WO2006135247A1 - A data storage device - Google Patents

A data storage device Download PDF

Info

Publication number
WO2006135247A1
WO2006135247A1 PCT/NO2006/000216 NO2006000216W WO2006135247A1 WO 2006135247 A1 WO2006135247 A1 WO 2006135247A1 NO 2006000216 W NO2006000216 W NO 2006000216W WO 2006135247 A1 WO2006135247 A1 WO 2006135247A1
Authority
WO
WIPO (PCT)
Prior art keywords
memory
read
unit
data storage
contact means
Prior art date
Application number
PCT/NO2006/000216
Other languages
French (fr)
Inventor
Per BRÖMS
Christer Karlsson
Geirr I. Leistad
Per Hamberg
Staffan BJÖRKLID
Johan Carlsson
Göran Gustafsson
Hans Gude Gudesen
Original Assignee
Thin Film Electronics Asa
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Thin Film Electronics Asa filed Critical Thin Film Electronics Asa
Priority to EP06747668A priority Critical patent/EP1891583B1/en
Priority to US11/917,571 priority patent/US8184467B2/en
Priority to AT06747668T priority patent/ATE525706T1/en
Priority to JP2008516772A priority patent/JP4782196B2/en
Publication of WO2006135247A1 publication Critical patent/WO2006135247A1/en

Links

Classifications

    • GPHYSICS
    • G06COMPUTING; CALCULATING OR COUNTING
    • G06KGRAPHICAL DATA READING; PRESENTATION OF DATA; RECORD CARRIERS; HANDLING RECORD CARRIERS
    • G06K7/00Methods or arrangements for sensing record carriers, e.g. for reading patterns
    • G06K7/0013Methods or arrangements for sensing record carriers, e.g. for reading patterns by galvanic contacts, e.g. card connectors for ISO-7816 compliant smart cards or memory cards, e.g. SD card readers
    • G06K7/0021Methods or arrangements for sensing record carriers, e.g. for reading patterns by galvanic contacts, e.g. card connectors for ISO-7816 compliant smart cards or memory cards, e.g. SD card readers for reading/sensing record carriers having surface contacts
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B82NANOTECHNOLOGY
    • B82YSPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11BINFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B9/00Recording or reproducing using a method not covered by one of the main groups G11B3/00 - G11B7/00; Record carriers therefor
    • G11B9/02Recording or reproducing using a method not covered by one of the main groups G11B3/00 - G11B7/00; Record carriers therefor using ferroelectric record carriers; Record carriers therefor
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C11/00Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
    • G11C11/21Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements
    • G11C11/22Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using ferroelectric elements
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C11/00Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
    • G11C11/56Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using storage elements with more than two stable states represented by steps, e.g. of voltage, current, phase, frequency
    • G11C11/5664Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using storage elements with more than two stable states represented by steps, e.g. of voltage, current, phase, frequency using organic memory material storage elements
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C13/00Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00
    • G11C13/0002Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00 using resistive RAM [RRAM] elements
    • G11C13/0009RRAM elements whose operation depends upon chemical change
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C13/00Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00
    • G11C13/0002Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00 using resistive RAM [RRAM] elements
    • G11C13/0009RRAM elements whose operation depends upon chemical change
    • G11C13/0014RRAM elements whose operation depends upon chemical change comprising cells based on organic memory material
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C13/00Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00
    • G11C13/0002Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00 using resistive RAM [RRAM] elements
    • G11C13/0009RRAM elements whose operation depends upon chemical change
    • G11C13/0014RRAM elements whose operation depends upon chemical change comprising cells based on organic memory material
    • G11C13/0016RRAM elements whose operation depends upon chemical change comprising cells based on organic memory material comprising polymers
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11BINFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B9/00Recording or reproducing using a method not covered by one of the main groups G11B3/00 - G11B7/00; Record carriers therefor
    • G11B9/12Recording or reproducing using a method not covered by one of the main groups G11B3/00 - G11B7/00; Record carriers therefor using near-field interactions; Record carriers therefor
    • G11B9/14Recording or reproducing using a method not covered by one of the main groups G11B3/00 - G11B7/00; Record carriers therefor using near-field interactions; Record carriers therefor using microscopic probe means, i.e. recording or reproducing by means directly associated with the tip of a microscopic electrical probe as used in Scanning Tunneling Microscopy [STM] or Atomic Force Microscopy [AFM] for inducing physical or electrical perturbations in a recording medium; Record carriers or media specially adapted for such transducing of information
    • G11B9/1418Disposition or mounting of heads or record carriers
    • G11B9/1427Disposition or mounting of heads or record carriers with provision for moving the heads or record carriers relatively to each other or for access to indexed parts without effectively imparting a relative movement
    • G11B9/1436Disposition or mounting of heads or record carriers with provision for moving the heads or record carriers relatively to each other or for access to indexed parts without effectively imparting a relative movement with provision for moving the heads or record carriers relatively to each other
    • G11B9/1454Positioning the head or record carrier into or out of operative position or across information tracks; Alignment of the head relative to the surface of the record carrier

Definitions

  • a data storage device A data storage device
  • the present invention concerns a data storage device comprising a card-like memory unit and a read/write unit provided as physically separate units.
  • the first is to use a magnetic material that is read and written using an external read/write unit
  • the second is to use printed bar codes that are a form of read-only memories being read by optical methods
  • the third is to use chip-based memories such as flash memories.
  • the different techniques all have their strengths and weaknesses.
  • the chip based memories e.g. SIM-cards
  • the chip-based memories include the drive circuits and control logic on the memory device, causing high manufacturing costs.
  • the chip-based memories require transistors to be present on the memory devices something which results in that the number of possible manufacturing methods is limited. In practice they are all built on Si wafers.
  • the magnetic stripes are re-writeable, but bar codes are not.
  • Magnetic stripes as used today, are read by an external unit that has a relative speed compared to the memory device, while bar codes are normally read while the read unit and the memory device are at rest.
  • the bar codes are very low cost printed devices, while the magnetic stripe must be manufactured in a controlled environment and later laminated inside the target item.
  • the data densities of the bar codes are very low, and the data capacity of the magnetic stripes is limited by the length of the stripe since it is read using a constant relative speed between the memory and the read/write unit. In practice the storage capacity of magnetic stripes are limited to not much more than a few hundred bytes.
  • the drawbacks of the magnetic stripes such as limited data content, high manufacturing costs and the need for a relative speed between the memory device and the read/write equipment are inherent and undesirable.
  • the object of the present invention is to provide an improved memory card which avoids the above-mentioned disadvantages of existing memory cards, but which retains any advantages thereof in addition to providing an increased storage capacities, high reliability and lower fabrication cost.
  • Another object of the present invention is to provide such memory cards based on data-storage technologies which hitherto has been applied only to more advanced data storage systems.
  • a further object is to provide such memory card wherein data are stored and input and output by electrical means.
  • a final, but important object of the invention is to be able to employ novel materials including organic ones for the memory media, and which moreover can be processed by fabrication methods which do not impair the performance.
  • the memory unit comprises a patterned or unpatterned layer of a memory material capable of attaining at least two distinct physical states and/or being set to either thereof or switched therebetween upon applying an electric field across the memory material, wherein said at least two distinct physical states are characterized by an impedance value or a polarization value, wherein the electric field is applied at specific positions and with a specific direction so as to define a memory cell with a determined extension in a volume of the memory material at the specific position for storing a datum given by a logical value as assigned to the distinct physical state set in the memory cell by the applied electric field, wherein the logical value can be detected and read by applying a potential difference across the memory cell, wherein the memory unit comprises one or more linear arrays of memory cells provided in a patterned or unpatterned layer of memory material, one or more bottom electrodes provided interfacing a bottom surface of the memory layer, wherein each said one or more bottom electrodes comprises one contact
  • figure 1 schematically shows the basic building blocks of a memory cell, as may be used in the present invention
  • figure 2 schematically the basic building blocks of a bilayer memory cell, as may be used in the present invention
  • figure 3 a first embodiment of a memory unit according to the present invention
  • figures 4a, 4b a first embodiment of the data storage device according to the present invention
  • figure 5 a second embodiment of a memory unit according to the present invention
  • figure 6 a third embodiment of a memory unit according to the present invention
  • figure 7a a second embodiment of the data storage device according to the present invention
  • figures 7b, 7c details of the data storage device in fig.
  • a memory cell which can be used in the memory unit in the present invention shall now be discussed with reference to fig. 1.
  • the memory cell is built on a smooth and non-conductive substrate 1 , which moreover shall not react with the material of a thereabove provided bottom electrode 2, but apart from that the substrate can be made from a number of candidate materials, rigid as well as flexible and including e.g. silicon wafers, polymer film, paper, coated metal foils and so on.
  • the memory cell is structured as a stack of essentially thin-film layers. These are from the substrate and up, the bottom electrode 2, the memory material or film 4 and a top electrode 5.
  • interlayers 3 a can be provided between the memory material 4 and/or the bottom and top electrodes 2;5 respectively.
  • the memory material 4 can be a composite or a mixture or various materials giving the overall memory material its overall functionality for storing and retaining data.
  • an optional protection layer 6 can be provided on the top of the memory cell structure.
  • This overall finished stacked thin- film structure conforms to the component 7, and it is indicated how a vertical stack of such memory cells can be formed by simply placing such memory cell components 7 on the top of each other. It is also evident that such memory cell structures can be provided juxtaposed on one and the same substrate to form memory cell arrays of various configurations and in various geometrical arrangements.
  • top and bottom electrodes must be suitably patterned such that each memory cell can be selected and addressed individually for a data storage or data retrieval operation.
  • this is achieved by patterning for instance the bottom electrodes as a set of parallel stripe-like electrodes and then patterning the top electrodes as a set of likewise parallel stripe electrodes, but oriented orthogonally to the bottom electrodes, such that it is possible to define a memory cell in the volume of memory material between the crossing of a top and bottom electrode.
  • the memory cell structure could be formed as a bilayer structure as shown in fig. 2.
  • a bottom electrode 2 is deposited on the substrate 1 and it now follows a first memory layer 4 l5 a common electrode layer 8, followed by a second memory layer 4 2 and the structure is finally capped with the top electrode 5.
  • Two memory cells are thus defined in this structure and it is seen that the common electrode 8 respectively forms the top electrode of the first cell, while it is also the bottom electrode of the second cell.
  • a first preferred embodiment of a memory unit according to the present invention is shown in fig. 3.
  • Memory material 4 is deposited on the bottom electrode 2, which also incorporates contact means 9 indicated simply by the x.
  • the top electrode 3 is shown as a row of a number of patterned electrodes 5 deposited on the memory material or memory layer 4. These separate electrodes 5 also form the contact means 9 2 of the memory cells, and it can generally de described as a unit with a linear array of memory cells formed in the memory layer 4 between the contact means 9 2 and the bottom electrode 2.
  • FIG. 4a shows how the contact means of the memory unit 10 is contacted by moving e.g. the hand-held read/write unit 11 down to contact the memory unit 10.
  • the read/write unit 11 comprises contact means 12 e.g. in the form of contact pins or pads and provided in a contact portion thereof.
  • the contact means are provided in a geometrical arrangement or pattern to furnish an exact match with the contact means 9 on the memory unit 10. It should be noted that in figs.
  • the contact means 9i at point x of the bottom electrode 2 is included in the linear array of contact means 9 such that when contact means 12 on the read/write unit 11 engage with the corresponding contact means 9 in the memory unit 10, an electric circuit is established through the memory cells of the memory unit 10.
  • the read/write unit 11 can also be a mechanically moved unit and as such a part of e.g. a terminal device or the like.
  • the read/write unit 10 as stated may comprise the required circuitry for driving, sensing and control, but this circuitry could also be part of a peripherial unit not shown in fig. 4a or 4b and then the read write unit should be connected thereto via appropriate means such as cord 13.
  • the embodiment as shown in figs. 3 and 4a, b is regarded as suitable for data storage applications where the storage capacity requirement is low.
  • a second embodiment of the memory unit 10 of the data storage device according to the present invention is shown in fig. 5.
  • the memory cells are defined as a linear array in the memory layer 4 (shaded in the figure) and each memory cell is provided with a bottom electrode 2 with contact means 9i forming a row along the side of memory layer 4 on one side thereof.
  • Each memory cell is also provided with a top electrode 5 on the opposite surface of the memory layer 4 and with similar contact means provided 9 2 along a side of the memory layer 4 and opposite the contact means 9 ⁇ of the bottom electrodes 2.
  • FIG. 6 A third embodiment of a memory unit in the data storage device according to the present invention is shown in fig. 6.
  • This embodiment resembles that in fig. 5, but now all the memory material has been provided in two parallel stripe-like layers 4 1? 4 2 such that two linear arrays of memory cells can be formed in the memory unit.
  • Bottom electrodes 2 are provided such that they are common to pairs of memory cells, with each cell of the pair being located in the respective layer 4 l5 4 2 of memory material in the manner shown.
  • the contact means 9 of the bottom electrodes are provided in the gap between the parallel memory layers 4 1? 4 2 .
  • a separate top electrode 5 with the contact means 9 2 provided in a row along side edges of respective memory layers 4.
  • the read/write unit 11 for a stationary addressing operation shall comprise contacts in the form of contact pins or contact pads provided in a geometrical arrangement and patterned exactly similar to the geometrical pattern of the contact means 9i, 9 2 of the embodiments in fig. 5 and 6.
  • the addressing of memory units corresponding to the embodiments in figs. 5 and 6 shall now be discussed with reference to figs. 7a-c and fig. 8.
  • Fig. 7a depicts a second embodiment of the data storage device of the invention and with the memory unit 10 provided with a substrate 1 and contact pads 9 as shown in the surface of the memory unit 10.
  • a hand-held read/write unit 11 is now translated in a sliding movement along the memory unit 10 and shall in succession contact the contact means 9. It is also of course to be understood that the read/write unit 11 need not be hand-held unit, but can be moved by mechanical means.
  • Fig. 7b provides a side view of the operation of the read/write unit 11 in fig. 7a.
  • the components are of course the same as already shown in fig. 7a but now with the addition of sliding contacts 12 incorporated in the read/write unit 11.
  • the sliding contact means 12 could be realized as shown in fig. 7b as two or more leaf springs and shall then providing adequate contact when a hand-held read/write unit 11 is translated in a sliding movement.
  • the positions of the sliding contacts in the read/write unit 11 of course must correspond to the row arrangement of the contacts 9 in either figs. 5 or fig. 6.
  • contacts in the form of rollers and the like could also be provided, of course dependent on the arrangement of the contact pads in the memory unit.
  • FIG. 7c shows the memory unit 10 and the read/write unit 11 viewed in the direction of a motion and with the same components labelled as before.
  • the memory unit 10 also here corresponds to one of the embodiments shown in figs. 5 and 6 with contact pads 9 in the memory unit 10 being engaged by respective sliding contacts 12 mounted in a read/write head of the read/write unit 11.
  • the sliding contacts 12 can be leaf springs.
  • Fig. 8 shows the memory unit 10 of the invention used with a stationary read/write unit 11 which of course also forms part of the data storage device of the invention, but otherwise would resemble fixed stationary units as known in the art for reading conventional memory cards such as magnetic cards and the like.
  • the card-like memory unit 10 is as in the prior art inserted in a slot on the stationary read/write unit 11, and the addressing operation is carried out in a sliding movement as the contact means of the memory unit 10 engages corresponding; for instance sliding contact means in the read/write unit 11.
  • the read/write unit 10 is a hand-held unit, it is translated in sliding contact with the memory unit 10.
  • the scale of the contact means and the arrangement of the memory cell arrays are such that it is no problem to maintain the appropriate engagement and physical contact for obtaining a reliable addressing even with a hand-moved read/write unit 11.
  • a fourth embodiment of the memory unit according to the invention is shown in fig. 9.
  • a single bottom electrode 2 with contact means 9, is provided as a common word line for all memory cells provided in a single linear array in the memory layer 4.
  • the top electrodes 5 are provided orthogonally to the common bottom electrode 2 on the opposite side of the memory layer and with the contact means 9 2 provided alongside the periphery of the layer 4 of memory material.
  • the contact means 9 easily allows for a stationary contact in a suitable engagement with a read/write unit 11 comprising contact means in the form of e.g. contact pins or contact pads in a geometric arrangement corresponding to the geometric arrangement of the contact means 9 in the memory unit 10 as depicted in fig. 9.
  • both the word line electrodes 2 and the bit line electrodes 2 are contacted simultaneously in a stationary engagement between the memory unit 10 and the read/write unit 11.
  • the read/write unit 11 will employ sliding contact means 12 similar to those in fig. 7b or 7c.
  • a fifth embodiment of the memory unit according to the invention is shown in fig. 10.
  • This memory unit 10 resembles a so-called matrix-addressable array that are used in various types of semiconductor memories, as well known to a person skilled in the art.
  • a first set of parallel stripe-like bottom electrodes 2 are provided on one side of a global layer 4 of memory material.
  • the parallel stripe-like bottom electrodes 2 form the word lines in a memory matrix and terminate in contact means 9 l5 as before.
  • the top electrodes 5 are provided on the opposite surface of the memory layer 4 and with parallel stripe-like electrodes oriented orthogonally to the word line electrodes and forming bit lines in the memory matrix and likewise terminated in contact means 9 2 .
  • Fig. 10b is a side view of the embodiment in fig. 10a with the bottom (word-line) electrodes 2 and the top (bit-line) electrodes 5 separated by the memory layer 4.
  • the memory unit structurally resembles a matrix-addressable memories as known in the art, no driving or multiplexing circuitry are included therein and hence its capacity is limited only by the number of contact pads.
  • the ratio between the number of the word lines and bit lines can be freely chosen, for instance as 1 :N, where N is the number of bit lines, an embodiment that corresponds to the memory unit shown in fig. 9 as a square matrix, i.e. N-N matrix with equal numbers of word lines and bit lines 2;5, and finally, as a rectangular M-N matrix, with M word lines and N bit lines 2;5 such that M ⁇ N.
  • n— 1 the number of data bits that can be stored will be equal to n— 1.
  • the number of data bits that can be stored correspondingly shall be n 2 /4.
  • the square matrix comprises 64 bit spots and hence can store 64 data bits.
  • An increasing number of memory cells and contact means in the memory unit 10 as used in the data storage device according to the invention requires more accurate procedures to handle the engagement between the memory unit and the read/write unit 11 to obtain a high-quality addressing operation.
  • a read/write unit 11 as depicted in either of the figs. 1 Ia or 1 Ib be used.
  • the contact means 9 are provided as a separate array 14 outside the memory cell matrix 9 comprising the memory layer 4.
  • This array 14 can of course be regarded as composed of separate parallel linear contact arrays constituting either rows or columns of the matrix depending on agreed convention. The detailed layout of the memory matrix and the contact means array shall be explained immediately below.
  • the array of contact means 15 in the read/write unit can be easily controlled to carefully land on the corresponding contact means 9 in the memory unit as depicted in fig. l ib. As shown in fig. l ie the contact means provided in the array 14 are connected to the bit line and word line electrodes of the memory matrix 13 by a suitable routing of contact lines 16.
  • the matrix 14 comprises 16 contact means.
  • Another arrangement of the contact means 9 for a memory cell matrix 14 is shown in fig. 1 Id and here the contact means are provided on the periphery of the memory cell matrix and alternating from side to side as shown.
  • the contact means 15 of the read/write unit 11 shall be correspondingly disposed.
  • the advantage of using a separate array 14 for the contact means 9 is that it is in no way limited by the size of the memory cell matrix 14 or has to scale to its dimensions. The memory cell matrix 14 can indeed be made very small.
  • a matrix-addressable array of for instance ferroelectric or resistive memory cells the latter can be provided (i.e. pixellated) with pitches in the range of 0.2 ⁇ m and even less, such that a memory layer area of say only a square millimetre easily could accommodate millions or memory cells. If the storage capacity is not that large, features can also be made larger making fabrication easier and less costly, and lessen the amount of production and quality controls needed to ensure high quality products as whole, as more faults and defects are likely to occur with reduced line widths and pitches.
  • the contact array could be made large to ensure reliable operation.
  • This possibility of scaling a contact array is facilitated by the fact that the number of contacts scales as M+N, i.e. the sum of word lines and bit lines (bottom and top electrodes 2;5), while a number of memory cells scales as M-N.
  • M+N the sum of word lines and bit lines
  • M-N the number of memory cells scales as M-N.
  • this is achieved by using a stepped and staggered arrangement of the memory layers allowing the contact means to be located in a suitable geometric arrangement outside the area occupied by the memory layers 4 and in the vicinity of the edge portions of the memory unit 10 as shown in plan view of fig. 12b. Due to the staggered arrangement the memory layer 4 ⁇ in the subunit 10a can have a larger storage capacity then the memory layer 4 2 in the subunit 10b. Otherwise is the embodiment shown in figs. 12a and 12b would present the same appearance to the user and the read/write unit of the invention as a card-like memory unit with a single memory layer. The actual arrangement of the memory and a geometrical arrangement of the memory matrix and the contact means in either subunits 10a, 10b in figs.
  • the electrodes could be manufactured using metal deposited and patterned by any standard method such as evaporation, sputtering, and photolithographic techniques or using e.g. polymer based conductive inks deposited by e.g. inkjet, flexo-printing or any other appropriate technique.
  • the memory film could be deposited by spin-coating a layer of electric film between the two electrode layers.
  • Other techniques such as inkjet, flexo- printing, evaporation etc can also be used to deposit the electric memory layer.
  • the read/ write unit has two main tasks. The first is to generate the needed voltage waveforms to control the read and write of the memory cells. The second is to sense the state of the memory cells during read.
  • the operation of the memory requires that well controlled voltage waveforms both in time and magnitude are applied to the electrodes. This can be achieved either with standard discrete electronic components or with an application specific integrated circuit. If the memory material is a ferroelectric material large enough applied voltage will force the dipoles in the ferroelectric memory film to align in the direction of the electric field between the electrodes, thus storing information in the polarization direction of the material. Basic information on the operation of ferroelectric memory cells is available in the literature.
  • a material having resistive impedance characteristics can have its resistance set by an applied external field thus being able to store data represented by stable resistance values.
  • a memory material of this kind for instance a metal-organic salt like M(TCNQ) could be used to realize multibit memory cells.
  • the sense circuitry shall make a decision on the state of the memory cell based on the amount of charge coming from the cell due to the charge displacement in the ferroelectric material during the read voltage pulse. This can e.g. be done with a simple Sawyer tower configuration or with a current integrator, both of which can be realised with discrete circuits. For large capacity memories however, it may be worthwhile to construct an application specific integrated circuit to do this.
  • the memory material of the data storage device of the invention is a ferroelectric or electret material capable of being polarized in either of two remanent polarization states and exhibiting hysteresis
  • a datum is stored in a memory cell by assigning a logical value to either of its remanent polarization states, i.e. the negative or positive polarization state.
  • Read and write operations are carried out on the hysteresis curve by applying electric fields of suitable strength over the memory cell, whereby a switching of the polarization state can be effected by applying a field with a coercive field strength higher than that of a memory cell and a direction opposite the polarization vector of the memory cell.
  • ferroelectric materials properly are a subclass of electret materials.
  • a number of candidate ferroelectric materials well known to a person skilled in the art may include inorganic ceramic materials such as lead zirconate titanate (PZT) or more preferable organic and easily printable ferroelectric oligomers, polymers, or co-oligomers including the well-known poly(vinylidene fluoride-trifluoroethylene) which presently is the most commonly used organic ferroelectric material.
  • PZT lead zirconate titanate
  • ferroelectric oligomers such as lead zirconate titanate (PZT) or more preferable organic and easily printable ferroelectric oligomers, polymers, or co-oligomers including the well-known poly(vinylidene fluoride-trifluoroethylene) which presently is the most commonly used organic ferroelectric material.
  • PZT lead zirconate titanate
  • ferroelectric oligomers such as poly(vinylidene fluoride-trifluoroethylene)
  • the memory material could also be selected as a dielectric material with a linear or non-linear resistive impedance.
  • a material of this kind can be set to specific resistance values by the application of an electric field and by varying the field strength it is possible to set a plurality of specific resistance states in the memory material.
  • the specific field strength applied will determine the resistance value set. It is also possible to erase the set resistance values by reversing the field.
  • resistive memory materials shall not be able to spontaneously form a diode junction with the contacting metallic electrode, but in order to form such a diode junction a layer of semiconducting material can be provided between the memory layer and the electrode, and a S chottky junction will then be generated.
  • a person skilled in the art will be familiar with candidates for the resistive memory materials, but they may for instance be selected as a phthalocyanine compound, an organic small-molecule compound, a metal-organic salt like the well-known M(TCNQ), an oligomer, a polymer or a copolymer.

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Theoretical Computer Science (AREA)
  • Nanotechnology (AREA)
  • Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Artificial Intelligence (AREA)
  • General Physics & Mathematics (AREA)
  • Mathematical Physics (AREA)
  • Computer Vision & Pattern Recognition (AREA)
  • Semiconductor Memories (AREA)
  • Memory System Of A Hierarchy Structure (AREA)
  • Read Only Memory (AREA)
  • Storage Device Security (AREA)
  • Debugging And Monitoring (AREA)

Abstract

In a non-volatile electric memory system a memory unit and a read/write unit are provided as physically separate units. The memory unit is based on a memory material that can be set to at least two distinct physical states by applying an electric field across the memory material. Electrode means and/or contact means are either provided in the memory unit or in the read/write unit and contact means are at least always provided in the read/write unit. Electrodes and contacts are provided in a geometrical arrangement, which defines geometrically one or more memory cells in the memory layer. Contact means in the read/write unit are provided connectable to driving, sensing and control means located in the read/write unit or in an external device connected with the latter. Establishing a physical contact between the memory unit and the read/write unit closes an electrical circuit over the addressed memory cell such that read, write or erase operations can be effected. The memory material of the memory unit can be a ferroelectric or electret material that can be polarized into two discernible polarization states, or it can be a material with a resistive impedance characteristic such that a memory cell of the material can be set to a specific stable resistance value by the application of an electric field.

Description

A data storage device
The present invention concerns a data storage device comprising a card-like memory unit and a read/write unit provided as physically separate units.
There are a number of situations when there is a need for a method to locally store digital information on objects. Today there are three dominating methods to achieve this. The first is to use a magnetic material that is read and written using an external read/write unit, the second is to use printed bar codes that are a form of read-only memories being read by optical methods, and the third is to use chip-based memories such as flash memories. The different techniques all have their strengths and weaknesses. The chip based memories (e.g. SIM-cards) include the drive circuits and control logic on the memory device, causing high manufacturing costs. Also, the chip-based memories require transistors to be present on the memory devices something which results in that the number of possible manufacturing methods is limited. In practice they are all built on Si wafers. The magnetic stripes are re-writeable, but bar codes are not. Magnetic stripes, as used today, are read by an external unit that has a relative speed compared to the memory device, while bar codes are normally read while the read unit and the memory device are at rest. The bar codes are very low cost printed devices, while the magnetic stripe must be manufactured in a controlled environment and later laminated inside the target item. The data densities of the bar codes are very low, and the data capacity of the magnetic stripes is limited by the length of the stripe since it is read using a constant relative speed between the memory and the read/write unit. In practice the storage capacity of magnetic stripes are limited to not much more than a few hundred bytes. The drawbacks of the magnetic stripes, such as limited data content, high manufacturing costs and the need for a relative speed between the memory device and the read/write equipment are inherent and undesirable.
Considering the disadvantages of existing technologies and solutions for simple memory cards and considering their extremely widespread and frequent use it is evident that there is a need for a improvement in the technology based on data storage means that can be implemented in the conventional and readable memory card format and in addition provide a significant gain with respect to quality, storage capacity, simplicity, reliability, particularly for read/write operations, and which moreover can be manufactured in high volumes and low cost. This also implies that it should be rewriteable and be employed with rewrite equipment that does not differ conceptually from today's card readers; it should for instance not require any moving parts, and the input/output operations should be performed without maintaining a relative speed between the memory card and the read/write equipment. Also a memory card of this kind should be possible to manufacture with low cost high- volume manufacturing methods. These include as per se conventional printing techniques which up to now to little extent have been applied to the manufacturing in the electronics and integrated circuit industry, but nevertheless has been shown to be able to fabricate high-performance components reliably and with high yield. In addition printing techniques also have the advantage that they make it a lot more easy to employ different materials, inorganic as well as organic, as the constituents of the components manufactured, but at the same time the incompatibility problems encountered in conventional fabricating processes when using such materials are avoided. These incompatibility problems may be thermal, mechanical or chemical and can significantly impair the functionality of one or more functional materials.
Hence the object of the present invention is to provide an improved memory card which avoids the above-mentioned disadvantages of existing memory cards, but which retains any advantages thereof in addition to providing an increased storage capacities, high reliability and lower fabrication cost.
Another object of the present invention is to provide such memory cards based on data-storage technologies which hitherto has been applied only to more advanced data storage systems. A further object is to provide such memory card wherein data are stored and input and output by electrical means.
A final, but important object of the invention is to be able to employ novel materials including organic ones for the memory media, and which moreover can be processed by fabrication methods which do not impair the performance.
The above objects as well as further features and advantages are realized with a data storage device according to the invention, wherein the memory unit comprises a patterned or unpatterned layer of a memory material capable of attaining at least two distinct physical states and/or being set to either thereof or switched therebetween upon applying an electric field across the memory material, wherein said at least two distinct physical states are characterized by an impedance value or a polarization value, wherein the electric field is applied at specific positions and with a specific direction so as to define a memory cell with a determined extension in a volume of the memory material at the specific position for storing a datum given by a logical value as assigned to the distinct physical state set in the memory cell by the applied electric field, wherein the logical value can be detected and read by applying a potential difference across the memory cell, wherein the memory unit comprises one or more linear arrays of memory cells provided in a patterned or unpatterned layer of memory material, one or more bottom electrodes provided interfacing a bottom surface of the memory layer, wherein each said one or more bottom electrodes comprises one contact means and contacts at least one memory cell and at most all memory cells in one linear array of memory cells, wherein a plurality of top electrodes are provided interfacing and extending over a top surface of the memory layer, wherein each of the top electrodes comprises one contact means and contacts at least one memory cell and at most all memory cells in a linear array of memory cells, whereby a memory cell is defined in the layer of memory material between a crossing bottom and top electrode, wherein a read/write unit comprises contact means provided in a geometrical arrangement corresponding to the geometrical arrangement of the contact means of the memory unit, thus enabling a direct electrical connection between the read/write unit and the memory unit upon establishing a mutual engagement therebetween, whereby the electrical connection closes an electrical circuit over each memory cell, thus enabling the application of a potential difference over the latter such that dependent on the sign and magnitude of the applied potential difference a read/write and erase operation can be effected to the memory cells.
Additional features and advantages of the data storage system of the present invention will be apparent from preferable embodiments as disclosed in the appended dependent claims.
The invention shall now be explained in more detail by resorting to a discussion of exemplary embodiments thereof and with reference to the accompanying drawing figures, wherein figure 1 schematically shows the basic building blocks of a memory cell, as may be used in the present invention, figure 2 schematically the basic building blocks of a bilayer memory cell, as may be used in the present invention, figure 3 a first embodiment of a memory unit according to the present invention, figures 4a, 4b a first embodiment of the data storage device according to the present invention, figure 5 a second embodiment of a memory unit according to the present invention, figure 6 a third embodiment of a memory unit according to the present invention, figure 7a a second embodiment of the data storage device according to the present invention, figures 7b, 7c details of the data storage device in fig. 7a figure 8 a third embodiment of the data storage device according to the present invention, figure 9 a fourth embodiment of a memory unit according to the present invention, figure 10a a fifth embodiment of a memory unit according to the present invention, figure 10b a side view of the embodiment in fig. 10a, figure 1 Ia a third embodiment of the data storage device according to the present invention, figure l ib a side view of the embodiment of the data storage device in fig. 11a, figure l ie schematically a plan view of the memory unit used in the embodiment in fig. 11a, figure 1 Id a plan view of a variant of the memory unit in fig. l ie, and figures 12a, 12b respectively a side view and a plan view of a memory unit with stacked memory layers. A memory cell which can be used in the memory unit in the present invention shall now be discussed with reference to fig. 1.
The memory cell is built on a smooth and non-conductive substrate 1 , which moreover shall not react with the material of a thereabove provided bottom electrode 2, but apart from that the substrate can be made from a number of candidate materials, rigid as well as flexible and including e.g. silicon wafers, polymer film, paper, coated metal foils and so on. The memory cell is structured as a stack of essentially thin-film layers. These are from the substrate and up, the bottom electrode 2, the memory material or film 4 and a top electrode 5. In addition interlayers 3 a can be provided between the memory material 4 and/or the bottom and top electrodes 2;5 respectively. It is also to be understood that the memory material 4 can be a composite or a mixture or various materials giving the overall memory material its overall functionality for storing and retaining data. On the top of the memory cell structure an optional protection layer 6 can be provided. This overall finished stacked thin- film structure conforms to the component 7, and it is indicated how a vertical stack of such memory cells can be formed by simply placing such memory cell components 7 on the top of each other. It is also evident that such memory cell structures can be provided juxtaposed on one and the same substrate to form memory cell arrays of various configurations and in various geometrical arrangements. The various thin-film layers of such memory arrays can then be contiguous and global in the array, while for instance top and bottom electrodes must be suitably patterned such that each memory cell can be selected and addressed individually for a data storage or data retrieval operation. Commonly this is achieved by patterning for instance the bottom electrodes as a set of parallel stripe-like electrodes and then patterning the top electrodes as a set of likewise parallel stripe electrodes, but oriented orthogonally to the bottom electrodes, such that it is possible to define a memory cell in the volume of memory material between the crossing of a top and bottom electrode.
Also the memory cell structure could be formed as a bilayer structure as shown in fig. 2. As before a bottom electrode 2 is deposited on the substrate 1 and it now follows a first memory layer 4l5 a common electrode layer 8, followed by a second memory layer 42 and the structure is finally capped with the top electrode 5. Two memory cells are thus defined in this structure and it is seen that the common electrode 8 respectively forms the top electrode of the first cell, while it is also the bottom electrode of the second cell. This shall increase the volumetric storage capacity, but also simplify the fabrication as the number of electrodes in a stacked structure is not twice the number of memory layers, but instead one more than the number of memory layers. This particular embodiment is explained thoroughly in for instance international published patent application WO98/58383 belonging to the present applicant.
The present invention shall be better understood from the following discussion of various preferred embodiments thereof, particularly in regard of the memory unit itself. In the discussion of the preferred embodiments, the disclosure is generally limited to the materials and components required to realize the absolute necessary functions of the memory units. The same consideration also applies to the drawing figures of the various embodiments, wherein the substrate e.g. usually is deleted. A first preferred embodiment of a memory unit according to the present invention is shown in fig. 3. Memory material 4 is deposited on the bottom electrode 2, which also incorporates contact means 9 indicated simply by the x. The top electrode 3 is shown as a row of a number of patterned electrodes 5 deposited on the memory material or memory layer 4. These separate electrodes 5 also form the contact means 92 of the memory cells, and it can generally de described as a unit with a linear array of memory cells formed in the memory layer 4 between the contact means 92 and the bottom electrode 2.
A first preferred embodiment of the data storage device of the present invention is shown in figs. 4a and 4b. Further figs. 4a and 4b detail the use of the memory unit of fig. 3 in conjunction with a read/write unit 11. Fig. 4a shows how the contact means of the memory unit 10 is contacted by moving e.g. the hand-held read/write unit 11 down to contact the memory unit 10. The read/write unit 11 comprises contact means 12 e.g. in the form of contact pins or pads and provided in a contact portion thereof. The contact means are provided in a geometrical arrangement or pattern to furnish an exact match with the contact means 9 on the memory unit 10. It should be noted that in figs. 4a, 4b, also the contact means 9i at point x of the bottom electrode 2 is included in the linear array of contact means 9 such that when contact means 12 on the read/write unit 11 engage with the corresponding contact means 9 in the memory unit 10, an electric circuit is established through the memory cells of the memory unit 10. Of course the read/write unit 11 can also be a mechanically moved unit and as such a part of e.g. a terminal device or the like. Further the read/write unit 10 as stated may comprise the required circuitry for driving, sensing and control, but this circuitry could also be part of a peripherial unit not shown in fig. 4a or 4b and then the read write unit should be connected thereto via appropriate means such as cord 13. The embodiment as shown in figs. 3 and 4a, b is regarded as suitable for data storage applications where the storage capacity requirement is low.
A second embodiment of the memory unit 10 of the data storage device according to the present invention is shown in fig. 5. Again the memory cells are defined as a linear array in the memory layer 4 (shaded in the figure) and each memory cell is provided with a bottom electrode 2 with contact means 9i forming a row along the side of memory layer 4 on one side thereof. Each memory cell is also provided with a top electrode 5 on the opposite surface of the memory layer 4 and with similar contact means provided 92 along a side of the memory layer 4 and opposite the contact means 9\ of the bottom electrodes 2.
A third embodiment of a memory unit in the data storage device according to the present invention is shown in fig. 6. This embodiment resembles that in fig. 5, but now all the memory material has been provided in two parallel stripe-like layers 41? 42 such that two linear arrays of memory cells can be formed in the memory unit. Bottom electrodes 2 are provided such that they are common to pairs of memory cells, with each cell of the pair being located in the respective layer 4l5 42 of memory material in the manner shown. Here the contact means 9 of the bottom electrodes are provided in the gap between the parallel memory layers 41? 42. However, for each memory cell there is provided a separate top electrode 5 with the contact means 92 provided in a row along side edges of respective memory layers 4. The embodiments of the memory units shown in figs. 5 and 6 can both be addressed in stationary on sliding engagement with a read/write unit according to the present invention and as a person skilled in the art may know, the read/write unit 11 for a stationary addressing operation shall comprise contacts in the form of contact pins or contact pads provided in a geometrical arrangement and patterned exactly similar to the geometrical pattern of the contact means 9i, 92 of the embodiments in fig. 5 and 6. The addressing of memory units corresponding to the embodiments in figs. 5 and 6 shall now be discussed with reference to figs. 7a-c and fig. 8. Fig. 7a depicts a second embodiment of the data storage device of the invention and with the memory unit 10 provided with a substrate 1 and contact pads 9 as shown in the surface of the memory unit 10. A hand-held read/write unit 11 is now translated in a sliding movement along the memory unit 10 and shall in succession contact the contact means 9. It is also of course to be understood that the read/write unit 11 need not be hand-held unit, but can be moved by mechanical means.
Fig. 7b provides a side view of the operation of the read/write unit 11 in fig. 7a. The components are of course the same as already shown in fig. 7a but now with the addition of sliding contacts 12 incorporated in the read/write unit 11. The sliding contact means 12 could be realized as shown in fig. 7b as two or more leaf springs and shall then providing adequate contact when a hand-held read/write unit 11 is translated in a sliding movement. The positions of the sliding contacts in the read/write unit 11 of course must correspond to the row arrangement of the contacts 9 in either figs. 5 or fig. 6. However, instead of the sliding contacts 12, contacts in the form of rollers and the like could also be provided, of course dependent on the arrangement of the contact pads in the memory unit. Fig. 7c shows the memory unit 10 and the read/write unit 11 viewed in the direction of a motion and with the same components labelled as before. The memory unit 10 also here corresponds to one of the embodiments shown in figs. 5 and 6 with contact pads 9 in the memory unit 10 being engaged by respective sliding contacts 12 mounted in a read/write head of the read/write unit 11. As before the sliding contacts 12 can be leaf springs. Fig. 8 shows the memory unit 10 of the invention used with a stationary read/write unit 11 which of course also forms part of the data storage device of the invention, but otherwise would resemble fixed stationary units as known in the art for reading conventional memory cards such as magnetic cards and the like. The card-like memory unit 10 is as in the prior art inserted in a slot on the stationary read/write unit 11, and the addressing operation is carried out in a sliding movement as the contact means of the memory unit 10 engages corresponding; for instance sliding contact means in the read/write unit 11.
An obvious advantage with the embodiments that allow the use of sliding movement of the read/write unit to carry out an addressing operation by either moving the read/write unit or the memory unit, of course has the advantage that the contact arrangement of the read/write unit shall be much simplified, and would not need to form a geometrical arrangement and pattern mimicking the corresponding geometrical arrangement and pattern of the contact means in the embodiment shown e.g. in figs. 5 and 6. As would be obvious to a person skilled in the art, only a pair of sliding contacts in the read/write unit be sufficient to read the memory unit of fig. 5, while for the memory unit shown in fig. 6 three sliding contacts in the read/ write unit 11 are required. It should be noted that in the case the read/write unit 10 is a hand-held unit, it is translated in sliding contact with the memory unit 10. The scale of the contact means and the arrangement of the memory cell arrays are such that it is no problem to maintain the appropriate engagement and physical contact for obtaining a reliable addressing even with a hand-moved read/write unit 11.
A fourth embodiment of the memory unit according to the invention is shown in fig. 9. Herein a single bottom electrode 2 with contact means 9, is provided as a common word line for all memory cells provided in a single linear array in the memory layer 4. The top electrodes 5 are provided orthogonally to the common bottom electrode 2 on the opposite side of the memory layer and with the contact means 92 provided alongside the periphery of the layer 4 of memory material. The contact means 9 easily allows for a stationary contact in a suitable engagement with a read/write unit 11 comprising contact means in the form of e.g. contact pins or contact pads in a geometric arrangement corresponding to the geometric arrangement of the contact means 9 in the memory unit 10 as depicted in fig. 9. In other words, both the word line electrodes 2 and the bit line electrodes 2 are contacted simultaneously in a stationary engagement between the memory unit 10 and the read/write unit 11. For sliding contact the read/write unit 11 will employ sliding contact means 12 similar to those in fig. 7b or 7c.
A fifth embodiment of the memory unit according to the invention is shown in fig. 10. This memory unit 10 resembles a so-called matrix-addressable array that are used in various types of semiconductor memories, as well known to a person skilled in the art. A first set of parallel stripe-like bottom electrodes 2 are provided on one side of a global layer 4 of memory material. The parallel stripe-like bottom electrodes 2 form the word lines in a memory matrix and terminate in contact means 9l5 as before. Similarly the top electrodes 5 are provided on the opposite surface of the memory layer 4 and with parallel stripe-like electrodes oriented orthogonally to the word line electrodes and forming bit lines in the memory matrix and likewise terminated in contact means 92. In order to accommodate shown structure without placing too heavy demand on real estate capacity, the contact means alternate along the side edges of the layer 4 of memory material such that four linear arrays of contact means are formed along the periphery. Fig. 10b is a side view of the embodiment in fig. 10a with the bottom (word-line) electrodes 2 and the top (bit-line) electrodes 5 separated by the memory layer 4.
Although the memory unit structurally resembles a matrix-addressable memories as known in the art, no driving or multiplexing circuitry are included therein and hence its capacity is limited only by the number of contact pads. As a person skilled in the art shall understand the ratio between the number of the word lines and bit lines can be freely chosen, for instance as 1 :N, where N is the number of bit lines, an embodiment that corresponds to the memory unit shown in fig. 9 as a square matrix, i.e. N-N matrix with equal numbers of word lines and bit lines 2;5, and finally, as a rectangular M-N matrix, with M word lines and N bit lines 2;5 such that M≠N. In the embodiment of the memory unit in fig. 9 with a single word line and with a total number n of nine contact means the number of data bits that can be stored will be equal to n— 1. In a square matrix embodiment of the memory unit 10 as shown in fig. 10, the number of data bits that can be stored correspondingly shall be n2/4. For instance when referred the embodiment in fig. 10 it is seen that the square matrix comprises 64 bit spots and hence can store 64 data bits. The number n of contact means 9 is the sum of the number of word line and bit line electrodes, being in this case of course 16, yielding a storage capacity 162/4=64 data bits.
An increasing number of memory cells and contact means in the memory unit 10 as used in the data storage device according to the invention requires more accurate procedures to handle the engagement between the memory unit and the read/write unit 11 to obtain a high-quality addressing operation. For instance could a read/write unit 11 as depicted in either of the figs. 1 Ia or 1 Ib be used. Here the contact means 9 are provided as a separate array 14 outside the memory cell matrix 9 comprising the memory layer 4. This array 14 can of course be regarded as composed of separate parallel linear contact arrays constituting either rows or columns of the matrix depending on agreed convention. The detailed layout of the memory matrix and the contact means array shall be explained immediately below. The whole memory unit 10 inserted in a slot in the read/write unit 11 and for this purpose and to ensure proper engagement, the read/write unit 11 may be provided with guiding and retaining means 17 for guiding the sliding movement of the memory unit 10. The array of contact means 14, which can be significantly larger than the memory cell matrix 13, engage with the corresponding array of contact means 15 in the read/write unit 11 , comprising for instance contact pins or pads. The array of contact means 15 in the read/write unit can be easily controlled to carefully land on the corresponding contact means 9 in the memory unit as depicted in fig. l ib. As shown in fig. l ie the contact means provided in the array 14 are connected to the bit line and word line electrodes of the memory matrix 13 by a suitable routing of contact lines 16. As depicted in the embodiment illustrated in fig. l ie there are 64 bit spots in the memory matrix 13, which is a square matrix with 8 word lines and 8 bit lines, making 16 in all and hence the matrix 14 comprises 16 contact means. Another arrangement of the contact means 9 for a memory cell matrix 14 is shown in fig. 1 Id and here the contact means are provided on the periphery of the memory cell matrix and alternating from side to side as shown. Of course the contact means 15 of the read/write unit 11 shall be correspondingly disposed. The advantage of using a separate array 14 for the contact means 9 is that it is in no way limited by the size of the memory cell matrix 14 or has to scale to its dimensions. The memory cell matrix 14 can indeed be made very small. In a matrix-addressable array of for instance ferroelectric or resistive memory cells the latter can be provided (i.e. pixellated) with pitches in the range of 0.2 μm and even less, such that a memory layer area of say only a square millimetre easily could accommodate millions or memory cells. If the storage capacity is not that large, features can also be made larger making fabrication easier and less costly, and lessen the amount of production and quality controls needed to ensure high quality products as whole, as more faults and defects are likely to occur with reduced line widths and pitches.
In other words, when the adequate data storage capacity is achieved in a memory matrix occupying at most few square millimetres, the contact array could be made large to ensure reliable operation. This possibility of scaling a contact array is facilitated by the fact that the number of contacts scales as M+N, i.e. the sum of word lines and bit lines (bottom and top electrodes 2;5), while a number of memory cells scales as M-N. Finally it should be noted that since the electrode layers can be very thin and the thickness of the memory layer 4 extremely small, all layers can be fabricated with a total thickness dimension below 1 μm. This would favour the use of volumetric memory units, i.e. where data is not stored in a single planar memory layer, for instance as the vertical stack of such layer appropriately electrically connected, as noted in connection with the discussion of fig. 1 or fig. 2. Although such architectures and configurations not necessarily would be required by memory unit of the present invention or as known in the prior art and which is tailored to be application specific and not for use in computer equipment, it is not difficult to implement a volumetric card architecture as shown in cross section in fig. 12a where two memory layers 4l5 42 are used in one and the same memory unit. As will be noted this is achieved by using a stepped and staggered arrangement of the memory layers allowing the contact means to be located in a suitable geometric arrangement outside the area occupied by the memory layers 4 and in the vicinity of the edge portions of the memory unit 10 as shown in plan view of fig. 12b. Due to the staggered arrangement the memory layer 4\ in the subunit 10a can have a larger storage capacity then the memory layer 42 in the subunit 10b. Otherwise is the embodiment shown in figs. 12a and 12b would present the same appearance to the user and the read/write unit of the invention as a card-like memory unit with a single memory layer. The actual arrangement of the memory and a geometrical arrangement of the memory matrix and the contact means in either subunits 10a, 10b in figs. 12, 12b could for instance resemble the arrangement shown in fig. 1 Id. The electrodes could be manufactured using metal deposited and patterned by any standard method such as evaporation, sputtering, and photolithographic techniques or using e.g. polymer based conductive inks deposited by e.g. inkjet, flexo-printing or any other appropriate technique.
The memory film could be deposited by spin-coating a layer of electric film between the two electrode layers. Other techniques, such as inkjet, flexo- printing, evaporation etc can also be used to deposit the electric memory layer.
The read/ write unit has two main tasks. The first is to generate the needed voltage waveforms to control the read and write of the memory cells. The second is to sense the state of the memory cells during read. The operation of the memory requires that well controlled voltage waveforms both in time and magnitude are applied to the electrodes. This can be achieved either with standard discrete electronic components or with an application specific integrated circuit. If the memory material is a ferroelectric material large enough applied voltage will force the dipoles in the ferroelectric memory film to align in the direction of the electric field between the electrodes, thus storing information in the polarization direction of the material. Basic information on the operation of ferroelectric memory cells is available in the literature. Similarly a material having resistive impedance characteristics can have its resistance set by an applied external field thus being able to store data represented by stable resistance values. A memory material of this kind, for instance a metal-organic salt like M(TCNQ) could be used to realize multibit memory cells.
The sense circuitry shall make a decision on the state of the memory cell based on the amount of charge coming from the cell due to the charge displacement in the ferroelectric material during the read voltage pulse. This can e.g. be done with a simple Sawyer tower configuration or with a current integrator, both of which can be realised with discrete circuits. For large capacity memories however, it may be worthwhile to construct an application specific integrated circuit to do this.
If the memory material of the data storage device of the invention is a ferroelectric or electret material capable of being polarized in either of two remanent polarization states and exhibiting hysteresis, a datum is stored in a memory cell by assigning a logical value to either of its remanent polarization states, i.e. the negative or positive polarization state. Read and write operations are carried out on the hysteresis curve by applying electric fields of suitable strength over the memory cell, whereby a switching of the polarization state can be effected by applying a field with a coercive field strength higher than that of a memory cell and a direction opposite the polarization vector of the memory cell. It should be noted that ferroelectric materials properly are a subclass of electret materials. A number of candidate ferroelectric materials well known to a person skilled in the art may include inorganic ceramic materials such as lead zirconate titanate (PZT) or more preferable organic and easily printable ferroelectric oligomers, polymers, or co-oligomers including the well-known poly(vinylidene fluoride-trifluoroethylene) which presently is the most commonly used organic ferroelectric material. Generally these organic ferroelectric materials are inherently incapable of forming diode junctions with a contacting metallic electrode.
In the data storage device according to the present invention the memory material could also be selected as a dielectric material with a linear or non-linear resistive impedance. A material of this kind can be set to specific resistance values by the application of an electric field and by varying the field strength it is possible to set a plurality of specific resistance states in the memory material. In other words, it is possible to store data with multibit coding, e.g. selecting as a set value as one of e.g. four or eight etc. resistance levels and thus being able to store respectively two, three, or more bits. The specific field strength applied will determine the resistance value set. It is also possible to erase the set resistance values by reversing the field. It should also be noted that some (or most) candidate resistive memory materials shall not be able to spontaneously form a diode junction with the contacting metallic electrode, but in order to form such a diode junction a layer of semiconducting material can be provided between the memory layer and the electrode, and a S chottky junction will then be generated. A person skilled in the art will be familiar with candidates for the resistive memory materials, but they may for instance be selected as a phthalocyanine compound, an organic small-molecule compound, a metal-organic salt like the well-known M(TCNQ), an oligomer, a polymer or a copolymer.

Claims

1. A non-volatile electrical data storage device comprising a card-like memory unit and a read/write unit provided as physically separate units, wherein the memory unit comprises a patterned or unpatterned layer of a memory material capable of attaining at least two distinct physical states and/or being set to either thereof or switched therebetween upon applying an electric field across the memory material, wherein said at least two distinct physical states are characterized by an impedance value or a polarization value, wherein the electric field is applied at specific positions and with a specific direction so as to define a memory cell with a determined extension in a volume of the memory material at the specific position for storing a datum given by a logical value as assigned to the distinct physical state set in the memory cell by the applied electric field, wherein the logical value can be detected and read by applying a potential difference across the memory cell, wherein the memory unit comprises one or more linear arrays of memory cells provided in a patterned or unpatterned layer of memory material, one or more bottom electrodes provided interfacing a bottom surface of the memory layer, wherein each said one or more bottom electrodes comprises one contact means and contacts at least one memory cell and at most all memory cells in one linear array of memory cells, wherein a plurality of top electrodes are provided interfacing and extending over a top surface of the memory layer, wherein each of the top electrodes comprises one contact means and contacts at least one memory cell and at most all memory cells in a linear array of memory cells, whereby a memory cell is defined in the layer of memory material between a crossing bottom and top electrode, wherein a read/write unit comprises contact means provided in a geometrical arrangement corresponding to the geometrical arrangement of the contact means of the memory unit, thus enabling a direct electrical connection between the read/write unit and the memory unit upon establishing a mutual engagement therebetween, whereby the electrical connection closes an electrical circuit over each memory cell, thus enabling the application of a potential difference over the latter such that dependent on the sign and magnitude of the applied potential difference a read/write and erase operation can be effected to the memory cells.
2. A data storage device according to claim 1, characterized in each top electrode comprising one contact means.
3. A data storage device according to claim 1, characterized in all contact means of the memory unit being provided outside the area occupied by the memory layer..
4. A data storage device according to claim 1, characterized in the memory unit comprising more than one linear memory cell array, said arrays forming rows and columns of a rectangular or square matrix.
5. A data storage device according to claim 4, characterized in one and the same bottom electrode contacting a pair of memory cells, each member of said pair of memory cells being an element of respective separate adjacent linear arrays.
6. A data storage device according to claim 4, characterized in each row and column of linear memory cell arrays in the rectangular or square matrix sharing a common bottom electrode and each column or row of linear memory cell arrays in the rectangular or square matrix sharing a common top electrode.
7. A data storage device according to claim 4, characterized in the contact means of each electrode being provided outside an area occupied by the memory layer and at the periphery of the matrix, the number of contact means being the sum of the number of rows and columns in the matrix.
8. A data storage device according to claim 4, characterized in the contact means of both the bottom and top electrodes being provided in a contact means matrix located on the memory unit outside the area occupied by the memory layer, the number of rows and columns of the contact means being the sum of the number of the rows and columns in the memory matrix, and each of the contact means in the contact means matrix being routed to connect a respective top and bottom electrode.
9. A data storage device according to claim 1, characterized in that the contact means of the bottom electrodes being provided exposed in the surface of the memory unit, and the contact means of the top electrodes being provided exposed in the opposite surface thereof.
10. A data storage device according to claim I5 characterized in the contact means of both the bottom and top electrode being provided exposed in the same surface of the memory unit.
11. A data storage device according to claim I5 characterized in that the contact means of the read/write unit being connectable with driving, sensing and control means located either in the read/write unit or in a peripheral unit connected with the latter.
12. A data storage device according to claim I5 characterized in the read/write unit being adapted for engaging the memory unit in a stationary or sliding physical contact.
13. A data storage device according to claim 12, characterized in establishing the sliding physical contact by translating the memory unit relative to the read/write unit or vice versa.
14. A data storage device according to claim 12, characterized in the read/write unit being a stationary unit, for instance a card reader in a terminal apparatus.
15. A data storage device according to claim 14, characterized in the contacting surface comprising means for guiding a movement of the memory unit.
16. A data storage device according to claim 1, characterized in the read/write unit being a moveable unit, for instance a hand-held apparatus.
17. A data storage device according to claim 5, characterized in the contact means of write/read unit being provided in contacting surface thereof adapted for engaging the contact means of the memory unit in stationary or sliding physical contact.
18. A data storage device according to claim 1, characterized in the memory material being a ferroelectric or electret material capable of being polarized in either of two opposite directions and exhibiting hysteresis, and data being stored in a memory cell defined in the ferroelectric or electret memory material by assigning a logical value to either of its remanent polarization states.
19. A data storage device according to claim 1, characterized in the ferroelectric or electret memory material being an inorganic ceramic material of the perovskite kind, an oligomer, a polymer or a co-polymer such as poly(vinylidene fluoride-trifluoroethylene) [P(VDF-TrFE)].
20. A data storage device according to claim 1, characterized in the memory material being a dielectric material having linear or non-linear resistive impedance characteristics and which can be set to specific resistance values upon the application of a suitable potential difference or electric field thereacross, data being stored as specific resistance values in the memory cells, logical values being assigned to said specific resistance values, and the logical values being read and detected by applying a suitable sensing potential difference across the memory material, said sensing potential difference having a value that does not alter the set resistance value of the memory cell.
21. A data storage device according to claim 19, characterized in the resistive memory material being a phthalocyanine compound, an organic small molecule compound, a metal-organic salt like M(TCNQ), an oligomer, a polymer, or a copolymer.
22. A data storage device according to claim 19, characterized in that a layer of an inorganic or organic semiconductor material has been provided adjacent to the memory layer comprising the resistive memory material, such that a diode junction is formed upon contacting said layer of semiconducting material with an electrode material.
PCT/NO2006/000216 2005-06-14 2006-06-08 A data storage device WO2006135247A1 (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
EP06747668A EP1891583B1 (en) 2005-06-14 2006-06-08 A data storage device
US11/917,571 US8184467B2 (en) 2005-06-14 2006-06-08 Card-like memory unit with separate read/write unit
AT06747668T ATE525706T1 (en) 2005-06-14 2006-06-08 DATA STORAGE DEVICE
JP2008516772A JP4782196B2 (en) 2005-06-14 2006-06-08 Data storage

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
NO20052904 2005-06-14
NO20052904A NO20052904L (en) 2005-06-14 2005-06-14 A non-volatile electrical memory system

Publications (1)

Publication Number Publication Date
WO2006135247A1 true WO2006135247A1 (en) 2006-12-21

Family

ID=35295086

Family Applications (2)

Application Number Title Priority Date Filing Date
PCT/NO2006/000216 WO2006135247A1 (en) 2005-06-14 2006-06-08 A data storage device
PCT/NO2006/000214 WO2006135245A1 (en) 2005-06-14 2006-06-08 A data storage device

Family Applications After (1)

Application Number Title Priority Date Filing Date
PCT/NO2006/000214 WO2006135245A1 (en) 2005-06-14 2006-06-08 A data storage device

Country Status (9)

Country Link
US (2) US8184467B2 (en)
EP (2) EP1894146B1 (en)
JP (2) JP4782196B2 (en)
CN (1) CN101198969A (en)
AT (1) ATE525706T1 (en)
DE (1) DE602006015808D1 (en)
NO (1) NO20052904L (en)
RU (2) RU2008100079A (en)
WO (2) WO2006135247A1 (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2013000825A1 (en) 2011-06-27 2013-01-03 Thin Film Electronics Asa Short circuit reduction in an electronic component comprising a stack of layers arranged on a flexible substrate
WO2013000501A1 (en) 2011-06-27 2013-01-03 Thin Film Electronics Asa Short circuit reduction in a ferroelectric memory cell comprising a stack of layers arranged on a flexible substrate
US10249625B1 (en) 2018-07-18 2019-04-02 Xerox Corporation Coated printed electronic devices exhibiting improved yield
US10304836B1 (en) 2018-07-18 2019-05-28 Xerox Corporation Protective layers for high-yield printed electronic devices
US10396124B2 (en) 2017-07-05 2019-08-27 Xerox Corporation Memory cells and devices
US10593684B2 (en) 2018-07-18 2020-03-17 Xerox Corporation Printed electronic devices exhibiting improved yield

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NO20052904L (en) * 2005-06-14 2006-12-15 Thin Film Electronics Asa A non-volatile electrical memory system
US7961506B2 (en) 2008-02-05 2011-06-14 Micron Technology, Inc. Multiple memory cells with rectifying device
US9219225B2 (en) 2013-10-31 2015-12-22 Micron Technology, Inc. Multi-bit ferroelectric memory device and methods of forming the same
JP2016189042A (en) * 2015-03-30 2016-11-04 株式会社クボタ Card issuing machine and card purchasing system
US9886571B2 (en) 2016-02-16 2018-02-06 Xerox Corporation Security enhancement of customer replaceable unit monitor (CRUM)
US10978169B2 (en) 2017-03-17 2021-04-13 Xerox Corporation Pad detection through pattern analysis
US9934415B1 (en) 2017-04-20 2018-04-03 Xerox Corporation Handheld reader having transparent circuit board for alignment of multiple electrical contacts
CN111213232B (en) * 2017-08-28 2024-07-23 Asml荷兰有限公司 Memory device having a predetermined activation value
US11055167B2 (en) * 2018-05-14 2021-07-06 Micron Technology, Inc. Channel-scope proximity disturb and defect remapping scheme for non-volatile memory
US10838831B2 (en) * 2018-05-14 2020-11-17 Micron Technology, Inc. Die-scope proximity disturb and defect remapping scheme for non-volatile memory
DE102020108366A1 (en) 2020-03-26 2021-09-30 Bayerische Motoren Werke Aktiengesellschaft Information storage and methods for programming and reading out information
US11727986B2 (en) * 2020-04-06 2023-08-15 Crossbar, Inc. Physically unclonable function (PUF) generation involving programming of marginal bits
WO2021207224A1 (en) 2020-04-06 2021-10-14 Crossbar, Inc. Distinct chip identifier utilizing unclonable characteristics of on-chip resistive memory array
US12087397B1 (en) 2020-04-06 2024-09-10 Crossbar, Inc. Dynamic host allocation of physical unclonable feature operation for resistive switching memory
US11823739B2 (en) * 2020-04-06 2023-11-21 Crossbar, Inc. Physically unclonable function (PUF) generation involving high side programming of bits

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3835301A (en) * 1973-02-21 1974-09-10 Helert P Card coding and read-out system
US5086216A (en) 1988-06-28 1992-02-04 Schlumberger Industries Memory card with fuses and a system for handling such memory cards
US5323377A (en) 1992-11-27 1994-06-21 Chen Zhi Q Electrical data recording and retrieval based on impedance variation
WO2005008574A1 (en) * 2003-07-17 2005-01-27 Avantone Oy Method for detecting objects and a system for solving content of a symbol
US20050156271A1 (en) * 2004-01-16 2005-07-21 Si-Ty Lam Data storage device

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2788265B2 (en) 1988-07-08 1998-08-20 オリンパス光学工業株式会社 Ferroelectric memory, driving method and manufacturing method thereof
JP2788290B2 (en) * 1988-07-08 1998-08-20 オリンパス光学工業株式会社 Ferroelectric memory
US6025618A (en) * 1996-11-12 2000-02-15 Chen; Zhi Quan Two-parts ferroelectric RAM
NO972803D0 (en) * 1997-06-17 1997-06-17 Opticom As Electrically addressable logic device, method of electrically addressing the same and use of device and method
JP3978818B2 (en) * 1997-08-08 2007-09-19 ソニー株式会社 Manufacturing method of micro head element
NO973993L (en) * 1997-09-01 1999-03-02 Opticom As Reading memory and reading memory devices
NO308149B1 (en) * 1998-06-02 2000-07-31 Thin Film Electronics Asa Scalable, integrated data processing device
CN1171301C (en) * 1998-01-28 2004-10-13 薄膜电子有限公司 Method for generating electrical conducting or semiconducting structures in two or three dimensions, method for erasing same structures and electric field generator/modulator
JP3825257B2 (en) * 1998-12-04 2006-09-27 シン フイルム エレクトロニクス エイエスエイ Data processing device capable of increasing capacity
EP1548833A4 (en) * 2002-08-19 2007-03-21 Seiko Epson Corp Ferroelectric memory and its manufacturing method
US7599278B2 (en) * 2003-08-25 2009-10-06 Samsung Electronics Co., Ltd. Recording medium comprising ferroelectric layer, nonvolatile memory device comprising recording medium, and methods of writing and reading data for the memory device
US7471614B2 (en) * 2003-08-29 2008-12-30 International Business Machines Corporation High density data storage medium
KR100590564B1 (en) * 2004-10-29 2006-06-19 삼성전자주식회사 Ferroelectric recording medium comprising anisotropic conduction layer, recording apparatus comprising the same, and recording method of the same
KR100612867B1 (en) * 2004-11-02 2006-08-14 삼성전자주식회사 Resistive memory device with probe array and manufacturing method the same
NO20052904L (en) * 2005-06-14 2006-12-15 Thin Film Electronics Asa A non-volatile electrical memory system

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3835301A (en) * 1973-02-21 1974-09-10 Helert P Card coding and read-out system
US5086216A (en) 1988-06-28 1992-02-04 Schlumberger Industries Memory card with fuses and a system for handling such memory cards
US5323377A (en) 1992-11-27 1994-06-21 Chen Zhi Q Electrical data recording and retrieval based on impedance variation
WO2005008574A1 (en) * 2003-07-17 2005-01-27 Avantone Oy Method for detecting objects and a system for solving content of a symbol
US20050156271A1 (en) * 2004-01-16 2005-07-21 Si-Ty Lam Data storage device

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2013000825A1 (en) 2011-06-27 2013-01-03 Thin Film Electronics Asa Short circuit reduction in an electronic component comprising a stack of layers arranged on a flexible substrate
WO2013000501A1 (en) 2011-06-27 2013-01-03 Thin Film Electronics Asa Short circuit reduction in a ferroelectric memory cell comprising a stack of layers arranged on a flexible substrate
EP3118853A1 (en) 2011-06-27 2017-01-18 Thin Film Electronics ASA Short circuit reduction in an electronic component comprising a stack of layers arranged on a flexible substrate
US10396124B2 (en) 2017-07-05 2019-08-27 Xerox Corporation Memory cells and devices
US10249625B1 (en) 2018-07-18 2019-04-02 Xerox Corporation Coated printed electronic devices exhibiting improved yield
US10304836B1 (en) 2018-07-18 2019-05-28 Xerox Corporation Protective layers for high-yield printed electronic devices
EP3598486A1 (en) 2018-07-18 2020-01-22 Xerox Corporation Protective layers for high-yield printed electronic devices
DE102019118880A1 (en) 2018-07-18 2020-01-23 Xerox Corporation COATED, PRINTED ELECTRONIC DEVICES THAT DETECT AN IMPROVED YIELD
US10593684B2 (en) 2018-07-18 2020-03-17 Xerox Corporation Printed electronic devices exhibiting improved yield

Also Published As

Publication number Publication date
ATE525706T1 (en) 2011-10-15
JP2008544363A (en) 2008-12-04
RU2008100080A (en) 2009-07-20
CN101198969A (en) 2008-06-11
JP2008544364A (en) 2008-12-04
RU2008100079A (en) 2009-07-20
JP4782196B2 (en) 2011-09-28
US20080198640A1 (en) 2008-08-21
NO20052904D0 (en) 2005-06-14
EP1894146B1 (en) 2010-07-28
WO2006135245A1 (en) 2006-12-21
EP1894146A4 (en) 2009-11-25
EP1894146A1 (en) 2008-03-05
US7764529B2 (en) 2010-07-27
EP1891583A1 (en) 2008-02-27
US8184467B2 (en) 2012-05-22
DE602006015808D1 (en) 2010-09-09
NO20052904L (en) 2006-12-15
US20080198644A1 (en) 2008-08-21
EP1891583B1 (en) 2011-09-21

Similar Documents

Publication Publication Date Title
US8184467B2 (en) Card-like memory unit with separate read/write unit
AU742011B2 (en) A read-only memory and read-only memory devices
US6646912B2 (en) Non-volatile memory
EP1269475B1 (en) Multidimensional addressing architecture for electronic devices
CN100378863C (en) Addressing and reading crossover point diode storage array
US6980465B2 (en) Addressing circuit for a cross-point memory array including cross-point resistive elements
JP2001189431A (en) Memory cell structure and memory device
KR101593509B1 (en) Memristive element based on hetero-junction oxide
KR100437925B1 (en) Scalable data processing apparatus
WO2006118466A1 (en) A non-volatile memory device

Legal Events

Date Code Title Description
DPE2 Request for preliminary examination filed before expiration of 19th month from priority date (pct application filed from 20040101)
121 Ep: the epo has been informed by wipo that ep was designated in this application
ENP Entry into the national phase

Ref document number: 2008516772

Country of ref document: JP

Kind code of ref document: A

NENP Non-entry into the national phase

Ref country code: DE

WWE Wipo information: entry into national phase

Ref document number: 2006747668

Country of ref document: EP

WWE Wipo information: entry into national phase

Ref document number: 197/CHENP/2008

Country of ref document: IN

WWE Wipo information: entry into national phase

Ref document number: 2008100079

Country of ref document: RU

WWP Wipo information: published in national office

Ref document number: 2006747668

Country of ref document: EP

WWE Wipo information: entry into national phase

Ref document number: 11917571

Country of ref document: US