WO2009037981A1 - 2-(alkylcarbonyloxy)-1,1-difluoroethanesulfonic acid salt and method for producing the same - Google Patents

2-(alkylcarbonyloxy)-1,1-difluoroethanesulfonic acid salt and method for producing the same Download PDF

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Publication number
WO2009037981A1
WO2009037981A1 PCT/JP2008/066042 JP2008066042W WO2009037981A1 WO 2009037981 A1 WO2009037981 A1 WO 2009037981A1 JP 2008066042 W JP2008066042 W JP 2008066042W WO 2009037981 A1 WO2009037981 A1 WO 2009037981A1
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WO
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Patent type
Prior art keywords
alkylcarbonyloxy
producing
same
method
ammonium salt
Prior art date
Application number
PCT/JP2008/066042
Other languages
French (fr)
Japanese (ja)
Inventor
Yuji Hagiwara
Masashi Nagamori
Masaki Fujiwara
Jonathan Joachim Jodry
Satoru Narizuka
Original Assignee
Central Glass Company, Limited
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date

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Classifications

    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C29/00Preparation of compounds having hydroxy or O-metal groups bound to a carbon atom not belonging to a six-membered aromatic ring
    • C07C29/132Preparation of compounds having hydroxy or O-metal groups bound to a carbon atom not belonging to a six-membered aromatic ring by reduction of an oxygen containing functional group
    • C07C29/136Preparation of compounds having hydroxy or O-metal groups bound to a carbon atom not belonging to a six-membered aromatic ring by reduction of an oxygen containing functional group of >C=O containing groups, e.g. —COOH
    • C07C29/147Preparation of compounds having hydroxy or O-metal groups bound to a carbon atom not belonging to a six-membered aromatic ring by reduction of an oxygen containing functional group of >C=O containing groups, e.g. —COOH of carboxylic acids or derivatives thereof
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C211/00Compounds containing amino groups bound to a carbon skeleton
    • C07C211/01Compounds containing amino groups bound to a carbon skeleton having amino groups bound to acyclic carbon atoms
    • C07C211/02Compounds containing amino groups bound to a carbon skeleton having amino groups bound to acyclic carbon atoms of an acyclic saturated carbon skeleton
    • C07C211/03Monoamines
    • C07C211/05Mono-, di- or tri-ethylamine
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C309/00Sulfonic acids; Halides, esters, or anhydrides thereof
    • C07C309/01Sulfonic acids
    • C07C309/02Sulfonic acids having sulfo groups bound to acyclic carbon atoms
    • C07C309/03Sulfonic acids having sulfo groups bound to acyclic carbon atoms of an acyclic saturated carbon skeleton
    • C07C309/07Sulfonic acids having sulfo groups bound to acyclic carbon atoms of an acyclic saturated carbon skeleton containing oxygen atoms bound to the carbon skeleton
    • C07C309/12Sulfonic acids having sulfo groups bound to acyclic carbon atoms of an acyclic saturated carbon skeleton containing oxygen atoms bound to the carbon skeleton containing esterified hydroxy groups bound to the carbon skeleton
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C313/00Sulfinic acids; Sulfenic acids; Halides, esters or anhydrides thereof; Amides of sulfinic or sulfenic acids, i.e. compounds having singly-bound oxygen atoms of sulfinic or sulfenic groups replaced by nitrogen atoms, not being part of nitro or nitroso groups
    • C07C313/02Sulfinic acids; Derivatives thereof
    • C07C313/04Sulfinic acids; Esters thereof
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C381/00Compounds containing carbon and sulfur and having functional groups not covered by groups C07C301/00 - C07C337/00
    • C07C381/12Sulfonium compounds
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C2603/00Systems containing at least three condensed rings
    • C07C2603/56Ring systems containing bridged rings
    • C07C2603/58Ring systems containing bridged rings containing three rings
    • C07C2603/70Ring systems containing bridged rings containing three rings containing only six-membered rings
    • C07C2603/74Adamantanes

Abstract

By using an organic base when a carboxylic acid bromodifluoroethyl ester is sulfinated by using a sulfinating agent, there is obtained 2-(alkylcarbonyloxy)-1,1-difluoroethanesulfinic acid ammonium salt. By oxidizing the 2-(alkylcarbonyloxy)-1,1-difluoroethanesulfinic acid ammonium salt, there is obtained 2-(alkylcarbonyloxy)-1,1-difluoroethanesulfonic acid ammonium salt. By using this 2-(alkylcarbonyloxy)-1,1-difluoroethanesulfonic acid ammonium salt as a raw material and exchanging it into an onium salt directly or through saponification/ esterification, there can be obtained a 2-alkylcarbonyloxy-1,1-difluoroethanesulfonic acid onium salt.
PCT/JP2008/066042 2007-09-18 2008-09-05 2-(alkylcarbonyloxy)-1,1-difluoroethanesulfonic acid salt and method for producing the same WO2009037981A1 (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2007-241606 2007-09-18
JP2007241606 2007-09-18
JP2008-210510 2008-08-19
JP2008210510A JP5347371B2 (en) 2007-09-18 2008-08-19 2- (alkylcarbonyloxy) -1,1-difluoroethanesulfonic acid salts and a method of manufacturing the same

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
KR20107008358A KR101234680B1 (en) 2007-09-18 2008-09-05 2-(alkylcarbonyloxy)-1,1-difluoroethanesulfonic acid salt and method for producing the same
CN 200880024402 CN101687741B (en) 2007-09-18 2008-09-05 2-(alkylcarbonyloxy)-1,1-difluoroethanesulfonic acid salt and method for producing the same
US12678250 US8581009B2 (en) 2007-09-18 2008-09-05 2-(alkylcarbonyloxy)-1, 1-difluoroethanesulfonic acid salt and method for producing the same
KR20127033866A KR20130003042A (en) 2007-09-18 2008-09-05 2-(alkylcarbonyloxy)-1,1-difluoroethanesulfonic acid salt and method for producing the same
US13935647 US8748672B2 (en) 2007-09-18 2013-07-05 2-(alkylcarbonyloxy)-1, 1-difluoroethanesulfonic acid salt and method for producing the same

Related Child Applications (2)

Application Number Title Priority Date Filing Date
US12678250 A-371-Of-International
US13935647 Division US8748672B2 (en) 2007-09-18 2013-07-05 2-(alkylcarbonyloxy)-1, 1-difluoroethanesulfonic acid salt and method for producing the same

Publications (1)

Publication Number Publication Date
WO2009037981A1 true true WO2009037981A1 (en) 2009-03-26

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2008/066042 WO2009037981A1 (en) 2007-09-18 2008-09-05 2-(alkylcarbonyloxy)-1,1-difluoroethanesulfonic acid salt and method for producing the same

Country Status (1)

Country Link
WO (1) WO2009037981A1 (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20100119970A1 (en) * 2008-11-07 2010-05-13 Shin-Etsu Chemical Co., Ltd. Resist lower-layer composition containing thermal acid generator, resist lower layer film-formed substrate, and patterning process
WO2010104177A1 (en) * 2009-03-12 2010-09-16 セントラル硝子株式会社 Fluoroalkanesulfonic acid ammonium salts and method for producing same
US20100285405A1 (en) * 2009-05-07 2010-11-11 Jsr Corporation Radiation-sensitive resin composition
US20130108964A1 (en) * 2011-10-26 2013-05-02 Shin-Etsu Chemical Co., Ltd. CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION FOR ArF IMMERSION LITHOGRAPHY AND PATTERN FORMING PROCESS

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007145797A (en) * 2005-04-06 2007-06-14 Shin Etsu Chem Co Ltd New sulfonic acid salt and derivative thereof, photoacid-generating agent and resist material using the same, and pattern-forming method
JP2007304490A (en) * 2006-05-15 2007-11-22 Shin Etsu Chem Co Ltd Thermal acid generator, resist underlayer film material containing the same, and pattern forming method using the resist underlayer film material
WO2008099869A1 (en) * 2007-02-15 2008-08-21 Central Glass Company, Limited Compound for photoacid generator, resist composition using the same, and pattern-forming method

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007145797A (en) * 2005-04-06 2007-06-14 Shin Etsu Chem Co Ltd New sulfonic acid salt and derivative thereof, photoacid-generating agent and resist material using the same, and pattern-forming method
JP2007304490A (en) * 2006-05-15 2007-11-22 Shin Etsu Chem Co Ltd Thermal acid generator, resist underlayer film material containing the same, and pattern forming method using the resist underlayer film material
WO2008099869A1 (en) * 2007-02-15 2008-08-21 Central Glass Company, Limited Compound for photoacid generator, resist composition using the same, and pattern-forming method

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20100119970A1 (en) * 2008-11-07 2010-05-13 Shin-Etsu Chemical Co., Ltd. Resist lower-layer composition containing thermal acid generator, resist lower layer film-formed substrate, and patterning process
US8349533B2 (en) * 2008-11-07 2013-01-08 Shin-Etsu Chemical Co., Ltd. Resist lower-layer composition containing thermal acid generator, resist lower layer film-formed substrate, and patterning process
WO2010104177A1 (en) * 2009-03-12 2010-09-16 セントラル硝子株式会社 Fluoroalkanesulfonic acid ammonium salts and method for producing same
US8877960B2 (en) 2009-03-12 2014-11-04 Central Glass Company, Limited Fluoroalkanesulfonic acid ammonium salts and method for producing same
US8431324B2 (en) * 2009-05-07 2013-04-30 Jsr Corporation Radiation-sensitive resin composition
US20100285405A1 (en) * 2009-05-07 2010-11-11 Jsr Corporation Radiation-sensitive resin composition
US20130108964A1 (en) * 2011-10-26 2013-05-02 Shin-Etsu Chemical Co., Ltd. CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION FOR ArF IMMERSION LITHOGRAPHY AND PATTERN FORMING PROCESS
KR20130045804A (en) * 2011-10-26 2013-05-06 신에쓰 가가꾸 고교 가부시끼가이샤 Chemically amplified positive resist composition for arf immersion lithography and pattern forming process
US8815492B2 (en) * 2011-10-26 2014-08-26 Shin-Etsu Chemical Co., Ltd. Chemically amplified positive resist composition for ArF immersion lithography and pattern forming process
KR101664520B1 (en) 2011-10-26 2016-10-10 신에쓰 가가꾸 고교 가부시끼가이샤 CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION FOR ArF IMMERSION LITHOGRAPHY AND PATTERN FORMING PROCESS

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