WO2007142988A3 - Uv and visible laser systems - Google Patents
Uv and visible laser systems Download PDFInfo
- Publication number
- WO2007142988A3 WO2007142988A3 PCT/US2007/012775 US2007012775W WO2007142988A3 WO 2007142988 A3 WO2007142988 A3 WO 2007142988A3 US 2007012775 W US2007012775 W US 2007012775W WO 2007142988 A3 WO2007142988 A3 WO 2007142988A3
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- light source
- light
- laser systems
- visible laser
- frequency converter
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70008—Production of exposure light, i.e. light sources
- G03F7/70025—Production of exposure light, i.e. light sources by lasers
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/35—Non-linear optics
- G02F1/353—Frequency conversion, i.e. wherein a light beam is generated with frequency components different from those of the incident light beams
- G02F1/3532—Arrangements of plural nonlinear devices for generating multi-colour light beams, e.g. arrangements of SHG, SFG, OPO devices for generating RGB light beams
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/005—Optical devices external to the laser cavity, specially adapted for lasers, e.g. for homogenisation of the beam or for manipulating laser pulses, e.g. pulse shaping
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/005—Optical devices external to the laser cavity, specially adapted for lasers, e.g. for homogenisation of the beam or for manipulating laser pulses, e.g. pulse shaping
- H01S3/0092—Nonlinear frequency conversion, e.g. second harmonic generation [SHG] or sum- or difference-frequency generation outside the laser cavity
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
- H01S3/06—Construction or shape of active medium
- H01S3/063—Waveguide lasers, i.e. whereby the dimensions of the waveguide are of the order of the light wavelength
- H01S3/067—Fibre lasers
- H01S3/06754—Fibre amplifiers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
- H01S3/16—Solid materials
- H01S3/1601—Solid materials characterised by an active (lasing) ion
- H01S3/1603—Solid materials characterised by an active (lasing) ion rare earth
- H01S3/1608—Solid materials characterised by an active (lasing) ion rare earth erbium
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
- H01S3/16—Solid materials
- H01S3/1601—Solid materials characterised by an active (lasing) ion
- H01S3/1603—Solid materials characterised by an active (lasing) ion rare earth
- H01S3/1611—Solid materials characterised by an active (lasing) ion rare earth neodymium
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
- H01S3/16—Solid materials
- H01S3/1601—Solid materials characterised by an active (lasing) ion
- H01S3/1603—Solid materials characterised by an active (lasing) ion rare earth
- H01S3/1618—Solid materials characterised by an active (lasing) ion rare earth ytterbium
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/23—Arrangements of two or more lasers not provided for in groups H01S3/02 - H01S3/22, e.g. tandem arrangements of separate active media
- H01S3/2383—Parallel arrangements
Landscapes
- Physics & Mathematics (AREA)
- Nonlinear Science (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Lasers (AREA)
- Optical Modulation, Optical Deflection, Nonlinear Optics, Optical Demodulation, Optical Logic Elements (AREA)
Abstract
A laser system comprising: a light source generating light, said light source comprising at least two laser sources of different wavelengths; and a frequency converter operatively coupled to said light source to accept the light provided by said light source and to convert it to higher optical frequency such that said frequency converter is producing light output at the final output wavelength situated in the 150-775 nm range.
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2009513261A JP2009540538A (en) | 2006-06-02 | 2007-05-31 | UV and visible laser systems |
EP07809246A EP2024787A2 (en) | 2006-06-02 | 2007-05-31 | Uv and visible laser systems |
US12/227,881 US20090185583A1 (en) | 2006-06-02 | 2007-05-31 | UV and Visible Laser Systems |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US81050506P | 2006-06-02 | 2006-06-02 | |
US60/810,505 | 2006-06-02 |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2007142988A2 WO2007142988A2 (en) | 2007-12-13 |
WO2007142988A3 true WO2007142988A3 (en) | 2008-03-20 |
Family
ID=38710486
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/US2007/012775 WO2007142988A2 (en) | 2006-06-02 | 2007-05-31 | Uv and visible laser systems |
Country Status (4)
Country | Link |
---|---|
US (1) | US20090185583A1 (en) |
EP (1) | EP2024787A2 (en) |
JP (1) | JP2009540538A (en) |
WO (1) | WO2007142988A2 (en) |
Families Citing this family (34)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB2434483A (en) * | 2006-01-20 | 2007-07-25 | Fianium Ltd | High-Power Short Optical Pulse Source |
US8953647B1 (en) * | 2007-03-21 | 2015-02-10 | Lockheed Martin Corporation | High-power laser using thulium-doped fiber amplifier and frequency quadrupling for blue output |
US8179934B2 (en) * | 2008-05-12 | 2012-05-15 | Ipg Photonics Corporation | Frequency conversion laser head |
JP2010050389A (en) * | 2008-08-25 | 2010-03-04 | Sony Corp | Laser beam generator |
WO2011071889A1 (en) | 2009-12-07 | 2011-06-16 | J.P. Sercel Associates, Inc. | Laser lift off systems and methods |
US9669613B2 (en) | 2010-12-07 | 2017-06-06 | Ipg Photonics Corporation | Laser lift off systems and methods that overlap irradiation zones to provide multiple pulses of laser irradiation per location at an interface between layers to be separated |
JP4590578B1 (en) | 2010-04-01 | 2010-12-01 | レーザーテック株式会社 | Light source apparatus, mask inspection apparatus, and coherent light generation method |
TW201208220A (en) * | 2010-06-17 | 2012-02-16 | Nikon Corp | Ultraviolet laser device |
JP6020441B2 (en) * | 2011-03-24 | 2016-11-02 | 株式会社ニコン | UV laser equipment |
US9535273B2 (en) * | 2011-07-21 | 2017-01-03 | Photon Dynamics, Inc. | Apparatus for viewing through optical thin film color filters and their overlaps |
US8873596B2 (en) | 2011-07-22 | 2014-10-28 | Kla-Tencor Corporation | Laser with high quality, stable output beam, and long life high conversion efficiency non-linear crystal |
US9250178B2 (en) | 2011-10-07 | 2016-02-02 | Kla-Tencor Corporation | Passivation of nonlinear optical crystals |
KR101329082B1 (en) * | 2011-11-25 | 2013-11-14 | 한국원자력연구원 | Method and Apparatus for the Separation of Carbon and Oxygen Isotopes by Fiber Lasers |
US9042006B2 (en) * | 2012-09-11 | 2015-05-26 | Kla-Tencor Corporation | Solid state illumination source and inspection system |
US8929406B2 (en) | 2013-01-24 | 2015-01-06 | Kla-Tencor Corporation | 193NM laser and inspection system |
US9529182B2 (en) | 2013-02-13 | 2016-12-27 | KLA—Tencor Corporation | 193nm laser and inspection system |
US9608399B2 (en) * | 2013-03-18 | 2017-03-28 | Kla-Tencor Corporation | 193 nm laser and an inspection system using a 193 nm laser |
FR3004820B1 (en) * | 2013-04-19 | 2016-08-19 | Centre Nat Rech Scient | INFRARED AND VISIBLE CONSISTENT LASER BEAM GENERATOR. |
JP5825642B2 (en) * | 2013-04-30 | 2015-12-02 | レーザーテック株式会社 | Light source device, inspection device, and wavelength conversion method |
JP5484619B2 (en) * | 2013-05-27 | 2014-05-07 | 株式会社メガオプト | Optical fiber laser |
PL3092690T3 (en) * | 2014-01-06 | 2024-05-27 | Ipg Photonics Corporation | Ultra-high power single mode green fiber laser operating in continuous wave and quasi-continuous wave regimes |
US20150204790A1 (en) * | 2014-01-23 | 2015-07-23 | Canon Kabushiki Kaisha | Stimulated raman scattering measurement apparatus |
US9804101B2 (en) | 2014-03-20 | 2017-10-31 | Kla-Tencor Corporation | System and method for reducing the bandwidth of a laser and an inspection system and method using a laser |
JP6667533B2 (en) * | 2014-09-16 | 2020-03-18 | アイピージー フォトニクス コーポレーション | RGB laser source for illumination of projector system |
US9419407B2 (en) | 2014-09-25 | 2016-08-16 | Kla-Tencor Corporation | Laser assembly and inspection system using monolithic bandwidth narrowing apparatus |
US9748729B2 (en) | 2014-10-03 | 2017-08-29 | Kla-Tencor Corporation | 183NM laser and inspection system |
WO2017092789A1 (en) * | 2015-11-30 | 2017-06-08 | Universität Stuttgart | Radiation field generating unit |
GB2547268B (en) | 2016-02-12 | 2019-11-13 | M Squared Lasers Ltd | Optical frequency mixing module |
US10175555B2 (en) | 2017-01-03 | 2019-01-08 | KLA—Tencor Corporation | 183 nm CW laser and inspection system |
CN111656273A (en) * | 2018-03-28 | 2020-09-11 | 极光先进雷射株式会社 | Wavelength conversion system and processing method |
CN110967704B (en) * | 2018-09-30 | 2021-09-07 | 中国科学院上海光学精密机械研究所 | Laser radar system device for measuring atmospheric carbon dioxide concentration and aerosol vertical profile by multiple wavelengths |
RU2754395C1 (en) * | 2020-07-23 | 2021-09-01 | Федеральное государственное бюджетное учреждение науки Физический институт им. П.Н. Лебедева Российской академии наук (ФИАН) | Method for generating terahertz radiation pulses and apparatus for implementation thereof |
DE102022200539A1 (en) | 2022-01-18 | 2022-11-17 | Carl Zeiss Smt Gmbh | Optical system for projection lithography |
EP4270685A1 (en) * | 2022-04-28 | 2023-11-01 | NKT Photonics A/S | Optical pulse source, optical system for rydberg excitation and method of forming optical pulses |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6256327B1 (en) * | 1997-09-30 | 2001-07-03 | The United States Of America As Represented By The Secretary Of The Army | Red light source |
US20020054613A1 (en) * | 2000-10-06 | 2002-05-09 | Kang Jin U. | Compact, highly efficient and rugged UV source based on fiber laser |
EP1571741A1 (en) * | 2002-12-10 | 2005-09-07 | Nikon Corporation | Ultraviolet light source, phototherapy apparatus using ultraviolet light source, and exposure system using ultraviolet light source |
US20060039423A1 (en) * | 2004-08-20 | 2006-02-23 | Nikon Corporation | Light source unit and light irradiation unit |
US20070064749A1 (en) * | 2005-09-20 | 2007-03-22 | Megaopto Co., Ltd. | Deep ultraviolet laser apparatus |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH11251666A (en) * | 1998-03-04 | 1999-09-17 | Sony Corp | Method and apparatus for generating laser beam |
JP2001353176A (en) * | 2000-04-13 | 2001-12-25 | Nikon Corp | Laser treatment apparatus |
JP2002099011A (en) * | 2000-09-21 | 2002-04-05 | Sony Corp | Laser beam generator |
JP2004086193A (en) * | 2002-07-05 | 2004-03-18 | Nikon Corp | Light source device and light irradiation apparatus |
WO2006013890A1 (en) * | 2004-08-04 | 2006-02-09 | Matsushita Electric Industrial Co., Ltd. | Coherent light source |
US7593437B2 (en) * | 2006-05-15 | 2009-09-22 | Coherent, Inc. | MOPA laser apparatus with two master oscillators for generating ultraviolet radiation |
-
2007
- 2007-05-31 WO PCT/US2007/012775 patent/WO2007142988A2/en active Application Filing
- 2007-05-31 US US12/227,881 patent/US20090185583A1/en not_active Abandoned
- 2007-05-31 JP JP2009513261A patent/JP2009540538A/en active Pending
- 2007-05-31 EP EP07809246A patent/EP2024787A2/en not_active Withdrawn
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6256327B1 (en) * | 1997-09-30 | 2001-07-03 | The United States Of America As Represented By The Secretary Of The Army | Red light source |
US20020054613A1 (en) * | 2000-10-06 | 2002-05-09 | Kang Jin U. | Compact, highly efficient and rugged UV source based on fiber laser |
EP1571741A1 (en) * | 2002-12-10 | 2005-09-07 | Nikon Corporation | Ultraviolet light source, phototherapy apparatus using ultraviolet light source, and exposure system using ultraviolet light source |
US20060039423A1 (en) * | 2004-08-20 | 2006-02-23 | Nikon Corporation | Light source unit and light irradiation unit |
US20070064749A1 (en) * | 2005-09-20 | 2007-03-22 | Megaopto Co., Ltd. | Deep ultraviolet laser apparatus |
Also Published As
Publication number | Publication date |
---|---|
US20090185583A1 (en) | 2009-07-23 |
JP2009540538A (en) | 2009-11-19 |
WO2007142988A2 (en) | 2007-12-13 |
EP2024787A2 (en) | 2009-02-18 |
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