WO2014200741A1 - System for forming a conductive pattern - Google Patents

System for forming a conductive pattern Download PDF

Info

Publication number
WO2014200741A1
WO2014200741A1 PCT/US2014/040439 US2014040439W WO2014200741A1 WO 2014200741 A1 WO2014200741 A1 WO 2014200741A1 US 2014040439 W US2014040439 W US 2014040439W WO 2014200741 A1 WO2014200741 A1 WO 2014200741A1
Authority
WO
WIPO (PCT)
Prior art keywords
substrate
functional material
image
electro
imaging
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/US2014/040439
Other languages
French (fr)
Inventor
Israel Schuster
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Eastman Kodak Co
Original Assignee
Eastman Kodak Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Eastman Kodak Co filed Critical Eastman Kodak Co
Publication of WO2014200741A1 publication Critical patent/WO2014200741A1/en
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/46Manufacturing multilayer circuits
    • H05K3/4688Composite multilayer circuits, i.e. comprising insulating layers having different properties
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/1601Process or apparatus
    • C23C18/1603Process or apparatus coating on selected surface areas
    • C23C18/1607Process or apparatus coating on selected surface areas by direct patterning
    • C23C18/1608Process or apparatus coating on selected surface areas by direct patterning from pretreatment step, i.e. selective pre-treatment
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/1601Process or apparatus
    • C23C18/1603Process or apparatus coating on selected surface areas
    • C23C18/1607Process or apparatus coating on selected surface areas by direct patterning
    • C23C18/1612Process or apparatus coating on selected surface areas by direct patterning through irradiation means
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/18Pretreatment of the material to be coated
    • C23C18/1803Pretreatment of the material to be coated of metallic material surfaces or of a non-specific material surfaces
    • C23C18/1813Pretreatment of the material to be coated of metallic material surfaces or of a non-specific material surfaces by radiant energy
    • C23C18/1817Heat
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/18Pretreatment of the material to be coated
    • C23C18/1803Pretreatment of the material to be coated of metallic material surfaces or of a non-specific material surfaces
    • C23C18/1813Pretreatment of the material to be coated of metallic material surfaces or of a non-specific material surfaces by radiant energy
    • C23C18/182Radiation, e.g. UV, laser
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/18Pretreatment of the material to be coated
    • C23C18/1803Pretreatment of the material to be coated of metallic material surfaces or of a non-specific material surfaces
    • C23C18/1824Pretreatment of the material to be coated of metallic material surfaces or of a non-specific material surfaces by chemical pretreatment
    • C23C18/1827Pretreatment of the material to be coated of metallic material surfaces or of a non-specific material surfaces by chemical pretreatment only one step pretreatment
    • C23C18/1831Use of metal, e.g. activation, sensitisation with noble metals
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/18Pretreatment of the material to be coated
    • C23C18/1851Pretreatment of the material to be coated of surfaces of non-metallic or semiconducting in organic material
    • C23C18/1862Pretreatment of the material to be coated of surfaces of non-metallic or semiconducting in organic material by radiant energy
    • C23C18/1865Heat
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/18Pretreatment of the material to be coated
    • C23C18/1851Pretreatment of the material to be coated of surfaces of non-metallic or semiconducting in organic material
    • C23C18/1862Pretreatment of the material to be coated of surfaces of non-metallic or semiconducting in organic material by radiant energy
    • C23C18/1868Radiation, e.g. UV, laser
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/18Pretreatment of the material to be coated
    • C23C18/1851Pretreatment of the material to be coated of surfaces of non-metallic or semiconducting in organic material
    • C23C18/1872Pretreatment of the material to be coated of surfaces of non-metallic or semiconducting in organic material by chemical pretreatment
    • C23C18/1875Pretreatment of the material to be coated of surfaces of non-metallic or semiconducting in organic material by chemical pretreatment only one step pretreatment
    • C23C18/1879Use of metal, e.g. activation, sensitisation with noble metals
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/18Pretreatment of the material to be coated
    • C23C18/20Pretreatment of the material to be coated of organic surfaces, e.g. resins
    • C23C18/2006Pretreatment of the material to be coated of organic surfaces, e.g. resins by other methods than those of C23C18/22 - C23C18/30
    • C23C18/2026Pretreatment of the material to be coated of organic surfaces, e.g. resins by other methods than those of C23C18/22 - C23C18/30 by radiant energy
    • C23C18/2033Heat
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/18Pretreatment of the material to be coated
    • C23C18/20Pretreatment of the material to be coated of organic surfaces, e.g. resins
    • C23C18/2006Pretreatment of the material to be coated of organic surfaces, e.g. resins by other methods than those of C23C18/22 - C23C18/30
    • C23C18/2026Pretreatment of the material to be coated of organic surfaces, e.g. resins by other methods than those of C23C18/22 - C23C18/30 by radiant energy
    • C23C18/204Radiation, e.g. UV, laser
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/18Pretreatment of the material to be coated
    • C23C18/20Pretreatment of the material to be coated of organic surfaces, e.g. resins
    • C23C18/28Sensitising or activating
    • C23C18/30Activating or accelerating or sensitising with palladium or other noble metal
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/54Contact plating, i.e. electroless electrochemical plating
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/10Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
    • H05K3/18Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material
    • H05K3/181Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material by electroless plating
    • H05K3/182Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material by electroless plating characterised by the patterning method
    • H05K3/185Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material by electroless plating characterised by the patterning method by making a catalytic pattern by photo-imaging
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2201/00Indexing scheme relating to printed circuits covered by H05K1/00
    • H05K2201/01Dielectrics
    • H05K2201/0137Materials
    • H05K2201/0145Polyester, e.g. polyethylene terephthalate [PET], polyethylene naphthalate [PEN]
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/10Using electric, magnetic and electromagnetic fields; Using laser light
    • H05K2203/107Using laser light
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/10Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
    • H05K3/18Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material
    • H05K3/181Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material by electroless plating
    • H05K3/182Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material by electroless plating characterised by the patterning method

Definitions

  • the present invention relates to an apparatus for functional printing using computer-to-plate imaging technology.
  • Functional printing is a category of printing that uses commercial printing equipment to print circuits or electronic devices which have a function other than, or in addition to, visual display of information.
  • An example of printed circuits is printing radio frequency identification (RFID) on a package or a product.
  • RFID radio frequency identification
  • Another example may be printing an electronic circuit on a package which is capable of producing music when the package is opened.
  • a system or apparatus for forming a conductive pattern on a substrate includes a thermal imaging head that forms an image pattern on the substrate.
  • a functional material spraying element applies a functional material on the substrate which bonds with the image pattern.
  • the spraying element is integrated in the thermal imaging head.
  • An electro-less deposition element is applied using the electro-less deposition element on the substrate to enhance the functionality of the final product.
  • thermal writing devices e.g. laser writing heads, or thermal transfer writing heads
  • This pattern can be used as is for various applications such as forming hydrophilic/hydrophobic regions for printing processes.
  • Another use is to form a pattern of a catalyst material that can be used for electro-less deposition of metal such as copper, thereby forming copper traces on the substrate.
  • the use of laser imaging or thermal transfer to a substrate with a combination of sprayed material such as gas applied on the imaged areas is one technology for accurate deposition.
  • the gas molecules are diffused towards the laser heated substrate to create a chemical compound between the gas and the material deposited on the surface of the substrate.
  • the gas is referred to as functional gas and creates a compound of traces on the substrate that is used to form conductive lines for example.
  • FIG. 1 represents in diagrammatic form a prior art digital front end for driving an imaging device
  • FIG. 2A represents in diagrammatic form the imaging system of
  • FIG. 1 A first figure.
  • FIG. 2B represents in diagrammatic form an embodiment of the imaging system having the thermal imaging element embedded functional material spraying element
  • FIG. 2C represents in diagrammatic form an embodiment of the imaging system having the thermal imaging element configured to image through a chamber carrying functional material
  • FIG. 3 represents in a diagrammatic form an electro-less coating machinery applied on a patterned substrate according to this invention.
  • the present invention will be directed in particular to elements forming part of, or in cooperation more directly with the apparatus in accordance with the present invention. It is to be understood that elements not specifically shown or described may take various forms well known to those skilled in the art.
  • FIG. 1 shows a plate imaging device 108.
  • the imaging device is driven by a digital front end (DFE) 104.
  • the DFE receives imaging data in a digital form from desktop publishing (DTP) systems (not shown), and renders the digital information for imaging.
  • the rendered information and imaging device control data are communicated between DFE 104 and imaging device 108 over interface line 112.
  • FIG. 2A shows an imaging system 200.
  • the imaging system 200 includes an imaging carriage 212 on which a material spray element 224 is mounted along with a thermal imaging head 220.
  • the sprayed material can be in a form of gas, liquid or fine powder.
  • the thermal imaging head 220 can be based on thermal transfer means or laser imaging components.
  • the thermal imaging head 220 is designed to operate of a wavelength matching the substrate 208 characteristics.
  • the thermal imaging head 220 is configured to image on substrate 208 mounted on a rotating cylinder 204.
  • the carriage 212 is adapted to move substantially in parallel to cylinder 204 guided by screw 216.
  • Controller 228 controls patterning process of thermal imaging head 220 and material emission from material spray element 224.
  • a computer-to-plate (CTP) device capable to image on flat surfaces, known as capstan devices, can be used as well for the same purpose (not shown).
  • An internal drum CTP (not shown) configuration can be used in conjunction with this invention as well.
  • Imaging substrate 208 comprised of glass, metal or various polymeric materials, is mounted on rotating cylinder 204.
  • a material spray element 224 deploys a material in proximity of imaging substrate 208.
  • the material may be applied prior, during or after laser exposure.
  • Thermal imaging head 220 will image a pattern according to data received from DFE 104 on imaging substrate 208.
  • the CTP imaging head 220 will elevate the temperature of imaging substrate 208, or opto-chemically modify its surface in the imaged areas to enable an efficient diffusion/bonding process of the functional sprayed material 232 molecules into substrate 208.
  • the pattern created by thermal imaging head 220 induces a doping pattern on imaging substrate 208.
  • MR imaging head can be used for imaging on a specialized NIR absorbing polyethylene terephthalate (PET) substrate, while applying catalyst material in a form of gas or liquid, such as 3- mercaptopropyltrimethoxysilane (MPTS) or palladium fine powder, to create traces of catalyst doping on imaging substrate 208.
  • the liquid material may be Palladium Chloride (PdC12) solution.
  • FIG. 2B shows another imaging system 250, similar to imaging system 200.
  • system 250 contains an integrated imaging and spaying element 222.
  • FIG. 2C shows yet another imaging system 280.
  • System 280 contains a chamber 236.
  • Chamber 236 carries functional material 240.
  • Chamber 236 is situated in proximity to rotating cylinder 204 is such a way that during rotation cylinder 204 and imaging substrate 208 immerses in functional material 240 in chamber 236.
  • Thermal imaging head 220 images through chamber 236, causing temperature elevation on specific areas of imaging substrate 208, and thus opto-chemically modify its surface in the imaged areas to enable an efficient diffusion/bonding process of the functional material 240.
  • imaging systems presented show an external drum system, showing imaging substrate 208 attached on the external surface of rotating cylinder 204.
  • a configuration which is not shown herein, may be constructed from a thermal imaging head 220 configured in an internal drum configuration wherein imaging substrate 208 is attached on the internal surface of rotating cylinder 204.
  • imaging head 220 will emit light internally in rotating cylinder 204.
  • the functional material will be also supplied internally inside the drum.
  • a standard electro-less coating process is performed to build material traces such as copper, silver or nickel traces on imaging substrate 208 by using electro-less coating machinery such as depicted in FIG. 3. These copper traces will form the pattern made by the CTP imaging head 220. See Yinxiang Lu, Qian Liang, Longlong Xue, Applied Surface Science, Volume 258, Issue 10, 1 March 2012, Pages 4782-4787.
  • Patterning resolution is determined by the resolution of the CTP thermal imaging head 220 and by imaging substrate 208 characteristics such as thermal conductivity.
  • DFE digital front end

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Toxicology (AREA)
  • Health & Medical Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Electrochemistry (AREA)
  • Manufacturing Of Printed Wiring (AREA)
  • Manufacture Or Reproduction Of Printing Formes (AREA)
  • Coating By Spraying Or Casting (AREA)

Abstract

A system or apparatus for forming a conductive pattern on a substrate (208) includes a thermal imaging head (220) that forms an image pattern on the substrate. A functional material (240) spraying element (224) applies a functional material on the substrate which bonds with the image pattern. The spraying element is integrated in the thermal imaging head. An electro-less deposition element is applied using the electro-less deposition element on the substrate to enhance the functionality of the final product.

Description

SYSTEM FOR FORMING A CONDUCTIVE PATTERN
FIELD OF THE INVENTION
The present invention relates to an apparatus for functional printing using computer-to-plate imaging technology.
BACKGROUND OF THE INVENTION
Functional printing is a category of printing that uses commercial printing equipment to print circuits or electronic devices which have a function other than, or in addition to, visual display of information. An example of printed circuits is printing radio frequency identification (RFID) on a package or a product. Another example may be printing an electronic circuit on a package which is capable of producing music when the package is opened.
There are several approaches for printing functional patterns on substrates including direct printing of functional inks. Other techniques use photolithography to mask and remove a pre-deposited functional layer. There is a need however for accurate deposition for functional material.
SUMMARY OF THE INVENTION
Briefly, according to one aspect of the present invention a system or apparatus for forming a conductive pattern on a substrate includes a thermal imaging head that forms an image pattern on the substrate. A functional material spraying element applies a functional material on the substrate which bonds with the image pattern. The spraying element is integrated in the thermal imaging head. An electro-less deposition element is applied using the electro-less deposition element on the substrate to enhance the functionality of the final product.
One embodiment of the invention uses thermal writing devices, e.g. laser writing heads, or thermal transfer writing heads, to form a thermal pattern on the substrate which, combined with the chemical environment, forms a pattern of functional chemical traces on the substrate. This pattern can be used as is for various applications such as forming hydrophilic/hydrophobic regions for printing processes. Another use is to form a pattern of a catalyst material that can be used for electro-less deposition of metal such as copper, thereby forming copper traces on the substrate. The use of laser imaging or thermal transfer to a substrate with a combination of sprayed material such as gas applied on the imaged areas is one technology for accurate deposition. The gas molecules are diffused towards the laser heated substrate to create a chemical compound between the gas and the material deposited on the surface of the substrate. The gas is referred to as functional gas and creates a compound of traces on the substrate that is used to form conductive lines for example.
The invention and its objects and advantages will become more apparent in the detailed description of the preferred embodiment presented below.
BRIEF DESCRIPTION OF THE DRAWINGS
FIG. 1 represents in diagrammatic form a prior art digital front end for driving an imaging device;
FIG. 2A represents in diagrammatic form the imaging system of
FIG. 1;
FIG. 2B represents in diagrammatic form an embodiment of the imaging system having the thermal imaging element embedded functional material spraying element;
FIG. 2C represents in diagrammatic form an embodiment of the imaging system having the thermal imaging element configured to image through a chamber carrying functional material; and
FIG. 3 represents in a diagrammatic form an electro-less coating machinery applied on a patterned substrate according to this invention.
DETAILED DESCRIPTION OF THE INVENTION
The present invention will be directed in particular to elements forming part of, or in cooperation more directly with the apparatus in accordance with the present invention. It is to be understood that elements not specifically shown or described may take various forms well known to those skilled in the art.
While the present invention is described in connection with one of the embodiments, it will be understood that it is not intended to limit the invention to this embodiment. On the contrary, it is intended to cover alternatives, modifications, and equivalents as covered by the appended claims. FIG. 1 shows a plate imaging device 108. The imaging device is driven by a digital front end (DFE) 104. The DFE receives imaging data in a digital form from desktop publishing (DTP) systems (not shown), and renders the digital information for imaging. The rendered information and imaging device control data are communicated between DFE 104 and imaging device 108 over interface line 112.
FIG. 2A shows an imaging system 200. The imaging system 200 includes an imaging carriage 212 on which a material spray element 224 is mounted along with a thermal imaging head 220. The sprayed material can be in a form of gas, liquid or fine powder. The thermal imaging head 220 can be based on thermal transfer means or laser imaging components. The thermal imaging head 220 is designed to operate of a wavelength matching the substrate 208 characteristics. The thermal imaging head 220 is configured to image on substrate 208 mounted on a rotating cylinder 204. The carriage 212 is adapted to move substantially in parallel to cylinder 204 guided by screw 216. Controller 228 controls patterning process of thermal imaging head 220 and material emission from material spray element 224. A computer-to-plate (CTP) device capable to image on flat surfaces, known as capstan devices, can be used as well for the same purpose (not shown). An internal drum CTP (not shown) configuration can be used in conjunction with this invention as well.
Imaging substrate 208, comprised of glass, metal or various polymeric materials, is mounted on rotating cylinder 204. Depending on the specific process, a material spray element 224 deploys a material in proximity of imaging substrate 208. The material may be applied prior, during or after laser exposure. Thermal imaging head 220 will image a pattern according to data received from DFE 104 on imaging substrate 208. The CTP imaging head 220 will elevate the temperature of imaging substrate 208, or opto-chemically modify its surface in the imaged areas to enable an efficient diffusion/bonding process of the functional sprayed material 232 molecules into substrate 208. Thus, the pattern created by thermal imaging head 220 induces a doping pattern on imaging substrate 208. For example, near IR (MR) imaging head can be used for imaging on a specialized NIR absorbing polyethylene terephthalate (PET) substrate, while applying catalyst material in a form of gas or liquid, such as 3- mercaptopropyltrimethoxysilane (MPTS) or palladium fine powder, to create traces of catalyst doping on imaging substrate 208. The liquid material may be Palladium Chloride (PdC12) solution.
FIG. 2B shows another imaging system 250, similar to imaging system 200. The main difference between the systems is that system 250 contains an integrated imaging and spaying element 222.
FIG. 2C shows yet another imaging system 280. System 280 contains a chamber 236. Chamber 236 carries functional material 240. Chamber 236 is situated in proximity to rotating cylinder 204 is such a way that during rotation cylinder 204 and imaging substrate 208 immerses in functional material 240 in chamber 236. Thermal imaging head 220 images through chamber 236, causing temperature elevation on specific areas of imaging substrate 208, and thus opto-chemically modify its surface in the imaged areas to enable an efficient diffusion/bonding process of the functional material 240.
All the imaging systems presented show an external drum system, showing imaging substrate 208 attached on the external surface of rotating cylinder 204. A configuration which is not shown herein, may be constructed from a thermal imaging head 220 configured in an internal drum configuration wherein imaging substrate 208 is attached on the internal surface of rotating cylinder 204. In addition imaging head 220 will emit light internally in rotating cylinder 204. The functional material will be also supplied internally inside the drum.
Following the completion of the required patterning on imaging substrate 208, a standard electro-less coating process is performed to build material traces such as copper, silver or nickel traces on imaging substrate 208 by using electro-less coating machinery such as depicted in FIG. 3. These copper traces will form the pattern made by the CTP imaging head 220. See Yinxiang Lu, Qian Liang, Longlong Xue, Applied Surface Science, Volume 258, Issue 10, 1 March 2012, Pages 4782-4787.
Assuming the substrate heat capacity and density are -1.2 Jg-lK-1 and 1.37gcm-3 respectively and assuming a penetration depth of ΙΟμιη is required, energy in the vicinity of 1.644mJ/cm2 will be needed for increasing substrate 208 temperature by IK. Thus, to achieve 100K temperature an increase of 164mJ/cm2 will be required, which within the working range of current CTP devices.
Patterning resolution is determined by the resolution of the CTP thermal imaging head 220 and by imaging substrate 208 characteristics such as thermal conductivity.
PARTS LIST
104 digital front end (DFE)
108 imaging device
1 12 interface line
200 imaging system
204 rotating cylinder
208 imaging substrate
212 carriage
216 screw
220 thermal imaging head
222 thermal imaging head integrated with a spaying element
224 material spray element
228 controller
232 sprayed material
236 chamber containing functional material
240 functional material
250 imaging system
280 imaging system

Claims

CLAIMS:
1. A system or apparatus for forming a conductive pattern on a substrate comprising:
a thermal imaging head that forms an image pattern on said substrate;
a functional material spraying element that applies a functional material on said substrate which bonds with said image pattern wherein said spraying element is integrated in said thermal imaging head; and
an electro-less deposition element wherein a deposition process is applied using said electro-less deposition element on said substrate to enhance the functionality of the final product.
2. The system or apparatus according to claim 1 wherein said spraying element is detached from said thermal imaging head.
3. The system or apparatus according to claim 1 wherein said thermal imaging head is a laser imaging component.
4. The system or apparatus according to claim 1 wherein said thermal imaging head is comprised of a plurality of heating elements such as in thermal transfer head.
5. The system or apparatus according to claim 1 wherein said substrate is polyethylene terephthalate (PET) treated to absorb near intra-red ( R) radiation.
6. The system or apparatus according to claim 3 wherein: said laser imaging component is configured to image on said substrate; and
wherein said substrate is mounted on a capstan imaging device.
7. The system or apparatus according to claim 3 wherein: said laser imaging component is configured to image on said substrate; and
wherein said substrate is mounted on an external drum.
8. The system or apparatus according to claim 3 wherein: said laser imaging component is configured to image on said substrate; and
wherein said substrate is mounted on an internal drum.
9. The system or apparatus according to claim 3 wherein said laser imaging component is configured to image ultra violet.
10. The system or apparatus according to claim 3 wherein said laser imaging component is configured to image near infra-red (NIR).
11. The system or apparatus according to claim 1 wherein said functional material is 3-mercaptopropyltrimethoxysilane (MPTS).
12. The system or apparatus according to claim 1 wherein said functional material is palladium fine powder.
13. The system or apparatus according to claim 1 wherein said electro-less deposition element deposits a metal such as copper, nickel, or silver.
14. The system or apparatus according to claim 1 wherein said functional material is in a form of gas.
15. The system or apparatus according to claim 1 wherein said functional material is in a form of liquid.
16. A system or apparatus for forming a conductive pattern on a substrate comprising:
a thermal imaging head that forms an image pattern on said substrate;
functional material chamber situated in proximity to said substrate wherein said functional material bonds with said image pattern; and an electro-less deposition element wherein a deposition process is applied using said electro-less deposition element on said substrate to enhance the functionality of the final product.
17. The system or apparatus according to claim 15 wherein said functional material in a form of liquid such as Palladium Chloride (PdC12) solution.
PCT/US2014/040439 2013-06-14 2014-06-02 System for forming a conductive pattern Ceased WO2014200741A1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US13/917,924 US20140366805A1 (en) 2012-11-14 2013-06-14 System for forming a conductive pattern
US13/917,924 2013-06-14

Publications (1)

Publication Number Publication Date
WO2014200741A1 true WO2014200741A1 (en) 2014-12-18

Family

ID=51134295

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2014/040439 Ceased WO2014200741A1 (en) 2013-06-14 2014-06-02 System for forming a conductive pattern

Country Status (2)

Country Link
US (1) US20140366805A1 (en)
WO (1) WO2014200741A1 (en)

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4822633A (en) * 1984-01-17 1989-04-18 Inoue Japax Research Incorporated Auto-selective metal deposition on dielectric surfaces
US5389496A (en) * 1987-03-06 1995-02-14 Rohm And Haas Company Processes and compositions for electroless metallization
US5580616A (en) * 1992-12-22 1996-12-03 Director-General Of Agency Of Industrial Science And Technology Method for surface modifying a fluorocarbonpolymer
WO2012046651A1 (en) * 2010-10-04 2012-04-12 株式会社いおう化学研究所 Process for forming metal film, and product equipped with metal film
US20140134326A1 (en) * 2012-11-14 2014-05-15 Israel Schuster Method for functional printing system

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE69929967T2 (en) * 1998-04-21 2007-05-24 Applied Materials, Inc., Santa Clara ELECTROPLATING SYSTEM AND METHOD FOR ELECTROPLATING ON SUBSTRATES
DE10009598A1 (en) * 2000-02-29 2001-09-06 Bosch Gmbh Robert Method and device for depositing a coating on a substrate by spraying a liquid
US7066463B2 (en) * 2002-04-08 2006-06-27 Ecrm Incorporated System and method for sheet transporting using dual capstan rollers
GB0402960D0 (en) * 2004-02-10 2004-03-17 Plastic Logic Ltd Thermal imaging of catalyst in electroless deposition of metal films
EP2009977A3 (en) * 2007-05-09 2011-04-27 FUJIFILM Corporation Electromagnetic shielding film and optical filter
JP5609392B2 (en) * 2010-07-30 2014-10-22 セイコーエプソン株式会社 Printing control apparatus, printing apparatus, and printing control method in printing apparatus

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4822633A (en) * 1984-01-17 1989-04-18 Inoue Japax Research Incorporated Auto-selective metal deposition on dielectric surfaces
US5389496A (en) * 1987-03-06 1995-02-14 Rohm And Haas Company Processes and compositions for electroless metallization
US5580616A (en) * 1992-12-22 1996-12-03 Director-General Of Agency Of Industrial Science And Technology Method for surface modifying a fluorocarbonpolymer
WO2012046651A1 (en) * 2010-10-04 2012-04-12 株式会社いおう化学研究所 Process for forming metal film, and product equipped with metal film
US20130183534A1 (en) * 2010-10-04 2013-07-18 Kunio Mori Process for forming metal film, and product equipped with metal film
US20140134326A1 (en) * 2012-11-14 2014-05-15 Israel Schuster Method for functional printing system

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
SUSUMU SAWADA ET AL: "Micropatterning of Copper on a Poly(ethylene terephthalate) Substrate Modified with a Self-Assembled Monolayer", LANGMUIR, vol. 22, no. 1, 3 December 2005 (2005-12-03), pages 332 - 337, XP055114457, ISSN: 0743-7463, DOI: 10.1021/la051538r *
YINXIANG LU; QIAN LIANG; LONGLONG XUE, APPLIED SURFACE SCIENCE, vol. 258, no. 10, 1 March 2012 (2012-03-01), pages 4782 - 4787

Also Published As

Publication number Publication date
US20140366805A1 (en) 2014-12-18

Similar Documents

Publication Publication Date Title
US10946672B2 (en) Printed heating element
CN108419378B (en) Method for manufacturing protective layer of printed circuit board
Godlinski et al. Printing technologies for the manufacturing of passive microwave components: antennas
CN103025071B (en) The system and method for the formation of electrical conductor in substrate
US20050129383A1 (en) Laser processing for heat-sensitive mesoscale deposition
US9310685B2 (en) Method and apparatus for the formation of conductive films on a substrate
JP2015523235A (en) Ink composition for producing high-definition conductive pattern
US20150189761A1 (en) Method for depositing and curing nanoparticle-based ink
JP2007507114A (en) Laser treatment of heat sensitive medium scale deposition.
JP2014525944A (en) Low temperature printable, flexible or conformal copper nanoparticle coating process for electronic devices and antennas
US9072209B2 (en) Method for forming a conductive pattern
US9205638B2 (en) Method of forming printed patterns
Lim et al. Surface treatments for inkjet printing onto a PTFE-based substrate for high frequency applications
US8795788B2 (en) Method for functional printing system
KR101808741B1 (en) Method for forming conductive layer patterns by inkjet-printing
US20140366805A1 (en) System for forming a conductive pattern
US11230133B2 (en) Pulsed light emitting diode sintering
US20140130737A1 (en) Functional printing system
JP2016101669A (en) Fine-line printed matter and manufacturing method of the same
US9096051B1 (en) Forming printed patterns of multiple print materials
WO2005105463A1 (en) System and method for inkjet printing
US9398698B2 (en) Forming patterns of electrically conductive materials
US20160108525A1 (en) Method of forming patterned metal unit, and patterned article formed with the same
CN102700247B (en) For the method for generating layer on substrate
CN1980796A (en) Systems and methods for inkjet printing

Legal Events

Date Code Title Description
121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 14736108

Country of ref document: EP

Kind code of ref document: A1

NENP Non-entry into the national phase

Ref country code: DE

122 Ep: pct application non-entry in european phase

Ref document number: 14736108

Country of ref document: EP

Kind code of ref document: A1