WO2012145101A1 - Structure and method of making graphene nanoribbons - Google Patents
Structure and method of making graphene nanoribbons Download PDFInfo
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- WO2012145101A1 WO2012145101A1 PCT/US2012/029336 US2012029336W WO2012145101A1 WO 2012145101 A1 WO2012145101 A1 WO 2012145101A1 US 2012029336 W US2012029336 W US 2012029336W WO 2012145101 A1 WO2012145101 A1 WO 2012145101A1
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Definitions
- This invention relates to graphene in a narrow ribbon structure and a method for making the same. More specifically, the invention relates to the use of graphene ribbons in electrical devices.
- Graphene is defined as a single layer of graphite with the carbon atoms occupying a two-dimensional (2D) hexagonal lattice. It has been used extensively in the past to model the electronic structure of carbon nanotubes (CNTs) [See R. Saito, G. Dresselhaus, M.S. Dresselhaus, Physical Properties of Carbon nanotubes, Imperial College Press, London, 1998; T. Ando, Advances in Solid State Physics, Springer, Berlin, 1998, pp 1-18, S. Reich, C. Thomsen, J. Maultzsch “Carbon Nanotubes " Wiley-VCH, 2004 ISBN 3-527-40386-8].
- CNTs carbon nanotubes
- Figure 1 shows that if the width of a graphene ribbon is reduced sufficiently, the band gap is increased to values that would permit the fabrication and operation FET with good device characteristics. This would open the door to graphene FET applications.
- Top down approaches for patterning a 2D graphene sheet into graphene nanoribbons from 2D graphene, with specific placement and orientation, for example using some kind of lithography (optical or electron beam lithography), are limited to minimum ribbon width sizes of about 30 nm for making an array of ribbons and in the easier case of an isolated feature just about 10 nm.
- the calculated band gap is less 0.1 eV and at 10 nm width it is about 0.2 eV.
- prior art has produced band gaps in the range of 30 meV [See Z. Chen et al.
- exfoliated commercial expandable graphite (Grafguard 160-50N, Graftech Incorporated, Cleveland, OH) by heating to 1000°C in forming gas (3% hydrogen in argon) for 60 seconds.
- the resulting exfoliated graphite was dispersed in a 1,2- dichloroethane (DCE) solution of poly (m-phenylenevinylene-co-2,5-dioctoxy-p- phenylenevinylene) (PmPV) by sonication for 30 min to form a homogeneous suspension. Centrifugation then removed large pieces of materials from the supernatant.
- DCE 1,2- dichloroethane
- Atomic force microscopy was used to characterize the materials deposited on substrates from the supernatant and numerous Graphene Nanoribbons (GNRs) with various widths ranging from w ⁇ 50 nm down to sub-10 nm were observed. Topographic heights of the GNRs (average length ⁇ 1 micron) were mostly between 1 and 1.8 nm, which, according to the authors of that report correspond to a single layer or a few layers (mostly ⁇ 3 layers). [See Li X. et al. Science 319, 1229 (2008).]
- the Cai reference uses a bianthryl molecule with a rotationally flexible covalent bond which creates a non-rigid molecule with many possible conformations on the substrate surface. Therefore, the Cai reference method has difficulty creating a multitude of parallel ribbons with certainty. Inspection of Figure 2 of this reference shows that many of the ribbons on the substrate are in random orientations.
- An aspect of this invention is a structure and a method to produce a structure of one or more graphene ribbons that are uniform in shape, size, straightness, and/or chirality; have uniform band gaps; and/or have predictable placement or orientation.
- An aspect of this invention is a graphene ribbon structure less than 9 nm wide, more preferably less than 1.6 nm wide.
- a further aspect of this invention is a graphene ribbon structure that is five fused aromatic rings or less in width fused together in a ribbon length.
- a further aspect of this invention is a graphene ribbon structure that is five aromatic rings or less in width fused in a length direction with a width tolerance of less than 0.5 nm in variation, more preferably less than 0.1 nm in variation.
- a further aspect of this invention is a graphene ribbon structure that is five aromatic rings or less in width fused in a length direction and has "arm chair" edges.
- a further aspect of this invention is a graphene ribbon structure that is five aromatic rings or less in width fused in a length direction that has "arm chair" edges and with a width tolerance of less than 0.5 nm in variation, more preferably less than 0.1 nm in variation.
- An aspect of this invention is a graphene ribbon structure less than 9 nm wide, more preferably less than 1.6 nm wide with a predictable placement on a substrate.
- An aspect of this invention is a graphene ribbon structure less than 9 nm wide, more preferably less than 1.6 nm wide with a predictable orientation on a substrate.
- An aspect of this invention is a graphene ribbon structure less than 9 nm wide, more preferably less than 1.6 nm wide with a predictable orientation on a substrate where the orientation is related to a crystal orientation of the substrate.
- An aspect of this invention is a graphene ribbon structure less than 9 nm wide, more preferably less than 1.6 nm wide, that is connected to one or more conductive electrodes using standard patterning techniques, e.g. lithography.
- An aspect of this invention is a graphene ribbon structure less than 9 nm wide, more preferably less than 1.6 nm wide, which is used in an electronic device, e.g. an FET or diode.
- An aspect of this invention is a graphene ribbon structure less than 9 nm wide, more preferably less than 1.6 nm wide, which is used in a channel region of an electronic device, e.g. an FET.
- An aspect of this invention is multiple graphene ribbon structures less than 9 nm wide each, more preferably less than 1.6 nm wide each, which are used in a channel region of an electronic device, e.g. an FET.
- An aspect of this invention is multiple graphene ribbon structures less than 9 nm wide each, more preferably less than 1.6 nm wide each, which are layered and used in a channel region of an electronic device, e.g. an FET.
- a further aspect of this invention is a graphene ribbon structure that is five fused aromatic rings in width with a width tolerance of less than 0.5 nm in variation, more preferably less than 0.1 nm in variation that uses pentacene molecules as the molecular building block.
- a further aspect of this invention is a graphene ribbon structure that is four fused aromatic rings in width with a width tolerance of less than 0.5 nm in variation, more preferably less than 0.1 nm in variation that uses tetracene molecules as the molecular building block.
- the present invention is a ribbon of graphene less than 3 nm wide, more preferably less than 1 nm wide.
- the edges of the ribbons are parallel to each other.
- the ribbons have at least one arm chair edge and may have wider widths.
- the invention further comprises a method of making a ribbon of graphene comprising the steps of:
- PAH polyaromatic hydrocarbon
- the invention further comprises an electrical device structure having two or more ribbons of graphene in surface to surface contact with a non conductive substrate.
- Each of the ribbons has a width less than 3 nm and each of the ribbons has edges that are parallel to one another.
- the ribbons comprise a channel in a Field Effect Transistor (FET).
- FET Field Effect Transistor
- Figure 1 is a graph of a function in the prior art that shows band gap energy versus GNR width.
- Figure 2 A is a prior image showing the alignment of pentacene molecules on a gold substrate.
- Figure 2B is a prior image showing the alignment of pentacene molecules on a gold substrate.
- Figure 3 shows a schematic of a prior art array of pentacene molecules aligned side by side as in Figure 2.
- Figure 4 is a schematic of novel array of pentacene molecules aligned side by side chemically interconnected to prevent volatilization.
- Figure 5A is a schematic of a novel graphene nanoribbon (GNR) less than 3 nanometers wide with armchair long edges that is produced by heating and/or radiating the structure of Figure 4.
- Figure 5B shows a sequence of three novel structures (first a row of tetracene molecules, second tetracene molecules aligned side by side chemically interconnected to prevent volatilization, and third a novel graphene nanoribbon (GNR) less than 2 nanometers wide with armchair long edges produced from the tetracene chemically interconnected structure (540).
- Figure 5C shows a sequence of three novel structures (first a row of anthracene molecules, second anthracene molecules aligned side by side chemically interconnected to prevent volatilization, and third a novel graphene nanoribbon (GNR) less than 1.5 nanometers wide with armchair long edges produced from the anthracene chemically interconnected structure (580).
- GNR graphene nanoribbon
- Figure 6 is a schematic of a novel process for producing graphene nanoribbon less than 3 nanometers wide with armchair long edges.
- Figure 7 is a block diagram of an apparatus used in the production of graphene nanoribbons.
- Figure 8 comprising Figures 8A through 8E, discloses structures made during the steps of making an FET with a GNR channel of the present invention.
- Figure 9 discloses the steps of a process that makes an FET with a GNR channel of the present invention.
- Figure 10 is a prior art table disclosing bond dissociation energies for carbon-carbon double bonds and carbon-hydrogen bonds.
- FIG 11 is a prior art graph of the ultra violet (UV) spectrum emitted by mercury (Hg) lamp.
- the present invention is a bottom-up approach, i.e. one where the graphene nanoribbons are constructed by using methods for self-assembly of appropriate molecules to make ordered rows of such molecules on appropriate substrate surfaces.
- the appropriate molecules preferably anthracene, tetracene, pentacene
- the chemical aromatic macromolecules are created by energetic beams (e.g. electromagnetic radiation, for example UV light, X-rays or e-beam or other radiation) or plasma that would cause the chemical change before the appropriate precursor molecules evaporate or sublime.
- the aromatic macromolecules are further converted to form graphene nanoribbons by a combination of heat and/or radiation. Since the aromatic macromolecule has a higher molecular weight the aromatic macromolecule is not volatile and can absorb the higher heat and/or radiation without subliming/evaporating before it converts into graphene nanoribbons (GNR). These GNRs have a width and edge structure accurately defined by the chemical structure of the original (precursor) molecule and the geometric structure of the ordered rows of the flat-lying "acene" precursor molecules.
- GNRs have edges with localized states [10] that can also affect transport. As very narrow GNRs are needed to achieve a band gap usable for FET applications for logic, the effect of the edges can be critical. Theoretical calculations have shown that when different hetero-atoms occupy are attached, or occupy edge positions in a graphene nanoribbon lattice, the transport properties of the various graphene nanoribbons are substantially affected. Thus, controlling the chemistry of the long edge of a graphene nanoribbon is very desirable.
- the prior top-down approaches do not offer the precision and selectivity of placing specific atoms at specific edge sites of a top-down fabricated graphene nanoribbon.
- the created graphene has the desired hydrogen termination at both the long edges and ends of the GNR in addition to the desired "arm chair" edge structure.
- the precursor acene molecules could be modified by adding appropriate atoms other than hydrogen at the ends of the molecule creating acene derivative molecules.
- these acene derivative molecules could be used to create GNR using this disclosure where the GNR long edge will have the "arm chair” structure but with terminal atoms other than hydrogen.
- GNR created with acene derivative molecules with Bromine (Chlorine, Nitrogen, etc.) bound to the ends of the acene molecules will produce GNRs with Bromine (etc.,) terminations on the long edges. Doing this could create electrical properties (e.g., electron mobilities) in the GNR that are different and/or superior to those GNR created by top down approaches or using this approach with acene precursors. Potentially, using acene derivative molecules as precursors could create electron mobilities as high as two dimensional graphene.
- Figure 2A is a prior image showing the alignment of pentacene molecules on a gold substrate.
- Figure 2A shows that pentacene molecules, which have a length just above 1.5 nm, can grow parallel rows of the same width separated by a narrow gap from a nearest neighbor (nn) row on appropriate surfaces.
- the pentacene molecules lie with their long axis practically parallel to the surface and practically perpendicular to the direction of the strip, as shown in the prior art [Kafer D. et al. Phys.Rev. B 75, 085309 (2007)].
- Figure 2A shows pentacene molecules self-assembled and flat lying on a Au (111) surface.
- the prior does not recognize or disclose the uses or advantages of flat lying pentacene to make aromatic macromolecules.
- the prior art does not disclose or recognize the dimensional requirements in the placement of the pentacene molecules to produce an aromatic macromolecule.
- Figure 2B is a prior image 210 showing the alignment of pentacene molecules on a gold substrate.
- Figure 2B identifies dimensions of pentacene molecules shown in Figure 2A that should be required to create aromatic macromolecules. Specifically, the gap distance 240 between the nearest neighbor (nn) atoms of adjacent pentacene molecules needs to be close enough so that if both nearest neighbor bonds are broken, a chemical bond between the two nn carbon atoms of the adjacent pentacene molecules at that point in the molecules can form. In a preferred embodiment, the van der Waals surfaces of these nn molecules are touching. This happens to be the case in Figure 2B as shown by line 240 in the Figure.
- the row distance 250 between the nearest neighbor (nn) atoms of adjacent pentacene molecular rows needs to be large enough so that if the nearest neighbor hydrogen atom bonds are removed between the rows, no chemical bond can be created between the two nn carbon atoms of the pentacene molecules in such adjacent rows.
- the row distance 250 is about 2 A, more preferable 0.19 nm. It so happens that this is also the case in Figure 2A because of the distance between molecules in nn rows, row distance 250, is larger than the intermolecular distance 240 within the same row. This is forced by the epitaxial relation of the acene rows with the substrate surface, here Au (111).
- gold (Au) is a preferred substrate on which to lay the acene molecule precursor because the intermolecular distance 240 is practically zero while the row distance 250 is approximately lk due to the epitaxial relation of acene precursor molecules to gold.
- other substrates are contemplated as long as these criteria are maintained.
- reaction between molecules in the same row is bound to happen when C-H bond are broken by appropriate energetic radiation, thus initiating the polymerization along a single row of pentacene molecules.
- Reaction is not expected to happen between molecules in nn rows, due to the gap of 2 A, row distance 250 that exists between their van der Waals surfaces.
- substrates other than gold may be selected to achieve the purposes of this disclosure so long as the substrates can: 1. cause the precursor molecules to lie flat in row, 2. the row distance 250 is large enough to prevent inter-row polymerization, and 3. the intermolecular gap distance 240 between the nn precursor molecules within a row is small enough to create a bond between the precursor molecules.
- Examples of alternative substrates would be ones with a surface reconstruction that creates a unique orientation on the substrate, for example, silicon (110) and silicon (100) surface reconstruction creating dimer rows. There are many other (110) and (100) surfaces that could be used, e.g., copper (110).
- these substrates can not form covalent bonds with the precursor molecules.
- insulating substrates are contemplated which have a dimer row surface reconstruction. These surfaces have long range order reconstructions that would yield very long GNRs.
- An example of an insulator would be silicon carbide.
- Figure 3 shows a schematic of a prior art array of pentacene molecules aligned side by side as in Figure 2A.
- Figure 3 further shows the optional pentacene derivative precursor molecules.
- Bromine atoms (not shown) would be optionally added at the ends of the pentacene molecules. Note that if no Bromine atoms are added, Figure 3 shows pentacene molecules with the normal hydrogen atoms at the ends.
- some of the Bromine atoms can be replaced with other elements or functional groups that form single covalent bonds with carbon, such as Chlorine, Fluorine, other elements from the halogen family, NH4, OH, etc.
- Figure 4 is a schematic of novel array of pentacene molecules aligned side by side chemically interconnected to prevent volatilization.
- the radiation applied has an energy spectrum that includes wavelengths shorter that visual light (e.g. ultraviolet radiation, x-ray radiation, electron beam or gamma rays).
- UV light is used with a wave length between 250 and 350 nanometers. This range is selected based on the dissociation energy of the C-H bonds, which is between 3.8 and 4.6 eV (wavelength of 326- 270 nm) according to the Table in Figure 10.
- the references for Figure 10 are R. Walsh, Acc. Chem. Res. 14, 246-252, (1981) and Gelest: Silanes, Silicones and metal organics catalog, (2000). )
- UV light from a mercury (Hg) light source is used.
- a representative energy spectrum produced by such a source is shown in Figure 11.
- the reference for Figure 11 is "UV Curing: Science and Technology, Vol. II Edited by S. P. Pappas, page 63, 1985.)
- Expected times of radiation exposure should be from 1 to 45 minutes.
- the sample is irradiated by a flood electron beam, under conditions similar to the ones described in prior art, i.e.
- the exposure of the ordered acene monolayer has to take place at a temperature that is well below the sublimation temperature of the specific acene in vacuum.
- the gap distance 240 between the nearest neighbor (nn) atoms of adjacent acene molecules needs to be close enough so that when both nearest neighbor bonds are broken, a chemical bond between the two nn carbon atoms of the adjacent pentacene molecules at that point in the molecules can form.
- the van der Waals surfaces of these nn molecules are touching. This happens to be the case in Figure 2B as shown by line 240 in the Figure.
- the row distance 250 between the nearest neighbor (nn) atoms of adjacent acene molecular rows needs to be large enough so that if the nn hydrogen-carbon atom bonds between the rows are dissociated and hydrogen is removed, no chemical bond can be created between the two nn carbon atoms of the acene molecules in such adjacent rows.
- the row distance 250 is about 2 A, or more. It so happens that this is also the case in Figure 2A because the distance between molecules in nn rows, row distance 250, is larger than the intermolecular distance 240 within the same row. This is forced by the epitaxial relation of the acene rows with the substrate surface, here Au (111). This prevents inter-row polymerization.
- the temperature is ramped up to promote further dehydrogenation and eventually sp 2 structure formation at temperatures approaching 1000 °C.
- the ramp rate may vary between 10 °C per minute and 200 °C per minute, followed by anneal at a specific elevated temperature, between 500 and 1000 °C, preferably 1000 °C.
- Figure 5A is a schematic of a novel graphene nanoribbon (GNR) less than 3 nanometers wide with armchair long edges that is produced by heating, and preferably in addition irradiating the structure of Figure 4 with UV light.
- GNR graphene nanoribbon
- Figure 5B shows a sequence of three novel structures (first a row of tetracene molecules, second tetracene molecules aligned side by side chemically interconnected to prevent volatilization, and third a novel graphene nanoribbon (GNR) less than 2 nanometers wide with armchair long edges produced from the tetracene chemically interconnected structure (540).
- GNR graphene nanoribbon
- Figure 5C shows a sequence of three novel structures (first a row of anthracene molecules, second anthracene molecules aligned side by side chemically interconnected to prevent volatilization, and third a novel graphene nanoribbon (GNR) less than 1.5 nanometers wide with armchair long edges produced from the anthracene chemically interconnected structure (580).
- GNR graphene nanoribbon
- Figure 6 is a schematic of a novel process for producing graphene nanoribbon less than 3 nanometers wide with armchair long edges.
- the process 600 begins by depositing 610 an acene precursor layer on a substrate that cause the acene precursor molecules to assemble in rows, as shown in Figure 2A.
- gold (111) is a preferred substrate, as are substrates with dimer row surface reconstruction.
- preferred acene molecules include anthracene, tetracene, and pentacene.
- Preferred methods of deposition include heating the acene precursors in an apparatus as shown in Figure 7 in a vacuum environment so that the precursors sublime into a gaseous state creating a molecular beam of the precursors. This molecular beam is directed toward the substrate where precursors are deposited (e.g., by condensation) on the substrate.
- the deposition is terminated once a monolayer is completed.
- the thickness is 2 monolayers.
- Thickness monitors well known in the art, e.g., quartz crystal thickness monitors (QCM), are used to establish the thickness endpoint and termination of the deposition.
- QCM quartz crystal thickness monitors
- the QCM will be calibrated using known surface science techniques to accurately determine the monolayer coverage. Vacuums preferable would be below 1E-9 Torr. Vacuums below this level insure that the substrate remains clean throughout the deposition.
- the acene precursor will align in rows 300 with intermolecular distances 240 that are near zero and row distances 250 of about 2 A because of the epitaxial relation of the precursor molecules to the substrate.
- the next step 620 is forming at least one bond between nn acene molecules within the same row. This is done by applying radiation as describe above in the description of Figure 4. In a preferred embodiment, the radiation applied has energy above visual light. In a more preferred embodiment, UV light is used with a wave length between 250 and 350 nanometers. In a more preferred embodiment, UV light from a Hg light source is used. Expected times of radiation exposure should be from 1 to 45 minutes.
- step 630 graphene is formed by changing the macromolecule 400 formed in step 620 by adding heat. Since a macromolecule 400 was formed in step 620, the addition of heat will not volatilize the molecule before it is de-hydrogenated to form the GNRs 500.
- the amount of heat applies preferably is between 250 degrees °C but below the melting point of the substrate (e.g. gold layer). Pure gold has a melting point of 1064 °C.
- the heat could be applied from 10 minutes to 10 hours with optimal times determined by experimentation, in an oxygen free atmosphere.
- the radiation applied in step 620 will continue throughout the heat application in step 630.
- the heat preferably will be applied in the vacuum chamber of Figure 7 to promote de-hydrogenation and formation of the sp 2 structure of the carbon-carbon bonds to form the GNRs 500.
- Figure 7 is a block diagram of an apparatus 700 used in the production of graphene nanoribbons.
- the apparatus 700 comprises a known vacuum chamber 710 for general deposition of materials on substrates. These vacuum chambers 710 are well known and can be purchase as a complete unit or in components for assembly.
- the vacuum chambers 710 are normally evacuated by vacuum pumps (not shown) through the vacuum pump port 730.
- the vacuum pumps can be one turbo pump and one mechanical pump in series configuration and optionally can include an ion pump and a titanium sublimation pump.
- the chamber apparatus 700 comprises a heated substrate holder 720, e.g. a polymeric boron nitride/pyrolytic graphite heater commonly available for this purpose.
- a heated substrate holder 720 e.g. a polymeric boron nitride/pyrolytic graphite heater commonly available for this purpose.
- the chamber apparatus 700 further comprises a molecular source 750 that can be an effusion cell 750 that is commonly known.
- the chamber apparatus 700 further novelty comprises a radiation source 740 that is used to apply radiation, preferably UV light, through a window that is transparent at the spectrum frequencies necessary for breaking carbon-hydrogen bonds.
- the window is made from quartz and the radiation source is a mercury (Hg) lamp that will produce the spectrum shown in Figure 11.
- Figure 8 comprises Figures 8A through 8E and discloses structures made during the steps of making an FET with a GNR channel of the present invention.
- the structure in Figure 8A shows a substrate 820 which is made of any material on which gold (111) or any other preferred layers for growing GNRs can be deposited.
- substrate 820 include silicon, germanium, sapphire, or any other single crystal substrate on which gold (or other layer) grows with a preferred orientation, e.g. (111).
- the next layer 815 is the gold (111) layer or other preferred layers like the dimer surface reconstructed layers as described above.
- Layer 810 is GNR layer made as disclosed herein.
- Layer 805 is any know gate insulator material that can be deposited on GNRs and would be used in field effect transistors (FETs). Examples of layer 805 include insulators like Si02, Hf02, A1203, or composite gate insulators in which there are first deposited a polysen layer (polyhydroxystyrene based - See Y.-M. Lin et al., Science 327, 662, (2010)).
- the gate layer 850 is a conductive material commonly used for FET gate electrode applications and will be patterned onto the gate insulator layer 805.
- the gate 850 materials are known including: copper, gold, titanium- gold, palladium, platinum, etc.
- the structure in Figure 8B further comprises a thick layer of material to act as a handle substrate 825 used to keep the structure intact during the removal of the original substrate 820.
- Handle layer 825 can be made from known materials including thermoset polymers.
- FIG. 8C shows the original substrate 820 removed.
- the release layer is dissolved, e.g. in Hydrofluoric Acid (HF) removing the original substrate and leaving behind an ultra thin film of silicon.
- HF Hydrofluoric Acid
- This thin film can be dissolved or removed by reactive ion etching (RTE.) These methods are well known.
- Figure 8E shows the pattern transferred to the acene growth surface layer 815, e.g., gold by a potassium iodide KI etching that is well known to create the source 860 and drain 870 contacts.
- Figure 9 discloses the steps of a process that makes an FET with a GNR channel of the present invention.
- Pentacene molecules which have a length just above 1.5 nm, can grow parallel ribbons of the same width separated by a narrow gap from a nearest neighbor (nn) ribbon on appropriate surfaces.
- the pentacene molecules lie with their long axis practically parallel to the surface and practically perpendicular to the direction of the strip, as shown in Figure 1 below taken from [Kafer D. et al. Phys.Rev. B 75, 085309 (2007)].
- This specific figure shows pentacene molecules self-assembled on a Au (111) surface, but other judiciously chosen surfaces could also be used to grow similar pentacene structures, preferably insulating surfaces or surfaces that could be removed later, at the device fabrication stage.
- Pentacene molecules can take place using a molecular beam deposition method similar to the one described in the art (Dimitrakopoulos et al. J. Appl. Phys. J. of Appl. Phys., 80, 2501- 2508, (1996) "Molecular beam deposited thin films of pentacene for organic field effect transistor applications", and Dimitrakopoulos et al. Science, 283, 822-824, (1999) "Low- voltage organic transistors on plastic comprising high-dielectric constant gate insulators”).
- Pentacene is placed in a resistively heated effusion cell source, and is heated under high or ultrahigh vacuum (P ⁇ lE-7 Torr or P ⁇ lE-9 Torr, respectively) to create a molecular beam of pentacene molecule.
- P ⁇ lE-7 Torr or P ⁇ lE-9 Torr high or ultrahigh vacuum
- an ultraviolet (UV) radiation or electron beam (e-beam) treatment should be used to make crosslinks (bonds) between the aligned nn pentacene molecules.
- UV radiation or electron beam (e-beam) treatment should be used to make crosslinks (bonds) between the aligned nn pentacene molecules.
- Radiative treatments at a judiciously chosen temperature are preferred to a simple heat treatment without radiation, because pentacene will most likely evaporate before crosslinking starts by just heating between ca. 150-300 °C depending on the environment and the interaction with the substrate.
- some crosslinks should form randomly between neighboring molecules along the same strip (row of pentacene molecules).
- Figure 4 schematically depicts such a crosslinked pentacene supermolecular ribbon.
- Higher crosslinking/polymerization process temperatures may be enabled in the case of the inert atmosphere (e.g. Ar or other noble gas) vs.
- the substrate surface used for the self-assembly of flat lying pentacene molecular rows is not insulating, but conductive, as is the case with the Au (111) surface used in the embodiment described above, then the graphene nanoribbons have to be transferred to an insulating substrate without disturbing their structure.
- This can be done by first depositing an insulating material 805 on the G Rs, e.g. depositing 10 nm of polyxydroxystyrene-based NFC that wets the graphene surfaces (spreads on them) followed by deposition of a second, thicker insulating layer of Hf0 2 by atomic layer deposition (ALD), as described in prior art [see Farmer D. B et al. Nano Lett. 9, 4474, (2009)]. Then depositing a metal layer and patterning this layer to form the metal gates 850 of the prospective GNR transistors (Figure 8A). This corresponds to step 910 in the flow-chart of Figure 9.
- Au could be patterned (this corresponds to step 940 in the flowchart of Figure 9) to form the source and drain electrodes (860, 870) of the transistor. See Figures 8D and 8E.
- a potassium iodide (KI) etchant is used (this corresponds to step 950 in the flow-chart of Figure 9), a process well known in the art. That leaves a graphene nanoribbon channel between these electrodes.
- the method of embodiment 1 can be used with one difference: The pentacene molecule is replaced by tetracene, an acene molecule with four fused aromatic rings instead of the five fused aromatic rings of pentacene (Figure 7). This will result to even shorter GNRs (thus with even wider band gap) than pentacene.
- Embodiment 3 is a diagrammatic representation of Embodiment 3
- the method of embodiment 1 can be used with one difference: The pentacene molecule is replaced by anthracene, an acene molecule with three fused aromatic rings instead of the five fused aromatic rings of pentacene. This will result to even shorter GNRs (thus with even wider band gap) than tetracene.
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Abstract
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| CN201280018957.8A CN103476582B (en) | 2011-04-18 | 2012-03-16 | Structure and method for preparing graphene nanoribbons |
| GB1318887.5A GB2505788B (en) | 2011-04-18 | 2012-03-16 | Structure and method of making graphene nanoribbons |
| DE112012001217.8T DE112012001217B4 (en) | 2011-04-18 | 2012-03-16 | Graphene nanostrips, method for making graphene nanostrips, field effect transistor (FET) structure and method for making a field effect transistor (FET) |
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| US13/088,765 US20120261644A1 (en) | 2011-04-18 | 2011-04-18 | Structure and method of making graphene nanoribbons |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP2907791A1 (en) | 2014-02-13 | 2015-08-19 | Basf Se | Graphene nanoribbons with controlled zig-zag edge and cove edge configuration |
Families Citing this family (31)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102011054103A1 (en) * | 2011-09-30 | 2013-04-04 | MAX-PLANCK-Gesellschaft zur Förderung der Wissenschaften e.V. | Method of making graphene nanoribbons |
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| JP6195266B2 (en) | 2013-05-01 | 2017-09-13 | 富士通株式会社 | Manufacturing method of electronic device |
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| US11217531B2 (en) | 2018-07-24 | 2022-01-04 | Samsung Electronics Co., Ltd. | Interconnect structure having nanocrystalline graphene cap layer and electronic device including the interconnect structure |
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| KR102601607B1 (en) | 2018-10-01 | 2023-11-13 | 삼성전자주식회사 | Method of forming graphene |
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| KR102912591B1 (en) | 2019-04-30 | 2026-01-13 | 삼성전자주식회사 | Graphene structure and method for forming the graphene structure |
| CN110311010B (en) * | 2019-06-28 | 2022-06-07 | 西安交通大学 | Infrared wide spectrum detector based on graphene nanoribbons |
| US11618681B2 (en) | 2021-06-28 | 2023-04-04 | Wisconsin Alumni Research Foundation | Graphene nanoribbons grown from aromatic molecular seeds |
| CN115616037A (en) * | 2021-07-13 | 2023-01-17 | 中国科学院近代物理研究所 | Method for improving performance of two-dimensional material gas detector |
| CN114560459B (en) * | 2022-01-19 | 2023-08-15 | 重庆大学 | Method for directly synthesizing graphene nanoribbon through surface catalysis of salt microcrystal |
| CN114582876A (en) * | 2022-03-14 | 2022-06-03 | 湘潭大学 | Graphene fuse device and preparation method thereof |
| CN114735680B (en) * | 2022-04-27 | 2023-07-25 | 北京化工大学 | A kind of graphene nanoribbon and preparation method thereof |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20070102111A1 (en) * | 2003-08-18 | 2007-05-10 | President And Fellows Of Harvard College | Controlled nanotube fabrication and uses |
| US20100028681A1 (en) * | 2008-07-25 | 2010-02-04 | The Board Of Trustees Of The Leland Stanford Junior University | Pristine and Functionalized Graphene Materials |
| US20100327956A1 (en) * | 2009-06-30 | 2010-12-30 | Nokia Corporation | Graphene device and method of fabricating a graphene device |
| US20110068290A1 (en) * | 2008-05-30 | 2011-03-24 | The Regents Of The University Of California | Chemical modulation of electronic and magnetic properties of graphene |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR101443222B1 (en) * | 2007-09-18 | 2014-09-19 | 삼성전자주식회사 | Graphene pattern and process for preparing the same |
| TW201012749A (en) * | 2008-08-19 | 2010-04-01 | Univ Rice William M | Methods for preparation of graphene nanoribbons from carbon nanotubes and compositions, thin films and devices derived therefrom |
| CN101993035B (en) * | 2009-08-19 | 2013-06-05 | 中国科学院物理研究所 | Switch element for graphene sodium electromechanical system |
| CN102001642B (en) * | 2009-09-02 | 2012-10-03 | 中国科学院金属研究所 | Method for producing graphene belts in controllable macroscopic quantity by chemically cutting grapheme |
| US8808810B2 (en) * | 2009-12-15 | 2014-08-19 | Guardian Industries Corp. | Large area deposition of graphene on substrates, and products including the same |
| WO2011146915A1 (en) * | 2010-05-21 | 2011-11-24 | The Board Of Regents Of The University Of Texas System | Monolithic parallel multijunction oled with independent tunable color emission |
| CN101913599B (en) * | 2010-08-13 | 2012-11-07 | 东华大学 | Method for preparing graphene nanobelt |
-
2011
- 2011-04-18 US US13/088,765 patent/US20120261644A1/en not_active Abandoned
-
2012
- 2012-03-16 GB GB1318887.5A patent/GB2505788B/en active Active
- 2012-03-16 WO PCT/US2012/029336 patent/WO2012145101A1/en not_active Ceased
- 2012-03-16 CN CN201280018957.8A patent/CN103476582B/en not_active Expired - Fee Related
- 2012-03-16 DE DE112012001217.8T patent/DE112012001217B4/en not_active Expired - Fee Related
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20070102111A1 (en) * | 2003-08-18 | 2007-05-10 | President And Fellows Of Harvard College | Controlled nanotube fabrication and uses |
| US20110068290A1 (en) * | 2008-05-30 | 2011-03-24 | The Regents Of The University Of California | Chemical modulation of electronic and magnetic properties of graphene |
| US20100028681A1 (en) * | 2008-07-25 | 2010-02-04 | The Board Of Trustees Of The Leland Stanford Junior University | Pristine and Functionalized Graphene Materials |
| US20100327956A1 (en) * | 2009-06-30 | 2010-12-30 | Nokia Corporation | Graphene device and method of fabricating a graphene device |
Non-Patent Citations (1)
| Title |
|---|
| DRESSELHAUS: "From Graphene to Graphite to Nanotubes to Graphene", APS MARCH MEETING GRAPHENE TUTORIAL, 9 March 2008 (2008-03-09) * |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP2907791A1 (en) | 2014-02-13 | 2015-08-19 | Basf Se | Graphene nanoribbons with controlled zig-zag edge and cove edge configuration |
| WO2015121785A1 (en) | 2014-02-13 | 2015-08-20 | Basf Se | Graphene nanoribbons with controlled zig-zag edge and cove edge configuration |
| US10329378B2 (en) | 2014-02-13 | 2019-06-25 | Basf Se | Graphene nanoribbons with controlled zig-zag edge and cove edge configuration |
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| GB2505788B (en) | 2019-12-18 |
| US20120261644A1 (en) | 2012-10-18 |
| CN103476582A (en) | 2013-12-25 |
| DE112012001217T5 (en) | 2014-04-10 |
| CN103476582B (en) | 2016-09-14 |
| GB2505788A (en) | 2014-03-12 |
| GB201318887D0 (en) | 2013-12-11 |
| DE112012001217B4 (en) | 2024-01-18 |
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