WO2008023711A1 - Integrated gas panel apparatus - Google Patents
Integrated gas panel apparatus Download PDFInfo
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- WO2008023711A1 WO2008023711A1 PCT/JP2007/066211 JP2007066211W WO2008023711A1 WO 2008023711 A1 WO2008023711 A1 WO 2008023711A1 JP 2007066211 W JP2007066211 W JP 2007066211W WO 2008023711 A1 WO2008023711 A1 WO 2008023711A1
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- WIPO (PCT)
- Prior art keywords
- flow path
- branch
- gas
- channel
- main
- Prior art date
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Classifications
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
- F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
- F16K27/00—Construction of housing; Use of materials therefor
- F16K27/003—Housing formed from a plurality of the same valve elements
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F15—FLUID-PRESSURE ACTUATORS; HYDRAULICS OR PNEUMATICS IN GENERAL
- F15B—SYSTEMS ACTING BY MEANS OF FLUIDS IN GENERAL; FLUID-PRESSURE ACTUATORS, e.g. SERVOMOTORS; DETAILS OF FLUID-PRESSURE SYSTEMS, NOT OTHERWISE PROVIDED FOR
- F15B13/00—Details of servomotor systems ; Valves for servomotor systems
- F15B13/02—Fluid distribution or supply devices characterised by their adaptation to the control of servomotors
- F15B13/06—Fluid distribution or supply devices characterised by their adaptation to the control of servomotors for use with two or more servomotors
- F15B13/08—Assemblies of units, each for the control of a single servomotor only
- F15B13/0803—Modular units
- F15B13/0821—Attachment or sealing of modular units to each other
- F15B13/0825—Attachment or sealing of modular units to each other the modular elements being mounted on a common member, e.g. on a rail
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
- F17D—PIPE-LINE SYSTEMS; PIPE-LINES
- F17D1/00—Pipe-line systems
- F17D1/02—Pipe-line systems for gases or vapours
- F17D1/04—Pipe-line systems for gases or vapours for distribution of gas
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67155—Apparatus for manufacturing or treating in a plurality of work-stations
- H01L21/6719—Apparatus for manufacturing or treating in a plurality of work-stations characterized by the construction of the processing chambers, e.g. modular processing chambers
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T137/00—Fluid handling
- Y10T137/5109—Convertible
- Y10T137/5283—Units interchangeable between alternate locations
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T137/00—Fluid handling
- Y10T137/8593—Systems
- Y10T137/877—With flow control means for branched passages
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T137/00—Fluid handling
- Y10T137/8593—Systems
- Y10T137/877—With flow control means for branched passages
- Y10T137/87885—Sectional block structure
Definitions
- the present invention relates to an integrated gas panel device used in a semiconductor manufacturing process or the like.
- An integrated gas panel device is a device for finally mixing a plurality of types of gases used in semiconductor device manufacturing or the like while controlling their flow rates, and supplying them to a film formation chamber. It was developed to reduce the gas supply control line configured with the previous piping structure.
- a gas control device such as a valve or a mass flow controller can be attached to a panel body having a substantially face plate shape.
- Patent Document 1 JP-A-10-169881
- branch flow paths are arranged in parallel on one side of the main flow path, and the junction part of each branch flow path and the main flow path is the main flow in the order of the branch flow paths. They are arranged at almost equal intervals from the upstream to the downstream of the road.
- branch flow paths are arranged in parallel on one side of the main flow path, and the confluence portion of each branch flow path and the main flow path is the arrangement of the branch flow paths. Since the pipes are arranged at almost equal intervals in order from the upstream to the downstream of the main flow path, the final flow of the gas in each branch flow path is the one that merges upstream and the downstream of the main flow path. There is a problem that the time to reach the exit is different. In this case, the arrival time of the gas from the branch channel located at the most upstream side becomes long, and this gas arrival time determines the response of the fluid circuit system.
- the present invention has been made in order to solve the problem of force and trouble, and can obtain a remarkably excellent response and can stabilize the gas concentration. Moreover, the conventional panel type shape can be obtained. Its main purpose is to provide an integrated gas panel device that can be maintained as it is, without complicating or enlarging the structure or even being made compact.
- the integrated gas panel device according to the invention of claim 1 is provided with a plurality of branches configured to control a gas flowing therein by providing a gas control device such as a valve or a mass flow controller in the middle.
- a branch channel block body that forms the branch channel.
- the branch channel force that has been disposed only on one side of the main channel in the related art is disposed on the left and right of the main channel, so that the length of the main channel can be shortened.
- the arrival time of the gas to the final outlet can be shortened, and the responsiveness can be improved.
- This also contributes to stabilization of the gas concentration.
- the block bodies forming the respective flow paths can be arranged in a plane to form a panel body similar to the conventional one, it is possible to easily replace the conventional apparatus.
- each joining portion of the one branch flow path and the other branch flow path facing each other across the main flow path with respect to the main flow path is in the extending direction of the main flow path. And what is set in almost the same place.
- the almost same place in the extending direction of the main flow path means that the merged portion is completely matched, and includes the pipe side wall portions facing each other and the orthogonal pipe side wall portions of the main flow path.
- the main channel block body is formed with an insertion hole communicating with the main channel inside thereof, and the outlet portion of the branch channel
- the branch channel block body having a portion inside is provided with a projecting pipe that projects the branch channel outward, and the projecting pipe is inserted into the insertion hole so that the main channel block body is provided.
- the tip of the protruding pipe is configured to protrude further inward from the inner surface of the main channel.
- the integrated gas panel device is configured such that a gas control device such as a valve or a mass flow controller is provided on the way to control the gas flowing inside.
- a gas control device such as a valve or a mass flow controller is provided on the way to control the gas flowing inside.
- the main channel block body having the main channel therein is formed with a penetration hole communicating with the main channel therein, and the branch channel
- a branch pipe having a branch flow passage projecting outward is provided in a branch flow path block body having an outlet portion of the main pipe, and the projecting pipe is inserted into the insertion hole so as to be used for the main flow path.
- a block body and a branch channel block body were assembled. In state, the tip of the protruding pipe characterized that you have configured to protrude further inward from the inner surface of the main
- the protruding pipe that is the outlet of the branch flow channel protrudes into the main flow channel, and the diameter of the flow channel is narrowed.
- the gas in the branch channel is strongly drawn into the main channel by the choke effect, and the gas is diffused by the turbulent flow generated behind the protruding pipe. Mixing with the gas in the branch channel is greatly promoted.
- the gas mixing in the gas panel device can be sufficiently performed, and the pipe length and the gas mixer capacity to be arranged in the subsequent stage can be reduced.
- By omitting or omitting it becomes possible to make the speed response much superior to the conventional one.
- this makes it possible to improve gas concentration stability at the time of start-up.
- the gas in the branch channel is a small flow rate, it is reliably drawn into the main channel. That is, the ability to perform S, and the fluctuation of the flow rate at the time of the merging of the small flow rate gas occurs, and from this point, the gas concentration stability can be improved.
- the end of the protruding pipe is configured to protrude to the vicinity of the center of the main flow path when viewed in cross section.
- the three-dimensionally integrated gas panel device is provided with a plurality of gas control devices such as valves and mass flow controllers, which are arranged in the middle to control the gas flowing inside.
- Gas control devices such as valves and mass flow controllers, which are arranged in the middle to control the gas flowing inside.
- Branch flow channel one main flow channel into which gas flows from these branch flow channels and merges, and a branch flow that forms a long panel with one branch flow channel formed inside and the bottom surface as the mounting surface
- the branch channel block bodies that have been developed in a flat shape in the past are arranged three-dimensionally, so the channel length can be reduced, the channel length can be reduced, and responsiveness can be improved.
- the ability to let S because of the three-dimensional configuration, the degree of freedom of arrangement of each flow path is increased, and by improving the flow path length and merging site, it is possible to improve the simultaneity of the gas merging timing and consequently the gas concentration stability. be able to.
- the merging portion is set at one position of the main flow path.
- the main flow path length can be shortened if the confluence part is set, for example, at the end of the central block body, so that the response can be improved as much as possible.
- each holding surface forms a rotationally symmetric shape about the axis of the central block body, and the merging portion It is preferable that the intermediate flow paths are provided on the axis and are set to have the same length.
- the diameter of the intermediate flow path and the flow path diameter in the branch flow path are varied according to the gas flow rate (the smaller the gas flow rate, the smaller the diameter). Just make it smaller).
- the center block body is preferably a regular polygonal column!
- the length of the pipe to be arranged in the subsequent stage and the gas mixer By reducing or omitting the capacity, it is possible to improve the high-speed response as compared with the conventional one, and also improve the gas concentration stability at the time of start-up. Furthermore, it is basically possible to construct a protruding pipe of a predetermined length from the branch channel block body, so that there is little structural complexity, and in the assembled state, this protruding pipe is inside. Since it is hidden, it can be maintained substantially the same as the conventional one.
- the branch channel block bodies are three-dimensionally arranged, so that compactness and improvement in design freedom can be achieved. As a result, Responsiveness and gas concentration stability can be improved.
- FIG. 1 is an overall perspective view of an integrated gas panel device according to a first embodiment of the present invention. It is.
- FIG. 2 is a fluid circuit diagram of the integrated gas panel device in the same embodiment.
- FIG. 3 is a schematic view showing a connection portion in the same embodiment as seen from a plane direction.
- FIG. 4 is a schematic view showing a connecting portion of an integrated gas panel device according to a modification of the embodiment, as viewed from the plane direction.
- Fig. 5 is a longitudinal sectional view of an essential part showing a main flow path of the integrated gas panel device in the same modification.
- FIG. 6 is an overall perspective view of an integrated gas panel device according to a second embodiment of the present invention.
- FIG. 7 is a fluid circuit diagram of the integrated gas panel device in the same embodiment.
- FIG. 8 is a partial cross-sectional view of the main part of the integrated gas panel device in the same embodiment.
- FIG. 9 is an exploded perspective view showing a connection portion in the same embodiment.
- FIG. 10 is a fragmentary sectional view of an essential part of the integrated gas panel device in the same embodiment.
- FIG. 11 is an overall perspective view showing the interior of a three-dimensionally integrated gas panel device according to a third embodiment of the present invention with a part broken away.
- FIG. 12 is a fluid circuit diagram of the three-dimensionally integrated gas panel device in the same embodiment.
- FIG. 13 is a schematic lateral end view showing a merging site in the same embodiment.
- FIG. 14 is a schematic cross-sectional view of a central block body in a modified example of the same embodiment.
- An integrated gas panel device 1 constitutes a part of a semiconductor manufacturing system. As shown in FIG. 1, an outline of various gas for film formation is supplied from a gas supply source (not shown). Each is introduced, mixed and used to supply a semiconductor film forming chamber (not shown).
- the integrated gas panel device 1 will be described first with reference to FIG. 2, including the fluid circuit structure, including the peripheral circuit.
- the integrated gas panel device 1 is provided with a plurality of branch channels R1 arranged in parallel in terms of a circuit, and one main channel R2 to which the outlets of the branch channels R1 are connected.
- Each branch channel R1 is connected to an inlet port PI at the base end thereof, and the gas supply is performed via an external pipe (not shown! /) Connected to the inlet port PI. From the source, several types of gases are fed into each branch channel R1.
- a gas control device such as a valve V or a mass flow controller MFC is arranged in the middle of each branch flow path R1, and the operation of these controls the flow rate of gas flowing through each branch flow path R1 and switching to the purge gas. Let's do it like a wholesale.
- the main flow path R2 has a single flow path structure as described above, and the connection portion CN with each branch flow path R1 described above is not concentrated at one place, but along the flow. It is provided to fly away.
- a gas mixer MIX that stirs and mixes the combined gas is disposed downstream of the integrated gas panel device 1, that is, downstream of the main flow path R2, and further downstream of the gas mixer.
- a flow rate controller FRC that distributes the gas mixed by MIX to a predetermined flow rate ratio and outputs it to each film forming chamber from the outlet port PO is provided.
- the gas supplied from each gas supply source is introduced into the main flow path R2 with the flow rate controlled in the branch flow path R1 of the integrated gas panel device 1, and then mixed with the gas.
- MIX is thoroughly mixed by the mixer MIX and output from each outlet port PO at a predetermined flow rate ratio from the flow rate controller FRC.
- FIG. 2 also shows the purge gas flow path, the inlet port PX, the outlet port PY, and the like.
- the member indicated by the symbol MFM Is a verifier to check whether the flow rate indicated by the mass flow controller is correct.
- the gas panel device 1 includes a panel body 2 having a substantially plate shape in which the main flow path R2 and the branch flow path R1 are formed, and the gas control device V attached to the panel body 2. It is equipped with MFC and additional piping equipment such as inlet port PI.
- the panel body 2 has a face plate shape configured by connecting a plurality of block bodies in a plane. Various forces are used as this block body.
- the branch channel block body 31 constituting the branch channel R1 and the main channel block body 32 constituting the main channel R2 are used.
- the branch channel block body 31 has a flat rectangular flat plate shape, and there are some types having different internal pipes, such as those for mounting valves and those for mounting mass flow controllers.
- One branch channel R1 is a force formed by connecting a plurality of such branch channel block bodies 31 in series to form a long plate shape.
- a plurality of branch flow paths R1 are arranged in parallel by arranging the rows of bodies 31 (hereinafter also referred to as branch flow block block rows 5) side by side to form a face plate.
- the main channel block body 32 has, for example, a single long plate shape, and the main channel R2 extends along the longitudinal direction (stretching direction) thereof. And it is laminated
- branch flow block bodies 5 are arranged symmetrically about the main flow path block 32 as a center.
- branch flow path R1 is symmetrically arranged on both the left and right sides of the main flow path R2 with the force S shown in FIG. 3 as a schematic diagram viewed from the plane direction.
- each connecting portion (hereinafter also referred to as a merged portion) CN of the one branch channel R1 and the other branch channel R1 facing each other across the main channel R2 with respect to the main channel R2 is the main stream.
- Road R2 stretch It is set at the same position in the direction and on opposite sides of the main channel R2.
- one of the connection portions CN may be a bottom portion of the main flow path and the other may be a side portion or the like for convenience of design such as arrangement of parts as long as they are at the same position in the extending direction of the main flow path R2.
- the branch flow channel R1 that has been conventionally disposed only on one side of the main flow channel is disposed on the left and right of the main flow channel R2.
- the length of the region where each merging portion CN is provided in the main channel R 2 can be reduced to about half of the conventional length.
- the block body is arranged in a plane to form a panel body 2 similar to the conventional one and the planar shape is maintained, for example, it can be easily replaced with an existing apparatus.
- the left and right branch channels R1 may be connected in a staggered manner to the main channel R2.
- each merging portion CN force with respect to the main channel between one branch channel and the other branch channel facing each other is a different place in the extending direction of the main channel R2, compared with the case of the above embodiment.
- the length of the main flow path R2 becomes slightly longer.
- the branch channel is arranged only on one side of the main channel, the length of the main channel R2 can be remarkably shortened, and almost the same effect as the previous embodiment is expected. it can.
- the outlet pipe 311 of the branch flow path R1 when projected into the main flow path R2 by a predetermined length at the junction site CN, the outlet pipe 311 Can be configured without any difficulty in causing the two to interfere with each other.
- an insertion hole 321 is opened on the surface of the main channel block body 32, and the insertion hole 321 is communicated with the internal main channel R2, while the branch channel Branch block 31 having the outlet portion of the branch channel R1
- the body 31 (1) is provided with a cylindrical outlet pipe (hereinafter also referred to as a protruding pipe) 311 with the branch flow path Rl protruding from the surface (which may be a separate body! /). /!
- the tip of the protruding pipe 311 is The main channel R2 is configured to protrude further inward from the inner side surface R2a (shown in FIG. 5).
- the projecting dimension is, for example, about the tip force of the projecting pipe 311 and the vicinity of the center of the main flow path R2 in the cross section.
- the main channel block body 32 and the branch channel block body 31 are also provided.
- a seal member 6 such as an O-ring is interposed between the opposing planes of (1) to make a close contact in the thrust direction, preventing gas leakage at this connection CN.
- the protruding pipe 311 that is the outlet of the branch flow path R1 protrudes into the main flow path R2 to narrow the diameter of the flow path.
- the gas flow rate in the main flow path R2 in this portion increases and the pressure decreases, so that the gas in the branch flow path R1 can be strongly drawn into the main flow path R2.
- the drawn gas is diffused by turbulent flow or the like generated behind the protruding pipe 311 in the main flow path R2, so that the force S can be more uniformly mixed with the gas flowing through the main flow path R2.
- the gas can be sufficiently mixed in the panel body 2 in advance.
- the pipe length after the connection portion which has been set long in order to sufficiently mix the gas in the past, can be shortened, and the capacity of the gas mixer MIX can be reduced. In some cases, this can be omitted.
- the responsiveness of the fluid circuit system can be further improved as much as the flow path capacity is reduced in this way.
- the length at the branch flow path merging point of the main flow path R2 and the subsequent flow path length can be shortened at the same time, thereby improving the responsiveness. Based on this, it will be possible to dramatically improve the gas concentration stability at the time of start-up.
- the branch channel block body is provided so as to be opposed, and the branch pipe 311 having a predetermined length is projected from the branch channel block body 31. Since it is only a part, it does not cause any structural complication, and in the assembled state, this protruding pipe 311 is hidden inside, so that this joint is made to be externally compatible with the conventional one. be able to.
- each branch channel may be set according to the flow rate of each gas (the smaller the flow rate, the smaller the inner diameter).
- the flow rates of each gas become more equal, and the simultaneity of the merging timing of each gas in the main flow path can be improved compared to the conventional one, so that the mixed gas can be supplied in a shorter time regardless of the gas flow rate.
- the block body may be not only a square shape but also a disk shape, for example. However, for a thrust seal structure, it is preferable to have a flat portion at the opposite location.
- the integrated gas panel apparatus 1 constitutes a part of a semiconductor manufacturing system. As shown in FIG. 6, an outline of various gas for film formation is supplied from a gas supply source (not shown). Each is introduced, mixed and used to supply a semiconductor film forming chamber (not shown).
- This integrated gas panel device 1 is provided with a plurality of branch channels R1 provided in parallel and one main channel R2 to which the outlets of the branch channels R1 are connected. .
- Each branch channel R1 has an inlet port PI connected to the base end thereof, and the gas supply source (not shown) is connected via an external pipe (not shown) connected to the inlet port PI. Therefore, several kinds of gases are sent to each branch channel R1. Gas control devices such as valve V and mass flow controller MFC are arranged in the middle of each branch channel R1. Through these operations, the flow rate of gas flowing through each branch channel R1 and switching to purge gas can be controlled.
- the main flow path R2 has a single flow path structure as described above, and the connection portion CN with each branch flow path R1 described above is not concentrated at one place, but along the flow. It is provided to fly away.
- a gas mixer MIX that stirs and mixes the combined gas is disposed downstream of the integrated gas panel device 1, that is, downstream of the main flow path R2, and further downstream of the gas mixer.
- a flow rate controller FRC that distributes the gas mixed in MIX to a predetermined flow rate ratio and outputs it to each film forming chamber from the outlet port PO is provided.
- the gas supplied from each gas supply source is introduced into the main channel R2 after being controlled in flow rate in the branch channel R1 of the integrated gas panel device 1, and then mixed with the gas.
- MIX is thoroughly mixed by the mixer MIX and output from each outlet port PO at a predetermined flow rate ratio from the flow rate controller FRC.
- FIG. 7 also describes the purge gas flow path, the inlet port PX, the outlet port PY, and the like.
- the member indicated by the symbol MFM is a verifier for checking whether the flow rate indicated by the mass flow controller is correct.
- the gas panel device 1 includes a panel body 2 having a substantially plate shape in which the main flow path R2 and the branch flow path R1 are formed, and the gas control device attached to the panel body 2. In addition, it is equipped with attached plumbing tools such as inlet port PI.
- the panel body 2 has a face plate shape constituted by connecting a plurality of block bodies in a plane. Various forces are used as this block body.
- the branch channel block body 31 constituting the branch channel R1 and the main channel block body 32 constituting the main channel R2 are used.
- the branch channel block body 31 has a flat rectangular flat plate shape and is mounted on a valve. There are some types with different internal pipes, such as those for mounting mass flow controllers.
- One branch channel R1 is a force formed by connecting a plurality of such branch channel block bodies 31 in series to form a long plate shape.
- a plurality of branch flow paths R1 are formed in parallel by arranging the rows of bodies 31 (hereinafter also referred to as branch flow block block rows 5) side by side to form a face plate.
- the main flow path block body 32 has, for example, a single long plate shape, and a main flow path R2 is formed inside along the longitudinal direction thereof. Then, they are stacked and connected to the lower surface of the branch channel block body 31 vertically (in a direction perpendicular to the plane direction of the panel body). At this time, the extending direction of the main channel block bodies 32 is orthogonal to the extending direction of the branch channel block bodies 5. As a result, as described above, the outlet of each branch channel R1 is connected to the main channel R2.
- connection portion CN between the main channel R2 and the branch channel R1.
- an insertion hole 321 is opened in the upper plane of the main channel block body 32 so that the insertion hole 321 communicates with the internal main channel R2.
- the branch channel R1 is connected to the most downstream side of the branch channel block body 31, that is, the branch channel block body 31 (1) having the outlet portion of the branch channel R1 from the lower plane.
- the protruding cylindrical protruding pipe 311 is integrally provided. The outer diameter of the protruding pipe 311 and the inner diameter of the insertion hole 321 are substantially matched.
- the tip of the protruding pipe 311 is The main channel R2 is configured to protrude further inward from the inner side surface R2a (shown in FIG. 10).
- the projecting dimension is, for example, such that the tip of the projecting pipe 311 reaches the vicinity of the center of the main flow path R 2 in a cross section.
- a sealing member 6 such as an O-ring is interposed between the opposing planes of the main flow path block body 32 and the branch flow path block body 31 (1) so as to be brought into close contact in the thrust direction. This prevents gas leakage at the connection CN.
- Reference numeral 322 denotes a countersink portion that is provided in the main flow path block body 32 and accommodates the seal member 6. This counterclock The section 322 may be provided in the branch channel block body 31! /.
- the protruding pipe 311 that is the outlet of the branch channel R1 projects into the main channel R2 at the connection portion CN between the branch channel R1 and the main channel R2. Since the diameter of the flow path is narrowed, the gas flow rate in the main flow path R2 at this portion increases and the pressure decreases, and the gas in the branch flow path R1 can be strongly drawn into the main flow path R2. The drawn gas is diffused by the turbulent flow generated behind the protruding pipe 311 in the main flow path R2, so that the force S can be more uniformly mixed with the gas flowing through the main flow path R2. .
- the structurally different from the conventional one is only the portion that protrudes the protruding pipe 311 having a predetermined length from the branch channel block body 31, so that the structure is hardly complicated. In the assembled state, this protruding pipe 311 is hidden inside, so that it can be made externally compatible with the conventional one.
- the present embodiment may be modified.
- the projecting dimension to the main flow path is a balance between the force and gas flow rate that were preferred around the center of the main flow path this time. What is necessary is just to set it as the optimal for mixing.
- each protruding pipe preferably the inner diameter of the branch flow channel after the mass flow controller
- the inner diameter of each protruding pipe is set according to the flow rate of each gas (the smaller the flow rate, the smaller the inner diameter). May be.
- the flow rate can be made equal to that of other gases and the arrival time can be shortened, so that the simultaneity of the merging timing of each gas in the main flow path can be improved. That is, the mixed gas can be supplied in a shorter time regardless of the gas flow rate.
- the protruding pipe is not limited to a cylindrical shape, and may be a polygonal tube, and various other shapes are also conceivable.
- the projecting pipe may be provided separately from the branch channel block body that is simply provided integrally with the branch channel block body and may be assembled.
- the block body may be not only a square shape but also a disk shape, for example. However, for a thrust seal structure, it is preferable to have a flat portion at the opposite location.
- the three-dimensionally integrated gas panel device 1 constitutes a part of a semiconductor manufacturing system. As shown in FIG. 11, the various gases for film formation are not illustrated. Each gas is introduced from a gas supply source, mixed and supplied to a semiconductor deposition chamber (not shown).
- the three-dimensionally integrated gas panel apparatus 1 will first be described with reference to FIG. 12, including its peripheral circuit, including its fluid circuit structure.
- the three-dimensionally integrated gas panel device 1 includes a plurality of branch channels R1 arranged in parallel in terms of a circuit, and one main channel R2 to which the outlets of the branch channels R1 are connected.
- a plurality of intermediate flow paths R3 communicating with the branch flow paths R1 and the main flow path are provided.
- Each branch channel R1 is connected to an inlet port PI at the base end thereof, and the gas supply is performed via an external pipe (not shown! /) Connected to the inlet port PI. From the source, several types of gases are sent to each branch channel R1.
- a gas control device such as a valve V or a mass flow controller MFC is arranged in the middle of each branch flow path R1, and the operation of these controls the flow rate of gas flowing through each branch flow path R1 and switching to the purge gas. Let's do it like a wholesale.
- the intermediate flow path R3 is continuously connected to the tip (exit) of each branch flow path R1, and connects each branch flow path R1 to the main flow path R2.
- the main flow path R2 has a single flow path structure.
- a gas mixer MIX that stirs and mixes the combined gas is disposed downstream of the main flow path R2, that is, downstream of the three-dimensionally integrated gas panel device 1, and further, gas mixing is performed downstream thereof.
- a flow rate controller FRC that distributes the gas mixed in the mixer MIX to a predetermined flow rate and outputs the gas to each film forming chamber from the outlet port PO is provided. Note that these gas mixer MIX, flow rate controller FRC, outlet port PO, etc. are not shown in FIG.
- the gas supplied from each gas supply source is flow-controlled in the branch channel R1 of the three-dimensionally integrated gas panel device 1 and then the intermediate channel R3. After that, it is introduced into the main flow path R2, and then thoroughly mixed by the gas mixer MIX, and output from each outlet port PO at a predetermined flow rate ratio from the flow rate ratio controller FRC.
- FIG. 12 also shows the purge gas flow path, the inlet port PX, the outlet port PY, and the like. Also, for the member indicated by the symbol MFM, check whether the flow rate indicated by the mass flow controller MFC is correct! /
- This three-dimensionally integrated gas panel device 1 includes a branch channel block body 3 having a long flat panel shape in which one branch channel R1 is formed, and a main channel R2 and an intermediate channel R3.
- a center block body 4 having a regular polygonal column shape (in this case, a regular octagonal column shape) formed with the gas control devices V and MFC attached to the branch channel block body 3 and an inlet port PI, etc. And plumbing fixtures.
- one branch channel R1 means one of a plurality of branch channels.
- the branch channel block body 3 is constituted by a plurality of series-connected block body elements 31 each having a flat rectangular plate shape. There are several types of block body elements 31 with different internal piping, such as those for valves and those for mass flow controllers. Of course, the branch channel block body 3 may not be divided and may be configured as a single sheet.
- the central block body 4 is a regular octagonal prism having a rotationally symmetric shape about the axis.
- the bottom surface 3a which is the mounting surface of each branch channel block body 3, is held facing each side peripheral surface 41, which is a holding surface, respectively.
- a main channel R2 is provided along the axis C at one end of the central block body 4.
- An outlet port P for connection with an external pipe is attached to the front end (one end on the end side) of the main flow path R2, and protrudes from the end face 4a of the central block body 4.
- a merging portion CN is set at the base end (one end opposite to the end) of the main flow path R2, and the central block body 4 is perpendicular to the axis C from the merging portion CN.
- the intermediate flow path R3 is extended radially toward each side peripheral surface 41 of the. These intermediate flow paths R3 have the same length.
- the flow path length from each branch flow path R1 to the main flow path R2 (the length of the intermediate flow path R3) is equal, and is also provided at one location of the main flow path R2. Since all of the intermediate flow path R3 merges at the merging site CN, the distance from each branch flow path R2 to the final outlet port P becomes equal. As a result, the simultaneity of the arrival times of the gases can be significantly improved.
- the main flow path R2 is located at the end of the central block body 4 in the vicinity of the outlet port P and the distance thereof is very short, the responsiveness is very excellent. This is an effect that made use of three-dimensional structural characteristics.
- the diameter of the intermediate flow path and the flow path diameter in the branch flow path are varied according to the gas flow rate (the smaller the gas flow rate, the smaller the diameter). Do it).
- the intermediate block body is left in a rotationally symmetric shape, and the merging portion is deviated from the axis of the intermediate block body, or the intermediate block body itself has an irregular shape.
- the length of the intermediate flow path may be varied.
- the center block body is not limited to a single structure, and may be configured by combining a plurality of block body elements.
- regular polygons The main point is not limited to the column, but it is only necessary that each holding surface 41 forms a plurality of rotationally symmetric shapes about the axis. An example is shown in FIG.
Abstract
Description
Claims
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
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US12/438,348 US8196609B2 (en) | 2006-08-23 | 2007-08-21 | Integrated gas panel apparatus |
JP2008530925A JP5037510B2 (en) | 2006-08-23 | 2007-08-21 | Integrated gas panel device |
CN2007800311579A CN101506561B (en) | 2006-08-23 | 2007-08-21 | Integrated gas panel apparatus |
US13/479,016 US8820360B2 (en) | 2006-08-23 | 2012-05-23 | Integrated gas panel apparatus |
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JP2006-227224 | 2006-08-23 | ||
JP2006-226970 | 2006-08-23 | ||
JP2006226970 | 2006-08-23 | ||
JP2006227224 | 2006-08-23 | ||
JP2006226874 | 2006-08-23 | ||
JP2006-226874 | 2006-08-23 |
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US12/438,348 A-371-Of-International US8196609B2 (en) | 2006-08-23 | 2007-08-21 | Integrated gas panel apparatus |
US13/479,016 Continuation US8820360B2 (en) | 2006-08-23 | 2012-05-23 | Integrated gas panel apparatus |
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WO2008023711A1 true WO2008023711A1 (en) | 2008-02-28 |
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PCT/JP2007/066211 WO2008023711A1 (en) | 2006-08-23 | 2007-08-21 | Integrated gas panel apparatus |
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US (2) | US8196609B2 (en) |
JP (2) | JP5037510B2 (en) |
KR (1) | KR101466998B1 (en) |
CN (1) | CN101506561B (en) |
TW (1) | TWI435991B (en) |
WO (1) | WO2008023711A1 (en) |
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Also Published As
Publication number | Publication date |
---|---|
KR101466998B1 (en) | 2014-12-01 |
CN101506561B (en) | 2012-04-18 |
KR20090053822A (en) | 2009-05-27 |
US20120227848A1 (en) | 2012-09-13 |
TWI435991B (en) | 2014-05-01 |
US20090320754A1 (en) | 2009-12-31 |
JP2012229807A (en) | 2012-11-22 |
TW200825315A (en) | 2008-06-16 |
JPWO2008023711A1 (en) | 2010-01-14 |
US8820360B2 (en) | 2014-09-02 |
US8196609B2 (en) | 2012-06-12 |
CN101506561A (en) | 2009-08-12 |
JP5579783B2 (en) | 2014-08-27 |
JP5037510B2 (en) | 2012-09-26 |
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