WO2007021549A3 - Ligh emitting diodes with quantum dots - Google Patents
Ligh emitting diodes with quantum dots Download PDFInfo
- Publication number
- WO2007021549A3 WO2007021549A3 PCT/US2006/030111 US2006030111W WO2007021549A3 WO 2007021549 A3 WO2007021549 A3 WO 2007021549A3 US 2006030111 W US2006030111 W US 2006030111W WO 2007021549 A3 WO2007021549 A3 WO 2007021549A3
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- quantum dots
- emitting diodes
- group iii
- matrix
- ligh emitting
- Prior art date
Links
- 239000002096 quantum dot Substances 0.000 title abstract 3
- 239000000956 alloy Substances 0.000 abstract 3
- 229910045601 alloy Inorganic materials 0.000 abstract 3
- 239000011159 matrix material Substances 0.000 abstract 3
- 239000004065 semiconductor Substances 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/02—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies
- H01L33/04—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies with a quantum effect structure or superlattice, e.g. tunnel junction
- H01L33/06—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies with a quantum effect structure or superlattice, e.g. tunnel junction within the light emitting region, e.g. quantum confinement structure or tunnel barrier
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y20/00—Nanooptics, e.g. quantum optics or photonic crystals
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/30—Structure or shape of the active region; Materials used for the active region
- H01S5/32—Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures
- H01S5/323—Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures in AIIIBV compounds, e.g. AlGaAs-laser, InP-based laser
- H01S5/32308—Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures in AIIIBV compounds, e.g. AlGaAs-laser, InP-based laser emitting light at a wavelength less than 900 nm
- H01S5/32341—Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures in AIIIBV compounds, e.g. AlGaAs-laser, InP-based laser emitting light at a wavelength less than 900 nm blue laser based on GaN or GaP
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/30—Structure or shape of the active region; Materials used for the active region
- H01S5/34—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers
- H01S5/341—Structures having reduced dimensionality, e.g. quantum wires
- H01S5/3412—Structures having reduced dimensionality, e.g. quantum wires quantum box or quantum dash
Landscapes
- Engineering & Computer Science (AREA)
- Nanotechnology (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Theoretical Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Mathematical Physics (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Life Sciences & Earth Sciences (AREA)
- Biophysics (AREA)
- Optics & Photonics (AREA)
- Semiconductor Lasers (AREA)
- Led Devices (AREA)
- Luminescent Compositions (AREA)
- Led Device Packages (AREA)
Abstract
An apparatus includes a light-emitting diode. The light-emitting diode has a semiconductor matrix of one or more group III - nitride alloys and quantum dots dispersed inside the matrix. The quantum dots include a group III - nitride alloy different from the one or more group III - nitride alloys of the matrix.
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2008526071A JP2009505399A (en) | 2005-08-11 | 2006-08-02 | Light emitting diode with quantum dots |
EP06789206A EP1913647A2 (en) | 2005-08-11 | 2006-08-02 | Ligh emitting diodes with quantum dots |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US11/202,114 | 2005-08-11 | ||
US11/202,114 US20070034858A1 (en) | 2005-08-11 | 2005-08-11 | Light-emitting diodes with quantum dots |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2007021549A2 WO2007021549A2 (en) | 2007-02-22 |
WO2007021549A3 true WO2007021549A3 (en) | 2007-04-19 |
Family
ID=37533263
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/US2006/030111 WO2007021549A2 (en) | 2005-08-11 | 2006-08-02 | Ligh emitting diodes with quantum dots |
Country Status (5)
Country | Link |
---|---|
US (1) | US20070034858A1 (en) |
EP (1) | EP1913647A2 (en) |
JP (1) | JP2009505399A (en) |
KR (1) | KR20080029977A (en) |
WO (1) | WO2007021549A2 (en) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100682928B1 (en) * | 2005-02-03 | 2007-02-15 | 삼성전자주식회사 | Energy downconversion film and quantum dot film comprising quantum dot |
US7348212B2 (en) * | 2005-09-13 | 2008-03-25 | Philips Lumileds Lighting Company Llc | Interconnects for semiconductor light emitting devices |
US20080218068A1 (en) * | 2007-03-05 | 2008-09-11 | Cok Ronald S | Patterned inorganic led device |
KR101704022B1 (en) * | 2010-02-12 | 2017-02-07 | 엘지이노텍 주식회사 | Light emitting device, method for fabricating the same and light emitting device package |
JP5732410B2 (en) * | 2012-01-05 | 2015-06-10 | 富士フイルム株式会社 | Method for forming quantum dot structure, wavelength conversion element, light-to-light conversion device, and photoelectric conversion device |
GB2573576B (en) * | 2018-05-11 | 2020-06-10 | Rockley Photonics Ltd | Optoelectronic device and method of manufacturing thereof |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20030059971A1 (en) * | 2001-09-27 | 2003-03-27 | Chua Soo Jin | Forming indium nitride (InN) and indium gallium nitride (InGaN) quantum dots grown by metal-organic-vapor-phase-epitaxy (MOCVD) |
US20040131097A1 (en) * | 2003-01-07 | 2004-07-08 | Deppe Dennis G | Optoelectronic and electronic devices based on quantum dots having proximity-placed acceptor impurities, and methods therefor |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5625202A (en) * | 1995-06-08 | 1997-04-29 | University Of Central Florida | Modified wurtzite structure oxide compounds as substrates for III-V nitride compound semiconductor epitaxial thin film growth |
US5831277A (en) * | 1997-03-19 | 1998-11-03 | Northwestern University | III-nitride superlattice structures |
US6558995B1 (en) * | 1998-07-31 | 2003-05-06 | Emory University | Holographic, laser-induced fabrication of indium nitride quantum wires and quantum dots |
DE10218409A1 (en) * | 2002-04-24 | 2003-11-06 | Merck Patent Gmbh | Process for the production of nitrides |
AU2003274409A1 (en) * | 2003-08-08 | 2005-02-25 | Centre National De La Recherche Scientifique (C.N.R.S.) | Method to manufacture indium nitride quantum dots |
KR101119019B1 (en) * | 2004-12-14 | 2012-03-12 | 주식회사 엘지실트론 | GaN semiconductor and manufacturing methods for the same |
-
2005
- 2005-08-11 US US11/202,114 patent/US20070034858A1/en not_active Abandoned
-
2006
- 2006-08-02 EP EP06789206A patent/EP1913647A2/en not_active Withdrawn
- 2006-08-02 KR KR1020077030815A patent/KR20080029977A/en not_active Application Discontinuation
- 2006-08-02 WO PCT/US2006/030111 patent/WO2007021549A2/en active Application Filing
- 2006-08-02 JP JP2008526071A patent/JP2009505399A/en active Pending
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20030059971A1 (en) * | 2001-09-27 | 2003-03-27 | Chua Soo Jin | Forming indium nitride (InN) and indium gallium nitride (InGaN) quantum dots grown by metal-organic-vapor-phase-epitaxy (MOCVD) |
US20040131097A1 (en) * | 2003-01-07 | 2004-07-08 | Deppe Dennis G | Optoelectronic and electronic devices based on quantum dots having proximity-placed acceptor impurities, and methods therefor |
Non-Patent Citations (1)
Title |
---|
YASUHIKO ARAKAWA: "Progress in GaN-Based Quantum Dots for Optoelectronics Applications", IEEE JOURNAL OF SELECTED TOPICS IN QUANTUM ELECTRONICS, IEEE SERVICE CENTER, PISCATAWAY, NJ, US, vol. 8, no. 4, July 2002 (2002-07-01), XP011066167, ISSN: 1077-260X * |
Also Published As
Publication number | Publication date |
---|---|
KR20080029977A (en) | 2008-04-03 |
JP2009505399A (en) | 2009-02-05 |
WO2007021549A2 (en) | 2007-02-22 |
US20070034858A1 (en) | 2007-02-15 |
EP1913647A2 (en) | 2008-04-23 |
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