WO2016178529A1 - Electric shock-prevention element and electronic device provided with same - Google Patents

Electric shock-prevention element and electronic device provided with same Download PDF

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Publication number
WO2016178529A1
WO2016178529A1 PCT/KR2016/004747 KR2016004747W WO2016178529A1 WO 2016178529 A1 WO2016178529 A1 WO 2016178529A1 KR 2016004747 W KR2016004747 W KR 2016004747W WO 2016178529 A1 WO2016178529 A1 WO 2016178529A1
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WO
WIPO (PCT)
Prior art keywords
esd protection
protection layer
electrode
width
electric shock
Prior art date
Application number
PCT/KR2016/004747
Other languages
French (fr)
Korean (ko)
Inventor
박인길
노태형
조승훈
허성진
이동석
신민섭
Original Assignee
주식회사 이노칩테크놀로지
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from KR1020160041189A external-priority patent/KR101763874B1/en
Application filed by 주식회사 이노칩테크놀로지 filed Critical 주식회사 이노칩테크놀로지
Priority to US15/571,849 priority Critical patent/US20180139827A1/en
Priority to CN201680004441.6A priority patent/CN107112130B/en
Publication of WO2016178529A1 publication Critical patent/WO2016178529A1/en

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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01GCAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES OR LIGHT-SENSITIVE DEVICES, OF THE ELECTROLYTIC TYPE
    • H01G2/00Details of capacitors not covered by a single one of groups H01G4/00-H01G11/00
    • H01G2/14Protection against electric or thermal overload
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01GCAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES OR LIGHT-SENSITIVE DEVICES, OF THE ELECTROLYTIC TYPE
    • H01G4/00Fixed capacitors; Processes of their manufacture
    • H01G4/002Details
    • H01G4/018Dielectrics
    • H01G4/06Solid dielectrics
    • H01G4/08Inorganic dielectrics
    • H01G4/12Ceramic dielectrics
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01GCAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES OR LIGHT-SENSITIVE DEVICES, OF THE ELECTROLYTIC TYPE
    • H01G4/00Fixed capacitors; Processes of their manufacture
    • H01G4/002Details
    • H01G4/228Terminals
    • H01G4/232Terminals electrically connecting two or more layers of a stacked or rolled capacitor
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01GCAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES OR LIGHT-SENSITIVE DEVICES, OF THE ELECTROLYTIC TYPE
    • H01G4/00Fixed capacitors; Processes of their manufacture
    • H01G4/30Stacked capacitors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01GCAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES OR LIGHT-SENSITIVE DEVICES, OF THE ELECTROLYTIC TYPE
    • H01G4/00Fixed capacitors; Processes of their manufacture
    • H01G4/40Structural combinations of fixed capacitors with other electric elements, the structure mainly consisting of a capacitor, e.g. RC combinations
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K9/00Screening of apparatus or components against electric or magnetic fields

Definitions

  • the present invention relates to an electric shock prevention device, and more particularly, to an electric shock prevention device capable of preventing the electric shock voltage from being transmitted to a user through a chargeable electronic device such as a smart phone.
  • the use of mobile communication terminal has evolved from the center of voice call to the convenience service of smartphone based life through data communication service.
  • various frequency bands are used according to the multifunctionalization of smart phones and the like. That is, a plurality of functions using different frequency bands, such as wireless LAN, Bluetooth, and GPS, are adopted in one smartphone.
  • the internal circuit density in a limited space is increased. This inevitably causes noise interference between internal circuits.
  • a plurality of circuit protection elements are used. For example, a capacitor, a chip bead, a common mode filter, and the like, which remove noise in different frequency bands, are used.
  • a shock current is generated by charging using a non-genuine charger or a defective charger using an overcurrent protection circuit or a low quality device. Such a shock current is transmitted to the ground terminal of the smartphone, and again from the ground terminal to the metal case, the user in contact with the metal case may be electrocuted.
  • using a smartphone during charging using a non-genuine charger in a smartphone using a metal case may cause an electric shock accident.
  • the present invention provides an electric shock prevention device that can be provided in an electronic device such as a smartphone to prevent an electric shock of a user due to a shock current input from a charger.
  • the present invention provides an electric shock prevention device that is not dielectrically broken by an electrostatic discharge (ESD).
  • ESD electrostatic discharge
  • An electric shock prevention device includes a laminate in which a plurality of insulating sheets are stacked; A capacitor unit including a plurality of internal electrodes formed in the stack; An ESD protection unit formed inside the stack and including at least two discharge electrodes and at least one ESD protection layer provided between the discharge electrodes; And external electrodes provided on at least two side surfaces of the stack and connected to the capacitor unit and the ESD protection unit, wherein the ESD protection layer is formed at least one of a thickness and a width of at least one region different from the other regions. .
  • the inner electrode adjacent to the discharge electrode is connected to the same outer electrode.
  • the external electrode extends to at least one of the upper and lower portions of the stack to partially overlap the inner electrode.
  • the length of one direction of the internal electrode is longer than or equal to the length of the discharge electrode, and the width of the internal electrode in another direction perpendicular to the one direction is greater than the width of the ESD protection layer and the width of the discharge electrode.
  • the width of the ESD protection layer is larger than the width of the discharge electrode.
  • the ESD protection layer includes at least one of an ESD protection material and a void including at least one of a porous insulating material and a conductive material.
  • the ESD protection layer is formed in the vertical direction or in the horizontal direction between the discharge electrodes.
  • the ESD protection layer is formed on at least one insulating sheet.
  • the ESD protection layer is formed in a polyhedron shape.
  • the ESD protection layer is formed in a shape that is widest at an intermediate thickness in one direction and narrows toward upper and lower portions thereof.
  • the ESD protection layer is formed in a shape that is thickest in the central area and becomes thinner from both ends thereof.
  • the ESD protection layer is formed in a shape in which the thickness decreases in one direction and then increases again.
  • the ESD protection layer is formed to at least partially contact between the discharge electrodes.
  • the ESD protection material is connected to at least one of the discharge electrodes and voids are formed in the remaining areas.
  • the ESD protection material is formed in at least one region in the through hole so as not to contact the discharge electrode, and the remaining region is formed with a void.
  • At least two capacitor parts and the ESD protection part are provided in the stack in a horizontal direction.
  • the internal electrodes are stacked in a vertical direction to form one capacitor portion, and are arranged in a horizontal direction to form a plurality of capacitor portions.
  • One of the external electrodes is connected to the metal case of the electronic device and the other is connected to the ground terminal to cut off the electric shock voltage and bypass the ESD voltage.
  • An electric shock prevention device includes a laminate in which a plurality of insulating sheets are stacked; A capacitor unit including a plurality of internal electrodes formed in the stack; An ESD protection unit formed on at least a portion of the insulating sheet to protect the ESD voltage; And external electrodes provided on at least two side surfaces of the stack and connected to the capacitor unit and the ESD protection unit, wherein the ESD protection unit includes at least two discharge electrodes and at least one ESD protection provided between the discharge electrodes. And at least one of a thickness and a width of at least one region is different from the other region, and the length of one direction of the inner electrode is longer than or equal to the length of the discharge electrode and is equal to the one direction. The width in the other direction perpendicular to each other is greater than the width of the ESD protection layer and the width of the discharge electrode, and the width of the ESD protection layer is greater than the width of the discharge electrode.
  • A is the distance between the discharge electrode and the internal electrodes adjacent to A, the distance between the discharge electrodes is B, and the distance between the internal electrodes is A ⁇ C or A ⁇ B.
  • an electronic device includes an electric shock prevention device provided between a metal case and an internal circuit to block an electric shock voltage and bypass an ESD voltage, wherein the electric shock prevention device includes a plurality of insulating sheets stacked thereon. Laminate; A capacitor unit including a plurality of internal electrodes formed in the stack; An ESD protection unit formed on at least a portion of the insulating sheet to protect the ESD voltage; And external electrodes provided on at least two side surfaces of the stack and connected to the capacitor unit and the ESD protection unit, wherein the ESD protection unit includes at least two discharge electrodes and at least one ESD protection provided between the discharge electrodes.
  • At least one of a thickness and a width of at least one region is different from the other region, and the length of one direction of the inner electrode is longer than or equal to the length of the discharge electrode and is equal to the one direction.
  • the width in the other direction perpendicular to each other is greater than the width of the ESD protection layer and the width of the discharge electrode, and the width of the ESD protection layer is greater than the width of the discharge electrode.
  • An inner electrode adjacent to the discharge electrode is connected to the same outer electrode.
  • A is the distance between the discharge electrode and the internal electrodes adjacent to A, the distance between the discharge electrodes is B, and the distance between the internal electrodes is A ⁇ C or A ⁇ B.
  • the external electrode extends to at least one of the upper and lower portions of the stack to partially overlap the inner electrode.
  • An electric shock prevention device may be provided between a metal case of an electronic device and an internal circuit to block an electric shock voltage transmitted from a ground terminal of the internal circuit. Therefore, it is possible to prevent the electric shock voltage generated in the defective charger from being transmitted to the user through the metal case from the ground terminal inside the electronic device.
  • the electric shock prevention device may include an ESD protection unit, and the ESD protection unit may be made of a porous structure to allow current to flow through the micropores to bypass the incoming ESD to the ground terminal to maintain the insulation state of the device. Therefore, the electric shock voltage can be interrupted continuously and the ESD voltage applied from the outside can be bypassed to the ground terminal.
  • At least one of the thickness and the width of at least one region may be formed differently from the other region.
  • the external electrode may be formed to overlap at least a portion of the internal electrode and a predetermined region. Therefore, a predetermined parasitic capacitance may be generated between the external electrode and the internal electrode, and the capacitance of the electric shock prevention device may be adjusted by adjusting the overlapping area of the external electrode and the internal electrode.
  • the discharge electrode of the ESD protection unit and the inner electrode of the capacitor unit adjacent to each other may be connected to the same external electrode. Therefore, even if the insulating sheet is broken insulated, it is possible to prevent the ESD voltage from being applied.
  • FIG. 1 is a perspective view of an electric shock prevention device according to a first embodiment of the present invention.
  • FIG. 2 and 3 are cross-sectional views taken along line A-A 'and line B-B' of FIG.
  • FIG. 4 is an equivalent circuit diagram of an electric shock prevention device according to a first embodiment of the present invention.
  • 5 and 6 are cross-sectional and cross-sectional photograph of the ESD protection layer of the electric shock protection device according to the embodiments of the present invention.
  • FIG. 7 is a cross-sectional view of an electric shock prevention device according to a second embodiment of the present invention.
  • FIG. 8 is a cross-sectional view of an electric shock prevention device according to a third embodiment of the present invention.
  • FIGS 9 to 11 are schematic cross-sectional views of an ESD protection unit including an ESD protection layer according to other embodiments of the present invention.
  • FIGS 12 to 18 are schematic cross-sectional views of an ESD protection unit including an ESD protection layer according to still another embodiment of the present invention.
  • 19 to 22 are schematic views of an electric shock prevention device according to a fourth embodiment of the present invention and modified examples thereof.
  • 23 to 26 are cross-sectional views of the electric shock prevention device according to the fifth embodiment of the present invention.
  • 27 to 30 are cross-sectional views of the electric shock prevention device according to the sixth embodiment of the present invention.
  • FIG. 1 is a perspective view of an electric shock prevention device according to a first exemplary embodiment of the present invention
  • FIG. 2 is a cross-sectional view taken along line AA ′ of FIG. 1
  • FIG. 3 is a cross-sectional view taken along line B-B ′ of FIG. 1.
  • 4 is an equivalent circuit diagram.
  • an electric shock prevention device according to a first exemplary embodiment of the present invention is provided in a laminate 1000 in which a plurality of insulating sheets 100 (101 to 111) are stacked and in a laminate 1000. And at least one capacitor unit 2000 and 4000 having a plurality of internal electrodes 200 and 201 to 208, at least one discharge electrode 310 and 311 and 312, and an ESD protection layer 320.
  • the protection unit 3000 may be included.
  • the first and second capacitor parts 2000 and 4000 may be provided in the stack 1000, and the ESD protection part 3000 may be provided therebetween. That is, the first capacitor part 2000, the ESD protection part 3000, and the second capacitor part 4000 may be stacked in the stack 1000 to implement an electric shock prevention device.
  • the electronic device may further include external electrodes 5100, 5200; 5000 formed on two opposite sides of the stack 1000 and connected to the first and second capacitor parts 2000 and 4000 and the ESD protection part 3000. can do.
  • the electric shock prevention device may include at least one capacitor part and at least one ESD protection part. That is, a capacitor unit may be provided on either the lower side or the upper side of the ESD protection unit 3000, and at least one capacitor unit may be provided on the upper side and the lower side of the two or more ESD protection units 3000 spaced apart from each other.
  • Such an electric shock prevention element is provided between an internal circuit of an electronic device, for example, a PCB and a metal case to block an electric shock voltage and bypass the ESD voltage to the ground terminal. In addition, since the insulation is not destroyed by the ESD, the electric shock voltage can be continuously interrupted.
  • the laminate 1000 is formed by stacking a plurality of insulating sheets 101 to 111;
  • the laminate 1000 has a predetermined length in one direction (for example, the X direction) and another direction (for example, the Y direction) orthogonal thereto, and has a predetermined height in the vertical direction (for example, the Z direction). It may be provided in a substantially hexahedral shape having a. That is, when the forming direction of the external electrode 5000 is in the X direction, the direction orthogonal to this in the horizontal direction may be the Y direction, and the vertical direction may be the Z direction.
  • the length of the X direction is longer than the length of the Y direction and the length of the Z direction
  • the length of the Y direction may be equal to or different from the length of the Z direction.
  • the length of the Y direction may be shorter or longer than the length of the Z direction.
  • the ratio of the lengths in the X, Y, and Z directions may be 2 to 5: 1: 0.5 to 1. That is, the length of the X direction may be about 2 to 5 times longer than the length of the Y direction based on the length of the Y direction, and the length of the Z direction may be 0.5 to 1 times the length of the Y direction.
  • the lengths of the X, Y, and Z directions may be variously modified according to the internal structure of the electronic device to which the discharge sensing device is connected, the shape of the discharge sensing device, and the like.
  • at least one capacitor part 2000 and 4000 and at least one ESD protection part 3000 may be provided in the stack 1000.
  • the first capacitor part 2000, the ESD protection part 3000, and the second capacitor part 4000 may be provided in the stacking direction of the sheet 100, that is, the Z direction.
  • the plurality of insulating sheets 100 may have a predetermined dielectric constant, for example, a dielectric constant of 10 to 20000.
  • the insulating sheet 100 may be formed of a material including at least one of dielectric material powder such as MLCC, BaTiO 3 , BaCO 3 , TiO 2 , Nd 2 O 3 , Bi 2 O 3 , Zn0, and Al 2 O 3 . have.
  • the plurality of insulating sheets 100 may all be formed to have the same thickness, and at least one may be formed thicker or thinner than the others. That is, the insulating sheet of the ESD protection unit 3000 may be formed to have a different thickness from the insulating sheets of the first and second capacitors 2000 and 4000, and the ESD protection unit 3000 and the first and second capacitors ( The insulating sheet formed between 2000 and 4000 may be formed to a different thickness from the other sheets.
  • the thickness of the insulating sheet may be the ESD protection unit 3000.
  • the distance between the ESD protection unit 3000 and the first and second capacitor parts 2000 and 4000 is formed to be thinner or the same as the distance between the internal electrodes of the first and second capacitor parts 2000 and 4000, or It may be formed thinner or the same as the thickness of the ESD protection unit 3000.
  • the insulating sheets 102 to 104 and 108 to 110 of the first and second capacitors 2000 and 4000 may be formed to have the same thickness, and either one may be thinner or thicker than the other.
  • the insulating sheets 100 may be formed to have a thickness that is not destroyed when ESD is applied, for example, 5 ⁇ m to 300 ⁇ m.
  • the laminate 1000 may further include a lower cover layer (not shown) and an upper cover layer (not shown) provided on the lower and upper portions of the first and second capacitor parts 2000 and 4000, respectively.
  • the first insulating sheet 101 may function as the lower cover layer and the eleventh insulating sheet 111 may function as the upper cover layer.
  • the lower and upper cover layers may be provided by stacking a plurality of magnetic sheets, and may have the same thickness.
  • a nonmagnetic sheet for example, a glass sheet, may be further formed on the outermost portion of the lower and upper cover layers formed of the magnetic sheet, that is, the lower and upper surfaces.
  • the lower and upper cover layers may be thicker than the insulating sheets therein, that is, the second to tenth insulating sheets 102 to 110. Therefore, when the first and eleventh insulating sheets 101 and 111 function as lower and upper cover layers, they may be thicker than the second to tenth insulating sheets 102 to 110.
  • the first capacitor part 2000 may be provided under the ESD protection part 3000, and may include at least two internal electrodes and at least two insulating sheets provided therebetween.
  • the first capacitor part 2000 may include the first to fourth insulating sheets 101 to 104 and the first to fourth internal electrodes 201 to 4 formed on the first to fourth insulating sheets 101 to 104, respectively. 204).
  • the first to fourth internal electrodes 201 to 204 may be formed to have a thickness of, for example, 1 ⁇ m to 10 ⁇ m.
  • the first to fourth internal electrodes 201 to 204 are formed such that one side of the first to fourth internal electrodes 201 to 204 are opposite to each other in the X direction, and the other side thereof is spaced apart from each other.
  • the first and third internal electrodes 201 and 203 are formed on predetermined areas on the first and third insulating sheets 101 and 103, respectively, and one side is connected to the first external electrode 5100 and the other side is second. It is formed to be spaced apart from the external electrode 5200.
  • the second and fourth internal electrodes 202 and 204 are formed in predetermined areas on the second and fourth insulating sheets 102 and 104, respectively, and one side thereof is connected to the second external electrode 5200 and the other side thereof is the first external electrode. It is formed to be spaced apart from the electrode 5100.
  • the first to fourth internal electrodes 201 to 204 are alternately connected to any one of the external electrodes 5000, and are formed to overlap a predetermined region with the second to fourth insulating sheets 202 to 204 interposed therebetween.
  • the first to fourth internal electrodes 201 and 204 are respectively formed in an area of 10% to 85% of the area of each of the first to fourth insulating sheets 101 to 104. Further, the first to fourth internal electrodes 201 to 204 are formed to overlap with an area of 10% to 85% of the area of each of these electrodes.
  • the first to fourth internal electrodes 201 to 204 may be formed in various shapes such as a square, a rectangle, a predetermined pattern shape, a spiral shape having a predetermined width and spacing, and the like.
  • capacitances are formed between the first to fourth internal electrodes 201 to 204, respectively, and the capacitances are overlapped areas of the first to fourth internal electrodes 201 to 204, and insulating sheets. It may be adjusted according to the thickness of the 101 (101 to 104).
  • at least one or more inner electrodes may be further formed in addition to the first to fourth inner electrodes 201 to 204, and at least one insulating sheet on which at least one inner electrode is formed may be further formed. It may be.
  • two internal electrodes may be formed in the first capacitor part 2000. That is, the present embodiment has described that four internal electrodes of the first capacitor 2000 are formed as an example, but two or more internal electrodes may be formed.
  • the ESD protection unit 3000 may include at least two discharge electrodes 310 (311 and 312) formed in the vertical direction and at least one ESD protection layer 320 provided between the at least two discharge electrodes 310. Can be.
  • the ESD protection unit 3000 may include the first and second discharge electrodes 311 formed on the fifth and sixth insulating sheets 105 and 106 and the fifth and sixth insulating sheets 105 and 106, respectively. 312 and the ESD protection layer 320 formed on the sixth insulating sheet 106.
  • the ESD protection layer 320 may be formed so that at least a part thereof contacts the first and second discharge electrodes 311 and 312.
  • the first and second discharge electrodes 311 and 312 may be formed to have the same thickness as the internal electrodes 200 of the capacitor parts 2000 and 4000.
  • the first and second discharge electrodes 311 and 312 may be formed to a thickness of 1 ⁇ m to 10 ⁇ m.
  • the first and second discharge electrodes 311 and 312 may be formed thinner or thicker than the internal electrodes 200 of the capacitor parts 2000 and 4000.
  • the first and second discharge electrodes 311 and 312 may be formed to have a smaller length and width than the internal electrodes 200 of the capacitor parts 2000 and 4000.
  • the first and second discharge electrodes 311 and 312 may be formed to have a shorter length than the internal electrodes 200 in the X direction, and have a narrower width than the internal electrodes 200 in the Y direction.
  • the first and second discharge electrodes 311 and 312 are formed to have a length of 50% to 90% of the length of the internal electrode 200 in the X direction, and 10% of the width of the internal electrode 200 in the Y direction. To 60% in width.
  • the first discharge electrode 311 is connected to the first external electrode 5100 to be formed on the fifth insulating sheet 105, and the end portion thereof is connected to the ESD protection layer 320.
  • the second discharge electrode 312 is connected to the second external electrode 5200 to be formed on the sixth insulating sheet 106, and the end portion thereof is connected to the ESD protection layer 320.
  • an area in contact with the ESD protection layer 320 of the first and second discharge electrodes 311 and 312 may have the same size or smaller size than the ESD protection layer 320. That is, the first and second discharge electrodes 311 and 312 may be formed to at least partially overlap the ESD protection layer 320 in the X and Y directions. For example, the first and second discharge electrodes 311 and 312 in the X direction may be completely overlapped without leaving the ESD protection layer 320.
  • the edges of the first and second discharge electrodes 311 and 312 in the X direction may form a vertical component with the edges of the ESD protection layer 320.
  • the first and second discharge electrodes 311 and 312 may be formed to overlap a portion of the ESD protection layer 320 in the X direction.
  • the first and second discharge electrodes 311 and 312 may be formed to overlap 10% to 100% of the horizontal area of the ESD protection layer 320 in the X direction.
  • the first and second discharge electrodes 311 and 312 are not formed beyond the ESD protection layer 320.
  • the first and second discharge electrodes 311 and 312 may be formed smaller than the ESD protection layer 320 in the Y direction. That is, as shown in FIG.
  • the first and second discharge electrodes 311 and 312 may be formed to be smaller than the width of the ESD protection layer 320 in the central portion of the ESD protection layer 320 in the Y direction.
  • the first and second discharge electrodes 311 and 312 may be formed to have a width of 10% to 95% of the width of the ESD protection part 320 in the Y direction.
  • the first and second discharge electrodes 311 and 312 may be formed to have a larger area than one in contact with the ESD protection layer 320.
  • the ESD protection layer 320 may be formed in a predetermined region, for example, a central portion of the sixth insulating sheet 106 and connected to the first and second discharge electrodes 311 and 312.
  • the ESD protection layer 320 may be formed to at least partially overlap the first and second discharge electrodes 311 and 312.
  • the ESD protection layer 320 may be formed to overlap 10% to 100% in the X direction with the first and second discharge electrodes 311 and 312, and may be formed to overlap 10% to 95% in the Y direction.
  • the ESD protection layer 320 may have an overlap ratio in the X direction with the first and second discharge electrodes 311 and 312 in the X direction or greater than the overlap ratio in the Y direction.
  • the width of the ESD protection layer 320 in the Y direction may be smaller than the width of the internal electrode 200.
  • the width of the ESD protection layer 320 in the Y direction may be 40% to 90% wider than the width of the internal electrode 200. Accordingly, the ESD protection layer 320 may be formed smaller than the width of the internal electrode 200 in the Y direction and larger than the width of the discharge electrode 310.
  • the ESD protection layer 320 forms a through hole having a predetermined size in a predetermined area, for example, a central portion of the sixth insulating sheet 106, and applies or fills an ESD protection material to at least a portion of the through hole by using a thick film printing process. Can be formed.
  • the ESD protection layer 330 may be formed, for example, with a diameter of 100 ⁇ m to 500 ⁇ m and a thickness of 10 ⁇ m to 50 ⁇ m.
  • the ESD protection layer 320 may be formed using a conductive material and an insulating material.
  • the ESD protection layer 320 may be formed by printing a mixed material of the conductive ceramic and the insulating ceramic on the sixth insulating sheet 106.
  • the ESD protection layer 320 may be formed by applying or filling at least a portion of an ESD protection material.
  • the ESD protection layer 320 may have a polygonal cross section, and may be formed by applying an ESD protection material to a side surface of the through hole formed in the sixth insulating sheet 106, and the ESD protection material only in at least some regions. It may be formed by coating or filling.
  • the ESD protection layer 320 may have a width in the X direction and a width in the Y direction larger than the thickness in the Z direction.
  • the ESD protection layer 320 may be formed in a substantially elliptical shape whose width in the X direction and the Y direction is larger than the thickness in the Z direction.
  • the ESD protection layer 320 may have a thickness different from at least one region. For example, it may be formed in a shape in which the vertical gap of the central portion in the X direction and the Y direction is greatest, and the vertical gap decreases toward the edge thereof.
  • the ratio of the region having the largest vertical gap and the region having the smallest vertical gap may be 5: 1 to 2: 1.
  • the ESD protection layer 320 may be formed on at least one insulating sheet 100. That is, the ESD protection layers 320 are formed on at least one of the insulating sheets 100 stacked in the vertical direction, for example, and the discharge electrodes are formed on the insulating sheet 100 so as to be spaced apart from each other. May be connected to the layer 320. The structure, material, and the like of the ESD protection layer 320 will be described later.
  • the second capacitor part 4000 may be provided above the ESD protection part 3000 and may include at least two or more internal electrodes and at least two or more insulating sheets provided therebetween.
  • the second capacitor part 2000 may include fifth to eighth internal electrodes formed on the seventh to tenth insulating sheets 107 to 110 and the seventh to tenth insulating sheets 107 to 110, respectively. 205 to 208).
  • the fifth to eighth internal electrodes 205 to 208 are formed such that one side of the fifth to eighth internal electrodes 205 to 208 is opposite to each other in the X direction, and the other side thereof is spaced apart from each other.
  • the fifth and seventh internal electrodes 205 and 207 are formed on the seventh and ninth insulating sheets 107 and 109 in predetermined areas, one side of which is connected to the first external electrode 5100 and the other side of which is the second external. It is formed to be spaced apart from the electrode 5200.
  • the sixth and eighth internal electrodes 206 and 208 are formed in predetermined areas on the eighth and tenth insulating sheets 108 and 110, respectively, and one side of the sixth and eighth internal electrodes 206 and 208 is connected to the second external electrode 5200 and the other side of the first external electrode. It is formed to be spaced apart from the electrode 5100.
  • the fifth to eighth internal electrodes 205 to 108 are alternately connected to any one of the external electrodes 5000, and are formed to overlap a predetermined area with the eighth to tenth insulating sheets 208 to 110 interposed therebetween.
  • the fifth to eighth internal electrodes 205 to 208 are respectively formed with an area of 10% to 85% of the area of each of the seventh to tenth insulating sheets 107 to 110.
  • the fifth to eighth internal electrodes 205 to 208 are formed to overlap with an area of 10% to 85% of the area of each of these electrodes.
  • the fifth to eighth internal electrodes 205 to 208 may be formed to have a thickness of, for example, 1 ⁇ m to 10 ⁇ m.
  • the fifth to eighth internal electrodes 205 to 208 may be formed in various shapes such as square, rectangular, predetermined pattern shape, spiral shape having a predetermined width and spacing.
  • capacitances are formed between the fifth to eighth internal electrodes 205 to 208, respectively, and the capacitances are overlapped areas of the fifth to eighth internal electrodes 205 to 208, and insulating sheets. 108 to 110, etc., to adjust the thickness.
  • at least one or more internal electrodes are further formed in addition to the third and fourth internal electrodes 203 and 204, and at least one insulating sheet on which at least one internal electrode is formed is further formed. It may be.
  • two internal electrodes may be formed in the second capacitor part 4000. That is, the present embodiment has described that four internal electrodes of the second capacitor 4000 are formed as an example. However, two or more internal electrodes may be formed.
  • the internal electrodes 201 to 204 of the first capacitor part 2000 and the internal electrodes 205 to 208 of the second capacitor part 4000 may be formed in the same shape and the same area, and the overlapping area may also be May be the same.
  • the insulating sheets 101 to 104 of the first capacitor part 2000 and the insulating sheets 107 to 110 of the second capacitor part 4000 may have the same thickness. In this case, when the first insulating sheet 101 functions as a lower cover layer, the first insulating sheet 101 may be thicker than the other insulating sheets. Therefore, the first and second capacitor parts 2000 and 4000 may have the same capacitance. However, the first and second capacitor parts 2000 and 4000 may have different capacitances.
  • the internal electrodes 201 to 208 of the capacitor parts 2000 and 4000 may be formed longer and wider than the discharge electrode 310 of the ESD protection part 3000. That is, as shown in FIG. 2, the internal electrode 200 is formed longer than the discharge electrode 310 in the X direction, and is wider than the discharge electrode 310 in the Y direction orthogonal to this as shown in FIG. 3. .
  • the width of the ESD protection layer 320 in the Y direction may be greater than the width of the discharge electrode 310 and smaller than the width of the internal electrode 200. Therefore, the internal electrode 200 may be formed to have a larger area than the discharge electrode 310.
  • the external electrodes 5100, 5200; 5000 are provided on two opposite sides of the stack 1000 to be connected to the first and second capacitor parts 2000 and 4000 and the internal electrodes of the ESD protection part 3000.
  • the external electrode 5000 may be formed of at least one layer.
  • the external electrode 5000 may be formed of a metal layer such as Ag, and at least one plating layer may be formed on the metal layer.
  • the external electrode 5000 may be formed by stacking a copper layer, a Ni plating layer, and a Sn or Sn / Ag plating layer.
  • the external electrode 5000 may be formed by mixing, for example, a multicomponent glass frit having 0.5% to 20% of Bi 2 O 3 or SiO 2 as a main component with a metal powder.
  • the mixture of the glass frit and the metal powder may be prepared in a paste form and applied to two surfaces of the laminate 1000.
  • the adhesion between the external electrode 5000 and the stack 1000 may be improved, and the contact reaction between the internal electrode 200 and the external electrode 5000 may be improved.
  • at least one plating layer may be formed on the upper portion thereof to form the external electrode 5000. That is, the metal layer including the glass and at least one plating layer formed thereon may form the external electrode 5000.
  • the external electrode 5000 may form a Ni plated layer and a Sn plated layer sequentially through electrolytic or electroless plating after forming a layer including glass frit and Ag and Cu.
  • the Sn plating layer may be formed to the same or thicker thickness than the Ni plating layer.
  • the external electrode 5000 may be formed to have a thickness of 2 ⁇ m to 100 ⁇ m
  • the Ni plating layer may be formed to have a thickness of 1 ⁇ m to 10 ⁇ m
  • the Sn or Sn / Ag plating layer may have a thickness of 2 ⁇ m to 10 ⁇ m. Can be formed.
  • the oxide powder may be distributed on the surface of the laminate before the external electrode 5000 is formed.
  • the oxide powder may be distributed before forming a part of the external electrode 5000 by the printing process, or may be formed before performing the plating process. That is, the oxide powder may be distributed on the surface of the laminate before the plating process when the external electrode 5000 is formed by the plating process.
  • the resistance of the surface of the laminate can be made uniform, whereby the plating process can be performed uniformly. That is, the surface of the laminate may be different from the resistance of other regions of at least one region.
  • the oxide powder can be dispersed on the surface of the laminate.
  • the oxide powder may be distributed on the surface of the laminate as a whole, and may be formed in a film form, or may be partially distributed on the surface of the laminate, and may be formed in a film form in at least one region and partially distributed in at least one region. It may be.
  • the oxide powder may be distributed over the entire surface of the laminate, and the oxide powder may be connected to form an oxide film having a predetermined thickness.
  • the oxide powder may be distributed in the form of islands on the surface of the laminate. That is, the oxide powders may be spaced apart from each other and distributed in an island form on the surface of the laminate, whereby at least a portion of the laminate surface may be exposed.
  • the oxide powder may be formed in a film form in at least one region and distributed in an island form in at least a portion thereof. That is, at least two oxide powders may be connected to each other to form a film in at least one region and may be formed in an island form at least in part. Thus, at least a portion of the laminate surface may be exposed by the oxide powder.
  • the total area of the oxide powder distributed in at least a portion in island form may be, for example, 10% to 80% of the total area of the laminate surface.
  • at least one or more metal oxides may be used as the oxide powder for making the surface resistance of the laminate uniform, for example, Bi 2 O 3 , BO 2 , B 2 O 3 , ZnO, Co 3 O 4 , SiO
  • At least one or more of materials containing 2 , Al 2 O 3 , MnO may be used.
  • the distance between the ESD protection unit 3000 and the capacitors 2000 and 4000 may be shorter or equal to the distance between two internal electrodes in the capacitors 2000 and 4000. That is, the thickness of each of the fifth and seventh insulating sheets 105 and 107 positioned between the ESD protection unit 3000 and the capacitor units 2000 and 4000 is between the internal electrodes 200 in the capacitor units 2000 and 4000. It may be thinner than or equal to the thickness of the insulating sheets 102 to 104 and 107 to 110 located at. In addition, the distance between the ESD protection unit 3000 and the capacitor units 2000 and 4000 may be shorter or equal to the distance between the two discharge electrodes 310 of the ESD protection unit 3000.
  • each of the fifth and seventh insulating sheets 105 and 107 disposed between the ESD protection unit 3000 and the capacitor units 2000 and 4000 may be the sixth insulating sheet 106 on which the ESD protection layer 320 is formed. Thinner than or equal to the thickness of As a result, each of the thicknesses of the fifth and seventh insulating sheets 105 and 107 positioned between the ESD protection unit 3000 and the capacitor units 2000 and 4000 is between the internal electrodes 200 in the capacitor units 2000 and 4000. Thinner than or equal to the thickness of the insulating sheets 102 to 104 and 107 to 110, or thinner than or equal to the distance B between the two discharge electrodes 310 of the ESD protection unit 3000. Can be formed.
  • the distance between the ESD protection unit 3000 and the capacitor units 2000 and 4000 is A1 and A2, and the distance between the two internal electrodes in the capacitor units 2000 and 4000 is C1 and C2, and the ESD protection unit 3000 is used.
  • A1 and A2 and C1 and C2 may not be the same.
  • the ESD protection unit 3000 including one ESD protection layer 320 is provided in the stack 1000
  • two or more ESD protection layers 320 are provided.
  • a plurality of ESD protection units 3000 may be provided.
  • at least two ESD protection layers 320 are formed in a vertical direction, and a discharge electrode is further formed between the ESD protection layers 320 so that an electric shock prevention device includes at least one capacitor and two or more ESD protection parts. Can be.
  • at least two internal electrodes 200 of the capacitor parts 2000 and 4000, a discharge electrode 310 of the ESD protection part 3000, and an ESD protection layer 320 may be formed in the Y direction. Accordingly, a plurality of electric shock prevention devices may be provided in one laminate 1000 in parallel.
  • the electric shock prevention device has a length L of 0.3 mm to 1.1 mm in one direction, that is, an X direction, and a width W of 0.15 mm to 0.55 mm in the other direction, ie, the Y direction, which is perpendicular thereto. That is, the thickness in the Z direction may be 0.15 mm to 0.55 mm.
  • the electric shock prevention device may have a length, a width, and a thickness of 0.9 mm to 1.1 mm, 0.45 mm to 0.55 mm, and 0.45 mm to 0.55 mm, respectively, 0.55 mm to 0.65 mm, 0.25 mm to 0.35 mm, and 0.25 mm, respectively.
  • the electric shock prevention device may have a length: width: thickness ratio of 2 to 3: 1 to 2: 1 to 2.
  • the length ⁇ width ⁇ thickness may be 1.0 mm ⁇ 0.5 mm ⁇ 0.5 mm, 0.6 mm ⁇ 0.3 mm ⁇ 0.3 mm, and 0.4 mm ⁇ 0.2 mm ⁇ 0.2 mm.
  • the electric shock prevention device may have a length: width: thickness ratio of 2: 1: 1. The dimensions of these devices follow typical device specifications for SMT.
  • the ESD protection layer 320 may be formed to have a width of 50 ⁇ m to 500 ⁇ m and a thickness of 5 ⁇ m to 50 ⁇ m, depending on the size of the device.
  • the ESD protection layer 320 is 50 ⁇ m to 450. It may be formed to a width of 5 ⁇ m and a thickness of 5 ⁇ m to 50 ⁇ m.
  • FIGS. 5 and 6 are cross-sectional schematic and cross-sectional photograph of the ESD protection layer 320 of the electric shock prevention device of an embodiment of the present invention. That is, the ESD protection layer 300 may be formed at least one region smaller or larger than another region, and FIGS. 5 and 6 are cross-sectional schematics and cross-sectional photographs of an enlarged portion of the ESD protection layer 320. .
  • the ESD protection layer 320 may be formed by mixing a conductive material and an insulating material.
  • the ESD protection layer 320 may be formed by mixing a conductive ceramic and an insulating ceramic.
  • the ESD protection layer 320 may be formed by mixing the conductive ceramic and the insulating ceramic in a mixing ratio of 10:90 to 90:10.
  • the mixing ratio of the conductive ceramic and the insulating ceramic can be adjusted to obtain a predetermined discharge start voltage.
  • a plurality of pores (not shown) may be formed in the ESD protection layer 320. The formation of pores makes it easier to bypass the ESD voltage.
  • the ESD protection layer 320 may be formed by stacking a conductive layer and an insulating layer in a predetermined stacked structure. That is, the ESD protection layer 320 may be formed by dividing the conductive layer and the insulating layer at least once and separating the conductive layer and the insulating layer. For example, the ESD protection layer 320 may be formed in a two-layer structure by laminating a conductive layer and an insulating layer, and may be formed in a three-layer structure by laminating the conductive layer, the insulating layer, and the conductive layer. In addition, the conductive layer 321 and the insulating layer 322 may be repeatedly stacked a plurality of times to form a stacked structure of three or more layers.
  • an ESD protection layer 320 having a three-layer structure in which the first conductive layer 321a, the insulating layer 322, and the second conductive layer 321b are stacked is provided.
  • FIG. 6B is a photograph in which an ESD protection layer having a three-layer structure is formed between internal electrodes between insulating sheets.
  • the conductive layer and the insulating layer are laminated a plurality of times, the uppermost layer and the lowest layer may be a conductive layer.
  • a plurality of pores may be formed in at least a portion of the conductive layer 321 and the insulating layer 322.
  • the insulating layer 322 formed between the conductive layers 321 has a porous structure, a plurality of pores may be formed in the insulating layer 322.
  • a gap may be further formed in the ESD protection layer 320 in a predetermined region.
  • a void may be formed between the layer in which the conductive material and the insulating material are mixed, and a gap may be formed between the conductive layer and the insulating layer. That is, the first mixed layer, the void, and the second mixed layer of the conductive material and the insulating material may be laminated, and the conductive layer, the void, and the insulating layer may be laminated.
  • the ESD protection layer 320 may include a first conductive layer 321a, a first insulating layer 322a, a void 323, and a second insulating layer 322b as shown in FIG. 5C.
  • the second conductive layer 321b may be stacked. That is, the insulating layer 322 may be formed between the conductive layers 321, and the gap 323 may be formed between the insulating layers 322.
  • 6C is a cross-sectional photograph of the ESD protection layer 320 having such a laminated structure.
  • the conductive layer, the insulating layer, and the pores may be repeatedly stacked to form the ESD protection layer 320.
  • the conductive layer 321, the insulating layer 322, and the gap 323 are stacked, all of them may have the same thickness, and at least one thickness may be thinner than the others.
  • the void 323 may be thinner than the conductive layer 321 and the insulating layer 322.
  • the conductive layer 321 may be formed to have the same thickness as the insulating layer 322, or may be formed thicker or thinner than the insulating layer 322.
  • the void 323 may be formed by filling the polymer material and then performing a sintering process to remove the polymer material.
  • the first polymer material including conductive ceramics, the second polymer material including insulating ceramics, and the third polymer material not containing conductive ceramics or insulating ceramics are filled in the via hole, and then a firing process is performed. By removing the polymer material, a conductive layer, an insulating layer and a void can be formed.
  • the gap 323 may be formed without being divided into layers.
  • the insulating layer 322 may be formed between the conductive layers 321a and 321b, and a plurality of pores may be connected in the insulating layer 322 in a vertical direction or a horizontal direction to form a gap 323. That is, the gap 323 may be formed with a plurality of pores in the insulating layer 322.
  • the void 323 may be formed in the conductive layer 321 by a plurality of pores.
  • the ESD protection layer 320 may be formed by applying an ESD protection material including a porous insulating material and a conductive material to a portion of the hole, and the remaining area is not coated with the ESD protection material, thereby forming voids.
  • an ESD protection material is not formed in the through hole, and a gap may be formed between the two discharge electrodes 311 and 312.
  • the conductive layer 321 used for the ESD protection layer 320 may flow a current with a predetermined resistance.
  • the conductive layer 321 may be a resistor having several kilowatts to several hundred kilowatts.
  • the conductive layer 321 lowers the energy level when an overvoltage flows, such as ESD, to prevent structural damage of the electric shock prevention device due to the overvoltage. That is, the conductive layer 321 serves as a heat sink that converts electrical energy into thermal energy.
  • the conductive layer 321 may be formed using a conductive ceramic, and the conductive ceramic may include a mixture including at least one of La, Ni, Co, Cu, Zn, Ru, Ag, Pd, Pt, W, Fe, and Bi. It is available.
  • the conductive layer 321 can be formed to a thickness of 1 ⁇ m to 50 ⁇ m. That is, when the conductive layer 321 is formed of a plurality of layers, the sum of the total thicknesses may be 1 ⁇ m to 50 ⁇ m.
  • the insulating layer 322 used for the ESD protection layer 320 may be made of a discharge inducing material, and may function as an electrical barrier having a porous structure.
  • the insulating layer 322 may be formed of an insulating ceramic, and the insulating ceramic may be a ferroelectric material having a dielectric constant of about 50 to 500,000.
  • the insulating ceramic can be formed using a mixture containing at least one of dielectric material powder such as MLCC, BaTiO 3 , BaCO 3 , TiO 2 , Nd, Bi, Zn, Al 2 O 3 .
  • the insulating layer 322 may have a porous structure in which a plurality of pores having a size of about 1 nm to about 5 ⁇ m are formed to have a porosity of about 30% to about 80%.
  • the shortest distance between the pores may be about 1nm to 5 ⁇ m. That is, the insulating layer 322 is formed of an electrically insulating material that does not flow current, but since pores are formed, current may flow through the pores.
  • the discharge start voltage may decrease.
  • the discharge start voltage may increase.
  • the pore size and the porosity of the insulating layer 322 may be adjusted to adjust the discharge start voltage while maintaining the shape of the ESD protection layer 320.
  • the insulating material may use an insulating ceramic having fine porosity and porosity.
  • the insulating layer 322 may have a resistance lower than that of the insulating sheet 100 by micropores, and partial discharge may be performed through the micropores.
  • the micropore is formed in the insulating layer 322 and partial discharge is performed through the micropore.
  • the insulating layer 322 may be formed to a thickness of 1 ⁇ m 50 ⁇ m. That is, when the insulating layer 322 is formed of a plurality of layers, the sum of the total thicknesses may be formed to be 1 ⁇ m to 50 ⁇ m.
  • the electric shock prevention device may be provided between the metal case 10 and the internal circuit 20 of the electronic device. That is, one of the external electrodes 5000 may be connected to the metal case 10 of the electronic device, and the other may be connected to the ground terminal. In this case, the ground terminal may be provided in the internal circuit 20.
  • the first external electrode 5100 may be connected to the metal case 10 of the electronic device, and the second external electrode 5200 may be connected to the ground terminal. Therefore, the electric shock voltage transmitted from the ground terminal of the internal circuit 20 to the metal case can be cut off, and the ESD voltage applied from the outside to the internal circuit can be bypassed to the ground terminal.
  • the electric shock prevention device may have a discharge start voltage higher than the rated voltage and lower than the ESD voltage.
  • the electric shock prevention device may have a rated voltage of 100V to 240V, the electric shock voltage may be equal to or higher than the operating voltage of the circuit, and the ESD voltage generated by external static electricity or the like may be higher than the electric shock voltage.
  • communication signals may be transmitted between the external circuit and the internal circuit 20 by the capacitor units 2000 and 4000.
  • a communication signal from the outside that is, an RF signal may be transmitted to the internal circuit 20 by the capacitor units 2000 and 4000, and the communication signal from the internal circuit 20 is transmitted to the capacitor units 2000 and 4000. Can be delivered to the outside. Therefore, even when the metal case 10 is used as an antenna without a separate antenna, communication signals with the outside may be exchanged using the capacitor units 2000 and 4000.
  • the electric shock prevention device according to the present invention may block an electric shock voltage applied from the ground terminal of the internal circuit, bypass the ESD voltage applied from the outside to the ground terminal, and transmit a communication signal between the external device and the electronic device. .
  • the electric shock prevention device when a plurality of insulating sheets having high breakdown voltage characteristics are stacked to form a capacitor, when an electric shock voltage of, for example, 310V is introduced into the metal case from an internal circuit caused by a defective charger. Insulation resistance can be maintained to prevent leakage current, and ESD protection can bypass the ESD voltage when the ESD voltage flows from the metal casing to the internal circuitry to maintain a high insulation resistance without damaging the device. That is, the ESD protection unit 3000 is formed of a conductive layer 321 for converting electrical energy into thermal energy by lowering an energy level and an ESD protection layer made of a porous structure and an insulating layer 322 for flowing current through micropores.
  • the ESD protection layer including the conductive layer and the insulating layer is formed between the capacitor parts so that the capacitor part is not destroyed by passing the ESD voltage through the ESD protection layer.
  • FIG. 7 is a cross-sectional view of an electric shock prevention device according to a second embodiment of the present invention.
  • the electric shock prevention device may include a laminate 1000 in which a plurality of insulating sheets 100 (101 to 111) are stacked, and are provided in the laminate 1000. At least one capacitor part 2000 and 4000 including internal electrodes 200 and 201 to 208, an ESD protection part 3000 including at least one discharge electrode 310 and an ESD protection layer 320;
  • the stack 1000 may include external electrodes 5100, 5200, and 5000 formed on two opposite sides of the stack 1000 and connected to the first and second capacitor parts 2000 and 4000 and the ESD protection part 3000. .
  • the distances A1 and A2 between the ESD protection unit 3000 and the capacitors 2000 and 4000 may be shorter or equal to the distances C1 and C2 between the two internal electrodes in the capacitors 2000 and 4000. . That is, the thickness of each of the fifth and seventh insulating sheets 105 and 107 positioned between the ESD protection unit 3000 and the capacitor units 2000 and 4000 is between the internal electrodes 200 in the capacitor units 2000 and 4000. It may be thinner than or equal to the thickness of the insulating sheets 102 to 104 and 107 to 110 located at.
  • the distances A1 and A2 between the ESD protection unit 3000 and the capacitors 2000 and 4000 may be shorter or equal to the distance B between the two discharge electrodes 310 of the ESD protection unit 3000.
  • the thickness of each of the fifth and seventh insulating sheets 105 and 107 disposed between the ESD protection unit 3000 and the capacitor units 2000 and 4000 may be the sixth insulating sheet 106 on which the ESD protection layer 320 is formed. Thinner than or equal to the thickness of As a result, each of the thicknesses of the fifth and seventh insulating sheets 105 and 107 positioned between the ESD protection unit 3000 and the capacitor units 2000 and 4000 is between the internal electrodes 200 in the capacitor units 2000 and 4000.
  • A1 and A2 and C1 and C2 may not be the same.
  • the thicknesses D1 and D2 of the lowermost and uppermost insulating sheets may be 10 ⁇ m or more and 50% or less of the thickness of the laminate 1000, respectively.
  • two internal electrodes adjacent to the discharge electrodes 311 and 312, that is, the fourth and fifth internal electrodes 204 and 205 may be connected to the discharge electrodes 311 and 312. It may be connected to the same external electrode 5000. That is, the first, third, fifth, and seventh internal electrodes 201, 203, 205, and 207 are connected to the second external electrode 5200, and the second, fourth, sixth, and eighth internal electrodes ( 202, 204, 206, and 208 are connected to the first external electrode 5100.
  • the first discharge electrode 311 is connected to the first external electrode 5100
  • the second discharge electrode 312 is connected to the second external electrode 5200.
  • first discharge electrode 311 and the fourth internal electrode 204 adjacent thereto are connected to the first external electrode 5100, and the second discharge electrode 312 and the fifth internal electrode 205 adjacent thereto are formed of the first discharge electrode 311 and the fourth internal electrode 205 adjacent thereto. 2 is connected to the external electrode 5200.
  • the ESD voltage is not applied to the electronic device even when the insulating sheet 100 is deteriorated, that is, the dielectric breakdown. Do not. That is, when the insulating electrode 100 is insulated and broken when the inner electrode 200 adjacent to the discharge electrode 310 and the inner electrode 200 are different from each other, the ESD voltage applied through the outer electrode 5000 is discharge electrode ( It flows to the other external electrode 5000 through the internal electrode 200 adjacent to 310. For example, as shown in FIG. 2, when the first discharge electrode 311 is connected to the first external electrode 5100 and the fourth internal electrode 204 adjacent thereto is connected to the second external electrode 5200, insulation is performed.
  • the sheet 100 When the sheet 100 is dielectrically broken, a conductive path is formed between the first discharge electrode 311 and the fourth internal electrode 204, and an ESD voltage applied through the first external electrode 5100 is applied to the first discharge electrode 311. ), It may flow into the dielectric breakdown fifth insulating sheet 105 and the second internal electrode 202, and thus may be applied to the internal circuit through the second external electrode 5200.
  • the thickness of the insulating sheet 100 can be formed to be thick, but in this case, there is a problem that the size of the electric shock prevention device increases.
  • FIG. 8 is a cross-sectional view of an electric shock prevention device according to a third embodiment of the present invention.
  • the electric shock prevention device may include a laminate 1000 in which a plurality of insulating sheets 100 (101 to 111) are stacked, and are provided in the laminate 1000, At least one capacitor part 2000 and 4000 including internal electrodes 200 and 201 to 208, an ESD protection part 3000 including at least one discharge electrode 310 and an ESD protection layer 320;
  • the stack 1000 may include external electrodes 5100, 5200, and 5000 formed on two opposite sides of the stack 1000 and connected to the first and second capacitor parts 2000 and 4000 and the ESD protection part 3000.
  • the external electrode 5000 may be formed to overlap the internal electrodes 200 by a predetermined region. That is, the third embodiment of the present invention differs from the first and second embodiments of the present invention in which the external electrode 5000 partially overlaps the internal electrode 200.
  • the external electrode 5000 may extend to the upper and lower surfaces as well as the side of the stack 1000.
  • the external electrode 5000 may be formed to overlap a predetermined region with the internal electrode 200 connected to the different external electrodes 5000.
  • a portion extending below and above the stack 1000 of the first external electrode 5100 may overlap a predetermined region of the internal electrodes 200.
  • portions formed to extend below and above the stack 1000 of the second external electrode 5200 may overlap the predetermined regions of the internal electrodes 200.
  • portions extending to the upper and lower portions of the stack 1000 of the external electrode 5000 may overlap the first and eighth internal electrodes 201 and 208.
  • At least one of the external electrodes 5000 may extend to the top and bottom surfaces of the stack 1000, and at least one of the extended portions may partially overlap the internal electrodes 200.
  • an area of the internal electrode 200 overlapping the external electrode 5000 may be 1% to 10% of the total area of the internal electrode 200.
  • the external electrode 5000 may increase the area formed on at least one of the upper and lower surfaces of the laminate 1000 by a plurality of processes.
  • the internal electrodes 200 of the capacitor parts 2000 and 4000 may be formed longer in the X-axis direction than in the first embodiment.
  • the end of the inner electrode 200 and the outer electrode 5000 adjacent thereto may be formed to maintain a spacing of 5% to 10% of the length of the X-axis direction. That is, the internal electrode 200 may be formed to have a length of 90% to 95% of the length of the insulating sheet 100 in the X axis direction.
  • a predetermined parasitic capacitance may be generated between the external electrode 5000 and the internal electrode 200.
  • capacitance may be formed between the first and eighth internal electrodes 201 and 208 and the extensions of the first and second external electrodes 5100 and 5200. Therefore, the capacitance of the electric shock prevention device may be adjusted by adjusting the overlapping area of the external electrode 5000 and the internal electrode 200. That is, even after the manufacturing process of the electric shock prevention device is completed, by adjusting the overlapping area of the external electrode 5000, the capacitance of the electric shock prevention device can be adjusted outside the laminate 1000.
  • the ESD protection layer 320 of the ESD protection unit 3000 may be formed in various shapes.
  • the ESD protection layer 320 may be formed by applying or filling at least one region to a through hole formed in the insulating sheet 106.
  • capacitors 2000 and 4000 including a plurality of insulating sheets and internal electrodes may be formed on at least one of the lower and upper portions of the ESD protection layer 320. That is, FIGS. 9 to 11 illustrate only the ESD protection unit 3000 excluding the capacitor unit, and the capacitor unit (as shown in FIGS. 2, 3, 7 and 8 in at least one region of the lower side and the upper side thereof). 2000, 4000 may be formed.
  • Various shapes of the ESD protection layer 320 according to the embodiments of the present invention will be described with reference to FIGS. 9 to 11 as follows.
  • 9 to 11 are cross-sectional schematic views of the ESD protection unit 3000 according to embodiments of the present invention.
  • through holes are formed in an insulating sheet, for example, the sixth insulating sheet 106 as shown in FIGS. 2 and 3, and an ESD protection layer 320 is formed in one region of the through holes.
  • a through hole may be formed in a shape of a circle, a square, or the like, and an ESD protection material 324 may be formed on a side of the through hole.
  • the ESD protection material 324 may be at least one of the porous insulating layer, the conductive layer, and the void described with reference to FIGS. 5 and 6, and may be, for example, a mixed material of the porous insulating material and the conductive material. .
  • voids 323 may be formed in regions where the ESD protection material 324 is not formed.
  • ESD protection materials 324b and 324c may be further formed on the lower and upper portions of the through-holes contacting the discharge electrodes 311 and 312. That is, the ESD protection layer 320 may include an ESD protection material 324a formed on the side of the through hole, and an ESD protection material 324b and 324c formed to contact the discharge electrodes 311 and 312 at the bottom and the top of the through hole. have.
  • a gap 323 may be formed in an area between the ESD protection materials 324a, 324b, and 324c.
  • FIG. 9B ESD protection materials 324b and 324c may be further formed on the lower and upper portions of the through-holes contacting the discharge electrodes 311 and 312. That is, the ESD protection layer 320 may include an ESD protection material 324a formed on the side of the through hole, and an ESD protection material 324b and 324c formed to contact the discharge electrodes
  • an ESD protection material 324 may be formed in the through hole to be spaced apart from the side surface of the through hole.
  • the ESD protection material 324 may be formed to contact the first and second discharge electrodes 311 and 312. That is, the ESD protection material 324 may be in contact with the first and second discharge electrodes 311 and 312 to be formed in a vertical direction therebetween.
  • a gap 323 is formed between the ESD protection material 324 and the sidewall of the through hole in the through hole where the ESD protection material 324 is not formed.
  • the void 323 may be formed by filling the polymer material and then removing the polymer material during the firing process.
  • the polymer material is formed so that a part of the through hole is filled, and the ESD protection material, for example, a mixture of porous insulating material and conductive material is formed in one region of the through hole, and then the polymer material is removed in the firing process.
  • An ESD protection layer 320 having an ESD protection material and a void 323 formed therein may be formed in the hole.
  • the ESD protection layer 320 including the ESD protection material and the voids 323 may be formed by such a process.
  • an ESD protection layer 320 may be formed to form a through hole in a predetermined region of the insulating sheet 106 and to contact any one of the discharge electrodes 311 and 312.
  • an ESD protection material 324 may be formed in the through hole to be spaced apart from the insulating sheet 106 and to contact the first discharge electrode 311.
  • An ESD protection material 324 may be formed in the through hole to be spaced apart from the insulating sheet 106 and in contact with the second discharge electrode 312 as illustrated in (b) of FIG.
  • FIG. 10A an ESD protection material 324 may be formed in the through hole to be spaced apart from the insulating sheet 106 and in contact with the second discharge electrode 312 as illustrated in (b) of FIG.
  • ESD protection materials 324a and 324b are formed in the through hole to be spaced apart from the insulating sheet 106 and to contact the first and second discharge electrodes 311 and 312, respectively.
  • the first and second ESD protection materials 324a and 324b may be spaced apart from each other at a central portion of the through hole.
  • a gap 323 is formed in a region where the ESD protection material 324 is not formed in the through hole. That is, the ESD protection material 324 is formed to be applied to a portion of the through-hole and in contact with at least one of the first and second discharge electrodes 311 and 312, and the void 323 is formed in the remaining area so that the ESD protection layer is formed.
  • 320 may be formed.
  • a through hole may be formed in a predetermined region of the insulating sheet 106, and an ESD protection material 324 may be formed in a horizontal direction.
  • the ESD protection material 324 may be formed to be spaced apart from the discharge electrodes 311 and 312. That is, as illustrated in FIG. 11A, an ESD protection material 320 may be formed by protruding inward to at least one side of the through hole in the insulating sheet 106. That is, the first and second ESD protection materials 324a and 324b may be formed to be spaced apart from each other from the sidewall of the through hole.
  • the first and second ESD protection materials 324a and 324b may be spaced apart from the first and second discharge electrodes 311 and 312 and spaced apart from the center of the through hole.
  • voids 323 are formed in regions where the ESD protection material 324 is not formed.
  • the ESD protection material 324 may be formed in the horizontal hole in the through hole. That is, the ESD protection material 324 may be formed horizontally from one side of the through hole to the other side.
  • the void 323 may be formed in the remaining area of the through hole where the ESD protection layer 320 is not formed. That is, voids 323a and 323b are formed between the discharge electrodes 311 and 312 and the ESD protection material 324, respectively.
  • the ESD protection layer 320 of the ESD protection unit 3000 according to the present invention may be formed differently from at least one of the thickness and width of at least one region different from the other region.
  • the ESD protection layer 320 may be formed by applying at least a part of two or more sheets. An ESD protection layer according to other embodiments of the ESD protection layer 320 will be described with reference to FIGS. 12 to 18 as follows.
  • FIGS. 12 to 18 are schematic cross-sectional views of an ESD protection unit including an ESD protection layer according to another embodiment of the present invention.
  • a capacitor unit including a plurality of insulating sheets and a plurality of internal electrodes may be formed on and under the ESD protection unit.
  • the ESD protection layer 320 may have a width in one direction of the central portion greater than that of the upper and lower portions.
  • the width of the center portion in the X direction may be greater than the width of the upper and lower portions. That is, as shown in FIGS. 12A and 12B, the ESD protection layer 320 is formed to have a predetermined thickness in the Z direction, and is formed to have a predetermined width in the X and Y directions, respectively.
  • the width w1 in the X direction in the middle region of the thickness may be greater than the width w2 of the upper and lower portions.
  • it may be formed so that the width becomes narrower toward the lower and upper in the central region.
  • the ESD protection layer 320 may have a hexagonal cross-sectional shape in the X direction. Accordingly, the ESD protection layer 320 may have a thickness t1 between the top surface and the bottom surface to be thicker than the thickness t2 of the edge.
  • the ESD protection layer 320 may have a central portion larger than the upper and lower portions in the Y direction orthogonal to the X direction, and may have a smaller width from the central portion toward the lower and upper portions. Therefore, the ESD protection layer 320 may be formed in a polyhedral shape having a top surface and a bottom surface flat and having angular sides. In this case, the ESD protection layer 320 may be formed on two sheets 106a and 106b as shown in FIG. 12C.
  • the lower sheet 106a has a first through-hole formed in a shape that becomes narrower from the lower surface to the upper surface
  • the upper sheet 106b has a second width that becomes wider from the lower surface to the upper surface.
  • Through-holes are formed, and at least a part of the ESD protection material is applied or filled in the first and second through-holes, and then stacked and pressed to form an ESD protection layer 320 having a width greater than that of the upper and lower portions of the center. Can be formed.
  • the ESD protection layer 320 may have an elliptical cross-sectional shape in one direction. That is, the ESD protection layer 320 may be formed in an egg shape. For example, it may have a first width in the X direction and a second width in the Y direction orthogonal thereto, and may have different thicknesses in the Z direction. That is, as shown in FIGS. 13A and 13B, the first width w1 in the X direction and the second width w2 in the Y direction have the first width w1. It may be formed to be greater than or equal to the second width (w2). In addition, the thickness in the Z direction may be thicker at the center portion and thinner at the edge.
  • the central portion may be formed to have a first thickness t1 and become thinner from the edge toward the edge.
  • any region between the central portion and the edge may be formed to have a second thickness t2 that is thinner than the first thickness t1.
  • the entire surface of the upper and lower surfaces of the ESD protection unit 320 may be exposed on the insulating sheet 106, and only a part thereof may be exposed on the insulating sheet 106. For example, only about one third of the first width in the X direction may be exposed, and the remaining area may be formed in the insulating sheet 106.
  • the ESD protection layer 320 may be formed on two sheets 106a and 106b as shown in FIG. 13C.
  • the first through-hole is formed in a shape in which the lower sheet 106a becomes wider from the lower surface to the upper surface
  • the second sheet 106b is in a shape in which the width narrows from the lower surface to the upper surface.
  • Through-holes are formed, and at least a part of the ESD protection material is applied or filled in the first and second through-holes, and then stacked and pressed to form an ESD protection layer 320 having a width greater than that of the upper and lower portions of the center. Can be formed.
  • the ESD protection layer 320 may be formed to have a width that increases from the bottom to the top. That is, as shown in (a) of FIG. 14, the ESD protection layer 320 may be formed in one sheet 106 in a shape in which the lower portion is smaller in width than the upper portion and wider in width toward the upper portion. Of course, on the contrary, the ESD protection layer 320 may be formed in a shape in which the lower portion is larger than the upper portion and the width thereof becomes narrower toward the upper portion. Therefore, the ESD protection layer can be formed in a substantially trapezoidal or inverted trapezoidal cross-sectional shape. In addition, as illustrated in FIG. 14B, an ESD protection layer 320 may be formed on at least two sheets 106a and 106b.
  • a first through hole is formed in the lower sheet 106a, the width of which extends from the bottom to the upper portion in contact with the first discharge electrode 311, and in the upper sheet 106b, the lower portion is the same as the upper width of the first through hole.
  • a second through hole that maintains the width and becomes wider as the upper portion thereof is formed may be formed, and the ESD protection layer 320 may be formed by embedding, stacking, and compressing the ESD protection material in the first and second through holes.
  • the ESD protection layer 320 may have a central portion having a width greater than that of the upper and lower portions. That is, the first ESD protection layer 320a having a predetermined width is formed at the bottom of the ESD protection layer 320, and the second width of the ESD protection layer 320a is wider than that of the first ESD protection layer 320a. An ESD protection layer 320b is formed, and a third ESD protection layer 320c having a narrower width than the second ESD protection layer 320b may be formed on the second ESD protection layer 320b.
  • the first to third ESD protection layers 320a, 302b, and 320c may be formed to have the same thickness.
  • first and second ESD protection layers 320a and 320c may have the same width and overlap each other.
  • the second ESD protection layer 320b may be formed to have a width that is 1.5 times or more wider than that of the first and third ESD protection layers 320a and 320c.
  • the second ESD protection layer 320b may be 1.5 to 3 times wider than the first and third ESD protection layers 320a and 320c.
  • the ESD protection layer 320 may be formed by stacking and compressing a predetermined hole in which at least a part of the ESD protection material is applied or filled in the two sheets 106a and 106b. .
  • the lower sheet 106a is formed with a first through hole having a first width from the bottom to 2/3 thickness and a second width larger than the first width in the remaining 1/3 thickness, and the upper sheet 106b.
  • the ESD protection layer 320 may be formed by lamination and compression.
  • the ESD protection layer 320 may be formed on the three sheets 106a, 106b, and 106c as shown in FIG. 15B.
  • a first through hole of a first width is formed in the lower sheet 106a
  • a second through hole of a second width larger than the first width is formed in the intermediate sheet 106b
  • a first through hole is formed in the upper sheet 106c.
  • a third through hole of one width may be formed, and an ESD protection layer 320 may be formed by stacking and compressing the ESD protection material by applying or filling at least a portion of the first through third through holes.
  • the ESD protection layer 320 may be formed by applying or filling at least a portion of an ESD protection material.
  • the ESD protection layer 320 may have a wide width.
  • the voids may be formed in the first and third ESD protection layers 320a and 320c to which the ESD protection material is applied or filled and the narrow first and third ESD protection layers 320a and 320c are not applied or filled.
  • the ESD protection material may be applied or filled only to a portion of the second ESD protection layer 320b that is coated or filled with and overlaps the first and third ESD protection layers 320a and 320c. That is, as illustrated in FIG. 15D, the second ESD protection layer 320b is coated or filled with an ESD protection material only in an area overlapping the first and third ESD protection layers 320a and 320c. In areas that do not have an ESD protection material applied or filled, voids may be formed.
  • the ESD protection layer 320 may have a central portion smaller in width than the upper portion and the lower portion. That is, the ESD protection layer 320 has a first width of the first ESD protection layer 320a having a predetermined width, and a second width smaller than the first ESD protection layer 320a on the first ESD protection layer 320a. An ESD protection layer 320b is formed, and a third ESD protection layer 320c having a wider width than that of the second ESD protection layer 320b may be formed on the second ESD protection layer 320b.
  • the first to third ESD protection layers 320a, 302b, and 320c may be formed to have the same thickness.
  • first and third ESD protection layers 320a and 320c may have the same width and may overlap each other.
  • the second ESD protection layer 320b may be formed to have a width that is 1.5 times or more narrower than that of the first and third ESD protection layers 320a and 320c.
  • the second ESD protection layer 320b may be 1.5 to 3 times narrower than the first and third ESD protection layers 320a and 320c.
  • the ESD protection layer 320 may be formed by stacking and compressing a predetermined through hole in which at least a part of the ESD protection material is applied or filled in the two sheets 106a and 106b as shown in FIG. 16A. have.
  • the lower sheet 106a is formed with a first through hole having a first width from the bottom to 2/3 thickness and a second width smaller than the first width in the remaining 1/3 thickness, and the upper sheet 106b.
  • the ESD protection layer 320 may be formed by lamination and compression.
  • the ESD protection layer 320 may be formed on the three sheets 106a, 106b, and 106c as shown in FIG. 16B.
  • a first through hole of a first width is formed in the lower sheet 106a
  • a second through hole of a second width smaller than the first width is formed in the intermediate sheet 106b
  • a first through hole is formed in the upper sheet 106c.
  • a third through hole of one width may be formed, and an ESD protection layer 320 may be formed by stacking and compressing the ESD protection material by applying or filling at least a portion of the first through third through holes. Meanwhile, the ESD protection layer 320 may be formed by applying or filling at least a part of an ESD protection material. For example, as illustrated in FIG.
  • An ESD protection material may be coated or filled on the 320a and 320c, and a gap may be formed in the narrow second ESD protection layer 320b without the ESD protection material being applied or filled.
  • an ESD protection material may be applied or filled only on the second ESD protection layer 320b, and voids may be formed in the first and third ESD protection layers 320a and 320c. have.
  • the ESD protection material may be applied or filled only to a portion of the first and third ESD protection layers 320a and 320c overlapping or overlapping the ESD protection material 320b. That is, as shown in FIG. 16E, an ESD protection material is formed in an area overlapping the second ESD protection layer 320b in the first and third ESD protection layers 320a and 320c, and is not overlapped. In the region, voids may be formed.
  • the ESD protection layer 320 may be formed in a shape in which thickness increases or decreases in one direction.
  • the ESD protection layer 320 may be reduced in thickness from one side in the X direction to the other side and then increased again to form a cross-sectional shape, for example, in a peanut shape. That is, the thickness increases from one end in the X direction toward the other end, and then decreases again, and then increases again.
  • the thickness of one end and the other end is the same and may be formed in the thinnest shape in the center. Of course, it may be formed in an irregular shape so as to have a thickness that is thinnest in at least one region and increases in thickness in at least one direction from one side and the other side therefrom.
  • the peanut protection ESD protection layer 320 may be formed on at least one insulating sheet 106. That is, the ESD protection layer 320 may be formed on one insulating sheet 106 or may be formed on two or more insulating sheets 106.
  • the ESD protection layer 320 may be formed in a shape in which the upper and lower portions of the ESD protection layer 320 are wide and narrow in width toward the center portion therebetween. That is, the ESD protection layer 320 may be formed to be wider from the thickness direction, that is, the lower side and the upper side from the center in the Z direction.
  • the ESD protection layer 320 may be formed on two insulating sheets 106a and 106b. For example, a first through hole is formed in the lower insulating sheet 106a in a shape that becomes narrower from the bottom to an upper portion, and a second through hole is formed in the upper insulating sheet 106b in a width that becomes wider from the lower portion to the upper portion thereof.
  • the through hole may be formed, and the ESD protection layer 320 may be formed by stacking and compressing the ESD protection material after applying or filling the ESD protection material in at least one region of the first and second through holes.
  • At least one of the thickness and the width of at least one region may be formed differently from the other regions, thereby effectively distributing the ESD voltage, thereby bypassing the ESD voltage more efficiently. Can be.
  • an ESD protection material is embedded or coated in a through hole in which the ESD protection layer 320 is formed in the insulating sheet 104.
  • the ESD protection layer 320 may be formed in a predetermined region of the insulating sheet, and the discharge electrode 310 may be formed to contact the ESD protection layer 320, respectively. That is, as shown in the cross-sectional view of the fourth embodiment of FIG. 19, two discharge electrodes 311 and 312 are formed on the insulating sheet 106 at a predetermined interval in the horizontal direction, and between the two discharge electrodes 311 and 312.
  • An ESD protection layer 320 may be formed on the substrate.
  • the ESD protection layer 320 may be formed differently from other regions where the thickness and / or width of at least one region is different.
  • the width of the ESD protection layer 320 in the Y direction may be greater than the widths of the discharge electrodes 311 and 312.
  • the length of the internal electrode 200 in the X direction and the width in the Y direction are greater than the lengths and the widths of the discharge electrodes 311 and 312, and the width of the internal electrode 200 in the Y direction is the ESD protection layer ( Greater than the width of 320).
  • the ESD protection unit 3000 includes at least two discharge electrodes 311 and 312 spaced apart on the same plane and at least one ESD protection layer 320 provided between the at least two discharge electrodes 311 and 312. can do. That is, two discharge electrodes 311 and 312 may be provided in a direction in which the external electrodes 5000 are formed so as to be spaced apart from each other in a predetermined region of the sheet, for example, in the X direction, and at least in a direction orthogonal thereto. Two or more discharge electrodes (not shown) may be further provided. Accordingly, at least one discharge electrode may be formed in a direction orthogonal to the direction in which the external electrode 5000 is formed, and at least one discharge electrode may be formed to face each other at a predetermined interval.
  • the ESD protection unit 3000 may include the sixth insulating sheet 106 and the first and second discharge electrodes 311 and 312 spaced apart from the sixth insulating sheet 106. ) And an ESD protection layer 320 formed on the sixth insulating sheet 106.
  • the ESD protection layer 320 may be formed such that at least a portion thereof is connected to the first and second discharge electrodes 311 and 312.
  • the first discharge electrode 311 is connected to the external electrode 5100 to be formed on the sixth insulating sheet 106, and the end portion thereof is connected to the ESD protection layer 320.
  • the second discharge electrode 312 is connected to the external electrode 5200 and is formed to be spaced apart from the first discharge electrode 311 on the sixth insulating sheet 106, and the end portion thereof is connected to the ESD protection layer 320. .
  • the ESD protection layer 320 may be formed to be connected to the first and second discharge electrodes 311 and 312 at a predetermined region, for example, a central portion of the sixth insulating sheet 106. In this case, the ESD protection layer 320 may be formed to partially overlap the first and second discharge electrodes 311 and 312.
  • An ESD protection layer 320 is formed on the exposed sixth insulating sheet 106 between the first and second discharge electrodes 311 and 312 to be connected to the side surfaces of the first and second discharge electrodes 311 and 312. It may be.
  • the ESD protection layer 320 may be spaced apart from the first and second discharge electrodes 311 and 312 without being in contact with each other, the ESD protection layer 320 may overlap the first and second discharge electrodes 311 and 312. It is preferred to form 320).
  • the discharge electrode 310 and the ESD protection layer 320 may be formed on the same plane, and thus may be modified in various shapes.
  • a portion of the ESD protection layer 320 may overlap the first discharge electrode 311, and a portion of the ESD protection layer 320 may be in contact with the insulating sheet 105. That is, the ESD protection layer 320 may be formed on the top and side surfaces of the first discharge electrode 311.
  • the second discharge electrode 312 may be formed on the insulating sheet 200 in contact with the top and side surfaces of the ESD protection layer 320.
  • the ESD protection layer 320 may have any one of a thickness and a width of at least one region different from the other regions.
  • the width in the X direction may be larger than the width in the Y direction, and the thickness of at least one region in the vertical direction may be different from the other region.
  • the thickness of the region in contact with the insulating sheet 105 may be thicker than the thickness of the region formed between the first and second discharge electrodes 311 and 312.
  • the ESD protection layer 320 is in contact with the upper portion of the first discharge electrode 311, and the second discharge electrode 312 is formed on the upper portion of the ESD protection layer 320. In contact with the surface may be formed on the insulating sheet 312. In this case, a space A may be formed on side surfaces of the second discharge electrode 312, the ESD protection layer 320, and the first discharge electrode 311. That is, the space A may be formed so that at least the first discharge electrode 311 and the second discharge electrode 312 do not contact each other.
  • a spacer using a polymer material is formed on the side of the ESD protection layer 320, and then the polymer material is volatilized during formation in the firing process. Space A may be formed. Of course, an insulation may be formed in the space A, and the ESD protection layer 320 may be extended.
  • the ESD protection unit 3000 may be implemented using the insulating sheet 200 having a step. That is, the first discharge electrode 311 is formed in a thin region of the insulating sheet 200 in which some regions have a thinner thickness than other regions, and the ESD protection layer (3) is formed on the first discharge electrode 311 so that the step is removed. 320 may be formed, and the second discharge electrode 312 may be formed to overlap the ESD protection layer 320 in a thick region.
  • internal electrodes of the capacitor parts 2000 and 4000 adjacent to the one discharge electrode 310 may be connected to the same external electrode 5000. It may be. That is, as shown in FIG. 21, the first discharge electrode 311 and the fourth internal electrode 204 adjacent thereto are connected to the first external electrode 5100, and the second discharge electrode 312 and the fifth adjacent electrode 512 are adjacent to each other.
  • the internal electrode 205 may be connected to the second external electrode 5200.
  • the fourth internal electrode 204 may be formed to have the same length as the first discharge electrode 311, and the fifth internal electrode 205 may be formed to have the same length as the second discharge electrode 312.
  • the ESD voltage may flow when the insulation breaks, so that the inner electrode 200 adjacent to the discharge electrode 310 and connected to the same external electrode 5000 is formed to have a length shorter or the same as the discharge electrode 310. Do.
  • the external electrode 5000 is formed to partially overlap with the internal electrode 200, thereby preventing an electric shock. You can adjust the capacitance of.
  • the ESD resistance characteristics may be maintained. This, combined with the design of the ESD protection of the electric shock protection device, results in a higher ESD immunity improvement. As a result, if the ESD is not passed to the ESD protection layer of the ESD protection due to the repetitive ESD voltage of the ESD protection, the capacitor part may be damaged, causing dielectric breakdown, and the ESD protection may not be degraded.
  • an ESD voltage load may be generated in the capacitor part for a while at a time between 1 ns and 30 ns of vacancy until the response time of the ESD protection part of the electric shock protection device, thereby causing dielectric breakdown.
  • the capacitor portion in the floating type, it is possible to improve the ESD breakdown characteristic of the capacitor layer, thereby improving the phenomenon in which the insulation resistance is destroyed and the short is generated.
  • an electric shock prevention device may include a laminate 1000 in which a plurality of insulating sheets 101 to 113; 100 are stacked, and in the laminate 1000.
  • the first capacitor part 2000, the ESD protection part 3000, and the second capacitor part 4000 may be provided.
  • the electronic device may further include external electrodes 5100, 5200; 5000 formed on two opposite sides of the stack 1000 and connected to the first and second capacitor parts 2000 and 4000 and the ESD protection part 3000. can do.
  • the first capacitor part 2000 may include a plurality of internal electrodes 201 to 205, and the second capacitor part 4000 may also include a plurality of internal electrodes 208 to 212.
  • the first and second capacitor parts 2000 and 4000 may have the same number, for example, five internal electrodes.
  • an ESD protection unit 3000 including discharge electrodes 311 and 312 and an ESD protection layer 320 provided therebetween is provided between the first and second capacitor units 2000 and 4000.
  • the first and second capacitor parts 2000 and 4000 may be formed in a shape in which at least one internal electrode has at least one region removed.
  • the internal electrode 201 of the first capacitor part 2000 is formed in a shape in which the center part is removed to a predetermined width, for example, and is symmetrical with the ESD protection part 3000 interposed therebetween.
  • the internal electrode 210 of the second capacitor part 4000 provided at the location may also be formed in a shape in which a predetermined region is removed at the same location as the internal electrode 201. Since the internal electrodes 201 and 210 are formed by removing a predetermined region, an overlapping area with the internal electrodes 202 and 209 adjacent thereto is reduced. In this case, two regions may be connected to the first and second external electrodes 5100 and 5200, respectively.
  • the predetermined regions of the internal electrodes 201 and 210 are removed to form a thick insulating sheet 102 and 112 between the internal electrodes 201 and 210 and the adjacent internal electrodes 202 and 209. That is, since two insulating sheets 101 and 102 are provided between the inner electrode 202 and the removed portion of the inner electrode 201, the thickness of the insulating sheet 100 is increased. Therefore, since the thickness of the insulating sheet 100 is increased at least twice in one region between the internal electrodes 200 of the capacitor parts 2000 and 4000, the ESD resistance characteristic may be maintained.
  • a predetermined region of the internal electrodes 201, 203, and 205 of the first capacitor unit 2000 is removed, and the ESD protection unit 3000 is interposed therebetween.
  • predetermined regions of the internal electrodes 206, 208, and 210 of the second capacitor unit 4000 positioned symmetrically may be removed.
  • the internal electrodes 202, 204, 207, and 209 are formed to overlap at least some of the internal electrodes 201, 203, 205, 206, 208, and 210 without being in contact with the external electrode 5000. Can be.
  • the internal electrodes 202, 204, 207, and 209 are formed at the center of the insulating sheet 100 and not formed at the center of the insulating sheet 100, and the internal electrodes 201, 203, 205, 206, 208, It may be formed to overlap with 210.
  • the internal electrodes of the first and second capacitor parts 2000 and 4000 may be removed from the central area as well as the areas spaced a predetermined distance therefrom.
  • the central region of the internal electrodes 201, 203, and 205 of the first capacitor unit 2000 is removed, and the internal electrodes 202 and 204 positioned therebetween are disposed in the center. Removal portions may be formed at both sides of the region spaced apart from each other by a predetermined interval.
  • the second capacitor part 4000 has internal electrodes 206 and 208 at positions symmetrical with the internal electrodes 201, 203 and 205 of the first capacitor part 2000 with the ESD protection part 3000 interposed therebetween.
  • a central region of 210 may be removed, and internal regions 207 and 209 disposed therebetween may have a removal region formed at the same position as internal electrodes 202 and 204 of the first capacitor unit 2000. .
  • At least two removal regions are formed in the central region of the internal electrodes 201, 203, and 205 of the first capacitor unit 2000, and the internal electrodes 202, which are positioned therebetween. 204 may be formed with removal regions on both sides spaced apart from the central region by a predetermined interval.
  • the second capacitor part 4000 has internal electrodes 206 and 208 at positions symmetrical with the internal electrodes 201, 203 and 205 of the first capacitor part 2000 with the ESD protection part 3000 interposed therebetween.
  • At least two removal regions are formed in the central region of the second and second regions 210, and the internal electrodes 207 and 209 disposed therebetween are disposed at the same position as the internal electrodes 202 and 204 of the first capacitor unit 2000. This can be formed.
  • the capacitor parts 2000 and 4000 may float at least one internal electrode. It can be formed into a type.
  • the electric shock prevention device may form at least one ESD protection layer 320 of the ESD protection unit 3000. That is, one ESD protection layer 300 may be formed in the X direction as shown in FIGS. 2, 3, 7, and 8, and the ESD protection layer in the X direction as shown in FIGS. 27 to 30. Two or more 320 may be formed. In this case, a plurality of ESD protection layers 320 may be formed in the Y direction. For example, as shown in FIG. 27, two ESD protection layers 320a and 320b may be formed on the same plane, and as shown in FIG. 28, three ESD protection layers 320a, 320b and 320c may also be formed.
  • At least two ESD protection layers 320a, 320b, and 320c may be connected by internal electrodes.
  • four ESD protection layers 320a, 320b, 320c, and 320d may be divided into two, respectively, and as shown in FIG. 30, six ESD protection layers 320a, 320b, 320c, 320d, 320e, and 320f may be formed by being divided up and down by three.
  • the upper ESD protection layers may be connected to each other, and the lower ESD protection layers may be connected to each other.
  • each ESD protection layer 320 may be formed in the same structure or may be formed in a different structure.
  • the ESD protection layer 320 is at least one of the vertical direction and the horizontal direction. At least two may be provided in the direction.
  • At least one capacitor part 2000 and 4000 and at least one ESD protection part 3000 may be formed in one stack.
  • one capacitor and two or more ESD protections may be formed.
  • the capacitor may be formed between the internal circuit of the electronic device and the metal case, and an ESD protection unit may be formed between the capacitor and the ground terminal.
  • the first and second external electrodes 5100 and 5200 are formed on two opposite sides of the laminate, and the first and second external electrodes 5100 and 5200 are not formed on the two opposite sides.
  • Third and fourth external electrodes (not shown) may be formed.
  • the first and second external electrodes 5100 and 5200 may be provided between the metal case of the electronic device and the internal circuit, respectively, and the third and fourth external electrodes may be connected to the ground terminal. That is, the first and second external electrodes 5100 and 5200 may be connected to two regions between the metal case of the electronic device and the internal circuit, respectively, and the third and fourth external electrodes may be connected to the ground terminal.
  • a plurality of capacitor parts 2000 and 4000 and a plurality of ESD protection parts 3000 may be formed in a horizontal direction in the stack 1000. That is, at least one capacitor part 2000 and 4000 and the ESD protection part 3000 stacked in the vertical direction are arranged in at least two in the horizontal direction and connected to at least two external electrodes 5000 in the horizontal direction.
  • a plurality of electric shock prevention elements including a plurality of capacitors and a plurality of ESD protection units may be provided in parallel. Therefore, two or more electric shock prevention devices may be implemented in one laminate 1000.
  • the plurality of first external electrodes 5100 may be connected to a plurality of regions of the metal case of the electronic device, and the plurality of second external electrodes 5200 may be connected to a ground terminal of the electronic device.
  • at least one of at least one internal electrode of the plurality of capacitor parts may be formed to have a different length. That is, at least one inner electrode of the plurality of inner electrodes formed in the horizontal direction to form different capacitor parts may be formed to be shorter or longer than the other inner electrodes.
  • the capacitance may be adjusted by adjusting not only the length of the inner electrode but also at least one of the overlapping area of the inner electrode and the stacking number of the inner electrode. Therefore, at least one capacitance of the plurality of capacitors may be different. That is, at least one of the plurality of capacitors having different capacitances may be implemented in one stack.

Abstract

Disclosed are an electric shock-prevention element and an electronic device provided with same, the electric shock-prevention element comprising: a laminate body in which a plurality of insulating sheets are laminated; a capacitor part provided with a plurality of inner electrodes in the interior of the laminate body; an ESD protection part provided in the interior of the laminate body and comprising at least two discharge electrodes and at least one ESD protection layer provided in between the discharge electrodes; and outer electrodes provided on at least two outer sides of the laminate body to be connected to the capacitor part and ESD protection part, wherein at least one among the thickness and width of at least one part of the ESD protection layer differs from the other part thereof.

Description

감전 방지 소자 및 이를 구비하는 전자기기Electric shock prevention device and electronic device having same
본 발명은 감전 방지 소자에 관한 것으로, 특히 스마트 폰 등의 충전 가능한 전자기기를 통해 사용자에게 감전 전압이 전달되는 것을 방지할 수 있는 감전 방지 소자에 관한 것이다.The present invention relates to an electric shock prevention device, and more particularly, to an electric shock prevention device capable of preventing the electric shock voltage from being transmitted to a user through a chargeable electronic device such as a smart phone.
이동통신 단말기의 이용은 과거 음성통화 중심에서 데이터 통신 서비스를 거쳐 스마트폰 기반의 생활편의 서비스로 진화되어 왔다. 또한, 스마트폰 등의 다기능화에 따라 다양한 주파수 대역이 사용되고 있다. 즉, 하나의 스마트폰 내에서 무선 LAN(wireless LAN), 블루투스(bluetooth), GPS 등 다른 주파수 대역을 이용하는 복수의 기능을 채용하게 되었다. 또한, 전자 기기의 고집적화에 따라 한정된 공간에서의 내부 회로 밀도가 높아지게 된다. 그에 따라 내부 회로 사이에 노이즈 간섭이 필연적으로 발생하게 된다. 휴대용 전자 기기의 다양한 주파수의 노이즈를 억제하고, 내부 회로 사이의 노이즈를 억제하기 위해 복수의 회로 보호 소자가 이용되고 있다. 예를 들어, 각각 서로 다른 주파수 대역의 노이즈를 제거하는 콘덴서, 칩 비드, 공통 모드 필터(common mode filter) 등이 이용되고 있다.The use of mobile communication terminal has evolved from the center of voice call to the convenience service of smartphone based life through data communication service. In addition, various frequency bands are used according to the multifunctionalization of smart phones and the like. That is, a plurality of functions using different frequency bands, such as wireless LAN, Bluetooth, and GPS, are adopted in one smartphone. In addition, due to the high integration of electronic devices, the internal circuit density in a limited space is increased. This inevitably causes noise interference between internal circuits. In order to suppress noise of various frequencies of a portable electronic device and to suppress noise between internal circuits, a plurality of circuit protection elements are used. For example, a capacitor, a chip bead, a common mode filter, and the like, which remove noise in different frequency bands, are used.
한편, 최근들어 스마트폰의 고급스런 이미지와 내구성이 강조되면서 금속 소재를 이용한 단말기의 보급이 증가하고 있다. 즉, 테두리를 금속으로 제작하거나, 전면의 화면 표시부를 제외한 나머지 케이스를 금속으로 제작한 스마트폰의 보급이 증가하고 있다.On the other hand, recently, with the emphasis on the high-end image and durability of smart phones, the spread of terminals using metal materials is increasing. In other words, the spread of smart phones, which are made of metal with the edges or with the case made of metal other than the front screen display unit, is increasing.
그런데, 과전류 보호 회로가 내장되지 않거나 저품질의 소자를 사용한 비정품 충전기 또는 불량 충전기를 이용하여 충전함으로써 쇼크 전류(Shock Current)가 발생된다. 이러한 쇼크 전류는 스마트폰의 접지 단자로 전달되고, 다시 접지 단자로부터 금속 케이스로 전달되어 금속 케이스에 접촉된 사용자가 감전될 수 있다. 결국, 금속 케이스를 이용한 스마트폰에 비정품 충전기를 이용한 충전 중 스마트폰을 이용하면 감전 사고가 발생할 수 있다.However, a shock current is generated by charging using a non-genuine charger or a defective charger using an overcurrent protection circuit or a low quality device. Such a shock current is transmitted to the ground terminal of the smartphone, and again from the ground terminal to the metal case, the user in contact with the metal case may be electrocuted. As a result, using a smartphone during charging using a non-genuine charger in a smartphone using a metal case may cause an electric shock accident.
(선행기술문헌)(Prior art document)
한국등록특허 제10876206호Korean Patent Registration No. 10876206
본 발명은 스마트폰 등의 전자기기 내에 마련되어 충전기로부터 입력되는 쇼크 전류에 의한 사용자의 감전을 방지할 수 있는 감전 방지 소자를 제공한다.The present invention provides an electric shock prevention device that can be provided in an electronic device such as a smartphone to prevent an electric shock of a user due to a shock current input from a charger.
본 발명은 ESD(ElectroStatic Discharge)에 의해 절연 파괴되지 않는 감전 방지 소자를 제공한다.The present invention provides an electric shock prevention device that is not dielectrically broken by an electrostatic discharge (ESD).
본 발명의 일 양태에 따른 감전 방지 소자는 복수의 절연 시트가 적층된 적층체; 상기 적층체 내부에 형성된 복수의 내부 전극을 포함하는 캐패시터부; 상기 적층체 내부에 형성되며, 적어도 둘 이상의 방전 전극과, 상기 방전 전극 사이에 마련되는 적어도 하나의 ESD 보호층을 포함하는 ESD 보호부; 및 상기 적층체 외부의 적어도 두 측면에 마련되어 상기 캐패시터부 및 ESD 보호부와 연결되는 외부 전극을 포함하고, 상기 ESD 보호층은 적어도 일 영역의 두께 및 폭의 적어도 어느 하나가 다른 영역과 다르게 형성된다.An electric shock prevention device according to an aspect of the present invention includes a laminate in which a plurality of insulating sheets are stacked; A capacitor unit including a plurality of internal electrodes formed in the stack; An ESD protection unit formed inside the stack and including at least two discharge electrodes and at least one ESD protection layer provided between the discharge electrodes; And external electrodes provided on at least two side surfaces of the stack and connected to the capacitor unit and the ESD protection unit, wherein the ESD protection layer is formed at least one of a thickness and a width of at least one region different from the other regions. .
상기 방전 전극과 인접한 상기 내부 전극은 동일 외부 전극과 연결된다.The inner electrode adjacent to the discharge electrode is connected to the same outer electrode.
상기 외부 전극은 상기 적층체의 상부 및 하부의 적어도 어느 하나로 연장되어 상기 내부 전극과 일부 중첩된다.The external electrode extends to at least one of the upper and lower portions of the stack to partially overlap the inner electrode.
상기 내부 전극의 일 방향의 길이는 상기 방전 전극의 길이보다 길거나 같고 상기 일 방향과 직교하는 타 방향으로의 폭은 상기 ESD 보호층의 폭 및 상기 방전 전극의 폭보다 크다.The length of one direction of the internal electrode is longer than or equal to the length of the discharge electrode, and the width of the internal electrode in another direction perpendicular to the one direction is greater than the width of the ESD protection layer and the width of the discharge electrode.
상기 ESD 보호층의 폭은 상기 방전 전극의 폭보다 크다.The width of the ESD protection layer is larger than the width of the discharge electrode.
상기 방전 전극과 인접한 상기 내부 전극 사이의 거리를 A, 상기 방전 전극 사이의 거리를 B, 상기 내부 전극 사이의 거리를 C라 할 때 A≤C≤ 또는 A≤B이다.A ≤ C ≤ or A ≤ B when the distance between the discharge electrode and the inner electrode adjacent to A, the distance between the discharge electrode is B, and the distance between the inner electrode is C.
상기 ESD 보호층은 다공성의 절연 물질과 도전 물질의 적어도 하나를 포함하는 ESD 보호 물질 및 공극의 적어도 하나를 포함한다.The ESD protection layer includes at least one of an ESD protection material and a void including at least one of a porous insulating material and a conductive material.
상기 ESD 보호층은 상기 방전 전극 사이에 수직 방향으로 형성되거나 수평 방향으로 형성된다.The ESD protection layer is formed in the vertical direction or in the horizontal direction between the discharge electrodes.
상기 ESD 보호층은 적어도 하나의 절연 시트에 형성된다.The ESD protection layer is formed on at least one insulating sheet.
상기 ESD 보호층은 다면체 형상으로 형성된다.The ESD protection layer is formed in a polyhedron shape.
상기 ESD 보호층은 일 방향의 중간 두께에서 폭이 가장 넓고 그 상부 및 하부로 갈수록 폭이 좁아지는 형상으로 형성된다.The ESD protection layer is formed in a shape that is widest at an intermediate thickness in one direction and narrows toward upper and lower portions thereof.
상기 ESD 보호층은 중앙 영역에서 두께가 가장 두껍고 그로부터 양 가장자리로 갈수록 두께가 얇아지는 형상으로 형성된다.The ESD protection layer is formed in a shape that is thickest in the central area and becomes thinner from both ends thereof.
상기 ESD 보호층은 일 방향으로 두께가 감소하다가 다시 증가하는 형상으로 형성된다.The ESD protection layer is formed in a shape in which the thickness decreases in one direction and then increases again.
상기 ESD 보호층은 상기 방전 전극 사이에 적어도 일부 접촉되도록 형성된다.The ESD protection layer is formed to at least partially contact between the discharge electrodes.
상기 ESD 보호 물질은 상기 방전 전극의 적어도 어느 하나와 연결되고 나머지 영역은 공극이 형성된다.The ESD protection material is connected to at least one of the discharge electrodes and voids are formed in the remaining areas.
상기 ESD 보호 물질은 상기 방전 전극과 접촉되지 않도록 관통홀 내의 적어도 일 영역에 형성되며, 나머지 영역은 공극이 형성된다.The ESD protection material is formed in at least one region in the through hole so as not to contact the discharge electrode, and the remaining region is formed with a void.
상기 캐패시터부 및 상기 ESD 보호부는 상기 적층체 내에 수평 방향으로 적어도 둘 이상 마련된다.At least two capacitor parts and the ESD protection part are provided in the stack in a horizontal direction.
상기 내부 전극은 수직 방향으로 적층되어 일 캐패시터부를 형성하고, 수평 방향으로 배열되어 복수의 캐패시터부를 형성한다.The internal electrodes are stacked in a vertical direction to form one capacitor portion, and are arranged in a horizontal direction to form a plurality of capacitor portions.
외부 전극의 하나가 전자기기의 금속 케이스와 연결되고 다른 하나가 접지 단자에 연결되어 감전 전압을 차단하고 ESD 전압을 바이패스시킨다.One of the external electrodes is connected to the metal case of the electronic device and the other is connected to the ground terminal to cut off the electric shock voltage and bypass the ESD voltage.
본 발명의 다른 양태에 따른 감전 방지 소자는 복수의 절연 시트가 적층된 적층체; 상기 적층체 내부에 형성된 복수의 내부 전극을 포함하는 캐패시터부; 상기 절연 시트의 적어도 일부에 형성되어 ESD 전압을 방호하는 ESD 보호부; 및 상기 적층체 외부의 적어도 두 측면에 마련되어 상기 캐패시터부 및 ESD 보호부와 연결되는 외부 전극을 포함하고, 상기 ESD 보호부는 적어도 둘 이상의 방전 전극과, 상기 방전 전극 사이에 마련되는 적어도 하나의 ESD 보호층을 포함하며, 상기 ESD 보호층은 적어도 일 영역의 두께 및 폭의 적어도 어느 하나가 다른 영역과 다르게 형성되고, 상기 내부 전극의 일 방향의 길이는 상기 방전 전극의 길이보다 길거나 같고 상기 일 방향과 직교하는 타 방향으로의 폭은 상기 ESD 보호층의 폭 및 상기 방전 전극의 폭보다 크며, 상기 ESD 보호층의 폭은 상기 방전 전극의 폭보다 크다.An electric shock prevention device according to another aspect of the present invention includes a laminate in which a plurality of insulating sheets are stacked; A capacitor unit including a plurality of internal electrodes formed in the stack; An ESD protection unit formed on at least a portion of the insulating sheet to protect the ESD voltage; And external electrodes provided on at least two side surfaces of the stack and connected to the capacitor unit and the ESD protection unit, wherein the ESD protection unit includes at least two discharge electrodes and at least one ESD protection provided between the discharge electrodes. And at least one of a thickness and a width of at least one region is different from the other region, and the length of one direction of the inner electrode is longer than or equal to the length of the discharge electrode and is equal to the one direction. The width in the other direction perpendicular to each other is greater than the width of the ESD protection layer and the width of the discharge electrode, and the width of the ESD protection layer is greater than the width of the discharge electrode.
상기 방전 전극과 인접한 상기 내부 전극 사이의 거리를 A, 상기 방전 전극 사이의 거리를 B, 상기 내부 전극 사이의 거리를 C라 할 때 A≤C 또는 A≤B이다.A is the distance between the discharge electrode and the internal electrodes adjacent to A, the distance between the discharge electrodes is B, and the distance between the internal electrodes is A≤C or A≤B.
본 발명의 또다른 양태에 따른 전자기기는 금속 케이스와 내부 회로 사이에 마련되어 감전 전압을 차단하고 ESD 전압을 바이패스시키는 감전 방지 소자를 포함하며, 상기 감전 방지 소자는, 복수의 절연 시트가 적층된 적층체; 상기 적층체 내부에 형성된 복수의 내부 전극을 포함하는 캐패시터부; 상기 절연 시트의 적어도 일부에 형성되어 ESD 전압을 방호하는 ESD 보호부; 및 상기 적층체 외부의 적어도 두 측면에 마련되어 상기 캐패시터부 및 ESD 보호부와 연결되는 외부 전극을 포함하고, 상기 ESD 보호부는 적어도 둘 이상의 방전 전극과, 상기 방전 전극 사이에 마련되는 적어도 하나의 ESD 보호층을 포함하며, 상기 ESD 보호층은 적어도 일 영역의 두께 및 폭의 적어도 어느 하나가 다른 영역과 다르게 형성되고, 상기 내부 전극의 일 방향의 길이는 상기 방전 전극의 길이보다 길거나 같고 상기 일 방향과 직교하는 타 방향으로의 폭은 상기 ESD 보호층의 폭 및 상기 방전 전극의 폭보다 크며, 상기 ESD 보호층의 폭은 상기 방전 전극의 폭보다 크다.According to another aspect of the present invention, an electronic device includes an electric shock prevention device provided between a metal case and an internal circuit to block an electric shock voltage and bypass an ESD voltage, wherein the electric shock prevention device includes a plurality of insulating sheets stacked thereon. Laminate; A capacitor unit including a plurality of internal electrodes formed in the stack; An ESD protection unit formed on at least a portion of the insulating sheet to protect the ESD voltage; And external electrodes provided on at least two side surfaces of the stack and connected to the capacitor unit and the ESD protection unit, wherein the ESD protection unit includes at least two discharge electrodes and at least one ESD protection provided between the discharge electrodes. And at least one of a thickness and a width of at least one region is different from the other region, and the length of one direction of the inner electrode is longer than or equal to the length of the discharge electrode and is equal to the one direction. The width in the other direction perpendicular to each other is greater than the width of the ESD protection layer and the width of the discharge electrode, and the width of the ESD protection layer is greater than the width of the discharge electrode.
상기 방전 전극과 인접한 내부 전극은 동일 외부 전극과 접속된다.An inner electrode adjacent to the discharge electrode is connected to the same outer electrode.
상기 방전 전극과 인접한 상기 내부 전극 사이의 거리를 A, 상기 방전 전극 사이의 거리를 B, 상기 내부 전극 사이의 거리를 C라 할 때 A≤C 또는 A≤B이다.A is the distance between the discharge electrode and the internal electrodes adjacent to A, the distance between the discharge electrodes is B, and the distance between the internal electrodes is A≤C or A≤B.
상기 외부 전극은 상기 적층체의 상부 및 하부의 적어도 어느 하나로 연장되어 상기 내부 전극과 일부 중첩된다.The external electrode extends to at least one of the upper and lower portions of the stack to partially overlap the inner electrode.
본 발명의 실시 예들에 따른 감전 방지 소자는 전자기기의 금속 케이스와 내부 회로 사이에 마련되어 내부 회로의 접지 단자로부터 전달되는 감전 전압을 차단할 수 있다. 따라서, 불량 충전기에서 발생된 감전 전압이 전자기기 내부의 접지 단자로부터 금속 케이스를 통해 사용자에게 전달되는 것을 방지할 수 있다. 또한, 감전 방지 소자는 ESD 보호부를 구비하고, ESD 보호부가 다공성 구조로 이루어져 미세 기공을 통해 전류를 흐르게 함으로써 유입되는 ESD를 접지 단자로 바이패스시켜 소자의 절연 상태를 유지할 수 있다. 따라서, 감전 전압을 지속적으로 차단할 수 있고, 외부로부터 인가되는 ESD 전압을 접지 단자로 바이패스시킬 수 있다.An electric shock prevention device according to embodiments of the present invention may be provided between a metal case of an electronic device and an internal circuit to block an electric shock voltage transmitted from a ground terminal of the internal circuit. Therefore, it is possible to prevent the electric shock voltage generated in the defective charger from being transmitted to the user through the metal case from the ground terminal inside the electronic device. In addition, the electric shock prevention device may include an ESD protection unit, and the ESD protection unit may be made of a porous structure to allow current to flow through the micropores to bypass the incoming ESD to the ground terminal to maintain the insulation state of the device. Therefore, the electric shock voltage can be interrupted continuously and the ESD voltage applied from the outside can be bypassed to the ground terminal.
또한, ESD 보호층을 적어도 일 영역의 두께 및 폭의 적어도 어느 하나를 다른 영역과 다르게 형성할 수 있다. 따라서, ESD 전압을 효율적으로 분배할 수 있고, 그에 따라 ESD 전압을 더욱 효율적으로 바이패스시킬 수 있다.In addition, at least one of the thickness and the width of at least one region may be formed differently from the other region. Thus, it is possible to distribute the ESD voltage efficiently, thereby bypassing the ESD voltage more efficiently.
한편, 외부 전극이 내부 전극의 적어도 일부와 소정 영역에 중첩되도록 형성될 수 있다. 따라서, 외부 전극과 내부 전극 사이에 소정의 기생 캐패시턴스가 생성될 수 있고, 외부 전극과 내부 전극의 중첩 면적을 조절함으로써 감전 방지 소자의 캐패시턴스를 조절할 수 있다.The external electrode may be formed to overlap at least a portion of the internal electrode and a predetermined region. Therefore, a predetermined parasitic capacitance may be generated between the external electrode and the internal electrode, and the capacitance of the electric shock prevention device may be adjusted by adjusting the overlapping area of the external electrode and the internal electrode.
그리고, ESD 보호부의 방전 전극과 인접한 캐패시터부의 내부 전극이 동일 외부 전극에 연결될 수 있다. 따라서, 절연 시트가 절연 파괴되더라도 ESD 전압이 인가되는 것을 방지할 수 있다.In addition, the discharge electrode of the ESD protection unit and the inner electrode of the capacitor unit adjacent to each other may be connected to the same external electrode. Therefore, even if the insulating sheet is broken insulated, it is possible to prevent the ESD voltage from being applied.
도 1은 본 발명의 제 1 실시 예에 따른 감전 방지 소자의 사시도.1 is a perspective view of an electric shock prevention device according to a first embodiment of the present invention.
도 2 및 도 3은 도 1의 A-A' 라인 및 B-B' 라인을 절취한 단면도.2 and 3 are cross-sectional views taken along line A-A 'and line B-B' of FIG.
도 4는 본 발명의 제 1 실시 예에 따른 감전 방지 소자의 등가 회로도.4 is an equivalent circuit diagram of an electric shock prevention device according to a first embodiment of the present invention.
도 5 및 도 6은 본 발명의 실시 예들에 따른 감전 방지 소자의 ESD 보호층의 단면도 및 단면 사진.5 and 6 are cross-sectional and cross-sectional photograph of the ESD protection layer of the electric shock protection device according to the embodiments of the present invention.
도 7은 본 발명의 제 2 실시 예에 따른 감전 방지 소자의 단면도.7 is a cross-sectional view of an electric shock prevention device according to a second embodiment of the present invention.
도 8은 본 발명의 제 3 실시 예에 따른 감전 방지 소자의 단면도.8 is a cross-sectional view of an electric shock prevention device according to a third embodiment of the present invention.
도 9 내지 도 11은 본 발명의 다른 실시 예들에 따른 ESD 보호층을 포함한 ESD 보호부의 개략 단면도.9 to 11 are schematic cross-sectional views of an ESD protection unit including an ESD protection layer according to other embodiments of the present invention.
도 12 내지 도 18은 본 발명의 또다른 실시 예들에 따른 ESD 보호층을 포함하는 ESD 보호부의 개략 단면도.12 to 18 are schematic cross-sectional views of an ESD protection unit including an ESD protection layer according to still another embodiment of the present invention.
도 19 내지 도 22은 본 발명의 제 4 실시 예 및 그 변형 예들에 따른 감전 방지 소자의 개략도.19 to 22 are schematic views of an electric shock prevention device according to a fourth embodiment of the present invention and modified examples thereof.
도 23 내지 도 26은 본 발명의 제 5 실시 예들에 따른 감전 방지 소자의 단면도.23 to 26 are cross-sectional views of the electric shock prevention device according to the fifth embodiment of the present invention.
도 27 내지 도 30은 본 발명의 제 6 실시 예들에 따른 감전 방지 소자의 단면도.27 to 30 are cross-sectional views of the electric shock prevention device according to the sixth embodiment of the present invention.
이하, 첨부된 도면을 참조하여 본 발명의 실시 예를 상세히 설명하기로 한 다. 그러나, 본 발명은 이하에서 개시되는 실시 예에 한정되는 것이 아니라 서로 다른 다양한 형태로 구현될 것이며, 단지 본 실시 예들은 본 발명의 개시가 완전하도록 하며, 통상의 지식을 가진 자에게 발명의 범주를 완전하게 알려주기 위해 제공되는 것이다.Hereinafter, embodiments of the present invention will be described in detail with reference to the accompanying drawings. However, the present invention is not limited to the embodiments disclosed below, but may be implemented in various forms, and only the embodiments are intended to complete the disclosure of the present invention and to those skilled in the art. It is provided for complete information.
도 1은 본 발명의 제 1 실시 예에 따른 감전 방지 소자의 사시도이고, 도 2는 도 1의 A-A' 라인을 절취한 단면도이며, 도 3은 도 1의 B-B' 라인을 절취한 단면도이다. 또한, 도 4는 등가 회로도이다.1 is a perspective view of an electric shock prevention device according to a first exemplary embodiment of the present invention, FIG. 2 is a cross-sectional view taken along line AA ′ of FIG. 1, and FIG. 3 is a cross-sectional view taken along line B-B ′ of FIG. 1. 4 is an equivalent circuit diagram.
도 1 내지 도 4를 참조하면, 본 발명의 제 1 실시 예에 따른 감전 방지 소자는 복수의 절연 시트(100; 101 내지 111)가 적층된 적층체(1000)와, 적층체(1000) 내에 마련되며 복수의 내부 전극(200; 201 내지 208)을 구비하는 적어도 하나의 캐패시터부(2000, 4000)와, 적어도 하나의 방전 전극(310; 311, 312)과 ESD 보호층(320)을 구비하는 ESD 보호부(3000)를 포함할 수 있다. 예를 들어, 적층체(1000) 내에 제 1 및 제 2 캐패시터부(2000, 4000)가 마련되고, 그 사이에 ESD 보호부(3000)가 마련될 수 있다. 즉, 적층체(1000) 내부에 제 1 캐패시터부(2000), ESD 보호부(3000) 및 제 2 캐패시터부(4000)가 적층되어 감전 방지 소자가 구현될 수 있다. 또한, 적층체(1000)의 서로 대향하는 두 측면에 형성되어 제 1 및 제 2 캐패시터부(2000, 4000)와 ESD 보호부(3000)와 연결되는 외부 전극(5100, 5200; 5000)을 더 포함할 수 있다. 물론, 감전 방지 소자는 적어도 하나의 캐패시터부와 적어도 하나의 ESD 보호부를 포함할 수 있다. 즉, ESD 보호부(3000)의 하측 또는 상측의 어느 하나에 캐패시터부가 마련될 수 있고, 서로 이격된 둘 이상의 ESD 보호부(3000)의 상측 및 하측에 적어도 하나의 캐패시터부가 마련될 수도 있다. 이러한 감전 방지 소자는 전자기기의 내부 회로, 예를 들어 PCB와 금속 케이스 사이에 마련되어 감전 전압을 차단하며, ESD 전압을 접지 단자로 바이패스시킨다. 그리고, ESD에 의해 절연이 파괴되지 않아 감전 전압을 지속적으로 차단할 수 있다.1 to 4, an electric shock prevention device according to a first exemplary embodiment of the present invention is provided in a laminate 1000 in which a plurality of insulating sheets 100 (101 to 111) are stacked and in a laminate 1000. And at least one capacitor unit 2000 and 4000 having a plurality of internal electrodes 200 and 201 to 208, at least one discharge electrode 310 and 311 and 312, and an ESD protection layer 320. The protection unit 3000 may be included. For example, the first and second capacitor parts 2000 and 4000 may be provided in the stack 1000, and the ESD protection part 3000 may be provided therebetween. That is, the first capacitor part 2000, the ESD protection part 3000, and the second capacitor part 4000 may be stacked in the stack 1000 to implement an electric shock prevention device. In addition, the electronic device may further include external electrodes 5100, 5200; 5000 formed on two opposite sides of the stack 1000 and connected to the first and second capacitor parts 2000 and 4000 and the ESD protection part 3000. can do. Of course, the electric shock prevention device may include at least one capacitor part and at least one ESD protection part. That is, a capacitor unit may be provided on either the lower side or the upper side of the ESD protection unit 3000, and at least one capacitor unit may be provided on the upper side and the lower side of the two or more ESD protection units 3000 spaced apart from each other. Such an electric shock prevention element is provided between an internal circuit of an electronic device, for example, a PCB and a metal case to block an electric shock voltage and bypass the ESD voltage to the ground terminal. In addition, since the insulation is not destroyed by the ESD, the electric shock voltage can be continuously interrupted.
적층체(1000)는 복수의 절연 시트(101 내지 111; 100)가 적층되어 형성된다. 이러한 적층체(1000)는 일 방향(예를 들어 X 방향) 및 이와 직교하는 타 방향(예를 들어 Y 방향)으로 각각 소정이 길이를 갖고, 수직 방향(예를 들어 Z 방향)으로 소정의 높이를 갖는 대략 육면체 형상으로 마련될 수 있다. 즉, 외부 전극(5000)의 형성 방향을 X 방향으로 할 때, 이와 수평 방향으로 직교하는 방향을 Y 방향으로 하고 수직 방향을 Z 방향으로 할 수 있다. 여기서, X 방향의 길이는 Y 방향의 길이 및 Z 방향의 길이보다 길고, Y 방향의 길이는 Z 방향의 길이와 같거나 다를 수 있다. Y 방향과 Z 방향의 길이가 다를 경우 Y 방향의 길이는 Z 방향의 길이보다 짧거나 길 수 있다. 예를 들어, X, Y 및 Z 방향의 길이의 비는 2∼5:1:0.5∼1일 수 있다. 즉, Y 방향의 길이를 기준으로 X 방향의 길이가 Y 방향의 길이보다 2배 내지 5배 정도 길 수 있고, Z 방향의 길이는 Y 방향의 길이보다 0.5배 내지 1배일 수 있다. 그러나, 이러한 X, Y 및 Z 방향의 길이는 하나의 예로서 방전 감지 소자가 연결되는 전자기기의 내부 구조, 방전 감지 소자의 형상 등에 따라 다양하게 변형 가능하다. 또한, 적층체(1000) 내부에는 적어도 하나의 캐패시터부(2000, 4000)와 적어도 하나의 ESD 보호부(3000)가 마련될 수 있다. 예를 들어, 제 1 캐패시터부(2000), ESD 보호부(3000) 및 제 2 캐패시터부(4000)가 시트(100)의 적층 방향, 즉 Z 방향으로 마련될 수 있다. 복수의 절연 시트(100)은 소정의 유전율, 예를 들어 10∼20000의 유전율을 가질 수 있다. 이러한 절연 시트(100)는 MLCC 등의 유전체 재료 분말, BaTiO3, BaCO3, TiO2, Nd2O3, Bi2O3, Zn0, Al2O3 중의 하나 이상을 포함하는 물질로 형성될 수 있다. 또한, 복수의 절연 시트(100)는 모두 동일 두께로 형성될 수 있고, 적어도 어느 하나가 다른 것들에 비해 두껍거나 얇게 형성될 수 있다. 즉, ESD 보호부(3000)의 절연 시트는 제 1 및 제 2 캐패시터부(2000, 4000)의 절연 시트와 다른 두께로 형성될 수 있고, ESD 보호부(3000)와 제 1 및 제 2 캐패시터(2000, 4000) 사이에 형성된 절연 시트가 다른 시트들과 다른 두께로 형성될 수 있다. 예를 들어, ESD 보호부(3000)와 제 1 및 제 2 캐패시터부(2000, 4000) 사이의 절연 시트, 즉 제 5 및 제 7 절연 시트(105, 107)의 두께는 ESD 보호부(3000)의 절연 시트, 즉 제 6 절연 시트(106)보다 얇거나 같은 두께로 형성되거나, 제 1 및 제 2 캐패시터부(2000, 4000)의 내부 전극 사이의 절연 시트(102 내지 104, 108 내지 110)보다 얇거나 같은 두께로 형성될 수 있다. 즉, ESD 보호부(3000)와 제 1 및 제 2 캐패시터부(2000, 4000) 사이의 간격은 제 1 및 제 2 캐패시터부(2000, 4000)의 내부 전극 사이의 간격보다 얇거나 같게 형성되거나, ESD 보호부(3000)의 두께보다 얇거나 같게 형성될 수 있다. 물론, 제 1 및 제 2 캐패시터(2000, 4000)의 절연 시트(102 내지 104, 108 내지 110)은 동일 두께로 형성될 수 있고, 어느 하나가 다른 하나보다 얇거나 두꺼울 수도 있다. 한편, 절연 시트들(100)은 ESD 인가 시 파괴되지 않는 두께, 예를 들어 5㎛∼300㎛의 두께로 형성될 수 있다. 또한, 적층체(1000)는 제 1 및 제 2 캐패시터부(2000, 4000)의 하부 및 상부에 각각 마련된 하부 커버층(미도시) 및 상부 커버층(미도시)을 더 포함할 수 있다. 물론, 제 1 절연 시트(101)가 하부 커버층으로 기능하고 제 11 절연 시트(111)가 상부 커버층으로 기능할 수도 있다. 하부 및 상부 커버층은 자성체 시트가 복수 적층되어 마련될 수 있으며, 동일 두께로 형성될 수 있다. 여기서, 자성체 시트로 이루어진 하부 및 상부 커버층의 최외곽, 즉 하부 및 상부 표면에 비자성 시트, 예를 들어 유리질의 시트가 더 형성될 수 있다. 또한, 하부 및 상부 커버층은 내부의 절연 시트들, 즉 제 2 내지 제 10 절연 시트(102 내지 110)보다 두꺼울 수 있다. 따라서, 제 1 및 제 11 절연 시트(101, 111)이 하부 및 상부 커버층으로 기능하는 경우 제 2 내지 제 10 절연 시트(102 내지 110)보다 두껍게 형성될 수 있다.The laminate 1000 is formed by stacking a plurality of insulating sheets 101 to 111; The laminate 1000 has a predetermined length in one direction (for example, the X direction) and another direction (for example, the Y direction) orthogonal thereto, and has a predetermined height in the vertical direction (for example, the Z direction). It may be provided in a substantially hexahedral shape having a. That is, when the forming direction of the external electrode 5000 is in the X direction, the direction orthogonal to this in the horizontal direction may be the Y direction, and the vertical direction may be the Z direction. Here, the length of the X direction is longer than the length of the Y direction and the length of the Z direction, the length of the Y direction may be equal to or different from the length of the Z direction. When the lengths of the Y and Z directions are different, the length of the Y direction may be shorter or longer than the length of the Z direction. For example, the ratio of the lengths in the X, Y, and Z directions may be 2 to 5: 1: 0.5 to 1. That is, the length of the X direction may be about 2 to 5 times longer than the length of the Y direction based on the length of the Y direction, and the length of the Z direction may be 0.5 to 1 times the length of the Y direction. However, the lengths of the X, Y, and Z directions may be variously modified according to the internal structure of the electronic device to which the discharge sensing device is connected, the shape of the discharge sensing device, and the like. In addition, at least one capacitor part 2000 and 4000 and at least one ESD protection part 3000 may be provided in the stack 1000. For example, the first capacitor part 2000, the ESD protection part 3000, and the second capacitor part 4000 may be provided in the stacking direction of the sheet 100, that is, the Z direction. The plurality of insulating sheets 100 may have a predetermined dielectric constant, for example, a dielectric constant of 10 to 20000. The insulating sheet 100 may be formed of a material including at least one of dielectric material powder such as MLCC, BaTiO 3 , BaCO 3 , TiO 2 , Nd 2 O 3 , Bi 2 O 3 , Zn0, and Al 2 O 3 . have. In addition, the plurality of insulating sheets 100 may all be formed to have the same thickness, and at least one may be formed thicker or thinner than the others. That is, the insulating sheet of the ESD protection unit 3000 may be formed to have a different thickness from the insulating sheets of the first and second capacitors 2000 and 4000, and the ESD protection unit 3000 and the first and second capacitors ( The insulating sheet formed between 2000 and 4000 may be formed to a different thickness from the other sheets. For example, the thickness of the insulating sheet, that is, the fifth and seventh insulating sheets 105 and 107 between the ESD protection unit 3000 and the first and second capacitor units 2000 and 4000 may be the ESD protection unit 3000. Thinner than or equal to the sixth insulating sheet 106, or between the insulating electrodes 102 to 104 and 108 to 110 between the internal electrodes of the first and second capacitor portions 2000 and 4000. It may be formed to be thin or the same thickness. That is, the distance between the ESD protection unit 3000 and the first and second capacitor parts 2000 and 4000 is formed to be thinner or the same as the distance between the internal electrodes of the first and second capacitor parts 2000 and 4000, or It may be formed thinner or the same as the thickness of the ESD protection unit 3000. Of course, the insulating sheets 102 to 104 and 108 to 110 of the first and second capacitors 2000 and 4000 may be formed to have the same thickness, and either one may be thinner or thicker than the other. Meanwhile, the insulating sheets 100 may be formed to have a thickness that is not destroyed when ESD is applied, for example, 5 μm to 300 μm. In addition, the laminate 1000 may further include a lower cover layer (not shown) and an upper cover layer (not shown) provided on the lower and upper portions of the first and second capacitor parts 2000 and 4000, respectively. Of course, the first insulating sheet 101 may function as the lower cover layer and the eleventh insulating sheet 111 may function as the upper cover layer. The lower and upper cover layers may be provided by stacking a plurality of magnetic sheets, and may have the same thickness. Here, a nonmagnetic sheet, for example, a glass sheet, may be further formed on the outermost portion of the lower and upper cover layers formed of the magnetic sheet, that is, the lower and upper surfaces. In addition, the lower and upper cover layers may be thicker than the insulating sheets therein, that is, the second to tenth insulating sheets 102 to 110. Therefore, when the first and eleventh insulating sheets 101 and 111 function as lower and upper cover layers, they may be thicker than the second to tenth insulating sheets 102 to 110.
제 1 캐패시터부(2000)는 ESD 보호부(3000)의 하측에 마련되며, 적어도 둘 이상의 내부 전극과, 이들 사이에 마련된 적어도 둘 이상의 절연 시트를 포함할 수 있다. 예를 들어, 제 1 캐패시터부(2000)는 제 1 내지 4 절연 시트(101 내지 104)와, 제 1 내지 4 절연 시트(101 내지 104) 상에 각각 형성된 제 1 내지 제 4 내부 전극(201 내지 204)를 포함할 수 있다. 제 1 내지 제 4 내부 전극(201 내지 204)는 예를 들어 1㎛∼10㎛의 두께로 형성할 수 있다. 여기서, 제 1 내지 제 4 내부 전극(201 내지 204)은 X 방향으로 서로 대향되도록 형성된 외부 전극(5100, 5200; 5000)과 일측이 연결되고 타측이 이격되도록 형성된다. 제 1 및 제 3 내부 전극(201, 203)은 제 1 및 제 3 절연 시트(101, 103) 상에 각각 소정 면적으로 형성되며, 일측이 제 1 외부 전극(5100)과 연결되고 타측이 제 2 외부 전극(5200)과 이격되도록 형성된다. 제 2 및 제 4 내부 전극(202, 204)는 제 2 및 제 4 절연 시트(102, 104) 상에 각각 소정 면적으로 형성되며 일측이 제 2 외부 전극(5200)과 연결되고 타측이 제 1 외부 전극(5100)과 이격되도록 형성된다. 즉, 제 1 내지 제 4 내부 전극(201 내지 204)는 외부 전극(5000)의 어느 하나와 교대로 연결되며 제 2 내지 제 4 절연 시트(202 내지 204)를 사이에 두고 소정 영역 중첩되도록 형성된다. 이때, 제 1 내지 제 4 내부 전극(201, 204)은 제 1 내지 제 4 절연 시트(101 내지 104) 각각의 면적 대비 10% 내지 85%의 면적으로 각각 형성된다. 또한, 제 1 내지 제 4 내부 전극(201 내지 204)은 이들 전극 각각의 면적 대비 10% 내지 85%의 면적으로 중첩되도록 형성된다. 한편, 제 1 내지 제 4 내부 전극(201 내지 204)은 예를 들어 정사각형, 직사각형, 소정의 패턴 형상, 소정 폭 및 간격을 갖는 스파이럴 형상 등 다양한 형상으로 형성될 수 있다. 이러한 제 1 캐패시터부(2000)는 제 1 내지 제 4 내부 전극(201 내지 204) 사이에 캐패시턴스가 각각 형성되며, 캐패시턴스는 제 1 내지 제 4 내부 전극(201 내지 204)의 중첩 면적, 절연 시트들(101 내지 104)의 두께 등에 따라 조절될 수 있다. 한편, 제 1 캐패시터부(2000)는 제 1 내지 제 4 내부 전극(201 내지 204) 이외에 적어도 하나 이상의 내부 전극이 더 형성되고, 적어도 하나의 내부 전극이 형성되는 적어도 하나의 절연 시트가 더 형성될 수도 있다. 또한, 제 1 캐패시터부(2000)는 두개의 내부 전극이 형성될 수도 있다. 즉, 본 실시 예는 제 1 캐패시터(2000)의 내부 전극이 네개 형성되는 것을 예로 설명하였으나, 내부 전극은 둘 이상 복수로 형성될 수 있다.The first capacitor part 2000 may be provided under the ESD protection part 3000, and may include at least two internal electrodes and at least two insulating sheets provided therebetween. For example, the first capacitor part 2000 may include the first to fourth insulating sheets 101 to 104 and the first to fourth internal electrodes 201 to 4 formed on the first to fourth insulating sheets 101 to 104, respectively. 204). The first to fourth internal electrodes 201 to 204 may be formed to have a thickness of, for example, 1 μm to 10 μm. Here, the first to fourth internal electrodes 201 to 204 are formed such that one side of the first to fourth internal electrodes 201 to 204 are opposite to each other in the X direction, and the other side thereof is spaced apart from each other. The first and third internal electrodes 201 and 203 are formed on predetermined areas on the first and third insulating sheets 101 and 103, respectively, and one side is connected to the first external electrode 5100 and the other side is second. It is formed to be spaced apart from the external electrode 5200. The second and fourth internal electrodes 202 and 204 are formed in predetermined areas on the second and fourth insulating sheets 102 and 104, respectively, and one side thereof is connected to the second external electrode 5200 and the other side thereof is the first external electrode. It is formed to be spaced apart from the electrode 5100. That is, the first to fourth internal electrodes 201 to 204 are alternately connected to any one of the external electrodes 5000, and are formed to overlap a predetermined region with the second to fourth insulating sheets 202 to 204 interposed therebetween. . In this case, the first to fourth internal electrodes 201 and 204 are respectively formed in an area of 10% to 85% of the area of each of the first to fourth insulating sheets 101 to 104. Further, the first to fourth internal electrodes 201 to 204 are formed to overlap with an area of 10% to 85% of the area of each of these electrodes. Meanwhile, the first to fourth internal electrodes 201 to 204 may be formed in various shapes such as a square, a rectangle, a predetermined pattern shape, a spiral shape having a predetermined width and spacing, and the like. In the first capacitor part 2000, capacitances are formed between the first to fourth internal electrodes 201 to 204, respectively, and the capacitances are overlapped areas of the first to fourth internal electrodes 201 to 204, and insulating sheets. It may be adjusted according to the thickness of the 101 (101 to 104). Meanwhile, in the first capacitor part 2000, at least one or more inner electrodes may be further formed in addition to the first to fourth inner electrodes 201 to 204, and at least one insulating sheet on which at least one inner electrode is formed may be further formed. It may be. In addition, two internal electrodes may be formed in the first capacitor part 2000. That is, the present embodiment has described that four internal electrodes of the first capacitor 2000 are formed as an example, but two or more internal electrodes may be formed.
ESD 보호부(3000)는 수직 방향으로 이격되어 형성된 적어도 두개의 방전 전극(310; 311, 312)과, 적어도 두개의 방전 전극(310) 사이에 마련된 적어도 하나의 ESD 보호층(320)을 포함할 수 있다. 예를 들어, ESD 보호부(3000)는 제 5 및 제 6 절연 시트(105, 106)와, 제 5 및 제 6 절연 시트(105, 106) 상에 각각 형성된 제 1 및 제 2 방전 전극(311, 312)과, 제 6 절연 시트(106)에 형성된 ESD 보호층(320)을 포함할 수 있다. 여기서, ESD 보호층(320)은 적어도 일부가 제 1 및 제 2 방전 전극(311, 312)과 접촉되도록 형성될 수 있다. 제 1 및 제 2 방전 전극(311, 312)은 캐패시터부(2000, 4000)의 내부 전극들(200)과 동일 두께로 형성될 수 있다. 예를 들어, 제 1 및 제 2 방전 전극(311, 312)은 1㎛∼10㎛의 두께로 형성할 수 있다. 그러나, 제 1 및 제 2 방전 전극(311, 312)은 캐패시터부(2000, 4000)의 내부 전극(200)보다 얇거나 두껍게 형성될 수도 있다. 또한, 제 1 및 제 2 방전 전극(311, 312)은 캐패시터부(2000, 4000)의 내부 전극들(200)보다 길이 및 폭이 작게 형성될 수 있다. 즉, 제 1 및 제 2 방전 전극(311, 312)은 X 방향으로 내부 전극들(200)보다 짧은 길이로 형성되고, Y 방향으로 내부 전극들(200)보다 좁은 폭으로 형성될 수 있다. 예를 들어, 제 1 및 제 2 방전 전극(311, 312)은 X 방향으로 내부 전극(200) 길이의 50% 내지 90%의 길이로 형성되고, Y 방향으로 내부 전극(200) 폭의 10% 내지 60%의 폭으로 형성될 수 있다. 한편, 제 1 방전 전극(311)은 제 1 외부 전극(5100)과 연결되어 제 5 절연 시트(105) 상에 형성되며 말단부가 ESD 보호층(320)과 연결되도록 형성된다. 제 2 방전 전극(312)은 제 2 외부 전극(5200)과 연결되어 제 6 절연 시트(106) 상에 형성되며 말단부가 ESD 보호층(320)과 연결되도록 형성된다. 여기서, 제 1 및 제 2 방전 전극(311, 312)의 ESD 보호층(320)과 접촉되는 영역은 ESD 보호층(320)과 적어도 일 영역이 동일 크기 또는 이보다 작게 형성될 수 있다. 즉, 제 1 및 제 2 방전 전극(311, 312)은 X 및 Y 방향으로 ESD 보호층(320)과 적어도 일부 중첩되도록 형성될 수 있다. 예를 들어, X 방향으로 제 1 및 제 2 방전 전극(311, 312)은 ESD 보호층(320)을 벗어나지 않고 완전히 중첩되어 형성될 수 있다. 따라서, X 방향으로 제 1 및 제 2 방전 전극(311, 312)의 가장자리는 ESD 보호층(320)의 가장자리와 수직 성분을 이룰 수 있다. 물론, 제 1 및 제 2 방전 전극(311, 312)은 X 방향으로 ESD 보호층(320)의 일부에 중첩되도록 형성될 수도 있다. 예를 들어, 제 1 및 제 2 방전 전극(311, 312)은 X 방향으로 ESD 보호층(320)의 수평 면적의 10% 내지 100% 중첩되도록 형성될 수 있다. 결국, 제 1 및 제 2 방전 전극(311, 312)은 ESD 보호층(320)을 벗어나게 형성되지 않는다. 또한, 제 1 및 제 2 방전 전극(311, 312)은 Y 방향으로 ESD 보호층(320)보다 작게 형성될 수 있다. 즉, 도 3에 도시된 바와 같이 제 1 및 제 2 방전 전극(311, 312)은 Y 방향으로 ESD 보호층(320)의 중앙부에 ESD 보호층(320)의 폭보다 작게 형성될 수 있다. 예를 들어, 제 1 및 제 2 방전 전극(311, 312)은 Y 방향으로 ESD 보호부(320) 폭의 10% 내지 95%의 폭으로 형성될 수 있다. 한편, 제 1 및 제 2 방전 전극(311, 312)은 ESD 보호층(320)과 접촉되는 일 영역이 접촉되지 않은 영역보다 크게 형성될 수 있다. ESD 보호층(320)은 제 6 절연 시트(106)의 소정 영역, 예를 들어 중심부에 형성되어 제 1 및 제 2 방전 전극(311, 312)과 연결될 수 있다. 이때, ESD 보호층(320)은 제 1 및 제 2 방전 전극(311, 312)과 적어도 일부 중첩되도록 형성될 수 있다. 예를 들어, ESD 보호층(320)은 제 1 및 제 2 방전 전극(311, 312)과 X 방향으로 10% 내지 100% 중첩되도록 형성되고, Y 방향으로 10% 내지 95% 정도 중첩되도록 형성될 수 있다. 따라서, ESD 보호층(320)은 제 1 및 제 2 방전 전극(311, 312)과 X 방향으로의 중첩 비율이 Y 방향으로의 중첩 비율보다 같거나 클 수 있다. 또한, ESD 보호층(320)은 Y 방향으로의 폭이 내부 전극(200)의 폭보다 작게 형성될 수 있다. 예를 들어, Y 방향의 ESD 보호층(320)의 폭은 내부 전극(200) 폭보다 40% 내지 90%의 폭으로 형성될 수 있다. 따라서, ESD 보호층(320)은 Y 방향으로 내부 전극(200)의 폭보다 작고 방전 전극(310)의 폭보다 크게 형성될 수 있다. 이러한 ESD 보호층(320)은 제 6 절연 시트(106)의 소정 영역, 예를 들어 중심부에 소정 크기의 관통홀을 형성하고 후막 인쇄 공정을 이용하여 관통홀의 적어도 일부에 ESD 보호 물질을 도포 또는 충진하여 형성될 수 있다. ESD 보호층(330)은 예를 들어 100㎛∼500㎛의 직경과 10㎛∼50㎛의 두께로 형성될 수 있다. 이때, ESD 보호층(320)의 두께가 얇을수록 방전 개시 전압이 낮아진다. 한편, ESD 보호층(320)은 도전성 물질과 절연성 물질을 이용하여 형성할 수 있다. 예를 들어, 도전성 세라믹과 절연성 세라믹의 혼합 물질을 제 6 절연 시트(106) 상에 인쇄하여 ESD 보호층(320)을 형성할 수 있다. 이러한 ESD 보호층(320)은 ESD 보호 물질이 적어도 일부 도포 또는 충진되어 형성될 수 있다. 예를 들어, ESD 보호층(320)은 단면이 사각형 등 다각형으로 형성되고 제 6 절연 시트(106)에 형성된 관통홀의 측면에 ESD 보호 물질이 도포되어 형성될 수 있고, 적어도 일부 영역에만 ESD 보호 물질이 도포 또는 충진되어 형성될 수도 있다. 또한, ESD 보호층(320)은 적어도 일 영역의 두께 및 폭의 적어도 어느 하나가 다른 영역과 다르게 형성될 수도 있다. 즉, ESD 보호층(320)은 X 방향의 폭 및 Y 방향으로의 폭이 Z 방향의 두께보다 크게 형성될 수도 있다. 예를 들어, ESD 보호층(320)은 X 방향 및 Y 방향으로의 폭이 Z 방향의 두께보다 큰 대략 타원형으로 형성될 수 있다. 그리고, ESD 보호층(320)은 적어도 일 영역의 두께가 다른 영역과 다를 수 있다. 예를 들어, X 방향 및 Y 방향의 중앙부의 상하 간격이 가장 크고, 그로부터 가장자리로 갈수록 상하 간격이 작아지는 형상으로 형성될 수 있다. 이때, 상하 간격이 가장 큰 영역과 상하 간격이 가장 작은 영역의 비율은 5:1 내지 2:1일 수 있다. 한편, ESD 보호층(320)은 적어도 하나의 절연 시트(100) 상에 형성될 수도 있다. 즉, 수직 방향으로 적층된 적어도 하나, 예를 들어 두개의 절연 시트(100)에 ESD 보호층(320)이 각각 형성되고, 그 절연 시트(100) 상에 서로 이격되도록 방전 전극이 형성되어 ESD 보호층(320)과 연결될 수 있다. ESD 보호층(320)의 구조, 재료 등의 보다 자세한 설명은 후술하도록 하겠다.The ESD protection unit 3000 may include at least two discharge electrodes 310 (311 and 312) formed in the vertical direction and at least one ESD protection layer 320 provided between the at least two discharge electrodes 310. Can be. For example, the ESD protection unit 3000 may include the first and second discharge electrodes 311 formed on the fifth and sixth insulating sheets 105 and 106 and the fifth and sixth insulating sheets 105 and 106, respectively. 312 and the ESD protection layer 320 formed on the sixth insulating sheet 106. Here, the ESD protection layer 320 may be formed so that at least a part thereof contacts the first and second discharge electrodes 311 and 312. The first and second discharge electrodes 311 and 312 may be formed to have the same thickness as the internal electrodes 200 of the capacitor parts 2000 and 4000. For example, the first and second discharge electrodes 311 and 312 may be formed to a thickness of 1 μm to 10 μm. However, the first and second discharge electrodes 311 and 312 may be formed thinner or thicker than the internal electrodes 200 of the capacitor parts 2000 and 4000. In addition, the first and second discharge electrodes 311 and 312 may be formed to have a smaller length and width than the internal electrodes 200 of the capacitor parts 2000 and 4000. That is, the first and second discharge electrodes 311 and 312 may be formed to have a shorter length than the internal electrodes 200 in the X direction, and have a narrower width than the internal electrodes 200 in the Y direction. For example, the first and second discharge electrodes 311 and 312 are formed to have a length of 50% to 90% of the length of the internal electrode 200 in the X direction, and 10% of the width of the internal electrode 200 in the Y direction. To 60% in width. Meanwhile, the first discharge electrode 311 is connected to the first external electrode 5100 to be formed on the fifth insulating sheet 105, and the end portion thereof is connected to the ESD protection layer 320. The second discharge electrode 312 is connected to the second external electrode 5200 to be formed on the sixth insulating sheet 106, and the end portion thereof is connected to the ESD protection layer 320. In this case, an area in contact with the ESD protection layer 320 of the first and second discharge electrodes 311 and 312 may have the same size or smaller size than the ESD protection layer 320. That is, the first and second discharge electrodes 311 and 312 may be formed to at least partially overlap the ESD protection layer 320 in the X and Y directions. For example, the first and second discharge electrodes 311 and 312 in the X direction may be completely overlapped without leaving the ESD protection layer 320. Accordingly, the edges of the first and second discharge electrodes 311 and 312 in the X direction may form a vertical component with the edges of the ESD protection layer 320. Of course, the first and second discharge electrodes 311 and 312 may be formed to overlap a portion of the ESD protection layer 320 in the X direction. For example, the first and second discharge electrodes 311 and 312 may be formed to overlap 10% to 100% of the horizontal area of the ESD protection layer 320 in the X direction. As a result, the first and second discharge electrodes 311 and 312 are not formed beyond the ESD protection layer 320. In addition, the first and second discharge electrodes 311 and 312 may be formed smaller than the ESD protection layer 320 in the Y direction. That is, as shown in FIG. 3, the first and second discharge electrodes 311 and 312 may be formed to be smaller than the width of the ESD protection layer 320 in the central portion of the ESD protection layer 320 in the Y direction. For example, the first and second discharge electrodes 311 and 312 may be formed to have a width of 10% to 95% of the width of the ESD protection part 320 in the Y direction. Meanwhile, the first and second discharge electrodes 311 and 312 may be formed to have a larger area than one in contact with the ESD protection layer 320. The ESD protection layer 320 may be formed in a predetermined region, for example, a central portion of the sixth insulating sheet 106 and connected to the first and second discharge electrodes 311 and 312. In this case, the ESD protection layer 320 may be formed to at least partially overlap the first and second discharge electrodes 311 and 312. For example, the ESD protection layer 320 may be formed to overlap 10% to 100% in the X direction with the first and second discharge electrodes 311 and 312, and may be formed to overlap 10% to 95% in the Y direction. Can be. Accordingly, the ESD protection layer 320 may have an overlap ratio in the X direction with the first and second discharge electrodes 311 and 312 in the X direction or greater than the overlap ratio in the Y direction. In addition, the width of the ESD protection layer 320 in the Y direction may be smaller than the width of the internal electrode 200. For example, the width of the ESD protection layer 320 in the Y direction may be 40% to 90% wider than the width of the internal electrode 200. Accordingly, the ESD protection layer 320 may be formed smaller than the width of the internal electrode 200 in the Y direction and larger than the width of the discharge electrode 310. The ESD protection layer 320 forms a through hole having a predetermined size in a predetermined area, for example, a central portion of the sixth insulating sheet 106, and applies or fills an ESD protection material to at least a portion of the through hole by using a thick film printing process. Can be formed. The ESD protection layer 330 may be formed, for example, with a diameter of 100 μm to 500 μm and a thickness of 10 μm to 50 μm. In this case, the thinner the thickness of the ESD protection layer 320, the lower the discharge start voltage. Meanwhile, the ESD protection layer 320 may be formed using a conductive material and an insulating material. For example, the ESD protection layer 320 may be formed by printing a mixed material of the conductive ceramic and the insulating ceramic on the sixth insulating sheet 106. The ESD protection layer 320 may be formed by applying or filling at least a portion of an ESD protection material. For example, the ESD protection layer 320 may have a polygonal cross section, and may be formed by applying an ESD protection material to a side surface of the through hole formed in the sixth insulating sheet 106, and the ESD protection material only in at least some regions. It may be formed by coating or filling. In addition, at least one of the thickness and the width of at least one region may be formed differently from the other region of the ESD protection layer 320. That is, the ESD protection layer 320 may have a width in the X direction and a width in the Y direction larger than the thickness in the Z direction. For example, the ESD protection layer 320 may be formed in a substantially elliptical shape whose width in the X direction and the Y direction is larger than the thickness in the Z direction. In addition, the ESD protection layer 320 may have a thickness different from at least one region. For example, it may be formed in a shape in which the vertical gap of the central portion in the X direction and the Y direction is greatest, and the vertical gap decreases toward the edge thereof. In this case, the ratio of the region having the largest vertical gap and the region having the smallest vertical gap may be 5: 1 to 2: 1. Meanwhile, the ESD protection layer 320 may be formed on at least one insulating sheet 100. That is, the ESD protection layers 320 are formed on at least one of the insulating sheets 100 stacked in the vertical direction, for example, and the discharge electrodes are formed on the insulating sheet 100 so as to be spaced apart from each other. May be connected to the layer 320. The structure, material, and the like of the ESD protection layer 320 will be described later.
제 2 캐패시터부(4000)는 ESD 보호부(3000)의 상측에 마련되며, 적어도 둘 이상의 내부 전극과, 이들 사이에 마련된 적어도 둘 이상의 절연 시트를 포함할 수 있다. 예를 들어, 제 2 캐패시터부(2000)는 제 7 내지 제 10 절연 시트(107 내지 110)와, 제 7 내지 제 10 절연 시트(107 내지 110) 상에 각각 형성된 제 5 내지 제 8 내부 전극(205 내지 208)을 포함할 수 있다. 여기서, 제 5 내지 제 8 내부 전극(205 내지 208)은 X 방향으로 서로 대향되도록 형성된 외부 전극(5100, 5200; 5000)과 일측이 연결되고 타측이 이격되도록 형성된다. 제 5 및 제 7 내부 전극(205, 207)은 제 7 및 제 9 절연 시트(107, 109) 상에 소정 면적으로 형성되며, 일측이 제 1 외부 전극(5100)과 연결되고 타측이 제 2 외부 전극(5200)과 이격되도록 형성된다. 제 6 및 제 8 내부 전극(206, 208)는 제 8 및 제 10 절연 시트(108, 110) 상에 각각 소정 면적으로 형성되며 일측이 제 2 외부 전극(5200)과 연결되고 타측이 제 1 외부 전극(5100)과 이격되도록 형성된다. 즉, 제 5 내지 제 8 내부 전극(205 내지 108)이 외부 전극(5000)의 어느 하나와 교대로 연결되며 제 8 내지 제 10 절연 시트(208 내지 110)를 사이에 두고 소정 영역 중첩되도록 형성된다. 이때, 제 5 내지 제 8 내부 전극(205 내지 208)은 제 7 내지 제 10 절연 시트(107 내지 110) 각각의 면적 대비 10% 내지 85%의 면적으로 각각 형성된다. 또한, 제 5 내지 제 8 내부 전극(205 내지 208)은 이들 전극 각각의 면적 대비 10% 내지 85%의 면적으로 중첩되도록 형성된다. 또한, 제 5 내지 제 8 내부 전극(205 내지 208)은 예를 들어 1㎛∼10㎛의 두께로 형성할 수 있다. 한편, 제 5 내지 제 8 내부 전극(205 내지 208)은 예를 들어 정사각형, 직사각형, 소정의 패턴 형상, 소정 폭 및 간격을 갖는 스파이럴 형상 등 다양한 형상으로 형성될 수 있다. 이러한 제 2 캐패시터부(4000)는 제 5 내지 제 8 내부 전극(205 내지 208) 사이에 캐패시턴스가 각각 형성되며, 캐패시턴스는 제 5 내지 제 8 내부 전극(205 내지 208)의 중첩 면적, 절연 시트들(108 내지 110)의 두께 등에 따라 조절될 수 있다. 한편, 제 2 캐패시터부(4000)는 제 3 및 제 4 내부 전극(203, 204) 이외에 적어도 하나 이상의 내부 전극이 더 형성되고, 적어도 하나의 내부 전극이 형성되는 적어도 하나의 절연 시트가 더 형성될 수도 있다. 또한, 제 2 캐패시터부(4000)는 두개의 내부 전극이 형성될 수도 있다. 즉, 본 실시 예는 제 2 캐패시터(4000)의 내부 전극이 네개 형성되는 것을 예로 설명하였으나, 내부 전극은 둘 이상 복수로 형성될 수 있다.The second capacitor part 4000 may be provided above the ESD protection part 3000 and may include at least two or more internal electrodes and at least two or more insulating sheets provided therebetween. For example, the second capacitor part 2000 may include fifth to eighth internal electrodes formed on the seventh to tenth insulating sheets 107 to 110 and the seventh to tenth insulating sheets 107 to 110, respectively. 205 to 208). Here, the fifth to eighth internal electrodes 205 to 208 are formed such that one side of the fifth to eighth internal electrodes 205 to 208 is opposite to each other in the X direction, and the other side thereof is spaced apart from each other. The fifth and seventh internal electrodes 205 and 207 are formed on the seventh and ninth insulating sheets 107 and 109 in predetermined areas, one side of which is connected to the first external electrode 5100 and the other side of which is the second external. It is formed to be spaced apart from the electrode 5200. The sixth and eighth internal electrodes 206 and 208 are formed in predetermined areas on the eighth and tenth insulating sheets 108 and 110, respectively, and one side of the sixth and eighth internal electrodes 206 and 208 is connected to the second external electrode 5200 and the other side of the first external electrode. It is formed to be spaced apart from the electrode 5100. That is, the fifth to eighth internal electrodes 205 to 108 are alternately connected to any one of the external electrodes 5000, and are formed to overlap a predetermined area with the eighth to tenth insulating sheets 208 to 110 interposed therebetween. . In this case, the fifth to eighth internal electrodes 205 to 208 are respectively formed with an area of 10% to 85% of the area of each of the seventh to tenth insulating sheets 107 to 110. In addition, the fifth to eighth internal electrodes 205 to 208 are formed to overlap with an area of 10% to 85% of the area of each of these electrodes. In addition, the fifth to eighth internal electrodes 205 to 208 may be formed to have a thickness of, for example, 1 μm to 10 μm. On the other hand, the fifth to eighth internal electrodes 205 to 208 may be formed in various shapes such as square, rectangular, predetermined pattern shape, spiral shape having a predetermined width and spacing. In the second capacitor part 4000, capacitances are formed between the fifth to eighth internal electrodes 205 to 208, respectively, and the capacitances are overlapped areas of the fifth to eighth internal electrodes 205 to 208, and insulating sheets. 108 to 110, etc., to adjust the thickness. Meanwhile, in the second capacitor part 4000, at least one or more internal electrodes are further formed in addition to the third and fourth internal electrodes 203 and 204, and at least one insulating sheet on which at least one internal electrode is formed is further formed. It may be. In addition, two internal electrodes may be formed in the second capacitor part 4000. That is, the present embodiment has described that four internal electrodes of the second capacitor 4000 are formed as an example. However, two or more internal electrodes may be formed.
한편, 제 1 캐패시터부(2000)의 내부 전극들(201 내지 204)과 제 2 캐패시터부(4000)의 내부 전극들(205 내지 208)은 동일 형상 및 동일 면적으로 형성될 수 있고, 중첩 면적 또한 동일할 수 있다. 또한, 제 1 캐패시터부(2000)의 절연 시트들(101 내지 104)와 제 2 캐패시터부(4000)의 절연 시트들(107 내지 110)은 동일 두께를 가질 수 있다. 이때, 제 1 절연 시트(101)가 하부 커버층으로 기능할 경우 제 1 절연 시트(101)는 나머지 절연 시트들에 비해 두껍게 형성될 수 있다. 따라서, 제 1 및 제 2 캐패시터부(2000, 4000)는 캐패시턴스가 동일할 수 있다. 그러나, 제 1 및 제 2 캐패시터부(2000, 4000)는 캐패시턴스가 다를 수 있으며, 이 경우 내부 전극의 면적, 내부 전극의 중첩 면적, 절연 시트의 두께의 적어도 어느 하나가 서로 다를 수 있다. 또한, 캐패시터부(2000, 4000)의 내부 전극(201 내지 208)는 ESD 보호부(3000)의 방전 전극(310)보다 길고 넓게 형성될 수 있다. 즉, 도 2에 도시된 바와 같이 내부 전극(200)은 X 방향으로 방전 전극(310)보다 길게 형성되고, 도 3에 도시된 바와 같이 이와 직교하는 Y 방향으로 방전 전극(310)보다 넓게 형성된다. 또한, ESD 보호층(320)의 Y 방향으로의 폭이 방전 전극(310)의 폭보다 크고 내부 전극(200)의 폭보다 작게 형성될 수 있다. 따라서, 내부 전극(200)은 방전 전극(310)보다 큰 면적으로 형성될 수 있다. Meanwhile, the internal electrodes 201 to 204 of the first capacitor part 2000 and the internal electrodes 205 to 208 of the second capacitor part 4000 may be formed in the same shape and the same area, and the overlapping area may also be May be the same. In addition, the insulating sheets 101 to 104 of the first capacitor part 2000 and the insulating sheets 107 to 110 of the second capacitor part 4000 may have the same thickness. In this case, when the first insulating sheet 101 functions as a lower cover layer, the first insulating sheet 101 may be thicker than the other insulating sheets. Therefore, the first and second capacitor parts 2000 and 4000 may have the same capacitance. However, the first and second capacitor parts 2000 and 4000 may have different capacitances. In this case, at least one of the area of the inner electrode, the overlapping area of the inner electrode, and the thickness of the insulating sheet may be different. In addition, the internal electrodes 201 to 208 of the capacitor parts 2000 and 4000 may be formed longer and wider than the discharge electrode 310 of the ESD protection part 3000. That is, as shown in FIG. 2, the internal electrode 200 is formed longer than the discharge electrode 310 in the X direction, and is wider than the discharge electrode 310 in the Y direction orthogonal to this as shown in FIG. 3. . In addition, the width of the ESD protection layer 320 in the Y direction may be greater than the width of the discharge electrode 310 and smaller than the width of the internal electrode 200. Therefore, the internal electrode 200 may be formed to have a larger area than the discharge electrode 310.
외부 전극(5100, 5200; 5000)는 적층체(1000)의 서로 대향되는 두 측면에 마련되어 제 1 및 제 2 캐패시터부(2000, 4000)와 ESD 보호부(3000)의 내부 전극과 연결된다. 이러한 외부 전극(5000)은 적어도 하나의 층으로 형성될 수 있다. 외부 전극(5000)은 Ag 등의 금속층으로 형성될 수 있고, 금속층 상에 적어도 하나의 도금층이 형성될 수도 있다. 예를 들어, 외부 전극(5000)은 구리층, Ni 도금층 및 Sn 또는 Sn/Ag 도금층이 적층 형성될 수도 있다. 또한, 외부 전극(5000)은 예를 들어 0.5%∼20%의 Bi2O3 또는 SiO2를 주성분으로 하는 다성분계의 글래스 프릿(Glass frit)을 금속 분말과 혼합하여 형성할 수 있다. 이때, 글래스 프릿과 금속 분말의 혼합물은 페이스트 형태로 제조되어 적층체(1000)의 두면에 도포될 수 있다. 이렇게 외부 전극(5000)에 글래스 프릿이 포함됨으로써 외부 전극(5000)과 적층체(1000)의 밀착력을 향상시킬 수 있고, 내부 전극(200)과 외부 전극(5000)의 콘택 반응을 향상시킬 수 있다. 또한, 글래스가 포함된 도전성 페이스트가 도포된 후 그 상부에 적어도 하나의 도금층이 형성되어 외부 전극(5000)이 형성될 수 있다. 즉, 글래스가 포함된 금속층과, 그 상부에 적어도 하나의 도금층이 형성되어 외부 전극(5000)이 형성될 수 있다. 예를 들어, 외부 전극(5000)은 글래스 프릿과 Ag 및 Cu의 적어도 하나가 포함된 층을 형성한 후 전해 또는 무전해 도금을 통하여 Ni 도금층 및 Sn 도금층 순차적으로 형성할 수 있다. 이때, Sn 도금층은 Ni 도금층과 같거나 두꺼운 두께로 형성될 수 있다. 한편, 외부 전극(5000)은 2㎛∼100㎛의 두께로 형성될 수 있으며, Ni 도금층이 1㎛∼10㎛의 두께로 형성되고, Sn 또는 Sn/Ag 도금층은 2㎛∼10㎛의 두께로 형성될 수 있다.The external electrodes 5100, 5200; 5000 are provided on two opposite sides of the stack 1000 to be connected to the first and second capacitor parts 2000 and 4000 and the internal electrodes of the ESD protection part 3000. The external electrode 5000 may be formed of at least one layer. The external electrode 5000 may be formed of a metal layer such as Ag, and at least one plating layer may be formed on the metal layer. For example, the external electrode 5000 may be formed by stacking a copper layer, a Ni plating layer, and a Sn or Sn / Ag plating layer. In addition, the external electrode 5000 may be formed by mixing, for example, a multicomponent glass frit having 0.5% to 20% of Bi 2 O 3 or SiO 2 as a main component with a metal powder. In this case, the mixture of the glass frit and the metal powder may be prepared in a paste form and applied to two surfaces of the laminate 1000. As the glass frit is included in the external electrode 5000, the adhesion between the external electrode 5000 and the stack 1000 may be improved, and the contact reaction between the internal electrode 200 and the external electrode 5000 may be improved. . In addition, after the conductive paste containing glass is applied, at least one plating layer may be formed on the upper portion thereof to form the external electrode 5000. That is, the metal layer including the glass and at least one plating layer formed thereon may form the external electrode 5000. For example, the external electrode 5000 may form a Ni plated layer and a Sn plated layer sequentially through electrolytic or electroless plating after forming a layer including glass frit and Ag and Cu. In this case, the Sn plating layer may be formed to the same or thicker thickness than the Ni plating layer. Meanwhile, the external electrode 5000 may be formed to have a thickness of 2 μm to 100 μm, the Ni plating layer may be formed to have a thickness of 1 μm to 10 μm, and the Sn or Sn / Ag plating layer may have a thickness of 2 μm to 10 μm. Can be formed.
또한, 외부 전극(5000)을 형성하기 이전에 적층체의 표면에 산화물 분말을 분포시킬 수 있다. 이때, 산화물 분말은 외부 전극(5000)의 일부를 인쇄 공정으로 형성하기 이전에 분포시킬 수도 있고, 도금 공정을 실시하기 이전에 형성할 수도 있다. 즉, 산화물 분말은 도금 공정으로 외부 전극(5000)을 형성할 때 도금 공정 이전에 적층체 표면에 분포될 수 있다. 이렇게 도금 공정 이전에 산화물 분말을 분포시킴으로써 적층체 표면의 저항을 균일하게 할 수 있고, 그에 따라 도금 공정이 균일하게 실시될 수 있다. 즉, 적층체의 표면은 적어도 일 영역의 저항이 다른 영역의 저항과 다를 수 있는데, 예를 들어 도금 공정 시 저항이 낮은 영역에 저항이 높은 영역보다 도금이 잘 진행되어 도금층의 성장 불균일이 발생된다. 따라서, 이러한 문제를 해결하기 위해 적층체의 표면 저항을 균일하게 유지해야 하고, 이를 위해 적층체의 표면에 산화물 분말을 분산시킬 수 있다. 이때, 산화물 분말은 적층체의 표면에 전체적으로 분포되어 막 형태로 형성될 수 있고, 적층체의 표면에 부분적으로 분포될 수도 있으며, 적어도 일 영역에 막 형태로 형성되고 적어도 일 영역에 부분적으로 분포될 수도 있다. 예를 들어, 산화물 분말이 적층체의 전체 표면에 분포되고, 산화물 분말이 연결되어 소정 두께의 산화물 막이 형성될 수 있다. 이때, 적층체 표면에 산화물 막이 형성되므로 적층체의 표면은 노출되지 않을 수 있다. 또한, 산화물 분말이 적층체의 표면에 섬(island) 형태로 분포될 수 있다. 즉, 적층체 표면에 산화물 분말이 서로 이격되어 섬 형태로 분포될 수 있고, 그에 따라 적층체 표면의 적어도 일부가 노출될 수 있다. 그리고, 산화물 분말은 적어도 일 영역에는 막 형태로 형성되고, 적어도 일부에는 섬 형태로 분포될 수 있다. 즉, 적어도 둘 이상의 산화물 분말이 연결되어 적어도 일 영역에는 막으로 형성되고, 적어도 일부에는 섬 형태로 형성될 수 있다. 따라서, 적층체 표면의 적어도 일부가 산화물 분말에 의해 노출될 수 있다. 적어도 일부에 섬 형태로 분포되는 산화물 분말의 총 면적은 적층체 표면 전체 면적의 예를 들어 10% 내지 80%일 수 있다. 여기서, 적층체의 표면 저항을 균일하게 하기 위한 산화물 분말은 적어도 하나 이상의 금속 산화물이 이용될 수 있는데, 예를 들어 Bi2O3, BO2, B2O3, ZnO, Co3O4, SiO2, Al2O3, MnO를 포함하는 물질의 적어도 하나 이상을 이용할 수 있다.In addition, the oxide powder may be distributed on the surface of the laminate before the external electrode 5000 is formed. In this case, the oxide powder may be distributed before forming a part of the external electrode 5000 by the printing process, or may be formed before performing the plating process. That is, the oxide powder may be distributed on the surface of the laminate before the plating process when the external electrode 5000 is formed by the plating process. Thus, by distributing the oxide powder before the plating process, the resistance of the surface of the laminate can be made uniform, whereby the plating process can be performed uniformly. That is, the surface of the laminate may be different from the resistance of other regions of at least one region. For example, in the plating process, the plating proceeds better than the region of high resistance in the region of low resistance, resulting in uneven growth of the plating layer. . Therefore, in order to solve this problem, the surface resistance of the laminate must be kept uniform, and for this purpose, the oxide powder can be dispersed on the surface of the laminate. In this case, the oxide powder may be distributed on the surface of the laminate as a whole, and may be formed in a film form, or may be partially distributed on the surface of the laminate, and may be formed in a film form in at least one region and partially distributed in at least one region. It may be. For example, the oxide powder may be distributed over the entire surface of the laminate, and the oxide powder may be connected to form an oxide film having a predetermined thickness. At this time, since the oxide film is formed on the surface of the laminate, the surface of the laminate may not be exposed. In addition, the oxide powder may be distributed in the form of islands on the surface of the laminate. That is, the oxide powders may be spaced apart from each other and distributed in an island form on the surface of the laminate, whereby at least a portion of the laminate surface may be exposed. The oxide powder may be formed in a film form in at least one region and distributed in an island form in at least a portion thereof. That is, at least two oxide powders may be connected to each other to form a film in at least one region and may be formed in an island form at least in part. Thus, at least a portion of the laminate surface may be exposed by the oxide powder. The total area of the oxide powder distributed in at least a portion in island form may be, for example, 10% to 80% of the total area of the laminate surface. Here, at least one or more metal oxides may be used as the oxide powder for making the surface resistance of the laminate uniform, for example, Bi 2 O 3 , BO 2 , B 2 O 3 , ZnO, Co 3 O 4 , SiO At least one or more of materials containing 2 , Al 2 O 3 , MnO may be used.
여기서, ESD 보호부(3000)와 캐패시터부(2000, 4000) 사이의 거리는 캐패시터부(2000, 4000) 내의 두 내부 전극 사이의 거리보다 짧거나 같을 수 있다. 즉, ESD 보호부(3000)와 캐패시터부(2000, 4000) 사이에 위치한 제 5 및 제 7 절연 시트(105, 107)의 각각의 두께는 캐패시터부(2000, 4000) 내의 내부 전극(200) 사이에 위치한 절연 시트들(102 내지 104, 107 내지 110)의 두께보다 얇거나 같을 수 있다. 또한, ESD 보호부(3000)와 캐패시터부(2000, 4000) 사이의 거리는 ESD 보호부(3000)의 두 방전 전극(310) 사이의 거리보다 짧거나 같을 수 있다. 즉, ESD 보호부(3000)와 캐패시터부(2000, 4000) 사이에 위치한 제 5 및 제 7 절연 시트(105, 107)의 각각의 두께는 ESD 보호층(320)이 형성된 제 6 절연 시트(106)의 두께보다 얇거나 같을 수 있다. 결국, ESD 보호부(3000)와 캐패시터부(2000, 4000) 사이에 위치한 제 5 및 제 7 절연 시트(105, 107)의 각각의 두께는 캐패시터부(2000, 4000) 내의 내부 전극(200) 사이에 위치한 절연 시트들(102 내지 104, 107 내지 110)의 두께보다 얇거나 같은 두께로 형성되거나, ESD 보호부(3000)의 두 방전 전극(310) 사이의 거리(B)보다 얇거나 같은 두께로 형성될 수 있다. 즉, ESD 보호부(3000)와 캐패시터부(2000, 4000) 사이의 거리를 A1 및 A2, 캐패시터부(2000, 4000) 내의 두 내부 전극 사이의 거리를 C1 및 C2, 그리고 ESD 보호부(3000)의 두 방전 전극(300) 사이의 거리를 B라 할 때 A1=A2≤C1=C2 또는 A1=A2≤B일 수 있다. 물론, A1과 A2, 그리고 C1과 C2는 같지 않을 수도 있다. 한편, 최하층 및 최상층의 절연 시트, 즉 제 1 및 제 11 절연 시트(101, 111)의 두께는 각각 10㎛ 이상 적층체(1000) 두께의 50% 이하일 수 있다. 이때, 제 1 및 제 11 절연 시트(101, 111)의 두께를 각각 D1 및 D2라 할 때 B≤D1=D2일 수 있으며, D1과 D2가 다를 수도 있다.Here, the distance between the ESD protection unit 3000 and the capacitors 2000 and 4000 may be shorter or equal to the distance between two internal electrodes in the capacitors 2000 and 4000. That is, the thickness of each of the fifth and seventh insulating sheets 105 and 107 positioned between the ESD protection unit 3000 and the capacitor units 2000 and 4000 is between the internal electrodes 200 in the capacitor units 2000 and 4000. It may be thinner than or equal to the thickness of the insulating sheets 102 to 104 and 107 to 110 located at. In addition, the distance between the ESD protection unit 3000 and the capacitor units 2000 and 4000 may be shorter or equal to the distance between the two discharge electrodes 310 of the ESD protection unit 3000. That is, the thickness of each of the fifth and seventh insulating sheets 105 and 107 disposed between the ESD protection unit 3000 and the capacitor units 2000 and 4000 may be the sixth insulating sheet 106 on which the ESD protection layer 320 is formed. Thinner than or equal to the thickness of As a result, each of the thicknesses of the fifth and seventh insulating sheets 105 and 107 positioned between the ESD protection unit 3000 and the capacitor units 2000 and 4000 is between the internal electrodes 200 in the capacitor units 2000 and 4000. Thinner than or equal to the thickness of the insulating sheets 102 to 104 and 107 to 110, or thinner than or equal to the distance B between the two discharge electrodes 310 of the ESD protection unit 3000. Can be formed. That is, the distance between the ESD protection unit 3000 and the capacitor units 2000 and 4000 is A1 and A2, and the distance between the two internal electrodes in the capacitor units 2000 and 4000 is C1 and C2, and the ESD protection unit 3000 is used. When the distance between two discharge electrodes 300 of B is A1 = A2 ≦ C1 = C2 or A1 = A2 ≦ B. Of course, A1 and A2 and C1 and C2 may not be the same. Meanwhile, the thicknesses of the lowermost and uppermost insulating sheets, that is, the first and eleventh insulating sheets 101 and 111 may be 10 μm or more and 50% or less of the thickness of the laminate 1000, respectively. In this case, when the thicknesses of the first and eleventh insulating sheets 101 and 111 are D1 and D2, respectively, B ≦ D1 = D2, and D1 and D2 may be different.
한편, 본 발명의 제 1 실시 예는 적층체(1000) 내에 하나의 ESD 보호층(320)을 구비하는 ESD 보호부(3000)가 마련된 경우를 설명하였으나, ESD 보호층(320)이 둘 이상 복수 마련될 수도 있어 ESD 보호부(3000)가 복수 마련될 수도 있다. 예를 들어, 수직 방향으로 ESD 보호층(320)이 적어도 둘 이상 형성되고 ESD 보호층(320) 사이에 방전 전극이 더 형성되어 하나의 감전 방지 소자가 적어도 하나의 캐패시터와 둘 이상의 ESD 보호부로 이루어질 수 있다. 또한, 캐패시터부(2000, 4000)의 내부 전극들(200)과 ESD 보호부(3000)의 방전 전극(310) 및 ESD 보호층(320)이 Y 방향으로 적어도 둘 이상 형성될 수 있다. 따라서, 하나의 적층체(1000) 내에 복수의 감전 방지 소자가 병렬로 마련될 수도 있다.Meanwhile, although the first embodiment of the present invention has been described in which the ESD protection unit 3000 including one ESD protection layer 320 is provided in the stack 1000, two or more ESD protection layers 320 are provided. In some embodiments, a plurality of ESD protection units 3000 may be provided. For example, at least two ESD protection layers 320 are formed in a vertical direction, and a discharge electrode is further formed between the ESD protection layers 320 so that an electric shock prevention device includes at least one capacitor and two or more ESD protection parts. Can be. In addition, at least two internal electrodes 200 of the capacitor parts 2000 and 4000, a discharge electrode 310 of the ESD protection part 3000, and an ESD protection layer 320 may be formed in the Y direction. Accordingly, a plurality of electric shock prevention devices may be provided in one laminate 1000 in parallel.
또한, 감전 방지 소자는 일 방향, 즉 X 방향으로의 길이(L)가 0.3㎜∼1.1㎜이고, 이와 직교하는 타 방향, 즉 Y 방향으로의 폭(W)이 0.15㎜∼0.55㎜이며, 높이, 즉 Z 방향으로의 두께가 0.15㎜∼0.55㎜일 수 있다. 예를 들어, 감전 방지 소자는 길이, 폭 및 두께가 각각 0.9㎜∼1.1㎜, 0.45㎜∼0.55㎜ 및 0.45㎜∼0.55㎜일 수 있고, 0.55㎜∼0.65㎜, 0.25㎜∼0.35㎜ 및 0.25㎜∼0.35㎜일 수 있으며, 0.35㎜∼0.45㎜, 0.15㎜∼0.25㎜ 및 0.15㎜∼0.25㎜일 수 있다. 즉, 감전 방지 소자는 길이:너비:두께의 비율이 2∼3:1∼2:1∼2로 구성될 수 있다. 바람직하게는 길이×너비×두께가 1.0㎜×0.5㎜×0.5㎜, 0.6㎜×0.3㎜×0.3㎜ 및 0.4㎜×0.2㎜×0.2㎜일 수 있다. 즉, 감전 방지 소자는 길이:너비:두께의 비율이 2:1:1로 구성될 수 있다. 이러한 소자의 디멘젼(dimension)은 전형적인 SMT용 소자 규격을 따른다. 이때, ESD 보호층(320)은 소자의 사이즈에 따라 예를 들어 50㎛∼500㎛의 폭과 5㎛∼50㎛의 두께로 형성될 수 있다. 예를 들어, 길이×너비×두께가 1.0㎜×0.5㎜×0.5㎜, 0.6㎜×0.3㎜×0.3㎜ 및 0.4㎜×0.2㎜×0.2㎜인 소자에서 ESD 보호층(320)은 50㎛∼450㎛의 폭과 5㎛∼50㎛의 두께로 형성될 수 있다.Further, the electric shock prevention device has a length L of 0.3 mm to 1.1 mm in one direction, that is, an X direction, and a width W of 0.15 mm to 0.55 mm in the other direction, ie, the Y direction, which is perpendicular thereto. That is, the thickness in the Z direction may be 0.15 mm to 0.55 mm. For example, the electric shock prevention device may have a length, a width, and a thickness of 0.9 mm to 1.1 mm, 0.45 mm to 0.55 mm, and 0.45 mm to 0.55 mm, respectively, 0.55 mm to 0.65 mm, 0.25 mm to 0.35 mm, and 0.25 mm, respectively. 0.35 mm to 0.45 mm, 0.15 mm to 0.25 mm and 0.15 mm to 0.25 mm. That is, the electric shock prevention device may have a length: width: thickness ratio of 2 to 3: 1 to 2: 1 to 2. Preferably, the length × width × thickness may be 1.0 mm × 0.5 mm × 0.5 mm, 0.6 mm × 0.3 mm × 0.3 mm, and 0.4 mm × 0.2 mm × 0.2 mm. That is, the electric shock prevention device may have a length: width: thickness ratio of 2: 1: 1. The dimensions of these devices follow typical device specifications for SMT. In this case, the ESD protection layer 320 may be formed to have a width of 50 μm to 500 μm and a thickness of 5 μm to 50 μm, depending on the size of the device. For example, in a device having a length x width x thickness of 1.0 mm x 0.5 mm x 0.5 mm, 0.6 mm x 0.3 mm x 0.3 mm, and 0.4 mm x 0.2 mm x 0.2 mm, the ESD protection layer 320 is 50 µm to 450. It may be formed to a width of 5㎛ and a thickness of 5㎛ to 50㎛.
도 5 및 도 6은 본 발명의 일 실시 예의 감전 방지 소자의 ESD 보호층(320)의 단면 개략도 및 단면 사진이다. 즉, ESD 보호층(300)은 적어도 일 영역의 두께가 다른 영역보다 작거나 크게 형성될 수 있는데, 도 5 및 도 6은 ESD 보호층(320)의 일부 영역을 확대한 단면 개략도 및 단면 사진이다.5 and 6 are cross-sectional schematic and cross-sectional photograph of the ESD protection layer 320 of the electric shock prevention device of an embodiment of the present invention. That is, the ESD protection layer 300 may be formed at least one region smaller or larger than another region, and FIGS. 5 and 6 are cross-sectional schematics and cross-sectional photographs of an enlarged portion of the ESD protection layer 320. .
도 5의 (a) 및 도 6의 (a)에 도시된 바와 같이, ESD 보호층(320)은 도전성 물질과 절연성 물질을 혼합하여 형성할 수 있다. 예를 들어, ESD 보호층(320)은 도전성 세라믹과 절연성 세라믹을 혼합하여 형성할 수 있다. 이 경우 ESD 보호층(320)은 도전성 세라믹과 절연성 세라믹을 예를 들어 10:90 내지 90:10의 혼합 비율로 혼합하여 형성할 수 있다. 절연성 세라믹의 혼합 비율이 증가할수록 방전 개시 전압이 높아지고, 도전성 세라믹의 혼합 비율이 증가할수록 방전 개시 전압이 낮아질 수 있다. 따라서, 소정의 방전 개시 전압을 얻을 수 있도록 도전성 세라믹과 절연성 세라믹의 혼합 비율을 조절할 수 있다. 이때, ESD 보호층(320)에는 복수의 기공(미도시)이 형성될 수 있다. 기공이 형성됨으로써 ESD 전압을 더욱 용이하게 바이패스시킬 수 있다.As illustrated in FIGS. 5A and 6A, the ESD protection layer 320 may be formed by mixing a conductive material and an insulating material. For example, the ESD protection layer 320 may be formed by mixing a conductive ceramic and an insulating ceramic. In this case, the ESD protection layer 320 may be formed by mixing the conductive ceramic and the insulating ceramic in a mixing ratio of 10:90 to 90:10. As the mixing ratio of the insulating ceramic increases, the discharge starting voltage increases, and as the mixing ratio of the conductive ceramic increases, the discharge starting voltage decreases. Therefore, the mixing ratio of the conductive ceramic and the insulating ceramic can be adjusted to obtain a predetermined discharge start voltage. In this case, a plurality of pores (not shown) may be formed in the ESD protection layer 320. The formation of pores makes it easier to bypass the ESD voltage.
또한, ESD 보호층(320)은 도전층과 절연층을 적층하여 소정의 적층 구조로 형성할 수 있다. 즉, ESD 보호층(320)은 도전층과 절연층을 적어도 1회 적층하여 도전층과 절연층이 구분되어 형성할 수 있다. 예를 들어, ESD 보호층(320)은 도전층과 절연층이 적층되어 2층 구조로 형성될 수 있고, 도전층, 절연층 및 도전층이 적층되어 3층 구조로 형성될 수 있다. 또한, 도전층(321)과 절연층(322)이 복수회 반복 적층되어 3층 이상의 적층 구조로 형성될 수도 있다. 예를 들어, 도 5의 (b)에 도시된 바와 같이 제 1 도전층(321a), 절연층(322) 및 제 2 도전층(321b)이 적층된 3층 구조의 ESD 보호층(320)이 형성될 수 있다. 도 6의 (b)는 절연 시트 사이의 내부 전극 사이에 3층 구조의 ESD 보호층이 형성된 사진이다. 한편, 도전층과 절연층을 복수회 적층하는 경우 최상층 및 최하층은 도전층이 위치할 수 있다. 이때, 도전층(321)과 절연층(322)의 적어도 일부에는 복수의 기공(미도시)이 형성될 수 있다. 예를 들어, 도전층(321) 사이에 형성된 절연층(322)은 다공성 구조로 형성되므로 절연층(322) 내에 복수의 기공이 형성될 수 있다.In addition, the ESD protection layer 320 may be formed by stacking a conductive layer and an insulating layer in a predetermined stacked structure. That is, the ESD protection layer 320 may be formed by dividing the conductive layer and the insulating layer at least once and separating the conductive layer and the insulating layer. For example, the ESD protection layer 320 may be formed in a two-layer structure by laminating a conductive layer and an insulating layer, and may be formed in a three-layer structure by laminating the conductive layer, the insulating layer, and the conductive layer. In addition, the conductive layer 321 and the insulating layer 322 may be repeatedly stacked a plurality of times to form a stacked structure of three or more layers. For example, as illustrated in FIG. 5B, an ESD protection layer 320 having a three-layer structure in which the first conductive layer 321a, the insulating layer 322, and the second conductive layer 321b are stacked is provided. Can be formed. FIG. 6B is a photograph in which an ESD protection layer having a three-layer structure is formed between internal electrodes between insulating sheets. On the other hand, when the conductive layer and the insulating layer are laminated a plurality of times, the uppermost layer and the lowest layer may be a conductive layer. In this case, a plurality of pores (not shown) may be formed in at least a portion of the conductive layer 321 and the insulating layer 322. For example, since the insulating layer 322 formed between the conductive layers 321 has a porous structure, a plurality of pores may be formed in the insulating layer 322.
또한, ESD 보호층(320)은 소정 영역에 공극이 더 형성될 수도 있다. 예를 들어, 도전성 물질과 절연성 물질이 혼합된 층의 사이에 공극이 형성될 수 있고, 도전층과 절연층 사이에 공극이 형성될 수도 있다. 즉, 도전성 물질과 절연성 물질의 제 1 혼합층, 공극 및 제 2 혼합층이 적층 형성될 수 있고, 도전층, 공극 및 절연층이 적층 형성될 수도 있다. 예를 들어, ESD 보호층(320)은 도 5의 (c)에 도시된 바와 같이 제 1 도전층(321a), 제 1 절연층(322a), 공극(323), 제 2 절연층(322b) 및 제 2 도전층(321b)이 적층되어 형성될 수 있다. 즉, 도전층(321) 사이에 절연층(322)이 형성되고, 절연층(322) 사이에 공극(323)이 형성될 수 있다. 도 6의 (c)에는 이러한 적층 구조를 갖는 ESD 보호층(320)의 단면 사진이다. 물론, 도전층, 절연층, 공극이 반복 적층되어 ESD 보호층(320)이 형성될 수도 있다. 한편, 도전층(321), 절연층(322) 및 공극(323)이 적층되는 경우 이들 모두의 두께가 모두 동일할 수 있고, 적어도 어느 하나의 두께가 다른 것들에 비해 얇을 수 있다. 예를 들어, 공극(323)이 도전층(321) 및 절연층(322)보다 얇을 수 있다. 또한, 도전층(321)은 절연층(322)과 동일 두께로 형성될 수도 있고, 절연층(322)보다 두껍거나 얇게 형성될 수도 있다. 한편, 공극(323)은 고분자 물질을 충진한 후 소성 공정을 실시하여 고분자 물질을 제거함으로써 형성할 수 있다. 예를 들어, 도전성 세라믹이 포함된 제 1 고분자 물질, 절연성 세라믹이 포함된 제 2 고분자 물질, 그리고 도전성 세라믹 또는 절연성 세라믹 등이 포함되지 않은 제 3 고분자 물질을 비아홀 내에 충진한 후 소성 공정을 실시하여 고분자 물질을 제거함으로써 도전층, 절연층 및 공극이 형성될 수 있다. 한편, 공극(323)은 층이 구분되지 않고 형성될 수도 있다. 예를 들어, 도전층(321a, 321b) 사이에 절연층(322)이 형성되고 절연층(322) 내에 수직 방향 또는 수평 방향으로 복수의 기공이 연결되어 공극(323)이 형성될 수 있다. 즉, 공극(323)은 절연층(322) 내에 복수의 기공으로 형성될 수 있다. 물론, 공극(323)이 복수의 기공에 의해 도전층(321)에 형성될 수도 있다.In addition, a gap may be further formed in the ESD protection layer 320 in a predetermined region. For example, a void may be formed between the layer in which the conductive material and the insulating material are mixed, and a gap may be formed between the conductive layer and the insulating layer. That is, the first mixed layer, the void, and the second mixed layer of the conductive material and the insulating material may be laminated, and the conductive layer, the void, and the insulating layer may be laminated. For example, the ESD protection layer 320 may include a first conductive layer 321a, a first insulating layer 322a, a void 323, and a second insulating layer 322b as shown in FIG. 5C. And the second conductive layer 321b may be stacked. That is, the insulating layer 322 may be formed between the conductive layers 321, and the gap 323 may be formed between the insulating layers 322. 6C is a cross-sectional photograph of the ESD protection layer 320 having such a laminated structure. Of course, the conductive layer, the insulating layer, and the pores may be repeatedly stacked to form the ESD protection layer 320. Meanwhile, when the conductive layer 321, the insulating layer 322, and the gap 323 are stacked, all of them may have the same thickness, and at least one thickness may be thinner than the others. For example, the void 323 may be thinner than the conductive layer 321 and the insulating layer 322. In addition, the conductive layer 321 may be formed to have the same thickness as the insulating layer 322, or may be formed thicker or thinner than the insulating layer 322. On the other hand, the void 323 may be formed by filling the polymer material and then performing a sintering process to remove the polymer material. For example, the first polymer material including conductive ceramics, the second polymer material including insulating ceramics, and the third polymer material not containing conductive ceramics or insulating ceramics are filled in the via hole, and then a firing process is performed. By removing the polymer material, a conductive layer, an insulating layer and a void can be formed. On the other hand, the gap 323 may be formed without being divided into layers. For example, the insulating layer 322 may be formed between the conductive layers 321a and 321b, and a plurality of pores may be connected in the insulating layer 322 in a vertical direction or a horizontal direction to form a gap 323. That is, the gap 323 may be formed with a plurality of pores in the insulating layer 322. Of course, the void 323 may be formed in the conductive layer 321 by a plurality of pores.
또한, ESD 보호층(320)은 다공성 절연 물질 및 도전 물질을 포함하는 ESD 보호 물질이 홀의 일부에 도포되고 나머지 영역은 ESD 보호 물질이 도포되지 않아 공극이 형성될 수 있다. 물론, ESD 보호층(320)은 관통홀 내부에 ESD 보호 물질이 형성되지 않고 두 방전 전극(311, 312) 사이에 공극이 형성될 수도 있다.In addition, the ESD protection layer 320 may be formed by applying an ESD protection material including a porous insulating material and a conductive material to a portion of the hole, and the remaining area is not coated with the ESD protection material, thereby forming voids. Of course, in the ESD protection layer 320, an ESD protection material is not formed in the through hole, and a gap may be formed between the two discharge electrodes 311 and 312.
한편, ESD 보호층(320)에 이용되는 도전층(321)은 소정의 저항을 갖고 전류를 흐르게 할 수 있다. 예를 들어, 도전층(321)은 수Ω 내지 수백㏁을 갖는 저항체일 수 있다. 이러한 도전층(321)은 ESD 등이 과전압이 유입될 경우 에너지 레벨을 낮춰 과전압에 의한 감전 방지 소자의 구조적인 파괴가 일어나지 않도록 한다. 즉, 도전층(321)은 전기 에너지를 열 에너지로 변환시키는 히트 싱크(heat sink)의 역할을 한다. 이러한 도전층(321)은 도전성 세라믹을 이용하여 형성할 수 있으며, 도전성 세라믹은 La, Ni, Co, Cu, Zn, Ru, Ag, Pd, Pt, W, Fe, Bi 중의 하나 이상을 포함한 혼합물을 이용할 수 있다. 또한, 도전층(321)은 1㎛∼50㎛의 두께로 형성할 수 있다. 즉, 도전층(321)이 복수의 층으로 형성될 경우 전체 두께의 합이 1㎛∼50㎛로 형성될 수 있다.Meanwhile, the conductive layer 321 used for the ESD protection layer 320 may flow a current with a predetermined resistance. For example, the conductive layer 321 may be a resistor having several kilowatts to several hundred kilowatts. The conductive layer 321 lowers the energy level when an overvoltage flows, such as ESD, to prevent structural damage of the electric shock prevention device due to the overvoltage. That is, the conductive layer 321 serves as a heat sink that converts electrical energy into thermal energy. The conductive layer 321 may be formed using a conductive ceramic, and the conductive ceramic may include a mixture including at least one of La, Ni, Co, Cu, Zn, Ru, Ag, Pd, Pt, W, Fe, and Bi. It is available. In addition, the conductive layer 321 can be formed to a thickness of 1 μm to 50 μm. That is, when the conductive layer 321 is formed of a plurality of layers, the sum of the total thicknesses may be 1 μm to 50 μm.
또한, ESD 보호층(320)에 이용되는 절연층(322)은 방전 유도 물질로 이루어질 수 있고, 다공성 구조를 가진 전기 장벽으로 기능할 수 있다. 이러한 절연층(322)은 절연성 세라믹으로 형성될 수 있고, 절연성 세라믹은 50∼50000 정도의 유전율을 갖는 강유전체 물질이 이용될 수 있다. 예를 들어, 절연성 세라믹은 MLCC 등의 유전체 재료 분말, BaTiO3, BaCO3, TiO2, Nd, Bi, Zn, Al2O3 중의 하나 이상을 포함한 혼합물을 이용하여 형성할 수 있다. 이러한 절연층(322)은 1㎚∼5㎛ 정도 크기의 기공이 복수 형성되어 30%∼80%의 기공률로 형성된 다공성 구조로 형성될 수 있다. 이때, 기공 사이의 최단 거리는 1㎚∼5㎛ 정도일 수 있다. 즉, 절연층(322)은 전류가 흐르지 못하는 전기 절연성 물질로 형성되지만, 기공이 형성되므로 기공을 통해 전류가 흐를 수 있다. 이때, 기공의 크기가 커지거나 기공률이 커질수록 방전 개시 전압이 낮아질 수 있고, 이와 반대로 기공의 크기가 작아지거나 기공률이 낮아지면 방전 개시 전압이 높아질 수 있다. 그러나, 기공의 크기가 5㎛를 초과하거나 기공률이 80%를 초과하면 ESD 보호층(320)의 형상 유지가 어려울 수 있다. 따라서, ESD 보호층(320)의 형상을 유지하면서 방전 개시 전압을 조절하도록 절연층(322)의 기공 크기 및 기공률을 조절할 수 있다. 한편, ESD 보호층(320)이 절연 물질과 도전 물질의 혼합 물질로 형성되는 경우 절연 물질은 미세 기공 및 기공률을 갖는 절연성 세라믹을 이용할 수 있다. 또한, 절연층(322)은 미세 기공에 의해 절연 시트(100)의 저항보다 낮은 저항을 갖고, 미세 기공을 통해 부분 방전이 이루어질 수 있다. 즉, 절연층(322)은 미세 기공이 형성되어 미세 기공을 통해 부분 방전이 이루어진다. 이러한 절연층(322)은 1㎛∼50㎛의 두께로 형성할 수 있다. 즉, 절연층(322)이 복수의 층으로 형성될 경우 전체 두께의 합이 1㎛∼50㎛로 형성될 수 있다.In addition, the insulating layer 322 used for the ESD protection layer 320 may be made of a discharge inducing material, and may function as an electrical barrier having a porous structure. The insulating layer 322 may be formed of an insulating ceramic, and the insulating ceramic may be a ferroelectric material having a dielectric constant of about 50 to 500,000. For example, the insulating ceramic can be formed using a mixture containing at least one of dielectric material powder such as MLCC, BaTiO 3 , BaCO 3 , TiO 2 , Nd, Bi, Zn, Al 2 O 3 . The insulating layer 322 may have a porous structure in which a plurality of pores having a size of about 1 nm to about 5 μm are formed to have a porosity of about 30% to about 80%. In this case, the shortest distance between the pores may be about 1nm to 5㎛. That is, the insulating layer 322 is formed of an electrically insulating material that does not flow current, but since pores are formed, current may flow through the pores. In this case, as the size of the pores increases or the porosity increases, the discharge start voltage may decrease. On the contrary, when the size of the pores decreases or the porosity decreases, the discharge start voltage may increase. However, when the pore size exceeds 5 μm or the porosity exceeds 80%, it may be difficult to maintain the shape of the ESD protection layer 320. Therefore, the pore size and the porosity of the insulating layer 322 may be adjusted to adjust the discharge start voltage while maintaining the shape of the ESD protection layer 320. Meanwhile, when the ESD protection layer 320 is formed of a mixed material of an insulating material and a conductive material, the insulating material may use an insulating ceramic having fine porosity and porosity. In addition, the insulating layer 322 may have a resistance lower than that of the insulating sheet 100 by micropores, and partial discharge may be performed through the micropores. That is, the micropore is formed in the insulating layer 322 and partial discharge is performed through the micropore. The insulating layer 322 may be formed to a thickness of 1 50㎛. That is, when the insulating layer 322 is formed of a plurality of layers, the sum of the total thicknesses may be formed to be 1 μm to 50 μm.
상기한 바와 같은 본 발명의 제 1 실시 예에 따른 감전 방지 소자는 도 4에 도시된 바와 같이 전자기기의 금속 케이스(10)와 내부 회로(20) 사이에 마련될 수 있다. 즉, 외부 전극(5000)의 어느 하나가 전자기기의 금속 케이스(10)에 연결되고, 다른 하나가 접지 단자와 연결될 수 있다. 이때, 접지 단자는 내부 회로(20) 내에 마련될 수 있다. 예를 들어, 제 1 외부 전극(5100)이 전자기기의 금속 케이스(10)에 연결되고, 제 2 외부 전극(5200)은 접지 단자에 연결될 수 있다. 따라서, 내부 회로(20)의 접지 단자로부터 금속 케이스로 전달되는 감전 전압을 차단할 수 있고, 외부로부터 내부 회로로 인가되는 ESD 전압을 접지 단자로 바이패스시킬 수 있다. 즉, 본 발명의 감전 방지 소자는 정격 전압 및 감전 전압에서는 외부 전극(5000) 사이에서 전류가 흐르지 못하고, ESD 전압에서는 ESD 보호부(3000)를 통해 전류가 흘러 ESD 전압이 접지 단자로 바이패스된다. 한편, 감전 방지 소자는 방전 개시 전압이 정격 전압보다 높고 ESD 전압보다 낮을 수 있다. 예를 들어, 감전 방지 소자는 정격 전압이 100V 내지 240V일 수 있고, 감전 전압은 회로의 동작 전압과 같거나 높을 수 있으며, 외부의 정전기 등에 의해 발생되는 ESD 전압은 감전 전압보다 높을 수 있다. 또한, 캐패시터부(2000, 4000)에 의해 외부와 내부 회로(20) 사이에 통신 신호가 전달될 수 있다. 즉, 외부로부터의 통신 신호, 즉 RF 신호는 캐패시터부(2000, 4000)에 의해 내부 회로(20)로 전달될 수 있고, 내부 회로(20)로부터의 통신 신호는 캐패시터부(2000, 4000)에 의해 외부로 전달될 수 있다. 따라서, 별도의 안테나가 마련되지 않고 금속 케이스(10)를 안테나로 이용하는 경우에도 캐패시터부(2000, 4000)를 이용하여 외부와의 통신 신호를 주고받을 수 있다. 결국, 본 발명에 따른 감전 방지 소자는 내부 회로의 접지 단자로부터 인가되는 감전 전압을 차단하고, 외부로부터 인가되는 ESD 전압을 접지 단자로 바이패스시키며, 외부와 전자기기 사이에 통신 신호를 전달할 수 있다.As described above, the electric shock prevention device according to the first embodiment of the present invention may be provided between the metal case 10 and the internal circuit 20 of the electronic device. That is, one of the external electrodes 5000 may be connected to the metal case 10 of the electronic device, and the other may be connected to the ground terminal. In this case, the ground terminal may be provided in the internal circuit 20. For example, the first external electrode 5100 may be connected to the metal case 10 of the electronic device, and the second external electrode 5200 may be connected to the ground terminal. Therefore, the electric shock voltage transmitted from the ground terminal of the internal circuit 20 to the metal case can be cut off, and the ESD voltage applied from the outside to the internal circuit can be bypassed to the ground terminal. That is, in the electric shock prevention device of the present invention, current does not flow between the external electrodes 5000 at the rated voltage and the electric shock voltage, and current flows through the ESD protection unit 3000 at the ESD voltage so that the ESD voltage is bypassed to the ground terminal. . Meanwhile, the electric shock prevention device may have a discharge start voltage higher than the rated voltage and lower than the ESD voltage. For example, the electric shock prevention device may have a rated voltage of 100V to 240V, the electric shock voltage may be equal to or higher than the operating voltage of the circuit, and the ESD voltage generated by external static electricity or the like may be higher than the electric shock voltage. In addition, communication signals may be transmitted between the external circuit and the internal circuit 20 by the capacitor units 2000 and 4000. That is, a communication signal from the outside, that is, an RF signal may be transmitted to the internal circuit 20 by the capacitor units 2000 and 4000, and the communication signal from the internal circuit 20 is transmitted to the capacitor units 2000 and 4000. Can be delivered to the outside. Therefore, even when the metal case 10 is used as an antenna without a separate antenna, communication signals with the outside may be exchanged using the capacitor units 2000 and 4000. As a result, the electric shock prevention device according to the present invention may block an electric shock voltage applied from the ground terminal of the internal circuit, bypass the ESD voltage applied from the outside to the ground terminal, and transmit a communication signal between the external device and the electronic device. .
또한, 본 발명의 일 실시 예에 따른 감전 방지 소자는 내압 특성이 높은 절연 시트를 복수 적층하여 캐패시터부를 형성함으로써 불량 충전기에 의한 내부 회로에서 금속 케이스로의 예를 들어 310V의 감전 전압이 유입될 때 누설 전류가 흐르지 않도록 절연 저항 상태를 유지할 수 있고, ESD 보호부 역시 금속 케이스에서 내부 회로로의 ESD 전압 유입 시 ESD 전압을 바이패스시켜 소자의 파손없이 높은 절연 저항 상태를 유지할 수 있다. 즉, ESD 보호부(3000)는 에너지 레벨을 낮춰 전기 에너지를 열 에너지로 변환시키는 도전층(321)과 다공성 구조로 이루어져 미세 기공을 통해 전류를 흐르게 하는 절연층(322)으로 이루어진 ESD 보호층(300)을 포함함으로써 외부로부터 유입되는 ESD 전압을 바이패스시켜 회로를 보호할 수 있다. 따라서, ESD 전압에 의해서도 절연 파괴되지 않고, 그에 따라 금속 케이스를 구비하는 전자기기 내에 마련되어 불량 충전기에서 발생된 감전 전압이 전자기기의 금속 케이스를 통해 사용자에게 전달되는 것을 지속적으로 방지할 수 있다. 한편, 일반적인 MLCC(Multi Layer Capacitance Circuit)는 감전 전압은 보호하지만 ESD에는 취약한 소자로 이는 반복적인 ESD 인가 시 전하 차징(Charging)에 의한 누설 포인트(Leak point)로 스파크(Spark)가 발생하여 소자 파손 현상이 발생될 수 있다. 그러나, 본 발명은 캐패시터부 사이에 도전층과 절연층을 포함하는 ESD 보호층이 형성됨으로써 ESD 전압을 ESD 보호층을 통해 패스시킴으로써 캐패시터부가 파괴되지 않는다.In addition, the electric shock prevention device according to an embodiment of the present invention, when a plurality of insulating sheets having high breakdown voltage characteristics are stacked to form a capacitor, when an electric shock voltage of, for example, 310V is introduced into the metal case from an internal circuit caused by a defective charger. Insulation resistance can be maintained to prevent leakage current, and ESD protection can bypass the ESD voltage when the ESD voltage flows from the metal casing to the internal circuitry to maintain a high insulation resistance without damaging the device. That is, the ESD protection unit 3000 is formed of a conductive layer 321 for converting electrical energy into thermal energy by lowering an energy level and an ESD protection layer made of a porous structure and an insulating layer 322 for flowing current through micropores. By including 300) it is possible to protect the circuit by bypassing the incoming ESD voltage. Therefore, it is not dielectric breakdown even by the ESD voltage, and thus it is possible to continuously prevent the electric shock voltage generated from the defective charger from being delivered to the user through the metal case of the electronic device provided in the electronic device having the metal case. On the other hand, the general MLCC (Multi Layer Capacitance Circuit) protects the electric shock voltage but is vulnerable to ESD. It is damaged due to sparking due to leakage point caused by charge charging when repeated ESD is applied. Phenomenon may occur. However, in the present invention, the ESD protection layer including the conductive layer and the insulating layer is formed between the capacitor parts so that the capacitor part is not destroyed by passing the ESD voltage through the ESD protection layer.
도 7은 본 발명의 제 2 실시 예에 따른 감전 방지 소자의 단면도이다.7 is a cross-sectional view of an electric shock prevention device according to a second embodiment of the present invention.
도 7을 참조하면, 본 발명의 제 2 실시 예에 따른 감전 방지 소자는 복수의 절연 시트(100; 101 내지 111)가 적층된 적층체(1000)와, 적층체(1000) 내에 마련되며 복수의 내부 전극(200; 201 내지 208)을 구비하는 적어도 하나의 캐패시터부(2000, 4000)와, 적어도 하나의 방전 전극(310)과 ESD 보호층(320)을 구비하는 ESD 보호부(3000)와, 적층체(1000)의 서로 대향하는 두 측면에 형성되어 제 1 및 제 2 캐패시터부(2000, 4000)와 ESD 보호부(3000)와 연결되는 외부 전극(5100, 5200; 5000)을 포함할 수 있다.Referring to FIG. 7, the electric shock prevention device according to the second exemplary embodiment of the present invention may include a laminate 1000 in which a plurality of insulating sheets 100 (101 to 111) are stacked, and are provided in the laminate 1000. At least one capacitor part 2000 and 4000 including internal electrodes 200 and 201 to 208, an ESD protection part 3000 including at least one discharge electrode 310 and an ESD protection layer 320; The stack 1000 may include external electrodes 5100, 5200, and 5000 formed on two opposite sides of the stack 1000 and connected to the first and second capacitor parts 2000 and 4000 and the ESD protection part 3000. .
여기서, ESD 보호부(3000)와 캐패시터부(2000, 4000) 사이의 거리(A1, A2)는 캐패시터부(2000, 4000) 내의 두 내부 전극 사이의 거리(C1, C2)보다 짧거나 같을 수 있다. 즉, ESD 보호부(3000)와 캐패시터부(2000, 4000) 사이에 위치한 제 5 및 제 7 절연 시트(105, 107)의 각각의 두께는 캐패시터부(2000, 4000) 내의 내부 전극(200) 사이에 위치한 절연 시트들(102 내지 104, 107 내지 110)의 두께보다 얇거나 같을 수 있다. 또한, ESD 보호부(3000)와 캐패시터부(2000, 4000) 사이의 거리(A1, A2)는 ESD 보호부(3000)의 두 방전 전극(310) 사이의 거리(B)보다 짧거나 같을 수 있다. 즉, ESD 보호부(3000)와 캐패시터부(2000, 4000) 사이에 위치한 제 5 및 제 7 절연 시트(105, 107)의 각각의 두께는 ESD 보호층(320)이 형성된 제 6 절연 시트(106)의 두께보다 얇거나 같을 수 있다. 결국, ESD 보호부(3000)와 캐패시터부(2000, 4000) 사이에 위치한 제 5 및 제 7 절연 시트(105, 107)의 각각의 두께는 캐패시터부(2000, 4000) 내의 내부 전극(200) 사이에 위치한 절연 시트들(102 내지 104, 107 내지 110)의 두께보다 얇거나 같은 두께로 형성되거나, ESD 보호부(3000)의 두 방전 전극(310) 사이의 거리(B)보다 얇거나 같은 두께로 형성될 수 있다. 즉, ESD 보호부(3000)와 캐패시터부(2000, 4000) 사이의 거리(A1, A2), 캐패시터부(2000, 4000) 내의 두 내부 전극 사이의 거리(C1, C2) 및 ESD 보호부(3000)의 두 방전 전극(300) 사이의 거리(B)는 A1=A2≤C1=C2 또는 A1=A2≤B일 수 있다. 물론, A1과 A2, 그리고 C1과 C2는 같지 않을 수도 있다. 한편, 최하층 및 최상층의 절연 시트, 즉 제 1 및 제 11 절연 시트(101, 111)의 두께(D1, D2)는 각각 10㎛ 이상 적층체(1000) 두께의 50% 이하일 수 있다. 이때, B≤D1=D2일 수 있으며, D1과 D2가 다를 수도 있다.Here, the distances A1 and A2 between the ESD protection unit 3000 and the capacitors 2000 and 4000 may be shorter or equal to the distances C1 and C2 between the two internal electrodes in the capacitors 2000 and 4000. . That is, the thickness of each of the fifth and seventh insulating sheets 105 and 107 positioned between the ESD protection unit 3000 and the capacitor units 2000 and 4000 is between the internal electrodes 200 in the capacitor units 2000 and 4000. It may be thinner than or equal to the thickness of the insulating sheets 102 to 104 and 107 to 110 located at. In addition, the distances A1 and A2 between the ESD protection unit 3000 and the capacitors 2000 and 4000 may be shorter or equal to the distance B between the two discharge electrodes 310 of the ESD protection unit 3000. . That is, the thickness of each of the fifth and seventh insulating sheets 105 and 107 disposed between the ESD protection unit 3000 and the capacitor units 2000 and 4000 may be the sixth insulating sheet 106 on which the ESD protection layer 320 is formed. Thinner than or equal to the thickness of As a result, each of the thicknesses of the fifth and seventh insulating sheets 105 and 107 positioned between the ESD protection unit 3000 and the capacitor units 2000 and 4000 is between the internal electrodes 200 in the capacitor units 2000 and 4000. Thinner than or equal to the thickness of the insulating sheets 102 to 104 and 107 to 110, or thinner than or equal to the distance B between the two discharge electrodes 310 of the ESD protection unit 3000. Can be formed. That is, the distances A1 and A2 between the ESD protection unit 3000 and the capacitors 2000 and 4000, the distances C1 and C2 between the two internal electrodes in the capacitors 2000 and 4000, and the ESD protection unit 3000. The distance B between the two discharge electrodes 300 may be A1 = A2 ≦ C1 = C2 or A1 = A2 ≦ B. Of course, A1 and A2 and C1 and C2 may not be the same. The thicknesses D1 and D2 of the lowermost and uppermost insulating sheets, that is, the first and eleventh insulating sheets 101 and 111 may be 10 μm or more and 50% or less of the thickness of the laminate 1000, respectively. In this case, B ≦ D1 = D2, and D1 and D2 may be different.
또한, 본 발명의 제 2 실시 예에 따른 감전 방지 소자는 방전 전극(311, 312)와 인접한 두 내부 전극, 즉 제 4 및 제 5 내부 전극(204, 205)이 방전 전극(311, 312)과 동일 외부 전극(5000)과 연결될 수 있다. 즉, 제 1, 제 3, 제 5 및 제 7 내부 전극(201, 203, 205, 207)은 제 2 외부 전극(5200)과 연결되고, 제 2, 제 4, 제 6 및 제 8 내부 전극(202, 204, 206, 208)은 제 1 외부 전극(5100)과 연결된다. 또한, 제 1 방전 전극(311)은 제 1 외부 전극(5100)과 연결되고, 제 2 방전 전극(312)은 제 2 외부 전극(5200)과 연결된다. 따라서, 제 1 방전 전극(311)과 이와 인접한 제 4 내부 전극(204)은 제 1 외부 전극(5100)과 연결되고, 제 2 방전 전극(312)과 이와 인접한 제 5 내부 전극(205)은 제 2 외부 전극(5200)과 연결된다.In addition, in the electric shock prevention device according to the second embodiment of the present invention, two internal electrodes adjacent to the discharge electrodes 311 and 312, that is, the fourth and fifth internal electrodes 204 and 205 may be connected to the discharge electrodes 311 and 312. It may be connected to the same external electrode 5000. That is, the first, third, fifth, and seventh internal electrodes 201, 203, 205, and 207 are connected to the second external electrode 5200, and the second, fourth, sixth, and eighth internal electrodes ( 202, 204, 206, and 208 are connected to the first external electrode 5100. In addition, the first discharge electrode 311 is connected to the first external electrode 5100, and the second discharge electrode 312 is connected to the second external electrode 5200. Accordingly, the first discharge electrode 311 and the fourth internal electrode 204 adjacent thereto are connected to the first external electrode 5100, and the second discharge electrode 312 and the fifth internal electrode 205 adjacent thereto are formed of the first discharge electrode 311 and the fourth internal electrode 205 adjacent thereto. 2 is connected to the external electrode 5200.
상기한 바와 같이 방전 전극(310)과 이와 인접한 내부 전극(200)이 동일 외부 전극(5000)과 연결됨으로써 절연 시트(100)가 열화, 즉 절연 파괴되는 경우에도 ESD 전압이 전자기기 내부로 인가되지 않는다. 즉, 방전 전극(310)과 인접한 내부 전극(200)이 서로 다른 외부 전극(5000)과 연결된 경우 절연 시트(100)가 절연 파괴되면 일 외부 전극(5000)을 통해 인가되는 ESD 전압이 방전 전극(310)과 인접한 내부 전극(200)을 통해 타 외부 전극(5000)으로 흐르게 된다. 예를 들어, 도 2에 도시된 바와 같이 제 1 방전 전극(311)이 제 1 외부 전극(5100)과 연결되고 이와 인접한 제 4 내부 전극(204)이 제 2 외부 전극(5200)과 연결된 경우 절연 시트(100)가 절연 파괴되면 제 1 방전 전극(311)과 제 4 내부 전극(204) 사이에 도전 경로가 형성되어 제 1 외부 전극(5100)을 통해 인가되는 ESD 전압이 제 1 방전 전극(311), 절연 파괴된 제 5 절연 시트(105) 및 제 2 내부 전극(202)으로 흐르게 되고, 그에 따라 제 2 외부 전극(5200)을 통해 내부 회로로 인가될 수 있다. 이러한 문제를 해결하기 위해서는 절연 시트(100)의 두께를 두껍게 형성할 수 있지만, 이 경우 감전 방지 소자의 사이즈가 커지는 문제가 있다. 그러나, 도 6에 도시된 바와 같이 방전 전극(310)과 이와 인접한 내부 전극(200)이 동일 외부 전극(5000)과 연결됨으로써 절연 시트(100)가 절연 파괴되는 경우에도 ESD 전압이 전자기기 내부로 인가되지 않는다. 또한, 절연 시트(100)의 두께를 두껍게 형성하지 않고도 ESD 전압이 인가되는 것을 방지할 수 있다.As described above, when the discharge electrode 310 and the adjacent internal electrode 200 are connected to the same external electrode 5000, the ESD voltage is not applied to the electronic device even when the insulating sheet 100 is deteriorated, that is, the dielectric breakdown. Do not. That is, when the insulating electrode 100 is insulated and broken when the inner electrode 200 adjacent to the discharge electrode 310 and the inner electrode 200 are different from each other, the ESD voltage applied through the outer electrode 5000 is discharge electrode ( It flows to the other external electrode 5000 through the internal electrode 200 adjacent to 310. For example, as shown in FIG. 2, when the first discharge electrode 311 is connected to the first external electrode 5100 and the fourth internal electrode 204 adjacent thereto is connected to the second external electrode 5200, insulation is performed. When the sheet 100 is dielectrically broken, a conductive path is formed between the first discharge electrode 311 and the fourth internal electrode 204, and an ESD voltage applied through the first external electrode 5100 is applied to the first discharge electrode 311. ), It may flow into the dielectric breakdown fifth insulating sheet 105 and the second internal electrode 202, and thus may be applied to the internal circuit through the second external electrode 5200. In order to solve this problem, the thickness of the insulating sheet 100 can be formed to be thick, but in this case, there is a problem that the size of the electric shock prevention device increases. However, as shown in FIG. 6, even when the insulating sheet 100 is insulated and destroyed by the discharge electrode 310 and the inner electrode 200 adjacent thereto connected to the same external electrode 5000, the ESD voltage is transferred into the electronic device. Not authorized In addition, it is possible to prevent the ESD voltage from being applied without forming the thickness of the insulating sheet 100 thickly.
도 8은 본 발명의 제 3 실시 예에 따른 감전 방지 소자의 단면도이다.8 is a cross-sectional view of an electric shock prevention device according to a third embodiment of the present invention.
도 8을 참조하면, 본 발명의 제 3 실시 예에 따른 감전 방지 소자는 복수의 절연 시트(100; 101 내지 111)가 적층된 적층체(1000)와, 적층체(1000) 내에 마련되며 복수의 내부 전극(200; 201 내지 208)을 구비하는 적어도 하나의 캐패시터부(2000, 4000)와, 적어도 하나의 방전 전극(310)과 ESD 보호층(320)을 구비하는 ESD 보호부(3000)와, 적층체(1000)의 서로 대향하는 두 측면에 형성되어 제 1 및 제 2 캐패시터부(2000, 4000)와 ESD 보호부(3000)와 연결되는 외부 전극(5100, 5200; 5000)을 포함할 수 있다. 이때, 외부 전극(5000)은 내부 전극들(200)과 소정 영역 중첩되도록 형성될 수 있다. 즉, 본 발명의 제 3 실시 예는 본 발명의 제 1 실시 예 및 제 2 실시 예와 외부 전극(5000)이 내부 전극(200)과 일부 중첩되어 형성되는 것이 상이하다.Referring to FIG. 8, the electric shock prevention device according to the third exemplary embodiment of the present invention may include a laminate 1000 in which a plurality of insulating sheets 100 (101 to 111) are stacked, and are provided in the laminate 1000, At least one capacitor part 2000 and 4000 including internal electrodes 200 and 201 to 208, an ESD protection part 3000 including at least one discharge electrode 310 and an ESD protection layer 320; The stack 1000 may include external electrodes 5100, 5200, and 5000 formed on two opposite sides of the stack 1000 and connected to the first and second capacitor parts 2000 and 4000 and the ESD protection part 3000. . In this case, the external electrode 5000 may be formed to overlap the internal electrodes 200 by a predetermined region. That is, the third embodiment of the present invention differs from the first and second embodiments of the present invention in which the external electrode 5000 partially overlaps the internal electrode 200.
외부 전극(5000)은 적층체(1000)의 측면 뿐만 아니라 상면 및 하면으로 연장 형성될 수 있다. 또한, 외부 전극(5000)은 서로 다른 외부 전극(5000)과 연결되는 내부 전극(200)과 소정 영역 중첩되도록 형성될 수 있다. 예를 들어, 제 1 외부 전극(5100)의 적층체(1000) 하부 및 상부로 연장 형성된 부분은 내부 전극들(200)의 소정 영역과 중첩되어 형성될 수 있다. 또한, 제 2 외부 전극(5200)의 적층체(1000) 하부 및 상부로 연장 형성된 부분도 내부 전극들(200)의 소정 영역과 중첩되어 형성될 수 있다. 예를 들어, 외부 전극(5000)의 적층체(1000) 상부 및 하부로 연장된 부분이 제 1 및 제 8 내부 전극(201, 208)과 중첩되어 형성될 수 있다. 즉, 외부 전극(5000)의 적어도 하나가 적층체(1000) 상면 및 하면으로 연장 형성되고, 연장된 부분의 적어도 하나가 내부 전극(200)과 일부 중첩되어 형성될 수 있다. 이때, 외부 전극(5000)과 중첩되는 내부 전극(200)의 면적은 내부 전극(200) 전체 면적의 1% 내지 10%일 수 있다. 또한, 외부 전극(5000)은 복수회의 공정에 의해 적층체(1000)의 상면 및 하면의 적어도 어느 하나에 형성되는 면적을 증가시킬 수 있다.The external electrode 5000 may extend to the upper and lower surfaces as well as the side of the stack 1000. In addition, the external electrode 5000 may be formed to overlap a predetermined region with the internal electrode 200 connected to the different external electrodes 5000. For example, a portion extending below and above the stack 1000 of the first external electrode 5100 may overlap a predetermined region of the internal electrodes 200. In addition, portions formed to extend below and above the stack 1000 of the second external electrode 5200 may overlap the predetermined regions of the internal electrodes 200. For example, portions extending to the upper and lower portions of the stack 1000 of the external electrode 5000 may overlap the first and eighth internal electrodes 201 and 208. That is, at least one of the external electrodes 5000 may extend to the top and bottom surfaces of the stack 1000, and at least one of the extended portions may partially overlap the internal electrodes 200. In this case, an area of the internal electrode 200 overlapping the external electrode 5000 may be 1% to 10% of the total area of the internal electrode 200. In addition, the external electrode 5000 may increase the area formed on at least one of the upper and lower surfaces of the laminate 1000 by a plurality of processes.
한편, 외부 전극(5000)과 중첩되도록 하기 위해 캐패시터부(2000, 4000)의 내부 전극(200)은 제 1 실시 예에 비해 X축 방향으로 길게 형성될 수 있다. 예를 들어, 내부 전극(200)의 끝과 이와 인접하는 외부 전극(5000)이 X축 방향 길이의 5% 내지 10%의 간격을 유지할 수 있도록 형성될 수 있다. 즉, 내부 전극(200)은 절연 시트(100)의 X축 방향 길이의 90% 내지 95%의 길이로 형성될 수 있다.Meanwhile, in order to overlap the external electrode 5000, the internal electrodes 200 of the capacitor parts 2000 and 4000 may be formed longer in the X-axis direction than in the first embodiment. For example, the end of the inner electrode 200 and the outer electrode 5000 adjacent thereto may be formed to maintain a spacing of 5% to 10% of the length of the X-axis direction. That is, the internal electrode 200 may be formed to have a length of 90% to 95% of the length of the insulating sheet 100 in the X axis direction.
이렇게 외부 전극(5000)과 내부 전극(200)을 중첩함으로써 외부 전극(5000)과 내부 전극(200) 사이에 소정의 기생 캐패시턴스가 생성될 수 있다. 예를 들어, 제 1 및 제 8 내부 전극(201, 208)과 제 1 및 제 2 외부 전극(5100, 5200)의 연장부 사이에 캐패시턴스가 형성될 수 있다. 따라서, 외부 전극(5000)과 내부 전극(200)의 중첩 면적을 조절함으로써 감전 방지 소자의 캐패시턴스를 조절할 수 있다. 즉, 감전 방지 소자의 제조 공정이 완료된 후에도 외부 전극(5000)의 중첩 면적을 조절함으로써 감전 방지 소자의 캐패시턴스를 적층체(1000) 외부에서 조절할 수 있다.By overlapping the external electrode 5000 and the internal electrode 200, a predetermined parasitic capacitance may be generated between the external electrode 5000 and the internal electrode 200. For example, capacitance may be formed between the first and eighth internal electrodes 201 and 208 and the extensions of the first and second external electrodes 5100 and 5200. Therefore, the capacitance of the electric shock prevention device may be adjusted by adjusting the overlapping area of the external electrode 5000 and the internal electrode 200. That is, even after the manufacturing process of the electric shock prevention device is completed, by adjusting the overlapping area of the external electrode 5000, the capacitance of the electric shock prevention device can be adjusted outside the laminate 1000.
한편, 본 발명에 따른 ESD 보호부(3000)의 ESD 보호층(320)은 다양한 형상으로 형성될 수 있다. 예를 들어, 도 9 내지 도 11에 도시된 바와 같이 ESD 보호층(320)은 절연 시트(106) 내에 형성된 관통홀에 적어도 일 영역이 도포 또는 충진되어 형성될 수 있다. 또한, 도시되지 않았지만, ESD 보호층(320)의 하부 및 상부의 적어도 하나에는 복수의 절연 시트와 내부 전극을 포함하는 캐패시터부(2000, 4000)가 형성될 수 있다. 즉, 도 9 내지 도 11은 캐패시터부를 제외한 ESD 보호부(3000)만을 도시한 것으로, 그 하측 및 상측의 적어도 일 영역에 도 2, 도 3, 도 7 및 도 8에 도시된 바와 같이 캐패시터부(2000, 4000)가 형성될 수 있다. 이러한 본 발명의 실시 예들에 따른 ESD 보호층(320)의 다양한 형상을 도 9 내지 도 11을 이용하여 설명하면 다음과 같다.Meanwhile, the ESD protection layer 320 of the ESD protection unit 3000 according to the present invention may be formed in various shapes. For example, as illustrated in FIGS. 9 to 11, the ESD protection layer 320 may be formed by applying or filling at least one region to a through hole formed in the insulating sheet 106. Although not shown, capacitors 2000 and 4000 including a plurality of insulating sheets and internal electrodes may be formed on at least one of the lower and upper portions of the ESD protection layer 320. That is, FIGS. 9 to 11 illustrate only the ESD protection unit 3000 excluding the capacitor unit, and the capacitor unit (as shown in FIGS. 2, 3, 7 and 8 in at least one region of the lower side and the upper side thereof). 2000, 4000 may be formed. Various shapes of the ESD protection layer 320 according to the embodiments of the present invention will be described with reference to FIGS. 9 to 11 as follows.
도 9 내지 도 11은 본 발명의 실시 예들에 따른 ESD 보호부(3000)의 단면 개략도이다.9 to 11 are cross-sectional schematic views of the ESD protection unit 3000 according to embodiments of the present invention.
도 9를 참조하면, 절연 시트, 예를 들어 도 2 및 도 3에 도시된 바와 같이 제 6 절연 시트(106)에 관통홀이 형성되고, 관통홀 내의 일 영역에 ESD 보호층(320)이 형성될 수 있다. 예를 들어, 도 9의 (a)에 도시된 바와 같이 원형, 사각형 등의 형상으로 관통홀이 형성되고 관통홀의 측면에 ESD 보호 물질(324)이 형성될 수 있다. 여기서, ESD 보호 물질(324)은 도 5 및 도 6을 이용하여 설명된 다공성 절연층, 도전층 및 공극의 적어도 어느 하나일 수 있으며, 예를 들어 다공성 절연 물질과 도전 물질의 혼합 물질일 수 있다. 또한, ESD 보호 물질(324)이 형성되지 않은 영역에는 공극(323)이 형성될 수 있다. 물론, 도 9의 (b)에 도시된 바와 같이 방전 전극(311, 312)와 접촉되는 관통홀의 하부 및 상부에 ESD 보호 물질(324b, 324c)가 더 형성될 수 있다. 즉, ESD 보호층(320)은 관통홀의 측면에 형성된 ESD 보호 물질(324a)과 관통홀의 하부 및 상부에 방전 전극(311, 312)과 접촉되도록 형성된 ESD 보호 물질(324b. 324c)를 포함할 수 있다. 이때, ESD 보호 물질(324a, 324b, 324c) 사이의 영역에는 공극(323)이 형성될 수 있다. 또한, 도 9의 (c)에 도시된 바와 같이 관통홀의 측면과 이격되도록 관통홀 내에 ESD 보호 물질(324)이 형성될 수 있다. ESD 보호 물질(324)은 제 1 및 제 2 방전 전극(311, 312)과 접촉되도록 형성될 수 있다. 즉, ESD 보호 물질(324)은 제 1 및 제 2 방전 전극(311, 312)과 접촉되어 이들 사이에 수직 방향으로 형성될 수 있다. 이때, ESD 보호 물질(324)이 형성되지 않은 관통홀 내에는 ESD 보호 물질(324)과 관통홀 측벽 사이에 공극(323)이 형성된다. 한편, 공극(323)은 고분자 물질을 충진한 후 소성 공정 시 고분자 물질이 제거됨으로써 형성할 수 있다. 즉, 관통홀의 일부가 매립되도록 고분자 물질을 형성하고 관통홀 내의 일 영역에 ESD 보호 물질, 예를 들어 다공성 절연 물질과 도전 물질의 혼합 물질을 형성한 후 이후 소성 공정에서 고분자 물질이 제거되도록 함으로써 관통홀 내에 ESD 보호 물질 및 공극(323)이 형성된 ESD 보호층(320)을 형성할 수 있다. 이하 ESD 보호 물질 및 공극(323)을 포함하는 ESD 보호층(320)은 이와 같은 공정으로 형성할 수 있다.Referring to FIG. 9, through holes are formed in an insulating sheet, for example, the sixth insulating sheet 106 as shown in FIGS. 2 and 3, and an ESD protection layer 320 is formed in one region of the through holes. Can be. For example, as illustrated in (a) of FIG. 9, a through hole may be formed in a shape of a circle, a square, or the like, and an ESD protection material 324 may be formed on a side of the through hole. Here, the ESD protection material 324 may be at least one of the porous insulating layer, the conductive layer, and the void described with reference to FIGS. 5 and 6, and may be, for example, a mixed material of the porous insulating material and the conductive material. . In addition, voids 323 may be formed in regions where the ESD protection material 324 is not formed. Of course, as illustrated in FIG. 9B, ESD protection materials 324b and 324c may be further formed on the lower and upper portions of the through-holes contacting the discharge electrodes 311 and 312. That is, the ESD protection layer 320 may include an ESD protection material 324a formed on the side of the through hole, and an ESD protection material 324b and 324c formed to contact the discharge electrodes 311 and 312 at the bottom and the top of the through hole. have. In this case, a gap 323 may be formed in an area between the ESD protection materials 324a, 324b, and 324c. In addition, as illustrated in FIG. 9C, an ESD protection material 324 may be formed in the through hole to be spaced apart from the side surface of the through hole. The ESD protection material 324 may be formed to contact the first and second discharge electrodes 311 and 312. That is, the ESD protection material 324 may be in contact with the first and second discharge electrodes 311 and 312 to be formed in a vertical direction therebetween. In this case, a gap 323 is formed between the ESD protection material 324 and the sidewall of the through hole in the through hole where the ESD protection material 324 is not formed. Meanwhile, the void 323 may be formed by filling the polymer material and then removing the polymer material during the firing process. That is, the polymer material is formed so that a part of the through hole is filled, and the ESD protection material, for example, a mixture of porous insulating material and conductive material is formed in one region of the through hole, and then the polymer material is removed in the firing process. An ESD protection layer 320 having an ESD protection material and a void 323 formed therein may be formed in the hole. Hereinafter, the ESD protection layer 320 including the ESD protection material and the voids 323 may be formed by such a process.
도 10을 참조하면, 절연 시트(106)의 소정 영역에 관통홀이 형성되고 방전 전극(311, 312)의 어느 하나와 접촉되도록 ESD 보호층(320)이 형성될 수 있다. 예를 들어, 도 10의 (a)에 도시된 바와 같이 관통홀 내에 절연 시트(106)와 이격되고 제 1 방전 전극(311)과 접촉되도록 ESD 보호 물질(324)이 형성될 수 있고, 도 10의 (b)에 도시된 바와 같이 관통홀 내에 절연 시트(106)와 이격되고 제 2 방전 전극(312)과 접촉되도록 ESD 보호 물질(324)이 형성될 수 있다. 또한, 도 10의 (c)에 도시된 바와 같이 관통홀 내에 절연 시트(106)와 이격되고 제 1 및 제 2 방전 전극(311, 312)과 각각 접촉되도록 ESD 보호 물질(324a, 324b)이 형성될 수 있다. 이때, 제 1 및 제 2 ESD 보호 물질(324a, 324b)은 관통홀의 중앙부에서 소정 간격 이격될 수 있다. 또한, 관통홀 내의 ESD 보호 물질(324)이 형성되지 않은 영역에는 공극(323)이 형성된다. 즉, 관통홀 내의 일부에 도포되고 제 1 및 제 2 방전 전극(311, 312)의 적어도 어느 하나와 접촉되도록 ESD 보호 물질(324)이 형성되고 나머지 영역에 공극(323)이 형성되어 ESD 보호층(320)이 형성될 수 있다.Referring to FIG. 10, an ESD protection layer 320 may be formed to form a through hole in a predetermined region of the insulating sheet 106 and to contact any one of the discharge electrodes 311 and 312. For example, as shown in FIG. 10A, an ESD protection material 324 may be formed in the through hole to be spaced apart from the insulating sheet 106 and to contact the first discharge electrode 311. An ESD protection material 324 may be formed in the through hole to be spaced apart from the insulating sheet 106 and in contact with the second discharge electrode 312 as illustrated in (b) of FIG. In addition, as shown in FIG. 10C, ESD protection materials 324a and 324b are formed in the through hole to be spaced apart from the insulating sheet 106 and to contact the first and second discharge electrodes 311 and 312, respectively. Can be. In this case, the first and second ESD protection materials 324a and 324b may be spaced apart from each other at a central portion of the through hole. In addition, a gap 323 is formed in a region where the ESD protection material 324 is not formed in the through hole. That is, the ESD protection material 324 is formed to be applied to a portion of the through-hole and in contact with at least one of the first and second discharge electrodes 311 and 312, and the void 323 is formed in the remaining area so that the ESD protection layer is formed. 320 may be formed.
도 11을 참조하면, 절연 시트(106)의 소정 영역에 관통홀이 형성되고 수평 방향으로 ESD 보호 물질(324)이 형성될 수 있다. 이때, ESD 보호 물질(324)은 방전 전극(311, 312)과 이격되어 형성될 수 있다. 즉, 도 11의 (a)에 도시된 바와 같이 절연 시트(106) 내의 관통홀의 적어도 일 측면에 내측으로 돌출되어 ESD 보호 물질(320)이 형성될 수 있다. 즉, 관통홀의 측벽으로부터 제 1 및 제 2 ESD 보호 물질(324a, 324b)이 서로 이격되도록 형성될 수 있다. 이때, 제 1 및 제 2 ESD 보호 물질(324a, 324b)은 제 1 및 제 2 방전 전극(311, 312)과 이격되고, 관통홀의 중앙부에서 이격되어 형성될 수 있다. 물론, ESD 보호 물질(324)이 형성되지 않은 영역에는 공극(323)이 형성된다. 또한, 도 11의 (b)에 도시된 바와 같이 관통홀 내에 수평 방형으로 ESD 보호 물질(324)이 형성될 수 있다. 즉, 관통홀의 일 측면으로부터 타 측면으로 ESD 보호 물질(324)이 수평으로 형성될 수 있다. 여기서, ESD 보호층(320)이 형성되지 않은 관통홀 내의 나머지 영역은 공극(323)이 형성될 수 있다. 즉, 방전 전극(311, 312)과 ESD 보호 물질(324)의 사이에 각각 공극(323a, 323b)이 형성된다.Referring to FIG. 11, a through hole may be formed in a predetermined region of the insulating sheet 106, and an ESD protection material 324 may be formed in a horizontal direction. In this case, the ESD protection material 324 may be formed to be spaced apart from the discharge electrodes 311 and 312. That is, as illustrated in FIG. 11A, an ESD protection material 320 may be formed by protruding inward to at least one side of the through hole in the insulating sheet 106. That is, the first and second ESD protection materials 324a and 324b may be formed to be spaced apart from each other from the sidewall of the through hole. In this case, the first and second ESD protection materials 324a and 324b may be spaced apart from the first and second discharge electrodes 311 and 312 and spaced apart from the center of the through hole. Of course, voids 323 are formed in regions where the ESD protection material 324 is not formed. In addition, as shown in FIG. 11B, the ESD protection material 324 may be formed in the horizontal hole in the through hole. That is, the ESD protection material 324 may be formed horizontally from one side of the through hole to the other side. Here, the void 323 may be formed in the remaining area of the through hole where the ESD protection layer 320 is not formed. That is, voids 323a and 323b are formed between the discharge electrodes 311 and 312 and the ESD protection material 324, respectively.
한편, 본 발명에 따른 ESD 보호부(3000)의 ESD 보호층(320)은 적어도 일 영역의 두께 및 폭의 적어도 어느 하나가 다른 영역과 다르게 형성될 수 있다. 또한, ESD 보호층(320)은 둘 이상의 시트에 적어도 일부 도포되어 형성될 수 있다. 이러한 ESD 보호층(320)의 다른 실시 예들에 따른 ESD 보호층을 도 12 내지 도 18을 이용하여 설명하면 다음과 같다.On the other hand, the ESD protection layer 320 of the ESD protection unit 3000 according to the present invention may be formed differently from at least one of the thickness and width of at least one region different from the other region. In addition, the ESD protection layer 320 may be formed by applying at least a part of two or more sheets. An ESD protection layer according to other embodiments of the ESD protection layer 320 will be described with reference to FIGS. 12 to 18 as follows.
도 12 내지 도 18은 본 발명의 또다른 실시 예들에 따른 ESD 보호층을 포함하는 ESD 보호부의 개략 단면도이다. 이하의 다양한 실시 예들은 ESD 보호부를 도시하였지만, 그 하부 및 상부에 복수의 절연 시트 및 복수의 내부 전극을 포함하는 캐패시터부가 형성될 수 있다.12 to 18 are schematic cross-sectional views of an ESD protection unit including an ESD protection layer according to another embodiment of the present invention. Although various embodiments of the present disclosure illustrate the ESD protection unit, a capacitor unit including a plurality of insulating sheets and a plurality of internal electrodes may be formed on and under the ESD protection unit.
도 12를 참조하면, ESD 보호층(320)은 중앙부의 일 방향의 폭이 상부 및 하부의 폭보다 크게 형성될 수 있다. 예를 들어, X 방향으로 중앙부의 폭이 상부 및 하부의 폭보다 크게 형성될 수 있다. 즉, 도 12의 (a) 및 도 12의 (b)에 도시된 바와 같이 ESD 보호층(320)은 Z 방향으로 소정의 두께로 형성되고, X 및 Y 방향으로 각각 소정의 폭으로 형성되며, 두께의 중간 영역에서 X 방향으로의 폭(w1)이 상부 및 하부의 폭(w2)보다 크게 형성될 수 있다. 또한, 중앙 영역에서 하부 및 상부로 갈수록 폭이 좁아지도록 형성될 수 있다. 즉, ESD 보호층(320)은 X 방향으로의 단면 형상이 육각형을 이룰 수 있다. 따라서, ESD 보호층(320)은 상부면과 하부면 사이의 두께(t1)가 가장자리의 두께(t2)보다 두꺼울 수 있다. 물론, ESD 보호층(320)은 X 방향과 직교하는 Y 방향으로 중앙부가 상부 및 하부보다 크게 형성되고, 중앙부로부터 하부 및 상부로 갈수록 폭이 작게 형성될 수도 있다. 따라서, ESD 보호층(320)은 상부면 및 하부면이 평탄하고 측면이 각진 형상을 갖는 다면체 형상으로 형성될 수 있다. 이때, ESD 보호층(320)은 도 12의 (c)에 도시된 바와 같이 두개의 시트(106a, 106b)에 형성될 수 있다. 즉, 하측 시트(106a)는 하부면으로부터 상부면으로 갈수록 폭이 좁아지는 형상으로 제 1 관통홀이 형성되고, 상측 시트(106b)는 하부면으로부터 상부면으로 갈수록 폭이 넓어지는 형상으로 제 2 관통홀이 형성되며, 이러한 제 1 및 제 2 관통홀 내에 ESD 보호 물질이 적어도 일부 도포 또는 충진된 후 적층 및 압착하여 중앙부의 폭이 상부 및 하부의 폭보다 큰 형상의 ESD 보호층(320)이 형성될 수 있다.Referring to FIG. 12, the ESD protection layer 320 may have a width in one direction of the central portion greater than that of the upper and lower portions. For example, the width of the center portion in the X direction may be greater than the width of the upper and lower portions. That is, as shown in FIGS. 12A and 12B, the ESD protection layer 320 is formed to have a predetermined thickness in the Z direction, and is formed to have a predetermined width in the X and Y directions, respectively. The width w1 in the X direction in the middle region of the thickness may be greater than the width w2 of the upper and lower portions. In addition, it may be formed so that the width becomes narrower toward the lower and upper in the central region. That is, the ESD protection layer 320 may have a hexagonal cross-sectional shape in the X direction. Accordingly, the ESD protection layer 320 may have a thickness t1 between the top surface and the bottom surface to be thicker than the thickness t2 of the edge. Of course, the ESD protection layer 320 may have a central portion larger than the upper and lower portions in the Y direction orthogonal to the X direction, and may have a smaller width from the central portion toward the lower and upper portions. Therefore, the ESD protection layer 320 may be formed in a polyhedral shape having a top surface and a bottom surface flat and having angular sides. In this case, the ESD protection layer 320 may be formed on two sheets 106a and 106b as shown in FIG. 12C. That is, the lower sheet 106a has a first through-hole formed in a shape that becomes narrower from the lower surface to the upper surface, and the upper sheet 106b has a second width that becomes wider from the lower surface to the upper surface. Through-holes are formed, and at least a part of the ESD protection material is applied or filled in the first and second through-holes, and then stacked and pressed to form an ESD protection layer 320 having a width greater than that of the upper and lower portions of the center. Can be formed.
도 13을 참조하면, ESD 보호층(320)은 일 방향으로의 단면 형상이 타원형으로 형성될 수 있다. 즉, ESD 보호층(320)은 계란형으로 형성될 수 있다. 예를 들어, X 방향으로 제 1 폭을 갖고 이와 직교하는 Y 방향으로 제 2 폭을 가지며, Z 방향으로 서로 다른 두께로 형성될 수 있다. 즉, 도 13의 (a) 및 도 13의 (b)에 도시된 바와 같이 X 방향으로 제 1 폭(w1)을 갖고 Y 방향으로 제 2 폭(w2)을 가지며, 제 1 폭(w1)이 제 2 폭(w2)보다 크거나 같도록 형성될 수 있다. 또한, Z 방향으로의 두께는 중앙부의 두께가 두껍고 가장자리로 갈수록 두께가 얇아질 수 있다. 즉, 중앙부가 제 1 두께(t1)를 가지고 그로부터 가장자리로 갈수록 두께가 얇아지도록 형성될 수 있다. 따라서, 중앙부와 가장자리 사이의 임의의 영역은 제 1 두께(t1)보다 얇은 제 2 두께(t2)를 갖도록 형성될 수 있다. 이때, ESD 보호부(320)은 상부면 및 하부면 전체가 절연 시트(106) 상에 노출될 수 있고, 일부만 절연 시트(106) 상에 노출될 수 있다. 예를 들어 X 방향으로의 제 1 폭의 1/3 정도만 노출되고 나머지 영역은 절연 시트(106) 내에 형성될 수 있다. 또한, ESD 보호층(320)은 도 13의 (c)에 도시된 바와 같이 두개의 시트(106a, 106b)에 형성될 수 있다. 즉, 하측 시트(106a)는 하부면으로부터 상부면으로 갈수록 폭이 넓어지는 형상으로 제 1 관통홀이 형성되고, 상측 시트(106b)는 하부면으로부터 상부면으로 갈수록 폭이 좁아지는 형상으로 제 2 관통홀이 형성되며, 이러한 제 1 및 제 2 관통홀 내에 ESD 보호 물질이 적어도 일부 도포 또는 충진된 후 적층 및 압착하여 중앙부의 폭이 상부 및 하부의 폭보다 큰 형상의 ESD 보호층(320)이 형성될 수 있다.Referring to FIG. 13, the ESD protection layer 320 may have an elliptical cross-sectional shape in one direction. That is, the ESD protection layer 320 may be formed in an egg shape. For example, it may have a first width in the X direction and a second width in the Y direction orthogonal thereto, and may have different thicknesses in the Z direction. That is, as shown in FIGS. 13A and 13B, the first width w1 in the X direction and the second width w2 in the Y direction have the first width w1. It may be formed to be greater than or equal to the second width (w2). In addition, the thickness in the Z direction may be thicker at the center portion and thinner at the edge. That is, the central portion may be formed to have a first thickness t1 and become thinner from the edge toward the edge. Thus, any region between the central portion and the edge may be formed to have a second thickness t2 that is thinner than the first thickness t1. In this case, the entire surface of the upper and lower surfaces of the ESD protection unit 320 may be exposed on the insulating sheet 106, and only a part thereof may be exposed on the insulating sheet 106. For example, only about one third of the first width in the X direction may be exposed, and the remaining area may be formed in the insulating sheet 106. In addition, the ESD protection layer 320 may be formed on two sheets 106a and 106b as shown in FIG. 13C. That is, the first through-hole is formed in a shape in which the lower sheet 106a becomes wider from the lower surface to the upper surface, and the second sheet 106b is in a shape in which the width narrows from the lower surface to the upper surface. Through-holes are formed, and at least a part of the ESD protection material is applied or filled in the first and second through-holes, and then stacked and pressed to form an ESD protection layer 320 having a width greater than that of the upper and lower portions of the center. Can be formed.
도 14를 참조하면, ESD 보호층(320)은 하부로부터 상부로 갈수록 폭이 넓어지는 형상으로 형성될 수 있다. 즉, 도 14의 (a)에 도시된 바와 같이 ESD 보호층(320)은 하나의 시트(106)에 하부가 상부보다 폭이 작고 상부로 갈수록 폭이 넓어지는 형상으로 형성될 수 있다. 물론, 이와 반대로 ESD 보호층(320)은 하부가 상부보다 크고 상부로 갈수록 폭이 좁아지는 형상으로 형성될 수 있다. 따라서, ESD 보호층은 단면 형상이 대략 사다리꼴 또는 역사다리꼴 형상으로 형성될 수 있다. 또한, 도 14의 (b)에 도시된 바와 같이 적어도 두개의 시트(106a, 106b)에 ESD 보호층(320)이 형성될 수 있다. 이를 위해 하측 시트(106a)에는 제 1 방전 전극(311)과 접촉되는 하부로부터 상부로 폭이 넓어지는 제 1 관통홀이 형성되고, 상측 시트(106b)에는 하부가 제 1 관통홀의 상부 폭과 동일 폭을 유지하고 상부로 갈수록 폭이 더 넓어지는 제 2 관통홀이 형성되어 제 1 및 제 2 관통홀에 ESD 보호 물질이 매립되고 적층 및 압착되어 ESD 보호층(320)이 형성될 수 있다.Referring to FIG. 14, the ESD protection layer 320 may be formed to have a width that increases from the bottom to the top. That is, as shown in (a) of FIG. 14, the ESD protection layer 320 may be formed in one sheet 106 in a shape in which the lower portion is smaller in width than the upper portion and wider in width toward the upper portion. Of course, on the contrary, the ESD protection layer 320 may be formed in a shape in which the lower portion is larger than the upper portion and the width thereof becomes narrower toward the upper portion. Therefore, the ESD protection layer can be formed in a substantially trapezoidal or inverted trapezoidal cross-sectional shape. In addition, as illustrated in FIG. 14B, an ESD protection layer 320 may be formed on at least two sheets 106a and 106b. To this end, a first through hole is formed in the lower sheet 106a, the width of which extends from the bottom to the upper portion in contact with the first discharge electrode 311, and in the upper sheet 106b, the lower portion is the same as the upper width of the first through hole. A second through hole that maintains the width and becomes wider as the upper portion thereof is formed may be formed, and the ESD protection layer 320 may be formed by embedding, stacking, and compressing the ESD protection material in the first and second through holes.
도 15를 참조하면, ESD 보호층(320)은 중앙부가 상부 및 하부보다 큰 폭으로 형성될 수 있다. 즉, ESD 보호층(320)은 하부에 소정 폭의 제 1 ESD 보호층(320a)이 형성되고, 제 1 ESD 보호층(320a) 상에 제 1 ESD 보호층(320a)보다 넓은 폭의 제 2 ESD 보호층(320b)이 형성되며, 제 2 ESD 보호층(320b) 상에 제 2 ESD 보호층(320b)보다 좁은 폭의 제 3 ESD 보호층(320c)이 형성될 수 있다. 여기서, 제 1 내지 제 3 ESD 보호층(320a, 302b, 320c)는 서로 동일 두께로 형성될 수 있다. 또한, 제 1 및 제 2 ESD 보호층(320a, 320c)는 동일 폭으로 형성되며, 중첩되어 형성될 수 있다. 그리고, 제 2 ESD 보호층(320b)은 제 1 및 제 3 ESD 보호층(320a, 320c)보다 1.5배 이상 넓은 폭으로 형성될 수 있다. 예를 들어, 제 2 ESD 보호층(320b)은 제 1 및 제 3 ESD 보호층(320a, 320c)보다 1.5배 내지 3배 넓은 폭으로 형성될 수 있다. 이러한 ESD 보호층(320)은 도 15의 (a)에 도시된 바와 같이 두개의 시트(106a, 106b)에 ESD 보호 물질이 적어도 일부 도포 또는 충진된 소정의 홀이 적층 및 압착되어 형성될 수 있다. 예를 들어, 하측 시트(106a)에는 하부로부터 2/3 두께까지 제 1 폭을 갖고 나머지 1/3 두께에 제 1 폭보다 큰 제 2 폭을 갖는 제 1 관통홀이 형성되고, 상측 시트(106b)에는 하부로부터 1/3 두께까지 제 2 폭을 갖고 나머지 2/3 두께는 제 1 폭을 갖는 제 2 관통홀이 형성되며, 이들 제 1 및 제 2 관통홀의 적어도 일부에 ESD 보호 물질이 도포 또는 충진된 후 적층 및 압착하여 ESD 보호층(320)이 형성될 수 있다. 물론, 도 15의 (b)에 도시된 바와 같이 세개의 시트(106a, 106b, 106c)에 ESD 보호층(320)이 형성될 수도 있다. 이를 위해 하측 시트(106a)에 제 1 폭의 제 1 관통홀이 형성되고, 중간 시트(106b)에 제 1 폭보다 큰 제 2 폭의 제 2 관통홀이 형성되며, 상측 시트(106c)에 제 1 폭의 제 3 관통홀이 형성되고, 이들 제 1 내지 제 3 관통홀의 적어도 일부에 ESD 보호 물질이 도포 또는 충진된 후 적층 및 압착하여 ESD 보호층(320)이 형성될 수 있다. 한편, ESD 보호층(320)이 ESD 보호 물질이 적어도 일부 도포 또는 충진되어 형성될 수 있는데, 예를 들어 도 15의 (c)에 도시된 바와 같이 폭이 넓은 제 2 ESD 보호층(320b)에는 ESD 보호 물질이 도포 또는 충진되고 폭이 좁은 제 1 및 제 3 ESD 보호층(320a, 320c)에는 ESD 보호 물질이 도포 또는 충진되지 않고 공극이 형성될 수 있다. 물론, 제 1 및 제 3 ESD 보호층(320a, 320c)에 ESD 보호 물질이 도포 또는 충진되고 이와 중첩되는 제 2 ESD 보호층(320b)의 일부 영역에만 ESD 보호 물질이 도포 또는 충진될 수 있다. 즉, 도 15의 (d)에 도시된 바와 같이 제 2 ESD 보호층(320b)은 제 1 및 제 3 ESD 보호층(320a, 320c)과 중첩된 영역에만 ESD 보호 물질이 도포 또는 충진되고 중첩되지 않는 영역에는 ESD 보호 물질이 도포 또는 충진되지 않고 공극이 형성될 수 있다.Referring to FIG. 15, the ESD protection layer 320 may have a central portion having a width greater than that of the upper and lower portions. That is, the first ESD protection layer 320a having a predetermined width is formed at the bottom of the ESD protection layer 320, and the second width of the ESD protection layer 320a is wider than that of the first ESD protection layer 320a. An ESD protection layer 320b is formed, and a third ESD protection layer 320c having a narrower width than the second ESD protection layer 320b may be formed on the second ESD protection layer 320b. Here, the first to third ESD protection layers 320a, 302b, and 320c may be formed to have the same thickness. In addition, the first and second ESD protection layers 320a and 320c may have the same width and overlap each other. The second ESD protection layer 320b may be formed to have a width that is 1.5 times or more wider than that of the first and third ESD protection layers 320a and 320c. For example, the second ESD protection layer 320b may be 1.5 to 3 times wider than the first and third ESD protection layers 320a and 320c. As shown in FIG. 15A, the ESD protection layer 320 may be formed by stacking and compressing a predetermined hole in which at least a part of the ESD protection material is applied or filled in the two sheets 106a and 106b. . For example, the lower sheet 106a is formed with a first through hole having a first width from the bottom to 2/3 thickness and a second width larger than the first width in the remaining 1/3 thickness, and the upper sheet 106b. ) Is formed with a second through hole having a second width from the bottom to a third thickness and the remaining 2/3 thickness having a first width, wherein at least some of these first and second through holes are coated with an ESD protection material or After filling, the ESD protection layer 320 may be formed by lamination and compression. Of course, the ESD protection layer 320 may be formed on the three sheets 106a, 106b, and 106c as shown in FIG. 15B. To this end, a first through hole of a first width is formed in the lower sheet 106a, a second through hole of a second width larger than the first width is formed in the intermediate sheet 106b, and a first through hole is formed in the upper sheet 106c. A third through hole of one width may be formed, and an ESD protection layer 320 may be formed by stacking and compressing the ESD protection material by applying or filling at least a portion of the first through third through holes. Meanwhile, the ESD protection layer 320 may be formed by applying or filling at least a portion of an ESD protection material. For example, as shown in FIG. 15C, the ESD protection layer 320 may have a wide width. The voids may be formed in the first and third ESD protection layers 320a and 320c to which the ESD protection material is applied or filled and the narrow first and third ESD protection layers 320a and 320c are not applied or filled. Of course, the ESD protection material may be applied or filled only to a portion of the second ESD protection layer 320b that is coated or filled with and overlaps the first and third ESD protection layers 320a and 320c. That is, as illustrated in FIG. 15D, the second ESD protection layer 320b is coated or filled with an ESD protection material only in an area overlapping the first and third ESD protection layers 320a and 320c. In areas that do not have an ESD protection material applied or filled, voids may be formed.
도 16을 참조하면, ESD 보호층(320)은 중앙부가 상부 및 하부보다 작은 폭으로 형성될 수 있다. 즉, ESD 보호층(320)은 하부에 소정 폭의 제 1 ESD 보호층(320a)이 형성되고, 제 1 ESD 보호층(320a) 상에 제 1 ESD 보호층(320a)보다 좁은 폭의 제 2 ESD 보호층(320b)이 형성되며, 제 2 ESD 보호층(320b) 상에 제 2 ESD 보호층(320b)보다 넓은 폭의 제 3 ESD 보호층(320c)이 형성될 수 있다. 여기서, 제 1 내지 제 3 ESD 보호층(320a, 302b, 320c)는 서로 동일 두께로 형성될 수 있다. 또한, 제 1 및 제 3 ESD 보호층(320a, 320c)는 동일 폭으로 형성되며, 중첩되어 형성될 수 있다. 그리고, 제 2 ESD 보호층(320b)은 제 1 및 제 3 ESD 보호층(320a, 320c)보다 1.5배 이상 좁은 폭으로 형성될 수 있다. 예를 들어, 제 2 ESD 보호층(320b)은 제 1 및 제 3 ESD 보호층(320a, 320c)보다 1.5배 내지 3배 좁은 폭으로 형성될 수 있다. 이러한 ESD 보호층(320)은 도 16의 (a)에 도시된 바와 같이 두개의 시트(106a, 106b)에 ESD 보호 물질이 적어도 일부 도포 또는 충진된 소정의 관통홀이 적층 및 압착되어 형성될 수 있다. 예를 들어, 하측 시트(106a)에는 하부로부터 2/3 두께까지 제 1 폭을 갖고 나머지 1/3 두께에 제 1 폭보다 작은 제 2 폭을 갖는 제 1 관통홀이 형성되고, 상측 시트(106b)에는 하부로부터 1/3 두께까지 제 2 폭을 갖고 나머지 2/3 두께는 제 1 폭을 갖는 제 2 관통홀이 형성되며, 이들 제 1 및 제 2 관통홀의 적어도 일부에 ESD 보호 물질이 도포 또는 충진된 후 적층 및 압착하여 ESD 보호층(320)이 형성될 수 있다. 물론, 도 16의 (b)에 도시된 바와 같이 세개의 시트(106a, 106b, 106c)에 ESD 보호층(320)이 형성될 수도 있다. 이를 위해 하측 시트(106a)에 제 1 폭의 제 1 관통홀이 형성되고, 중간 시트(106b)에 제 1 폭보다 작은 제 2 폭의 제 2 관통홀이 형성되며, 상측 시트(106c)에 제 1 폭의 제 3 관통홀이 형성되고, 이들 제 1 내지 제 3 관통홀의 적어도 일부에 ESD 보호 물질이 도포 또는 충진된 후 적층 및 압착하여 ESD 보호층(320)이 형성될 수 있다. 한편, ESD 보호층(320)이 ESD 보호 물질이 적어도 일부 도포 또는 충진되어 형성될 수 있는데, 예를 들어 도 16의 (c)에 도시된 바와 같이 폭이 넓은 제 1 및 제 3 ESD 보호층(320a, 320c)에는 ESD 보호 물질이 도포 또는 충진되고 폭이 좁은 제 2 ESD 보호층(320b)에는 ESD 보호 물질이 도포 또는 충진되지 않고 공극이 형성될 수 있다. 또한, 도 16의 (d)에 도시된 바와 같이 제 2 ESD 보호층(320b)에만 ESD 보호 물질이 도포 또는 충진되고, 제 1 및 제 3 ESD 보호층(320a, 320c)에는 공극이 형성될 수도 있다. 물론, 제 2 ESD 보호층(320b)에 ESD 보호 물질이 도포 또는 충진되고 이와 중첩되는 제 1 및 제 3 ESD 보호층(320a, 320c)의 일부 영역에만 ESD 보호 물질이 도포 또는 충진될 수 있다. 즉, 도 16의 (e)에 도시된 바와 같이 제 1 및 제 3 ESD 보호층(320a, 320c)에는 제 2 ESD 보호층(320b)과 중첩되는 영역에 ESD 보호 물질이 형성되고, 중첩되지 않은 영역에는 공극이 형성될 수 있다.Referring to FIG. 16, the ESD protection layer 320 may have a central portion smaller in width than the upper portion and the lower portion. That is, the ESD protection layer 320 has a first width of the first ESD protection layer 320a having a predetermined width, and a second width smaller than the first ESD protection layer 320a on the first ESD protection layer 320a. An ESD protection layer 320b is formed, and a third ESD protection layer 320c having a wider width than that of the second ESD protection layer 320b may be formed on the second ESD protection layer 320b. Here, the first to third ESD protection layers 320a, 302b, and 320c may be formed to have the same thickness. In addition, the first and third ESD protection layers 320a and 320c may have the same width and may overlap each other. The second ESD protection layer 320b may be formed to have a width that is 1.5 times or more narrower than that of the first and third ESD protection layers 320a and 320c. For example, the second ESD protection layer 320b may be 1.5 to 3 times narrower than the first and third ESD protection layers 320a and 320c. The ESD protection layer 320 may be formed by stacking and compressing a predetermined through hole in which at least a part of the ESD protection material is applied or filled in the two sheets 106a and 106b as shown in FIG. 16A. have. For example, the lower sheet 106a is formed with a first through hole having a first width from the bottom to 2/3 thickness and a second width smaller than the first width in the remaining 1/3 thickness, and the upper sheet 106b. ) Is formed with a second through hole having a second width from the bottom to a third thickness and the remaining 2/3 thickness having a first width, wherein at least some of these first and second through holes are coated with an ESD protection material or After filling, the ESD protection layer 320 may be formed by lamination and compression. Of course, the ESD protection layer 320 may be formed on the three sheets 106a, 106b, and 106c as shown in FIG. 16B. To this end, a first through hole of a first width is formed in the lower sheet 106a, a second through hole of a second width smaller than the first width is formed in the intermediate sheet 106b, and a first through hole is formed in the upper sheet 106c. A third through hole of one width may be formed, and an ESD protection layer 320 may be formed by stacking and compressing the ESD protection material by applying or filling at least a portion of the first through third through holes. Meanwhile, the ESD protection layer 320 may be formed by applying or filling at least a part of an ESD protection material. For example, as illustrated in FIG. An ESD protection material may be coated or filled on the 320a and 320c, and a gap may be formed in the narrow second ESD protection layer 320b without the ESD protection material being applied or filled. In addition, as shown in FIG. 16D, an ESD protection material may be applied or filled only on the second ESD protection layer 320b, and voids may be formed in the first and third ESD protection layers 320a and 320c. have. Of course, the ESD protection material may be applied or filled only to a portion of the first and third ESD protection layers 320a and 320c overlapping or overlapping the ESD protection material 320b. That is, as shown in FIG. 16E, an ESD protection material is formed in an area overlapping the second ESD protection layer 320b in the first and third ESD protection layers 320a and 320c, and is not overlapped. In the region, voids may be formed.
도 17을 참조하면, ESD 보호층(320)은 일 방향으로 두께가 증감하는 형상으로 형성될 수 있다. 예를 들어, ESD 보호층(320)은 X 방향의 일 측으로부터 타 측으로 두께가 감소하다가 다시 증가하여 단면 형상이 예컨데 땅콩 형상으로 형성될 수 있다. 즉, X 방향의 일 단부로부터 타 단부 방향으로 갈수록 두께가 증가하다가 다시 감소한 후 다시 증가하는 형상으로 형성되며, 일 단부 및 타 단부의 두께가 같고 중앙부에서 가장 얇은 형상으로 형성될 수 있다. 물론, 불규칙한 형상으로 형성되어 적어도 일 영역에서 두께가 가장 얇고 그로부터 일측 및 타측의 적어도 일 방향으로 갈수록 두께가 증가하는 형상으로 형성될 수도 있다. 이러한 땅콩 형상의 ESD 보호층(320)은 적어도 하나의 절연 시트(106)에 형성될 수 있다. 즉, ESD 보호층(320)이 하나의 절연 시트(106)에 형성될 수도 있고, 둘 이상의 절연 시트(106)에 형성될 수도 있다.Referring to FIG. 17, the ESD protection layer 320 may be formed in a shape in which thickness increases or decreases in one direction. For example, the ESD protection layer 320 may be reduced in thickness from one side in the X direction to the other side and then increased again to form a cross-sectional shape, for example, in a peanut shape. That is, the thickness increases from one end in the X direction toward the other end, and then decreases again, and then increases again. The thickness of one end and the other end is the same and may be formed in the thinnest shape in the center. Of course, it may be formed in an irregular shape so as to have a thickness that is thinnest in at least one region and increases in thickness in at least one direction from one side and the other side therefrom. The peanut protection ESD protection layer 320 may be formed on at least one insulating sheet 106. That is, the ESD protection layer 320 may be formed on one insulating sheet 106 or may be formed on two or more insulating sheets 106.
도 18을 참조하면, ESD 보호층(320)은 상부 및 하부의 폭이 넓고 그 사이의 중앙부로 갈수록 폭이 좁아지는 형상으로 형성될 수 있다. 즉, ESD 보호층(320)은 두께 방향, 즉 Z 방향의 중앙으로부터 하측 및 상측으로 갈수록 폭이 넓어지도록 형성될 수 있다. 이러한 ESD 보호층(320)은 두개의 절연 시트(106a, 106b)에 형성될 수 있다. 예를 들어, 하측 절연 시트(106a)에는 하부로부터 상부로 갈수록 폭이 좁아지는 형상으로 제 1 관통홀이 형성되고, 상측 절연 시트(106b)에는 하부로부터 상부로 갈수록 폭이 넓어지는 형상으로 제 2 관통홀이 형성되며, 제 1 및 제 2 관통홀의 적어도 일 영역에 ESD 보호 물질이 도포 또는 충진된 후 적층 및 압착되어 ESD 보호층(320)이 형성될 수 있다.Referring to FIG. 18, the ESD protection layer 320 may be formed in a shape in which the upper and lower portions of the ESD protection layer 320 are wide and narrow in width toward the center portion therebetween. That is, the ESD protection layer 320 may be formed to be wider from the thickness direction, that is, the lower side and the upper side from the center in the Z direction. The ESD protection layer 320 may be formed on two insulating sheets 106a and 106b. For example, a first through hole is formed in the lower insulating sheet 106a in a shape that becomes narrower from the bottom to an upper portion, and a second through hole is formed in the upper insulating sheet 106b in a width that becomes wider from the lower portion to the upper portion thereof. The through hole may be formed, and the ESD protection layer 320 may be formed by stacking and compressing the ESD protection material after applying or filling the ESD protection material in at least one region of the first and second through holes.
상기한 바와 같이 적어도 일 영역의 두께 및 폭의 적어도 어느 하나를 다른 영역과 다르게 ESD 보호층(320)을 형성함으로써 ESD 전압을 효율적으로 분배할 수 있고, 그에 따라 ESD 전압을 더욱 효율적으로 바이패스시킬 수 있다.As described above, at least one of the thickness and the width of at least one region may be formed differently from the other regions, thereby effectively distributing the ESD voltage, thereby bypassing the ESD voltage more efficiently. Can be.
한편, 본 발명의 제 1 내지 제 3 실시 예는 ESD 보호층(320)이 절연 시트(104)에 형성된 관통홀에 ESD 보호 물질이 매립 또는 도포되어 형성되었다. 그러나, ESD 보호층(320)은 절연 시트의 소정 영역에 형성되고, ESD 보호층(320)에 각각 접촉되도록 방전 전극(310)이 형성될 수 있다. 즉, 도 19의 제 4 실시 예의 단면도에 도시된 바와 같이 절연 시트(106) 상에 두 방전 전극(311, 312)이 수평 방향으로 소정 간격 이격되어 형성되고, 두 방전 전극(311, 312) 사이에 ESD 보호층(320)이 형성될 수 있다. 이 경우에도, ESD 보호층(320)은 적어도 일 영역의 두께 및/또는 폭이 다른 영역과 다르게 형성될 수 있다. 또한, ESD 보호층(320)은 Y 방향으로의 폭이 방전 전극(311, 312)의 폭보다 크게 형성될 수 있다. 그리고, 내부 전극(200)의 X 방향으로의 길이 및 Y 방향으로의 폭이 방전 전극(311, 312)의 길이 및 폭보다 크고, 내부 전극(200)의 Y 방향으로의 폭이 ESD 보호층(320)의 폭보다 크다.Meanwhile, in the first to third embodiments of the present invention, an ESD protection material is embedded or coated in a through hole in which the ESD protection layer 320 is formed in the insulating sheet 104. However, the ESD protection layer 320 may be formed in a predetermined region of the insulating sheet, and the discharge electrode 310 may be formed to contact the ESD protection layer 320, respectively. That is, as shown in the cross-sectional view of the fourth embodiment of FIG. 19, two discharge electrodes 311 and 312 are formed on the insulating sheet 106 at a predetermined interval in the horizontal direction, and between the two discharge electrodes 311 and 312. An ESD protection layer 320 may be formed on the substrate. Even in this case, the ESD protection layer 320 may be formed differently from other regions where the thickness and / or width of at least one region is different. In addition, the width of the ESD protection layer 320 in the Y direction may be greater than the widths of the discharge electrodes 311 and 312. The length of the internal electrode 200 in the X direction and the width in the Y direction are greater than the lengths and the widths of the discharge electrodes 311 and 312, and the width of the internal electrode 200 in the Y direction is the ESD protection layer ( Greater than the width of 320).
ESD 보호부(3000)는 동일 평면 상에 이격되어 형성된 적어도 두개의 방전 전극(311, 312)과, 적어도 두개의 방전 전극(311, 312) 사이에 마련된 적어도 하나의 ESD 보호층(320)을 포함할 수 있다. 즉, 시트의 소정 영역, 예를 들어 중앙부에서 서로 이격되도록 외부 전극(5000)이 형성된 방향, 즉 X 방향으로 두개의 방전 전극(311, 312)이 마련될 수 있고, 또한 이와 직교하는 방향으로 적어도 둘 이상의 방전 전극(미도시)이 더 마련될 수도 있다. 따라서, 외부 전극(5000)이 형성된 방향과 직교하는 방향으로 적어도 하나의 방전 전극이 형성되고, 소정 간격 이격되어 대향되도록 적어도 하나의 방전 전극이 형성될 수 있다. 예를 들어, ESD 보호부(3000)는 도 8에 도시된 바와 같이 제 6 절연 시트(106)와, 제 6 절연 시트(106) 상에 이격되어 형성된 제 1 및 제 2 방전 전극(311, 312)과, 제 6 절연 시트(106) 상에 형성된 ESD 보호층(320)을 포함할 수 있다. 여기서, ESD 보호층(320)은 적어도 일부가 제 1 및 제 2 방전 전극(311, 312)과 연결되도록 형성될 수 있다. 제 1 방전 전극(311)은 외부 전극(5100)과 연결되어 제 6 절연 시트(106) 상에 형성되며 말단부가 ESD 보호층(320)과 연결되도록 형성된다. 제 2 방전 전극(312)은 외부 전극(5200)과 연결되어 제 6 절연 시트(106) 상에 제 1 방전 전극(311)과 이격되어 형성되며 말단부가 ESD 보호층(320)과 연결되도록 형성된다. ESD 보호층(320)은 제 6 절연 시트(106)의 소정 영역, 예를 들어 중심부에 제 1 및 제 2 방전 전극(311, 312)과 연결되도록 형성될 수 있다. 이때, ESD 보호층(320)은 제 1 및 제 2 방전 전극(311, 312)과 일부 중첩되도록 형성될 수 있다. ESD 보호층(320)이 제 1 및 제 2 방전 전극(311, 312) 사이의 노출된 제 6 절연 시트(106) 상에 형성되어 제 1 및 제 2 방전 전극(311, 312)의 측면과 연결될 수도 있다. 그러나, 이 경우 ESD 보호층(320)이 제 1 및 제 2 방전 전극(311, 312)과 접촉되지 않고 이격될 수 있으므로 제 1 및 제 2 방전 전극(311, 312)과 중첩되도록 ESD 보호층(320)을 형성하는 것이 바람직하다. The ESD protection unit 3000 includes at least two discharge electrodes 311 and 312 spaced apart on the same plane and at least one ESD protection layer 320 provided between the at least two discharge electrodes 311 and 312. can do. That is, two discharge electrodes 311 and 312 may be provided in a direction in which the external electrodes 5000 are formed so as to be spaced apart from each other in a predetermined region of the sheet, for example, in the X direction, and at least in a direction orthogonal thereto. Two or more discharge electrodes (not shown) may be further provided. Accordingly, at least one discharge electrode may be formed in a direction orthogonal to the direction in which the external electrode 5000 is formed, and at least one discharge electrode may be formed to face each other at a predetermined interval. For example, the ESD protection unit 3000 may include the sixth insulating sheet 106 and the first and second discharge electrodes 311 and 312 spaced apart from the sixth insulating sheet 106. ) And an ESD protection layer 320 formed on the sixth insulating sheet 106. Here, the ESD protection layer 320 may be formed such that at least a portion thereof is connected to the first and second discharge electrodes 311 and 312. The first discharge electrode 311 is connected to the external electrode 5100 to be formed on the sixth insulating sheet 106, and the end portion thereof is connected to the ESD protection layer 320. The second discharge electrode 312 is connected to the external electrode 5200 and is formed to be spaced apart from the first discharge electrode 311 on the sixth insulating sheet 106, and the end portion thereof is connected to the ESD protection layer 320. . The ESD protection layer 320 may be formed to be connected to the first and second discharge electrodes 311 and 312 at a predetermined region, for example, a central portion of the sixth insulating sheet 106. In this case, the ESD protection layer 320 may be formed to partially overlap the first and second discharge electrodes 311 and 312. An ESD protection layer 320 is formed on the exposed sixth insulating sheet 106 between the first and second discharge electrodes 311 and 312 to be connected to the side surfaces of the first and second discharge electrodes 311 and 312. It may be. However, in this case, since the ESD protection layer 320 may be spaced apart from the first and second discharge electrodes 311 and 312 without being in contact with each other, the ESD protection layer 320 may overlap the first and second discharge electrodes 311 and 312. It is preferred to form 320).
한편, 본 발명의 제 4 실시 예는 방전 전극(310)과 ESD 보호층(320)이 동일 평면에 형성되어 다양한 형상으로 변형될 수 있다. 예를 들어 도 20의 (a)에 도시된 바와 같이 ESD 보호층(320)의 일부가 제 1 방전 전극(311)와 중첩되고 나머지 일부가 절연 시트(105) 상에 접촉 형성될 수 있다. 즉, ESD 보호층(320)은 제 1 방전 전극(311)의 상부 및 측면에 형성될 수 있다. 그리고, 제 2 방전 전극(312)은 ESD 보호층(320)의 상면 및 측면에 접촉되어 절연 시트(200) 상에 형성될 수 있다. 이 경우에도 ESD 보호층(320)은 적어도 어느 한 영역의 두께 및 폭의 어느 하나가 다른 영역과 다를 수 있다. 즉, X 방향으로의 폭이 Y 방향으로의 폭보다 클 수 있고, 수직 방향으로 적어도 어느 한 영역의 두께가 다른 영역과 다를 수 있다. 예를 들어, 절연 시트(105) 상에 접촉되는 영역의 두께가 제 1 및 제 2 방전 전극(311, 312) 사이에 형성된 영역의 두께보다 두꺼울 수 있다.Meanwhile, in the fourth embodiment of the present invention, the discharge electrode 310 and the ESD protection layer 320 may be formed on the same plane, and thus may be modified in various shapes. For example, as shown in FIG. 20A, a portion of the ESD protection layer 320 may overlap the first discharge electrode 311, and a portion of the ESD protection layer 320 may be in contact with the insulating sheet 105. That is, the ESD protection layer 320 may be formed on the top and side surfaces of the first discharge electrode 311. In addition, the second discharge electrode 312 may be formed on the insulating sheet 200 in contact with the top and side surfaces of the ESD protection layer 320. In this case, the ESD protection layer 320 may have any one of a thickness and a width of at least one region different from the other regions. That is, the width in the X direction may be larger than the width in the Y direction, and the thickness of at least one region in the vertical direction may be different from the other region. For example, the thickness of the region in contact with the insulating sheet 105 may be thicker than the thickness of the region formed between the first and second discharge electrodes 311 and 312.
또한, 도 20의 (b)에 도시된 바와 같이 ESD 보호층(320)은 제 1 방전 전극(311)의 상부에 접촉 형성되며, 제 2 방전 전극(312)은 ESD 보호층(320)의 상부면에 접촉되어 절연 시트(312) 상에 형성될 수 있다. 이때, 제 2 방전 전극(312)과 ESD 보호층(320) 및 제 1 방전 전극(311)의 측면에는 공간(A)이 형성될 수 있다. 즉, 공간(A)은 적어도 제 1 방전 전극(311)과 제 2 방전 전극(312)이 접촉되지 않도록 형성될 수 있다. 이러한 공간(A)을 형성하기 위해 제 1 방전 전극(311)을 형성하기 전에 ESD 보호층(320)의 측면에 고분자 물질 등을 이용한 스페이서를 형성하고, 이후 소성 공정에서 형성 시 고분자 물질이 휘발됨으로써 공간(A)이 형성될 수 있다. 물론, 공간(A)에는 절연물이 형성될 수도 있고, ESD 보호층(320)이 연장되어 형성될 수도 있다.In addition, as shown in FIG. 20B, the ESD protection layer 320 is in contact with the upper portion of the first discharge electrode 311, and the second discharge electrode 312 is formed on the upper portion of the ESD protection layer 320. In contact with the surface may be formed on the insulating sheet 312. In this case, a space A may be formed on side surfaces of the second discharge electrode 312, the ESD protection layer 320, and the first discharge electrode 311. That is, the space A may be formed so that at least the first discharge electrode 311 and the second discharge electrode 312 do not contact each other. Before forming the first discharge electrode 311 to form the space A, a spacer using a polymer material is formed on the side of the ESD protection layer 320, and then the polymer material is volatilized during formation in the firing process. Space A may be formed. Of course, an insulation may be formed in the space A, and the ESD protection layer 320 may be extended.
그리고, 도 20의 (c)에 도시된 바와 같이 단차를 갖는 절연 시트(200)를 이용하여 ESD 보호부(3000)를 구현한 수 있다. 즉, 일부 영역이 다른 영역에 비해 얇은 두께를 갖는 절연 시트(200)의 얇은 영역에 제 1 방전 전극(311)을 형성하고, 단차가 제거되도록 제 1 방전 전극(311) 상에 ESD 보호층(320)이 형성되며, 두꺼운 영역에 ESD 보호층(320)과 중첩되도록 제 2 방전 전극(312)을 형성할 수 있다.As shown in FIG. 20C, the ESD protection unit 3000 may be implemented using the insulating sheet 200 having a step. That is, the first discharge electrode 311 is formed in a thin region of the insulating sheet 200 in which some regions have a thinner thickness than other regions, and the ESD protection layer (3) is formed on the first discharge electrode 311 so that the step is removed. 320 may be formed, and the second discharge electrode 312 may be formed to overlap the ESD protection layer 320 in a thick region.
또한, ESD 보호층(320)과 방전 전극(310)이 동일 평면 상에 형성되는 경우에도 일 방전 전극(310)과 인접한 캐패시터부(2000, 4000)의 내부 전극이 동일 외부 전극(5000)에 연결될 수도 있다. 즉, 도 21에 도시된 바와 같이 제 1 방전 전극(311)과 이와 인접한 제 4 내부 전극(204)는 제 1 외부 전극(5100)에 연결되고, 제 2 방전 전극(312)과 이와 인접한 제 5 내부 전극(205)는 제 2 외부 전극(5200)에 연결될 수 있다. 이때, 제 4 내부 전극(204)은 제 1 방전 전극(311)과 동일 길이로 형성되고, 제 5 내부 전극(205)는 제 2 방전 전극(312)과 동일 길이로 형성될 수 있다. 즉, 제 4 내부 전극(204)이 제 2 방전 전극(312)과 일부 중첩되어 형성되거나, 제 5 내부 전극(205)이 제 1 방전 전극(311)과 일부 중첩되어 형성될 경우 절연 시트(100)가 절연 파괴되면 ESD 전압이 흐를 수 있기 때문에 방전 전극(310)과 인접하고 동일 외부 전극(5000)과 연결되는 내부 전극(200)은 방전 전극(310)보다 짧거나 같은 길이로 형성되는 것이 바람직하다. 또한, 방전 전극(310)과 ESD 보호층(320)이 동일 평면 상에 형성되는 경우에도 방전 전극(310)과 인접한 내부 전극(204, 205) 사이의 거리(A1, A2)는 캐패시터부(2000, 4000)의 두 내부 전극(200) 사이의 거리(C1, C2)보다 짧거나 같을 수 있다. 즉, A1=A2≤C1=C2일 수 있다. 이때, A1과 A2는 다를 수 있으며, C1과 C2 또한 다를 수 있다.In addition, even when the ESD protection layer 320 and the discharge electrode 310 are formed on the same plane, internal electrodes of the capacitor parts 2000 and 4000 adjacent to the one discharge electrode 310 may be connected to the same external electrode 5000. It may be. That is, as shown in FIG. 21, the first discharge electrode 311 and the fourth internal electrode 204 adjacent thereto are connected to the first external electrode 5100, and the second discharge electrode 312 and the fifth adjacent electrode 512 are adjacent to each other. The internal electrode 205 may be connected to the second external electrode 5200. In this case, the fourth internal electrode 204 may be formed to have the same length as the first discharge electrode 311, and the fifth internal electrode 205 may be formed to have the same length as the second discharge electrode 312. That is, when the fourth internal electrode 204 partially overlaps the second discharge electrode 312, or when the fifth internal electrode 205 partially overlaps the first discharge electrode 311, the insulating sheet 100 is formed. ), The ESD voltage may flow when the insulation breaks, so that the inner electrode 200 adjacent to the discharge electrode 310 and connected to the same external electrode 5000 is formed to have a length shorter or the same as the discharge electrode 310. Do. In addition, even when the discharge electrode 310 and the ESD protection layer 320 are formed on the same plane, the distances A1 and A2 between the discharge electrode 310 and the adjacent internal electrodes 204 and 205 may be the capacitor portion 2000. It may be less than or equal to the distance (C1, C2) between the two internal electrodes 200 of, 4000. That is, A1 = A2 ≦ C1 = C2. At this time, A1 and A2 may be different, and C1 and C2 may also be different.
그리고, 도 22에 도시된 바와 같이 방전 전극(310)과 ESD 보호층(320)이 동일 평면 상에 형성되는 경우에도 외부 전극(5000)이 내부 전극(200)과 일부 중첩되도록 형성되어 감전 방지 소자의 캐패시턴스를 조절할 수 있다.In addition, as shown in FIG. 22, even when the discharge electrode 310 and the ESD protection layer 320 are formed on the same plane, the external electrode 5000 is formed to partially overlap with the internal electrode 200, thereby preventing an electric shock. You can adjust the capacitance of.
한편, 칩 사이즈가 작아지면서 설계 가능한 공간이 적어지게 된다. 따라서, 좁은 공간에서도 높은 ESD 내압 특성을 갖는 감전 방지 소자의 내부 구조가 필요하다. 그런데, 감전 방지 소자의 사이즈가 작아지게 되면 공간 부족으로 인하여 절연 시트의 두께가 얇아질 수 밖에 없고, 이는 절연 시트 자체의 내압 특성이 저하되어 낮은 레벨의 ESD를 인가하여도 쉽게 절연 시트의 절연 저항이 파괴되는 현상이 발생된다. 이러한 문제를 해결하기 위해 복수 형상의 플로팅 타입(floating type) 구조를 이용하여 일반적인 적층 타입보다 동일 공간 내에서 ESD 내압 특성을 개선할 수 있다. 즉, 캐패시터부의 내부 전극의 형상을 변형하여 내부 전극 사이의 일 영역에서 절연 시트의 두께가 2배 이상 증가되기 때문에 ESD 내압 특성이 유지될 수 있다. 이는 감전 방지 소자가 갖는 ESD 보호부의 설계와 맞물려 보다 높은 ESD 내성 개선 효과를 보인다. 결국, ESD 보호부의 반복적인 ESD 전압에 의한 기능 저하로 인하여 ESD가 ESD 보호부의 ESD 보호층으로 패스되지 않을 경우 캐패시터부가 데미지를 입어 절연 파괴가 발생될 수 있고, ESD 보호부의 기능 저하가 없더라고 ESD 전압 유입 시 감전 방지 소자의 ESD 보호부의 반응 시간까지의 1ns 내지 30ns 공백 시간에 캐패시터부에 ESD 전압 부하가 잠시 동안 발생되어 절연 파괴가 발생될 수 있다. 그러나, 캐패시터부를 플로팅 타입으로 형성함으로써 캐패시터층의 ESD 내압 특성을 높혀 절연 저항이 파괴되어 쇼트가 발생되는 현상을 개선할 수 있다.On the other hand, as the chip size becomes smaller, the designable space becomes smaller. Therefore, there is a need for an internal structure of an electric shock prevention device having high ESD withstand characteristics even in a narrow space. However, when the size of the electric shock prevention device is reduced, the thickness of the insulating sheet is inevitably reduced due to the lack of space, which lowers the breakdown voltage characteristic of the insulating sheet itself, so that the insulation resistance of the insulating sheet can be easily applied even when a low level of ESD is applied. This breaking phenomenon occurs. In order to solve this problem, it is possible to improve ESD withstand voltage characteristics in the same space than a general stacking type by using a floating shape having a plurality of shapes. That is, since the thickness of the insulating sheet is increased by more than two times in one region between the internal electrodes by deforming the shape of the internal electrodes of the capacitor part, the ESD resistance characteristics may be maintained. This, combined with the design of the ESD protection of the electric shock protection device, results in a higher ESD immunity improvement. As a result, if the ESD is not passed to the ESD protection layer of the ESD protection due to the repetitive ESD voltage of the ESD protection, the capacitor part may be damaged, causing dielectric breakdown, and the ESD protection may not be degraded. During voltage inflow, an ESD voltage load may be generated in the capacitor part for a while at a time between 1 ns and 30 ns of vacancy until the response time of the ESD protection part of the electric shock protection device, thereby causing dielectric breakdown. However, by forming the capacitor portion in the floating type, it is possible to improve the ESD breakdown characteristic of the capacitor layer, thereby improving the phenomenon in which the insulation resistance is destroyed and the short is generated.
이러한 캐패시터부를 플로팅 타입으로 형성하는 본 발명의 다양한 실시 예를 도 23 내지 도 26을 이용하여 설명하면 다음과 같다.Hereinafter, various embodiments of the present invention for forming the capacitor unit in the floating type will be described with reference to FIGS. 23 to 26.
도 23 내지 도 26을 참조하면, 본 발명의 다른 실시 예들에 따른 감전 방지 소자는 복수의 절연 시트(101 내지 113; 100)가 적층된 적층체(1000)로 이루어지며, 적층체(1000) 내에 제 1 캐패시터부(2000), ESD 보호부(3000) 및 제 2 캐패시터부(4000)가 마련될 수 있다. 또한, 적층체(1000)의 서로 대향하는 두 측면에 형성되어 제 1 및 제 2 캐패시터부(2000, 4000)와 ESD 보호부(3000)와 연결되는 외부 전극(5100, 5200; 5000)을 더 포함할 수 있다. 제 1 캐패시터부(2000)는 복수의 내부 전극(201 내지 205)을 구비하며, 제 2 캐패시터부(4000) 또한 복수의 내부 전극(208 내지 212)을 포함할 수 있다. 즉, 제 1 및 제 2 캐패시터부(2000, 4000)는 동일한 수, 예를 들어 5개의 내부 전극을 각각 구비할 수 있다. 또한, 제 1 및 제 2 캐패시터부(2000, 4000) 사이에 방전 전극(311 및 312)과 이들 사이에 마련된 ESD 보호층(320)을 포함하는 ESD 보호부(3000)가 마련된다. 여기서, 제 1 및 제 2 캐패시터부(2000, 4000)는 적어도 하나의 내부 전극이 적어도 일 영역이 제거된 형상으로 형성될 수 있다.23 to 26, an electric shock prevention device according to another exemplary embodiment of the present disclosure may include a laminate 1000 in which a plurality of insulating sheets 101 to 113; 100 are stacked, and in the laminate 1000. The first capacitor part 2000, the ESD protection part 3000, and the second capacitor part 4000 may be provided. In addition, the electronic device may further include external electrodes 5100, 5200; 5000 formed on two opposite sides of the stack 1000 and connected to the first and second capacitor parts 2000 and 4000 and the ESD protection part 3000. can do. The first capacitor part 2000 may include a plurality of internal electrodes 201 to 205, and the second capacitor part 4000 may also include a plurality of internal electrodes 208 to 212. That is, the first and second capacitor parts 2000 and 4000 may have the same number, for example, five internal electrodes. In addition, an ESD protection unit 3000 including discharge electrodes 311 and 312 and an ESD protection layer 320 provided therebetween is provided between the first and second capacitor units 2000 and 4000. Here, the first and second capacitor parts 2000 and 4000 may be formed in a shape in which at least one internal electrode has at least one region removed.
도 23에 도시된 바와 같이, 제 1 캐패시터부(2000)의 내부 전극(201)이 예를 들어 중앙부가 소정 폭으로 제거된 형상으로 형성되고, ESD 보호부(3000)를 사이에 두고 이와 대칭적 위치에 마련된 제 2 캐패시터부(4000)의 내부 전극(210) 또한 내부 전극(201)과 동일한 위치에 소정 영역이 제거된 형상으로 형성될 수 있다. 내부 전극(201, 210)이 소정 영역이 제거되어 형성되므로 그와 인접한 내부 전극(202, 209)과의 중첩 면적이 작아지게 된다. 이때, 소정 영역이 제거되어 두 영역으로 나뉜 내부 전극(201, 210)은 두 영역이 각각 제 1 및 제 2 외부 전극(5100, 5200)과 연결될 수 있다. 이렇게 내부 전극(201, 210)의 소정 영역이 제거된 형상으로 형성됨으로써 내부 전극(201, 210)와 인접한 내부 전극(202, 209) 사이에 절연 시트(102, 112)이 두껍게 형성된다. 즉, 내부 전극(202)과 내부 전극(201)의 제거된 부분 사이에 두개의 절연 시트(101, 102)가 마련되므로 절연 시트(100)의 두께가 증가하게 된다. 따라서, 캐패시터부(2000, 4000)의 내부 전극(200) 사이의 일 영역에서 절연 시트(100)의 두께가 적어도 2배 증가되기 때문에 ESD 내압 특성이 유지될 수 있다.As shown in FIG. 23, the internal electrode 201 of the first capacitor part 2000 is formed in a shape in which the center part is removed to a predetermined width, for example, and is symmetrical with the ESD protection part 3000 interposed therebetween. The internal electrode 210 of the second capacitor part 4000 provided at the location may also be formed in a shape in which a predetermined region is removed at the same location as the internal electrode 201. Since the internal electrodes 201 and 210 are formed by removing a predetermined region, an overlapping area with the internal electrodes 202 and 209 adjacent thereto is reduced. In this case, two regions may be connected to the first and second external electrodes 5100 and 5200, respectively. As such, the predetermined regions of the internal electrodes 201 and 210 are removed to form a thick insulating sheet 102 and 112 between the internal electrodes 201 and 210 and the adjacent internal electrodes 202 and 209. That is, since two insulating sheets 101 and 102 are provided between the inner electrode 202 and the removed portion of the inner electrode 201, the thickness of the insulating sheet 100 is increased. Therefore, since the thickness of the insulating sheet 100 is increased at least twice in one region between the internal electrodes 200 of the capacitor parts 2000 and 4000, the ESD resistance characteristic may be maintained.
또한, 도 24에 도시된 바와 같이, 제 1 캐패시터부(2000)의 내부 전극들(201, 203, 205)의 예를 들어 중앙부의 소정 영역이 제거되고, 이와 ESD 보호부(3000)를 사이에 두고 대칭적으로 위치되는 제 2 캐패시터부(4000)의 내부 전극들(206, 208, 210)의 예를 들어 중앙부의 소정 영역이 제거될 수 있다. 이때, 내부 전극들(202, 204, 207, 209)은 외부 전극(5000)에 접촉되지 않고 내부 전극들(201, 203, 205, 206, 208, 210) 사이에서 이들의 적어도 일부와 중첩되도록 형성될 수 있다. 즉, 내부 전극들(202, 204, 207, 209)은 절연 시트(100)의 중앙부에 형성되어 절연 시트(100)의 중앙부에는 형성되지 않은 내부 전극들(201, 203, 205, 206, 208, 210)과 중첩되도록 형성될 수 있다.In addition, as shown in FIG. 24, for example, a predetermined region of the internal electrodes 201, 203, and 205 of the first capacitor unit 2000 is removed, and the ESD protection unit 3000 is interposed therebetween. For example, predetermined regions of the internal electrodes 206, 208, and 210 of the second capacitor unit 4000 positioned symmetrically may be removed. In this case, the internal electrodes 202, 204, 207, and 209 are formed to overlap at least some of the internal electrodes 201, 203, 205, 206, 208, and 210 without being in contact with the external electrode 5000. Can be. That is, the internal electrodes 202, 204, 207, and 209 are formed at the center of the insulating sheet 100 and not formed at the center of the insulating sheet 100, and the internal electrodes 201, 203, 205, 206, 208, It may be formed to overlap with 210.
한편, 제 1 및 제 2 캐패시터부(2000, 4000)의 내부 전극은 중앙 영역 뿐만 아니라 이로부터 소정 간격 이격된 영역이 제거될 수도 있다. 예를 들어, 도 25에 도시된 바와 같이 제 1 캐패시터부(2000)의 내부 전극들(201, 203, 205)의 중앙 영역이 제거되고, 이들 사이에 위치한 내부 전극들(202, 204)은 중앙 영역에서 소정 간격 이격된 양측에 제거부가 형성될 수 있다. 또한, 제 2 캐패시터부(4000)는 ESD 보호부(3000)를 사이에 두고 제 1 캐패시터부(2000)의 내부 전극들(201, 203, 205)과 대칭되는 위치의 내부 전극들(206, 208, 210)의 중앙 영역이 제거되고, 이들 사이에 위치한 내부 전극들(207, 209)은 제 1 캐패시터부(2000)의 내부 전극들(202, 204)과 동일 위치에 제거 영역이 형성될 수 있다.Meanwhile, the internal electrodes of the first and second capacitor parts 2000 and 4000 may be removed from the central area as well as the areas spaced a predetermined distance therefrom. For example, as shown in FIG. 25, the central region of the internal electrodes 201, 203, and 205 of the first capacitor unit 2000 is removed, and the internal electrodes 202 and 204 positioned therebetween are disposed in the center. Removal portions may be formed at both sides of the region spaced apart from each other by a predetermined interval. In addition, the second capacitor part 4000 has internal electrodes 206 and 208 at positions symmetrical with the internal electrodes 201, 203 and 205 of the first capacitor part 2000 with the ESD protection part 3000 interposed therebetween. , A central region of 210 may be removed, and internal regions 207 and 209 disposed therebetween may have a removal region formed at the same position as internal electrodes 202 and 204 of the first capacitor unit 2000. .
또한, 도 26에 도시된 바와 같이, 제 1 캐패시터부(2000)의 내부 전극들(201, 203, 205)의 중앙 영역에 둘 이상의 제거 영역이 형성되고, 이들 사이에 위치한 내부 전극들(202, 204)은 중앙 영역에서 소정 간격 이격된 양측에 제거 영역이 형성될 수 있다. 또한, 제 2 캐패시터부(4000)는 ESD 보호부(3000)를 사이에 두고 제 1 캐패시터부(2000)의 내부 전극들(201, 203, 205)과 대칭되는 위치의 내부 전극들(206, 208, 210)의 중앙 영역에 둘 이상의 제거 영역이 형성되고, 이들 사이에 위치한 내부 전극들(207, 209)은 제 1 캐패시터부(2000)의 내부 전극들(202, 204)과 동일 위치에 제거 영역이 형성될 수 있다.In addition, as illustrated in FIG. 26, at least two removal regions are formed in the central region of the internal electrodes 201, 203, and 205 of the first capacitor unit 2000, and the internal electrodes 202, which are positioned therebetween. 204 may be formed with removal regions on both sides spaced apart from the central region by a predetermined interval. In addition, the second capacitor part 4000 has internal electrodes 206 and 208 at positions symmetrical with the internal electrodes 201, 203 and 205 of the first capacitor part 2000 with the ESD protection part 3000 interposed therebetween. At least two removal regions are formed in the central region of the second and second regions 210, and the internal electrodes 207 and 209 disposed therebetween are disposed at the same position as the internal electrodes 202 and 204 of the first capacitor unit 2000. This can be formed.
물론, 제 1 및 제 2 방전 전극(311, 312)이 수평 방향으로 형성되고 ESD 보호층(320)이 이들과 접촉되도록 형성되는 경우에도 캐패시터부(2000, 4000)는 적어도 하나의 내부 전극이 플로팅 타입으로 형성될 수 있다.Of course, even when the first and second discharge electrodes 311 and 312 are formed in the horizontal direction and the ESD protection layer 320 is in contact with them, the capacitor parts 2000 and 4000 may float at least one internal electrode. It can be formed into a type.
한편, 본 발명의 실시 예들에 따른 감전 방지 소자는 ESD 보호부(3000)의 ESD 보호층(320)을 적어도 하나 이상 형성할 수 있다. 즉, 도 2, 도 3, 도 7 및 도 8에 도시된 바와 같이 X 방향으로 ESD 보호층(300)을 하나 형성할 수도 있고, 도 27 내지 도 30에 도시된 바와 같이 X 방향으로 ESD 보호층(320)을 둘 이상 복수로 형성할 수 있다. 이때, Y 방향으로도 ESD 보호층(320)이 복수 형성될 수 있다. 예를 들어, 도 27에 도시된 바와 같이 동일 평면 상에 두개의 ESD 보호층(320a, 320b)을 형성할 수도 있고, 도 28에 도시된 바와 같이 동일 평면 상에 세개의 ESD 보호층(320a, 320b, 320c)을 형성할 수도 있다. 적어도 두개 이상의 ESD 보호층(320a, 320b, 320c)은 내부 전극에 의해 연결될 수 있다. 또한, 도 29에 도시된 바와 같이 네개의 ESD 보호층(320a, 320b, 320c, 320d)가 두개씩 상하로 나뉘어 형성될 수도 있고, 도 30에 도시된 바와 같이 여섯개의 ESD 보호층(320a, 320b, 320c, 320d, 320e, 320f)가 세개씩 상하로 나뉘어 형성될 수 있다. 상하 이격되어 형성된 ESD 보호층들(320)은 상측 ESD 보호층들이 서로 연결되고 하측 ESD 보호층들이 서로 연결될 수 있다. 이렇게 복수의 ESD 보호층(320)이 형성되는 경우에도 각 ESD 보호층(320)은 동일 구조로 형성될 수 있고, 서로 다른 구조로 형성될 수 있다. Meanwhile, the electric shock prevention device according to the embodiments of the present invention may form at least one ESD protection layer 320 of the ESD protection unit 3000. That is, one ESD protection layer 300 may be formed in the X direction as shown in FIGS. 2, 3, 7, and 8, and the ESD protection layer in the X direction as shown in FIGS. 27 to 30. Two or more 320 may be formed. In this case, a plurality of ESD protection layers 320 may be formed in the Y direction. For example, as shown in FIG. 27, two ESD protection layers 320a and 320b may be formed on the same plane, and as shown in FIG. 28, three ESD protection layers 320a, 320b and 320c may also be formed. At least two ESD protection layers 320a, 320b, and 320c may be connected by internal electrodes. In addition, as shown in FIG. 29, four ESD protection layers 320a, 320b, 320c, and 320d may be divided into two, respectively, and as shown in FIG. 30, six ESD protection layers 320a, 320b, 320c, 320d, 320e, and 320f may be formed by being divided up and down by three. In the ESD protection layers 320 spaced apart from each other, the upper ESD protection layers may be connected to each other, and the lower ESD protection layers may be connected to each other. Even when the plurality of ESD protection layers 320 are formed as described above, each ESD protection layer 320 may be formed in the same structure or may be formed in a different structure.
물론, 제 1 및 제 2 방전 전극(311, 312)이 수평 방향으로 형성되고 ESD 보호층(320)이 이들과 접촉되도록 형성되는 경우에도 ESD 보호층(320)은 수직 방향 및 수평 방향의 적어도 한 방향으로 적어도 둘 이상 마련될 수 있다.Of course, even when the first and second discharge electrodes 311 and 312 are formed in the horizontal direction and the ESD protection layer 320 is formed in contact with them, the ESD protection layer 320 is at least one of the vertical direction and the horizontal direction. At least two may be provided in the direction.
상기한 바와 같이 본 발명에 따른 감전 방지 소자는 하나의 적층체 내에 적어도 하나의 캐패시터부(2000, 4000)와 적어도 하나 이상의 ESD 보호부(3000)가 형성될 수 있다. 예를 들어, 하나의 캐패시터와 둘 이상의 ESD 보호부가 형성될 수 있다. 이때, 캐패시터는 전자기기의 내부 회로와 금속 케이스 사이에 형성되고, 캐패시터와 접지 단자 사이에 ESD 보호부가 형성될 수 있다. 이를 위해 적층체의 서로 대향되는 두 측면에 제 1 및 제 2 외부 전극(5100, 5200)이 형성되고, 제 1 및 제 2 외부 전극(5100, 5200)이 형성되지 않는 서로 대향되는 두 측면에 제 3 및 제 4 외부 전극(미도시)이 형성될 수 있다. 제 1 및 제 2 외부 전극(5100, 5200)은 전자기기의 금속 케이스와 내부 회로 사이에 각각 마련되고, 제 3 및 제 4 외부 전극은 접지 단자와 연결될 수 있다. 즉, 제 1 및 제 2 외부 전극(5100, 5200)이 전자기기의 금속 케이스와 내부 회로 사이의 두 영역에 각각 연결되고 제 3 및 제 4 외부 전극은 접지 단자에 연결될 수 있다As described above, in the electric shock prevention device according to the present invention, at least one capacitor part 2000 and 4000 and at least one ESD protection part 3000 may be formed in one stack. For example, one capacitor and two or more ESD protections may be formed. In this case, the capacitor may be formed between the internal circuit of the electronic device and the metal case, and an ESD protection unit may be formed between the capacitor and the ground terminal. To this end, the first and second external electrodes 5100 and 5200 are formed on two opposite sides of the laminate, and the first and second external electrodes 5100 and 5200 are not formed on the two opposite sides. Third and fourth external electrodes (not shown) may be formed. The first and second external electrodes 5100 and 5200 may be provided between the metal case of the electronic device and the internal circuit, respectively, and the third and fourth external electrodes may be connected to the ground terminal. That is, the first and second external electrodes 5100 and 5200 may be connected to two regions between the metal case of the electronic device and the internal circuit, respectively, and the third and fourth external electrodes may be connected to the ground terminal.
또한, 본 발명에 따른 감전 방지 소자는 적층체(1000) 내에 수평 방향으로 복수의 캐패시터부(2000, 4000)와 복수의 ESD 보호부(3000)가 형성될 수 있다. 즉, 수직 방향으로 적층된 적어도 하나의 캐패시터부(2000, 4000)와 ESD 보호부(3000)가 수평 방향으로 적어도 둘 이상 배열되고, 수평 방향으로 배열된 적어도 둘 이상의 외부 전극(5000)와 연결됨으로써 복수의 캐패시터와 복수의 ESD 보호부로 이루어진 복수의 감전 방지 소자가 병렬로 마련될 수 있다. 따라서, 하나의 적층체(1000) 내에 두개 이상이 감전 방지 소자가 구현될 수 있다. 이때, 예를 들어 복수의 제 1 외부 전극(5100)은 전자기기의 메탈 케이스의 복수의 영역에 연결되고, 복수의 제 2 외부 전극(5200)은 전자기기의 접지 단자에 연결될 수 있다. 한편, 복수의 캐패시터부는 적어도 어느 하나의 적어도 어느 하나의 내부 전극이 다른 길이로 형성될 수 있다. 즉, 수평 방향으로 형성되어 서로 다른 캐패시터부를 이루는 복수의 내부 전극 중에서 적어도 하나의 내부 전극이 다른 내부 전극보다 짧거나 길게 형성될 수 있다. 물론, 내부 전극의 길이 뿐만 아니라 내부 전극의 중첩 면적, 내부 전극의 적층 수의 적어도 하나를 조절하여 캐패시턴스를 조절할 수 있다. 따라서, 복수의 캐패시터 중에서 적어도 어느 하나의 캐패시턴스를 다르게 할 수 있다. 즉, 하나의 적층체 내에 적어도 어느 하나가 다른 캐패시턴스를 갖는 복수의 캐패시터를 구현할 수 있다.In addition, in the electric shock prevention device according to the present invention, a plurality of capacitor parts 2000 and 4000 and a plurality of ESD protection parts 3000 may be formed in a horizontal direction in the stack 1000. That is, at least one capacitor part 2000 and 4000 and the ESD protection part 3000 stacked in the vertical direction are arranged in at least two in the horizontal direction and connected to at least two external electrodes 5000 in the horizontal direction. A plurality of electric shock prevention elements including a plurality of capacitors and a plurality of ESD protection units may be provided in parallel. Therefore, two or more electric shock prevention devices may be implemented in one laminate 1000. In this case, for example, the plurality of first external electrodes 5100 may be connected to a plurality of regions of the metal case of the electronic device, and the plurality of second external electrodes 5200 may be connected to a ground terminal of the electronic device. Meanwhile, at least one of at least one internal electrode of the plurality of capacitor parts may be formed to have a different length. That is, at least one inner electrode of the plurality of inner electrodes formed in the horizontal direction to form different capacitor parts may be formed to be shorter or longer than the other inner electrodes. Of course, the capacitance may be adjusted by adjusting not only the length of the inner electrode but also at least one of the overlapping area of the inner electrode and the stacking number of the inner electrode. Therefore, at least one capacitance of the plurality of capacitors may be different. That is, at least one of the plurality of capacitors having different capacitances may be implemented in one stack.
본 발명은 상기에서 서술된 실시 예에 한정되는 것이 아니라 서로 다른 다양한 형태로 구현될 수 있다. 즉, 상기의 실시 예는 본 발명의 개시가 완전하도록 하며 통상의 지식을 가진 자에게 발명의 범주를 완전하게 알려주기 위해 제공되는 것이며, 본 발명의 범위는 본원의 특허청구범위에 의해서 이해되어야 한다.The present invention is not limited to the above-described embodiments, but may be implemented in various forms. In other words, the above embodiments are provided to make the disclosure of the present invention complete and to fully inform those skilled in the art of the scope of the present invention, and the scope of the present invention should be understood by the claims of the present application. .

Claims (25)

  1. 복수의 절연 시트가 적층된 적층체;A laminate in which a plurality of insulating sheets are stacked;
    상기 적층체 내부에 형성된 복수의 내부 전극을 포함하는 캐패시터부;A capacitor unit including a plurality of internal electrodes formed in the stack;
    상기 적층체 내부에 형성되며, 적어도 둘 이상의 방전 전극과, 상기 방전 전극 사이에 마련되는 적어도 하나의 ESD 보호층을 포함하는 ESD 보호부; 및An ESD protection unit formed inside the stack and including at least two discharge electrodes and at least one ESD protection layer provided between the discharge electrodes; And
    상기 적층체 외부의 적어도 두 측면에 마련되어 상기 캐패시터부 및 ESD 보호부와 연결되는 외부 전극을 포함하고,An external electrode provided on at least two side surfaces of the laminate and connected to the capacitor part and the ESD protection part;
    상기 ESD 보호층은 적어도 일 영역의 두께 및 폭의 적어도 어느 하나가 다른 영역과 다르게 형성된 감전 방지 소자.The ESD protection layer is formed of at least one of the thickness and width of at least one region is different from the other region.
  2. 청구항 1에 있어서, 상기 방전 전극과 인접한 상기 내부 전극은 동일 외부 전극과 연결되는 감전 방지 소자.The electric shock prevention device of claim 1, wherein the inner electrode adjacent to the discharge electrode is connected to a same outer electrode.
  3. 청구항 1 또는 청구항 2에 있어서, 상기 외부 전극은 상기 적층체의 상부 및 하부의 적어도 어느 하나로 연장되어 상기 내부 전극과 일부 중첩되는 감전 방지 소자.The electric shock prevention device according to claim 1 or 2, wherein the external electrode extends to at least one of upper and lower portions of the laminate and partially overlaps the internal electrode.
  4. 청구항 3에 있어서, 상기 내부 전극의 일 방향의 길이는 상기 방전 전극의 길이보다 길거나 같고 상기 일 방향과 직교하는 타 방향으로의 폭은 상기 ESD 보호층의 폭 및 상기 방전 전극의 폭보다 큰 감전 방지 소자.The electric shock prevention of claim 3, wherein the length of one direction of the internal electrode is longer than or equal to the length of the discharge electrode, and the width of the internal electrode in another direction perpendicular to the one direction is greater than the width of the ESD protection layer and the width of the discharge electrode. device.
  5. 청구항 4에 있어서, 상기 ESD 보호층의 폭은 상기 방전 전극의 폭보다 큰 감전 방지 소자.The electric shock prevention device of claim 4, wherein a width of the ESD protection layer is larger than a width of the discharge electrode.
  6. 청구항 5에 있어서, 상기 방전 전극과 인접한 상기 내부 전극 사이의 거리를 A, 상기 방전 전극 사이의 거리를 B, 상기 내부 전극 사이의 거리를 C라 할 때 A≤C 또는 A≤B인 감전 방지 소자.The electric shock prevention device according to claim 5, wherein A ≤ C or A ≤ B, wherein A is the distance between the discharge electrode and the adjacent internal electrodes, A is the distance between the discharge electrodes, and B is the distance between the internal electrodes. .
  7. 청구항 6에 있어서, 상기 ESD 보호층은 다공성의 절연 물질과 도전 물질의 적어도 하나를 포함하는 ESD 보호 물질 및 공극의 적어도 하나를 포함하는 감전 방지 소자.The device of claim 6, wherein the ESD protection layer comprises at least one of an ESD protection material and a void including at least one of a porous insulating material and a conductive material.
  8. 청구항 7에 있어서, 상기 ESD 보호층은 상기 방전 전극 사이에 수직 방향으로 형성되거나 수평 방향으로 형성된 감전 방지 소자.The electric shock prevention device of claim 7, wherein the ESD protection layer is formed in a vertical direction or in a horizontal direction between the discharge electrodes.
  9. 청구항 8에 있어서, 상기 ESD 보호층은 적어도 하나의 절연 시트에 형성된 감전 방지 소자.The electric shock prevention device of claim 8, wherein the ESD protection layer is formed on at least one insulating sheet.
  10. 청구항 9에 있어서, 상기 ESD 보호층은 다면체 형상으로 형성된 감전 방지 소자.The electric shock prevention device of claim 9, wherein the ESD protection layer has a polyhedron shape.
  11. 청구항 10에 있어서, 상기 ESD 보호층은 일 방향의 중간 두께에서 폭이 가장 넓고 그 상부 및 하부로 갈수록 폭이 좁아지는 형상으로 형성된 감전 방지 소자.The electric shock prevention device of claim 10, wherein the ESD protection layer has a width that is widest at an intermediate thickness in one direction and narrows toward upper and lower portions thereof.
  12. 청구항 10에 있어서, 상기 ESD 보호층은 중앙 영역에서 두께가 가장 두껍고 그로부터 양 가장자리로 갈수록 두께가 얇아지는 형상으로 형성된 감전 방지 소자.The electric shock prevention device of claim 10, wherein the ESD protection layer is formed to have a thickness in a central region, the thickness being thinner toward both edges.
  13. 청구항 10에 있어서, 상기 ESD 보호층은 일 방향으로 두께가 감소하다가 다시 증가하는 형상으로 형성된 감전 방지 소자.The electric shock prevention device of claim 10, wherein the ESD protection layer has a shape in which the thickness decreases in one direction and then increases again.
  14. 청구항 9에 있어서, 상기 ESD 보호층은 상기 방전 전극 사이에 적어도 일부 접촉되도록 형성된 감전 방지 소자.The electric shock prevention device of claim 9, wherein the ESD protection layer is formed to at least partially contact the discharge electrodes.
  15. 청구항 14에 있어서, 상기 ESD 보호 물질은 상기 방전 전극의 적어도 어느 하나와 연결되고 나머지 영역은 공극이 형성된 감전 방지 소자.The electric shock prevention device of claim 14, wherein the ESD protection material is connected to at least one of the discharge electrodes and the remaining area is formed with a void.
  16. 청구항 7에 있어서, 상기 ESD 보호 물질은 상기 방전 전극과 접촉되지 않도록 관통홀 내의 적어도 일 영역에 형성되며, 나머지 영역은 공극이 형성된 감전 방지 소자.The electric shock prevention device of claim 7, wherein the ESD protection material is formed in at least one region in the through hole so as not to contact the discharge electrode, and the remaining region is formed with a void.
  17. 청구항 4에 있어서, 상기 캐패시터부 및 상기 ESD 보호부는 상기 적층체 내에 수평 방향으로 적어도 둘 이상 마련되는 감전 방지 소자.The electric shock prevention device of claim 4, wherein at least two capacitor parts and the ESD protection part are provided in the stack in a horizontal direction.
  18. 청구항 17에 있어서, 상기 내부 전극은 수직 방향으로 적층되어 일 캐패시터부를 형성하고, 수평 방향으로 배열되어 복수의 캐패시터부를 형성하는 감전 방지 소자.The electric shock prevention device of claim 17, wherein the internal electrodes are stacked in a vertical direction to form one capacitor part, and the horizontal electrodes are arranged in a horizontal direction to form a plurality of capacitor parts.
  19. 청구항 1에 있어서, 외부 전극의 하나가 전자기기의 금속 케이스와 연결되고 다른 하나가 접지 단자에 연결되어 감전 전압을 차단하고 ESD 전압을 바이패스시키는 감전 방지 소자.The electric shock prevention device of claim 1, wherein one of the external electrodes is connected to the metal case of the electronic device and the other is connected to the ground terminal to block the electric shock voltage and bypass the ESD voltage.
  20. 복수의 절연 시트가 적층된 적층체;A laminate in which a plurality of insulating sheets are stacked;
    상기 적층체 내부에 형성된 복수의 내부 전극을 포함하는 캐패시터부;A capacitor unit including a plurality of internal electrodes formed in the stack;
    상기 절연 시트의 적어도 일부에 형성되어 ESD 전압을 방호하는 ESD 보호부; 및An ESD protection unit formed on at least a portion of the insulating sheet to protect the ESD voltage; And
    상기 적층체 외부의 적어도 두 측면에 마련되어 상기 캐패시터부 및 ESD 보호부와 연결되는 외부 전극을 포함하고,An external electrode provided on at least two side surfaces of the laminate and connected to the capacitor part and the ESD protection part;
    상기 ESD 보호부는 적어도 둘 이상의 방전 전극과, 상기 방전 전극 사이에 마련되는 적어도 하나의 ESD 보호층을 포함하며,The ESD protection unit includes at least two discharge electrodes and at least one ESD protection layer provided between the discharge electrodes,
    상기 ESD 보호층은 적어도 일 영역의 두께 및 폭의 적어도 어느 하나가 다른 영역과 다르게 형성되고,The ESD protection layer is formed at least one of the thickness and width of at least one region is different from the other region,
    상기 내부 전극의 일 방향의 길이는 상기 방전 전극의 길이보다 길거나 같고 상기 일 방향과 직교하는 타 방향으로의 폭은 상기 ESD 보호층의 폭 및 상기 방전 전극의 폭보다 크며, 상기 ESD 보호층의 폭은 상기 방전 전극의 폭보다 큰 감전 방지 소자.The length of one direction of the internal electrode is longer than or equal to the length of the discharge electrode and the width in the other direction perpendicular to the one direction is greater than the width of the ESD protection layer and the width of the discharge electrode, and the width of the ESD protection layer. Is an electric shock prevention element larger than the width of said discharge electrode.
  21. 청구항 20에 있어서, 상기 방전 전극과 인접한 상기 내부 전극 사이의 거리를 A, 상기 방전 전극 사이의 거리를 B, 상기 내부 전극 사이의 거리를 C라 할 때 A≤C 또는 A≤B인 감전 방지 소자.21. The electric shock prevention device according to claim 20, wherein A≤C or A≤B when the distance between the discharge electrode and the adjacent internal electrodes is A, the distance between the discharge electrodes is B, and the distance between the internal electrodes is C. .
  22. 금속 케이스와 내부 회로 사이에 마련되어 감전 전압을 차단하고 ESD 전압을 바이패스시키는 감전 방지 소자를 포함하며,An electric shock protection device provided between the metal case and the internal circuit to block the electric shock voltage and bypass the ESD voltage,
    상기 감전 방지 소자는,The electric shock prevention element,
    복수의 절연 시트가 적층된 적층체;A laminate in which a plurality of insulating sheets are stacked;
    상기 적층체 내부에 형성된 복수의 내부 전극을 포함하는 캐패시터부;A capacitor unit including a plurality of internal electrodes formed in the stack;
    상기 절연 시트의 적어도 일부에 형성되어 ESD 전압을 방호하는 ESD 보호부; 및An ESD protection unit formed on at least a portion of the insulating sheet to protect the ESD voltage; And
    상기 적층체 외부의 적어도 두 측면에 마련되어 상기 캐패시터부 및 ESD 보호부와 연결되는 외부 전극을 포함하고,An external electrode provided on at least two side surfaces of the laminate and connected to the capacitor part and the ESD protection part;
    상기 ESD 보호부는 적어도 둘 이상의 방전 전극과, 상기 방전 전극 사이에 마련되는 적어도 하나의 ESD 보호층을 포함하며,The ESD protection unit includes at least two discharge electrodes and at least one ESD protection layer provided between the discharge electrodes,
    상기 ESD 보호층은 적어도 일 영역의 두께 및 폭의 적어도 어느 하나가 다른 영역과 다르게 형성되고,The ESD protection layer is formed at least one of the thickness and width of at least one region is different from the other region,
    상기 내부 전극의 일 방향의 길이는 상기 방전 전극의 길이보다 길거나 같고 상기 일 방향과 직교하는 타 방향으로의 폭은 상기 ESD 보호층의 폭 및 상기 방전 전극의 폭보다 크며, 상기 ESD 보호층의 폭은 상기 방전 전극의 폭보다 큰 전자기기.The length of one direction of the internal electrode is longer than or equal to the length of the discharge electrode and the width in the other direction perpendicular to the one direction is greater than the width of the ESD protection layer and the width of the discharge electrode, and the width of the ESD protection layer. Is an electronic device larger than the width of the discharge electrode.
  23. 청구항 22에 있어서, 상기 방전 전극과 인접한 내부 전극은 동일 외부 전극과 접속된 전자 기기.The electronic device of claim 22, wherein an inner electrode adjacent to the discharge electrode is connected to a same outer electrode.
  24. 청구항 22 또는 청구항 23에 있어서, 상기 방전 전극과 인접한 상기 내부 전극 사이의 거리를 A, 상기 방전 전극 사이의 거리를 B, 상기 내부 전극 사이의 거리를 C라 할 때 A≤C 또는 A≤B인 전자기기.The method according to claim 22 or 23, wherein A is the distance between the discharge electrode and the inner electrode adjacent to A, the distance between the discharge electrode is B, and the distance between the inner electrodes is A ≦ C or A ≦ B. Electronics.
  25. 청구항 22 또는 청구항 23에 있어서, 상기 외부 전극은 상기 적층체의 상부 및 하부의 적어도 어느 하나로 연장되어 상기 내부 전극과 일부 중첩되는 전자기기.The electronic device of claim 22 or 23, wherein the external electrode extends to at least one of an upper portion and a lower portion of the stack to partially overlap the inner electrode.
PCT/KR2016/004747 2015-05-07 2016-05-04 Electric shock-prevention element and electronic device provided with same WO2016178529A1 (en)

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KR101082079B1 (en) * 2009-12-09 2011-11-10 조인셋 주식회사 EMI LC Filter having a fuction for protecting electro-static discharge
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