WO2009058405A1 - Methods of preparing clusterboron - Google Patents

Methods of preparing clusterboron Download PDF

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Publication number
WO2009058405A1
WO2009058405A1 PCT/US2008/012469 US2008012469W WO2009058405A1 WO 2009058405 A1 WO2009058405 A1 WO 2009058405A1 US 2008012469 W US2008012469 W US 2008012469W WO 2009058405 A1 WO2009058405 A1 WO 2009058405A1
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Prior art keywords
solvent
acid
produce
contacting
filtration
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PCT/US2008/012469
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French (fr)
Inventor
Kevin S. Cook
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Semequip, Inc.
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Publication date
Application filed by Semequip, Inc. filed Critical Semequip, Inc.
Priority to US12/741,198 priority Critical patent/US8623309B2/en
Priority to EP08845116.6A priority patent/EP2205525B1/en
Priority to JP2010532072A priority patent/JP5710974B2/en
Priority to CN200880114578A priority patent/CN101848856A/en
Publication of WO2009058405A1 publication Critical patent/WO2009058405A1/en

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    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B6/00Hydrides of metals including fully or partially hydrided metals, alloys or intermetallic compounds ; Compounds containing at least one metal-hydrogen bond, e.g. (GeH3)2S, SiH GeH; Monoborane or diborane; Addition complexes thereof
    • C01B6/06Hydrides of aluminium, gallium, indium, thallium, germanium, tin, lead, arsenic, antimony, bismuth or polonium; Monoborane; Diborane; Addition complexes thereof
    • C01B6/10Monoborane; Diborane; Addition complexes thereof
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B35/00Boron; Compounds thereof
    • C01B35/02Boron; Borides
    • C01B35/023Boron

Definitions

  • the invention provides methods for synthesizing Bi 8 H 22 as a mixture of syn and anti isomers, commonly marketed as ClusterBoron.
  • the invention further provides isotopically enriched Bi 8 H 22 prepared by the aforementioned methods.
  • the invention relates the preparation of natural abundance Bi 8 H 22 , 10 B- enriched Bi 8 H 22 and ⁇ B-enriched Bi 8 H 22 .
  • boron hydride compounds have become important feed stocks for boron doped P-type impurity regions in semiconductor manufacture. More particularly, high molecular weight boron hydride compounds, e.g., boron hydride compounds comprising at least a five (5) boron atom cluster, are preferred boron atom feed stocks for molecular boron implantation.
  • Scaling is driven by continuous advances in lithographic process methods, allowing the definition of smaller and smaller features in the semiconductor substrate which contains the integrated circuits.
  • a generally accepted scaling theory has been developed to guide chip manufacturers in the appropriate resize of all aspects of the semiconductor device design at the same time, i.e., at each technology or scaling node.
  • the greatest impact of scaling on ion implantation processes is the scaling of junction depths, which requires increasingly shallow junctions as the device dimensions are decreased. This requirement for increasingly shallow junctions as integrated circuit technology scales translates into the following requirement: ion implantation energies must be reduced with each scaling step.
  • the extremely shallow junctions called for by modern, sub-0.13 micron devices are termed "Ultra-Shallow Junctions" or USJs.
  • boron doped P -type junctions have been hampered by difficulty in controlling the ion-implantation process using boron.
  • Boron clusters or cages e.g., boranes have been investigated as a feed stock for delivering molecular boron species to a semiconductor substrate with reduced penetration. See PCT/US03/20197.
  • boron hydride compounds that is boron compounds having between 5 and about 100 boron atoms are preferred for use in molecular ion implantation methods for delivering boron atoms to a semiconductor substrate.
  • two or more structurally related boron hydride compounds having the same number of boron atoms but different numbers of hydrogen atoms have been isolated for various sized boron clusters.
  • pentaborane(9) and pentaborane(l 1) have chemical formulas Of B 5 H 9 and B 5 Hn respectively.
  • Such compounds are frequently classified as closo (B n H n ), «/do(B n H n+2 ), arachno (B n H n+4 ), hypho (B n H n+6 ), conjuncto (B n H n+8 ), and the like.
  • different boron hydride species including isomers and compounds containing various amounts of hydrogen, are frequently known for boron hydrides having n boron atoms. Jemmis, et al. have provided a review of various macropolyhedral boranes and known compounds having n boron atoms and various amounts of hydrogen. ' ' 2
  • the invention is particularly useful for facile synthesis and purification of large quantities Of B] 8 H 22 .
  • the present invention also relates to isotopically-enriched Bi 8 H 22 .
  • enriched means the modification of the boron isotopes natural abundance.
  • natural abundance of the 10 B isotope ranges from 19.10 % to 20.31 % and natural abundance of the 1 1 B isotope ranges from 80.90 % to 79.69 %.
  • a typical Bj 8 H 22 molecular ion beam contains a wide range of ion masses due to a varying number of hydrogen losses from the molecular ion as well as the varying mass due to the two naturally occurring isotopes.
  • mass selection is possible in an implanter device used in semiconductor manufacture, use of isotopically enriched boron in Bi 8 H 22 can greatly reduce the spread of masses, thereby providing an increased beam current of the desired implantation species.
  • B and B isotopically-enriched Bj 8 H 22 is also of great interest.
  • the invention provides methods for synthesizing octadecaborane
  • (Bi 8 H 22 ) which methods suitably comprise: (a) contacting the borane anion Bi 0 HiO 2" with an oxidizing agent to produce B 20 Hi 8 2" ; and (b) contacting the borane anion B 20 Hi 8 2" with acid to produce H 2 B 20 Hi 8 *xH 2 O.
  • the invention provides methods for synthesizing octadecaborane (Bi 8 H 22 ), which methods suitably comprise (a)contacting the borane anion Bi 0 Hi 0 2" with an oxidizing agent to produce B 20 Hi 8 2" ; (b) contacting the borane anion B 20 Hi 8 2" with acid to produce H 2 B 20 Hi 8 »xH 2 O; and (c) separating insoluble byproducts from the reaction mixture.
  • the invention provides synthesizing Bi 8 H 22 by methods comprising the steps of:
  • Preferred methods of the invention are suitable to prepare isotopically pure
  • Bi 8 H 22 and mixtures of structural isomers Of Bi 8 H 22 are mixtures of structural isomers Of Bi 8 H 22 . That is, the method of the invention, provide Bi 8 H 22 capable of generating a suitable molecular ion beam for ion implantation and high purity Bi 8 H 22 for use in other applications.
  • a solution Of Bi 0 Hi 0 2" is reacted in solution with an oxidant in a cage-coupling oxidation to form B 20 Hi 8 2" .
  • Preferred oxidants form stable species on reduction that do not significantly react with the B 20 Hi 8 produced.
  • Possible oxidizing agents include inorganic metal reagents or organic oxidants with a standard reduction potential of E 0 > 0 V.
  • solvents are mixtures in which the Bi 0 HiO 2" salt is soluble but not destroyed and B 20 H i 8 2" salt is insoluble but not destroyed. These solvents may include water, alcohols, nitriles, ethers, sulfones, and the like.
  • the Bi 8 H 22 precursor H 2 B 20 H ig»xH 2 O is produced in situ by contacting the
  • B 20 H) 8 2" salt with acid in a chemically inert solvent and water Preferred acids have a pKa ⁇ 2.0 and should not be destructive to any reaction starting materials, intermediates or B] 8 H 22 .
  • Preferred acids may include mineral acids such as sulfuric acid, nitric acid, phosphoric acid, hydrochloric acid, hydrobromic acid, hydroiodic acid as well as organic acids such as sulfonic acids, halogenated acetic acids, and oxalic acids.
  • Bi 8 H 22 is formed from H 2 B 20 Hi 8 ⁇ xH 2 O with the simultaneous or subsequent removal of water from the system.
  • conditions conducive to removal of water from the hydrated hydronium ion salt, H 2 B 20 H] 8 *xH 2 O are also suitable to induce partial hydronium ion degradation.
  • preferred degradation conditions include the use of Dean Stark trap, moisture traps, moisture scavengers or contacting the hydrated hydronium salt with one or more drying agents. Drying agents may include, but are not limited to molecular sieves, phosphorus pentoxide, alumina, silica, silicates and the like, or a combination thereof.
  • Reaction solvents should not cause degradation or show significant reactivity to Bi 8 H 22 or any starting materials or intermediates produced during the course of the reaction. These may include, but are not limited to aromatic and arene solvents, alkane solvents, ethers, sulfones, esters, and the like. Reaction temperatures to promote water removal from the system range from 0 0 C to about 250 0 C.
  • the invention provides for the synthesis of Bi 8 H 22 by methods comprising the steps of:
  • the invention provides for the synthesis of
  • the methods of synthesis which provide Bi 8 H 22 in high isolated yield (>50%) and with few synthetic procedures, are suitable for use in preparing isotopically enriched Bi 8 H 22 , e.g., the isotopic concentration of 10 B or 1 IB is greater than natural abundance.
  • Preparation of isotopically enriched, 10 B or 11 B, Bj 8 H 22 is practical using the invention synthesis methods due to the limited number of synthetic steps, mass efficiency, and high overall synthetic yield (>65 % from B 20 Hi 8 2" ).
  • Figure 2 shows use of a reaction set-up according to a preferred process of the invention.
  • the present includes methods of synthesizing octadecaborane (Bi 8 H 22 ), comprising:
  • solvent e.g. is water, alcohols, nitriles, ethers, sulfones, arenes, aliphatic hydrocarbons, and combinations thereof
  • acid preferably a molar excess of acid, with suitable acids including organic and inorganic acids having a pKa of less than about 2 e.g. p-toluene sulfonic acid
  • the oxidizing agent preferably has a standard reduction potential of E 0 > 0 V. More particularly, the oxidizing agent suitably may be an inorganic salt with standard reduction potential of E 0 > 0 V.
  • the oxidizing agent also may be an iron(III) salt.
  • the oxidizing agent suitably may be an organometallic compound with a standard reduction potential of E 0 > 0 V.
  • the oxidizing agent also suitably may be an organic oxidant with a standard reduction potential of E 0 > 0 V.
  • Preferred oxidizing agents include iron(IIl) salts.
  • Suitable solvents in step (c) of the above method include wherein the solvent is a mixture of aqueous and non-aqueous solvents, and suitable non-aqueous solvents may be suitably selected from the group consisting of alcohols, nitriles, ethers, arenes, aliphatic hydrocarbons and combinations thereof, more preferably hexanes, toluene, xylenes or a combination thereof, and suitably wherein the non-aqueous solvent comprises between about 1 % and about 99% by volume of the total solvent component, suitably with the solvent component comprising between about 1% and 99% water by volume based on total volume of the solvent component.
  • suitable non-aqueous solvents may be suitably selected from the group consisting of alcohols, nitriles, ethers, arenes, aliphatic hydrocarbons and combinations thereof, more preferably hexanes, toluene, xylenes or a combination thereof, and suitably wherein the non-aqueous solvent comprises
  • the Bi 0 Hi 0 2" salt may be suitably an alkyl ammonium salt with a cation formula of [NR 1 R 2 R 3 R 4 ]*, wherein
  • R 1 , R 2 , and R 3 are independently selected from the group consisting of hydrogen, Ci -20 alkyl, C 6- i 0 aryl, C 7- ioaralkyl, or any two of R 1 , R 2 , or R 3 taken in combination form a heterocyclic ring; and
  • R 4 is selected from hydrogen, Ci -20 alkyl, or C 6- ioaryl
  • the B 20 Hi 8 2" salt may be suitably an alkyl ammonium salt with a cation formula of [NR 1 R 2 R 3 R 4 J + , wherein
  • R 1 , R , and R 3 are independently selected from the group consisting of hydrogen, Ci -20 alkyl, C 6- i 0 aryl, C 7- i 0 aralkyl, or any two of R , R , or R taken in combination form a heterocyclic ring; and
  • R 4 is selected from hydrogen, Ci -20 alkyl, or C 6- i 0 aryl;
  • the B 20 Hi 8 2" salt may be suitably an inorganic salt.
  • Suitable solvents in step (a) of the above method include wherein the solvent is a mixture of aqueous and non-aqueous solvents, and suitable non-aqueous solvents may be suitably selected from the group consisting of alcohols, nitriles, ethers, arenes, aliphatic hydrocarbons and combinations thereof, more preferably hexanes, toluene, xylenes or a combination thereof, and suitably wherein the non-aqueous solvent comprises between about 1% and about 99% by volume of the total solvent component, suitably with the solvent component comprising between about 1 % and 99% water by volume based on total volume of the solvent component.
  • water may be removed from the reaction mixture by a variety of methods including e.g.
  • a Dean-Stark trap can be preferred such as illustrated in Figure 2.
  • a method of synthesizing octadecaborane (Bi 8 H 22 ) is provided, the method comprising:
  • a method of synthesizing octadecaborane (Bi 8 H 22 ) is provided, the method comprising:
  • the isotopic concentration of 10 B atoms suitably may be greater than the natural abundance, e.g. wherein at least about 50% of the boron atoms present in the product Bi 8 H 22 are 10 B, or wherein at least about 80% of the boron atoms present in the product Bi 8 H 22 are 10 B, or wherein at least about 90% of the boron atoms present in the product B) 8 H 22 are 10 B, or wherein at least about 95% of the boron atoms present in the product Bi 8 H 22 are 10 B, or wherein at least about 99% of the boron atoms present in the product Bi 8 H 22 are 10 B.
  • the isotopic concentration of 11 B atoms suitably may be greater than the natural abundance, e.g. wherein at least about 90% of the boron atoms present in the product Bi 8 H 22 are 11 B, or wherein at least about 95% of the boron atoms present in the product Bi 8 H 22 are ' 1 B, or wherein at least about 99% of the boron atoms present in the product Bj 8 H 22 are 11 B.
  • Figure 1 of the drawings also depicts a specifically preferred method of the invention.
  • the toluene layer is separated from any oils present, washed with water (3 x 200 mL), dried over MgSO 4 and concentrated to dryness to give a light yellow powder.
  • the powder is extracted with 1 L of hexanes and any insolubles are removed by filtration.
  • the hexane solution is removed to leave white to off-white Bi 8 H 22 (16.8 g, 50.6 %).

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Abstract

The invention provides new methods for synthesis of ClusterBoron (B18H22). Preferred methods of the invention include in situ generation of the conjugate acid of B20H182- and degradation of the acid in solution to produce B18H22 in high yields and high purity. The invention further provides isotopically enriched boranes, particularly isotopically enriched 10B)18H22 and 11B18H22.

Description

METHODS OF PREPARING CLUSTERBORON
The present application claims the benefit of U.S. provisional application number 61/001682 filed November 2, 2007, which is incorporated by reference herein in its entirety.
BACKGROUND
1. Field of the Invention.
The invention provides methods for synthesizing Bi8H22 as a mixture of syn and anti isomers, commonly marketed as ClusterBoron. The invention further provides isotopically enriched Bi8H22 prepared by the aforementioned methods. In particular, the invention relates the preparation of natural abundance Bi8H22, 10B- enriched Bi8H22 and πB-enriched Bi8H22.
2. Background.
Large boron hydride compounds have become important feed stocks for boron doped P-type impurity regions in semiconductor manufacture. More particularly, high molecular weight boron hydride compounds, e.g., boron hydride compounds comprising at least a five (5) boron atom cluster, are preferred boron atom feed stocks for molecular boron implantation.
An important aspect of modern semiconductor technology is the continuous development of smaller and faster devices. This process is called scaling. Scaling is driven by continuous advances in lithographic process methods, allowing the definition of smaller and smaller features in the semiconductor substrate which contains the integrated circuits. A generally accepted scaling theory has been developed to guide chip manufacturers in the appropriate resize of all aspects of the semiconductor device design at the same time, i.e., at each technology or scaling node. The greatest impact of scaling on ion implantation processes is the scaling of junction depths, which requires increasingly shallow junctions as the device dimensions are decreased. This requirement for increasingly shallow junctions as integrated circuit technology scales translates into the following requirement: ion implantation energies must be reduced with each scaling step. The extremely shallow junctions called for by modern, sub-0.13 micron devices are termed "Ultra-Shallow Junctions" or USJs.
Methods of manufacturing boron doped P -type junctions have been hampered by difficulty in controlling the ion-implantation process using boron. The single boron atom, being light (MW =10.8), can penetrate too deeply into a silicon substrate and diffuse throughout the substrate lattice rapidly during annealing or other elevated temperature processes.
Boron clusters or cages, e.g., boranes have been investigated as a feed stock for delivering molecular boron species to a semiconductor substrate with reduced penetration. See PCT/US03/20197.
Large boron hydride compounds, that is boron compounds having between 5 and about 100 boron atoms are preferred for use in molecular ion implantation methods for delivering boron atoms to a semiconductor substrate. Typically, there may be isomers of the boron hydride compound that exist. That is, boron hydrides with the same number of boron and hydrogen atoms that possess different chemical properties, e.g. structural isomers or stereoisomers. In addition, two or more structurally related boron hydride compounds having the same number of boron atoms but different numbers of hydrogen atoms have been isolated for various sized boron clusters. For example, pentaborane(9) and pentaborane(l 1) have chemical formulas Of B5H9 and B5Hn respectively. Such compounds are frequently classified as closo (BnHn), «/do(BnHn+2), arachno (BnHn+4), hypho (BnHn+6), conjuncto (BnHn+8), and the like. Thus, different boron hydride species, including isomers and compounds containing various amounts of hydrogen, are frequently known for boron hydrides having n boron atoms. Jemmis, et al. have provided a review of various macropolyhedral boranes and known compounds having n boron atoms and various amounts of hydrogen. ' ' 2
Mixtures of isomers and mixtures of n-boron atom containing boron hydrides are suitable for use in the implantation methods discussed. The molecular ions generated by the ionization process of boron hydride mixtures will have uniform and narrow weight distributions.
Current synthetic technologies for the preparation of large boron hydride molecules, e.g., boron hydride molecules with more than 12 boron atoms, are often plagued by complicated synthetic processes, low isolated yields, and/or inconsistent reproducibility.
Although there are several synthetic routes reported in the literature for the preparation Of Bi8H22 as a mixture of isomers, they are lengthy, often result in notably low yields, are unreliable and have safety issues associated with the synthesis.
It thus would be desirable to have new methods for preparation Of Bi8H22.
SUMMARY
We have now discovered new methods for the preparation of octadecaborane, B18H22. The invention is particularly useful for facile synthesis and purification of large quantities Of B]8H22. The present invention also relates to isotopically-enriched Bi8H22. Whereas, by definition, enriched means the modification of the boron isotopes natural abundance. Depending on source natural abundance of the 10B isotope ranges from 19.10 % to 20.31 % and natural abundance of the 1 1B isotope ranges from 80.90 % to 79.69 %.
A typical Bj8H22 molecular ion beam contains a wide range of ion masses due to a varying number of hydrogen losses from the molecular ion as well as the varying mass due to the two naturally occurring isotopes. As mass selection is possible in an implanter device used in semiconductor manufacture, use of isotopically enriched boron in Bi8H22 can greatly reduce the spread of masses, thereby providing an increased beam current of the desired implantation species. Thus, B and B isotopically-enriched Bj8H22 is also of great interest.
In one aspect, the invention provides methods for synthesizing octadecaborane
(Bi8H22), which methods suitably comprise: (a) contacting the borane anion Bi0HiO2" with an oxidizing agent to produce B20Hi8 2"; and (b) contacting the borane anion B20Hi8 2" with acid to produce H2B20Hi8*xH2O.
In a further aspect, the invention provides methods for synthesizing octadecaborane (Bi8H22), which methods suitably comprise (a)contacting the borane anion Bi0Hi0 2" with an oxidizing agent to produce B20Hi8 2"; (b) contacting the borane anion B20Hi8 2" with acid to produce H2B20Hi8»xH2O; and (c) separating insoluble byproducts from the reaction mixture.
In certain aspects the invention provides synthesizing Bi8H22 by methods comprising the steps of:
(a) contacting the borane anion B I0Hi0 2" in solvent with an oxidizing cage- coupling agent to produce B20Hi8 2" in situ; (b) washing of the B20Hi8 2" such as to remove byproducts
(c) contacting the borane anion B20H]8 2" in solvent and water with acid, preferably a molar excess thereof, to produce H2B20H i8»xH2O in situ;
(d) removing water from the reaction vessel, preferably in the presence of a Bj8H22 solubilizing solvent that remains essentially chemically inert in the system; (e) separating insoluble byproducts from the reaction mixture through (i) filtration and/or (ii) concentration of reaction solvent, dissolution Of Bj8H22 into aliphatic solvent and filtration of byproducts; (f) isolation of B 18H22 such as through removal of solvent.
Preferred methods of the invention are suitable to prepare isotopically pure
Bi8H22 and mixtures of structural isomers Of Bi8H22. That is, the method of the invention, provide Bi8H22 capable of generating a suitable molecular ion beam for ion implantation and high purity Bi8H22 for use in other applications.
In some aspects of the invention, a solution Of Bi0Hi0 2" is reacted in solution with an oxidant in a cage-coupling oxidation to form B20Hi8 2". Preferred oxidants form stable species on reduction that do not significantly react with the B20Hi8 produced. Possible oxidizing agents include inorganic metal reagents or organic oxidants with a standard reduction potential of E0 > 0 V. These may include Sn(IV), Fe(III), Cu(II), Mn(VII), Ag(I), Mn(IV), Cr(VI), Cl2, Br2, Hg(I), Hg(II), Au(III), Ce(IV), Pb(IV), Co(III), F2, 12, O3, hydrogen peroxide, organic peroxides, or organometallic compounds. Preferred solvents are mixtures in which the Bi0HiO2" salt is soluble but not destroyed and B20H i8 2" salt is insoluble but not destroyed. These solvents may include water, alcohols, nitriles, ethers, sulfones, and the like.
The Bi8H22 precursor H2B20H ig»xH2O is produced in situ by contacting the
B20H)8 2" salt with acid in a chemically inert solvent and water. Preferred acids have a pKa < 2.0 and should not be destructive to any reaction starting materials, intermediates or B]8H22. These may include mineral acids such as sulfuric acid, nitric acid, phosphoric acid, hydrochloric acid, hydrobromic acid, hydroiodic acid as well as organic acids such as sulfonic acids, halogenated acetic acids, and oxalic acids.
Bi8H22 is formed from H2B20Hi8^xH2O with the simultaneous or subsequent removal of water from the system. Although not wishing to be bound by theory, conditions conducive to removal of water from the hydrated hydronium ion salt, H2B20H]8*xH2O (where x is a positive real number), are also suitable to induce partial hydronium ion degradation. Typically, preferred degradation conditions include the use of Dean Stark trap, moisture traps, moisture scavengers or contacting the hydrated hydronium salt with one or more drying agents. Drying agents may include, but are not limited to molecular sieves, phosphorus pentoxide, alumina, silica, silicates and the like, or a combination thereof. Reaction solvents should not cause degradation or show significant reactivity to Bi8H22 or any starting materials or intermediates produced during the course of the reaction. These may include, but are not limited to aromatic and arene solvents, alkane solvents, ethers, sulfones, esters, and the like. Reaction temperatures to promote water removal from the system range from 0 0C to about 250 0C.
In a preferred aspect, the invention provides for the synthesis of Bi8H22 by methods comprising the steps of:
(a) contacting an ammonium salt Of Bi0Hi0 2" in acidic water (pH < 2.0) with FeCl3 at reflux to produce B20H)8 2";
(b) washing of the B20H)8 2" with water such as to remove byproducts; (c) contacting the borane anion B20H )8 2" in toluene and water with 5-40 molar equivalents ofp-toluenesulfonic acid to produce H2B20Hi 8*xH2O in situ;
(d) removing water from the reaction vessel such as in the presence of a hot toluene (90 °C to 120 °C) and through the use of a Dean Stark moisture trap;
(e) separating insoluble byproducts from the reaction mixture through filtration; (f) removal or concentration of toluene to leave crude Bj8H22 that is contaminated with boric acid and borates;
(g) dissolution of crude Bi8H22 into hexanes and filtration of insolubles;
(h) removal of hexanes to isolate B)8H22.
In yet another preferred aspect, the invention provides for the synthesis of
B 18h22 by methods comprising the steps of:
(c) contacting the borane anion B20H)8 2" in toluene and water with 5-40 molar equivalents of/?-toluenesulfonic acid to produce H2B20H ig»xH2O in situ;
(d) removing water from the reaction vessel such a sin the presence of a hot toluene (90 °C to 120 0C) such as through the use of a Dean Stark moisture trap;
(e) separating insoluble byproducts from the reaction mixture through filtration;
(f) removal or concentration of toluene to leave crude B)8H22 that is contaminated with boric acid and borates;
(g) dissolution of crude B)8H22 into hexanes and filtration of insolubles; (h) removal of hexanes to isolate B)8H22. Preferred methods of the invention are suitable to provide Bi8H22 capable of generating a suitable molecular ion beam for ion implantation and high purity Bi8H22 for use in other applications.
The methods of synthesis, which provide Bi8H22 in high isolated yield (>50%) and with few synthetic procedures, are suitable for use in preparing isotopically enriched Bi8H22, e.g., the isotopic concentration of 10B or 1 IB is greater than natural abundance. Preparation of isotopically enriched, 10B or 11B, Bj8H22 is practical using the invention synthesis methods due to the limited number of synthetic steps, mass efficiency, and high overall synthetic yield (>65 % from B20Hi8 2").
Other aspects of the invention are disclosed infra.
BRIEF DESCRIPTION OF THE DRAWINGS Figure 1 shows schematically a preferred process of the invention;
Figure 2 shows use of a reaction set-up according to a preferred process of the invention.
DETAILED DESCRIPTION
In one preferred aspect, the present includes methods of synthesizing octadecaborane (Bi8H22), comprising:
(a) contacting the borane anion B I0Hi0 2' preferably in solvent with an oxidizing agent (preferably, an oxidizing cage-coupling agent) to produce B20Hi8 2" preferably in situ;
(b) optionally washing the B20Hi8 2" to remove byproducts;
(c) contacting the borane anion B20Hi8 2" preferably in solvent (e.g. is water, alcohols, nitriles, ethers, sulfones, arenes, aliphatic hydrocarbons, and combinations thereof) and water with acid (preferably a molar excess of acid, with suitable acids including organic and inorganic acids having a pKa of less than about 2 e.g. p-toluene sulfonic acid) to produce H2B20Hi8»xH2O preferably in situ;
(d) optionally removing water from the reaction vessel in the presence of a Bi8H22 solubilizing solvent that remains essentially chemically inert in the system; (e) separating insoluble byproducts from the reaction mixture preferably through (i) filtration and/or (ii) concentration of reaction solvent, dissolution Of B18H22 into aliphatic solvent (e.g. alkanes, ethers, or a combination thereof) and filtration of byproducts; and (f) preferably isolation of Bi8H22 such as through solvent removal.
In the above method, the oxidizing agent preferably has a standard reduction potential of E0 > 0 V. More particularly, the oxidizing agent suitably may be an inorganic salt with standard reduction potential of E0 > 0 V. The oxidizing agent also may be an iron(III) salt. The oxidizing agent suitably may be an organometallic compound with a standard reduction potential of E0 > 0 V. The oxidizing agent also suitably may be an organic oxidant with a standard reduction potential of E0 > 0 V. Preferred oxidizing agents include iron(IIl) salts.
Suitable solvents in step (c) of the above method include wherein the solvent is a mixture of aqueous and non-aqueous solvents, and suitable non-aqueous solvents may be suitably selected from the group consisting of alcohols, nitriles, ethers, arenes, aliphatic hydrocarbons and combinations thereof, more preferably hexanes, toluene, xylenes or a combination thereof, and suitably wherein the non-aqueous solvent comprises between about 1 % and about 99% by volume of the total solvent component, suitably with the solvent component comprising between about 1% and 99% water by volume based on total volume of the solvent component.
In another preferred aspect, methods are provided to synthesize octadecaborane (Bi8H22), the methods comprising:
(a) contacting the borane anion B20H)8 2' preferably in solvent and water with acid (preferably a molar excess, , with suitable acids including organic and inorganic acids having a pKa of less than about 2 e.g. p-toluene sulfonic acid) to produce H2B20H)8*xH2O preferably in situ; (b) preferably removing water from the reaction vessel in the presence of a B]8H22 solubilizing solvent that remains essentially chemically inert in the system; (c) preferably separating insoluble byproducts from the reaction mixture such as through (i) filtration and/or (ii) concentration of reaction solvent, dissolution of Bi8H22 into aliphatic solvent (e.g. alkanes, ethers, or a combination thereof) and filtration of byproducts; and (d) preferably isolating Bi8H22 such as through removal of solvent.
In the above methods, the Bi0Hi0 2" salt may be suitably an alkyl ammonium salt with a cation formula of [NR1R2R3R4]*, wherein
R1, R2, and R3 are independently selected from the group consisting of hydrogen, Ci-20alkyl, C6-i0aryl, C7-ioaralkyl, or any two of R1, R2, or R3 taken in combination form a heterocyclic ring; and
R4 is selected from hydrogen, Ci-20alkyl, or C6-ioaryl;
In the above methods, the B20Hi8 2" salt may be suitably an alkyl ammonium salt with a cation formula of [NR1R2R3R4J+, wherein
R1, R , and R3 are independently selected from the group consisting of hydrogen, Ci-20alkyl, C6-i0aryl, C7-i0aralkyl, or any two of R , R , or R taken in combination form a heterocyclic ring; and
R4 is selected from hydrogen, Ci-20alkyl, or C6-i0aryl;
In the above methods, the B20Hi8 2" salt may be suitably an inorganic salt.
Suitable solvents in step (a) of the above method include wherein the solvent is a mixture of aqueous and non-aqueous solvents, and suitable non-aqueous solvents may be suitably selected from the group consisting of alcohols, nitriles, ethers, arenes, aliphatic hydrocarbons and combinations thereof, more preferably hexanes, toluene, xylenes or a combination thereof, and suitably wherein the non-aqueous solvent comprises between about 1% and about 99% by volume of the total solvent component, suitably with the solvent component comprising between about 1 % and 99% water by volume based on total volume of the solvent component. In the above methods, water may be removed from the reaction mixture by a variety of methods including e.g. through the use of moisture traps, moisture scavengers, or more drying agents such as molecular sieves, phosphorus pentoxide, alumina, silica, silicates and the like, or a combination thereof. A Dean-Stark trap can be preferred such as illustrated in Figure 2..
In another aspect, a method of synthesizing octadecaborane (Bi8H22) is provided, the method comprising:
(a) contacting an ammonium salt OfBi0Hi0 " in acidic water (pH < 2.0) with FeCl3 at reflux to produce B20Hj8 2";
(b) washing of the B20Hi8 2" with water to remove byproducts;
(c) contacting the borane anion B20Hi8 2" in toluene and water with 5-40 molar equivalents ofp-toluenesulfonic acid to produce H2B20H i8*xH2O in situ;
(d) removing water from the reaction vessel in the presence of a hot toluene (90 °C to 120 °C) through the use of a Dean Stark moisture trap (see Figure 3);
(e) separating insoluble byproducts from the reaction mixture through filtration;
(f) removal or concentration of toluene to leave crude Bi8H22 that is contaminated with boric acid and borates;
(g) dissolution of crude Bi8H22 into hexanes and filtration of insolubles; (h) removal of hexanes to isolate Bi8H22
In a further aspect, a method of synthesizing octadecaborane (Bi8H22) is provided, the method comprising:
(a) contacting the borane anion B20Hi8 2' in toluene and water with 5-40 molar equivalents of/?-toluenesulfonic acid to produce H2B20Hi8^xH2O in situ;
(b) removing water from the reaction vessel in the presence of a hot toluene (90 °C to 120 °C) through the use of a Dean Stark moisture trap (see Figure 3);
(c) separating insoluble byproducts from the reaction mixture through filtration;
(d) removal or concentration of toluene to leave crude Bi8H22 that is contaminated with boric acid and borates;
(e) dissolution of crude Bj8H22 into hexanes and filtration of insolubles;
(f) removal of hexanes to isolate B 18H22 In methods of the invention wherein the isotopic concentration of 10B atoms suitably may be greater than the natural abundance, e.g. wherein at least about 50% of the boron atoms present in the product Bi8H22 are 10B, or wherein at least about 80% of the boron atoms present in the product Bi8H22 are 10B, or wherein at least about 90% of the boron atoms present in the product B)8H22 are 10B, or wherein at least about 95% of the boron atoms present in the product Bi8H22 are 10B, or wherein at least about 99% of the boron atoms present in the product Bi8H22 are 10B.
In the methods of the invention, the isotopic concentration of 11B atoms suitably may be greater than the natural abundance, e.g. wherein at least about 90% of the boron atoms present in the product Bi8H22 are 11B, or wherein at least about 95% of the boron atoms present in the product Bi8H22 are ' 1B, or wherein at least about 99% of the boron atoms present in the product Bj8H22 are 11B.
Figure 1 of the drawings also depicts a specifically preferred method of the invention.
The invention now being generally described, it will be more readily understood by reference to the following examples, which are included merely for purposes of illustration of certain aspects and embodiments of the present invention, and are not intended to limit the invention.
Example 1 Re-crystallized but not dried (HNEt3)2B20H i8*xH2O prepared from
(HNEt3)2BioH,o (100.0 g, 0.31 mol) and^-C7H4SO3H»H2O (265.4 g, 1.40 mol) are weighed into a 1 L two-necked round bottomed flask. Toluene (1 L) and water (1 13 mL) are added to the flask the Dean Stark apparatus is assembled as in Figure 3 and the trap filled with toluene. After purging with argon for 45 minutes, the solution is brought to reflux with rapid stirring. Following the removal of most of the water from the reaction, hydrogen evolution significantly increases and precipitate begins to form. When hydrogen evolution ceases, the reaction is cooled and insolubles filtered away. The toluene layer is separated from any oils present, washed with water (3 x 200 mL), dried over MgSO4 and concentrated to dryness to give a light yellow powder. The powder is extracted with 1 L of hexanes and any insolubles are removed by filtration. The hexane solution is removed to leave white to off-white Bi8H22 (16.8 g, 50.6 %).
Example 2
Re-crystallized but not dried (HNEt3)2' 1B20H18^xH2O prepared from (HNEt3)2' 1Bi0Hi0 (5.00 g, 15.4 mmol) andp-C7H4SO3H»H2O (14.32 g, 75.3 mmol) are weighed into a 1 L two-necked round bottomed flask. Toluene (150 L) and water (30 mL) are added to the flask the Dean Stark apparatus is assembled as in Figure 3 and the trap filled with toluene. After purging with argon for 45 minutes, the solution is brought to reflux with rapid stirring. Following the removal of most of the water from the reaction, hydrogen evolution significantly increases and precipitate begins to form. When hydrogen evolution ceases, the reaction is cooled and insolubles filtered away. The toluene layer is separated from any oils present, washed with water (3 x 100 mL), dried over MgSO4 and concentrated to dryness to give a light yellow powder. The powder is extracted with 250 mL of hexanes and any insolubles are removed by filtration. The hexane solution is removed to leave white to off-white 11Bi8H22 (0.85 g, 50.1 %). 11B enrichment was determined to be that of the starting material (> 98.6 % 11B isotopic enrichment).
The invention has been described in detail with reference to preferred embodiments thereof. However, it will be appreciated that those skilled in the art, upon consideration of the disclosure, may make modifications and improvements within the spirit and scope of the invention.
References:
1. Jemmis, E. D.; Balakrishnarajan, M. M.; Pancharatna, P. D., Electronic Requirements for Macropolyhedral Boranes. Chem. Rev. 2002, 102, 93-144.
2. Jemmis, E. D.; Balakrishnarajan, M. M.; Pancharatna, P. D., A unifying Electron-Counting Rule for Macropolyhedral Boranes, metallaboranes, and Metallocenes. J. Amer. Chem. Soc. 2001, 123, 4313-4323. 3. Pitochelli, A. R.; Hawthorne, M. F., The Preparation of a New Boron Hydride B18H22. J. Amer. Chem. Soc. 1962, 84, 3218.
4. Hawthorne, M. F.; Pilling, R. L.; Stokely, P. F., The preparation and rearrangement of the three isomeric B20Hi8 4" ions. J. Am. Chem. Soc. 1965, 87, 1893- 1899.
5. Olsen, F. P.; Vasavada, R. C; Hawthorne, M. F., The chemistry of n-B)8H22 and i-Bi8H22. J. Am. Chem. Soc. 1968, 90, (15), 3946-3951.
6. Chamberland, E. L.; Muetterties, E. L., Chemistry of Boranes. XVIII. Oxidation Of Bi0Hi0 "2 and its derivatives. Inorg. Chem. 1964, 3, 1450-1456.
All of the patents and publications cited herein are hereby incorporated by reference in their entirety.
Those skilled in the art will recognize, or be able to ascertain using no more than routine experimentation, many equivalents to the specific embodiments of the invention described herein. Such equivalents are intended to be encompassed by the following claims.

Claims

What is claimed is:
1. A method of synthesizing octadecaborane (Bi8H22), the method comprising:
(a) Cc(ontacting the borane anion Bi0HiO 2" with an oxidizing agent to produce
B20Hi8 2"; and
(b) contacting the borane anion B20Hi8 2-" with acid to produce H2B20H i8»xH2O.
2. A method of synthesizing octadecaborane (B]8H22), the method comprising:
(a) contacting the borane anion Bi0Hi0 2" with an oxidizing agent to produce B20Hi8 ;
(b) contacting the borane anion B20Hi8 2" with acid to produce H2B20H i8*xH2O; and
(c) separating insoluble byproducts from the reaction mixture.
3. The method of claim 1 or 2 wherein the oxidizing agent is a oxidizing cage- coupling agent.
4. The method of claim 1 or 2 further comprising after step (b) removing water from the reaction vessel in the presence of a Bi8H22 solubilizing solvent that remains essentially chemically inert in the system;
5. The method of claim 1 or 2 wherein in step (c) byproducts can be separated through (i) filtration and/or (ii) concentration of reaction solvent, dissolution of B)8H22 into aliphatic solvent and filtration of byproducts.
6. The method of claim 1 or 2 wherein after step (c) B)8H22 is isolated.
7. The method of claim 6 wherein Bi8H22 is isolated through solvent removal.
8. A method of synthesizing octadecaborane (B)8H22), the method comprising: (a) contacting the borane anion B20Hi8 2" with acid to produce H2B20Hi8^xH2O; (b) removing water from the reaction vessel in the presence of a Bj8H22 solubilizing solvent that remains essentially chemically inert in the system; and
(c) separating insoluble byproducts from the reaction mixture through (i) filtration and/or (ii) concentration of reaction solvent, dissolution Of Bj8H22 into aliphatic solvent and filtration of byproducts.
9. The method of claim 8 wherein Bj8H22 is isolated through removal of solvent.
10. The method of claim 1, 2 or 8 wherein the BioHio2" salt is an alkyl ammonium salt with a cation formula of [NR1 R2R3R4J+, wherein
R1, R2, and R3 are independently selected from the group consisting of hydrogen, Ci-20alkyl, Cό-ioaryl, C7-ioaralkyl, or any two of R1, R2, or R3 taken in combination form a heterocyclic ring; and
R4 is selected from hydrogen,
Figure imgf000017_0001
or Cό-ioaryl;
11. The method of claims 1 , 2 or 8 wherein the B20Hi8 2" salt is an alkyl ammonium salt with a cation formula of [NR1R2R3R4]*, wherein
R1, R2, and R3 are independently selected from the group consisting of hydrogen, Cj.2oalkyl, Cn-ioaryl, C7-i0aralkyl, or any two of R1, R2, or R3 taken in combination form a heterocyclic ring; and
R4 is selected from hydrogen, Cj-2oalkyl, or Cδ-ioaryl;
12. The method of claim 1, 2 or 8 wherein the B20Hj8 2" salt is an inorganic salt.
13. The method of claim 1 or 2 wherein the oxidizing agent has a standard reduction potential of E0 > 0 V.
14. The method of claim 1 or 2 wherein the oxidizing agent is an inorganic salt with standard reduction potential of E0 > 0 V.
15. The method of claim 1 or 2 wherein the oxidizing agent is an iron(III) salt.
- 15 -
16. The method of claim 1 or 2 wherein the oxidizing agent is an organometallic compound with a standard reduction potential of E0 > 0 V.
17. The method of claim 1 or 2 wherein the oxidizing agent is an organic oxidant with a standard reduction potential of E0 > 0 V.
18. The method of claims 1, 2 or 8 wherein the acid is an organic acid having a pKa of less than about 2.
19. The method of claims 1 , 2 or 8 wherein the acid is an inorganic acid having a pKa of less than about 2.
20. The method of claims 1, 2 or 8 wherein the acid is/j-toluenesulfonic acid.
21. The method of claims 4 or 8 wherein the solvent comprise a mixture of one or more aqueous solvents and one or more non-aqueous solvents.
22. The method of claim 21 wherein the non-aqueous solvent is selected from the group consisting of alcohols, nitriles, ethers, arenes, aliphatic hydrocarbons and combinations thereof.
23. The method of claim 21 wherein the non-aqueous solvent comprises hexanes, toluene, xylenes or a combination thereof.
24. The method of claim 21 wherein the non-aqueous solvent comprises between about 1% and about 99% by volume of the total solvent component.
25. The method of claim 21 wherein the solvent comprises between about 1% and 99% water by volume of the total solvent component.
- 16 -
26. The method of claim 1, 2 or 8 wherein water is removed through the use of moisture traps, moisture scavengers, or more drying agents such as molecular sieves, phosphorus pentoxide, alumina, silica, silicates and the like, or a combination thereof,
27. The method of claim 1 , 2 or 8 wherein water is removed through the use of a Dean-Stark trap.
28. The method of claim 1 , 2 or 8 wherein the reaction temperature is between about 0 0C and about 200 0C.
29. The method of claim 1, 2 or 8 wherein the reaction temperature is between about 50 0C and about 150 0C.
30. The method of claim 1, 2 or 8 wherein the dissolution solvent is selected from the group consisting of alkanes, ethers, or a combination thereof.
31. The method of claim 30 wherein the dissolution solvent is hexanes.
32. A method of synthesizing octadecaborane (BI 8H22), the method comprising: (a) contacting an ammonium salt of BioHio2" in acidic water (pH < 2.0) with FeCl3 to produce B2oHi8 2';
(c) contacting the borane anion B20Hi8 2" with acid to produce H2B20Hi8^xH2O in situ;
(d) removing water from the reaction vessel;
(e) separating insoluble byproducts from the reaction mixture;
(f) optional solvent removal to provide crude B]8H22 that is contaminated with boric acid and borates;
(g) dissolution of crude B 18H22 into hexanes and filtration of insolubles.
33. The method of claim 32 comprising removal of solvent to isolate Bi8H22.
34. A method of synthesizing octadecaborane (B) 8H22), the method comprising:
- 17 - (a) contacting the borane anion B2oHi8 2" in toluene and water with 5-40 molar equivalents ofp-toluenesulfonic acid to produce H2B20Hi 8*xH2O in situ;
(b) removing water from the reaction vessel in the presence of a hot toluene (90 °C to 120 °C) through the use of a Dean Stark moisture trap (see Figure 3);
(c) separating insoluble byproducts from the reaction mixture through filtration;
(d) removal or concentration of toluene to leave crude Bi8H22 that is contaminated with boric acid and borates;
(e) dissolution of crude Bi8H22 into hexanes and filtration of insolubles;
(f) removal of hexanes to isolate Bi8H22
35. The method of any one of claims 1 through 34 wherein the isotopic concentration of 10B atoms is greater than the natural abundance.
36. The method of claim 35 wherein at least about 50% of the boron atoms present in the product Bi8H22 are 10B.
37. The method of claim 35 wherein at least about 80% of the boron atoms present in the product Bi8H22 are 10B.
38. The method of claim 35 wherein at least about 90% of the boron atoms present in the product Bj8H22 are 10B.
39. The method of claim 35 wherein at least about 95% of the boron atoms present in the product Bi8H22 are ' B.
40. The method of claim 35 wherein at least about 99% of the boron atoms present in the product B18H22 are 10B.
41. The method of any one of claims 1 through 35 wherein the isotopic concentration of ' 1B atoms is greater than the natural abundance.
42. The method of claim 41 wherein at least about 90% of the boron atoms present in the product Bi8H22 are 11B.
43. The method of claim 41 wherein at least about 95% of the boron atoms present in the product Bi8H22 are 1 1B.
44. The method of claim 41 wherein at least about 99% of the boron atoms present in the product B]8H22 are ' 1B.
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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9598352B2 (en) 2011-11-18 2017-03-21 The Curators Of The University Of Missouri Process and device for the production of polyhedral boranes

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JP5710976B2 (en) * 2007-11-02 2015-04-30 セメクイップ, インコーポレイテッド Preparation method of class turbolone
JP5695259B1 (en) 2014-02-19 2015-04-01 株式会社World Medish High flexibility stent
CN113578317B (en) * 2021-06-30 2022-07-05 武汉大学 M-Ti hydrotalcite-based closed typeBoron cluster MBxHxPreparation method and application of nanoscale noble metal

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20050163693A1 (en) * 2004-01-22 2005-07-28 Semequip Inc. Isotopically-enriched boranes and methods of preparing them
US20050169828A1 (en) 2004-02-02 2005-08-04 Bernard Spielvogel Method of production of B10H102-ammonium salts and methods of production of B18H22

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100797138B1 (en) * 2002-06-26 2008-01-22 세미이큅, 인코포레이티드 Complementary metal oxide semiconductor device, and method for forming a metal oxide semiconductor device and a complementary metal oxide semiconductor device

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20050163693A1 (en) * 2004-01-22 2005-07-28 Semequip Inc. Isotopically-enriched boranes and methods of preparing them
US20050169828A1 (en) 2004-02-02 2005-08-04 Bernard Spielvogel Method of production of B10H102-ammonium salts and methods of production of B18H22

Non-Patent Citations (4)

* Cited by examiner, † Cited by third party
Title
JEMMIS, E. D.; BALAKRISHNARAJAN, M. M.; PANCHARATNA, P. D.: "A unifying Electron-Counting Rule for Macropolyhedral Boranes, metallaboranes, and Metallocenes", J. AMER. CHEM. SOC., vol. 123, 2001, pages 4313 - 4323
JEMMIS, E. D.; BALAKRISHNARAJAN, M. M.; PANCHARATNA, P. D.: "Electronic Requirements for Macropolyhedral Boranes", CHEM. REV., vol. 102, 2002, pages 93 - 144
PITOCHELLI, J. AMER. CHEM. SOC., vol. 84, 1962, pages 3218
See also references of EP2205525A4

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9598352B2 (en) 2011-11-18 2017-03-21 The Curators Of The University Of Missouri Process and device for the production of polyhedral boranes

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