WO2012164546A3 - Heated mask - Google Patents

Heated mask Download PDF

Info

Publication number
WO2012164546A3
WO2012164546A3 PCT/IB2012/052806 IB2012052806W WO2012164546A3 WO 2012164546 A3 WO2012164546 A3 WO 2012164546A3 IB 2012052806 W IB2012052806 W IB 2012052806W WO 2012164546 A3 WO2012164546 A3 WO 2012164546A3
Authority
WO
WIPO (PCT)
Prior art keywords
stencil
membrane
clogging
heated mask
heated
Prior art date
Application number
PCT/IB2012/052806
Other languages
French (fr)
Other versions
WO2012164546A2 (en
Inventor
Shenqi XIE
Andreea Veronica SAVU
Juergen Brugger
Original Assignee
Ecole Polytechnique Federale De Lausanne (Epfl)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ecole Polytechnique Federale De Lausanne (Epfl) filed Critical Ecole Polytechnique Federale De Lausanne (Epfl)
Publication of WO2012164546A2 publication Critical patent/WO2012164546A2/en
Publication of WO2012164546A3 publication Critical patent/WO2012164546A3/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • C23C14/042—Coating on selected surface areas, e.g. using masks using masks
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • C23C14/042—Coating on selected surface areas, e.g. using masks using masks
    • C23C14/044—Coating on selected surface areas, e.g. using masks using masks using masks to redistribute rather than totally prevent coating, e.g. producing thickness gradient

Abstract

The invention concerns a method and a device wherein a stencil is provided with an integrated microhotplate on the stencil membrane to prevent aperture clogging, whereby the stencil can be locally heated up in order to minimize material condensation, remove clogging and control the resolution of the deposited material by deforming the membrane towards or away from a substrate.
PCT/IB2012/052806 2011-06-03 2012-06-04 Microheater-based in situ self-cleaning dynamic stencil lithography WO2012164546A2 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP11168719 2011-06-03
EP11168719.0 2011-06-03

Publications (2)

Publication Number Publication Date
WO2012164546A2 WO2012164546A2 (en) 2012-12-06
WO2012164546A3 true WO2012164546A3 (en) 2013-01-24

Family

ID=46508121

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/IB2012/052806 WO2012164546A2 (en) 2011-06-03 2012-06-04 Microheater-based in situ self-cleaning dynamic stencil lithography

Country Status (1)

Country Link
WO (1) WO2012164546A2 (en)

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004103512A (en) * 2002-09-12 2004-04-02 Fujitsu Ltd Manufacturing method and device for organic el element
EP1491653A2 (en) * 2003-06-13 2004-12-29 Pioneer Corporation Evaporative deposition methods and apparatus
US20050037136A1 (en) * 2003-07-28 2005-02-17 Katsuya Yamamoto Mask for deposition, film formation method using the same and film formation equipment using the same
US20050208216A1 (en) * 2004-03-22 2005-09-22 Michael Long High thickness uniformity vaporization source
JP2009289474A (en) * 2008-05-27 2009-12-10 Casio Comput Co Ltd Light-emitting device, and manufacturing method of light-emitting device

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62272529A (en) 1986-05-20 1987-11-26 Nec Corp Electron beam exposing device
DE3721940A1 (en) 1987-07-02 1989-01-12 Ibm Deutschland REMOVAL OF PARTICLES FROM SURFACES OF SOLID BODY BY LASER Bombardment
DE69223589T2 (en) 1991-10-22 1998-12-10 Halliburton Energy Serv Inc Procedure for measuring boreholes during drilling
JPH06124884A (en) 1992-10-12 1994-05-06 Mitsubishi Electric Corp Electron beam exposure apparatus
US5529862A (en) 1993-09-01 1996-06-25 Texas Instruments Incorporated Method of forming a low distortion stencil mask
JP3578872B2 (en) 1995-10-26 2004-10-20 三菱電機株式会社 X-ray mask manufacturing method and heating apparatus
US5742065A (en) 1997-01-22 1998-04-21 International Business Machines Corporation Heater for membrane mask in an electron-beam lithography system
DE69835601D1 (en) 1997-09-24 2006-09-28 Merrion Res I Ltd COMPOSITIONS AND METHODS FOR INCREASING PARAZELLULAR TRANSPORT BY CELL LAYERS
US6705152B2 (en) 2000-10-24 2004-03-16 Nanoproducts Corporation Nanostructured ceramic platform for micromachined devices and device arrays
US6610464B2 (en) 2001-05-24 2003-08-26 Agere Systems Inc. Process for patterning a membrane
JP2004202351A (en) 2002-12-25 2004-07-22 Sony Corp Washing method and its apparatus

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004103512A (en) * 2002-09-12 2004-04-02 Fujitsu Ltd Manufacturing method and device for organic el element
EP1491653A2 (en) * 2003-06-13 2004-12-29 Pioneer Corporation Evaporative deposition methods and apparatus
US20050037136A1 (en) * 2003-07-28 2005-02-17 Katsuya Yamamoto Mask for deposition, film formation method using the same and film formation equipment using the same
US20050208216A1 (en) * 2004-03-22 2005-09-22 Michael Long High thickness uniformity vaporization source
JP2009289474A (en) * 2008-05-27 2009-12-10 Casio Comput Co Ltd Light-emitting device, and manufacturing method of light-emitting device

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
BRIAND D ET AL: "Design and fabrication of high-temperature micro-hotplates for drop-coated gas sensors", SENSORS AND ACTUATORS B: CHEMICAL: INTERNATIONAL JOURNAL DEVOTED TO RESEARCH AND DEVELOPMENT OF PHYSICAL AND CHEMICAL TRANSDUCERS, ELSEVIER S.A, SWITZERLAND, vol. 68, no. 1-3, 25 August 2000 (2000-08-25), pages 223 - 233, XP004216618, ISSN: 0925-4005, DOI: 10.1016/S0925-4005(00)00433-0 *

Also Published As

Publication number Publication date
WO2012164546A2 (en) 2012-12-06

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