WO2007008265A8 - Apparatus and method for in situ and ex situ measurement of spatial impulse response of an optical system using phase-shifting point-diffraction interferometry - Google Patents

Apparatus and method for in situ and ex situ measurement of spatial impulse response of an optical system using phase-shifting point-diffraction interferometry

Info

Publication number
WO2007008265A8
WO2007008265A8 PCT/US2006/013330 US2006013330W WO2007008265A8 WO 2007008265 A8 WO2007008265 A8 WO 2007008265A8 US 2006013330 W US2006013330 W US 2006013330W WO 2007008265 A8 WO2007008265 A8 WO 2007008265A8
Authority
WO
Grant status
Application
Patent type
Prior art keywords
optical system
impulse response
situ
spatial impulse
phase
Prior art date
Application number
PCT/US2006/013330
Other languages
French (fr)
Other versions
WO2007008265A3 (en )
WO2007008265A2 (en )
Inventor
Henry A Hill
Original Assignee
Zetetic Inst
Henry A Hill
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date

Links

Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01JMEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRA-RED, VISIBLE OR ULTRA-VIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J9/00Measuring optical phase difference; Determining degree of coherence; Measuring optical wavelength
    • G01J9/02Measuring optical phase difference; Determining degree of coherence; Measuring optical wavelength by interferometric methods
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00Instruments as specified in the subgroups and characterised by the use of optical measuring means
    • G01B9/02Interferometers for determining dimensional properties of, or relations between, measurement objects
    • G01B9/02015Interferometers for determining dimensional properties of, or relations between, measurement objects characterised by a particular beam path configuration
    • G01B9/02022Interferometers for determining dimensional properties of, or relations between, measurement objects characterised by a particular beam path configuration contacting one object by grazing incidence
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00Instruments as specified in the subgroups and characterised by the use of optical measuring means
    • G01B9/02Interferometers for determining dimensional properties of, or relations between, measurement objects
    • G01B9/02015Interferometers for determining dimensional properties of, or relations between, measurement objects characterised by a particular beam path configuration
    • G01B9/02024Measuring in transmission, i.e. light traverses the object
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00Instruments as specified in the subgroups and characterised by the use of optical measuring means
    • G01B9/02Interferometers for determining dimensional properties of, or relations between, measurement objects
    • G01B9/02055Interferometers for determining dimensional properties of, or relations between, measurement objects characterised by error reduction techniques
    • G01B9/02056Passive error reduction, i.e. not varying during measurement, e.g. by constructional details of optics
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00Instruments as specified in the subgroups and characterised by the use of optical measuring means
    • G01B9/02Interferometers for determining dimensional properties of, or relations between, measurement objects
    • G01B9/02055Interferometers for determining dimensional properties of, or relations between, measurement objects characterised by error reduction techniques
    • G01B9/02056Passive error reduction, i.e. not varying during measurement, e.g. by constructional details of optics
    • G01B9/02057Passive error reduction, i.e. not varying during measurement, e.g. by constructional details of optics by using common path configuration, i.e. reference and object path almost entirely overlapping
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Exposure apparatus for microlithography
    • G03F7/70483Information management, control, testing, and wafer monitoring, e.g. pattern monitoring
    • G03F7/70591Testing optical components
    • G03F7/706Aberration measurement
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01JMEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRA-RED, VISIBLE OR ULTRA-VIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J9/00Measuring optical phase difference; Determining degree of coherence; Measuring optical wavelength
    • G01J9/02Measuring optical phase difference; Determining degree of coherence; Measuring optical wavelength by interferometric methods
    • G01J2009/0223Common path interferometry; Point diffraction interferometry

Abstract

A point diffraction interferometer for measuring properties of a spatial impulse response function, the interferometer including: a source for generating a source beam; an optical system; an optical element including a test object located in an object plane of the optical system, the test object including a diffraction point for generating from the source beam a measurement beam that passes through the optical system, wherein the optical element also generates from the source beam a reference beam that is combined with the measurement beam to generate an interference pattern in an image plane of the optical system, the interference pattern representing the spatial impulse response function of the optical system.
PCT/US2006/013330 2005-04-11 2006-04-10 Apparatus and method for in situ and ex situ measurement of spatial impulse response of an optical system using phase-shifting point-diffraction interferometry WO2007008265A3 (en)

Priority Applications (8)

Application Number Priority Date Filing Date Title
US67021805 true 2005-04-11 2005-04-11
US60/670,218 2005-04-11
US71102005 true 2005-08-24 2005-08-24
US60/711,020 2005-08-24
US71425805 true 2005-09-06 2005-09-06
US60/714,258 2005-09-06
US73710205 true 2005-11-15 2005-11-15
US60/737,102 2005-11-15

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP20060799903 EP1869399A2 (en) 2005-04-11 2006-04-10 Apparatus and method for in situ and ex situ measurement of spatial impulse response of an optical system using phase-shifting point-diffraction interferometry
JP2008506577A JP2008538006A (en) 2005-04-11 2006-04-10 Apparatus and method for insitu measured and exsitu measurement of spatial impulse response of the optical system using a phase shift point diffraction interferometry

Publications (3)

Publication Number Publication Date
WO2007008265A2 true WO2007008265A2 (en) 2007-01-18
WO2007008265A8 true true WO2007008265A8 (en) 2007-03-22
WO2007008265A3 true WO2007008265A3 (en) 2008-01-17

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2006/013330 WO2007008265A3 (en) 2005-04-11 2006-04-10 Apparatus and method for in situ and ex situ measurement of spatial impulse response of an optical system using phase-shifting point-diffraction interferometry

Country Status (3)

Country Link
US (1) US7508527B2 (en)
EP (1) EP1869399A2 (en)
WO (1) WO2007008265A3 (en)

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JP2008249691A (en) * 2007-03-08 2008-10-16 Advanced Lcd Technologies Development Center Co Ltd Device and method for measuring aberration
JP6180909B2 (en) * 2013-12-06 2017-08-16 東京エレクトロン株式会社 Method of determining the distance, a method of neutralizing the electrostatic chuck, and a processing unit
US9810893B2 (en) * 2014-03-27 2017-11-07 The Board Of Trustees Of The Leland Stanford Junior University Phase mask imaging with characterization of rotational mobility

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Also Published As

Publication number Publication date Type
US7508527B2 (en) 2009-03-24 grant
EP1869399A2 (en) 2007-12-26 application
WO2007008265A3 (en) 2008-01-17 application
WO2007008265A2 (en) 2007-01-18 application
US20060250620A1 (en) 2006-11-09 application

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