WO2016155027A1 - 激光脉冲调制装置 - Google Patents

激光脉冲调制装置 Download PDF

Info

Publication number
WO2016155027A1
WO2016155027A1 PCT/CN2015/075931 CN2015075931W WO2016155027A1 WO 2016155027 A1 WO2016155027 A1 WO 2016155027A1 CN 2015075931 W CN2015075931 W CN 2015075931W WO 2016155027 A1 WO2016155027 A1 WO 2016155027A1
Authority
WO
WIPO (PCT)
Prior art keywords
laser
pulse
linearly polarized
pulsed laser
beam splitter
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/CN2015/075931
Other languages
English (en)
French (fr)
Inventor
叶昱均
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Wuhan China Star Optoelectronics Technology Co Ltd
TCL China Star Optoelectronics Technology Co Ltd
Original Assignee
Shenzhen China Star Optoelectronics Technology Co Ltd
Wuhan China Star Optoelectronics Technology Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shenzhen China Star Optoelectronics Technology Co Ltd, Wuhan China Star Optoelectronics Technology Co Ltd filed Critical Shenzhen China Star Optoelectronics Technology Co Ltd
Priority to US14/648,048 priority Critical patent/US9651793B2/en
Publication of WO2016155027A1 publication Critical patent/WO2016155027A1/zh
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/28—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for polarising
    • G02B27/283—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for polarising used for beam splitting or combining
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/10—Beam splitting or combining systems
    • G02B27/14—Beam splitting or combining systems operating by reflection only
    • G02B27/144—Beam splitting or combining systems operating by reflection only using partially transparent surfaces without spectral selectivity
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00—Semiconductor lasers
    • H01S5/005—Optical components external to the laser cavity, specially adapted therefor, e.g. for homogenisation or merging of the beams or for manipulating laser pulses, e.g. pulse shaping
    • H01S5/0057—Optical components external to the laser cavity, specially adapted therefor, e.g. for homogenisation or merging of the beams or for manipulating laser pulses, e.g. pulse shaping for temporal shaping, e.g. pulse compression, frequency chirping
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00—Semiconductor lasers
    • H01S5/005—Optical components external to the laser cavity, specially adapted therefor, e.g. for homogenisation or merging of the beams or for manipulating laser pulses, e.g. pulse shaping
    • H01S5/0085—Optical components external to the laser cavity, specially adapted therefor, e.g. for homogenisation or merging of the beams or for manipulating laser pulses, e.g. pulse shaping for modulating the output, i.e. the laser beam is modulated outside the laser cavity
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00—Semiconductor lasers
    • H01S5/40—Arrangement of two or more semiconductor lasers, not provided for in groups H01S5/02 - H01S5/30
    • H01S5/4012—Beam combining, e.g. by the use of fibres, gratings, polarisers, prisms

Definitions

  • the present invention relates to the field of laser modulation, and more particularly to a laser pulse modulation device.
  • amorphous silicon is generally converted to polycrystalline silicon by high temperature annealing.
  • the amorphous silicon is generally rapidly raised to a set temperature by laser irradiation.
  • the amorphous silicon is directly irradiated by a laser pulse device with a large peak power, hydrogen explosion may occur, which may cause the generated polysilicon film to fall off and affect the yield of the product. If the amorphous silicon is irradiated by a laser pulse device with a lower peak power, the amorphous silicon surface cannot reach the set temperature in a short time, and multiple laser pulse irradiation is required to complete the entire conversion operation.
  • the object of the present invention is to provide a laser pulse modulating device which does not affect the yield of a product and which is less difficult to operate, and solves the technical problem that the existing laser pulse modulating device is prone to hydrogen explosion and difficult to operate.
  • Embodiments of the present invention provide a laser pulse modulation apparatus, including:
  • a first laser source for generating a first linearly polarized pulsed laser having a direction of vibration parallel to the direction of propagation
  • a second laser source for generating a second linearly polarized pulsed laser having a direction of vibration perpendicular to the direction of propagation
  • a polarization beam splitter for superimposing the first linearly polarized pulsed laser and the second linearly polarized pulsed laser to form a first integrated pulsed laser
  • a beam splitter for splitting incident light to form a first split laser and a second split laser
  • a mirror combination for reflecting a second split laser beam emitted from the beam splitter to the beam splitter
  • the pulse width of the first integrated pulsed laser is greater than the pulse width of the first linearly polarized pulsed laser, and the pulse width of the first integrated pulsed laser is greater than the pulse width of the second linearly polarized pulsed laser;
  • the pulse width of the first linearly polarized pulsed laser ranges from 20 nanoseconds to 200 nanoseconds.
  • the mirror combination includes a plurality of mirrors for adjusting a propagation direction of the second spectral laser.
  • the plurality of first split laser beams emitted from the beam splitter are superimposed on each other to form a second integrated pulsed laser light.
  • the pulse width of the second integrated pulsed laser light is larger than the pulse width of the first integrated pulsed laser light.
  • the light transmittance of the beam splitter is 20% to 50%.
  • the spectroscope has a reflectance of 50% to 80%.
  • the first linearly polarized pulsed laser light is totally transmitted on the polarization beam splitter.
  • the second linearly polarized pulsed laser light is totally reflected on the polarization beam splitter.
  • the pulse width of the first linearly polarized pulsed laser light is equal to the pulse width of the second linearly polarized pulsed laser light.
  • a difference between a pulse start time of the first linearly polarized pulsed laser light and a pulse start time of the second linearly polarized pulsed laser light is smaller than the pulse width.
  • Embodiments of the present invention provide a laser pulse modulation apparatus, including:
  • a first laser source for generating a first linearly polarized pulsed laser having a direction of vibration parallel to the direction of propagation
  • a second laser source for generating a second linearly polarized pulsed laser having a direction of vibration perpendicular to the direction of propagation
  • a polarization beam splitter for superimposing the first linearly polarized pulsed laser and the second linearly polarized pulsed laser to form a first integrated pulsed laser
  • the pulse width of the first integrated pulsed laser light is greater than the pulse width of the first linearly polarized pulsed laser light, and the pulse width of the first integrated pulsed laser light is greater than the pulse width of the second linearly polarized pulsed laser light.
  • the laser pulse modulation device further includes:
  • a beam splitter for splitting incident light to form a first split laser and a second split laser
  • a mirror combination for reflecting a second split laser beam emitted from the beam splitter to the beam splitter is
  • the mirror combination includes a plurality of mirrors for adjusting a propagation direction of the second spectral laser.
  • the plurality of first split laser beams emitted from the beam splitter are superimposed on each other to form a second integrated pulsed laser light.
  • the pulse width of the second integrated pulsed laser light is larger than the pulse width of the first integrated pulsed laser light.
  • the light transmittance of the beam splitter is 20% to 50%, and the reflectance of the beam splitter is 50% to 80%.
  • the first linearly polarized pulsed laser light is totally transmitted on the polarization beam splitter, and the second linearly polarized pulsed laser light is totally reflected on the polarization beam splitter.
  • the pulse width of the first linearly polarized pulsed laser light is equal to the pulse width of the second linearly polarized pulsed laser light.
  • a difference between a pulse start time of the first linearly polarized pulsed laser light and a pulse start time of the second linearly polarized pulsed laser light is smaller than the pulse width.
  • the pulse width of the first linearly polarized pulsed laser ranges from 20 nanoseconds to 200 nanoseconds.
  • the laser pulse modulation device of the present invention uses a dual laser source to form an integrated laser pulse with suitable power and pulse width, thereby improving the yield of the product and having less difficulty in operation; Some laser pulse modulation devices are prone to hydrogen explosion and technical problems that are difficult to operate.
  • FIG. 1 is a schematic structural view of a first preferred embodiment of a laser pulse modulation device of the present invention
  • 2A is a waveform diagram of a laser pulse of a first preferred embodiment of the laser pulse modulation device of the present invention
  • 2B is a second diagram of a laser pulse waveform diagram of a first preferred embodiment of the laser pulse modulation device of the present invention
  • FIG. 3 is a schematic structural view of a second preferred embodiment of the laser pulse modulation device of the present invention.
  • 4A is a view showing a laser pulse waveform diagram of a second preferred embodiment of the laser pulse modulation device of the present invention.
  • 4B is a second diagram of a laser pulse waveform diagram of a second preferred embodiment of the laser pulse modulation device of the present invention.
  • FIG. 1 is a schematic structural view of a first preferred embodiment of a laser pulse modulation device according to the present invention.
  • the laser pulse modulation device 10 of the preferred embodiment includes a first laser source 11, a second laser source 12, and a polarization beam splitter 13.
  • the first laser source 11 is for generating a first linearly polarized pulsed laser light 111 whose vibration direction is parallel to the propagation direction; and the second laser light source 12 is for generating a second linearly polarized pulsed laser light 112 whose vibration direction is perpendicular to the propagation direction.
  • the first linearly polarized pulsed laser light 111 is totally transmitted on the polarization beam splitter 13, and the second linearly polarized pulsed laser light 112 is totally reflected on the polarization beam splitter 13, so that the first linearly polarized pulsed laser light 111 and the second linearly polarized pulsed laser light 112 are polarized.
  • the superposition mirror 13 is superimposed to form a first integrated pulsed laser 113.
  • the pulse start time of the first linearly polarized pulsed laser light 111 has a difference from the pulse start time of the second linearly polarized pulsed laser light 112, so that the pulse width of the first integrated pulsed laser light 113 is simultaneously larger than the pulse width of the first linearly polarized pulsed laser light 111.
  • FIG. 2A is one of the laser pulse waveform diagrams of the first preferred embodiment of the laser pulse modulation device of the present invention
  • FIG. 2B is a laser of the first preferred embodiment of the laser pulse modulation device of the present invention.
  • the pulse width of the first linearly polarized pulsed laser light 111 is equal to the pulse width of the second linearly polarized pulsed laser light 112, such as from 20 nanoseconds to 200 nanoseconds, preferably from 25 nanoseconds to 80 nanoseconds.
  • the difference between the pulse start time of the first linearly polarized pulsed laser light 111 and the pulse start time of the second linearly polarized pulsed laser light 112 is 10 ns.
  • the waveform of the solid line is the waveform of the first linearly polarized pulsed laser light 111
  • the waveform of the broken line is the waveform of the second linearly polarized pulsed laser light 112.
  • the pulse width of the first integrated pulsed laser 113 formed by the polarization beam splitter is 30 ns, as shown in FIG. 2B, wherein the waveform realized is the waveform of the first integrated pulsed laser 113.
  • the first laser source 11 When the laser pulse modulation device 10 of the preferred embodiment is used, the first laser source 11 generates a first linearly polarized pulsed laser light 111 whose vibration direction is parallel to the propagation direction, and the first linearly polarized pulsed laser light 111 is directly incident on the polarization beam splitter 13.
  • the second laser source 12 generates a second linearly polarized pulsed laser light 112 whose vibration direction is perpendicular to the propagation direction, and the second linearly polarized pulsed laser light 112 is incident on the polarization beam splitter 13 via the mirror.
  • the polarizing beam splitter 13 performs a total transmission operation on the first linearly polarized pulsed laser light 111, and the polarizing beam splitter 13 performs a total reflection operation on the second linearly polarized pulsed laser light 112, and the first linearly polarized pulsed laser light 111 and the second linearly polarized pulsed laser light 112 are superimposed.
  • a first integrated pulsed laser 113 is formed. Finally, the first integrated pulsed laser 113 illuminates the amorphous silicon layer 14 to form a corresponding polysilicon layer.
  • the difference in pulse start time between the first linearly polarized pulse laser 111 and the second linearly polarized pulsed laser 112 can be adjusted, as the pulse width of the first integrated pulsed laser 113 is large, the difference can be reduced to The pulse width of the synthesized first integrated pulsed laser 113 is reduced; if the pulse width of the first integrated pulsed laser 113 is small, the difference may be increased to increase the pulse width of the synthesized first integrated pulsed laser 113 . Therefore, the pulse width and the pulse peak of the synthesized first integrated pulsed laser 113 can be adjusted accordingly, so that the first integrated pulsed laser 113 having a corresponding pulse width and pulse peak can be formed.
  • the laser pulse modulating device of the preferred embodiment uses a dual laser source to form an integrated laser pulse of suitable power and pulse width, thereby improving the yield of the product and being less difficult to operate.
  • FIG. 3 is a schematic structural view of a second preferred embodiment of the laser pulse modulation device of the present invention.
  • the laser pulse device 20 of the preferred embodiment further includes a beam splitter 21 and a mirror combination 22.
  • the beam splitter 21 is configured to perform spectroscopic processing on the incident light to form a first splitting laser 211 and a second splitting laser 212; the light transmittance of the beam splitter 21 is preferably 30% to 50%, and the reflectivity of the beam splitter 21 It is preferably 50% to 70%.
  • the mirror combination 22 is for reflecting the second spectral laser light 212 emitted from the beam splitter 21 to the beam splitter.
  • the mirror 22 includes a plurality of mirrors 221 for adjusting the propagation direction of the second beam splitting laser 212.
  • FIG. 4A is one of laser pulse waveform diagrams of a second preferred embodiment of the laser pulse modulation apparatus of the present invention
  • FIG. 4B is a laser beam of a second preferred embodiment of the laser pulse modulation apparatus of the present invention.
  • the second pulse waveform In the preferred embodiment, the pulse width of the first linearly polarized pulsed laser light 111 is equal to the pulse width of the second linearly polarized pulsed laser light 112, as is 20 ns.
  • the difference between the pulse start time of the first linearly polarized pulsed laser light 111 and the pulse start time of the second linearly polarized pulsed laser light 112 is 10 ns. Specifically, as shown in FIG.
  • the waveform of the solid line is the waveform of the first linearly polarized pulsed laser 111 processed by the beam splitter 21 and the mirror combination 22.
  • the waveform of the broken line is the second linearly polarized pulsed laser 112, which is transmitted through the beam splitter 21 and reflected.
  • the mirror combines the processed waveforms.
  • the lasers in FIG. 4A are superimposed on each other to form a second integrated pulsed laser 213 having a pulse width of 50 ns to 80 ns, as shown in FIG. 4B, wherein the waveform obtained is the second integrated pulsed laser 213. Waveform.
  • the first laser source 11 When the laser pulse modulation device 20 of the preferred embodiment is used, the first laser source 11 generates a first linearly polarized pulsed laser light 111 whose vibration direction is parallel to the propagation direction, and the first linearly polarized pulsed laser light 111 is directly incident on the polarization beam splitter 13.
  • the second laser source 12 generates a second linearly polarized pulsed laser light 112 whose vibration direction is perpendicular to the propagation direction, and the second linearly polarized pulsed laser light 112 is incident on the polarization beam splitter 13 via the mirror.
  • the polarizing beam splitter 13 performs a total transmission operation on the first linearly polarized pulsed laser light 111, and the polarizing beam splitter 13 performs a total reflection operation on the second linearly polarized pulsed laser light 112, and the first linearly polarized pulsed laser light 111 and the second linearly polarized pulsed laser light 112 are superimposed.
  • a first integrated pulsed laser 113 is formed.
  • the first integrated pulsed laser light 113 is incident on the beam splitter 21, and the beam splitter 21 performs spectroscopic processing on the first integrated pulsed laser light 113 to form a first splitting laser light 211 and a second splitting laser light 212.
  • the first split laser 211 directly irradiates the amorphous silicon layer 14; the second split laser 212 passes through the plurality of mirrors in the mirror combination 22, and is again incident on the beam splitter 21, and the splitter 21 pairs the second split laser 212, the spectroscopic processing is performed again, and the spectroscope 21 performs a plurality of spectroscopic operations to form a plurality of first spectroscopic lasers 211 (as shown in FIG.
  • the dichroic mirror 21 emits a plurality of first spectroscopic lasers 211 superimposed on each other to form a second integrated pulse.
  • Laser 213 shown in Figure 4B.
  • the second integrated pulsed laser 213 illuminates the amorphous silicon layer 14 to form a corresponding polysilicon layer.
  • the combination of the beam splitter 21 and the mirror combination 22 can better enlarge the pulse width of the second integrated pulsed laser 213 and reduce the peak pulse of the second integrated pulsed laser 213, so that the second integrated pulsed laser
  • the pulse width of 213 is larger than the pulse width of the first integrated pulse laser 113.
  • the conversion operation is simple, and the hydrogen explosion phenomenon can be well avoided to form a polycrystalline silicon film of better quality.
  • the laser pulse modulation device of the invention uses the dual laser source to form an integrated laser pulse suitable for power and pulse width, thereby improving the yield of the product and having less difficulty in operation; and solving the problem that the existing laser pulse modulation device is prone to hydrogen explosion Phenomenon and technical problems that are difficult to operate.

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Electromagnetism (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Lasers (AREA)
  • Laser Beam Processing (AREA)
  • Investigating, Analyzing Materials By Fluorescence Or Luminescence (AREA)

Abstract

一种激光脉冲调制装置（10），包括第一激光源（11）、第二激光源（12）以及偏振分光镜（13）。第一激光源（11）用于产生振动方向与传播方向平行的第一线偏振脉冲激光（111），第二激光源（12）用于产生振动方向与传播方向垂直的第二线偏振脉冲激光（112），偏振分光镜（13）用于对第一线偏振脉冲和第二线偏振脉冲激光进行叠加，以形成第一整合脉冲激光（113）。

Description

激光脉冲调制装置 技术领域
本发明涉及激光调制领域，特别是涉及一种激光脉冲调制装置。
 背景技术
在半导体领域，一般通过高温退火的方式将非晶硅转换为多晶硅。这里一般采用激光照射的方式将非晶硅快速上升至一个设定温度。
但是如直接采用峰值功率较大的激光脉冲装置对非晶硅进行照射，可能导致氢爆现象的产生，从而可能造成生成的多晶硅薄膜脱落，影响产品的良率。如采用峰值功率较低的激光脉冲装置对非晶硅进行照射，则非晶硅表面无法在短时间内达到设定温度，并需要进行多次激光脉冲照射才能完成整个转换操作。
故，有必要提供一种激光脉冲调制装置，以解决现有技术所存在的问题。
 技术问题
本发明的目的在于提供一种不会影响产品的良率且操作难度较小的激光脉冲调制装置；以解决现有的激光脉冲调制装置的易产生氢爆现象以及操作难度较大的技术问题。
 技术解决方案
本发明实施例提供一种激光脉冲调制装置，其包括：
第一激光源，用于产生振动方向与传播方向平行的第一线偏振脉冲激光；
第二激光源，用于产生振动方向与传播方向垂直的第二线偏振脉冲激光；
偏振分光镜，用于对所述第一线偏振脉冲激光和所述第二线偏振脉冲激光进行叠加，以形成第一整合脉冲激光；
分光镜，用于对入射光线进行分光处理，以形成第一分光激光以及第二分光激光；以及
反射镜组合，用于将所述分光镜出射的第二分光激光反射至所述分光镜；
其中所述第一整合脉冲激光的脉冲宽度大于所述第一线偏振脉冲激光的脉冲宽度，所述第一整合脉冲激光的脉冲宽度大于所述第二线偏振脉冲激光的脉冲宽度；
其中所述第一线偏振脉冲激光的脉冲宽度的范围为20纳秒至200纳秒。
在本发明所述的激光脉冲调制装置中，所述反射镜组合包括用于调整所述第二分光激光的传播方向的多个反射镜。
在本发明所述的激光脉冲调制装置中，所述分光镜出射的多条所述第一分光激光相互叠加，以形成第二整合脉冲激光。
在本发明所述的激光脉冲调制装置中，所述第二整合脉冲激光的脉冲宽度大于所述第一整合脉冲激光的脉冲宽度。
在本发明所述的激光脉冲调制装置中，所述分光镜的透光率为20%至50%。
在本发明所述的激光脉冲调制装置中，所述分光镜的反射率为50%至80%。
在本发明所述的激光脉冲调制装置中，所述第一线偏振脉冲激光在所述偏振分光镜上发生全透射。
在本发明所述的激光脉冲调制装置中，所述第二线偏振脉冲激光在所述偏振分光镜上发生全反射。
在本发明所述的激光脉冲调制装置中，所述第一线偏振脉冲激光的脉冲宽度等于所述第二线偏振脉冲激光的脉冲宽度。
在本发明所述的激光脉冲调制装置中，所述第一线偏振脉冲激光的脉冲开始时间与所述第二线偏振脉冲激光的脉冲开始时间的差值小于所述脉冲宽度。.
本发明实施例提供一种激光脉冲调制装置，其包括：
第一激光源，用于产生振动方向与传播方向平行的第一线偏振脉冲激光；
第二激光源，用于产生振动方向与传播方向垂直的第二线偏振脉冲激光；以及
偏振分光镜，用于对所述第一线偏振脉冲激光和所述第二线偏振脉冲激光进行叠加，以形成一第一整合脉冲激光；
其中所述第一整合脉冲激光的脉冲宽度大于所述第一线偏振脉冲激光的脉冲宽度，所述第一整合脉冲激光的脉冲宽度大于所述第二线偏振脉冲激光的脉冲宽度。
在本发明所述的激光脉冲调制装置中，所述激光脉冲调制装置还包括：
分光镜，用于对入射光线进行分光处理，以形成第一分光激光以及第二分光激光；以及
反射镜组合，用于将所述分光镜出射的第二分光激光反射至所述分光镜。
在本发明所述的激光脉冲调制装置中，所述反射镜组合包括用于调整所述第二分光激光的传播方向的多个反射镜。
在本发明所述的激光脉冲调制装置中，所述分光镜出射的多条所述第一分光激光相互叠加，以形成第二整合脉冲激光。
在本发明所述的激光脉冲调制装置中，所述第二整合脉冲激光的脉冲宽度大于所述第一整合脉冲激光的脉冲宽度。
在本发明所述的激光脉冲调制装置中，所述分光镜的透光率为20%至50%，所述分光镜的反射率为50%至80%。
在本发明所述的激光脉冲调制装置中，所述第一线偏振脉冲激光在所述偏振分光镜上发生全透射，所述第二线偏振脉冲激光在所述偏振分光镜上发生全反射。
在本发明所述的激光脉冲调制装置中，所述第一线偏振脉冲激光的脉冲宽度等于所述第二线偏振脉冲激光的脉冲宽度。
在本发明所述的激光脉冲调制装置中，所述第一线偏振脉冲激光的脉冲开始时间与所述第二线偏振脉冲激光的脉冲开始时间的差值小于所述脉冲宽度。
在本发明所述的激光脉冲调制装置中，所述第一线偏振脉冲激光的脉冲宽度的范围为20纳秒至200纳秒。
 有益效果
相较于现有的激光脉冲调制装置，本发明的激光脉冲调制装置使用双激光源形成功率以及脉宽适合的整合激光脉冲，从而提高了产品的良率，且操作难度较小；解决了现有的激光脉冲调制装置的易产生氢爆现象以及操作难度较大的技术问题。
 附图说明
图1为本发明的激光脉冲调制装置的第一优选实施例的结构示意图；
图2A为本发明的激光脉冲调制装置的第一优选实施例的激光脉冲波形图之一；
图2B为本发明的激光脉冲调制装置的第一优选实施例的激光脉冲波形图之二；
图3为本发明的激光脉冲调制装置的第二优选实施例的结构示意图；
图4A为本发明的激光脉冲调制装置的第二优选实施例的激光脉冲波形图之一；
图4B为本发明的激光脉冲调制装置的第二优选实施例的激光脉冲波形图之二。
 本发明的最佳实施方式
以下各实施例的说明是参考附加的图式，用以例示本发明可用以实施的特定实施例。本发明所提到的方向用语，例如「上」、「下」、「前」、「后」、「左」、「右」、「内」、「外」、「侧面」等，仅是参考附加图式的方向。因此，使用的方向用语是用以说明及理解本发明，而非用以限制本发明。
在图中，结构相似的单元是以相同标号表示。
请参照图1，图1为本发明的激光脉冲调制装置的第一优选实施例的结构示意图。本优选实施例的激光脉冲调制装置10包括第一激光源11、第二激光源12以及偏振分光镜13。该第一激光源11用于产生振动方向与传播方向平行的第一线偏振脉冲激光111；第二激光源12用于产生振动方向与传播方向垂直的第二线偏振脉冲激光112。
第一线偏振脉冲激光111在偏振分光镜13上发生全透射，第二线偏振脉冲激光112在偏振分光镜13上发生全反射，因此第一线偏振脉冲激光111和第二线偏振脉冲激光112在偏振分光镜13上进行叠加，以形成第一整合脉冲激光113。同时第一线偏振脉冲激光111的脉冲开始时间与第二线偏振脉冲激光112的脉冲开始时间具有一差值，因此第一整合脉冲激光113的脉冲宽度同时大于第一线偏振脉冲激光111的脉冲宽度以及第二线偏振脉冲激光112的脉冲宽度。
请参照图2A和图2B，图2A为本发明的激光脉冲调制装置的第一优选实施例的激光脉冲波形图之一；图2B为本发明的激光脉冲调制装置的第一优选实施例的激光脉冲波形图之二。在本优选实施例中第一线偏振脉冲激光111的脉冲宽度等于第二线偏振脉冲激光112的脉冲宽度，如均为20纳秒至200纳秒，优选为25纳秒至80纳秒。这里以20纳秒为例，第一线偏振脉冲激光111的脉冲开始时间与第二线偏振脉冲激光112的脉冲开始时间的差值为10ns。具体如图2A所示，其中实线的波形为第一线偏振脉冲激光111的波形，虚线的波形为第二线偏振脉冲激光112的波形。偏振分光镜形成的第一整合脉冲激光113的脉冲宽度为30ns，具体如图2B所示，其中实现的波形为第一整合脉冲激光113的波形。
本优选实施例的激光脉冲调制装置10使用时，第一激光源11产生振动方向与传播方向平行的第一线偏振脉冲激光111，该第一线偏振脉冲激光111直接入射至偏振分光镜13。第二激光源12产生振动方向与传播方向垂直的第二线偏振脉冲激光112，该第二线偏振脉冲激光112经反射镜入射至偏振分光镜13。偏光分光镜13对第一线偏振脉冲激光111进行全透射操作，偏光分光镜13对第二线偏振脉冲激光112进行全反射操作，第一线偏振脉冲激光111和第二线偏振脉冲激光112进行叠加，形成第一整合脉冲激光113。最后该第一整合脉冲激光113对非晶硅层14进行照射，形成相应的多晶硅层。
由于第一线偏振脉冲激光111和第二线偏振脉冲激光112之间的脉冲开始时间的差值可调整，如第一整合脉冲激光113的脉冲宽度较大，则可将上述差值减小，以减小合成的第一整合脉冲激光113的脉冲宽度；如第一整合脉冲激光113的脉冲宽度较小，则可将上述差值增大，以增大合成的第一整合脉冲激光113的脉冲宽度。因此合成的第一整合脉冲激光113的脉冲宽度以及脉冲峰值可做相应的调整，从而可形成相应的脉冲宽度以及脉冲峰值的第一整合脉冲激光113。
本优选实施例的激光脉冲调制装置使用双激光源形成功率以及脉宽适合的整合激光脉冲，从而提高了产品的良率，且操作难度较小。
请参照图3，图3为本发明的激光脉冲调制装置的第二优选实施例的结构示意图。在第一优选实施例的基础上，本优选实施例的激光脉冲装置20还包括分光镜21以及反射镜组合22。该分光镜21用于对入射光线进行分光处理，以形成第一分光激光211以及第二分光激光212；该分光镜21的透光率优选为30%至50%，该分光镜21的反射率优选为50%至70%。反射镜组合22用于将分光镜21出射的第二分光激光212反射至分光镜。该反射镜22包括用于调整第二分光激光212的传播方向的多个反射镜221。
请参照图4A和图4B，图4A为本发明的激光脉冲调制装置的第二优选实施例的激光脉冲波形图之一；图4B为本发明的激光脉冲调制装置的第二优选实施例的激光脉冲波形图之二。在本优选实施例中第一线偏振脉冲激光111的脉冲宽度等于第二线偏振脉冲激光112的脉冲宽度，如均为20ns。第一线偏振脉冲激光111的脉冲开始时间与第二线偏振脉冲激光112的脉冲开始时间的差值为10ns。具体如图4A所示，其中实线的波形为第一线偏振脉冲激光111经分光镜21以及反射镜组合22处理后的波形，虚线的波形为第二线偏振脉冲激光112经分光镜21以及反射镜组合22处理后的波形。上述图4A中的激光相互叠加，形成第二整合脉冲激光213，第二整合脉冲激光213的脉冲宽度为50ns至80ns，具体如图4B所示，其中实现的波形为第二整合脉冲激光213的波形。
本优选实施例的激光脉冲调制装置20使用时，第一激光源11产生振动方向与传播方向平行的第一线偏振脉冲激光111，该第一线偏振脉冲激光111直接入射至偏振分光镜13。第二激光源12产生振动方向与传播方向垂直的第二线偏振脉冲激光112，该第二线偏振脉冲激光112经反射镜入射至偏振分光镜13。偏光分光镜13对第一线偏振脉冲激光111进行全透射操作，偏光分光镜13对第二线偏振脉冲激光112进行全反射操作，第一线偏振脉冲激光111和第二线偏振脉冲激光112进行叠加，形成第一整合脉冲激光113。
随后第一整合脉冲激光113入射至分光镜21，分光镜21对第一整合脉冲激光113进行分光处理，以形成第一分光激光211以及第二分光激光212。其中第一分光激光211直接对非晶硅层14进行照射；第二分光激光212通过反射镜组合22中的多个反射镜，重新入射到分光镜21上，分光镜21对该第二分光激光212再次进行分光处理，分光镜21进行多次分光操作后形成多个第一分光激光211（如图4A所示），分光镜21出射多条第一分光激光211相互叠加，形成第二整合脉冲激光213（如图4B所示）。最后该第二整合脉冲激光213对非晶硅层14进行照射，形成相应的多晶硅层。
从图4A和图4B可知，分光镜21和反射镜组合22的组合可较好的扩大第二整合脉冲激光213的脉冲宽度以及降低第二整合脉冲激光213的峰值脉冲，使第二整合脉冲激光213的脉冲宽度大于第一整合脉冲激光113的脉冲宽度。该转换操作简单，且可很好的避免氢爆现象的发生，以形成质量较好的多晶硅薄膜。
本发明的激光脉冲调制装置使用双激光源形成功率及脉宽适合的整合激光脉冲，从而提高了产品的良率，且操作难度较小；解决了现有的激光脉冲调制装置的易产生氢爆现象以及操作难度较大的技术问题。
综上所述，虽然本发明已以优选实施例揭露如上，但上述优选实施例并非用以限制本发明，本领域的普通技术人员，在不脱离本发明的精神和范围内，均可作各种更动与润饰，因此本发明的保护范围以权利要求界定的范围为准。

Claims (20)

  1. 一种激光脉冲调制装置，其包括：
    第一激光源，用于产生振动方向与传播方向平行的第一线偏振脉冲激光；
    第二激光源，用于产生振动方向与传播方向垂直的第二线偏振脉冲激光；
    偏振分光镜，用于对所述第一线偏振脉冲激光和所述第二线偏振脉冲激光进行叠加，以形成第一整合脉冲激光；
    分光镜，用于对入射光线进行分光处理，以形成第一分光激光以及第二分光激光；以及
    反射镜组合，用于将所述分光镜出射的第二分光激光反射至所述分光镜；
    其中所述第一整合脉冲激光的脉冲宽度大于所述第一线偏振脉冲激光的脉冲宽度，所述第一整合脉冲激光的脉冲宽度大于所述第二线偏振脉冲激光的脉冲宽度；
    其中所述第一线偏振脉冲激光的脉冲宽度的范围为20纳秒至200纳秒。
  2. 根据权利要求1所述的激光脉冲调制装置，其中所述反射镜组合包括用于调整所述第二分光激光的传播方向的多个反射镜。
  3. 根据权利要求1所述的激光脉冲调制装置，其中所述分光镜出射的多条所述第一分光激光相互叠加，以形成第二整合脉冲激光。
  4. 根据权利要求3所述的激光脉冲调制装置，其中所述第二整合脉冲激光的脉冲宽度大于所述第一整合脉冲激光的脉冲宽度。
  5. 根据权利要求1所述的激光脉冲调制装置，其中所述分光镜的透光率为20%至50%。
  6. 根据权利要求1所述的激光脉冲调制装置，其中所述分光镜的反射率为50%至80%。
  7. 根据权利要求1所述的激光脉冲调制装置，其中所述第一线偏振脉冲激光在所述偏振分光镜上发生全透射。
  8. 根据权利要求1所述的激光脉冲调制装置，其中所述第二线偏振脉冲激光在所述偏振分光镜上发生全反射。
  9. 根据权利要求1所述的激光脉冲调制装置，其中所述第一线偏振脉冲激光的脉冲宽度等于所述第二线偏振脉冲激光的脉冲宽度。
  10. 根据权利要求9所述的激光脉冲调制装置，其中所述第一线偏振脉冲激光的脉冲开始时间与所述第二线偏振脉冲激光的脉冲开始时间的差值小于所述脉冲宽度。.
  11. 一种激光脉冲调制装置，其包括：
    第一激光源，用于产生振动方向与传播方向平行的第一线偏振脉冲激光；
    第二激光源，用于产生振动方向与传播方向垂直的第二线偏振脉冲激光；以及
    偏振分光镜，用于对所述第一线偏振脉冲激光和所述第二线偏振脉冲激光进行叠加，以形成第一整合脉冲激光；
    其中所述第一整合脉冲激光的脉冲宽度大于所述第一线偏振脉冲激光的脉冲宽度，所述第一整合脉冲激光的脉冲宽度大于所述第二线偏振脉冲激光的脉冲宽度。
  12. 根据权利要求11所述的激光脉冲调制装置，其中所述激光脉冲调制装置还包括：
    分光镜，用于对入射光线进行分光处理，以形成第一分光激光以及第二分光激光；以及
    反射镜组合，用于将所述分光镜出射的第二分光激光反射至所述分光镜。
  13. 根据权利要求12所述的激光脉冲调制装置，其中所述反射镜组合包括用于调整所述第二分光激光的传播方向的多个反射镜。
  14. 根据权利要求12所述的激光脉冲调制装置，其中所述分光镜出射的多条所述第一分光激光相互叠加，以形成第二整合脉冲激光。
  15. 根据权利要求14所述的激光脉冲调制装置，其中所述第二整合脉冲激光的脉冲宽度大于所述第一整合脉冲激光的脉冲宽度。
  16. 根据权利要求12所述的激光脉冲调制装置，其中所述分光镜的透光率为20%至50%，所述分光镜的反射率为50%至80%。
  17. 根据权利要求11所述的激光脉冲调制装置，其中所述第一线偏振脉冲激光在所述偏振分光镜上发生全透射；所述第二线偏振脉冲激光在所述偏振分光镜上发生全反射。
  18. 根据权利要求11所述的激光脉冲调制装置，其中所述第一线偏振脉冲激光的脉冲宽度等于所述第二线偏振脉冲激光的脉冲宽度。
  19. 根据权利要求18所述的激光脉冲调制装置，其中所述第一线偏振脉冲激光的脉冲开始时间与所述第二线偏振脉冲激光的脉冲开始时间的差值小于所述脉冲宽度。.
  20. 根据权利要求18所述的激光脉冲调制装置，其中所述第一线偏振脉冲激光的脉冲宽度的范围为20纳秒至200纳秒。
PCT/CN2015/075931 2015-03-30 2015-04-03 激光脉冲调制装置 Ceased WO2016155027A1 (zh)

Priority Applications (1)

Application Number Priority Date Filing Date Title
US14/648,048 US9651793B2 (en) 2015-03-30 2015-04-03 Laser pulse modulation device

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
CN201510145145.5 2015-03-30
CN201510145145.5A CN104734003B (zh) 2015-03-30 2015-03-30 激光脉冲调制装置

Publications (1)

Publication Number Publication Date
WO2016155027A1 true WO2016155027A1 (zh) 2016-10-06

Family

ID=53457611

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/CN2015/075931 Ceased WO2016155027A1 (zh) 2015-03-30 2015-04-03 激光脉冲调制装置

Country Status (3)

Country Link
US (1) US9651793B2 (zh)
CN (1) CN104734003B (zh)
WO (1) WO2016155027A1 (zh)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108199254A (zh) * 2018-02-11 2018-06-22 山东大学 一种基于硅纳米片的激光脉冲调制器及其制备方法与应用

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5148318A (en) * 1987-05-29 1992-09-15 Mitsubishi Denki K.K. Optical pulse waveform shaper
JPH10125614A (ja) * 1996-10-18 1998-05-15 Seiko Epson Corp レーザ照射装置
CN1362729A (zh) * 2000-12-26 2002-08-07 株式会社半导体能源研究所 激光辐照装置和激光辐照方法
JP2005148550A (ja) * 2003-11-18 2005-06-09 Gigaphoton Inc 光学的パルス伸長器および露光用放電励起ガスレーザ装置
US6996141B1 (en) * 1999-07-08 2006-02-07 Carl Zeiss Smt Ag Device for reducing the peak power of a pulsed laser light source
US20090103196A1 (en) * 2003-12-15 2009-04-23 Alois Herkommer Optical Delay Module for Lengthening the Propagation Path of a Light Beam and Pulse Multiplication or Elongation Module
US20130100456A1 (en) * 2011-04-15 2013-04-25 Carl Zeiss Meditec, Inc. Systems and methods for swept-source optical coherence tomography

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5746735A (en) * 1994-10-26 1998-05-05 Cynosure, Inc. Ultra long pulsed dye laser device for treatment of ectatic vessels and method therefor
US20040134894A1 (en) * 1999-12-28 2004-07-15 Bo Gu Laser-based system for memory link processing with picosecond lasers
CN2454952Y (zh) * 2000-12-08 2001-10-17 中国科学院上海光学精密机械研究所 产生双十太瓦级不同脉宽脉冲的复合激光装置
CN102289078A (zh) * 2011-06-22 2011-12-21 深圳市大族激光科技股份有限公司 一种激光合束系统及一种激光合束方法
CN203012249U (zh) * 2012-12-04 2013-06-19 广东汉唐量子光电科技有限公司 脉冲激光器偏振合束装置
CN104347368A (zh) * 2013-07-26 2015-02-11 上海微电子装备有限公司 多激光的激光退火装置及方法

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5148318A (en) * 1987-05-29 1992-09-15 Mitsubishi Denki K.K. Optical pulse waveform shaper
JPH10125614A (ja) * 1996-10-18 1998-05-15 Seiko Epson Corp レーザ照射装置
US6996141B1 (en) * 1999-07-08 2006-02-07 Carl Zeiss Smt Ag Device for reducing the peak power of a pulsed laser light source
CN1362729A (zh) * 2000-12-26 2002-08-07 株式会社半导体能源研究所 激光辐照装置和激光辐照方法
JP2005148550A (ja) * 2003-11-18 2005-06-09 Gigaphoton Inc 光学的パルス伸長器および露光用放電励起ガスレーザ装置
US20090103196A1 (en) * 2003-12-15 2009-04-23 Alois Herkommer Optical Delay Module for Lengthening the Propagation Path of a Light Beam and Pulse Multiplication or Elongation Module
US20130100456A1 (en) * 2011-04-15 2013-04-25 Carl Zeiss Meditec, Inc. Systems and methods for swept-source optical coherence tomography

Also Published As

Publication number Publication date
US9651793B2 (en) 2017-05-16
CN104734003A (zh) 2015-06-24
CN104734003B (zh) 2017-09-19
US20160291341A1 (en) 2016-10-06

Similar Documents

Publication Publication Date Title
EP2185308B1 (en) Method for partitioning and incoherently summing a coherent beam
CN103887700B (zh) 一种能同时进行多束激光稳频的传输腔稳频装置
WO2017185555A1 (zh) 太赫兹时域光谱辐射与检测装置
TW201541770A (zh) 具有可變重複率之高功率飛秒雷射
CN114063307B (zh) 一种飞秒庞加莱球矢量光束的偏振态调控系统
Stark et al. Electro-optically controlled divided-pulse amplification
WO2018205441A1 (zh) 一种宽带光参量啁啾脉冲放大器
CN103208734A (zh) 稳定的高对比度飞秒激光脉冲种子源
CN115395361B (zh) 一种基于法布里–珀罗谐振腔产生超快激光脉冲序列的装置
WO2019028831A1 (zh) 一种双啁啾频谱光参量放大器及放大方法
CN107102436A (zh) 一种补偿任意光学相位延迟的波片组设计方法
CN108988107A (zh) 一种飞秒紫外光激光器
US11796846B2 (en) Laser pulse shaping device and method, pulse shaper, and optical system
CN115693374A (zh) 一种激光倍频装置
WO2016155027A1 (zh) 激光脉冲调制装置
CN102928989B (zh) 高功率激光系统的多程相位调制装置
CN115832846A (zh) 一种飞秒激光倍频装置及方法
CN103337780A (zh) 基于偏振分束的脉冲分离展宽结构
CN105261916A (zh) 一种基于电光晶体的脉冲激光合束装置及其方法
Cai et al. Propagation of elliptical Gaussian beam through misaligned optical systems in spatial domain and spatial-frequency domain
CN104570377B (zh) 激光啁啾脉冲分束环路光栅压缩器
CN103576411A (zh) 多色飞秒激光产生装置
CN216670418U (zh) 一种飞秒庞加莱球矢量光束的偏振态调控系统
CN105742953A (zh) 一种用脉冲堆积放大实现高功率超短脉冲激光的装置与方法
CN102664344B (zh) 一种高能量激光倍频调q装置

Legal Events

Date Code Title Description
WWE Wipo information: entry into national phase

Ref document number: 14648048

Country of ref document: US

121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 15886997

Country of ref document: EP

Kind code of ref document: A1

NENP Non-entry into the national phase

Ref country code: DE

122 Ep: pct application non-entry in european phase

Ref document number: 15886997

Country of ref document: EP

Kind code of ref document: A1