WO2009131335A3 - 반도체 발광소자 - Google Patents

반도체 발광소자 Download PDF

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Publication number
WO2009131335A3
WO2009131335A3 PCT/KR2009/001992 KR2009001992W WO2009131335A3 WO 2009131335 A3 WO2009131335 A3 WO 2009131335A3 KR 2009001992 W KR2009001992 W KR 2009001992W WO 2009131335 A3 WO2009131335 A3 WO 2009131335A3
Authority
WO
WIPO (PCT)
Prior art keywords
emitting device
semiconductor light
semiconductor layer
primary
layer
Prior art date
Application number
PCT/KR2009/001992
Other languages
English (en)
French (fr)
Other versions
WO2009131335A2 (ko
Inventor
이상열
Original Assignee
엘지이노텍주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 엘지이노텍주식회사 filed Critical 엘지이노텍주식회사
Priority to CN2009801138976A priority Critical patent/CN102017195A/zh
Priority to JP2011506185A priority patent/JP2011519161A/ja
Priority to EP09734742A priority patent/EP2262010A4/en
Publication of WO2009131335A2 publication Critical patent/WO2009131335A2/ko
Publication of WO2009131335A3 publication Critical patent/WO2009131335A3/ko

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/36—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the electrodes
    • H01L33/38—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the electrodes with a particular shape
    • H01L33/385—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the electrodes with a particular shape the electrode extending at least partially onto a side surface of the semiconductor body
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/44—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the coatings, e.g. passivation layer or anti-reflective coating
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/005—Processes
    • H01L33/0093—Wafer bonding; Removal of the growth substrate

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Led Devices (AREA)
  • Electrodes Of Semiconductors (AREA)

Abstract

실시 예는 반도체 발광소자에 관한 것이다. 실시 예에 따른 반도체 발광소자는 제1도전형 반도체층; 상기 제1도전형 반도체층 아래에 활성층; 상기 활성층 아래에 제2도전형 반도체층; 상기 제2도전형 반도체층의 아래에 제2전극층; 상기 제2전극층의 일측 위에 절연막; 및 상기 절연막 위에 상기 제1도전형 반도체층의 일단에 전기적으로 연결된 제1전극을 포함한다.
PCT/KR2009/001992 2008-04-24 2009-04-16 반도체 발광소자 WO2009131335A2 (ko)

Priority Applications (3)

Application Number Priority Date Filing Date Title
CN2009801138976A CN102017195A (zh) 2008-04-24 2009-04-16 半导体发光器件
JP2011506185A JP2011519161A (ja) 2008-04-24 2009-04-16 半導体発光素子
EP09734742A EP2262010A4 (en) 2008-04-24 2009-04-16 SEMICONDUCTOR ELECTROLUMINESCENT DEVICE

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR1020080038117A KR100946523B1 (ko) 2008-04-24 2008-04-24 반도체 발광소자 및 그 제조방법
KR10-2008-0038117 2008-04-24

Publications (2)

Publication Number Publication Date
WO2009131335A2 WO2009131335A2 (ko) 2009-10-29
WO2009131335A3 true WO2009131335A3 (ko) 2010-01-21

Family

ID=41214125

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/KR2009/001992 WO2009131335A2 (ko) 2008-04-24 2009-04-16 반도체 발광소자

Country Status (7)

Country Link
US (2) US7973329B2 (ko)
EP (2) EP2262010A4 (ko)
JP (1) JP2011519161A (ko)
KR (1) KR100946523B1 (ko)
CN (1) CN102017195A (ko)
DE (1) DE202009018441U1 (ko)
WO (1) WO2009131335A2 (ko)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100946523B1 (ko) * 2008-04-24 2010-03-11 엘지이노텍 주식회사 반도체 발광소자 및 그 제조방법
KR101039999B1 (ko) * 2010-02-08 2011-06-09 엘지이노텍 주식회사 반도체 발광소자 및 그 제조방법
KR100986560B1 (ko) * 2010-02-11 2010-10-07 엘지이노텍 주식회사 발광소자 및 그 제조방법
KR101683583B1 (ko) * 2010-07-21 2016-12-07 엘지이노텍 주식회사 발광 소자
KR101689164B1 (ko) * 2010-07-21 2016-12-23 엘지이노텍 주식회사 발광소자
DE102010044986A1 (de) * 2010-09-10 2012-03-15 Osram Opto Semiconductors Gmbh Leuchtdiodenchip und Verfahren zur Herstellung eines Leuchtdiodenchips
KR101710889B1 (ko) * 2010-11-05 2017-02-28 엘지이노텍 주식회사 발광 소자
JP4989773B1 (ja) 2011-05-16 2012-08-01 株式会社東芝 半導体発光素子
DE102013107531A1 (de) * 2013-07-16 2015-01-22 Osram Opto Semiconductors Gmbh Optoelektronischer Halbleiterchip
KR102169826B1 (ko) * 2014-05-28 2020-10-27 엘지이노텍 주식회사 발광소자
TWI572025B (zh) * 2015-01-15 2017-02-21 財團法人工業技術研究院 半導體發光元件及其製作方法
US9721931B2 (en) 2015-01-15 2017-08-01 Industrial Technology Research Institute Semiconductor light emitting device and fabricating method thereof
US10354580B2 (en) 2017-09-07 2019-07-16 United Microelectronics Corp. Integrated LED display and fabrication method thereof
CN109888074B (zh) * 2019-01-31 2020-07-07 华灿光电（浙江）有限公司 发光二极管芯片及其制备方法

Citations (5)

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JPH11330622A (ja) * 1998-05-21 1999-11-30 Nichia Chem Ind Ltd 窒化物半導体素子
KR20050104750A (ko) * 2004-04-29 2005-11-03 주식회사 이츠웰 수직전극형 발광 다이오드 및 그 제조 방법
JP2006073619A (ja) * 2004-08-31 2006-03-16 Sharp Corp 窒化物系化合物半導体発光素子
JP2006278554A (ja) * 2005-03-28 2006-10-12 Tokyo Institute Of Technology ＡｌＧａＮ系深紫外発光素子およびその製造方法
JP2007110056A (ja) * 2005-09-13 2007-04-26 Showa Denko Kk 窒化物系半導体発光素子及びその製造方法

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JPH1093186A (ja) * 1996-09-17 1998-04-10 Nichia Chem Ind Ltd 窒化物半導体レーザ素子
JP3087831B2 (ja) * 1996-11-27 2000-09-11 日亜化学工業株式会社 窒化物半導体素子
DE59814431D1 (de) * 1997-09-29 2010-03-25 Osram Opto Semiconductors Gmbh Halbleiterlichtquelle und Verfahren zu ihrer Herstellung
DE10044500A1 (de) * 2000-09-08 2002-04-04 Highlink Technology Corp Chupe Licht emittierendes Verbindungshalbleiter-Bauteil und Verfahren zur Herstellung desselben
CN1220283C (zh) * 2001-04-23 2005-09-21 松下电工株式会社 使用led芯片的发光装置
TW518771B (en) * 2001-09-13 2003-01-21 United Epitaxy Co Ltd LED and the manufacturing method thereof
TW578318B (en) * 2002-12-31 2004-03-01 United Epitaxy Co Ltd Light emitting diode and method of making the same
US9368428B2 (en) * 2004-06-30 2016-06-14 Cree, Inc. Dielectric wafer level bonding with conductive feed-throughs for electrical connection and thermal management
US7679097B2 (en) * 2004-10-21 2010-03-16 Nichia Corporation Semiconductor light emitting device and method for manufacturing the same
JP4353167B2 (ja) * 2004-10-21 2009-10-28 日亜化学工業株式会社 半導体発光素子とその製造方法
US7256483B2 (en) * 2004-10-28 2007-08-14 Philips Lumileds Lighting Company, Llc Package-integrated thin film LED
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KR101316415B1 (ko) * 2005-10-17 2013-10-08 엘지이노텍 주식회사 질화물 반도체 발광소자 및 그 제조 방법
DE102007022947B4 (de) * 2007-04-26 2022-05-05 OSRAM Opto Semiconductors Gesellschaft mit beschränkter Haftung Optoelektronischer Halbleiterkörper und Verfahren zur Herstellung eines solchen
KR100946523B1 (ko) * 2008-04-24 2010-03-11 엘지이노텍 주식회사 반도체 발광소자 및 그 제조방법

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11330622A (ja) * 1998-05-21 1999-11-30 Nichia Chem Ind Ltd 窒化物半導体素子
KR20050104750A (ko) * 2004-04-29 2005-11-03 주식회사 이츠웰 수직전극형 발광 다이오드 및 그 제조 방법
JP2006073619A (ja) * 2004-08-31 2006-03-16 Sharp Corp 窒化物系化合物半導体発光素子
JP2006278554A (ja) * 2005-03-28 2006-10-12 Tokyo Institute Of Technology ＡｌＧａＮ系深紫外発光素子およびその製造方法
JP2007110056A (ja) * 2005-09-13 2007-04-26 Showa Denko Kk 窒化物系半導体発光素子及びその製造方法

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
See also references of EP2262010A4 *

Also Published As

Publication number Publication date
EP2262010A2 (en) 2010-12-15
JP2011519161A (ja) 2011-06-30
EP2657996A3 (en) 2014-03-05
EP2657996A2 (en) 2013-10-30
US7973329B2 (en) 2011-07-05
KR20090112308A (ko) 2009-10-28
US20090267106A1 (en) 2009-10-29
US20110284823A1 (en) 2011-11-24
CN102017195A (zh) 2011-04-13
DE202009018441U1 (de) 2011-09-06
KR100946523B1 (ko) 2010-03-11
US8492782B2 (en) 2013-07-23
WO2009131335A2 (ko) 2009-10-29
EP2262010A4 (en) 2011-09-14

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