WO2009126382A3 - Supercapacitors and methods of making and using same - Google Patents

Supercapacitors and methods of making and using same Download PDF

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Publication number
WO2009126382A3
WO2009126382A3 PCT/US2009/036184 US2009036184W WO2009126382A3 WO 2009126382 A3 WO2009126382 A3 WO 2009126382A3 US 2009036184 W US2009036184 W US 2009036184W WO 2009126382 A3 WO2009126382 A3 WO 2009126382A3
Authority
WO
WIPO (PCT)
Prior art keywords
improved
supercapacitors
making
methods
same
Prior art date
Application number
PCT/US2009/036184
Other languages
French (fr)
Other versions
WO2009126382A2 (en
Inventor
William Judson Ready
Original Assignee
Georgia Tech Research Corporation
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Georgia Tech Research Corporation filed Critical Georgia Tech Research Corporation
Publication of WO2009126382A2 publication Critical patent/WO2009126382A2/en
Publication of WO2009126382A3 publication Critical patent/WO2009126382A3/en

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof  ; Multistep manufacturing processes therefor
    • H01L29/02Semiconductor bodies ; Multistep manufacturing processes therefor
    • H01L29/06Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions
    • H01L29/0657Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions characterised by the shape of the body
    • H01L29/0665Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions characterised by the shape of the body the shape of the body defining a nanostructure
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B82NANOTECHNOLOGY
    • B82YSPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01GCAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES OR LIGHT-SENSITIVE DEVICES, OF THE ELECTROLYTIC TYPE
    • H01G11/00Hybrid capacitors, i.e. capacitors having different positive and negative electrodes; Electric double-layer [EDL] capacitors; Processes for the manufacture thereof or of parts thereof
    • H01G11/22Electrodes
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01GCAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES OR LIGHT-SENSITIVE DEVICES, OF THE ELECTROLYTIC TYPE
    • H01G11/00Hybrid capacitors, i.e. capacitors having different positive and negative electrodes; Electric double-layer [EDL] capacitors; Processes for the manufacture thereof or of parts thereof
    • H01G11/22Electrodes
    • H01G11/30Electrodes characterised by their material
    • H01G11/32Carbon-based
    • H01G11/36Nanostructures, e.g. nanofibres, nanotubes or fullerenes
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof  ; Multistep manufacturing processes therefor
    • H01L29/02Semiconductor bodies ; Multistep manufacturing processes therefor
    • H01L29/06Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions
    • H01L29/0657Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions characterised by the shape of the body
    • H01L29/0665Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions characterised by the shape of the body the shape of the body defining a nanostructure
    • H01L29/0669Nanowires or nanotubes
    • H01L29/0673Nanowires or nanotubes oriented parallel to a substrate
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof  ; Multistep manufacturing processes therefor
    • H01L29/40Electrodes ; Multistep manufacturing processes therefor
    • H01L29/43Electrodes ; Multistep manufacturing processes therefor characterised by the materials of which they are formed
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof  ; Multistep manufacturing processes therefor
    • H01L29/66Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/86Types of semiconductor device ; Multistep manufacturing processes therefor controllable only by variation of the electric current supplied, or only the electric potential applied, to one or more of the electrodes carrying the current to be rectified, amplified, oscillated or switched
    • H01L29/92Capacitors with potential-jump barrier or surface barrier
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E60/00Enabling technologies; Technologies with a potential or indirect contribution to GHG emissions mitigation
    • Y02E60/13Energy storage using capacitors

Abstract

Described herein are improved supercapacitor components and supercapacitors made from such components. Further described are methods of making and using the improved supercapacitor components and supercapacitors made therefrom. An improved electrolyte is formed from an ionic liquid. An improved electrode is formed from carbon nanotubes. A supercapacitor can include the improved electrolyte and/or the improved electrode.
PCT/US2009/036184 2008-03-05 2009-03-05 Supercapacitors and methods of making and using same WO2009126382A2 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US3398108P 2008-03-05 2008-03-05
US61/033,981 2008-03-05

Publications (2)

Publication Number Publication Date
WO2009126382A2 WO2009126382A2 (en) 2009-10-15
WO2009126382A3 true WO2009126382A3 (en) 2010-01-07

Family

ID=41162492

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2009/036184 WO2009126382A2 (en) 2008-03-05 2009-03-05 Supercapacitors and methods of making and using same

Country Status (1)

Country Link
WO (1) WO2009126382A2 (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20110205688A1 (en) * 2010-02-19 2011-08-25 Nthdegree Technologies Worldwide Inc. Multilayer Carbon Nanotube Capacitor
WO2015183762A1 (en) * 2014-05-24 2015-12-03 Georgia Tech Research Corporation Chip-scale embedded carbon nanotube electrochemical double layer supercapacitor
CN109599412B (en) * 2017-09-30 2020-09-08 清华大学 Photoelectric self-energy storage device

Citations (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20020008956A1 (en) * 1997-06-04 2002-01-24 Chun-Ming Niu Fibril composite electrode for electrochemical capacitors
US20020177039A1 (en) * 2000-12-23 2002-11-28 Wen Lu Long-lived conjugated polymer electrochemical devices incorporating ionic liquids
US20030026063A1 (en) * 1999-11-25 2003-02-06 Lithiun Power Technologies, Inc. Electrochemical capacitor and methods of fabricating same
US20060087797A1 (en) * 2004-10-22 2006-04-27 Matsushita Electric Industrial Co., Ltd. Electric double layer capacitor
US20070001220A1 (en) * 2004-09-16 2007-01-04 Atomate Corporation Nanotube Transistor and Rectifying Devices
US20070093678A1 (en) * 2005-10-26 2007-04-26 Teruo Umemoto Novel perfluoroalkanesulfonamide compounds
US20070237990A1 (en) * 2003-06-02 2007-10-11 Kh Chemicals Co., Ltd. Carbon nanotube electrode comprising sulfur or metal nanoparticles as a binder and process for preparing the same
US20080014443A1 (en) * 2004-11-11 2008-01-17 Board Of Regents, The University Of Texas System Method and apparatus for transferring an array of oriented carbon nanotubes
US20080027230A1 (en) * 2004-07-16 2008-01-31 Ignatyev Nikolai Mykola Process for the Preparation of Onium Salts Having a Low Chloride Content
US20080039342A1 (en) * 2005-01-07 2008-02-14 Combimatrix Corporation Process for transition metal-catalyzed electrochemical allylic alkylation on an electrode array device

Patent Citations (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20020008956A1 (en) * 1997-06-04 2002-01-24 Chun-Ming Niu Fibril composite electrode for electrochemical capacitors
US20030026063A1 (en) * 1999-11-25 2003-02-06 Lithiun Power Technologies, Inc. Electrochemical capacitor and methods of fabricating same
US20020177039A1 (en) * 2000-12-23 2002-11-28 Wen Lu Long-lived conjugated polymer electrochemical devices incorporating ionic liquids
US20070237990A1 (en) * 2003-06-02 2007-10-11 Kh Chemicals Co., Ltd. Carbon nanotube electrode comprising sulfur or metal nanoparticles as a binder and process for preparing the same
US20080027230A1 (en) * 2004-07-16 2008-01-31 Ignatyev Nikolai Mykola Process for the Preparation of Onium Salts Having a Low Chloride Content
US20070001220A1 (en) * 2004-09-16 2007-01-04 Atomate Corporation Nanotube Transistor and Rectifying Devices
US20060087797A1 (en) * 2004-10-22 2006-04-27 Matsushita Electric Industrial Co., Ltd. Electric double layer capacitor
US20080014443A1 (en) * 2004-11-11 2008-01-17 Board Of Regents, The University Of Texas System Method and apparatus for transferring an array of oriented carbon nanotubes
US20080039342A1 (en) * 2005-01-07 2008-02-14 Combimatrix Corporation Process for transition metal-catalyzed electrochemical allylic alkylation on an electrode array device
US20070093678A1 (en) * 2005-10-26 2007-04-26 Teruo Umemoto Novel perfluoroalkanesulfonamide compounds

Also Published As

Publication number Publication date
WO2009126382A2 (en) 2009-10-15

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