WO2008025174A2 - Massenspektrometer - Google Patents
Massenspektrometer Download PDFInfo
- Publication number
- WO2008025174A2 WO2008025174A2 PCT/CH2007/000371 CH2007000371W WO2008025174A2 WO 2008025174 A2 WO2008025174 A2 WO 2008025174A2 CH 2007000371 W CH2007000371 W CH 2007000371W WO 2008025174 A2 WO2008025174 A2 WO 2008025174A2
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- arrangement according
- arrangement
- emitter surface
- reaction zone
- mass spectrometer
- Prior art date
Links
- 238000000605 extraction Methods 0.000 claims abstract description 46
- 150000002500 ions Chemical class 0.000 claims abstract description 43
- 238000006243 chemical reaction Methods 0.000 claims abstract description 32
- 239000002245 particle Substances 0.000 claims abstract description 31
- 230000007935 neutral effect Effects 0.000 claims abstract description 24
- 238000001514 detection method Methods 0.000 claims abstract description 5
- 239000000463 material Substances 0.000 claims description 12
- 229910052751 metal Inorganic materials 0.000 claims description 9
- 239000002184 metal Substances 0.000 claims description 9
- 238000004458 analytical method Methods 0.000 claims description 7
- 239000000203 mixture Substances 0.000 claims description 6
- 238000005530 etching Methods 0.000 claims description 3
- 239000004065 semiconductor Substances 0.000 claims description 3
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 2
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 claims description 2
- 230000005540 biological transmission Effects 0.000 claims description 2
- 229910052799 carbon Inorganic materials 0.000 claims description 2
- 238000003486 chemical etching Methods 0.000 claims description 2
- 229910001092 metal group alloy Inorganic materials 0.000 claims description 2
- 229910052750 molybdenum Inorganic materials 0.000 claims description 2
- 239000011733 molybdenum Substances 0.000 claims description 2
- 238000001020 plasma etching Methods 0.000 claims description 2
- 125000006850 spacer group Chemical group 0.000 claims description 2
- 239000010935 stainless steel Substances 0.000 claims description 2
- 229910052715 tantalum Inorganic materials 0.000 claims description 2
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 claims description 2
- 239000010409 thin film Substances 0.000 claims description 2
- 238000000034 method Methods 0.000 description 9
- 238000005259 measurement Methods 0.000 description 5
- 238000005516 engineering process Methods 0.000 description 4
- 238000000926 separation method Methods 0.000 description 4
- 238000013461 design Methods 0.000 description 3
- 239000007789 gas Substances 0.000 description 3
- 150000002739 metals Chemical class 0.000 description 3
- 238000005229 chemical vapour deposition Methods 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 238000002347 injection Methods 0.000 description 2
- 239000007924 injection Substances 0.000 description 2
- 238000005240 physical vapour deposition Methods 0.000 description 2
- 238000007788 roughening Methods 0.000 description 2
- 230000035945 sensitivity Effects 0.000 description 2
- 238000001228 spectrum Methods 0.000 description 2
- 238000012356 Product development Methods 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 230000003851 biochemical process Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 239000003814 drug Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 239000000284 extract Substances 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 238000011835 investigation Methods 0.000 description 1
- 238000004949 mass spectrometry Methods 0.000 description 1
- 238000000691 measurement method Methods 0.000 description 1
- 238000010327 methods by industry Methods 0.000 description 1
- 238000005457 optimization Methods 0.000 description 1
- 230000035515 penetration Effects 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 239000011343 solid material Substances 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J49/00—Particle spectrometers or separator tubes
- H01J49/02—Details
- H01J49/08—Electron sources, e.g. for generating photo-electrons, secondary electrons or Auger electrons
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J49/00—Particle spectrometers or separator tubes
- H01J49/02—Details
- H01J49/10—Ion sources; Ion guns
- H01J49/14—Ion sources; Ion guns using particle bombardment, e.g. ionisation chambers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J49/00—Particle spectrometers or separator tubes
- H01J49/02—Details
- H01J49/10—Ion sources; Ion guns
- H01J49/14—Ion sources; Ion guns using particle bombardment, e.g. ionisation chambers
- H01J49/147—Ion sources; Ion guns using particle bombardment, e.g. ionisation chambers with electrons, e.g. electron impact ionisation, electron attachment
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J49/00—Particle spectrometers or separator tubes
- H01J49/02—Details
- H01J49/10—Ion sources; Ion guns
- H01J49/16—Ion sources; Ion guns using surface ionisation, e.g. field-, thermionic- or photo-emission
Definitions
- the invention relates to a mass spectrometer arrangement according to the preamble of claim 1.
- Mass spectrometric measurement methods are used today in a variety of ways in the field of process engineering, technology and product development, medicine and scientific research. Typical areas of application here are the leak testing of components in various industrial sectors, the quantitative determination of the composition and purity of process gases (partial pressure determination of gas fractions), complex analyzes of reactions on surfaces, investigation and process tracking in chemical and biochemical processes and processes, analyzes in the Range of vacuum technology, for example of plasma processes such as in the semiconductor industry, etc.
- the mass filter consists of an electrostatic system of 4 rods into which the ions are injected.
- the rod system is a high-frequency alternating electric field whereby the ions perform vibrations of different amplitude and trajectory, which can be detected and separated.
- this system is under known as quadrupole mass spectrometer.
- This mass spectrometer has various advantages, such as high sensitivity, large measuring range, high repetition rate, small dimensions, any installation position, direct compatibility in important vacuum technology applications and good usability.
- the ion sources of these known mass spectrometers usually use a thermionic cathode which contains a heated filament, ie a hot cathode, for producing electrons which ionize the neutral particles upon bombardment.
- a thermionic cathode which contains a heated filament, ie a hot cathode, for producing electrons which ionize the neutral particles upon bombardment.
- the quality, for example of the quadrupole spectrometer, is already very good in concept.
- the thermionic cathodes used have various disadvantages, which then also have an overall negative effect on the mass spectrometer.
- One problem is that material from the filament is always evaporated away from a hot cathode and as a result unwanted particles are superimposed on the particles to be measured, which increases the so-called signal noise and thus adversely affects the measurement accuracy or falsifies the measurement signal.
- Another problem is that chemical reactions take place on or near the hot filament with the particles to be measured, which falsifies the measurement and can also reduce the resolution.
- the emission of light, ie of photons that can interact, is disadvantageous in this case.
- the hot arrangement leads to increased temperature fluctuations, which causes an increased drift behavior and a poorer reproducibility of the measurement result.
- a filament is also susceptible to vibrations, which can lead to unwanted signal fluctuations (microphonic) or even breakage in the event of severe vibrations.
- the object of the present invention is to eliminate or reduce the disadvantages of the prior art.
- the object is to provide a mass spectrometer arrangement, which makes it possible to produce an undisturbed spectrum of the gas to be measured with a better signal / noise ratio, which allows a higher resolution and sensitivity and this in particular for quadrupole mass spectrometer arrangements.
- the mass spectrometer arrangement should be economical to produce.
- the mass spectrometer assembly includes a cathode assembly for emitting electrons, a reaction zone connected to a neutral particle feed inlet, which is operatively connected to the cathode assembly for ionizing neutral particles, an ion extraction assembly which communicates with the cathode Is arranged effective range of the reaction zone, means for guiding ions to a Detektionsssy- system within the mass spectrometer arrangement and means for evacuating the mass spectrometer arrangement.
- the cathode arrangement contains a field emission cathode with an emitter surface, wherein an extraction grating is arranged at a small distance to this emitter surface for the extraction of electrons which substantially covers the emitter surface.
- the emitter surface encloses at least partially a cavity, so that a tubular structure is formed.
- FIG. 2 shows in section along the longitudinal axis a further, preferred, mass spectrometer arrangement according to the invention with axial feeding of the neutral particles into the ion source;
- FIG. 3 shows a section along the longitudinal axis of the mass spectrometer arrangement according to the invention according to FIG. 2, a more detailed illustration of the cathode arrangement
- FIG. 4 shows a section along the longitudinal axis of a further, preferred, mass spectrometer arrangement according to the invention with orthogonally arranged cathode arrangement for radially feeding the electrons into the ion source;
- FIG. 5 shows, in section along the longitudinal axis, a further, preferred, mass spectrometer arrangement according to the invention with a cathode arrangement arranged coaxially with the ion source for radially feeding the electrons into the ion source.
- a mass spectrometer arrangement essentially comprises an ion source 6, 4, 5, an ion optics 4, 1, 10, 11 for extracting and guiding the ions 22, and an analysis system 12, as shown in longitudinal section in FIG. 1 at the preferred example of a quadrupole mass spectrometer with staff system 12 as an analysis system.
- the ion source contains a cathode arrangement 6 which contains an emitter surface 7 as a field emitter, which is designed as a planar field emission cathode, and briefly spaced apart from this surface 7, an extraction grid 9 is arranged, which is placed with a voltage source 24 to a voltage VQ with respect to the emitter surface 7, for the formation and extraction of electrons 21, as shown in detail in Figure 3.
- the extraction voltage V G at the extraction grid 9 is set to a positive value in the range between 70V to 2000V for the extraction of the electrons 21. Particularly favorable for the overall dimensioning is in this case a voltage in the range of 70V to 200V.
- the extraction grid 9 can be produced from a metal sheet with openings, an etched structure with openings or, preferably, a wire mesh with the largest possible transmission factor for the electrons.
- the extraction grid 9 should be arranged as uniformly as possible above the emitter surface 7.
- insulating etched support members may be provided, but preferably insulating spacer elements 8, which are arranged distributed on the surface in order to maintain the desired predetermined distances stable.
- the distance between the extraction grid 9 and the emitter surface 7 should be set to a value in the range of 1.0 ⁇ m and 2.0 mm, advantageously to a value in the range of 5.0 ⁇ m and 200 ⁇ m, which simplifies the structure.
- the selected value is advantageously set to be substantially equal over the entire emitter surface.
- the emitter surface 7 is formed as a curved surface and encloses at least partially a cavity 13 such that a tubular structure is formed. It can also be divided into sector elements, so have interruptions. It can then be subdivided only as emitter surface 7 as a layer itself and the carrier or the carrier can be divided. However, a substantially non-subdivided surface is preferred, which is self-contained and, as a result, the cavity 13 is also closed at least on the wall of the tubular structure.
- the tubular structure is advantageously designed substantially cylindrical. This simplifies the design and enables better signal optimization.
- the extent of the emitter surface 7 should be in the range of 0.5 cm 2 to 80 cm 2 , with the range of 1.0 cm 2 to 50 cm 2 being preferred.
- the diameter of the cavity 13 formed is in the range between 0.5 cm and 8.0 cm, preferably in the range of 0.5 cm to 6.0 cm.
- the length of the cavity 13 in the axial direction is in the range between 2.0 to 8.0 cm.
- the emitter surface 7 is made of an emitter material or is made as a coating of this material, said material containing at least one of carbon, a metal or a metal mixture, a semiconductor, a carbide or mixtures of these materials. Preference is given in this case to metals, in particular molybdenum and / or tantalum. Particularly preferred are corrosion resistant steels. It is also possible to use mixtures of these metals.
- vacuum methods such as Chemical Vapor Deposition (CVD) and Physical Vapor Deposition (PVD) are preferred.
- a particularly advantageous embodiment of the emitter surface 7 is that it consists of the material of the wall 2 of the support itself and covers at least part of the surface of the housing wall 2 thus formed, but preferably lends the entire surface of the wall 2, the cavity 13 encloses occupies.
- the housing wall 2 in this case consists of one of the aforementioned metals themselves or a metal alloy, preferably of a corrosion-resistant steel.
- the wall 2 could also be covered with a kind of sleeve of the emitting material. If the housing wall 2 and the emitter surface 7 are made of the same material, the arrangement can be realized simpler and better.
- the housing wall can then also be formed directly as a vacuum housing, whereby a further simplification is achieved.
- the housing wall 2 and thus the emitter surface 7 is electrically connected to ground potential, as shown in Figure 3.
- the electron emitter or the emitter surface 7 is thus formed as a kind of tube wall emitter.
- the surfaces of the abovementioned coating or the surface of the solid material of the housing wall 2 must be roughened in such a way that a suitable emitter surface 7 is formed which then has field emission properties such that it is capable of producing enough electrons 21 at the low grating extraction voltage VQ to emit.
- the roughening can be done mechanically, preferably by etching, such as plasma etching or, preferably, by chemical etching.
- a multiplicity of irregularly distributed elevations are produced in the simplest way, which are sharp-edged and / or pointed, with dimensions in the nanometer range, whereby field emission of electrons is possible even at low field strengths.
- Such elevations have heights in relation to the mean base area within a range of 10 nm to 1000 nm, preferably within 10 nm to 100 nm.
- Known field emitters, such as spinner microtips are structured, for example, as an array-shaped uniformly distributed tip assembly. This is done by multiple, complicated removal and application of material. This requires complex multistage structuring processes. Also, such processes can not occur on any surfaces, such as on inner surfaces of small tubular parts. In contrast, in the present invention, the present surface is simply roughened.
- the roughening takes place here exclusively with a single structuring step, so that the desired sharp-edged or tip-like elements are formed which enable the desired field emission.
- this occurs, for example, by a grinding process.
- this is due to the inherent grain structure of the base material.
- the emitting peaks are thus stochastically distributed.
- the reaction zone 3 is thus connected to an inlet opening 14 for the supply of neutral particles 20.
- an electron extraction lens 5 which extracts the electrons 21 in the axial direction of the mass spectrometer from this cavity 13 and leads to a reaction zone 3, where by electron impact the neutral particles 21 be ionized.
- Opposite lying to the electron extraction lens 5 is spaced apart in the axial direction, the ion extraction lens 4 is arranged. These two lenses 4, 5 enclose the reaction space 3.
- the two extraction lenses can be at the same electrical potential, they thus form together with a surrounding the reaction zone 3 wall a kind of housing in the wall openings 14 are provided for the passage of neutral particles to be measured 20.
- the ion extraction lens 4 contains a Lens opening in which a field penetration effected by the downstream electro-optical elements, whereby the ions are extracted from the ionticiansbe- range of the reaction zone 3 in the axial direction.
- the neutral particles 20 are let into the reaction space 3 radially to the axis, laterally to the reaction space 3 through the inlet opening 14.
- the extracted ions 22 are guided through the ion optics 4, 1 onto a focusing arrangement 10, 11 and thereafter into the analysis system 12.
- the ion optics contains an extraction lens 4 and a further lens 1, here as a ground plane to ground potential and the retarded focusing arrangement comprises a focusing lens 10 and an injection aperture 11, as well as the detection system as a 4-fold rod arrangement.
- FIG. 1 shows an arrangement with a reaction space 3 separated from the cavity 13 of the cathode arrangement 6 and lateral feeding of the neutral particles 20.
- the whole arrangement is designed such that it can be evacuated for operation, whether it can be provided by flanged to pumped vacuum systems and / or with their own pumps.
- FIG. 2 A further preferred embodiment of the invention is shown in Figure 2 and in detail in Figure 3.
- the figures also show schematically the preferred embodiment of on a quadrupole mass spectrometer arrangement.
- the emitter surface 7 of the field emitter is arranged on the tube wall such that the reaction zone 3 is located within the cavity 13 and there the ionization takes place.
- the ionization space is thus located within the electron source or the cathode arrangement 6.
- a substantially simplified structural design results, since no separate ionization space is required. Nevertheless, the necessary potential conditions are substantially met, since the extraction grid 9 with respect to the emitter surface 7 and the wall 2, positive potential V G and this is advantageously placed on ground potential M.
- the emitter surface 7 thus forms together with the grid 9, the electron source.
- the voltage VG at the extraction grid 9 has a value in the range of 70V to 2000V, depending on which material for the emitter surface 7 and which distance of the extraction grid 9 from the emitter surface 7 is selected. Values in the range of 70V to 200V are particularly suitable because in the present embodiment of the cathode assembly, enough electrons 21 can still be generated, thereby allowing further simplification of the system.
- the ion extraction lens 4 is arranged on the end face to the cavity 13 or to the reaction zone 3 and consists in the simplest case of a pinhole.
- the ions are extracted in the axial direction from the cavity 13 and moved in the direction of the detection system 12 and thus the mass filter arrangement for the ion detection within the mass spectrometer.
- a slightly positive voltage Vi is also possible if it is significantly smaller than V G.
- the neutral particles 20 to be examined are introduced via an inlet opening 14 into the cavity 13 of the tubular cathode arrangement.
- This inlet opening is arranged frontally to the tubular cavity 13, opposite to the ion extraction lens 4.
- the tubular cathode arrangement 6 with the ion extraction lens 4 is advantageously aligned axially, ie in line with the longitudinal axis of the quadrupole mass spectrometer arrangement.
- the direction of movement 25 The extracted ions 22 here lead along the longitudinal axis in the direction of the analysis system 12.
- FIG. 3 shows in detail a preferred arrangement with a blechar-type ion extraction lens 4, which has a hole as a lens opening for extracting the ions in the center and which is not sealingly connected to the wall 2 vacuum.
- the remaining part of the mass spectrometer arrangement is evacuated here by the electron or ion source, which also simplifies the construction in terms of vacuum technology.
- FIG. 4 A further preferred arrangement according to the invention is shown in Figure 4 in section along the longitudinal axis.
- the cathode assembly 6 is arranged orthogonal to the longitudinal axis of the mass spectrometer, that is laterally to the ion source which also, as shown in Figure 3, as a kind of closed chamber 5, wherein the lateral chamber wall has an opening to the cathode assembly 6 and thus the electron extraction lens 5 forms.
- the electron extraction lens 5 itself is, as mentioned, chamber-like here, thereby enclosing the reaction zone 3 for the ionization of the neutral particles 20.
- one or more openings 14 are provided in the wall of this chamber for introduction of the neutral particles 20 to be analyzed this chamber 3 in turn with an ion extraction lens 4 for extraction of the ions formed in the analysis system of the mass spectrometer.
- FIG 5 a further preferred embodiment is shown, in which the tube-shaped cathode assembly 6 is coaxial with the longitudinal axis of the mass spectrometer and the chamber-like electron extraction lens 5, as previously described for Figure 4, is arranged.
- the cathode arrangement 6 encloses the chamber with the reaction zone 3, at least partially, whereby it is possible to attach an opening or preferably two or more extraction openings for the electrons 21 to the periphery of the wall of the chamber, ie the extraction lens 5 .
- the neutral particles 20 are also introduced, as shown in the arrangement of Figure 4, through at least one opening 14 in the chamber wall.
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- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Other Investigation Or Analysis Of Materials By Electrical Means (AREA)
- Electron Tubes For Measurement (AREA)
Abstract
Description
Claims
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB0902542A GB2453702B (en) | 2006-08-29 | 2007-07-27 | Mass spectrometer |
JP2009525884A JP5044835B2 (ja) | 2006-08-29 | 2007-07-27 | 質量分析計 |
DE112007001837.2T DE112007001837B4 (de) | 2006-08-29 | 2007-07-27 | Massenspektrometer |
US12/376,542 US8071941B2 (en) | 2006-08-29 | 2007-07-27 | Mass spectrometer |
US13/205,925 US8410433B2 (en) | 2006-08-29 | 2011-08-09 | Mass spectrometer |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CH1380/06 | 2006-08-29 | ||
CH01380/06A CH698896B1 (de) | 2006-08-29 | 2006-08-29 | Massenspektrometer. |
Related Child Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US12/376,542 A-371-Of-International US8071941B2 (en) | 2006-08-29 | 2007-07-27 | Mass spectrometer |
US13/205,925 Continuation US8410433B2 (en) | 2006-08-29 | 2011-08-09 | Mass spectrometer |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2008025174A2 true WO2008025174A2 (de) | 2008-03-06 |
WO2008025174A3 WO2008025174A3 (de) | 2008-09-18 |
Family
ID=37136894
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/CH2007/000371 WO2008025174A2 (de) | 2006-08-29 | 2007-07-27 | Massenspektrometer |
Country Status (6)
Country | Link |
---|---|
US (2) | US8071941B2 (de) |
JP (1) | JP5044835B2 (de) |
CH (1) | CH698896B1 (de) |
DE (1) | DE112007001837B4 (de) |
GB (1) | GB2453702B (de) |
WO (1) | WO2008025174A2 (de) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CH698896B1 (de) | 2006-08-29 | 2009-11-30 | Inficon Gmbh | Massenspektrometer. |
WO2010131008A1 (en) * | 2009-05-13 | 2010-11-18 | Micromass Uk Limited | Surface coating on ion source |
US8476587B2 (en) | 2009-05-13 | 2013-07-02 | Micromass Uk Limited | Ion source with surface coating |
WO2013098607A1 (en) * | 2011-12-28 | 2013-07-04 | Dh Technologies Development Pte. Ltd. | Dynamic multipole kingdon ion trap |
US10014166B2 (en) * | 2013-05-30 | 2018-07-03 | Dh Technologies Development Pte. Ltd. | Inline ion reaction device cell and method of operation |
WO2015189548A1 (en) | 2014-06-12 | 2015-12-17 | Micromass Uk Limited | Secondary electrospray ionization at reduced pressure |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE2810736A1 (de) * | 1978-03-13 | 1979-09-27 | Max Planck Gesellschaft | Feldemissionskathode sowie herstellungsverfahren und verwendung hierfuer |
DE4002049A1 (de) * | 1990-01-24 | 1991-07-25 | Deutsche Forsch Luft Raumfahrt | Elektronenemissionsquelle |
GB2384908A (en) * | 2002-02-05 | 2003-08-06 | Microsaic Systems Ltd | Miniature mass spectrometer |
US20040032194A1 (en) * | 2002-08-09 | 2004-02-19 | Matsushita Electric Industrial Co., Ltd. | Field-emission electron source element and image display apparatus |
Family Cites Families (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0106497B1 (de) * | 1982-09-10 | 1988-06-01 | Nippon Telegraph And Telephone Corporation | Ionenflutgerät |
JPS6020442A (ja) * | 1983-07-13 | 1985-02-01 | Fumio Watanabe | 質量分析計用熱陰極電子衝撃型イオン源 |
US4988869A (en) * | 1989-08-21 | 1991-01-29 | The Regents Of The University Of California | Method and apparatus for electron-induced dissociation of molecular species |
FR2792770A1 (fr) * | 1999-04-22 | 2000-10-27 | Cit Alcatel | Fonctionnement a haute pression d'une cathode froide a emission de champ |
US6429596B1 (en) * | 1999-12-31 | 2002-08-06 | Extreme Devices, Inc. | Segmented gate drive for dynamic beam shape correction in field emission cathodes |
US6700329B2 (en) * | 2001-04-10 | 2004-03-02 | California Institute Of Technology | Method and apparatus for providing flow-stabilized microdischarges in metal capillaries |
US6765215B2 (en) * | 2001-06-28 | 2004-07-20 | Agilent Technologies, Inc. | Super alloy ionization chamber for reactive samples |
JP2003242876A (ja) * | 2002-02-15 | 2003-08-29 | Sharp Corp | 電子放出用陰極部とそれを含む蛍光表示装置 |
US20080267354A1 (en) * | 2003-05-22 | 2008-10-30 | Comet Holding Ag. | High-Dose X-Ray Tube |
US6885010B1 (en) * | 2003-11-12 | 2005-04-26 | Thermo Electron Corporation | Carbon nanotube electron ionization sources |
US7259381B2 (en) * | 2004-08-03 | 2007-08-21 | Applied Materials, Inc. | Methodology for determining electron beam penetration depth |
EP1698878A1 (de) | 2005-03-04 | 2006-09-06 | Inficon GmbH | Elektrodenanordnung und Druckmessvorrichtung |
CH698896B1 (de) * | 2006-08-29 | 2009-11-30 | Inficon Gmbh | Massenspektrometer. |
-
2006
- 2006-08-29 CH CH01380/06A patent/CH698896B1/de not_active IP Right Cessation
-
2007
- 2007-07-27 DE DE112007001837.2T patent/DE112007001837B4/de active Active
- 2007-07-27 WO PCT/CH2007/000371 patent/WO2008025174A2/de active Application Filing
- 2007-07-27 JP JP2009525884A patent/JP5044835B2/ja active Active
- 2007-07-27 US US12/376,542 patent/US8071941B2/en active Active
- 2007-07-27 GB GB0902542A patent/GB2453702B/en active Active
-
2011
- 2011-08-09 US US13/205,925 patent/US8410433B2/en active Active
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE2810736A1 (de) * | 1978-03-13 | 1979-09-27 | Max Planck Gesellschaft | Feldemissionskathode sowie herstellungsverfahren und verwendung hierfuer |
DE4002049A1 (de) * | 1990-01-24 | 1991-07-25 | Deutsche Forsch Luft Raumfahrt | Elektronenemissionsquelle |
GB2384908A (en) * | 2002-02-05 | 2003-08-06 | Microsaic Systems Ltd | Miniature mass spectrometer |
US20040032194A1 (en) * | 2002-08-09 | 2004-02-19 | Matsushita Electric Industrial Co., Ltd. | Field-emission electron source element and image display apparatus |
Also Published As
Publication number | Publication date |
---|---|
US20110291005A1 (en) | 2011-12-01 |
US20100176293A1 (en) | 2010-07-15 |
US8410433B2 (en) | 2013-04-02 |
GB0902542D0 (en) | 2009-04-01 |
GB2453702A (en) | 2009-04-15 |
JP5044835B2 (ja) | 2012-10-10 |
DE112007001837B4 (de) | 2018-02-22 |
WO2008025174A3 (de) | 2008-09-18 |
DE112007001837A5 (de) | 2009-08-06 |
JP2010501986A (ja) | 2010-01-21 |
CH698896B1 (de) | 2009-11-30 |
US8071941B2 (en) | 2011-12-06 |
GB2453702B (en) | 2011-06-22 |
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