WO2013097842A3 - Vorrichtung zum verdampfen eines verdampfungsguts - Google Patents

Vorrichtung zum verdampfen eines verdampfungsguts Download PDF

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Publication number
WO2013097842A3
WO2013097842A3 PCT/DE2012/001220 DE2012001220W WO2013097842A3 WO 2013097842 A3 WO2013097842 A3 WO 2013097842A3 DE 2012001220 W DE2012001220 W DE 2012001220W WO 2013097842 A3 WO2013097842 A3 WO 2013097842A3
Authority
WO
WIPO (PCT)
Prior art keywords
opening
evaporation
evaporating
substance
nozzle
Prior art date
Application number
PCT/DE2012/001220
Other languages
English (en)
French (fr)
Other versions
WO2013097842A2 (de
Inventor
Christopher Eisele
Frank Huber
Heiko Schuler
Ralf MÜLLER
Original Assignee
Dr. Eberl Mbe-Komponenten Gmbh
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dr. Eberl Mbe-Komponenten Gmbh filed Critical Dr. Eberl Mbe-Komponenten Gmbh
Publication of WO2013097842A2 publication Critical patent/WO2013097842A2/de
Publication of WO2013097842A3 publication Critical patent/WO2013097842A3/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/243—Crucibles for source material
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B23/00—Single-crystal growth by condensing evaporated or sublimed materials
    • C30B23/02—Epitaxial-layer growth
    • C30B23/06—Heating of the deposition chamber, the substrate or the materials to be evaporated
    • C30B23/066—Heating of the material to be evaporated

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Mechanical Engineering (AREA)
  • Physical Vapour Deposition (AREA)
  • Vaporization, Distillation, Condensation, Sublimation, And Cold Traps (AREA)

Abstract

Vorrichtung (10) zum Verdampfen eines Verdampfungsguts in einer Vakuumbeschichtungsanlage mit einem Tiegel (12) der eine einen Öffnungsrand (106) aufweisende Öffnung (101) aufweist, und in der Öffnung (101) ein mindestens eine Düse (103) aufweisender herausnehmbarer Einsatz (102) mit einer Düsenaustrittsöffnung ( 108 ) angeordnet ist, wobei die Öffnung (101) oder die Düsenaustrittsöffnung (108) in einer Verdampfungsrichtung (100) oberhalb eines Abschirmelementes (109) und oberhalb einer als Kühlmantel dienenden Wandung (14) angeordnet ist.
PCT/DE2012/001220 2011-12-30 2012-12-21 Vorrichtung zum verdampfen eines verdampfungsguts WO2013097842A2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102011122591.2 2011-12-30
DE201110122591 DE102011122591A1 (de) 2011-12-30 2011-12-30 Vorrichtung zum Verdampfen eines Verdampfungsguts

Publications (2)

Publication Number Publication Date
WO2013097842A2 WO2013097842A2 (de) 2013-07-04
WO2013097842A3 true WO2013097842A3 (de) 2013-08-22

Family

ID=48039961

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/DE2012/001220 WO2013097842A2 (de) 2011-12-30 2012-12-21 Vorrichtung zum verdampfen eines verdampfungsguts

Country Status (2)

Country Link
DE (1) DE102011122591A1 (de)
WO (1) WO2013097842A2 (de)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102013012471A1 (de) * 2013-07-26 2015-01-29 Createc Fischer & Co. Gmbh Verdampfer und Verfahren zur Schichtabscheidung im Vakuum
CN103952668B (zh) * 2014-05-14 2016-04-13 深圳市华星光电技术有限公司 可以侦测和防止高温金属材料泄露的加热容器及制造方法
CN104404450B (zh) * 2014-10-28 2018-06-01 深圳市华星光电技术有限公司 用于升华型oled材料蒸镀的坩埚
CN112074623A (zh) * 2018-05-22 2020-12-11 应用材料公司 蒸发源、用于操作蒸发源的方法和沉积系统
FR3102189B1 (fr) * 2019-10-17 2022-08-05 Riber Cellule d’évaporation pour chambre d’évaporation sous vide et procédé d’évaporation associé

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4700660A (en) * 1984-06-12 1987-10-20 Kievsky Politekhnichesky Institut Evaporator for depositing films in a vacuum
US5932294A (en) * 1995-05-03 1999-08-03 Chorus Corporation MBE deposition method employing effusion cell having a unibody crucible
US20060169211A1 (en) * 2005-01-31 2006-08-03 Kim Do G Vapor deposition source and vapor deposition apparatus having the same
DE102006056390A1 (de) * 2006-06-20 2007-12-27 General Electric Co. Mehrteiliger keramischer Tiegel und Verfahren zu seiner Herstellung
DE102009026340A1 (de) * 2009-08-06 2011-03-10 Solibro Gmbh Effusionszelle

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2793609A (en) * 1953-01-26 1957-05-28 British Dielectric Res Ltd Means for the deposition of materials by evaporation in a vacuum
US3281517A (en) * 1963-11-19 1966-10-25 Melpar Inc Vacuum furnace
DE2548357C2 (de) * 1975-10-29 1983-05-26 Robert Bosch Gmbh, 7000 Stuttgart Einrichtung zur kontinuierlichen Vakuumbedampfung eines bandförmigen Trägermaterials mit Zink

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4700660A (en) * 1984-06-12 1987-10-20 Kievsky Politekhnichesky Institut Evaporator for depositing films in a vacuum
US5932294A (en) * 1995-05-03 1999-08-03 Chorus Corporation MBE deposition method employing effusion cell having a unibody crucible
US20060169211A1 (en) * 2005-01-31 2006-08-03 Kim Do G Vapor deposition source and vapor deposition apparatus having the same
DE102006056390A1 (de) * 2006-06-20 2007-12-27 General Electric Co. Mehrteiliger keramischer Tiegel und Verfahren zu seiner Herstellung
DE102009026340A1 (de) * 2009-08-06 2011-03-10 Solibro Gmbh Effusionszelle

Also Published As

Publication number Publication date
WO2013097842A2 (de) 2013-07-04
DE102011122591A1 (de) 2013-07-04

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