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WO2004095135A3 - Optical arrangement of autofocus elements for use with immersion lithography - Google Patents

Optical arrangement of autofocus elements for use with immersion lithography

Info

Publication number
WO2004095135A3
WO2004095135A3 PCT/US2004/011287 US2004011287W WO2004095135A3 WO 2004095135 A3 WO2004095135 A3 WO 2004095135A3 US 2004011287 W US2004011287 W US 2004011287W WO 2004095135 A3 WO2004095135 A3 WO 2004095135A3
Authority
WO
Grant status
Application
Patent type
Prior art keywords
light
target
surface
beam
autofocus
Prior art date
Application number
PCT/US2004/011287
Other languages
French (fr)
Other versions
WO2004095135A2 (en )
Inventor
W Thomas Novak
Original Assignee
Nippon Kogaku Kk
W Thomas Novak
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Exposure apparatus for microlithography
    • G03F7/70216Systems for imaging mask onto workpiece
    • G03F7/70258Projection system adjustment, alignment during assembly of projection system
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20Exposure; Apparatus therefor
    • G03F7/2041Exposure; Apparatus therefor in the presence of a fluid, e.g. immersion; using fluid cooling means
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Exposure apparatus for microlithography
    • G03F7/70216Systems for imaging mask onto workpiece
    • G03F7/70341Immersion
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Exposure apparatus for microlithography
    • G03F7/70483Information management, control, testing, and wafer monitoring, e.g. pattern monitoring
    • G03F7/70616Wafer pattern monitoring, i.e. measuring printed patterns or the aerial image at the wafer plane
    • G03F7/70641Focus
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Exposure apparatus for microlithography
    • G03F7/708Construction of apparatus, e.g. environment, hygiene aspects or materials
    • G03F7/7095Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
    • G03F7/70958Optical materials and coatings, e.g. with particular transmittance, reflectance
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7023Aligning or positioning in direction perpendicular to substrate surface
    • G03F9/7026Focusing
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7023Aligning or positioning in direction perpendicular to substrate surface
    • G03F9/7034Leveling

Abstract

An autofocus unit is provided to an immersion lithography apparatus for having a fluid over a target surface of a workpiece and an image pattern projected on this target surface through the fluid. The autofocus unit has an optical element such as a projection lens disposed opposite and above the target surface. An autofocus light source is arranged to project a light beam obliquely at a specified angle such that this light beam passes through the fluid and is reflected by the target surface of the workpiece at a specified reflection position which is below the optical element. A receiver receives and analyzes the reflected light. Correction lenses may be disposed on the optical path of the light beam for correcting propagation of the light beam.
PCT/US2004/011287 2003-04-17 2004-04-12 Optical arrangement of autofocus elements for use with immersion lithography WO2004095135A3 (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
US46439203 true 2003-04-17 2003-04-17
US60/464,392 2003-04-17

Applications Claiming Priority (11)

Application Number Priority Date Filing Date Title
EP20040759834 EP1614000B1 (en) 2003-04-17 2004-04-12 Immersion lithographic apparatus
JP2006509951A JP2006523958A (en) 2003-04-17 2004-04-12 Optical structure of the autofocus device for use in an immersion lithography
KR20127029277A KR101369582B1 (en) 2003-04-17 2004-04-12 Optical arrangement of autofocus elements for use with immersion lithography
US11234279 US7414794B2 (en) 2003-04-17 2005-09-26 Optical arrangement of autofocus elements for use with immersion lithography
US11606914 US7570431B2 (en) 2003-04-17 2006-12-01 Optical arrangement of autofocus elements for use with immersion lithography
US12457742 US8018657B2 (en) 2003-04-17 2009-06-19 Optical arrangement of autofocus elements for use with immersion lithography
US12461762 US8094379B2 (en) 2003-04-17 2009-08-24 Optical arrangement of autofocus elements for use with immersion lithography
US13313399 US8599488B2 (en) 2003-04-17 2011-12-07 Optical arrangement of autofocus elements for use with immersion lithography
US14066315 US8810915B2 (en) 2003-04-17 2013-10-29 Optical arrangement of autofocus elements for use with immersion lithography
US14330263 US8953250B2 (en) 2003-04-17 2014-07-14 Optical arrangement of autofocus elements for use with immersion lithography
US14589399 US9086636B2 (en) 2003-04-17 2015-01-05 Optical arrangement of autofocus elements for use with immersion lithography

Related Child Applications (1)

Application Number Title Priority Date Filing Date
US11234279 Continuation US7414794B2 (en) 2003-04-17 2005-09-26 Optical arrangement of autofocus elements for use with immersion lithography

Publications (2)

Publication Number Publication Date
WO2004095135A2 true WO2004095135A2 (en) 2004-11-04
WO2004095135A3 true true WO2004095135A3 (en) 2004-12-09

Family

ID=33310880

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2004/011287 WO2004095135A3 (en) 2003-04-17 2004-04-12 Optical arrangement of autofocus elements for use with immersion lithography

Country Status (6)

Country Link
US (8) US7414794B2 (en)
EP (1) EP1614000B1 (en)
JP (2) JP2006523958A (en)
KR (2) KR20050122269A (en)
CN (1) CN1774667A (en)
WO (1) WO2004095135A3 (en)

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US8902404B2 (en) 2005-02-22 2014-12-02 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
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US9013672B2 (en) 2007-05-04 2015-04-21 Asml Netherlands B.V. Cleaning device, a lithographic apparatus and a lithographic apparatus cleaning method
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