WO2006038392A1 - マイクロレンズの製造方法、及びマイクロレンズ用型の製造方法 - Google Patents
マイクロレンズの製造方法、及びマイクロレンズ用型の製造方法 Download PDFInfo
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- WO2006038392A1 WO2006038392A1 PCT/JP2005/015488 JP2005015488W WO2006038392A1 WO 2006038392 A1 WO2006038392 A1 WO 2006038392A1 JP 2005015488 W JP2005015488 W JP 2005015488W WO 2006038392 A1 WO2006038392 A1 WO 2006038392A1
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- resist
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B3/00—Simple or compound lenses
- G02B3/0006—Arrays
- G02B3/0012—Arrays characterised by the manufacturing method
Definitions
- the present invention relates to a microlens using photolithography (the microlens referred to in the present specification and claims includes a microlens array.
- the microlens includes an aspherical lens, a cylinder, and the like. Of course, it is recognized as a normal lens, such as a lens, but it also has optical power due to a relief pattern, such as a Fresnel lens or a diffraction grating, etc., or when transmitting light due to the shape of the surface. Including all those having optical power.) And a method for manufacturing a microlens mold. Background art
- Microlenses have been put into practical use mainly in the fields of digital cameras, optical communications, and M E M S, and the range of use is expanding.
- Patent Document 1 Japanese Patent No. 1209
- Patent Document 2 Japanese Patent Application Laid-Open No. 8-1887781
- a method of manufacturing a photo-resist microphone mouth lens having a stepped surface by exposing the resist with an exposure amount and developing the resist, and the shape of the resist formed in this way And the substrate are simultaneously etched to transfer to the substrate. Is a method for manufacturing a microlens.
- FIG. 7 is a view showing a cross section of a rotationally symmetric circle centered on a one-dot chain line.
- 21 is a substrate such as glass
- 22 is a curved surface of a photoresist microlens to be formed on the substrate 21.
- the curved surface 22 is a spherical surface
- the surface shape 23 is a surface shape when disks having different radii are stacked.
- a photo-resistive microphone mouth lens having a step shape like a surface shape 23 is formed.
- a resist is applied on the substrate 21 up to a height indicated by a two-dot chain line 24.
- a mask as shown in 25a to 25f of (a) is prepared.
- These masks 25a to 25f are made of glass or the like, and the blacked portions are plated with chrome or the like so as to block the light rays.
- the hatched area is transparent and allows light to pass through.
- Each of the masks 25 a to 25 f is formed with an annular opening (a portion that transmits light).
- register 24 When register 24 is exposed using these five masks 25a to 25f, no exposure is performed at portion A, only exposure with mask 25a is performed at portion B, and C Exposure is performed with masks 2 5 a and 2 5 b in the area of, exposure with masks 2 5 a, 2 5 b and 2 5 c is performed in the area of D, and masks 2 5 a and 2 5 are exposed in the area of E Exposure with b, 25 c, and 25 d is performed, and exposure with all masks is performed in F part.
- the exposure amounts for each of A, B, C, D, E, and F differ. Due to this difference, when register 24 is developed, the resist surface shape is 23. The surface shape is as shown. Photoresist microphone port lens can be formed.
- the surface shape as shown in 23 is transferred to the substrate 21, and the stepped shape consisting of the substrate 21 is formed. Is formed.
- Patent Document 3 A method for manufacturing a mic mouth lens using a gray scale mask that is completely different from such a mask is disclosed in Japanese Patent Application Laid-Open No. 8-054015 (Patent Document 3). This is because the resist formed on the surface of the substrate is exposed using a gray scale mask (a mask having a change in light transmittance that can be regarded as analog), and the resist is developed to develop the gray scale. By forming a three-dimensional resist pattern according to the shape and using it as a microlens, or by etching the lens-shaped resist together with the substrate as described above, the lens-shaped resist pattern is formed. The microphone pattern is transferred to the substrate to form a microphone mouth lens made of the substrate.
- a gray scale mask a mask having a change in light transmittance that can be regarded as analog
- photosensitive amount the amount lost when the resist is developed
- the exposure amount (a + b) is given at once, and when the exposure amount a and b exposure amount are given separately, the exposure amount is not the same.
- the exposure level is determined by the pre-registration conditions of the resist, after exposure. It varies depending on the time until light is emitted and the time from exposure to development.
- the exposure amount when using a certain mask is changed to adjust the exposure amount of a given stepped portion, the change in the exposure amount will affect the exposure amount of another stepped portion. Become. Therefore, it is actually difficult to form a precise step-like resist shape by the microlens manufacturing method as described in Patent Document 1 and Patent Document 2.
- heat flow treatment is performed in order to make the stepped shape into the desired curved surface shape.
- Heat flow treatment is a process that heats the resist to cause deformation and smoothes the surface.
- the resist is heated to the inside, so that the deformation of the resist becomes large, the surface of the stepped shape is not only smoothed, but the shape (for example, curvature) itself changes. There is also a problem that it may be.
- the method using a grayscale mask requires the mask to be manufactured with precise control of the aperture area and the light-shielding area, and requires special equipment and technology to manufacture the mask. There is a point. Furthermore, when the relationship between the exposure amount and the exposure amount of the resist changes, it is inevitable that the shape of the microlens to be formed will change, but this change is difficult to adjust. There is a point. Disclosure of the invention
- the present invention has been made in view of such circumstances, and can be manufactured by a simple method, and can be easily adjusted even when the conditions of the resist change. It is an object to provide a method for manufacturing a lens mold.
- the first means for solving the above problems is to manufacture a microphone mouth lens formed from a stepped pattern that approximates a concave shape, a convex shape, or a concave-convex shape.
- a method comprising: applying a resist on a substrate, exposing each stepped portion to the same height using a mask, and then developing the resist. This is a method for manufacturing a microphone mouth lens.
- a microphone mouth lens having a resist shape that approximates a curved surface with a staircase pattern an area having the same height in the staircase portion is exposed using one mask each. And then developing the resist. Therefore, even when the relationship between the exposure amount of the resist and the exposure amount changes, adjust the exposure amount when performing exposure using each mask (for example, adjust the exposure time or adjust the intensity of the light source). This makes it possible to easily obtain the desired resist exposure, and the adjustment result in one stepped part does not affect the other stepped part. Therefore, a microphone mouth lens can be manufactured by a simple method, and can be easily adjusted even if the resist conditions change.
- a second means for solving the problem is the first means, wherein after developing the resist, the resist and the substrate are etched simultaneously to remove the resist,
- the method has a step of transferring the shape formed in the resist to the substrate.
- the resist and the substrate are etched at the same time, and the resist is removed, and the shape formed in the resist is transferred to the substrate.
- High-precision microlenses can be manufactured.
- the third means for solving the above problem is that the lens has a concave shape and a convex shape.
- a solvent that approximates a stepped pattern that approximates a shape or a concavo-convex shape manufactures a microphone mouth lens having the stepped shape resist by the first method, and then dissolves the resist And a step of smoothing the stepped portion by exposure to an atmosphere of steam.
- a microphone mouth lens having a step-shaped resist is manufactured by the first method, and then exposed to an atmosphere of a solvent vapor that dissolves the resist (referred to as a solvent vapor method). ), And a step for smoothing the stepped portion.
- the solvent vapor method is a technique described in Japanese Patent Laid-Open No. 2000-0 1 9 8 7 3 5, and the resist layer is exposed by exposing the resist layer to the solvent that dissolves the resist. This is a technology that dissolves only the surface to smooth the resist surface.
- the stepped surface can be smoothed and brought close to the target surface shape. Furthermore, unlike the case where heat flow is used, the resist remains only in the vicinity of the surface, so that the resist is not greatly deformed, for example, causing a change in curvature.
- a fourth means for solving the above problem is the third means, wherein after smoothing the stepped portion of the resist, the resist and the substrate are etched at the same time.
- the method includes a step of removing the resist and transferring the shape formed in the resist to the substrate.
- a fifth means for solving the above problem is a method for manufacturing a microlens mold in which the microlens in any one of the first to fourth means is replaced with a microlens manufacturing mold. .
- the microlens is manufactured.
- the manufactured microlens can be used not as a microlens but as a mold for manufacturing a microlens.
- the registry does not have to be transparent.
- nickel plating or the like may be applied to the resist or the surface of the substrate to improve the durability of the mold.
- FIG. 1 is a diagram for explaining an embodiment of the present invention for producing a photo-resistive spherical microlens.
- Fig. 2 is a diagram for explaining the processing method by the solvent vapor method.
- FIG. 3 is a diagram showing an example of a process for manufacturing a microlens array from a mold manufactured by the method of the present invention.
- FIG. 4 is a diagram showing an example of a process for manufacturing a microlens array from a mold manufactured by the method of the present invention.
- FIG. 5 is a diagram showing the shape error of the microlens obtained by the first example of the present invention.
- FIG. 6 is a diagram showing the shape error of the microphone mouth lens obtained by the second embodiment of the present invention.
- FIG. 7 is a diagram for explaining a method of manufacturing a microphone mouth lens using a conventional multiple mask.
- FIG. 1 is a diagram showing an example in the case of manufacturing a photoresist spherical microphone mouth lens.
- FIG. 1 is a diagram showing a cross section from the center to the outer periphery of a rotationally symmetric circular shape centered on a one-dot chain line.
- 1 is a substrate such as glass
- 2 is the curved surface of the photo-resist microphone port lens to be formed on the substrate 1.
- the curved surface 2 is a spherical surface
- the surface shape 3 is a stepped surface shape when disks with different radii are stacked.
- a photomicrophone mouth lens having a stepped shape such as a surface shape 3 is formed.
- a resist is applied on the substrate 1 up to a height indicated by a two-dot chain line 4.
- a mask as shown in 5a to 5f of (a) is prepared.
- These masks 5a to 5f are made of glass or the like, and the portions painted black are plated with chrome or the like so as to block light rays.
- the annular part with diagonal hatching is transparent and allows light to pass through.
- Each mask has an opening (a portion through which light is transmitted) only in a region having the same height.
- each window has an annular opening since it has a rotationally symmetric shape.
- the resist 4 is exposed using these five masks 5a to 5f. Then, in the portion A, no exposure is performed at all. In the portion B, only the exposure with the mask 5a is performed. In the portion C, the exposure is performed only with the mask 5b. In the portion D, the mask 5c is exposed. Exposure is performed using only the mask 5d in the portion E, and only the mask 5f is used in the portion F. Exposure is performed. In exposure using each mask, exposure is performed with an exposure amount corresponding to the SAG amount (photosensitive amount) of each irradiation region.
- the exposure amount for each of A, B, C, D, E, and F is different. Due to this difference, the surface shape of the resist is indicated by 3 when register 4 is developed. A surface resist microlens having a stepped shape can be formed.
- each of A, B, C, D, E, and F is exposed using one mask.
- the exposure amount in each part is determined in accordance with the intended exposure amount (corresponding to the SAG amount) of each part, and in this embodiment, it can be easily adjusted by changing the exposure time. You may adjust by changing the intensity of a light source.
- Fig. 1 explains the case of a spherical lens.
- aspherical lenses, cylindrical lenses, Fresnel lenses, diffraction gratings, etc. that have optical power due to relief patterns, etc.
- the same method is used when manufacturing a product that has optical power when passing through Can be manufactured.
- the lens manufactured by the above manufacturing process has a resist as an optical base material and generates optical power. Since the resist has a step structure, it is not exactly the target surface shape. An example of a method for bringing such a lens closer to the target shape will be described with reference to FIG. This is a method of smoothing the surface of the resist by the so-called solvent vapor method.
- a solvent 9 for dissolving a resist 7 having a lens shape formed on the substrate 6 (in the figure, a microlens array is shown) is placed in the petri dish 8, and a lid (not shown) is used.
- PGMEA propylene glycol monomethyl ether acetate
- the lid is quickly replaced with the substrate 6 having the resist 7 formed with the micro lens array shape, and the resist 7 is sealed with the resist 7 facing downward.
- the substrate 6 serves as a lid for the petri dish 8, and the saturated vapor pressure of the solvent vapor 10 is maintained.
- the surface of resist 7 is exposed to solvent vapor 10.
- the surface of the resist forming the microlens is dissolved, so that the level difference formed on each microphone mouth lens is eliminated, and the surface becomes smooth.
- the photoresist used in the photoresist layer is preferably a novolak resin.
- a solvent for dissolving the photoresist used in the solvent vapor method any solvent capable of dissolving the photoresist layer on which the optical surface to be processed is formed can be used.
- it is not limited to those generally used for dilution or washing of a photoresist, but in addition to ketones and alcohols, etheroids such as dioxane ether glycolinolemonomethinoreether.
- PGMEA propyleneglycololemethinoreether
- a certain type of thinner for example, PM thinner manufactured by Tokyo Ohka Co., Ltd.
- a certain type of thinner for example, PM thinner manufactured by Tokyo Ohka Co., Ltd.
- the solvent vapor used in the solvent vapor method is obtained, for example, by evaporating the solvent vapor from the surface of the solvent by keeping the solvent dissolving the photoresist at an appropriate temperature.
- the vapor pressure of the solvent during the process of the solvent vapor process is spatially uniform and constant in time.
- the vapor pressure of this solvent is a saturated vapor pressure at which the amount of vapor evaporated (vaporized) from the solvent and the amount of vapor returning to the solvent level (liquefied) is balanced at a constant temperature. It is preferable to perform a process of exposing the optical element to be processed to this saturated vapor.
- One method is to keep the solvent at a predetermined temperature T in the sealed container, evaporate the solvent, and at the same time keep the inner surface of the sealed container at the temperature T.
- the optical element to be processed when processing the optical element to be processed in a closed container in order to perform the solvent vapor process, the optical element to be processed should be kept at a temperature T in advance. And are preferred.
- the solvent vapor chemically acts on the step of the optical surface of the photoresist layer to be processed, and the processing proceeds by dissolving only the surface of this step.
- the processing conditions are optimized by adjusting the solvent type, processing temperature, and processing time. By processing under this optimized condition, the level difference of the optical surface of the optical element to be processed becomes smooth, and the shape accuracy of the optical surface does not change.
- the processing amount increases in proportion to the product of the processing speed and the processing time. If the processing amount is too small, the effect of improving the unevenness is insufficient, and if it is too large, the shape accuracy of the optical surface is changed, so there is an optimum processing amount. If the processing temperature is too high, the processing time may be short, but the processing quality is not stable, and if it is too low, the processing takes too much time, which is not preferable, and an optimum processing temperature exists. The optimum processing temperature depends on the shape of the optical surface to be processed, the type of photoresist, and the type of solvent, and is determined by repeated testing.
- the difference between the maximum height and the minimum height of the lens surface of the lens thus manufactured is preferably 5 m or less. In other words, if this difference increases, the step must be increased or the number of masks used must be increased. However, increasing the step causes the optical characteristics of the lens to deteriorate, and increasing the number of masks. The number of exposures increases accordingly. If the difference between the maximum height and the minimum height of the lens surface is 5 IX m or less, a microphone mouth lens with sufficient accuracy can be obtained without complicating the process so much.
- a lens with a lens shape manufactured as described above As an intermediate material, the resist and the substrate are dry-etched to remove the resist, and the resist shape is transferred to the substrate (the target shape is determined in consideration of the etching rate between the resist and the substrate). It goes without saying that the shape of the resist is adjusted in advance so that it can be obtained on the substrate), and a microlens made only of the substrate can also be formed.
- This method is described in, for example, Japanese Patent Laid-Open No. Hei 9-8 2 6 6 (Patent Document 5), and is well known, and therefore its description is omitted. In this case, it is not necessary to use a light-transmitting resister.
- the method described above is a method of directly producing a microlens according to the process of photolithography, but these are used as a mold, and a resin-made microlens array is used with this mold. It may be manufactured.
- Figure 3 shows such a method.
- a mold having a resist 12 in which the shape of a microlens array is formed on a substrate 11 is used as a mold (a).
- UV-curable resin 14 is injected and pressed using a dispenser or the like, and then irradiated with ultraviolet rays through the surface plate 1 3.
- a resin microlens array can be manufactured (c). In this case, it goes without saying that the substrate 1 1 and the register 1 2 do not have to be transparent.
- the resin-made microlens array formed in this way is not used as a microlens array, but is used as a mold.
- ultraviolet light curable resin 14 ' is injected and pressed using a dispenser or the like, and then irradiated with ultraviolet light through a platen 13 3' to cure the ultraviolet curable resin 14 4 '( d).
- a microlens array made of resin can be manufactured (e).
- the UV curable resin 14 ' is not used as a microlens array, but is used as a mold, and a number of molds are manufactured by repeating the steps shown in Fig. 3 (c) to (d). From these, a large number of micro lens arrays can be manufactured.
- a metal thin film or a dielectric thin film can be formed on these surfaces to harden the surface, thereby increasing the durability of the mold.
- a metal used Cu, Al, Ni, an Au or the like is suitable, is a dielectric used, SiN X, SiO 2, Al 2 ⁇ 3, Ta 2 O 5, TiO 2 or the like Is appropriate.
- a replica is manufactured by applying electricity to the microphone mouth lens formed as shown in FIG. 1 or the microphone mouth lens formed by subjecting it to a solvent vapor treatment, and this is used as a mold. It is also possible to mold a resin to produce a plurality of microlens arrays made of resin.
- FIG. 4 An example of this is shown in Figure 4.
- a mold having a resist 12 in which the shape of a microlens array is formed on a substrate 11 is used as a mold (a).
- the Ni layer 15 is attached to the resist 12 by electroless plating, and Ni is applied as an electrode to produce a Ni replica 16.
- an ultraviolet curable resin is placed between this mold and a transparent surface plate using a dispenser or the like. After injecting and pressing, the ultraviolet curable resin is cured by irradiating with ultraviolet rays through a surface plate, and then the cured ultraviolet curable resin is peeled off from the mold and the surface plate to obtain a resin microphone mouth.
- Lens arrays can be manufactured.
- the above-mentioned mold uses the resist 12 with the microlens array shape as the master of the mold, but in addition to this, the resist 12 has the shape of the substrate.
- the substrate 1 1 transferred to 1 1 and having the shape of the microlens array may be used as the master of the mold.
- a long-life master can be obtained by using this substrate 11 as the master of the mold.
- a 2.5 m thick positive resist was applied to a 2.3 mm thick 6-inch quartz substrate. Application was carried out at a rotational speed of 1500 rpm. Pre-baking (conditions: temperature 90 ° C, time 30 minutes) After that, 8 steps of microlenses were fabricated using 8 different simple circular pattern reticles. For exposure, an i-line stepper (NSR 2205 I12D manufactured by Nikon Corporation) was used. Microphone mouth made of resist The lens shape is a shape with a lens diameter of 2400 ⁇ m (effective diameter 20.0 ⁇ ) and an SAG amount of about 1.6 ⁇ m. The contour of the ring pattern of each mask was determined so that the height of each step was equal to 0.2 ⁇ .
- the obtained shape is measured with a stylus profilometer, and is obtained from the measured data by curved surface fitting calculation having a curvature corresponding to the measured data.
- the shape error of each point from the obtained curved surface (SAG amount Error).
- Figure 5 shows the shape error. As can be seen from Fig. 5, the shape error is about 100 nm. We were able to produce a high-precision microphone mouth lens.
- a positive resist with a film thickness of 2.5 ⁇ m was applied to a 6-inch quartz substrate with a thickness of 2.3 mm. Application was carried out at a rotational speed of 1500 rpm. Prebeta (Conditions: Temperature 90 ° C, Time 30 minutes) After that, 8 steps of microlenses were fabricated using 8 different simple circular pattern reticles. For exposure, an i-line stepper (NSR 2205 I12D manufactured by Nikon Corporation) was used.
- the lens shape is the lens diameter 2 40 ⁇ m (effective diameter SOO ⁇ n S AG amount is about 1.6 ⁇ .
- the height of each step is 0.25 ⁇ m.
- the contour of the ring pattern of each mask was determined so as to be equal to ⁇ First, using the mask ⁇ 1 for creating the shape of the first step, the exposure was performed with an exposure time of 60 msec. Shape creation was exposed with an exposure time of 120 msec using mask n 2. Similarly, shape creation at the K-th stage was performed using mask nK with an exposure time (60 * K) msec. In this way, after eight exposures using eight masks, development was performed using an organic developer.
- the obtained shape is measured with a stylus profilometer, and is obtained from the measured data by curved surface fitting calculation having a curvature corresponding to the measured data.
- the shape error of each point from the obtained curved surface (SAG amount Error).
- Figure 6 shows the shape error. As can be seen from Fig. 6, we were able to produce a high-precision microphone mouth lens with a shape error of about 50 nm.
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Cited By (2)
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JP2012102318A (ja) * | 2010-11-05 | 2012-05-31 | Far Eastern New Century Corp | 微細構造の製造方法及びその微細構造 |
US8828650B2 (en) | 2011-09-13 | 2014-09-09 | Far Eastern New Century Corporation | Method for making a retarder |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
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JPH07104106A (ja) * | 1993-10-04 | 1995-04-21 | Asahi Glass Co Ltd | 非球面マイクロレンズアレイの製造方法 |
JPH07191209A (ja) * | 1993-12-27 | 1995-07-28 | Fujitsu Ltd | 微小光学素子の製造方法 |
JPH0821908A (ja) * | 1994-07-11 | 1996-01-23 | Fujitsu Ltd | 光学素子の製造方法 |
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JP2002350623A (ja) * | 2001-05-23 | 2002-12-04 | Dainippon Printing Co Ltd | 回折光学素子の製造方法 |
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- 2005-08-19 WO PCT/JP2005/015488 patent/WO2006038392A1/ja active Application Filing
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
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JPH07104106A (ja) * | 1993-10-04 | 1995-04-21 | Asahi Glass Co Ltd | 非球面マイクロレンズアレイの製造方法 |
JPH07191209A (ja) * | 1993-12-27 | 1995-07-28 | Fujitsu Ltd | 微小光学素子の製造方法 |
JPH0821908A (ja) * | 1994-07-11 | 1996-01-23 | Fujitsu Ltd | 光学素子の製造方法 |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
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JP2012102318A (ja) * | 2010-11-05 | 2012-05-31 | Far Eastern New Century Corp | 微細構造の製造方法及びその微細構造 |
US8703409B2 (en) | 2010-11-05 | 2014-04-22 | Far Eastern New Century Corporation | Method for forming a microstructure |
US8828650B2 (en) | 2011-09-13 | 2014-09-09 | Far Eastern New Century Corporation | Method for making a retarder |
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