WO2007108214A1 - 分析素子およびこれを用いた分析装置 - Google Patents
分析素子およびこれを用いた分析装置 Download PDFInfo
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- WO2007108214A1 WO2007108214A1 PCT/JP2007/000246 JP2007000246W WO2007108214A1 WO 2007108214 A1 WO2007108214 A1 WO 2007108214A1 JP 2007000246 W JP2007000246 W JP 2007000246W WO 2007108214 A1 WO2007108214 A1 WO 2007108214A1
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- Prior art keywords
- optical waveguide
- detection
- light
- analysis
- gas
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Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/01—Arrangements or apparatus for facilitating the optical investigation
- G01N21/03—Cuvette constructions
- G01N21/031—Multipass arrangements
-
- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61B—DIAGNOSIS; SURGERY; IDENTIFICATION
- A61B5/00—Measuring for diagnostic purposes; Identification of persons
- A61B5/08—Detecting, measuring or recording devices for evaluating the respiratory organs
- A61B5/097—Devices for facilitating collection of breath or for directing breath into or through measuring devices
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N33/00—Investigating or analysing materials by specific methods not covered by groups G01N1/00 - G01N31/00
- G01N33/48—Biological material, e.g. blood, urine; Haemocytometers
- G01N33/483—Physical analysis of biological material
- G01N33/497—Physical analysis of biological material of gaseous biological material, e.g. breath
Definitions
- the present invention relates to an analysis element for analyzing a gas or liquid sample and an analysis apparatus using the same.
- an advance in technology capable of analyzing a small amount of liquid components such as blood is also desired.
- it is not limited to biological samples.
- technological development for measuring a small amount of gas contained in the atmosphere is being actively conducted.
- Patent Document 1 Japanese Patent Laid-Open No. 2005-30021 2
- Patent Document 2 Japanese Patent Laid-Open No. 6-281568
- Non-Patent Document 1 Manfre ed Murtz, Op tics & Photonics News, vo l. 1 6, No. 1, pp. 30-35 (2 005)
- one of the problems to be solved by the present invention is the form of an on-line measurement type breath analysis system, and in particular, the size of the gas cell that is a major obstacle to carrying.
- Patent Document 1 reports a method for reducing the size by using an optical waveguide as a detection portion for use in the above-described total reflection absorption spectroscopy.
- Patent Document 1 an object to be measured is applied instead of the upper clad region of the optical waveguide, and the refractive index of the object to be measured is used to function as a part of the optical waveguide, while being distributed to the object to be measured.
- the absorption of light is generated, and as a result, total reflection absorption spectroscopy can be performed.
- This technique is effective for a coatable material having a certain refractive index, but when considering the measurement of a trace gas aimed at by the present invention, the light distribution in the layer direction is not uniform. As a result, light is easily emitted to the substrate side, and a stable propagation state is difficult to create.
- the actual processing of optical waveguides In this case, the core layer is directly exposed on the top surface, and there is a problem that excessive waveguide loss occurs due to a minute scratch that is assumed to easily enter the manufacturing process. is doing.
- Patent Document 2 describes a liquid component analyzer using total reflection absorption spectroscopy (ATR method). As described in FIG. 1 of this document, in this apparatus, the detection light enters from the side surface of the detection optical waveguide and proceeds while being totally reflected in the optical waveguide. However, with this method, evanescent light absorption occurs only at the point where the light is totally reflected at the optical waveguide interface, making it difficult to achieve sufficient measurement sensitivity. In addition, since the incident angle is extremely limited, there is a problem that it is difficult to determine the light incident and emission angles. Furthermore, the total reflection absorption spectroscopy (ATR method) disclosed in Patent Document 2 has the following problems.
- the total reflection angle varies greatly depending on the refractive index of the sample, and the light is incident obliquely after being reflected by the infrared light emitting diode (LED), so the total reflection condition cannot be obtained from the sample in the first place. There is.
- the conventional example using the optical waveguide does not have an optical waveguide structure that can be used as a sample cell and is suitable for detecting a minute amount of gas or liquid.
- An object of the present invention is to realize an analytical element and an analytical apparatus that can measure a gas or liquid component with high accuracy while being small in size.
- Detection light provided adjacent to the sample chamber and guided by detection light for detecting the sample A waveguide
- a detection light incident portion that makes detection light traveling in a direction along the detection optical waveguide incident from the end face of the detection light waveguide with respect to the detection optical waveguide
- the detection optical waveguide has an exposed surface that is exposed in the sample chamber.
- the cell In the conventional method in which the detection light is transmitted through the sample cell, the cell needs to have a hollow structure so that the sample can be accommodated therein. Since the detection light is transmitted through the hollow portion, it is difficult to change the direction of the waveguide.
- the analysis element of the present invention has an optical waveguide through which the detection light is guided and the sample. It has a structure in which the cells to be accommodated are separated. When a sample is present in the cell, absorption of evanescent light that has oozed out of the optical waveguide occurs, resulting in a decrease in the intensity of the light guided in the optical waveguide. By detecting this decrease in strength, the sample can be configured to perform qualitative and quantitative analysis.
- the present invention employs such an analysis method, it is possible to measure a sample made of a gas, a liquid, or a mixture thereof with high accuracy while being small.
- the optical waveguide can be composed of, for example, a semiconductor laminated structure, a polymer, an inorganic material, or the like, the direction of the waveguide can be arbitrarily changed by adopting a configuration such as coupling with a curved optical waveguide. For this reason, it is possible to integrate the waveguides at a high density in a limited region and secure a long optical path length. Furthermore, since the element according to the present invention is configured such that the detection light is incident from the end face of the detection optical waveguide and travels in a direction along the detection optical waveguide, sufficient measurement sensitivity can be realized. . In the conventional total reflection absorption spectroscopy (ATR method)
- the detection light enters from the side surface of the detection optical waveguide and proceeds while being totally reflected in the optical waveguide.
- absorption of evanescent light occurs only at the point where the light is totally reflected at the optical waveguide interface, so that it is difficult to achieve sufficient measurement sensitivity. I got it.
- the incident angle is extremely limited, there is a problem that it is difficult to determine the incident and outgoing angles of light. In the present invention, these problems are solved, and sufficient measurement accuracy is realized.
- the detection optical waveguide may be configured to extend in a predetermined direction.
- the exposed surface may be provided in a strip shape along the detection optical waveguide.
- the detection optical waveguide includes first and second detection optical waveguides provided in parallel with the sample chamber interposed therebetween, and the first detection optical waveguide and the second detection optical waveguide.
- a configuration in which the sample chamber is provided therebetween may be employed. In this way, the light intensity distribution in the sample chamber can be increased and more accurate analysis can be performed.
- the distance between the first and second detection optical waveguides is preferably D or less, more preferably DZ 2 or less, where D is the sum of the widths of the first and second detection optical waveguides. In this way, the light intensity distribution in the sample chamber can be further increased.
- the first and second detection optical waveguides may be either linear or curved, but are preferably provided in parallel at a predetermined distance. In any case, it is preferable to provide them in a straight line so that they are parallel to each other.
- An optical waveguide structure including
- the core layer is the detection optical waveguide, and a space adjacent to the mesa portion forms the sample chamber;
- Analytical element having a configuration in which a side surface of the core layer is exposed in the sample chamber
- a detection light incident part for incident detection light in the analytical element, A detection light incident part for incident detection light;
- a demultiplexer for demultiplexing the incident detection light
- a detection unit to which the demultiplexed detection light is guided
- a detection light emitting portion for emitting the combined detection light
- the detection unit is
- a sample chamber into which a gaseous or liquid sample is introduced, and first and second detection optical waveguides provided in parallel across the sample chamber,
- the first and second detection optical waveguides have exposed surfaces exposed in the sample chamber
- the detection light incident part is a light
- An analysis element configured to allow detection light traveling in a direction along the detection optical waveguide to enter.
- the analysis element may further include the following configuration.
- a first and second mesa portion comprising a multilayer film in which a lower clad layer, a core layer, and an upper clad layer are laminated in this order on the substrate;
- An optical waveguide structure including
- the first and second mesas are provided in parallel,
- the core layers of the first and second mesa portions are the first and second detection optical waveguides, respectively, and a space sandwiched between the first and second mesa portions defines the sample chamber. None,
- the analytical element wherein a side surface of the core layer is exposed in the sample chamber.
- a first unit and a second unit consisting of the detection unit, the duplexer, and the multiplexer;
- the first and second units are optically coupled,
- the detection optical waveguide included in the first unit and the detection optical waveguide included in the second unit have different optical waveguide directions.
- first and second units are coupled by a curved optical waveguide.
- the detection optical waveguide included in the first unit and the detection optical waveguide included in the second unit may both be provided in a straight line and provided in parallel.
- each of the first and second units may be configured to include first and second detection optical waveguides provided in parallel with the sample chamber interposed therebetween.
- the detection light incident part and the detection light emission part may include a mirror, and each mirror may be configured such that a part of the detection light is reflected and the rest is transmitted. Good. In this way, more accurate analysis can be performed. In addition, quantitative analysis based on the attenuation rate of the emitted light becomes possible. Moreover, according to the present invention,
- An analyzer including a light source, an analysis unit that receives light from the light source, and a photodetector that detects light emitted from the analysis unit,
- the analysis unit includes the analysis element described above.
- an analyzer characterized in that a sample is analyzed from the relationship between the intensity of light incident on an analysis section provided in the analysis element and the intensity of light emitted from the analysis section.
- the analysis unit may further include an exhalation collection unit that collects exhalation and guides it to the sample chamber.
- an analysis element capable of analyzing exhaled breath quickly and accurately is realized.
- an analysis element an analysis apparatus, and a system having the following configurations are provided.
- the gas detection optical waveguide has a first cladding layer, a core layer, and a second cladding layer on the substrate, and the optical waveguide structure in which the core layer is located spatially above the substrate bottom surface.
- the analytical element according to (A), comprising an optical waveguide cell having a structure in which a plurality of the optical waveguides for gas detection are arranged close to each other.
- An optical waveguide cell having a structure in which an incident optical waveguide, an optical amplifier, an optical coupling / branching waveguide, a gas detection optical waveguide, a curved optical waveguide, and an output optical waveguide are integrated on a substrate. Analytical element.
- the gas detection optical waveguide has a first clad layer, a core layer, and a second clad layer on a substrate, and the core layer has an optical waveguide structure positioned spatially above the substrate bottom surface.
- (G) A gas analyzer provided with the analysis element of (A) to (F) as a gas cell.
- a breath analysis apparatus comprising the analysis element of (A) to (F) as a gas cell.
- (I) A gas analysis system, characterized in that the gas analyzer of (G) and a computer are connected to analyze gas component data analyzed by the gas analyzer.
- a gas analyzer described in (G) above and a computer are connected to a network and perform analysis based on the gas component data analyzed by the gas analyzer. Analysis system.
- (K) A gas analysis system characterized in that the gas analysis system of (I) above is built in a mobile phone.
- the breath analysis apparatus according to (H) is connected to a computer, and health examination is performed based on the breath component data analyzed by the breath analysis apparatus.
- a breath analysis and diagnosis system is provided.
- the optical waveguide cell functions as an optical waveguide. On the other hand, it works to positively distribute the light in the gas phase, and in addition, it works to allow the introduction of trace gases easily from the outside.
- a gas cell that is usually used is a cylindrical part (a length of about 1 O cm and a radius of about c).
- a gas to be measured is filled into a sealed space and light is propagated through the space.
- light travels straight, so it has to be of such a large size to generate effective light absorption for measurement.
- the same optical path length can be kept to a size of several mm to several cm square.
- light propagation through an optical waveguide usually propagates through a solid, and is not configured to include a trace gas to be measured in the optical waveguide.
- a structure called a hollow waveguide that surrounds the space with a total reflection mirror is also conceivable.
- a sealed structure surrounded by the total reflection mirror a structure that is isolated from the external space
- a small amount of gas is used. It is a structure that is physically difficult to introduce from the outside.
- a hollow waveguide must be an optical waveguide with a large waveguide loss. It was not a structure suitable for propagation of several 10 cm or more.
- the optical waveguide type cell in the above (A) to (N) is configured so that light is actively distributed in the gas phase while being composed of the optical waveguide, and the hollow waveguide and Unlike the above, it is not a sealed structure. As described above, it acts as an optical waveguide, actively acts to distribute light in the gas phase, and in addition, externally It works so that trace gas can be easily introduced.
- an analytical element and an analytical apparatus that can measure a gas or liquid component with high accuracy while being small in size.
- FIG. 1 is a diagram showing a first embodiment.
- FIG. 2 is a structural schematic diagram showing a second embodiment.
- (B) is an enlarged view of (a).
- FIG. 3 is a schematic cross-sectional view of a gas detection optical waveguide used in a second embodiment.
- FIG. 4 is a schematic cross-sectional view of an incident optical waveguide, an optical coupling / branching waveguide, a curved optical waveguide, and an outgoing optical waveguide used in the second embodiment.
- FIG. 5 is a diagram for explaining the principle of gas detection by the gas detection optical waveguide shown in the second embodiment.
- FIG. 6 is a process diagram showing a method for manufacturing an optical waveguide cell according to second, fourth, and sixth embodiments, wherein (a) and (b) are cross-sectional views.
- FIG. 7 is a process diagram showing a method for manufacturing an optical waveguide cell according to the second, fourth, and sixth embodiments, wherein (a) and (b) are cross-sectional views.
- FIG. 8 is a schematic configuration diagram showing third, fifth and seventh embodiments.
- FIG. 9 is a schematic configuration diagram of an optical waveguide type gas cell used in the third, fifth and seventh embodiments.
- FIG. 10 is a schematic diagram showing a configuration of a sixth embodiment.
- FIG. 11 is an example of an optical coupling / branching waveguide shown in the second, fourth, and sixth embodiments.
- FIG. 12 is a diagram for explaining optical coupling / branching waveguides shown in the second, fourth, and sixth embodiments.
- FIG. 1 shows a schematic configuration of the analysis element 10 according to the present embodiment.
- This analysis element 10 includes a sample chamber 11 into which a gaseous sample is introduced, and a detection optical waveguide 1 2 a, b provided adjacent to the sample chamber 11 1 to guide detection light for detecting the sample. And a detection light incident part 13 for causing the detection light traveling in the direction along the detection optical waveguides 12 a and b to enter the detection optical waveguides 12 a and b from the end surfaces of the detection optical waveguides 12 a and b.
- the detection optical waveguides 12 a and b each have an exposed surface 14 exposed in the sample chamber 11.
- the detection light enters the detection optical waveguide 12 a from the detection light incident portion 13, travels through the detection optical waveguides 12 a and b, and exits from the detection light emission portion 16.
- the curved waveguide portion 15 connects the detection light incident portion 13 and the detection light emitting portion 16.
- an optical fiber can be used as the curved waveguide portion 15, for example.
- the detection light is incident from the end faces of the detection optical waveguides 12 a and b, and the detection light travels in a direction along the detection optical waveguides 12 a and b.
- the sample since the sample is a gas, the sample can absorb light over the entire length of the detection optical waveguide.
- the detection optical waveguides 12a and b each have a linear shape extending in a predetermined direction, and are provided in parallel.
- the detection optical waveguides 12a and b are provided in parallel with the sample chamber 11 therebetween, and the sample chamber 11 is provided between the detection optical waveguide 12a and the detection optical waveguide 12b.
- the analysis element 10 is provided so that the exposed surfaces 14 of the detection optical waveguides 12 a and b are opposed to each other with the sample chamber 11 interposed therebetween.
- the detection optical waveguides 12 a and b have exposed surfaces 14 exposed in the sample chamber 11.
- the exposed surface 14 is provided in a strip shape along each detection optical waveguide. Detection light
- the side walls of the waveguides 12 a and b form the wall of the sample chamber 11.
- the sample chamber 11 is a region sandwiched between the side walls of the detection optical waveguides 12 a and b, and is partitioned by these side walls.
- the detection optical waveguides 1 2 a and b When light is guided through the detection optical waveguides 1 2 a and b, a part of the light guided through the detection optical waveguides 1 2 a and b oozes out from the exposed surface 1 4, and constant light enters the sample chamber. Distributed.
- the gas introduced into the sample chamber 1 1 absorbs this exuding light.
- the intensity of the light guided in the detection optical waveguide is lowered according to the degree of light absorption of the gas in the sample chamber 11. The sample can be analyzed by detecting this decrease in light intensity.
- the sample chamber 11 is a sample introduction region having a gas cell function. Sample room
- 1 1 is the area where the sample is held. In this region, the sample may be in circulation or may be stagnant.
- a gas having a known extinction coefficient is introduced into the sample chamber 11, and light of a predetermined intensity is incident from the detection light incident part 13 in advance.
- the light travels along the detection optical waveguides 12 a and b and is emitted from the detection light emitting unit 16.
- the intensity of the emitted light is detected by a photodetector. From the relationship between the intensity of the light incident on the detection optical waveguides 12 a and b and the intensity of the light emitted from the detection optical waveguides 12 a and b, the absorbance of the gas is obtained and the concentration of the gas is calculated.
- the analysis element of the present embodiment since the detection optical waveguide through which the detection light is guided and the sample cell are separated, the degree of freedom of the planar layout of the optical waveguide is improved, so that a long optical path length is secured. It becomes possible to do. Therefore, by using the analytical element of the present invention, the analytical apparatus can be downsized and a minute amount of sample can be accurately measured.
- the analysis element of this embodiment guides the detection light to the optical waveguide, the optical loss can be reduced as compared with the conventional gas cell system.
- the cell In the conventional method in which the detection light is transmitted through the sample cell, the cell needs to have a hollow structure so that the sample can be accommodated therein. Since the detection light is transmitted through the hollow portion, it is difficult to change the direction of the waveguide.
- the analysis element of the present invention has an optical waveguide through which the detection light is guided and the sample. It has a structure in which the cells to be accommodated are separated.
- the sample When a sample is present in the cell, absorption of evanescent light that has oozed out of the optical waveguide occurs, resulting in a decrease in the intensity of the light guided in the optical waveguide. By detecting this decrease in strength, the sample can be configured to perform qualitative and quantitative analysis.
- the present invention employs such an analysis method, it is possible to measure a sample made of a gas, a liquid, or a mixture thereof with high accuracy while being small.
- the optical waveguide can be composed of, for example, a semiconductor laminated structure, a polymer, an inorganic material, or the like, the direction of the waveguide can be arbitrarily changed by adopting a configuration such as coupling with a curved optical waveguide. For this reason, it is possible to integrate the waveguides at a high density in a limited region and secure a long optical path length.
- the analysis element is appropriately referred to as an “optical waveguide cell”.
- This optical waveguide cell 8 0 1 includes an incident optical waveguide 10 0 1 that receives detection light, an optical coupling / branching waveguide 1 0 2 that demultiplexes incident detection light, and a demultiplexed detection light Gas detection optical waveguide 10 3 through which the light is guided, optical coupling / branching waveguide 10 2 that combines the detection light emitted from the gas detection optical waveguide 103, and emission that emits the combined detection light
- the gas detection waveguide 10 03 includes a sample chamber 11 into which gas is introduced, and two detection light waveguides provided in parallel with the sample chamber 11 therebetween.
- the detection optical waveguide has an exposed surface exposed in the sample chamber 11, and the incident optical waveguide 10 1 proceeds in a direction along the detection optical waveguide. The detection light is made incident.
- FIG. 2 shows an example.
- the optical coupling / branching waveguide 10 0 2 shown in Fig. 2 (a) shows a 1 X 2 MMI coupler structure
- the optical coupling / branching waveguide 10 0 2 shown in Fig. 2 (b) shows a Y-type branching structure.
- the optical coupling / branching waveguide 10 2 in the present embodiment has a function of demultiplexing the incident detection light and combining the detection light emitted from the gas detection optical waveguide 10 3. Any structure is possible.
- FIG. 3 is a diagram showing a cross-sectional structure of the gas detection optical waveguide 103 indicated by AA ′ in FIG.
- the optical waveguide cell 8 0 1 includes an Si substrate layer 2 0 1, an Si substrate layer 2 0 1, an Si 0 2 first cladding layer 2 0 2, an Si core layer 2 0 3, and an S 1 i 0 2
- the second clad layer 2 0 4 has an optical waveguide structure including two high mesas 2 0 5 made of a multilayer film laminated in this order, and the high mesas 2 0 5 are respectively provided in parallel,
- the two Si core layers 20 3 are detection optical waveguides, and the space between the two high mesas 20 5 forms the sample chamber 11 1, and the side surface of the Si core layer 20 3 is the sample. Room 1 1 is exposed.
- the optical waveguide cell 8 0 1 includes a gas detection waveguide 1 0 3 and two optical coupling and branching waveguides 1 0. 2 and a plurality of units, and each unit is optically coupled.
- the detection optical waveguides included in adjacent units have different optical waveguide directions.
- the optical waveguide directions of the two detection optical waveguides in the unit are the same direction.
- Each unit is connected by a curved optical waveguide 10.
- the detection optical waveguides included in each unit are all provided in a straight line.
- Each unit includes a detection optical waveguide provided in parallel across the sample chamber.
- a detection optical waveguide provided in parallel across the sample chamber.
- not only a region sandwiched between parallel detection optical waveguides but also a region adjacent to the outside of these detection optical waveguides functions as a sample chamber.
- light absorption of the sample occurs in the region adjacent to the outside of the detection optical waveguide.
- An optical waveguide cell 801 includes an incident optical waveguide 101, an optical coupling / branching waveguide 102, a gas detection optical waveguide 103, a curved optical waveguide 104, and an outgoing optical waveguide on a substrate 100. 1 05 and are integrated.
- the incident optical waveguide 101 and the outgoing optical waveguide 105 are configured with a waveguide width of about 0.9 m and a length of about 100 m, and an optical coupling waveguide 102 with a waveguide width of about 4 m and a length of about 25 m.
- the gas detection optical waveguide 103 is configured with a region length of about 1 cm.
- the high mesa optical waveguides are close to each other with a waveguide spacing of about 900 nm, and the width of each optical waveguide is about 900 nm.
- the curved optical waveguide 104 has a radius of curvature of about 5 mm.
- the cross-sectional structures of the incident optical waveguide 101, the optical coupling / branching waveguide 102, and the curved optical waveguide 104 shown by ⁇ _ ⁇ 'in Fig. 2 (a) are high mesa structures as shown in Fig. 4. .
- S i substrate layer 201 S i O 2 first cladding layer 202, S i core layer 2 03, S i 0 2 second clad layer It is a high mesa structure 205 in which 204 layers are stacked.
- S i 0 2 first cladding layer 202 thickness is approximately 1 m
- S i core layer 203 thickness is 0. 3 m approximately
- S i 0 2 second clad layer 204 thickness is One Do about 1 m.
- the wavelength band used is close to the communication wavelength band (1.55 m band).
- the gas detection optical waveguide 103 of the optical waveguide cell according to the present invention is composed of two adjacent high mesa optical waveguides.
- a structure in which two high mesa optical waveguides are close to each other is used as a gas detection waveguide.
- Figure 5 shows the result of calculating the light distribution ratio “ a i r in the air with respect to the distance d between the two high-mesa optical waveguides using the three-dimensional beam propagation method.
- the distance d is approximately 9 0 0 It can be seen that about 30% of the light is distributed in the gas phase at around nm.
- the element according to the present embodiment light having a predetermined intensity is distributed in the gas phase. Transmission absorption spectroscopy is possible for trace gas components.
- the present embodiment by adopting a configuration in which a plurality of gas detection optical waveguides 103 are stacked via the curved optical waveguide 104, the total optical path length of the gas detection optical waveguide 103 is obtained.
- an optical path length of about 1 Om can be realized within a size of about 1 cm square, and the optical path length is one digit longer than that of a conventional gas cell, but the element size is one digit smaller. This cell can be realized.
- the number of high mesas may be two or more, for example, three or five.
- the gas detection optical waveguide 103 is configured to have only a straight portion.
- the curved optical waveguide 104 also has a configuration in which a plurality of high mesa waveguides are close to each other. You may comprise as an optical waveguide. At that time, it is possible to abbreviate unnecessary optical coupling / branching waveguides.
- the radius of curvature is set to 5 m, the present invention is not limited to this. For example, it may be 25 m or 500 m.
- incident optical waveguide 1 0 1, exit A spot size converter or a tapered optical waveguide for improving the coupling efficiency with the optical fiber may be inserted before and after the optical waveguide 10.
- the length of the gas detection optical waveguide 103 region is about 1 cm. However, the length is not limited to this, and it may be long or short, for example, 3 cm, or 1 mm. It may be.
- the incident optical waveguide 10 0 1 and the outgoing light waveguide 1 0 5 have an optical waveguide structure formed in different end face directions. However, the present invention is not limited to this, and the incident light guide in the same end face direction is used.
- a waveguide 10 0 1 and an outgoing light waveguide 1 0 5 may be formed.
- the wavelength band used is in the vicinity of the communication wavelength band (1.55 m band), it is not limited to this, and may be, for example, a visible light band or a mid-infrared light band.
- the optical coupling / branching waveguide 10 0 2 is configured as a normal 1 X 2 optical coupling / branching waveguide, but is not limited thereto.
- the number of branches is changed according to the number of high-mesa optical waveguides.
- it may be an optical coupling / branching waveguide having a light distribution matching region.
- FIG. 11 is a diagram illustrating an example of the optical coupling / branching waveguide 10 2.
- This optical coupling / branching waveguide 10 0 2 has a light distribution matching region 1 0 0 1 added thereto.
- the structure and function of the optical branching waveguide 10 2 will be described.
- FIG. 12 is a diagram showing possible optical field shapes when a double high mesa structure is used. Simulations show that a high light intensity distribution rate can be obtained by creating the optical field state shown in Fig. 12. As shown by the solid line in Fig. 12, we assume that there are two strong peaks in the optical waveguide, and that there are weak peaks at the bottom and center of the strong peaks on the left and right in the valley between the optical waveguides. Then, the propagation light of the double high mesa structure can be approximated as a superposition of almost five Gaussian beams. The optical coupling / branching waveguide 10 2 shown in Fig. 1 is designed to create a superposition of these five Gaussian beams.
- This optical coupling / branching waveguide 10 2 is obtained by adding two optical waveguides to the right and left ordinary high mesa optical waveguides steeply in the lateral direction and only inside for a short distance. Can be expressed.
- the MM I region length is slightly shorter or slightly longer than the theoretical optimum value, so that light is originally coupled only to the left and right optical waveguides. You can use the effect that appears in the middle. Therefore, it is possible to create a superposition state of five Gaussian beams by this optical coupling / branching waveguide 102.
- the optical coupling / branching waveguide 102 with the light distribution matching region 1001 added it becomes possible to suppress the coupling loss of propagating light.
- a Si 0 2 film 5 02 is deposited on a normal SO I substrate 501 by using a thermal CVD method (FIG. 6 (a)).
- a mask 503 is formed in the waveguide shape using a photolithography method using a stepper (reduced projection exposure) (Fig. 6 (b)).
- RIE is performed by the inductively coupled plasma (ICP) method to form a high mesa 601 (Fig. 7 (a)).
- ICP inductively coupled plasma
- FIG. 7 (b) the mask 503 immediately above the high mesa 601 is removed by an organic solvent and an ashing method.
- the optical waveguide cell 801 is cut out, the end face is polished, and the device manufacturing is completed.
- a stepper is used for lithography, but the present invention is not limited to this.
- electron beam exposure may be used.
- a thermal CVD to S i 0 2 film 5 02 forming technique even for example, a plasma CVD method, or may be sputtering.
- the mesa formation process method is not limited to the ICP method, and for example, the RIE method may be used.
- a high mesa structure is used in which etching reaches the Si substrate layer 201.
- the Si substrate layer 201 is not necessarily etched, and the Si core layer 203 is etched. It only has to be.
- the substrate is S i
- the cladding layer is S i 0 2
- the core layer is S i N
- the substrate may be In P
- the clad may be In P
- the core layer may be In Ga AsP as a compound semiconductor system, and of course, a polymer material may be used.
- the optical waveguide cell 80 1 is cut out and then polished, but it may be cleaved.
- FIG. 8 shows a schematic configuration diagram of a gas analyzer as a third embodiment.
- This gas analyzer includes a tunable light source 70 1, an optical waveguide gas cell 70 2 that receives light from the tunable light source 70 1, and a light that detects light emitted from the optical waveguide gas cell 70 2.
- Including detector 7 0 3 The optical waveguide type gas cell 70 2 includes an optical waveguide type cell 8 0 1, an optical waveguide type gas cell 7 0 2 including the optical waveguide type cell 8 0 1, and the intensity of light incident on the optical waveguide type gas cell 7 0 2. Analyze the sample in relation to the intensity of the light emitted from 0 2.
- This gas analyzer has a configuration in which a wavelength tunable light source 70 1, an optical waveguide gas cell 70 2, and a photodetector 70 3 are connected by an optical fiber 70 4.
- FIG. 8 A schematic configuration diagram of the optical waveguide gas cell 70 2 is shown in FIG.
- An optical waveguide cell 80 1, a leading spherical fiber 8 0 2, a gas introduction port 8 0 3, and a gas exhaust port 8 0 4 are provided in the casing 8 0 0.
- a gas sample is introduced into the casing 800.
- a vacuum pump 8 0 5 is connected to the gas discharge port 0 8 0 4 so that the trace gas to be measured introduced from the gas introduction port 0 8 3 is drawn into the housing 8 0 0, and
- a stop valve 8 06 and a pressure gauge 8 0 7 are provided so that the pressure in the housing 8 0 0 can be controlled.
- the optical waveguide cell 80 1 is accommodated in the housing 80 0, and its structure is equivalent to the optical waveguide cell described in the second embodiment.
- the entire casing 800 functions as a gas cell.
- a gas sample is introduced around the detection optical waveguide disposed inside.
- the region sandwiched between the parallel detection optical waveguides but also the region adjacent to the outside of these detection optical waveguides functions as a sample chamber. That is, light absorption of the sample also occurs in the region adjacent to the outside of the detection light waveguide.
- the length of the gas detection waveguide 103 described in the second embodiment is 30 mm
- the curvature of the curved optical waveguide 104 is the radius is set to 5 m, it is assumed that in the optical waveguide type cell of about 3 cm square, the total optical waveguide length of approximately 1 0 2 m even is realized.
- Gas is sucked from the gas inlet port 8 0 3 and the casing 8 0 0 is filled with the gas to be measured.
- Light intensity I from tunable light source 7 0 1 To get. Also, let I be the light intensity detected by the forward detector. I. From the relationship between I and I, the gas absorbance can be obtained. If the gas extinction coefficient is known, the gas concentration can be determined.
- the optical waveguide cell 80 1 constituting the gas analyzing apparatus according to the present embodiment is realized as a part fixed together with the optical fiber in the casing 800. Therefore, its size is within a few centimeters at most, including the case. Compared with the length, it is one to two orders of magnitude smaller and can be easily transported.
- the optical fibers are fixed together, there is no need to worry about misalignment of the optical axis even when transported in the same way as normal optical communication parts, for example, semiconductor lasers. Yes.
- the total optical path length and 1 0 2 m since the compared to conventional space propagation type gas cell set 2 digits or more long, trace gases can be detected with higher sensitivity.
- the gas detection waveguide 1 In this embodiment, in order to obtain sufficient infrared absorption, the gas detection waveguide 1
- the length of 0 3 is set to 3 O mm
- the radius of curvature of the curved optical waveguide 10 4 is set to 5 m
- the total optical waveguide is approximately 10 2 m in the optical waveguide cell 8 0 1 of about 3 cm square.
- the optical waveguide type cell 8 0 1 is realized, the length is not limited to this.
- the length of the gas detection waveguide 10 3, the radius of curvature of the curved optical waveguide 10 4, and the element size are It can be set freely according to the purpose of measurement.
- the tip-spherical fiber is used, but it is not necessary to be limited to this as long as the optical waveguide cell 8101 can be optically coupled.
- the wavelength variable light source is used.
- a broadband light source such as a super luminescent diode may be used.
- a configuration using a photodetector is used, but instead, a device having a function capable of measuring both wavelength and light intensity, such as a spectrum analyzer, or an array grating type waveguide, for example. It is of course possible to simultaneously measure the absorption wavelength and the amount of absorption with high sensitivity by combining a grating and a photodetector.
- the gas analyzer of the present embodiment is configured to combine the wavelength tunable light source 70 1, the optical waveguide gas cell 70 2, and the photodetector 70 3, but this is not a limitation, and all Monolithic integration or hybrid integration may be performed.
- the gas analyzer according to the present embodiment and the computer can be connected, or further connected to a network.
- the computer has material specific data. For example, molar extinction coefficient. Therefore, based on the intensity of the light emitted from the wavelength tunable light source 70 1 by the gas analyzer and the intensity of the light detected by the photodetector 70 3, a minute amount component contained in the gas is detected by the computer. Can be analyzed. Further, a light absorption coefficient can be calculated by creating a calibration curve from the intensity of the light emitted from the wavelength tunable light source 70 1 and the intensity of the light detected by the photo detector 70 3. Furthermore, save the obtained data and You may also look at changes. Thus, by connecting the gas analyzer in this embodiment and the computer, a gas analysis system capable of analyzing the analysis contents can be constructed.
- analysis results can be transmitted from a location remote from the measurement location, and this analysis result can be analyzed and evaluated by a recomputer.
- the optical waveguide cell 80 1 is disposed in the housing 80 0, but instead, in the mobile phone, the variable wavelength light source, the optical waveguide cell, and the photo Of course, detectors can be stacked and arranged.
- this gas analysis system if exhalation is introduced instead of the analysis gas, the concentration of each component contained in the exhalation can be examined. The concentration of gas contained in exhaled air changes depending on the physical condition and illness. Therefore, by using this gas analysis system, it is possible to examine health conditions and diagnose diseases.
- the fourth embodiment is the same as the second embodiment shown in Fig. 2.
- an incident optical waveguide 1001 On the substrate 100, an incident optical waveguide 1001, an optical coupling / branching waveguide 100, and gas detection
- An optical waveguide 10 3 for use, a curved optical waveguide 10 4, and an outgoing optical waveguide 1 0 5 are integrated.
- the waveguide configuration is the same as that of the second embodiment.
- the difference from the second embodiment is that a high reflectivity (HR) film is formed on the end faces of the incident optical waveguide 10 0 1 and the outgoing optical waveguide 1 0 5. It is a point that is formed. In each HR film, a part of the detection light is reflected and the rest is transmitted.
- HR high reflectivity
- the HR film is not particularly limited as long as it reflects and transmits light. Therefore, a semi-reflective film may be formed on different end faces of the incident optical waveguide 101 and the outgoing optical waveguide 105.
- the reflectance of the semi-reflective film can be, for example, 90% or more, or 99.9% or more.
- the HR film is realized by laminating thin films made of different materials in multiple layers. What is important for the performance of HR films is low light absorption and low surface roughness. Therefore, the light absorption of the HR film can be reduced by using a material having low light absorption. Material is also to be appropriately modified by the wavelength used, eg S i 0 2 and oxides such as tantalum pentoxide, may be used a fluoride such as lanthanum fluoride. In the present embodiment, it can be used preferably S io 2.
- a film formation method By polishing the substrate to be used on an ultra-smooth surface and laminating an ultra-smooth film on the surface, a film having a high reflection function can be produced. For example, a very smooth surface can be obtained with a film produced by sputtering.
- this embodiment enables transmission absorption spectroscopy for a trace gas component by light distributed in the gas phase, and the element size is 1 in comparison with a conventional gas cell.
- the same principle applies to the point that cells smaller than an order of magnitude can be realized.
- HR films are formed on the end surfaces of the incident optical waveguide 101 and the outgoing optical waveguide 105. Therefore, the light introduced from the incident optical waveguide 10 1 into the optical waveguide is reflected by the HR film at the end face of the outgoing optical waveguide 10 1 and the end face of the incident optical waveguide 1 0 1.
- the light is reciprocated while attenuating the intensity little by little for each reflection, and when the light is reflected by the HR film, part of the light leaks out of the HR film.
- the intensity of this leaking light decreases exponentially with time, so the light attenuation coefficient can be obtained by plotting the light intensity and time of the leaking light. Since this attenuation coefficient changes according to the concentration of the sample, the concentration of the sample can be obtained from the attenuation coefficient.
- the transmitted and absorbed light from the finally obtained output optical waveguide 105 it is possible to obtain a measurement result equivalent to the transmitted and absorbed light after propagating to about 10 5 m as an effective optical path length. become. Therefore, it is possible to obtain a very small sample concentration.
- an effective optical path length of about 1 OOO m can be obtained. This is a sufficient optical path length to measure a sample with a concentration of about 10 ppm.
- the HR film is formed on different end faces of the incident optical waveguide 10 1 and the outgoing optical waveguide 10 5, but the present invention is not limited to this, and in the same end face direction
- the incident optical waveguide 10 1 and the outgoing optical waveguide 10 5 may be formed, and the HR film may be formed only on the end face.
- the number of high mesas may be two or more, for example, three or five.
- the curved optical waveguide 104 may also be configured as a gas detection optical waveguide in which a plurality of high mesa waveguides are close to each other. At that time, it is possible to omit an unnecessary optical branching waveguide in the meantime.
- the radius of curvature may be, for example, 25 m or 500 m.
- a spot size converter or a tapered optical waveguide for improving the coupling efficiency with the optical fiber may be inserted before and after the incident optical waveguide 101 and the outgoing optical waveguide 10.
- the length of the gas detection optical waveguide 10 3 region is about 1 cm. However, the length is not limited to this, and it may be long or short. For example, it may be 3 cm or 1 mm. It may be.
- the wavelength band used is in the vicinity of the communication wavelength band (1.55 m band), the present invention is not limited to this, and may be, for example, a visible light band or a mid-infrared light band.
- optical coupling / branching waveguide 102 is configured as a normal 1 ⁇ 2 optical coupling / branching waveguide, the present invention is not limited to this.
- the number of branches may be changed according to the number of high-mesa optical waveguides.
- a Si 0 2 film 5 0 2 is deposited on the 5 0 1 layer using a thermal CVD method (FIG. 6 (a)).
- a mask 50 3 is formed in a waveguide shape using a photolithographic method using a stepper (reduced projection exposure) (FIG. 6 (b)).
- etching is performed by an inductively coupled plasma (ICP) method to form a high mesa 60 1 (FIG. 7 (a)).
- ICP inductively coupled plasma
- high mesa 6 0 1 directly above S i 0 2 mask 5 0 3 is removed by organic solvent and ashing method (Fig. 7 (b)).
- the optical waveguide cell 80 1 is cut out and the end face is polished.
- a multilayer HR film is formed on the end face of the incident optical waveguide 101 and the end face of the outgoing optical waveguide 105 using the sputtering method, and the manufacture of the device is completed.
- a stepper is used for lithography, but the present invention is not limited to this.
- electron beam exposure may be used.
- a thermal CVD to S io 2 film type firing method even for example, a plasma CVD method, may be a spa jitter method.
- the mesa formation process method is not limited to the ICP method, and may be the RIE method, for example.
- the etching has a high mesa structure that reaches the Si substrate layer 20 1, but the Si substrate layer 2 0 1 does not necessarily need to be etched, and the Si core layer 2 It is sufficient that 0 3 is etched.
- an SOI substrate, a core layer S i, but the cladding layer is an optical waveguide structure according to S i 0 2, if basically an optical waveguide is constructed material system which It is not necessary to limit to.
- the substrate may be S i
- the cladding layer may be S i 0 2
- the core layer may be S i N
- the compound semiconductor system may be In P
- the cladding is In P
- the core layer is In G A A s P or, of course, a polymer material.
- the optical waveguide cell 81 is cut out and then polished, but it may be cleaved.
- the configuration according to this embodiment is the same as that of the third embodiment shown in FIG. 8, and includes a wavelength tunable light source 70 1, an optical waveguide gas cell 70 2, and a photodetector 7 0 3. It is configured to be connected by optical fibers.
- the configuration of the optical waveguide type gas cell 72 is the same as that of the third embodiment shown in FIG.
- the difference between this embodiment and the third embodiment is that the optical waveguide cell 8 01 constituting the optical waveguide gas cell 70 2 is equivalent to the optical waveguide cell described in the fourth embodiment. It is a point.
- the principle of realizing the gas analyzer according to the fifth embodiment in a portable and compact size will be described.
- the optical waveguide type gas cell 70 2 constituting the gas analyzing apparatus according to the present embodiment is realized as a component fixed together with the optical fiber in the casing 800. . Therefore, it can be easily transported. And since the optical fiber is fixed together, there is no need to worry about misalignment of the optical axis even if it is transported in the same way as normal optical communication parts, such as semiconductor lasers. Yes.
- the effective total optical path length is 10 5 m ⁇ !, which is set at least five orders of magnitude longer than that of ordinary space-propagating gas cells, so that trace gases can be detected with higher sensitivity.
- the length of the gas detection waveguide 10 3, the radius of curvature of the curved optical waveguide 10 4, and the element size may be freely set depending on the purpose of measurement.
- a variable wavelength light source is used.
- a broadband light source such as a super luminescent diode may be used.
- a configuration using a photodetector is used, but instead, a device having a function capable of measuring both wavelength and light intensity, for example, a spectrum analyzer, or an array grating type waveguide grating and a photodetector.
- a device having a function capable of measuring both wavelength and light intensity for example, a spectrum analyzer, or an array grating type waveguide grating and a photodetector.
- the high-reflection mirror is set on both end faces of the optical waveguide cell, the incident light is used as pulsed light, and the decay time of the pulsed light intensity in the emitted light is measured. It is also possible to adopt a configuration that detects a trace amount of gas with high sensitivity by applying a cavity ring-down method that can determine the amount of light absorption.
- the gas analyzer of the present embodiment is configured to combine the wavelength tunable light source 70 1, the optical waveguide gas cell 70 2, and the photodetector 70 3, but this is not a limitation, and all Monolithic integration or hybrid integration may be performed.
- the gas analyzer in this embodiment is connected to a computer, or Furthermore, by connecting to a network, a gas analysis system that can analyze the analysis content can be constructed. If exhalation is introduced instead of analysis gas, in this embodiment, the optical waveguide cell 8 0 1 is arranged in the housing 8 0 0, but instead, the wavelength variable in the mobile phone. Of course, a light source, an optical waveguide cell, and a photodetector can be integrated.
- the sample gas is sucked from the gas inlet port 8 0 3 and the casing 8 0 0 is filled with the gas to be measured.
- Light intensity I from tunable light source 7 0 1 To get. Also, let I be the light intensity detected by the photodetector 70 3. I. From the relationship between I and I, the absorbance of the sample can be obtained, and if the extinction coefficient of the sample is known, the concentration of the sample can be determined.
- FIG. 10 as a sixth embodiment, there is shown a schematic configuration diagram of an optical waveguide of an optical waveguide cell. Similar to the fourth embodiment, on a normal SOI substrate 100, an incident optical waveguide 10.01, an optical coupling waveguide 10.02, a gas detection optical waveguide 10.03, and a curved optical waveguide. 1 0 4, a first outgoing optical waveguide 9 0 5, and a second outgoing optical waveguide 9 0 6 are integrated, and the incident optical waveguide 1 0 1 and the second outgoing optical waveguide 9 A high reflectivity (HR) film is formed. Further, a semiconductor optical amplifier 9 0 1 is hybrid integrated. The waveguide configuration is the same as that of the fourth embodiment, and the difference from the fourth embodiment is that the semiconductor optical amplifier 90 1 is integrated in a hybrid manner.
- HR high reflectivity
- the present embodiment enables transmission absorption spectroscopy for trace gas components by the light distributed in the gas phase, and the element size compared to the conventional gas cell.
- a light cell with an order of magnitude or more can be realized, and the light introduced into the optical waveguide is repeatedly reflected at the end face of the outgoing optical waveguide and the end face of the incident optical waveguide, resulting in an effective optical path length of approximately 10 5 m.
- a measurement result equivalent to the transmitted absorption light after propagating to the extent is obtained.
- semiconductor optical amplifiers are hybrid-integrated. Therefore, even if an excessive propagation loss occurs in the optical waveguide, it is possible to avoid a decrease in signal and measurement sensitivity.
- the HR film is formed on different end faces of the incident optical waveguide 101 and the outgoing optical waveguide.
- the incident optical waveguide 10 1 and the outgoing optical waveguide may be formed on the same, and the HR film may be formed only on the end face.
- the number of high mesas may be two or more, for example, three or five.
- the curved optical waveguide 104 may also be configured as an optical waveguide for gas detection in which a plurality of high mesa waveguides are close to each other. At that time, it is possible to abbreviate unnecessary optical waveguides in between.
- the radius of curvature may be, for example, 25 m or 50 m.
- a spot size converter or a tapered optical waveguide for improving the coupling efficiency with the optical fiber may be inserted before and after the incident optical waveguide and the outgoing optical waveguide.
- the length of the gas detection optical waveguide 10 3 region is about 1 cm. However, the length is not limited to this, and it may be long or short. For example, it may be 3 cm or 1 mm. It may be.
- the semiconductor optical amplifier 90 1 is hybrid-integrated.
- the semiconductor optical amplifier instead of the semiconductor optical amplifier, a super luminescent diode may be used, or instead of the semiconductor optical amplifier 9 0 1, Even in the case of a Fabry-mouth semiconductor laser, it can be configured with high sensitivity.
- the insertion position of the light emitting device such as the semiconductor optical amplifier 5 0 1 may be anywhere as long as it is inside the highly reflective surface. For example, it may be inserted into the incident optical waveguide 1 0 1 side, or the curved optical waveguide 1 0 May be inserted in part of 3.
- the optical waveguide and the light-emitting device are hybrid-integrated.
- the optical waveguide is not limited to the hybrid.
- the optical waveguide is generally used.
- the wavelength band used is in the vicinity of the communication wavelength band (1.55 m band), it is not limited to this, and may be, for example, a visible light band or a mid-infrared light band.
- the optical coupling / branching waveguide 10 0 2 is configured as a normal 1 ⁇ 2 optical coupling / branching waveguide, the present invention is not limited to this.
- the number of branches may be changed according to the number of high-mesa optical waveguides.
- the manufacturing method is the same as that of the second embodiment.
- a Si 0 2 film 502 is deposited on a normal SO I substrate 5001 by using a thermal CVD method (FIG. 6 (a)).
- a mask 503 is formed in the waveguide shape using a photolithographic method using a stepper (reduced projection exposure) (FIG. 6 (b)).
- etching is performed by the inductively coupled plasma (ICP) method to form a high mesa 601 (Fig. 7 (a)).
- ICP inductively coupled plasma
- the Si 0 2 mask 503 immediately above the high mesa 601 is removed by an organic solvent and an ashing method (FIG. 7 (b)).
- the optical waveguide cell 801 is cut out and the end face is polished.
- a multilayer HR film is formed on the end face of the incident optical waveguide 101 and the end face of the outgoing optical waveguide 105 by using the sputtering method, and the semiconductor optical amplifier 501 is hybrid-integrated to complete the device fabrication.
- a stepper is used for lithography, but the present invention is not limited to this.
- electron beam exposure may be used.
- a thermal CVD to S io 2 film type firing method even for example, a plasma CVD method, may be a spa jitter method.
- the mesa formation process method is not limited to the ICP method, and for example, the RIE method may be used.
- the etching has a high mesa structure that reaches the Si substrate layer 201.
- the Si substrate layer 201 is not necessarily etched, and the Si core layer 203 is etched. Just do it.
- the SO I substrate Although the optical waveguide structure has a core layer of S i and a cladding layer of S i 0 2 , the material system is basically not limited to this as long as it is a material system constituting the optical waveguide.
- the substrate may be S i
- the cladding layer may be S i 0 2
- the core layer may be S i N
- the compound semiconductor system may be In P
- the cladding is In P
- the core layer is In G A A s P
- the optical amplifier is hybrid-integrated, but may be monolithically integrated.
- the optical waveguide cell 80 1 is cut out and then polished, but it may be cleaved.
- the configuration is the same as that of the second embodiment shown in FIG. 8, and the wavelength tunable light source 701, the optical waveguide type gas cell 702, and the photodetector 703 are combined with one optical fiber. It is a connected configuration. Since the configuration of the optical waveguide type gas cell 72 is the same as that of the third embodiment shown in FIG. 9, its description is omitted. The difference between the present embodiment and the third embodiment is that the optical waveguide cell 8 01 constituting the optical waveguide gas cell 70 2 is equivalent to the optical waveguide cell described in the sixth embodiment. It is a point.
- the optical waveguide type gas cell 70 2 constituting the gas analyzing apparatus according to the present embodiment is realized as a component fixed together with the optical fiber in the casing 800. . Therefore, it can be easily transported. And since the optical fiber is fixed together, there is no need to worry about misalignment of the optical axis even if it is transported in the same way as normal optical communication parts, such as semiconductor lasers. Yes.
- the effective total optical path length is 10 5 m, which is set at least 5 orders of magnitude longer than that of a normal space propagation gas cell, so that trace gases can be detected with higher sensitivity.
- the optical amplifier is hybrid-integrated in the optical waveguide cell 8 0 1, an excessive propagation loss occurs in the optical waveguide. Even if an excessive loss with the optical fiber occurs, the signal decreases and the measurement is performed. Sensitivity is It is possible to avoid the reduction.
- the length of the gas detection waveguide 10 3, the radius of curvature of the curved optical waveguide 10 4, and the element size may be freely set according to the purpose of measurement.
- the variable wavelength light source is used.
- a broadband light source such as a super luminescent diode or super continuum light may be used.
- a photo detector is used, but instead, a device having a function capable of measuring both the wavelength and the light intensity, such as a spectrum analyzer or an array grating waveguide grating. It is of course possible to measure the absorption wavelength and the amount of absorption at the same time with high sensitivity by combining the photo detector and the photodetector.
- the high-reflection mirrors are set on both end faces of the optical waveguide cell, the incident light is used as pulsed light, and the decay time of the pulsed light intensity in the emitted light is measured. It is also possible to apply a cavity ring-down method that can determine the amount of light absorption, and to detect trace gases with high sensitivity.
- the optical amplifiers are hybrid-integrated, but may be monolithically integrated.
- the gas analyzer of the present embodiment is configured to combine the wavelength tunable light source 70 1, the optical waveguide gas cell 70 2, and the photodetector 70 3, but this is not a limitation, and all Monolithic integration or hybrid integration may be performed.
- a gas analysis system capable of analyzing the analysis contents can be constructed. If exhalation is introduced instead of analysis gas, in this embodiment, the optical waveguide cell 8 0 1 is arranged in the housing 8 0 0, but instead, the wavelength variable in the mobile phone.
- a light source, an optical waveguide cell, and a photodetector can be integrated. A simulation was carried out on the results when a gas sample was quantitatively analyzed using the optical waveguide cell 80 1 shown in the second embodiment (FIG. 2).
- this optical waveguide cell 80 30% of the total amount of light is distributed between the waveguides.
- the total optical waveguide length of the cell was 5 m.
- ammonia-containing air with different concentrations 5, 10 and 20 ppm
- methane-containing air with different concentrations 2500, 500 and 10:00 ppm
- the blank was air containing neither ammonia nor methane.
- the wavelength of the incident light was 1.5 m when the sample was ammonia-containing air, and 1.6 m when the sample was methane-containing air.
- the intensity of the emitted light from the blank and the intensity of the emitted light when each sample was absorbed were examined, and the intensity of the emitted light at the time of sample measurement relative to the intensity of the emitted light from the blank was calculated as the light intensity reduction rate.
- Table 1 shows the results when using ammonia-containing air as a sample.
- Table 2 shows the results when using methane-containing air as a sample.
- the optical waveguide cell 80 1 shown in FIG. 2 was manufactured and evaluated.
- a variable wavelength light source was connected to the incident optical waveguide 10 0 1 using an optical fiber, and a photodetector was connected to the outgoing optical waveguide 1 0 5.
- Sample contains methane Air was prepared and introduced into the optical waveguide cell 8 0 1.
- a light having a wavelength of 1.55 m from a wavelength tunable light source was incident from the incident optical waveguide 10 1, and light emitted from the output optical waveguide 1 0 5 was detected by a photodetector.
- the blank was normal air containing no methane, and the intensity of the emitted light when using the sample and the blank was measured.
- the optical waveguide cell 80 1 shown in FIG. 2 was manufactured and evaluated. Unlike the optical waveguide cell 80 1 used in Example 1, a multilayer HR film is formed on the end face of the incident optical waveguide 101 and the end face of the outgoing optical waveguide 105.
- a variable wavelength light source was connected to the incident optical waveguide 10 0 1 using an optical fiber, and a photodetector was connected to the outgoing optical waveguide 1 0 5.
- methane-containing air was prepared and introduced into the optical waveguide cell 80 1.
- a light having a wavelength of 1.55 m from a wavelength tunable light source was incident from the incident optical waveguide 10 1, and light emitted from the output optical waveguide 1 0 5 was detected by a photodetector.
- the blank was normal air containing no methane, and the intensity of the emitted light when using the sample and the blank was measured.
- gas has been described as an example of the sample.
- the present invention is not limited to this, and a mixed sample of gas and liquid or a liquid sample can also be used.
- the sample chamber has been described by taking a semi-open structure as an example.
- it can be a sealed structure or a sealed structure.
- the region sandwiched between the parallel detection optical waveguides, but also the region adjacent to the outside of these detection optical waveguides functions as the sample chamber. That is, light absorption of the sample occurs also in a region adjacent to the outside of the detection optical waveguide.
- the gap between the first and second detection optical waveguides (the width of the sample chamber) provided in parallel with the sample chamber interposed therebetween is guided by the refractive index of the detection optical waveguide and the waveguide. It is designed according to the wavelength of the light to be transmitted. By setting the gap of the waveguide to a predetermined range, the amount of light distribution in the sample chamber is increased due to optical coupling. However, it is preferable to be less than the sum of the widths of the first and second detection optical waveguides.
- the widths of the first and second detection optical waveguides are equal.
- the width of the first and second detection optical waveguides is x
- the gap between the first and second detection optical waveguides is D
- the intensity of light distributed in the sample chamber between both waveguides can be effectively increased, and as a result, the sample to be measured can be analyzed with high accuracy.
- the interval between the first and second detection optical waveguides is adjusted so that the sample chamber light distribution rate is preferably 10% or more, more preferably 20% or more. Can do.
- the sample chamber light distribution rate can be expressed by the following equation.
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Abstract
Description
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DE112007000644.7T DE112007000644B4 (de) | 2006-03-17 | 2007-03-16 | Analysierelement und mit diesem versehene Analysevorrichtung |
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Also Published As
Publication number | Publication date |
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JP5444711B2 (ja) | 2014-03-19 |
US8917959B2 (en) | 2014-12-23 |
US20090103852A1 (en) | 2009-04-23 |
DE112007000644B4 (de) | 2018-09-27 |
DE112007000644T5 (de) | 2009-02-05 |
JPWO2007108214A1 (ja) | 2009-08-06 |
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