WO2016056788A3 - Glass substrate manufacturing method for increasing bonding force with electroless plating layer - Google Patents

Glass substrate manufacturing method for increasing bonding force with electroless plating layer Download PDF

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Publication number
WO2016056788A3
WO2016056788A3 PCT/KR2015/010420 KR2015010420W WO2016056788A3 WO 2016056788 A3 WO2016056788 A3 WO 2016056788A3 KR 2015010420 W KR2015010420 W KR 2015010420W WO 2016056788 A3 WO2016056788 A3 WO 2016056788A3
Authority
WO
WIPO (PCT)
Prior art keywords
glass substrate
plating layer
electroless plating
substrate manufacturing
bonding force
Prior art date
Application number
PCT/KR2015/010420
Other languages
French (fr)
Korean (ko)
Other versions
WO2016056788A2 (en
Inventor
김준수
김지만
이성찬
문형수
오정근
이지훈
최재영
Original Assignee
코닝정밀소재 주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 코닝정밀소재 주식회사 filed Critical 코닝정밀소재 주식회사
Publication of WO2016056788A2 publication Critical patent/WO2016056788A2/en
Publication of WO2016056788A3 publication Critical patent/WO2016056788A3/en

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C15/00—Surface treatment of glass, not in the form of fibres or filaments, by etching

Abstract

The present invention relates to a glass substrate manufacturing method and, more specifically, to a glass substrate manufacturing method capable of increasing a bonding force with an electroless plating layer to be plated on the surface. To this end, the present invention provides a glass substrate manufacturing method for increasing a bonding force with an electroless plating layer, comprising: a first etching step of immersing a glass substrate into a hydrofluoric acid (HF) solution; and a second etching step of forming a three-dimensional network structure in the inner direction on the surface of the glass substrate on which the electroless plating layer is to be plated, by immersing, into a saturated silica solution, the glass substrate etched through the first etching step.
PCT/KR2015/010420 2014-10-08 2015-10-02 Glass substrate manufacturing method for increasing bonding force with electroless plating layer WO2016056788A2 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR10-2014-0135808 2014-10-08
KR20140135808 2014-10-08

Publications (2)

Publication Number Publication Date
WO2016056788A2 WO2016056788A2 (en) 2016-04-14
WO2016056788A3 true WO2016056788A3 (en) 2017-04-27

Family

ID=55653922

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/KR2015/010420 WO2016056788A2 (en) 2014-10-08 2015-10-02 Glass substrate manufacturing method for increasing bonding force with electroless plating layer

Country Status (2)

Country Link
TW (1) TW201630843A (en)
WO (1) WO2016056788A2 (en)

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002160943A (en) * 2000-09-13 2002-06-04 Nippon Sheet Glass Co Ltd Method for processing amorphous material and glass basal plate
JP2006338837A (en) * 2005-06-06 2006-12-14 Fuji Electric Device Technology Co Ltd Plating method on glass substrate, method for manufacturing disk substrate for vertical magnetic recording medium, disk substrate for vertical magnetic recording medium, and the vertical magnetic recording medium
KR20120055323A (en) * 2010-11-23 2012-05-31 삼성코닝정밀소재 주식회사 Method for etching glass substrate and glass substrate
KR20120137417A (en) * 2007-06-18 2012-12-20 인터디지탈 테크날러지 코포레이션 Method for inter-radio access technology cell reselection

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002160943A (en) * 2000-09-13 2002-06-04 Nippon Sheet Glass Co Ltd Method for processing amorphous material and glass basal plate
JP2006338837A (en) * 2005-06-06 2006-12-14 Fuji Electric Device Technology Co Ltd Plating method on glass substrate, method for manufacturing disk substrate for vertical magnetic recording medium, disk substrate for vertical magnetic recording medium, and the vertical magnetic recording medium
KR20120137417A (en) * 2007-06-18 2012-12-20 인터디지탈 테크날러지 코포레이션 Method for inter-radio access technology cell reselection
KR20120055323A (en) * 2010-11-23 2012-05-31 삼성코닝정밀소재 주식회사 Method for etching glass substrate and glass substrate

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
HYUN, YONG-MIN ET AL.: "Effect of Heat Treatment on the Adhesive Strength of Electoless Nickel Deposits", JOURNAL OF THE KOREAN INSTITUTE OF SURFACE ENGINEERING, vol. 44, no. 6, 2011, pages 246 - 249 *

Also Published As

Publication number Publication date
WO2016056788A2 (en) 2016-04-14
TW201630843A (en) 2016-09-01

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