WO2011034492A1 - A pvd method for depositing a coating onto a body and coated bodies made thereof - Google Patents
A pvd method for depositing a coating onto a body and coated bodies made thereof Download PDFInfo
- Publication number
- WO2011034492A1 WO2011034492A1 PCT/SE2010/050989 SE2010050989W WO2011034492A1 WO 2011034492 A1 WO2011034492 A1 WO 2011034492A1 SE 2010050989 W SE2010050989 W SE 2010050989W WO 2011034492 A1 WO2011034492 A1 WO 2011034492A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- bias voltage
- substrate bias
- coating
- deposition
- minutes
- Prior art date
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Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3435—Applying energy to the substrate during sputtering
- C23C14/345—Applying energy to the substrate during sputtering using substrate bias
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
Definitions
- the present invention relates to a method of making a coated body using a PVD-method.
- the PVD-method comprises a sequence varying the substrate bias voltage.
- the present invention also relates to a coated body made according to the method.
- PVD coatings especially on cutting tools, are well known in the art.
- the most commonly known PVD techniques are arc evaporation and magnetron sputtering. It is known in the art to vary the substrate bias voltage depending on the coating composition. Different target
- compositions can require different substrate bias voltages.
- PVD depositing technique where the substrate bias voltage is varied is the uni- and bipolar pulsed techniques where the substrate bias voltage is varied at a high frequency.
- the coating produced contains at least one electrically isolating layer.
- the coating is deposited with Bipolar Pulsed Dual Magnetron Sputtering
- US2007/0218242 discloses a PVD-coating having variations in compressive stress within the coating.
- the compressive stress variation is obtained by varying the substrate bias voltage.
- Fig. la-le shows different embodiments of the present invention where the substrate bias is varied in different patterns.
- FIG. 2 is a schematic drawing of one embodiment of the present invention showing as it would look like in a Scanning Electron Microscope.
- Figure 2 shows a substrate (1), pre-coated with an inner layer (2), a coating deposited according to the present invention (3) and an outer layer (5).
- the coating according to the present invention comprising sequences (4) varying the substrate bias has a layered appearance.
- the present invention relates to a method of making a coated body comprising a coating and a substrate where onto said substrate a coating is deposited, using a PVD deposition process.
- the coating comprises a nitride, carbide, oxide, boride or mixtures thereof, of one or more elements selected from groups IVb, Vb, VIb of the periodic table and Al, Y and Si.
- the deposition process comprises at least one sequence of varying the substrate bias voltage, while maintaining the active targets, where the sequence of varying the substrate bias voltage comprises a subsequence S ; ;
- n is suitably 2 ⁇ n ⁇ 1000, preferably 6 ⁇ n ⁇ 100 and most preferably 10 ⁇ n ⁇ 20.
- the substrate bias voltage etc. is suitably between -10 and -300 V and preferably between -20 and -200 V.
- is preferably > 40 V more preferably >70 V, but ⁇ 290 V.
- the deposition time, Tj is preferably between 30 seconds and 30 minutes and more preferably between 1 and 15 minutes.
- the ramping time, Rj is preferably between 20 seconds and 20 minutes, more preferably between 30 seconds and 10 minutes.
- the active targets are maintained.
- the deposition is continued using the same targets through out the sequence of varying the substrate bias voltage.
- the sequence comprises two different subsequences, A and B, alternated through out the whole sequence of varying the substrate bias voltage.
- the two subsequences will then be:
- the sequence of varying the substrate bias voltage is built up by subsequences such that the substrate bias voltage during deposition at deposition time Ti in the first, third, fifth etc. subsequence is gradually increasing as well as the substrate bias voltage during deposition at deposition time Ti in the second, fourth, sixth etc. subsequence is gradually increasing.
- Fig. lb One example of this embodiment is shown in Fig. lb.
- the sequence of varying the substrate bias voltage is built up by subsequences such that the substrate bias voltage during deposition at deposition time Ti in the first, third, fifth etc. subsequence is gradually decreasing as well as the substrate bias voltage during deposition at deposition time Ti in the second, fourth, sixth etc. subsequence is gradually decreasing.
- Fig. lc One example of this embodiment is shown in Fig. lc.
- Bj-B i + i is increasing for each subsequence.
- Fig. Id One example of this embodiment is shown in Fig. Id.
- the sequence is built such that substrate bias voltages, deposition times and ramping times are varied randomly.
- Fig. le One example of this embodiment is shown in Fig. le.
- the method can also comprise a mixture of one or more of the above described embodiments.
- the composition of the coating deposited according to the present invention is determined by the target composition and the process gas present in the deposition chamber.
- the coating deposited according to the present invention i.e. during the deposited during the at least sequence of varying the substrate bias voltage, is suitably a nitride, carbide, oxide, boride or mixtures thereof of one or more elements selected from groups IVb, Vb, VIb of the periodic table and Al, Y and Si.
- the coating deposited according to the present invention is a nitride of one or more elements selected from groups IVb, Vb, VIb of the periodic table and Al, Y and Si, more preferably a nitride of one or more of Ti, Al, Cr, Si and Y.
- the coating deposited according to the present invention is (Ti,Al)N, preferably with a composition of (Tii_ x Al x )N, where x suitably is between 0.2 and 0.9 preferably between 0.4 and 0.8, most preferably between 0.5 and 0.7.
- the coating deposited according to the present invention is (Ti,Al,Cr)N, preferably with a composition (Ali_ x _ y Ti x Cr y )N where x is between 0.05 and 0.25, preferably between 0.10 and 0.20, and where y is between 0.05 and 0.30 preferably y is between 0.10 and 0.25 and 0.30 ⁇ x+y ⁇ 0.70.
- the coating deposited according to the present invention is (Ti,Al,Cr,Si)N.
- the method according to the present invention can be applied to all common PVD
- Process parameters are conventional in the art for depositing PVD-coatings onto substrates and depend on the specific deposition equipment, coating composition etc. Typically, the deposition temperature varies between 100 and 900°C.
- the pressure during deposition is typically between 0.1 to 10 Pa of the process gas present.
- the process gas can be one or more of 0 2 , N 2 , Ar, C 2 H 2 , CH 4 or silicon containing gases like e.g. trimethylsilane depending on the aimed coating composition.
- Substrates suitable for the present invention are preferably cutting tools, like cutting tool inserts, or round tools such as drills, end mills, taps etc.
- the substrate is preferably made of any of cemented carbide, cermets, ceramics, cubic boron nitride, poly crystalline diamond or high speed steels, more preferably cemented carbide.
- the substrate can be pre-coated with an inner layer deposited directly onto the substrate to ensure a good adhesion to the substrate, the inner layer comprising a pure metal and/or a nitride, preferably Cr, Ti, CrN or TiN, said layer being 0.005-0.5 ⁇ , preferably 0.02-0.2 ⁇ and is deposited within the same coating process as the rest of the coating.
- the inner layer comprising a pure metal and/or a nitride, preferably Cr, Ti, CrN or TiN, said layer being 0.005-0.5 ⁇ , preferably 0.02-0.2 ⁇ and is deposited within the same coating process as the rest of the coating.
- the method can further comprise deposition of other PVD layers without the sequence of varying the substrate bias voltage, i.e. at conventional deposition conditions.
- additional deposition sequences can be performed either prior to or after the sequence with varying the substrate bias voltage. These additional deposition sequences take place in the same deposition apparatus as the rest of the deposition steps.
- the method can further comprise one or more additional sequences according to the present invention where the active targets are changed between each sequence, i.e. during the sequence of varying the substrate bias voltage the active targets does not change, but the active targets can be changed if a new sequence is started.
- the total coating thickness is between 0.5 and 20 ⁇ , preferably between 0.5 and 8 mand most preferably between 1 and 6 m
- All thicknesses given herein refer to measurements conducted on a reasonably flat surface being in direct line of sight from the targets. For inserts, being mounted on sticks during deposition, it means that the thickness has been measured on the middle of a side directly facing the target. For irregular surfaces, such as those on e.g. drills and end mills, the thicknesses given herein refers to the thickness measured on any reasonably flat surface or a surface having a relatively large curvature and some distance away from any edge or corner. For instance, on a drill, the measurements have been performed on the periphery and on an end mill the measurements has been performed on the flank side.
- the method further comprises a post treatment step.
- the post treatment step can e.g. be a brushing, blasting, shot peening, etc.
- the sequence if varying the substrate bias voltage is as follows:
- step a) to d) is repeated until the desired coating thickness is reached.
- the sequence of varying the substrate bias voltage is as follows:
- step a) to d) is repeated until the desired coating thickness is reached.
- the present invention also relates to coated bodies made according to the method described above.
- the sequences varying the bias are displayed as a layered structure which can be seen when using Scanning Electron Microscopy (SEM) or Transmission Electron Microscopy (TEM).
- Cemented carbide end mills with the geometry R216.34-10050-BC22P were coated with PVD arc evaporation using Tio.33Alo.67-targets.
- the substrates were first subjected to an etching process, prior to deposition of a starting layer of Ti having a thickness of approximately 0.050 ⁇ After that, deposition of the (Ti,Al)N coating took place.
- the coating was deposited at a temperature of 600°C and at a N 2 pressure of 1.0 Pa.
- the substrate bias voltage was varied according to the following sequence:
- Step a) to d) was repeated until the coating reached a coating thickness on the flank side of 2.8 ⁇
- invention 1 The end mills are herein referred to as Invention 1.
- Cemented carbide end mills of the same geometry and composition as in Example 1 were coated with PVD arc evaporation using Tio.33Alo.67-targets.
- the substrates were first subjected to an etching process, prior to depositing a starting layer of Ti having a thickness of approximately 0.050 ⁇ After that, deposition of the (Ti,Al)N coating took place.
- the coating was deposited at a temperature of 600°C, at a N 2 pressure of 1.0 Pa, and at a constant substrate bias voltage of 100 V until a final coating thickness of 3.8 ⁇ was reached.
- the end mills according to Example 2 are herein referred to as Reference 1.
- V c 300 m/min
- Coolant Tool life criterion Vb/Vb max >0.15/0.20
- Table 1 clearly shows that the end mills coated according to the present invention, Invention 1, have a considerably longer tool life than prior art, i.e. Reference 1 and Comparative 1.
- V c 105 m/min
- Table 2 clearly shows that the end mills coated according to the present invention, Invention 1, have a considerably better wear resistance, i.e. a lower maximum wear, than both Reference 1 and Comparative 1.
- Threading inserts of the geometry, 266RG-16MM01A150M were coated according to the method described in Example 1 to a coating thickness of 2.3 ⁇ and according to the method in Example 2 to a coating thickness of 2.1 ⁇ , respectively. They are herein referred to as Invention 2 and Reference 2. They were tested in an intermittent threading application as follows:
- V c 110 m/min
- Length of thread 25 mm
- Table 3 clearly shows that the threading inserts coated according to the present invention, Invention 2, have a longer tool life than prior art inserts, i.e. Reference 2.
- Cemented carbide threading inserts with the geometry R166.OG-16VM01-002 were coated using PVD arc evaporation with Tio.3oAlo. 7 o-targets an d Cr3oAl 7 o-targets.
- the substrates were first subjected to an etching process, prior to depositing a starting layer of TiN having a thickness of approximately 0.1 ⁇ .
- the substrate bias voltage was varied according to the following sequence:
- Step a) to d) was repeated until the coating reached a coating thickness on the flank face of 2.2 m
- the deposition cycle was ended with a thin TiN color layer of approximately 0.2 ⁇ .
- the threading inserts are herein referred to as Invention 3.
- Cemented carbide threading inserts with the geometry R166.OG-16VM01-002 were deposited with TiN at 450 °C using an ion plating method.
- the threading inserts are herein referred to as Reference 3.
- Length of thread 30 mm
- Table 4 clearly shows that the threading inserts coated according to the present invention, Invention 1 and Invention 2, have a considerably longer tool life than prior art, i.e. Reference 3.
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- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Cutting Tools, Boring Holders, And Turrets (AREA)
Abstract
Description
Claims
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2012529713A JP2013505358A (en) | 2009-09-18 | 2010-09-15 | PVD process for depositing a coating on an object and a coated object produced therefrom |
CN2010800414613A CN102498234A (en) | 2009-09-18 | 2010-09-15 | A pvd method for depositing a coating onto a body and coated bodies made thereof |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP09011915A EP2298954B1 (en) | 2009-09-18 | 2009-09-18 | A PVD method for depositing a coating onto a body and coated bodies made thereof |
EP09011915.7 | 2009-09-18 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2011034492A1 true WO2011034492A1 (en) | 2011-03-24 |
Family
ID=41217625
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/SE2010/050989 WO2011034492A1 (en) | 2009-09-18 | 2010-09-15 | A pvd method for depositing a coating onto a body and coated bodies made thereof |
Country Status (6)
Country | Link |
---|---|
US (1) | US20110067996A1 (en) |
EP (1) | EP2298954B1 (en) |
JP (1) | JP2013505358A (en) |
KR (1) | KR20120070569A (en) |
CN (1) | CN102498234A (en) |
WO (1) | WO2011034492A1 (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2013045039A2 (en) | 2011-09-30 | 2013-04-04 | Oerlikon Trading Ag, Trübbach | Aluminum titanium nitride coating with adapted morphology for enhanced wear resistance in machining operations and method thereof |
Families Citing this family (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP2669401A1 (en) | 2012-05-29 | 2013-12-04 | Seco Tools AB | Method for depositing a coating and a coated cutting tool |
DE102012107129A1 (en) | 2012-08-03 | 2014-02-06 | Walter Ag | TiAIN coated tool |
US9476114B2 (en) | 2012-08-03 | 2016-10-25 | Walter Ag | TiAlN-coated tool |
DE102012109254A1 (en) | 2012-09-28 | 2014-04-03 | Walter Ag | Tool with TiAlCrSiN PVD coating |
JP6208437B2 (en) * | 2013-02-27 | 2017-10-04 | 株式会社神戸製鋼所 | Hard film, method for producing the same, and hard film coated member |
DE102014018915A1 (en) * | 2014-12-22 | 2016-06-23 | Oerlikon Surface Solutions Ag, Trübbach | AlCrN-based coating for improved resistance to crater wear |
CN104911551A (en) * | 2015-06-03 | 2015-09-16 | 陕西航天导航设备有限公司 | Preparation method for TiN film with thickness of 21.5mu m |
CN104911539A (en) * | 2015-06-03 | 2015-09-16 | 陕西航天导航设备有限公司 | Method for preparing titanium nitride film |
EP3239349B1 (en) | 2016-04-26 | 2022-06-22 | IHI Ionbond AG | Wear resistant tetrahedral diamond like carbon layer |
CN108390075B (en) * | 2018-01-24 | 2019-04-02 | 上海交通大学 | Anticorrosive conductive film and its pulsed bias alternating magnetron sputtering deposition method and application |
EP3757252B1 (en) * | 2019-06-28 | 2022-03-30 | Walter Ag | A coated cutting tool |
CN113249689B (en) * | 2021-05-12 | 2021-12-10 | 东莞市华升真空镀膜科技有限公司 | Workpiece coating and preparation method and application thereof |
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US6824601B2 (en) * | 2000-12-28 | 2004-11-30 | Kobe Steel, Ltd. | Hard film for cutting tools, cutting tool coated with hard film, process for forming hard film, and target used to form hard film |
GB2410254A (en) * | 2004-01-21 | 2005-07-27 | Nanofilm Technologies Int | Method of reducing stress in coatings produced by physical vapour deposition |
US20070218242A1 (en) | 2004-07-08 | 2007-09-20 | Hideki Moriguchi | Surface-Coated Cutting Tool With Coated Film Having Strength Distribution of Compressive Stress |
US20070275179A1 (en) | 2004-09-10 | 2007-11-29 | Aastrand Maria | Cutting Tool with Wear Resistant Coating and Method of Making the Same |
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US4814056A (en) * | 1987-06-23 | 1989-03-21 | Vac-Tec Systems, Inc. | Apparatus for producing graded-composition coatings |
US6905578B1 (en) * | 1998-04-27 | 2005-06-14 | Cvc Products, Inc. | Apparatus and method for multi-target physical-vapor deposition of a multi-layer material structure |
JP2003113463A (en) * | 2001-08-03 | 2003-04-18 | Toshiba Tungaloy Co Ltd | COATED MEMBER WITH TiAl ALLOY FILM AND MANUFACTURING METHOD THEREFOR |
JP4634247B2 (en) * | 2004-08-18 | 2011-02-16 | 住友電工ハードメタル株式会社 | Surface coated cutting tool |
KR20090052174A (en) * | 2007-11-20 | 2009-05-25 | 아이시스(주) | Diffusion thinfilm deposition method and apparatus the same |
EP2072636B1 (en) * | 2007-12-21 | 2016-08-31 | Sandvik Intellectual Property AB | Method of making a coated cutting tool |
CN101215685B (en) * | 2007-12-27 | 2011-06-22 | 重庆跃进机械厂有限公司 | Method for preparing tin content step-up PVD bushing in antifriction layer |
CN102439697B (en) * | 2009-04-03 | 2015-08-19 | 应用材料公司 | High pressure RF-DC sputters and improves the film uniformity of this technique and the method for step coverage rate |
-
2009
- 2009-09-18 EP EP09011915A patent/EP2298954B1/en not_active Not-in-force
-
2010
- 2010-09-15 WO PCT/SE2010/050989 patent/WO2011034492A1/en active Application Filing
- 2010-09-15 CN CN2010800414613A patent/CN102498234A/en active Pending
- 2010-09-15 JP JP2012529713A patent/JP2013505358A/en active Pending
- 2010-09-15 KR KR1020127006819A patent/KR20120070569A/en not_active Application Discontinuation
- 2010-09-17 US US12/884,778 patent/US20110067996A1/en not_active Abandoned
Patent Citations (4)
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US6824601B2 (en) * | 2000-12-28 | 2004-11-30 | Kobe Steel, Ltd. | Hard film for cutting tools, cutting tool coated with hard film, process for forming hard film, and target used to form hard film |
GB2410254A (en) * | 2004-01-21 | 2005-07-27 | Nanofilm Technologies Int | Method of reducing stress in coatings produced by physical vapour deposition |
US20070218242A1 (en) | 2004-07-08 | 2007-09-20 | Hideki Moriguchi | Surface-Coated Cutting Tool With Coated Film Having Strength Distribution of Compressive Stress |
US20070275179A1 (en) | 2004-09-10 | 2007-11-29 | Aastrand Maria | Cutting Tool with Wear Resistant Coating and Method of Making the Same |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
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WO2013045039A2 (en) | 2011-09-30 | 2013-04-04 | Oerlikon Trading Ag, Trübbach | Aluminum titanium nitride coating with adapted morphology for enhanced wear resistance in machining operations and method thereof |
US9447488B2 (en) | 2011-09-30 | 2016-09-20 | Oerlikon Surface Solutions Ag, Pfaffikon | Aluminum titanium nitride coating with adapted morphology for enhanced wear resistance in machining operations and method thereof |
Also Published As
Publication number | Publication date |
---|---|
EP2298954A1 (en) | 2011-03-23 |
JP2013505358A (en) | 2013-02-14 |
US20110067996A1 (en) | 2011-03-24 |
KR20120070569A (en) | 2012-06-29 |
CN102498234A (en) | 2012-06-13 |
EP2298954B1 (en) | 2013-03-13 |
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