WO2008096594A1 - インプリント用モールドおよびその製造方法 - Google Patents
インプリント用モールドおよびその製造方法 Download PDFInfo
- Publication number
- WO2008096594A1 WO2008096594A1 PCT/JP2008/050826 JP2008050826W WO2008096594A1 WO 2008096594 A1 WO2008096594 A1 WO 2008096594A1 JP 2008050826 W JP2008050826 W JP 2008050826W WO 2008096594 A1 WO2008096594 A1 WO 2008096594A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- mold
- group
- imprint mold
- imprint
- main body
- Prior art date
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C33/00—Moulds or cores; Details thereof or accessories therefor
- B29C33/38—Moulds or cores; Details thereof or accessories therefor characterised by the material or the manufacturing process
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C33/00—Moulds or cores; Details thereof or accessories therefor
- B29C33/56—Coatings, e.g. enameled or galvanised; Releasing, lubricating or separating agents
- B29C33/60—Releasing, lubricating or separating agents
- B29C33/62—Releasing, lubricating or separating agents based on polymers or oligomers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y40/00—Manufacture or treatment of nanostructures
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29K—INDEXING SCHEME ASSOCIATED WITH SUBCLASSES B29B, B29C OR B29D, RELATING TO MOULDING MATERIALS OR TO MATERIALS FOR MOULDS, REINFORCEMENTS, FILLERS OR PREFORMED PARTS, e.g. INSERTS
- B29K2023/00—Use of polyalkenes or derivatives thereof as moulding material
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29L—INDEXING SCHEME ASSOCIATED WITH SUBCLASS B29C, RELATING TO PARTICULAR ARTICLES
- B29L2011/00—Optical elements, e.g. lenses, prisms
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31652—Of asbestos
- Y10T428/31663—As siloxane, silicone or silane
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Nanotechnology (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Crystallography & Structural Chemistry (AREA)
- Mechanical Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Theoretical Computer Science (AREA)
- Mathematical Physics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Moulds For Moulding Plastics Or The Like (AREA)
- Shaping Of Tube Ends By Bending Or Straightening (AREA)
Abstract
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2008557054A JP4930517B2 (ja) | 2007-02-07 | 2008-01-22 | インプリント用モールドおよびその製造方法 |
EP08703670A EP2116350A4 (en) | 2007-02-07 | 2008-01-22 | IMPRESSION MOLD AND METHOD FOR PRODUCING THE SAME |
CN2008800038834A CN101610888B (zh) | 2007-02-07 | 2008-01-22 | 压印用模及其制造方法 |
US12/511,215 US7767309B2 (en) | 2007-02-07 | 2009-07-29 | Imprinting mold and process for its production |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2007028268 | 2007-02-07 | ||
JP2007-028268 | 2007-02-07 |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US12/511,215 Continuation US7767309B2 (en) | 2007-02-07 | 2009-07-29 | Imprinting mold and process for its production |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2008096594A1 true WO2008096594A1 (ja) | 2008-08-14 |
Family
ID=39681505
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/JP2008/050826 WO2008096594A1 (ja) | 2007-02-07 | 2008-01-22 | インプリント用モールドおよびその製造方法 |
Country Status (7)
Country | Link |
---|---|
US (1) | US7767309B2 (ja) |
EP (1) | EP2116350A4 (ja) |
JP (1) | JP4930517B2 (ja) |
KR (1) | KR20090117699A (ja) |
CN (1) | CN101610888B (ja) |
TW (1) | TW200904616A (ja) |
WO (1) | WO2008096594A1 (ja) |
Cited By (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2010131569A (ja) * | 2008-12-08 | 2010-06-17 | Asahi Glass Co Ltd | 含フッ素重合体薄膜を有する基材及びその製造方法 |
JP2010234575A (ja) * | 2009-03-30 | 2010-10-21 | Fujifilm Corp | インプリント用モールド構造体、インプリント用モールド構造体の製造方法、インプリント方法、及び磁気記録媒体の製造方法 |
JP2011005696A (ja) * | 2009-06-24 | 2011-01-13 | Tokyo Electron Ltd | テンプレート処理装置、インプリントシステム、離型剤処理方法、プログラム及びコンピュータ記憶媒体 |
JP2011005695A (ja) * | 2009-06-24 | 2011-01-13 | Tokyo Electron Ltd | テンプレート処理装置、インプリントシステム、離型剤処理方法、プログラム及びコンピュータ記憶媒体 |
WO2011122605A1 (ja) * | 2010-03-30 | 2011-10-06 | Hoya株式会社 | インプリント用離型層付きモールド及びインプリント用離型層付きモールドの製造方法、コピーモールドの製造方法 |
JP2011224982A (ja) * | 2010-03-30 | 2011-11-10 | Hoya Corp | 離型層付きモールドおよびその製造方法ならびにモールドの製造方法 |
WO2012018043A1 (ja) * | 2010-08-06 | 2012-02-09 | 綜研化学株式会社 | ナノインプリント用樹脂製モールド |
JP2012048772A (ja) * | 2010-08-24 | 2012-03-08 | Hoya Corp | インプリント用離型層、インプリント用離型層付きモールド及びインプリント用離型層付きモールドの製造方法 |
JP2013239535A (ja) * | 2012-05-14 | 2013-11-28 | Toyo Gosei Kogyo Kk | 光インプリント方法 |
Families Citing this family (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101652680B1 (ko) * | 2008-05-29 | 2016-08-31 | 아사히 가라스 가부시키가이샤 | 광경화성 조성물 및 표면에 미세 패턴을 갖는 성형체의 제조 방법 |
WO2011118591A1 (ja) * | 2010-03-25 | 2011-09-29 | 三菱レイヨン株式会社 | モールドの製造方法および微細凹凸構造を表面に有する物品の製造方法 |
US20130084352A1 (en) * | 2010-03-30 | 2013-04-04 | Hoya Corporation | Mold having release layer for imprinting, method for producing mold having release layer for imprinting, and method for producing copy mold |
CN101807628B (zh) * | 2010-04-02 | 2012-05-23 | 日强光伏科技有限公司 | 一种制作太阳能电池正面栅线电极的方法 |
CN101872081B (zh) * | 2010-06-10 | 2012-02-08 | 复旦大学 | 光致形变液晶高分子三维可调谐光子晶体及其制备方法 |
EP2650124B1 (en) * | 2010-12-09 | 2019-05-15 | Asahi Kasei Kabushiki Kaisha | Fine-structure laminate, method for preparing fine-structure laminate, and production method for fine-structure laminate |
JP5653769B2 (ja) * | 2011-01-19 | 2015-01-14 | 富士フイルム株式会社 | ナノインプリント方法 |
WO2012115059A1 (ja) * | 2011-02-22 | 2012-08-30 | 旭硝子株式会社 | 微細構造成形体および該微細構造成形体を備えた液晶表示装置 |
US9434094B2 (en) * | 2011-02-28 | 2016-09-06 | Tanazawa Hakkosha Co., Ltd. | Molding die and method for manufacturing same |
US20120261849A1 (en) * | 2011-04-14 | 2012-10-18 | Canon Kabushiki Kaisha | Imprint apparatus, and article manufacturing method using same |
CN103199268B (zh) * | 2013-03-11 | 2016-02-03 | 中国科学院上海高等研究院 | 基于纳米压印技术的有序纳米结构膜、有序纳米结构膜电极的制备及应用 |
DE112016000083T5 (de) * | 2015-07-30 | 2017-03-30 | Tanazawa Hakkosha Co., Ltd. | Harzformungsform |
KR20190083215A (ko) | 2018-01-03 | 2019-07-11 | 정장수 | 삽입 및 중심 고정형 드릴팁이 결합 된 드릴 공구 |
CN112571687A (zh) * | 2020-12-28 | 2021-03-30 | 上海建工四建集团有限公司 | 一种高开孔率复合硅胶模具 |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH05339007A (ja) * | 1992-06-08 | 1993-12-21 | Shin Etsu Chem Co Ltd | 含フッ素有機けい素化合物およびその製造方法 |
JPH10113936A (ja) * | 1996-10-15 | 1998-05-06 | Sumitomo Chem Co Ltd | キャストシートの製造方法 |
JP2002283354A (ja) | 2001-03-27 | 2002-10-03 | Daikin Ind Ltd | インプリント加工用金型およびその製造方法 |
JP2007028268A (ja) | 2005-07-19 | 2007-02-01 | Kddi Corp | 不正パケットを送信する端末の帯域割当を制限する基地局、システム及び方法 |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5288891A (en) * | 1990-11-22 | 1994-02-22 | Nippon Oil And Fats Co. Ltd. | Fluoralykyl group-containing organosilicon oligomer, method for preparing same and surface treating agent |
JPH04296336A (ja) * | 1991-03-27 | 1992-10-20 | Nippon Oil & Fats Co Ltd | 表面処理剤 |
EP0844265B1 (en) * | 1995-08-11 | 2002-11-20 | Daikin Industries, Limited | Silicon-containing organic fluoropolymers and use of the same |
DE19819761C2 (de) * | 1998-05-04 | 2000-05-31 | Jenoptik Jena Gmbh | Einrichtung zur Trennung eines geformten Substrates von einem Prägewerkzeug |
US6649272B2 (en) * | 2001-11-08 | 2003-11-18 | 3M Innovative Properties Company | Coating composition comprising fluorochemical polyether silane polycondensate and use thereof |
US20040168613A1 (en) * | 2003-02-27 | 2004-09-02 | Molecular Imprints, Inc. | Composition and method to form a release layer |
EP1838424B8 (en) * | 2004-11-24 | 2015-04-22 | Canon Nanotechnologies, Inc. | Method for reducing adhesion forces between an imprinting material and a mold, and use of an imprinting composition |
-
2008
- 2008-01-22 CN CN2008800038834A patent/CN101610888B/zh not_active Expired - Fee Related
- 2008-01-22 JP JP2008557054A patent/JP4930517B2/ja not_active Expired - Fee Related
- 2008-01-22 WO PCT/JP2008/050826 patent/WO2008096594A1/ja active Application Filing
- 2008-01-22 KR KR1020097014980A patent/KR20090117699A/ko not_active Application Discontinuation
- 2008-01-22 EP EP08703670A patent/EP2116350A4/en not_active Withdrawn
- 2008-02-05 TW TW97104659A patent/TW200904616A/zh unknown
-
2009
- 2009-07-29 US US12/511,215 patent/US7767309B2/en not_active Expired - Fee Related
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH05339007A (ja) * | 1992-06-08 | 1993-12-21 | Shin Etsu Chem Co Ltd | 含フッ素有機けい素化合物およびその製造方法 |
JPH10113936A (ja) * | 1996-10-15 | 1998-05-06 | Sumitomo Chem Co Ltd | キャストシートの製造方法 |
JP2002283354A (ja) | 2001-03-27 | 2002-10-03 | Daikin Ind Ltd | インプリント加工用金型およびその製造方法 |
JP2007028268A (ja) | 2005-07-19 | 2007-02-01 | Kddi Corp | 不正パケットを送信する端末の帯域割当を制限する基地局、システム及び方法 |
Non-Patent Citations (1)
Title |
---|
See also references of EP2116350A4 |
Cited By (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2010131569A (ja) * | 2008-12-08 | 2010-06-17 | Asahi Glass Co Ltd | 含フッ素重合体薄膜を有する基材及びその製造方法 |
JP2010234575A (ja) * | 2009-03-30 | 2010-10-21 | Fujifilm Corp | インプリント用モールド構造体、インプリント用モールド構造体の製造方法、インプリント方法、及び磁気記録媒体の製造方法 |
JP2011005696A (ja) * | 2009-06-24 | 2011-01-13 | Tokyo Electron Ltd | テンプレート処理装置、インプリントシステム、離型剤処理方法、プログラム及びコンピュータ記憶媒体 |
JP2011005695A (ja) * | 2009-06-24 | 2011-01-13 | Tokyo Electron Ltd | テンプレート処理装置、インプリントシステム、離型剤処理方法、プログラム及びコンピュータ記憶媒体 |
WO2011122605A1 (ja) * | 2010-03-30 | 2011-10-06 | Hoya株式会社 | インプリント用離型層付きモールド及びインプリント用離型層付きモールドの製造方法、コピーモールドの製造方法 |
JP2011224982A (ja) * | 2010-03-30 | 2011-11-10 | Hoya Corp | 離型層付きモールドおよびその製造方法ならびにモールドの製造方法 |
WO2012018043A1 (ja) * | 2010-08-06 | 2012-02-09 | 綜研化学株式会社 | ナノインプリント用樹脂製モールド |
JP5292621B2 (ja) * | 2010-08-06 | 2013-09-18 | 綜研化学株式会社 | ナノインプリント用樹脂製モールド |
US9393737B2 (en) | 2010-08-06 | 2016-07-19 | Soken Chemical & Engineering Co., Ltd. | Resin mold for nanoimprinting |
JP2012048772A (ja) * | 2010-08-24 | 2012-03-08 | Hoya Corp | インプリント用離型層、インプリント用離型層付きモールド及びインプリント用離型層付きモールドの製造方法 |
JP2013239535A (ja) * | 2012-05-14 | 2013-11-28 | Toyo Gosei Kogyo Kk | 光インプリント方法 |
Also Published As
Publication number | Publication date |
---|---|
TW200904616A (en) | 2009-02-01 |
US20090285927A1 (en) | 2009-11-19 |
CN101610888A (zh) | 2009-12-23 |
EP2116350A4 (en) | 2011-06-22 |
CN101610888B (zh) | 2012-10-17 |
KR20090117699A (ko) | 2009-11-12 |
JP4930517B2 (ja) | 2012-05-16 |
JPWO2008096594A1 (ja) | 2010-05-20 |
US7767309B2 (en) | 2010-08-03 |
EP2116350A1 (en) | 2009-11-11 |
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