WO2006068642A1 - Semiconductor package structure having enhanced thermal dissipation characteristics - Google Patents

Semiconductor package structure having enhanced thermal dissipation characteristics Download PDF

Info

Publication number
WO2006068642A1
WO2006068642A1 PCT/US2004/043076 US2004043076W WO2006068642A1 WO 2006068642 A1 WO2006068642 A1 WO 2006068642A1 US 2004043076 W US2004043076 W US 2004043076W WO 2006068642 A1 WO2006068642 A1 WO 2006068642A1
Authority
WO
WIPO (PCT)
Prior art keywords
package
attachment structure
stepped
electronic
electrode
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/US2004/043076
Other languages
French (fr)
Inventor
Francis J. Carney
Michael J. Seddon
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Semiconductor Components Industries LLC
Original Assignee
Semiconductor Components Industries LLC
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Semiconductor Components Industries LLC filed Critical Semiconductor Components Industries LLC
Priority to HK08103408.2A priority Critical patent/HK1113230B/en
Priority to CN2004800445283A priority patent/CN101073151B/en
Priority to US11/575,808 priority patent/US7944044B2/en
Priority to PCT/US2004/043076 priority patent/WO2006068642A1/en
Priority to TW094137199A priority patent/TWI381499B/en
Publication of WO2006068642A1 publication Critical patent/WO2006068642A1/en
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W70/00Package substrates; Interposers; Redistribution layers [RDL]
    • H10W70/40Leadframes
    • H10W70/481Leadframes for devices being provided for in groups H10D8/00 - H10D48/00
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W70/00Package substrates; Interposers; Redistribution layers [RDL]
    • H10W70/40Leadframes
    • H10W70/464Additional interconnections in combination with leadframes
    • H10W70/466Tape carriers or flat leads
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W74/00Encapsulations, e.g. protective coatings
    • H10W74/10Encapsulations, e.g. protective coatings characterised by their shape or disposition
    • H10W74/111Encapsulations, e.g. protective coatings characterised by their shape or disposition the semiconductor body being completely enclosed
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/071Connecting or disconnecting
    • H10W72/076Connecting or disconnecting of strap connectors
    • H10W72/07631Techniques
    • H10W72/07636Soldering or alloying
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/071Connecting or disconnecting
    • H10W72/076Connecting or disconnecting of strap connectors
    • H10W72/07631Techniques
    • H10W72/07637Techniques using a polymer adhesive, e.g. an adhesive based on silicone or epoxy
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/071Connecting or disconnecting
    • H10W72/076Connecting or disconnecting of strap connectors
    • H10W72/07651Connecting or disconnecting of strap connectors characterised by changes in properties of the strap connectors during connecting
    • H10W72/07652Connecting or disconnecting of strap connectors characterised by changes in properties of the strap connectors during connecting changes in structures or sizes
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/071Connecting or disconnecting
    • H10W72/076Connecting or disconnecting of strap connectors
    • H10W72/07651Connecting or disconnecting of strap connectors characterised by changes in properties of the strap connectors during connecting
    • H10W72/07653Connecting or disconnecting of strap connectors characterised by changes in properties of the strap connectors during connecting changes in shapes
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/50Bond wires
    • H10W72/531Shapes of wire connectors
    • H10W72/533Cross-sectional shape
    • H10W72/534Cross-sectional shape being rectangular
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/50Bond wires
    • H10W72/541Dispositions of bond wires
    • H10W72/5438Dispositions of bond wires the bond wires having multiple connections on the same bond pad
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/50Bond wires
    • H10W72/551Materials of bond wires
    • H10W72/552Materials of bond wires comprising metals or metalloids, e.g. silver
    • H10W72/5522Materials of bond wires comprising metals or metalloids, e.g. silver comprising gold [Au]
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/50Bond wires
    • H10W72/551Materials of bond wires
    • H10W72/552Materials of bond wires comprising metals or metalloids, e.g. silver
    • H10W72/5524Materials of bond wires comprising metals or metalloids, e.g. silver comprising aluminium [Al]
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/50Bond wires
    • H10W72/59Bond pads specially adapted therefor
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/60Strap connectors, e.g. thick copper clips for grounding of power devices
    • H10W72/621Structures or relative sizes of strap connectors
    • H10W72/627Multiple strap connectors having different structures or shapes
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/60Strap connectors, e.g. thick copper clips for grounding of power devices
    • H10W72/631Shapes of strap connectors
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/60Strap connectors, e.g. thick copper clips for grounding of power devices
    • H10W72/651Materials of strap connectors
    • H10W72/652Materials of strap connectors comprising metals or metalloids, e.g. silver
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/60Strap connectors, e.g. thick copper clips for grounding of power devices
    • H10W72/651Materials of strap connectors
    • H10W72/655Materials of strap connectors of outermost layers of multilayered strap connectors, e.g. material of a coating
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/851Dispositions of multiple connectors or interconnections
    • H10W72/853On the same surface
    • H10W72/871Bond wires and strap connectors
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/851Dispositions of multiple connectors or interconnections
    • H10W72/874On different surfaces
    • H10W72/884Die-attach connectors and bond wires
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/851Dispositions of multiple connectors or interconnections
    • H10W72/874On different surfaces
    • H10W72/886Die-attach connectors and strap connectors
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/90Bond pads, in general
    • H10W72/921Structures or relative sizes of bond pads
    • H10W72/926Multiple bond pads having different sizes
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/90Bond pads, in general
    • H10W72/951Materials of bond pads
    • H10W72/952Materials of bond pads comprising metals or metalloids, e.g. PbSn, Ag or Cu
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W74/00Encapsulations, e.g. protective coatings
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W90/00Package configurations
    • H10W90/701Package configurations characterised by the relative positions of pads or connectors relative to package parts
    • H10W90/761Package configurations characterised by the relative positions of pads or connectors relative to package parts of strap connectors
    • H10W90/766Package configurations characterised by the relative positions of pads or connectors relative to package parts of strap connectors between a chip and a stacked lead frame, conducting package substrate or heat sink

Definitions

  • the present invention relates in general to semiconductor device packaging and, more particularly, to semiconductor components housed in packages having improved heat transfer characteristics .
  • [0002] There is a continuing demand for electronic systems with a higher functionality and smaller physical size . With this demand, there are several challenges that face electronic component designers and manufacturers . Such challenges include the management of heat generated by power semiconductor devices, which are typically arranged closely together or next to sensitive logic circuits on electronic circuit boards .
  • plastic encapsulated devices are commonly used.
  • One problem with plastic packages is that the thermal conductivity out of a package is often limited by the plastic molding material . As a result , the majority of the heat generated by the semiconductor device is transferred through the lower part of the package next to the printed circuit board . Because the printed circuit boards are becoming more densely populated, the boards cannot properly dissipate or handle large amounts of heat . When this happens , the boards can warp, which can cause damage to both the board and the components on the board. In addition, the heat itself can damage other components on the printed circuit board or the materials that make up the board.
  • FIG . 1 illustrates an enlarged cross-sectional view of a package structure according to an embodiment of the present invention
  • FIG . 2 illustrates an enlarged cross-sectional view of a package structure according to a second embodiment of the present invention
  • FIG . 3 illustrates an enlarged cross-sectional view of a package structure according to a third embodiment of the present invention
  • FIG . 4 illustrates an enlarged cross-sectional view of a package structure according to a fourth embodiment of the present invention
  • FIG . 5 illustrates an enlarged cross-sectional view of a package structure according to a fifth embodiment of the present invention
  • FIG . 6 illustrates an embodiment of an interconnect scheme for the package structures of FIGS . 1 and 4 ;
  • FIG . 9 illustrates another embodiment of an interconnect scheme for the package structures of FIGS . 2 and 3. Detailed Description of the Drawings
  • FIG . 1 shows an enlarged cross-sectional view of a packaged semiconductor structure, QFN/DFN package, leadless packaged device or package 10 having enhanced thermal dissipation or heat transfer characteristics in accordance with the present invention .
  • Packaged device 10 includes a conductive substrate or lead frame 11 , which includes a flag, plate, or die attach portion 13 and a lead, terminal , connection, or pad portion 14.
  • Lead frame 11 comprises , for example, copper, a copper alloy (e . g . , TOMAC 4 , TAMAC 5 , 2ZFROFC, or CDA194 ) , a copper plated iron/nickel alloy (e . g .
  • Flag portion 13 and pad portion 14 are used to connect or couple to bonding pads on a next level of assembly such as a printed circuit board .
  • Package 10 further includes an electronic chip or semiconductor device 17 , which is attached to flag 13 using a die attach layer 19.
  • Semiconductor device 17 comprises , for example, a power MOSFET device, a bipolar transistor, an insulated gate bipolar transistor, a thyristor, a diode, an analog or digital integrated circuit , a sensor, a passive component , or other electronic device .
  • semiconductor device 17 comprises a power MOSFET device including a source, an up-source or major current carrying electrode 21 , a drain, down-drain or current carrying electrode 23 , and a gate or control electrode 26 ( shown in FIG . 6 ) .
  • Source electrode 21 comprises , for example, a solderable top metal , aluminum, an aluminum alloy, or the like .
  • Drain electrode 23 typically comprises a solderable metal layer or layers such as TiNiAg, CrNiAu, or the like .
  • semiconductor chip 17 is in a major current carrying electrode or source electrode "up" configuration . That is , the major heat generating electrode (e . g . , electrode 21 ) of semiconductor chip 17 is oriented away from or opposite from the side of package 10 that will be attached to the next level assembly . This orientation promotes heat transfer out of top surface 28 of package 10 , instead of through the next level of assembly or through the chip itself .
  • An attachment structure, undulating, stepped, or non-planar attachment structure or conductive clip or strap 31 is coupled to source electrodes 21 and pad portion 14 to provide an electrical path between semiconductor chip 17 and pad portion 14.
  • Clip 31 comprises , for example, rigid copper or a copper alloy and is optionally plated with silver for either solder attachment or conductive epoxy attachment .
  • clip 31 preferably is undulating, stepped or non-planar so that portions of clip 31 are closer to top surface 28 of package 10 and not in contact with semiconductor chip 17. This provides a reduced thermal resistance path for improved conductive heat transfer away from semiconductor chip 34 compared to a flat or planar clip .
  • clip 31 Preferably, at least about 50% of the surface area of clip 31 is in contact with electrode 21, and the balance of the surface area is that portion of clip 31 undulating or stepped away from electrode 21. Preferably, clip 31 has at least 2 steps .
  • Optional attachment or interconnect schemes for control electrode 26 are shown and described in conjunction with FIGS . 6 and 7.
  • encapsulating layer 29 is formed over lead frame 11 , semiconductor chip 17 , and at least portions of clip 31 using a single cavity or overmolding process .
  • encapsulating layer 29 comprises a high thermal conductivity mold compound .
  • encapsulating layer 29 comprises a mold compound having a thermal conductivity greater than about 3.0 Watts/MK.
  • Suitable high conductivity mold compounds are available from Sumitomo Plastics America of Santa Clara, California ( e . g . , EME A700 series ) and Hitachi Chemical of Santa Clara, California (e . g . , a CEL 9000 series mold compound) .
  • package 10 has an overall height 34 less than about 1.10 millimeters .
  • height 34 is less than about 0.80 millimeters .
  • the thickness of encapsulating layer 29 above semiconductor chip 17 is less than about 0.53 millimeters .
  • thermal studies evaluating a comparable sized package 10 to a DirectFETTM product showed that a package 10 according to the present invention assembled with a mold compound having a thermal conductivity greater that or equal to about 3.0 Watts/mK, and a height 34 of less than about 0.80 millimeters had an equal or better thermal resistance ( junction to top of package) characteristic .
  • Undulating clip 31 is shown with one or more optional mold lock features or notches 39 , which are used to provide better adhesion between encapsulating layer 29 and clip 31. More or fewer notches 39 may be used .
  • package 10 includes an optional heat sink device 43 , which is attached to package 10 with, for example, a high conductivity epoxy material 42 , such as a CEL9750 HFLO (AL3 ) or a CEL9210 HFLO (AL2 ) epoxy available from Hitachi Chemical , or an EMF 760a epoxy available from Sumitomo Plastics America . It is understood that heat sink 43 is an option for all package embodiment described including those shown in FIGS . 2-5 hereinafter . In applications where safety is a concern, heat sink 43 is optionally coated with an insulating material such as a thermal grease .
  • FIG . 2 shows an enlarged cross-sectional view of a packaged semiconductor structure, QFN/DFN package, leadless packaged device, or package 100 according to a second embodiment of the present invention .
  • Package 100 is similar to package 10 except that instead of undulating clip 31 , an undulating or non-planar attachment structure or ribbon bond ( s ) 231. is used to couple major current carrying electrode 21 semiconductor chip 17 to pad portion 14.
  • Ribbon bond 231 refers to a flexible rectangular shaped conductor, wherein a width 51 of ribbon bond 231 ( shown in FIG . 7 ) is greater than a thickness 52 of ribbon bond 231.
  • Suitable materials for ribbon bond 231 include gold, aluminum, silver, palladium, copper or the like .
  • Attachment of ribbon bond 231 typically includes ultrasonic wedge bonding end 232 to source electrodes 21 , and wedge bonding end 233 to pad portion 14.
  • ribbon bond 231 is formed having a thickness of about twenty five microns and a width of about seventy five microns .
  • ribbon bond 231 is typically formed to a thickness 52 of about six microns to fifty microns and a width 52 of about fifty microns to fifteen hundred microns wide .
  • One advantage of the embodiments of FIGS . 1 and 2 is that the top side of packages 10 and 100 are electrically- insulated so that the safety issues associated with prior art structure are avoided .
  • FIG . 3 shows an enlarged cross-sectional view of a packaged semiconductor structure, QFN/DFN package, leadless packaged device, or package 110 according to a third embodiment of the present invention .
  • Package 110 is similar to package 10 except that in package 110 , an encapsulating layer 129 covers only a portion of undulating clip 31. That is , in package 110 , portions 310 of clip 31 are left exposed, which further enhances the heat transfer characteristics of the package while semiconductor chip 17 is still covered or passivated by encapsulating layer 129.
  • encapsulating layer 129 preferably comprises materials similar to encapsulating layer 29.
  • FIG . 4 shows an enlarged cross-sectional view of a packaged semiconductor structure, QFN/DFN package, leadless packaged device, or package 200 according to another embodiment of the present invention .
  • Package 200 is similar to package 100 except that in package 200 , an encapsulating layer 229 covers only a portion of attachment structure or ribbon bond 231. That is , in package 200 , portions 331 of ribbon bond 231 are left exposed, which further enhances the heat transfer characteristics of the package while semiconductor chip 17 is still covered or passivated by encapsulating layer 129.
  • encapsulating layer 229 preferably comprises materials similar to encapsulating layer 29.
  • the assemblies are placed in a molding apparatus so that portions 310 and 331 contact or adj oin a surface of the mold cavity .
  • the surface of the mold cavity acts as a mask to prevent encapsulating material 129 and 229 from covering portions 310 and 331.
  • FIG . 5 shows an enlarged cross-sectional view of a packaged semiconductor structure, QFN/DFN package, leadless packaged device, or package 210 according to a further embodiment of the present invention .
  • Package 210 is similar to package 100 except that in package 210 , an undulating or non-planar attachment structure or ribbon bond 431 is used having an omega or substantially omega-like shape . That is ribbon bond 431 includes base portions 432 and upper portions 433 above semiconductor chip 17 , wherein the base portions 432 have a width less than the width of upper portions 433. Omega shaped ribbon bond 431 provides an undulating attachment structure that has more conductive surface area, which provides for a package with enhanced heat transfer characteristics .
  • FIGS . 6-9 show embodiments of different attachment structure schemes for use with the present invention prior to an encapsulation step .
  • FIG . 6 shows lead frame 11 and semiconductor chip 17 of FIG . 1 with the addition of control electrode attachment structure 61 coupling a control electrode 26 (as referenced in paragraph [ 0019 ] ) on semiconductor chip 17 to pad portion 114.
  • control electrode attachment structure 61 comprises a ribbon bond.
  • an area of control electrode 26 is selected to be approximately three times the width by three times the thickness of the ribbon bond .
  • ribbon bond area can be smaller without sacrificing manufacturability, reliability or strength .
  • FIG . 7 shows lead frame 11 and semiconductor chip 17 of FIG . 2 with the addition of ribbon bond 61 as described in conjunction with FIG . 6.
  • FIG . 7 further shows a plurality of or multiple ribbon bonds 231 , and includes width 51 as referenced in paragraph [ 0025 ] .
  • FIG . 8 shows lead frame 11 and semiconductor chip 17 of FIG . 1 with the addition of wire bond 71 , which is an attachment structure coupling a control electrode 226 on semiconductor chip 17 to a pad portion 114 of lead frame 11.
  • control electrode 226 comprises a metal suitable for wire bonding such as aluminum or an aluminum alloy .
  • Wire bond 71 is formed using conventional wire bonding techniques , and comprises for example , aluminum or gold.
  • wire bond 71 has a loop height that is less than the height of undulating clip 31 so that wire bond 71 is not exposed in the embodiment of FIG . 3.
  • FIG . 9 shows lead frame 11 and semiconductor chip 17 of FIG . 2 with the addition of wire bond 71 coupling control electrode 226 on semiconductor chip 17 to pad portion 114 of lead frame 11.
  • control electrode 226 comprises a metal suitable for wire bonding - such as aluminum or an aluminum alloy .
  • Wire bond 71 is formed using conventional wire bonding techniques, and comprises for example, aluminum or gold .
  • wire bond 71 has a loop height that is less than the height of ribbon bond 231 so that wire bond 71 is not exposed in the embodiment of FIG . 4.
  • the package includes an electronic chip that is orientated so that the heat generating or major current carrying electrode is away from the side of the package intended to attach to a next level of assembly. This provides an improved thermal path through the top of the package .
  • the package further includes an undulating attachment structure that places a portion of the attachment structure closer to the top of the package thereby further reducing the thermal resistance path .
  • the package incorporates a high thermal conductivity mold compound (greater than about 3.0 W/mK) and a thin profile ( less than about 1.10 millimeters) to further enhance thermal dissipation .
  • a portion of the undulating attachment structure is exposed to further enhance thermal dissipation .
  • the undulating attachment structure has an omega-like shape to provide more conductive surface area for heat transfer .
  • a heat sink device is added to the top of the package to further enhance thermal dissipation .

Landscapes

  • Cooling Or The Like Of Semiconductors Or Solid State Devices (AREA)
  • Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
  • Lead Frames For Integrated Circuits (AREA)

Abstract

In one embodiment, a packaged semiconductor device having enhanced thermal dissipation characteristics includes a lead frame structure and a semiconductor chip having a major current carrying or heat generating electrode. The semiconductor chip is oriented so that the major current carrying electrode faces the top of the package or away from the next level of assembly. The packaged semiconductor device further includes a non-planar, stepped or undulating attachment structure coupling the current carrying electrode to the lead frame. A high thermal conductivity mold compound and thin package profile further enhance thermal dissipation.

Description

SEMICONDUCTOR PACKAGE STRUCTURE HAVING ENHANCED THERMAL DISSIPATION CHARACTERISTICS
Background of the Invention
[0001] The present invention relates in general to semiconductor device packaging and, more particularly, to semiconductor components housed in packages having improved heat transfer characteristics . [0002] There is a continuing demand for electronic systems with a higher functionality and smaller physical size . With this demand, there are several challenges that face electronic component designers and manufacturers . Such challenges include the management of heat generated by power semiconductor devices, which are typically arranged closely together or next to sensitive logic circuits on electronic circuit boards .
[0003] In current configurations , plastic encapsulated devices are commonly used. One problem with plastic packages is that the thermal conductivity out of a package is often limited by the plastic molding material . As a result , the majority of the heat generated by the semiconductor device is transferred through the lower part of the package next to the printed circuit board . Because the printed circuit boards are becoming more densely populated, the boards cannot properly dissipate or handle large amounts of heat . When this happens , the boards can warp, which can cause damage to both the board and the components on the board. In addition, the heat itself can damage other components on the printed circuit board or the materials that make up the board.
[0004] In view of this problem, the semiconductor industry is migrating to packages that have the capability of transferring heat out through the top of the package instead of through the printed circuit boards . Such packages may also include a heat sink attached to the top of the package to further aid in heat transfer . [0005] One such package is the DirectFET™ package shown in a Board Mounting Application Note AN-1035 entitled
"DirectFET™ Technology" dated January 2002 by International Rectifier Corporation . In this design, plastic mold compound is eliminated altogether because of its perceived poor heat transfer characteristics . [0006] This design has several disadvantages . First , because the package does not use mold compound, the semiconductor is left unprotected making it susceptible to damage or contamination . Also, this design utilizes non- standard manufacturing techniques , which adds to manufacturing cycle time and increases manufacturing costs . In addition, in certain applications this design places the main current carrying electrode (e . g . , source electrode) in a down orientation or next to the printed circuit board, which lessens heat transfer capability . In other applications, this design places the main current carrying electrode in an up orientation or away from the printed circuit board, but in direct contact with an unpassivated heat sink, which is a safety concern under operation . [0007] Accordingly, a need exists for semiconductor packages that have enhanced thermal dissipation characteristics without detrimentally impacting device reliability, safety, manufacturing cycle time, and cost . Brief Description of the Drawings
[0008] FIG . 1 illustrates an enlarged cross-sectional view of a package structure according to an embodiment of the present invention;
[0009] FIG . 2 illustrates an enlarged cross-sectional view of a package structure according to a second embodiment of the present invention; [0010] FIG . 3 illustrates an enlarged cross-sectional view of a package structure according to a third embodiment of the present invention;
[0011] FIG . 4 illustrates an enlarged cross-sectional view of a package structure according to a fourth embodiment of the present invention;
[0012] FIG . 5 illustrates an enlarged cross-sectional view of a package structure according to a fifth embodiment of the present invention;
[0013] FIG . 6 illustrates an embodiment of an interconnect scheme for the package structures of FIGS . 1 and 4 ;
[0014] FIG . 7 illustrates another embodiment of an interconnect scheme for the package structures of FIGS . 1 and 4 ; ' [0015] FIG . 8 illustrates an embodiment of an interconnect scheme for the package structures of FIGS . 2 and 3 ; and
[0016] FIG . 9 illustrates another embodiment of an interconnect scheme for the package structures of FIGS . 2 and 3. Detailed Description of the Drawings
[0017] For ease of understanding, elements in the drawing figures are not necessarily drawn to scale, and like element numbers are used where appropriate throughout the various figures . Although the invention is described using a QFN/DFN embodiment , those skilled in the art will recognize that the present invention is applicable to other types of packages as well , particularly those where enhanced heat transfer characteristics are important .
[0018] FIG . 1 shows an enlarged cross-sectional view of a packaged semiconductor structure, QFN/DFN package, leadless packaged device or package 10 having enhanced thermal dissipation or heat transfer characteristics in accordance with the present invention . Packaged device 10 includes a conductive substrate or lead frame 11 , which includes a flag, plate, or die attach portion 13 and a lead, terminal , connection, or pad portion 14. Lead frame 11 comprises , for example, copper, a copper alloy (e . g . , TOMAC 4 , TAMAC 5 , 2ZFROFC, or CDA194 ) , a copper plated iron/nickel alloy (e . g . , copper plated Alloy 42 ) , plated aluminum, plated plastic , or the like . Plated materials include copper, silver, multi-layer plating such nickel-palladium and gold. Flag portion 13 and pad portion 14 are used to connect or couple to bonding pads on a next level of assembly such as a printed circuit board .
[0019] Package 10 further includes an electronic chip or semiconductor device 17 , which is attached to flag 13 using a die attach layer 19. Semiconductor device 17 comprises , for example, a power MOSFET device, a bipolar transistor, an insulated gate bipolar transistor, a thyristor, a diode, an analog or digital integrated circuit , a sensor, a passive component , or other electronic device . In an exemplary embodiment, semiconductor device 17 comprises a power MOSFET device including a source, an up-source or major current carrying electrode 21 , a drain, down-drain or current carrying electrode 23 , and a gate or control electrode 26 ( shown in FIG . 6 ) . Source electrode 21 comprises , for example, a solderable top metal , aluminum, an aluminum alloy, or the like . Drain electrode 23 typically comprises a solderable metal layer or layers such as TiNiAg, CrNiAu, or the like . In accordance with the present invention, semiconductor chip 17 is in a major current carrying electrode or source electrode "up" configuration . That is , the major heat generating electrode (e . g . , electrode 21 ) of semiconductor chip 17 is oriented away from or opposite from the side of package 10 that will be attached to the next level assembly . This orientation promotes heat transfer out of top surface 28 of package 10 , instead of through the next level of assembly or through the chip itself . [0020] An attachment structure, undulating, stepped, or non-planar attachment structure or conductive clip or strap 31 is coupled to source electrodes 21 and pad portion 14 to provide an electrical path between semiconductor chip 17 and pad portion 14. Clip 31 comprises , for example, rigid copper or a copper alloy and is optionally plated with silver for either solder attachment or conductive epoxy attachment . In the embodiment shown and in accordance with the present invention, clip 31 preferably is undulating, stepped or non-planar so that portions of clip 31 are closer to top surface 28 of package 10 and not in contact with semiconductor chip 17. This provides a reduced thermal resistance path for improved conductive heat transfer away from semiconductor chip 34 compared to a flat or planar clip . Preferably, at least about 50% of the surface area of clip 31 is in contact with electrode 21, and the balance of the surface area is that portion of clip 31 undulating or stepped away from electrode 21. Preferably, clip 31 has at least 2 steps . Optional attachment or interconnect schemes for control electrode 26 are shown and described in conjunction with FIGS . 6 and 7.
[0021] An encapsulating or passivating layer 29 is formed over lead frame 11 , semiconductor chip 17 , and at least portions of clip 31 using a single cavity or overmolding process . In accordance with the present invention, encapsulating layer 29 comprises a high thermal conductivity mold compound . Preferably, encapsulating layer 29 comprises a mold compound having a thermal conductivity greater than about 3.0 Watts/MK.. Suitable high conductivity mold compounds are available from Sumitomo Plastics America of Santa Clara, California ( e . g . , EME A700 series ) and Hitachi Chemical of Santa Clara, California (e . g . , a CEL 9000 series mold compound) .
[0022] Preferably, package 10 has an overall height 34 less than about 1.10 millimeters . In a more preferred embodiment , height 34 is less than about 0.80 millimeters . Additionally, the thickness of encapsulating layer 29 above semiconductor chip 17 is less than about 0.53 millimeters . These dimensions together with undulating clip 31 , the orientation of major current carrying electrode 21 , and the high conductivity mold compound provide for an enhanced heat transfer effect . In particular, thermal studies evaluating a comparable sized package 10 to a DirectFET™ product showed that a package 10 according to the present invention assembled with a mold compound having a thermal conductivity greater that or equal to about 3.0 Watts/mK, and a height 34 of less than about 0.80 millimeters had an equal or better thermal resistance ( junction to top of package) characteristic .
[0023] Undulating clip 31 is shown with one or more optional mold lock features or notches 39 , which are used to provide better adhesion between encapsulating layer 29 and clip 31. More or fewer notches 39 may be used . Additionally, package 10 includes an optional heat sink device 43 , which is attached to package 10 with, for example, a high conductivity epoxy material 42 , such as a CEL9750 HFLO (AL3 ) or a CEL9210 HFLO (AL2 ) epoxy available from Hitachi Chemical , or an EMF 760a epoxy available from Sumitomo Plastics America . It is understood that heat sink 43 is an option for all package embodiment described including those shown in FIGS . 2-5 hereinafter . In applications where safety is a concern, heat sink 43 is optionally coated with an insulating material such as a thermal grease .
[0024] FIG . 2 shows an enlarged cross-sectional view of a packaged semiconductor structure, QFN/DFN package, leadless packaged device, or package 100 according to a second embodiment of the present invention . Package 100 is similar to package 10 except that instead of undulating clip 31 , an undulating or non-planar attachment structure or ribbon bond ( s ) 231. is used to couple major current carrying electrode 21 semiconductor chip 17 to pad portion 14.
[0025] Ribbon bond 231 refers to a flexible rectangular shaped conductor, wherein a width 51 of ribbon bond 231 ( shown in FIG . 7 ) is greater than a thickness 52 of ribbon bond 231. Suitable materials for ribbon bond 231 include gold, aluminum, silver, palladium, copper or the like .
Attachment of ribbon bond 231 typically includes ultrasonic wedge bonding end 232 to source electrodes 21 , and wedge bonding end 233 to pad portion 14. In one embodiment , ribbon bond 231 is formed having a thickness of about twenty five microns and a width of about seventy five microns . Alternatively, ribbon bond 231 is typically formed to a thickness 52 of about six microns to fifty microns and a width 52 of about fifty microns to fifteen hundred microns wide . One advantage of the embodiments of FIGS . 1 and 2 is that the top side of packages 10 and 100 are electrically- insulated so that the safety issues associated with prior art structure are avoided .
[0026] FIG . 3 shows an enlarged cross-sectional view of a packaged semiconductor structure, QFN/DFN package, leadless packaged device, or package 110 according to a third embodiment of the present invention . Package 110 is similar to package 10 except that in package 110 , an encapsulating layer 129 covers only a portion of undulating clip 31. That is , in package 110 , portions 310 of clip 31 are left exposed, which further enhances the heat transfer characteristics of the package while semiconductor chip 17 is still covered or passivated by encapsulating layer 129. In this embodiment , encapsulating layer 129 preferably comprises materials similar to encapsulating layer 29.
[0027] FIG . 4 shows an enlarged cross-sectional view of a packaged semiconductor structure, QFN/DFN package, leadless packaged device, or package 200 according to another embodiment of the present invention . Package 200 is similar to package 100 except that in package 200 , an encapsulating layer 229 covers only a portion of attachment structure or ribbon bond 231. That is , in package 200 , portions 331 of ribbon bond 231 are left exposed, which further enhances the heat transfer characteristics of the package while semiconductor chip 17 is still covered or passivated by encapsulating layer 129. In this embodiment , encapsulating layer 229 preferably comprises materials similar to encapsulating layer 29. [0028] In a preferred method for forming packages 110 and 200 , after attachment structures 31 and 231 are formed, the assemblies are placed in a molding apparatus so that portions 310 and 331 contact or adj oin a surface of the mold cavity . The surface of the mold cavity acts as a mask to prevent encapsulating material 129 and 229 from covering portions 310 and 331.
[0029] FIG . 5 shows an enlarged cross-sectional view of a packaged semiconductor structure, QFN/DFN package, leadless packaged device, or package 210 according to a further embodiment of the present invention . Package 210 is similar to package 100 except that in package 210 , an undulating or non-planar attachment structure or ribbon bond 431 is used having an omega or substantially omega-like shape . That is ribbon bond 431 includes base portions 432 and upper portions 433 above semiconductor chip 17 , wherein the base portions 432 have a width less than the width of upper portions 433. Omega shaped ribbon bond 431 provides an undulating attachment structure that has more conductive surface area, which provides for a package with enhanced heat transfer characteristics . In an alternative embodiment, portions of omega shaped ribbon bond 431 are exposed similar to the packages shown in FIGS . 3 and 4. [0030] FIGS . 6-9 show embodiments of different attachment structure schemes for use with the present invention prior to an encapsulation step . FIG . 6 shows lead frame 11 and semiconductor chip 17 of FIG . 1 with the addition of control electrode attachment structure 61 coupling a control electrode 26 (as referenced in paragraph [ 0019 ] ) on semiconductor chip 17 to pad portion 114. In this embodiment, control electrode attachment structure 61 comprises a ribbon bond. In general , an area of control electrode 26 is selected to be approximately three times the width by three times the thickness of the ribbon bond . One advantage to ribbon bond 61 is that compared to contact areas required for wire bonds , ribbon bond area can be smaller without sacrificing manufacturability, reliability or strength .
[0031] FIG . 7 shows lead frame 11 and semiconductor chip 17 of FIG . 2 with the addition of ribbon bond 61 as described in conjunction with FIG . 6. FIG . 7 further shows a plurality of or multiple ribbon bonds 231 , and includes width 51 as referenced in paragraph [ 0025 ] .
[0032] FIG . 8 shows lead frame 11 and semiconductor chip 17 of FIG . 1 with the addition of wire bond 71 , which is an attachment structure coupling a control electrode 226 on semiconductor chip 17 to a pad portion 114 of lead frame 11. In this embodiment , control electrode 226 comprises a metal suitable for wire bonding such as aluminum or an aluminum alloy . Wire bond 71 is formed using conventional wire bonding techniques , and comprises for example , aluminum or gold. In a preferred embodiment , wire bond 71 has a loop height that is less than the height of undulating clip 31 so that wire bond 71 is not exposed in the embodiment of FIG . 3.
[0033] FIG . 9 shows lead frame 11 and semiconductor chip 17 of FIG . 2 with the addition of wire bond 71 coupling control electrode 226 on semiconductor chip 17 to pad portion 114 of lead frame 11. In this embodiment, control electrode 226 comprises a metal suitable for wire bonding - such as aluminum or an aluminum alloy . Wire bond 71 is formed using conventional wire bonding techniques, and comprises for example, aluminum or gold . In a preferred embodiment, wire bond 71 has a loop height that is less than the height of ribbon bond 231 so that wire bond 71 is not exposed in the embodiment of FIG . 4.
[0034] By now it should be appreciated that there has been provided a semiconductor package structure that has enhanced thermal dissipation or heat transfer characteristics . The package includes an electronic chip that is orientated so that the heat generating or major current carrying electrode is away from the side of the package intended to attach to a next level of assembly. This provides an improved thermal path through the top of the package . The package further includes an undulating attachment structure that places a portion of the attachment structure closer to the top of the package thereby further reducing the thermal resistance path . In addition, the package incorporates a high thermal conductivity mold compound (greater than about 3.0 W/mK) and a thin profile ( less than about 1.10 millimeters) to further enhance thermal dissipation . In an alternative embodiment , a portion of the undulating attachment structure is exposed to further enhance thermal dissipation . In an additional embodiment, the undulating attachment structure has an omega-like shape to provide more conductive surface area for heat transfer . In a still further embodiment , a heat sink device is added to the top of the package to further enhance thermal dissipation .

Claims

CLAIMS What is claimed is :
1. A semiconductor package comprising : a conductive substrate having a flag portion and a pad portion; an electronic chip coupled to the flag portion, wherein the electronic chip includes a maj or current carrying electrode on a surface opposite the flag portion; an attachment structure coupling the major current carrying electrode to the pad portion; and an encapsulating layer having a thermal conductivity greater than or equal to about 3.0 Watts/mK, wherein the encapsulating layer covers the electronic chip and at least a portion of the undulating attachment structure .
2. The package of claim 1 wherein the attachment structure comprises a stepped clip .
3. The package of claim 2 wherein a portion of the stepped clip is exposed.
4. The package of claim 2 wherein the stepped clip has at least two steps .
5. The package of claim 1 wherein the attachment structure comprises a undulating ribbon bond.
6. The package of claim 5 wherein a portion of the undulating ribbon bond is exposed.
7. The package of claim 5 wherein the undulating ribbon bond has a substantially omega-like shape .
8. The package of claim 1 wherein the encapsulating layer covers the attachment structure .
9. The package of claim 1 wherein the package has height less than about 1.10 millimeters .
10. The package of claim 1 wherein the electronic chip further includes a control electrode, and wherein the conductive substrate further includes a second pad portion, and wherein a second attachment structure couples the control electrode to the second pad portion .
11. The package of claim 9 wherein the second attachment structure includes a ribbon bond.
12. The package of claim 9 wherein the second attachment structure includes a wire bond.
13. The package of claim 1 wherein the attachment structure includes a mold lock .
14. The package of claim 1 further comprising a heat sink attached to an upper surface of the semiconductor package .
15. A leadless semiconductor package having enhanced thermal dissipation comprising : a lead frame including a terminal portion; a semiconductor device having a first electrode on a surface; a stepped attachment structure coupled to the first electrode and the terminal portion; and a passivating layer covering the semiconductor device and at least a portion of the stepped attachment structure .
16. The leadless semiconductor package of claim 15 wherein the stepped attachment structure comprises an stepped clip having at least two steps .
17. The leadless semiconductor package of claim 15 wherein the stepped attachment structure comprises an undulating ribbon bond.
18. The leadless semiconductor package of claim 15 wherein a portion of the stepped attachment structure is exposed.
19. The leadless semiconductor package of claim 15 wherein the stepped attachment structure has a substantially omega-like shape .
20. The leadless semiconductor package of claim 15 wherein the passivating layer comprises a material having a thermal conductivity greater than or equal to about 3.0 Watts/mK.
21. A electronic package comprising : a semiconductor die having a major current carrying electrode; a stepped attachment structure coupled to the major current carrying electrode; and an encapsulating layer covering at least a portion of the semiconductor die while leaving a portion of the stepped attachment structure exposed .
22. The electronic package of claim 21 wherein the stepped attachment structure comprises a stepped clip .
23. The electronic package of claim 21 wherein the stepped attachment structure comprises an undulating ribbon bond .
24. The electronic package of claim 21 wherein the semiconductor die further includes a control electrode and a second attachment structure attached thereto .
25. The electronic package of claim 24 wherein the second attachment structure comprises a ribbon bond .
26. The electronic package of claim 24 wherein the second attachment structure comprises a wire bond.
27. The electronic package of claim 21 wherein the encapsulating layer comprises a material having a thermal conductivity greater than or equal to about 3.0 Watts/mK.
PCT/US2004/043076 2004-12-20 2004-12-20 Semiconductor package structure having enhanced thermal dissipation characteristics Ceased WO2006068642A1 (en)

Priority Applications (5)

Application Number Priority Date Filing Date Title
HK08103408.2A HK1113230B (en) 2004-12-20 Semiconductor package structure having enhanced thermal dissipation characteristics
CN2004800445283A CN101073151B (en) 2004-12-20 2004-12-20 Semiconductor packaging structure with enhanced heat dissipation
US11/575,808 US7944044B2 (en) 2004-12-20 2004-12-20 Semiconductor package structure having enhanced thermal dissipation characteristics
PCT/US2004/043076 WO2006068642A1 (en) 2004-12-20 2004-12-20 Semiconductor package structure having enhanced thermal dissipation characteristics
TW094137199A TWI381499B (en) 2004-12-20 2005-10-24 Semiconductor package structure with enhanced heat dissipation characteristics

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/US2004/043076 WO2006068642A1 (en) 2004-12-20 2004-12-20 Semiconductor package structure having enhanced thermal dissipation characteristics

Publications (1)

Publication Number Publication Date
WO2006068642A1 true WO2006068642A1 (en) 2006-06-29

Family

ID=34959832

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2004/043076 Ceased WO2006068642A1 (en) 2004-12-20 2004-12-20 Semiconductor package structure having enhanced thermal dissipation characteristics

Country Status (4)

Country Link
US (1) US7944044B2 (en)
CN (1) CN101073151B (en)
TW (1) TWI381499B (en)
WO (1) WO2006068642A1 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2007052199A1 (en) * 2005-11-01 2007-05-10 Nxp B.V. Methods of packaging a semiconductor die and package formed by the methods
US9728694B2 (en) 2014-04-10 2017-08-08 Nichia Corporation Light emitting device and manufacturing method thereof

Families Citing this family (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102005057401B4 (en) * 2005-11-30 2009-10-08 Infineon Technologies Ag Semiconductor component and method for its production
US7915081B2 (en) 2006-03-31 2011-03-29 Intel Corporation Flexible interconnect pattern on semiconductor package
US7692276B2 (en) * 2007-08-09 2010-04-06 Broadcom Corporation Thermally enhanced ball grid array package formed in strip with one-piece die-attached exposed heat spreader
JP4989437B2 (en) * 2007-12-14 2012-08-01 ルネサスエレクトロニクス株式会社 Manufacturing method of semiconductor device
DE102008031786B4 (en) * 2008-07-04 2012-11-08 Osram Ag LED module with a heat sink
US8796837B2 (en) 2009-03-03 2014-08-05 Ixys Corporation Lead and lead frame for power package
US9230874B1 (en) * 2009-07-13 2016-01-05 Altera Corporation Integrated circuit package with a heat conductor
CN102202484B (en) * 2010-03-23 2014-04-16 施耐德东芝换流器欧洲公司 Diagnosis method for heat radiation system
US20120098117A1 (en) * 2010-10-22 2012-04-26 Renesas Technology America, Inc. Power and thermal design using a common heat sink on top of high thermal conductive resin package
US9054040B2 (en) * 2013-02-27 2015-06-09 Infineon Technologies Austria Ag Multi-die package with separate inter-die interconnects
US9123708B2 (en) * 2013-03-01 2015-09-01 Infineon Technologies Austria Ag Semiconductor chip package
US9041170B2 (en) 2013-04-02 2015-05-26 Infineon Technologies Austria Ag Multi-level semiconductor package
CN104681525B (en) * 2013-11-27 2017-09-08 万国半导体股份有限公司 A multi-chip stacked packaging structure and packaging method thereof
US20150221578A1 (en) * 2014-02-05 2015-08-06 Infineon Technologies Ag Semiconductor package and method for producing a semiconductor
DE102015104995B4 (en) 2015-03-31 2020-06-04 Infineon Technologies Austria Ag Compound semiconductor device with a multi-stage carrier
JP6663340B2 (en) 2016-10-28 2020-03-11 ルネサスエレクトロニクス株式会社 Semiconductor device
KR20190007936A (en) * 2017-07-14 2019-01-23 제엠제코(주) Multiple Combination clip structure and Semiconductor package with clip structure
JP7006706B2 (en) * 2018-01-05 2022-01-24 三菱電機株式会社 Semiconductor device
CN113496960A (en) * 2020-04-01 2021-10-12 上海凯虹科技电子有限公司 Package and packaging method
US20230268311A1 (en) * 2020-07-16 2023-08-24 Rohm Co., Ltd. Semiconductor device, and production method for semiconductor device
JP7638087B2 (en) * 2020-11-30 2025-03-03 新電元工業株式会社 Semiconductor module and method for manufacturing the same
US20220181290A1 (en) * 2020-12-03 2022-06-09 Semiconductor Components Industries, Llc Clip interconnect with micro contact heads
DE102020215346A1 (en) 2020-12-04 2021-12-02 Vitesco Technologies Germany Gmbh Circuit arrangement
DE102021200562A1 (en) 2021-01-22 2022-07-28 Vitesco Technologies Germany Gmbh semiconductor module
US11652078B2 (en) * 2021-04-20 2023-05-16 Infineon Technologies Ag High voltage semiconductor package with pin fit leads
JP7661267B2 (en) * 2022-03-21 2025-04-14 株式会社東芝 Semiconductor Device

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20010033022A1 (en) * 2000-04-26 2001-10-25 International Rectifier Corp. Nickel-iron expansion contact for semiconductor die
US6372539B1 (en) * 2000-03-20 2002-04-16 National Semiconductor Corporation Leadless packaging process using a conductive substrate
US20030082854A1 (en) * 2001-10-26 2003-05-01 Tetsuichiro Kasahara Lead frame, method of manufacturing the same, and method of manufacturing a semiconductor device using the same
US6630726B1 (en) * 2001-11-07 2003-10-07 Amkor Technology, Inc. Power semiconductor package with strap
JP2004277572A (en) * 2003-03-17 2004-10-07 Renesas Technology Corp Solventless liquid silver paste composition and semiconductor device using the same

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5221642A (en) * 1991-08-15 1993-06-22 Staktek Corporation Lead-on-chip integrated circuit fabrication method
US5371404A (en) * 1993-02-04 1994-12-06 Motorola, Inc. Thermally conductive integrated circuit package with radio frequency shielding
US6255722B1 (en) * 1998-06-11 2001-07-03 International Rectifier Corp. High current capacity semiconductor device housing
US6521982B1 (en) * 2000-06-02 2003-02-18 Amkor Technology, Inc. Packaging high power integrated circuit devices
US6975512B1 (en) * 2002-10-31 2005-12-13 Altera Corporation Thermally enhanced heat sink BGA package
CN1287449C (en) * 2003-03-14 2006-11-29 北京有色金属研究总院 High-thermal conductivity silicon-aluminium alloy sealing material with low-density and expansion coefficient, preparing method thereof
US20040217488A1 (en) * 2003-05-02 2004-11-04 Luechinger Christoph B. Ribbon bonding
JP2005302951A (en) * 2004-04-09 2005-10-27 Toshiba Corp Power semiconductor device package

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6372539B1 (en) * 2000-03-20 2002-04-16 National Semiconductor Corporation Leadless packaging process using a conductive substrate
US20010033022A1 (en) * 2000-04-26 2001-10-25 International Rectifier Corp. Nickel-iron expansion contact for semiconductor die
US20030082854A1 (en) * 2001-10-26 2003-05-01 Tetsuichiro Kasahara Lead frame, method of manufacturing the same, and method of manufacturing a semiconductor device using the same
US6630726B1 (en) * 2001-11-07 2003-10-07 Amkor Technology, Inc. Power semiconductor package with strap
JP2004277572A (en) * 2003-03-17 2004-10-07 Renesas Technology Corp Solventless liquid silver paste composition and semiconductor device using the same

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
PATENT ABSTRACTS OF JAPAN vol. 2003, no. 12 5 December 2003 (2003-12-05) *

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2007052199A1 (en) * 2005-11-01 2007-05-10 Nxp B.V. Methods of packaging a semiconductor die and package formed by the methods
US8183682B2 (en) 2005-11-01 2012-05-22 Nxp B.V. Methods of packaging a semiconductor die and package formed by the methods
US9728694B2 (en) 2014-04-10 2017-08-08 Nichia Corporation Light emitting device and manufacturing method thereof
US9887337B2 (en) 2014-04-10 2018-02-06 Nichia Corporation Manufacturing method of light emitting device

Also Published As

Publication number Publication date
CN101073151A (en) 2007-11-14
US20070278664A1 (en) 2007-12-06
TWI381499B (en) 2013-01-01
HK1113230A1 (en) 2008-09-26
US7944044B2 (en) 2011-05-17
TW200633170A (en) 2006-09-16
CN101073151B (en) 2010-05-12

Similar Documents

Publication Publication Date Title
US7944044B2 (en) Semiconductor package structure having enhanced thermal dissipation characteristics
US7755179B2 (en) Semiconductor package structure having enhanced thermal dissipation characteristics
KR101493866B1 (en) Power device package and the method of fabricating the same
US7061080B2 (en) Power module package having improved heat dissipating capability
JP6509885B2 (en) DC-DC converter having terminal of semiconductor chip
KR101519062B1 (en) Semiconductor Device Package
CN1711639B (en) Folded flexible bondwire-less multi-chip power package
CN101073152A (en) Electronic package having down-set leads and method
JPH04293259A (en) Semiconductor device and manufacture thereof
US7221055B2 (en) System and method for die attach using a backside heat spreader
US7084494B2 (en) Semiconductor package having integrated metal parts for thermal enhancement
CN101819955B (en) Semiconductor packaging structure with reinforced heat dissipation property
US8120169B2 (en) Thermally enhanced molded leadless package
US10366946B2 (en) Connection member with bulk body and electrically and thermally conductive coating
WO2006074312A2 (en) Dual flat non-leaded semiconductor package
CN114203659A (en) Multilayer interconnection tape
US20250357284A1 (en) Electronic devices and methods of manufacturing electronic devices
HK1113230B (en) Semiconductor package structure having enhanced thermal dissipation characteristics
HK1147596B (en) Semiconductor package structure having enhanced thermal dissipation characteristics
HK1113228B (en) Semiconductor package structure having enhanced thermal dissipation characteristics
HK1113229B (en) Electronic package having down-set leads and method

Legal Events

Date Code Title Description
AK Designated states

Kind code of ref document: A1

Designated state(s): AE AG AL AM AT AU AZ BA BB BG BR BW BY BZ CA CH CN CO CR CU CZ DE DK DM DZ EC EE EG ES FI GB GD GE GH GM HR HU ID IL IN IS JP KE KG KP KR KZ LC LK LR LS LT LU LV MA MD MG MK MN MW MX MZ NA NI NO NZ OM PG PH PL PT RO RU SC SD SE SG SK SL SM SY TJ TM TN TR TT TZ UA UG US UZ VC VN YU ZA ZM ZW

AL Designated countries for regional patents

Kind code of ref document: A1

Designated state(s): BW GH GM KE LS MW MZ NA SD SL SZ TZ UG ZM ZW AM AZ BY KG KZ MD RU TJ TM AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IS IT LT LU MC NL PL PT RO SE SI SK TR BF BJ CF CG CI CM GA GN GQ GW ML MR NE SN TD TG

121 Ep: the epo has been informed by wipo that ep was designated in this application
WWE Wipo information: entry into national phase

Ref document number: 11575808

Country of ref document: US

WWE Wipo information: entry into national phase

Ref document number: 200480044528.3

Country of ref document: CN

NENP Non-entry into the national phase

Ref country code: DE

WWP Wipo information: published in national office

Ref document number: 11575808

Country of ref document: US

122 Ep: pct application non-entry in european phase

Ref document number: 04815190

Country of ref document: EP

Kind code of ref document: A1