WO2008059702A1 - Process for purification of polycyclic compounds, process for production of polycyclic compounds, and uses of polycyclic compounds - Google Patents

Process for purification of polycyclic compounds, process for production of polycyclic compounds, and uses of polycyclic compounds Download PDF

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Publication number
WO2008059702A1
WO2008059702A1 PCT/JP2007/070814 JP2007070814W WO2008059702A1 WO 2008059702 A1 WO2008059702 A1 WO 2008059702A1 JP 2007070814 W JP2007070814 W JP 2007070814W WO 2008059702 A1 WO2008059702 A1 WO 2008059702A1
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Prior art keywords
polycyclic compound
polycyclic
film
integer
coating
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PCT/JP2007/070814
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French (fr)
Japanese (ja)
Inventor
Shoichi Matsuda
Junzo Miyazaki
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Nitto Denko Corporation
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Priority claimed from JP2007182951A external-priority patent/JP5060853B2/en
Application filed by Nitto Denko Corporation filed Critical Nitto Denko Corporation
Publication of WO2008059702A1 publication Critical patent/WO2008059702A1/en

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    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D235/00Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, condensed with other rings
    • C07D235/02Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, condensed with other rings condensed with carbocyclic rings or ring systems
    • C07D235/04Benzimidazoles; Hydrogenated benzimidazoles
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D241/00Heterocyclic compounds containing 1,4-diazine or hydrogenated 1,4-diazine rings
    • C07D241/36Heterocyclic compounds containing 1,4-diazine or hydrogenated 1,4-diazine rings condensed with carbocyclic rings or ring systems

Definitions

  • the present invention relates to a method for purifying a polycyclic compound containing impurities such as sulfate ions, a method for producing a polycyclic compound having a SO M group, and uses thereof.
  • a liquid crystal display device (hereinafter sometimes referred to as “LCD”) is an element that displays characters and images by utilizing the electro-optical characteristics of liquid crystal molecules.
  • LCDs are widely used in mobile phones, notebook computers, liquid crystal televisions, and so on.
  • LCD uses liquid crystal molecules with optical anisotropy, even if it shows excellent display characteristics in one direction, the screen becomes dark or unclear in the other direction.
  • Birefringent films are used in LCDs to solve these problems.
  • a birefringent film is also called a retardation film or an optical compensation film.
  • birefringent films a film whose refractive index ellipsoid satisfies the relationship of nx> nz> ny is known (for example, see Patent Document 1).
  • This birefringent film is produced by a method in which a shrinkable film is attached to both sides of a polymer film, and the polymer film is stretched so as to expand in the thickness direction by shrinkage of the shrinkable film. For this reason, the birefringent film obtained cannot easily meet the demand for thinning and weight reduction that tends to be thick.
  • Patent Document 1 Japanese Patent Publication 2006-072309
  • the present inventors have studied various materials in order to obtain a thin and light birefringent film, and found that a polycyclic compound having a SOM group is a preferable material.
  • a birefringent film satisfying the relationship of nx ⁇ nz> ny can be obtained by dissolving such a polycyclic compound in water and coating the aqueous solution on a substrate. Based on this knowledge, we were further studying film formation using polycyclic compounds. In some cases, the aqueous solution of the polycyclic compound may not be applied uniformly. The present inventors have further conducted intensive studies on the cause, in an aqueous solution of a polycyclic compound so 2 _ etc.
  • An object of the present invention is to provide a method for purifying a polycyclic compound that can easily and substantially remove impurities such as sulfuric acid from the polycyclic compound.
  • Another object of the present invention is to provide a method for producing a polycyclic compound substantially free of impurities such as sulfuric acid.
  • Another object of the present invention is to provide a coating solution that contains the polycyclic compound and can be satisfactorily coated on a substrate.
  • the first means of the present invention includes an impurity containing at least one of SO 2 and SO—.
  • the force S can be used to separate and purify polycyclic compounds by a relatively simple method of filtration.
  • the purified polycyclic compound is prepared, for example, as a coating solution.
  • the coating liquid can be satisfactorily coated on the substrate, and as a result, a film having a substantially uniform thickness can be produced.
  • the organic solvent is at least one selected from methanol, ethanol, isopropyl alcohol, other lower alcohols, and acetone.
  • the polycyclic compound includes a quinoxaline derivative represented by the following general formula (I).
  • M represents a counter ion.
  • a and B represent substituents, and a and b represent the number of substitutions (a is an integer from 0 to 4, and b is an integer from 0 to 6).
  • 1 and m represent the number of substitutions (1 is an integer from 0 to 4, and m is an integer from 0 to 6). However, 1 and m are not 0 at the same time.
  • the polycyclic compound includes a quinoxaline derivative represented by the following general formula ( ⁇ ).
  • M represents a counter ion.
  • m represents the number of substitutions (an integer of 1 to 6)
  • Another preferable method for purifying a polycyclic compound according to the present invention is that the polycyclic compound has a wavelength of 4
  • the polycyclic compound includes a perylene derivative represented by the following general formula (IV) or general formula (IV).
  • M represents a counter ion.
  • nl ⁇ ! ⁇ 4 represents a substituent (an integer of 0 to 4). However, nl ⁇ ! All powers of ⁇ 4 are not 0 at the same time.
  • the amount of residual impurities in the polycyclic compound after separation is 100 mg / g or less.
  • the second means of the present invention relates to a method for producing a polycyclic compound, which is a sulfonating polycyclic compound having a SO M group (where M represents a counter ion).
  • It has a step of obtaining a dispersion by mixing with an organic solvent, and a step of filtering the dispersion to separate a polycyclic compound.
  • a preferred method for producing a polycyclic compound according to the present invention is to use sulfuric acid as the sulfonation treatment.
  • At least one selected from fuming sulfuric acid and inorganic sulfonic acid is used.
  • the polycyclic compound contains a quinoxaline derivative represented by the general formula (I).
  • the polycyclic compound has a wavelength of 4
  • the polycyclic compound is soluble in water.
  • the third means of the present invention relates to a coating solution, and the coating solution contains, in water, the polycyclic compound separated by any one of the above purification methods or any one of the production methods. It is obtained by dissolving.
  • a preferred coating liquid of the present invention exhibits a nematic liquid crystal phase.
  • a fourth means of the present invention relates to a birefringent film, and the birefringent film is obtained by applying any one of the above-mentioned coating liquids onto a substrate and drying, and has a refractive index.
  • the ellipsoid is characterized by satisfying the relationship nx ⁇ nz> ny.
  • a fifth means of the present invention relates to a polarizing film, and this polarizing film is obtained by applying any one of the above-mentioned coating solutions onto a substrate and drying.
  • the polycyclic compound obtained by such a method can be used as a solution to obtain a coating solution that can be satisfactorily applied to a substrate.
  • a film obtained by coating and drying this coating liquid on a substrate can be used as a birefringent film or a polarizing film.
  • the method for purifying a polycyclic compound of the present invention includes at least one of SO 2 and SO—
  • the polycyclic compound can be easily purified from a mixture containing
  • the polycyclic compound to be treated by the method of the present invention is a polycyclic compound having a SO M group.
  • this polycyclic compound comprises a SO M group and
  • COOM groups may be included.
  • M represents a counter ion (hereinafter the same).
  • the polycyclic compound to be treated by the method of the present invention may be one kind or two or more kinds having different structures.
  • the basic skeleton of the polycyclic compound is preferably two or more aromatic rings and / or heterocyclic rings More preferably 3 to 8 aromatic rings and / or heterocyclic rings.
  • the basic skeleton of the polycyclic compound preferably has at least a heterocyclic ring, and the heterocyclic ring preferably contains a nitrogen atom, more preferably the force S.
  • examples of the basic skeleton of the polycyclic compound include quinoxaline derivatives and perylene derivatives. These polycyclic compounds are preferable because they exhibit a liquid crystal phase (that is, lyotropic liquid crystal) in a solution state.
  • this liquid crystal phase is preferably a nematic liquid crystal phase in terms of excellent orientation. This nematic liquid crystal phase includes supramolecules, and the formed body is in a nematic state.
  • the quinoxaline-based polycyclic compound is preferably used as a material for forming a birefringent film.
  • the perylene-based polycyclic compound can be preferably used as a material for forming a polarizing film.
  • Examples of the quinoxaline-based polycyclic compound include acenaphtho represented by the following general formula (I):
  • Examples include [1, 2, b] quinoxaline derivatives.
  • a and B represent substituents, and a and b represent the number of substitutions (a is an integer of 0 to 4, and b is an integer of 0 to 6).
  • 1 and m represent the number of substitutions (1 is an integer from 0 to 4, and m is an integer from 0 to 6).
  • at least one of 1 and m which is not 0 at the same time is 1 or more.
  • M in the general formula (I) represents a counter ion.
  • the M is preferably a hydrogen atom, an alkali metal atom, an alkaline earth metal atom, a metal ion, or a substituted or unsubstituted ammonium ion.
  • the metal ions include Ni 2+ , Fe 3+ , Cu 2+ , Ag + , Zn 2+ , Al 3+ , Pd 2+ , Cd 2+ , Sn 2+ , Co 2+ , Mn 2+ , Ce 3+ and the like can be exemplified.
  • substituents represented by A and B in formula (I) may be the same or different.
  • Substituents for A and B include halogen atoms, substituted or unsubstituted carbon numbers;! To 2 alkyl groups, substituted or unsubstituted alkoxy groups having 1 to 2 carbon atoms, OCOCH groups, NH groups, NHCs OCH group, —NO group, CF group, CN group, OCN group, SCN group, COOM group,
  • CONH group, SM group, OM group, etc. can be exemplified (in each group, M is a counter ion)
  • At least one of A and B is a COOM group (carboxylic acid or a salt thereof). Even if the polycyclic compound has the above substituents represented by A and B, it can be separated by the method of the present invention.
  • the substitution numbers a and b are preferably 0 to 2, and more preferably the substitution numbers a and b are 0 to 1.
  • the polycyclic compound of the general formula (I) in which A and B are unsubstituted or have a small number of substitutions shows good orientation when coated.
  • examples of the quinoxaline-based polycyclic compound include acetnaphtho [1,2-b] quinoxaline derivatives represented by the following general formula (II).
  • formula ( ⁇ ) m represents the number of substitutions (an integer of 1 to 6).
  • M in the general formula (II) is the same as that in the formula (I).
  • a quinoxaline derivative in which m is 1 or 2 can be separated and purified in high yield / yield by the method of the present invention.
  • Examples of perylene-based polycyclic compounds include perylene-based derivatives represented by the following general formula (III) or general formula (IV).
  • nl ⁇ ! ⁇ 4 represents the number of substitutions (an integer from 0 to 4). However, nl ⁇ ! ⁇ 4 is all 0 at the same time nl ⁇ ! At least one of ⁇ 4 is an integer from!
  • at least one of nl and n2 is a force S; M in the above formulas (III) and (IV) is the same as in formula (I).
  • nl ⁇ ! ⁇ 4 is preferably an integer of 0 to 2, more preferably an integer of 0 to 1.
  • perylene-based polycyclic compounds include perylene-based derivatives represented by the following general formula (V) or general formula (VI).
  • nl and n2 represent the number of substitutions (an integer of 0 to 4). However, at least one of nl and n2 is an integer of 1 to 4.
  • M in the above formulas (V) and (VI) is the same as in formula (I).
  • nl and n2 are each preferably an integer of 1 or 2.
  • the polycyclic compound represented by the general formula (V) or (VI) has SO M groups at both ends in the long axis direction of the basic skeleton.
  • the Such perylene-based polycyclic compounds exhibit good orientation when applied.
  • the perylene-based polycyclic compounds represented by the above general formulas (III) to (VI) are compounds having the maximum value of the light absorption spectrum in the wavelength range of 400 nm to 8 OOnm. Such a polycyclic compound is particularly suitable as a material for forming a polarizing film. [0038] (Synthesis of polycyclic compound having one SO M group)
  • the above polycyclic compound has a SO M group (sulfonic acid or a salt thereof) in the basic skeleton of the compound.
  • the SO M group is, for example, a sulfonation treatment.
  • Examples of methods for synthesizing quinoxaline-based polycyclic compounds include the following 1) and 2).
  • 1,2-Benzenediamine having an unsubstituted or substituted group or / and acenaphthoquinone having an unsubstituted or substituted group are sulfonated with fuming sulfuric acid and the like, and then both compounds are condensed to form SO.
  • acenaphtho [1,2b] quinoxaline represented by the following reaction formula (a) or a substituted product thereof is sulfonated with an inorganic sulfonic acid or the like.
  • the inorganic sulfonic acid include sulfuric acid, fuming sulfuric acid, and chlorosulfonic acid.
  • At least one of 1,2-benzenediamine represented by the following formula (b) or a substituted product thereof, or acenaphthoquinone or a substituted product thereof is used.
  • the benzenediamine and acenaphthoquinone are condensed.
  • the inorganic sulfonic acid include sulfuric acid, fuming sulfuric acid, and chlorosulfonic acid.
  • Quinoxari having one SO M group by force method Derivatives (polycyclic compounds) can be obtained.
  • A, a, B, b, 1 and m are the same as in formula (I) (provided that 1 and m are not 0 at the same time).
  • the perylene-based polycyclic compound of the present invention includes, for example, a perylene derivative (for example, a dibenzimidazole derivative of perylene tetracarboxylic acid) sulfonated with fuming sulfuric acid and the like, and an SO M group is introduced.
  • a perylene derivative for example, a dibenzimidazole derivative of perylene tetracarboxylic acid
  • SO M group is introduced.
  • the synthesized product in order to substantially and easily remove the impurities in the synthesized product, contains impurities such as sulfuric acid and SO M group obtained after sulfonation treatment) in an organic solvent.
  • impurities such as sulfuric acid and SO M group obtained after sulfonation treatment
  • the polycyclic compound is purified by separation.
  • the organic solvent used in the purification is SO 2 — or SO— (preferably SO 2 — and SO
  • a solvent in which a polycyclic compound having a SO M group is hardly soluble is used. It is.
  • SO 2 _ or SO- dissolves when SO 2 _ or SO-
  • Solubility power at 3 ° C is about 10g / 100g or more. Also has SO M group
  • the term “poorly soluble polycyclic compound” means that the solubility of the polycyclic compound in an organic solvent at 23 ° C. is about 0.5 g / 100 g or less.
  • the organic solvent examples include lower alcohols such as methanol, ethanol and isopropyl alcohol (preferably lower alcohols having 1 to 4 carbon atoms); acetone and the like. Among these, it is preferable to use methanol or / and acetone. In the present invention, one or more selected from these organic solvents can be used in combination.
  • water is not used as the solvent is that the polycyclic compound has high solubility in water.
  • a dispersion in which the formula compound is dispersed is obtained.
  • the amount of the organic solvent is not particularly limited as long as it is a sufficient amount for the synthesized product. Furthermore, if the amount of organic solvent is too small, so 2 etc. may not be sufficiently dissolved. On the other hand
  • the organic solvent is preferably about 200 to 10,000 parts by mass with respect to 100 parts by mass of the composite.
  • the filtration method is preferably natural filtration using gravity or reduced pressure filtration in which the lower surface of the filter medium is decompressed.
  • pressure filtration and centrifugal filtration can be used as the filtration method.
  • filter medium cellulosic filter paper widely used for natural filtration and the like can be used.
  • a filter medium other than paper such as glass fiber type may be used.
  • the filter medium for example, it is preferable to use a filter medium having a pore size of about 0.8 in.
  • the type of filter paper (mainly fineness of the eyes) is preferably, for example, 5 types C or 6 types for quantitative analysis.
  • 5 types C and 6 types are filter paper standards based on JIS P 3801.
  • the dispersion is separated into a filtrate and a residue by filtration. SO 2 _ and the like dissolved in the organic solvent are removed as a filtrate.
  • Polycyclic compounds that are sparingly soluble in organic solvents are
  • the polycyclic compound can be purified by drying.
  • the residue may be mixed with the organic solvent again and filtration may be repeated.
  • a polycyclic compound with higher purity can be obtained.
  • the amount of residual impurities (amount of sulfuric acid, sulfate, etc.) in the polycyclic compound is It is preferable to carry out until 1 OOmg or less, more preferably 20mg or less.
  • SO 2 and the like in the coating liquid described later can be made extremely small, and a coating liquid excellent in coating property can be prepared.
  • the high purity / polycyclic compound obtained through the above production method or purification method can be used for an appropriate purpose.
  • the use of the purified polycyclic compound is preferably a coating solution for forming a birefringent film or a coating film for forming a polarizing film.
  • the coating liquid can be prepared by dissolving the high-purity polycyclic compound obtained as described above in an appropriate solvent.
  • the polycyclic compound is water-soluble. For this reason, water can be used as a solvent for preparing the coating liquid.
  • the electrical conductivity of the water is preferably 20 S / cm
  • a birefringent film having a high in-plane birefringence can be obtained by using a coating liquid having an electric conductivity of water in the above range, wherein the electric conductivity is determined by the method described in the following examples. Can be measured.
  • the coating solution one or more of the above polycyclic compounds or two or more of different structures are dissolved.
  • the concentration of the polycyclic compound in the coating solution is not particularly limited. However, since the polycyclic compound exhibits a stable nematic liquid crystal phase in the solution, the concentration of the polycyclic compound is preferably 5% by mass to 35% by mass, more preferably 5% by mass to 30% by mass. The nematic liquid crystal phase can be confirmed and identified by the optical pattern of the liquid crystal phase observed with a polarizing microscope.
  • the pH value of the coating solution is low, it is desirable to add an alkali to adjust the pH to about 4 to 10, and further to about pH 6 to 8.
  • an additive may be added to the coating liquid.
  • Additives include plasticizers, heat stabilizers, light stabilizers, lubricants, antioxidants, UV absorbers, flame retardants, colorants, antistatic agents, compatibilizers, crosslinking agents, thickeners, etc. It can be illustrated.
  • the addition amount of these additives is preferably more than 0 and 10 parts by mass or less with respect to 100 parts by mass of the coating liquid.
  • a surfactant is added to the coating solution!
  • the surfactant is used to improve the wettability and coating property of the polycyclic compound to the substrate surface.
  • a nonionic surfactant is preferably used as the surfactant.
  • the additive amount of the surfactant is preferably more than 0 and 5 parts by mass or less with respect to 100 parts by mass of the coating liquid.
  • the birefringent film or polarizing film of the present invention can be obtained by forming a composition containing the above polycyclic compound.
  • the birefringent film or polarizing film of the present invention can be produced, for example, by a production method including the following steps (1) to (3). (1) a step of preparing the coating liquid,
  • a laminated film having at least a birefringent film or a polarizing film and a substrate can be obtained.
  • step (1) and step (2) are performed is not particularly limited, and step (2) may be performed after step (1) is performed first, or step (2). After performing step (1), step (1) may be performed, or step (1) and step (2) may be performed in parallel.
  • the "coating liquid” used in the above step (1) is as described above in the section "Coating liquid containing a polycyclic compound”.
  • the “hydrophilic treatment” in the above step (2) refers to a treatment for reducing the water contact angle of the substrate.
  • the hydrophilization treatment is performed in order to improve the wettability and coatability of the substrate surface on which the polycyclic compound is coated.
  • the hydrophilization treatment is a treatment that lowers the contact angle of water at 23 ° C of the substrate, preferably 10% or more, and more preferably 15% to 80% lower than before the treatment. Particularly preferred is a treatment for reducing by 20% to 70%.
  • the reduction ratio (%) is determined by the equation: ⁇ (contact angle before treatment, contact angle after treatment) / contact angle before treatment ⁇ X100.
  • the contact angle was measured using a solid-liquid interface analyzer (product name “Drop Master300j” manufactured by Kyowa Interface Science Co., Ltd.) (droplet 0.51, static contact angle measurement after 5 seconds from dropping). Can be measured.
  • the hydrophilization treatment is a treatment for reducing the contact angle of water at 23 ° C of the substrate, preferably by 5 ° or more, more preferably 10 ° to 65 ° compared to before treatment.
  • This is a treatment for lowering, particularly preferably a treatment for lowering by 20 ° to 65 °.
  • the hydrophilization treatment is a treatment wherein the contact angle of water at 23 ° C of the substrate is preferably 5 ° to 60 °, more preferably 5 ° to 50 °. Particularly preferred is a treatment of 5 ° to 45 °.
  • the hydrophilic treatment may be, for example, a dry treatment or a wet treatment.
  • the dry treatment include discharge treatment such as corona treatment, plasma treatment, and glow discharge treatment; flame treatment; ozone treatment; ionizing active ray treatment such as UV ozone treatment, ultraviolet treatment, and electron beam treatment.
  • the wet treatment include ultrasonic treatment using a solvent such as water and acetone, alkali treatment, anchor coating treatment, and the like. These treatments may be performed singly or in combination of two or more! /.
  • the hydrophilization treatment is a corona treatment, a plasma treatment, an alkali treatment, or an anchor coat treatment.
  • a birefringent film or a polarizing film having high orientation and low thickness fluctuation can be obtained.
  • the conditions for the hydrophilization treatment (for example, treatment time and strength) can be appropriately adjusted as appropriate so that the water contact angle of the base material falls within the above range.
  • the corona treatment is typically a treatment for modifying the substrate surface by passing the substrate through corona discharge.
  • Corona discharge is generated by applying high frequency and high voltage between a grounded dielectric roll and an insulated electrode, causing the air between the electrodes to break down and become ionized.
  • the plasma treatment is typically a treatment for modifying the substrate surface by passing the substrate through the low temperature plasma.
  • Low-temperature plasma is generated when a glow discharge occurs in an inorganic gas such as a low-pressure inert gas, oxygen, or halogen gas, and part of gas molecules is ionized.
  • the above ultrasonic cleaning treatment is typically a treatment that removes contaminants on the surface of the substrate and improves the wettability of the substrate by immersing the substrate in water or an organic solvent and applying ultrasonic waves. It is.
  • the alkali treatment is typically a treatment for modifying the substrate surface by immersing the substrate in an alkali treatment solution in which a basic substance is dissolved in water or an organic solvent.
  • the anchor coating treatment is typically a treatment for applying an anchor coating agent to the surface of the base material.
  • the substrate on which the coating liquid is applied is used to uniformly cast the coating liquid.
  • Any appropriate substrate can be selected.
  • the substrate include a glass substrate, a quartz substrate, a polymer film, a plastic plate, a metal plate such as aluminum and iron, and ceramics.
  • Examples include a tas substrate and a silicon wafer.
  • the substrate is preferably a glass substrate or a polymer film.
  • the glass substrate any appropriate one can be selected.
  • the glass substrate can be equivalent to a cell substrate used for a liquid crystal cell.
  • the glass substrate include soda lime glass (blue plate glass) containing an alkali component, or low alkali borosilicate glass.
  • a commercial item may be used as it is for the glass substrate.
  • commercially available glass base materials include glass cord “1737” manufactured by Kojung Co., Ltd., glass code “AN635” manufactured by Asahi Glass Co., Ltd., and glass code “NA-35” manufactured by NH Techno Glass Co., Ltd.
  • the polymer film a film having excellent visible light transmittance and excellent transparency is preferably used.
  • the light transmittance of visible light in this polymer film is preferably 80% or more, more preferably 90% or more.
  • the light transmittance is a film thickness of 100 m
  • the Y value is corrected for visibility based on the spectrum data measured with a spectrophotometer (product name “U-4100”, manufactured by Hitachi, Ltd.).
  • the haze value of the polymer film is preferably 3% or less, more preferably 1% or less.
  • the haze value is a value measured according to JIS-K 7105.
  • the resin for forming the polymer film is not particularly limited, and any appropriate resin can be selected.
  • the polymer film is a film containing a thermoplastic resin.
  • the thermoplastic resin include olefin resin, cycloolefin resin, chlorinated resin, cellulose resin, styrene resin, polymethyl methacrylate, polybutyl acetate, vinylidene chloride resin, polyamide resin, and polyacetal resin. , Force-bonate resin, polybutylene terephthalate resin, polyethylene terephthalate resin, polysulfone resin, polyethersulfone resin, polyetheretherketone resin, polyarylate resin, amidoimide resin, imide resin, etc. It is done.
  • thermoplastic resins can be used alone or in combination of two or more.
  • the thermoplastic resin may be subjected to any appropriate polymer modification.
  • examples of the polymer modification include copolymerization, crosslinking, molecular terminals, and stereoregularity.
  • a polymer film containing a cellulose resin as the substrate.
  • a substrate is excellent in wettability with respect to a polycyclic compound. .
  • a birefringent film having a high in-plane birefringence and a small thickness variation can be obtained.
  • a polarizing film having excellent polarization characteristics and small thickness variation can be obtained.
  • the cellulose-based resin is preferably a cellulose organic acid ester or a cellulose mixed organic acid ester substituted with one group at least one of acetyl group, propionyl group and butyl group. It is.
  • the cellulose organic acid ester include cenololose acetate, cenololose propionate, cenololose butyrate and the like.
  • the cellulose mixed organic acid ester include cellulose acetate propionate and cenorelose acetate butyrate.
  • the above-mentioned senorelose resin can be obtained, for example, by the method described in Japanese Patent Publication No. 2001_188128 [0040] to [0041].
  • a commercially available polymer film may be used as it is.
  • a film obtained by subjecting a commercially available polymer film to secondary treatment such as stretching and / or shrinking may be used! /.
  • Commercially available polymer films containing cellulosic resins include Fuji Photo Film Co., Ltd.'s Fujitac series (trade names “ZRF80S”, “TD80UF”, “TDY—80UL”), KONiki Minoltaput Co., Ltd.
  • An example of the product name “KC8UX2M” is available.
  • the thickness of the substrate is preferably 20 ⁇ m to 100 ⁇ m. By making the thickness of the substrate within the above range, the handling property of the substrate is improved.
  • a coating method using an appropriate coater can be adopted as appropriate.
  • the coater include a reverse mouth single coater, a forward rotation low roll coater, a gravure coater, a rod coater, a slot die coater, a slot orifice coater, a curtain coater, and a fountain coater. If the coating method uses the coater, a birefringent film or a polarizing film with small thickness variation can be obtained.
  • the coating speed of the coating solution is preferably 50 mm / second or more, more preferably More than 100mm / sec.
  • a shearing force suitable for orienting the polycyclic compound is applied to the coating solution. For this reason, a birefringent film having a high in-plane birefringence and a small thickness variation can be obtained. Further, by setting the coating speed within the above range, a polarizing film having excellent polarization characteristics and small thickness variation can be obtained.
  • Drying can be performed by, for example, an air circulation type thermostatic oven in which hot or cold air circulates, a heater using microwaves or far infrared rays, a roll heated for temperature control, a heated heat pipe roll, a heated metal It can be performed using a belt or the like.
  • the drying temperature is equal to or lower than the isotropic phase transition temperature of the coating liquid, and it is preferable to gradually raise the temperature from a low temperature to a high temperature.
  • the drying temperature is preferably 10 ° C to 80 ° C, more preferably 20 ° C to 60 ° C. By setting the temperature range, a birefringent film or a polarizing film having a small thickness variation can be obtained.
  • the drying time can be appropriately selected depending on the drying temperature and the type of solvent. However, in order to obtain a birefringent film or a polarizing film with small thickness variation, the drying time is, for example, 1 minute to 30 minutes, preferably 1 minute to 10 minutes.
  • step (4) may be further performed.
  • the birefringent film or polarizing film obtained in the above step (3) has an aluminum salt, a sodium salt, a lead salt, a chromium salt, a strontium salt, and two or more amino groups in the molecule.
  • the above step (4) is carried out in order to make the obtained birefringent film or polarizing film insoluble or hardly soluble in water.
  • the above compound salts include aluminum chloride, barium chloride, lead chloride, chromium chloride, strontium chloride, 4,4'-tetramethyldiaminodiphenylmethane hydrochloride, 2,2'-dipyridyl hydrochloride, 4,4'-dipyridyl hydrochloride And melamine hydrochloride, tetraaminobilimidine hydrochloride and the like. With such a compound salt, a birefringent film or a polarizing film excellent in water resistance can be obtained.
  • the concentration of the compound salt in the solution containing the compound salt is preferably 3% by mass to 40% by mass. More preferably, it is 5 to 30% by mass.
  • a birefringent film or a polarizing film excellent in durability can be obtained by contacting a solution containing a compound salt in the above concentration range.
  • any appropriate method may be adopted as a method of bringing the solution containing the above compound salt into contact with the birefringent film or polarizing film obtained in step (3).
  • the method include a method of applying a solution containing the above compound salt to the surface of the birefringent film or polarizing film, or a method of immersing the birefringent film or polarizing film in a solution containing the above compound salt. Is mentioned.
  • the obtained birefringent film or polarizing film is preferably washed with water or an arbitrary solvent. Thereafter, by further drying, a laminate having excellent interface adhesion between the substrate and the birefringent film or polarizing film can be obtained.
  • the refractive index ellipsoid satisfies the relationship of nx ⁇ nz> ny.
  • the birefringent film exhibits birefringence in the in-plane and / or thickness direction and in-plane and / or birefringence power of the thickness direction 1 X 10_ 4 or more at a wavelength of 590nm at 23 ° C.
  • nx ⁇ nz> ny represents the optical anisotropy of the birefringent film.
  • nx is the refractive index in the direction that maximizes the refractive index in the plane of the birefringent film (that is, the slow axis direction), and ny is the direction that is orthogonal to the slow axis direction in the plane (that is, the fast phase) Representing the refractive index in the axial direction, nz represents the refractive index in the thickness direction (hereinafter the same).
  • the polycyclic compound used as the material for forming the birefringent film of the present invention is preferably a compound having two or more aromatic rings and / or heterocyclic rings in the molecular structure, and more preferably. , A compound having 3 to 8 aromatic rings and / or heterocycles, particularly preferably a compound having 4 to 6 aromatic rings and / or heterocycles.
  • the material for forming the birefringent film is most preferably a polycyclic compound represented by the above general formula (I) or ( ⁇ ⁇ ).
  • the reason why the birefringent film of the present invention exhibits high birefringence is as follows. That is, the polycyclic compound containing the SO M group is a solution.
  • this aggregate which is easy to form an aggregate, is high in order, so the film formed from the force and the solution also shows high orientation and high birefringence. It is thought that a film can be formed. In particular, it has many SO M groups and COOM groups.
  • the cyclic compound is considered to exhibit high orientation.
  • the transmittance of the birefringent film at a wavelength of 590 nm is preferably 85% or more, and more preferably 90% or more.
  • the in-plane retardation value (Re [590]) of the birefringent film at a wavelength of 590 nm can be set to an appropriate value depending on the purpose.
  • the above Re [590] is 10 nm or more, preferably 20 to 1000, more preferably 50 to 500, and particularly preferably 100 to 400 nm.
  • the in-plane retardation value (Re [ ⁇ ]) refers to the in-plane retardation value at 23 ° C. and the wavelength ⁇ (nm).
  • Rth [590] of the birefringent film can be set to an appropriate value as long as the refractive index ellipsoid satisfies the relationship of nx ⁇ nz> ny.
  • the difference (Re [590] — Rth [590]) between the in-plane retardation value (Re [590]) and the thickness direction retardation value (Rth [590]) of the birefringent film at a wavelength of 590 nm is The thickness is preferably 10 nm to 800 nm, more preferably 10 nm to 400 nm, and particularly preferably 10 nm to 200 nm.
  • the thickness direction retardation value (Rth [ ⁇ ]) is the thickness direction retardation value at 23 ° C. and the wavelength ⁇ (nm).
  • the Nz coefficient of the birefringent film is preferably more than 0 and less than 1, more preferably (or 0.1 to 0.8, particularly preferably (or 0.1 to 0). 7, most preferably (0.1 to 0.6). If the Nz coefficient is in the above range, the birefringent film of the present invention can be used for optical compensation of liquid crystal cells in various drive modes. In this specification, the Nz coefficient is a value calculated from Rth [590] / Re [590].
  • the thickness of the birefringent film is preferably 0.05 ⁇ m to 10 ⁇ m, more preferably 0.1 ⁇ m to 8 ⁇ m, and particularly preferably 0.1. ⁇ m to 6 ⁇ m.
  • the birefringent film in the above thickness range has a retardation value useful for improving the display characteristics of a liquid crystal display device.
  • the polarizing film of the present invention containing the above polycyclic compound has a polarization degree of preferably 90% or more, more preferably 95% or more.
  • the single transmittance of the polarizing film is preferably 35% or more, more preferably 40% or more.
  • the single transmittance and degree of polarization are values based on a wavelength of 550 nm at 23 ° C. The reason why a polarizing finale having such a strong polarization property can be obtained is that the polycyclic compound exhibits high orientation by applying a coating solution.
  • the polycyclic compound used as the material for forming the polarizing film of the present invention is a compound having the maximum value of the light absorption spectrum in the wavelength range of 400 nm to 800 nm.
  • the polycyclic compound is preferably a compound having a maximum value of light absorption spectrum within a wavelength range of 400 nm to 800 nm and having two or more aromatic rings and / or heterocyclic rings in the molecular structure. More preferably a compound having the same maximum value and having 3 to 8 aromatic rings and / or heterocycles, and particularly preferably a polycyclic compound having a perylene skeleton.
  • the material for forming the polarizing film is most preferably a polycyclic compound represented by the above general formulas ( ⁇ ) to (VI). A film is formed using a coating solution containing such a polycyclic compound. Then, a polarizing film excellent in dichroism can be obtained.
  • the thickness of the polarizing film is preferably 0 ⁇ ⁇ ⁇ ⁇ ⁇ ; 10 ⁇ m, more preferably 0.1 111-5111. Since the polarizing film of the present invention can be formed by coating, it can be formed thin.
  • the use of the birefringent film of the present invention is not particularly limited, but is typically a ⁇ / 4 plate for a liquid crystal display device, a ⁇ / 2 plate and a viewing angle widening film; an antireflection film for a flat panel display, Etc. Power S is mentioned.
  • the birefringent film can also be used for image display devices such as organic EL display devices.
  • the birefringent film can be laminated with a polarizing film to form a polarizing plate.
  • this polarizing plate will be described.
  • the polarizing plate of the present invention comprises at least the birefringent film of the present invention and a polarizing film.
  • This polarizing plate may include a laminated film including at least the birefringent film of the present invention and a base material, or may include another birefringent film or an optional protective layer. Practically, an arbitrary appropriate adhesive layer is provided between the constituent layers of the polarizing plate, and the birefringent film and the constituent members are attached.
  • the polarizing film constituting the polarizing plate is not particularly limited as long as it has optical characteristics that convert natural light or polarized light into linearly polarized light.
  • the polarizing film of the present invention containing the above polycyclic compound may be used! /, Or another polarizing film may be used.
  • the stretched film which has as a main component the polybulal alcohol-type resin containing an iodine or a dichroic dye is preferable.
  • the thickness of the polarizing film composed of this stretched film is usually 5 am to 50 am.
  • any appropriate layer can be selected as long as it is a layer that joins surfaces of adjacent members and integrates them with practically sufficient adhesive force and adhesive time.
  • the material forming the adhesive layer include an adhesive, a pressure-sensitive adhesive, and an anchor coat agent.
  • the adhesive layer may have a multilayer structure in which an anchor coating agent is applied to the surface of the adherend and an adhesive or a pressure-sensitive adhesive is applied thereon.
  • the adhesive layer may not be recognized macroscopically! /, Such a thin layer! /, Or a layer (also known as a hairline)! /.
  • Above polarizing film The adhesive layer disposed on one side of the system and the adhesive layer disposed on the other side may be the same or different.
  • the angle at which the polarizing film and the birefringent film are attached to the polarizing plate can be appropriately set according to the purpose.
  • the angle between the absorption axis direction of the polarizing film and the slow axis direction of the birefringent film is preferably 25 ° to 65 °. More preferably 35 ° to 55 °.
  • the angle between the polarizing film absorption axis direction and the birefringent film slow axis direction of the polarizing plate is substantially parallel or substantially orthogonal. It is.
  • substantially parallel includes an angle between the absorption axis direction of the polarizing film and the slow axis direction of the birefringent film, and includes a range of 0 ° ⁇ 10 °, preferably 0 ° ⁇ 5 °.
  • substantially orthogonal includes the range of 90 ° ⁇ 10 °, preferably 90 ° ⁇ 5 °, which is the angle force between the absorption axis direction of the polarizing film and the slow axis direction of the birefringent film. °.
  • the application of the polarizing film of the present invention is not particularly limited, but is typically an optical application of a liquid crystal display device. Since the polarizing film of the present invention is formed by coating on a substrate, the substrate can also be used as a protective film.
  • a part of the coating film formed on the surface of the base material (glass plate) is peeled off, and the step between the base material and the coating film is measured with a three-dimensional non-contact surface shape measurement system (manufactured by Ryoka System Co., Ltd. measured using the name "Mi C ram a p MM5200"), which was the thickness.
  • the measured values of polarization degree and single transmittance were based on a wavelength of 550 nm.
  • the single transmittance is tristimulus Y ⁇ t based on the two-degree field of view of J1S Z 8701-1995
  • a solid was obtained in the same manner as in Example 1-1 except that 10 g of acetone was used instead of methanol.
  • a solid was obtained in the same manner as in Example 1-1 except that 10 g of toluene was used instead of methanol.
  • a solid was obtained in the same manner as in Example 2-1, except that 10 g of acetone was used instead of methanol.
  • Example 2-1 A solid was obtained in the same manner as in Example 2-1, except that 10 g of toluene was used instead of methanol.
  • the PCDI used was a mixture of cis and transformer types as shown in equation (e).
  • a solid was obtained in the same manner as in Example 3-1, except that 10 g of acetone was used instead of methanol.
  • a solid was obtained in the same manner as in Example 3-1, except that 10 g of toluene was used instead of methanol.
  • the amount of residual sulfuric acid was determined according to the following formula.
  • Residual sulfuric acid amount (mg) / raw material solid content (g) [ ⁇ (base amount in sodium hydroxide aqueous solution used for titration (mol)-assuming that all the raw material solid content used for titration is the target quinoxaline. Acid amount (mol)) ⁇ 98 ⁇ 03 ⁇ / 2] X (1000 / raw material solids (g)).
  • the electrical conductivity (S / cm) was measured using a solution conductivity meter (product name “CM-117” manufactured by Kyoto Electronics Industry Co., Ltd.).
  • the purified aqueous solution obtained was diluted by adding ion-exchanged water so as to have the same concentration as above to obtain an aqueous solution for measurement.
  • the electrical conductivity of the synthesized products (before filtration treatment) synthesized in Synthesis Examples 1 to 3 was also measured by the same method as described above.
  • Table 1 shows the measurement results of the amount of residual sulfuric acid and electrical conductivity. As shown in Table 1, Example 1 one;
  • aqueous solution is applied to a 1.3 mm thick glass plate (trade name “MATSUNAMI S LIDE GLASS” manufactured by Matsunami Glass Industrial Co., Ltd.) and a bar coater (trade name “m ayer rot HS 1.5” manufactured by BUSCHMAN). And dried in a constant temperature room at 23 ° C. When the surface of the coating film was visually observed, it was uniformly coated without repelling.
  • the refractive index ellipsoid satisfies the relationship iix>nz> ny, and this can be used as a birefringent film.
  • Example 3 Same as Example 3 except that 1.56 g of the compound obtained in Synthesis Example 1 (before filtration) and 0.84 g of the compound obtained in Synthesis Example 2 (before filtration) were used. An aqueous solution was prepared and applied to form a coating film on a glass plate.
  • the obtained aqueous solution was concentrated using a rotary evaporator until the concentration of the PCDI sulfonated product in the aqueous solution reached 11% by mass.
  • the obtained aqueous solution was observed with a polarizing microscope, it exhibited a nematic liquid crystal phase at 23 ° C.
  • the coating film thus formed can be used as a polarizing film.
  • An aqueous solution was prepared in the same manner as in Example 5 except that 2.0 g of the synthesized product obtained in Synthesis Example 3 (before filtration) was used, and this was coated to form a coating film on a glass plate. Formed.

Abstract

The invention provides a process for production of polycyclic compounds substantially free from impurities such as sulfuric acid. The process comprises the step of synthesizing a polycyclic compound having a -SO3M group through sulfonation, the step of mixing the obtained synthetic with an organic solvent in which SO42- or SO3- is soluble and in which the polycyclic compound is slightly soluble to prepare a dispersion, and the step of filtering the dispersion to separate the polycyclic compound. Examples of the polycyclic compounds include quinoxaline derivatives represented by the general formula(I).

Description

明 細 書  Specification
多環式化合物の精製方法、多環式化合物の製造方法、及び多環式化合 物の用途  Methods for purifying polycyclic compounds, methods for producing polycyclic compounds, and uses of polycyclic compounds
技術分野  Technical field
[0001] 本発明は、硫酸イオンなどの不純物が含まれている多環式化合物を精製する方法 、及び SO M基を有する多環式化合物の製造方法、及びその用途に関する。  The present invention relates to a method for purifying a polycyclic compound containing impurities such as sulfate ions, a method for producing a polycyclic compound having a SO M group, and uses thereof.
3  Three
背景技術  Background art
[0002] 液晶表示装置(以下、 LCDと!/、う場合がある)は、液晶分子の電気光学特性を利用 して、文字や画像を表示する素子である。 LCDは、携帯電話やノートパソコン、液晶 テレビ等に広く普及している。しかし、 LCDは、光学異方性を持った液晶分子を利用 するため、ある一方向には優れた表示特性を示していても、他の方向では、画面が 暗くなつたり、不鮮明になったりするといつた課題がある。複屈折性フィルムは、このよ うな課題を解決するために、 LCDに用いられている。複屈折性フィルムは、位相差フ イルム、光学補償フィルムなどとも呼ばれる。  A liquid crystal display device (hereinafter sometimes referred to as “LCD”) is an element that displays characters and images by utilizing the electro-optical characteristics of liquid crystal molecules. LCDs are widely used in mobile phones, notebook computers, liquid crystal televisions, and so on. However, since LCD uses liquid crystal molecules with optical anisotropy, even if it shows excellent display characteristics in one direction, the screen becomes dark or unclear in the other direction. There is a problem when. Birefringent films are used in LCDs to solve these problems. A birefringent film is also called a retardation film or an optical compensation film.
従来、複屈折性フィルムの一つとして、屈折率楕円体が nx〉nz〉nyの関係を満足 するフィルムが知られている(例えば、特許文献 1参照)。この複屈折性フィルムは、 高分子フィルムの両側に収縮性フィルムを貼着し、該収縮性フィルムの収縮によって 高分子フィルムを厚み方向に膨張するように延伸する方法で作製される。このため、 得られる複屈折性フィルムは、分厚くなり易ぐ薄型軽量化の要請に応えることができ ない。  Conventionally, as one of birefringent films, a film whose refractive index ellipsoid satisfies the relationship of nx> nz> ny is known (for example, see Patent Document 1). This birefringent film is produced by a method in which a shrinkable film is attached to both sides of a polymer film, and the polymer film is stretched so as to expand in the thickness direction by shrinkage of the shrinkable film. For this reason, the birefringent film obtained cannot easily meet the demand for thinning and weight reduction that tends to be thick.
特許文献 1 :日本国特許公開 2006— 072309号公報  Patent Document 1: Japanese Patent Publication 2006-072309
発明の開示  Disclosure of the invention
[0003] 本発明者らは、薄型軽量化に優れた複屈折性フィルムを得るため、種々の材料を 検討したところ、 SO M基を有する多環式化合物が好ましい材料であることを発見  [0003] The present inventors have studied various materials in order to obtain a thin and light birefringent film, and found that a polycyclic compound having a SOM group is a preferable material.
3  Three
した。かかる多環式化合物は、水に溶解させ、該水溶液を基材上に塗工することによ り、 nx≥nz〉nyの関係を満足する複屈折性フィルムを得ることができる。かかる知見 の下、多環式化合物を用いた製膜について更に検討していたところ、基材上に塗工 する際、多環式化合物の水溶液を均等に塗工できない場合がある。本発明者らは、 この原因について更に鋭意研究したところ、多環式化合物の水溶液中に so 2_など did. A birefringent film satisfying the relationship of nx≥nz> ny can be obtained by dissolving such a polycyclic compound in water and coating the aqueous solution on a substrate. Based on this knowledge, we were further studying film formation using polycyclic compounds. In some cases, the aqueous solution of the polycyclic compound may not be applied uniformly. The present inventors have further conducted intensive studies on the cause, in an aqueous solution of a polycyclic compound so 2 _ etc.
4 が含まれ、この存在が上記水溶液の塗工性を悪くしている原因であることを突き止め 、本発明を完成させた。  4 was found to be the cause of the deterioration of the coatability of the aqueous solution, and the present invention was completed.
[0004] 本発明の目的は、多環式化合物から、硫酸などの不純物を簡単に且つ実質的に 除去することができる多環式化合物の精製方法を提供することである。 [0004] An object of the present invention is to provide a method for purifying a polycyclic compound that can easily and substantially remove impurities such as sulfuric acid from the polycyclic compound.
本発明の他の目的は、硫酸などの不純物を実質的に含まない多環式化合物の製 造方法を提供することである。  Another object of the present invention is to provide a method for producing a polycyclic compound substantially free of impurities such as sulfuric acid.
本発明の他の目的は、上記多環式化合物を含有し、基材上に良好に塗工できるコ 一ティング液を提供することである。  Another object of the present invention is to provide a coating solution that contains the polycyclic compound and can be satisfactorily coated on a substrate.
[0005] 本発明の第 1の手段は、 SO 2 及び SO—の少なくとも何れか一方を含む不純物と [0005] The first means of the present invention includes an impurity containing at least one of SO 2 and SO—.
4 3  4 3
- SO M基を有する多環式化合物(ただし、 Mは対イオンを表す)とを含有する混合 -A mixture containing a polycyclic compound having a SO M group (where M represents a counter ion)
3 Three
物から前記多環式化合物を精製する方法であって、前記混合物を、 so 2 又は so A method for purifying the polycyclic compound from a product, wherein the mixture is so 2 or so
4 3 4 3
_が溶解し且つ前記多環式化合物が難溶な有機溶媒に混合して分散液を得る工程 、前記分散液をろ過し、多環式化合物を分離する工程、を有することを特徴とする。 _ Is dissolved and the polycyclic compound is mixed with a poorly soluble organic solvent to obtain a dispersion, and the dispersion is filtered to separate the polycyclic compound.
[0006] 上記精製方法によれば、多環式化合物中に含有する SO 2_又は/及び SO _は、 [0006] According to the purification method, SO 2 _ and / or SO _ contained in the polycyclic compound is
4 3 有機溶媒と共にろ液として流出し、その結果、残さとして多環式化合物を分離できる 。従って、本発明では、ろ過という比較的簡便な方法で、多環式化合物を分離精製 すること力 Sでさる。  4 3 It flows out as a filtrate together with an organic solvent, and as a result, a polycyclic compound can be separated as a residue. Therefore, in the present invention, the force S can be used to separate and purify polycyclic compounds by a relatively simple method of filtration.
精製された多環式化合物は、例えば、コーティング液に調製される。該コーティング 液は、基材上に良好に塗工でき、その結果、厚みがほぼ均一なフィルムを作製でき  The purified polycyclic compound is prepared, for example, as a coating solution. The coating liquid can be satisfactorily coated on the substrate, and as a result, a film having a substantially uniform thickness can be produced.
[0007] 本発明の好ましい多環式化合物の精製方法は、上記有機溶媒が、メタノール、エタ ノール、イソプロピルアルコール、その他の低級アルコール、及びアセトンから選ばれ る少なくとも 1種である。 [0007] In a preferred method for purifying a polycyclic compound of the present invention, the organic solvent is at least one selected from methanol, ethanol, isopropyl alcohol, other lower alcohols, and acetone.
[0008] 本発明の他の好ましい多環式化合物の精製方法は、上記多環式化合物が、下記 一般式 (I)で表されるキノキサリン誘導体を含む。  [0008] In another preferred method for purifying a polycyclic compound of the present invention, the polycyclic compound includes a quinoxaline derivative represented by the following general formula (I).
[0009] [化 1] 式 (I)中、 Mは、対イオンを表す。 A及び Bは、置換基を表し、 a及び bは、その置換 数(aは 0〜4の整数、 bは、 0〜6の整数)を表す。また、 1及び mは、置換数(1は、 0〜 4の整数、 mは、 0〜6の整数)を表す。ただし、 1及び mは、同時に 0でない。 [0009] [Chemical 1] In formula (I), M represents a counter ion. A and B represent substituents, and a and b represent the number of substitutions (a is an integer from 0 to 4, and b is an integer from 0 to 6). 1 and m represent the number of substitutions (1 is an integer from 0 to 4, and m is an integer from 0 to 6). However, 1 and m are not 0 at the same time.
[0010] さらに、本発明の他の好ましい多環式化合物の精製方法は、上記多環式化合物が 、下記一般式 (Π)で表されるキノキサリン誘導体を含む。  Furthermore, in another preferred method for purifying a polycyclic compound of the present invention, the polycyclic compound includes a quinoxaline derivative represented by the following general formula (一般).
[0011] [化 2]  [0011] [Chemical 2]
式(Π)中、 Mは、対イオンを表す。 mは、置換数(1〜6の整数)を表す。 In the formula (Π), M represents a counter ion. m represents the number of substitutions (an integer of 1 to 6).
[0012] 本発明の他の好ましい多環式化合物の精製方法は、上記多環式化合物が、波長 4[0012] Another preferable method for purifying a polycyclic compound according to the present invention is that the polycyclic compound has a wavelength of 4
00nm〜800nmに於いて光吸収スペクトルの最大値を有する化合物である。 It is a compound having the maximum value of the light absorption spectrum at 00 nm to 800 nm.
[0013] 本発明の他の好ましい多環式化合物の精製方法は、上記多環式化合物が、下記 一般式 (ΠΙ)または一般式 (IV)で表されるペリレン誘導体を含む。 In another preferable method for purifying a polycyclic compound of the present invention, the polycyclic compound includes a perylene derivative represented by the following general formula (IV) or general formula (IV).
[0014] [化 3] [0014] [Chemical 3]
式(III)及び式(IV)中、 Mは対イオンを表す。 nl〜! ι4は、置換基(0〜4の整数)を 表す。ただし、 nl〜! ι4の全て力 同時に 0でない。  In formula (III) and formula (IV), M represents a counter ion. nl ~! ι4 represents a substituent (an integer of 0 to 4). However, nl ~! All powers of ι4 are not 0 at the same time.
[0015] また、本発明の他の好ましい多環式化合物の精製方法は、分離後の多環式化合 物中の残存不純物量が、 100mg/g以下である。 [0015] In another preferable method for purifying a polycyclic compound of the present invention, the amount of residual impurities in the polycyclic compound after separation is 100 mg / g or less.
[0016] さらに、本発明の第 2の手段は、多環式化合物の製造方法に係り、スルホン化処理 をし、 SO M基を有する多環式化合物(ただし、 Mは対イオンを表す)を合成する [0016] Further, the second means of the present invention relates to a method for producing a polycyclic compound, which is a sulfonating polycyclic compound having a SO M group (where M represents a counter ion). Synthesize
3  Three
工程、前記合成物を、 so 2 又は so—が溶解し且つ前記多環式化合物が難溶な A step, wherein the compound is dissolved in so 2 or so- and the polycyclic compound is hardly soluble
4 3  4 3
有機溶媒に混合して分散液を得る工程、前記分散液をろ過して多環式化合物を分 離する工程、を有することを特徴とする。  It has a step of obtaining a dispersion by mixing with an organic solvent, and a step of filtering the dispersion to separate a polycyclic compound.
[0017] 本発明の好ましい多環式化合物の製造方法は、上記スルホン化処理として、硫酸[0017] A preferred method for producing a polycyclic compound according to the present invention is to use sulfuric acid as the sulfonation treatment.
、発煙硫酸、及び無機スルホン酸から選ばれる少なくとも 1種を用いる。 At least one selected from fuming sulfuric acid and inorganic sulfonic acid is used.
[0018] 本発明の他の好ましい多環式化合物の製造方法は、上記多環式化合物が、上記 一般式 (I)で表されるキノキサリン誘導体を含む。 [0018] In another preferable method for producing a polycyclic compound of the present invention, the polycyclic compound contains a quinoxaline derivative represented by the general formula (I).
[0019] 本発明の他の好ましい多環式化合物の製造方法は、上記多環式化合物が、波長 4[0019] According to another preferred method for producing a polycyclic compound of the present invention, the polycyclic compound has a wavelength of 4
00nm〜800nmに於いて光吸収スペクトルの最大値を有する化合物である。 It is a compound having the maximum value of the light absorption spectrum at 00 nm to 800 nm.
[0020] 本発明の他の好ましい多環式化合物の製造方法は、上記多環式化合物が、水に 可溶である。 [0020] In another preferable method for producing a polycyclic compound of the present invention, the polycyclic compound is soluble in water.
[0021] また、本発明の第 3の手段は、コーティング液に係り、このコーティング液は、上記 何れかの精製方法又は何れかの製造方法により分離された多環式化合物を、水に 溶解させることにより得られることを特徴とする。 [0021] Further, the third means of the present invention relates to a coating solution, and the coating solution contains, in water, the polycyclic compound separated by any one of the above purification methods or any one of the production methods. It is obtained by dissolving.
[0022] 本発明の好ましいコーティング液は、ネマチック液晶相を示す。 [0022] A preferred coating liquid of the present invention exhibits a nematic liquid crystal phase.
本発明の他の好ましいコーティング液は、 pHが 4〜; 10に調製されている。  Other preferred coating solutions of the present invention are prepared with a pH of 4 to 10;
[0023] 本発明の第 4の手段は、複屈折性フィルムに係り、この複屈折性フィルムは、上記 何れかのコーティング液を基材上に塗工し、乾燥することにより得られ、屈折率楕円 体が nx^nz〉nyの関係を満足することを特徴とする。 [0023] A fourth means of the present invention relates to a birefringent film, and the birefringent film is obtained by applying any one of the above-mentioned coating liquids onto a substrate and drying, and has a refractive index. The ellipsoid is characterized by satisfying the relationship nx ^ nz> ny.
[0024] 本発明の第 5の手段は、偏光フィルムに係り、この偏光フィルムは、上記何れかのコ 一ティング液を基材上に塗工し、乾燥することにより得られる。 [0024] A fifth means of the present invention relates to a polarizing film, and this polarizing film is obtained by applying any one of the above-mentioned coating solutions onto a substrate and drying.
[0025] 本発明の多環式化合物の精製方法及び多環式化合物の製造方法によれば、不純 物を簡易に除去でき、純度の高い多環式化合物を得ることができる。 [0025] According to the method for purifying a polycyclic compound and the method for producing a polycyclic compound of the present invention, impurities can be easily removed, and a highly pure polycyclic compound can be obtained.
かかる方法によって得られた多環式化合物は、これを溶液状にすることで、基材に 良好に塗工できるコーティング液を得ることができる。  The polycyclic compound obtained by such a method can be used as a solution to obtain a coating solution that can be satisfactorily applied to a substrate.
このコーティング液を基材に塗工乾燥して得られた膜は、複屈折性フィルムまたは 偏光フィルムとして利用できる。  A film obtained by coating and drying this coating liquid on a substrate can be used as a birefringent film or a polarizing film.
発明を実施するための最良の形態  BEST MODE FOR CARRYING OUT THE INVENTION
[0026] <多環式化合物の精製方法及び製造方法〉 <Polycyclic compound purification method and production method>
本発明の多環式化合物の精製方法は、 SO 2 及び SO—の少なくとも何れか一方 The method for purifying a polycyclic compound of the present invention includes at least one of SO 2 and SO—
4 3  4 3
を含む不純物と、 SO M基を有する多環式化合物(ただし、 Mは対イオンを表す)  And a polycyclic compound having a SO M group (where M represents a counter ion)
3  Three
と、を含有する混合物から、前記多環式化合物を簡易に精製できる。  The polycyclic compound can be easily purified from a mixture containing
なお、以下、本発明の多環式化合物の精製方法について、多環式化合物の製造 方法と共に説明する。  Hereinafter, the method for purifying the polycyclic compound of the present invention will be described together with the method for producing the polycyclic compound.
[0027] (多環式化合物) [0027] (Polycyclic compound)
本発明の方法の処理対象となる多環式化合物は、 SO M基を有する多環式化  The polycyclic compound to be treated by the method of the present invention is a polycyclic compound having a SO M group.
3  Three
合物であれば特に限定されない。さらに、この多環式化合物は、 SO M基及び  If it is a compound, it will not specifically limit. Furthermore, this polycyclic compound comprises a SO M group and
3  Three
COOM基を含んでもよい。ただし、 Mは、対イオンを表す(以下、同様)。本発明の 方法の処理対象となる多環式化合物は、 1種でも良いし、構造の異なる 2種以上でも よい。  COOM groups may be included. However, M represents a counter ion (hereinafter the same). The polycyclic compound to be treated by the method of the present invention may be one kind or two or more kinds having different structures.
上記多環式化合物の基本骨格は、好ましくは芳香環及び/又は複素環を 2個以上 有し、より好ましくは芳香環及び/又は複素環を 3個〜 8個有する。また、多環式化 合物の基本骨格は、好ましくは少なくとも複素環を有し、該複素環は窒素原子を含む こと力 Sより好ましい。具体的には、上記多環式化合物の基本骨格としては、キノキサリ ン誘導体、又はペリレン誘導体を例示できる。これら多環式化合物は、溶液状態で液 晶相(すなわち、リオトロピック液晶)を呈するので好ましい。なお、この液晶相は、配 向性に優れるという点で、好ましくは、ネマチック液晶相である。このネマチック液晶 相は、超分子を形成し、その形成体がネマチック状態にある場合も含まれる。 The basic skeleton of the polycyclic compound is preferably two or more aromatic rings and / or heterocyclic rings More preferably 3 to 8 aromatic rings and / or heterocyclic rings. In addition, the basic skeleton of the polycyclic compound preferably has at least a heterocyclic ring, and the heterocyclic ring preferably contains a nitrogen atom, more preferably the force S. Specifically, examples of the basic skeleton of the polycyclic compound include quinoxaline derivatives and perylene derivatives. These polycyclic compounds are preferable because they exhibit a liquid crystal phase (that is, lyotropic liquid crystal) in a solution state. In addition, this liquid crystal phase is preferably a nematic liquid crystal phase in terms of excellent orientation. This nematic liquid crystal phase includes supramolecules, and the formed body is in a nematic state.
上記キノキサリン系の多環式化合物は、好ましくは複屈折性フィルムの形成材料と して用いること力 Sできる。上記ペリレン系の多環式化合物は、好ましくは偏光フィルム の形成材料として用いることができる。  The quinoxaline-based polycyclic compound is preferably used as a material for forming a birefringent film. The perylene-based polycyclic compound can be preferably used as a material for forming a polarizing film.
[0028] 上記キノキサリン系の多環式化合物としては、下記一般式 (I)で表されるァセナフト  [0028] Examples of the quinoxaline-based polycyclic compound include acenaphtho represented by the following general formula (I):
[1 , 2— b]キノキサリン誘導体を例示できる。式 (I)中、 A及び Bは、置換基を表し、 a 及び bは、その置換数(aは 0〜4の整数、 bは、 0〜6の整数)を表す。また、 1及び mは 、置換数(1は、 0〜4の整数、 mは、 0〜6の整数)を表す。ただし、 1及び mは、同時に 0でなぐ少なくとも何れか一方は、 1以上である。  Examples include [1, 2, b] quinoxaline derivatives. In the formula (I), A and B represent substituents, and a and b represent the number of substitutions (a is an integer of 0 to 4, and b is an integer of 0 to 6). 1 and m represent the number of substitutions (1 is an integer from 0 to 4, and m is an integer from 0 to 6). However, at least one of 1 and m which is not 0 at the same time is 1 or more.
上記一般式 (I)中の Mは、対イオンを表す。前記 Mは、好ましくは、水素原子、アル カリ金属原子、アルカリ土類金属原子、金属イオン、又は置換若しくは無置換のアン モニゥムイオンなどである。該金属イオンとしては、 Ni2+、 Fe3+、 Cu2+、 Ag+、 Zn2+、 Al3+、 Pd2+、 Cd2+、 Sn2+、 Co2+、 Mn2+、 Ce3+などを例示できる。 M in the general formula (I) represents a counter ion. The M is preferably a hydrogen atom, an alkali metal atom, an alkaline earth metal atom, a metal ion, or a substituted or unsubstituted ammonium ion. The metal ions include Ni 2+ , Fe 3+ , Cu 2+ , Ag + , Zn 2+ , Al 3+ , Pd 2+ , Cd 2+ , Sn 2+ , Co 2+ , Mn 2+ , Ce 3+ and the like can be exemplified.
[0029] [化 4]  [0029] [Chemical 4]
式(I)の A及び Bで表す置換基は、同一または異なっていてもよい。 A及び Bの置換 基としては、ハロゲン原子、置換若しくは無置換の炭素数;!〜 2のアルキル基、置換 若しくは無置換の炭素数 1〜2のアルコキシ基、 OCOCH基、 NH基、 NHC OCH基、—NO基、 CF基、 CN基、 OCN基、 SCN基、 COOM基、 The substituents represented by A and B in formula (I) may be the same or different. Substituents for A and B include halogen atoms, substituted or unsubstituted carbon numbers;! To 2 alkyl groups, substituted or unsubstituted alkoxy groups having 1 to 2 carbon atoms, OCOCH groups, NH groups, NHCs OCH group, —NO group, CF group, CN group, OCN group, SCN group, COOM group,
3 2 3 3 2 3
CONH基、 SM基、 OM基などを例示できる(各基に於いて、 Mは、対イオン CONH group, SM group, OM group, etc. can be exemplified (in each group, M is a counter ion)
2 2
を表す)。好ましくは、 A及び Bの少なくとも何れか一方は、 COOM基(カルボン酸 又はその塩)である。多環式化合物は、 A及び Bで表される上記置換基を有していて も、本発明の方法によって分離することができる。一般式 (I)において、好ましくは、置 換数 a及び bは 0〜2であり、より好ましくは、置換数 a及び bは 0〜1である。 A及び Bが 無置換又は置換数の少ない一般式 (I)の多環式化合物は、塗工することにより、良好 な配向性を示す。  Represents). Preferably, at least one of A and B is a COOM group (carboxylic acid or a salt thereof). Even if the polycyclic compound has the above substituents represented by A and B, it can be separated by the method of the present invention. In the general formula (I), the substitution numbers a and b are preferably 0 to 2, and more preferably the substitution numbers a and b are 0 to 1. The polycyclic compound of the general formula (I) in which A and B are unsubstituted or have a small number of substitutions shows good orientation when coated.
[0031] また、上記キノキサリン系の多環式化合物としては、下記一般式 (II)で表されるァセ ナフト [1 , 2— b]キノキサリン誘導体を例示できる。式 (Π)中、 mは、置換数(1〜6の 整数)を表す。上記一般式 (II)中の Mは、式 (I)と同様である。一般式 (Π)で表される キノキサリン誘導体の中でも、 mが 1又は 2であるキノキサリン誘導体は、本発明の方 法によって高!/、収率で分離精製できる。  [0031] Further, examples of the quinoxaline-based polycyclic compound include acetnaphtho [1,2-b] quinoxaline derivatives represented by the following general formula (II). In formula (Π), m represents the number of substitutions (an integer of 1 to 6). M in the general formula (II) is the same as that in the formula (I). Among the quinoxaline derivatives represented by the general formula (Π), a quinoxaline derivative in which m is 1 or 2 can be separated and purified in high yield / yield by the method of the present invention.
[0032] [化 5]  [0032] [Chemical 5]
[0033] ペリレン系の多環式化合物としては、下記一般式 (III)または一般式 (IV)で表される ペリレン系誘導体を例示できる。式(III)及び式(IV)中、 nl〜! ι4は、置換数(0〜4の 整数)を表す。ただし、 nl〜! ι4の全てが同時に 0ではなぐ nl〜! ι4のうち少なくとも 何れか一つは、;!〜 4の整数である。好ましくは、 nl及び n2の少なくとも何れか一方 力 S、;!〜 4の整数である。上記式 (III)及び式 (IV)の Mは、式 (I)と同様である。一般式 (III)または一般式(IV)において、 nl〜! ι4は、好ましくは 0〜2の整数であり、より好ま しくは 0〜1の整数である。 [0033] Examples of perylene-based polycyclic compounds include perylene-based derivatives represented by the following general formula (III) or general formula (IV). In formula (III) and formula (IV), nl ~! ι4 represents the number of substitutions (an integer from 0 to 4). However, nl ~! ι4 is all 0 at the same time nl ~! At least one of ι4 is an integer from! Preferably, at least one of nl and n2 is a force S; M in the above formulas (III) and (IV) is the same as in formula (I). In general formula (III) or general formula (IV), nl ~! ι4 is preferably an integer of 0 to 2, more preferably an integer of 0 to 1.
[0034] [化 6] [0034] [Chemical 6]
[0035] また、ペリレン系の多環式化合物としては、下記一般式 (V)または一般式 (VI)で表 されるペリレン系誘導体を例示できる。式 (V)及び式 (VI)中、 nl及び n2は、置換数( 0〜4の整数)を表す。ただし、 nl及び n2の少なくとも何れか一方は、 1〜4の整数で ある。上記式 (V)及び式 (VI)の Mは、式 (I)と同様である。一般式 (V)または一般式( VI)において、 nl及び n2は、何れも 1又は 2の整数が好ましい。一般式 (V)または(VI )で表される多環式化合物は、基本骨格の長軸方向両端部に SO M基を有してい  In addition, examples of perylene-based polycyclic compounds include perylene-based derivatives represented by the following general formula (V) or general formula (VI). In formula (V) and formula (VI), nl and n2 represent the number of substitutions (an integer of 0 to 4). However, at least one of nl and n2 is an integer of 1 to 4. M in the above formulas (V) and (VI) is the same as in formula (I). In general formula (V) or general formula (VI), nl and n2 are each preferably an integer of 1 or 2. The polycyclic compound represented by the general formula (V) or (VI) has SO M groups at both ends in the long axis direction of the basic skeleton.
3  Three
る。かかるペリレン系の多環式化合物は、塗工することにより、良好な配向性を示す。  The Such perylene-based polycyclic compounds exhibit good orientation when applied.
[0036] [化 7] [0036] [Chemical 7]
上記一般式(III)〜(VI)で表されるペリレン系の多環式化合物は、波長 400nm〜8 OOnmの範囲内に於!/、て光吸収スペクトルの最大値を有する化合物である。かかる 多環式化合物は、特に、偏光フィルムの形成材料として好適である。 [0038] (一 SO M基を有する多環式化合物の合成) The perylene-based polycyclic compounds represented by the above general formulas (III) to (VI) are compounds having the maximum value of the light absorption spectrum in the wavelength range of 400 nm to 8 OOnm. Such a polycyclic compound is particularly suitable as a material for forming a polarizing film. [0038] (Synthesis of polycyclic compound having one SO M group)
3  Three
上記多環式化合物は、化合物の基本骨格に SO M基 (スルホン酸又はその塩)  The above polycyclic compound has a SO M group (sulfonic acid or a salt thereof) in the basic skeleton of the compound.
3  Three
を導入することによって得ること力できる。前記 SO M基は、例えば、スルホン化処  You can gain the power by introducing. The SO M group is, for example, a sulfonation treatment.
3  Three
理によって導入できる。  It can be introduced by reason.
キノキサリン系の多環式化合物の合成方法は、例えば、次の 1)及び 2)などが挙げ られる。  Examples of methods for synthesizing quinoxaline-based polycyclic compounds include the following 1) and 2).
1)非置換または置換基を有するキノキサリン誘導体を、発煙硫酸などでスルホン化 して、 SO M基の導入されたキノキサリン誘導体を合成する方法。  1) A method of synthesizing a quinoxaline derivative having an SO M group introduced by sulfonating an unsubstituted or substituted quinoxaline derivative with fuming sulfuric acid or the like.
3  Three
2)非置換または置換基を有する 1 , 2—ベンゼンジァミン、又は/及び、非置換ま たは置換基を有するァセナフトキノンを、発煙硫酸などでスルホン化した後、両化合 物を縮合させて SO M基の導入されたキノキサリン誘導体を合成する方法。  2) 1,2-Benzenediamine having an unsubstituted or substituted group or / and acenaphthoquinone having an unsubstituted or substituted group are sulfonated with fuming sulfuric acid and the like, and then both compounds are condensed to form SO. A method for synthesizing a quinoxaline derivative having an M group introduced therein.
3  Three
[0039] 上記 1)の具体的方法としては、例えば、下記反応式 (a)に示されるァセナフト [1 , 2 b]キノキサリン又はその置換物を、無機スルホン酸などでスルホン化する。前記無 機スルホン酸としては、硫酸、発煙硫酸、又はクロロスルホン酸などを例示できる。 かる方法によって SO M基を有するキノキサリン誘導体(多環式化合物)を得ること  [0039] As a specific method of the above 1), for example, acenaphtho [1,2b] quinoxaline represented by the following reaction formula (a) or a substituted product thereof is sulfonated with an inorganic sulfonic acid or the like. Examples of the inorganic sulfonic acid include sulfuric acid, fuming sulfuric acid, and chlorosulfonic acid. Obtaining a quinoxaline derivative (polycyclic compound) having a SO M group by this method
3  Three
力できる。なお、式(a)中、 A、 a、 B、 b、 1及び mは、式(I)と同様である(但し、 1及び m は、同時に 0でない)。  I can do it. In formula (a), A, a, B, b, 1 and m are the same as in formula (I) (provided that 1 and m are not 0 at the same time).
[0040] [化 8] [0040] [Chemical 8]
また、上記 2)の具体的方法としては、例えば、下記式 (b)に示される 1 , 2—べンゼ ンジァミン若しくはその置換物、または、ァセナフトキノン若しくはその置換物の少なく とも何れか一方を、無機スルホン酸などでスルホン化した後、該ベンゼンジァミンとァ セナフトキノンを縮合させる。前記無機スルホン酸としては、硫酸、発煙硫酸、又はク ロロスルホン酸などを例示できる。力、かる方法によって一 SO M基を有するキノキサリ ン誘導体(多環式化合物)を得ることができる。なお、式 (b)中、 A、 a、 B、 b、 1及び m は、式 (I)と同様である(但し、 1及び mは、同時に 0でない)。 In addition, as a specific method of the above 2), for example, at least one of 1,2-benzenediamine represented by the following formula (b) or a substituted product thereof, or acenaphthoquinone or a substituted product thereof is used. After sulfonation with an inorganic sulfonic acid or the like, the benzenediamine and acenaphthoquinone are condensed. Examples of the inorganic sulfonic acid include sulfuric acid, fuming sulfuric acid, and chlorosulfonic acid. Quinoxari having one SO M group by force, method Derivatives (polycyclic compounds) can be obtained. In formula (b), A, a, B, b, 1 and m are the same as in formula (I) (provided that 1 and m are not 0 at the same time).
[化 9]  [Chemical 9]
[0043] 本発明のペリレン系の多環式化合物は、例えば、ペリレン誘導体 (例えば、ペリレン テトラカルボン酸のジベンゾイミダゾール誘導体など)を発煙硫酸などでスルホン化処 理して、 SO M基の導入されたペリレン誘導体を合成することにより、得ることがで [0043] The perylene-based polycyclic compound of the present invention includes, for example, a perylene derivative (for example, a dibenzimidazole derivative of perylene tetracarboxylic acid) sulfonated with fuming sulfuric acid and the like, and an SO M group is introduced. Can be obtained by synthesizing a perylene derivative.
3  Three
きる。  wear.
[0044] (多環式化合物の精製)  [0044] (Purification of polycyclic compound)
上記合成によって得られた合成物の中には、 SO 2_又は SO—を生じ得る不純物 Among the compounds obtained by the above synthesis, impurities that can generate SO 2 _ or SO-
4 3  4 3
が残存している。 so 2 又は so—を生じ得る不純物とは、上記スルホン化処理に用 Remains. Impurities that can generate so 2 or so-
4 3  4 3
いた硫酸及びその塩、無機スルホン酸等である。  Sulfuric acid and salts thereof, inorganic sulfonic acid and the like.
この不純物は、不揮発性であるため、乾燥させても合成物中に残存する。本発明者 らは、多環式化合物中に硫酸等の不純物を多く含む合成物は、これを溶液状にして 基材上に塗工しても、良好な塗工膜が形成できないことを見出している。この原因は 明らかではないが、溶液状にした際に、残存硫酸等に起因して so 2_又は so—が Since these impurities are non-volatile, they remain in the synthesized product even when dried. The present inventors have found that a compound containing a large amount of impurities such as sulfuric acid in a polycyclic compound cannot form a good coating film even if it is applied in the form of a solution on a substrate. ing. The cause of this is not clear, but when it is made into a solution, so 2 _ or so-
4 3 生じ、これが塗工膜形成の障害になっていると推定される。  It is estimated that this is an obstacle to coating film formation.
本発明では、合成物中の上記不純物を実質的に且つ簡易に除去するために、有 機溶媒に合成物(この合成物は、スルホン化処理後に得られる、硫酸などの不純物と SO M基を有する多環式化合物とを含む混合物である)を溶解させた後、ろ過分 In the present invention, in order to substantially and easily remove the impurities in the synthesized product, the synthesized product (the synthesized product contains impurities such as sulfuric acid and SO M group obtained after sulfonation treatment) in an organic solvent. A mixture containing a polycyclic compound having
3 Three
離によって、前記多環式化合物を精製する。  The polycyclic compound is purified by separation.
[0045] 精製の際に用いる上記有機溶媒は、 SO 2_又は SO—(好ましくは SO 2_及び SO [0045] The organic solvent used in the purification is SO 2 — or SO— (preferably SO 2 — and SO
4 3 4 3 4 3 4 3
_の何れも)が溶解し且つ SO M基を有する多環式化合物が難溶な溶媒が用いら れる。 In any case, a solvent in which a polycyclic compound having a SO M group is hardly soluble is used. It is.
ここで、 SO 2_又は SO—が溶解するとは、有機溶媒に対する SO 2_又は SO—の 2 Here, SO 2 _ or SO- dissolves when SO 2 _ or SO-
4 3 4 3 4 3 4 3
3°Cに於ける溶解度力 約 10g/100g以上であることを言う。また、 SO M基を有 Solubility power at 3 ° C is about 10g / 100g or more. Also has SO M group
3  Three
する多環式化合物が難溶とは、有機溶媒に対する前記多環式化合物の 23°Cに於け る溶解度が、約 0. 5g/100g以下であることを言う。  The term “poorly soluble polycyclic compound” means that the solubility of the polycyclic compound in an organic solvent at 23 ° C. is about 0.5 g / 100 g or less.
上記有機溶媒としては、メタノール、エタノール、イソプロピルアルコールなどの低 級アルコール(好ましくは炭素数 1〜4の低級アルコール);アセトンなどを例示できる 。これらの中でも、メタノール又は/及びアセトンを用いることが好ましい。本発明で は、これら有機溶媒から選ばれる 1種又は 2種以上を併用して用いることができる。な お、溶媒として水を用いない理由は、上記多環式化合物は、水に対する溶解性が高 いからである。  Examples of the organic solvent include lower alcohols such as methanol, ethanol and isopropyl alcohol (preferably lower alcohols having 1 to 4 carbon atoms); acetone and the like. Among these, it is preferable to use methanol or / and acetone. In the present invention, one or more selected from these organic solvents can be used in combination. The reason why water is not used as the solvent is that the polycyclic compound has high solubility in water.
[0046] 上記合成物(SO 2_又は SO—の少なくとも何れか一方を含む不純物と SO M基 [0046] The above compound (impurities containing at least one of SO 2 _ and SO- and SO M groups
4 3 3 を有する多環式化合物とを含む混合物)は、上記有機溶媒に混合される。合成物を 上記有機溶媒に混合した液は、 so 42 又は/及び so—が溶解した溶液中に、多環 And a polycyclic compound having 4 3 3) are mixed with the organic solvent. Liquid synthesized was mixed with the organic solvent, the solution so 4 2 or / and so- was dissolved, polycyclic
3  Three
式化合物が分散した分散液となる。  A dispersion in which the formula compound is dispersed is obtained.
有機溶媒の量は、特に限定されず、合成物に対して十分な量であればよい。もっと も、有機溶媒の量が余りに少ないと、 so 2 等が十分溶解しない虞がある。一方、不 The amount of the organic solvent is not particularly limited as long as it is a sufficient amount for the synthesized product. Furthermore, if the amount of organic solvent is too small, so 2 etc. may not be sufficiently dissolved. On the other hand
4  Four
必要に有機溶媒が多いと、溶媒コストが増す上、精製される多環式化合物の量が僅 かに減少する場合がある(有機溶媒の種類や多環式化合物の構造によっては、該多 環式化合物が有機溶媒に僅かに溶解する場合がある)。このような理由から、有機溶 媒は、合成物 100質量部に対して、 200-10, 000質量部程度が好ましい。  If there are many organic solvents necessary, the cost of the solvent increases and the amount of the polycyclic compound to be purified may slightly decrease (depending on the type of organic solvent and the structure of the polycyclic compound, Formula compounds may be slightly soluble in organic solvents). For these reasons, the organic solvent is preferably about 200 to 10,000 parts by mass with respect to 100 parts by mass of the composite.
[0047] 有機溶媒に混合した後、十分に攪拌して、 SO 2_等の溶解を促進させる。 [0047] After mixing with an organic solvent, the mixture is sufficiently stirred to promote dissolution of SO 2 _ and the like.
4  Four
次に、得られた分散液を、ろ過する。ろ過の方法は、重力を利用した自然ろ過、又 は、ろ材の下面を減圧する減圧ろ過が好ましい。もっとも、ろ過の方法は、加圧ろ過、 遠心ろ過なども可能である。  Next, the obtained dispersion is filtered. The filtration method is preferably natural filtration using gravity or reduced pressure filtration in which the lower surface of the filter medium is decompressed. However, pressure filtration and centrifugal filtration can be used as the filtration method.
ろ材としては、自然ろ過などに広く一般に用いられているセルロース系のろ紙が使 用できる。もっとも、セルロース系以外、例えば、グラスファイバー系などの紙以外の ろ材を使用してもよい。 ろ材としては、例えば、 0. 8 in程度の孔径を有するろ材を用いることが好ましい。 該ろ材を用いることにより、確実に且つ比較的短時間で SO 2 等と多環式化合物とを As the filter medium, cellulosic filter paper widely used for natural filtration and the like can be used. However, other than the cellulose type, for example, a filter medium other than paper such as glass fiber type may be used. As the filter medium, for example, it is preferable to use a filter medium having a pore size of about 0.8 in. By using the filter medium, SO 2 and the polycyclic compound can be reliably and in a relatively short time.
4  Four
分離できる。  Can be separated.
ろ材としてろ紙を使用する場合、ろ紙の種類(主として目の細かさ)は、例えば、定 量分析用の 5種 C、 6種などが好ましい。ただし、前記 5種 C及び 6種は、いずれも、 JI S P 3801に準拠したろ紙の規格である。  When filter paper is used as the filter medium, the type of filter paper (mainly fineness of the eyes) is preferably, for example, 5 types C or 6 types for quantitative analysis. However, the above 5 types C and 6 types are filter paper standards based on JIS P 3801.
[0048] 上記分散液は、ろ過することによって、ろ液と残さに分離される。有機溶媒に溶解し た SO 2_等は、ろ液として除去される。有機溶媒に難溶な多環式化合物は、残さとし[0048] The dispersion is separated into a filtrate and a residue by filtration. SO 2 _ and the like dissolved in the organic solvent are removed as a filtrate. Polycyclic compounds that are sparingly soluble in organic solvents are
4 Four
て取り出される。従って、 so 2 等と多環式化合物とを、容易に分離できる。前記残さ To be taken out. Therefore, so 2 etc. and polycyclic compounds can be easily separated. Said residue
4  Four
を乾燥することで、多環式化合物を精製できる。  The polycyclic compound can be purified by drying.
なお、必要に応じて、残さを再び上記有機溶媒に混合し、ろ過を繰り返してもよい。 有機溶媒に混合してろ過する工程を数回繰り返すことによって、より純度の高い多環 式化合物を得ることができる。  If necessary, the residue may be mixed with the organic solvent again and filtration may be repeated. By repeating the step of mixing with an organic solvent and filtering several times, a polycyclic compound with higher purity can be obtained.
[0049] 上記有機溶媒に混合してろ過する工程 (すなわち、多環式化合物の精製)は、多環 式化合物中の残存不純物量 (硫酸、硫酸塩などの量)が、多環式化合物 lg当たり、 1 OOmg以下となるまで行うことが好ましぐ更に、 20mg以下がより好ましい。残存不純 物量を lOOmg以下の範囲にまで低減することにより、後述するコーティング液中の S O 2 等を極少量にでき、塗工性に優れたコーティング液を調製できる。 [0049] In the step of mixing in the organic solvent and filtering (that is, purification of the polycyclic compound), the amount of residual impurities (amount of sulfuric acid, sulfate, etc.) in the polycyclic compound is It is preferable to carry out until 1 OOmg or less, more preferably 20mg or less. By reducing the amount of residual impurities to the range of lOOmg or less, SO 2 and the like in the coating liquid described later can be made extremely small, and a coating liquid excellent in coating property can be prepared.
4  Four
[0050] <多環式化合物を含有するコーティング液〉  [0050] <Coating liquid containing polycyclic compound>
上記製造方法又は精製方法を経て得られた純度の高!/、多環式化合物は、適宜な 用途に使用され得る。精製された多環式化合物の用途は、好ましくは、複屈折性フィ ルムを形成するためのコーティング液、又は、偏光フィルムを形成するためのコーティ ング ί夜である。  The high purity / polycyclic compound obtained through the above production method or purification method can be used for an appropriate purpose. The use of the purified polycyclic compound is preferably a coating solution for forming a birefringent film or a coating film for forming a polarizing film.
すなわち、上記のようにして得られた純度の高い多環式化合物を、適当な溶媒に 溶解させることにより、コーティング液を調製できる。上記多環式化合物は、水溶性で ある。このため、コーティング液を調製する際の溶媒としては、水を用いることができる That is, the coating liquid can be prepared by dissolving the high-purity polycyclic compound obtained as described above in an appropriate solvent. The polycyclic compound is water-soluble. For this reason, water can be used as a solvent for preparing the coating liquid.
Yes
上記溶媒として水を用いる場合、その水の電気伝導率は、好ましくは 20 S/cm 以下(下限ィ直 (ま 0 S/cm)、より好ましく (ま 0· 001 S/cm〜; 10 S/cmであり、 特に好ましくは 0. 01 H 3/じ111〜5 S/cmである。水の電気伝導率が上記範囲の コーティング液を用いることにより、高い面内の複屈折率を有する複屈折性フィルム が得られ得る。なお、当該電気伝導度は、下記実施例に記載の方法によって測定で きる。 When water is used as the solvent, the electrical conductivity of the water is preferably 20 S / cm The following (lower limit straight (to 0 S / cm), more preferably (to 0 · 001 S / cm to 10 S / cm, particularly preferably 0.01 H 3/111 to 5 S / cm) A birefringent film having a high in-plane birefringence can be obtained by using a coating liquid having an electric conductivity of water in the above range, wherein the electric conductivity is determined by the method described in the following examples. Can be measured.
[0051] 上記コーティング液は、上記多環式化合物の 1種または構造の異なる 2種以上が溶 解している。該コーティング液に於ける多環式化合物の濃度は、特に限定されない。 もっとも、溶液中に於いて多環式化合物が安定なネマチック液晶相を示すことから、 前記多環式化合物の濃度は、好ましくは 5質量%〜35質量%であり、より好ましくは 5質量%〜30質量%である。なお、ネマチック液晶相は、偏光顕微鏡で観察される 液晶相の光学模様によって、確認、識別すること力 Sできる。  [0051] In the coating solution, one or more of the above polycyclic compounds or two or more of different structures are dissolved. The concentration of the polycyclic compound in the coating solution is not particularly limited. However, since the polycyclic compound exhibits a stable nematic liquid crystal phase in the solution, the concentration of the polycyclic compound is preferably 5% by mass to 35% by mass, more preferably 5% by mass to 30% by mass. The nematic liquid crystal phase can be confirmed and identified by the optical pattern of the liquid crystal phase observed with a polarizing microscope.
また、上記コーティング液の pH値が低い場合には、アルカリを添加して、 pH4〜10 程度、更に、 pH6〜8程度に調製することが望ましい。  Moreover, when the pH value of the coating solution is low, it is desirable to add an alkali to adjust the pH to about 4 to 10, and further to about pH 6 to 8.
[0052] さらに、コーティング液には、添加剤が添加されていてもよい。添加剤としては、可 塑剤、熱安定剤、光安定剤、滑剤、抗酸化剤、紫外線吸収剤、難燃剤、着色剤、帯 電防止剤、相溶化剤、架橋剤、増粘剤などを例示できる。これら添加剤の添加量は、 好ましくは、コーティング液 100質量部に対して、 0を超え 10質量部以下である。  [0052] Furthermore, an additive may be added to the coating liquid. Additives include plasticizers, heat stabilizers, light stabilizers, lubricants, antioxidants, UV absorbers, flame retardants, colorants, antistatic agents, compatibilizers, crosslinking agents, thickeners, etc. It can be illustrated. The addition amount of these additives is preferably more than 0 and 10 parts by mass or less with respect to 100 parts by mass of the coating liquid.
[0053] また、コーティング液には、界面活性剤が添加されて!/、てもよ!/、。界面活性剤は、 多環式化合物の基材表面へのぬれ性や塗工性を向上させるために使用される。界 面活性剤は、好ましくは、非イオン界面活性剤が用いられる。該界面活性剤の添カロ 量は、好ましくは、コーティング液 100質量部に対して、 0を超え 5質量部以下である [0053] In addition, a surfactant is added to the coating solution! The surfactant is used to improve the wettability and coating property of the polycyclic compound to the substrate surface. As the surfactant, a nonionic surfactant is preferably used. The additive amount of the surfactant is preferably more than 0 and 5 parts by mass or less with respect to 100 parts by mass of the coating liquid.
Yes
[0054] <多環式化合物を含有する複屈折性フィルム及び偏光フィルム〉  <Birefringent film and polarizing film containing polycyclic compound>
本発明の複屈折性フィルム又は偏光フィルムは、上記多環式化合物を含む組成物 を製膜することにより、得ること力 Sできる。  The birefringent film or polarizing film of the present invention can be obtained by forming a composition containing the above polycyclic compound.
(複屈折性フィルム又は偏光フィルムの製法)  (Production method of birefringent film or polarizing film)
本発明の複屈折性フィルム又は偏光フィルムは、例えば、次の(1)〜(3)の工程を 含む製法によって作製できる。 (1)上記コーティング液を調製する工程、 The birefringent film or polarizing film of the present invention can be produced, for example, by a production method including the following steps (1) to (3). (1) a step of preparing the coating liquid,
(2)少なくとも一方の表面力 S、親水化処理された基材を準備する工程、  (2) a step of preparing at least one surface force S, a hydrophilized base material;
(3)工程(2)で準備した基材の親水化処理された表面に、上記工程(1)で調製した 溶液を塗工し、乾燥させる工程。  (3) A step of applying and drying the solution prepared in the above step (1) on the surface of the base material prepared in the step (2) which has been subjected to a hydrophilic treatment.
このような製法によって、複屈折性フィルム又は偏光フィルムと、基材と、を少なくと も備える積層フィルムを得ることができる。  By such a production method, a laminated film having at least a birefringent film or a polarizing film and a substrate can be obtained.
なお、工程(1)及び工程(2)を実施する順序は、特に限定されず、工程(1)を先に 行った後、工程(2)を行ってもよいし、或いは、工程(2)を先に行った後、工程(1)を 行ってもよいし、或いは、工程(1)と工程(2)を並行しても行ってもよい。  Note that the order in which step (1) and step (2) are performed is not particularly limited, and step (2) may be performed after step (1) is performed first, or step (2). After performing step (1), step (1) may be performed, or step (1) and step (2) may be performed in parallel.
[0055] 上記工程(1)で用いられる「コーティング液」は、上記く多環式化合物を含有するコ 一ティング液〉の欄で説明した通りである。  [0055] The "coating liquid" used in the above step (1) is as described above in the section "Coating liquid containing a polycyclic compound".
上記工程(2)における「親水化処理」とは、基材の水の接触角を低下させる処理を いう。上記親水化処理は、多環式化合物を塗工する基材表面のぬれ性、塗工性を 向上させるために行われる。上記親水化処理は、基材の 23°Cにおける水の接触角 を、処理前に比べて、好ましくは 10%以上低下させる処理であり、さらに好ましくは 1 5%〜80%低下させる処理であり、特に好ましくは 20%〜70%低下させる処理であ る。なお、この低下させる割合(%)は、式; { (処理前の接触角 処理後の接触角)/ 処理前の接触角 } X 100により求められる。なお、当該接触角は、固液界面解析装 置(協和界面科学 (株)製、製品名「Drop Master300j ) (液滴 0. 5 1、滴下後 5秒 間経過後に静的接触角測定)を用いて測定することができる。  The “hydrophilic treatment” in the above step (2) refers to a treatment for reducing the water contact angle of the substrate. The hydrophilization treatment is performed in order to improve the wettability and coatability of the substrate surface on which the polycyclic compound is coated. The hydrophilization treatment is a treatment that lowers the contact angle of water at 23 ° C of the substrate, preferably 10% or more, and more preferably 15% to 80% lower than before the treatment. Particularly preferred is a treatment for reducing by 20% to 70%. The reduction ratio (%) is determined by the equation: {(contact angle before treatment, contact angle after treatment) / contact angle before treatment} X100. The contact angle was measured using a solid-liquid interface analyzer (product name “Drop Master300j” manufactured by Kyowa Interface Science Co., Ltd.) (droplet 0.51, static contact angle measurement after 5 seconds from dropping). Can be measured.
[0056] さらに、上記親水化処理は、基材の 23°Cにおける水の接触角を、処理前に比べて 、好ましくは 5° 以上低下させる処理であり、さらに好ましくは、 10° 〜65° 低下させ る処理であり、特に好ましくは 20° 〜65° 低下させる処理である。  [0056] Further, the hydrophilization treatment is a treatment for reducing the contact angle of water at 23 ° C of the substrate, preferably by 5 ° or more, more preferably 10 ° to 65 ° compared to before treatment. This is a treatment for lowering, particularly preferably a treatment for lowering by 20 ° to 65 °.
[0057] さらに、上記親水化処理は、基材の 23°Cにおける水の接触角を、好ましくは 5° 〜 60° とする処理であり、さらに好ましくは 5° 〜50° とする処理であり、特に好ましく は 5° 〜45° とする処理である。基材の水の接触角を上記範囲とすることによって、 高い面内の複屈折率を示し、且つ、厚みバラツキの小さい複屈折性フィルムが得ら れ得る。また、基材の水の接触角を上記範囲とすることによって、偏光特性に優れ、 且つ厚みバラツキの小さい偏光フィルムが得られ得る。 [0057] Further, the hydrophilization treatment is a treatment wherein the contact angle of water at 23 ° C of the substrate is preferably 5 ° to 60 °, more preferably 5 ° to 50 °. Particularly preferred is a treatment of 5 ° to 45 °. By setting the water contact angle of the substrate within the above range, a birefringent film exhibiting a high in-plane birefringence and having a small thickness variation can be obtained. In addition, by making the water contact angle of the base material within the above range, it has excellent polarization characteristics, In addition, a polarizing film having a small thickness variation can be obtained.
[0058] 上記親水化処理としては、任意の適切な方法が採用され得る。上記親水化処理は 、例えば、乾式処理でもよぐ湿式処理でもよい。乾式処理としては、例えば、コロナ 処理、プラズマ処理、及びグロ一放電処理などの放電処理;火炎処理;オゾン処理; UVオゾン処理、紫外線処理及び電子線処理などの電離活性線処理、などが挙げら れる。湿式処理としては、水やアセトンなどの溶媒を用いた超音波処理、アルカリ処 理、アンカーコート処理などを例示できる。これらの処理は、 1種単独で、又は、 2つ 以上を組み合せて行ってもよ!/、。  [0058] Any appropriate method may be adopted as the hydrophilic treatment. The hydrophilic treatment may be, for example, a dry treatment or a wet treatment. Examples of the dry treatment include discharge treatment such as corona treatment, plasma treatment, and glow discharge treatment; flame treatment; ozone treatment; ionizing active ray treatment such as UV ozone treatment, ultraviolet treatment, and electron beam treatment. It is. Examples of the wet treatment include ultrasonic treatment using a solvent such as water and acetone, alkali treatment, anchor coating treatment, and the like. These treatments may be performed singly or in combination of two or more! /.
[0059] 好ましくは、上記親水化処理は、コロナ処理、プラズマ処理、アルカリ処理、又はァ ンカーコート処理である。上記親水化処理であれば、高い配向性を有し、且つ、厚み ノ ラツキの小さ!/、複屈折性フィルム又は偏光フィルムが得られ得る。上記親水化処理 の条件 (例えば、処理時間や強度など)は、基材の水の接触角が上記の範囲となるよ うに、適宜、適切に調整され得る。  [0059] Preferably, the hydrophilization treatment is a corona treatment, a plasma treatment, an alkali treatment, or an anchor coat treatment. With the above hydrophilization treatment, a birefringent film or a polarizing film having high orientation and low thickness fluctuation can be obtained. The conditions for the hydrophilization treatment (for example, treatment time and strength) can be appropriately adjusted as appropriate so that the water contact angle of the base material falls within the above range.
[0060] 上記コロナ処理は、代表的には、コロナ放電内へ基材を通過させることによって、 基材表面を改質する処理である。コロナ放電は、接地された誘電体ロールと絶縁され た電極との間に高周波且つ高電圧を印加することによって電極間の空気が絶縁破 壊してイオン化して発生する。上記プラズマ処理は、代表的には、低温プラズマ内へ 基材を通過させることによって、基材表面を改質する処理である。低温プラズマは、 低圧の不活性ガスや酸素、ハロゲンガスなど無機気体中でグロ一放電を起こすと、 気体分子の一部がイオン化して発生する。上記超音波洗浄処理は、代表的には、水 や有機溶媒中に基材を浸漬させて超音波をあてることにより、基材表面の汚染物を 除去し、基材のぬれ性を改善する処理である。上記アルカリ処理は、代表的には、塩 基性物質を水又は有機溶剤に溶解したアルカリ処理液に、基材を浸漬することによ つて、基材表面を改質する処理である。上記アンカーコート処理は、代表的には、基 材表面にアンカーコート剤を塗工する処理である。  [0060] The corona treatment is typically a treatment for modifying the substrate surface by passing the substrate through corona discharge. Corona discharge is generated by applying high frequency and high voltage between a grounded dielectric roll and an insulated electrode, causing the air between the electrodes to break down and become ionized. The plasma treatment is typically a treatment for modifying the substrate surface by passing the substrate through the low temperature plasma. Low-temperature plasma is generated when a glow discharge occurs in an inorganic gas such as a low-pressure inert gas, oxygen, or halogen gas, and part of gas molecules is ionized. The above ultrasonic cleaning treatment is typically a treatment that removes contaminants on the surface of the substrate and improves the wettability of the substrate by immersing the substrate in water or an organic solvent and applying ultrasonic waves. It is. The alkali treatment is typically a treatment for modifying the substrate surface by immersing the substrate in an alkali treatment solution in which a basic substance is dissolved in water or an organic solvent. The anchor coating treatment is typically a treatment for applying an anchor coating agent to the surface of the base material.
[0061] コーティング液を塗工する基材は、コーティング液を均一に流延するために用いら れる。上記基材は、任意の適切なものが選択され得る。上記基材としては、ガラス基 材、石英基材、高分子フィルム、プラスチックス板、アルミや鉄などの金属板、セラミツ タス基材、シリコンウェハーなどを例示できる。上記基材は、好ましくは、ガラス基材又 は高分子フィルムである。 [0061] The substrate on which the coating liquid is applied is used to uniformly cast the coating liquid. Any appropriate substrate can be selected. Examples of the substrate include a glass substrate, a quartz substrate, a polymer film, a plastic plate, a metal plate such as aluminum and iron, and ceramics. Examples include a tas substrate and a silicon wafer. The substrate is preferably a glass substrate or a polymer film.
[0062] 上記ガラス基材としては、任意の適切なものが選択され得る。好ましくは、上記ガラ ス基材は、液晶セルに用いられるセル基板と同等品を使用できる。該ガラス基材とし ては、アルカリ成分を含むソーダ石灰ガラス(青板ガラス)、又は低アルカリ硼砂酸ガ ラスを例示できる。上記ガラス基材は、市販品をそのまま用いてもよい。市販のガラス 基材としては、コーユング社製のガラスコード「1737」、旭硝子(株)製のガラスコード 「AN635」、 NHテクノグラス(株)製のガラスコード「NA— 35」などを例示できる。  [0062] As the glass substrate, any appropriate one can be selected. Preferably, the glass substrate can be equivalent to a cell substrate used for a liquid crystal cell. Examples of the glass substrate include soda lime glass (blue plate glass) containing an alkali component, or low alkali borosilicate glass. A commercial item may be used as it is for the glass substrate. Examples of commercially available glass base materials include glass cord “1737” manufactured by Kojung Co., Ltd., glass code “AN635” manufactured by Asahi Glass Co., Ltd., and glass code “NA-35” manufactured by NH Techno Glass Co., Ltd.
[0063] 上記高分子フィルムは、可視光の光線透過率に優れ且つ透明性に優れるフィルム を用いることが好ましい。この高分子フィルムの可視光に於ける光線透過率は、好ま しくは 80%以上、より好ましくは 90%以上である。ただし、光線透過率は、フィルム厚 100 mで、分光光度計(日立製作所製、製品名「U— 4100型」)で測定されたスぺ タトルデータを基に視感度補正を行った Y値をいう。また、高分子フィルムのヘイズ値 は、好ましくは 3%以下、より好ましくは 1 %以下である。ただし、ヘイズ値は、 JIS— K 7105に準じて測定された値をいう。  [0063] As the polymer film, a film having excellent visible light transmittance and excellent transparency is preferably used. The light transmittance of visible light in this polymer film is preferably 80% or more, more preferably 90% or more. However, the light transmittance is a film thickness of 100 m, and the Y value is corrected for visibility based on the spectrum data measured with a spectrophotometer (product name “U-4100”, manufactured by Hitachi, Ltd.). Say. The haze value of the polymer film is preferably 3% or less, more preferably 1% or less. However, the haze value is a value measured according to JIS-K 7105.
上記高分子フィルムを形成する樹脂としては、特に限定されず、任意の適切な樹脂 が選択され得る。好ましくは、上記高分子フィルムは、熱可塑性樹脂を含有するフィ ルムである。前記熱可塑性樹脂としては、ォレフィン系樹脂、シクロォレフイン系樹脂 、塩化ビュル系樹脂、セルロース系樹脂、スチレン系樹脂、ポリメタクリル酸メチル、ポ リ酢酸ビュル、塩化ビニリデン系樹脂、ポリアミド系樹脂、ポリアセタール系樹脂、力 ーボネート系樹脂、ポリブチレンテレフタレート系樹脂、ポリエチレンテレフタレート系 樹脂、ポリスルホン系樹脂、ポリエーテルスルホン系樹脂、ポリエーテルエーテルケト ン系樹脂、ポリアリレート系樹脂、アミドイミド系樹脂、イミド系樹脂などが挙げられる。 上記熱可塑性樹脂は、 1種単独で、または 2種以上を併用できる。また、上記熱可塑 性樹脂は、任意の適切なポリマー変性が施されていてもよい。上記ポリマー変性とし ては、共重合、架橋、分子末端、立体規則性などを例示できる。  The resin for forming the polymer film is not particularly limited, and any appropriate resin can be selected. Preferably, the polymer film is a film containing a thermoplastic resin. Examples of the thermoplastic resin include olefin resin, cycloolefin resin, chlorinated resin, cellulose resin, styrene resin, polymethyl methacrylate, polybutyl acetate, vinylidene chloride resin, polyamide resin, and polyacetal resin. , Force-bonate resin, polybutylene terephthalate resin, polyethylene terephthalate resin, polysulfone resin, polyethersulfone resin, polyetheretherketone resin, polyarylate resin, amidoimide resin, imide resin, etc. It is done. The above thermoplastic resins can be used alone or in combination of two or more. The thermoplastic resin may be subjected to any appropriate polymer modification. Examples of the polymer modification include copolymerization, crosslinking, molecular terminals, and stereoregularity.
[0064] 本発明にお!/、ては、上記基材として、セルロース系樹脂を含有する高分子フィルム を用いることが好ましい。かかる基材は、多環式化合物に対するぬれ性に優れている 。この基材に上記コーティング液を塗工することにより、高い面内の複屈折率を有し、 且つ、厚みバラツキの小さい複屈折性フィルムが得られ得る。この基材に上記コーテ イング液を塗工することにより、偏光特性に優れ、且つ厚みバラツキの小さい偏光フィ ルムが得られ得る。 [0064] In the present invention, it is preferable to use a polymer film containing a cellulose resin as the substrate. Such a substrate is excellent in wettability with respect to a polycyclic compound. . By applying the coating solution to the substrate, a birefringent film having a high in-plane birefringence and a small thickness variation can be obtained. By applying the coating liquid to the substrate, a polarizing film having excellent polarization characteristics and small thickness variation can be obtained.
[0065] 上記セルロース系樹脂は、任意の適切なものが採用され得る。上記セルロース系 樹脂は、好ましくは、セルロースの水酸基の一部または全部力 ァセチル基、プロピ ォニル基及びブチル基の少なくとも何れ力、 1つの基で置換された、セルロース有機酸 エステルまたはセルロース混合有機酸エステルである。上記セルロース有機酸エステ ノレとしては、セノレロースアセテート、セノレロースプロピオネート、セノレロースブチレート 等を例示できる。上記セルロース混合有機酸エステルとしては、セルロースァセテ一 トプロピオネート、セノレロースアセテートブチレート等を例示できる。上記セノレロース 系樹脂は、例えば、 日本国特許公開 2001 _ 188128号公報 [0040]〜[0041]に 記載の方法により得ることができる。  [0065] Any appropriate cellulose-based resin can be adopted. The cellulose-based resin is preferably a cellulose organic acid ester or a cellulose mixed organic acid ester substituted with one group at least one of acetyl group, propionyl group and butyl group. It is. Examples of the cellulose organic acid ester include cenololose acetate, cenololose propionate, cenololose butyrate and the like. Examples of the cellulose mixed organic acid ester include cellulose acetate propionate and cenorelose acetate butyrate. The above-mentioned senorelose resin can be obtained, for example, by the method described in Japanese Patent Publication No. 2001_188128 [0040] to [0041].
[0066] 本発明に用いられる基材は、市販の高分子フィルムをそのまま用いてもよい。ある いは、市販の高分子フィルムに、延伸処理および/または収縮処理などの 2次的加 ェを施したフィルムを用いてもよ!/、。セルロース系樹脂を含有する市販の高分子フィ ルムとしては、富士写真フィルム(株)製のフジタックシリーズ(商品名「ZRF80S」、「 TD80UF」、「TDY— 80UL」)、コニ力ミノルタォプト(株)製の商品名「KC8UX2M 」などを例示できる。  [0066] As the base material used in the present invention, a commercially available polymer film may be used as it is. Alternatively, a film obtained by subjecting a commercially available polymer film to secondary treatment such as stretching and / or shrinking may be used! /. Commercially available polymer films containing cellulosic resins include Fuji Photo Film Co., Ltd.'s Fujitac series (trade names “ZRF80S”, “TD80UF”, “TDY—80UL”), KONiki Minoltaput Co., Ltd. An example of the product name “KC8UX2M” is available.
[0067] 上記基材の厚みは、好ましくは、 20 μ m〜100 μ mである。基材の厚みを上記の 範囲とすることによって、基材のハンドリング性などが良好となる。  [0067] The thickness of the substrate is preferably 20 μm to 100 μm. By making the thickness of the substrate within the above range, the handling property of the substrate is improved.
[0068] 上記工程(3)において、コーティング液を基材の表面に塗工する方法としては、適 宜、適切なコータを用いた塗工方式が採用され得る。前記コータとしては、リバース口 一ノレコータ、正回転ローノレコータ、グラビアコータ、ロッドコータ、スロットダイコータ、 スロットオリフィスコータ、カーテンコータ、フアウンテンコータなどを例示できる。前記 コータを用いた塗工方式であれば、厚みバラツキの小さい複屈折性フィルム又は偏 光フィルムが得られ得る。  [0068] In the above step (3), as a method of applying the coating liquid to the surface of the substrate, a coating method using an appropriate coater can be adopted as appropriate. Examples of the coater include a reverse mouth single coater, a forward rotation low roll coater, a gravure coater, a rod coater, a slot die coater, a slot orifice coater, a curtain coater, and a fountain coater. If the coating method uses the coater, a birefringent film or a polarizing film with small thickness variation can be obtained.
コーティング液の塗工速度は、好ましくは 50mm/秒以上であり、さらに好ましくは 100mm/秒以上である。塗工速度を上記の範囲にすることによって、多環式化合 物が配向するのに適した、せん断力がコーティング液に加わる。このため、高い面内 の複屈折率を有し、且つ、厚みバラツキの小さい複屈折性フィルムが得られ得る。ま た、塗工速度を上記の範囲にすることによって、 偏光特性に優れ、且つ厚みバラッ キの小さ!/、偏光フィルムが得られ得る。 The coating speed of the coating solution is preferably 50 mm / second or more, more preferably More than 100mm / sec. By setting the coating speed within the above range, a shearing force suitable for orienting the polycyclic compound is applied to the coating solution. For this reason, a birefringent film having a high in-plane birefringence and a small thickness variation can be obtained. Further, by setting the coating speed within the above range, a polarizing film having excellent polarization characteristics and small thickness variation can be obtained.
[0069] 塗工後のコーティング液を乾燥させる方法は、適宜、適切な方法が採用され得る。  [0069] As a method of drying the coating liquid after coating, an appropriate method can be appropriately employed.
乾燥は、例えば、熱風又は冷風が循環する空気循環式恒温オーブン、マイクロ波も しくは遠赤外線などを利用したヒーター、温度調節用に加熱されたロール、加熱され たヒートパイプロール、加熱された金属ベルトなどを用いて行うことができる。  Drying can be performed by, for example, an air circulation type thermostatic oven in which hot or cold air circulates, a heater using microwaves or far infrared rays, a roll heated for temperature control, a heated heat pipe roll, a heated metal It can be performed using a belt or the like.
乾燥させる温度は、上記コーティング液の等方相転移温度以下であり、低温から高 温へ徐々に昇温させることが好ましい。前記乾燥温度は、好ましくは 10°C〜80°Cで あり、さらに好ましくは 20°C〜60°Cである。前記温度範囲にすることによって、厚みバ ラツキの小さい複屈折性フィルム又は偏光フィルムが得られ得る。  The drying temperature is equal to or lower than the isotropic phase transition temperature of the coating liquid, and it is preferable to gradually raise the temperature from a low temperature to a high temperature. The drying temperature is preferably 10 ° C to 80 ° C, more preferably 20 ° C to 60 ° C. By setting the temperature range, a birefringent film or a polarizing film having a small thickness variation can be obtained.
乾燥させる時間は、乾燥温度や溶媒の種類によって、適宜、選択され得る。ただし 、厚みバラツキの小さい複屈折性フィルム又は偏光フィルムを得るためには、乾燥時 間は、例えば 1分〜 30分であり、好ましくは 1分〜 10分である。  The drying time can be appropriately selected depending on the drying temperature and the type of solvent. However, in order to obtain a birefringent film or a polarizing film with small thickness variation, the drying time is, for example, 1 minute to 30 minutes, preferably 1 minute to 10 minutes.
[0070] なお、上記工程(1)〜(3)の後に、さらに、下記工程 (4)を行ってもよい。  [0070] After the steps (1) to (3), the following step (4) may be further performed.
(4)上記工程(3)で得られた複屈折性フィルム又は偏光フィルムに、アルミニウム塩、 ノ リウム塩、鉛塩、クロム塩、ストロンチウム塩、及び分子内に 2個以上のアミノ基を有 する化合物塩からなる群から選択される少なくとも 1種の化合物塩を含む溶液を接触 させる工程。  (4) The birefringent film or polarizing film obtained in the above step (3) has an aluminum salt, a sodium salt, a lead salt, a chromium salt, a strontium salt, and two or more amino groups in the molecule. Contacting a solution containing at least one compound salt selected from the group consisting of compound salts.
[0071] 上記工程 (4)は、得られる複屈折性フィルム又は偏光フィルムを、水に対して、不溶 化又は難溶化させるために行われる。上記化合物塩としては、塩化アルミニウム、塩 化バリウム、塩化鉛、塩化クロム、塩化ストロンチウム、 4, 4'ーテトラメチルジアミノジ フエニルメタン塩酸塩、 2, 2'ージピリジル塩酸塩、 4, 4'ージピリジル塩酸塩、メラミ ン塩酸塩、テトラアミノビリミジン塩酸塩などを例示できる。このような化合物塩であれ ば、耐水性に優れた複屈折性フィルム又は偏光フィルムが得られ得る。  [0071] The above step (4) is carried out in order to make the obtained birefringent film or polarizing film insoluble or hardly soluble in water. The above compound salts include aluminum chloride, barium chloride, lead chloride, chromium chloride, strontium chloride, 4,4'-tetramethyldiaminodiphenylmethane hydrochloride, 2,2'-dipyridyl hydrochloride, 4,4'-dipyridyl hydrochloride And melamine hydrochloride, tetraaminobilimidine hydrochloride and the like. With such a compound salt, a birefringent film or a polarizing film excellent in water resistance can be obtained.
[0072] 上記化合物塩を含む溶液の、化合物塩の濃度は、好ましくは 3質量%〜40質量% であり、より好ましくは 5質量%〜30質量%である。上記濃度範囲の化合物塩を含む 溶液を接触させることによって、耐久性に優れた複屈折性フィルム又は偏光フィルム が得られ得る。 [0072] The concentration of the compound salt in the solution containing the compound salt is preferably 3% by mass to 40% by mass. More preferably, it is 5 to 30% by mass. A birefringent film or a polarizing film excellent in durability can be obtained by contacting a solution containing a compound salt in the above concentration range.
[0073] 工程(3)で得られた複屈折性フィルム又は偏光フィルムに、上記化合物塩を含む 溶液を接触させる方法としては、任意の適切な方法が採用され得る。前記方法として は、例えば、複屈折性フィルム又は偏光フィルムの表面に上記化合物塩を含む溶液 を塗工する方法、又は、複屈折性フィルム又は偏光フィルムを上記化合物塩を含む 溶液に浸漬する方法などが挙げられる。これらの方法が採用される場合、得られた複 屈折性フィルム又は偏光フィルムは、水又は任意の溶剤で洗浄することが好ましレ、。 その後、さらに乾燥することにより、基材と複屈折性フィルム又は偏光フィルムとの界 面の密着性に優れた積層体が得られ得る。  [0073] Any appropriate method may be adopted as a method of bringing the solution containing the above compound salt into contact with the birefringent film or polarizing film obtained in step (3). Examples of the method include a method of applying a solution containing the above compound salt to the surface of the birefringent film or polarizing film, or a method of immersing the birefringent film or polarizing film in a solution containing the above compound salt. Is mentioned. When these methods are employed, the obtained birefringent film or polarizing film is preferably washed with water or an arbitrary solvent. Thereafter, by further drying, a laminate having excellent interface adhesion between the substrate and the birefringent film or polarizing film can be obtained.
[0074] (複屈折性フィルムの性質等)  [0074] (Properties of birefringent film, etc.)
上記多環式化合物を含む本発明の複屈折性フィルムは、屈折率楕円体が nx^nz 〉nyの関係を満足する。  In the birefringent film of the present invention containing the above polycyclic compound, the refractive index ellipsoid satisfies the relationship of nx ^ nz> ny.
この複屈折性フィルムは、面内及び/又は厚み方向に複屈折を示し、 23°Cで波長 590nmにおける面内及び/又は厚み方向の複屈折率力 1 X 10_4以上となる。 ただし、「nx≥nz〉ny」とは、複屈折性フィルムの光学的な異方性を表す。 nxは、 複屈折性フィルムの面内において屈折率の最大となる方向(すなわち、遅相軸方向) の屈折率を、 nyは、面内において遅相軸方向と直交する方向(すなわち、進相軸方 向)の屈折率を、 nzは、厚み方向の屈折率を、それぞれ表す(以下、同様)。 The birefringent film exhibits birefringence in the in-plane and / or thickness direction and in-plane and / or birefringence power of the thickness direction 1 X 10_ 4 or more at a wavelength of 590nm at 23 ° C. However, “nx ≧ nz> ny” represents the optical anisotropy of the birefringent film. nx is the refractive index in the direction that maximizes the refractive index in the plane of the birefringent film (that is, the slow axis direction), and ny is the direction that is orthogonal to the slow axis direction in the plane (that is, the fast phase) Representing the refractive index in the axial direction, nz represents the refractive index in the thickness direction (hereinafter the same).
[0075] 本発明の複屈折性フィルムの形成材料として用いられる多環式化合物は、好ましく は、分子構造中に芳香環及び/又は複素環を 2個以上有する化合物であり、より好 ましくは、芳香環及び/又は複素環を 3個〜 8個有する化合物であり、特に好ましく は、芳香環及び/又は複素環を 4個〜 6個有する化合物である。複屈折性フィルム の形成材料は、最も好ましくは上記一般式 (I)又は(Π)で表される多環式化合物であ る。このような多環式化合物を含むコーティング液を用いて製膜すれば、可視光の領 域で吸収がなレ、か又は小さい、透明な複屈折性フィルムが得られ得る。  [0075] The polycyclic compound used as the material for forming the birefringent film of the present invention is preferably a compound having two or more aromatic rings and / or heterocyclic rings in the molecular structure, and more preferably. , A compound having 3 to 8 aromatic rings and / or heterocycles, particularly preferably a compound having 4 to 6 aromatic rings and / or heterocycles. The material for forming the birefringent film is most preferably a polycyclic compound represented by the above general formula (I) or (上 記). When a film is formed using a coating solution containing such a polycyclic compound, a transparent birefringent film that does not absorb or is small in the visible light region can be obtained.
[0076] 上記複屈折性フィルムは、塗工によって形成できるので、薄型に形成できる。さらに 、上記複屈折性フィルムは、屈折率楕円体カ¾«≥1 2〉1^ (1«〉1 2〉1^又は1« = 1 z〉ny)の関係を満たし、且つ、高い面内の複屈折率を有する。このため、該複屈折 性フィルムは、従来の複屈折性フィルムに比べて、格段に薄い厚みで、所望の位相 差値を有する。なお、本明細書に於いて、「nx = nz」とは、 nxと nzが完全に同一であ る場合だけでなぐ実質的に同一である場合も含まれる。 nxと nzが実質的に同一で ある場合とは、例えば、 Rth [590]がー 10nm〜; !Onmを含む。 [0076] The birefringent film can be formed thin because it can be formed by coating. further The birefringent film satisfies the relationship of refractive index ellipsoidal curve ≥ «1 2〉 1 ^ (1«〉 1 2〉 1 ^ or 1 «= 1 z〉 ny) and has a high in-plane relationship. Has a birefringence. For this reason, the birefringent film has a desired retardation value with a much thinner thickness than the conventional birefringent film. In the present specification, “nx = nz” includes not only the case where nx and nz are completely the same, but also the case where they are substantially the same. The case where nx and nz are substantially the same includes, for example, Rth [590] -10nm to;! Onm.
本発明者等の推定によれば、本発明の複屈折性フィルムが、高い複屈折性を示す 理由は、次の通りである。すなわち、上記 SO M基を含む多環式化合物が、溶液  According to the estimation of the present inventors, the reason why the birefringent film of the present invention exhibits high birefringence is as follows. That is, the polycyclic compound containing the SO M group is a solution.
3  Three
中(コーティング液中)で、会合体を形成し易ぐこの会合体を形成した状態の秩序性 が高いために、力、かる溶液から形成されたフィルムも高い配向性を示し、高複屈折の フィルムを形成できると考えられる。特に、 SO M基及び COOM基を有する多  In the middle (in the coating solution), the formation of this aggregate, which is easy to form an aggregate, is high in order, so the film formed from the force and the solution also shows high orientation and high birefringence. It is thought that a film can be formed. In particular, it has many SO M groups and COOM groups.
3  Three
環式化合物は、高い配向性を示すと考えられる。  The cyclic compound is considered to exhibit high orientation.
[0077] 上記複屈折性フィルムの波長 590nmにおける透過率は、好ましくは 85%以上であ り、より好ましくは 90%以上である。  [0077] The transmittance of the birefringent film at a wavelength of 590 nm is preferably 85% or more, and more preferably 90% or more.
上記複屈折性フィルムの波長 590nmにおける面内の位相差値 (Re [590] )は、 目 的に応じて、適切な値に設定され得る。上記 Re [590]は、 10nm以上であり、好まし くは 20應〜 1000腹であり、より好ましくは 50應〜 500應であり、特に好ましくは 100nm〜400nmである。本明細書において、面内の位相差値(Re [ λ ] )は、 23°C で波長 λ (nm)における面内の位相差値をいう。 Re [ λ ]は、複屈折性フィルムの厚 みを d (nm)としたとき、式: Re [ λ ] = (ηχ-ny) X dによって求めることカできる。  The in-plane retardation value (Re [590]) of the birefringent film at a wavelength of 590 nm can be set to an appropriate value depending on the purpose. The above Re [590] is 10 nm or more, preferably 20 to 1000, more preferably 50 to 500, and particularly preferably 100 to 400 nm. In this specification, the in-plane retardation value (Re [λ]) refers to the in-plane retardation value at 23 ° C. and the wavelength λ (nm). Re [λ] can be obtained by the formula: Re [λ] = (ηχ−ny) Xd, where d (nm) is the thickness of the birefringent film.
[0078] 上記複屈折性フィルムの Rth [590]は、屈折率楕円体が nx≥nz〉nyの関係を満 足する範囲で、適切な値に設定され得る。上記複屈折性フィルムの波長 590nmに おける面内の位相差値 (Re [590] )と厚み方向の位相差値 (Rth[590] )との差 (Re [590]— Rth [590] )は、好ましくは 10nm〜800nmであり、さらに好ましくは 10nm 〜400nmであり、特に好ましくは 10nm〜200nmである。本明細書において、厚み 方向の位相差値 (Rth [ λ ] )は、 23°Cで波長 λ (nm)における厚み方向の位相差値 をいう。 Rth [ ]は、フィルムの厚みを d (nm)としたとき、式: Rth [ λ ] = (nx— nz) X dによって求めることができる。 [0079] 上記複屈折性フィルムの Nz係数は、好ましくは 0を超え 1未満であり、さらに好まし く (ま 0. 1 ~0. 8であり、特 ίこ好ましく (ま 0. 1 ~0. 7であり、最も好ましく (ま 0. 1 ~0. 6 である。 Nz係数が上記の範囲であれば、本発明の複屈折性フィルムは、様々な駆動 モードの液晶セルの光学補償に利用することができる。本明細書において、 Nz係数 とは、 Rth[590] /Re [590]から算出される値である。 [0078] Rth [590] of the birefringent film can be set to an appropriate value as long as the refractive index ellipsoid satisfies the relationship of nx≥nz> ny. The difference (Re [590] — Rth [590]) between the in-plane retardation value (Re [590]) and the thickness direction retardation value (Rth [590]) of the birefringent film at a wavelength of 590 nm is The thickness is preferably 10 nm to 800 nm, more preferably 10 nm to 400 nm, and particularly preferably 10 nm to 200 nm. In this specification, the thickness direction retardation value (Rth [λ]) is the thickness direction retardation value at 23 ° C. and the wavelength λ (nm). Rth [] can be obtained by the formula: Rth [λ] = (nx−nz) Xd, where d (nm) is the thickness of the film. [0079] The Nz coefficient of the birefringent film is preferably more than 0 and less than 1, more preferably (or 0.1 to 0.8, particularly preferably (or 0.1 to 0). 7, most preferably (0.1 to 0.6). If the Nz coefficient is in the above range, the birefringent film of the present invention can be used for optical compensation of liquid crystal cells in various drive modes. In this specification, the Nz coefficient is a value calculated from Rth [590] / Re [590].
[0080] 本発明の複屈折性フィルムの 23°Cでの波長 590nmにおける面内の複屈折率(Δ n [590] =nx— ny)は、好ましくは 0. 05以上であり、さらに好ましくは 0. 1 ~0. 5で あり、特に好ましくは 0. 2〜0. 4である。なお、上記 Δ η[590]は、多環式化合物の 分子構造により、上記範囲に、適宜、調整すること力 Sできる。  [0080] The in-plane birefringence (Δ n [590] = nx-ny) of the birefringent film of the present invention at a wavelength of 590 nm at 23 ° C is preferably 0.05 or more, more preferably 0.1 to 0.5, and particularly preferably 0.2 to 0.4. Note that Δ η [590] can be appropriately adjusted within the above range depending on the molecular structure of the polycyclic compound.
[0081] 上記複屈折性フィルムの厚みは、好ましくは 0. 05 μ m〜; 10 μ mであり、より好まし くは 0. 1 μ m〜8 μ mであり、特に好ましくは 0· 1 μ m〜6 μ mである。上記厚み範囲 の複屈折性フィルムは、液晶表示装置の表示特性の改善に有用な位相差値を有す  [0081] The thickness of the birefringent film is preferably 0.05 μm to 10 μm, more preferably 0.1 μm to 8 μm, and particularly preferably 0.1. μm to 6 μm. The birefringent film in the above thickness range has a retardation value useful for improving the display characteristics of a liquid crystal display device.
[0082] (偏光フィルムの性質等) [0082] (Characteristics of polarizing film, etc.)
上記多環式化合物を含む本発明の偏光フィルムは、その偏光度が、好ましくは 90 %以上、より好ましくは 95%以上である。また、該偏光フィルムの単体透過率は、好 ましくは 35%以上、より好ましくは 40%以上である。ただし、単体透過率及び偏光度 は、 23°Cで波長 550nmを基準とした値である。力、かる偏光特性を有する偏光フィノレ ムが得られる理由は、コーティング液を塗工することによって、多環式化合物が高い 配向性を示すためと推定される。  The polarizing film of the present invention containing the above polycyclic compound has a polarization degree of preferably 90% or more, more preferably 95% or more. The single transmittance of the polarizing film is preferably 35% or more, more preferably 40% or more. However, the single transmittance and degree of polarization are values based on a wavelength of 550 nm at 23 ° C. The reason why a polarizing finale having such a strong polarization property can be obtained is that the polycyclic compound exhibits high orientation by applying a coating solution.
[0083] 本発明の偏光フィルムの形成材料として用いられる多環式化合物は、波長 400nm 〜800nmの範囲内に於いて光吸収スペクトルの最大値を有する化合物である。該 多環式化合物は、好ましくは、波長 400nm〜800nmの範囲内に於いて光吸収スぺ タトルの最大値を有し、且つ分子構造中に芳香環及び/又は複素環を 2以上有する 化合物であり、より好ましくは、同最大値を有し且つ芳香環及び/又は複素環を 3個 〜8個有する化合物であり、特に好ましくは、ペリレン系骨格を有する多環化合物で ある。偏光フィルムの形成材料は、最も好ましくは上記一般式 (ΠΙ)〜 (VI)で表される 多環式化合物である。このような多環式化合物を含むコーティング液を用いて製膜す れば、二色性に優れた偏光フィルムが得られ得る。 [0083] The polycyclic compound used as the material for forming the polarizing film of the present invention is a compound having the maximum value of the light absorption spectrum in the wavelength range of 400 nm to 800 nm. The polycyclic compound is preferably a compound having a maximum value of light absorption spectrum within a wavelength range of 400 nm to 800 nm and having two or more aromatic rings and / or heterocyclic rings in the molecular structure. More preferably a compound having the same maximum value and having 3 to 8 aromatic rings and / or heterocycles, and particularly preferably a polycyclic compound having a perylene skeleton. The material for forming the polarizing film is most preferably a polycyclic compound represented by the above general formulas (ΠΙ) to (VI). A film is formed using a coating solution containing such a polycyclic compound. Then, a polarizing film excellent in dichroism can be obtained.
偏光フィルムの厚みは、好ましくは 0· Οδ ^ ιη〜; 10 ^ mであり、より好ましくは 0. 1 111〜5 111である。本発明の偏光フィルムは、塗工によって形成できるので、薄型 に形成できる。  The thickness of the polarizing film is preferably 0 · Οδ ^ ιη˜; 10 ^ m, more preferably 0.1 111-5111. Since the polarizing film of the present invention can be formed by coating, it can be formed thin.
[0084] <複屈折性フィルム又は偏光フィルムの用途〉  <Use of birefringent film or polarizing film>
本発明の複屈折性フィルムの用途は、特に制限はないが、代表的には、液晶表示 装置用の λ /4板、 λ /2板及び視野角拡大フィルム;フラットパネルディスプレイ用 反射防止フィルム、など力 S挙げられる。また、上記複屈折性フィルムは、有機 EL表示 装置などの画像表示装置などにも用いることができる。 1つの実施形態においては、 上記複屈折性フィルムは、偏光フィルムと積層して、偏光板とすることができる。以下 、この偏光板について説明する。  The use of the birefringent film of the present invention is not particularly limited, but is typically a λ / 4 plate for a liquid crystal display device, a λ / 2 plate and a viewing angle widening film; an antireflection film for a flat panel display, Etc. Power S is mentioned. The birefringent film can also be used for image display devices such as organic EL display devices. In one embodiment, the birefringent film can be laminated with a polarizing film to form a polarizing plate. Hereinafter, this polarizing plate will be described.
[0085] 本発明の偏光板は、本発明の複屈折性フィルムと偏光フィルムとを少なくとも備える 。この偏光板は、本発明の複屈折性フィルムと基材とを少なくとも備える積層フィルム を含んでいてもよいし、他の複屈折性フィルムや、任意の保護層を含んでいてもよい 。実用的には、上記偏光板の、構成部材の各層の間には、任意の適切な接着層が 設けられ、上記複屈折フィルムと各構成部材とが貼着される。  [0085] The polarizing plate of the present invention comprises at least the birefringent film of the present invention and a polarizing film. This polarizing plate may include a laminated film including at least the birefringent film of the present invention and a base material, or may include another birefringent film or an optional protective layer. Practically, an arbitrary appropriate adhesive layer is provided between the constituent layers of the polarizing plate, and the birefringent film and the constituent members are attached.
[0086] 上記偏光板を構成する偏光フィルムは、自然光又は偏光を直線偏光に変換する光 学特性を有していれば、特に限定されない。該偏光フィルムは、上記多環式化合物 を含む本発明の偏光フィルムを用いてもよ!/、し、他の偏光フィルムを用いてもょレ、。 前記他の偏光フィルムとしては、ヨウ素又は二色性染料を含有するポリビュルアルコ ール系樹脂を主成分とする延伸フィルムが好ましレ、。この延伸フィルムから構成され る偏光フィルムの厚みは、通常、 5 a m〜50 a mである。  The polarizing film constituting the polarizing plate is not particularly limited as long as it has optical characteristics that convert natural light or polarized light into linearly polarized light. As the polarizing film, the polarizing film of the present invention containing the above polycyclic compound may be used! /, Or another polarizing film may be used. As said other polarizing film, the stretched film which has as a main component the polybulal alcohol-type resin containing an iodine or a dichroic dye is preferable. The thickness of the polarizing film composed of this stretched film is usually 5 am to 50 am.
[0087] 上記接着層は、隣り合う部材の面と面とを接合し、実用上十分な接着力と接着時間 で、一体化させる層であれば、任意の適切なものが選択され得る。上記接着層を形 成する材料としては、例えば、接着剤、粘着剤、アンカーコート剤などが挙げられる。 上記接着層は、被着体の表面にアンカーコート剤が塗工され且つその上に接着剤ま たは粘着剤が塗工されたような、多層構造であってもよい。また、接着層は、肉眼的 に認知できな!/、ような薄!/、層(ヘアーラインともレ、う)であってもよ!/、。上記偏光フィル ムの一方の側に配置された接着層と他方の側に配置された接着層は、それぞれ同 一であってもよいし、或いは、異なっていてもよい。 [0087] As the adhesive layer, any appropriate layer can be selected as long as it is a layer that joins surfaces of adjacent members and integrates them with practically sufficient adhesive force and adhesive time. Examples of the material forming the adhesive layer include an adhesive, a pressure-sensitive adhesive, and an anchor coat agent. The adhesive layer may have a multilayer structure in which an anchor coating agent is applied to the surface of the adherend and an adhesive or a pressure-sensitive adhesive is applied thereon. In addition, the adhesive layer may not be recognized macroscopically! /, Such a thin layer! /, Or a layer (also known as a hairline)! /. Above polarizing film The adhesive layer disposed on one side of the system and the adhesive layer disposed on the other side may be the same or different.
[0088] 上記偏光板の、偏光フィルムと複屈折性フィルムと貼着する角度は、 目的に応じて 、適宜、設定され得る。例えば、上記偏光板が反射防止フィルムとして用いられる場 合、該偏光板の、偏光フィルムの吸収軸方向と複屈折性フィルムの遅相軸方向との なす角度は、好ましくは 25° 〜65° であり、さらに好ましくは 35° 〜55° である。上 記偏光板が視野角拡大フィルムとして用いられる場合、該偏光板の、偏光フィルムの 吸収軸方向と複屈折性フィルムの遅相軸方向とのなす角度は、実質的に平行又は 実質的に直交である。本明細書において「実質的に平行」とは、偏光フィルムの吸収 軸方向と複屈折性フィルムの遅相軸方向とのなす角度カ、 0° ± 10° の範囲を包含 し、好ましくは 0° ± 5° である。「実質的に直交」とは、偏光フィルムの吸収軸方向と 複屈折性フィルムの遅相軸方向とのなす角度力、 90° ± 10° の範囲を包含し、好 ましくは 90° ± 5° である。  [0088] The angle at which the polarizing film and the birefringent film are attached to the polarizing plate can be appropriately set according to the purpose. For example, when the polarizing plate is used as an antireflection film, the angle between the absorption axis direction of the polarizing film and the slow axis direction of the birefringent film is preferably 25 ° to 65 °. More preferably 35 ° to 55 °. When the polarizing plate is used as a viewing angle widening film, the angle between the polarizing film absorption axis direction and the birefringent film slow axis direction of the polarizing plate is substantially parallel or substantially orthogonal. It is. In the present specification, “substantially parallel” includes an angle between the absorption axis direction of the polarizing film and the slow axis direction of the birefringent film, and includes a range of 0 ° ± 10 °, preferably 0 ° ± 5 °. “Substantially orthogonal” includes the range of 90 ° ± 10 °, preferably 90 ° ± 5 °, which is the angle force between the absorption axis direction of the polarizing film and the slow axis direction of the birefringent film. °.
[0089] また、本発明の偏光フィルムの用途は、特に制限はないが、代表的には、液晶表示 装置の光学用途である。本発明の偏光フィルムは、基材に塗工することにより形成さ れるので、該基材を保護フィルムとして利用することもできる。  [0089] The application of the polarizing film of the present invention is not particularly limited, but is typically an optical application of a liquid crystal display device. Since the polarizing film of the present invention is formed by coating on a substrate, the substrate can also be used as a protective film.
実施例  Example
[0090] 本発明について、以下の実施例および比較例を用いて更に説明する。なお、本発 明は、これらの実施例のみに限定されるものではない。なお、実施例で用いた各分 析方法の一部は、以下の通りである。  [0090] The present invention will be further described using the following examples and comparative examples. Note that the present invention is not limited to these examples. A part of each analysis method used in the examples is as follows.
(1)厚みの測定方法:  (1) Measuring method of thickness:
基材 (ガラス板)表面に形成した塗工膜の一部を剥離し、該基材と塗工膜との段差 を、三次元非接触表面形状計測システム((株)菱化システム製、製品名「MiCramap MM5200」)を用いて測定し、これを厚みとした。 A part of the coating film formed on the surface of the base material (glass plate) is peeled off, and the step between the base material and the coating film is measured with a three-dimensional non-contact surface shape measurement system (manufactured by Ryoka System Co., Ltd. measured using the name "Mi C ram a p MM5200"), which was the thickness.
(2)屈折率の測定方法:  (2) Refractive index measurement method:
王子計測機器 (株)製、製品名「KOBRA21— ADH」を用いて、 23°Cで測定した。 なお、平均屈折率は、アッベ屈折率計 (ァタゴ (株)製、製品名「DR— M4」)を用いて 測定した値を用いた。 (3)単体透過率及び偏光度の測定方法: Measurement was performed at 23 ° C. using a product name “KOBRA21—ADH” manufactured by Oji Scientific Instruments. As the average refractive index, a value measured using an Abbe refractometer (manufactured by Atago Co., Ltd., product name “DR-M4”) was used. (3) Measuring method of single transmittance and degree of polarization:
分光光度計 (村上色彩技術研究所 (株)製、製品名「DOT— 3」)を用いて、 23°Cで 測定した。なお、偏光度及び単体透過率の測定値は、波長 550nmを基準とした。 単体透過率は、 J1S Z 8701— 1995の 2度視野に基づぐ三刺激 の Y^tである Measurement was performed at 23 ° C using a spectrophotometer (Murakami Color Research Laboratory Co., Ltd., product name “DOT-3”). The measured values of polarization degree and single transmittance were based on a wavelength of 550 nm. The single transmittance is tristimulus Y ^ t based on the two-degree field of view of J1S Z 8701-1995
Yes
偏光度は、平行透過率 (H )および直交透過率 (H )を測定し、式:偏光度(%) =  Polarization degree is measured by measuring parallel transmittance (H) and orthogonal transmittance (H), and the formula: degree of polarization (%) =
0 90  0 90
{ (H— H ) / (H +H ) } 1/2 X 100より求めることができる。平行透過率 (H )は、{(H—H) / (H + H)} 1/2 X 100. Parallel transmittance (H) is
0 90 0 90 0 測定対象である偏光フィルム 2枚を互いの吸収軸が平行となるように重ね合わせて作 製した平行型積層体の透過率の値である。直交透過率 (H )は、測定対象である偏 0 90 0 90 0 This is the transmittance value of a parallel laminate produced by superposing two polarizing films to be measured so that their absorption axes are parallel to each other. The orthogonal transmittance (H)
90  90
光フィルム 2枚を互!/、の吸収軸が直交するように重ね合わせて作製した直交型積層 体の透過率の値である。なお、これらの透過率は、 J1S Z 8701— 1982の 2度視野 (C光源)により、視感度補正を行った Y値である。  This is a transmittance value of an orthogonal laminate produced by superposing two optical films so that their absorption axes are orthogonal to each other. Note that these transmittances are Y values obtained by correcting the visibility using the J1S Z 8701-1982 2-degree field of view (C light source).
[0091] [合成例 1] [0091] [Synthesis Example 1]
攪拌機を備えた反応容器に、 5リットルの氷酢酸と精製した 490gのァセナフテンキ ノンを添加し、窒素パブリング下で 15分間攪拌し、ァセナフテンキノン溶液を得た。 同様に、攪拌機を備えた別の反応容器に 7. 5リットルの氷酢酸と 275gの o フエ二 レンジアミンを添加し、窒素バブリング下で 15分間攪拌し、 o フエ二レンジアミン溶 液を得た。その後、窒素雰囲気下で攪拌しながら前記 o フエ二レンジァミン溶液を ァセナフテンキノン溶液に 1時間かけて徐々に添加し、その後、 3時間攪拌を続ける ことで反応させた。得られた反応液にイオン交換水を添加した後、沈殿物をろ過して 、ァセナフト [1 , 2— b]キノキサリンを含む粗生成物を得た。この粗生成物は、熱氷酢 酸で再結晶を行レヽ精製した。  To a reaction vessel equipped with a stirrer, 5 liters of glacial acetic acid and 490 g of purified acenaphthenequinone were added and stirred for 15 minutes under nitrogen publishing to obtain a acenaphthenequinone solution. Similarly, 7.5 liters of glacial acetic acid and 275 g of o-phenylenediamine were added to another reaction vessel equipped with a stirrer, and stirred for 15 minutes under nitrogen bubbling to obtain o-phenylenediamine solution. . Thereafter, the o-phenylenediamine solution was gradually added to the caseen quinone quinone solution over 1 hour with stirring under a nitrogen atmosphere, and then the reaction was continued for 3 hours. Ion exchange water was added to the resulting reaction solution, and then the precipitate was filtered to obtain a crude product containing caseenaft [1,2-b] quinoxaline. The crude product was purified by recrystallization from hot ice acetic acid.
[0092] 次に、下記反応経路(c)に示すように、 300gの上記ァセナフト [1 , 2 b]キノキサリ ンを、 30%発煙硫酸(2. 1リットル)に加えて 24時間室温で攪拌後、 125°Cに加熱し 、 32時間攪拌して反応させた。得られた溶液を 40°C〜50°Cに保ちながら、 4. 5リット ルのイオン交換水を加えて希釈し、さらに 3時間攪拌した。沈殿物をろ過し、硫酸で 再結晶を行い、ァセナフト [1 , 2— b]キノキサリン 2, 5 ジスルホン酸(以下、 2, 5 disulfo Q ANと記す)を合成した。 [0093] [化 10] [0092] Next, as shown in the following reaction route (c), 300 g of the above-mentioned caseenaft [1, 2 b] quinoxaline was added to 30% fuming sulfuric acid (2.1 liters) and stirred for 24 hours at room temperature. The mixture was heated to 125 ° C and stirred for 32 hours to be reacted. While maintaining the resulting solution at 40 ° C. to 50 ° C., 4.5 liters of ion exchange water was added for dilution, and the mixture was further stirred for 3 hours. The precipitate was filtered and recrystallized with sulfuric acid to synthesize acenaphtho [1,2-b] quinoxaline 2,5 disulfonic acid (hereinafter referred to as 2,5 disulfo QAN). [0093] [Chemical 10]
[0094] [実施例 1 1] [0094] [Example 1 1]
上記合成例 1で得られた合成物(残留硫酸を含む 2, 5 -disulfo-QAN)のゥエツ トケーキ品 2gを、メタノール 10gに入れ、十分に攪拌して分散液を得た。この分散液 を、ろ紙 (アドバンテック社製、商品名「NO. 5C」)を用いて減圧ろ過し、残さを得た。 この残さを、再度、メタノール 10gに混合し、同様のろ過を行った。前記メタノール 10 gを混合してろ過する工程を、計 4回繰り返して行った。最終ろ過で得られた残さを取 り出し、 60°Cで 6時間真空乾燥をした後、固形分を得た。  2 g of the wet cake product of the synthesized product (2,5-disulfo-QAN containing residual sulfuric acid) obtained in Synthesis Example 1 above was put in 10 g of methanol and sufficiently stirred to obtain a dispersion. This dispersion was filtered under reduced pressure using filter paper (trade name “NO. 5C” manufactured by Advantech Co., Ltd.) to obtain a residue. This residue was again mixed with 10 g of methanol and subjected to the same filtration. The process of mixing and filtering 10 g of methanol was repeated a total of 4 times. The residue obtained by final filtration was taken out and vacuum-dried at 60 ° C for 6 hours to obtain a solid content.
[0095] [実施例 1 2] [0095] [Example 1 2]
メタノールに代えて、アセトン 10gを用いたこと以外は、実施例 1—1と同様にしてろ 過を行い、固形物を得た。  A solid was obtained in the same manner as in Example 1-1 except that 10 g of acetone was used instead of methanol.
[0096] [比較例 1 1] [0096] [Comparative Example 1 1]
メタノールに代えて、トルエン 10gを用いたこと以外は、実施例 1—1と同様にしてろ 過を行い、固形物を得た。  A solid was obtained in the same manner as in Example 1-1 except that 10 g of toluene was used instead of methanol.
[0097] [比較例 1 2] [0097] [Comparative Example 1 2]
メタノールに代えて、シクロへキサン 10gを用いたこと以外は、実施例 1—1と同様に してろ過を行い、固形物を得た。  Filtration was performed in the same manner as in Example 1-1 except that 10 g of cyclohexane was used in place of methanol to obtain a solid.
[0098] [比較例 1 3] [0098] [Comparative Example 1 3]
合成例 1で得られた合成物(残留硫酸を含む 2, 5— disulfo— QAN)のウエットケ ーキ品 1. 3kgを、 48. 7リットルのイオン交換水(電気伝導度: 0. l S/cm)に溶解 し、さらに、水酸化ナトリウムの 5質量%水溶液を、 9. 8リットル加えて中和した。得ら れた水溶液を、供給タンクに入れ、逆浸透膜フィルター(日東電工 (株)製、製品名「 NTR- 7430フィルターエレメント」 )を備えた高圧 ROエレメント試験装置を用いて、 液量が一定となるように逆浸透水を加えながら循環ろ過した。そして、廃液の電気伝 導度が、 13. 6 S/cmとなるまで残存硫酸またはその硫酸塩の除去を行ことにより 、精製水溶液を得た。 Wet cake product of the synthesized product (residual sulfuric acid-containing 2, 5—disulfo—QAN) obtained in Synthesis Example 1. 1. 3 kg of 48.7 liters of ion-exchanged water (electric conductivity: 0.1 l S / cm) and neutralized by adding 9.8 liters of a 5% by weight aqueous solution of sodium hydroxide. The obtained aqueous solution is put into a supply tank, and using a high pressure RO element test apparatus equipped with a reverse osmosis membrane filter (product name “NTR-7430 filter element” manufactured by Nitto Denko Corporation) Circulation filtration was performed while adding reverse osmosis water so that the liquid amount was constant. Then, the residual sulfuric acid or its sulfate was removed until the electrical conductivity of the waste liquid reached 13.6 S / cm to obtain a purified aqueous solution.
[0099] [合成例 2]  [0099] [Synthesis Example 2]
合成例 1と同様にして、ァセナフト [1 , 2— b]キノキサリンを得た。  In the same manner as in Synthesis Example 1, caseenaft [1,2-b] quinoxaline was obtained.
次に、下記反応経路(d)に示すように、 300gの上記ァセナフト [1 , 2— b]キノキサリ ンを、 30%発煙硫酸(2. 1リットル)に加え、室温で 48時間攪拌して反応させた。得ら れた溶液を 40°C〜50°Cに保ちながら、 4. 5リットルのイオン交換水を加えて希釈し、 さらに 3時間攪拌した。沈殿物をろ過し、ァセナフト [1 , 2— b]キノキサリン一 2—スル ホン酸(以下、 2— sulfo— QANと記す)を合成した。  Next, as shown in the following reaction route (d), 300 g of the above-mentioned caseenaft [1, 2-b] quinoxaline was added to 30% fuming sulfuric acid (2.1 liters) and stirred at room temperature for 48 hours. I let you. While maintaining the obtained solution at 40 ° C. to 50 ° C., 4.5 liters of ion exchange water was added for dilution, and the mixture was further stirred for 3 hours. The precipitate was filtered to synthesize acenaphtho [1,2-b] quinoxaline-2-sulfonic acid (hereinafter referred to as 2-sulfo-QAN).
[0100] [化 11]  [0100] [Chemical 11]
[実施例 2— 1 ] [Example 2-1]
上記合成例 2で得られた合成物(残留硫酸を含む 2— sulfo— QAN)のウエットケー キ品 2gを、メタノール 10gに入れ、十分に攪拌して分散液を得た。これを実施例 1— 1と同様にして、メタノール 10gを混合してろ過する工程を計 4回行い、固形物を得た  2 g of the wet cake product of the synthesized product (2-sulfo-QAN containing residual sulfuric acid) obtained in Synthesis Example 2 above was placed in 10 g of methanol and sufficiently stirred to obtain a dispersion. In the same manner as in Example 1-1, the process of mixing and filtering 10 g of methanol was performed a total of 4 times to obtain a solid matter.
[0102] [実施例 2— 2] [0102] [Example 2—2]
メタノールに代えて、アセトン 10gを用いたこと以外は、実施例 2—1と同様にしてろ 過を行い、固形物を得た。  A solid was obtained in the same manner as in Example 2-1, except that 10 g of acetone was used instead of methanol.
[0103] [実施例 2— 3] [0103] [Example 2-3]
メタノールに代えて、イソプロピルアルコール 10gを用いたこと以外は、実施例 2—1 と同様にしてろ過を行い、固形物を得た。  Filtration was performed in the same manner as in Example 2-1 except that 10 g of isopropyl alcohol was used instead of methanol to obtain a solid.
[0104] [比較例 2— 1 ] メタノールに代えて、トルエン 10gを用いたこと以外は、実施例 2—1と同様にしてろ 過を行い、固形物を得た。 [Comparative Example 2-1] A solid was obtained in the same manner as in Example 2-1, except that 10 g of toluene was used instead of methanol.
[0105] [比較例 2— 2] [0105] [Comparative Example 2-2]
メタノールに代えて、シクロへキサン 10gを用いたこと以外は、実施例 2—1と同様に してろ過を行い、固形物を得た。  Filtration was performed in the same manner as in Example 2-1 except that 10 g of cyclohexane was used instead of methanol to obtain a solid.
[0106] [比較例 2— 3] [0106] [Comparative Example 2-3]
合成例 2で得られた合成物(残留硫酸を含む 2— sulfo— QAN)のウエットケーキ品 500gを、 35. 5リットルのイオン交換水(電気伝導度: 0· 1 H S/cm)に溶解し、さら に、水酸化ナトリウムの 5質量%水溶液を、 3. 5リットル加えて中和した。得られた水 溶液を、供給タンクに入れ、逆浸透膜フィルター(日東電工 (株)製、製品名「NTR— 7430フィルターエレメント」)を備えた高圧 ROエレメント試験装置を用いて、液量が 一定となるように逆浸透水を加えながら循環ろ過した。そして、廃液の電気伝導度が 、 8. 06 S/cmとなるまで残存硫酸またはその硫酸塩の除去を行うことにより、精製 水溶液を得た。  Dissolve 500 g of the wet cake product (2-sulfo-QAN containing residual sulfuric acid) obtained in Synthesis Example 2 in 35.5 liters of ion-exchanged water (electric conductivity: 0 · 1 HS / cm). Furthermore, 3.5 liters of a 5% by mass aqueous solution of sodium hydroxide was added for neutralization. The obtained aqueous solution is put into a supply tank, and the amount of liquid is constant using a high pressure RO element testing device equipped with a reverse osmosis membrane filter (product name “NTR-7430 filter element” manufactured by Nitto Denko Corporation). Circulation filtration was performed while adding reverse osmosis water. Then, the residual sulfuric acid or its sulfate was removed until the electrical conductivity of the waste liquid reached 8.06 S / cm to obtain a purified aqueous solution.
[0107] [合成例 3] [Synthesis Example 3]
<ペリレンテトラカルボン酸のジベンゾイミダゾール誘導体のスルホン化〉 攪拌機を備えた反応容器に、 30%発煙硫酸(0. 5リットル)を入れ、 35°Cで攪拌し ながらペリレンテトラカルボン酸のジベンゾイミダゾール誘導体(以下、 PCDIと記す) lOOgを徐々に加えてスルホン化を行った。この後、イオン交換水 4. 5リットルをカロえ て希釈し、反応を終了させた。沈殿物をろ過し、硫酸で再結晶を行い、 PCDIスルホ ン化物を得た (反応式 (e)参照)。  <Sulfonation of dibenzimidazole derivative of perylenetetracarboxylic acid> In a reaction vessel equipped with a stirrer, 30% fuming sulfuric acid (0.5 liter) was placed and stirred at 35 ° C while dibenzoimidazole derivative of perylenetetracarboxylic acid ( (Hereinafter referred to as PCDI) lOOg was gradually added to effect sulfonation. Thereafter, 4.5 liters of ion-exchanged water was diluted by dilution, and the reaction was terminated. The precipitate was filtered and recrystallized with sulfuric acid to obtain a PCDI sulfonate (see reaction formula (e)).
なお、 PCDIは、式(e)に示すように、シス型とトランス型が混在しているものを用い た。  The PCDI used was a mixture of cis and transformer types as shown in equation (e).
この PCDIスルホン化物の 0. lmmol/L水溶液を調製し、分光光度計(日立製作 所製、製品名「U— 4100分光光度計」)を用いて、光吸収スペクトルを測定したところ 、波長 600nmにおいて最大吸収を示した。  A 0.1 mmol / L aqueous solution of this PCDI sulfonated product was prepared, and a light absorption spectrum was measured using a spectrophotometer (product name “U-4100 spectrophotometer” manufactured by Hitachi, Ltd.). Maximum absorption was shown.
[0108] [化 12] [0108] [Chemical 12]
[0109] [実施例 3— 1]  [Example 3— 1]
合成例 3で得られた合成物 (残留硫酸を含む PCDIスルホン化物)のウエットケーキ 品 2gを、メタノール 10gに入れ、十分に攪拌して分散液を得た。この分散液を、ろ紙 ( アドバンテック社製、商品名「NO. 5C」)を用いて減圧ろ過し、残さを得た。この残さ を、再度、メタノール 10gに混合し、同様の減圧ろ過を行った。メタノール 10gを混合 してろ過する工程を、計 4回繰り返して行った。最終ろ過で得られた残さを取り出し、 60°Cで 6時間真空乾燥をした後、最終的な固形分を得た。  2 g of a wet cake product of the synthesized product (PCDI sulfonated product containing residual sulfuric acid) obtained in Synthesis Example 3 was placed in 10 g of methanol and sufficiently stirred to obtain a dispersion. This dispersion was filtered under reduced pressure using a filter paper (trade name “NO. 5C” manufactured by Advantech Co., Ltd.) to obtain a residue. This residue was again mixed with 10 g of methanol and subjected to the same vacuum filtration. The process of mixing and filtering 10 g of methanol was repeated a total of 4 times. The residue obtained by final filtration was taken out and vacuum-dried at 60 ° C. for 6 hours to obtain a final solid content.
[0110] [実施例 3— 2] [0110] [Example 3-2]
メタノールに代えて、アセトン 10gを用いたこと以外は、実施例 3—1と同様にしてろ 過を行い、固形物を得た。  A solid was obtained in the same manner as in Example 3-1, except that 10 g of acetone was used instead of methanol.
[0111] [実施例 3— 3] [0111] [Example 3-3]
メタノールに代えて、イソプロピルアルコール 10gを用いたこと以外は、実施例 3—1 と同様にしてろ過を行い、固形物を得た。  Filtration was performed in the same manner as in Example 3-1 except that 10 g of isopropyl alcohol was used instead of methanol to obtain a solid.
[0112] [比較例 3— 1] [0112] [Comparative Example 3-1]
メタノールに代えて、トルエン 10gを用いたこと以外は、実施例 3—1と同様にしてろ 過を行い、固形物を得た。  A solid was obtained in the same manner as in Example 3-1, except that 10 g of toluene was used instead of methanol.
[0113] [比較例 3— 2] [0113] [Comparative Example 3-2]
メタノールに代えて、シクロへキサン 10gを用いたこと以外は、実施例 3—1と同様に してろ過を行い、固形物を得た。  Filtration was performed in the same manner as in Example 3-1 except that 10 g of cyclohexane was used instead of methanol to obtain a solid.
[0114] 上記実施例 1 1 3— 3の固形物及び比較例 1 1 3— 2の固形物につ!/、て残 存硫酸量を評価するため、中和滴定及び電気伝導度測定を行った。 [0115] (中和滴定) [0114] In order to evaluate the amount of sulfuric acid remaining in the solids of Example 1 1 3-3 and Comparative Example 1 1 3-2! It was. [0115] (Neutralization titration)
中和滴定による残存硫酸量の評価は、次の通りである。上記実施例 1一;!〜 3— 3 及び比較例 1 3— 2の固形物をそれぞれイオン交換水に溶解させ、 0. 1質量 %の水溶液を調製した。この水溶液 75gに、水酸化ナトリウムの 0. 1質量%水溶液を 加えて、 pH = 7となるように中和滴定を行った。  Evaluation of the residual sulfuric acid amount by neutralization titration is as follows. The solids of Example 1 above;! To 3-3 and Comparative Example 1 3-2 were dissolved in ion-exchanged water to prepare 0.1 mass% aqueous solutions. A 0.1% by mass aqueous solution of sodium hydroxide was added to 75 g of this aqueous solution, and neutralization titration was performed so that pH = 7.
なお、残存硫酸量は次式に従って求めた。  The amount of residual sulfuric acid was determined according to the following formula.
残存硫酸量 (mg) /原料固形分 (g) = [{ (滴定に用いた水酸化ナトリウム水溶液中 の塩基量 (mol)—滴定に用いた原料固形分全てが目的のキノキサリンと仮定した場 合の酸量 (mol) ) Χ 98· 03 } /2] X (1000/原料固形分 (g) )。  Residual sulfuric acid amount (mg) / raw material solid content (g) = [{(base amount in sodium hydroxide aqueous solution used for titration (mol)-assuming that all the raw material solid content used for titration is the target quinoxaline. Acid amount (mol)) Χ 98 · 03} / 2] X (1000 / raw material solids (g)).
ただし、比較例 1—3及び比較例 2— 3については、既に中和された精製水溶液が 得られているため、中和滴定を行うことはできなかった。  However, for Comparative Examples 1-3 and 2-3, neutralized titration could not be performed because a neutralized purified aqueous solution was obtained.
なお、参考として、合成例 1〜合成例 3で合成された合成物(ろ過処理前)の残存硫 酸量についても、上記と同様の方法にて測定した。  For reference, the residual sulfuric acid content of the synthesized products (before filtration treatment) synthesized in Synthesis Examples 1 to 3 was also measured in the same manner as described above.
[0116] (電気伝導度) [0116] (Electrical conductivity)
電気伝導度( S/cm)は、溶液電導率計 (京都電子工業 (株)製、製品名「CM— 117」)を用いて測定した。測定用の水溶液は、以下のようにして調製した。実施例 1 一;!〜 3— 3及び比較例 1 1 3 2の固形物を、イオン交換水に溶解させ、 0. 1質 量%水溶液を調製した。この水溶液に 0. 1質量%水酸化ナトリウム水溶液を加えな 力 ¾pH = 7となるように中和することにより、測定用の水溶液を得た。  The electrical conductivity (S / cm) was measured using a solution conductivity meter (product name “CM-117” manufactured by Kyoto Electronics Industry Co., Ltd.). An aqueous solution for measurement was prepared as follows. Example 1 1;! To 3-3 and Comparative Example 1 1 3 2 were dissolved in ion-exchanged water to prepare a 0.1 mass% aqueous solution. An aqueous solution for measurement was obtained by adding a 0.1% by mass aqueous sodium hydroxide solution to this aqueous solution and neutralizing it to give a force of pH = 7.
また、比較例 1 3及び比較例 2— 3については、得られた精製水溶液を上記と同 濃度となるようにイオン交換水を加えて希釈することにより、測定用の水溶液を得た。 なお、参考として、合成例 1〜合成例 3で合成された合成物(ろ過処理前)の電気伝 導度についても、上記と同様の方法にて測定した。  Further, for Comparative Examples 13 and 2-3, the purified aqueous solution obtained was diluted by adding ion-exchanged water so as to have the same concentration as above to obtain an aqueous solution for measurement. For reference, the electrical conductivity of the synthesized products (before filtration treatment) synthesized in Synthesis Examples 1 to 3 was also measured by the same method as described above.
[0117] 残存硫酸量及び電気伝導度の測定結果を表 1に示す。表 1の通り、実施例 1一;!〜 [0117] Table 1 shows the measurement results of the amount of residual sulfuric acid and electrical conductivity. As shown in Table 1, Example 1 one;
3— 3の固形物は、処理前に比べて、残存硫酸量が極めて少な力、つた。従って、実施 例 1一;!〜 3— 3の方法は、高純度の多環式化合物を精製できた。  The solid matter of 3-3 had an extremely small amount of residual sulfuric acid compared to before treatment. Therefore, the method of Example 1 1 ;! to 3-3 could purify a highly pure polycyclic compound.
[0118] [表 1] 残存硫酸量 (mg) 電気伝導度 多環式化合物 分離方法 有機溶媒 [0118] [Table 1] Residual sulfuric acid amount (mg) Electrical conductivity Polycyclic compound Separation method Organic solvent
ノ原料固形分 (g) ( μ S/cm) 処理前 2,5-disulfo-QAN ― ― 331 .8 832 実施例 1一 1 2,5-disulfo-QAN ろ過 メタノール 6.6 378 実施例 1一 2 2,5-disulfo-QAN ろ Ji アセトン 9.0 386 比較例 1—1 2,5-disulfo-QAN ろ i§ トルエン 328.9 829 比較例 1一 2 2,5-disulfo-QAN ろ過 シクロへキサン 330.4 831 比較例 1 _3 2,5-disulfo-QAN 膜 ― ― 462 処理前 2-sulfo-QAN ― ― 382.7 794 実施例 2— 1 2-sulfo-QAN ろ メタノール 14.1 250 実施例 2— 2 2-sulfo-QAN ろ過 アセトン 1 7.7 255 実施例 2— 3 2-sulfo-QAN ろ id IPA 1 5.9 252 比較例 2— 1 2-sulfo-QAN ろ過 トルエン 382.4 793 比較例 2— 2 2-sulfo-QAN ろ シクロへキサン 380.8 792 比較例 2— 3 2-sulfo-QAN 膜 ― ― 277 処理前 PCDIスルホン化物 一 ― 463.2 1 048 実施例 3— 1 PGDIスルホン化物 ろ過 メタノー レ 9.4 232 実施例 3— 2 PCD1スルホン化物 ろ in アセトン 5.7 229 実施例 3— 3 PCDIスルホン化物 ろ j@ IPA 8.2 284 比較例 3— 1 PCDIスルホン化物 ろ過 トルエン 457.4 903 比較例 3— 2 PCD1スルホン化物 ろ過 シクロへキサン 461 .9 954 [実施例 4]  Raw material solids (g) (μS / cm) Before treatment 2,5-disulfo-QAN ― ― 331.8 832 Example 1 1 1 2,5-disulfo-QAN Filtration Methanol 6.6 378 Example 1 1 2 2 1,5-disulfo-QAN filter Ji Acetone 386 386 Comparative example 1—1, 2,5-disulfo-QAN filter i§ Toluene 328.9 829 Comparative example 1 1 2 2,5-disulfo-QAN filtration Cyclohexane 330.4 831 Comparative example 1 _3 2,5-disulfo-QAN membrane--462 Before treatment 2-sulfo-QAN--382.7 794 Example 2— 1 2-sulfo-QAN filtration Methanol 14.1 250 Example 2— 2 2-sulfo-QAN filtration Acetone 1 7.7 255 Example 2-3 2-sulfo-QAN filter id IPA 1 5.9 252 Comparative example 2— 1 2-sulfo-QAN filtration Toluene 382.4 793 Comparative example 2— 2 2-sulfo-QAN filter Cyclohexane 380.8 792 Comparative example 2- 3 2-sulfo-QAN membrane ― ― 277 Before treatment PCDI sulfonated one ― 463.2 1 048 Example 3-1 PGDI sulfonated product Filtration methanol 9.4 232 Example 3-2 PCD1 sulfonated product in acetone 5.7 229 Example 3-3 PCDI sulfonated products @ IPA 8.2 284 Comparative Example 3-1 PCDI Sulfonated Filtration Toluene 457.4 903 Comparative Example 3-2 PCD1 Sulfonated Filtration Cyclohexane 461.99 954 [Example 4]
実施例 1—2で得られた固形物 1 · 56gと、実施例 2— 2で得られた固形物 0. 84gを 、 50ミリリットノレのイオン交換水(電気伝導度:1. 7 S/cm)に溶解し、さらに水酸化 アンモニゥムを加えて、 ρΗ = 6· 9となるように中和した。得られた水溶液を、ロータリ 一エバポレーターを用いて、水溶液中の多環式化合物の濃度が 24質量%となるよう に調製した。ここで得られた水溶液を、偏光顕微鏡観察すると、 23°Cでネマチック液 晶相を示した。  1 · 56 g of the solid material obtained in Example 1-2 and 0.84 g of the solid material obtained in Example 2-2 were mixed with 50 milliliters of ion-exchanged water (electric conductivity: 1.7 S / cm). Then, ammonium hydroxide was further added to neutralize so that ρΗ = 6 · 9. The obtained aqueous solution was prepared using a rotary evaporator so that the concentration of the polycyclic compound in the aqueous solution was 24% by mass. When the aqueous solution obtained here was observed with a polarizing microscope, it showed a nematic liquid crystal phase at 23 ° C.
次に、厚み 1. 3mmのガラス板(松浪硝子工業社製、商品名「MATSUNAMI S LIDE GLASS」 )に、上記水溶液を、バーコータ(BUSCHMAN社製、商品名「m ayer rot HS 1. 5」)を用いて塗工し、 23°Cの恒温室内で自然乾燥させた。塗工膜 の表面を目視で観察したところ、ハジキもなぐ均一に塗工されていた。  Next, the above aqueous solution is applied to a 1.3 mm thick glass plate (trade name “MATSUNAMI S LIDE GLASS” manufactured by Matsunami Glass Industrial Co., Ltd.) and a bar coater (trade name “m ayer rot HS 1.5” manufactured by BUSCHMAN). And dried in a constant temperature room at 23 ° C. When the surface of the coating film was visually observed, it was uniformly coated without repelling.
このようにして形成された塗工膜は、屈折率楕円体が iix >nz > nyの関係を満足し 、これは複屈折性フィルムとして利用できる。該塗工膜は、厚み 0. 6 u m, Re [590] = 203腹、 Nz係数 =0· 25であった。 In the coating film formed in this way, the refractive index ellipsoid satisfies the relationship iix>nz> ny, and this can be used as a birefringent film. The coating film has a thickness of 0.6 um, Re [590] = 203 stomachs, Nz coefficient = 0 · 25.
[0120] [比較例 4] [0120] [Comparative Example 4]
合成例 1で得られた合成物(ろ過処理前) 1. 56gと、合成例 2で得られた合成物(ろ 過処理前) 0. 84gとを用いたこと以外は、実施例 3と同様にして水溶液を調製し、こ れを塗工して、ガラス板に塗工膜を形成した。  Same as Example 3 except that 1.56 g of the compound obtained in Synthesis Example 1 (before filtration) and 0.84 g of the compound obtained in Synthesis Example 2 (before filtration) were used. An aqueous solution was prepared and applied to form a coating film on a glass plate.
得られた塗工膜の表面を目視で観察したところ、直径 0. 5mm以上の円形のハジ キ跡が多数生じていた。  When the surface of the obtained coating film was visually observed, many circular scuff marks having a diameter of 0.5 mm or more were generated.
[0121] [実施例 5] [0121] [Example 5]
実施例 3— 2で得られた固形物(PCDIスルホン化物) 2· 0gを、 50ミリリットルのィォ ン交換水(電気伝導度: 1. 7 S/cm)に溶解し、さらに、 5質量%の水酸化ナトリウ ム水溶液を加えて、 pH = 4. 58まで中和した。得られた水溶液を、ロータリーエバポ レーターを用いて、水溶液中の PCDIスルホン化物の濃度が 11質量%となるまで濃 縮した。得られた水溶液を、偏光顕微鏡観察すると、 23°Cでネマチック液晶相を示し た。  2 g of the solid material (PCDI sulfonated product) obtained in Example 3-2 was dissolved in 50 ml of ion-exchanged water (electric conductivity: 1.7 S / cm), and further 5% by mass. Was added to neutralize to pH = 4.58. The obtained aqueous solution was concentrated using a rotary evaporator until the concentration of the PCDI sulfonated product in the aqueous solution reached 11% by mass. When the obtained aqueous solution was observed with a polarizing microscope, it exhibited a nematic liquid crystal phase at 23 ° C.
次に、厚み 1 · 3mmのガラス板(松浪硝子工業社製、商品名「MATSUNAMI S LIDE GLASS」 )に、上記水溶液を、バーコータ(BUSCHMAN社製、商品名「m ayer rot HS1. 5」)を用いて塗工し、 23°Cの恒温室内で自然乾燥させた。塗工膜 の表面を目視で観察したところ、ハジキもなぐ均一に塗工されていた。  Next, place the above aqueous solution on a glass plate (Matsunami Glass Industry Co., Ltd., trade name “MATSUNAMI S LIDE GLASS”) with a thickness of 1 to 3 mm. It was applied and dried in a constant temperature room at 23 ° C. When the surface of the coating film was visually observed, it was uniformly coated without repelling.
このようにして形成された塗工膜は、偏光フィルムとして利用できる。該塗工膜は、 厚み 0· 35 111、偏光度 = 95%、単体透過率 = 43%であった。  The coating film thus formed can be used as a polarizing film. The coated film had a thickness of 0 · 35 111, a degree of polarization = 95%, and a single transmittance = 43%.
[0122] [比較例 5] [0122] [Comparative Example 5]
合成例 3で得られた合成物(ろ過処理前) 2. 0gを用いたこと以外は、実施例 5と同 様にして水溶液を調製し、これを塗工して、ガラス板に塗工膜を形成した。  An aqueous solution was prepared in the same manner as in Example 5 except that 2.0 g of the synthesized product obtained in Synthesis Example 3 (before filtration) was used, and this was coated to form a coating film on a glass plate. Formed.
得られた塗工膜の表面を目視で観察したところ、直径 0. 3mm以上の円形のハジ キ跡が多数生じていた。このような穴開き膜は、フィルムとして使用できない。  When the surface of the obtained coating film was visually observed, many circular cissing marks having a diameter of 0.3 mm or more were generated. Such a perforated membrane cannot be used as a film.

Claims

請求の範囲  The scope of the claims
[1] SO 2 及び SO—の少なくとも何れか一方を含む不純物と SO M基を有する多環 [1] A polycycle having an SO M group and an impurity containing at least one of SO 2 and SO—
4 3 3  4 3 3
式化合物(ただし、 Mは対イオンを表す)とを含有する混合物を、 SO 2 又は SO—が A mixture containing a compound of the formula (where M represents a counter ion), SO 2 or SO—
4 3 溶解し且つ前記多環式化合物が難溶な有機溶媒に混合して分散液を得る工程、前 記分散液をろ過し、前記多環式化合物を分離する工程、を有することを特徴とする多 環式化合物の精製方法。  4 3 Dissolving and mixing the polycyclic compound with a poorly soluble organic solvent to obtain a dispersion, and filtering the dispersion to separate the polycyclic compound. A method for purifying a polycyclic compound.
[2] 前記有機溶媒が、メタノール、エタノール、イソプロピルアルコール、その他の低級 アルコール、及びアセトンから選ばれる少なくとも 1種である請求項 1に記載の多環式 化合物の精製方法。  2. The method for purifying a polycyclic compound according to claim 1, wherein the organic solvent is at least one selected from methanol, ethanol, isopropyl alcohol, other lower alcohols, and acetone.
[3] 前記多環式化合物が、下記一般式 (I)で表されるキノキサリン誘導体を含む請求項  [3] The polycyclic compound comprises a quinoxaline derivative represented by the following general formula (I):
1または 2に記載の多環式化合物の精製方法。  A method for purifying the polycyclic compound according to 1 or 2.
[化 1]  [Chemical 1]
式 (I)中、 Mは、対イオンを表す。 A及び Bは、置換基を表し、 a及び bは、その置換 数(aは 0〜4の整数、 bは、 0〜6の整数)を表す。また、 1及び mは、置換数(1は、 0〜 4の整数、 mは、 0〜6の整数)を表す。ただし、 1及び mは、同時に 0でない。 In formula (I), M represents a counter ion. A and B represent substituents, and a and b represent the number of substitutions (a is an integer from 0 to 4, and b is an integer from 0 to 6). 1 and m represent the number of substitutions (1 is an integer from 0 to 4, and m is an integer from 0 to 6). However, 1 and m are not 0 at the same time.
前記多環式化合物が、下記一般式 (Π)で表されるキノキサリン誘導体を含む請求 項 3に記載の多環式化合物の精製方法。  4. The method for purifying a polycyclic compound according to claim 3, wherein the polycyclic compound contains a quinoxaline derivative represented by the following general formula (Π).
[化 2]  [Chemical 2]
式(Π)中、 Μは、対イオンを表す。 mは、置換数(1〜6の整数)を表す。 In the formula (Π), 表 す represents a counter ion. m represents the number of substitutions (an integer of 1 to 6).
[5] 前記多環式化合物が、波長 400nm〜800nmに於いて光吸収スペクトルの最大値 を有する請求項 1または 2に記載の多環式化合物の精製方法。 5. The method for purifying a polycyclic compound according to claim 1 or 2, wherein the polycyclic compound has a maximum value of a light absorption spectrum at a wavelength of 400 nm to 800 nm.
[6] 前記多環式化合物が、下記一般式 (III)または一般式 (IV)で表されるペリレン誘導 体を含む請求項 5に記載の多環式化合物の精製方法。 6. The method for purifying a polycyclic compound according to claim 5, wherein the polycyclic compound contains a perylene derivative represented by the following general formula (III) or general formula (IV).
[化 3]  [Chemical 3]
式(III)及び式(IV)中、 Mは対イオンを表す。 nl〜! ι4は、置換基(0〜4の整数)を 表す。ただし、 nl〜! ι4の全て力 同時に 0でない。  In formula (III) and formula (IV), M represents a counter ion. nl ~! ι4 represents a substituent (an integer of 0 to 4). However, nl ~! All powers of ι4 are not 0 at the same time.
[7] 分離後の多環式化合物中の残存不純物量が、 100mg/g以下である請求項 1〜6 の!/、ずれかに記載の多環式化合物の精製方法。 7. The method for purifying a polycyclic compound according to any one of claims 1 to 6, wherein the amount of residual impurities in the polycyclic compound after separation is 100 mg / g or less.
[8] スルホン化処理をし、 SO M基を有する多環式化合物(ただし、 Mは対イオンを [8] A polycyclic compound having a sulfonation treatment and a SO M group (where M is a counter ion)
3  Three
表す)を合成して合成物を得る工程、  A process for obtaining a composite by
前記合成物を、 so 2 又は so—が溶解し且つ前記多環式化合物が難溶な有機 The compound is an organic compound in which so 2 or so- is dissolved and the polycyclic compound is hardly soluble.
4 3  4 3
溶媒に混合して分散液を得る工程、  Mixing with a solvent to obtain a dispersion,
前記分散液をろ過して SO M基を有する多環式化合物を分離する工程、  Separating the polycyclic compound having a SO M group by filtering the dispersion;
3  Three
を有する多環式化合物の製造方法。  The manufacturing method of the polycyclic compound which has this.
[9] スルホン化処理として、硫酸、発煙硫酸、及び無機スルホン酸から選ばれる少なくと も 1種を用いる請求項 8に記載の多環式化合物の製造方法。 9. The method for producing a polycyclic compound according to claim 8, wherein at least one selected from sulfuric acid, fuming sulfuric acid, and inorganic sulfonic acid is used as the sulfonation treatment.
[10] 前記多環式化合物が、下記一般式 (I)で表されるキノキサリン誘導体を含む請求項 8または 9に記載の多環式化合物の製造方法。 [10] The polycyclic compound comprises a quinoxaline derivative represented by the following general formula (I): A process for producing the polycyclic compound according to 8 or 9.
[化 4]  [Chemical 4]
式 (I)中、 Mは対イオンを表す。 A及び Bは、置換基を表し、 a及び bは、その置換数 (aは 0〜4の整数、 bは、 0〜6の整数)を表す。また、 1及び mは、置換数(1は、 0〜4 の整数、 mは、 0〜6の整数)を表す。ただし、 1及び mは、同時に 0でない。 In formula (I), M represents a counter ion. A and B represent substituents, and a and b represent the number of substitutions (a is an integer from 0 to 4, and b is an integer from 0 to 6). 1 and m represent the number of substitutions (1 is an integer from 0 to 4, and m is an integer from 0 to 6). However, 1 and m are not 0 at the same time.
[11] 前記多環式化合物が、波長 400nm〜800nmに於いて光吸収スペクトルの最大値 を有する請求項 8または 9に記載の多環式化合物の製造方法。  11. The method for producing a polycyclic compound according to claim 8 or 9, wherein the polycyclic compound has a maximum value of a light absorption spectrum at a wavelength of 400 nm to 800 nm.
[12] 前記多環式化合物が、水に可溶である請求項 8〜; 11のいずれかに記載の多環式 化合物の製造方法。  [12] The method for producing a polycyclic compound according to any one of [8] to [11], wherein the polycyclic compound is soluble in water.
[13] 請求項 1〜4のいずれかに記載の精製方法又は請求項 8〜; 10のいずれかに記載 の製造方法により分離された多環式化合物を、水に溶解させることにより得られる液 晶相を示すコーティング液。  [13] A liquid obtained by dissolving, in water, the polycyclic compound separated by the purification method according to any one of claims 1 to 4 or the production method according to any one of claims 8 to; A coating solution showing a crystal phase.
[14] 請求項 5または 6に記載の精製方法又は請求項 11に記載の製造方法により分離さ れた多環式化合物を、水に溶解させることにより得られる液晶相を示すコーティング 液。 [14] A coating solution showing a liquid crystal phase obtained by dissolving a polycyclic compound separated by the purification method according to claim 5 or 6 or the production method according to claim 11 in water.
[15] 液晶相力 ネマチック液晶相である請求項 13または 14に記載のコーティング液。  [15] The coating liquid according to claim 13 or 14, which is a nematic liquid crystal phase.
[16] pHが 4〜; 10に調製されている請求項 13〜; 15に記載のコーティング液。  [16] The coating solution according to claims 13 to 15, wherein the pH is adjusted to 4 to 10;
[17] 請求項 13に記載のコーティング液を基材上に塗工し、乾燥することにより得られる n x≥nz > nyの関係を満足する複屈折性フィルム。  [17] A birefringent film satisfying a relationship of nx≥nz> ny obtained by coating the coating liquid according to claim 13 on a substrate and drying.
[18] 請求項 14に記載のコーティング液を基材上に塗工し、乾燥することにより得られる 偏光フィルム。 [18] A polarizing film obtained by coating the coating liquid according to claim 14 on a substrate and drying the coating liquid.
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Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08511109A (en) * 1993-05-21 1996-11-19 ロシアン テクノロジー グループ Two-color polarizer that is heat stable and light fast
WO2004096805A2 (en) * 2003-04-25 2004-11-11 Nitto Denko Corporation Lyotropic liquid crystal systems based on sulfonated perylenetetracarboxylic acid dibenzimidazoles
WO2005003132A1 (en) * 2003-06-25 2005-01-13 Nitto Denko Corporation Perylenetetracarboxylic acid dibenzimidazole sulfoderivatives containing oxo-groups in the perylene core which form part of a para-quinoid system of bonds, lyotropic liquid crystal systems and anisotropic films containing the same, and methods for making the same
WO2005051926A1 (en) * 2003-11-21 2005-06-09 Nitto Denko Corporation Sulfoderivatives of acenaphtho[1,2-b]quinoxaline, lyotropic liquid crystal and anisotropic film on their base
JP2005352322A (en) * 2004-06-11 2005-12-22 Dainippon Printing Co Ltd Polarizing plate, liquid crystal display element substrate and liquid crystal display element using the polarizing plate
WO2007042788A2 (en) * 2005-10-07 2007-04-19 Crysoptix Limited Acenaphthoquinoxaline sulfonamide derivatives, optical crystal film and method of production thereof

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08511109A (en) * 1993-05-21 1996-11-19 ロシアン テクノロジー グループ Two-color polarizer that is heat stable and light fast
WO2004096805A2 (en) * 2003-04-25 2004-11-11 Nitto Denko Corporation Lyotropic liquid crystal systems based on sulfonated perylenetetracarboxylic acid dibenzimidazoles
WO2005003132A1 (en) * 2003-06-25 2005-01-13 Nitto Denko Corporation Perylenetetracarboxylic acid dibenzimidazole sulfoderivatives containing oxo-groups in the perylene core which form part of a para-quinoid system of bonds, lyotropic liquid crystal systems and anisotropic films containing the same, and methods for making the same
WO2005051926A1 (en) * 2003-11-21 2005-06-09 Nitto Denko Corporation Sulfoderivatives of acenaphtho[1,2-b]quinoxaline, lyotropic liquid crystal and anisotropic film on their base
JP2005352322A (en) * 2004-06-11 2005-12-22 Dainippon Printing Co Ltd Polarizing plate, liquid crystal display element substrate and liquid crystal display element using the polarizing plate
WO2007042788A2 (en) * 2005-10-07 2007-04-19 Crysoptix Limited Acenaphthoquinoxaline sulfonamide derivatives, optical crystal film and method of production thereof

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
SCHNEIDER T. ET AL.: "Oriented Monolayers Prepared from Lyotrophic Chromonic Liquid Crystal", LANGMUIR, vol. 21, no. 6, 2005, pages 2300 - 2307, XP003022563 *

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