WO2010053582A1 - Chromium doped diamond-like carbon - Google Patents
Chromium doped diamond-like carbon Download PDFInfo
- Publication number
- WO2010053582A1 WO2010053582A1 PCT/US2009/006047 US2009006047W WO2010053582A1 WO 2010053582 A1 WO2010053582 A1 WO 2010053582A1 US 2009006047 W US2009006047 W US 2009006047W WO 2010053582 A1 WO2010053582 A1 WO 2010053582A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- chromium
- heterojunction
- diamond
- concentration
- doped
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Ceased
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
- H10D62/80—Semiconductor bodies, or regions thereof, of devices having potential barriers characterised by the materials
- H10D62/83—Semiconductor bodies, or regions thereof, of devices having potential barriers characterised by the materials being Group IV materials, e.g. B-doped Si or undoped Ge
- H10D62/8303—Diamond
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/0021—Reactive sputtering or evaporation
- C23C14/0036—Reactive sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/26—Deposition of carbon only
- C23C16/27—Diamond only
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/26—Deposition of carbon only
- C23C16/27—Diamond only
- C23C16/278—Diamond only doping or introduction of a secondary phase in the diamond
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F1/00—Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties
- H01F1/01—Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties of inorganic materials
- H01F1/40—Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties of inorganic materials of magnetic semiconductor materials, e.g. CdCr2S4
- H01F1/401—Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties of inorganic materials of magnetic semiconductor materials, e.g. CdCr2S4 diluted
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F1/00—Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties
- H01F1/01—Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties of inorganic materials
- H01F1/40—Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties of inorganic materials of magnetic semiconductor materials, e.g. CdCr2S4
- H01F1/401—Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties of inorganic materials of magnetic semiconductor materials, e.g. CdCr2S4 diluted
- H01F1/405—Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties of inorganic materials of magnetic semiconductor materials, e.g. CdCr2S4 diluted of IV type, e.g. Ge1-xMnx
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F10/00—Thin magnetic films, e.g. of one-domain structure
- H01F10/08—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers
- H01F10/10—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers characterised by the composition
- H01F10/18—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers characterised by the composition being compounds
- H01F10/193—Magnetic semiconductor compounds
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D48/00—Individual devices not covered by groups H10D1/00 - H10D44/00
- H10D48/385—Devices using spin-polarised carriers
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
- H10D62/80—Semiconductor bodies, or regions thereof, of devices having potential barriers characterised by the materials
- H10D62/82—Heterojunctions
- H10D62/822—Heterojunctions comprising only Group IV materials heterojunctions, e.g. Si/Ge heterojunctions
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
- H10D62/80—Semiconductor bodies, or regions thereof, of devices having potential barriers characterised by the materials
- H10D62/83—Semiconductor bodies, or regions thereof, of devices having potential barriers characterised by the materials being Group IV materials, e.g. B-doped Si or undoped Ge
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
- H10D62/80—Semiconductor bodies, or regions thereof, of devices having potential barriers characterised by the materials
- H10D62/83—Semiconductor bodies, or regions thereof, of devices having potential barriers characterised by the materials being Group IV materials, e.g. B-doped Si or undoped Ge
- H10D62/834—Semiconductor bodies, or regions thereof, of devices having potential barriers characterised by the materials being Group IV materials, e.g. B-doped Si or undoped Ge further characterised by the dopants
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N50/00—Galvanomagnetic devices
- H10N50/10—Magnetoresistive devices
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F1/00—Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties
- H01F1/0009—Antiferromagnetic materials, i.e. materials exhibiting a Néel transition temperature
Definitions
- the present invention relates generally to spin-electronics applications and particularly to Chromium (Cr) doped diamond-like carbon (“DLC”) films as semiconductor spintronics materials and methods to create semiconductors for spin electronics applications.
- Cr Chromium
- DLC diamond-like carbon
- DLC films have been extensively studied for over a decade due to their unique combination of chemical inertness, mechanical, tribological and optical properties.
- composite metal-containing DLC films have gained popularity in the scientific community, as metal additions allow controllable variation of a wide variety of properties ranging from electrical conductivity, optical and magnetic to mechanical and tribological. Therefore, these composites are important multifunctional materials for applications where mechanical integrity, low friction, and/or high wear resistance are required, such as electronic, micro-electromechanical, magnetic, and photonic applications.
- spintronics Spintronics or semiconductor spintronics is an area of semiconductor electronics where spin degrees of freedom play an important role in realizing functionalities.
- Conventional electronics rely on the transport of electrons (and the detection of such) in a semiconductor such as silicon.
- a heteroj unction for use in spin electronics applications includes an n-type silicon semiconductor and a chromium doped hydrogenated diamond-like carbon film deposited on the n-type silicon semiconductor.
- concentration of chromium dopant may be configured such that the heteroj unction has an increase in forward bias current ranging from about 50% to about 150% in a small magnetic field at about room temperature and such that the heteroj unction has spin electronic properties at about room temperature.
- Figure 1 is a cross-section of a heterojunction comprising a Cr doped DLC film deposited on an n-type silicon semiconductor, according to an exemplary embodiment of the present invention.
- Figure 2(a) illustrates X-ray absorption edge structure spectra of Cr-DLC films, Cr and Cr 3 C 2 , normalized spectra, translated along the y-axis (intensity) according to exemplary embodiments of the present invention.
- Figure 2(b) illustrates the Fourier transform of the EXAFS spectra for the Cr-DLC films along with pure Cr carbide (Cr 3 C 2 ) according to exemplary embodiments of the present invention.
- Figure 3 (a) illustrates magnetization curves of Cr-DLC ( ⁇ 3% at Cr) at 20 K, including the virgin magnetization curve, according to exemplary embodiment of the present invention.
- Figure 3(b) illustrates magnetization curves of Cr-DLC (-3% at Cr) at 10K, including the virgin magnetization curve, according to exemplary embodiments of the present invention.
- Figure 4(a) illustrates the I-V curves for a 11 at % Cr Cr-DLC film to n-type silicon heteroj unction device with changing applied magnetic field, at room temperature, according to an exemplary embodiment of the present invention.
- Figure 4(b) illustrates the I-V curves for a 15 at % Cr Cr-DLC film to n-type silicon heteroj unction device with changing applied magnetic field, at room temperature, according to an exemplary embodiment of the present invention.
- Figure 4(c) illustrates the change in forward current, as a function of the magnetic field, plotted for a forward bias of 2V, for a Cr-DLC film to n-type silicon heteroj unction device at about 11.0% Cr, according to an exemplary embodiment of the present invention.
- Figure 4(d) illustrates the change in forward current, as a function of the magnetic field, plotted for a forward bias of 2V, for a Cr-DLC film to n-type silicon heteroj unction device at about 15.0% Cr, according to an exemplary embodiment of the present invention.
- Embodiments of the present invention are provided that exploit the magnetic properties of Cr and Cr doped DLC to yield spintronic properties, such as increased coupling of magnetic moments, at room temperature.
- Heteroj unction devices may be provided that include Cr-DLC films deposited on n-type silicon in which various concentrations of chromium acted as a p-type dopant to the DLC films. At low Cr concentrations, both ferromagnetic and compensated magnetic coupling occur in the Cr- DLC films at low temperatures, hi a wide range of Cr concentrations up to 18%, the Cr- DLC films form a heteroj unction with the n-type silicon that demonstrated a large coefficient of negative magnetoresistance at room temperature.
- Embodiments of the present invention may be applied to several different commercial applications, including quantum computers/quantum information technologies, medical devices, ferromagnetic semiconductors, magneto-optic devices, magnetoresistive devices, and information storage devices.
- amorphous DLC films are extended by metal additions, which have a profound effect on the films.
- Cr in combination with DLC increases coupling of magnetic moments, making the composite attractive for spintronics applications.
- Cr doped DLC films are provided that have significant advantages in tribological applications due to their high hardness and low friction coefficient. Further, according to embodiments of the present invention, DLC films are provided with properties that make them suitable for solar cell applications. Still further, in accordance with embodiments of the present invention, Cr doped DLC films have unique magnetic properties and possess spintronics properties at room temperature that make them very attractive for commercial applications.
- Embodiments of the inventive subject matter utilize Cr-doped hydrogenated diamond-like carbon (Cr-DLC) and chromium carbide hydrogenated diamond-like carbon alloys, which are provided as a mixed matrix material and in the form of heteroj unctions for spin-electronics applications.
- Cr-DLC Cr-doped hydrogenated diamond-like carbon
- chromium carbide hydrogenated diamond-like carbon alloys which are provided as a mixed matrix material and in the form of heteroj unctions for spin-electronics applications.
- chromium-doped hydrogenated diamond-like carbon and chromium carbide hydrogenated diamond-like carbon alloys may be synthesized by plasma-assisted vapor deposition and investigated by such techniques as X-Ray Absorption Near Edge Structure (XANES), Extended X-Ray Absorption Fine Structure (EXAFS), Synchrotron Radiation VUV Photoelectron Spectroscopy, Superconducting Quantum Interference Device (SQUID) magnetometry, I-V curve measurements, and magnetoresistance.
- XANES X-Ray Absorption Near Edge Structure
- EXAFS Extended X-Ray Absorption Fine Structure
- SQUID Superconducting Quantum Interference Device
- Structural and magnetic properties of the doped and alloy materials may be altered as a function of the Cr concentration, which may vary from about 0.1% to about 20%.
- Cr substitutes for carbon in a diamond-like amorphous matrix and forms a substitutional solid-solution compound.
- the Cr precipitates in the form of chromium carbide (Cr 3 C 2 ) nanoclusters.
- the systems are ferromagnetic at very low temperatures, whereas the chromium-carbide clusters formed at higher concentrations are antiferromagnetic with uncompensated spins at the surface.
- the Cr-DLC films and alloys with various Cr concentrations may be used to make heteroj unctions on silicon, and the produced diodes may be investigated by I-V measurements.
- the heteroj unctions exhibit negative magnetoresistance that saturates at less than 500 Oe and may be suitable for spin-electronics applications.
- the unique features of Cr-doped DLC films is not limited to the field of spintronics. Embodiments of the present invention may be used in any field where materials featuring an adjustable bandgap are desired, such as solar energy applications. While DLC films' large bandgap renders them generally unsuitable for photoelectric cell applications, according to embodiments of the present invention the bandgap of Cr-doped DLC films may be engineered/modified/decreased by Cr addition up to 20%. Modulated-bandgap DLC films may be desirable for solar energy harvesting, as a sufficiently low gap will permit relatively low-energy photons to excite electrons into the conduction band. Suitable substrates for the Cr-doped DLC films intended for solar energy harvesting are thus not restricted to doped or pure semiconductor materials; indeed, substrates may be selected from metals.
- Embodiments of a hybrid plasma-assisted PVD/CVD process may be used to deposit the Cr-DLC films onto a Si(IOO) substrate.
- Embodiments of the process may involve magnetron sputtering from a Cr target (99.5% Cr) in an Ar/CH4 discharge with the substrate biased at -1000 V.
- Further embodiments include varying the Cr content in the Cr- DLC by operating the magnetron under current control and modulating the current between 100 mA and 350 mA.
- Cr-DLC films with variable levels of Cr concentrate are embedded in an amorphous matrix, which forms crystalline nanoclusters ranging from about 2nm to about 5nm in size.
- Cr-DLC films with a Cr concentration of less than or equal to about 0.4% the atomic clusters are not formed because Cr is dissolved in the DLC matrix.
- WDS wavelength-dispersive spectroscopy
- EDS energy dispersive spectroscopy
- X-ray absorption (EXAFS and XANES) spectroscopies can determine the structure of embodiments of the Cr-DLC films.
- FIG. 1 shows a cross section of a heteroj unction 100 according to an exemplary embodiment of the present invention.
- the heteroj unction 100 includes an n-type silicon semiconductor 105 and a DLC film 110 deposited on the silicon semiconductor 105.
- the DLC film 110 is doped with Cr 115, which acts as a p-type dopant.
- Figure 2(a) shows X-ray absorption edge structure spectra of Cr-DLC films, Cr and Cr 3 C 2 , normalized spectra, translated along the y-axis (intensity).
- XANES spectra were obtained for certain embodiments of the present invention containing Cr contents of about 0.1%, 0.4%, 1.5%, 2.8% and about 11.8% along with pure Cr, Cr-III oxide (Cr 2 O 2 ) and Cr carbide (Cr 3 C 2 ) samples. (All concentrations were measured in %).
- the XANES spectra indicate that the chemical state and the local environment around the absorbing Cr atoms remains essentially the same for Cr content higher than or comparable greater than or equal to 1.5%.
- the XANES spectra of the films are reminiscent of Cr 3 C 2 spectrum, and the high Cr concentrations yield nanocluster precipitates, similar to the situation encountered in Co-DLC and Ti-DLC systems.
- the local environment about Cr was significantly enhanced and reduced C and Cr coordination numbers, respectively.
- each chromium atom has 6.6 ⁇ 0.7 C and 2.0 ⁇ 0.9 Cr neighbors, as compared to the respective numbers 4 and 11 for Cr 3 C 2 . This is consistent with a solid solution of Cr in C, with little clustering of Cr.
- clustering can not be excluded, because the strain created by the substitution of Cr for C yields an attractive interaction (Kanzaki forces) between the Cr atoms, similar to the situation encountered for gases in metals.
- clustering of chromium impurities typically occur for concentrations exceeding about 1.5%.
- uniform Cr distribution in C matrix at lower levels (about 6 %) and Cr-rich cluster formation at high doping levels of about 12% may occur.
- Figure 2(b) depicts the Fourier-transformed EXAFS spectra of Cr-carbide and Cr- DLC films at the Cr K-edge, according to certain embodiments of the present invention.
- the spectra of the films with high Cr content (11.8 and 2.8%) show two peaks (1.5 and 2.1 A) corresponding to the two sub-shells (Cr...C and Cr...Cr) of the first coordination shell.
- the data also suggest a highly disordered (amorphous) structure with some short-range order because no significant features were observed above 2.6 A. Similar observations were made on these films by X-ray diffraction and low angle X-ray diffraction experiments.
- the bond lengths are nearly the same for all films and similar to that of C ⁇ C2 powder (2.2 A for Cr-C and 2.7 A for Cr-Cr). Based on both valence band and core level photoemission more pronounced precipitation of carbide nanoclusters occurs at the surface than in the bulk, which is important for spintronics applications.
- Figures 3 (a) and 3(b) show the magnetization curves of Cr-DLC films with about 3% chromium at 2OK and 10K, respectively, according to certain embodiments of the present invention.
- Superconducting Quantum Interference Device (SQUID) magnetometry was used to perform the magnetic measurements, which were performed with the magnetic field in the film plane. At low temperatures of about 10K, the curves show ferromagnetisms, but at higher temperatures (above 20K) the curves indicate compensated ferromagnetism. Constricted loops frequently occur in magnetically inhomogeneous systems and reflect a cluster-size distribution ranging from very few interatomic distances to about 10 nm.
- the largely carbon-weighted photoemission features at 6 eV are enhanced at photon energies of about 39-44 eV, near the Cr 3p band (42 eV), and the chromium 3d bands are strongly hybridized to the carbon 2p.
- This hybridization provides for the low-temperature ferromagnetism of the dilute Cr-DLC. Below 12 K, the system exhibits ordinary hysteresis loops, with a coercivity of order 0.8 mT (8 Oe), but at somewhat elevated temperatures (above 20 K), the hysteresis loops are constricted (wasp-like).
- Cr-DLC heterojunctions with silicon may be fabricated for spin-electronics applications.
- devices may be produced that include Cr-DLC films deposited on n-type silicon in which various concentrations of chromium act as a p-type dopant to the DLC films.
- such a heteroj unction device may have about 50% to about 150% increases in forward bias currents in a small magnetic field.
- Cr-doped hydrogenated diamond-like carbon and chromium carbide hydrogenated diamond-like carbon alloys are provided where, in the film embodiments of higher chromium concentration, a large coefficient of negative magneto-resistance is provided in heteroj unction devices with n-type silicon. Therefore, embodiments of the present invention may provide significant functionality over other conventional heterojunction diodes.
- Figures 4(a) and 4(b) show the I-V curves for heterojunctions made with about 11% Cr and about 15% Cr content, respectively, with a changing applied magnetic field at room temperature, according to exemplary embodiments of the present invention.
- heterojunction diodes were made, but the capacitance was quite large and dominated the devices properties, consistent with amorphous carbon films on n-type silicon.
- good diode rectification may be obtained for about 11% to about 15% Cr doping.
- With a Cr doping concentration of about 20% or more, heterojunction diodes with n-type silicon may show very large relative leakage currents in reverse bias and increasingly resemble a 'bad' conventional resistor.
- the negative magnetoresistance of the I-V curve which is ascribed to uncompensated spins at the surface of the antiferromagnetic chromium-carbide clusters, indicates that embodiments of present invention are suitable for spin-electronics applications.
- Figures 4(c) and 4(d) show the change in forward current as a function of the magnetic field, plotted for a forward bias of 2V, for Cr-DLC film to n-type silicon heteroj unction devices at about 11.0% Cr and 15.0% Cr, respectively, according to exemplary embodiments of the present invention.
- the heteroj unction diodes of n-type silicon and about 11% and about 15% Cr-doped DLC films as the p-type semiconductor have strong negative magnetoresistance with the forward bias current increasing with magnetic field, even at room temperature.
- the negative magneto- resistance may be as much as about 50% to about 100% in an applied magnetic field as small as 300 Oe.
- Embodiments of the present invention apply to, but are not limited to the following applications of semiconductor spintronics:
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Power Engineering (AREA)
- Inorganic Chemistry (AREA)
- Hall/Mr Elements (AREA)
Abstract
A heterojunction is provided for spin electronics applications. The heterojunction includes an n-type silicon semiconductor and a hydrogenated diamond-like carbon film deposited on the n-type silicon semiconductor. The hydrogenated diamond-like carbon film is doped with chromium. The concentration of the chromium dopant in the chromium doped diamond-like carbon film may be configured such that the heterojunction has an increase in forward bias current ranging from about 50% to about 150% in a small magnetic field at about room temperature. The heterojunction has spin electronics properties at about room temperature.
Description
[3185-37]
CHROMIUM DOPED DIAMOND-LIKE CARBON
CROSS-REFERENCE TO RELATED APPLICATIONS
This application claims the benefit of U.S. Provisional Patent Application Serial No. 61/198,790 filed November 10, 2008 which is expressly incorporated herein in its entirety by reference thereto.
STATEMENT OF GOVERNMENT-SPONSORED RESEARCH
This invention was made with government support under the following contracts:
• Contract DAAG55-98-1-0279, from the U.S. Army/Army Research Office;
• Contract ECS0725881, from the National Science Foundation; and
• Contract N00014-06-1-0616, from the U.S. Navy/Office of Naval Research. The government has certain rights in the invention.
FIELD
The present invention relates generally to spin-electronics applications and particularly to Chromium (Cr) doped diamond-like carbon ("DLC") films as semiconductor spintronics materials and methods to create semiconductors for spin electronics applications.
BACKGROUND
DLC films have been extensively studied for over a decade due to their unique combination of chemical inertness, mechanical, tribological and optical properties. Particularly, composite metal-containing DLC films have gained popularity in the scientific community, as metal additions allow controllable variation of a wide variety of properties ranging from electrical conductivity, optical and magnetic to mechanical and tribological. Therefore, these composites are important multifunctional materials for applications where mechanical integrity, low friction, and/or high wear resistance are required, such as electronic, micro-electromechanical, magnetic, and photonic applications.
While the use of DLC films and metal-containing composites thereof has been researched in fields where hardness and tribological properties are key, such as corrosive
and wear resistant coatings for tools and sharp instruments, little research has been devoted to the use of these materials as semiconductors, and particularly the emerging field of spin electronics ("spintronics"). Spintronics or semiconductor spintronics is an area of semiconductor electronics where spin degrees of freedom play an important role in realizing functionalities. Conventional electronics rely on the transport of electrons (and the detection of such) in a semiconductor such as silicon. Individual electrons possess an intrinsic angular momentum ("electron spin") and a magnetic moment which is oriented in either an "up" or "down" direction, hi the field of spintronics, devices exploit the spin of electrons to store/write information as a particular spin orientation (i.e., "up" or "down"). The ability to store additional information in the spin orientation of a flow of electrons makes such devices particularly attractive in the area of quantum computing/quantum information technologies, where the electron spin can represent an extra "bit" (called a "qubit") of information, and in the area on information storage devices and the reduction of the footprints thereof. Most currently available spintronic technologies utilize materials that demonstrate such properties only at temperatures below room temperature.
SUMMARY
According to an exemplary embodiment of the present invention, a heteroj unction for use in spin electronics applications is provided that includes an n-type silicon semiconductor and a chromium doped hydrogenated diamond-like carbon film deposited on the n-type silicon semiconductor. The concentration of chromium dopant may be configured such that the heteroj unction has an increase in forward bias current ranging from about 50% to about 150% in a small magnetic field at about room temperature and such that the heteroj unction has spin electronic properties at about room temperature.
BRIEF DESCRIPTION OF THE DRAWINGS
Figure 1 is a cross-section of a heterojunction comprising a Cr doped DLC film deposited on an n-type silicon semiconductor, according to an exemplary embodiment of the present invention.
Figure 2(a) illustrates X-ray absorption edge structure spectra of Cr-DLC films, Cr and Cr3C2, normalized spectra, translated along the y-axis (intensity) according to exemplary embodiments of the present invention.
Figure 2(b) illustrates the Fourier transform of the EXAFS spectra for the Cr-DLC films along with pure Cr carbide (Cr3C2) according to exemplary embodiments of the present invention.
Figure 3 (a) illustrates magnetization curves of Cr-DLC (~3% at Cr) at 20 K, including the virgin magnetization curve, according to exemplary embodiment of the present invention.
Figure 3(b) illustrates magnetization curves of Cr-DLC (-3% at Cr) at 10K, including the virgin magnetization curve, according to exemplary embodiments of the present invention.
Figure 4(a) illustrates the I-V curves for a 11 at % Cr Cr-DLC film to n-type silicon heteroj unction device with changing applied magnetic field, at room temperature, according to an exemplary embodiment of the present invention.
Figure 4(b) illustrates the I-V curves for a 15 at % Cr Cr-DLC film to n-type silicon heteroj unction device with changing applied magnetic field, at room temperature, according to an exemplary embodiment of the present invention.
Figure 4(c) illustrates the change in forward current, as a function of the magnetic field, plotted for a forward bias of 2V, for a Cr-DLC film to n-type silicon heteroj unction device at about 11.0% Cr, according to an exemplary embodiment of the present invention.
Figure 4(d) illustrates the change in forward current, as a function of the magnetic field, plotted for a forward bias of 2V, for a Cr-DLC film to n-type silicon heteroj unction device at about 15.0% Cr, according to an exemplary embodiment of the present invention.
DETAILED DESCRIPTION
Embodiments of the present invention are provided that exploit the magnetic properties of Cr and Cr doped DLC to yield spintronic properties, such as increased coupling of magnetic moments, at room temperature. Heteroj unction devices may be provided that include Cr-DLC films deposited on n-type silicon in which various concentrations of chromium acted as a p-type dopant to the DLC films. At low Cr concentrations, both ferromagnetic and compensated magnetic coupling occur in the Cr- DLC films at low temperatures, hi a wide range of Cr concentrations up to 18%, the Cr- DLC films form a heteroj unction with the n-type silicon that demonstrated a large coefficient of negative magnetoresistance at room temperature. Embodiments of the present invention may be applied to several different commercial applications, including quantum computers/quantum information technologies, medical devices, ferromagnetic
semiconductors, magneto-optic devices, magnetoresistive devices, and information storage devices.
In accordance with embodiments of the present invention, the functionality and application of amorphous DLC films are extended by metal additions, which have a profound effect on the films. Cr in combination with DLC increases coupling of magnetic moments, making the composite attractive for spintronics applications.
In accordance with embodiments of the present invention, Cr doped DLC films are provided that have significant advantages in tribological applications due to their high hardness and low friction coefficient. Further, according to embodiments of the present invention, DLC films are provided with properties that make them suitable for solar cell applications. Still further, in accordance with embodiments of the present invention, Cr doped DLC films have unique magnetic properties and possess spintronics properties at room temperature that make them very attractive for commercial applications.
Embodiments of the inventive subject matter utilize Cr-doped hydrogenated diamond-like carbon (Cr-DLC) and chromium carbide hydrogenated diamond-like carbon alloys, which are provided as a mixed matrix material and in the form of heteroj unctions for spin-electronics applications.
In certain embodiments of the present invention, chromium-doped hydrogenated diamond-like carbon and chromium carbide hydrogenated diamond-like carbon alloys may be synthesized by plasma-assisted vapor deposition and investigated by such techniques as X-Ray Absorption Near Edge Structure (XANES), Extended X-Ray Absorption Fine Structure (EXAFS), Synchrotron Radiation VUV Photoelectron Spectroscopy, Superconducting Quantum Interference Device (SQUID) magnetometry, I-V curve measurements, and magnetoresistance.
Structural and magnetic properties of the doped and alloy materials may be altered as a function of the Cr concentration, which may vary from about 0.1% to about 20%. At low concentration, Cr substitutes for carbon in a diamond-like amorphous matrix and forms a substitutional solid-solution compound. Towards the upper end of the concentration range, the Cr precipitates in the form of chromium carbide (Cr3C2) nanoclusters. For low Cr concentrations, the systems are ferromagnetic at very low temperatures, whereas the chromium-carbide clusters formed at higher concentrations are antiferromagnetic with uncompensated spins at the surface. Cr-DLC films and alloys with various Cr concentrations may be used to make heteroj unctions on silicon, and the produced diodes may be investigated by I-V measurements. The heteroj unctions exhibit negative
magnetoresistance that saturates at less than 500 Oe and may be suitable for spin-electronics applications.
The unique features of Cr-doped DLC films is not limited to the field of spintronics. Embodiments of the present invention may be used in any field where materials featuring an adjustable bandgap are desired, such as solar energy applications. While DLC films' large bandgap renders them generally unsuitable for photoelectric cell applications, according to embodiments of the present invention the bandgap of Cr-doped DLC films may be engineered/modified/decreased by Cr addition up to 20%. Modulated-bandgap DLC films may be desirable for solar energy harvesting, as a sufficiently low gap will permit relatively low-energy photons to excite electrons into the conduction band. Suitable substrates for the Cr-doped DLC films intended for solar energy harvesting are thus not restricted to doped or pure semiconductor materials; indeed, substrates may be selected from metals.
Embodiments of a hybrid plasma-assisted PVD/CVD process may be used to deposit the Cr-DLC films onto a Si(IOO) substrate. Embodiments of the process may involve magnetron sputtering from a Cr target (99.5% Cr) in an Ar/CH4 discharge with the substrate biased at -1000 V. Further embodiments include varying the Cr content in the Cr- DLC by operating the magnetron under current control and modulating the current between 100 mA and 350 mA. hi other embodiments, Cr-DLC films with variable levels of Cr concentrate are embedded in an amorphous matrix, which forms crystalline nanoclusters ranging from about 2nm to about 5nm in size. In still other embodiments, Cr-DLC films with a Cr concentration of less than or equal to about 0.4% the atomic clusters are not formed because Cr is dissolved in the DLC matrix. To determine the chromium content, some embodiments utilize wavelength-dispersive spectroscopy (WDS) or energy dispersive spectroscopy (EDS). In addition, the X-ray absorption (EXAFS and XANES) spectroscopies can determine the structure of embodiments of the Cr-DLC films.
Figure 1 shows a cross section of a heteroj unction 100 according to an exemplary embodiment of the present invention. The heteroj unction 100 includes an n-type silicon semiconductor 105 and a DLC film 110 deposited on the silicon semiconductor 105. The DLC film 110 is doped with Cr 115, which acts as a p-type dopant.
Figure 2(a) shows X-ray absorption edge structure spectra of Cr-DLC films, Cr and Cr3C2, normalized spectra, translated along the y-axis (intensity). XANES spectra were obtained for certain embodiments of the present invention containing Cr contents of about 0.1%, 0.4%, 1.5%, 2.8% and about 11.8% along with pure Cr, Cr-III oxide (Cr2O2) and Cr carbide (Cr3C2) samples. (All concentrations were measured in %). The XANES spectra
indicate that the chemical state and the local environment around the absorbing Cr atoms remains essentially the same for Cr content higher than or comparable greater than or equal to 1.5%. In this concentration range, the XANES spectra of the films are reminiscent of Cr3C2 spectrum, and the high Cr concentrations yield nanocluster precipitates, similar to the situation encountered in Co-DLC and Ti-DLC systems. For low Cr concentrations (about 0.4% and about 0.1%), the local environment about Cr was significantly enhanced and reduced C and Cr coordination numbers, respectively. For instance, in the sample with about 0.4% Cr, each chromium atom has 6.6 ± 0.7 C and 2.0 ± 0.9 Cr neighbors, as compared to the respective numbers 4 and 11 for Cr3C2. This is consistent with a solid solution of Cr in C, with little clustering of Cr. Some clustering can not be excluded, because the strain created by the substitution of Cr for C yields an attractive interaction (Kanzaki forces) between the Cr atoms, similar to the situation encountered for gases in metals. Thus, clustering of chromium impurities typically occur for concentrations exceeding about 1.5%. However, uniform Cr distribution in C matrix at lower levels (about 6 %) and Cr-rich cluster formation at high doping levels of about 12% may occur.
Figure 2(b) depicts the Fourier-transformed EXAFS spectra of Cr-carbide and Cr- DLC films at the Cr K-edge, according to certain embodiments of the present invention. The spectra of the films with high Cr content (11.8 and 2.8%) show two peaks (1.5 and 2.1 A) corresponding to the two sub-shells (Cr...C and Cr...Cr) of the first coordination shell. The data also suggest a highly disordered (amorphous) structure with some short-range order because no significant features were observed above 2.6 A. Similar observations were made on these films by X-ray diffraction and low angle X-ray diffraction experiments. Further, the bond lengths are nearly the same for all films and similar to that of CπC2 powder (2.2 A for Cr-C and 2.7 A for Cr-Cr). Based on both valence band and core level photoemission more pronounced precipitation of carbide nanoclusters occurs at the surface than in the bulk, which is important for spintronics applications.
Figures 3 (a) and 3(b) show the magnetization curves of Cr-DLC films with about 3% chromium at 2OK and 10K, respectively, according to certain embodiments of the present invention. Superconducting Quantum Interference Device (SQUID) magnetometry was used to perform the magnetic measurements, which were performed with the magnetic field in the film plane. At low temperatures of about 10K, the curves show ferromagnetisms, but at higher temperatures (above 20K) the curves indicate compensated ferromagnetism. Constricted loops frequently occur in magnetically inhomogeneous systems and reflect a cluster-size distribution ranging from very few interatomic distances to about 10 nm.
Exchange interactions leading to Curie temperatures above 20 K are common in magnetic oxides and not surprising where the C 2p electrons strongly hybridize with the Cr 3d electrons. In fact, the strong overlap between 2p electron-orbitals in elements such as B, C, and O means that 2p moment created by transition-metal ions and other impurities couple relatively rigidly to neighboring 2p atoms. Relatively extended orbitals of this type occur in some oxides and Co doped semiconducting boron carbides.
The largely carbon-weighted photoemission features at 6 eV are enhanced at photon energies of about 39-44 eV, near the Cr 3p band (42 eV), and the chromium 3d bands are strongly hybridized to the carbon 2p. This hybridization provides for the low-temperature ferromagnetism of the dilute Cr-DLC. Below 12 K, the system exhibits ordinary hysteresis loops, with a coercivity of order 0.8 mT (8 Oe), but at somewhat elevated temperatures (above 20 K), the hysteresis loops are constricted (wasp-like).
Cr-DLC heterojunctions with silicon may be fabricated for spin-electronics applications. According to exemplary embodiments of the present invention, devices may be produced that include Cr-DLC films deposited on n-type silicon in which various concentrations of chromium act as a p-type dopant to the DLC films. According to certain embodiments of the present invention, such a heteroj unction device may have about 50% to about 150% increases in forward bias currents in a small magnetic field. According to further embodiments, Cr-doped hydrogenated diamond-like carbon and chromium carbide hydrogenated diamond-like carbon alloys are provided where, in the film embodiments of higher chromium concentration, a large coefficient of negative magneto-resistance is provided in heteroj unction devices with n-type silicon. Therefore, embodiments of the present invention may provide significant functionality over other conventional heterojunction diodes.
Figures 4(a) and 4(b) show the I-V curves for heterojunctions made with about 11% Cr and about 15% Cr content, respectively, with a changing applied magnetic field at room temperature, according to exemplary embodiments of the present invention. At lower doping levels, heterojunction diodes were made, but the capacitance was quite large and dominated the devices properties, consistent with amorphous carbon films on n-type silicon. As shown in Figures 3(a) and 3(b), good diode rectification may be obtained for about 11% to about 15% Cr doping. With a Cr doping concentration of about 20% or more, heterojunction diodes with n-type silicon may show very large relative leakage currents in reverse bias and increasingly resemble a 'bad' conventional resistor. The negative magnetoresistance of the I-V curve, which is ascribed to uncompensated spins at the surface
of the antiferromagnetic chromium-carbide clusters, indicates that embodiments of present invention are suitable for spin-electronics applications.
Figures 4(c) and 4(d) show the change in forward current as a function of the magnetic field, plotted for a forward bias of 2V, for Cr-DLC film to n-type silicon heteroj unction devices at about 11.0% Cr and 15.0% Cr, respectively, according to exemplary embodiments of the present invention. The heteroj unction diodes of n-type silicon and about 11% and about 15% Cr-doped DLC films as the p-type semiconductor have strong negative magnetoresistance with the forward bias current increasing with magnetic field, even at room temperature. At 2 V forward bias, the negative magneto- resistance may be as much as about 50% to about 100% in an applied magnetic field as small as 300 Oe. Due to magnetic ordering, the negative magnetoresistance saturates and shows little change at the higher applied magnetic fields. Accordingly, antiferromagnetic order creates uncompensated spins at the clusters' surfaces. These cluster macrospins interact with each other, since the clusters are particularly concentrated at the DLC film surface, with the magnetic field, and with an electric current.
Embodiments of the present invention apply to, but are not limited to the following applications of semiconductor spintronics:
• Quantum information technologies using spin as a qubit in solid state
• Medical applications
• Ferromagnetic semiconductors
• Magneto-optic devices
• Magneto-resistive devices
• Spin coherence
These applications, and others that utilize embodiments of Cr doped DLC film as a semiconductor spintronics material, will achieve the desired spintronics properties at room temperature in addition to below room temperatures.
While the embodiments are described with reference to various implementations and exploitations, it will be understood that these embodiments are illustrative and that the scope of the inventions is not limited to them. Many variations, modifications, additions, and improvements are possible. Further still, any steps described herein may be carried out in any desired order, and any desired steps may be added or deleted.
Claims
1. A heteroj unction for use in spin electronics applications, comprising: an n-type silicon semiconductor; and a hydrogenated diamond-like carbon film deposited on the n-type silicon semiconductor, wherein the hydrogenated diamond-like carbon film is doped with chromium; and wherein the concentration of chromium in the chromium doped diamond-like carbon film is configured such that the heteroj unction has an increase in forward bias current ranging from about 50% to about 150% in a small magnetic field at about room temperature and the heteroj unction has spin electronic properties at about room temperature.
2. A heteroj unction for use in spin electronics applications, comprising: an n-type silicon semiconductor; and a hydrogenated diamond-like carbon film deposited on the n-type silicon semiconductor, wherein the hydrogenated diamond-like carbon film is doped with chromium.
3. The heteroj unction of claim 2, wherein the concentration of chromium in the chromium doped diamond-like carbon film is from about 5% to about 20%.
4. The heteroj unction of claim 2, wherein the concentration of chromium in the chromium doped diamond-like carbon film is configured such that the heteroj unction has an increase in forward bias current ranging from about 50% to about 150% in a small magnetic field at room temperature.
5. The heterojunction of claim 4, wherein the small magnetic field is no greater than 3 kGauss.
6. The heteroj unction of claim 2, wherein the concentration of chromium in the chromium doped diamond-like carbon film is configured such that the heteroj unction has spin electronic properties at about room temperature.
7. A heterojunction for use in spin electronics applications, comprising: an n-type silicon semiconductor; and a chromium carbide hydrogenated diamond-like carbon alloy deposited on the n- type silicon semiconductor.
8. The heterojunction of claim 7, wherein the concentration of chromium in the chromium carbide hydrogenated diamond-like carbon alloy is from about 5% to about 20%.
9. The heterojunction of claim 7, wherein the chromium carbide hydrogenated diamond- like carbon alloy is configured such that the heterojunction has an increase in forward bias current ranging from about 50% to about 150% in a small magnetic field at room temperature.
10. The heterojunction of claim 9, wherein the small magnetic field is no greater than 3 kGauss.
11. A heterojunction for use in spin electronics applications, comprising: an n-type silicon semiconductor; and a metal containing hydrogenated diamond-like carbon film deposited on the n- type silicon semiconductor, wherein the metal is configured to act as a p-type dopant.
12. The heterojunction of claim 11, wherein the concentration of metal dopant in the metal containing diamond-like carbon film is configured such that the heterojunction has an increase in forward bias current ranging from about 50% to about 150% in a small magnetic field at room temperature.
13. The heterojunction of claim 12, wherein the small magnetic field is no greater than 3 kGauss.
14. The heterojunction of claim 11, wherein the concentration of metal dopant in the metal containing diamond-like carbon film is configured such that the heterojunction has spin electronic properties at about room temperature.
15. A method for making a heterojunction for use in spin electronics applications, comprising: using a hybrid plasma-assisted PVD/CVD to deposit the Cr-DLC films onto a Si(IOO) substrate, wherein Cr doping is achieved via magnetron sputtering from a Cr target (99.5% Cr) in an Ar/CH4 discharge with the substrate biased at -1000 V.
16. The method of claim 15, wherein the Cr content in the Cr-DLC is varied by operating the magnetron under current control and modulating the current between 100 mA and 350 mA.
17. An apparatus, comprising: a Cr-doped DLC film configured to have an adjustable bandgap, wherein the concentration of Cr in the Cr-doped DLC film is configured such that a change in the concentration of Cr yields a corresponding change in the DLC film bandgap; and a substrate.
18. The apparatus of claim 17, wherein the Cr concentration is from about 0.1% to about 20%.
19. The apparatus of claim 17, wherein the substrate includes at least one of a metal, a semiconductor and a doped semiconductor.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US19879008P | 2008-11-10 | 2008-11-10 | |
| US61/198,790 | 2008-11-10 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| WO2010053582A1 true WO2010053582A1 (en) | 2010-05-14 |
Family
ID=42153151
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| PCT/US2009/006047 Ceased WO2010053582A1 (en) | 2008-11-10 | 2009-11-10 | Chromium doped diamond-like carbon |
Country Status (2)
| Country | Link |
|---|---|
| US (1) | US20100224912A1 (en) |
| WO (1) | WO2010053582A1 (en) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US9548382B2 (en) | 2012-10-12 | 2017-01-17 | Northeastern University | Spintronic device |
| US9324938B2 (en) * | 2012-12-17 | 2016-04-26 | University Of North Texas | Boron carbide films exhibits extraordinary magnetoconductance and devices based thereon |
| DE102013207989A1 (en) * | 2013-04-30 | 2014-10-30 | Schunk Kohlenstofftechnik Gmbh | Method of coating articles |
| US11121302B2 (en) | 2018-10-11 | 2021-09-14 | SeeQC, Inc. | System and method for superconducting multi-chip module |
| CN110299446B (en) * | 2019-06-24 | 2021-03-26 | 华中科技大学 | Electric control magneton valve structure based on acoustic wave excitation |
| WO2022084519A1 (en) * | 2020-10-23 | 2022-04-28 | Université De Namur | Tunable multifunctional carbon-based coatings |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| NL267879A (en) * | 1960-09-26 | |||
| GB9206086D0 (en) * | 1992-03-20 | 1992-05-06 | Philips Electronics Uk Ltd | Manufacturing electronic devices comprising,e.g.tfts and mims |
-
2009
- 2009-11-10 WO PCT/US2009/006047 patent/WO2010053582A1/en not_active Ceased
- 2009-11-10 US US12/590,524 patent/US20100224912A1/en not_active Abandoned
Non-Patent Citations (5)
| Title |
|---|
| CHIBA ET AL.: "Magnetoresistance effect and interlayer coupling of (Ga,Mn)As trilayer structures", APPL. PHYS. LETT., vol. 77, no. 12, September 2000 (2000-09-01), pages 1873 - 1875 * |
| DLUZNIEWSKI ET AL.: "dc Conductivity of Metal/DLC/Si/Metal Heterostructures", IEEE TRANSACTIONS ON DIELECTRICS AND ELECTRICAL INSULATION, vol. 8, no. 3, June 2001 (2001-06-01), pages 418 - 421 * |
| KIM ET AL.: "Magnetic and Half-Metallic Properties of Cr-Doped Beta-SiC", IEEE TRANSACTIONS ON MAGNETICS, vol. 41, no. 10, October 2005 (2005-10-01), pages 2733 - 2735 * |
| SAITO ET AL.: "Magnetism in diamond-like carbon", SOLID STATE COMMUNICATIONS, vol. 136, September 2005 (2005-09-01), pages 546 - 549 * |
| SINGH ET AL.: "Cr-diamondlike carbon nanocomposite films: Synthesis, characterization and properties", THIN SOLID FILMS, vol. 489, October 2005 (2005-10-01), pages 150 - 158 * |
Also Published As
| Publication number | Publication date |
|---|---|
| US20100224912A1 (en) | 2010-09-09 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| An et al. | Highly flexible and twistable freestanding single crystalline magnetite film with robust magnetism | |
| Duan et al. | Beating the exclusion rule against the coexistence of robust luminescence and ferromagnetism in chalcogenide monolayers | |
| Kapilashrami et al. | Transition from ferromagnetism to diamagnetism in undoped ZnO thin films | |
| Inumaru et al. | Synthesis and characterization of superconducting β-Mo2N crystalline phase on a Si substrate: An application of pulsed laser deposition to nitride chemistry | |
| US20100224912A1 (en) | Chromium doped diamond-like carbon | |
| Sun et al. | Anisotropic magnetoresistance in room temperature ferromagnetic single crystal CrTe flake | |
| Guo et al. | Removal of the magnetic dead layer by geometric design | |
| Zeng et al. | Recent advances in high-entropy superconductors | |
| Bouzid et al. | Multiple Magnetic Phases in Van Der Waals Mn‐Doped SnS2 Semiconductor | |
| Schnabel et al. | Self‐assembled silicon nanocrystal arrays for photovoltaics | |
| Singh et al. | Highly conducting zinc oxide thin films achieved without postgrowth annealing | |
| Liu et al. | Emerging 2D cobalt telluride (CoxTey): From theory to applications | |
| Jiang et al. | Thickness-Tunable Growth of Composition-Controllable Two-Dimensional Fe x GeTe2 | |
| US12389805B2 (en) | Layered structure, magnetoresistive device using the same, and method of fabricating layered structure | |
| Jiao et al. | A room-temperature magnetic semiconductor from a Co-Fe-Nb-B metallic glass | |
| Gong et al. | Synthesis and structural characterizations of CrCoFeNiMn x (0≤ x≤ 1) high-entropy-alloy thin films by thermal reduction in hydrogen | |
| Lim et al. | Fabrication of graphene polyhedra: unveiling new structures, forms, and properties | |
| Zhou et al. | Graphene-passivated cobalt as a spin-polarized electrode: growth and application to organic spintronics | |
| Santana et al. | Magnetism of Cr-doped diamond-like carbon | |
| Du et al. | Effect of oxygen inclusion on microstructure and thermal stability of copper nitride thin films | |
| Gupt et al. | Structural, magnetic, and transport properties of Co2CrAl epitaxial thin film | |
| Jin et al. | Electric and magnetic properties of Cr-doped SiC films grown by dual ion beam sputtering deposition | |
| Kumar et al. | Structural and magnetic properties of co-sputtered Fe 0.8 C 0.2 thin films | |
| Zhang et al. | Chemical vapor deposition growth of high-quality 2D ultrathin hexagonal CoSb crystals | |
| Thomas et al. | Magnetic properties of ceramics from the pyrolysis of metallocene-based polymers doped with palladium |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| 121 | Ep: the epo has been informed by wipo that ep was designated in this application |
Ref document number: 09825138 Country of ref document: EP Kind code of ref document: A1 |
|
| NENP | Non-entry into the national phase |
Ref country code: DE |
|
| 122 | Ep: pct application non-entry in european phase |
Ref document number: 09825138 Country of ref document: EP Kind code of ref document: A1 |