WO2006000599A8 - Distribuidor de gases para el recubrimiento de una lente, y procedimiento, lente y dispositivo de recubrimiento correspondientes - Google Patents

Distribuidor de gases para el recubrimiento de una lente, y procedimiento, lente y dispositivo de recubrimiento correspondientes

Info

Publication number
WO2006000599A8
WO2006000599A8 PCT/ES2005/000278 ES2005000278W WO2006000599A8 WO 2006000599 A8 WO2006000599 A8 WO 2006000599A8 ES 2005000278 W ES2005000278 W ES 2005000278W WO 2006000599 A8 WO2006000599 A8 WO 2006000599A8
Authority
WO
WIPO (PCT)
Prior art keywords
lens
points
flat
auxiliary surface
gas dispenser
Prior art date
Application number
PCT/ES2005/000278
Other languages
English (en)
French (fr)
Other versions
WO2006000599A1 (es
Inventor
Artal Alfonso Egio
Mas Antoni Vilajuana
Berasategui Eva Gutierrez
Lopez Juan Carlos Duersteler
Serrano Ricardo Fernandez
Original Assignee
Indo Int Sa
Artal Alfonso Egio
Mas Antoni Vilajuana
Berasategui Eva Gutierrez
Lopez Juan Carlos Duersteler
Serrano Ricardo Fernandez
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Indo Int Sa, Artal Alfonso Egio, Mas Antoni Vilajuana, Berasategui Eva Gutierrez, Lopez Juan Carlos Duersteler, Serrano Ricardo Fernandez filed Critical Indo Int Sa
Priority to EP05750167A priority Critical patent/EP1757713A1/en
Publication of WO2006000599A1 publication Critical patent/WO2006000599A1/es
Publication of WO2006000599A8 publication Critical patent/WO2006000599A8/es
Priority to US11/587,370 priority patent/US20070178230A1/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45563—Gas nozzles
    • C23C16/45565—Shower nozzles
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Eyeglasses (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)

Abstract

Distribuidor de gases para el recubrimiento de una lente, y procedimiento, lente y dispositivo de recubrimiento correspondientes. El distribuidor comprende una placa de salida plana con una pluralidad de orificios de salida que presentan una distribu­ción sobre la placa obtenible de la siguiente manera: [a] definición de una superficie auxiliar, [b] posicionado de unos primeros puntos sobre una primera superficie plana, con una densidad superficial de primeros puntos constante, donde la primera superficie se apoya sobre el borde inferior de la superficie auxiliar, y [c] trazado de unas rectas de proyección desde un origen de proyección, y que pa­sen por cada uno de los primeros puntos, hasta que corten la superficie auxiliar, definiendo unos puntos proyectados sobre la superficie auxiliar, y abatido de los puntos proyectados hasta que corten la placa de salida plana, definiendo la posi­ción de los orificios de salida.
PCT/ES2005/000278 2004-06-18 2005-05-19 Distribuidor de gases para el recubrimiento de una lente, y procedimiento, lente y dispositivo de recubrimiento correspondientes WO2006000599A1 (es)

Priority Applications (2)

Application Number Priority Date Filing Date Title
EP05750167A EP1757713A1 (en) 2004-06-18 2005-05-19 Lens-coating gas dispenser and corresponding coating device, lens and method
US11/587,370 US20070178230A1 (en) 2004-06-18 2006-10-23 Gas distributor for coating a lens, and corresponding method, lens and coating device

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
ES200401600A ES2222111B1 (es) 2004-06-18 2004-06-18 Distribuidor de gases para el recubrimiento de una lente, y procedimiento, lente y dispositivo de recubrimiento correspondientes.
ESP200401600 2004-06-18

Publications (2)

Publication Number Publication Date
WO2006000599A1 WO2006000599A1 (es) 2006-01-05
WO2006000599A8 true WO2006000599A8 (es) 2006-07-06

Family

ID=34507918

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/ES2005/000278 WO2006000599A1 (es) 2004-06-18 2005-05-19 Distribuidor de gases para el recubrimiento de una lente, y procedimiento, lente y dispositivo de recubrimiento correspondientes

Country Status (4)

Country Link
US (1) US20070178230A1 (es)
EP (1) EP1757713A1 (es)
ES (1) ES2222111B1 (es)
WO (1) WO2006000599A1 (es)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
ES2302661B1 (es) * 2008-02-14 2009-10-29 Indo Internacional S.A. Lente de base polimerica que comprende una capa endurecedora, una multicapa interferencial y una capa dura intercalada entre ambas, y procedimiento de fabricacion correspondiente.

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH1036971A (ja) * 1996-07-24 1998-02-10 Nikon Corp Ｃｖｄ装置
KR19980071011A (ko) * 1997-01-24 1998-10-26 조셉 제이. 스위니 고온 및 고 흐름 속도의 화학적 기상 증착 장치 및 관련증착 방법
JP3782206B2 (ja) * 1997-05-16 2006-06-07 Ｈｏｙａ株式会社 プラズマｃｖｄ成膜用の膜厚補正機構
US20020011215A1 (en) * 1997-12-12 2002-01-31 Goushu Tei Plasma treatment apparatus and method of manufacturing optical parts using the same
JPH11172447A (ja) * 1997-12-12 1999-06-29 Tadahiro Omi プラズマ処理装置および光学部品の製造法
US6126753A (en) * 1998-05-13 2000-10-03 Tokyo Electron Limited Single-substrate-processing CVD apparatus and method
US6207590B1 (en) * 1999-11-19 2001-03-27 Wafertech, Inc. Method for deposition of high stress silicon dioxide using silane based dual frequency PECVD process

Also Published As

Publication number Publication date
ES2222111A1 (es) 2005-01-16
EP1757713A1 (en) 2007-02-28
US20070178230A1 (en) 2007-08-02
ES2222111B1 (es) 2005-12-16
WO2006000599A1 (es) 2006-01-05

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