WO2004068389A2 - Method of forming a conductive metal region on a substrate - Google Patents
Method of forming a conductive metal region on a substrate Download PDFInfo
- Publication number
- WO2004068389A2 WO2004068389A2 PCT/GB2004/000358 GB2004000358W WO2004068389A2 WO 2004068389 A2 WO2004068389 A2 WO 2004068389A2 GB 2004000358 W GB2004000358 W GB 2004000358W WO 2004068389 A2 WO2004068389 A2 WO 2004068389A2
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- substrate
- solution
- metal
- deposited
- activator
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/1601—Process or apparatus
- C23C18/1633—Process of electroless plating
- C23C18/1675—Process conditions
- C23C18/1678—Heating of the substrate
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B42—BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
- B42D—BOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
- B42D25/00—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
- B42D25/30—Identification or security features, e.g. for preventing forgery
- B42D25/36—Identification or security features, e.g. for preventing forgery comprising special materials
- B42D25/373—Metallic materials
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/1601—Process or apparatus
- C23C18/1603—Process or apparatus coating on selected surface areas
- C23C18/1607—Process or apparatus coating on selected surface areas by direct patterning
- C23C18/1608—Process or apparatus coating on selected surface areas by direct patterning from pretreatment step, i.e. selective pre-treatment
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/1601—Process or apparatus
- C23C18/1603—Process or apparatus coating on selected surface areas
- C23C18/1607—Process or apparatus coating on selected surface areas by direct patterning
- C23C18/161—Process or apparatus coating on selected surface areas by direct patterning from plating step, e.g. inkjet
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/1601—Process or apparatus
- C23C18/1633—Process of electroless plating
- C23C18/1646—Characteristics of the product obtained
- C23C18/165—Multilayered product
- C23C18/1651—Two or more layers only obtained by electroless plating
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/1601—Process or apparatus
- C23C18/1633—Process of electroless plating
- C23C18/1655—Process features
- C23C18/1658—Process features with two steps starting with metal deposition followed by addition of reducing agent
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/1601—Process or apparatus
- C23C18/1633—Process of electroless plating
- C23C18/1675—Process conditions
- C23C18/1676—Heating of the solution
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
- H05K3/18—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material
- H05K3/181—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material by electroless plating
- H05K3/182—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material by electroless plating characterised by the patterning method
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01M—PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
- H01M10/00—Secondary cells; Manufacture thereof
- H01M10/04—Construction or manufacture in general
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/09—Use of materials for the conductive, e.g. metallic pattern
- H05K1/092—Dispersed materials, e.g. conductive pastes or inks
- H05K1/095—Dispersed materials, e.g. conductive pastes or inks for polymer thick films, i.e. having a permanent organic polymeric binder
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/10—Details of components or other objects attached to or integrated in a printed circuit board
- H05K2201/10431—Details of mounted components
- H05K2201/10439—Position of a single component
- H05K2201/10477—Inverted
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/01—Tools for processing; Objects used during processing
- H05K2203/0104—Tools for processing; Objects used during processing for patterning or coating
- H05K2203/013—Inkjet printing, e.g. for printing insulating material or resist
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/07—Treatments involving liquids, e.g. plating, rinsing
- H05K2203/0703—Plating
- H05K2203/0709—Catalytic ink or adhesive for electroless plating
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/11—Treatments characterised by their effect, e.g. heating, cooling, roughening
- H05K2203/1157—Using means for chemical reduction
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/11—Treatments characterised by their effect, e.g. heating, cooling, roughening
- H05K2203/1163—Chemical reaction, e.g. heating solder by exothermic reaction
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/14—Related to the order of processing steps
- H05K2203/1461—Applying or finishing the circuit pattern after another process, e.g. after filling of vias with conductive paste, after making printed resistors
- H05K2203/1469—Circuit made after mounting or encapsulation of the components
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
- H05K3/12—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using thick film techniques, e.g. printing techniques to apply the conductive material or similar techniques for applying conductive paste or ink patterns
- H05K3/1241—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using thick film techniques, e.g. printing techniques to apply the conductive material or similar techniques for applying conductive paste or ink patterns by ink-jet printing or drawing by dispensing
- H05K3/125—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using thick film techniques, e.g. printing techniques to apply the conductive material or similar techniques for applying conductive paste or ink patterns by ink-jet printing or drawing by dispensing by ink-jet printing
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/30—Assembling printed circuits with electric components, e.g. with resistor
- H05K3/303—Surface mounted components, e.g. affixing before soldering, aligning means, spacing means
- H05K3/305—Affixing by adhesive
Definitions
- the present invention relates to the field of forming conductive metal regions on substrates.
- conductive metal regions on substrates there are many industrial applications for conductive metal regions on substrates, particularly processes which enable the conductive metal regions to be formed according to a pattern.
- An important application is the manufacture of printed circuit boards, upon which metal layers are formed into a pattern to electrically connect different components and electrical devices according to a predetermined arrangement.
- Other applications include aerials and antennae, such as those found in mobile telephones, radio frequency identification devices (RFIDs), smart cards, contacts for batteries and power supplies, arrays of contacts for flat screen technologies (liquid crystal displays, light emitting polymer displays and the like), electrodes for biological and electrochemical sensors, smart textiles, and decorative features.
- RFIDs radio frequency identification devices
- smart cards contacts for batteries and power supplies
- arrays of contacts for flat screen technologies liquid crystal displays, light emitting polymer displays and the like
- electrodes for biological and electrochemical sensors smart textiles, and decorative features.
- the metal region must be conductive and a high level of conductivity is desirable, or in some cases essential.
- One known method for preparing a conductive metal region on a substrate includes the step of inkjet printing a liquid including metallic nanoparticles.
- the printed liquid is then heated to fuse chemical components of the liquid and evaporate the solvent.
- the nanoparticles are thus brought into contact with each other and so conduct.
- these materials do not have a conductivity approaching that of bulk metal.
- the heating step is not only inconvenient, but prevents the technique from being used with low melting point plastic substrates.
- One example of this technique is described in "Metallisations by Direct-Write Inkjet Printing" , presented at NCPN Program Review Meeting, Lakewood, Colorado 14-17 October 2001 , by C. Curtis et al.
- Digital inkjet printing techniques are used to print a pattern of metal organic decomposition inks, with and without nanoparticle additions.
- an organometallic compound such as silver(hexafluoroacetylacetonate)(l,5-cyclooctadiene) is dissolved in an organic solvent to which silver particles are added which are sufficiently small to avoid clogging the 10-50 micron inkjet printing head orifice.
- the ink is then applied by a digitally controlled inkjet printer, which deposits an ink pattern across the substrate.
- the ink is then heated to form a pattern of nanoparticles, which provide the bulk of the conductivity, electrically joined to some extent by residual silver compounds.
- the technique provides good conductivity silver regions.
- the electroless plating process is a solution chemistry plating technique which has been used for many years to apply a conductive metal coating layer to a substrate, which may be flat or shaped. A substrate is immersed in a succession of baths. The resulting conductive metal layer may be used as formed, or may undergo a subsequent electrodeposition process to increase the thickness of the conductive layer.
- a commercially important technique is the so-called "plate through hole” process which has been used for over 30 years to metallize drilled holes in printed circuit boards by electroless techniques, for subsequent electroplating.
- a generic example of the electroless process is as follows. Firstly, a plastic substrate is etched in a chromic acid/concentrated sulphuric acid bath at 68 +2°C to microscopically etch the surface of the plastics substrate, ensuring good adhesion of the copper to the plastics substrate. Secondly, any hexavalent chromic species left on the plastics substrate are neutralised in a bath comprising approx. 30% concentrated hydrochloric acid at around 50 °C. The plastics substrate is then added to a third bath in which an activator is added to prepare the plastics substrate surface to absorb the catalyst in the next step. This third bath is typically approx. 30% concentrated hydrochloric acid, at room temperature.
- the plastic substrate is dipped into a fourth bath which includes a dilute solution of a palladium colloid along with tin salts.
- the colloid deposits on the surface of the plastic to catalyse the deposition of copper in the subsequent plating step.
- This bath includes a high proportion of tin salts, approx. 30% concentrated hydrochloric acid, and operated at room temperature.
- the fifth bath into which the plastics substrate is dipped includes an accelerator which activates the adsorbed palladium, improving the speed and uniformity of deposition. Accelerator baths include around 30% concentrated hydrochloric acid.
- the activated plastics substrate is dipped into a sixth bath including a plating solution which, catalysed by the palladium colloid on the plastic substrate, causes copper to deposit onto areas of the plastics substrate which were coated with the catalyst.
- the plating solution include a copper salt, formaldehyde as a reducing agent, and sodium hydroxide to activate the formaldehyde.
- the composition of the plating solution must be carefully temperature controlled, with a temperature of 45 ⁇ 2°C being appropriate for some commercially applicable compositions. At a lower temperature, plating does not take place. At a higher temperature, plating takes places spontaneously and the copper in the bath plates out.
- the copper salt, formaldehyde and sodium hydroxide must be stored separately as the combined solution is unstable.
- the electroless copper deposition is used extensively and has the important advantage of producing highly conductive metal layers.
- the conductivity of the resulting metal layer is usually close to that of the corresponding bulk metal.
- a key disadvantage is that as plating is a bath process, the entire surface of the substrate is usually metallised. The process does not in itself allow the deposition of a metal in a pattern, as is required for many of the applications discussed above.
- the process has several other limitations. Firstly, the process is relatively complex, often requiring at least 6 baths, and so is suitable only for use at specialist manufacturing facilities. Slight errors in composition or deviations from the optimum temperature can result in the majority of the copper in the plating solution spontaneously precipitating, wasting chemicals. Furthermore, the metal ions in the waste products can be toxic to the environment and so require expensive waste processing procedures. The high price of Palladium (and the volatility in the price of Palladium) lead to further high costs and economic uncertainty in catalysed procedures.
- An alternative approach to providing metal parts according to a pattern is to press several component parts out of metal and then mount these into a device using additional substrate parts to hold the metallic components.
- the technology known as insert moulding has developed this concept, aiming to reduce the number of separate components and manufacturing costs.
- insert moulding a metal component is held inside an injection moulding machine and the part is then moulded around the metal component(s).
- a first component is injection moulded in plastic and then plated with a metal by the electroless process described above.
- the plated part is then placed into a second mould and the remainder of the part is formed around the plated part.
- injection moulding incorporating two different grades of plastic, one of which is susceptible to plating in the electroless plating procedure, and one of which is not.
- Such parts are created in a single moulding process and then plated, with only the first grade of plastic being plated. Although effective, this process can be expensive and is therefore not suitable for use with low cost items.
- US 4,668,533 to E. I. Du Pont de Nemours and Company discloses inkjet printing on a substrate using an ink comprising either finely divided copper particles, or a metal containing activator, such as a palladium (II) salt.
- the resulting printed substrate is then placed in a metal depositing bath which deposits a metal layer by the electroless process described above.
- the pattern formed by the resulting metal layer is determined by the pattern of droplets applied during the inkjet printing stage.
- US 5,751,325 to AGFA-Gevaert, N.V. discloses an inkjet printing process which brings into working relationship, on a receiving material, a reducible metal compound, a reducing agent for said metal compound and physical development nuclei that catalyse the reduction of said metal compound to metal.
- the process is used to produce high optical density inkjet printed images rather than a conductive metal layer.
- the physical development nuclei are dispersed in an image receiving layer, such as a gelatin layer, overlying a substrate.
- metal is formed as discrete particles, around each physical development nuclei, within the gelatin layer. Discrete particles will not form an electrically conductive region.
- conductive carbon e.g. graphite
- PEDOT conductive polymer
- This resulting material has low conductivity compared with conductive metals and so a subsequent electrolytic plating step may be applied.
- this is a complex multistage process.
- a method of forming a conductive metal region on a substrate comprising depositing on the substrate a solution of a metal ion, and depositing on the substrate a solution of a reducing agent, such that the metal ion and the reducing agent react together in a reaction solution to form a conductive metal region on the substrate.
- reaction preferably takes place on or near or within the surface of the substrate, i.e. in situ, and not before the metal ion and reducing agent are in contact with the surface of the substrate.
- the metal which is deposited is the only or uppermost metal layer in a product.
- the invention can be used to deposit all, or the bulk of, the metal which is to form the conductive metal region in a finished product.
- thermodynamically favourable will depend on factors including the temperature and pH of the reaction solution, the strength of the reducing agent, the ease with which the metal ion can be reduced, the influence of complexing agents which can slow down the reduction of the metal ion, the properties of additional components of the reaction solution and other factors well understood by persons skilled in the field.
- the composition of the reaction solution should not be such that spontaneous formation of metal particles takes place throughout the reaction solution. If this occurs, then instead of building up a conductive metal region on the substrate, fine particles will form which are not physically connected to the surface of the substrate or electrically connected to one another.
- Deposition of solution on the substrate allows the amount of metal ion and reducing agent to be commensurate with the desired thickness of the conductive metal region.
- Deposition contrasts with immersion techniques such as the conventional electroless process where the substrate is immersed in a bath including metal ion and reducing agent.
- Deposition requires lower quantities of metal ion and reducing agent than an immersion process and can reduce waste. Furthermore, deposition reduces or obviates the difficulties in regulating the composition and temperature of immersion baths.
- the composition of the reaction solution may be selected so that it is sufficiently unstable that the reaction between metal ion and the reducing agent in solution to form the conductive metal region on the substrate takes place spontaneously.
- the reaction solution should not be composed so that it is so unstable that a fine powder of conductive metal forms spontaneously throughout the reaction solution, instead of forming a conductive metal region on the substrate.
- One skilled in the art can readily adjust the composition of the reaction solution to prepare a reaction solution which will spontaneously plate out on the substrate, but not tliroughout the reaction solution.
- the reaction between the metal ion and the reducing agent in solution to form the conductive metal region on the substrate may be activated by an activator.
- the reaction between the metal ion and the reducing agent to form the conductive metal region on the substrate need not take place spontaneously were it not for the presence of the activator.
- the activator may already have been applied to the substrate.
- the activator may be a component of the substrate.
- the activator may be applied to, preferably deposited on, the substrate as an initial stage.
- the activator is a catalyst which catalyses the reaction between the metal ion and the reducing agent.
- Appropriate catalysts lower the activation energy and allow the metal region to form spontaneously on the substrate.
- Preferred activators include fine metal particles or a metal layer (which functions as catalyst).
- the activator may comprise a component of a reaction which forms fine metal particles or a metal layer in situ, for example metal ions or reducing agent which can xeact in a reaction solution of metal ions and reducing agent to form fine metal particles or a metal layer which functions as a catalyst for the subsequent metallisation reaction.
- the metal which comprises the activator is typically different to the metal which forms the bulk of the conductive metal layer in the finished product.
- an organic acid salt of a transition metal such as palladium acetate may be deposited (preferrably iakjet printed), preferably with one or more binders, then reduced to palladium in srCu by application of reducing agent (preferably by inkjet printing, but potentially by any metallisation process including immersion in a bath of reducing agent).
- a solution-, of a different metal ion e.g. copper, nickel or silver ions, is then deposited thereon, as is a solution of a reducing agent, by the method of the present invention.
- the resulting reaction solution is autocatalytic, i.e. once its component metal starts depositing, further metal will deposit thereon.
- the catalyst metal functions to catalyse the formation of metal from the autocatalytic solution thereon, to start the deposition process.
- Suitable activators include organic acid salts of transition metals, for example, palladium acetate or palladium proponate. Palladium acetate has been found to have good solvent solubility, is readily printable by inkjet techniques, and dries quickly to give high print quality and good edge definition. Many other palladium salts, such as palladium chloride, are also suitable. Alkanoate salts are preferred.
- Alternative activators include salts, complexes or colloids of transition metals, or particles of bronze, aluminium, gold or copper.
- a suitable solvent for the deposition of an organic acid salt of a transition metal is a 50/50 mixture of diacetone alcohol and methoxypropanol.
- the organic acid salt of a transition metal constitutes 1-3 % by weight of palladium acetate, most preferably 2% by weight of the deposited liquid.
- An equivalent concentration of another organic acid salt of a transition metal can be employed.
- An alternative solvent is a 50/50 mixture of toluene and methoxypropanol. Approximately a 2% by weight solution of palladium acetate in this solvent is preferably. Preferably a co- solvent is added to increase viscosity for inkjet printing.
- the activator/catalyst may be a second metal different from the first metal.
- the second metal may be formed by depositing ions of the second metal and a reducing agent on the substrate, such that the second metal ions and the reducing agent react together in a reaction solution to form a conductive metal region on the surface.
- the first metal will preferably form the bulk of the conductive metal which is deposited.
- a catalytic metal region, or fine metal powder may be formed by first depositing (preferably by inkjet printing) of one or more of metal ion, reducing agent or base, preferably with a binder or in a chemical formulation which forms a solid layer, and then depositing whichever of metal ion, reducing agent and base has not already been deposited thereon. This forms a conductive metal region or an area of fine metal particles.
- a metal ion (e.g. palladium) is applied to the substrate by inkjet printing (and preferably dried/cured/hardened in situ) and then the substrate is either immersed into a bath of reducing agent or has reducing agent deposited thereon (e.g. by inkjet printing) forming a conductive metal region or area of fine metal particles on the substrate to function as catalyst.
- This is then suitable for metallisation by deposition on the substrate of a solution of a metal ion, and deposition on the substrate of a solution of a reducing agent as before.
- the metal ion deposited to form the bulk of the resulting conductive metal region is different to the metal ion deposited to form the catalyst.
- reducing agent is applied first to the substrate, which is then immersed in a solution of metal ion and base or has metal ion deposited thereon by inkjet printing.
- the solution of metal ion and the solution of reducing agent may be deposited in a plurality of separate component solutions, or in a single component solution.
- a pH altering reagent typically an acid or base may also be deposited, to activate the reducing agent.
- the acid/base may be deposited in a component solution with either or both of the metal ion and the reducing agent.
- the base may deposited in a separate component solution to either or both of the metal ion and the reducing agent.
- the acid/base may also be deposited with the activator.
- the metal ion may be stored in a component solution at a pH at which it will not spontaneously form metal.
- the metal ion, the reducing agent and an acid/base may be deposited in three separate component solutions which mix together on the substrate and form the reaction solution.
- the metal ion and the reducing agent are deposited in a first component solution, and an acid/base is deposited in a second component solutions, such that the first and second component solutions mix together on the substrate and form the reaction solution.
- a single component solution includes the metal ion, the reducing agent and the acid/base.
- reaction solution it is generally preferred to have as few component solutions as possible to minimise the complexity of the deposition process.
- separation of components of the reaction solution into a plurality of component solutions allows the reaction solution to be prepared from more stable component solutions.
- the method preferably includes the step of depositing the activator on the substrate before deposition of a component solution. More preferably, the activator is deposited before either or both of the metal ion or the reducing agent are deposited on the substrate. The activator is therefore located on the substrate and so favours formation of a conductive metal region on the substrate rather than formation of fine particles of conductive metal throughout the reaction solution.
- the activator is preferably deposited in an activator solution.
- the solvent for the activator solution is primarily or entirely non-aqueous.
- the solvent is preferably allowed to substantially evaporate or otherwise dissipate prior to deposition of one or more component solutions thereby forming a layer. This reduces or prevents diffusion of the activator away from the substrate where it might lead to excessive formation of conductive metal regions which are not on the substrate. Typically, between a few seconds and a few minutes may be required to allow volatile components to dissipate, with a time of around 30 seconds being typical, before one or more component solutions are deposited thereon.
- the substrate is pretreated before an activator liquid is deposited thereon. This causes the activator liquid to dry rapidly and spread less, achieving thinner lines. For example, a Melinex substrate (Melinex is a Trade Mark) was heated at 350°C for 4 seconds using a heat gun.
- the activator is deposited in a solution including a chemical component which promotes adhesion of the activator to the substrate, for example, a polymer.
- a chemical component which promotes adhesion of the activator to the substrate for example, a polymer.
- Suitable adhesion promoters retain the activator on the surface of the substrate so that the activator is not washed into the reaction solution when a further component solution is deposited.
- Suitable polymer adhesion promoters include polyvinylpyrollidinone and polyvinylbutyral.
- the activator is deposited in a primarily or entirely non-aqueous solution
- the activator may be deposited in a solvent selected dependent on the nature of the substrate.
- the solvent is selected to partially dissolve the substrate to enable the activator to penetrate the substrate and improve adhesion of the resulting conductive metal region to the substrate.
- the activator is preferably deposited in solution prior to the deposition of either or both the metal ion and the reducing agent.
- the solvent must not be too aggressive or not only will the substrate be damaged, but the substrate will swell and the activator will penetrate too far into the substrate, so that it is no longer present at the surface of the substrate in sufficiently quantity to reliably activate the deposition of the conductive metal ions.
- the substrate may be pretreated prior to the deposition of activator to improve adhesion.
- the substrate may be immersed in a water based oxidising solution, as it known in the conventional electroless procedure.
- the method may also include the deposition of a preparation reagent on the substrate, such as a solvent which etches the substrate or a water based oxidising solution, prior to deposition of the catalyst.
- the activator solution may comprise one or more of the metal ion, the reducing agent or a base/acid.
- the component solution which comprises the metal ion may further comprise a complexing agent.
- a complexing agent such as EDTA binds metal ions, slowing or preventing the rate of reduction of the metal ion by the reducing agent.
- a complexing agent can therefore prevent spontaneous formation of metal in the component solution comprising the metal ion.
- a single component solution may be deposited, or a plurality of component solutions may be deposited which are mixed together during or as a result of deposition. If metal ion and reducing agent are deposited at separate times, they may be deposited in either order. Where a plurality of component solutions are deposited, they may be deposited sequentially or simultaneousl . It is preferred that a plurality of component solutions are deposited sequentially and a single solution, or combination of solutions is allowed to partially or fully dry-out, cure or otherwise harden before one or more further component solutions are deposited thereon. We have found that this procedure can allow better adhesion of the conductive metal region to the substrate and can improve the quality of patterning.
- a solution (perhaps formed from a plurality of solutions) (hereafter 'first liquid') comprising an activator for the conductive metal region forming reaction, is allowed to partially or fully dry-out, cure or otherwise harden on the substrate to form a first solid layer, before one or more further component solutions (hereafter 'second liquid') is deposited thereon to begin the conductive metal region forming reaction, and where the first liquid comprises an activator for a second solid-layer-forming chemical reaction, the first liquid is selected so that the first solid layer adheres to the substrate and is permeable to the second liquid which comprises one or more reagents for the second solid layer- forming chemical reaction.
- the activator is adhered to the substrate by virtue of its inclusion in the first solid layer (whether by entrapment, immobilisation or other means).
- the second liquid When the second liquid is brought into contact with the first solid layer, the second liquid penetrates the first solid layer, allowing the second liquid to access the activator within the first solid layer.
- the second solid-layer-forming reaction can thus take place, on or in close proximity to or within the substrate substance, producing the desired (second) solid layer (of conductive metal) on the substrate.
- penetration of the second liquid into the first solid layer may result in the (second) solid layer of material intermingling with the first solid layer, thereby enhancing adhesion of the (second) solid layer (of conductive metal) to the substrate via the adhered first solid layer.
- the activator As the activator is located in a layer on the surface of the substrate, metallisation will occur on the first layer in preference to the formation of fine particles of metal in the second liquid.
- the first liquid need not necessarily be a solution.
- One or more components thereof may be a solid, colloid etc.
- the first liquid comprises a first chemical functionality which is insoluble in the second solvent.
- the first liquid comprises a second chemical functionality which is at least partially soluble in the second solvent.
- a second chemical functionality will at least partially dissolves in the second solvent, allowing the second solvent to penetrate the first solid layer and contact the activator.
- the first chemical functionality retains sufficient integrity to adhere to the substrate and the second solid layer.
- the method may include the further step of chemically converting the one or imore reagents to an active or catalytic form.
- palladium acetate may be reduced in situ by a subsequently applied reducing agent solution, forming palladium metal whicln can catalyse deposition of metal thereon when the second liquid is applied.
- the first liquid may comprise a second chemical functionality which can swell in the second solvent or take up the second solvent.
- the first and second chemical functionalisation may be separate molecules, or groups of molecules, or may be or become part of the same molecules. Typically, they are two separate binders.
- the first chemical functionality only needs to be sufficiently insoluble in the second solvent to retain integrity while the second solid layer is formed.
- the first solvent is preferably sufficiently aggressive to the substrate to allow the first layer to allow the first liquid to penetrate therein, increasing adhesion of the first solid layer to the substrate, and thus also increasing the adhesion of the second solid layer to the substrate (via the first solid layer) .
- the first and second solvents are preferably different. This allows the first solvent to be selected to be appropriate for the formation of the first layer and the adhesion of the first layer to the substrate, whilst the second solvent can be selected to be appropriate for the formation of the second layer.
- the second solvent is water.
- the first solvent is selected to partially dissolve or otherwise permeate into the substrate, improving adhesion of the first layer to the substrate.
- aqueous metallisation chemistry and a non-aqueous first solvent can be utilised in different steps of the same process.
- the first solvent is partially or entirely non-aqueous.
- the first liquid may comprise one or more second chemical functionalities which are soluble in the second solvent, such as polyvinyl pyrrollidinone, which is soluble in water.
- second solvent such as polyvinyl pyrrollidinone
- Alternatives include polyacrylic acid, polyvinyl acetate, polyethylene imine, polyethylene oxide, polyethylene glycol, gelatin or copolymers thereof.
- the soluble components may dissolve when the second liquid is brought into contact with the first solid layer.
- the polyvinyl pyrrollidinone will dissolve in contact with an aqueous solution of metal ion and reducing agent usable to form a conductive metal region on the first solid layer. Around 5% by weight of polyvinyl pyrrollidinone in the resulting solid layer is appropriate.
- the second chemical functionality could instead (or as well) comprise a water swellable monomer and/or oligomer such as HEMA (2-hydroxyethyl methacrylate), GMA (glyceryl methacrylate) or NNP (n-vinyl pyrrolidinone).
- HEMA 2-hydroxyethyl methacrylate
- GMA glyceryl methacrylate
- NNP n-vinyl pyrrolidinone
- Other monomers and/or oligomers which are themselves swellable in the solvent of the second liquid and/or are swellable when polymerised could be used instead. This allows the second liquid to permeate into the first solid layer, improving adhesion and allowing access to more activator than just what is present on the surface of the first solid layer.
- the second chemical functionality could instead (or as well) comprise a high boiling point solvent miscible with the solvent of the second liquid.
- ⁇ MP n-methyl pyrrolidinone
- Alternative solvents include ethylene glycol, diethylene glycol or glycerol.
- the first liquid could instead (or as well) comprise micro-porous particles to create a micro-porous film structure.
- Micro-porous particles could be organic (e.g. PPNP poly (polyvinyl pyrrolidinone)) or inorganic (e.g. silica).
- the first liquid may solidify as a result of evaporation of the first solvent.
- the process may be repeated (optionally with different first and second liquids) to build up a multi-layer structure.
- the first liquid is curable; that is to say, able to undergo a chemical change as a result of which the liquid hardens, preferably solidifies
- the curable first liquid may be selected to have improved wetting properties on one or more substrates than the second liquid. This allows more accurate and precise patterning than if the curable first liquid was applied from the same carrier (e.g. water) as the second liquid, with fine features and better edge definition. There will typically be less bleed and feathering of the curable first liquid than if activator were applied to the surface by a different technique using a carrier with poorer wetting properties.
- Improved wetting properties allow more accurate and precise patterning as successive spots of liquid along a line can be deposited further apart (by a technique such as inkjet printing) allowing a lower volume of liquid to be used, and thus narrower lines and finer features to be prepared.
- first curable liquid comprising an activator is particularly important where it is desirable to use inkjet printing to digitally pattern a material on a substrate.
- Many curable liquids are within the correct viscosity range to be inkjet printed.
- the curable first liquid preferably comprises one or more component chemicals which can undergo a reaction causing the liquid to harden.
- the curable first liquid comprises monomers and/or oligomers which can polymerise and/or cross-link in use, thereby hardening and forming a solid layer.
- the resulting polymer forms a matrix which includes the activator.
- a curable first liquid including at least some oligomers will often have lower toxicity than if it included only monomers.
- the first solid layer may be rigid, elastic or plastic (where or not it is formed by curing). Preferably, it need not necessarily finish hardening before the second liquid is applied.
- the first liquid is curable in response to a stimulus, for example, electromagnetic radiation of a particular wavelength band (e.g. ultra-violet, blue, microwaves, infra-red), electron beams, or heat.
- a stimulus for example, electromagnetic radiation of a particular wavelength band (e.g. ultra-violet, blue, microwaves, infra-red), electron beams, or heat.
- the curable first liquid may be curable responsive to electromagnetic radiation of a specific wavelength range (e.g. ultraviolet radiation, blue light, infra-red radiation), heat curable, electron beam curable etc.
- the liquid could be curable responsive to the presence of one or more chemical species such as moisture or air.
- the component chemicals are selected to undergo a reaction responsive to one of the above stimuli.
- the curable first liquid comprises one or more monomers and/or oligomers which can form a polymer, and constitute the first chemical functionality.
- monomers and/or oligomers which react to form a polymer, and an initiator which starts a polymerisation reaction responsive to one of the above stimuli e.g. AIBN (2, 2'- azobisisobutyronitrile) can be included to initiate a polymerisation reaction responsive to heat.
- an initiator generates free radicals responsive to a stimulus. It is also possible to use an initiator which generates cations responsive to a stimulus .
- the monomers and/or oligomers are those known from the field of UN curable, or other curable inks proposed for inkjet printing of curable inks.
- the delay between depositing and curing the curable liquid is as short as possible. This reduces over-wetting of the substrate, which causes less of definition to the image.
- the delay between deposition and curing is 20 seconds or less.
- the curable first liquid comprises some monomers and/or oligomers having a high number of cross-linkable functional groups, such as four or more, or even six or more functional groups.
- Actilane 505 which is a reactive tetrafunctional polyester acrylate oligomer supplied by AKZO ⁇ obel UN Resins, Manchester, UK
- DPHA dipentaerythritol hexaacrylate
- UCB hexafunctional monomer supplied by UCB, Dragenbos, Belgium.
- These monomers and/or oligomers with a high number of cross-linkable functional groups are more highly cross-linked than polymers formed from monomers with fewer cross-linkable functional groups and can provide a stronger, more robust film with better adhesion to the substrate. Too high a proportion of highly cross-linkable monomers and/or oligomers would however form a brittle surface.
- the activator is also included in the first liquid it will typically be trapped within the first layer in a matrix formed, for example, by a polymer.
- the activator could also be immobilised as part of the matrix, for example, by including the activator on a molecule with a reactive group which reacts with monomer or oligomer units.
- the activator may be initially inactive, and become active only once the first liquid has formed the first solid layer, or in response to a stimulus, or when in contact with a component of the second liquid.
- the activator may be one or more of metal ions, reducing agent and (optionally) an acid or base.
- the second liquid will be such that a second-layer-forming reaction begins when the second liquid is in contact with the first layer.
- the activator comprises metal ions, typically as metal salts or metal complexes (and perhaps also bases)
- the second liquid may comprise reducing agent and (optionally) an acid/base.
- the second liquid may also contain additional ions of the same or a different metal.
- the activator comprises a reducing agent (and perhaps also acid/base)
- the second liquid will preferably comprise metal ions, typically as metal salts or metal complexes.
- the second liquid may comprise further reducing agent.
- the second liquid typically includes metal ions and reducing agent, and optionally further acid/base.
- the first liquid is curable, it preferably does not include a volatile carrier which, in use, is evaporated off before the second liquid is brought into contact with the first layer.
- a volatile carrier which, in use, is evaporated off before the second liquid is brought into contact with the first layer.
- substantially all of the constituents of such a curable first liquid preferably remain (albeit perhaps in chemically changed form) in the first solid layer.
- the first liquid may include a volatile carrier.
- the volatile carrier evaporates or is evaporated off before the second liquid is brought into contact with the first layer.
- the first liquid may comprise water or (preferably) one or more organic solvents which, in use, are evaporated off before the second liquid is brought into contact with the first layer.
- the method may include a pause to allow a volatile carrier to evaporate before one or both of applying a stimulus (if applicable) and bringing the second liquid into contact with the first layer.
- the first liquid is deposited onto the substrate by inkjet printing.
- the second liquid is deposited on the first layer by inkjet printing. Where the first liquid and/or resulting first layer are patterned, the second liquid may be deposited according to the same pattern.
- a component solution may be mixed from stock solutions prior to deposition. Mixing may take place immediately prior to deposition.
- a component solution which is unstable might be mixed from stock solutions including constituents of the component solution prior to deposition.
- a component solution including both the metal ion and the reducing agent might be mixed from separate stock solutions of the metal ion and the reducing agent immediately prior to deposition. This allows unstable solutions to be deposited onto the substrate.
- a component of the reaction in the form of a solution of a metal ion, a solution of a reducing agent or an activator
- that component to dry, cure or otherwise harden to form a solid layer on the substrate.
- Other component(s) of the reaction are subsequently deposited in liquid form (in one or more steps) on the solid layer.
- a currently preferred method involves initial deposit of an activator, e.g. palladium acetate, which is dried, cured or otherwise hardened in situ to form a solid layer on the substrate surface.
- the palladium acetate is optionally treated with DMAB (dimethylamineborane) to reduce palladium ions to palladium metal.
- DMAB dimethylamineborane
- a solution of a metal ion, e.g. copper sulphate, and a reducing agent, e.g. formaldehyde, (with base to adjust pH) are then deposited on the palladium metal layer, with these further reagents conveniently mixed together in a single solution.
- the activator is deposited on the substrate in a pattern, thereby leading to the formation of one or more patterned conductive metal regions. Component solutions may be deposited in the same pattern, over the activator, or more generally across the substrate.
- a pattern may also be formed by depositing a component solution in a pattern. This is particularly appropriate where activator has been deposited in a non-pattern specific distribution across the substrate.
- deposition in a pattern is carried out by inkjet printing.
- the activator solution is inkjet printed.
- one or more component solutions may be inkjet printed.
- Other deposition techniques, such as spraying, may be employed.
- Inkjet printing can be used to provide a quicker process, with fewer steps, than the conventional electroless procedure. Inkjet printing apparatus could potentially be cheaper than the capital equipment required for the conventional electroless procedure and is more readily transported than the immersion baths used in the conventional electroless procedure. Inkjet printing allows the deposition of very carefully controlled volumes of liquid, allowing the correct stochiometry of metal ion and reducing agent to be deposited, reducing waste.
- metal ion is copper sulphate and the reducing agent is formaldehyde
- the reaction products are sodium sulphate and sodium formate which can readily be processed for disposal.
- substantially stochiometric amounts of metal ion and reducing agent may be deposited.
- an excess of reducing agent to metal ion may be deposited, so that essentially all of the metal ion is consumed, reducing or avoiding metal -containing waste. The excess reducing agent may be washed away.
- inkjet printing is a digitally controlled procedure, allowing different patterns to be applied using the same apparatus. This is particularly important for one-off products, customised products, or a series of uniquely identifiable products. Furthermore, as inkjet printing is a non-contact procedure, the present method may be used with fragile substrates.
- Inkjet printing may be achieved using continuous or drop-on-demand inkjet printing techniques, such as binary or raster continuous inkjet, and piezo or thermal drop on demand inkjet technologies.
- US Patent 5,463,416 discloses a method of operating a drop-on-demand inkjet printer.
- the inkjet print head preferably comprises a ceramic material , such that liquid containing the acid or base contacts only ceramic material in the inkjet print head.
- solutions to be inkjet printed may be deposited by different nozzles or banks of nozzles in the same inkjet head, or by separate inkjet heads at the same time, or after a short delay.
- the metal ion may be an ion of any conductive metal .
- Preferred conductive metals include copper, nickel, silver, gold, cobalt, a platinum group metal, or an alloy of two or more of these materials.
- the conductive metal may include non-metallic elements, for example, the conductive metal may be nickel phosphorus.
- the metal ion is typically in the form of a salt.
- a salt For example, copper sulphate.
- the metal ion might instead be present in a complex such as with EDTA (ethylene diamine tetra acetic acid) or cyanide.
- EDTA ethylene diamine tetra acetic acid
- reducing agents examples include formaldehyde, glucose or most other aldehydes, or sodium hypophosphite, glyoxylic acid, hydrazines or dimethylamineborane.
- a relatively mild reducing agents may be used with readily reducible metal ions such as gold or silver, and stronger reducing agent may be required for less readily reducible metal ions.
- the reducing agent should not be too strong however or metal particles will spontaneously nucleate away from the surface of the substrate.
- the substrate and/or the reaction solution may be heated to start and/or speed up the process of deposition of conductive metal on the substrate. For example, infra-red light from an infra-red heater may be incident on the reaction solution.
- Suitable substrates include plastics material sheets and fabrics.
- the substrate might be a material having thereon electrical components, such as conductive, semiconductive, resistive, capacitive, inductive, or optical materials such as liquid crystals, light emitting polymers or the like.
- the method may include the step of depositing one or more of said electrical components on a substrate, preferably by inkjet printing, prior to forming a conductive metal region on the resulting substrate.
- the method may further include the step of depositing an electrical component onto the resulting conductive metal region, building up complex devices.
- Said further deposition step may also be carried out using inkjet printing technology.
- the method can be used as one stage in the fabrication of electrical items. It is particularly appropriate for use in manufacturing electrical items which involve complex patterns, such as displays which include complex patterns of pixels.
- Other applications include the fabrication of aerials or antenna for car radio, mobile phones, and/or satellite navigation systems; radio frequency shielding devices; edge connectors, contact and bus connectors for circuit boards; radio frequency identification tags (RFID tags); conductive tracks for printed circuit boards, including flexible printed circuit boards; smart textiles, such as those including electrical circuits; decoration; vehicle windscreen heaters; components of batteries and/or fuel cells; ceramic components; transformers and inductive power supplies, particularly in miniaturised form; security devices; printed circuit board components, such as capacitors and inductors; membrane keyboards, particularly their electrical contacts; disposable low cost electronic items; electroluminescent disposable displays; biosensors, mechanical sensors, chemical and electrochemical sensors.
- the conductive metal region forms a layer.
- components of the reaction solution are selected so that the layer adheres to the surface of the substrate.
- the method may be repeated, depositing further metal ion and reducing agent in solution upon the conductive metal region so as to form a thicker conductive metal layer.
- Different metal ions may be used for a second or successive layers, thus building up a material comprising layers of a plurality of different metals. Products including multiple layers of different metals may be built up in this way, including products comprising layers alternative between two or more different metals. Alloys may be built up by depositing a component solution comprising a mixture of metal ions, or by depositing a plurality of component solutions comprising different metal ions.
- RFID tags can send and/or receive identifying information to/from RFID tag detectors.
- the method is applicable to both inductively and capacitively coupled tags, which may be active (i.e. including an internal power source) or passive (not including an internal power source).
- tags typically include a microprocessor (often including some memory), and a conductive antenna.
- the invention extends to a method of manufacturing an RFID tag using one or more of the procedures A, B or C below, and also to an RFID tag manufactured using one or more of procedures A, B or C below.
- an antenna of a conductive metal is formed on a substrate by the method of the first aspect.
- the antenna is a concentric loop of conductive metal.
- This technique is applicable to the manufacture of active or passive RFID tags.
- the invention also extends to a method of forming an aerial on a substrate (for any application) by forming a conductive metal region, configured to function as an aerial, on a substrate, by the method of the first aspect.
- a battery is formed on a substrate by forming two regions of different conductive metals on a substrate by the method of the first aspect, and electrolytically connecting the two regions by way of an electrolyte (which may be inkjet printed), thereby forming an electrochemical cell.
- a plurality of electrochemical cells may be electrically connected in series or in parallel thereby increasing the voltage and/or current available.
- the invention also extends to a method of forming a battery by forming two regions of different conductive metals on a substrate by the method of the first aspect, and electrolytically connecting the two regions by way of an electrolyte (which may be inkjet printed).
- the invention also extends to a battery formed by the said method.
- a microchip is applied to a substrate and then one or more conductive metal regions are formed on the substrate by the method of the first aspect of the present invention to make electrical connections to one or more electrical contacts of the microchip.
- the invention also extends to a method of making an electronic device (not just RFID tags) comprising the step of applying a microchip to a substrate and then forming one or more conductive metal regions on the substrate by the method of the first aspect of the present invention.
- the invention further extends to an electronic device made by this method.
- this procedure includes the step (after the microchip has been applied to the substrate) of measuring the location of the microchip and then forming the conductive metal regions to make electrical connections dependent on the measured location of the microchip.
- This has the benefit that the location where the microchip is applied can vary within a tolerance that is higher than with known methods of locating a microchip, reducing costs.
- the procedure may also include the step of forming a conductive metal region on the substrate to function as a heat sink for a microchip, before applying the microchip thereon.
- the method includes the step of depositing a thermally conductive material (typically a thermally conductive adhesive) upon the heat sink (perhaps by inkjet printing) before the microchip is applied.
- a region of Conductive metal is preferably formed on a substrate by inkjet printing.
- the method of manufacturing an RFID tag may comprise the steps of inkjet printing the substrate upon which the antenna, battery, heat sink and/or chip is deposited.
- the method of manufacturing an RFID tag may comprise the step of inkjet printing an over coat or protective layer of material (such as a polymer layer) over the deposited components.
- the method of manufacturing an RFID tag has advantages of simplicity and low cost over known techniques.
- the one or more component solutions should fulfil the specific requirements of inkjet printing inks as regards viscosity, surface tension, conductivity, pH, filtration, particle size and ageing stability.
- Humectants may be added to one or more component solutions to reduce evaporation.
- the particular values of these properties which are required are different for different inkjet technologies and suitable component solutions fulfilling these properties can readily be devised for a specific application by one skilled in the art.
- the method may include the further step of electrolytically plating additional metal onto the conductive metal regions by known electrolytic plating techniques.
- the method may include the further step of plating additional metal onto the conductive metal regions by the known electroless immersion procedure.
- an article comprising a substrate including a conducting metal region prepared according to the method of the first embodiment.
- the conducting metal region is a layer.
- a method of activating the reaction between a metal ion and a reducing agent to form a conducting metal region comprising the use of an organic acid salt of a transition metal as an activator.
- organic acid salts of transition metals have good solvent solubility, are readily printable by inkjet techniques, and dry quickly to give high print quality and good edge definition.
- a preferred organic acid salt of a transition metal is palladium acetate which has the above properties and also has the benefit of being commercially available in bulk at a reasonable price.
- Alternatives include palladium propanoate, butanoate etc. or other alkanoate salts of a transition metal, especially palladium.
- the organic acid salt of a transition metal is reduced to metal particles or a metal layer which can catalyse deposition of metal (preferably a different metal) thereon, by the method of the first aspect.
- the activator is deposited with a polymer to adhere the catalyst to the substrate.
- the activator is added to a substrate and the conducting metal region is formed as a layer on the substrate.
- the activator is added to the substrate by inkjet printing a solution including the activator.
- Palladium acetate is present as an activator. Diacetone alcohol and methoxy propanol are mixed in this proportion to give a solvent which evaporates sufficiently quickly to allow the palladium acetate to attach to the substrate before addition of the reaction solutions discussed below. However, the rate of evaporation is sufficiently slow that this activator solution can be conveniently inkjet printed.
- Polyvinylbutyral is present to help the catalyst adhere to the substrate. Polyvinylbutyral with a molecular weight of between 15,000 and 25,000 is suitable, such as grade BN18, available from Wacker. Potassium hydroxide is present to function as a base, activating the reducing agent below.
- a 30% solution of polyvinylbutyral is prepared in a 50/50 mixture by weight of diacetone alcohol and methoxy propanol.
- a 3% palladium acetate solution is prepared in the same solvent mixture using sonication over a period of 2-3 hours.
- a 10% solution of potassium hydroxide is prepared in the same solvent mixture.
- These three solutions are then mixed and more of the same solvent mixture is added to make up the appropriate total volume to give the proportions specified above.
- the resulting fluid is a brown-orange translucent liquid which is then filtered through a 1 micron GF-B glass fibre filter available from Whatman. A slight deposit is sometimes visible on the filter paper.
- the resulting activator solution has a viscosity of 3.91 cPs and a surface tension of 31.5 dynes/cm.
- the copper sulphate is the source of the metal ion, here Cu 2+ .
- Sodium sulphate is present to stabilise the copper sulphate.
- EDTA is a complexing agent which forms a protective barrier around the copper ions, without which a solution of this composition would immediately precipitate out.
- t-butanol is a cosolvent which reduces surface tension and improves wetting.
- Formaldehyde is present as the reducing agent.
- the function of sodium hydroxide is to activate the reducing agent when the solutions are combined.
- Solutions A, B and C are shaken and then filtered through a 1 micron GF-B glass fibre filter, available from Whatman. Each solution had a viscosity of less than 3 cps.
- the activator was deposited by inkjet printing.
- the resolution down web was adjusted to the particular substrate. For easily wetted substrates, 250 dots per inch (dpi) was used. For substrates which are wetted only with difficulty, 1000 dpi was used to ensure complete wetting.
- the XJ128-200 print head ejected droplets of 80pL.
- the jetting frequency was between 1 and 2 kHz and a throw distance of l-2mm was used.
- the activator was inkjet printed in a variety of patterns, such as solid blocks, thin lines, text, checked patterns and standard inkjet printing test images.
- the printed activator solution was allowed to dry using an infra-red heater located just above the substrate. In some experiments, the printed catalyst solution was allowed to dry under ambient conditions, without any additional heating.
- the 3 separate component solutions A, B and C were inkjet printed onto the dried activator.
- the three solutions were printed separately, in equal volumes, onto the same locations on the substrate, evenly across the whole printable surface area of the substrate, forming a reaction solution in situ.
- the solutions were inkjet printed using a 64ID3 print head, available from Ink Jet Technology. All parts of this print head which contact the fluid to be jetted are ceramic and so this head is particularly suitable for printing very basic or acidic liquids. Jetting took place at 5 kHz.
- the waveform of the potential applied to the piezoelectric printing head was selected to cause ejection of droplets of 137pL.
- the activator is reduced to form palladium particles on the surface which catalyse formation of a copper metal region thereon. Once copper has started depositing, the reaction is autocatalytic.
- reaction solution was allowed to remain in contact with the substrate until a suitable thickness of copper had been deposited. Typically, less than 5 minutes at room temperature were required to produce a suitable layer of copper.
- the copper regions could be formed quicker by heating the substrate with infra-red radiation. However, it was important to ensure that the surface temperature did not rise above 50 degrees centigrade for many types of plastics substrates, to avoid warping the substrate.
- ABS (Acrylonitrile butadiene styrene) Good
- Metal layers of between 0.3 and 3 microns have been demonstrated depending on the specific chemistry used. Repeat printing can be used to build up thicker layers, such as the 15 to 20 micron layers required for aerial/antenna applications.
- solution AB contains both the metal ion and the reducing agent.
- EDTA disodium salt 0.60 formaldehyde solution (37% by weight in water) 0.22 sodium formate 3.71 water 85.63 t-butanol 5.00
- Solution AB was filtered through a 1 micron GF-B glass fibre filter, available from Whatman.
- Deposition was carried out as before, beginning with inkjet printing of the catalyst solution followed by a delay while the activator solution solvent evaporated. Next, equal volumes of solution AB and solution C were inkjet printed over the surface of the substrate using the 64ID3 inkjet printhead.
- a conductive copper region was formed on the substrate.
- the following single solution was prepared. It is stable for a period of a few hours and so may be inkjet printed as a single component solution.
- the above solution is prepared from its constituents and then filtered through a 1 micron GF-B glass fibre filter from Whatman.
- the viscosity is 9.8 cPs and the surface tension is 30.0 dynes/cm.
- Enplate 872 A contains copper sulphate.
- Enplate 872B contains a cyanide complexing agent and formaldehyde.
- Enplate 872C contains sodium hydroxide. (Enplate is a trade mark).
- Enplate 872 A, B and C are available from Enthone-OMI and are in common use as component solutions for electroless copper plating.
- Ethylene glycol is present as a humectant and acts to lower surface tension.
- T-butanol is a cosolvent which reduces surface tension and increases wetting.
- Surfadone LP-100 is a wetting agent with surfactant properties.
- PEG- 1500 functions as a humectant.
- the catalyst solution described above is inkjet printed according to a pattern. After a short pause (30 seconds) to allow the solvent in the activator solution to evaporate, the above solution is deposited by inkjet printing, either across the whole printable area of the substrate, or on top of the regions where the activator solution was inkjet printed. Thus, a copper layer forms on the surface of the substrate according to the pattern.
- This activator solution has a viscosity of 3.85 cPs and a surface tension of 30.5 dynes per cm.
- K30 grade polyvinylpyrollidinone was sourced from International Speciality Products. This polymer has a molecule weight between 60,000 and 70,000 and was found to accelerate the formation of a conductive metal region but gave less reproducible results than with polyvinylbutyral.
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Chemically Coating (AREA)
- Manufacturing Of Printed Wiring (AREA)
Abstract
Description
Claims
Priority Applications (8)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP04705844A EP1590500A2 (en) | 2003-01-28 | 2004-01-28 | Method of forming a conductive metal region on a substrate |
JP2006502211A JP2006516818A (en) | 2003-01-28 | 2004-01-28 | Method for producing a conductive metal region on a substrate |
US10/543,311 US20060134318A1 (en) | 2003-01-28 | 2004-01-28 | Method of forming a conductive metal region on a substrate |
JP2006537433A JP2007510301A (en) | 2003-10-29 | 2004-10-29 | Electrical connection of parts |
KR1020067010084A KR20060126481A (en) | 2003-10-29 | 2004-10-29 | Electrical connection of components |
US10/975,500 US7243421B2 (en) | 2003-10-29 | 2004-10-29 | Electrical connection of components |
PCT/GB2004/004595 WO2005044451A1 (en) | 2003-10-29 | 2004-10-29 | Electrical connection of components |
EP04818166A EP1678761A1 (en) | 2003-10-29 | 2004-10-29 | Electrical connection of components |
Applications Claiming Priority (8)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB0301933.8 | 2003-01-28 | ||
GB0301933A GB0301933D0 (en) | 2003-01-28 | 2003-01-28 | Method of forming a conductive metal region on a substrate |
GB0325247.5 | 2003-10-29 | ||
GB0325247A GB0325247D0 (en) | 2003-10-29 | 2003-10-29 | Method of forming a conductive metal region on a substrate |
GB0328221A GB0328221D0 (en) | 2003-12-05 | 2003-12-05 | Formation of solid layers on substrates |
GB0328221.7 | 2003-12-05 | ||
US52794803P | 2003-12-08 | 2003-12-08 | |
US60/527,948 | 2003-12-08 |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2004068389A2 true WO2004068389A2 (en) | 2004-08-12 |
WO2004068389A3 WO2004068389A3 (en) | 2005-02-10 |
Family
ID=32830946
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/GB2004/000358 WO2004068389A2 (en) | 2003-01-28 | 2004-01-28 | Method of forming a conductive metal region on a substrate |
Country Status (5)
Country | Link |
---|---|
US (1) | US20060134318A1 (en) |
EP (1) | EP1590500A2 (en) |
JP (1) | JP2006516818A (en) |
KR (1) | KR20050097956A (en) |
WO (1) | WO2004068389A2 (en) |
Cited By (25)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2005087979A2 (en) * | 2004-03-11 | 2005-09-22 | Frontcoat Technologies Aps | A method and a device for deposition of a metal layer on a non-conducting surface of a substrate |
WO2006049776A2 (en) * | 2004-10-29 | 2006-05-11 | Hewlett-Packard Development Company, L.P. | Ink-jet printing of coupling agents for trace or circuit deposition templating |
WO2006123144A2 (en) * | 2005-05-18 | 2006-11-23 | Conductive Inkjet Technology Limited | Formation of layers on substrates |
WO2007003247A1 (en) * | 2005-06-30 | 2007-01-11 | Bundesdruckerei Gmbh | Security document or valuable document comprising a contactless interface and a bi-stable display |
WO2007020448A2 (en) | 2005-08-18 | 2007-02-22 | Dunwilco (1198) Limited | Process |
WO2007126177A1 (en) * | 2006-05-02 | 2007-11-08 | Korea Research Institute Of Standards And Science | Process for preparing nanogap electrode and nanogap device using the same |
WO2008040936A1 (en) * | 2006-10-04 | 2008-04-10 | Hexcel Composites Limited | Curable resin films |
EP1939324A1 (en) * | 2006-12-29 | 2008-07-02 | Nederlandse Organisatie voor toegepast-natuurwetenschappelijk Onderzoek TNO | Conductive fibrous web and method for making the same |
JP2008524395A (en) * | 2004-12-16 | 2008-07-10 | イー・アイ・デュポン・ドウ・ヌムール・アンド・カンパニー | Silver-containing inkjet ink |
WO2008120147A1 (en) * | 2007-03-29 | 2008-10-09 | Koninklijke Philips Electronics N.V. | Textile for connection of electronic devices and manufacturing method therefore |
WO2008152574A1 (en) * | 2007-06-15 | 2008-12-18 | Koninklijke Philips Electronics N.V. | Fabric display with diffuser |
EP2047259A1 (en) * | 2006-07-13 | 2009-04-15 | Korea Research Institute of Standards and Science | Biosensor comprising interdigitated electrode sensor units |
WO2010092392A1 (en) | 2009-02-13 | 2010-08-19 | Conductive Inkjet Technology Limited | Diffractive optical elements |
DE102007025351B4 (en) * | 2007-05-31 | 2010-10-21 | Gigaset Communications Gmbh | injection molding |
WO2010142976A1 (en) | 2009-06-08 | 2010-12-16 | Conductive Inkjet Technology Limited | Display device |
US7868832B2 (en) | 2004-06-10 | 2011-01-11 | Galtronics Corporation Ltd. | Three dimensional antennas formed using wet conductive materials and methods for production |
EP2273591A3 (en) * | 2005-03-30 | 2011-03-30 | Umicore Ag & Co. Kg | Ink for producing catalyst layers |
US8016909B2 (en) | 2005-08-12 | 2011-09-13 | Dunwilco (1198) Limited | Process for producing metal flakes |
US8138614B2 (en) | 2006-02-08 | 2012-03-20 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device having an antenna with anisotropic conductive adhesive |
US8231811B2 (en) * | 2006-07-22 | 2012-07-31 | Conductive Inkjet Technology Limited | Formation of conductive metal regions on substrates |
EP2489436A2 (en) | 2011-02-21 | 2012-08-22 | Sony DADC Austria AG | Microfluidic devices and methods of manufacture thereof |
WO2013136039A1 (en) | 2012-03-16 | 2013-09-19 | Cambridge Display Technology Limited | Optoelectronic device |
FR3002183A1 (en) * | 2013-02-19 | 2014-08-22 | Innovia Security Pty Ltd | SAFETY DEVICES COMPRISING HIGHLY REFLECTIVE AREAS AND METHODS OF MANUFACTURE |
US20160010273A1 (en) * | 2013-02-25 | 2016-01-14 | The Secretary Of State For Business, Innovation & Skills | Conductive Fibres |
US9823221B2 (en) | 2012-02-17 | 2017-11-21 | STRATEC CONSUMABLES GmbH | Microstructured polymer devices |
Families Citing this family (26)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CA2565113A1 (en) * | 2004-06-10 | 2005-12-22 | Sumitomo Electric Industries, Ltd. | Metal catalyst and method for preparation thereof |
KR20060035052A (en) * | 2004-10-20 | 2006-04-26 | 삼성전자주식회사 | Method of an electrode, display devices and method of manufacturing the same |
US7476616B2 (en) * | 2004-12-13 | 2009-01-13 | Fsi International, Inc. | Reagent activator for electroless plating |
US7531203B2 (en) * | 2005-01-06 | 2009-05-12 | The Hong Kong Polytechnic University | Method for the production of conductive flexible textile arrays |
JP2006295878A (en) * | 2005-01-25 | 2006-10-26 | Ricoh Co Ltd | Image forming device |
JP5282423B2 (en) * | 2008-03-14 | 2013-09-04 | コニカミノルタ株式会社 | Ink jet ink for forming metal pattern and method for forming metal pattern |
KR100938473B1 (en) * | 2008-04-16 | 2010-01-25 | 한국과학기술원 | Polymer organic Light Emitting Diode and manufacturing method thereof |
TWM341266U (en) * | 2008-04-18 | 2008-09-21 | Darfon Electronics Corp | Keyswitch and keyboard |
US8268536B2 (en) | 2008-08-29 | 2012-09-18 | Korea University Research And Business Foundation | Electrode formation based on photo-induced reduction of metal ions in the presence of metal nanomaterials |
JP4998418B2 (en) * | 2008-09-16 | 2012-08-15 | コニカミノルタホールディングス株式会社 | Film for supplying metal and method for producing printed wiring board using the same |
US8337010B2 (en) | 2010-02-24 | 2012-12-25 | Geller Gary R | Method and apparatus for creating a graphic image on a reflective metal surface |
JP5898616B2 (en) * | 2010-06-30 | 2016-04-06 | 三井金属鉱業株式会社 | Method for producing copper foil for negative electrode current collector |
CN104487609A (en) * | 2012-04-01 | 2015-04-01 | 盖尔创尼克斯有限公司 | Printing method for printing and plating process |
US9371473B2 (en) * | 2012-06-27 | 2016-06-21 | Henkel IP & Holding GmbH | Accelerators for two step adhesive systems |
JP6035540B2 (en) | 2012-12-21 | 2016-11-30 | 奥野製薬工業株式会社 | Conductive film forming bath |
WO2014118783A1 (en) * | 2013-01-31 | 2014-08-07 | Yissum Research Development Company Of The Hebrew University Of Jerusalem Ltd | Three-dimensional conductive patterns and inks for making same |
WO2015111291A1 (en) | 2014-01-27 | 2015-07-30 | 奥野製薬工業株式会社 | Conductive film-forming bath |
US9446990B2 (en) | 2014-07-16 | 2016-09-20 | Electronics For Imaging, Inc. | Ceramic inkjet ink for relief effect |
JP5649150B1 (en) * | 2014-07-17 | 2015-01-07 | 日本エレクトロプレイテイング・エンジニヤース株式会社 | Pretreatment liquid for electroless plating and electroless plating method |
KR101831983B1 (en) * | 2015-05-18 | 2018-02-26 | 주식회사 랩311 | Paper for Printing Electrode Pattern and Method for Printing the Same |
US20170073815A1 (en) * | 2015-09-10 | 2017-03-16 | Lam Research Corporation | Method for a non-aqueous electroless polyol deposition of metal or metal alloy in features of a substrate |
US20180201010A1 (en) * | 2017-01-18 | 2018-07-19 | Microsoft Technology Licensing, Llc | Screen printing liquid metal |
WO2021059671A1 (en) * | 2019-09-27 | 2021-04-01 | 株式会社村田製作所 | Antenna module and communication device provided with same |
JP7506404B2 (en) | 2019-10-29 | 2024-06-26 | 学校法人 工学院大学 | METAL FILM PRODUCTION METHOD, METAL FILM FORMING COMPOSITION, AND METAL FILM LAMINATE |
US11346000B2 (en) * | 2019-12-03 | 2022-05-31 | Scodix Ltd. | Method for patterning a metal on a substrate and articles comprising same |
CN115243799B (en) * | 2020-03-05 | 2024-02-20 | 富士胶片株式会社 | Coating method |
Citations (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3962494A (en) * | 1971-07-29 | 1976-06-08 | Photocircuits Division Of Kollmorgan Corporation | Sensitized substrates for chemical metallization |
EP0132677A1 (en) * | 1983-07-22 | 1985-02-13 | Bayer Ag | Process for activating substrate surfaces for the direct partial metallization of support materials |
DE4041472A1 (en) * | 1990-05-16 | 1991-11-21 | Bayer Ag | Sprayable compsn. activating substrates for electroless plating - contg. gp=I metal salt and/or amine or ammonium salt and polyurethane elastomer |
US5275861A (en) * | 1989-12-21 | 1994-01-04 | Monsanto Company | Radiation shielding fabric |
US5403649A (en) * | 1989-12-21 | 1995-04-04 | Monsanto Company | Fabricating metal articles from printed images |
US5437916A (en) * | 1986-11-07 | 1995-08-01 | Monsanto Company | Flexible printed circuits |
US5462773A (en) * | 1992-12-28 | 1995-10-31 | Xerox Corporation | Synchronized process for catalysis of electroless metal plating on plastic |
US6194032B1 (en) * | 1997-10-03 | 2001-02-27 | Massachusetts Institute Of Technology | Selective substrate metallization |
EP1201787A2 (en) * | 2000-10-24 | 2002-05-02 | Shipley Company LLC | Plating catalysts |
US20020154427A1 (en) * | 1999-09-29 | 2002-10-24 | Akihiro Takahagi | Metal salt solution for use as a reacting solution and method for using same |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3761305A (en) * | 1971-07-06 | 1973-09-25 | Ppg Industries Inc | Squeegee shield |
US4192764A (en) * | 1977-11-03 | 1980-03-11 | Western Electric Company, Inc. | Stabilizing composition for a metal deposition process |
US5648125A (en) * | 1995-11-16 | 1997-07-15 | Cane; Frank N. | Electroless plating process for the manufacture of printed circuit boards |
-
2004
- 2004-01-28 KR KR1020057013814A patent/KR20050097956A/en not_active Application Discontinuation
- 2004-01-28 US US10/543,311 patent/US20060134318A1/en not_active Abandoned
- 2004-01-28 EP EP04705844A patent/EP1590500A2/en not_active Withdrawn
- 2004-01-28 JP JP2006502211A patent/JP2006516818A/en not_active Withdrawn
- 2004-01-28 WO PCT/GB2004/000358 patent/WO2004068389A2/en active Application Filing
Patent Citations (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3962494A (en) * | 1971-07-29 | 1976-06-08 | Photocircuits Division Of Kollmorgan Corporation | Sensitized substrates for chemical metallization |
EP0132677A1 (en) * | 1983-07-22 | 1985-02-13 | Bayer Ag | Process for activating substrate surfaces for the direct partial metallization of support materials |
US5437916A (en) * | 1986-11-07 | 1995-08-01 | Monsanto Company | Flexible printed circuits |
US5275861A (en) * | 1989-12-21 | 1994-01-04 | Monsanto Company | Radiation shielding fabric |
US5403649A (en) * | 1989-12-21 | 1995-04-04 | Monsanto Company | Fabricating metal articles from printed images |
DE4041472A1 (en) * | 1990-05-16 | 1991-11-21 | Bayer Ag | Sprayable compsn. activating substrates for electroless plating - contg. gp=I metal salt and/or amine or ammonium salt and polyurethane elastomer |
US5462773A (en) * | 1992-12-28 | 1995-10-31 | Xerox Corporation | Synchronized process for catalysis of electroless metal plating on plastic |
US6194032B1 (en) * | 1997-10-03 | 2001-02-27 | Massachusetts Institute Of Technology | Selective substrate metallization |
US20020154427A1 (en) * | 1999-09-29 | 2002-10-24 | Akihiro Takahagi | Metal salt solution for use as a reacting solution and method for using same |
EP1201787A2 (en) * | 2000-10-24 | 2002-05-02 | Shipley Company LLC | Plating catalysts |
Cited By (37)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2005087979A2 (en) * | 2004-03-11 | 2005-09-22 | Frontcoat Technologies Aps | A method and a device for deposition of a metal layer on a non-conducting surface of a substrate |
WO2005087979A3 (en) * | 2004-03-11 | 2006-03-30 | Frontcoat Technologies Aps | A method and a device for deposition of a metal layer on a non-conducting surface of a substrate |
US7868832B2 (en) | 2004-06-10 | 2011-01-11 | Galtronics Corporation Ltd. | Three dimensional antennas formed using wet conductive materials and methods for production |
WO2006049776A2 (en) * | 2004-10-29 | 2006-05-11 | Hewlett-Packard Development Company, L.P. | Ink-jet printing of coupling agents for trace or circuit deposition templating |
WO2006049776A3 (en) * | 2004-10-29 | 2006-07-13 | Hewlett Packard Development Co | Ink-jet printing of coupling agents for trace or circuit deposition templating |
JP2008524395A (en) * | 2004-12-16 | 2008-07-10 | イー・アイ・デュポン・ドウ・ヌムール・アンド・カンパニー | Silver-containing inkjet ink |
EP2273591A3 (en) * | 2005-03-30 | 2011-03-30 | Umicore Ag & Co. Kg | Ink for producing catalyst layers |
WO2006123144A2 (en) * | 2005-05-18 | 2006-11-23 | Conductive Inkjet Technology Limited | Formation of layers on substrates |
WO2006123144A3 (en) * | 2005-05-18 | 2007-03-08 | Conductive Inkjet Tech Ltd | Formation of layers on substrates |
US8642117B2 (en) | 2005-05-18 | 2014-02-04 | Conductive Inkjet Technology Limited | Formation of layers on substrates |
JP2008541470A (en) * | 2005-05-18 | 2008-11-20 | コンダクティブ・インクジェット・テクノロジー・リミテッド | Formation of layers on the substrate |
WO2007003247A1 (en) * | 2005-06-30 | 2007-01-11 | Bundesdruckerei Gmbh | Security document or valuable document comprising a contactless interface and a bi-stable display |
US8016909B2 (en) | 2005-08-12 | 2011-09-13 | Dunwilco (1198) Limited | Process for producing metal flakes |
WO2007020448A2 (en) | 2005-08-18 | 2007-02-22 | Dunwilco (1198) Limited | Process |
US8138614B2 (en) | 2006-02-08 | 2012-03-20 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device having an antenna with anisotropic conductive adhesive |
WO2007126177A1 (en) * | 2006-05-02 | 2007-11-08 | Korea Research Institute Of Standards And Science | Process for preparing nanogap electrode and nanogap device using the same |
EP2047259A1 (en) * | 2006-07-13 | 2009-04-15 | Korea Research Institute of Standards and Science | Biosensor comprising interdigitated electrode sensor units |
EP2047259A4 (en) * | 2006-07-13 | 2010-01-06 | Korea Res Inst Of Standards | Biosensor comprising interdigitated electrode sensor units |
US8231811B2 (en) * | 2006-07-22 | 2012-07-31 | Conductive Inkjet Technology Limited | Formation of conductive metal regions on substrates |
WO2008040936A1 (en) * | 2006-10-04 | 2008-04-10 | Hexcel Composites Limited | Curable resin films |
US8313825B2 (en) | 2006-10-04 | 2012-11-20 | Hexcel Composites Limited | Curable resin films |
EP1980647A1 (en) | 2006-10-04 | 2008-10-15 | Hexcel Composites Limited | Curable resin films |
EP1939324A1 (en) * | 2006-12-29 | 2008-07-02 | Nederlandse Organisatie voor toegepast-natuurwetenschappelijk Onderzoek TNO | Conductive fibrous web and method for making the same |
WO2008082292A1 (en) * | 2006-12-29 | 2008-07-10 | Nederlandse Organisatie Voor Toegepast-Natuurwetenschappelijk Onderzoek Tno | Conductive fibrous web and method for making the same |
WO2008120147A1 (en) * | 2007-03-29 | 2008-10-09 | Koninklijke Philips Electronics N.V. | Textile for connection of electronic devices and manufacturing method therefore |
DE102007025351B4 (en) * | 2007-05-31 | 2010-10-21 | Gigaset Communications Gmbh | injection molding |
WO2008152574A1 (en) * | 2007-06-15 | 2008-12-18 | Koninklijke Philips Electronics N.V. | Fabric display with diffuser |
WO2010092392A1 (en) | 2009-02-13 | 2010-08-19 | Conductive Inkjet Technology Limited | Diffractive optical elements |
WO2010142976A1 (en) | 2009-06-08 | 2010-12-16 | Conductive Inkjet Technology Limited | Display device |
EP2489436A2 (en) | 2011-02-21 | 2012-08-22 | Sony DADC Austria AG | Microfluidic devices and methods of manufacture thereof |
US8877320B2 (en) | 2011-02-21 | 2014-11-04 | Sony Dadc Austria Ag | Microfluidic devices and methods of manufacture thereof |
US9823221B2 (en) | 2012-02-17 | 2017-11-21 | STRATEC CONSUMABLES GmbH | Microstructured polymer devices |
WO2013136039A1 (en) | 2012-03-16 | 2013-09-19 | Cambridge Display Technology Limited | Optoelectronic device |
US9461262B2 (en) | 2012-03-16 | 2016-10-04 | Cambridge Display Technology Limited | Optoelectronic device |
FR3002183A1 (en) * | 2013-02-19 | 2014-08-22 | Innovia Security Pty Ltd | SAFETY DEVICES COMPRISING HIGHLY REFLECTIVE AREAS AND METHODS OF MANUFACTURE |
US20160010273A1 (en) * | 2013-02-25 | 2016-01-14 | The Secretary Of State For Business, Innovation & Skills | Conductive Fibres |
US10508387B2 (en) | 2013-02-25 | 2019-12-17 | Pireta Limited | Conductive fibres |
Also Published As
Publication number | Publication date |
---|---|
KR20050097956A (en) | 2005-10-10 |
WO2004068389A3 (en) | 2005-02-10 |
JP2006516818A (en) | 2006-07-06 |
US20060134318A1 (en) | 2006-06-22 |
EP1590500A2 (en) | 2005-11-02 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US20060134318A1 (en) | Method of forming a conductive metal region on a substrate | |
US8519048B2 (en) | Formation of solid layers on substrates | |
EP1799880B1 (en) | Active filler particles in inks | |
US6461678B1 (en) | Process for metallization of a substrate by curing a catalyst applied thereto | |
US8124226B2 (en) | Flexible circuits | |
US20130230667A1 (en) | Flexible Circuit Chemistry | |
US20050130397A1 (en) | Formation of layers on substrates | |
EP2162237A2 (en) | Method of patterning a substrate | |
JP2007535618A (en) | Selective catalyst activation of non-conductive substrates | |
US5989653A (en) | Process for metallization of a substrate by irradiative curing of a catalyst applied thereto | |
WO2006084064A2 (en) | Selective catalytic activation of non-conductive substrates | |
US20090047423A1 (en) | Formation of layers on substrates | |
TW200846207A (en) | Second surface metallization | |
CN1745194A (en) | Method of forming a conductive metal region on a substrate | |
KR20040007643A (en) | Patterning method | |
JP5504216B2 (en) | Formation of a solid layer on a substrate | |
EP1689909B1 (en) | Formation of solid layers on substrates | |
JP2007510063A (en) | Formation of layers on the substrate | |
CN1898413B (en) | Formation of layers on substrates | |
WO2002099163A2 (en) | Autocatalytic coating method | |
JPWO2020003881A1 (en) | Method for producing molded body having metal pattern | |
KR20110109799A (en) | Plating pretreatment method and method of manufacturing surface metal film material |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
AK | Designated states |
Kind code of ref document: A2 Designated state(s): AE AG AL AM AT AU AZ BA BB BG BR BW BY BZ CA CH CN CO CR CU CZ DE DK DM DZ EC EE EG ES FI GB GD GE GH GM HR HU ID IL IN IS JP KE KG KP KR KZ LC LK LR LS LT LU LV MA MD MG MK MN MW MX MZ NA NI NO NZ OM PG PH PL PT RO RU SC SD SE SG SK SL SY TJ TM TN TR TT TZ UA UG US UZ VC VN YU ZA ZM ZW |
|
AL | Designated countries for regional patents |
Kind code of ref document: A2 Designated state(s): BW GH GM KE LS MW MZ SD SL SZ TZ UG ZM ZW AM AZ BY KG KZ MD RU TJ TM AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IT LU MC NL PT RO SE SI SK TR BF BJ CF CG CI CM GA GN GQ GW ML MR NE SN TD TG |
|
121 | Ep: the epo has been informed by wipo that ep was designated in this application | ||
ENP | Entry into the national phase |
Ref document number: 2006134318 Country of ref document: US Kind code of ref document: A1 |
|
WWE | Wipo information: entry into national phase |
Ref document number: 10543311 Country of ref document: US |
|
WWE | Wipo information: entry into national phase |
Ref document number: 1020057013814 Country of ref document: KR |
|
WWE | Wipo information: entry into national phase |
Ref document number: 2004705844 Country of ref document: EP Ref document number: 2006502211 Country of ref document: JP Ref document number: 20048029983 Country of ref document: CN |
|
WWP | Wipo information: published in national office |
Ref document number: 1020057013814 Country of ref document: KR |
|
WWP | Wipo information: published in national office |
Ref document number: 2004705844 Country of ref document: EP |
|
WWP | Wipo information: published in national office |
Ref document number: 10543311 Country of ref document: US |