WO2012052864A2 - Plasma ignition and sustaining methods and apparatuses - Google Patents
Plasma ignition and sustaining methods and apparatuses Download PDFInfo
- Publication number
- WO2012052864A2 WO2012052864A2 PCT/IB2011/054326 IB2011054326W WO2012052864A2 WO 2012052864 A2 WO2012052864 A2 WO 2012052864A2 IB 2011054326 W IB2011054326 W IB 2011054326W WO 2012052864 A2 WO2012052864 A2 WO 2012052864A2
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- coil
- fingers
- peloc
- plasma
- cylinder
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Ceased
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32082—Radio frequency generated discharge
- H01J37/321—Radio frequency generated discharge the radio frequency energy being inductively coupled to the plasma
- H01J37/3211—Antennas, e.g. particular shapes of coils
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/26—Plasma torches
- H05H1/30—Plasma torches using applied electromagnetic fields, e.g. high frequency or microwave energy
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32532—Electrodes
- H01J37/32541—Shape
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K10/00—Welding or cutting by means of a plasma
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K9/00—Arc welding or cutting
- B23K9/013—Arc cutting, gouging, scarfing or desurfacing
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K2101/00—Articles made by soldering, welding or cutting
- B23K2101/36—Electric or electronic devices
- B23K2101/40—Semiconductor devices
Definitions
- substrates such as wafers undergo deposition and etching processes to form features thereon.
- the processing of semiconductor substrates often leaves residues, such as polymer deposition, between processing steps.
- Atmospheric inductively coupled plasma torches have been employed to clean substrates in preparation for further processing.
- FIG. 1 shows a typical prior art atmospheric inductively coupled plasma torch 100, which includes a double-wall cylinder 102.
- Cylinder 102 is typically formed out of quarts or a similarly suitable material.
- a cooling gas inlet 104 permits a cooling gas, such as nitrogen or air for example, to be injected in between the cylinder walls to thermally regulate double-wall cylinder 102 during use.
- a cooling gas such as nitrogen or air for example
- a coil 106 is shown wrapped around the outer periphery of double-wall cylinder
- a process gas e.g., hydrogen or nitrogen
- a process gas e.g., hydrogen or nitrogen
- an appropriate driver RF signal e.g., at 40 MHz
- coil 106 acts as part of a series LC resonance circuit to ignite a plasma from the process gas.
- the coil is designed as a tube allowing liquid cooling to flow through it.
- the inductively coupled plasma formed within atmospheric inductively coupled plasma torch 100 is ejected from opening 120.
- the hot jet of plasma ejected from opening 120 may then be employed to remove or clean materials, such as unwanted polymer deposition after an ion implantation process, from substrates.
- the induced voltage across coil 106 is a function of the frequency of the driver RF signal.
- a typical atmospheric inductively coupled plasma torch may experience up to 20 KV (peak-to-peak) between the ends of coil 106, for example.
- the high induced voltage is necessary for igniting plasma at typical atmospheric conditions.
- the high RF driver frequency employed in the prior art presents cost and engineering challenges.
- many processing systems already employ lower- frequency RF sources (e.g., 10-30 MHz, such as 13.56 MHz or 27.12 MHz) for etching and deposition.
- lower- frequency RF sources e.g., 10-30 MHz, such as 13.56 MHz or 27.12 MHz
- components and expertise for designing, manufacturing, qualifying, and maintaining lower-frequency subsystems are readily available at lower cost.
- tool-to-tool repeatability is improved when a lower driver RF frequency is employed.
- the invention relates to methods and apparatus for improving plasma ignition in an atmospheric inductively coupled plasma torch in particular and in inductively coupled plasma tools in general.
- FIG. 1 shows a typical prior art atmospheric inductively coupled plasma torch.
- FIG. 2 shows, in accordance with an embodiment of the invention, an
- V is the induced voltage between the coil ends
- E is the strength of the electric field
- L is the length of the coil. It should be noted that by 'L, length of the coil' we mean the length of the coil solenoid and not the length of the wire that is used to wind the coil.
- the inventors herein realize that if the effective length of the coil L can be reduced, a stronger electric field E can be obtained for the same induced voltage on the coil.
- the induced voltage V is reduced (due to, for example, a reduction in the driver RF frequency)
- an electric field that is capable of satisfactorily igniting the plasma may still be created by lowering the effective length of the coil.
- PELOC longitudinally oriented conductive
- the PELOC fingers are conductive strips or prongs or teeth or protrusions (referred to herein generically as "fingers") of conductive materials that are disposed outside of the quartz cylinder and are oriented along the longitudinal axis of the quartz cylinder of the atmospheric inductively coupled plasma torch.
- Two sets of fingers are provided, with each set of fingers connected to a different coil end.
- the fingers of each set are disposed longitudinally with respect to the cylinder as well with the fingers of the first set pointing toward the second set (and vice versa) in a spatially separated manner.
- Embodiments of the invention also relate to techniques for manufacturing, provisioning, operating and maintaining these enhancements for an atmospheric inductively coupled plasma torch.
- FIG. 2 shows, in accordance with an embodiment of the invention, an example configuration in which the conductive fingers of PELOC finger set 202 are disposed
- the conductive fingers of PELOC finger set 204 are disposed longitudinally with respect to the longitudinal axis 220 of cylinder 210.
- the PELOC finger set 202 and PELOC finger set 204 are arranged such that fingertips of PELOC finger set 202 point in the direction toward fingertips of PELOC finger set 204.
- the conductive fingers of PELOC finger set 202 and the conductive fingers of PELOC finger set 204 are spatially separated by a set-to-set gap A along the longitudinal axis 220 of cylinder 210.
- the conductive fingers of PELOC finger set 202 only partially enclose the periphery of cylinder 210, resulting in an intra-set gap B as shown.
- the conductive fingers of PELOC finger set 204 only partially enclose the periphery of cylinder 210 resulting in an intra-set gap C as shown.
- each set of PELOC fingers is coupled to a different coil end (via leads 230 and 232 in Fig. 2 for example) and the greater proximity A of the finger tips to each other as compared to L, the coil length is there to reduce the physical distance over which the coil voltage drops (a five -turn coil of length L is shown in Fig. 2 as an example). Again, this is the case since the sets of PELOC fingers are disposed closer together in a partially enclosing manner outside the cylinder.
- Set-to-set gap A (the terms “set-to-set” or “inter-set” denotes the finger-tip-to-finger-tip gap from one set of fingers to another set of fingers along the longitudinal axis of the cylinder) is preferably as small as possible to minimize this effective coil length.
- set-to-set gap A should not be so small as to cause arcing to occur between fingers of PELOC finger set 202 and fingers of PELOC finger set 204.
- set-to- set gap A should also not be so small as to cause undesired plasma formation outside of the cylinder to occur between fingers of PELOC finger set 202 and fingers of PELOC finger set 204.
- an empirical method is employed to determine the size of set- to-set gap A for a particular torch.
- the two PELOC finger sets are partially wrapped around the cylinder and lined up along the longitudinal axis of the cylinder.
- the finger sets are positioned such that they are far apart from one another while still satisfying form factor constraints imposed by the size of the cylinder and while still being capable of igniting plasma inside the cylinder (although the large effective length of the coil at this gap distance would require a rather high coil voltage to generate the requisite E field to ignite the plasma). This places an upper limit on the size of set-to-set gap A.
- set-to-set gap A becomes so small that arcing occurs or the probability of arcing becomes unacceptably high. Further, as set-to-set gap A is made smaller, there is a risk that plasma ignition of ambient air may occur if the electric field set up in set-to-set gap A is high enough. Such uncontrolled plasma ignition of ambient air outside the cylinder is undesirable.
- the smallest set-to-set gap A that does not allow arcing or undesired ambient air ignition to occur establishes a lower bound on the size of set-to-set gap A.
- set-to-set gap A is set to be as small as possible as long as arcing or unwanted outside -the-cylinder plasma ignition is prevented. This minimum gap distance for set-to-set gap A ensures that the effective length of the coil is kept to a minimum while ensuring that arcing or unwanted plasma ignition will not occur.
- all the fingers of any one set of PELOC fingers are electrically coupled to one another.
- the individual fingers while being electrically interconnected, are aligned longitudinally along the longitudinal axis of the cylinder as discussed earlier.
- An intra-set gap B (see Fig. 2) is provided such that the fingers of each PELOC set of fingers only partially enclose the outer circumference or outer periphery (if the cylinder is not round, for example) of the cylinder.
- This gap referred to herein as an "intra-set” gap, specifies the dimension of the break made among the electrically connected fingers of a PELOC finger set in order to implement the "partially enclosing" feature.
- intra-set gap B ensures that recirculating currents are minimized among fingers of each set of PELOC fingers.
- the dimension of intra-set gap B is designed with analogous considerations (e.g., arcing avoidance) as the design for set-to-set gap A.
- intra-set gap B is preferably as small as possible to minimize non-uniformity in the generated electric field and induced magnetic field. Such non-uniformity may possibly affect the uniformity of the generated plasma and is minimized to the extent possible, in one or more embodiments of the invention.
- a strip of conductive material or conductive "spine” is provided to electrically and structurally connect the fingers of each set of PELOC fingers together.
- Each of the two “spines” is then connected to one of the coil ends (labeled 230 and 232 in Figure 2).
- the fingers resemble teeth of a comb.
- Each "comb” partially wraps around the cylinder of the atmospheric inductively coupled plasma torch such that there exists an intra-set gap where the two comb ends of the comb do not meet due to the partially enclosing feature but are rather separated by gap B.
- the comb implementation may be seen in Fig. 2, for example.
- the fingers may be made as slender or long/short as desired since the gaps between adjacent fingers allow the induced magnetic field to penetrate into the cylinder to reach the plasma therein.
- the conductive finger material may be copper, copper alloy, or a similarly suitable material.
- the coils for generating the electro -magnetic field may be disposed outside of the fingers (i.e., at a greater radius distance from the center longitudinal axis of the cylinder). A sufficient number of fingers should be provided in each 'comb' and spaced equal distance around the circumference of the quartz cylinder to avoid azimuthal non- uniformities in the applied electro-magnetic field.
- the conductive fingers need to be wide enough to be mechanically stable but, generally speaking, should be kept narrower than the width of the gap between them to allow as many magnetic field lines from the coil as possible to advance to the inside of the quartz cylinder (a metal finger itself will be opaque to a time -varying magnetic field - only a gap allows the field to advance further inward.
- the magnetic field lines emanating from the coil are responsible for sustaining plasma inside the quartz tube).
- the PELOC fingers are believed to contribute primarily to plasma ignition. Sustaining the plasma is believed to be driven primarily by the coil. Consequently, plasma uniformity tends to depend on how uniform the winding pitch of the coil is and how well the coil is coaxially aligned with the quartz cylinder.
- embodiments of the invention enhance the utilization of the plasma-igniting electro -magnetic field in an atmospheric inductively coupled plasma torch.
- plasma ignition in an atmospheric inductively coupled plasma torch is possible even if the induced coil voltage is lowered, e.g., due to the lowering of the driver RF frequency for example.
- RF generators as well as components for the atmospheric inductively coupled plasma torch may be made more inexpensively and may be matched system-to-system with greater ease, contributing to lower production cost for semiconductor products.
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- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Mechanical Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Electromagnetism (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Plasma Technology (AREA)
Abstract
Description
Claims
Priority Applications (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2013534407A JP6046628B2 (en) | 2010-10-20 | 2011-10-03 | Plasma generator |
| KR1020137010130A KR101846599B1 (en) | 2010-10-20 | 2011-10-03 | Plasma ignition and sustaining methods and apparatuses |
| CN201180050020.4A CN103153517B (en) | 2010-10-20 | 2011-10-03 | Method and device for igniting and maintaining plasma |
| SG2013024393A SG189219A1 (en) | 2010-10-20 | 2011-10-03 | Plasma ignition and sustaining methods and apparatuses |
| KR1020177025250A KR101866153B1 (en) | 2010-10-20 | 2011-10-03 | Plasma ignition and sustaining methods and apparatuses |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US12/908,459 | 2010-10-20 | ||
| US12/908,459 US9174296B2 (en) | 2010-10-20 | 2010-10-20 | Plasma ignition and sustaining methods and apparatuses |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| WO2012052864A2 true WO2012052864A2 (en) | 2012-04-26 |
| WO2012052864A3 WO2012052864A3 (en) | 2012-07-19 |
Family
ID=45972073
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| PCT/IB2011/054326 Ceased WO2012052864A2 (en) | 2010-10-20 | 2011-10-03 | Plasma ignition and sustaining methods and apparatuses |
Country Status (7)
| Country | Link |
|---|---|
| US (2) | US9174296B2 (en) |
| JP (2) | JP6046628B2 (en) |
| KR (2) | KR101866153B1 (en) |
| CN (2) | CN105578700A (en) |
| SG (1) | SG189219A1 (en) |
| TW (1) | TWI587750B (en) |
| WO (1) | WO2012052864A2 (en) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2014045547A1 (en) * | 2012-09-18 | 2014-03-27 | パナソニック株式会社 | Plasma processing device, and plasma processing method |
| US9653266B2 (en) * | 2014-03-27 | 2017-05-16 | Mks Instruments, Inc. | Microwave plasma applicator with improved power uniformity |
| JP2015215942A (en) * | 2014-05-07 | 2015-12-03 | 国立大学法人金沢大学 | Plasma generator and plasma generation method |
| CN108471666B (en) * | 2017-02-23 | 2021-06-08 | 北京北方华创微电子装备有限公司 | Plasma generating method and device and semiconductor processing equipment |
| KR101932117B1 (en) * | 2017-08-11 | 2018-12-24 | 피에스케이 주식회사 | Substrate treating apparatus, substrate treating method and plasma generating unit |
| CN111479376B (en) * | 2020-06-01 | 2021-12-28 | 深圳先进技术研究院 | Atmospheric pressure injection frequency thermal plasma generator based on preionization ignition device |
| CN111778553A (en) * | 2020-07-29 | 2020-10-16 | 哈尔滨工业大学 | Seed crystal continuous thinning plasma annealing method for improving the quality of CVD single crystal diamond |
| US20240164005A1 (en) * | 2022-11-16 | 2024-05-16 | Perkinelmer U.S. Llc | Induction devices for inductively coupled plasma torches and methods and systems including same |
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-
2010
- 2010-10-20 US US12/908,459 patent/US9174296B2/en active Active
-
2011
- 2011-10-03 KR KR1020177025250A patent/KR101866153B1/en active Active
- 2011-10-03 SG SG2013024393A patent/SG189219A1/en unknown
- 2011-10-03 CN CN201510937447.6A patent/CN105578700A/en active Pending
- 2011-10-03 KR KR1020137010130A patent/KR101846599B1/en active Active
- 2011-10-03 WO PCT/IB2011/054326 patent/WO2012052864A2/en not_active Ceased
- 2011-10-03 JP JP2013534407A patent/JP6046628B2/en active Active
- 2011-10-03 CN CN201180050020.4A patent/CN103153517B/en active Active
- 2011-10-17 TW TW100137590A patent/TWI587750B/en active
-
2015
- 2015-11-03 US US14/931,672 patent/US10395901B2/en active Active
-
2016
- 2016-11-17 JP JP2016223877A patent/JP2017054824A/en active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| JP2014500574A (en) | 2014-01-09 |
| CN103153517B (en) | 2016-01-13 |
| US9174296B2 (en) | 2015-11-03 |
| US20120097646A1 (en) | 2012-04-26 |
| US10395901B2 (en) | 2019-08-27 |
| WO2012052864A3 (en) | 2012-07-19 |
| TWI587750B (en) | 2017-06-11 |
| JP2017054824A (en) | 2017-03-16 |
| US20160056023A1 (en) | 2016-02-25 |
| JP6046628B2 (en) | 2016-12-21 |
| KR101866153B1 (en) | 2018-06-08 |
| TW201230885A (en) | 2012-07-16 |
| KR20170106499A (en) | 2017-09-20 |
| KR101846599B1 (en) | 2018-04-06 |
| KR20130123384A (en) | 2013-11-12 |
| CN105578700A (en) | 2016-05-11 |
| SG189219A1 (en) | 2013-05-31 |
| CN103153517A (en) | 2013-06-12 |
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