WO2014039647A1

WO2014039647A1 - Plasma treatment system

Info

Publication number: WO2014039647A1
Application number: PCT/US2013/058218
Authority: WO
Inventors: James L. Hanna; Glenn D. GRAM
Original assignee: Mectron Engineering Company, Inc.
Priority date: 2012-09-06
Filing date: 2013-09-05
Publication date: 2014-03-13

Abstract

The invention relates to a system for generating a plasma stream which may be useful for various applications. In one application, the plasma stream may be used to excite nanoparticles. In another application, the plasma stream may applications be used for sterilization and therapy in accordance with the teachings of the invention.

Description

PLASMA TREATMENT SYSTEM

RELATED APPLICATION

[0001] The present patent document claims the benefit of the filing date under 35 U.S.C. §1 19(e) of Provisional U.S. Patent Application Serial No. 61/697,391 , filed September 6, 2012, which is hereby incorporated by reference.

FIELD OF THE INVENTION

[0001] This invention relates to a system for generating a plasma stream which is useful in the application of treating diseases of humans and animals.

BACKGROUND AND SUMMARY OF THE INVENTION

[0002] This invention relates to a system for generating a plasma stream which is useful for various applications. In one application, the plasma stream is used to excite nanoparticles of a metal such as gold or platinum, causing them to vibrate at a high frequency based on inherent properties of the element. One application for the technology is to inject nanoparticles of metal into a human patient, for example at a tumor site or elsewhere. The externally applied plasma stream can be used to excite the in-situ nanoparticles to generate heat. The induced hyperthermia can provide therapeutic benefits.

[0003] The system in accordance with this invention can be tuned to the characteristic frequencies of various elements such as gold, platinum, silver, etc. The plasma gas stream itself may be used for medical or industrial purposes, for example, the gas stream may have the ability to sterilize surfaces and treat surfaces for various purposes. BRIEF DESCRIPTION OF THE DRAWINGS

[0004] Figure 1 is a pictorial view of the plasma generating system in accordance with the present invention;

[0005] Figure 2 is an illustration of a plasma source system that is used in a plasma generating system;

[0006] Figure 3 is a detail view of a nozzle for a plasma source system that is used in a plasma generating system;

[0007] Figure 4a is a circuit diagram of driver electronics that is applied in a plasma generating system; and

[0008] Figure 4b is a continuation of the circuit diagram of 4a that is applied in the plasma generating system.

DETAILED DESCRIPTION OF THE INVENTION

[0009] Figure 1 illustrates a plasma generating system 2 in accordance with the present invention. The plasma generating system 2 includes two primary systems, including a plasma source system 4 and driver electronics 6. The driver electronics 6 are operable to generate a high frequency alternating current (AC) at a range of frequencies. The driver electronics drive a Tesla coil implemented in the plasma source system 2. The driver electronics are electronically connected with the plasma source system via a first primary coil conductor 8 and a second primary coil conductor 12. Each of the first primary coil conductor 8 and the second primary coil conductor 12 may include a wire or other electrically conductive connectors. In some implementations, the driver electronics include at least one relay circuit 13. The relay circuit 13 is controlled by the driver electronics and operable to control at least one relay or switch, for example a reed relay.

[00010] The plasma source system 4 includes a nozzle 14 operably coupled to the plasma source system 4 via a conduit 16. The nozzle 14 is configured to emit a plasma discharge from a plasma outlet. The conduit 16 supplies high voltage power generated in a secondary coil of the Tesla coil to achieve plasma production in the nozzle 14. When a high voltage charge builds in the nozzle, a gaseous flow of a plasma generation gas is used to generate the plasma discharge. In some implementations the plasma discharge may be of an ionized helium gas. The conduit 16 includes a flexible conduit that provides the nozzle 14 to be selectively positioned to direct the plasma discharge toward a target. The conduit 16 may be constructed of various materials, and in a preferred embodiment of the invention, the conduit 16 is constructed of Mu-metal. The conduit 16 serves to limit electromagnetic radiation from passing into the environment surrounding the plasma source system 4.

[00011] In operation, a plasma generation gas, for example helium gas, is discharged from a plasma gas supply 18 through a first flow valve 20. The plasma gas supply may be stored in a compressed gas tank. A first flow valve 20 controls a flow rate of the plasma gas into a plasma gas supply line 22. The plasma gas supply line 22 is in fluid communication with the nozzle 14 and provides a controlled flow of the plasma gas to the nozzle 14.

[00012] Upon entry into the nozzle 14, the plasma generation gas is ionized in response to a high frequency field in the nozzle 14. A discharge of ionized plasma gas from the nozzle 14 is formed into a stream or micro-stream of plasma. The stream of plasma oscillates at a frequency corresponding to the high frequency field in the nozzle. The high frequency field causes the micro-stream of plasma to oscillate at a frequency corresponding to the excitation of ionization of the plasma generation gas. In some embodiments of the invention, the oscillating frequency of ionized particles of the plasma is configured to oscillate at a natural frequency of a material or substance, for example a metallic substance or solution thereof.

[00013] In some embodiments of the invention, a dielectric gas, for example nitrogen, is supplied to the plasma source system 4, through the tesla coil, and through the conduit 16 to purge atmospheric air from the plasma source system 4. The dielectric gas serves to limit a possibility of arcing in the windings of the Tesla coil and along the length of the conduit 16. The dielectric gas is fed into the plasma source system from a dielectric gas supply 24. Though referred to as a dielectric gas, the dielectric gas may include any inert or electrically insulating gas, compound, or other electrically insulating gases, for example nitrogen. The dielectric gas is supplied to the plasma source system through a second flow valve 26. The second flow valve 26 allows a controlled flow of the dielectric gas to pass through a dielectric gas supply line 28 to limit a potential of arcing in the plasma source system 4.

[00014] Figure 2 illustrates an example of a plasma source system 4 used in the plasma generating system 2 in accordance with the present invention. The plasma source system 4 is conveniently mounted on a baseplate 30 with a pair of upwardly extending supports 32. The upwardly extending supports 32 mount to a glass tube 34. In various embodiments, the glass tube 34 is formed of any electrically insulating material and is preferably formed of Pyrex type material. In one embodiment of the invention, the glass tube 34 is approximately 38.8 cm long, 8.26 cm in diameter with a .5 cm wall thickness.

[00015] The glass tube 34 is closed by a pair of end caps defining a first end cap 36 and a second end cap 38. The first end cap 36 closes the glass tube 34 at a proximal end 40 and the second end cap closes the glass tube 34 at a distal end 42. The first end cap 36 and the second end cap 38 are preferably of an electrically insulating material, such as a ceramic, and are preferably formed of Garolite. Affixed to the first end cap 36 is an inlet nipple 44 which is attached to an inlet valve 46 and the dielectric gas supply line 28. The inlet nipple 44 is configured to allow a flow of the dielectric gas to enter the glass tube. The conduit 16 is affixed to the second end cap 38 and extends to the nozzle 14.

[00016] A center tube 45 is affixed to the first end cap 36 and extends along a central axis of glass tube 34. The center tube 45 forms a flow path for the dielectric gas to enter the glass tube 34 through the inlet nipple 45 and the first end cap 36. The dielectric gas from the dielectric gas supply 24 flows through the dielectric gas supply line 28, the inlet nipple 44, and the inlet valve 46 and into the glass tube 34 through center tube 45. The center tube 45 is preferably of a non-conductive material, such as plastic and may be of PVC tubing. The first end cap 36 positions the center tube 45 within an interior cavity of the glass tube 34.

[00017] The plasma source system 4 is electrically excited through the driver electronics 6. The driver electronics include an AC drive system for a tesla coil transformer system. A primary coil 48 is wrapped around the outside of the glass tube 34 and is electrically coupled to the driver electronics 6 via the first primary coil conductor 8, and the second primary coil conductor 12. In a preferred embodiment of the invention, the primary coil 48 includes 5 turns of 4mm diameter copper tubing uniformly wrapped around a central portion of the length of the outside of the glass tube 34.

[00018] A secondary coil 50 of the tesla coil transformer system includes windings wrapped around the outside of the center tube 45. The number of turns in the secondary coil 50 may vary substantially based on a target frequency of the high frequency field. The target frequency of the high frequency field corresponds to a switching frequency induced in the secondary coil 50. In a preferred embodiment of the invention, the secondary coil 50 includes 408 turns of 26 gauge copper wire uniformly wrapped closely together around the center tube 45. In other embodiments the number of turns in the secondary coil is adjustable by adding or removing turns via relay or switch. The center tube 45 and the secondary coil 50 may also be interchangeable. In embodiments having interchangeable secondary windings, the secondary windings may be changed by removing the first end cap 36 to access the center tube 45. In a preferred embodiment of the invention, the center tube 45 is approximately 3.33 cm in diameter and approximately 27.3 cm in length extending from the first end cap 36.

[00019] The secondary coil 50 is wound around the center tube 45 and the windings begin at a first winding end approximately 2.5 cm from where the center tube 45 meets the first end cap 36. A second end of the secondary coil is wound around the center tube 45 toward the second end cap 38 of the glass tube 34. The first end of the secondary coil 50 is conductively connected to a first supply wire 52 that extends through the second end cap 38 through an internal passage 54 of the conduit 16. The second end of the secondary coil 50 is conductively connected to a second supply wire 56 that also extends through the second end cap 38 through an internal passage 54 of the conduit 16. In accordance with Tesla coil type designs, the turn ratio between the primary coil 48 and the secondary coil 50 is very great, and the system is driven at high frequency. These systems are capable of providing extremely high voltage outputs from their secondary windings.

[00020] The first supply wire 52 extends from a first end of the secondary coil 50 through the internal passage 54 of the conduit and into the nozzle 14. The first supply wire 52 is conductively connected to a conductive rod of conductive material positioned in the nozzle 14. The conductive rod is configured to provide a positive pole that passes energy to a ring located proximate to the conductive rod in the nozzle 14.

[00021] The ring is conductively connected to the second supply wire 56. The second supply wire 56 extends back through the internal passage 54 of the conduit 16 and into the glass tube 34. The second supply wire 56 extends through the glass tube where the second supply wire 56 is conductively connected to the second end of the secondary coil 50. As the current oscillates through the secondary coil 50, electrical potential energy fluctuates between the ring and the needle generating high frequency electromagnetic field. Each of the first supply wire 52 and the second supply wire 56 consist of wires configured to transport high voltage from the secondary coil to the nozzle. The first supply wire 52 and the second supply wire 56 may include heavy insulation and a core of conductive stranded 12 gauge wire.

[00022] The passage from the inlet nipple 45 through the glass tube 14, through the internal passage 54 of the conduit 16, and into the nozzle 16 forms a sealed passage for the flow of the dielectric gas from the dielectric gas supply 24. As a safety precaution, prior to activation of the driver electronics 6, the inlet valve 46 may be opened and the second flow valve 26 may be adjusted to allow a flow of the dielectric gas to enter the glass tube 14. The dielectric gas displaces atmospheric air from the glass tube 14 and pass into the internal passage 54 of the conduit 16. The dielectric gas displaces atmospheric air from the internal passage 54 of the conduit 16 and exit through a purge valve 59 connected to the nozzle 14 proximate the connection of the conduit 16 and the nozzle 14. The dielectric gas may continue to flow through the glass tube 34 and the internal passage 54 of the conduit during operation to limit the potential of arcing in the plasma source system 4. In some cases, the dielectric gas may also be sealed in the plasma source system by closing the inlet valve 46 after the atmospheric air is displaced.

[00023] Figure 3 illustrates a detail view of the nozzle 14 for the plasma source system 4 in accordance with the present invention. The nozzle 14 generally includes a nozzle chamber 60, a nozzle inlet 62, and a nozzle tip 64. A distal end of the conduit 16, opposite the end connected to the second end cap 38 of the plasma source system 4, is connected to the nozzle inlet 62. The nozzle tip includes a plasma outlet 66 forming an outlet passage from the nozzle chamber 60 to a region outside the nozzle. The nozzle outlet 66 extends along a longitudinal axis 68 of the nozzle 14. The nozzle chamber 60 may be of an electrically insulating material and in a preferred embodiment of the invention may be of glass, for example Pyrex. The nozzle inlet 62 and the nozzle outlet 64 may be of an electrically insulating material, such as a ceramic, and is preferably formed of Garolite. [00024] To transfer current from the secondary coil 50, the first supply wire 52 is conductively connected to a first terminal 70. The first terminal 70 is conductively connected to a first stud 72. The first stud 72 may be of a conductive metal and is threaded through an opening in the nozzle inlet 62. The first stud 72 is significantly aligned with the longitudinal axis 68 of the nozzle 14. At one end, the first stud 72 forms a first internal cavity 74 configured to receive a conductive rod 76. The conductive rod 76 is needle-like in shape and be of a thermally resistant, electrically conductive material, for example tungsten. The conductive rod 76 is affixed in the first internal cavity 74 of the first stud 72 by a collet 78.

[00025] The second supply wire 56 is conductively connected to a second terminal 80. The second terminal 80 is conductively connected to a second stud 82. The second stud 82 may be of a conductive metal and is threaded through an opening in the nozzle inlet 62. The second stud 82 is offset from and parallel to longitudinal axis 68 of the nozzle 14. At one end, the second stud 82 forms a second internal cavity 84 configured to receive a conductive ring assembly 86. The conductive ring assembly 86 extends parallel to the conductive rod 76 and includes a ring 88 aligned with the conductive rod 76. The ring 88 is aligned with the conductive rod 76 such that the longitudinal axis 68 of the nozzle 14 and a corresponding longitudinal axis of the conductive rod 76 pass centrally through an opening inside the ring 88. The conductive ring assembly 76 is affixed in the second internal cavity 84 of the second stud 82 by a collet 87. The conductive ring assembly 86 may be of a thermally resistant, electrically conductive material, for example tungsten. [00026] In operation, a plasma generation gas, such as helium, flows into the nozzle from the plasma gas supply 18 through a plasma gas inlet 89. The flow of the plasma generation gas is regulated by the first flow valve 20 and flows through the plasma gas supply line 22. The plasma generation gas passes into the nozzle chamber 60 and is acted upon by the high frequency field produced by the secondary coil 50. The high frequency field is transmitted into the nozzle chamber 60 alternately via the first supply wire 52 and the second supply wire 56. The alternating of the current in the secondary coil conducted through the first and second supply wires 52 and 56 causes the electrical potential energy to fluctuate between the ring 88 and the conductive rod 76 generating the high frequency field.

[00027] The high frequency field passes between the conductive rod 76 and the ring 88. As the plasma generation gas passes through the high frequency field, the plasma generation gas is ionized, thereby generating a plasma stream which is emitted from the plasma outlet 66. The plasma stream may define a micro-stream of plasma capable of delivering charged ions to a target region. Generally, the plasma stream may have multiple uses with one potential use being described as follows.

[00028] There are certain treatment situations for human and animal patients in which is desired to induce high temperatures in tissue which can lead to the destruction of cell membranes and therefore undesired cells and tissue, referred to generically as hyperthermia treatment. In one such therapeutic application, nanospheres of gold, silver or other metals which can be homogeneous or in the form of coated nanospheres can be introduced into tissue. This can be accomplished by direct injection or through a form of tissue or organ selective delivery systems. When the nanospheres are accumulated within the desired target tissue the spheres can be excited externally by applying the plasma source in accordance with this invention. This excitation causes them to vibrate at a very high frequency which leads to a heating effect.

[00029] It is contemplated that nanopartides of 2nm to 250nm may be used. The excitation of the nanopartides is accomplished by amplitude modulation of the field applied to the gas stream at a desired frequency. In some embodiments, the plasma stream may be used without the excitation of nanopartides for many applications including sterilization of items and surfaces, augmenting wound healing, and for dental applications.

[00030] Figure 4a illustrates driver electronics 6 applied in the plasma generating system 2 in accordance with the invention. The driver electronics include various electrical components and topographies configured to drive the primary coil 48 at a controlled voltage and frequency. The various circuits and components described herein may be substituted with a variety of similar components and alternate methods for generating a high frequency driving current similar to those disclosed herein.

[00031] In one preferred embodiment, the driver electronics 6 include a power supply 90 comprising an AC to DC converter 92, a first DC voltage converter 94, and a second DC voltage converter 96. The AC to DC converter 92 includes isolation transformers 98 and a bridge rectifier 100. Current from an AC input 102, such as 60 Hz line current with a 250VA capacity, is input and conducted through the isolation transformers 98. The current passing through the isolation transformers 98 is rectified by the bridge rectifier 100 to produce a DC output. For operating safety and the protection of the driver electronics 6, an amp meter 104 may be placed in line with the DC voltage output from the AC to DC converter 92 to monitor the current delivered to the driver electronics 6.

[00032] The first and second DC voltage converters 94 and 96 are similarly configured and each may include a buck-boost converter. The first DC voltage converter 94 is configured to deliver power to the primary coil 48. In this particular embodiment, the first DC voltage converter 94 is operable to output voltage ranging from approximately 1 to 60 Volts. The voltage output is preferably set to a voltage output ranging from 20 to 45 Volts. The voltage supplied and specific power requirements for the primary coil 48 depend on a variety of design variables including the design of the primary and secondary coils 48 and 50, the insulation of various components of the plasma source system 4, and a desired intensity of a generated plasma stream.

[00033] Referring now to Figure 4b, a continuation of the circuit diagram of 4a is shown in accordance with the invention. The second DC voltage converter 96 is configured to deliver supply power to a plurality of control and timing components 106. The control and timing components include a timer 108, a high-speed transistor driver 1 10, and a transistor 1 12. The timer 108 is configurable to generate a timing signal at a variety of frequencies. For example, a frequency of the timing signal may range from 10 kHz to 3 MHz. In a preferred embodiment, the frequency of the timing signal ranges from 100 kHz and 2.5 MHz, and in some cases is configured to operate at a range of frequencies from 400 kHz and 2.2 MHz. The frequency of the timing signal may vary among the ranges described herein and is dependent on the specific design of the plasma source system 4, for example, the specific configuration of the primary coil 48, the secondary coil 50, and a desired intensity of a generated plasma stream.

[00034] The timer 108 is operably coupled to the transistor driver 1 10 and communicates the timing signal to the transistor driver 1 10. The transistor driver 1 10 includes any transistor driver operable to achieve a desired frequency in response to the timing signal and is preferably capable of managing high sink/source currents, for example current in excess of 5 Amps. In a preferred embodiment of the invention, the transistor driver is a power MOSFET driver operable to achieve switching speeds corresponding to the ranges of the timing signal.

[00035] The transistor driver 1 10 is operably coupled to the transistor 1 12. The transistor 1 12 may include a variety of devices configured to generate an electrical switching signal. For example, the transistor may be a FET, JFET, IGFET, MOSFET, BJT, IBGT, and various other switching components. The transistor is preferably operable to achieve switching speeds corresponding to the ranges of the timing signal previously described. The transistor 1 12 is supplied power from the first DC voltage converter 94. In operation, the transistor generates an output signal with a frequency corresponding to the timing signal from the timer 108. The voltage of the output signal varies in response to the voltage supplied from the first DC voltage converter 94.

[00036] The output signal from the transistor 1 12 is conducted through the first primary coil conductor 8 and into the primary coil 48 at a first primary coil end. To complete the circuit of the primary coil, the second primary coil conductor 12 is connected to a second primary coil end and returns to a ground of the driver electronics 6. The frequency of the output signal from the transistor induces an electromagnetic field having varying magnetic flux. The varying magnetic flux induces a voltage in the secondary coil 50. The voltage induced in the secondary coil 50 may be applied to generate the high frequency field which is transmitted into the nozzle chamber 60 to generate the plasma stream.

[00037] The frequency of the high frequency field used to generate the plasma stream is a function of the configuration of the secondary coil 50. As such, in an exemplary embodiment, the secondary coil 50 includes a plurality of coils 1 14. Each of the plurality of coils 1 14 may correspond to a specific section or grouping of windings. In an exemplary embodiment, a first secondary coil 1 16 and a second secondary coil 1 18 are optionally incorporated in the secondary coil 50. Each of the plurality of secondary coils 1 14 is optionally driven by connecting or disconnecting the first or the second secondary coil 1 16 or 1 18. In other embodiments, the first or the second secondary coil 1 16 or 1 18 may be optionally driven in series. Though first and second secondary coils are discussed herein, similar designs may include any number of secondary coils and combinations thereof, for example a third and a fourth secondary coil.

[00038] A switch 120 controls the actuation of one or more relays or switches in the secondary coil 50. The switch may be any type of electrical switch including a variety of relays or switches, for example reed relays, latching relays, solid-state relays, etc. When in an open position, the switch 120 provides a first current path through the first secondary coil 1 16. When in a closed position, the switch 120 provides a second current path through the second secondary coil 1 18. In this implementation, a first reed relay 122 and a second reed relay 124 control a path for the flow of current through the first current path and the second current path respectively.

[00039] The plurality of secondary coils may provide various configurations of the secondary coil 50 operable to generate different frequencies of the high frequency field. The plurality of secondary coils may comprise a plurality of groupings of secondary windings that may be selectively connected in the secondary coil to generate different frequencies. The different frequencies are applied to generate plasma streams oscillating at different frequencies. The different frequencies of the plasma may be operable to excite different materials, for example nanospheres of gold, silver or other metals which can be homogeneous or in the form of coated nanospheres. Though heating of nanospheres is discussed herein, the applications of the plasma streams generated at different frequencies provides for numerous applications for sterilization and therapy in accordance with the teachings of the invention.

[00040] Some applications of the plasma generating system may include using a plasma stream to sterilize items and surfaces, augmenting wound healing, and for dental applications. In one particular application, nanospheres of gold, silver or other metals which can be homogeneous or in the form of coated nanospheres can be introduced into tissue that is targeted for treatment. The delivery of the nanospheres may be completed through injection into the tissue. When the nanospheres are accumulated within the desired target tissue the spheres can be excited externally by applying the plasma source in accordance with this invention.

[00041] The plasma stream may be delivered from the nozzle of the plasma source system and pass through tissue surrounding the injection site without affecting the tissue. Upon reaching the desired target tissue, the plasma stream may induce high temperatures in the tissue which may provide for hyperthermic treatment of the tissue. The excitation of the nanospheres in response to the plasma stream causes them to vibrate at a very high frequency which leads to a heating effect.

[00042] While the present invention has been described with reference to specific exemplary embodiments, it will be evident that various modifications and changes may be made to these embodiments without departing from the broader scope of the invention as set forth in the claims. Accordingly, the specification and drawings are to be regarded in an illustrative rather than a restrictive sense.

Claims

CLAIMS What is claimed is:

1 . A plasma generating system comprising:

driver electronics for generating an AC supply;

a plasma source system including a primary coil conductively connected to the driver electronics, a secondary coil coaxially positioned within the primary coil, and at least one conductive connector conductively connected to the secondary coil;

a conduit having a first end extending from the plasma generating system, the conductive connector passing from the secondary coil through an internal passage of the conduit;

a nozzle, the nozzle affixed to a second end of the conduit, and

a gas source supplying gas to an inlet end of the nozzle, gas flowing into the nozzle ionized while passing through the nozzle and outward through an outlet end of the nozzle under the influence of an electric field produced by the secondary coil, the electric field transferred into the nozzle via the conductive connector.

2. The system according to claim 1 , wherein the secondary coil is configured to generate a frequency configured to oscillate at a natural frequency of a metallic substance.

3. The system according to claim 1 , wherein the conductive connector comprises a first supply wire, the first supply wire conductively connected to a first end of the secondary coil.

4. The system according to claim 3, wherein the nozzle comprises a conductive rod conductively connected to a second end of the first supply wire.

5. The system according to claim 4, wherein the nozzle comprises a ring, the ring aligned with the conductive rod such that a longitudinal axis of the conductive rod passes centrally through an opening inside the ring.

6. The system according to claim 5, wherein the conductive rod is needle like in shape with the narrow end of the needle-like shape extending toward the ring.

7. The system according to claim 5, wherein the ring is connected to a second supply wire, the second supply wire extending from the nozzle to a second end of the primary coil through the internal passage of the conduit.

8. The system according to claim 5, wherein the gas flowing into the nozzle is ionized by passing through the electromagnetic field of the secondary coil emitted from the conductive rod to the ring.

9. A method for generating a targeted plasma stream, the method comprising:

generating an AC supply in driver electronics, the driver electronics configured to control a driving frequency of a transistor to control the AC supply,

conducting the AC supply in a primary coil to generate an electromagnetic field at the driving frequency,

inducing a current in a secondary coil in response to the electromagnetic field, the current in the secondary coil comprising a high voltage signal, the high voltage signal oscillating at a frequency corresponding to the configuration of the secondary coil,

transmitting the high voltage signal through a conduit to a nozzle, the high voltage signal conducted through a conductive connector,

inducing a flow of gas through the nozzle,

generating a plasma stream in response to the high voltage signal in the gas flowing through the nozzle.

10. The device according to claim 9, wherein the driving frequency is between 100 kHz and 2.5 MHz.

1 1 . The device according to claim 9, wherein the driving frequency between 400 kHz and 2.2 MHz

12. The method according to claim 9, wherein the driving frequency is controlled by a timer and the transistor of the driver electronics.

13. The method according to claim 9, wherein secondary coil comprises a plurality of groupings of secondary windings.

14. The method according to claim 13, wherein at least one of the plurality of groupings of secondary windings is conductively connected to the conductive connector in response to at least one relay or switch.

15. The method according to claim 14, wherein the at least one relay or switch is configured to change a number of turns in the secondary coil.

16. The method according to claim 14, wherein the number of turns in the secondary coil is configurable to control the high voltage signal at a first frequency and a second frequency corresponding to a first grouping of the secondary windings and a second grouping of the secondary windings.

17. The method according to claim 16, wherein the first frequency corresponds to a natural frequency of a first material.

18. The method according to claim 16, wherein the second frequency corresponds to the natural frequency of a second material, the second material being different than the first material.

19. A plasma generating device comprising;

driver electronics for generating an AC supply,

a plasma source system including a primary coil and a secondary coil, the secondary coil positioned within the primary coil, the primary coil conductively connected to the driver electronics,

a conduit connected to a first end of the plasma source system, the conduit comprising an internal passage, a conductive connector passing from the secondary coil through the internal passage, the conductive connector configured to transfer a high voltage signal from the secondary coil through at least one supply wire, a first end of the conduit attached to an end cap of the first tube, a nozzle, the nozzle affixed to a second end of the conduit, the nozzle configured to receive the at least one supply wire, the at least one supply wire conductively connected to a conductive rod, the conductive rod extending along a longitudinal axis of the nozzle,

a gas source supplying gas to the nozzle, gas flowing into the nozzle ionized while passing in proximity to the conductive rod and outward through an outlet end of the nozzle to produce a plasma stream in response to an electric field, the electric field produced by the secondary coil and conducted through the conductive rod.

20. The device according to claim 19, wherein an oscillating of an ionized charge of the plasma gas stream corresponds to a natural frequency of the metallic substance.