WO2013086911A1 - 一种多阶hdi板的生产方法 - Google Patents

一种多阶hdi板的生产方法 Download PDF

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Publication number
WO2013086911A1
WO2013086911A1 PCT/CN2012/084271 CN2012084271W WO2013086911A1 WO 2013086911 A1 WO2013086911 A1 WO 2013086911A1 CN 2012084271 W CN2012084271 W CN 2012084271W WO 2013086911 A1 WO2013086911 A1 WO 2013086911A1
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WIPO (PCT)
Prior art keywords
copper foil
hole
foil layer
layer
browning
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PCT/CN2012/084271
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English (en)
French (fr)
Inventor
姜雪飞
黄海蛟
杜明星
林楠
白亚旭
Original Assignee
深圳崇达多层线路板有限公司
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Publication of WO2013086911A1 publication Critical patent/WO2013086911A1/zh

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Classifications

    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/40Forming printed elements for providing electric connections to or between printed circuits
    • H05K3/42Plated through-holes or plated via connections
    • H05K3/429Plated through-holes specially for multilayer circuits, e.g. having connections to inner circuit layers
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/46Manufacturing multilayer circuits
    • H05K3/4644Manufacturing multilayer circuits by building the multilayer layer by layer, i.e. build-up multilayer circuits
    • H05K3/4652Adding a circuit layer by laminating a metal foil or a preformed metal foil pattern
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2201/00Indexing scheme relating to printed circuits covered by H05K1/00
    • H05K2201/09Shape and layout
    • H05K2201/09209Shape and layout details of conductors
    • H05K2201/095Conductive through-holes or vias
    • H05K2201/09509Blind vias, i.e. vias having one side closed
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2201/00Indexing scheme relating to printed circuits covered by H05K1/00
    • H05K2201/09Shape and layout
    • H05K2201/09209Shape and layout details of conductors
    • H05K2201/095Conductive through-holes or vias
    • H05K2201/09536Buried plated through-holes, i.e. plated through-holes formed in a core before lamination
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2201/00Indexing scheme relating to printed circuits covered by H05K1/00
    • H05K2201/09Shape and layout
    • H05K2201/09209Shape and layout details of conductors
    • H05K2201/095Conductive through-holes or vias
    • H05K2201/096Vertically aligned vias, holes or stacked vias
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/0011Working of insulating substrates or insulating layers
    • H05K3/0017Etching of the substrate by chemical or physical means
    • H05K3/0026Etching of the substrate by chemical or physical means by laser ablation
    • H05K3/0032Etching of the substrate by chemical or physical means by laser ablation of organic insulating material
    • H05K3/0035Etching of the substrate by chemical or physical means by laser ablation of organic insulating material of blind holes, i.e. having a metal layer at the bottom
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/0011Working of insulating substrates or insulating layers
    • H05K3/0044Mechanical working of the substrate, e.g. drilling or punching
    • H05K3/0047Drilling of holes

Definitions

  • the invention relates to a method for producing a multi-step 11DI board, in particular to a method for producing a multi-stage HDI board with multiple buried holes, blind holes or buried holes and blind holes. Background technique!
  • HDI circuit board is also called high-density mutual ⁇ plate, which means that the hole diameter is below 6 mil, the hole diameter of the hole ring is below 0.25, the contact density is above 130 points/square, and the line width/pitch is 3 mil. /3mil printed circuit board.
  • the HDI circuit board can reduce the production cost of multi-layer PCB and increase the line density, and has the advantages of high reliability and good electrical performance.
  • the production process of the multilayer laser cobalt hole HDI circuit board is: cutting material - an inner layer pattern - inner layer etching - inner layer A0I - - browning - laminating - - browning 2 - laser drilling - -- Inner layer of copper, plate electricity - inner layer plating pattern - "filling hole plating - one film - one belt grinding plate - one inner layer drilling - "inner layer of copper, plate electricity 2 - inside Layer plating pattern 2 - plating hole one - peeling film 2 - resin plug hole - sand belt grinding plate 2 - inner layer sinking copper, plate electricity 3 - inner layer pattern 2 - inner layer etching 2 - Inner layer ⁇ - One browning 3- - Lamination 2 - Browning 4 - Laser drilling 2 - External copper, plate electricity - One
  • the inner blind holes and buried holes of the multi-stage HDI board are used for the boring holes by the same set of holes, and the locating holes of the drilled holes are smaller after the blind holes are filled, and the holes are smaller.
  • the thickness of electroplated copper is not the same, which results in the use of positioning holes for through holes and blind holes.
  • the blind holes need to be sanded after the hole is filled, and then the holes are buried, and the expansion and contraction of the ⁇ 0 ⁇ plate after the grinding plate is different. The problem that the coefficient of the buried hole is inconsistent with the number of the blind hole system. Summary of the invention:
  • an object of the present invention is to provide a method for producing a multi-stage HDI board, which is to solve the problem that the inner layer blind hole and the buried hole of the current multi-stage HDI board are used to separate the 3 ⁇ 43 ⁇ 4 holes by using the same group of holes, and the existing drill
  • the coefficient of the buried hole is inconsistent with the blind hole coefficient, and the through hole and the hole are not matched.
  • the present invention mainly adopts the following technical solutions:
  • a method for producing a multi-step HDI board including steps -
  • the hole forms an outer blind hole at the position of the buried hole, forms a stacked hole with the buried hole, and forms a through hole by mechanical drilling.
  • step A described before includes:
  • the step A described above specifically includes:
  • the core board is browned to form a browning film on the surface of the core board;
  • A2 laminating a first copper foil layer on the core board, and subjecting the first copper foil layer to a browning treatment to form a browning film on the surface of the first copper foil layer;
  • step B specifically includes - bl, using the same set of positioning holes to simultaneously perform laser drilling and mechanical drilling on the surface of the first copper foil layer, and forming a blind hole of the inner layer by laser drilling, and forming a buried hole by mechanical drilling ;
  • the buried hole is plugged by the PP resin, and the circuit board after the plug hole is subjected to abrasive belt grinding; b5, the inner layer of the circuit board after the abrasive belt is plated, the surface is plated, and the inner surface is plated.
  • the layer pattern is formed and the inner layer is etched to form a circuit pattern on the first copper foil layer, and then the first copper foil layer is subjected to a browning treatment to form a brown film on the surface of the first copper foil layer.
  • step D specifically includes -
  • the outer hole blind hole is formed by the laser drilling at the buried hole position, and the stacked hole is formed with the buried hole, and is mechanically Drilling to form a through hole;
  • the second copper foil layer is subjected to an outer layer of copper and a plate surface plating treatment
  • the invention drills the inner blind hole together with the buried hole, and uses the same set of holes as the positioning hole, thereby avoiding the problem that the through hole and the blind hole existing in the blind hole and the buried hole are not matched, and the present invention is adopted.
  • the manufacturing process of the invention avoids the processes of inner copper sinking, plate electricity, inner layer plating pattern, hole filling plating, film unwinding and abrasive belt grinding plate, which greatly shortens the production cycle and reduces the inner layer of the inner belt.
  • the grinding plate can make the circuit board dimensional stability better and save the production cost.
  • FIG. 1 is a schematic structural view of a laser blind hole, a buried hole and a through hole on a multilayer circuit board of the present invention.
  • Figure 2 is a process flow diagram of the present invention.
  • the illustration shows the core board 1, the first copper foil layer 2, the second copper foil layer 3, the inner blind hole 4, the buried hole 5, the outer blind hole
  • the invention provides a method for producing a multi-stage HDI board, which is mainly used for solving the current multi-stage HDI board in the production process, because there are multiple blind holes, buried holes, through holes or both buried holes and blind holes. It is easy to see that the through hole and the blind hole do not match. Ding question.
  • FIG. 1 is a schematic structural view of a laser blind hole, a buried hole and a through hole on a multilayer circuit board according to the present invention.
  • the core board 1 Located inside is the core board 1, on the first layer of the core board 1 is a first copper foil layer 2, above the first copper foil layer 2 is a second copper box layer 3, wherein on the first copper foil layer 2 The inner blind hole 4 and the buried hole 5 are drilled, the two are in the same layer, the buried hole 5 is filled with the resin; the outer copper blind hole 6 is drilled with the outer blind hole 6 and the through hole 7 The layer blind hole 6 forms a stacked hole with the above buried hole 5, and the through hole 7 passes through the entire circuit board.
  • FIG. 2 is a process flow diagram of the present invention.
  • the present invention also provides a method for producing a multi-step HDI board, which specifically includes the following steps:
  • step A it also includes:
  • the core board is subjected to browning treatment to form a browning film on the surface of the core board; then the first copper foil layer is laminated on the core board, and the first copper foil layer is subjected to browning treatment to form a surface of the first copper S layer.
  • Brown film
  • Step B specifically includes:
  • the outer hole blind hole is formed by the laser drilling at the buried hole position, and the buried hole forms a stacked hole, and is drilled by the mechanical drill
  • the holes form through holes.
  • the step D specifically includes:
  • D2 the outer copper plate and the plate surface plating treatment are performed on the second copper foil layer; D3, performing outer plating pattern and filling plating treatment;
  • the specific manufacturing process of the present invention is compared with the existing multi-stage HDI board manufacturing process.
  • the two processes of laser drilling and inner layer drilling in the original process are combined into one process, in the first copper foil layer.
  • the copper foil layer is laser drilled and the inner layer is mechanically drilled, thereby reducing the inner layer of copper, plate electricity, inner plating hole pattern, and hole filling of the inner layer drilling in the original process.
  • Processes such as electroplating, film detachment and abrasive belt grinding.
  • the drilling holes of the same type of holes are used for the positioning holes of the same group of holes, when blind holes, through holes or buried holes are drilled on the same layer, there is no blind hole caused by the difference of the positioning holes.
  • the hole or buried hole coefficient is inconsistent, and the through hole and blind hole do not match.

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  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Production Of Multi-Layered Print Wiring Board (AREA)
  • Laser Beam Processing (AREA)

Abstract

一种多阶HDI板的生产方法,包括步骤:A、在芯板(1)上层压第一铜箔层(2),并对第一铜箔层(2)进行棕化处理,使第一铜箔层(2)表面形成棕化膜;B、使用同一组定位孔同时对第一铜箔层(2)表面进行激光钻孔和机械钻孔,并由激光钻孔形成内层盲孔(4),由机械钻孔形成埋孔(5);C、在第一铜箔层(2)表面上层压第二铜箔层(3),并对第二铜箔层(3)进行棕化处理,使第二铜箔层(3)表面形成棕化膜;D、使用同一组定位孔同时对第二铜箔层(3)表面进行激光钻孔和机械钻孔,由激光钻孔在埋孔(5)位置处形成外层盲孔(6),与埋孔(5)形成叠孔,并由机械钻孔形成通孔(7)。该方法避免了盲孔与埋孔分开钻孔所存在的通孔、盲孔不匹配的问题,同时减少了内层沉铜、板电、内层镀孔图形、填孔电镀、退膜和砂带磨板等流程,缩短了生产周期,节约了生产成本。

Description

一种多阶 HD I板的生产方法 技术领域:
本发明涉及一种多阶 11DI板的生产方法,特别是对多次埋孔、盲孔或埋孔、盲孔同 对存在的多阶 HDI板的生产方法。 背景技术!
HDI电路板也称高密度互眹板,是指孔径在 6mil以下,孔环的环径(Hole Pad)在 0. 25删以下,接点密度在 130点 /平方时以上,线宽 /间距为 3mil/3mil以下的印刷电路 板。 HDI电路板可降低多层 PCB板的生产成本、增加线路密度,具有可靠度高、电性能好等优' 点。
由于激光钻孔 HDI板阶数的不断增加 7结构的复杂化,导致多阶 HD]:板的生产流程 增加,报废率升高,生产成本提高。目前多层激光钴孔 HDI电路板的生产流程为:开料 -一内 层图形一-内层蚀刻 ---内层 A0I-—棕化 --层压 - -棕化 2—激光钻孔 ---内层沉铜、 板电―内层镀孔图形——―填孔电镀 -一退膜 -一砂带磨板 -一内层钻孔——―内层沉铜、板 电 2 —内层镀孔图形 2—-镀孔一-退膜 2—-树脂塞孔 ---砂带磨板 2—内层沉铜、板 电 3---内层图形 2-—内层蚀刻 2-—内层 · -一棕化 3-—层压 2一-棕化 4一激光钻 孔 2---外层沉铜、板电 -一外层镀孔图形 -一填孔电镀 2---退膜 3---砂带磨板 3—-外 层钻孔—―—外层沉铜 2---外层板电 2-—外层图形 -一图形电镀一-外层蚀刻 一丝印阻 焊 ---表面处理—―成型 ---成型后测试 - - -FQC -包装。
上述生产流程中多阶 HDI板的内层盲孔与埋孔使用同一组孔做定位孔进行分幵 钻孔,钻埋孔的定位孔在盲孔填孔后,孔径会变小,孔内的电镀铜厚度也不一样,导致通孔、 盲孔使用的定位孔本质不一.;盲孔填孔后需要砂带磨板,然后 埋孔,而磨板后 Η0Γ板的 涨缩不一,容易导致钻埋孔的系数与盲孔系.数不一致的问题。 发明内容:
鉴于以上问题 本发明的目的在于提供一种多阶 HDI板的生产方法,以解决目前 多阶 HDI板制作内层盲孔与埋孔使用同一组孔做定位孔进行分开 ¾¾孔 ,所存在的钻埋孔的 系数与盲孔系数不一致、通孔、省孔不匹配的问题。
为实现上述目的,本发明主要采用以下技术方案:
一种多阶 HDI板的生产方法,包括步骤-
Α、在芯板上层压第一铜箔层,并对第一铜箔层进行棕化处理,使第一铜箔层表面 形成棕化膜 ';
β、使用同一组定位孔同时对第一铜箔层表面进行激光钻孔和机械钻孔,并由激光 钻孔形成内层盲孔,由机械钻孔形成埋孔;
C、在上述第一铜箔层表面上层压笫二铜箔层,并对第二铜箔层进行棕化处理,使 第二铜箔层表面形成棕化膜;
Ό,使用同一组定位孔同吋对第二铜箔层表面进行激光钻孔和机械钻孔,由激光钻 孔在埋孔位置处形成外层盲孔,与埋孔形成叠孔,并由机械钻孔形成通孔。
其中所述步骤 A之前包括:
选择覆铜板进行幵料,对幵料后的覆铜板进行内层图形制作,之后进行内层蚀刻, 在内层板面上形成电路图形,然后对线路板上下两面分别覆盖半固化片和铜箔,进行层压, 得到芯板。
其中所述步骤 A具体包括:
al、对芯板进行棕化处理,使芯板表面形成棕化膜;
a2、在芯板上层压第一铜箔层,并对第一铜箔层进行棕化处理,使第一铜箔层表面 形成棕化膜;
其中所述步骤 B具体包括- bl、使用同一组定位孔同时对第一铜箔层表面进行激光钻孔和机械钻孔,并由激 光钻孔形成内层盲孔,由机械钻孔形成埋孔;
b2、对上述线路板进行内层沉铜、板面电镀及内层镀孔图形处理;
b3、对上述盲孔及埋孔进行镀孔处理,并褪去第一铜箔层表面的棕化膜;
M、通过 PP树脂对上述埋孔进行塞孔,并对塞孔后的线路板进行砂带磨板处理; b5、对砂带磨板后的线路板进行内层沉铜、板面电镀以及内层图形制作和内层蚀 刻处理,在第一铜箔层上形成电路图形,然后对第一铜箔层进行棕化处理,使第一铜箔层表 面形成棕化膜。
其中所述步骤 D具体包括-
(11、使用同一组定位孔同时对第二铜箔层表面进行激光钻孔和机械钻孔,由激光 钻孔在埋孔位置处形成外层盲孔,与埋孔形成叠孔,并由机械钻孔形成通孔;
d2、对第二铜箔层进行外层沉铜、板面电镀处理;
d3、进行外层镀孔图形和填孔电镀处理;
d4、褪去第二铜箔层表面的棕化膜,对线路板进行砂带磨板处理;
d5、对砂带磨板处理后的线路板进行外层钻孔、外层沉铜、外层板电、外层图形制 作、图形电镀、外层蚀刻、丝印阻焊及表面处理之后形成成品。
本发明将内层盲孔与埋孔一起钻孔,并使用同一组孔做定位孔,避免了目前盲孔 与埋孔分开钻孔所存在的通孔、盲孔不匹配的问题,而且采用本发明的制作流程,避免了内 层沉铜、板电、内层镀孔图形、填孔电镀、退膜和砂带磨板等流程,大大缩短了生产周期,同 时由于减少了内层一次砂带磨板,可使线路板尺寸稳定性更好,节约了生产成本。 附图说明:
图 1为本发明多层线路板上激光盲孔、埋孔和通孔的结构示意图。
图 2为本发明的工艺流程图。
图中标识说明:芯板 1、第一铜箔层 2、第二铜箔层 3、内层盲孔 4、埋孔 5、外层盲孔
6、通孔 7。 具体实施方式:
为阐述本发明的思想及目的,下面将结合附图和具体实施例对本发明做进一步的 说明。
本发明提供的是一种多阶 HDI板的生产方法,主要用于解决目前多阶 HDI板在生 产制作过程中,因存在多次盲孔、埋孔、通孔或同时存在埋孔和盲孔时 容易出现通孔、盲孔 不匹配的 ί。丁题。
请参见图 1所示,图 1为本发明多层线路板上激光盲孔、埋孔和通孔的结构示意 图。
位于内部的是芯板 1,在芯板 1的上面第一层为第一铜箔层 2,在第一铜箔层 2上 面为第二铜箱层 3,其中在第一铜箔层 2上钻有内层盲孔 4和埋孔 5,二者处于同一层,埋孔 5中塞有 ΡΡ树脂;在第二铜箔层 3上钻有外层盲孔 6和通孔 7,所述外层盲孔 6与上述的埋 孔 5形成叠孔,所述的通孔 7则穿过整个线路板。
请参见图 2所示,图 2为本发明的工艺流程图。 本发明还提.供了一种多阶 HDI板 的生产方法,其具体包括步骤如下:
Α、在芯板上层压第一铜箔层 并对第一铜箔层进行棕化处理,使第一铜箔层表面 形成棕化膜;
其中歩骤 A之前还包括:
选择覆铜板进行开料,对幵料后的覆铜板进行内层图形制作,之后进行内层蚀刻, 在内层板面上形成电路图形,然后对线路板上下两面分别覆盖半固化片和铜箔 进行层压., 得到芯板。
然后对芯板进行棕化处理,使芯板表面形成棕化膜;之后在芯板上层压第一铜箔 层,并对第一铜箔层进行棕化处理,使第一铜 S层表面形成棕化膜;
B、使用同一组定位孔同时对第一铜 层表面进行激光钴孔和机械钻孔,并由激光 钻孔形^ <内层盲孔,由机械钻孔形成埋孔;.
其中歩骤 B具体包括:
bl、使用同一组定位孔同时对第一铜箔层表面进行激光钻孔和机械钻孔 并由激 光^ ί孔形成内层盲孔,由机械钻孔形成埋孔:
b2、对上述线路板进行内层沉铜、板面电镀及内层镀孔图形处理;
b3、对上述盲孔及埋孔进行镀孔处理,并褪去第一铜箔层表面的棕化膜; b4、通过 PP树脂对上述埋孔进行塞孔,并对塞孔后的线路板进行砂带磨板处理; b5、对砂带磨板后的线路板进行内层沉铜、板面电镀以及内层图形制作和内层蚀 刻处理,在第一铜箔层上形成电路图形,然后对第一铜箔层进行棕化处理,使第一铜箔层表 面形成棕化膜„
C、在上述第一铜箔层表面上层压第二铜箔层,并对第二铜箔层进行棕化处理,使 第二铜箔层表面形成棕化膜;
D、使用同一组定位孔同时对第二铜箔层表面进行激光钻孔和机械钻孔,由激光钻 孔在埋孔位置处形成外层盲孔,与埋孔形成叠孔,并由机械钻孔形成通孔。
其中歩骤 D具体包括:
dl、使用同一组定位孔同时对第二铜箔层表面进行激光钻孔和机械钻孔,由激光 钻孔在埋孔位置处形成外层盲孔,与埋孔形成叠孔,并由机械钻孔形成通孔;
d2 ,对第二铜箔层进行外层沉铜、板面电镀处理; d3、进行外层镀孔图形和填孔电镀处理;
d4、褪去第二铜箔层表面的棕化膜,对线路板进行砂带磨板处理;
c!5、对砂带磨板处理后的线路板进行外层钻孔、外层沉铜、外层板电、外层图形制 作、图形电镀、外层蚀刻、丝印阻焊及表面处理之后形成成品。
本发明的具体制作流程与现有多阶 HDI板的制作流程比较,由于本发明中将原流 程中激光钻孔与内层钻孔两个单独的工序合并成一个工序,在第一铜箔层层压后就同时对 该铜箔层进行激光钻孔和内层的机械钻孔,因此减少了原工序中进行内层钻孔的内层沉 铜、板电、内层镀孔图形、填孔电镀、退膜和砂带磨板等流程。
另外由于本砝码钻孔所采用的是同一组孔的定位孔,因此在同一层上进行钻盲 孔、通孔或埋孔时,不会出现因为定位孔不一,而导致的盲孔、通孔或埋孔系数不一致,通 孔、盲孔不匹配的问题。
以上是对本发明所提供的一种多阶 HDI板的生产方法进行了详细的介绍,本文中 应用了具体个例对本发明的结构原理及实施方式进行了阐述 以上实施例只是用于帮助理 解本发明的方法及其核心思想;同时,对于本领域的一般技术人员,依据本发明的思想,在 具体实施方式及应用范围上均会有改变之处,综上所述,本说明书内容不应理解为对本发 明的限制。

Claims

1. 一种多阶 HDI板的生产方法,其特征在于包括步骤:
A、在芯板上层压第一铜箔层,并对第一铜箔层进行棕化处理,使第一铜箔层表面形成 棕化膜;
B、使用同一组定位孔同时对第一铜箔层表面进行激光钻孔和机械钻孔,并由徼光钻孔 形成内层盲孔,甶机械钻孔形成埋孔;
C、在上述第一铜箔层表面上层压第二铜箔层,并对第二铜箔层进行棕化处理,使第二 铜箔层表面形成棕化膜;
D、使用同一组定位孔同时对第二铜箔层表面进行激光钻孔和机械钻孔,由激光钻孔在 埋孔位置迚形成外层盲孔,与埋孔形成叠孔,并由机械钻孔形成通孔。
2.根据权利要求 1.所述的多阶 HDI板的生产方法,其特征在于所述歩骤 A之前包括: 选择覆铜板进行开料,对开料后的覆铜板进行内层图形制作,之后进行内层蚀刻,在内 层板面上形成电路图形,然后对线路板上下两面分别覆盖半固化片和铜箔 进行层压,得到 芯板。
3. 根据权利要求 1所述的多阶 HDI板的生产方法,其特征在于所述歩骤 A具体包括: al、对芯板进行棕化处理,使芯板表面形成棕化膜;
a2、在芯板上层压第一铜箔层,并对第一铜箔层进行棕化处理,使第一铜箔层表面形成 棕化膜。
4. 根据权利要求 1所述的多阶 HDI板的生产方法,其特征在于所述'步骤 B具体包括: bl、使用同一组定位孔同时对第一铜箔层表面进行激光钻孔和机械钻孔,并由激光钻 孔形成内层盲孔,由机械钻孔形成埋孔;
b2、对上述线路板进行内层沉铜、板面电镀及内层镀孔图形处理;
b3、对上述盲孔及埋孔进行镀孔处理,并褪去第一铜箔层表面的棕化膜;
b4、通过 PP树脂对上述埋孔进行塞孔,并对塞孔后的线路板进行砂带磨板处理; b5 对砂带磨板后的线路板进行内层沉铜、板面电镀以及内层图形制作和内层蚀刻处 理,在第一铜箔层上形成电路图形,然后对第一铜箔层进行棕化处理,使第一铜箔层表面形 成棕化膜。
5. 根据权利要求 1.所述的多阶 HDI板的生产方法,其特征在于所述步骤 D具体包括: dl、使用同一组定位孔同时对第二铜箔层表面进行激光钻孔和机械钻孔,由激光钻孔 在埋孔位置处形成外层盲孔,与埋孔形成叠孔,并由机械钻孔形成通孔;
d2、对第二铜箔层进行外层沉铜、板面电镀处理;
d.3、进行外层镀孔图形和填; fL电镀处理;
d4、褪去第二铜箔层表面的棕化膜,对线路板进行砂带磨板处理;
d.5、对砂带磨板处理后的线路板进行外层钻孔、外层沉铜、外层板电、外层图形制作、图 形电镀、外层蚀刻、丝印阻焊及表面处理之后形成成品。
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