WO2006065059A1 - Appareil de chauffage d'un dispositif a air chaud electronique - Google Patents
Appareil de chauffage d'un dispositif a air chaud electronique Download PDFInfo
- Publication number
- WO2006065059A1 WO2006065059A1 PCT/KR2005/004273 KR2005004273W WO2006065059A1 WO 2006065059 A1 WO2006065059 A1 WO 2006065059A1 KR 2005004273 W KR2005004273 W KR 2005004273W WO 2006065059 A1 WO2006065059 A1 WO 2006065059A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- thin film
- film heater
- metal
- heater
- heating apparatus
- Prior art date
Links
- 238000010438 heat treatment Methods 0.000 title claims abstract description 57
- 239000010409 thin film Substances 0.000 claims abstract description 158
- 229910052751 metal Inorganic materials 0.000 claims abstract description 129
- 239000002184 metal Substances 0.000 claims abstract description 129
- 239000010408 film Substances 0.000 claims abstract description 86
- 238000009413 insulation Methods 0.000 claims abstract description 80
- 229910052755 nonmetal Inorganic materials 0.000 claims abstract description 17
- 230000020169 heat generation Effects 0.000 claims abstract description 12
- 238000010292 electrical insulation Methods 0.000 claims abstract description 7
- 229920000642 polymer Polymers 0.000 claims description 25
- 238000000034 method Methods 0.000 claims description 17
- 229910052782 aluminium Inorganic materials 0.000 claims description 14
- 239000004642 Polyimide Substances 0.000 claims description 11
- 238000000576 coating method Methods 0.000 claims description 11
- 229920001721 polyimide Polymers 0.000 claims description 11
- 239000011248 coating agent Substances 0.000 claims description 8
- 239000004809 Teflon Substances 0.000 claims description 6
- 229920006362 Teflon® Polymers 0.000 claims description 6
- 229920002647 polyamide Polymers 0.000 claims description 6
- 238000005507 spraying Methods 0.000 claims description 6
- 239000010936 titanium Substances 0.000 claims description 6
- 239000004952 Polyamide Substances 0.000 claims description 5
- 230000015556 catabolic process Effects 0.000 claims description 5
- 239000000919 ceramic Substances 0.000 claims description 5
- 239000000126 substance Substances 0.000 claims description 5
- 229910052719 titanium Inorganic materials 0.000 claims description 5
- 239000011521 glass Substances 0.000 claims description 3
- 229910052750 molybdenum Inorganic materials 0.000 claims description 3
- 230000003647 oxidation Effects 0.000 claims description 3
- 238000007254 oxidation reaction Methods 0.000 claims description 3
- 229910052697 platinum Inorganic materials 0.000 claims description 3
- 238000007650 screen-printing Methods 0.000 claims description 3
- 238000004528 spin coating Methods 0.000 claims description 3
- 229910052721 tungsten Inorganic materials 0.000 claims description 3
- FRWYFWZENXDZMU-UHFFFAOYSA-N 2-iodoquinoline Chemical compound C1=CC=CC2=NC(I)=CC=C21 FRWYFWZENXDZMU-UHFFFAOYSA-N 0.000 claims description 2
- 206010010144 Completed suicide Diseases 0.000 claims description 2
- 239000004593 Epoxy Substances 0.000 claims description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims description 2
- LTPBRCUWZOMYOC-UHFFFAOYSA-N beryllium oxide Inorganic materials O=[Be] LTPBRCUWZOMYOC-UHFFFAOYSA-N 0.000 claims description 2
- 230000032798 delamination Effects 0.000 claims description 2
- 238000007598 dipping method Methods 0.000 claims description 2
- 229910052737 gold Inorganic materials 0.000 claims description 2
- 229910001092 metal group alloy Inorganic materials 0.000 claims description 2
- 230000001590 oxidative effect Effects 0.000 claims description 2
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 claims description 2
- 239000003973 paint Substances 0.000 claims description 2
- 229910021332 silicide Inorganic materials 0.000 claims description 2
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 claims description 2
- 239000000463 material Substances 0.000 description 35
- 239000010410 layer Substances 0.000 description 18
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 12
- 230000008569 process Effects 0.000 description 8
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 6
- 238000004519 manufacturing process Methods 0.000 description 5
- 229910052736 halogen Inorganic materials 0.000 description 4
- 150000002367 halogens Chemical class 0.000 description 4
- 238000013021 overheating Methods 0.000 description 4
- 239000005020 polyethylene terephthalate Substances 0.000 description 4
- 229920000139 polyethylene terephthalate Polymers 0.000 description 4
- 239000002861 polymer material Substances 0.000 description 4
- 229910004205 SiNX Inorganic materials 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- 238000001035 drying Methods 0.000 description 3
- 239000003792 electrolyte Substances 0.000 description 3
- 229910052814 silicon oxide Inorganic materials 0.000 description 3
- 239000010935 stainless steel Substances 0.000 description 3
- 229910001220 stainless steel Inorganic materials 0.000 description 3
- 230000003746 surface roughness Effects 0.000 description 3
- 238000012546 transfer Methods 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 229910052790 beryllium Inorganic materials 0.000 description 2
- ATBAMAFKBVZNFJ-UHFFFAOYSA-N beryllium atom Chemical compound [Be] ATBAMAFKBVZNFJ-UHFFFAOYSA-N 0.000 description 2
- 239000002346 layers by function Substances 0.000 description 2
- 238000004518 low pressure chemical vapour deposition Methods 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 238000000623 plasma-assisted chemical vapour deposition Methods 0.000 description 2
- 230000035939 shock Effects 0.000 description 2
- 238000004904 shortening Methods 0.000 description 2
- 238000004088 simulation Methods 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- 238000006731 degradation reaction Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 229910052571 earthenware Inorganic materials 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 238000003487 electrochemical reaction Methods 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 230000004907 flux Effects 0.000 description 1
- 229920006015 heat resistant resin Polymers 0.000 description 1
- 238000002955 isolation Methods 0.000 description 1
- 238000003475 lamination Methods 0.000 description 1
- WABPQHHGFIMREM-UHFFFAOYSA-N lead(0) Chemical compound [Pb] WABPQHHGFIMREM-UHFFFAOYSA-N 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229920000620 organic polymer Polymers 0.000 description 1
- 238000005240 physical vapour deposition Methods 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 238000005546 reactive sputtering Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
Classifications
-
- A—HUMAN NECESSITIES
- A45—HAND OR TRAVELLING ARTICLES
- A45D—HAIRDRESSING OR SHAVING EQUIPMENT; EQUIPMENT FOR COSMETICS OR COSMETIC TREATMENTS, e.g. FOR MANICURING OR PEDICURING
- A45D20/00—Hair drying devices; Accessories therefor
- A45D20/04—Hot-air producers
- A45D20/08—Hot-air producers heated electrically
- A45D20/10—Hand-held drying devices, e.g. air douches
- A45D20/12—Details thereof or accessories therefor, e.g. nozzles, stands
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B3/00—Ohmic-resistance heating
- H05B3/40—Heating elements having the shape of rods or tubes
- H05B3/42—Heating elements having the shape of rods or tubes non-flexible
- H05B3/46—Heating elements having the shape of rods or tubes non-flexible heating conductor mounted on insulating base
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B2203/00—Aspects relating to Ohmic resistive heating covered by group H05B3/00
- H05B2203/013—Heaters using resistive films or coatings
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B2203/00—Aspects relating to Ohmic resistive heating covered by group H05B3/00
- H05B2203/017—Manufacturing methods or apparatus for heaters
Definitions
- the present invention relates to a heating apparatus of an electronic hot wind device, and more particularly, to a heating apparatus of an electronic hot wind device, wherein a thin film heater is used as a heating element in the heating apparatus of the electronic hot wind device, such as a hair dryer, a hand dryer, a drying hood, a fan heater, a hot blast heater, a small-sized hot blast heater for an automobile, a clothes dryer, a dishwasher, a dish dryer and a printer dryer, thereby shortening temperature rise time and lowering electric power consumption.
- a thin film heater is used as a heating element in the heating apparatus of the electronic hot wind device, such as a hair dryer, a hand dryer, a drying hood, a fan heater, a hot blast heater, a small-sized hot blast heater for an automobile, a clothes dryer, a dishwasher, a dish dryer and a printer dryer, thereby shortening temperature rise time and lowering electric power consumption.
- a halogen lamp, a bulk heater or a coil heater is used as a heating element in an electronic hot wind device such as a hair dryer, a drying hood, a fan heater and a hot blast heater.
- the electronic hot wind device comprises a sensor for sensing temperature.
- the heating element is bulky and a heating rate threof is very small due to the small contact area of the heating element with the metal plate.
- the heating element has high electric power consumption by requiring a high electric power of 0.9kW to several kW as electric power for heat generation of the heating element. Additionally, in case of a bulk heater or a coil heater, there is a problem in that a temperature descent rate is small even though the supply of electric power is cut off after use of the electronic hot wind device. Disclosure of Invention
- An object of the present invention is to provide a heating apparatus of an electronic hot wind device, wherein a thin film heater is used as a heating element of the electronic hot wind device, thereby shortening temperature rise time of a surface of a metal plate and lowering electric power consumption.
- a conductive pattern may be formed on one side of the thin film heater of the heating apparatus to induce uniform heat generation of an entire surface of the thin film heater and to reduce a difference in temperature between an electrode lead-in portion of the thin film heater and a central portion of the thin film heater within a shorter period of time at an early stage of supply of electric power, and the metal pads may define a pattern such that a plurality of heating thin film cells are formed.
- FIGs. 1 and 2 are sectional views illustrating embodiments of the structure of a heating apparatus of an electronic hot wind device using a metal plate, according to the present invention.
- FIGs. 3 and 4 are sectional views illustrating embodiments of the structure of a heating apparatus of an electronic hot wind device using a nonmetal plate, according to the present invention.
- FIGs. 5 to 7 are exemplary views of thin film heaters with conductive patterns formed thereon.
- FIGs. 8 and 9 are views showing embodiments of a metal pad defining a pattern on a thin film heater.
- FIGs. 10 to 12 are a view showing a heating apparatus of an electronic hot wind device to which the present invention is applied, and graphs showing measured surface temperature values of the heating apparatus, respectively.
- FIG. 1 is a view illustrating an embodiment of the structure of a heating apparatus using a metal plate for use in an electronic hot wind device, according to the present invention.
- Reference numerals 11, 12, 13, 14, 15, 16 and 17 designate a metal plate, a thin film heater, a temperature sensor, an insulation film, a metal pad, a power connection terminal and a fan, respectively.
- FIG. 2 is a view illustrating an embodiment of the structure of a heating apparatus using a metal plate and a conductive pattern for use in an electronic hot wind device, according to the present invention.
- Reference numerals 18 and 19 designate a conductive pattern and a protecting layer, respectively.
- FIG. 3 is a view illustrating an embodiment of the structure of a heating apparatus of an electronic hot wind device using a nonmetal plate, according to the present invention.
- Reference numerals 20, 12, 13, 14, 15, 16 and 17 designate a nonmetal plate, a thin film heater, a temperature sensor, an insulation film, a metal pad, a power connection terminal and a fan, respectively.
- FIG. 4 is a view illustrating another embodiment of the structure of a heating apparatus of an electronic hot wind device using a nonmetal plate, according to the present invention.
- Reference numerals 18 and 19 designate an conductive pattern and a protecting layer, respectively.
- a heating apparatus of an electronic hot wind device comprises a metal plate 11; an insulation film 14 formed on one side of the metal plate 11 to shield transfer of electricity to the metal plate; a thin film heater 12 formed on the insulation film 14 to generate heat by receiving electric power; metal pads 15 formed at end portions of one side of the thin film heater 12 to supply electric power to the thin film heater; and power connection terminals 16 that are in contact with the metal pads 15 to supply electric power to the metal pads.
- a temperature sensor 13 is in contact with a certain portion of the thin film heater 12 to sense temperature, and a fan 17 exhausts air heated by the metal plate.
- a conductive pattern 18 may be formed on the one side of the thin film heater 12 to induce uniform heat generation of an entire surface of the thin film heater within a short period of time at an early stage of supply of electric power and to reduce a difference in temperature between an electrode lead-in portion of the thin film heater and a central portion of the thin film heater.
- the metal pads 15 can define a pattern such that a plurality of heating thin-film cells are formed.
- a heater protecting layer 19 is preferably formed on a lower surface of the thin film heater 12 to protect the thin film heater 12 from external foreign substances and the like.
- the heater protecting layer may be formed of inorganic heater protecting layer materials (SiNx, SiOx), organic heater protecting layer materials (polyimide, polyamide, Teflon, PET, etc.), and the like.
- the metal plate 11 in the present invention may be composed of a plurality of divided pieces and is fixed by a support member.
- the metal plate 11 used in the present invention is formed of a metal with superior thermal conductivity, such as aluminum or stainless steel.
- the thickness of the metal plate 11 preferably ranges from 0.3mm to 3mm, more preferably 0.3mm to 2mm.
- the insulation film 14 When the thermal conductivity of the insulation film 14 is higher, heat generated by the thin film heater is transferred at a higher rate to the metal plate 11. Therefore, it is preferred that the insulation film have a smaller thickness. That is, the insulation film should be designed to have a smallest thickness capable of securing electrical insulation between the thin film heater 12 and the metal plate 11.
- the thickness of the insulation film 14 preferably ranges from 0.5D to 500D, preferably 0.5D to 200D.
- the thickness of the insulation film may vary according to the material of the insulation film.
- the insulation film 14 should not produce dielectric breakdown and should maintain a leakage current below 2OD when a voltage of about 100V is applied to the thin film heater.
- the insulation film should have a superior contact property with the thin film heater or the metal plate such that the insulation film is not physically de- laminated from the metal plate when the material of the thin film heater generates heat at a high temperature. Furthermore, when the material of the thin film heater generates heat at a high temperature, a chemical reaction between the insulation film and the material of the thin film heater or the metal plate should not occur.
- the insulation film should have good surface roughness such that the surface roughness thereof does not affect the electrical resistivity of the material of the thin film heater.
- the surface of the metal plate may be formed with one or two or more insulation films selected from the group consisting of an oxidized insulation film formed by oxidizing the surface of aluminum or stainless steel using an arc, an insulation film formed by coating ceramic, glass or ceramic glaze on the surface of the metal plate, and a polymer insulation film formed by coating a polymer on the surface of the metal plate.
- the insulation film may be a polymer insulation film formed of polymer-based materials such as polyimide, polyamide, Teflon and PET, or a film to which the oxidized insulation film and the polymer insulation film are simultaneously applied.
- the oxidized insulation film can be formed using electrical energy such as an arc applied from the outside to the metallic surface of a metal plate, which is made of aluminum (Al), beryllium (Be), titanium (Ti) or stainless steel and dipped in an alkaline electrolyte, so that an electrochemical reaction occurs between metal atoms of the metal surface and external oxygen to convert properties of the metallic surface into an oxidized film.
- electrical energy such as an arc applied from the outside to the metallic surface of a metal plate, which is made of aluminum (Al), beryllium (Be), titanium (Ti) or stainless steel and dipped in an alkaline electrolyte, so that an electrochemical reaction occurs between metal atoms of the metal surface and external oxygen to convert properties of the metallic surface into an oxidized film.
- Al O , ZrO , Y O or the like is used for the oxidized insulation film, and the oxidized insulation film may be formed on the metal plate by means of plasma spray coating and the like.
- plasma spray coating and the like one embodiment of a process of forming the oxidized insulation film on the metal plate will be described below.
- an aluminum oxide can be formed on the surface of a metal plate 11 made of aluminum
- a titanium oxide can be formed on the surface of a metal plate 11 made of titanium
- a beryllium oxide can be formed on the surface of a metal plate 11 made of beryllium.
- an electrical insulation film using a polymer material is formed to have a uniform thickness between a metal substrate and a thin film heater for generating heat by means of a spin coating method using the polymer material capable of securing an electrical insulation property for electrical insulation between the two layers.
- a polymer insulation film is formed using a liquid organic polymer material that is to be uniformly coated on the surface of the metal plate 11 made of a metal.
- coating methods include a spin coating method, a spray coating method, a dipping coating method, and a screen printing method.
- polymer materials include polyimide-based materials, polyamide- based materials, Teflon-based materials, paint-based materials, silver-ston, Tefzel-s, epoxy, rubber, and UV-sensitive materials.
- An embodiment of a process of coating a polyimide-based material on the metal plate 11 by means of the spray coating method is as follows. [51] The metal plate 11 is cleaned with acetone, IPA (isopropyl alcohol) or the like, the polyimide-based material is sprayed onto the metal plate 11 while the cleaned metal plate 11 is rotated at a high speed (e.g., 2,000rpm or more), and the polyimide-based material coated on the surface of the metal plate 11 is subjected to heat treatment.
- a high speed e.g., 2,000rpm or more
- a double insulation film comprising an oxidized insulation film and a polymer insulation film can be formed by forming the oxidized insulation film on the surface of a metal plate 21 made of a metal and uniformly coating a polymer-based material on the oxidized insulation film, or by coating the polymer-based material on the surface of the metal plate made of a metal and forming the oxidized insulation film on the coated polymer-based material.
- the case where the oxidized insulation film and the polymer insulation film are simultaneously formed can reduce the thickness of each of the insulation films and minimize dielectric breakdown of the insulation films as compared with a case where only one insulation film of the oxidized insulation film and the polymer insulation film is formed.
- the thickness of the insulation film 14 preferably ranges from 0.5D to 500D, more preferably 0.5D to 200D for efficient heat transfer (the thickness of the insulation film varies according to the material of the insulation film).
- the insulation film 14 has a dielectric breakdown voltage of 1,000V or more, and a leakage current of 2OD or less upon application of a voltage of 100V.
- the insulation film 14 should be formed such that it is not delaminated respectively from the metal plate 11 and the thin film heater 12 when the thin film heater 12 generates heat (in a thermal cycle).
- the thin film heater 12 generates heat in a resistive heat generation manner by means of application of a DC or AC voltage to the metal pads 15 connected to the thin film heater 12 so that a predetermined amount of current can flow through the thin film heater.
- the thin film heater 12 may be made of a single metal (e.g., Ta, W, Pt, Ru, Hf, Mo,
- a binary metal alloy e.g., TaW, etc.
- a binary metal-nitride e.g., WN, MoN, ZrN, etc.
- a binary metal- suicide e.g., TaSi, WSi, etc.
- a thick conductive paste such as Ag/Pd.
- the thin film heater 12 has a thickness of several tens D or less (e.g., 0.05D to 3OD, wherein the thickness of the thin film heater varies according to the material of the thin film heater).
- the heat capacity of the thin film heater 12 is expressed as a function with a parameter of thickness.
- the present invention can deduce an optimum thickness range of the thin film heater 12 through various simulations and experiments to satisfy two requirements for the instantaneous rise of the temperature of the thin film heater 12 and the extension of the lifespan of the thin film heater 12. There may be a slight difference in thickness according to the material of the thin film heater 12.
- the optimum thickness of the thin film heater 12 is deduced based on the following formula.
- the optimum thickness range of the thin film heater 12 (e.g., 0.05D to 30D) is deduced according to the material of the thin film heater 12 corresponding to characteristics of each product by performing simulation with the aforementioned parameters as input data considering the resistivity value range of the material of the thin film heater 12.
- Methods for forming a thin film heater using vacuum evaporation include a thick film screen printing method, physical vapor deposition (sputtering, reactive sputtering, co-sputtering, evaporation and E-beam) methods, and chemical vapor deposition (low pressure chemical vapor deposition (LPCVD) and plasma enhanced chemical vapor deposition (PECVD)) methods.
- sputtering, reactive sputtering, co-sputtering, evaporation and E-beam physical vapor deposition
- chemical vapor deposition low pressure chemical vapor deposition (LPCVD) and plasma enhanced chemical vapor deposition (PECVD)
- a protecting layer is preferably formed on the thin film heater to protect the thin film heater.
- the heater protecting layer is formed of inorganic heater protecting layer materials such as SiNx and SiOx and organic heater protecting layer materials such as polyimide, polyamide, Teflon and PET.
- the protecting layer may be formed on a thin film heater with a conductive pattern formed thereon as well as a thin film heater with no conductive pattern formed thereon.
- a conductive pattern 18 having lower electric resistance and higher thermal conductivity than thin film heaters with various shapes and configurations can be formed on one side of the thin film heater.
- the formation of the conductive pattern on the thin film heater can improve a production yield over a single thin film heater on which a conductive pattern is not formed upon production of the thin film heater. This is because the single thin film heater on which a conductive pattern is not formed may suffer from degradation in the quality of the entire resistor even due to a minute thickness difference in or damage such as a scratch to a portion of the entire thin film heater, resulting in drop in the production yield of the thin film heater.
- the metal pads 15 are formed on both ends of the thin film heater 12 to secure a uniform current density in the thin film heater 12, so that the metal pads 15 can be responsible for electrical connection between the thin film heater 12 and an external power supply.
- the metal pads 15 may have various shapes and configurations. It is preferred that the width of the metal pads 15 be identical with or larger than that of the thin film heater 12 to provide a constant current density to the thin film heater 12.
- the metal pads 15 in the present invention can define patterns at different positions with a variety of configurations, sizes and numbers such that a plurality of heating thin film cells are formed as illustrated in Figs. 8 and 9.
- the metal pads should have temperature stability during heat generation of the thin film heater and should not produce resistance increase or physical delamination due to oxidation of the metal pads.
- the metal pads in the present invention can be made of Al, Au, W, Pt, Ag, Ta, Mo, Ti or the like.
- a protecting layer be formed on the thin film heater
- the protecting layer may be formed of inorganic heater protecting layer materials (SiNx, SiOx), organic heater protecting layer materials (polyimide, polyamide, Teflon, PET, etc.) and the like.
- a heating apparatus of an electronic hot wind device comprises a nonmetal plate 20; a thin film heater 12 formed on one side of the nonmetal plate 20 to generate heat by receiving electric power; metal pads 15 formed at end portions of one side of the thin film heater 12 to supply electric power to the thin film heater; and power connection terminals 16 that are in contact with the metal pads 15 to supply electric power to the metal pads.
- the one side of the thin film heater 12 may be formed with a conductive pattern 18 for ensuring uniform heat generation on the entire surface of the thin film heater within a shorter period of time at an early stage of supply of electric power and for preventing the occurrence of an overheating phenomenon at an electrode lead-in portion of the thin film heater as well as a heater protecting layer 19 for protecting the thin film heater 12 from external foreign substances.
- the metal pads 15 can define a pattern such that a plurality of heating thin film cells are formed in the same manner as the case where the metal plate is used.
- a nonmetal plate is made of thermally enhanced plastics, heat resistant resins, ceramics, glass and earthenware capable of resisting to a temperature of at least 25O 0 C.
- FIG. 9 shows a heating apparatus of an electronic hot wind device to which the present invention is applied
- Fig. 10 illustrates a graph showing measured changes in the surface temperature of the heating apparatus with time when an electric power of 50 watts is applied to the heating apparatus of the electronic hot wind device shown in Fig. 9
- Fig. 11 illustrates a graph showing measured changes in the surface temperature when varying power is applied for 10 seconds to the heating apparatus of the electronic hot wind device shown in Fig. 9.
- 9 to 11 are numerical values obtained in one embodiment of a heating apparatus of an electronic hot wind device, and the numerical values may be deduced as different results according to resistance values, thicknesses and materials of respective components such as the thin film heater, the insulation film, the metal pads and the metal plate.
- an optimum product can be produced by differently applying resistance values, thicknesses, materials and the like of respective components such as the thin film heater, the insulation film, the metal pads and the metal plate in consideration of product requirements for a heating apparatus of an electronic hot wind device so as to reduce time required to reach a surface temperature and power consumption corresponding to product characteristics.
Landscapes
- Surface Heating Bodies (AREA)
- Resistance Heating (AREA)
Abstract
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR20040105733 | 2004-12-14 | ||
KR10-2004-0105733 | 2004-12-14 |
Publications (1)
Publication Number | Publication Date |
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WO2006065059A1 true WO2006065059A1 (fr) | 2006-06-22 |
Family
ID=36588080
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/KR2005/004273 WO2006065059A1 (fr) | 2004-12-14 | 2005-12-13 | Appareil de chauffage d'un dispositif a air chaud electronique |
Country Status (2)
Country | Link |
---|---|
KR (1) | KR20060067858A (fr) |
WO (1) | WO2006065059A1 (fr) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2008103372A2 (fr) * | 2007-02-20 | 2008-08-28 | Thermoceramix Inc. | Appareil de chauffage au gaz et procédés associés |
EP2044858A1 (fr) * | 2007-06-26 | 2009-04-08 | Takashi Mukai | Fer à friser |
WO2011025880A1 (fr) * | 2009-08-27 | 2011-03-03 | Tornier, Inc. | Élément chauffant à substrat métallique |
WO2012019855A1 (fr) * | 2010-08-11 | 2012-02-16 | Valeo Systemes Thermiques | Module chauffant comprenant un element chauffant serigraphie |
WO2020026751A1 (fr) * | 2018-07-30 | 2020-02-06 | 株式会社デンソー | Élément de génération de chaleur |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR102292835B1 (ko) | 2019-11-08 | 2021-08-25 | 주식회사헤옴 | 복사열 방사 전기히터 |
KR102235925B1 (ko) * | 2020-07-10 | 2021-04-05 | 서중석 | 세라믹 히터를 포함하는 무선 헤어드라이어 |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR0171971B1 (ko) * | 1995-06-23 | 1999-05-01 | . | 금속박막 발열체의 제조방법 및 금속박막 발열히터 |
KR100187292B1 (ko) * | 1995-07-28 | 1999-05-15 | 조남인 | 박막형 전열기 |
-
2005
- 2005-12-13 WO PCT/KR2005/004273 patent/WO2006065059A1/fr active Application Filing
- 2005-12-13 KR KR1020050122746A patent/KR20060067858A/ko not_active Application Discontinuation
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR0171971B1 (ko) * | 1995-06-23 | 1999-05-01 | . | 금속박막 발열체의 제조방법 및 금속박막 발열히터 |
KR100187292B1 (ko) * | 1995-07-28 | 1999-05-15 | 조남인 | 박막형 전열기 |
Cited By (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2008103372A2 (fr) * | 2007-02-20 | 2008-08-28 | Thermoceramix Inc. | Appareil de chauffage au gaz et procédés associés |
WO2008103372A3 (fr) * | 2007-02-20 | 2013-08-15 | Thermoceramix Inc. | Appareil de chauffage au gaz et procédés associés |
EP2044858A1 (fr) * | 2007-06-26 | 2009-04-08 | Takashi Mukai | Fer à friser |
EP2044858A4 (fr) * | 2007-06-26 | 2011-06-22 | Takashi Mukai | Fer à friser |
WO2011025880A1 (fr) * | 2009-08-27 | 2011-03-03 | Tornier, Inc. | Élément chauffant à substrat métallique |
FR2951348A1 (fr) * | 2009-10-12 | 2011-04-15 | Tornier Sa | Element chauffant et appareil chirurgical le mettant en oeuvre |
WO2012019855A1 (fr) * | 2010-08-11 | 2012-02-16 | Valeo Systemes Thermiques | Module chauffant comprenant un element chauffant serigraphie |
FR2963867A1 (fr) * | 2010-08-11 | 2012-02-17 | Valeo Systemes Thermiques | Module chauffant comprenant un element chauffant serigraphie |
WO2020026751A1 (fr) * | 2018-07-30 | 2020-02-06 | 株式会社デンソー | Élément de génération de chaleur |
JP2020021563A (ja) * | 2018-07-30 | 2020-02-06 | 株式会社デンソー | 発熱部材 |
JP7131178B2 (ja) | 2018-07-30 | 2022-09-06 | 株式会社デンソー | 発熱部材 |
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