WO2015175274A1 - Light emitting diode digital micromirror device illuminator - Google Patents
Light emitting diode digital micromirror device illuminator Download PDFInfo
- Publication number
- WO2015175274A1 WO2015175274A1 PCT/US2015/029392 US2015029392W WO2015175274A1 WO 2015175274 A1 WO2015175274 A1 WO 2015175274A1 US 2015029392 W US2015029392 W US 2015029392W WO 2015175274 A1 WO2015175274 A1 WO 2015175274A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- led
- aperture
- collection optic
- output
- output aperture
- Prior art date
Links
- 238000005286 illumination Methods 0.000 claims abstract description 44
- 238000003384 imaging method Methods 0.000 claims abstract description 44
- 230000003287 optical effect Effects 0.000 claims abstract description 30
- 238000004891 communication Methods 0.000 claims abstract description 13
- 239000011521 glass Substances 0.000 claims description 12
- 230000000694 effects Effects 0.000 claims description 5
- 150000001875 compounds Chemical class 0.000 claims description 2
- 230000008878 coupling Effects 0.000 claims description 2
- 238000010168 coupling process Methods 0.000 claims description 2
- 238000005859 coupling reaction Methods 0.000 claims description 2
- 239000000463 material Substances 0.000 abstract description 14
- 238000001459 lithography Methods 0.000 abstract description 5
- 230000005284 excitation Effects 0.000 abstract description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 16
- 229910003460 diamond Inorganic materials 0.000 description 15
- 239000010432 diamond Substances 0.000 description 15
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 11
- 229910052802 copper Inorganic materials 0.000 description 11
- 239000010949 copper Substances 0.000 description 11
- 230000008901 benefit Effects 0.000 description 8
- 238000013461 design Methods 0.000 description 8
- 230000003595 spectral effect Effects 0.000 description 8
- 230000007423 decrease Effects 0.000 description 6
- 230000001419 dependent effect Effects 0.000 description 6
- 229910000679 solder Inorganic materials 0.000 description 6
- 125000006850 spacer group Chemical group 0.000 description 6
- 238000001723 curing Methods 0.000 description 5
- 230000006870 function Effects 0.000 description 5
- 238000004519 manufacturing process Methods 0.000 description 5
- 229910052751 metal Inorganic materials 0.000 description 5
- 239000002184 metal Substances 0.000 description 5
- 238000000034 method Methods 0.000 description 5
- 239000000758 substrate Substances 0.000 description 5
- 238000013459 approach Methods 0.000 description 4
- 230000004907 flux Effects 0.000 description 4
- 239000011800 void material Substances 0.000 description 4
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 3
- 238000003848 UV Light-Curing Methods 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- 239000004519 grease Substances 0.000 description 3
- 230000008569 process Effects 0.000 description 3
- 229910052709 silver Inorganic materials 0.000 description 3
- 239000004332 silver Substances 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 2
- 238000000862 absorption spectrum Methods 0.000 description 2
- 230000004075 alteration Effects 0.000 description 2
- 238000002048 anodisation reaction Methods 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 230000001186 cumulative effect Effects 0.000 description 2
- 230000003247 decreasing effect Effects 0.000 description 2
- 230000003467 diminishing effect Effects 0.000 description 2
- 239000005350 fused silica glass Substances 0.000 description 2
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 2
- 229910052737 gold Inorganic materials 0.000 description 2
- 239000010931 gold Substances 0.000 description 2
- 230000006872 improvement Effects 0.000 description 2
- 230000007774 longterm Effects 0.000 description 2
- 238000012423 maintenance Methods 0.000 description 2
- 230000013011 mating Effects 0.000 description 2
- 230000002441 reversible effect Effects 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 239000006096 absorbing agent Substances 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 230000032683 aging Effects 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 238000012937 correction Methods 0.000 description 1
- 239000002178 crystalline material Substances 0.000 description 1
- 230000000593 degrading effect Effects 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 239000000499 gel Substances 0.000 description 1
- 230000005764 inhibitory process Effects 0.000 description 1
- 239000000976 ink Substances 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- 238000012544 monitoring process Methods 0.000 description 1
- 239000000382 optic material Substances 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 238000012856 packing Methods 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 238000007639 printing Methods 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 238000002310 reflectometry Methods 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 229910052594 sapphire Inorganic materials 0.000 description 1
- 239000010980 sapphire Substances 0.000 description 1
- 238000004088 simulation Methods 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 230000002123 temporal effect Effects 0.000 description 1
- 239000003039 volatile agent Substances 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B19/00—Condensers, e.g. light collectors or similar non-imaging optics
- G02B19/0004—Condensers, e.g. light collectors or similar non-imaging optics characterised by the optical means employed
- G02B19/0009—Condensers, e.g. light collectors or similar non-imaging optics characterised by the optical means employed having refractive surfaces only
- G02B19/0014—Condensers, e.g. light collectors or similar non-imaging optics characterised by the optical means employed having refractive surfaces only at least one surface having optical power
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B19/00—Condensers, e.g. light collectors or similar non-imaging optics
- G02B19/0033—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use
- G02B19/0047—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use for use with a light source
- G02B19/0061—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use for use with a light source the light source comprising a LED
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B19/00—Condensers, e.g. light collectors or similar non-imaging optics
- G02B19/0004—Condensers, e.g. light collectors or similar non-imaging optics characterised by the optical means employed
- G02B19/0028—Condensers, e.g. light collectors or similar non-imaging optics characterised by the optical means employed refractive and reflective surfaces, e.g. non-imaging catadioptric systems
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B19/00—Condensers, e.g. light collectors or similar non-imaging optics
- G02B19/0033—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use
- G02B19/0047—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use for use with a light source
- G02B19/0061—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use for use with a light source the light source comprising a LED
- G02B19/0066—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use for use with a light source the light source comprising a LED in the form of an LED array
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/09—Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
- G02B27/0938—Using specific optical elements
- G02B27/0994—Fibers, light pipes
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
- G03B21/00—Projectors or projection-type viewers; Accessories therefor
- G03B21/14—Details
- G03B21/20—Lamp housings
- G03B21/208—Homogenising, shaping of the illumination light
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70008—Production of exposure light, i.e. light sources
- G03F7/7005—Production of exposure light, i.e. light sources by multiple sources, e.g. light-emitting diodes [LED] or light source arrays
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/7015—Details of optical elements
- G03F7/70166—Capillary or channel elements, e.g. nested extreme ultraviolet [EUV] mirrors or shells, optical fibers or light guides
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/702—Reflective illumination, i.e. reflective optical elements other than folding mirrors, e.g. extreme ultraviolet [EUV] illumination systems
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70283—Mask effects on the imaging process
- G03F7/70291—Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70383—Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
- G03F7/70391—Addressable array sources specially adapted to produce patterns, e.g. addressable LED arrays
-
- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
- H04N9/00—Details of colour television systems
- H04N9/12—Picture reproducers
- H04N9/31—Projection devices for colour picture display, e.g. using electronic spatial light modulators [ESLM]
- H04N9/3141—Constructional details thereof
- H04N9/315—Modulator illumination systems
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B13/00—Optical objectives specially designed for the purposes specified below
- G02B13/22—Telecentric objectives or lens systems
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B19/00—Condensers, e.g. light collectors or similar non-imaging optics
- G02B19/0033—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use
- G02B19/0095—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use for use with ultraviolet radiation
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
- G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
- G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
- G02B26/0833—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
- G03B21/00—Projectors or projection-type viewers; Accessories therefor
- G03B21/005—Projectors using an electronic spatial light modulator but not peculiar thereto
- G03B21/008—Projectors using an electronic spatial light modulator but not peculiar thereto using micromirror devices
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
- G03B21/00—Projectors or projection-type viewers; Accessories therefor
- G03B21/14—Details
- G03B21/20—Lamp housings
- G03B21/2006—Lamp housings characterised by the light source
- G03B21/2033—LED or laser light sources
Definitions
- the invention relates to high radiance Ultraviolet (UV) sources of illumination coupled to projection systems for selectively exposing photocurable materials in applications such as maskless lithography and printing.
- UV Ultraviolet
- High brightness light emitting diode (LED) light sources have only recently become available at performance levels suitable for challenging high intensity applications in UV curing.
- LED light emitting diode
- This improvement in process time has significant value to the manufacturing community.
- Imaged UV curing in the case of maskless lithography saves considerable cost in eliminating the need to produce the mask, in addition to the time savings.
- UV curing devices typically utilize short arc mercury lamps, xenon lamps, lasers and more recently, systems incorporating pre-packaged high brightness LEDs.
- Conventional arc lamps suffer from significant arc flicker resulting in the need to homogenize the light which in typical non-Etendue preserving designs reduces radiance (optical power per unit area per unit solid angle [W/cm 2 /sr]).
- Arc lamps also suffer from poor lifetime and rapidly decreasing output as a function of time with lifetimes in the hundreds to low thousands of hours at best. This results in added system cost and maintenance expense relative to LED sources which are more stable in output in both the short and long term, and characterized by lifetimes of tens of thousands of hours given proper attention to thermal design.
- laser diodes have been used to replace arc lamps, however, laser diodes are extremely expensive compared to both arc lamps and LEDs, and suffer from image artifacts due to the high temporal and spatial coherence relative to LEDs.
- Prepackaged LEDs are defined as devices comprising an LED die or die array sitting on top of one or more thermally and electrically conductive materials. The thermal impedances of these multiple interfaces leads to a cumulative total thermal impedance that results in high LED junction temperature, thereby degrading LED output and life. Examples of prepackaged UV LED devices include those offered by the SemiLeds ® and Nichia ® product lines.
- a UV LED digital micromirror device (DMD) illuminator uses "Chip-on-Board" (COB) metal core printed circuit board (PCB) technology, a heat spreader and a water heat exchanger in conjunction with high efficiency compact non-imaging and imaging optics to provide a more compact, higher performance, longer life, and lower cost system relative to systems incorporating pre-packaged LED devices that are commercially available.
- COB Chip-on-Board
- PCB metal core printed circuit board
- the diamond heat spreader is characterized by four to five times the thermal conductivity of bulk copper and thus acts to significantly reduce heat flux going into the metal core board and water heat exchanger which in turn reduces the LED junction temperature.
- the thermal impedance between the LED junction and the heat sink is significantly reduced for COB technology combined with diamond heat spreaders by placing the LED die array directly on a diamond heat spreader which is subsequently mounted to a metal core board (or other high thermal conductivity material substrate or heat spreader), thereby increasing temperature dependent life and thermally dependent output power.
- High efficiency water heat exchangers may be included with various embodiments. Alternatively, high thermal efficiency heat pipes may be used with systems that require no water or a hybrid two stage water heat exchanger combined with heat pipes.
- the combination of COB technology, high thermal conductivity heat spreaders, high thermal conductivity substantially void free solder, high performance water heat exchanger and high efficiency non-imaging and aberration corrected telecentric imaging optics results in one preferred embodiment of the invention which provides the required high uniformity as well as telecentric illumination required for use in conjunction with DMDs utilizing total internal reflection (TIR) prisms.
- TIR total internal reflection
- the system of lenses can be configured to accommodate a non-telecentric stop for systems that do not use TIR prisms produced, for example, by Texas Instruments ® .
- the DMD is combined with a high performance projection lens system to image the UV light from the DMD onto the illumination plane of interest for the primary purpose of selectively curing photocurable materials.
- Illuminators provide a highly reliable and high power density source of uniform illumination for use in a variety of applications including maskless lithography and selective curing of printed inks.
- Embodiments of the invention described herein include a high radiance UV LED illuminator that projects onto a DMD as a source of high radiance UV energy to be subsequently imaged by a well corrected projection lens with minimal distortion onto an illumination plane with a high degree of spatial uniformity and high intensity.
- Applications include acting as the illumination portion of a system designed for maskless lithography and other related UV cured materials applications or as a part of a system providing structured fluorescence excitation.
- An LED die or die array which is comprised of one or more spectral bands in the UV, is arranged on a high thermal conductivity diamond heat spreader attached by high thermal conductivity substantially void free solder, which is mounted to a high thermal conductivity metal core copper LED board by similar substantially void free solder, which in turn is cooled by a water based heat exchanger.
- the UV optical power emitting by the LED array is emitted into a substantially Lambertian distribution and is substantially collected by a non-imaging optic with rectangular input and output apertures with an aspect ratio that substantially matches that of the given DMD module.
- the length and output aperture are selected to optimally homogenize the Near Field (NF) spatial uniformity at the output aperture of the non-imaging collection optic, which in one embodiment is a tapered glass light pipe ("taper").
- the aspect ratio of the rectangular output of the taper is substantially similar to that of the DMD such that the output of the taper is subsequently imaged by a low distortion, near diffraction limited lens system onto the DMD aperture.
- the lens system of the projection lens is configured such that the DMD is the limiting factor in image quality, not the lens.
- the illumination system lenses are made of glass with low UV absorption and configured to be telecentric in both object and image space.
- the DMD has a typical acceptance angle of 12° half angle.
- each of the individual mirror pixels on the DMD When activated, each of the individual mirror pixels on the DMD is tilted either +12 or -12 degrees to the plane of the DMD to direct the ultraviolet energy either toward the projection lens or toward an absorber.
- a controlled image can be digitally projected of a desired spatial contrast only limited by the spatial resolution of the DMD.
- Embodiments of the illuminator thereby comprise a source of UV energy with high uniformity within a specific area and angle space as required by the DMD and projection system to which it is interfaced. A low spatial non-uniformity on the DMD of less than 5% peak to peak is readily achieved.
- the radiance on the DMD can be increased from what it would be limited to by a purely Etendue conserving design.
- Embodiments of the illuminator can, however, work with a smaller taper and LED array designed to conserve Etendue and achieve high spatial uniformity, but at a lower radiance.
- the size of the output face of the taper is increased from that of the previously described taper. For the same input aperture size, this reduces the far field angular extent of the taper collection optic to match that of the illumination lens system defined by the stop of the system of lenses and selected to match the far field acceptance angle of 12° half angle required by the DMD.
- a highly reflective mirror is deposited on the output face of the taper with the same aperture size which is imaged onto the DMD.
- the reflective mirror may be provided as a reflective surface pattern on an adjacent surface of a window disposed near or at the output face of the taper or as a reflective surface pattern on the front surface of a lens element disposed nearest to the taper.
- the masked-off (transmissive) portion of the mirrored output face allows UV energy to exit the non-mirrored output face at the appropriate size to fill the DMD.
- the UV energy that is incident on the internal mirrored surface of the taper is directed back towards the LED array where it has an opportunity to diffusely scatter off the LED array back toward and exit out of the aperture of the taper.
- the UV energy emitted by the LED array that would otherwise by absorbed by the stop is allowed to scatter back to the exit aperture of the taper within the acceptance angle of the optical system, thereby further increasing intensity on the DMD.
- the first embodiment described above with no mirror on the taper output face results in approximately 22% of the optical power incident on the lens stop being outside the dimension of the stop and thereby being blocked.
- the mirrored taper embodiment can result in an improvement on the order of 15% or more in the total power incident on the DMD.
- the illuminator is a visible LED DMD illuminator or an infrared LED DMD illuminator.
- the invention features a LED projector for a micromirror device.
- the LED projector includes at least one LED die and a non-imaging collection optic having an input aperture in optical communication with the at least one LED die and having an output aperture.
- the LED projector further includes a lens system in optical communication with the output aperture of the non-imaging collection optic and configured to generate an image of the output aperture in an image plane.
- the lens system is telecentric in an object space which includes the output aperture of the non- imaging collection optic. In some embodiments, the lens system is also telecentric in an image space which includes the image plane.
- the invention features a digital micromirror illumination system that includes at least one LED die, a non-imaging collection optic, a lens system and a DMD.
- the nonimaging collection optic has an input aperture in optical communication with the at least one LED die and has an output aperture.
- the lens system is in optical communication with the output aperture of the non-imaging collection optic and is configured to provide an image of the output aperture in an image plane.
- the lens system is telecentric in an object space that includes the output aperture of the non-imaging collection optic.
- the DMD includes a plane of micromirrors disposed in the image plane.
- Fig. 1 is a diagrammatic isometric view of a preferred embodiment of a high radiance UV LED illuminator comprising LED Board, heat exchanger, and lens assembly. The relative position and size of the illumination image are shown.
- Fig. 2 is a diagrammatic isometric view of the system of Figure 1 indicating additional detail.
- Fig. 3 is a diagrammatic cross sectional view of the system of Figure 1 showing internal optical and mechanical components as well as the LED array interfaced to the non-imaging collection optic.
- Figs. 4A and 4B show, respectively, a diagrammatic isometric view and a cross sectional view of the LED board and collection optic of the system of Figure 1.
- Figs. 5A and 5B show, respectively, a diagrammatic isometric view of the system of Figure 4 with the collection optic removed and a close up of the LED array and heat spreader.
- Figs. 6A and 6B show, respectively, a top view and side view of the optical system of Figure 3 indictating the rays as transmitted out of the collection optic aperture and onto the DMD illuminaiton plane.
- Figs. 7A, 7B and 7C show, respectively, a diagrammatic isometric view of an alternative embodiment of the collection optic of Figure 3 with reflective aperture, and top and side views showing how rays pass through the output aperture and reflect off the internal mirrored aperture of the collection optic and back through the exit aperture.
- the present invention relates to LED illumination used for the photopolymerization of materials with controlled spatial structure, i.e., imaged UV energy, afforded by imaging the output of a high power UV LED array onto the aperture of a DMD and subsequently through a projection lens and onto a desired surface of illumination.
- controlled spatial structure i.e., imaged UV energy
- Embodiments of the present invention include an LED based illumination source for improved intensity and spatial uniformity at the illumination plane which results in higher throughput which in turn decreases the cost of manufacturing processes relative to prior art.
- the present invention is distinguished from conventional illumination sources in that it comprises a high radiance profile with high spatial uniformity which optimizes system performance and results in much improved lifetime due to minimizing thermal impedance between the bottom side of the LED die and associated heat sinking elements.
- a further advantage is the ability to use multiple UV spectral bands one at a time, or together in any spectral combination and relative intensity, to allow effective use of a wider variety of photoinitiators.
- one preferred embodiment described herein uses two discrete cathode traces allowing for the use of two different UV die wavelengths.
- the absorption spectrum of various photoinitiators can vary as a function of exposure time, so the ability to combine more than one spectral band in a single system allows for a more complete cure for certain types of photocured materials.
- the UV LED illumination source system 10 comprises an LED assembly 12, a lens housing 14, and a lens system of which the most distal lens element 16 is shown.
- the illumination device projects an image 18 along the Z-axis which is positioned coincident with a DMD device with similar aperture extents and comprising telecentric illumination at each position on the DMD within a 12° half angle of acceptance.
- the long axis of the rectangular DMD aperture is oriented along the horizontal X-axis and the short axis of the aperture in the vertical Y-axis.
- the size of the illuminated image from the system 10 overfills the DMD slightly, for example by 5% to 10% to account for system positional tolerances.
- FIG. 2 there is shown a diagrammatic isometric view 20 of the illumination source 10 of Fig. 1 showing additional structure of the illumination assembly.
- LED board assembly 12 is sandwiched between the flange of the lens housing 14 and the water heat exchanger assembly 30 by three bolts 32 positioned symmetrically about the flange at 120 degree intervals to apply uniform pressure of the back side of the LED board 22 and the water heat exchanger 30.
- a thin uniform layer of high thermal conductivity material such as silver conductive grease, aluminum oxide thermal grease, phase change thermal gap filling material, solder, diamond thermal paste, etc. is deposited between the back side of copper LED board 22 and heat exchanger face of heat exchanger 30 to optimally couple heat between the devices.
- silver filled thermal grease is used.
- One eight-pin high current connector 24 is used for the common anode connection.
- An additional eight-pin connector 26 is used for the cathode; however, it is divided into four pins per 2 channels to allow for use of 2 different spectral bins of UV LED die. This can readily be extended up to the total number of LED die in the array, if desired.
- the front flange, surrounding distal lens 16 has a pair of kinematic interface features 36 comprising a hole and a slot to assure that the illumination system can be accurately and repeatedly attached to the mating DMD assembly (not shown) by four bolts going through four holes 34 on the distal flange of the lens housing 14.
- Fig. 3 there is shown a diagrammatic cross section of an isometric view of the system 20 of Fig. 2.
- the water heat exchanger 30 can have microchannel features to allow water to flow with optimal exchange of heat between the copper material it is made of and the water flowing between the heat exchanger inlet and outlet at a given flow rate.
- the back of the LED board 12 comprising a sheet of copper 22 is thermal interfaced to the heat exchanger 30 with silver filled thermal paste.
- the LED die array 42 is shown interfacing proximally to a tapered straight sided non-imaging collection optic 52 within its rectangular aperture, the details of which will be made clear below.
- the collection optic 52 commonly referred to as a taper, is centered and held in position relative to LED array 42 by holders 44 and 50 with spring 48 pushing the taper up against first lens element 54.
- a spacer 56 positions second lens element 58 up against the lens systems aperture stop 60 which also functions as a spacer for third lens element 64.
- Lens element 64 makes direct contact near its outer edge with distal lens element 16, thereby requiring no spacer.
- a lens retainer 66 holds the four lens elements and two spacers securely up against the seat in the housing 14 of lens 54. This resists the spring 48 from pushing the lens 54 toward the output of the lens systems and assures that the taper 52 is reliably positioned in distance by the order of 100 to 200 microns from the LED array 42.
- a shim is used between LED board assembly 12 and the proximal flange of lens housing 14 to set the distance between the LED array 42 and input to the taper collection optic 52 to account for manufacturing tolerances.
- the glass elements 52, 54, 58, 64, and 16 in a preferred embodiment are made out of a low UV absorption glass type such as fused silica, but can be made of other low dispersion UV transparent glass materials such as BK7 or B270, crystalline materials, salts, diamond, sapphire or UV transparent silicone or sol gels. Optimally, the materials are anti-reflection coated to minimize Fresnel reflective losses and to minimize ghosting at the illumination plane.
- the housing 14 is made of black anodized aluminum in a preferred embodiment due to its low mass, high thermal conductivity and reasonably low thermal expansion coefficient and low cost. High flux UV energy can degrade standard black anodization so more robust coatings, such as Optic BlackTM
- Fig. 4A there is shown a diagrammatic isometric view 70 of the LED board assembly 12 of Fig. 3 as interfaced to collection optic 52.
- Fig. 4A affords a better view of anode connector 24 and cathode connector 26 as well as photosensor and thermistor connector 28.
- the thermistor 74 and photosensor 76 are shown to the upper left of the LED array 42.
- the thermistor allows a control system to continually monitor temperature in the event that the cooling system is turned off or fails. Such a control system quickly shuts off the LED die array in the event of a sudden spike in temperature to avoid catastrophic failure.
- thermistor An additional use of the thermistor is to enable a temperature sensitive correction of the output by calibrating output of the LED array as a function of current and temperature. For example, if the ambient temperature were to increase then the temperature dependent output of the LED array would decrease.
- a closed loop system can be controlled by an analog or digital control loop to adjust the output current to maintain constant LED output power.
- a photosensor 76 which is comprised of a UV sensitive detector, such as a silicon photodiode coupled to a transimpedance amplifier, is able to monitor changes in output and drive the current higher through a closed loop control to maintain constant output power over both time and temperature.
- the bottom cavity of the housing 14 has features that allow a small amount of the UV energy emitted by the LED array to be sampled.
- a separate photosensor off the LED board can be used to look transverse to the Z-axis in the middle of the collection optic 52 to sample the amount of UV energy transmitted by the system.
- Silicon photosensors are very stable with time and the applicable temperature range and thus make an accurate measurement of optical power.
- the taper 52 is comprised of a rectangular input side 78 mating within less than 500 microns of the LED array 42 and with an aspect ratio similar to that of the DMD, although strictly speaking the aspect ratio of the output aperture 80 comprising long side 82 and small side 84 is what is imaged onto and determines the size of the DMD illumination.
- the aspect ratio of output face 80 of tapered collection optic 52 is preferably substantially similar to that of the DMD micromirror array positioned at illumination plane 18 of Fig. 1.
- the sides of the taper are substantially flat with larger face 86 and smaller face 88 symmetric on two opposite sides.
- the purpose of the taper is to capture the UV energy emitted by LED array 42 which extends over a hemisphere in angle space (2 ⁇ steradians) and convert it into a smaller angle ⁇ with respect to the optical Z-axis that is equal to or greater than the 12° half angle required at the input of the lens system of Fig. 3 to assure that the lens system aperture stop 60 of Fig. 3 is fully filled, otherwise the output would be reduced.
- the output of the taper in a preferred embodiment overfills the aperture stop 60 by an amount that blocks approximately 22% of the power incident on it.
- Fig. 4A Also indicated in Fig. 4A are a pair of opposed holes 72 through the LED board copper substrate 22 which are interfaced to two kinematic pins, one round, one oval to allow the position of the taper input aperture 78 to be accurately and reliably positioned relative to the LED array 42. These two holes 72 act as the datum feature to which the LED die array is aligned.
- FIG. 4B a diagrammatic cross sectional view 90 of a close up of the area near the LED array of Fig. 4 A is shown.
- a synthetic polycrystalline diamond heat spreader 92 is attached to LED board copper substrate 22 by use a high thermal conductivity solder.
- the LED die array 42 is attached to gold plated traces on the top of the diamond heat spreader by use of a similar high thermal conductivity substantially void free solder.
- the LED die can be operated at a current up to the order of 5 Amperes per square centimeter at a voltage on the order of 5 Volts. That results in a heat flux on the order of 2,000 W/cm2.
- the transverse thermal conductivity of diamond heat spreaders is on the order of 2000 W/m-K, which is roughly five times that of bulk copper.
- Diamond heat spreaders are anisotropic so the thermal conductivity in the thin dimension (into the heat spreader Z-Axis) is less but still on the order of 600 W/m-K, which is still better than bulk copper.
- the heat spreader acts to spread the heat out in the X-Y plane and thereby reduces the heat flux into the copper substrate 22, which further spreads the heat before entering the water heat exchanger 30, of Fig. 4A.
- the diamond heat spreader 22 has gold traces 94 to which wire bonds 96 are attached from the top of the LED die and in turn those traces are attached by a series of wire bonds to the copper traces on top of the COB.
- Fig. 5A shows a diagrammatic isometric view of the system of Fig. 4A with the tapered collection optic 52 removed.
- the additional features on the board shown in this view comprise four symmetrically opposed holes 102 which allow the LED board to be attached to the housing 14 prior to attachment of the water heat exchanger 30 of Fig. 2.
- Fig. 5B shows a diagrammatic isometric close up view of the LED die array 42 and heat spreader 92. There are three rows of six each UV LED die closely packed together to form an eighteen die array for use with a 1080p 0.95 in. diagonal Texas Instruments ® DMD device. Another embodiment of the system uses the same lens system, housing and LED board but is designed for the 1024 by 768 by 0.70 in.
- the diagonal Texas Instruments ® DMD device is comprised of a proportionally smaller taper and a three by four die array of UV LEDs.
- the typical LED die is approximately 1,000 microns square by about 100 microns in thickness with two each wire bond pads per die.
- Some photopolymers are known to have surface cure inhibition by oxygen preventing good surface curing. The use of UV energy on the order of 250 nm to 280 nm has been shown to prevent this.
- the diamond heat spreader 92 of Fig. 5B is expensive so it is important for overall cost and performance to determine how large the heat spreader should be. As the size of the heat spreader increases, it has less incremental benefit.
- the relative size of the LED array shown in the preferred embodiment of Fig. 5B is the order of 3.3 mm by 6.6 mm and the size of the diamond heat spreader is 8.0 mm by 10.0 mm which was found to be an optimal tradeoff between heat spreader size, reduction in ⁇ between the back side of the LED board and the LED junction temperature and cost, resulting in a temperature drop on the order of 20°C to 25°C relative to room temperature of 25°C.
- LED die This significant drop in temperature allows the LED die to be continuously operated at current densities on the order of 5 Amperes per centimeter squared and since they are at a lower temperature for a given intensity, they last longer.
- the lifetime of LED die is known to decrease exponentially with increasing junction temperature due to temperature dependent diffusion processes within the diode junction.
- Computational Fluid Dynamics (CFD) software packages such as SolidWorks ® Flow ® can be used to run simulations to determine optimal heat spreader size. Alternatively, the data can be determined empirically.
- the LED die array shown in Fig. 5B is attached on the bottom side in a common anode configuration to allow the die to be butted together thereby maximizing the radiance.
- common anode One down side of common anode is that if all the cathodes are tied together to the same current source then differences in forward voltage between LED die can lead to differences in current through each die. This in turn leads to differences in temperature dependent aging. Common anode prevents the LED die from being wired in series to assure that each die gets the same current. In another embodiment of the invention, each LED die is wire bonded to an independent current source. In this way, it is possible to get the thermal and tight packing advantages as well as precise control of each LED die. Additionally, such a current driving scheme is better than series connection since the failure of one LED die does not affect the other die as in a series connection. A further advantage of driving each LED die is that the forward voltage of each can be monitored with time and the system can go through a calibration at start up to monitor the output of each LED die with time to predict lifetime and inform the operator of any future maintenance that may be required.
- FIG. 6A a diagrammatic top view 120 of the system of Fig. 1 is shown with the housing, spacers, and taper holder components removed for clarity.
- Rays exiting from a given point on the output of the taper surface 80 converge toward a point of rays 134 on the DMD with the chief ray normal to the DMD surface in a telecentric condition as required for proper use of the DMD.
- a block of glass 128 is shown positioned between the last lens element 16 of the illumination system and the glass cover plate 132 of the DMD to represent the optical effect (unfolded path) of a total internally reflecting (TIR) coupling prism.
- TIR total internally reflecting
- This type of prism is often used to couple the illumination into the DMD at an angle of incidence on the order of 24 .
- TIR prism is used in a preferred embodiment of a 0.95 in.
- the invention could be used without a TIR prism.
- the optical design is optimized with a piece of glass representing the prism to take proper account of and correct for the aberrations, however, the prism is not included as part of the illumination housing. Rays emitted from aperture 80 but outside the angle space of the lens systems aperture stop 126 are absorbed by the stop and are prevented from transmitting toward the DMD 136.
- the system of lenses 54, 58, 64, and 16 are designed to be telecentric in both object (taper output aperture) and image (DMD micromirror plane) space. On the object side, telecentricity approximates the virtual far field of the taper, which is also a function of taper length.
- the taper 52 of Fig. 6A is designed with a far field distribution which overfills the aperture stop 126 of the UV illumination lens system to increase radiance. This is accomplished by trading off efficiency by recognizing that rays at smaller emitted angles from the LED surface have less power as emitted from a Lambertian source due to the decrease in projected area with increasing angle, which is the well know cosine ⁇ effect. Therefore, by increasing the size and thereby, the Etendue of the LED array 42 and purposely rejecting high angular extent rays emitted by the LED array 42 as they are absorbed by the optical stop 126 of the lens system, the radiance on the DMD 136 can be increased from what it would be limited to by a purely Etendue conserving design.
- the water heat exchanger 30 has input and output ports (reversible) 122 that are attachable to a water to air heat exchanger by use of tubing clamped to hose barbs on 122.
- Fig. 6B shows a diagrammatic side view 120 of the system of Fig. 6A representing the narrow output dimension of the taper 52 and DMD 136. Likewise collectively rays 138 that are emitted at angles larger than the aperture stop 126 are absorbed by it and prevented from transmitting to the DMD. It should be noted that in both Fig. 6A and 6B, only those rays that pass through the aperture stop 126 are shown. Rays at higher angles that are emitted by the taper 52 and overfill the aperture stop 126 are not shown.
- Fig. 7A an alternative embodiment 140 of a tapered collection optic is show in diagrammatic isometric view.
- the input aperture 142 has long side 144 and short side 146 with a substantially rectangular aperture.
- Short side 150 and long side 148 are shown corresponding to short output edge 158 and long output edge 160, respectively.
- all six sides of the taper are polished to reduce or minimize surface scattering and are generally made of glass such as fused silica, UV grade low fluorescence Schott BK7 or B270 glass or equivalent. UV rays reflect multiple times as they progress down the taper by total internal reflection. This is a much more efficient reflection means in comparison to reflective hollow tapers, which suffer significant cumulative reflective losses, particularly in the UV where it is more difficult to achieve a high reflectivity coating.
- the input aperture dimensions of the taper 140 are identical to that of taper 52 as they are both designed to interface to the same LED array 42; however, the output dimensions are proportionally larger.
- the output dimensions for taper 140 are chosen such that the angular extent of the taper output matches that required to fill the aperture stop of the system of Figs. 1, 2, 3, and 6. This contrasts to the taper 52 which was specifically designed to overfill the lens aperture stop and take advantage of the cosine ⁇ effect as described above for trading off efficiency for intensity.
- Fig. 7B shows a diagrammatic top view of the taper 140 of Fig. 7A.
- Ray 166 emitted by the LED array and passing through input aperture 142 reflects off the sides of the taper 140 by total internal reflection and impinges on internally mirrored surface 162 as indicated by ray 168.
- ray 168 strikes the LED array, it is diffusely scattered back toward the taper with most of the energy passing back out of aperture 152 and is thereby recovered and can result in an increase by 15% or more in the intensity at the illumination plane.
- Most of the rays 164 like those recovered rays just described pass directly out of the aperture 152.
- Fig. 7C shows a diagrammatic side view of the narrow dimension of taper 140 of Fig. 7A.
- the same effect is true for this view for rays striking the mirror surface 162 and returning down the length of the taper, reflecting off the LED array and exiting out of aperture 152. Some of the light that is reflected back off the LED array will be incident on the mirror 162 again. The more times this happens, the more loss occurs for such rays, which again is why there are diminishing returns as the mirrored area size approaches that of the emitting aperture area.
- Other shapes that can be used for the non- imaging collection optic include compound parabolic concentrators (CPCs). The system is characterized by the requirement to have high near field uniformity at the output of the collection optic.
- Non-imaging straight walled collection optics with an even number of sides are excellent at producing very high near field uniformity at their output.
- CPCs work well as concentrators (or collectors in reverse), however; a CPC only results in uniform near field output at its exit aperture if the input aperture is uniformly filled. That precludes the use of more than one spectral bin of LED die as can be accommodated by embodiments described above.
- glass CPCs are more difficult to make than tapers which can be conventionally polished.
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- Multimedia (AREA)
- Signal Processing (AREA)
- Projection Apparatus (AREA)
- General Engineering & Computer Science (AREA)
- High Energy & Nuclear Physics (AREA)
- Optical Elements Other Than Lenses (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Spectroscopy & Molecular Physics (AREA)
Abstract
Description
Claims
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP15792480.4A EP3143449A4 (en) | 2014-05-10 | 2015-05-06 | Light emitting diode digital micromirror device illuminator |
CA2945982A CA2945982A1 (en) | 2014-05-10 | 2015-05-06 | Light emitting diode digital micromirror device illuminator |
JP2016565687A JP2017516141A (en) | 2014-05-10 | 2015-05-06 | Light Emitting Diode Digital Micromirror Device Illuminator |
EP18178483.6A EP3435132A3 (en) | 2014-05-10 | 2015-05-06 | Light emitting diode digital micromirror device illuminator |
IL248343A IL248343A0 (en) | 2014-05-10 | 2016-10-13 | Light emitting diode digital micromirror device illuminator |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US201461991488P | 2014-05-10 | 2014-05-10 | |
US61/991,488 | 2014-05-10 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2015175274A1 true WO2015175274A1 (en) | 2015-11-19 |
Family
ID=54368430
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/US2015/029392 WO2015175274A1 (en) | 2014-05-10 | 2015-05-06 | Light emitting diode digital micromirror device illuminator |
Country Status (6)
Country | Link |
---|---|
US (2) | US20150325323A1 (en) |
EP (2) | EP3143449A4 (en) |
JP (1) | JP2017516141A (en) |
CA (1) | CA2945982A1 (en) |
IL (1) | IL248343A0 (en) |
WO (1) | WO2015175274A1 (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US10180248B2 (en) | 2015-09-02 | 2019-01-15 | ProPhotonix Limited | LED lamp with sensing capabilities |
US10908507B2 (en) | 2016-07-13 | 2021-02-02 | Applied Materials, Inc. | Micro LED array illumination source |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US9971135B2 (en) | 2014-05-10 | 2018-05-15 | Innovations In Optics, Inc. | Light emitting diode digital micromirror device illuminator |
EP3571539B1 (en) | 2017-01-19 | 2024-05-01 | Innovations in Optics, Inc. | Light emitting diode digital micromirror device illuminator |
WO2019109071A1 (en) * | 2017-12-01 | 2019-06-06 | Chroma Technology Corp. | System and method for preparing laser light for microscopy |
US11303355B2 (en) * | 2018-05-30 | 2022-04-12 | Apple Inc. | Optical structures in directional free-space optical communication systems for portable electronic devices |
US10700780B2 (en) | 2018-05-30 | 2020-06-30 | Apple Inc. | Systems and methods for adjusting movable lenses in directional free-space optical communication systems for portable electronic devices |
TWI659239B (en) * | 2018-11-14 | 2019-05-11 | 大立光電股份有限公司 | Imaging optical lens assembly, imaging apparatus and electronic device |
US11549799B2 (en) | 2019-07-01 | 2023-01-10 | Apple Inc. | Self-mixing interference device for sensing applications |
CN112666135B (en) * | 2020-11-26 | 2023-04-21 | 中国科学技术大学 | Three-dimensional microscopic imaging device and method |
Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20060139580A1 (en) * | 2004-12-29 | 2006-06-29 | Conner Arlie R | Illumination system using multiple light sources with integrating tunnel and projection systems using same |
US20070206390A1 (en) * | 2006-03-06 | 2007-09-06 | Brukilacchio Thomas J | Light emitting diode projection system |
US20070291491A1 (en) * | 2006-06-13 | 2007-12-20 | Li Kenneth K | Illumination system and method for recycling light to increase the brightness of the light source |
US20090190101A1 (en) * | 2008-01-28 | 2009-07-30 | International Business Machines Corporation | Double-Reverse Total-Internal-Reflection-Prism Optical Engine |
US20110037953A1 (en) * | 2007-09-25 | 2011-02-17 | Explay Ltd. | Micro-projector |
US20110075105A1 (en) * | 2009-09-29 | 2011-03-31 | Wavien, Inc. | Multiplexing light pipe having enhanced brightness |
US20120140186A1 (en) * | 2009-08-25 | 2012-06-07 | Muneharu Kuwata | Light collecting optical system and projection-type image display apparatus |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5442414A (en) * | 1994-05-10 | 1995-08-15 | U. S. Philips Corporation | High contrast illumination system for video projector |
AU2004235047A1 (en) * | 2003-04-24 | 2004-11-11 | Chromnomotion Imaging Applications, Inc. | Solid state light engine optical system |
US7029130B2 (en) * | 2003-12-30 | 2006-04-18 | 3M Innovative Properties Company | Contrast and brightness enhancing apertures for illumination displays |
US7889430B2 (en) * | 2006-05-09 | 2011-02-15 | Ostendo Technologies, Inc. | LED-based high efficiency illumination systems for use in projection systems |
EP1955107B1 (en) * | 2006-07-18 | 2012-02-22 | RealD Inc. | Light collectors for projection systems |
WO2010084666A1 (en) * | 2009-01-20 | 2010-07-29 | コニカミノルタオプト株式会社 | Projection apparatus |
US8403527B2 (en) * | 2010-10-26 | 2013-03-26 | Thomas J. Brukilacchio | Light emitting diode projector |
-
2015
- 2015-05-06 EP EP15792480.4A patent/EP3143449A4/en not_active Withdrawn
- 2015-05-06 JP JP2016565687A patent/JP2017516141A/en active Pending
- 2015-05-06 EP EP18178483.6A patent/EP3435132A3/en not_active Withdrawn
- 2015-05-06 US US14/705,202 patent/US20150325323A1/en not_active Abandoned
- 2015-05-06 WO PCT/US2015/029392 patent/WO2015175274A1/en active Application Filing
- 2015-05-06 CA CA2945982A patent/CA2945982A1/en not_active Abandoned
-
2016
- 2016-10-13 IL IL248343A patent/IL248343A0/en unknown
-
2018
- 2018-07-16 US US16/036,167 patent/US20180341094A1/en not_active Abandoned
Patent Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20060139580A1 (en) * | 2004-12-29 | 2006-06-29 | Conner Arlie R | Illumination system using multiple light sources with integrating tunnel and projection systems using same |
US20070206390A1 (en) * | 2006-03-06 | 2007-09-06 | Brukilacchio Thomas J | Light emitting diode projection system |
US20070291491A1 (en) * | 2006-06-13 | 2007-12-20 | Li Kenneth K | Illumination system and method for recycling light to increase the brightness of the light source |
US20110037953A1 (en) * | 2007-09-25 | 2011-02-17 | Explay Ltd. | Micro-projector |
US20090190101A1 (en) * | 2008-01-28 | 2009-07-30 | International Business Machines Corporation | Double-Reverse Total-Internal-Reflection-Prism Optical Engine |
US20120140186A1 (en) * | 2009-08-25 | 2012-06-07 | Muneharu Kuwata | Light collecting optical system and projection-type image display apparatus |
US20110075105A1 (en) * | 2009-09-29 | 2011-03-31 | Wavien, Inc. | Multiplexing light pipe having enhanced brightness |
Non-Patent Citations (1)
Title |
---|
See also references of EP3143449A4 * |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US10180248B2 (en) | 2015-09-02 | 2019-01-15 | ProPhotonix Limited | LED lamp with sensing capabilities |
US10908507B2 (en) | 2016-07-13 | 2021-02-02 | Applied Materials, Inc. | Micro LED array illumination source |
Also Published As
Publication number | Publication date |
---|---|
JP2017516141A (en) | 2017-06-15 |
IL248343A0 (en) | 2016-11-30 |
EP3143449A4 (en) | 2018-01-03 |
EP3143449A1 (en) | 2017-03-22 |
US20150325323A1 (en) | 2015-11-12 |
US20180341094A1 (en) | 2018-11-29 |
EP3435132A3 (en) | 2019-04-17 |
CA2945982A1 (en) | 2015-11-19 |
EP3435132A2 (en) | 2019-01-30 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US20180341094A1 (en) | Light emitting diode digital micromirror device illuminator | |
US10409045B2 (en) | Hollow light integrator for light emitting diode digital micromirror device illuminator | |
KR102599324B1 (en) | LED array with metalens for adaptive lighting | |
US8403527B2 (en) | Light emitting diode projector | |
EP2389536B1 (en) | Light emitting diode linear light for machine vision | |
US7832878B2 (en) | Light emitting diode projection system | |
JP5687013B2 (en) | Exposure apparatus and light source apparatus | |
TWI600975B (en) | Light source device and exposure device | |
EP1733255A1 (en) | Light-collecting illumination system | |
CN102084177A (en) | Light source module | |
US20160274446A1 (en) | Light source apparatus and projection display apparatus | |
EP3571539B1 (en) | Light emitting diode digital micromirror device illuminator | |
CN112068392A (en) | LCD projector with active color separation illumination | |
KR101999514B1 (en) | Lightning device and exposure apparatus having thereof | |
JP2016103423A (en) | Light source device and lighting device | |
JP6283798B2 (en) | Exposure apparatus and illumination unit |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
121 | Ep: the epo has been informed by wipo that ep was designated in this application |
Ref document number: 15792480 Country of ref document: EP Kind code of ref document: A1 |
|
WWE | Wipo information: entry into national phase |
Ref document number: 248343 Country of ref document: IL |
|
ENP | Entry into the national phase |
Ref document number: 2945982 Country of ref document: CA |
|
ENP | Entry into the national phase |
Ref document number: 2016565687 Country of ref document: JP Kind code of ref document: A |
|
NENP | Non-entry into the national phase |
Ref country code: DE |
|
REEP | Request for entry into the european phase |
Ref document number: 2015792480 Country of ref document: EP |
|
WWE | Wipo information: entry into national phase |
Ref document number: 2015792480 Country of ref document: EP |