WO2009088177A2 - Silicon-based hardmask composition (si-soh; si-based spin-on hardmask) and process of producing semiconductor integrated circuit device using the same - Google Patents

Silicon-based hardmask composition (si-soh; si-based spin-on hardmask) and process of producing semiconductor integrated circuit device using the same Download PDF

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Publication number
WO2009088177A2
WO2009088177A2 PCT/KR2008/007886 KR2008007886W WO2009088177A2 WO 2009088177 A2 WO2009088177 A2 WO 2009088177A2 KR 2008007886 W KR2008007886 W KR 2008007886W WO 2009088177 A2 WO2009088177 A2 WO 2009088177A2
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Prior art keywords
group
hardmask
silicon
tetrabutylammonium
weight
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PCT/KR2008/007886
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French (fr)
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WO2009088177A3 (en
Inventor
Sang Kyun Kim
Hyeon Mo Cho
Sang Ran Koh
Mi Young Kim
Hui Chan Yun
Yong Jin Chung
Jong Seob Kim
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Cheil Industries Inc.
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Application filed by Cheil Industries Inc. filed Critical Cheil Industries Inc.
Priority to CN2008801244896A priority Critical patent/CN101910947B/en
Priority to EP08869469A priority patent/EP2229607A4/en
Priority to JP2010542157A priority patent/JP5378410B2/en
Publication of WO2009088177A2 publication Critical patent/WO2009088177A2/en
Publication of WO2009088177A3 publication Critical patent/WO2009088177A3/en
Priority to US12/805,081 priority patent/US8524851B2/en

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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
    • H01L21/3105—After-treatment
    • H01L21/311—Etching the insulating layers by chemical or physical means
    • H01L21/31144—Etching the insulating layers by chemical or physical means using masks
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/11—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/48—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule in which at least two but not all the silicon atoms are connected by linkages other than oxygen atoms
    • C08G77/50—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule in which at least two but not all the silicon atoms are connected by linkages other than oxygen atoms by carbon linkages
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/48—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule in which at least two but not all the silicon atoms are connected by linkages other than oxygen atoms
    • C08G77/50—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule in which at least two but not all the silicon atoms are connected by linkages other than oxygen atoms by carbon linkages
    • C08G77/52—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule in which at least two but not all the silicon atoms are connected by linkages other than oxygen atoms by carbon linkages containing aromatic rings
    • H—ELECTRICITY
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    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02107—Forming insulating materials on a substrate
    • H01L21/02109—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates
    • H01L21/02112—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer
    • H01L21/02123—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer the material containing silicon
    • H01L21/02126—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer the material containing silicon the material containing Si, O, and at least one of H, N, C, F, or other non-metal elements, e.g. SiOC, SiOC:H or SiONC
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02107—Forming insulating materials on a substrate
    • H01L21/02109—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates
    • H01L21/02205—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates the layer being characterised by the precursor material for deposition
    • H01L21/02208—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates the layer being characterised by the precursor material for deposition the precursor containing a compound comprising Si
    • H01L21/02214—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates the layer being characterised by the precursor material for deposition the precursor containing a compound comprising Si the compound comprising silicon and oxygen
    • H01L21/02216—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates the layer being characterised by the precursor material for deposition the precursor containing a compound comprising Si the compound comprising silicon and oxygen the compound being a molecule comprising at least one silicon-oxygen bond and the compound having hydrogen or an organic group attached to the silicon or oxygen, e.g. a siloxane
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02107—Forming insulating materials on a substrate
    • H01L21/02225—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer
    • H01L21/0226—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process
    • H01L21/02282—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process liquid deposition, e.g. spin-coating, sol-gel techniques, spray coating
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H01L21/033—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising inorganic layers
    • H01L21/0332—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising inorganic layers characterised by their composition, e.g. multilayer masks, materials
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H01L21/306—Chemical or electrical treatment, e.g. electrolytic etching
    • H01L21/308—Chemical or electrical treatment, e.g. electrolytic etching using masks
    • H01L21/3081—Chemical or electrical treatment, e.g. electrolytic etching using masks characterised by their composition, e.g. multilayer masks, materials
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
    • H01L21/312—Organic layers, e.g. photoresist
    • H01L21/3121—Layers comprising organo-silicon compounds
    • H01L21/3122—Layers comprising organo-silicon compounds layers comprising polysiloxane compounds
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
    • H01L21/3205—Deposition of non-insulating-, e.g. conductive- or resistive-, layers on insulating layers; After-treatment of these layers
    • H01L21/321—After treatment
    • H01L21/3213—Physical or chemical etching of the layers, e.g. to produce a patterned layer from a pre-deposited extensive layer
    • H01L21/32139—Physical or chemical etching of the layers, e.g. to produce a patterned layer from a pre-deposited extensive layer using masks
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04—Polysiloxanes
    • C08G77/14—Polysiloxanes containing silicon bound to oxygen-containing groups
    • C08G77/16—Polysiloxanes containing silicon bound to oxygen-containing groups to hydroxyl groups
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/70—Siloxanes defined by use of the MDTQ nomenclature

Definitions

  • SILICON-BASED HARDMASK COMPOSITION SI-SOH; SI- BASED SPIN-ON HARDMASK
  • the present invention relates to a silicon-based hardmask composition that can be applied by spin-on coating (hereinafter, also referred to a 'silicon-based spin-on hardmask composition'), a process for producing a semiconductor integrated circuit device using the hardmask composition, and a semiconductor integrated circuit produced using the process.
  • spin-on coating hereinafter, also referred to a 'silicon-based spin-on hardmask composition'
  • Hardmasks are materials featuring high etch selectivity.
  • a typical hardmask consists of two layers (see FIG. 1). Referring to FIG. 1, a carbon-based hardmask and a silicon-based hardmask are sequentially formed on a substrate, and a photoresist is coated on the silicon-based hardmask. Although the thickness of the photoresist is very small, a pattern of the thin photoresist can be easily transferred to the silicon-based hardmask because of higher etch selectivity of the silicon-based hardmask for the photoresist than for the substrate.
  • Etching of the carbon-based hardmask is performed using the patterned silicon-based hardmask as a mask to transfer the pattern to the carbon-based hardmask. Finally, etching of the substrate is performed using the patterned carbon-based hardmask as a mask to transfer the pattern to the substrate. Consequently, the substrate can be etched to a desired thickness despite the use of the thin photoresist.
  • hardmasks have been produced by chemical vapor deposition (CVD) in semiconductor manufacturing processes on an industrial scale.
  • CVD chemical vapor deposition
  • Such particles are embedded in hardmasks, making it difficult to detect.
  • the presence of particles is insignificant in a pattern with a large line width.
  • CVD is disadvantageous in view of its characteristics in that a long time and expensive equipment are required to produce hardmasks.
  • spin-on coating is advantageous in that it is easy to control the formation of particles, the processing time is short and existing coaters can be used, incurring no substantial additional investment costs.
  • a silicon-based hardmask material which is one of the aspects of the present invention, must have a sufficiently high silicon content in terms of etch selectivity.
  • an excessively high silicon content causes poor coatability and storage instability of the hardmask material. That is, it is difficult to find an optimum silicon content of the material suitable for mass production of hardmasks.
  • a failure in controlling the surface physical properties of the material may result in defects during coating with another material.
  • the present invention has been made in an effort to solve the above problems, and it is an object of the present invention to provide a silicon-based spin-on hardmask composition that has high etch selectivity and good storage stability and whose surface physical properties can be modified.
  • Another object of the present invention is to provide a process for producing a semiconductor integrated circuit device using the silicon-based hardmask composition.
  • a silicon- based spin-on hardmask composition which comprises a polysilsesquioxane, as a base resin, having terminal hydroxyl (-OH) and alkoxy (-OR) groups and containing linkers connecting two adjacent silicon atoms.
  • the silicon-based hardmask composition of the present invention comprises (a) an organosilane polymer represented by Formula 1 :
  • the hardmask composition of the present invention has good storage stability and can be used for the production of a hardmask with good etch resistance to O 2 plasma gas during etching.
  • the hardmask produced using the hardmask composition can easily transfer a pattern despite its very small thickness.
  • the surface hy- drophilicity of the hardmask is modified so that the compatibility of the hardmask with overlying and underlying films can be improved.
  • the hardmask can assist in accurately forming a photoresist pattern during exposure in semiconductor manufacturing processes due to its ability to absorb light.
  • high etch selectivity of the hardmask facilitates the transfer of a pattern of a thin photoresist layer to a desired substrate through the hardmask.
  • the hardmask whose surface physical properties can be modified can be easily coated with a thin photoresist or an anti-reflective coating (ARC).
  • FIG. 1 is a schematic cross-sectional view of a multilayer film consisting of a carbon- based hardmask, a silicon-based hardmask and a resist on a substrate;
  • FIG. 2 shows specific exemplary compounds of Formula 5
  • FIG. 3 shows specific exemplary compounds of Formula 7.
  • the present invention provides a silicon-based hardmask composition
  • a silicon-based hardmask composition comprising (a) an organosilane polymer represented by Formula 1 :
  • the organosilane polymer (a) may be a poly condensate of compounds represented by
  • R 1 is a C 1 -C 6 alkyl group, 0 ⁇ a ⁇ 3, and X is a C 6 -C 30 functional group containing at least one substituted or unsubstituted aromatic ring;
  • R 2 is a C 1 -C 6 alkyl group, 0 ⁇ b ⁇ 3, and R 3 is a C 1 -C 12 alkyl group;
  • R 4 and R 5 are independently a C 1 -C 6 alkyl group, 0 ⁇ c ⁇ 3, 0 ⁇ d ⁇ 3, and Y is a linking group selected from the group consisting of an aromatic ring, a substituted or unsubstituted linear or branched C 1 -C 20 alkylene group, a C 1 -C 20 alkylene group containing at least one aromatic or heterocyclic ring or having at least one urea or iso- cyanurate group in the backbone, and a C 2 -C 20 hydrocarbon group containing at least one multiple bond.
  • the organosilane polymer (a) may be prepared by poly condensation of hydrolysates of compounds represented by Formulae 5, 6 and 7:
  • X is a C 6 -C 30 functional group containing at least one substituted or unsubstituted aromatic ring, and R 1 is a C 1 -C 6 alkyl group;
  • R 2 is a C 1 -C 6 alkyl group and R 3 is a C 1 -C 12 alkyl group;
  • R 4 and R 5 are independently a C 1 -C 6 alkyl group
  • Y is a linking group selected from the group consisting of an aromatic ring, a substituted or unsubstituted linear or branched Ci-C 2O alkylene group, a Ci-C 2O alkylene group containing at least one aromatic or heterocyclic ring or having at least one urea or isocyanurate group in the backbone and a C 2 -C 20 hydrocarbon group containing at least one multiple bond, in the presence of an acid catalyst.
  • the organosilane polymer (a) may have a weight average molecular weight of 2,000 to 90,000.
  • the organosilane polymer may be prepared by mixing 0 to 90 parts by weight of the compound of Formula 5, 5 to 90 parts by weight of the compound of Formula 6 and 5 to 90 parts by weight of the compound of Formula 7 with respect to 100 parts by weight of the compounds of Formulae 5, 6 and 7, and allowing the mixture to react in the presence of 0.001 to 5 parts by weight of an acid catalyst in 100 to 900 parts by weight of a reaction solvent.
  • the acid catalyst may be selected from the group consisting of nitric acid, sulfuric acid, hydrochloric acid, p-toluenesulfonic acid monohydrate, diethyl sulfate, and combinations thereof.
  • the hydrolysis or condensation reaction can be suitably controlled by varying the kind, the amount and the addition mode of the acid catalyst.
  • the acid catalyst may be used in an amount of 0.001 and 5 parts by weight.
  • the use of the acid catalyst in an amount smaller than 0.001 parts by weight remarkably slows down the reaction rates, while the use of the acid catalyst in an amount larger than 5 parts by weight causes an excessive increase in the reaction rates, making it impossible to prepare a polycon- densation product having a desired molecular weight.
  • the reaction solvent may be selected from the group consisting of acetone, tetrahy- drofuran, benzene, toluene, diethyl ether, chloroform, dichloromethane, ethyl acetate, propylene glycol methyl ether, propylene glycol ethyl ether, propylene glycol propyl ether, propylene glycol methyl ether acetate, propylene glycol ethyl ether acetate, propylene glycol propyl ether acetate, ethyl lactate, ⁇ -butyrolactone, and mixtures thereof.
  • the compounds of Formulae 2, 3 and 4 may be prepared by hydrolysis of the compounds of Formulae 5, 6 and 7, respectively, in the presence of the acid catalyst.
  • the hardmask composition of the present invention exhibits excellent antire- flective properties.
  • the hardmask composition of the present invention has desired ab- sorbance and refractive index at a particular wavelength by controlling the number of the substituted or unsubstituted aromatic groups in the organosilane polymer. It is preferable to use the compound of Formula 5 in an amount of 0 to 90 parts by weight, based on 100 parts by weight of the compounds of Formulae 5, 6 and 7.
  • the antireflective properties of the hardmask composition are satisfactory due to the substituted or unsubstituted aromatic groups, thus avoiding the need to apply an additional antireflective coating.
  • an antireflective coating may be additionally used. If the compound of Formula 5 is not used (i.e. 0%), an additional antireflective coating may be necessary. Meanwhile, if the compound of Formula 5 is used in an amount exceeding 90 parts by weight, sufficient etch selectivity of the hardmask composition cannot be ensured due to the decreased Si content. Suitable antireflective properties can be attained by controlling the relative amount of the compound of Formula 5.
  • the storage stability of the hardmask composition may be impaired. Meanwhile, if the compound of Formula 6 is used in an amount of more than 90 parts by weight, the absorbance of the hardmask composition may be lowered.
  • the use of the compound of Formula 7 in an amount exceeding 90 parts by weight may cause a deterioration in the storage stability of the hardmask composition.
  • An increase in the relative amount of the compound of Formula 7 reduces the degree of freedom of the bonds due to the linkers present between the Si atoms to increase the number of the Si-OH groups exposed to the surface, rendering a thin film to be formed using the hardmask composition highly hy- drophilic. Consequently, the hydrophilicity of the hardmask can be controlled by varying the amount of the compound of Formula 7.
  • the hydrophilicity of the hardmask is an important factor in controlling the compatibility with a film overlying the hardmask.
  • the storage stability of the hardmask composition can be determined by varying the amount of the alkoxy groups in the final polycondensate, which is prepared by poly- condensation of hydrolysates of the compounds of Formulae 5, 6 and 7.
  • the amount of the alkoxy groups in the organosilane polymer is controlled to a maximum of 25 mol% relative to the repeating units of the polymer.
  • An increase in the amount of the alkoxy groups brings about an improvement in storage stability but causes poor coatability and solvent resistance, which render the quality of the coating non-uniform or make it difficult to coat another film on the hardmask.
  • the organosilane polymer (a) is preferably present in an amount of 1 to 50 parts by weight and more preferably 1 to 30 parts by weight, based on 100 parts by weight of the hardmask composition. Out of this range, poor coatability of the hardmask composition is caused.
  • solvents suitable for use in the hardmask composition of the present invention include acetone, tetrahydrofuran, benzene, toluene, diethyl ether, chloroform, dichloromethane, ethyl acetate, propylene glycol methyl ether, propylene glycol ethyl ether, propylene glycol propyl ether, propylene glycol methyl ether acetate (PGMEA), propylene glycol ethyl ether acetate, propylene glycol propyl ether acetate, ethyl lactate, and ⁇ -butyrolactone.
  • the solvent may be the same as or different from the reaction solvent.
  • the hardmask composition of the present invention may further comprise a crosslinking catalyst selected from the group consisting of sulfonic acid salts of organic bases, such as pyridinium p-toluenesulfonate, amidosulfobetain-16 and (-)-camphor-lO-sulfonic acid ammonium salt, ammonium formate, triethylammonium formate, trimethylammonium formate, tetramethylammonium formate, pyridinium formate, tetrabutylammonium formate, tetramethylammonium nitrate, tetrabuty- lammonium nitrate, tetrabutylammonium acetate, tetrabutylammonium azide, tetrabutylammonium benzoate, tetrabutylammonium bisulfate, tetrabutylammonium bromide, tetrabutyl
  • the crosslinking catalyst plays a role in promoting the crosslinking of the organosilane polymer to improve the etch resistance and solvent resistance of the hardmask.
  • the crosslinking catalyst is preferably used in an amount of 0.0001 to 0.01 parts by weight, based on 100 parts by weight of the organosilane polymer. The above effects are not expected if the crosslinking catalyst is used in an amount of less than 0.0001 parts by weight.
  • the storage stability of the hardmask composition is deteriorated if the crosslinking catalyst is used in an amount of more than 0.01 parts by weight.
  • the hardmask composition of the present invention may further comprise at least one additive selected from crosslinkers, radical stabilizers, and surfactants.
  • a combination of the additive and the crosslinking catalyst may be used in the hardmask composition of the present invention.
  • the present invention also provides a process for producing a semiconductor integrated circuit device using the hardmask composition.
  • the process comprises (a) forming a carbon-based hardmask layer on a substrate, (b) coating the hardmask composition on the carbon-based hardmask layer to form a silicon-based hardmask layer, (c) forming a photoresist layer on the silicon- based hardmask layer, (d) exposing portions of the photoresist layer to light from a light source through a mask, (e) selectively removing the exposed portions of the photoresist layer to form a pattern, (f) transferring the pattern to the silicon-based hardmask layer using the patterned photoresist layer as an etch mask to pattern the silicon-based hardmask layer, (g) transferring the pattern to the carbon-based hardmask layer using the patterned silicon-based hardmask layer as an etch mask to pattern the carbon-based hardmask layer, and (h) transferring the pattern to the substrate using the patterned carbon-based hardmask layer as an etch mask.
  • the process of the present invention may further comprise forming an antireflective coating on the silicon-based hardmask layer prior to step (c).
  • the process of the present invention can be carried out in accordance with the following procedure.
  • a material e.g., aluminum or silicon nitride (SiN)
  • the material may be any one of electrically conductive, semi-conductive, magnetic and insulating materials.
  • the hardmask composition of the present invention is spin-coated to a thickness of 500 to 4,000 A on the carbon-based hardmask layer and baked at 100-300 0 C for 10 seconds to 10 minutes to form a silicon-based hardmask layer. If needed, an antireflective coating (BARC) may be formed on the silicon-based hardmask layer.
  • BARC antireflective coating
  • a radiation-sensitive imaging layer (a photoresist layer) is formed on the silicon- based hardmask layer. Exposure and development are performed to form a pattern on the imaging layer. The exposed portions of the underlying layer are dry-etched using a gas mixture, typically CHF 3 /CF 4 , to form a pattern on the silicon-based hardmask layer. After the dry etching, the exposed portions of the carbon-based hardmask layer are etched using a gas mixture, such as BC1 3 /C1 2 , to pattern the carbon-based hardmask layer.
  • a gas mixture such as BC1 3 /C1 2
  • the exposed potions of the material layer are dry-etched using a gas mixture, such as CHF 3 /CF 4 , to pattern the material layer.
  • a plasma e.g., oxygen plasma
  • the process of the present invention can be applied to the fabrication of a semiconductor integrated circuit device.
  • the composition of the present invention and the resulting lithographic structure can be used in the fabrication and design of integrated circuit devices.
  • the composition of the present invention can be used in the formation of patterned material layer structures, such as metal wirings, holes for contacts and biases, insulating sections (e.g., damascene trenches (DTs) and shallow trench isolation (STI)), and trenches for capacitor structures.
  • patterned material layer structures such as metal wirings, holes for contacts and biases, insulating sections (e.g., damascene trenches (DTs) and shallow trench isolation (STI)
  • STI shallow trench isolation
  • the present invention is not restricted to any particular lithographic techniques and device structures.
  • Example 1 79 .2 79.1 79.4 79.5 79.0 79 2
  • Example 2 73.8 73.6 73.6 73.6 73 7 73 7
  • Example 3 71 5
  • 72 3 71 3 71 1 71 5
  • Example 1 1.62 0.10
  • Example 4 L73 020
  • Example 5 501 1.0 503
  • Example 6 502 1.0 503
  • Example 7 503 1.0 514
  • the normalized molecular weight refers to a value obtained by dividing the molecular weight of the corresponding polymer measured after 30 days of storage by the molecular weight of the polymer measured immediately after the preparation of the polymer.
  • the results in Table 3 show that the polymers having alkoxy (-OR) groups in the predetermined content range defined in the present invention were highly stable during storage. The more the amount of alkoxy groups, the less the changes in molecular weight and thickness after storage for the given time, indicating better storage stability.
  • Example 1 0.2 0.2
  • Example 2 0.2 0.2
  • Example 3 0.2 0.2
  • the patterns had vertical shapes after etching, indicating good etching characteristics of the specimens.
  • the results reveal that the silicon-based spin-on hardmask compositions can be actually used in semiconductor manufacturing processes.

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Abstract

A silicon-based hardmask composition is provided. The hardmask composition comprises (a) an organosilane polymer and (b) a solvent. The organosilane polymer is represented by Formula 1: { (SiO1.5- Y-SiO1.5)x(R3SiO1.5)y(XSiO1.5)z}(OH)e(OR6)f (1). In Formula 1, x, y and z represent the relative ratios of the repeating units (SiO1.5- Y-SiO1.5), (R3SiO1.5) and (XSiO1.5) in the polymer and satisfy the relations 0.05 ≤ x ≤ 0.9, 0.05 ≤ y ≤ 0.9, 0 ≤ z ≤ 0.9 and x + y + z = l; e and f represent the ratios of the numbers of the terminal -OH groups and -OR groups bonded to the silicon (Si) atoms to the number of the 2x+y+z silicon (Si) atoms in the polymer, respectively, and satisfy the relations 0.03 ≤ e ≤ 0.2 and 0.03 ≤ f ≤ 0.25; X is a C6-C30 functional group containing at least one substituted or unsubstituted aromatic ring; R3 is a C1-C6 alkyl group; Y is a linking group selected from the group consisting of an aromatic ring, a substituted or unsubstituted linear or branched C1-C20 alkylene group, a C1-C20 alkylene group containing at least one aromatic or heterocyclic ring or having at least one urea or isocyanurate group in the backbone, and a C2-C20 hydrocarbon group containing at least one multiple bond; and R6 is a C1-C6 alkyl group.

Description

Description
SILICON-BASED HARDMASK COMPOSITION (SI-SOH; SI- BASED SPIN-ON HARDMASK) AND PROCESS OF PRODUCING SEMICONDUCTOR INTEGRATED CIRCUIT
DEVICE USING THE SAME Technical Field
[1] The present invention relates to a silicon-based hardmask composition that can be applied by spin-on coating (hereinafter, also referred to a 'silicon-based spin-on hardmask composition'), a process for producing a semiconductor integrated circuit device using the hardmask composition, and a semiconductor integrated circuit produced using the process.
[2]
Background Art
[3] With decreasing width of lines used in semiconductor microcircuits, the use of photoresists with smaller thickness is required due to the aspect ratio of the patterns. However, too thin a photoresist suffers from difficulty in performing a role as a mask in a subsequent pattern transfer (i.e. etching) process. That is, since the thin photoresist is liable to be worn out during etching, an underlying substrate cannot be etched to a desired depth.
[4] To solve these problems, hardmask processes have been introduced. Hardmasks are materials featuring high etch selectivity. A typical hardmask consists of two layers (see FIG. 1). Referring to FIG. 1, a carbon-based hardmask and a silicon-based hardmask are sequentially formed on a substrate, and a photoresist is coated on the silicon-based hardmask. Although the thickness of the photoresist is very small, a pattern of the thin photoresist can be easily transferred to the silicon-based hardmask because of higher etch selectivity of the silicon-based hardmask for the photoresist than for the substrate. Etching of the carbon-based hardmask is performed using the patterned silicon-based hardmask as a mask to transfer the pattern to the carbon-based hardmask. Finally, etching of the substrate is performed using the patterned carbon-based hardmask as a mask to transfer the pattern to the substrate. Consequently, the substrate can be etched to a desired thickness despite the use of the thin photoresist.
[5] In general, hardmasks have been produced by chemical vapor deposition (CVD) in semiconductor manufacturing processes on an industrial scale. In most case, the formation of particles is inevitable during CVD. Such particles are embedded in hardmasks, making it difficult to detect. The presence of particles is insignificant in a pattern with a large line width. However, even a small amount of particles greatly affect the electrical properties of a final device with decreasing line width, causing difficulties in the mass production of the device. Further, CVD is disadvantageous in view of its characteristics in that a long time and expensive equipment are required to produce hardmasks.
[6] Under these circumstances, there is a need for hardmask materials that can be applied by spin-on coating. Spin-on coating is advantageous in that it is easy to control the formation of particles, the processing time is short and existing coaters can be used, incurring no substantial additional investment costs. However, there are several technical problems to be solved in order to prepare spin-on hardmask materials. For example, a silicon-based hardmask material, which is one of the aspects of the present invention, must have a sufficiently high silicon content in terms of etch selectivity. However, an excessively high silicon content causes poor coatability and storage instability of the hardmask material. That is, it is difficult to find an optimum silicon content of the material suitable for mass production of hardmasks. A failure in controlling the surface physical properties of the material may result in defects during coating with another material.
[7]
Disclosure of Invention
Technical Problem
[8] The present invention has been made in an effort to solve the above problems, and it is an object of the present invention to provide a silicon-based spin-on hardmask composition that has high etch selectivity and good storage stability and whose surface physical properties can be modified.
[9] Another object of the present invention is to provide a process for producing a semiconductor integrated circuit device using the silicon-based hardmask composition.
[10]
Technical Solution
[11] According to one embodiment of the present invention, there is provided a silicon- based spin-on hardmask composition which comprises a polysilsesquioxane, as a base resin, having terminal hydroxyl (-OH) and alkoxy (-OR) groups and containing linkers connecting two adjacent silicon atoms.
[12] Specifically, the silicon-based hardmask composition of the present invention comprises (a) an organosilane polymer represented by Formula 1 :
[13] ((SiO15-Y-SiO1 S)x(R3SiO15MXSiO1 S)J(OH)6(OR6Ml)
[14] wherein x, y and z represent the relative ratios of the repeating units (SiO1 5-Y-SiO1 5
), (R3SiO1 5) and (XSiO1 5) in the polymer and satisfy the relations 0.05 < x < 0.9, 0.05 < y < 0.9, 0 < z < 0.9 and x + y + z = l; e and f represent the ratios of the numbers of the terminal -OH groups and -OR groups bonded to the silicon (Si) atoms to the number of the 2x+y+z silicon (Si) atoms in the polymer, respectively, and satisfy the relations 0.03 < e < 0.2 and 0.03 < f < 0.25; X is a C6-C30 functional group containing at least one substituted or unsubstituted aromatic ring; R3 is a Ci-C6 alkyl group; Y is a linking group selected from the group consisting of an aromatic ring, a substituted or unsubstituted linear or branched Ci-C2O alkylene group, a Ci-C2O alkylene group containing at least one aromatic or heterocyclic ring or having at least one urea or iso- cyanurate group in the backbone, and a C2-C20 hydrocarbon group containing at least one multiple bond; and R6 is a Ci-C6 alkyl group, and
[15] (b) a solvent.
[16] According to another embodiment of the present invention, there is provided a process for producing a semiconductor integrated circuit device using the hardmask composition.
[17]
Advantageous Effects
[18] The hardmask composition of the present invention has good storage stability and can be used for the production of a hardmask with good etch resistance to O2 plasma gas during etching. The hardmask produced using the hardmask composition can easily transfer a pattern despite its very small thickness. In addition, the surface hy- drophilicity of the hardmask is modified so that the compatibility of the hardmask with overlying and underlying films can be improved. Furthermore, the hardmask can assist in accurately forming a photoresist pattern during exposure in semiconductor manufacturing processes due to its ability to absorb light.
[19] Particularly, high etch selectivity of the hardmask facilitates the transfer of a pattern of a thin photoresist layer to a desired substrate through the hardmask. Moreover, the hardmask whose surface physical properties can be modified can be easily coated with a thin photoresist or an anti-reflective coating (ARC).
[20]
Brief Description of Drawings
[21] FIG. 1 is a schematic cross-sectional view of a multilayer film consisting of a carbon- based hardmask, a silicon-based hardmask and a resist on a substrate;
[22] FIG. 2 shows specific exemplary compounds of Formula 5; and
[23] FIG. 3 shows specific exemplary compounds of Formula 7.
[24]
Best Mode for Carrying out the Invention
[25] The present invention provides a silicon-based hardmask composition comprising (a) an organosilane polymer represented by Formula 1 :
[26] ((SiO15-Y-SiO1 S)x(R3SiO15MXSiO1 S)J(OH)6(OR6Ml)
[27] wherein x, y and z represent the relative ratios of the repeating units (SiO1 5-Y-SiO1 5
), (R3SiO1 5) and (XSiO1 5) in the polymer and satisfy the relations 0.05 < x < 0.9, 0.05 < y < 0.9, 0 < z < 0.9 and x + y + z = l; e and f represent the ratios of the numbers of the terminal -OH groups and -OR groups bonded to the silicon (Si) atoms to the number of the 2x+y+z silicon (Si) atoms in the polymer, respectively, and satisfy the relations 0.03 < e < 0.2 and 0.03 < f < 0.25; X is a C6-C30 functional group containing at least one substituted or unsubstituted aromatic ring; R3 is a C1-C6 alkyl group; Y is a linking group selected from the group consisting of an aromatic ring, a substituted or unsubstituted linear or branched C1-C20 alkylene group, a C1-C20 alkylene group containing at least one aromatic or heterocyclic ring or having at least one urea or iso- cyanurate group in the backbone, and a C2-C20 hydrocarbon group containing at least one multiple bond; and R6 is a C1-C6 alkyl group, and
[28] (b) a solvent.
[29] The organosilane polymer (a) may be a poly condensate of compounds represented by
Formulae 2, 3 and 4:
[30] (HO)3(R1O)^3)Si-X (2)
[31] wherein R1 is a C1-C6 alkyl group, 0 < a < 3, and X is a C6-C30 functional group containing at least one substituted or unsubstituted aromatic ring;
[32] (HO)b(R2O)(3.b)Si-R3 (3)
[33] wherein R2 is a C1-C6 alkyl group, 0 < b < 3, and R3 is a C1-C12 alkyl group; and
[34] (HO)c(R4θ)(3-c)Si- Y-Si(OH)d(R5O)(3.d) (4)
[35] wherein R4 and R5 are independently a C1-C6 alkyl group, 0 < c < 3, 0 < d < 3, and Y is a linking group selected from the group consisting of an aromatic ring, a substituted or unsubstituted linear or branched C1-C20 alkylene group, a C1-C20 alkylene group containing at least one aromatic or heterocyclic ring or having at least one urea or iso- cyanurate group in the backbone, and a C2-C20 hydrocarbon group containing at least one multiple bond.
[36] The organosilane polymer (a) may be prepared by poly condensation of hydrolysates of compounds represented by Formulae 5, 6 and 7:
[37] (R1O)3Si-X (5)
[38] wherein X is a C6-C30 functional group containing at least one substituted or unsubstituted aromatic ring, and R1 is a C1-C6 alkyl group;
[39] (R2O)3Si-R3 (O)
[40] wherein R2 is a C1-C6 alkyl group and R3 is a C1-C12 alkyl group; and
[41] (R4O)3Si-Y-Si(OR5)3 (7)
[42] wherein R4 and R5 are independently a C1-C6 alkyl group, and Y is a linking group selected from the group consisting of an aromatic ring, a substituted or unsubstituted linear or branched Ci-C2O alkylene group, a Ci-C2O alkylene group containing at least one aromatic or heterocyclic ring or having at least one urea or isocyanurate group in the backbone and a C2-C20 hydrocarbon group containing at least one multiple bond, in the presence of an acid catalyst.
[43] The organosilane polymer (a) may have a weight average molecular weight of 2,000 to 90,000.
[44] Specific examples of the compounds of Formulae 5 and 7 are shown in FIGS. 2 and
3, respectively. (in FIG 2 and 3, Me=Methyl,
Figure imgf000006_0001
alkyl)
[45] The organosilane polymer may be prepared by mixing 0 to 90 parts by weight of the compound of Formula 5, 5 to 90 parts by weight of the compound of Formula 6 and 5 to 90 parts by weight of the compound of Formula 7 with respect to 100 parts by weight of the compounds of Formulae 5, 6 and 7, and allowing the mixture to react in the presence of 0.001 to 5 parts by weight of an acid catalyst in 100 to 900 parts by weight of a reaction solvent.
[46] The acid catalyst may be selected from the group consisting of nitric acid, sulfuric acid, hydrochloric acid, p-toluenesulfonic acid monohydrate, diethyl sulfate, and combinations thereof.
[47] The hydrolysis or condensation reaction can be suitably controlled by varying the kind, the amount and the addition mode of the acid catalyst. The acid catalyst may be used in an amount of 0.001 and 5 parts by weight. The use of the acid catalyst in an amount smaller than 0.001 parts by weight remarkably slows down the reaction rates, while the use of the acid catalyst in an amount larger than 5 parts by weight causes an excessive increase in the reaction rates, making it impossible to prepare a polycon- densation product having a desired molecular weight.
[48] The reaction solvent may be selected from the group consisting of acetone, tetrahy- drofuran, benzene, toluene, diethyl ether, chloroform, dichloromethane, ethyl acetate, propylene glycol methyl ether, propylene glycol ethyl ether, propylene glycol propyl ether, propylene glycol methyl ether acetate, propylene glycol ethyl ether acetate, propylene glycol propyl ether acetate, ethyl lactate, γ-butyrolactone, and mixtures thereof.
[49] The compounds of Formulae 2, 3 and 4 may be prepared by hydrolysis of the compounds of Formulae 5, 6 and 7, respectively, in the presence of the acid catalyst.
[50] Taking advantage of the ability of the substituted or unsubstituted aromatic group included in the compound of Formula 5 to absorb UV light in the deep UV (DUV) region, the hardmask composition of the present invention exhibits excellent antire- flective properties. The hardmask composition of the present invention has desired ab- sorbance and refractive index at a particular wavelength by controlling the number of the substituted or unsubstituted aromatic groups in the organosilane polymer. It is preferable to use the compound of Formula 5 in an amount of 0 to 90 parts by weight, based on 100 parts by weight of the compounds of Formulae 5, 6 and 7. When the compound of Formula 5 is used in an amount not greater than 90 parts by weight, the antireflective properties of the hardmask composition are satisfactory due to the substituted or unsubstituted aromatic groups, thus avoiding the need to apply an additional antireflective coating. For the purpose of achieving improved absorbance and photo profile of the hardmask composition, an antireflective coating may be additionally used. If the compound of Formula 5 is not used (i.e. 0%), an additional antireflective coating may be necessary. Meanwhile, if the compound of Formula 5 is used in an amount exceeding 90 parts by weight, sufficient etch selectivity of the hardmask composition cannot be ensured due to the decreased Si content. Suitable antireflective properties can be attained by controlling the relative amount of the compound of Formula 5.
[51] On the other hand, an increase in the relative amount of the compound of Formula 6 used leads to better storage stability of the hardmask composition. It is preferred to use the compound of Formula 6 in an amount of 5 to 90 parts by weight, based on 100 parts by weight of the compounds of Formulae 5, 6 and 7. If the compound of Formula
6 is used in an amount of less than 5 parts by weight, the storage stability of the hardmask composition may be impaired. Meanwhile, if the compound of Formula 6 is used in an amount of more than 90 parts by weight, the absorbance of the hardmask composition may be lowered.
[52] An increase in the relative content of the compound of Formula 7 leads to an improvement in the hydrophilicity of the hardmask composition. It is preferred to use the compound of Formula 7 in an amount of 5 to 90 parts by weight, based on 100 parts by weight of the compounds of Formulae 5, 6 and 7. The use of the compound of Formula
7 in an amount of less than 5 parts by weight cannot ensure effective modification of hydrophilicity. Meanwhile, the use of the compound of Formula 7 in an amount exceeding 90 parts by weight may cause a deterioration in the storage stability of the hardmask composition. An increase in the relative amount of the compound of Formula 7 reduces the degree of freedom of the bonds due to the linkers present between the Si atoms to increase the number of the Si-OH groups exposed to the surface, rendering a thin film to be formed using the hardmask composition highly hy- drophilic. Consequently, the hydrophilicity of the hardmask can be controlled by varying the amount of the compound of Formula 7. The hydrophilicity of the hardmask is an important factor in controlling the compatibility with a film overlying the hardmask.
[53] The storage stability of the hardmask composition can be determined by varying the amount of the alkoxy groups in the final polycondensate, which is prepared by poly- condensation of hydrolysates of the compounds of Formulae 5, 6 and 7. Preferably, the amount of the alkoxy groups in the organosilane polymer is controlled to a maximum of 25 mol% relative to the repeating units of the polymer. An increase in the amount of the alkoxy groups brings about an improvement in storage stability but causes poor coatability and solvent resistance, which render the quality of the coating non-uniform or make it difficult to coat another film on the hardmask.
[54] The organosilane polymer (a) is preferably present in an amount of 1 to 50 parts by weight and more preferably 1 to 30 parts by weight, based on 100 parts by weight of the hardmask composition. Out of this range, poor coatability of the hardmask composition is caused.
[55] Examples of solvents suitable for use in the hardmask composition of the present invention include acetone, tetrahydrofuran, benzene, toluene, diethyl ether, chloroform, dichloromethane, ethyl acetate, propylene glycol methyl ether, propylene glycol ethyl ether, propylene glycol propyl ether, propylene glycol methyl ether acetate (PGMEA), propylene glycol ethyl ether acetate, propylene glycol propyl ether acetate, ethyl lactate, and γ-butyrolactone. The solvent may be the same as or different from the reaction solvent.
[56] The hardmask composition of the present invention may further comprise a crosslinking catalyst selected from the group consisting of sulfonic acid salts of organic bases, such as pyridinium p-toluenesulfonate, amidosulfobetain-16 and (-)-camphor-lO-sulfonic acid ammonium salt, ammonium formate, triethylammonium formate, trimethylammonium formate, tetramethylammonium formate, pyridinium formate, tetrabutylammonium formate, tetramethylammonium nitrate, tetrabuty- lammonium nitrate, tetrabutylammonium acetate, tetrabutylammonium azide, tetrabutylammonium benzoate, tetrabutylammonium bisulfate, tetrabutylammonium bromide, tetrabutylammonium chloride, tetrabutylammonium cyanide, tetrabutylammonium fluoride, tetrabutylammonium iodide, tetrabutylammonium sulfate, tetrabutylammonium nitrite, tetrabutylammonium p-toluenesulfonate, tetrabutylammonium phosphate, and mixtures thereof. The crosslinking catalyst plays a role in promoting the crosslinking of the organosilane polymer to improve the etch resistance and solvent resistance of the hardmask. The crosslinking catalyst is preferably used in an amount of 0.0001 to 0.01 parts by weight, based on 100 parts by weight of the organosilane polymer. The above effects are not expected if the crosslinking catalyst is used in an amount of less than 0.0001 parts by weight. The storage stability of the hardmask composition is deteriorated if the crosslinking catalyst is used in an amount of more than 0.01 parts by weight.
[57] Optionally, the hardmask composition of the present invention may further comprise at least one additive selected from crosslinkers, radical stabilizers, and surfactants. A combination of the additive and the crosslinking catalyst may be used in the hardmask composition of the present invention.
[58] The present invention also provides a process for producing a semiconductor integrated circuit device using the hardmask composition.
[59] Specifically, the process comprises (a) forming a carbon-based hardmask layer on a substrate, (b) coating the hardmask composition on the carbon-based hardmask layer to form a silicon-based hardmask layer, (c) forming a photoresist layer on the silicon- based hardmask layer, (d) exposing portions of the photoresist layer to light from a light source through a mask, (e) selectively removing the exposed portions of the photoresist layer to form a pattern, (f) transferring the pattern to the silicon-based hardmask layer using the patterned photoresist layer as an etch mask to pattern the silicon-based hardmask layer, (g) transferring the pattern to the carbon-based hardmask layer using the patterned silicon-based hardmask layer as an etch mask to pattern the carbon-based hardmask layer, and (h) transferring the pattern to the substrate using the patterned carbon-based hardmask layer as an etch mask.
[60] The process of the present invention may further comprise forming an antireflective coating on the silicon-based hardmask layer prior to step (c).
[61] Specifically, the process of the present invention can be carried out in accordance with the following procedure. First, a material (e.g., aluminum or silicon nitride (SiN)) to be patterned is applied to a silicon substrate by any suitable technique. The material may be any one of electrically conductive, semi-conductive, magnetic and insulating materials.
[62] Subsequently, a carbon-based hardmask composition is spin-coated to a thickness of
500 to 4,000 A and baked at 100-3000C for 10 seconds to 10 minutes to form a carbon- based hardmask layer. Then, the hardmask composition of the present invention is spin-coated to a thickness of 500 to 4,000 A on the carbon-based hardmask layer and baked at 100-3000C for 10 seconds to 10 minutes to form a silicon-based hardmask layer. If needed, an antireflective coating (BARC) may be formed on the silicon-based hardmask layer.
[63] A radiation-sensitive imaging layer (a photoresist layer) is formed on the silicon- based hardmask layer. Exposure and development are performed to form a pattern on the imaging layer. The exposed portions of the underlying layer are dry-etched using a gas mixture, typically CHF3/CF4, to form a pattern on the silicon-based hardmask layer. After the dry etching, the exposed portions of the carbon-based hardmask layer are etched using a gas mixture, such as BC13/C12, to pattern the carbon-based hardmask layer.
[64] The exposed potions of the material layer are dry-etched using a gas mixture, such as CHF3/CF4, to pattern the material layer. A plasma (e.g., oxygen plasma) is used to remove the remaining material, leaving the patterned material layer only. The process of the present invention can be applied to the fabrication of a semiconductor integrated circuit device.
[65] Accordingly, the composition of the present invention and the resulting lithographic structure can be used in the fabrication and design of integrated circuit devices. For example, the composition of the present invention can be used in the formation of patterned material layer structures, such as metal wirings, holes for contacts and biases, insulating sections (e.g., damascene trenches (DTs) and shallow trench isolation (STI)), and trenches for capacitor structures. It should be appreciated that the present invention is not restricted to any particular lithographic techniques and device structures.
[66]
Mode for the Invention
[67] Hereinafter, the present invention will be explained in more detail with reference to the following examples. However, these examples are given for the purpose of illustration only and are not to be construed as limiting the scope of the invention.
[68]
[69] EXAMPLES
[70] [Example 1]
[71] 449.8g of methyltrimethoxysilane, 41.8g of phenyltrimethoxysilane and 138.4g of bis(triethoxysilyl)ethane were dissolved in 1,47Og of propylene glycol monomethyl ether acetate (PGMEA) in a 3-liter four-neck flask equipped with a mechanical agitator, a condenser, a dropping funnel and a nitrogen inlet tube. To the solution was added 162.5g of an aqueous nitric acid solution (1,000 ppm) at room temperature. After the mixture was allowed to react at 5O0C for 1 hour, methanol and ethanol were removed from the reaction mixture under reduced pressure. The reaction was continued for 5 days while maintaining the reaction temperature at 8O0C, yielding the silicone polymer of Formula 8: { (SiOi 5-CH2CH2-SiOi 5)010(MeSiOi 5)0846(PhSiOi 5)0054 } (OH)005(OMe)015(OEt)007 (8) (wherein Me, Et and Ph represent methyl, ethyl and phenyl, respectively).
[72] 2.Og of the polymer was diluted with 5Og of PGMEA and 0.002g of pyridinium p- toluenesulfonate was added thereto. The resulting solution was spin-coated on a silicon wafer, followed by baking at 24O0C for 60 seconds to form a 500 A thick film. [73]
[74] [Example 2]
[75] 265.4g of methyltrimethoxysilane, 28.9g of phenyltrimethoxysilane and 325.8g of bis(triethoxysilyl)ethane were dissolved in 1,47Og of propylene glycol monomethyl ether acetate (PGMEA) in a 3-liter four-neck flask equipped with a mechanical agitator, a condenser, a dropping funnel and a nitrogen inlet tube. To the solution was added 150.7g of an aqueous nitric acid solution (1,000 ppm) at room temperature. After the mixture was allowed to react at 5O0C for 1 hour, methanol and ethanol were removed from the reaction mixture under reduced pressure. The reaction was continued for 7 days while maintaining the reaction temperature at 5O0C, yielding the silicone polymer of Formula 9: ((SiO1 5-CH2CH2-SiO1 S)030(MeSiO1 S)0636(PhSiO1 5)0004 1(OH)006(OMe)013(OEt)009 (9) (wherein Me, Et and Ph represent methyl, ethyl and phenyl, respectively). [76] 2.Og of the polymer was diluted with 5Og of PGMEA and 0.002g of pyridinium p- toluenesulfonate was added thereto. The resulting solution was spin-coated on a silicon wafer, followed by baking at 24O0C for 60 seconds to form a 500 A thick film.
[77]
[78] [Example 3]
[79] 146.2g of methyltrimethoxysilane, 37.Og of phenyltrimethoxysilane and 446.8g of bis(triethoxysilyl)ethane were dissolved in 1,47Og of propylene glycol monomethyl ether acetate (PGMEA) in a 3-liter four-neck flask equipped with a mechanical agitator, a condenser, a dropping funnel and a nitrogen inlet tube. To the solution was added 143.Og of an aqueous nitric acid solution (1,000 ppm) at room temperature. After, the mixture was allowed to react at 5O0C for 1 hour, methanol and ethanol were removed from the reaction mixture under reduced pressure. The reaction was continued for 3 days while maintaining the reaction temperature at 5O0C, yielding the silicone polymer of Formula 10: { (SiO1 5-CH2CH2-SiO1 5)050(MeSiO1 S)0426(PhSiO1 5)0074 J(OH)004(OMe)010(OEt)0 12 (10) (wherein Me, Et and Ph represent methyl, ethyl and phenyl, respectively).
[80] 2.Og of the polymer was diluted with 5Og of PGMEA and 0.002g of pyridinium p- toluenesulfonate was added thereto. The resulting solution was spin-coated on a silicon wafer, followed by baking at 24O0C for 60 seconds to form a 500 A thick film.
[81]
[82] [Example 4]
[83] 271.4g of methyltrimethoxysilane, 58.5g of phenyltrimethoxysilane and 90. Ig of bis(triethoxysilyl)ethane were dissolved in 980g of propylene glycol monomethyl ether acetate (PGMEA) in a 2-liter four-neck flask equipped with a mechanical agitator, a condenser, a dropping funnel and a nitrogen inlet tube. To the solution was added 105.8g of an aqueous nitric acid solution (1,000 ppm) at room temperature. After the mixture was allowed to react at 5O0C for 1 hour, methanol and ethanol were removed from the reaction mixture under reduced pressure. The reaction was continued for 13 days while maintaining the reaction temperature at 8O0C, yielding the silicone polymer of Formula 11 : { (SiO1 5-CH2CH2-SiO1 5)0 !0(MeSiO1 5)07S4(PhSiO1 5)0116} (OH)006(OMe) 0 18(OEt)003 (11) (wherein Me, Et and Ph represent methyl, ethyl and phenyl, respectively). [84] 2.Og of the polymer was diluted with 5Og of PGMEA and 0.002g of pyridinium p- toluenesulfonate was added thereto. The resulting solution was spin-coated on a silicon wafer, followed by baking at 24O0C for 60 seconds to form a 500 A thick film.
[85]
[86] [Example 5]
[87] 136.4g of methyltrimethoxysilane, 49.7g of phenyltrimethoxysilane and 444.Og of bis(triethoxysilyl)ethane were dissolved in 1,47Og of propylene glycol monomethyl ether acetate (PGMEA) in a 3-liter four-neck flask equipped with a mechanical agitator, a condenser, a dropping funnel and a nitrogen inlet tube. To the solution was added 142. Ig of an aqueous nitric acid solution (1,000 ppm) at room temperature. After the mixture was allowed to react at 5O0C for 1 hour, methanol and ethanol were removed from the reaction mixture under reduced pressure. The reaction was continued for 7 days while maintaining the reaction temperature at 5O0C, yielding the silicone polymer of Formula 12: { (SiO15-CH2CH2-SiO1 5)050(MeSiO1 S)040(PhSiO1 5)0 10 1(OH)006(OMe)011(OEt)0 11 (12) (wherein Me, Et and Ph represent methyl, ethyl and phenyl, respectively).
[88] 2.Og of the polymer was diluted with 5Og of PGMEA and 0.002g of pyridinium p- toluenesulfonate was added thereto. The resulting solution was spin-coated on a silicon wafer, followed by baking at 24O0C for 60 seconds to form a 500 A thick film.
[89]
[90] [Example 6]
[91] 170.5g of methyltrimethoxysilane, 63.8g of phenyltrimethoxysilane and 570.8g of bis(triethoxysilyl)ethane were dissolved in 1,89Og of propylene glycol monomethyl ether acetate (PGMEA) in a 4-liter four-neck flask equipped with a mechanical agitator, a condenser, a dropping funnel and a nitrogen inlet tube. To the solution was added 260. Ig of an aqueous nitric acid solution (1,000 ppm) at room temperature. After the mixture was allowed to react at 5O0C for 1 hour, methanol and ethanol were removed from the reaction mixture under reduced pressure. The reaction was continued for 2 days while maintaining the reaction temperature at 5O0C, yielding the silicone polymer of Formula 13: ((SiO15-CH2CH2-SiO1 S)050(MeSiO1 S)0040(PhSiO1 5)0 10 1(OH)0 11(OMe)008(OEt)006 (13) (wherein Me, Et and Ph represent methyl, ethyl and phenyl, respectively).
[92] 2.Og of the polymer was diluted with 5Og of PGMEA and 0.002g of pyridinium p- toluenesulfonate was added thereto. The resulting solution was spin-coated on a silicon wafer, followed by baking at 24O0C for 60 seconds to form a 500 A thick film.
[93]
[94] [Example 7]
[95] 160.2g of methyltrimethoxysilane, 59. Ig of phenyltrimethoxysilane and 528.5g of bis(triethoxysilyl)ethane were dissolved in 1,75Og of propylene glycol monomethyl ether acetate (PGMEA) in a 4-liter four-neck flask equipped with a mechanical agitator, a condenser, a dropping funnel and a nitrogen inlet tube. To the solution was added 480.3g of an aqueous nitric acid solution (1,000 ppm) at room temperature. After the mixture was allowed to react at 5O0C for 1 hour, methanol and ethanol were removed from the reaction mixture under reduced pressure. The reaction was continued for 1 day while maintaining the reaction temperature at 5O0C, yielding the silicone polymer of Formula 14: ((SiO15-CH2CH2-SiO1 S)050(MeSiO1 S)004O(PhSiO15)010 1(OH)0 18(OMe)004(OEt)003 (14) (wherein Me, Et and Ph represent methyl, ethyl and phenyl, respectively).
[96] 2.Og of the polymer was diluted with 5Og of PGMEA and 0.002g of pyridinium p- toluenesulfonate was added thereto. The resulting solution was spin-coated on a silicon wafer, followed by baking at 24O0C for 60 seconds to form a 500 A thick film.
[97]
[98] [Experimental Example 1]
[99] The films formed in Examples 1-3 were measured for contact angle with water using a contact angle measurement system (Phoenix 300 plus, SEO). 10 μl of water was dropped onto the surface (five points) of each of the films. The angles between the surface of the film and the drops of water were measured. The results are shown in Table 1.
[100] Table 1
Contact angle Point K0) Point 2 (°) Point 3 (°) Point 4 (°) Point 5 (°) Average (°)
Example 1 79 .2 79.1 79.4 79.5 79.0 79 2 Example 2 73.8 73.6 73.6 73.6 73 7 73 7 Example 3 71 5 71 2 72 3 71 3 71 1 71 5
[101]
[102] The results of Table 1 demonstrate that polymers having desired surface characteristics can be readily synthesized by appropriately varying the feeding ratio of the compounds of Formulae 5-7. Particularly, as the proportion of the compound of Formula 7 in the polymers increased, the surface characteristics of the polymers were more hydrophilic.
[103]
[104] [Experimental Example 2]
[105] The films formed in Examples 1-4 were measured for refractive index (n) and extinction coefficient (k) using an Ellipsometer (J. A. Woollam). The results are shown in Table 2.
[106] Table 2
Sample used lor film formation Optical properties (193 nm) Refractive index (n) Extinction coefficient (k)
Example 1 1.62 0.10 Example 4 L73 020
[107]
[108] As can be seen from the results of Table 2, taking advantage of the ability of the substituted or unsubstituted aromatic groups included in the polymers to absorb UV light in the deep UV (DUV) bbo region, materials with excellent antireflective properties can be produced and the antireflective properties of the materials can be optimized by varying the contents of the compounds used.
[109]
[110] [Experimental Example 3]
[111] The solutions prepared in Examples 5-7 were tested for stability. The three solutions were stored at 4O0C for 30 days. The states of the solutions were observed and the thicknesses of the films after coating were measured. The results are shown in Table 3.
[H2] Table 3
Sample Befoie storage 30 davs aftei storage
Normalized Thickness (A) Normalized Thickness (A) molecular weight molecular weight
Example 5 501 1.0 503 Example 6 502 1.0 503 Example 7 503 1.0 514
[113]
[114] The normalized molecular weight refers to a value obtained by dividing the molecular weight of the corresponding polymer measured after 30 days of storage by the molecular weight of the polymer measured immediately after the preparation of the polymer. The results in Table 3 show that the polymers having alkoxy (-OR) groups in the predetermined content range defined in the present invention were highly stable during storage. The more the amount of alkoxy groups, the less the changes in molecular weight and thickness after storage for the given time, indicating better storage stability. These results lead to the conclusion that the storage stability of the solutions can be improved by varying the amount of alkoxy groups remaining after hydrolysis.
[115]
[116] [Experimental Example 4]
[117] An ArF photoresist was coated on each of the films formed in Examples 1-3, baked at 11O0C for 60 seconds, exposed to light using an ArF exposure system (ASML1250, FN70 5.0 active, NA 0.82), and developed with an aqueous solution of TMAH (2.38 wt%) to form an 80-nm line and space pattern. The exposure latitude (EL) margin of the pattern was measured as a function of exposure energy and the depth of focus (DoF) margin of the pattern was measured as a function of the distance from a light source. The results are recorded in Table 4. [118] Table 4
Sample used lor film formation Pattern properties EL (Δ mJ/exposure energy mJ) DoF (μm)
Example 1 0.2 0.2 Example 2 0.2 0.2 Example 3 0.2 0.2
[119]
[120] The patterns all showed good photo profiles in terms of EL margin and DoF margin.
The results demonstrate that the silicon-based spin-on hardmask compositions can be used actually used in semiconductor manufacturing processes. [121]
[ 122] [Experimental Example 5 ] [123] The patterned specimens obtained in Experimental Example 4 were sequentially dry- etched using CFx plasma, O2 plasma and CFx plasma. The remaining organic materials were completely removed using O2, and the cross sections of the etched specimens were observed by FE-SEM. The results are listed in Table 5.
[124] Table s
Sample lor film formation Pattern shape after etching
Example 1 Vertical
Example 2 Vertical
Example 3 Vertical
[125]
[126] The patterns had vertical shapes after etching, indicating good etching characteristics of the specimens. The results reveal that the silicon-based spin-on hardmask compositions can be actually used in semiconductor manufacturing processes.

Claims

Claims
[1] A silicon-based hardmask composition comprising
(a) an organosilane polymer represented by Formula 1 : ((SiO15-Y-SiO1 S)x(R3SiO1 5)y(XSi0i 5)z} (OH)6(OR6Ml) wherein x, y and z represent the relative ratios of the repeating units (SiO1 5 - Y-SiO1 5), (R3SiO1 5) and (XSiO1 5) in the polymer and satisfy the relations 0.05 < x < 0.9, 0.05 < y < 0.9, 0 < z < 0.9 and x + y + z = 1 ; e and f represent the ratios of the numbers of the terminal -OH groups and -OR groups bonded to the silicon (Si) atoms to the number of the 2x+y+z silicon (Si) atoms in the polymer, respectively, and satisfy the relations 0.03 < e < 0.2 and 0.03 < f < 0.25; X is a C6 - C30 functional group containing at least one substituted or unsubstituted aromatic ring; R3 is a C1-C6 alkyl group; Y is a linking group selected from the group consisting of an aromatic ring, a substituted or unsubstituted linear or branched C 1-C20 alkylene group, a C1-C2O alkylene group containing at least one aromatic or heterocyclic ring or having at least one urea or isocyanurate group in the backbone, and a C2-C2O hydrocarbon group containing at least one multiple bond; and R6 is a C1-C6 alkyl group, and
(b) a solvent.
[2] The hardmask composition of claim 1, wherein the organosilane polymer (a) is a polycondensate of compounds represented by Formulae 2, 3 and 4: (HO)8(R1O)O-8)Si-X (2) wherein R1 is a C1-C6 alkyl group, 0 < a < 3, and X is a C6-C30 functional group containing at least one substituted or unsubstituted aromatic ring; (HO)b(R2O)(3_b)Si-R3 (3) wherein R2 is a C1-C6 alkyl group, 0 < b < 3, and R3 is a C1-C12 alkyl group; and (HO)c(R4O)(3_c)Si-Y-Si(OH)d(R5O)(3_d) (4) wherein R4 and R5 are independently a C1-C6 alkyl group, 0 < c < 3, 0 < d < 3, and Y is a linking group selected from the group consisting of an aromatic ring, a substituted or unsubstituted linear or branched C1-C20 alkylene group, a C1-C20 alkylene group containing at least one aromatic or heterocyclic ring or having at least one urea or isocyanurate group in the backbone, and a C2-C20 hydrocarbon group containing at least one multiple bond.
[3] The hardmask composition of claim 1, wherein the organosilane polymer (a) is prepared by poly condensation of hydrolysates of compounds represented by Formulae 5, 6 and 7: (R1O)3Si-X (5) wherein X is a C6-C30 functional group containing at least one substituted or un- substituted aromatic ring, and R1 is a Ci-C6 alkyl group;
(R2O)3Si-R3 (6) wherein R2 is a Ci-C6 alkyl group and R3 is a Ci-Ci2 alkyl group; and
(R4O)3Si-Y-Si(OR5), (7) wherein R4 and R5 are independently a Ci-C6 alkyl group, and Y is a linking group selected from the group consisting of an aromatic ring, a substituted or un- substituted linear or branched Ci-C20 alkylene group, a Ci-C20 alkylene group containing at least one aromatic or heterocyclic ring or having at least one urea or isocyanurate group in the backbone and a C2-C20 hydrocarbon group containing at least one multiple bond, in the presence of an acid catalyst.
[4] The hardmask composition of claim 1, wherein the organosilane polymer (a) has a weight average molecular weight of 2,000 to 90,000.
[5] The hardmask composition of claim 3, wherein the organosilane polymer is prepared by mixing 0 to 90 parts by weight of the compound of Formula 5, 5 to 90 parts by weight of the compound of Formula 6 and 5 to 90 parts by weight of the compound of Formula 7 with respect to 100 parts by weight of the compounds of Formulae 5, 6 and 7, and allowing the mixture to react in the presence of 0.001 to 5 parts by weight of an acid catalyst.
[6] The hardmask composition of claim 3, wherein the acid catalyst is selected from the group consisting of nitric acid, sulfuric acid, hydrochloric acid, p- toluenesulfonic acid monohydrate, diethyl sulfate, and combinations thereof.
[7] The hardmask composition of claim 1, wherein the organosilane polymer (a) is present in an amount of 1 to 50 parts by weight, based on 100 parts by weight of the hardmask composition.
[8] The hardmask composition of claim 1, further comprising a compound selected from the group consisting of pyridinium p-toluenesulfonate, amidosulfobetain- 16, (-)-camphor-lO-sulfonic acid ammonium salt, ammonium formate, triethy- lammonium formate, trimethylammonium formate, tetramethylammonium formate, pyridinium formate, tetrabutylammonium formate, tetramethylammonium nitrate, tetrabutylammonium nitrate, tetrabutylammonium acetate, tetrabutylammonium azide, tetrabutylammonium benzoate, tetrabutylammonium bisulfate, tetrabutylammonium bromide, tetrabutylammonium chloride, tetrabutylammonium cyanide, tetrabutylammonium fluoride, tetrabutylammonium iodide, tetrabutylammonium sulfate, tetrabutylammonium nitrite, tetrabutylammonium p-toluenesulfonate, tetrabutylammonium phosphate, and mixtures thereof.
[9] The hardmask composition of claim 1, further comprising at least one additive selected from the group consisting of crosslinkers, radical stabilizers, and sur- factants.
[10] The hardmask composition of claim 8, further comprising at least one additive selected from the group consisting of crosslinkers, radical stabilizers, and surfactants.
[11] A process for producing a semiconductor integrated circuit device, the process comprising
(a) forming a carbon-based hardmask layer on a substrate,
(b) coating the hardmask composition according to any one of claims 1 to 10 on the carbon-based hardmask layer to form a silicon-based hardmask layer,
(c) forming a photoresist layer on the silicon-based hardmask layer,
(d) exposing portions of the photoresist layer to light from a light source through a mask,
(e) selectively removing the exposed portions of the photoresist layer to form a pattern,
(f) transferring the pattern to the silicon-based hardmask layer using the patterned photoresist layer as an etch mask to pattern the silicon-based hardmask layer,
(g) transferring the pattern to the carbon-based hardmask layer using the patterned silicon-based hardmask layer as an etch mask to pattern the carbon- based hardmask layer, and
(h) transferring the pattern to the substrate using the patterned carbon-based hardmask layer as an etch mask.
[12] The process of claim 11, further comprising forming an antireflective coating on the silicon-based hardmask layer prior to step (c).
PCT/KR2008/007886 2008-01-11 2008-12-31 Silicon-based hardmask composition (si-soh; si-based spin-on hardmask) and process of producing semiconductor integrated circuit device using the same WO2009088177A2 (en)

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012194216A (en) * 2011-03-15 2012-10-11 Shin Etsu Chem Co Ltd Patterning process and composition for forming silicon-containing film to be used for patterning process
US20120270143A1 (en) * 2009-12-30 2012-10-25 Hui-Chan Yun Resist underlayer composition and method of manufacturing semiconductor integrated circuit devices using the same

Families Citing this family (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5568892B2 (en) * 2009-05-01 2014-08-13 Ｊｓｒ株式会社 Negative radiation sensitive composition, cured pattern forming method, and cured pattern
KR101344795B1 (en) * 2009-12-31 2013-12-26 제일모직주식회사 Resist underlayer composition and Process of Producing Integrated Circuit Devices Using the Same
KR101344794B1 (en) 2009-12-31 2014-01-16 제일모직주식회사 Aromatic ring-containing polymer for resist　underlayer　and　resist underlayer composition　including　same
RU2013117118A (en) 2010-09-16 2014-10-27 Спекмет, Инк. METHOD, PROCESS, AND TECHNOLOGY OF PRODUCTION OF HIGH-PERFORMANCE INEXPENSIVE CRYSTAL SILICON SOLAR ELEMENTS
KR101423171B1 (en) 2010-12-30 2014-07-25 제일모직 주식회사 Hardmask composition and method of forming patterns and semiconductor integrated circuit device including the patterns
KR101506998B1 (en) * 2011-12-30 2015-03-31 제일모직 주식회사 Resist underlayer composition and process for producing integrated circuit device using same
US9761449B2 (en) 2013-12-30 2017-09-12 Taiwan Semiconductor Manufacturing Company, Ltd. Gap filling materials and methods
US9362120B2 (en) 2014-03-31 2016-06-07 Taiwan Semiconductor Manufacturing Company, Ltd. Lithography process and composition with de-crosslinkable crosslink material
KR101688012B1 (en) * 2014-04-04 2016-12-21 제일모직 주식회사 Resist underlayer composition, thin film structure including the composition, and integrated circuit device including the thin film structure
US10619097B2 (en) 2014-06-30 2020-04-14 Specmat, Inc. Low-[HF] room temperature wet chemical growth (RTWCG) chemical formulation
KR101520793B1 (en) * 2014-08-28 2015-05-18 엘티씨 (주) Photo-sensitive poly silsesquinoxane resin compositions with high heat resistance
WO2017111870A1 (en) * 2015-12-24 2017-06-29 Intel Corporation Selective hard mask processing based on low-valency group iv heterocyclic precursors
TWI587093B (en) * 2016-04-11 2017-06-11 台灣積體電路製造股份有限公司 Trilayer photoresist structure and method for manufacturing the same
US10410883B2 (en) * 2016-06-01 2019-09-10 Corning Incorporated Articles and methods of forming vias in substrates
US10794679B2 (en) 2016-06-29 2020-10-06 Corning Incorporated Method and system for measuring geometric parameters of through holes
TWI742160B (en) * 2016-09-30 2021-10-11 美商道康寧公司 Bridged silicone resin, film, electronic device and related methods
CN106601670B (en) * 2016-12-30 2019-11-22 上海集成电路研发中心有限公司 Organic antireflection layer containing inorganic matter does the process of double-pattern hard mask
US10580725B2 (en) 2017-05-25 2020-03-03 Corning Incorporated Articles having vias with geometry attributes and methods for fabricating the same
US11078112B2 (en) 2017-05-25 2021-08-03 Corning Incorporated Silica-containing substrates with vias having an axially variable sidewall taper and methods for forming the same
US10186424B2 (en) 2017-06-14 2019-01-22 Rohm And Haas Electronic Materials Llc Silicon-based hardmask
KR102456578B1 (en) 2017-07-14 2022-10-20 삼성전자주식회사 Hardmask composition, method of manufacturing the same and method of forming patterned layer using hardmask composition
US11554984B2 (en) 2018-02-22 2023-01-17 Corning Incorporated Alkali-free borosilicate glasses with low post-HF etch roughness
CN113314400A (en) 2020-02-27 2021-08-27 长鑫存储技术有限公司 Semiconductor device and method for manufacturing the same

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002299441A (en) 2001-03-30 2002-10-11 Jsr Corp Method of forming dual damascene structure
AU2002354487A1 (en) * 2001-12-14 2003-06-30 Asahi Kasei Kabushiki Kaisha Coating composition for forming low-refractive index thin layers
TW200307709A (en) * 2002-02-19 2003-12-16 Honeywell Int Inc Organosiloxanes
JP2004274020A (en) * 2002-09-24 2004-09-30 Rohm & Haas Electronic Materials Llc Manufacture of electronic device
US7148263B2 (en) * 2004-07-14 2006-12-12 Honeywell International Inc. Hybrid inorganic/organic low k dielectric films with improved mechanical strength
EP1632956A1 (en) * 2004-09-07 2006-03-08 Rohm and Haas Electronic Materials, L.L.C. Compositions comprising an organic polysilica and an arylgroup-capped polyol, and methods for preparing porous organic polysilica films
JP4860953B2 (en) * 2005-07-08 2012-01-25 富士通株式会社 Silica-based film forming material, silica-based film and manufacturing method thereof, multilayer wiring and manufacturing method thereof, and semiconductor device and manufacturing method thereof
EP1762895B1 (en) * 2005-08-29 2016-02-24 Rohm and Haas Electronic Materials, L.L.C. Antireflective Hard Mask Compositions
US7879526B2 (en) 2005-12-26 2011-02-01 Cheil Industries, Inc. Hardmask compositions for resist underlayer films
KR100861176B1 (en) * 2006-01-02 2008-09-30 주식회사 하이닉스반도체 Inorganic Hardmask Composition and method for manufacturing semiconductor device using the same
US7629260B2 (en) * 2006-03-22 2009-12-08 Cheil Industries, Inc. Organosilane hardmask compositions and methods of producing semiconductor devices using the same
KR100909384B1 (en) * 2006-06-26 2009-07-24 제일모직주식회사 Hard mask composition for resist underlayer film and manufacturing method of semiconductor integrated circuit device using same
KR100796047B1 (en) * 2006-11-21 2008-01-21 제일모직주식회사 Hardmask composition coated under photoresist, process of producing integrated circuit devices using the same and semiconductor device produced by the process
KR100813850B1 (en) * 2007-03-29 2008-03-17 삼성에스디아이 주식회사 Light emitting device

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
See references of EP2229607A4 *

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20120270143A1 (en) * 2009-12-30 2012-10-25 Hui-Chan Yun Resist underlayer composition and method of manufacturing semiconductor integrated circuit devices using the same
JP2012194216A (en) * 2011-03-15 2012-10-11 Shin Etsu Chem Co Ltd Patterning process and composition for forming silicon-containing film to be used for patterning process
US8835102B2 (en) 2011-03-15 2014-09-16 Shin-Etsu Chemical Co., Ltd. Patterning process and composition for forming silicon-containing film usable therefor
US8951711B2 (en) 2011-03-15 2015-02-10 Shin-Etsu Chemical Co., Ltd. Patterning process and composition for forming silicon-containing film usable therefor

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