WO2016206708A1 - Coating chamber - Google Patents

Coating chamber

Info

Publication number
WO2016206708A1
WO2016206708A1 PCT/EP2015/063937 EP2015063937W WO2016206708A1 WO 2016206708 A1 WO2016206708 A1 WO 2016206708A1 EP 2015063937 W EP2015063937 W EP 2015063937W WO 2016206708 A1 WO2016206708 A1 WO 2016206708A1
Authority
WO
Grant status
Application
Patent type
Prior art keywords
coating
chamber
particular
invention
according
Prior art date
Application number
PCT/EP2015/063937
Other languages
German (de)
French (fr)
Inventor
Felix MASSA
Tobias ZENGER
Original Assignee
Ev Group E. Thallner Gmbh
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date

Links

Classifications

    • HELECTRICITY
    • H01BASIC ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/6715Apparatus for applying a liquid, a resin, an ink or the like

Abstract

The invention relates to a coating chamber, a mask for said coating chamber, a processing system comprising said coating chamber, and a system for coating substrates.

Description

coating chamber

Description

The manufacture of integrated components such as circuits which as logic devices, microfluidic devices, MEMS devices, filters,

LEDs etc. are on substrates. In the semiconductor industry are on or in the substrates, the semiconductor devices, also called chips manufactured.

Substrates are offering preferential wafer. Wafers are standardized substrates with well-defined, standardized diameters. However, the substrates can generally be of any shape. The diameters of the substrates may generally take on any size but usually have one of the standardized diameter of 1, 2, 3, 4, 5 inches and 150, 200, 300 or 450 mm, corresponding to 6, 8, 10, 12 and 18 inches.

Furthermore, as substrates arbitrarily shaped pieces or fragments should be particularly understood from wafers. are as substrates

To understand in particular square objects having edge lengths in particular greater than 10 mm, greater than 50 mm, in a preferred variant with edge lengths greater than 100 mm, in a further preferred variant of greater than 200 mm in a further preferred variant larger 280 mm. Later in the description is commonly spoken of substrates. In particular, the invention relates

However, embodiments primarily on wafer.

The semiconductor industry uses a variety one known in the art technologies for processing the substrates.

One of these technologies is used to provide the substrates with a functional layer or layer sequences, referred to as a coating (English, coating).

In the course is generally spoken of layers, mutatis mutandis, but Schtchtfolgen should also be understood by it.

The coatings can be produced in various ways and applied to the substrate. There are physical processes such as evaporation, sputtering or deposition processes physical and chemical agents used, such as. Chemical vapor deposition (CVD), plasma-enhanced chemical vapor deposition (PECVD), physical vapor deposition (PVD). In addition to these methods of thin-film technology coatings by dipping, spraying, and spin coating to the substrate surfaces are widespread.

The plants that produce the coating, are as

Coating plants referred. The coating operations are described as processes which are directed through recipes.

Recipes are optimized values ​​collections of parameters that are the functional or procedural context. The use of recipes makes it possible to ensure the reproducibility of production processes. This reproducibility of the results is deemed to include as quality.

For the quality of the coating characteristics must be defined and divided.

Quality criteria for all coating processes as well as for

exporting coating systems include the

Uniformity (homogeneity) of the coating obtained, layer thickness and freedom from defects of the formed layer.

The quality criteria can be, for example, fall into three generic terms. Input, process and output characteristics.

At the entrance features include eg. All substrate parameters, not alterable machine parameters can not be influenced

Environmental conditions such as. The local gravitational constant at the site.

As process characteristics all features be understood that affect the application of the coating on the substrate. Example, substrate preparation and coating material preparation, the application process itself as well as the post-treatment of the substrate to the nearest

Processing step.

As starting characteristics all the characteristics that have changed the substrate by coating process apply, whether energetic, material changes, or the information content of the substrate, which for example. In / encoded the structural geometry / n / are. The achievement of quality criteria is an interaction of all

Input and process characteristics advance so that the output characteristics are achieved reproducibly. This interaction is therefore on the part of the coating system, the process and used

Materials (layer and substrate, plant materials) and, for example, substrate composition, substrate material, cleanliness,

Environmental coined.

Current coating systems, especially for lithography or for the imprinting, especially for nanoimprinting have multiple coating methods, which are realized by appropriate technical measures. These are the spin coating and the

process spray coating, and plasma-enhanced variants of the above coating.

In lithography, are applied to the substrates, in general, paints, or other materials. but coatings are possible with any, goal-oriented materials or material mixtures.

The process characteristics are also understood as method features and used interchangeably.

The general procedure, which can be achieved, the coating of substrates and performed by means of coating plants, consisting essentially of the following sub steps, known

Subdivisions of the partial steps are assumed to be common knowledge of the skilled artisan.

In a recipe, the process features are targeted

together, created the sub-steps in a meaningful combination. The recipes can be made available both as instruction sets in maschinenverstäncüicfier form or for the operator. The execution of the recipe to implement the process characteristics, which on the

Coating plants takes place, is described here. To preparatory process steps is omitted here.

In the first general step, the recipe is loaded. In the second general step, the substrate is charged or at several

simultaneously treated substrates all substrates are loaded. For the general method, the number of the substrates is negligible, so will continue talking from the substrate; However, it is reasonable according to the plural form also included.

In the third general step, the application is carried out (engl. Dispensing) of the coating material. In this step, a movement, especially a rotation of the substrate holder (engl. Chuck) irrelevant.

In spray coating the same time uniform distribution of the coating material takes place in this process step.

In the fourth, optional general step, the coating material is spun to achieve the uniformity of the layer thickness and spun off excess coating material. There are

Coating operations, which require re-application of the material, analogously to the general steps are then three and four performed again.

In the fifth method step, the substrate from which it is

removed coating chamber and further processed. In the sixth, optional process step, the coating chamber is cleaned from the remnants and debris of the coating material.

Problems of the current coating systems are, inter alia, that the particles produced during spraying or spin contaminate large areas of the coating chamber. On one hand, this is detrimental to the throughput of the plant with increased purification times and concomitant reduced production times, on the other hand, the flow characteristics in the chamber are thereby adversely affected to a non-reproducible manner, because the photoresist remains as deposits flow cross-sections and surface roughnesses

change.

The changes in the flow cross-sections or surface roughness are particularly disadvantageous as dynamic processes, as the local gas concentration of the solvent as well as the flow conditions in the chamber atmosphere will vary depending on the solvent content of the produced layer or splashes, whereby the quality of the coating is adversely affected.

It is therefore the object of the present invention to eliminate the disadvantages of the prior art and in particular to increase the throughput of the coating chamber or of the plant to reduce cleaning times to increase productive time and to improve the quality of the coating.

This object is achieved with the inventive objects according to the independent claims. Advantageous developments of the invention are specified in the subclaims. In the framework of the invention, all combinations of at least two of the description, the claims and / or the figures stated features fall. For declared value ranges are disclosed as limit values ​​also apply within the stated limits are values ​​and be claimed in any combination.

A subject of the invention relates to a coating chamber, in particular coater chamber, for coating a substrate, in particular a wafer, having a chamber opening for loading and / or discharge of the coating chamber, the

Having coating chamber a diaphragm, especially an iris diaphragm for at least partially closing the chamber opening.

Another subject of the invention relates to a visor for a, in particular according to the invention, the coating chamber, comprising an, in particular central, preferably circular, aperture and

at least one movable, in particular rotatable lamella to at least teiiweisen occlusion of the aperture.

Another subject of the invention relates to a

Processing system for processing substrates, in particular wafers, having a, in particular according to the invention, the coating chamber, the coating chamber, aperture can be sealed off from other parts of the plant at least partially through a, in particular according to the invention.

Another subject of the invention relates to a method for coating a substrate, particularly wafers, comprising the steps of, in particular with the following sequence:

a) loading of an, in particular according to the invention, the coating chamber having a substrate by a chamber opening in the coating chamber;

b) At least partially closing the chamber opening by a, in particular according to the invention, aperture;

c) applying a coating material on the substrate within the deposition chamber;

d) At least partial releasing of the chamber opening by the diaphragm; e) removing the coated substrate from the coating chamber.

It is also conceivable that the two steps b) and c) are reversed, so that the coating material applied first and then the shutter is closed.

The core of the invention particularly relates to a coating chamber (hereinafter also referred to briefly chamber), in particular a

Coater chamber controlled by a diaphragm, in particular continuously and / or from the other system, at least partially

may be foreclosed to temporarily an atmosphere in

To produce coating, in particular lacquering and / or to avoid splashing in the other parts of the plant and / or chamber geometry and / or the chamber volume targeted, and in particular

different substrate sizes to adjust.

A major advantage of the invention lies particularly in the increased quality of the coating of substrates by the increased reproducibility of the coating process.

In a preferred embodiment, the diaphragm, in particular continuously and / or automated, formed so adjusted that the effective size of the opening of the coating chamber variable, in particular depending on the desired, preferably continuously, can be adjusted by the aperture. The effective size of the chamber opening and the effective opening chamber is that portion of the chamber opening, which is released from the diaphragm or is which is therefore not blocked by the shutter or slats. Characterized the conditions in the deposition chamber (process conditions) can be as desired, precisely adjusted, and in particular continuously in an efficient manner in particular advantageous, in particular, the quality of the coating can be improved. Furthermore, the effective chamber opening can be particularly well adapted as appropriate to the desired size, for example for loading, for coating, etc. for spinning. This process times can be reduced in particular.

In another preferred embodiment, the adjustment of the aperture by a particular closed loop is controllable. So that the conditions can be optimally adjusted within the coating chamber, whereby in particular the quality of

Coating can be optimized. In particular, in the

Control loop at least one, in particular in the coating chamber is arranged, the sensor may be arranged, in particular, an ambient sensor for measuring temperatures, gas, solvent concentrations, flow rates and / or rotary speeds of flows in the coating chamber, characterized may advantageously measured values ​​with sensors, for example, in the coating chamber are determined, are used to set the optimal size of the opening of the coating chamber. This makes it even more possible to the optimum process conditions within the

adjust coating chamber.

In particular, the adjustability of a solvent concentration in the coating chamber with the, in particular continuously and / or automatically adjustable, aperture, particularly in connection with a closed loop, resulting in better manageable and

adjustable process conditions and thus better to

Coating quality.

In particular, in the control loop at least one sensor is arranged, such as an environmental sensor, which measures eg. Temperature, gas and / or solvent concentrations, flow rates, rotation speed of the flow etc. in the coating chamber. By influencing the flow conditions in the

Open coating chamber means, partial opening or closing or partially closing the aperture which may preferably automatically and / or continuously, to constant

Environmental conditions for the coating can be produced.

The data of the sensor (also called processing unit) in particular in a control unit prepared, evaluated, corrected (eg.

Dead or delays considered accidental

Controller variations spurious signals eliminated) and output as a control signal to the diaphragm.

The control signal is of the diaphragm in particular an actuator, soft is operated electronically, electrically, hydraulically and / or pneumatically fed. The actuator generates the adjusting movement of the diaphragm in order to achieve the required position and the desired state of the shutter and / or to approach by means of a motion sequence to the target value to the control value and / or to achieve. Then a renewed control cycle may receive the start.

Another advantage of the closable aperture in the protection of the entire plant from splashes, particularly paint splashes, and / or unwanted deposits from a spray in the

Coating chamber, the influence of the flow field in the chamber and / or the closure of the chamber also considered can be considered simultaneously in the particular control operation.

In particular, the aperture for the used in the chamber materials, rolling off a surface property, that is low surface adhesion may have. The aperture can to have the largest possible contact angle. Thereby, it is advantageously possible to keep the panel as possible from undesired impurities-free.

Furthermore, the aperture in particular consist of functional materials, which in the given Dämpfe-, droplet and

Aerosol atmosphere of the chamber are inert, especially

are corrosion-prone.

The coating chamber in particular that all components which are necessary for a substrate coating and known to those skilled to fulfill the function are: one can in particular

rotatable or fixed substrate chuck, a holder for the substrate or the substrates, drains, as well as suction,

Metering devices and Reinigungsvor-directions and / or

Sensors be present in the chamber.

The aperture of the coating chamber is preferably a cover ring which is several times as divided ring may be formed in a preferred embodiment as a one-part ring, in a further preferred embodiment as unique split ring, in a further embodiment. In particular, the aperture can be designed as an iris diaphragm. This advantageously a particularly efficient control of the iris or of the

Closing and opening distance. Alternatively, the aperture may as

be slit formed.

The main function of the aperture is, in particular, the

separating the coating chamber from the other parts of the plant and / or to limit the chamber volume. The separation should the leakage of particles, splashes, aerosols, vapors, gases,

prevent solvents from the chamber so that they do not reach outside of the coating chamber to other divider of the system. Another essential function of the diaphragm according to the invention by, at least partially, closing the chamber opening, the chamber reaching a defined atmosphere, in particular by means of

Dosing device on procedural ways. A defined chamber atmosphere can increase the conformity of the deposited layer.

The chamber atmosphere may in particular about what is included

Gas concentrations and / or liquid concentrations are characterized. The concentrations in the chamber are between 0% to 100%, preferably between 25% - 10Ö%, more preferably between 50% - 100%, more preferably between 75% - 100%, most preferably between 90% - 100%, in most preferably, between 95% - 100%. The percentage limits data refer in particular respectively to the saturated state of the individual, the atmosphere generated gases and / or vapors and / or mist. These characteristic values ​​are to the expert, for example. known state diagrams of the pressure-temperature. The control of the chamber atmosphere can be adjusted via a gas purge in accordance with the invention a preferred embodiment. In a further preferred embodiment according to the atmosphere within the coating chamber, by a

Exhaust Control Set / regulation. In another

preferred embodiment according to the setting of the chamber atmosphere via a combination of a gas supply and / or liquid supply and / or exhaust air control / regulation adjustable.

Another invention according to preferred embodiment may

additionally having respective fluid reservoir, the

Surface of the liquid and / or a liquid mixture

larger and thus influence by evaporating the atmosphere. A further embodiment may comprise a temperature-controlled and / or regulated heated reservoir for targeted evaporation.

The concentrations of the substances in the chamber atmosphere are particularly dependent on temperature. The temperature within the chamber is between 1 0 ° C and 500 ° C, preferably between 10 ° C and 400 ° C, more preferably between 10 ° C and 300 ° C, most preferably between 1 0 ° C and 200 ° C, allerbevorzugtesten between 1 0 ° C and 100 ° C.

The temperature of the sample holder (Engl, chuck) can also the

influence coating results. The sample holder can on

Temperatures greater than 10 ° C, preferably greater than 20 ° C, more preferably greater than 25 ° C, more preferably greater than 50 ° C, more preferably greater than 100 ° C, most preferably greater than 200 ° C, allerbevorzugtesten be heated above 300 ° C. The temperature of the sample holder can be adjusted in the ideal case with 0% and kept stable with an error less than 10%, more preferably less than 5%, more preferably less than 1%, less than 0.5% allerbevorzugtesten. The error can be viewed locally and / or time.

The aperture may, in particular in a relative movement to Probenhaiter, in particular on the sample holder to be moved, wherein the diaphragm and / or the chamber and / or the chuck can be moved. The goal of this exercise is particularly the process-related reduction or minimization of the distance between the diaphragm and the substrate surface to be coated.

In a preferred embodiment, the diaphragm has at least one movable, in particular screenplays are. Lamel! e for at least partially closing the chamber opening, wherein the coating chamber has in particular a plurality of at least partially overlapping lamellae. The movable fin or fins, the effective chamber opening can be adjusted more accurately. Preferably, the diaphragm has more than 2, preferably more than 3, more preferably greater than 4, more preferably more than 5, most preferably more than 6, even more preferably greater than 7, more preferably greater than 8, most preferably more than 10 fins on.

In a further embodiment of the invention the diaphragm may have a fixed blade, in a further inventive

Embodiment may have a fixed and a movable blade exactly the aperture. In a further preferred embodiment of the invention, the aperture a fixed and more than 1, preferably more than 2, more preferably greater than 4, most preferably more than 6, even more preferably greater than 8, most preferably more than 10, most

ailerbevorzugtesten comprise more than 12 movable slats. It can form more than a fixed blade, in particular more than 2, more preferably be used more than 4, more preferably more than 6, most preferably more than 8, more than 10 ailerbevorzugtesten on fixed blades. In a further preferred inventive

Embodiment, may be designed movably all slats of the panel. The number of fins depends in particular on the shape of the desired opening, or after the approximation of a circle.

In particular, the at least one lamella to the outside can (ie from the interior of the chamber away) or be curved inwardly (ie towards the inside of the chamber). Alternatively, the at least one blade may be planar.

Moreover, the shutter can open in particular inwardly, outwardly or in one plane.

The diaphragm, in particular a retaining ring or the blade (s) of the shutter (or the iris), consists or consist in particular of:

• metal and alloys thereof, in particular of

o steel and / or its alloys,

o aluminum and / or its alloys,

o CMOS-compatible metals and alloys, practically free of: Cu, Au, Ag, Pb, V,

• semiconductor materials, in particular from

o silicon and / or its alloys,

• polymers, in particular

o thermoplastics,

o thermosets,

o thermosets,

o amorphous polymers,

o chlorinated or fluorinated copolymers or other • glasses, especially from

o oxide glasses, especially from

■ phosphatic glasses,

"Silicate glasses, eg. Quartz glass, aluminosilicate glass, lead silicate glass, and alkali Erdalkalisilikatglas,

■ borate glasses or borosilicate glasses.

• ceramics.

In a preferred embodiment, the functionally relevant portions of the diaphragm are made from the following materials

• polymer, in particular

o elastomer

• metal

• metal alloy

• semiconductor material

• composite

The material from which the diaphragm is made may

• amorphous

partially crystalline or •

• crystalline

be.

The tensile strength of the material is preferably greater than 1 0 Pa, preferably greater than 100 Pa, more preferably greater than 1 kPa, most preferably greater than 1 MPa, at allerbevorzugtesten greater than 1 GPa.

In particular, the material of the diaphragm may be uncoated. In a preferred embodiment, the material of the diaphragm with one or more functional layers can in the following also called coating, may be provided. The advantage of the coating is to reduce the adhesion of the present in the Beschtchtungskammer media and the avoidance of contamination of the aperture. In addition, the

Coating a reduction of the friction of the diaphragm, a material achieving a compatibility and / or an acid or

Alkali resistance allow.

The coating is preferably a

Non-stick coating (English:. Anti-sticking layer). The anti-adhesive property of a surface is preferably represented by the energy that is necessary to separate the coated surface from a second surface. The energy is given in J / m2. The energy per unit area is less than 2.5 J / m2, with preference less than 0.1 J / m2, with greater preference less than 0.01 J / m2} with the greatest preference less than 0001 J / m2, with allergrößtem preference less than 0.0001 J / m2, most preferably less than 0.00001 J / m2.

In another embodiment, the coating chamber to achieve can, for example, a low cost destination without

Self-cleaning functionality are applied.

In a preferred embodiment, the chamber has a,

in particular automated} (especially self) cleaning device for cleaning the diaphragm or for the removal of contaminants on the diaphragm on. Thereby, advantageously, the contamination of the substrate or the coating of the substrate can be prevented for example by Down drops of impurities. In addition, the durability of the diaphragm is extended. In addition, the panel need not be replaced for cleaning, so that the throughput can be increased because periods of stagnation of the chamber can be avoided especially for maintenance.

The cleaning means preferably comprises a, in particular rotatable, wipers, in particular a stripper ring, and / or at least one, in particular swiveling and / or translationally within the coating chamber (3) movable, cleaning nozzle for the removal of contaminants on the diaphragm.

The self-cleaning, in a preferred embodiment with a roll-off effect with a hydrophobicity having preferably higher

Contact angle than 20 degrees, more preferably greater than 30 degrees, most preferably greater than 40 degrees, more preferably greater than 60 degrees, most preferably greater than 70 degrees, allerbevorzugtesten greater than 95 degrees at the reached.

The scraper can, in particular mechanical, preferably pneumatically, more preferably electrically and / or electronically by the operator and / or by prescription, in particular automated, operate.

In a particularly preferred embodiment of a nozzle system or nozzle systems may be provided for cleaning the aperture. The nozzle or nozzles may be aimed at a contaminated site or location of the panel and removed with a cleaning fluid, for example. Photoresist residues. The cleaning fluid may be particularly adapted to the applied photoresists. The following solvents are possible:

* Water, in particular

o DI water

• organic solvents, in particular o isopropanol (IPA)

o mesitylenes

o PG EA

• Inorganic solvents

• mixing of the above-mentioned solvents

In a further embodiment, the cleaning nozzle or the nozzle system by means of gases and / or liquids can, in particular a high flow rate, clean the aperture. For this, a gas mixture and / or a vapor solvent mixture can in particular CDA, (liquefied) C02, N2, are used.

In a further embodiment of the invention the cover can be removed and cleaned on a dedicated cleaning station. In a preferred embodiment, in the

Coating line several apertures are used which are temporarily stored after cleaning, so that the functionality of the coating chamber during the cleaning of a diaphragm is maintained, since decontaminated apertures are required for the exchange are available.

In another preferred embodiment of the invention the cleaning and / or replacement of the visor is automated.

In a further embodiment of the invention is the

Cleaning functionality of a combination of the already

Nozzle system described and the wiper system.

In a further embodiment the aperture for providing the functionality may be discretely adjustable between the fully open and the fully closed state so that the aperture can be opened or closed in a known manner to the skilled person.

The remaining opening of discretely controllable steps in opening or closing, in a preferred embodiment, a residual opening of greater than 1 mm, more preferably greater than 1 / 8th inch or 3 mm, more preferably greater than 50 mm, more preferably greater than 200 mm, the preferably greater than 350 mm, the amount allerbevorzugtesten greater than 500 mm, in particular corresponding to the wafer sizes described in the preceding paragraphs of this specification.

In an alternative preferred embodiment, the inventive diaphragm can adopt continuous between the fully open and the fully closed state each state.

This embodiment of the invention can be carried out either manually or automatically as well. The securing of the position may, for example, by suitable measures such as fixing self-locking, brake, ratchet or Gehemme (snap, screw, magnetic clamping) take place. Further, when the drive of the aperture are used for changing the position of the fixation exist.

The manual embodiment is preset according to the recipe of a device operator. The automated, preferred

Embodiment of the invention is controlled in a well-known to the expert by means of a system consisting of a measuring element, control element and actuator.

The opening and closing speed of the shutter is between 1 mm / s to 450 mm / s, preferably between 1 mm / s and 300 mm / s, more preferably between 1 mm / s and 200 mm / s, most preferably between 1 mm / s and 100 mm / s, at allerbevorzugtesten between l mm / s and 50 mm / s, and in particular irrespective of whether the to be closed

Coating chamber is completely or incompletely closed. Thus, a relatively fast adjustment of the desired size of the opening is advantageously possible, so that the coating process can be carried out relatively quickly.

In particular, the aperture may be fixed, in particular a retaining ring, be connected to an edge of the chamber opening. This results advantageously a particularly stable connection and a particularly good utilization of the chamber opening for effective chamber opening.

Alternatively, the aperture can in particular rotatably, in particular with the retaining ring to be mounted on the edge of the chamber opening. The

Rotation speed in revolutions per minute (English:. Rounds per minute, rpm) indicated. The aperture is in particular more than 1 rpm, preferably with more than 10 rpm, more preferably more than 100 rpm, more preferably more than 500 rpm, more preferably of more than 1000 rpm, more preferably of more than 2500 rpm, more preferably with more than 5000 rpm is rotatable. Thereby, advantageously a

Relative movement between the diaphragm and the substrate,

Cleaner, etc. in order so that, for example, better cleaning can be achieved.

According to a further exemplary embodiment, the

, Coating chamber configured such that the change in

Opening of the aperture and the coating chamber, the chamber volume, in particular between 1 liter and 20 liters, is changed. This can be done eg. With a domed cover. Also, the flow conditions can be changed to a desired state out so that, for example, turbulence and other turbulence can be avoided. Another advantage of this embodiment is seen in the spray coating. The distance is the

closed diaphragm from the substrate selected such that the liquid

Components which are above the wafer on the panel, to solidify therein and will not drop onto the substrate and cause defects in the coating.

According to a further preferred embodiment, the diaphragm is configured such that the chamber is optimized for reduction in volume, wherein the enclosed volume remains virtually constant. Thus, the free volume of gas between the substrate and the aperture is adjusted to an optimum. This optimum is composed of the factors height,

Flow conditions, speeds during the spin cycle, gas or

Solvent composition and concentration in the

Coating chamber, coating method, coating recipe etc. together.

According to a further exemplary embodiment, the

Coating chamber configured such that the diaphragm as a functional group during the coating in the coating chamber

is clamped and / or otherwise attached. Thus, the panel is out of the setting movement of the opening and / or closing any

Movement necessary. This embodiment may be particularly advantageous when spray coating and / or at low speeds Chuck.

According to a further exemplary embodiment, the

Coating chamber configured such that the diaphragm co-rotate synchronized as a functional group during the coating to the sample holder and / or with one of the rotational speed of the sample holder

different speed rotates along.

The rotational speeds of the substrate and / or the aperture can in particular more than 1 rpm, preferably more than 10 rpm, 100 rpm, 500 rpm, 1000 rpm, 1500 rpm, 2000 rpm, 2500 rpm, 3000 rpm, 3500 rpm, 4000 rpm, 5000 rpm, 10000 rpm and 20000 rpm, respectively.

So that the coating system can achieve appropriate process results, in particular is not only the speed but also the

Angular acceleration of central importance. The angular acceleration is a key parameter in particular for the uniformity and avoiding the formation of a meniscus (English, edge bead). In particular, the angular acceleration is greater than 1 rpm / s, 1000 rpm / s, 5000 rpm / s, 10000 rpm / sec, 20000 rpm / sec or 30000 rpm / s.

Regardless of this rotation, the functionally relevant movement (opening, partially open, close, partially closing) may also recipe controlled and / or regulated occur at the diaphragm.

The application of the medium (coating material) may already almost completely closed aperture are so advantageous in a waiting time, in particular in order to drive a loading arm from the chamber and / or close a lid is omitted.

The rotations of the aperture and / or the sample holder be understood in the context of this description in the same direction or opposite directions of rotation as a co-rotates. As drives for the rotational direct drives and / or drives are possible with gear. According to a further exemplary embodiment, the coating chamber is designed such that the bezel

Coating chamber completely, practically gastight may enter. The main advantage of this embodiment resides in the better control of the chamber atmosphere as well as the reduced odor, spatter and / or pollutant contamination of other parts of the coating system.

According to a further exemplary embodiment, the

Coating chamber configured such that the diaphragm partially covers the coating chamber in the fully closed state and characterized, for example. One, in particular continuous and / or on both sides, provides the extraction solvent. This embodiment is particularly useful for solvent with a very low flash point,

carcinogenic, tetra genes and / or otherwise harmful photoresists or coating pre-Open advantageous.

According to a further exemplary embodiment, the

Coating chamber designed so that the aperture itself has the information necessary for fulfilling the functions of facilities. This can be advantageous in reduced design.

According to a further exemplary embodiment, the

Coating chamber are formed such that the aperture at least two, in particular one above the other and / or behind each other stacked,

includes individual panels. Thus, the effective aperture can be adjusted more precisely. The individual screens can be designed according to the invention. Reference is made to the above statements. The single aperture can be adjusted individually in particular. The number of apertures may more than 2, preferably greater than 3,

more preferably greater than 4, more preferably greater than 5, more preferably greater than 6, most preferably greater than 7, be on allerbevorzugteste.n greater. 8

Subtasks as splash protection, gas-tight sealing of the chamber, light stabilizers, in-situ sensors may be divided into differently shaped single shutter. The main advantage is the

Segregation of duties and in the application of the selfsame

Design principle.

According to a further exemplary embodiment, the

Coating chamber configured such that the diaphragm in a particular closed loop control is operated. The control can especially all measurable and / or calculable parameters or their appropriate combinations, such as temperature, partial pressures of the

Atmosphere, saturation of the atmosphere, speed and / or

recourse angular acceleration of the chuck, flow rates of the gases used and / or liquids, process time. This means that to achieve better process control and thus an increase in quality.

According to a further exemplary embodiment of the

The coating chamber can be controlled, the aperture and / or adjusted manually. This embodiment can be particularly advantageous for manually operated systems.

Hereinafter, an inventive method step, the opening of the panel or an at least partial release of the chamber opening by the shutter will be described. In an inventively preferred variant, this means the complete opening of the diaphragm. In a further preferred variant, the opening of the diaphragm may be a partial opening, in particular up on substrate size, mean, in particular so that the substrate can be removed from the coating chamber. In a further preferred variant, the opening of the diaphragm a

concurrent cleaning means comprise scraper.

Subsequently, another inventive method step of closing the aperture and an at least partially closing the chamber opening by the shutter will be described. In an inventively preferred variant, this can mean virtually gas-tight closing. In another presently disclosed variant, the partial closing is expected by a flow-optimized or otherwise specified position.

Further, it is another optional step of cleaning of the visor, in particular after the coating described. In a preferred variant according to the invention, this is intended to include the purification by means of scrapers, which runs at the same time with the opening of the diaphragm.

In particular, the chamber which may comprise a ventilation device for ventilation of the interior of the coating chamber

Ventilation means is formed in particular as at least one passage and / or at least one valve in the diaphragm, in particular in the retaining ring of the diaphragm, and / or in a chamber wall. Thus, the conditions within the chamber can be better controlled.

In particular, special process gas can be supplied through the aerator into the chamber. Advantageously, this may be be a gas / vapor mixture. When steam is in particular to solvent vapor. Advantageously, the steam can also be a precursor to react with the coating material. The gas and / or the gas / vapor mixture are prepared in a corresponding feeding means and controlled in the chamber is supplied. such

Devices are known in the art and are not described here.

Cleaning the aperture

In an exemplary variant of the invention, the cleaning of the panel following partial steps should include:

In a first process step the shutter is closed.

In a second process step is solvent on a page in another preferred variant, on both sides of the diaphragm

applied, which is to replace the splashes and any other deposits.

In a third optional step, the diaphragm is with

Solvent such as DI water, ultrapure water rinsed. Optional can be used to remove the residual particles solvent combinations to achieve a Marangoni convection.

In a fourth method step the bezel with CDA, nitrogen or another gas or gas mixture is particulate and / or droplet-free blown.

In a fifth method step, the shutter is opened. In another preferred variant of the invention is to the

Cleaning of the diaphragm following partial steps include:

In a first method step, the aperture of which is

Coating chamber removed.

In a second method step, the aperture is on a

Cleaning station transfers.

In the further process steps, cleaning is run similar to the previously described variant. After the completion of the

Cleaning operation, the diaphragm is transferred to a storage station. The purified aperture is then in the

Coating chamber mounted.

coating process

A first exemplary method of the invention for coating a substrate is as follows:

In a first process step according to the invention a recipe is started.

In a second method step at least partly, open aperture is on, load the substrate into the coating chamber on a chuck.

In a third process step according to the invention the shutter is set to a defined Dispense position. In a fourth inventive method, the step is carried out

Called dosage of the coating composition as Dispense. In this case, the chuck together with the substrate may rotate.

In a fifth process step according to the invention the aperture is closed.

In a sixth step, the spin coating method according to the invention the coating agent is carried out optionally.

In a seventh method step according to the invention the aperture is opened.

The eighth process step according to the invention is the removal of the substrate from the coating chamber.

As a ninth invention process step is optional

Cleaning of the coating chamber performed so that after the next coating process can take place.

A second preferred method of the invention proceeds as follows:

The first and second step of the invention is identical to the invention from the first method.

In a third process step according to the invention the aperture is closed.

In a fourth process step according to the invention a defined gas atmosphere (eg. With a defined concentration of solvent) is produced.

In a fifth process step according to the invention the shutter is set to a defined Dispense position.

In a sixth method step according to the invention takes place

Called dosage of the coating composition as Dispense. In this case, the chuck together with the substrate may rotate.

In a seventh method step according to the invention the aperture is closed.

In an eighth inventive step, the spin coating of the coating composition optionally takes place.

In a ninth method step according to the invention the aperture is opened.

The tenth process step according to the invention is the removal of the substrate from the coating chamber.

As the eleventh inventive step, the cleaning of the coating chamber is optional running, so then the next

can drain coating process.

Further advantages, features and details of the invention will become apparent from the following description of preferred embodiments and with reference to the drawings. The following figures show schematically:

Fig. La illustrates schematically a diaphragm according to the invention according to an exemplary embodiment with slats in the open position is. Shows the diaphragm in Fig. La with fins in semi-closed position. provides a coating chamber according to the invention according to an exemplary embodiment having a convex diaphragm in the closed position is. shows the coating chamber in the open position, provides a coating chamber according to the invention according to a further exemplary embodiment with a inwardly curved visor in the closed position is. shows the coating chamber in open position. provides a coating chamber according to the invention according to a third exemplary embodiment with a flat visor in the closed position is. shows the coating chamber with a flat visor in the open position. illustrates schematically an inventive

Coating chamber according to a fourth exemplary embodiment having a diaphragm mounted thereon.

Fig. 5 is a schematic illustration of a coating chamber according to the invention according to a fifth exemplary embodiment with rotating bezel.

Fig. 6 illustrates an exemplary aperture of invention

a plurality of individual apertures is.

Fig. 7 shows an inventive exemplary block diagram for the control of a diaphragm in a closed loop.

Fig. 8 illustrates an inventive exemplary block diagram for controlling a shutter is in an open control chain.

FIG. 9a is an overview of another exemplary

Coating chamber according to the invention with a flat panel.

Fig. 9b, the coating chamber with additional

Ventilation functionality is at the aperture.

Fig. 9c is another variant of the coating chamber with ventilation aperture with functionality of the chamber.

Fig. 1 illustrates an exemplary inventive 0a

Procedure for coating a substrate is.

Fig. 10b shows another exemplary invention

Procedure for coating a substrate.

Fig. 1 0c shows another exemplary invention

Procedure for coating a substrate. is a partial schematic illustration of another

exemplary coating chamber according to the invention with orifice and a fixed scraper ring. is a partial schematic illustration of another

exemplary coating chamber according to the invention with fixed scraper and rotatable aperture. is a partial schematic illustration of another

exemplary coating chamber according to the invention with a rotatable scraper and rotatable aperture. is a partial schematic illustration of another

exemplary coating chamber according to the invention with a fixed aperture and a rotatable scraper. is a partial schematic illustration of another

exemplary coating chamber according to the invention having a pivotable cleaning nozzle and fixed iris. is a partial schematic illustration of another

exemplary coating chamber according to the invention with a plurality of pivotal cleaning nozzles and fixed iris. is a partial schematic illustration of another

exemplary coating chamber according to the invention with a swiveling nozzle or nozzle system, which can be moved in translation in the chamber and fixed iris. Fig. 12d is a partial schematic illustration of another

exemplary coating chamber according to the invention having a pivotable cleaning nozzle and rotterbarer aperture.

FIG. 12e is a partial schematic illustration of another

exemplary coating chamber according to the invention with a plurality of cleaning nozzles pivotable and rotatable aperture.

FIG. 12f is a partial schematic illustration of another

exemplary coating chamber according to the invention with a swiveling nozzle or nozzle system, which can be moved in translation in the chamber, and rotatable aperture.

In the figures, identical components or features, or having the same function with the same reference numerals.

Fig. La is a schematic plan view of an exemplary

Lens according to the invention 2 with four slats 1 in the fully open position. In this embodiment, the diaphragm 2 is formed as an iris diaphragm. The diaphragm 2 has a central circular opening 23 which can be closed by the slats. 1 The slats 1 are pivotally connected in each case via a pivot joint 22 with an annular retainer ring 2. 1 The fins 1 can, in particular by a non-illustrated drive, are rotated about the hinges 22 such that the opening 23 is at least partially obscured by the fins 1 and sealed. With open slats 1, a coating chamber 3, not shown, as will be explained in more accessible. This is in particular the position in which or from a substrate freely introduced into the coating chamber 3 of the

Coating chamber 3 can be removed.

Fig. Lb shows a schematic top view of the diaphragm 2 in semi-closed position. This may be in particular an intermediate position of the diaphragm 2 between fully open as in Fig. La and practical gas-tight. The slats 1 are moved to an unshown Versteümechamsmus, so that the desired opening can be adjusted. The slats 1 are overlapped partially to close the opening 23. As a carrier of the disk 1, the retaining ring 21 to which the blades are attached 1 through the rotary joints 22 rotatably serving.

Fig. 2a shows a schematic sectional view of an exemplary deposition chamber 3 of the invention with an outwardly curved aperture 2 and with outwardly curved lamella 1 in the closed position. With curved outward, it is meant that the diaphragm 2 and fins 1 of the coating chamber 3 arched away. The diaphragm 2 is fixed 35 with its retaining ring 21 on an edge 36 of a chamber opening and completely covers the chamber opening 35 of the coating chamber 3, which is used for loading and / or discharge of the coating chamber 3 with a substrate, particularly wafers. Thus, an unillustrated substrate holder together with the substrate in the coating chamber 3 of other parts of a coating system is removed virtually gas-tight manner, thereby forming a provided with eg. Solvent or in a further according to the invention advantageous embodiment, the solvent mixture local atmosphere can take place.

FIG. 2b shows a schematic sectional view of the coating chamber 3 of Fig. 2a in the open position. In this position the substrate is free removable. The splash guard functionality is for those of the

I i is the inside of the iris ring fins 1 protected areas exist, the outer side la of the iris ring fins 1 to the other parts of the

Coating plant turned.

Fig. 2c provides a coating chamber according to the invention 3 according to a further exemplary embodiment with a inwardly curved aperture 2 and with inwardly curved slats 1 in the closed position. With curved inward is meant that the diaphragm 2 and fins 1 in the direction the coating chamber are curved. 3

In this embodiment of the invention, the iris ring fins are 1 seen from the coating chamber 3 ago concave. With the election of the bulge a position eg. The Verfließens splashes can be controlled.

Fig. 2d shows the coating chamber 3 of Figure 2c in an open position. In this embodiment of the invention extend the

Iris ring fins 1 in the open position in the coating chamber 3. It is particularly advantageous in this embodiment the

Combination of the buckle with the constancy of the coating chamber height with an open and closed position. A change in the

Flow conditions in the chamber is possible by adjusting the lamellae.

Figures 3a and 3b provide a schematic sectional view of a coating chamber 3 according to another exemplary

Embodiment is with a diaphragm 2 having flat lamellae, wherein the lamellae 1 are shown 'schematically illustrated as closed, and in Fig. 3b, the laminations 1' as disclosed in Fig. 3a. In this preferred embodiment, the small footprint is particularly advantageous.

In addition, flat diaphragms 2 are particularly well over one another for stacking of multiple aperture second

Fig. 4 illustrates a schematic side view of a coating chamber 3 according to another exemplary embodiment of the invention with an attached diaphragm 2. A fastener 4 between diaphragm 2 and the coating chamber 3 indicates the immobility of the diaphragm 2 and the coating chamber 3 in operation of the coating chamber 3. The attachment 4 may both in the diaphragm 2 as well as in the

be integrated coating chamber. 3 Another attachment 5 ensures the local position of the coating chamber 3 in the non-illustrated Beschichtungsani age.

Fig. 5 is a schematic sectional view of a coating chamber 3 according to another exemplary embodiment of the invention with a rotatable visor 2. This particularly advantageous

Embodiment comprises for the rotation of the panel 2 bearing elements 6, preferably acting in the axial direction of the coating chamber 3, between the diaphragm 2 and the coating chamber 3 which is a

allow rotation of the visor 2 during operation. Here, between a sample holder 7 and the shutter 2 can at the same and / or held opposite direction twists. The speed of the diaphragm 2, with the

done speed of the sample holder 7 in synchronism. are therefore

in particular the parts of said angular accelerations and angular velocities in magnitude and direction the same.

This embodiment of the invention is, for example. For targeted

Generation of turbulence at different speeds,

running angular accelerations and angular velocities in the DC and / or antisense movements usable.

Fig. 6 is a schematic sectional view of a panel 2 according to another exemplary embodiment of the invention. The panel 2 includes 4 single aperture (2 \ 2 ", 2" 2 "") on. The individual panels (2 \ 2 ", 2 ', 2" ") are stacked. Thus, an almost

continuous variation of the airfoil possible because a plurality of individual panels (2 \ 2 ", 2 m, 2" ") with the iris annular lamellae (1 \ 1", 1 "\ 1" ") flow through the single aperture (2 ', 2", 2 " ', 2" ") more accurately,

especially gentle, can set as a single panel.

Fig. 7 shows an inventive exemplary block diagram for the control and / or regulation of an aperture 2 in a closed control loop. As is apparent to the skilled person there is a loop in the minimum configuration with actuator feigned object diaphragm 2 and the sensor in the feedback path. In this representation, regulatory approaches, type of control, data processing,

not listed energy supply, confounding factors for the clarity of presentation, as they are known in the art.

Other control parameters can all measurable and / or calculable parameters or their useful combinations such as temperature,

be Partiaidrücke the atmosphere, degree of saturation of the atmosphere, speed and / or angular acceleration of the chuck, flow rates of the gases used and / or fluids, process time; the controlled variable may also be a control parameter and / or to be adjusted path of the iris ring, the speed of movement of the slats, the rotation speed of the ring, the cleaning speed, the cleaning effect (determined by means of eg. the change in layer thickness to the chamber wall, etc.). Fig. 8 illustrates an inventive exemplary block diagram for the control of a diaphragm in an open-loop control chain. These skilled in the art well-known open form of the output influencing (opening diameter of the aperture 2, defined by the position of the slats 1) may, in particular in manual systems advantageously be used. Here, the position of the actuator is provided which this provides to the panel. 2

FIG. 9a is a representation of another exemplary

inventive coating chamber 3 with a planar diaphragm 2 or planar Iris annular lamellae, wherein the different

Embodiments are shown in the following.

Fig. 9b is a magnification of a schematic sectional view of another exemplary coating chamber 3 according to the invention. In this Embodiment 3, the coating chamber, at least one additional ventilation functionality 8 'on the retaining ring 21. The

Ventilation functionality 8 may be formed as a valve in the retaining ring 21 'than the retaining ring 21 passes through conducting and / or.

Accordingly, the integrated ventilation may or

Air purge functionality in particular by means of valves, advantageously rectifier valves, which are integrated in the retaining ring 21,

be formed.

Fig. 9c represents a magnification of a schematic sectional view of another exemplary coating chamber 3 according to the invention. In this Embodiment 3, the coating chamber has at least one ventilation functionality 8 ", wherein in the chamber wall 3 of the 1

Coating chamber 3 at least one passage 8 "and / or at least one valve 8" is arranged itself, particularly a straightening valve. The implementation of 8 "or the valve 8" is positioned in the upper region of the coating chamber 3, wherein the upper region is the region of the coating chamber 3 which faces the diaphragm. 2 This embodiment of the invention separates the

Ventilation functionality 8 "of the coating chamber 3 from the diaphragm 2. At the same time simplifies this embodiment, the configuration of the diaphragm 2 in comparison to FIG. 9b. Furthermore, it can be done with a special process gas and / or gas / vapor mixture, the vent, whose preparation is not separately will be discussed.

Ftg. 10 illustrates a block diagram for an exemplary

Procedure according to the invention is for a coating of a substrate.

In a first inventive method step, in particular in a control unit for controlling the coating chamber 3, a recipe that can be specified in particular manually and / or automatically started. in one optional second method step of the present invention is the panel 2, in particular completely, opened if the shutter was closed. 2

In a third method step, a substrate to be coated, in particular a wafer, through the aperture of the iris 2 in the

Coating chamber 3 loaded on a substrate holder.

In a fourth process step according to the invention the aperture is provided by an adjusting mechanism to a defined Dispense position or coating position. 2 The slats 1 are adjusted such that the desired size of the opening of the aperture 2 is achieved. The opening of the iris 2 can be reduced in particular.

In a fifth process step according to the invention takes place

Dosage of the coating composition, also called dispensations. In this case, the substrate holder together with the substrate may, in particular rotate.

In a sixth inventive process step the shutter is brought 2 position by the adjusting mechanism in a defined by recipe Coating-, in particular completely closed.

In a seventh step, the spin coating method according to the invention the coating agent is carried out optionally.

In an eighth step according to the invention the shutter 2 is opened, in particular completely.

The ninth process step according to the invention is the removal of the substrate from the coating chamber 3 through the open aperture. 2

As a tenth invention process step is optional

Cleaning of the coating chamber 3 running, so then the next coating process can take place.

As a final step according to the invention, the recipe is stopped.

Fig. 1 0b shows a block diagram illustrates a further exemplary method of the invention a procedure for coating a substrate.

In a first inventive method step, in particular in a control unit for controlling the Beschichtungskamrner 3, a recipe that can be specified in particular manually and / or automatically started.

In one optional second method step, the panel 2 is opened if the shutter was closed 2, in particular completely.

In a third method step, a substrate to be coated, in particular a afer, through the aperture of the iris 2 in the

Beschichtungskamrner 3 loaded on a substrate holder.

In a fourth process step according to the invention, the panel 2 is closed, in particular completely.

In a fifth invention, in the method step

Beschichtungskamrner 3 generates a defined gas atmosphere (eg. With a defined concentration of solvent).

In a sixth method step according to the invention the aperture is provided by an adjusting mechanism to a defined Dispense position or coating position. 2 The slats 1 are adjusted such that the desired size of the opening of the aperture 2 is achieved. The aperture of the diaphragm 2 can be increased in particular.

In a seventh inventive step, the dosage of the coating composition takes place, also called dispensations. In this case, the substrate holder together with the substrate may, in particular rotate.

In an eighth step according to the invention the diaphragm 2 is, in particular completely closed by the adjustment mechanism.

In a ninth step, the spin coating method according to the invention the coating agent is carried out optionally.

In a tenth process step according to the invention the shutter 2 is opened, in particular completely.

The eleventh step of the invention is the removal of the

Substrate from the coating chamber 3 through the open aperture. 2

Another inventive step is the optional

Cleaning of the coating chamber 3 running, so then the next coating process can take place.

The last step of the invention is the halting of the last recipe.

Fig. 1 0c is a block diagram illustrates a further exemplary method of the invention a procedure for coating a substrate.

In a first inventive method step, in particular in a control unit for controlling the coating chamber 3, a recipe that can be specified in particular manually and / or automatically started. In one optional second method step, the panel 2 is opened if the shutter was closed 2, in particular completely.

In a third method step, a substrate to be coated, in particular a wafer, through the aperture of the iris 2 in the

Coating chamber 3 loaded on a substrate holder.

In a fourth process step according to the invention the aperture is provided by an adjusting mechanism to a defined Dispense position or coating position. 2 The slats 1 are adjusted such that the desired size of the opening of the aperture 2 is achieved. The aperture of the diaphragm 2 can be increased in particular.

In a fifth process step according to the invention takes place

Dosage of the coating composition, also called dispensations. In this case, the substrate holder together with the substrate may, in particular rotate.

In a sixth method step according to the invention a defined gas atmosphere (eg. With a defined concentration of solvent) is generated in the coating chamber 3.

In a seventh method step according to the invention the diaphragm 2 is, in particular completely closed by the adjusting mechanism.

In an eighth inventive step, the spin coating of the coating composition optionally takes place. In a tenth process step according to the invention the shutter 2 is opened, in particular completely.

The eleventh step of the invention is the removal of the

Substrate from the coating chamber 3 through the open aperture. 2

Another inventive step is the optional

Cleaning of the coating chamber 3 running, so then the next coating process can take place.

The last step of the invention is the halting of the last recipe.

Fig. I Ia is a schematic partial illustration of another exemplary coating chamber 3 according to the invention with cover 2 and a stationary and fixed to the chamber wall 31 of stripper ring 9. The diaphragm 2 is provided with its retaining ring 21 in the region of the opening of the

Coating chamber 3 is fixed. The wiper ring 9 is in contact with the inside I i of the slats. 1 To function fulfilling the iris 2 is opened, so that the adhering impurities, residues of

Coating material, in particular photoresist residues, or otherwise due to the movement of the slats 1 by the scraper ring 9 are stripped off. For this function the relative translation of the slats I of the diaphragm 2 is to the stripper ring 9 the condition. It is particularly desirable to position the wiper ring 9 close to the diaphragm 2, to full open of the slats 1 as possible to achieve a large area and slough off.

Fig. 1 lb is a partial schematic representation of another exemplary coating chamber according to the invention 3. In this Embodiment 3, the coating chamber as in FIG 10a a stationary stripper ring 9 'which is fastened to the chamber wall 3 1. in the

Contrast to FIG IIa the diaphragm 2 and the retaining ring is supported rotatably via bearing elements 21 6, for example ball bearings on the chamber wall 3. 1 The bearing 6 permits the rotation of the visor 2 and of the retainer ring 21. In this variant of the invention is the

Relative movement, which is necessary for the stripping operation, composed of two components. The scraper 9 'is fixed, all radii of the diaphragm 2 will open or close by means of the diaphragm 2 with the scraper 9 similar to a line obtained. The rotation of the panel 2 as a second component of movement in the circumferential direction enhances the cleaning effect of the scraper 9. 4 By the way, on the

made statements on Figure 1 la.

Fig. 1 1 c is a schematic partial illustration of another exemplary coating chamber according to the invention 3. In this embodiment, both the stripper ring 9 'and the panel 2 is rotatable. The

Stripper ring 9 '4 is by means of a bearing 32 rotatably on the

Chamber wall 3 1 stored.

Here, the relative movement between the scraper 9 'and the diaphragm 2 generated in the radial direction with the displacement of the diaphragm 2 as described above. The rotation of the visor 2 and of the Abstreiferrings 9 ", the effect in the circumferential direction, and thereby an improved cleaning is achieved. In this variant, an increase in the

expected self cleaning speed, which makes a significant contribution to the reduction of processing time and increasing throughput. Reference is also made to the statements regarding FIGS II a to 1 1 b. Fig. 1 ld is a fragmentary schematic illustration of another exemplary coating chamber according to the invention 3. In this embodiment, the diaphragm 2 and the retaining ring 21 as shown in the figure II a is fixedly connected to the chamber wall 3 1. Also, as mounted in Figure 1 1 c rotatable by means of the bearing 32 on the chamber wall 31 of the stripper ring 9 ". Here, the time necessary for cleaning relative movement is produced by means of opening of the diaphragm 2 in the radial direction, the effect in the

Circumferential direction is "generated with respect to the coating chamber 3 and the fixed panel 2 by means of rotation of the scraper. 9 Reference is also made to the statements regarding FIGS II a to 1 1 c.

FIG. 12a is a schematic partial illustration of another exemplary coating chamber 3 according to the invention with a pivotable cleaning nozzle 10 and a fixed aperture 2. The pivotable cleaning nozzle 10 is supported on the chamber wall 31 via a bearing 33rd

A cleaning fluid is sprayed into the coating chamber to the inside I i of the slats 1 of the panel 2 by means of the pivotable cleaning nozzle 10th There is a switching between different

Cleaning fluids appropriate and possible. Thus, for example, first, a solvent, respectively solvent mixture, applied to the diaphragm 2, which then for example. By means of di-water can be rinsed off. Advantageously, for this embodiment, the minimization of the moving components in the system, whereby a simple construction can be made possible is.

Fig. 12b is a partial schematic illustration of another exemplary coating chamber 3 according to the invention with a plurality of pivotal cleaning nozzles 10 ', and a fixed aperture 2. This embodiment is an extension of Fig. 12a, Here, the diaphragm 2 at the same time with different solvents or

Solvent mixtures are sprayed. Moreover, by the plurality of pivotal cleaning nozzle 10 'has a better

Surface uniformity of the cleaning effect can be achieved.

Fig. 12c is a partial schematic illustration of another exemplary coating chamber according to the invention 3. In this embodiment, the pivotal cleaning nozzle 10 "or a corresponding nozzle system via a drive 34 in the coating chamber 3 translationally movable, wherein the diaphragm 2 is motionless. The additional translational mobility of the cleaning nozzle 10 "is reachable an improved cleaning action, because the diaphragm 2 with uniform

Cleaning agent can be sprayed.

Fig. 12d is a partial schematic representation of another exemplary coating chamber according to the invention 3. In this embodiment, the cleaning nozzle 1 is 0 pivotable and the diaphragm 2 is rotatably supported on the support 6 such as in the figure II b disclosed.

In this variant is to be expected with a more thorough cleaning effect, as by the rotation of the panel 2 the angle of incidence

Cleaning nozzle 10 less has to be adjusted. The fixed

Embodiment of the nozzle 10 also the supply of the cleaning fluid simplified. Not shown is the variant, after which the panel 2 is fixed and the nozzle 10 or the nozzle system is rotatable.

FIG. 12e is a schematic Teildarsteüung another exemplary coating chamber according to the invention 3. In this Embodiment 3, the coating chamber several rotatable cleaning nozzles 10 ', in which only one is shown. In this embodiment, the diaphragm 2 is mounted rotatably in the figure 12d.

The functionality is an extension of the neck 12d described in Fig.. Here, the diaphragm 2 is carried rotatably on the bearing element 6, a nozzle system or the nozzle array of a plurality of nozzles 10 'provides a faster and more thorough cleaning effect than in Fig. 12d discloses.

FIG. 12f is a partial schematic illustration of another exemplary coating chamber according to the invention 3. In this embodiment 3, the coating chamber a pivotable nozzle 10 "or a pivoting nozzle system, which can be moved within the coating chamber 3 analogously to the embodiment of Figure 12c translaiorisch. Is also as shown in the figure, the diaphragm 2 12d rotatably mounted on the bearing elements. 6

The surface of the panel 2, in this embodiment by means of

Pivot and translation scanned, which can lead to a more thorough cleaning effect in a shorter cleaning time. This is for throughput optimization of the system of considerable importance. Reference is also made to the explanations of the figures 12a to 12e. LIST OF REFERENCE NUMBERS

1, 1 ', 1 ", 1" \ 1 "" Slat

I i inner side of the slats

la outside of the slats

, 2 ', 2 ", 2"', 2 "" Aperture

1 retaining ring

swivel

23 aperture

3 coating them £ t he mm

31 chamber wall

32 bearing the scraper

33 storing the cleaning nozzle

34 drive and positioning of the

cleaning nozzle

35 chamber opening

36 edge of the chamber opening

4 mounting of the grill

5 fixing the coating chamber

6 bearing elements

7 substrate holder

8 'implementation or vent valve

8 "implementation or vent valve

wiper ring

'wiper ring

"wiper ring

10 cleaning nozzle

10 * cleaning nozzle

10 "cleaning nozzle

Claims

claims
Coating chamber (3), particularly coater chamber, for coating a substrate, in particular a wafer, comprising a chamber opening (35) for loading and / or discharge of the coating chamber (3),
characterized,
that the coating chamber (3) having a diaphragm (2), especially an iris, for at least partially closing the chamber opening (35).
Coating chamber (3) according to one of the preceding
Claims, characterized in that the diaphragm (2),
in particular continuously and / or automated, such
is adjustable such that the effective size of the chamber opening (35) is variably adjustable.
Coating chamber (3) according to claim 2, characterized
in that the adjustment of the diaphragm (2) by a, in particular closed loop can be controlled, wherein preferably at least one in the control loop, in particular in the coating chamber (3) is arranged, the sensor is arranged, in particular, an ambient sensor for measuring temperatures, gas -, solvent concentrations, flow rates, and / or rotational velocities of flows in the
Coating chamber (3).
Coating chamber (3) according to one of the preceding
Claims, characterized in that the diaphragm (2) has at least one movable, in particular rotatable slat (1, V, 1 "", 1 "") for at least partially closing the chamber opening (35), wherein the coating chamber (3) in particular a plurality of at least partially overlapping blades (1, 1 "", 1 "") has.
Coating chamber (3) according to one of the preceding
Claims, comprising an, in particular automated,
Cleaning means for removing impurities on the panel (2), wherein the cleaning device is preferably an, in particular rotatable, scraper (9, 9 ', 9 "), in particular a stripper ring, and / or at least one, in particular swiveling and / or translationally within the coating chamber (3) movable, cleaning nozzle (10, 10 ', 10 ") comprises the removal of contaminants on the diaphragm (2).
6. Coating chamber (3) according to any one of the preceding
Claims, characterized in that the opening and / or Schüeßgeschwindigkeit the diaphragm (2) is between 1 mm / s to 450 mm / s, preferably between 1 mm / s and 300 mm / s, more
more preferably between 1 mm / s and 200 mm / s, most preferably between 1 mm / s and 1 00 mm / s, at allerbevorzugtesten between l mm / s and 50 mm / s.
7 coating chamber (3) according to one of the preceding
Claims, characterized in that the at least one slat (1, 1 ", 1" ") is curved outwardly and / or the diaphragm (2) opens to the outside.
8. The coating chamber (3) according to one of claims 1 to 6,
characterized in that the at least one slat (1, 1 "Γ", 1 "") is inwardly curved towards and / or the diaphragm (2) opens inward.
9. The coating chamber (3) according to one of claims 1 to 6,
characterized in that the at least one slat (1, 1 ', ",',") is flat and / or the diaphragm (2) opens in a plane.
10. The coating chamber (3) according to any one of the preceding
Claims, characterized in that the panel (2) fixed, in particular with a retaining ring (21) with an edge (36) of the chamber opening (35) is connected.
1. 1 (3) Coating chamber according to, one of claims 1 to 9,
characterized in that the diaphragm (2) is rotatably mounted, particularly with a retaining ring (21) on an edge (36) of the chamber opening (35) is mounted, wherein the diaphragm (2), in particular with more than 1 rpm, preferably with more than 0 rpm, more preferably more than 100 rpm, most preferably with more than 500 rpm, the
most preferably of more than 1000 rpm is rotatable.
12. The coating chamber (3) according to any one of the preceding
Claims, characterized in that the diaphragm (2) ( "" 2 ', 2 ", 2'", 2) comprises at least two, in particular stacked, single aperture.
13. coating chamber (3) according to one of the preceding
Claims, comprising a ventilation device for ventilation of the coating chamber (3) of the interior, wherein the
Ventilation device, in particular as at least one
is formed implementation (8 ', 8 ") and / or as at least one valve in the diaphragm (2), particularly in a holding ring (21) of the diaphragm (2), and / or in a chamber wall (3 1).
14 panel (2) for a coating chamber (3), in particular according to one of the preceding claims, comprising a,
in particular central, preferably circular, aperture (23) and at least one movable, in particular rotatable slat (1, 1 "", 1 "") for at least partial concealment of
Aperture (23). Processing system for processing substrates, in particular wafers, having a coating chamber (3), in particular according to one of claims 1 to 13, wherein the
Coating chamber (3) by a diaphragm (2), in particular according to claim 14, may be sealed off from other parts of the plant at least partially.
A method of coating at least one substrate, in particular wafer, comprising the steps of, in particular with the following sequence:
a) loading a coating chamber (3), in particular according to one of claims 1 to 13, comprising a substrate by a
Chamber opening (35) of the coating chamber (3);
b) At least partly closing the chamber opening (35) through an aperture (2), in particular according to claim 14;
c) applying a coating material to the substrate within the coating chamber (3);
d) At least partial releasing of the chamber opening (35) through the aperture (2);
e) removing the coated substrate from the
Coating chamber (3).
PCT/EP2015/063937 2015-06-22 2015-06-22 Coating chamber WO2016206708A1 (en)

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PCT/EP2015/063937 WO2016206708A1 (en) 2015-06-22 2015-06-22 Coating chamber

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US5677000A (en) * 1995-08-24 1997-10-14 Dainippon Screen Mfg. Co., Ltd. Substrate spin treating method and apparatus
US20050181127A1 (en) * 2004-02-18 2005-08-18 Tokyo Electron Limited Coating treatment apparatus and coating treatment method
US20120276753A1 (en) * 2011-04-26 2012-11-01 Tokyo Electron Limited Coating treatment apparatus, coating and developing treatment system, coating treatment method, and non-transitory recording medium having program recorded thereon for executing coating treatment method
US20140235070A1 (en) * 2013-02-19 2014-08-21 Tokyo Electron Limited Cover plate for wind mark control in spin coating process
US20150004311A1 (en) * 2013-06-27 2015-01-01 Tokyo Electron Limited Coating film forming apparatus, coating film forming method, and recording medium

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5395649A (en) * 1992-02-04 1995-03-07 Sony Corporation Spin coating apparatus for film formation over substrate
US5677000A (en) * 1995-08-24 1997-10-14 Dainippon Screen Mfg. Co., Ltd. Substrate spin treating method and apparatus
US20050181127A1 (en) * 2004-02-18 2005-08-18 Tokyo Electron Limited Coating treatment apparatus and coating treatment method
US20120276753A1 (en) * 2011-04-26 2012-11-01 Tokyo Electron Limited Coating treatment apparatus, coating and developing treatment system, coating treatment method, and non-transitory recording medium having program recorded thereon for executing coating treatment method
US20140235070A1 (en) * 2013-02-19 2014-08-21 Tokyo Electron Limited Cover plate for wind mark control in spin coating process
US20150004311A1 (en) * 2013-06-27 2015-01-01 Tokyo Electron Limited Coating film forming apparatus, coating film forming method, and recording medium

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