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WO2004048639A3 - Method and apparatus for controlling a deposition process - Google Patents

Method and apparatus for controlling a deposition process

Info

Publication number
WO2004048639A3
WO2004048639A3 PCT/GB2003/005130 GB0305130W WO2004048639A3 WO 2004048639 A3 WO2004048639 A3 WO 2004048639A3 GB 0305130 W GB0305130 W GB 0305130W WO 2004048639 A3 WO2004048639 A3 WO 2004048639A3
Authority
WO
Grant status
Application
Patent type
Prior art keywords
apparatus
process
same
used
deposition
Prior art date
Application number
PCT/GB2003/005130
Other languages
French (fr)
Other versions
WO2004048639A2 (en )
Inventor
David Charles Poole
Jeffrey James Harris
Gavin Charles Rider
Original Assignee
Oxford Instr Plasma Technology
David Charles Poole
Jeffrey James Harris
Gavin Charles Rider
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/52—Controlling or regulating the coating process
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/24—Deposition of silicon only
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/46—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for heating the substrate

Abstract

A method and apparatus is provided for rapidly conducting studies of the temperature dependency of CVD processes, in a combinatorial style and with high temperature resolution, while using a single test substrate and few system adjustments. Other combinatorial experiments can also be conducted using the same apparatus to explore the interdependencies of other process parameters to map out a multidimensional process space. The preferred process conditions thereby determined can then be programmed into the deposition equipment’s control system to allow the same apparatus to be used immediately for production of uniform optimised films, without the need for any further equipment or process cross calibration. Preferably, the same apparatus used to determine an optimal growth rate at the knee of an Arrhenius curve is also used for back substrate processing.
PCT/GB2003/005130 2002-11-25 2003-11-25 Method and apparatus for controlling a deposition process WO2004048639A3 (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
GB0227446A GB0227446D0 (en) 2002-11-25 2002-11-25 Improvements relating to a deposition process
GB0227446.2 2002-11-25

Publications (2)

Publication Number Publication Date
WO2004048639A2 true WO2004048639A2 (en) 2004-06-10
WO2004048639A3 true true WO2004048639A3 (en) 2004-11-18

Family

ID=9948456

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/GB2003/005130 WO2004048639A3 (en) 2002-11-25 2003-11-25 Method and apparatus for controlling a deposition process

Country Status (2)

Country Link
GB (1) GB0227446D0 (en)
WO (1) WO2004048639A3 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20170211180A1 (en) * 2016-01-22 2017-07-27 Silcotek Corp. Diffusion-rate-limited thermal chemical vapor deposition coating

Citations (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4607591A (en) * 1985-08-06 1986-08-26 Spectrum Cvd, Inc. CVD heater control circuit
JPH08218177A (en) * 1995-02-08 1996-08-27 Matsushita Electric Ind Co Ltd Cvd simulation method
US5624720A (en) * 1989-03-31 1997-04-29 Canon Kabushiki Kaisha Process for forming a deposited film by reacting between a gaseous starting material and an oxidizing agent
JPH11243061A (en) * 1998-02-25 1999-09-07 Sumitomo Metal Ind Ltd Vapor-phase growing method and device thereof
US6162488A (en) * 1996-05-14 2000-12-19 Boston University Method for closed loop control of chemical vapor deposition process
EP1083470A2 (en) * 1999-09-10 2001-03-14 Applied Materials, Inc. Multi-computer chamber control system, method and medium
US6217651B1 (en) * 1998-07-23 2001-04-17 Shin-Etsu Handotai, Co., Ltd. Method for correction of thin film growth temperature
US6335288B1 (en) * 2000-08-24 2002-01-01 Applied Materials, Inc. Gas chemistry cycling to achieve high aspect ratio gapfill with HDP-CVD
US6374194B1 (en) * 1998-04-14 2002-04-16 The Institute Of Physical And Chemical Research System and method of diagnosing particle formation
WO2002092876A1 (en) * 2001-05-17 2002-11-21 Aixtron Ag Method and device for depositing layers

Patent Citations (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4607591A (en) * 1985-08-06 1986-08-26 Spectrum Cvd, Inc. CVD heater control circuit
US5624720A (en) * 1989-03-31 1997-04-29 Canon Kabushiki Kaisha Process for forming a deposited film by reacting between a gaseous starting material and an oxidizing agent
JPH08218177A (en) * 1995-02-08 1996-08-27 Matsushita Electric Ind Co Ltd Cvd simulation method
US6162488A (en) * 1996-05-14 2000-12-19 Boston University Method for closed loop control of chemical vapor deposition process
JPH11243061A (en) * 1998-02-25 1999-09-07 Sumitomo Metal Ind Ltd Vapor-phase growing method and device thereof
US6374194B1 (en) * 1998-04-14 2002-04-16 The Institute Of Physical And Chemical Research System and method of diagnosing particle formation
US6217651B1 (en) * 1998-07-23 2001-04-17 Shin-Etsu Handotai, Co., Ltd. Method for correction of thin film growth temperature
EP1083470A2 (en) * 1999-09-10 2001-03-14 Applied Materials, Inc. Multi-computer chamber control system, method and medium
US6335288B1 (en) * 2000-08-24 2002-01-01 Applied Materials, Inc. Gas chemistry cycling to achieve high aspect ratio gapfill with HDP-CVD
WO2002092876A1 (en) * 2001-05-17 2002-11-21 Aixtron Ag Method and device for depositing layers

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
PATENT ABSTRACTS OF JAPAN vol. 1996, no. 12 26 December 1996 (1996-12-26) *
PATENT ABSTRACTS OF JAPAN vol. 1999, no. 14 22 December 1999 (1999-12-22) *

Also Published As

Publication number Publication date Type
WO2004048639A2 (en) 2004-06-10 application
GB0227446D0 (en) 2002-12-31 grant
GB2395492A (en) 2004-05-26 application

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