WO2004037794A1 - Process for making pyrazole compounds - Google Patents

Process for making pyrazole compounds Download PDF

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Publication number
WO2004037794A1
WO2004037794A1 PCT/JP2003/013507 JP0313507W WO2004037794A1 WO 2004037794 A1 WO2004037794 A1 WO 2004037794A1 JP 0313507 W JP0313507 W JP 0313507W WO 2004037794 A1 WO2004037794 A1 WO 2004037794A1
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WIPO (PCT)
Prior art keywords
group
alkyl
compound
salt
acid
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PCT/JP2003/013507
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French (fr)
Inventor
Toshiaki Mase
Takehiko Iida
Chie Kadowaki
Masashi Kawasaki
Kenichi Asakawa
Yuji Haga
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Banyu Pharmaceutical Co., Ltd
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Application filed by Banyu Pharmaceutical Co., Ltd filed Critical Banyu Pharmaceutical Co., Ltd
Priority to US10/531,317 priority Critical patent/US20060014815A1/en
Priority to EP03758792A priority patent/EP1554251A1/en
Priority to CA002503024A priority patent/CA2503024A1/en
Priority to AU2003274738A priority patent/AU2003274738A1/en
Priority to BR0315508-0A priority patent/BR0315508A/en
Priority to MXPA05004262A priority patent/MXPA05004262A/en
Priority to JP2004546450A priority patent/JP2006505584A/en
Priority to TW093102472A priority patent/TW200526589A/en
Publication of WO2004037794A1 publication Critical patent/WO2004037794A1/en
Priority to NO20052197A priority patent/NO20052197D0/en
Priority to HR20050456A priority patent/HRP20050456A2/en

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    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D231/00Heterocyclic compounds containing 1,2-diazole or hydrogenated 1,2-diazole rings
    • C07D231/02Heterocyclic compounds containing 1,2-diazole or hydrogenated 1,2-diazole rings not condensed with other rings
    • C07D231/10Heterocyclic compounds containing 1,2-diazole or hydrogenated 1,2-diazole rings not condensed with other rings having two or three double bonds between ring members or between ring members and non-ring members
    • C07D231/14Heterocyclic compounds containing 1,2-diazole or hydrogenated 1,2-diazole rings not condensed with other rings having two or three double bonds between ring members or between ring members and non-ring members with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
    • C07D231/38Nitrogen atoms
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D401/00Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, at least one ring being a six-membered ring with only one nitrogen atom
    • C07D401/02Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, at least one ring being a six-membered ring with only one nitrogen atom containing two hetero rings
    • C07D401/04Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, at least one ring being a six-membered ring with only one nitrogen atom containing two hetero rings directly linked by a ring-member-to-ring-member bond

Definitions

  • the present invention provides a process for preparing compounds of structural formula I
  • the process involves converting an unsubstituted or substituted phenyl hydrazine salt, or an unsubstituted or substituted pyridine hydrazine salt, of formula III, such as the hydrochloride salt IIIA, into the free phenyl hydrazine III' , or the free pyridyl hydrazine III, with a base.
  • the process may start with the free phenyl hydrazine III ' , or the free pyridyl hydrazine III.
  • the free phenyl hydrazine III', or the free pyridyl hydrazine III, is then reacted with an acrylonitrile to form the unsubstituted or substituted phenyl pyrazole, or unsubstituted or substituted pyridyl pyrazole, of formula I .
  • the pyrazole of formula I may be treated with an acid to form the pyrazole salt of general formula IC, wherein X a is CH, CRl, CR 2 or nitrogen.
  • Scheme A illustrates the preparation of pyrazoles of formula I, and salts thereof as exemplified by IC, wherein X a is CH, CRl, CR2 or nitrogen.
  • the present invention relates to a process for the preparation of the pyrazole of formula I .
  • the compounds of formula I are intermediates useful for the preparation of the spirolactone compounds of formula II.
  • the compounds of formula II are also useful as agents for the treatment of various diseases related to NPY, including, but not limited to, cardiovascular disorders, such as hypertension, nephropathy, heart disease, vasospasm, arteriosclerosis and the like, central nervous system disorders, such as bulimia, depression, anxiety, seizure, epilepsy, dementia, pain, alcoholism, drug withdrawal and the like, metabolic diseases such as obesity, diabetes, hormone abnormality, hypercholesterolemia, hyperlipidemia and the like, sexual and reproductive dysfunction, gastrointestinal disorder, respiratory disorder, inflammation or glaucoma, and the like.
  • cardiovascular disorders such as hypertension, nephropathy, heart disease, vasospasm, arteriosclerosis and the like
  • central nervous system disorders such as bulimia, depression, anxiety, seizure, epilepsy, dementia, pain, alcoholism, drug withdrawal and the like
  • metabolic diseases such as obesity, diabetes, hormone abnormality, hypercholesterolemia, hyperlipidemia and the like, sexual and reproductive dysfunction, gastrointestinal disorder,
  • R 1 and R 2 are both independently selected from the group consisting of ( 1 ) hydrogen,
  • R 3 is selected from the group consisting of
  • step (b) (3) -CHt ⁇ aryl, to the hydrazine solution of step (a) to form a mixture; and (c) heating the mixture of step (b) to a temperature between about 50°C to about 100°C; to afford the compound I', or a salt, hydrate or polymorph thereof.
  • the hydrazine solution of step (a) is formed by dissolving a compound of formula III'
  • the solvent is selected from the group consisting of (a) C ⁇ - 4 alcohol; (b) toluene;
  • the solvent is ethanol. In another subclass, the solvent is toluene-ethanol.
  • the hydrazine solution of step (a) is formed by treating a salt of a compound of formula III' salt of III'
  • the solvent is selected from the group consisting of (a) C ⁇ -4 alcohol;
  • the solvent is ethanol.
  • the solvent is toluene-ethanol or tert-butanol.
  • the salt of the compound of formula III' is selected from the group consisting of hydrochloride salt, hydrobromide salt, dihydrobromide salt, mesylate salt, tosylate salt, besylate salt and sulfate salt.
  • the salt of the compound of formula III' is a hydrochloride salt .
  • the base is selected from the group consisting of
  • the base is sodium ethoxide.
  • R 3 is selected from the group consisting of lower alkyl.
  • R3 is selected from the group consisting of : -CH 3 , -CH2CH3, -(CH2)2CH 3 , -CH(CH 3 )2, ⁇ (CH2) 3 CH 3 , and-C(CH 3 )3-
  • R3 is -CH2CH3.
  • the amount of the compound of the formula V relative to that of a hydrazine is preferably about 0.8 to 1.8 in terms of molar ratio.
  • step (c) is aged for a period of about 2 hours to 48 hours, preferably about
  • step (c) is aged for a period of about 2 to 30 hours, preferably about 10 to 30 hours.
  • the process further comprises step (d) of isolating the compound of formula I'.
  • R 1 and R are independently selected from the group consisting of
  • Q is selected from the group consisting of a single bond and a carbonyl
  • Ar2 is selected from the group consisting of (1) aryl, and (2) heteroaryl, wherein Ar2 is unsubstituted or substituted with a substituent selected from the group consisting of
  • Rl is hydrogen and R 2 is selected from the group consisting of
  • Rl is hydrogen and R 2 is selected from the group consisting of
  • both Rl and R2 are hydroge .
  • Rl is hydrogen and R 2 is 2-fluoro. In yet another subclass of this class, Rl is hydrogen and R2 is 4-fluoro.
  • the process further comprises the step (e) of treating the compound of formula I' I' with an acid to form a salt .
  • the acid of step (e) is selected from the group consisting of acetic acid, oxalic acid, hydrobromic acid, hydrochloric acid, anhydrous p-toluene- sulfoni ⁇ acid, p-toluenesulfonic acid hydrate, p-toluene- sulfonic acid monohydrate, benzenesulfonic acid, and methanesulfonic acid, or a mixture thereof.
  • the acid of step (e) is selected from the group consisting of acetic acid, oxalic acid, hydrochloric acid, anhydrous p-toluenesulfonic acid, p-toluenesulfonic acid hydrate, p-toluenesulfonic acid monohydrate, and benzenesulfonic acid or mixture thereof.
  • the acid of step (e) is hydrochloric acid.
  • the acid of step (e) is p-toluenesulfonic acid monohydrate.
  • the salt formed is the p-toluenesulfonic acid salt of formula IA', or a hydrate or polymorph thereof.
  • R! and R 2 are both independently selected from the group consisting of (1) hydrogen,
  • the salt formed is the hydrochloric acid salt of formula IB ' , or a hydrate or polymorph thereof,
  • R 1 and R 2 are both independently selected from the group consisting of ( 1 ) hydrogen,
  • R 1 and R 2 are both independently selected from the group consisting of
  • R 1 and R 2 are both independently selected from the group consisting of
  • X a is CH, CR 1 , Cir or nitrogen; R 1 and R 2 are both independently selected from the group consisting of
  • R 3 is selected from the group consisting of
  • step (c) heating the mixture of step (b) to a temperature between about 50°C to about 100°C; to afford the compound I , or a salt , hydrate or polymorph thereof .
  • the hydrazine solution of step (a) is formed by dissolving a compound of formula III III
  • the solvent is selected from the group consisting of
  • the solvent is ethanol. In another subclass, the solvent is £e_rt-butanol or toluene-ethanol.
  • the hydrazine solution of step (a) is formed by treating a salt of a compound of formula III,
  • the solvent is selected from the group consisting of (a) Ci-4 alcohol; (b) toluene ;
  • the solvent is ethanol.
  • the solvent is tex-t-butanol.
  • the base is selected from the group consisting of (a) sodium ethoxide, (b) sodium methoxide,
  • the base is potassium teirt-butoxide .
  • the salt of the compound of formula III is selected from the group consisting of hydrochloride salt, hydrobromide salt, dihydrobromide salt, mesylate salt, tosylate salt, besylate salt and sulfate salt.
  • the salt of the compound of formula III is a hydrochloride salt .
  • R 3 is selected from the group consisting of lower alkyl.
  • R3 is selected from the group consisting of : -CH 3 , -CH2CH 3 , -(CH 2 )2CH 3 , -CH(CH 3 )2, -(CH2) 3 CH 3 , and-C(CH 3 ) 3 .
  • R3 is -CH 2 CH 3 .
  • the amount of the compound of the formula V relative to that of a hydrazine is preferably about 0.8 to 1.8 in terms of molar ratio.
  • step (c) is aged for a period of about 2 hours to 48 hours. In a class of this embodiment, step (c) is aged for a period of about 2 to 5 hours . In another embodiment of this invention, the process further comprises step (d) of isolating the compound of formula I.
  • Rl and R are independently selected from the group consisting of
  • Rl is hydrogen and R2 is selected from the group consisting of (1) hydrogen
  • Rl is hyarogen ana R 2 is selected from the group consisting of
  • both Rl and R 2 are hydrogen.
  • Rl is hydrogen and R2 is 2-fluoro. In yet another subclass of this class, Rl is hydrogen and R2 is 4-fluoro.
  • the process further comprises the step (e) of treating the compound of formula I
  • the acid of step (e) is selected from the group consisting of acetic acid, oxalic acid, hydrobromic acid, hydrochloric acid, anhydrous p-toluenesulfonic acid, p-toluenesulfonic acid hydrate, p-toluenesulfonic acid monohydrate, benzenesulfonic acid, and methane sulfonic acid, or a mixture thereof.
  • the acid of step (e) is selected from the group consisting of acetic acid, oxalic acid, hydrochloric acid, anhydrous p-toluenesulfonic acid, p-toluenesulfonic acid hydrate, p-toluenesulfonic acid monohydrate and benzenesulfonic acid, or a mixture thereof.
  • the acid of step (e) is hydrochloric acid.
  • the acid of step (e) is p-toluene sulfonic acid monohydrate.
  • the salt formed is the p-toluenesulfonic acid salt of formula IA, or a hydrate or polymorph thereof,
  • X a is CH, CR 1 , CR 2 or nitrogen; R! and R 2 are both independently selected from the group consisting of
  • the salt formed is the hydrochloric acid salt of formula IB, or a hydrate or polymorph thereof,
  • X a is CH, CR 1 , CR 2 or nitrogen;
  • R 1 and R 2 are both independently selected from the group consisting of
  • X a is CH, CR 1 , CR 2 or nitrogen;
  • R 1 and R 2 are both independently selected from the group consisting of
  • X a is CH, CR 1 , CR 2 or nitrogen;
  • R 1 and R 2 are both inaependently selectea from the group consisting of
  • lower alkylene optionally substitutea with oxo, ana
  • -Q-Ar 2 ' wherein Q is selected from the group consisting of a single bond and a carbonyl, and wherein Ar 2 is selected from the group consisting of
  • the compounds in the processes of the present invention in ⁇ luae stereoisomers, such as optical isomers, aiastereomers ana geometrical isomers, or tautomers depending on the mode of substitution.
  • the present invention is meant to comprehend all such isomeric forms of the compounds in the compositions of the present invention, and their mixtures. All hydrates, solvates and polymorphic crystalline forms of the above-described compounds and their use, including their use in the processes of the instant invention, are encompassed within scope of the instant invention.
  • Halogen refers to fluorine atom, chlorine atom, bromine atom and iodine atom.
  • Ci- 4 alco h ol refers to methanol, ethanol, n-propanol, isopropanol, n-butanol, isobutanol, sec-butanol and tert-butanol, and the like.
  • “Lower alkyl” refers to a straight- or branched-chain alkyl group of Ci to CQ , for example, methyl, ethyl, propyl, isopropyl, butyl, isobutyl, sec-butyl, tert-butyl, pentyl, isopentyl, hexyl, isohexyl, and the like.
  • Halo(lower)alkyl refers to the aforesaid lower alkyl substituted with 1 or more than 2, preferably 1 to 3 aforesaid halogen atoms identically or differently at the substitutable. arbitrary positions, for example, fluoromethyl, difluoromethyl, trifluoromethyl, 2-fluoroethyl, 1,2-difluoroethyl, chloromethyl, 2-chloroethyl, 1,2-dichloroethyl, bromomethyl, iodomethyl, and the like.
  • Hydroxy(lower)alkyl refers to the aforesaid lower alkyl substituted with 1 or more than 2, preferably 1 or 2 hydroxy groups at the substitutable, arbitrary positions, for example, hydroxymethyl, 2-hydroxyethyl, 1-hydroxy-1-methylethyl, 1,2-dihydroxyethyl, 3-hydroxypropyl, and the like.
  • Cyclo(lower)alkyl refers to a cycloalkyl group of C3 to C ⁇ , for example, cyclopropyl, cyclobutyl, cyclopentyl, cyclohexyl, and the like.
  • “Lower alkenyl” refers to a straight- or branched-chain alkenyl group of C2 to C ⁇ , for example, vinyl, 1-propenyl, 2-propenyl, isopropenyl, 3-butenyl, 2-butenyl, 1-butenyl, 1-methyl-2-propenyl, 1-methyl-1-propenyl, 1-ethyl-1-ethenyl, 2-methyl-2-propenyl, 2-methyl-1-propenyl, 3-methyl-2-butenyl, 4-pentenyl, and the like.
  • “Lower alkoxy” refers to a straight- or branched-chain alkoxy group of C ⁇ to C ⁇ , for example, methoxy, ethoxy, propoxy, isopropoxy, butoxy, sec-butoxy, isobutoxy, tert-butoxy, pentyloxy, isopentyloxy, hexyloxy, isohexyloxy, and the like.
  • Halo(lower)alkoxy refers to the aforesaid lower alkoxy substituted with 1 or more than 2, preferably 1 to 3 aforesaid halogen atoms identically or differently at the substitutable, arbitrary positions, for example, fluoromethoxy, difluoromethoxy, trifluoromethoxy, 2-fluoroethoxy, 1,2-difluoroethoxy, chloromethoxy, 2-chloroethoxy, 1,2-dichloroethoxy, bromomethoxy, iodomethoxy, and the like.
  • “Lower alkylthio” refers to a straight- or branched-chain alkylthio group of Ci to C ⁇ , for example, methylthio, ethylthio, propylthio, isopropylthio, butylthio, se ⁇ -butylthio, isobutylthio, tert-butylthio, pentylthio, isopentylthio, hexylthio, isohexylthio, and the like.
  • “Lower alkylamine” refers to an amine which is mono-, di- or trisubstituted with a straight- or branched-chain alkyl group of Ci to C4, for example, methylamine, ethylamine, propylamine, isopropylamine, butylamine, sec-butylamine, isobutylamine, tert-butylamine, dimethyl amine, trimethyl amine, diethyl amine, triethyl amine, diisopropylethyl amine, and the like.
  • “Lower alkanoyl” refers to an alkanoyl group containing the aforesaia lower alkyl, that is, an alkanoyl group of C2 to C7, for example acetyl, propionyl, butyryl, isobutyryl, valeryl, isovaleryl, pivaloyl, ana the like.
  • “Lower alkoxycarbonyl” refers to an alkoxycarbonyl group containing the aforesaia lower alkoxy, that is, an alkoxycarbonyl group of C2 to C7, for example, methoxycarbonyl, ethoxycarbonyl, propoxycarbonyl, isopropoxycarbonyl, butoxycarbonyl, isobutoxycarbonyl, tert-butoxycarbonyl, pentyloxycarbonyl, and the like.
  • “Lower alkylene optionally substituted with oxo” refers to a straight- or branched-chain alkylene group of C2 to C ⁇ which may be substitutea with 1 or more than 2 , preferably 1 oxo group at a substitutable, arbitrary position, for example, ethylene, trimethylene, tetramethylene, pentamethylene, hexamethylene, 1-oxoethylene, 1-oxotrimethylene, 2-oxotrimethylene, 1-oxotetramethylene, 2-oxotetramethylene, ana the like.
  • the above alkylene group is formea by combining R 1 and R 2 , taken together.
  • Aryl incluaes phenyl, naphthyl, ana the like.
  • Heteroaryl refers to 5- or 6-memberea monocylic heteroaromatic group which contains 1 or more than 2 , preferably 1 to 3 hetero atoms iaentically or aifferently selected from the group consisting of oxygen atom, nitrogen atom and sulfur atom; or condensed heteroaromatic group, where the aforesaid monocylic heteroaromatic group is condensed with the aforesaid aryl group, or with the identifiea or different aforesaid monocylic heteroaromatic group each other, for example, pyrrolyl, furyl, thienyl, imidazolyl, pyrazolyl, thiazolyl, isothiazolyl, oxazolyl, isoxazolyl, 1, 2,3-triazolyl, 1,2,4-triazolyl, tetrazolyl, oxadia
  • “Lower alkylamino” refers to an amino group mono-substituted with the aforesaid lower alkyl, for example, methylamino, ethylamino, propylamino, isopropylamino, butylamino, sec-butylamino, tert-butylamino, and the like.
  • “Di-lower alkylamino” refers to an amino group di-substitutedwith identical or different aforesaid lower alkyl, for example, dimethylamino, diethylamino, ethylmethylamino, dipropylamino, methylpropylamino, diisopropylamino, and the like.
  • Aryl or heteroaryl which may be substituted, the substituent being selected from the group consisting of halogen, nitro, lower alkyl, halo(lower)alkyl, hydroxy(lower)alkyl, cyclo(lower)alkyl, lower alkenyl, lower alkoxy, halo(lower)alkoxy, lower alkylthio, carboxyl, lower alkanoyl, lower alkoxycarbonyl, lower alkylene optionally substituted with oxo, and a group representea by formula of -Q-Ar 2 " refers to unsubstituted aforesaid aryl or aforesaid heteroaryl, or the aforesaid aryl or aforesaid heteroaryl which has substituent(s) at the substitutable, arbitrary position(s).
  • the aforesaid substituent can be, identically or differently, one or more than 2, preferably 1 or 2 selected from the group consisting of halogen, nitro, lower alkyl, halo(lower) alkyl, hyaroxy(lower)alkyl, cyclo(lower)alkyl, lower alkenyl, lower alkoxy, halo(lower)alkoxy, lower alkylthio, carboxyl, lower alkanoyl, lower alkoxycarbonyl, lower alkylene optionally substitutea with oxo, and a group of formula: -Q-Ar 2 .
  • Halogen atom as the aforesaid substituent includes , preferably, fluorine atom, chlorine atom, and the like.
  • Lower alkyl as the aforesaid substituent includes, preferably, methyl, ethyl, propyl, isopropyl, and the like.
  • Halo(lower)alkyl as the aforesaid substituent includes, preferably, difluoromethyl, trifluoromethyl, and the like.
  • Hydroxy(lower)alkyl as the aforesaid substituent includes, preferably, hydroxymethyl, 2-hydroxyethyl,
  • Cyclo(lower)alkyl as the aforesaid substituent includes, preferably, cy ⁇ lopropyl, cyclobutyl, and the like.
  • Lower alkenyl as the aforesaid substituent includes, preferably, vinyl, 1-propenyl, 2-methyl-1-propenyl, and the like.
  • Lower alkoxy as the aforesaid substituent includes , preferably, methoxy, ethoxy, and the like.
  • Halo(lower)alkoxy as the aforesaid substituents includes, preferably, fluoromethoxy, difluoromethoxy, trifluoromethoxy, and the like.
  • Lower alkylthio as the aforesaid substituent includes, preferably, methylthio, ethylthio, and the like.
  • Lower alkanoyl as the aforesaid substituent includes, preferably, acetyl, propionyl, and the like.
  • Lower alkoxycarbonyl as the aforesaid substituent includes , preferably, methoxycarbonyl, ethoxycarbonyl, and the like.
  • Lower alkylene optionally substituted with oxo as the aforesaid substituent includes , preferably, 1-oxotetramethylene, and the like.
  • Ar2 represents aryl or heteroaryl which may be substituted, the substituent being selected from the group consisting of halogen, cyano, lower alkyl, halo(lower)alkyl, hydroxy(lower)alkyl, hydroxy, lower alkoxy, halo(lower)alkoxy, lower alkylamino, di-lower alkylamino, lower alkanoyl and aryl;
  • Q represents a single bond or carbonyl.
  • Aryl or heteroaryl which may be substituted, the substituent being selected from the group consisting of halogen, cyano, lower alkyl, halo(lower) alkyl, hydroxy(lower)alkyl. hydroxy, lower alkoxy, halo(lower)alkoxy, lower alkylamino, di-lower alkylamino, lower alkanoyl and aryl
  • aryl refers to unsubstituted aforesaid aryl or aforesaid heteroaryl, or the aforesaid aryl or aforesaid heteroaryl which has substituent (s) at the substitutable, arbitrary position(s).
  • the aforesaid substituent can be, iaentically or differently, one or not less than 2, preferably 1 or 2 selected from the group consisting of halogen, cyano, lower alkyl, halo(lower)alkyl, hydroxy(lower)alkyl, hydroxy, lower alkoxy, halo(lower)alkoxy, lower alkylamino, di-lower alkylamino, lower alkanoyl and aryl.
  • Halogen atom as the aforesaid substituent includes, preferably, fluorine atom, chlorine atom, and the like.
  • Lower alkyl as the aforesaid substituent includes, preferably, methyl, ethyl, propyl, isopropyl, and the like.
  • Halo(lower)alkyl as the aforesaid substituent includes, preferably, difluoromethyl, trifluoromethyl, and the like.
  • Hydroxy(lower)alkyl as the aforesaid substituent includes, preferably, hydroxymethyl, 2-hydroxyethyl,
  • Lower alkoxy as the aforesaid substituent includes , preferably, methoxy, ethoxy, and the like.
  • Halo(lower)alkoxy as the aforesaia substituent incluaes, preferably, fluoromethoxy, aifluoromethoxy, trifluoromethoxy, ana the like.
  • Lower alkylamino as the aforesaid substituent includes, preferably, methylamino, ethylamino, and the like.
  • Di-lower alkylamino as the aforesaid substituent includes, preferably, dimethylamino, diethylamino, and the like.
  • Lower alkanoyl as the aforesaid substituent includes. preferably, acetyl, propionyl, ana the like.
  • Aryl as the aforesaia substituent incluaes, preferably, phenyl, ana the like.
  • the substituent (s) of Ar2 include, preferably, halogen, cyano, lower alkyl, halo(lower)alkyl, hyaroxy(lower)alkyl, hydroxy, halo(lower)alkoxy, and the like.
  • Aryl in Ar2 includes, preferably, phenyl, and the like and heteroaryl includes imidazolyl, pyridyl, benzofuranyl, quinolyl, and the like. Consequently, a group of formula: -Q-Ar 2 includes, for example, phenyl, 2-fluorophenyl, 3-fluorophenyl, 4-fluorophenyl, 2,3-difluorophenyl, 2 , 4-difluorophenyl, 3, 5-difluorophenyl, 2-chlorophenyl, 3-chlorophenyl, 4-chlorophenyl, 2-cyanophenyl, 3-cyanophenyl, 4-cyanophenyl, 2-methylphenyl, 3-methylphenyl, 4-methylphenyl, 2-fluoro-5-methylphenyl, 3-fluoromethylphenyl, 2-trifluoromethylphenyl, 3-trifluoromethylphenyl,
  • the salts of compounds of formula I refer to the pharmaceutically acceptable and common salts, for example, base addition salt to carboxyl group when the compound has a carboxyl group, or acid addition salt to amino or basic heterocyclyl when the compound has an amino or basic heterocyclyl group, and the like.
  • the base addition salts include salts with alkali metals (including, but not limited to, sodium, potassium); alkaline earth metals (including, but not limited to, calcium, magnesium); ammonium or organic amines (including, but not limited to, trimethylamine, triethylamine, dicyclohexylamine, ethanolamine, diethanolamine, triethanolamine, procaine,
  • the acid addition salts include salts with inorganic acids (including, but not limited to, hydrochloric acid, sulfuric acid, nitric acid, phosphoric acid, perchloric acid) , organic acids (including, but not limited to, acetic acid, oxalic acid, maleic acid, fumaric acid, tar aric acid, citric acid, ascorbic acid, trifluoroacetic acid, acetic acid), sulfonic acids (incluaing, but not limited to, methanesulfoni ⁇ acid, isethionic acid, benzenesulfonic acid, p-toluenesulfonic acid, p-toluenesulfonic acid monohydrate, p-toluenesulfonic acid hydrate, camphor sulfonic acid), and the like.
  • inorganic acids including, but not limited to, hydrochloric acid, sulfuric acid, nitric acid, phosphoric acid, perchloric acid
  • Polymorphism can be aefined as the ability of the same chemical substance to exist in different crystalline structures.
  • the different structures are referred to as polymorphs , polymorphic modifications or forms.
  • the pyrazole tosylate salt 1-4 has been found it exist in at least two polymorphic nonsolvated forms. Form A and Form B, each of which can be formed by careful control of the crystallization conaitions .
  • THF tetrahydrofuran
  • TsOH p-toluenesulfonic acid
  • the compounds of the present invention can be prepared by employing the following General Scheme, which shows one embodiment of the present invention wherein a 2-fluorophenyl- hydrazine salt of compound III is reacted with an acrylonitrile of formula V.
  • the pyrazole compounds of formula I, and salts and polymorphs thereof, are prepared from commercially available starting materials, such as 2-fluorophenylhydrazine hydrochloride 1-1, and ethoxyacrylonitrile 1-2, as shown in Example 1 and 2.
  • the resulting aqueous EtOH solution was stirred at 20°C to 25°C for 1 to 2 hours.
  • the reaction mixture was concentrated to circa 600 mL (12 volumes), then IPAC (750 mL) was added.
  • the layers were separated and the organic layer was washed with 10% aqueous NaCl ( 200 mL) .
  • Activated carbon Sirasagi P, 1.75g, 3.5 weigh % to 2-fluorophenylhydrazine HCl
  • Compound 1-3 is also characterized by differential scanning calorimetry (DSC).
  • DSC differential scanning calorimetry
  • the DSC curve for compound 1-3 is characterized by an endotherm with a peak temperature of 46.98°C + 2°C, when obtained under the following measurement conditions: Appratus: DSC 2920 (TA Instruments) Sample cell: 60 microliter Hasteroy B closed cell (KASEN Engineering Co., Ltd.) Lamp: 10°C/min. (ambient - 300°C) Atmosphere: in cell: atomospheric pressure out cell: atomospheric pressure.
  • Step B Preparation of the Tosylate Salt 1-4
  • form-I crystal seeding instead of seeding form-II crystals, form-I crystal seeding and the above treatment gave the form-I crystal of pyrazole tosylate.
  • Tables 1 , 2 and 3 were measured by RINT1100 (manufactured by Rigaku
  • X-ray radiation source Cu, tube voltage: 40 KV, tube current: 30 mA, monochronomater: automatic monochromater monore ⁇ eiving slit: 0.60 mm goniometer: wide angle goniometer, scan step: 0.02 degrees, scan speed: 2.00 degrees/minute, divergence slit (DS) : 1 degree, scattering slit: 1 degree, receiving slit (RS): 0.15 millimeter, measured temperature: ambient temperature.
  • monochronomater automatic monochromater monore ⁇ eiving slit: 0.60 mm goniometer: wide angle goniometer, scan step: 0.02 degrees, scan speed: 2.00 degrees/minute, divergence slit (DS) : 1 degree, scattering slit: 1 degree, receiving slit (RS): 0.15 millimeter, measured temperature: ambient temperature.
  • DS divergence slit
  • RS receiving slit
  • Form I of 1- (2-fluorophenyl) -IH-pyrazole-3-amine tosylate 1-4 is characterized by the complete group of angle 2 theta values listed in Table 1 , all the values are not required for such indentification.
  • Form I of 1- (2-fluorophenyl) -1H- pyrazole-3-amine tosylate 1-4 can be identified by the angle theta value in the range of 14.2 to 14.3°.
  • Form I of l-(2- fluorophenyl) -lH-pyrazole-3-amine tosylate 1-4 can be identified by any one of the following angle theta values , or any one of the following groups of angle theta values : a) 14.24°; b) 14.2 - 14.3° and 21.6 - 21.7°; c) 14.2 - 14.3°, 20.0 - 20.1°, and 21.6 - 21.7°; d) 14.2 - 14.3°, 20.0 - 20.1°, 21.6 - 21.7°, and 31.2 - 31.3°; e) 14.24° , 14.6 - 14.7° , 15.9° , 16.0 - 16.1° , 19.4 - 19.5° , 20.0- 20.1° , 21.6 - 21.7° , 22.8 - 22.9° , 23° , 25.6 - 25.7° , 25.7° , 28.2° and 31.2 - 31.3° .
  • each of the angle 2 theta values from Table 1 can be expressea to two aecimal places as follows: 14.24° , 14.66° , 15.90° , 16.02° , 19.46° , 20.02° , 21.68° , 22.84° , 23.00° , 25.62° , 25.70° , 28.20° ana 31.24° .
  • Form II of 1- (2-fluorophenyl) -lH-pyrazole- 3-amine tosylate 1-4 is characterized by the complete group of angle 2 theta values listed in Table 2, all the values are not required for such indentification.
  • Form II of l-(2- fluorophenyl) -lH-pyrazole-3-amine tosylate 1-4 can be identified by the angle theta value in the range of 8.6 to 8.7°.
  • Form II of 1- (2-fluorophenyl) -lH-pyrazole-3-amine tosylate 1-4 can be identified by any one of the following angle theta values , or any one of the following groups of angle theta values : a) 8.68°; b) 8.6 - 8.7° and 11.9 - 12.0°; c) 8.6 - 8.7°, 11.9 - 12.0°, and 20.5 - 20.6°; d) 8.6 - 8.7°, 11.9 - 12.0°, 20.5 - 20.6°, and 20.6 - 20.7°; and e) 8.6 - 8.7° , 11.9 - 12.0° , 15.3 - 15.4° , 18.8 - 18.9° , 20.5 - 20.6°, 20.6 - 20.7°, and 22.5°. Additionally, each of the angle 2 theta values from Table 1 can be expressed to two decimal places as follows: 8.68°, 11.98°, 15.34°, 18.82°, 20
  • Compound 1-4 is also characterized by differential scanning calorimetry (DSC) .
  • DSC differential scanning calorimetry
  • the DSC curve for compound 1-3 is characterized by an endotherm with a peak temperature of 140.29°C + 2°C, when obtained under the same measurement ⁇ onaitions as for compouna 1-3, Example 1, Step A.
  • Step A Preparation of 1- (2-Fluorophenyl) -lH-Pyrazole-3- Amine 1-3
  • the resulting slurry was agea at room temperature for 1 hour, ana then EtOAc (88 mL, 15 volumes to pyrazole assay) was added dropwise at ambient temperature over more than 2 hours.
  • the resulting suspension was aged at ambient temperature for 15 to 20 hours.
  • the batch was filtered, washed with EtOH-AcOEt (1:10; 23.5 mL), EtOAc (11.7 mL) , and dried at room temperature under vacuum for 15 hours to give the l-( 2-fluorophenyl) -lH-pyrazole-3-amine hydrochloride salt 2-1.
  • 1- ( 2-fluorophenyl) -lH-pyrazole-3-amine hydrochloride salt 2-1 is characterized by the complete group of angle 2 theta values listed in Table 3, all the values are not required for such indentification.
  • the 1- (2-fluorophenyl) -1H- pyrazole-3-amine hydrochloride salt 2-1 can be identified by the angle theta value in the range of 19.9 - 20.0°.
  • the l-(2- fluorophenyl)-lH-pyrazole-3-amine hydrochloride salt 2-1 can be identified by any one of the following angle theta values , or any one of the following groups of angle theta values : a) 19.94°; b) 10.9 - 11.0°, 19.9 - 20.0°, and 24.6 - 24.7°; and c) 10.9 - 11.0°, 19.4°, 19.9 - 20.0°, 22.0 - 22.1°, 23.6 - 23.7°, 24.6 - 24.7° and 27.6°. Additionally, each of the angle 2 theta values from Table 1 can be expressed to two decimal places as follows: 10.92°, 19.40°, 19.94°, 22.08°, 23.68°, 24.68° and 27.60°.
  • Compound 2-1 is also characterized by differential scanning calorimetry (DSC).
  • DSC differential scanning calorimetry
  • the DSC curve for compound 1-3 is characterized by an endotherm with a peak temperature of 145.65°C + 2°C, when obtained under the same measurement conditions as for compound 1-3, Example 1, Step A.
  • l-phenyl-lH-pyrazole-3-amine 3-2 may also be prepared according to the synthethic procedure shown in Example 4.
  • the present invention relates to a process for the preparation of the pyrazole of formula I .
  • the compounds of formula I are intermediates useful for the preparation of the spirolactone compounds of formula II.
  • the compounds of formula II are also useful as agents for the treatment of various diseases related to NPY, including, but not limited to, cardiovascular disorders, such as hypertension, nephropathy, heart disease, vasospasm, arteriosclerosis and the like, central nervous system disorders, such as bulimia. depression, anxiety, seizure, epilepsy, dementia, pain, alcoholism, drug withdrawal and the like, metabolic diseases such as obesity, diabetes, hormone abnormality, hypercholesterolemia, hyperlipidemia and the like, sexual and reproductive dysfunction, gastrointestinal disorder, respiratory disorder, inflammation or glaucoma, and the like.
  • cardiovascular disorders such as hypertension, nephropathy, heart disease, vasospasm, arteriosclerosis and the like
  • central nervous system disorders such as bulimia. depression, anxiety, seizure, epilepsy, dementia, pain, alcoholism, drug withdrawal and the like
  • metabolic diseases such as obesity, diabetes, hormone abnormality, hypercholesterolemia, hyperlipidemia and the like, sexual and reproductive dysfunction, gastrointestinal disorder,

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Abstract

This invention relates to a process for making pyrazole compoundsof formula I.

Description

DESCRIPTION
PROCESS FOR MAKING PYRAZOLE COMPOUNDS
Technical Field
The present invention provides a process for preparing compounds of structural formula I
Figure imgf000002_0001
I The process involves converting an unsubstituted or substituted phenyl hydrazine salt, or an unsubstituted or substituted pyridine hydrazine salt, of formula III, such as the hydrochloride salt IIIA, into the free phenyl hydrazine III' , or the free pyridyl hydrazine III, with a base. Alternatively, the process may start with the free phenyl hydrazine III ' , or the free pyridyl hydrazine III. The free phenyl hydrazine III', or the free pyridyl hydrazine III, is then reacted with an acrylonitrile to form the unsubstituted or substituted phenyl pyrazole, or unsubstituted or substituted pyridyl pyrazole, of formula I . The pyrazole of formula I may be treated with an acid to form the pyrazole salt of general formula IC, wherein Xa is CH, CRl, CR2 or nitrogen. Scheme A illustrates the preparation of pyrazoles of formula I, and salts thereof as exemplified by IC, wherein Xa is CH, CRl, CR2 or nitrogen.
Scheme A
Figure imgf000003_0001
Reacting the pyrazole I, or the pyrazole salt IC, with a spirolactone of formula IV gives spirolactone amides of general structural formula II.
Figure imgf000003_0002
IV
Background Art
The present invention relates to a process for the preparation of the pyrazole of formula I .
Figure imgf000004_0001
The compounds of formula I are intermediates useful for the preparation of the spirolactone compounds of formula II.
Figure imgf000004_0002
II The compounds of formula II, along with their use as NPY5 antagonists for treating bulimia, obesity or diabetes, were disclosed in U.S. Patent No. 6,335,345, which is incorporated by reference herein in its entirety, and in WO 01/14376 (published on 3/02/01) . The compounds of formula II are also useful as agents for the treatment of various diseases related to NPY, including, but not limited to, cardiovascular disorders, such as hypertension, nephropathy, heart disease, vasospasm, arteriosclerosis and the like, central nervous system disorders, such as bulimia, depression, anxiety, seizure, epilepsy, dementia, pain, alcoholism, drug withdrawal and the like, metabolic diseases such as obesity, diabetes, hormone abnormality, hypercholesterolemia, hyperlipidemia and the like, sexual and reproductive dysfunction, gastrointestinal disorder, respiratory disorder, inflammation or glaucoma, and the like.
U.S. Patent No. 6,335,345, which is incorporated by reference herein in its entirety, and WO 01/14376, describe a process for preparing the compounds of formula II.
Processes for the preparation of l-phenylpyrazol-3-amine by reacting a phenylhydrazine with 2-chloro-acrylonitrile, 3-chloroaσrylonitrile, 2,3-dichloro-propanenitrile, or 2,3-dibromopropanenitrile are described in the Journal of Heterocyclic Chemistry, vol. 19, pp.1265 and 1267 (1982). However, for the reactions utilizing 2-chloroacrylonitrile, 2,3-dichloropropanenitrile, and 2,3-dibromopropanenitrile, the yield of the l-phenylpyrazol-3-amine is very low. Additionally, the 3-chloroacrylonitrile starting material is very difficult to prepare.
Disclosure of Invention
By this invention, there is provided a process for the preparation of a compound of structural formula. I', or a salt, hydrate or polymorph thereof.
Figure imgf000006_0001
I'
wherein R1 and R2 are both independently selected from the group consisting of ( 1 ) hydrogen,
(2) halogen,
(3) nitro,
(4) lower alkyl,
(5) halo(lower)alkyl, ( 6) hydroxy(lower)alkyl,
(7) cyclo(lower)alkyl,
(8) lower alkenyl,
(9) lower alkoxy,
(10) halo (lower) alkoxy, (11) lower alkylthio,
(12) carboxyl,
(13) lower alkanoyl,
(14) lower alkoxycarbonyl,
(15) lower alkylene optionally substituted with oxo, and
(16) -Q-Ar2, wherein Q is selected from the group consisting of a single bond and a carbonyl, and wherein Ar2 is selected from the group consisting of ( 1 ) aryl , and
(2) heteroaryl, wherein Ar2 is unsubstituted or substituted with a substituent selected from the group consisting of
( halogen.
(b] cyano,
(c lower alkyl.
(a; halo(lower)alkyl,
(e hydroxy(lower)alkyl,
(f hydroxy,
(g lower alkoxy.
(h i halo(lower)alkoxy.
(i i lower alkylamino.
(3 ι di-lower alkylamino.
(k lower alkanoyl, and
(1 i aryl;
comprising the steps of:
(a) forming a hydrazine solution; (b) adding a compound of formula V
.CN
R30'
V
wherein R3 is selected from the group consisting of
(1) lower alkyl,
( 2) aryl, and
(3) -CHtøaryl, to the hydrazine solution of step (a) to form a mixture; and (c) heating the mixture of step (b) to a temperature between about 50°C to about 100°C; to afford the compound I', or a salt, hydrate or polymorph thereof.
In one embodiment of the present invention, the hydrazine solution of step (a) is formed by dissolving a compound of formula III'
Figure imgf000008_0001
III1
in a solvent.
In one class of this embodiment, the solvent is selected from the group consisting of (a) Cχ-4 alcohol; (b) toluene;
(c) tetrahydrofuran; and
( ) dimethylformamide, or a mixture thereof.
In one subclass of this class, the solvent is ethanol. In another subclass, the solvent is toluene-ethanol.
In another embodiment of the present invention, the hydrazine solution of step (a) is formed by treating a salt of a compound of formula III'
Figure imgf000009_0001
salt of III'
with a base in a solvent.
In one class of this embodiment, the solvent is selected from the group consisting of (a) Cι-4 alcohol;
(b) toluene;
(c) tetrahydrofuran; and
(d) dimethyIformamide, or a mixture thereof. i a subclass of this class, the solvent is ethanol. In another subclass of this class, the solvent is toluene-ethanol or tert-butanol.
In another class of this embodiment, the salt of the compound of formula III' is selected from the group consisting of hydrochloride salt, hydrobromide salt, dihydrobromide salt, mesylate salt, tosylate salt, besylate salt and sulfate salt. In a subclass of this class, the salt of the compound of formula III' is a hydrochloride salt .
in another class of this embodiment, the base is selected from the group consisting of
(a) sodium ethoxide,
(b) sodium methoxide,
(c) lower alkylamine, (d) l,8-diazabicyclo[5.4.0]undec-7-ene. (e) potassium t-butoxide, and
(f) sodium hydroxide.
In a subclass of this class, the base is sodium ethoxide.
In another embodiment, R3 is selected from the group consisting of lower alkyl. In a class of this embodiment, R3 is selected from the group consisting of : -CH3, -CH2CH3, -(CH2)2CH3, -CH(CH3)2, ~(CH2)3CH3, and-C(CH3)3- In a subclass of this class , R3 is -CH2CH3.
In another embodiment of the present invention, in the step (b) the amount of the compound of the formula V relative to that of a hydrazine is preferably about 0.8 to 1.8 in terms of molar ratio.
In another embodiment of the present invention, step (c) is aged for a period of about 2 hours to 48 hours, preferably about
4 hours to 48 hours. In a class of this embodiment, step (c) is aged for a period of about 2 to 30 hours, preferably about 10 to 30 hours.
In another embodiment of this invention, the process further comprises step (d) of isolating the compound of formula I'.
In another embodiment of this invention, R1 and R are independently selected from the group consisting of
(1) hydrogen,
(2) halogen,
(3) lower alkyl, ( 4 ) halo(lower)alkyl,
(5) lower alkenyl,
(6) lower alkanoyl,
(7) lower alkylene optionally substituted with oxo, and
(8) -Q-Ar2, wherein Q is selected from the group consisting of a single bond and a carbonyl, and wherein Ar2 is selected from the group consisting of (1) aryl, and (2) heteroaryl, wherein Ar2 is unsubstituted or substituted with a substituent selected from the group consisting of
(a) halogen,
(b) cyano, (c) lower alkyl,
(d) halo(lower)alkyl,
(e) hydroxy(lower)alkyl,
(f) hydroxy,
(g) lower alkoxy, (h) halo(lower)alkoxy,
(i) lower alkylamino, ( j ) di-lower alkylamino, (k) lower alkanoyl, and (1) aryl .
In a class of this embodiment, Rl is hydrogen and R2 is selected from the group consisting of
( 1 ) hydrogen,
(2) 2-fluoro, (3) 3-fluoro,
(4) 4-fluoro,
(5) 5-fluoro,
(6) 2-chloro, (7) 3-chloro,
(8) 4-chloro,
(9) 2-difluoromethoxy,
(10) 3-difluoromethoxy,
(11) 2-methyl, (12) 2-pyridyl,
(13) 2-quinolyl, and
(14) 3-quinolyl.
In a subclass of this class , Rl is hydrogen and R2 is selected from the group consisting of
(1) hydrogen,
(2) 2-fluoro,
(3) 3-fluoro, and
(4) 4-fluoro.
In another subclass of this class, both Rl and R2 are hydroge .
In another subclass of this class, Rl is hydrogen and R2 is 2-fluoro. In yet another subclass of this class, Rl is hydrogen and R2 is 4-fluoro.
In another embodiment of this invention, the process further comprises the step (e) of treating the compound of formula I'
Figure imgf000013_0001
I' with an acid to form a salt .
In one class of this embodiment, the acid of step (e) is selected from the group consisting of acetic acid, oxalic acid, hydrobromic acid, hydrochloric acid, anhydrous p-toluene- sulfoniσ acid, p-toluenesulfonic acid hydrate, p-toluene- sulfonic acid monohydrate, benzenesulfonic acid, and methanesulfonic acid, or a mixture thereof.
In one subclass of this class, the acid of step (e) is selected from the group consisting of acetic acid, oxalic acid, hydrochloric acid, anhydrous p-toluenesulfonic acid, p-toluenesulfonic acid hydrate, p-toluenesulfonic acid monohydrate, and benzenesulfonic acid or mixture thereof.
In another subclass of this class, the acid of step (e) is hydrochloric acid.
In yet another subclass of this class, the acid of step (e) is p-toluenesulfonic acid monohydrate.
In another class of this embodiment, the salt formed is the p-toluenesulfonic acid salt of formula IA', or a hydrate or polymorph thereof.
Figure imgf000014_0001
IA'
wherein R! and R2 are both independently selected from the group consisting of (1) hydrogen,
(2) halogen,
(3). nitro,
(4) lower alkyl,
( 5 ) halo(lower)alkyl, ( 6) hydroxy(lower)alkyl,
( 7 ) cyclo(lower)alkyl,
(8) lower alkenyl,
(9) lower alkoxy,
(10) halo(lower)alkoxy, (11) lower alkylthio,
(12) carboxyl,
(13) lower alkanoyl,
(14) lower alkoxycarbonyl ,
(15) lower alkylene optionally substituted with oxo, and
(16) -Q-Ar2, wherein Q is selected from the group consisting of a single bond and a carbonyl, and wherein Ar2 is selected from the group consisting of ( 1 ) aryl , and
(2) heteroaryl, wherein Ar2 is unsubstituted or substituted with a substituent selected from the group consisting of (a) halogen,
(b) cyano,
(c) lower alkyl,
(d) halo(lower)alkyl,
(e) hydroxy(lower)alkyl, (f) hydroxy,
(g) lower alkoxy, (h) halo(lower)alkoxy, (i) lower alkylamino, (j) di-lower alkylamino, (k) lower alkanoyl, and
(1) aryl.
In yet another class of this embodiment, the salt formed is the hydrochloric acid salt of formula IB ' , or a hydrate or polymorph thereof,
Figure imgf000015_0001
wherein R1 and R2 are both independently selected from the group consisting of ( 1 ) hydrogen,
( 2 ) haloge ,
(3) nitro,
(4) lower alkyl, (5) halo(lower)alkyl,
(6) hydroxy(lower)alkyl,
( 7 ) cyclo(lower)alkyl,
(8) lower alkenyl,
(9) lower alkoxy, (10) halo(lower)alkoxy,
(11) lower alkylthio,
(12) carboxyl,
(13) lower alkanoyl,
(14) lower alkoxycarbonyl, (15) lower alkylene optionally substituted with oxo, and (16) -Q-Ar2, wherein Q is selected from the group consisting of a single bond and a carbonyl, and wherein Ar2 is selected from the group consisting of ( 1 ) aryl, and
(2) heteroaryl, wherein Ar2 is unsubstituted or substituted with a substituent selected from the group consisting of
(a) halogen, (b) cyano,
(c) lower alkyl,
(d) halo(lower)alkyl,
( e) hydrox (lower)alkyl,
( f) hydroxy, (g) lower alkoxy,
(h) halo(lower)alkoxy,
(i) lower alkylamino,
(-j) di-lower alkylamino,
(k) lower alkanoyl, and
(1) aryl.
By this invention, there is also provided a compound of formula IA'
Figure imgf000017_0001
wherein R1 and R2 are both independently selected from the group consisting of
(1) hydrogen,
(2) halogen, (3) nitro,
(4) lower alkyl,
( 5) halo(lower)alkyl,
(6) hydroxy(lower)alkyl,
( 7 ) cyσlo(lower)alkyl, (8) lower alkenyl,
(9) lower alkoxy,
(10) halo(lower)alkoxy,
(11) lower alkylthio. ( 12 ) carboxyl ,
(13) lower alkanoyl,
(14) lower alkoxycarbonyl ,
(15) lower alkylene optionally substituted with oxo, and
(16) -Q-Ar2, wherein Q is selected from the group consisting of a single bond and a carbonyl, and wherein Ar2 is selected from the group consisting of ( i ) aryl, and (2) heteroaryl, wherein Ar2 is unsubstituted or substituted with a substituent selected from the group consisting of
(a) halogen,
(b) cyano, (c) lower alkyl,
(d) halo(lower)alkyl,
(e) hydroxy(lower)alkyl,
(f) hydroxy,
(g) lower alkoxy, (h) halo(lower)alkoxy,
(i) lower alkylamino,
(j) di-lower alkylamino,
(k) lower alkanoyl, and
(1) aryl, or a hydrate or polymorph thereof.
By this invention, there is also provided a compound of formula IB ' 18
Figure imgf000019_0001
wherein R1 and R2 are both independently selected from the group consisting of
( I ) hydroge , (2) halogen,
(3) nitro,
(4) lower alkyl,
( 5 ) halo(lower)alkyl,
(6) hydroxy(lower)alkyl, ( 7) cyclo(lower)alkyl,
(8) lower alkenyl,
(9) lower alkoxy,
(10) halo (lower) alkoxy,
(II) lower alkylthio, (12) carboxyl,
(13) lower alkanoyl,
(14) lower alkoxycarbonyl,
(15) lower alkylene optionally substituted with oxo, and (16) -Q-Ar2, wherein Q is selected from the group consisting of a single bond and a carbonyl, and wherein Ar2 is selected from the group consisting of ( i ) aryl, and (2) heteroaryl, wherein Ar2 is unsubstituted or substituted with a substituent selected from the group consisting of
(a] halogen.
(t>; cyano,
(c, lower alkyl.
(a; halo(lower)alkyl,
(e hydroxy(lower)alkyl,
( f hydroxy,
(g i lower alkoxy.
(h halo(lower)alkoxy,
(i ι lower alkylamino.
( j i di-lower alkylamino.
(k i lower alkanoyl, and
(1 i aryl, or a hydrate or polymorph thereof,
By this invention, there is also provided a process for the preparation of a compound of structural formula I , or a salt , hydrate or polymorph thereof.
Figure imgf000020_0001
wherein
Xa is CH, CR1, Cir or nitrogen; R1 and R2 are both independently selected from the group consisting of
( 1) hydrogen,
(2) halogen, (3) nitro,
(4) lower alkyl,
(5) halo(lower)alkyl,
(6) hydroxy(lower)alkyl,
(7) cyclo(lower)alkyl, (8) lower alkenyl,
(9) lower alkoxy,
(10) halo(lower)alkoxy,
(11) lower alkylthio,
(12) carboxyl, (13) lower alkanoyl,
(14) lower alkoxycarbonyl,
(15) lower alkylene optionally substituted with oxo, and
(16) -Q-Ar2 ' wherein Q is selected from the group consisting of a single bond and a carbonyl, and wherein Ar2 is selected from the group consisting of
(1) aryl, and
( 2 ) heteroaryl, wherein Ar2 is unsubstituted or substituted with a substituent selected from the group consisting of
(a) halogen,
(b) cyano,
(c) lower alkyl,
(d) halo(lower)alkyl. (e) hydroxy(lower)alkyl,
(f) hydroxy,
(g) lower alkoxy,
(h) halo(lower)alkoxy, ( ) lower alkylamino,
( ) di-lower alkylamino,
(k) lower alkanoyl, and
(1) aryl;
comprising the steps of:
(a) forming a hydrazine solution;
(b) adding a compound of formula V ^CN
R 0 v, wherein
R3 is selected from the group consisting of
(1) lower alkyl,
(2 ) aryl, and
(3) -CH2aryl, to the hydrazine solution of step (a) to form a mixture; and
(c) heating the mixture of step (b) to a temperature between about 50°C to about 100°C; to afford the compound I , or a salt , hydrate or polymorph thereof . In one embodiment of the present invention, the hydrazine solution of step (a) is formed by dissolving a compound of formula III
Figure imgf000023_0001
III
in a solvent.
In one class of this embodiment, the solvent is selected from the group consisting of
(a) Ci-4 alcohol;
(b) toluene;
(c) tetrahydrofuran; and
(d) dimethyIformamide, or a mixture thereof.
In one subclass of this class, the solvent is ethanol. In another subclass, the solvent is £e_rt-butanol or toluene-ethanol.
In another embodiment of the present invention, the hydrazine solution of step (a) is formed by treating a salt of a compound of formula III,
Figure imgf000023_0002
salt of III
with a base in a solvent .
In one class of this embodiment, the solvent is selected from the group consisting of (a) Ci-4 alcohol; (b) toluene ;
(c) tetrahydrofuran; and
(d) dimethy1formamide, or a mixture thereof. In a subclass of this class, the solvent is ethanol. In another subclass of this class, the solvent is tex-t-butanol.
In another class of this embodiment, the base is selected from the group consisting of (a) sodium ethoxide, (b) sodium methoxide,
(c) lower alkylamine,
(d) l,8-diazabicyclo[5.4.0]undec-7-ene,
(e) potassium t-butoxide, and
(f) sodium hydroxide.
In a subclass of this class, the base is potassium teirt-butoxide .
In another class of this embodiment, the salt of the compound of formula III is selected from the group consisting of hydrochloride salt, hydrobromide salt, dihydrobromide salt, mesylate salt, tosylate salt, besylate salt and sulfate salt. In a subclass of this class, the salt of the compound of formula III is a hydrochloride salt .
In another embodiment, R3 is selected from the group consisting of lower alkyl. In a class of this embodiment, R3 is selected from the group consisting of : -CH3, -CH2CH3, -(CH2)2CH3, -CH(CH3)2, -(CH2)3CH3, and-C(CH3)3. In a subclass of this class, R3 is -CH2CH3. In another embodiment of the present invention in the step (b) the amount of the compound of the formula V relative to that of a hydrazine is preferably about 0.8 to 1.8 in terms of molar ratio.
In another embodiment of the present invention, step (c) is aged for a period of about 2 hours to 48 hours. In a class of this embodiment, step (c) is aged for a period of about 2 to 5 hours . In another embodiment of this invention, the process further comprises step (d) of isolating the compound of formula I.
In another embodiment of this invention, Rl and R are independently selected from the group consisting of
( 1 ) hydrogen, (2) halogen,
(3) lower alkyl,
( 4 ) halo(lower)alkyl,
( 5 ) lower alkenyl,
(6) lower alkanoyl, (7) lower alkylene optionally substituted with oxo, and (8) -Q-Ar2, wherein Q is selected from the group consisting of a single bond and a carbonyl, and wherein Ar2 is selected from the group consisting of (1) aryl, and
( 2 ) heteroaryl, wherein Ar2 is unsubstituted or substituted with a substituent selected from the group consisting of
(a) halogen. 25
(b) cyano,
(c) lower alkyl,
(a) halo(lower)alkyl,
(e) hyarox (lower)alkyl,
(f) hyaroxy,
(g) lower alkoxy.
(h) halo(lower)alkoxy,
(i) lower alkylamino,
(3) di-lower alkylamino.
(k) lower alkanoyl, and
(1) aryl.
In a class of this embodiment, Rl is hydrogen and R2 is selected from the group consisting of (1) hydrogen,
(2) 2-fluoro,
(3) 3-fluoro,
(4) 4-fluoro,
(5) 5-fluoro, (6) 2-chloro,
(7) 3-chloro,
(8) 4-chloro,
(9) 2-difluoromethoxy,
(10) 3-aifluoromethoxy, (11) 2-methyl,
(12) 2-pyriayl,
(13) 2-quinolyl, ana
(14) 3-quinolyl.
In a subclass of this class , Rl is hyarogen ana R2 is selected from the group consisting of
( 1 ) hydrogen,
(2) 2-fluoro,
(3) 3-fluoro, and (4) 4-fluoro.
In another subclass of this class, both Rl and R2 are hydrogen.
In another subclass of this class, Rl is hydrogen and R2 is 2-fluoro. In yet another subclass of this class, Rl is hydrogen and R2 is 4-fluoro.
In another embodiment of this invention, the process further comprises the step (e) of treating the compound of formula I
Figure imgf000027_0001
with an acid to form a salt .
In one class of this embodiment, the acid of step (e) is selected from the group consisting of acetic acid, oxalic acid, hydrobromic acid, hydrochloric acid, anhydrous p-toluenesulfonic acid, p-toluenesulfonic acid hydrate, p-toluenesulfonic acid monohydrate, benzenesulfonic acid, and methane sulfonic acid, or a mixture thereof.
In one subclass of this class, the acid of step (e) is selected from the group consisting of acetic acid, oxalic acid, hydrochloric acid, anhydrous p-toluenesulfonic acid, p-toluenesulfonic acid hydrate, p-toluenesulfonic acid monohydrate and benzenesulfonic acid, or a mixture thereof. In another subclass of this class, the acid of step (e) is hydrochloric acid.
In yet another subclass of this class, the acid of step (e) is p-toluene sulfonic acid monohydrate.
In another class of this embodiment, the salt formed is the p-toluenesulfonic acid salt of formula IA, or a hydrate or polymorph thereof,
Figure imgf000028_0001
wherein
Xa is CH, CR1, CR2 or nitrogen; R! and R2 are both independently selected from the group consisting of
( 1 ) hydrogen,
(2) halogen,
(3) nitro, (4) lower alkyl,
(5) halo(lower)alkyl,
(6) hydroxy(lower)alkyl,
( 7 ) cyσlo(lower)alkyl, (8) lower alkenyl,
( 9 ) lower alkoxy,
(10) halo(lower)alkoxy,
(11) lower alkylthio, (l2) carboxyl,
(13) lower alkanoyl,
(14) lower alkoxycarbonyl,
(15) lower alkylene optionally substituted with oxo, and (16) -Q-Ar2* wherein Q is selected from the group consisting of a single bond and a carbonyl, and wherein Ar2 is selected from the group consisting of ( i ) aryl, and (2) heteroaryl, wherein Ar2 is unsubstituted or substituted with a substituent selected from the group consisting of
(a, halogen.
(bj cyano ,
(c lower alkyl.
(a, halo( lower)alkyl,
(e hyaroxy( lower) lkyl,
(f hydroxy,
(g lower alkoxy.
(h halo(lower) alkoxy,
(i lower alkylamino.
(3 i di-lower alkylamino.
(k lower alkanoyl, and
(1 aryl .
In yet another class of this embodiment, the salt formed is the hydrochloric acid salt of formula IB, or a hydrate or polymorph thereof,
Figure imgf000030_0001
wherein
Xa is CH, CR1, CR2 or nitrogen;
R1 and R2 are both independently selected from the group consisting of
( 1 ) hydrogen,
(2) halogen, (3) nitro,
(4) lower alkyl,
(5) halo(lower)alkyl,
(6) hydroxy(lower)alkyl,
( 7) cyclo(lower)alkyl, (8) lower alkenyl,
(9) lower alkoxy,
(10) halo(lower)alkoxy,
(11) lower alkylthio,
(12) carboxyl, (13) lower alkanoyl,
(14) lower alkoxycarbonyl. (15) lower alkylene optionally substituted with oxo, and
(16) -Q-Ar2, wherein Q is selected from the group consisting of a single bond and a carbonyl, and wherein Ar2 is selected from the group consisting of
(1) aryl, and
(2) heteroaryl, wherein Ar2 is unsubstituted or substituted with a substituent selected from the group consisting of
(a] halogen.
(b] cyano ,
(cj lower alkyl.
(a; halo ( lower)alkyl ,
(e hydroxy(lower) alkyl ,
( f ] hydroxy,
(g lower alkoxy.
(h halo( lower) alkoxy,
(i i lower alkylamino.
(3 i di-lower alkylamino.
(k i lower alkanoyl, and
(1 ι aryl .
By this invention, there is also provided a compound of formula IA
Figure imgf000032_0001
wherein
Xa is CH, CR1, CR2 or nitrogen;
R1 and R2 are both independently selected from the group consisting of
(1) hydrogen,
(2) halogen,
(3) nitro,
(4) lower alkyl, (5) halo(lower) alkyl,
(6) hydroxy(lower)alkyl,
( 7) cyclo(lower)alkyl,
(8) lower alkenyl,
(9) lower alkoxy, (10) halo(lower) alkoxy,
(11) lower alkylthio,
(12) carboxyl,
(13) lower alkanoyl,
(14) lower alkoxycarbonyl, (15) lower alkylene optionally substituted with oxo, and (16) -Q-Ar2' wherein Q is selected from the group consisting of a single bond and a carbonyl, and wherein Ar2 is selected from the group consisting of
( 1 ) aryl, and
(2 ) heteroaryl, wherein Ar2 is unsubstituted or substituted with a substituent selected from the group consisting of
(a] halogen.
(b] cyano,
(o] lower alkyl.
(a, halo(lower)alkyl,
(e; hydroxy(lower)alkyl,
( f ] hydroxy,
(g lower alkoxy.
(h halo(lower)alkoxy, u: lower alkylamino.
(3 di-lower alkylamino.
(k lower alkanoyl, and
(1 1 aryl, or a hyarate or polymorph thereof.
By this inveintion, there is also provided a compound of formula IB
Figure imgf000033_0001
wherein Xa is CH, CR1, CR2 or nitrogen;
R1 and R2 are both inaependently selectea from the group consisting of
( I ) hyarogen, (2) halogen,
(3) nitro,
(4) lower alkyl,
( 5) halo(lower)alkyl,
( 6 ) hyaroxy(lower)alkyl, (7) cyclo(lower)alkyl,
(8) lower alkenyl,
(9) lower alkoxy,
(10) halo(lower) alkoxy,
(II) lower alkylthio, (12) carboxyl,
(13) lower alkanoyl,
(14) lower alkoxycarbonyl,
(15) lower alkylene optionally substitutea with oxo, ana (16) -Q-Ar2' wherein Q is selected from the group consisting of a single bond and a carbonyl, and wherein Ar2 is selected from the group consisting of
( 1 ) aryl, and
(2) heteroaryl, wherein Ar2 is unsubstituted or substituted with a substituent selected from the group consisting of
(a) halogen,
(b) cyano,
(c) lower alkyl. (d) halo(lower)alkyl,
(e) hydroxy(lower)alkyl,
(f) hydroxy,
(g) lower alkoxy, (h) halo(lower)alkoxy,
(x) lower alkylamino, (j) di-lower alkylamino, (k) lower alkanoyl, and (1) aryl, or a hydrate or polymorph thereof.
By this invention, there is also provided a compound of formula 1-3
Figure imgf000035_0001
1-3 or a hydrate or polymorph thereof.
By this invention, there is also provided a compound of formula 1-4 35
Figure imgf000036_0001
or a hydrate or polymorph thereof.
By this invention, there is also provided a crystalline form of the tosylate salt of compound 1-4
Figure imgf000036_0002
By this invention, there is also provided a compound of 2-1
Figure imgf000036_0003
or a hydrate or polymorph thereof.
By this invention, there is also provided a compound which is a crystalline form of the hydrochloride salt of compound 2-1
Figure imgf000037_0001
2 - 1
The compounds in the processes of the present invention inσluae stereoisomers, such as optical isomers, aiastereomers ana geometrical isomers, or tautomers depending on the mode of substitution. The present invention is meant to comprehend all such isomeric forms of the compounds in the compositions of the present invention, and their mixtures. All hydrates, solvates and polymorphic crystalline forms of the above-described compounds and their use, including their use in the processes of the instant invention, are encompassed within scope of the instant invention.
"Halogen" refers to fluorine atom, chlorine atom, bromine atom and iodine atom. "Ci-4 alcohol" refers to methanol, ethanol, n-propanol, isopropanol, n-butanol, isobutanol, sec-butanol and tert-butanol, and the like.
"Lower alkyl" refers to a straight- or branched-chain alkyl group of Ci to CQ , for example, methyl, ethyl, propyl, isopropyl, butyl, isobutyl, sec-butyl, tert-butyl, pentyl, isopentyl, hexyl, isohexyl, and the like.
"Halo(lower)alkyl" refers to the aforesaid lower alkyl substituted with 1 or more than 2, preferably 1 to 3 aforesaid halogen atoms identically or differently at the substitutable. arbitrary positions, for example, fluoromethyl, difluoromethyl, trifluoromethyl, 2-fluoroethyl, 1,2-difluoroethyl, chloromethyl, 2-chloroethyl, 1,2-dichloroethyl, bromomethyl, iodomethyl, and the like. "Hydroxy(lower)alkyl" refers to the aforesaid lower alkyl substituted with 1 or more than 2, preferably 1 or 2 hydroxy groups at the substitutable, arbitrary positions, for example, hydroxymethyl, 2-hydroxyethyl, 1-hydroxy-1-methylethyl, 1,2-dihydroxyethyl, 3-hydroxypropyl, and the like. "Cyclo(lower)alkyl" refers to a cycloalkyl group of C3 to Cβ, for example, cyclopropyl, cyclobutyl, cyclopentyl, cyclohexyl, and the like.
"Lower alkenyl" refers to a straight- or branched-chain alkenyl group of C2 to Cβ, for example, vinyl, 1-propenyl, 2-propenyl, isopropenyl, 3-butenyl, 2-butenyl, 1-butenyl, 1-methyl-2-propenyl, 1-methyl-1-propenyl, 1-ethyl-1-ethenyl, 2-methyl-2-propenyl, 2-methyl-1-propenyl, 3-methyl-2-butenyl, 4-pentenyl, and the like.
"Lower alkoxy" refers to a straight- or branched-chain alkoxy group of C± to Cβ , for example, methoxy, ethoxy, propoxy, isopropoxy, butoxy, sec-butoxy, isobutoxy, tert-butoxy, pentyloxy, isopentyloxy, hexyloxy, isohexyloxy, and the like.
"Halo(lower)alkoxy" refers to the aforesaid lower alkoxy substituted with 1 or more than 2, preferably 1 to 3 aforesaid halogen atoms identically or differently at the substitutable, arbitrary positions, for example, fluoromethoxy, difluoromethoxy, trifluoromethoxy, 2-fluoroethoxy, 1,2-difluoroethoxy, chloromethoxy, 2-chloroethoxy, 1,2-dichloroethoxy, bromomethoxy, iodomethoxy, and the like. "Lower alkylthio" refers to a straight- or branched-chain alkylthio group of Ci to Cβ, for example, methylthio, ethylthio, propylthio, isopropylthio, butylthio, seσ-butylthio, isobutylthio, tert-butylthio, pentylthio, isopentylthio, hexylthio, isohexylthio, and the like.
"Lower alkylamine" refers to an amine which is mono-, di- or trisubstituted with a straight- or branched-chain alkyl group of Ci to C4, for example, methylamine, ethylamine, propylamine, isopropylamine, butylamine, sec-butylamine, isobutylamine, tert-butylamine, dimethyl amine, trimethyl amine, diethyl amine, triethyl amine, diisopropylethyl amine, and the like.
"Lower alkanoyl" refers to an alkanoyl group containing the aforesaia lower alkyl, that is, an alkanoyl group of C2 to C7, for example acetyl, propionyl, butyryl, isobutyryl, valeryl, isovaleryl, pivaloyl, ana the like.
"Lower alkoxycarbonyl" refers to an alkoxycarbonyl group containing the aforesaia lower alkoxy, that is, an alkoxycarbonyl group of C2 to C7, for example, methoxycarbonyl, ethoxycarbonyl, propoxycarbonyl, isopropoxycarbonyl, butoxycarbonyl, isobutoxycarbonyl, tert-butoxycarbonyl, pentyloxycarbonyl, and the like.
"Lower alkylene optionally substituted with oxo" refers to a straight- or branched-chain alkylene group of C2 to Cβ which may be substitutea with 1 or more than 2 , preferably 1 oxo group at a substitutable, arbitrary position, for example, ethylene, trimethylene, tetramethylene, pentamethylene, hexamethylene, 1-oxoethylene, 1-oxotrimethylene, 2-oxotrimethylene, 1-oxotetramethylene, 2-oxotetramethylene, ana the like. The above alkylene group is formea by combining R1 and R2, taken together.
"Aryl" incluaes phenyl, naphthyl, ana the like. "Heteroaryl" refers to 5- or 6-memberea monocylic heteroaromatic group which contains 1 or more than 2 , preferably 1 to 3 hetero atoms iaentically or aifferently selected from the group consisting of oxygen atom, nitrogen atom and sulfur atom; or condensed heteroaromatic group, where the aforesaid monocylic heteroaromatic group is condensed with the aforesaid aryl group, or with the identifiea or different aforesaid monocylic heteroaromatic group each other, for example, pyrrolyl, furyl, thienyl, imidazolyl, pyrazolyl, thiazolyl, isothiazolyl, oxazolyl, isoxazolyl, 1, 2,3-triazolyl, 1,2,4-triazolyl, tetrazolyl, oxadiazolyl, 1,2,3-thiadiazolyl, 1,2,4- thiaaiazolyl, 1,3,4-thiadiazolyl, pyridyl, pyrazinyl, pyrimidinyl, pyridazinyl, 1,2,4- triazinyl, 1,3,5-triazinyl, indolyl, benzofuranyl, benzothienyl, benzimidazolyl, benzoxazolyl, benzisoxazolyl, benzothiazolyl, benzisothiazolyl, indazolyl, purinyl, quinolyl, isoquinolyl, phthalazyl, naphthylidinyl, quinoxalinyl, quinazolinyl, cinnolinyl, pteridinyl, pyrido[3,2-b]pyridyl, and the like.
"Lower alkylamino" refers to an amino group mono-substituted with the aforesaid lower alkyl, for example, methylamino, ethylamino, propylamino, isopropylamino, butylamino, sec-butylamino, tert-butylamino, and the like. "Di-lower alkylamino" refers to an amino group di-substitutedwith identical or different aforesaid lower alkyl, for example, dimethylamino, diethylamino, ethylmethylamino, dipropylamino, methylpropylamino, diisopropylamino, and the like. In oraer to aisclose the aforesaia compounas of the general formula I more detailed, the various symbols used in the formula
I are explained in more detail by the use of preferred embodiments .
"Aryl or heteroaryl which may be substituted, the substituent being selected from the group consisting of halogen, nitro, lower alkyl, halo(lower)alkyl, hydroxy(lower)alkyl, cyclo(lower)alkyl, lower alkenyl, lower alkoxy, halo(lower)alkoxy, lower alkylthio, carboxyl, lower alkanoyl, lower alkoxycarbonyl, lower alkylene optionally substituted with oxo, and a group representea by formula of -Q-Ar2" refers to unsubstituted aforesaid aryl or aforesaid heteroaryl, or the aforesaid aryl or aforesaid heteroaryl which has substituent(s) at the substitutable, arbitrary position(s). The aforesaid substituent can be, identically or differently, one or more than 2, preferably 1 or 2 selected from the group consisting of halogen, nitro, lower alkyl, halo(lower) alkyl, hyaroxy(lower)alkyl, cyclo(lower)alkyl, lower alkenyl, lower alkoxy, halo(lower)alkoxy, lower alkylthio, carboxyl, lower alkanoyl, lower alkoxycarbonyl, lower alkylene optionally substitutea with oxo, and a group of formula: -Q-Ar2.
Halogen atom as the aforesaid substituent includes , preferably, fluorine atom, chlorine atom, and the like.
Lower alkyl as the aforesaid substituent includes, preferably, methyl, ethyl, propyl, isopropyl, and the like. Halo(lower)alkyl as the aforesaid substituent includes, preferably, difluoromethyl, trifluoromethyl, and the like.
Hydroxy(lower)alkyl as the aforesaid substituent includes, preferably, hydroxymethyl, 2-hydroxyethyl,
1-hydroxy-1-methylethyl, and the like. Cyclo(lower)alkyl as the aforesaid substituent includes, preferably, cyσlopropyl, cyclobutyl, and the like.
Lower alkenyl as the aforesaid substituent includes, preferably, vinyl, 1-propenyl, 2-methyl-1-propenyl, and the like.
Lower alkoxy as the aforesaid substituent includes , preferably, methoxy, ethoxy, and the like.
Halo(lower)alkoxy as the aforesaid substituents includes, preferably, fluoromethoxy, difluoromethoxy, trifluoromethoxy, and the like.
Lower alkylthio as the aforesaid substituent includes, preferably, methylthio, ethylthio, and the like.
Lower alkanoyl as the aforesaid substituent includes, preferably, acetyl, propionyl, and the like. Lower alkoxycarbonyl as the aforesaid substituent includes , preferably, methoxycarbonyl, ethoxycarbonyl, and the like.
Lower alkylene optionally substituted with oxo as the aforesaid substituent includes , preferably, 1-oxotetramethylene, and the like. In a group of formula: -Q-Ar2 as the aforesaid substituent, Ar2 represents aryl or heteroaryl which may be substituted, the substituent being selected from the group consisting of halogen, cyano, lower alkyl, halo(lower)alkyl, hydroxy(lower)alkyl, hydroxy, lower alkoxy, halo(lower)alkoxy, lower alkylamino, di-lower alkylamino, lower alkanoyl and aryl; Q represents a single bond or carbonyl.
"Aryl or heteroaryl which may be substituted, the substituent being selected from the group consisting of halogen, cyano, lower alkyl, halo(lower) alkyl, hydroxy(lower)alkyl. hydroxy, lower alkoxy, halo(lower)alkoxy, lower alkylamino, di-lower alkylamino, lower alkanoyl and aryl" refers to unsubstituted aforesaid aryl or aforesaid heteroaryl, or the aforesaid aryl or aforesaid heteroaryl which has substituent (s) at the substitutable, arbitrary position(s). The aforesaid substituent can be, iaentically or differently, one or not less than 2, preferably 1 or 2 selected from the group consisting of halogen, cyano, lower alkyl, halo(lower)alkyl, hydroxy(lower)alkyl, hydroxy, lower alkoxy, halo(lower)alkoxy, lower alkylamino, di-lower alkylamino, lower alkanoyl and aryl.
Halogen atom as the aforesaid substituent includes, preferably, fluorine atom, chlorine atom, and the like.
Lower alkyl as the aforesaid substituent includes, preferably, methyl, ethyl, propyl, isopropyl, and the like. Halo(lower)alkyl as the aforesaid substituent includes, preferably, difluoromethyl, trifluoromethyl, and the like.
Hydroxy(lower)alkyl as the aforesaid substituent includes, preferably, hydroxymethyl, 2-hydroxyethyl,
1-hydroxy-1-methylethyl, and the like. Lower alkoxy as the aforesaid substituent includes , preferably, methoxy, ethoxy, and the like.
Halo(lower)alkoxy as the aforesaia substituent incluaes, preferably, fluoromethoxy, aifluoromethoxy, trifluoromethoxy, ana the like. Lower alkylamino as the aforesaid substituent includes, preferably, methylamino, ethylamino, and the like.
Di-lower alkylamino as the aforesaid substituent includes, preferably, dimethylamino, diethylamino, and the like.
Lower alkanoyl as the aforesaid substituent includes. preferably, acetyl, propionyl, ana the like.
Aryl as the aforesaia substituent incluaes, preferably, phenyl, ana the like.
The substituent (s) of Ar2 incluae, preferably, halogen, cyano, lower alkyl, halo(lower)alkyl, hyaroxy(lower)alkyl, hydroxy, halo(lower)alkoxy, and the like.
Aryl in Ar2 includes, preferably, phenyl, and the like and heteroaryl includes imidazolyl, pyridyl, benzofuranyl, quinolyl, and the like. Consequently, a group of formula: -Q-Ar2 includes, for example, phenyl, 2-fluorophenyl, 3-fluorophenyl, 4-fluorophenyl, 2,3-difluorophenyl, 2 , 4-difluorophenyl, 3, 5-difluorophenyl, 2-chlorophenyl, 3-chlorophenyl, 4-chlorophenyl, 2-cyanophenyl, 3-cyanophenyl, 4-cyanophenyl, 2-methylphenyl, 3-methylphenyl, 4-methylphenyl, 2-fluoro-5-methylphenyl, 3-fluoromethylphenyl, 2-trifluoromethylphenyl, 3-trifluoromethylphenyl,
4-trifluoromethylphenyl, 2-methoxyphenyl, 3-methoxyphenyl, 4-methoxyphenyl, 3-fluoro-5-methoxyphenyl,
3-fluoromethoxypheny1, 3-difluoromethoxypheny1, 3- ( 2-hydroxyethyl)phenyl, 3-hydroxymethylphenyl,
3- ( 1-hydroxy-1-methylethyl)phenyl, 3-hydroxyphenyl,
4-hydroxyphenyl, 2-imidazolyl, 1-ethyl-2-imidazolyl, l,2,4-thiadiazol-5-yl, 1 , 3 , 4-thiadiaol-2-yl, 2-pyridyl, 3-pyridyl, 4-pyridyl, 2-ethyl-4-pyridyl, 4-pyrimidinyl, 5-pyrimidinyl, 4-benzo[b]furanyl, 5-benzo[b]furanyl, 7-benzo[b]furanyl, 2-quinolyl, 3-quinolyl, 4-quinolyl, 5-quinolyl, 6-quinolyl, 8-quinolyl, benzoyl, 2-pyridylcarbonyl, and the like, and preferably, phenyl, 2-fluorophenyl, 3-fluorophenyl, 3, 5-difluorophenyl, 3-chlorophenyl, 4-chlorophenyl, 3-cyanophenyl, 3-trifluoromethylphenyl, 3-difluoromethoxyphenyl, 3- ( 2-hydroxyethyl)phenyl,
3-hydroxyphenyl, 4-hydroxyphenyl, 1-ethyl-2-imidazolyl, 2-pyridyl, 7-benzo[b]furanyl, 2-quinolyl, 3-quinolyl, benzoyl, 2-pyridylcarbonyl, and the like.
The salts of compounds of formula I, including, but not limited to, compounds of formula IA, IB, and IC, refer to the pharmaceutically acceptable and common salts, for example, base addition salt to carboxyl group when the compound has a carboxyl group, or acid addition salt to amino or basic heterocyclyl when the compound has an amino or basic heterocyclyl group, and the like.
The base addition salts include salts with alkali metals (including, but not limited to, sodium, potassium); alkaline earth metals (including, but not limited to, calcium, magnesium); ammonium or organic amines (including, but not limited to, trimethylamine, triethylamine, dicyclohexylamine, ethanolamine, diethanolamine, triethanolamine, procaine,
N,N' -dibenzylethylenediamine) , and the like. The acid addition salts include salts with inorganic acids (including, but not limited to, hydrochloric acid, sulfuric acid, nitric acid, phosphoric acid, perchloric acid) , organic acids (including, but not limited to, acetic acid, oxalic acid, maleic acid, fumaric acid, tar aric acid, citric acid, ascorbic acid, trifluoroacetic acid, acetic acid), sulfonic acids (incluaing, but not limitea to, methanesulfoniσ acid, isethionic acid, benzenesulfonic acid, p-toluenesulfonic acid, p-toluenesulfonic acid monohydrate, p-toluenesulfonic acid hydrate, camphor sulfonic acid), and the like. Polymorphism can be aefined as the ability of the same chemical substance to exist in different crystalline structures. The different structures are referred to as polymorphs , polymorphic modifications or forms. The pyrazole tosylate salt 1-4 has been found it exist in at least two polymorphic nonsolvated forms. Form A and Form B, each of which can be formed by careful control of the crystallization conaitions .
In the schemes ana examples below, various reagent symbols ana abbreviations have the following meanings : AcOEt or EtOAc: ethyl acetate tBuOH: tert-butanol tert-BuOH: tert-butanol DBU: 1 , 8-aiazabicyclo[5.4.0]undec-7-ene EtOH: ethanol g: grams
IPAC: isopropyl acetate
HC1: hydrochloric acid
HPLC: high pressure liquid chromatography
KOtBu: potassium te.r£-butoxide
NaCl: sodium chloride
NaHCθ3 : sodium bicarbonate
NaOEt : sodium ethoxide
NaOH: sodium hydroxide mL: milliliter mmol: millimole mol: moles/liter
MTBE: methyl t-butyl ether
THF: tetrahydrofuran TsOH: p-toluenesulfonic acid
TsOH-H2θ: p-toluenesulfonic acid monohydrate
The compounds of the present invention can be prepared by employing the following General Scheme, which shows one embodiment of the present invention wherein a 2-fluorophenyl- hydrazine salt of compound III is reacted with an acrylonitrile of formula V. The pyrazole compounds of formula I, and salts and polymorphs thereof, are prepared from commercially available starting materials, such as 2-fluorophenylhydrazine hydrochloride 1-1, and ethoxyacrylonitrile 1-2, as shown in Example 1 and 2.
Examples The following examples are provided to illustrate the invention and are not to be construed as limiting the scope of the invention in any manner.
GENERAL SCHEME
Figure imgf000048_0001
Acid
Figure imgf000048_0002
IC, salt of I
EXAMPLE 1
Preparation of 1- (2 -Fluorophenyl) -lH-Pyrazole-3-Amine Tosylate 1-4
Figure imgf000048_0003
1-3 Step A: Preparation of 1- ( 2-Fluorophenyl) -lH-Pyrazole-3- Amine 1-3
To a suspension of the 2-fluorophenylhydrazine hydrochloride 1-1 (50 g, JEMCO, Inc.) in EtOH (300 mL) was added 20 weight % NaOEt in EtOH (292.97 g, Ni on Soda). The ethoxyacrylonitrile 1-2 (53.76 g, Degussa) was then added at ambient temperature. The reaction mixture was warmed to about 82°C and aged for 20 to 28 hours. The reaction mixture was cooled to ambient temperature. To the batch was added water (250 mL, 5 volumes) and 6N HCl to adjust the mixture to a pH between about 2.9 - 3.1. The resulting aqueous EtOH solution was stirred at 20°C to 25°C for 1 to 2 hours. After treatment with 5N NaOH to adjust the solution to a pH of about 6.5 to 8.0, the reaction mixture was concentrated to circa 600 mL (12 volumes), then IPAC (750 mL) was added. The layers were separated and the organic layer was washed with 10% aqueous NaCl ( 200 mL) . Activated carbon (Sirasagi P, 1.75g, 3.5 weigh % to 2-fluorophenylhydrazine HCl) was added to the resulting solution at ambient temperature. After 1 to 20 hours treatment of the activated carbon, the cake was washed with IPAC (4 volumes to a weight % to 2-fluorophenylhydrazine HCl, 200mL). The combined organic layers were σoncentratea to about 410 - 510 mL (10 - 12.5 volumes to assay gram of pyrazole 1-3) to give l-( 2-fluorophenyl) -lH-pyrazole-3-amine 1-3. Selectea Signals IH NMR (300 MHz, DMSO-dβ): δ 7.84 (d, J=2.6Hz, IH), 7.72 (dd, J=8.2, 1.8 Hz, IH) , 7.34 (ddd, J=ll.l, 7.9, 1.7 Hz, IH), 7.28-7.14 (m, 2H) , 5.77 (d, J=2.6 Hz, IH) , 5.10 (brs, 2H) .
Compound 1-3 is also characterized by differential scanning calorimetry (DSC). The DSC curve for compound 1-3 is characterized by an endotherm with a peak temperature of 46.98°C + 2°C, when obtained under the following measurement conditions: Appratus: DSC 2920 (TA Instruments) Sample cell: 60 microliter Hasteroy B closed cell (KASEN Engineering Co., Ltd.) Lamp: 10°C/min. (ambient - 300°C) Atmosphere: in cell: atomospheric pressure out cell: atomospheric pressure.
Step B: Preparation of the Tosylate Salt 1-4
Figure imgf000050_0001
1-3 1-4
Pyrazole tosylate (0.5 weight % to assay grams of pyrazole, 105 mg, form-II) was added to the reaction mixture as seed. TsOH-H2θ (27.07 g 142.32 mmol, 1.2 equivalents to assay % of pyrazole 1-3) in EtOH (67.2 mL) was added to the solution of compound 1-3, from step A, over 3 hours, followea by IPAC (2.5 volumes to assay grams of pyrazole, 52.5 mL) over 1 hour at room tempaaerature . The mixture was stirrea for about 14 to 17 hours. The batch was coolea to 0°C, aged for 2 hours and then filtered. The cake was washed with EtOH-IPAC (1:9, 84 mL) , IPAC (84 mL), and then dried in vacuo at 30°C to give the pyrazole tosylate salt 1-4 (Form-II crystal) .
Selected Signals: iH NMR (500 MHz, DMSO-dβ): δ 9.68. (brs, 3H) , 8.24. (dd, J=2.0, 2.0. Hz, IH) , 7.72. (dd, J=8.0, 8.0. Hz, IH) , 7.51-7.42. (m, 4H) , 7.37. (dd, 3=1.6 , 7.6 Hz, IH) , 7.12. (d, J=7.9.Hz, 2H), 6.44. (d, J=2.3 Hz, IH) , 2.28(s, 3H)~
Instead of seeding form-II crystals, form-I crystal seeding and the above treatment gave the form-I crystal of pyrazole tosylate.
Crystal Form-I The prepared 1- (2-fluorophenyl) -lH-pyrazole-3-amine tosylate salt 1-4 (Form-II crystal, 1 g) was stirred in EtOH-MTBE (1:4.5 mixture, 20.1 mL) at room temperature for 23 hours. The crystal was filtered and washed with MTBE to give l-(2- fluorophenyl) -lH-pyrazole-3-amine tosylate salt 1-4 (Form-I crystal, 95%).
Crystal Form-II
To a solution of crude 1- (2-fluorophenyl) -lH-pyrazole- 3-amine 1-3 (3.42 g, 18.29 mmoL) in EtOH (13.7 mL) was added p-toluenesulfonic acia (4.41 g, 23.2 mmoL) in EtOH (11 mL), ana then aropwise MTBE (8.6 mL) over 0.5 h at room temperature. The seea (pyrazole tosylate, form I crystal, 0.25 weight % to assay grams of pyrazole) was added then aged at this temperature for 0.5 h. To this slurry was added additional MTBE (103 mL) over 3.0 hours and stirred for 13 hours at room temperature. The crystal was filtered and washea with MTBE-EtOH (9:1, 27.4 mL) to give 1- (2-fluorophenyl) -lH-pyrazole-3-amine tosylate salt 1-4 (Form-II crystal, 58%).
The following powder X-ray diffraction analysis data in
Tables 1 , 2 and 3 were measured by RINT1100 (manufactured by Rigaku
International Corporation) and analysis methods were as follows:
X-ray radiation source: Cu, tube voltage: 40 KV, tube current: 30 mA, monochronomater: automatic monochromater monoreσeiving slit: 0.60 mm goniometer: wide angle goniometer, scan step: 0.02 degrees, scan speed: 2.00 degrees/minute, divergence slit (DS) : 1 degree, scattering slit: 1 degree, receiving slit (RS): 0.15 millimeter, measured temperature: ambient temperature.
Table 1. Powder X-ray diffraction: l-(2-Fluorophenyl) -lH-Pyrazole-3-Amine Tosylate 1-4, Crystal
Form-I θ( 2 theta) (aegrees ) Intensity(cps)
5.020 573
7.700 183
9.400 617
9.600 642
13.300 116
14.240 2230
14.500 973
14.660 2589
14.920 140
15.400 262
15.900 2225
16.020 2582
17.140 198
19.180 805
19.460 1358
20.020 6311
21.360 476
21.680 1705
22.840 1142
23.000 1575
23.140 928
23.640 834
24.540 343
25.340 263
25.620 2769
25.700 3756
25.980 773
26.460 545 26.680 611
26.980 558
27.420 279
28.200 1494 28.740 123
29.460 450
30.020 256
30.580 124
31.240 2024 31.520 309
31.900 253
32.300 233
33.620 305
34.820 254 35.260 343
35.860 163
36.300 159
37.260 123
37.680 219 38.220 204
38.700 231
39.060 173
Although Form I of 1- (2-fluorophenyl) -IH-pyrazole-3-amine tosylate 1-4 is characterized by the complete group of angle 2 theta values listed in Table 1 , all the values are not required for such indentification. Form I of 1- (2-fluorophenyl) -1H- pyrazole-3-amine tosylate 1-4 can be identified by the angle theta value in the range of 14.2 to 14.3°. Form I of l-(2- fluorophenyl) -lH-pyrazole-3-amine tosylate 1-4 can be identified by any one of the following angle theta values , or any one of the following groups of angle theta values : a) 14.24°; b) 14.2 - 14.3° and 21.6 - 21.7°; c) 14.2 - 14.3°, 20.0 - 20.1°, and 21.6 - 21.7°; d) 14.2 - 14.3°, 20.0 - 20.1°, 21.6 - 21.7°, and 31.2 - 31.3°; e) 14.24° , 14.6 - 14.7° , 15.9° , 16.0 - 16.1° , 19.4 - 19.5° , 20.0- 20.1° , 21.6 - 21.7° , 22.8 - 22.9° , 23° , 25.6 - 25.7° , 25.7° , 28.2° and 31.2 - 31.3° . Aaaitionally , each of the angle 2 theta values from Table 1 can be expressea to two aecimal places as follows: 14.24° , 14.66° , 15.90° , 16.02° , 19.46° , 20.02° , 21.68° , 22.84° , 23.00° , 25.62° , 25.70° , 28.20° ana 31.24° .
Table 2. Powaer X-ray aiffraction:
1- ( 2-Fluorophenyl) -1H- -Pyrazole-3-Amine
Form-II
2θ(2 theta) (aegrees) Intensity(cps)
2.220 384
8.680 4040
9.500 395
11.980 3610
14.560 276
15.340 1130
15.680 238
16.080 129
16.720 206
17.460 190 17.780 272
18.200 726
18.820 1295
19.160 211 20.100 565
20.520 3939
20.660 2817
22.500 1494
23.640 398 24.040 196
24.420 239
24.920 889
25.740 214
26.080 504 26.360 808
27.100 288
28.240 1106
29.320 234
29.880 581 30.280 310
30.920 267
32.940 376
34.280 159
34.700 358 35.420 146
37.140 161
37.440 199
38.360 248
38.940 398 39 . 680 209
Although Form II of 1- (2-fluorophenyl) -lH-pyrazole- 3-amine tosylate 1-4 is characterized by the complete group of angle 2 theta values listed in Table 2, all the values are not required for such indentification. Form II of l-(2- fluorophenyl) -lH-pyrazole-3-amine tosylate 1-4 can be identified by the angle theta value in the range of 8.6 to 8.7°. Form II of 1- (2-fluorophenyl) -lH-pyrazole-3-amine tosylate 1-4 can be identified by any one of the following angle theta values , or any one of the following groups of angle theta values : a) 8.68°; b) 8.6 - 8.7° and 11.9 - 12.0°; c) 8.6 - 8.7°, 11.9 - 12.0°, and 20.5 - 20.6°; d) 8.6 - 8.7°, 11.9 - 12.0°, 20.5 - 20.6°, and 20.6 - 20.7°; and e) 8.6 - 8.7° , 11.9 - 12.0° , 15.3 - 15.4° , 18.8 - 18.9° , 20.5 - 20.6°, 20.6 - 20.7°, and 22.5°. Additionally, each of the angle 2 theta values from Table 1 can be expressed to two decimal places as follows: 8.68°, 11.98°, 15.34°, 18.82°, 20.52°, 20.66°, 22.50°, and 28.24°.
Compound 1-4 is also characterized by differential scanning calorimetry (DSC) . The DSC curve for compound 1-3 is characterized by an endotherm with a peak temperature of 140.29°C + 2°C, when obtained under the same measurement σonaitions as for compouna 1-3, Example 1, Step A.
EXAMPLE 2 Preparation of l-(2-Fluorophenyl) -lH-Pyrazole-3-Amine Hydrochloride 2-1
Step A: Preparation of 1- (2-Fluorophenyl) -lH-Pyrazole-3- Amine 1-3
Figure imgf000058_0001
1-3
To a suspension of the 2-fluorophenylhydrazine hydrochloride 1-1 (12.5 g, 76.9 mmol, JEMCO) in EtOH (75 mL, 6 volumes) was added 20 weight % NaOEt in EtOH (72.9 g) while keeping the temperature less than 30°C. The ethoxyaσrylonitrile 1-2 (13.4 g, Degussa) was then added at 25°C. The reaction mixture was warmed to about 82°C over 30 minutes and then aged for 20 to 28 hours . The reaction mixture was cooled to ambient temperature . Water (62.5 mL, 5 volumes) and 6N HCl, to adjust the mixture to a pH between 2.9 to 3.1, were slowly added to the reaction mixture while keeping the temperature below 30°C. The resulting aqueous ethanol solution was stirred at a temperature of about 20°C to 25°C for 1 to 2 hours, then treated with 5N NaOH, to adjust the pH to between 6.5 to 8.0. The resulting solution was concentrated to 150 mL (12 volumes) in vacuo at 40°C, and then extracted with toluene (125 mL) two times.
The organic layer was washed with 10% aqueous NaCl (62.5 mL, 5 volumes). Activated carbon (Shirasagi P, 3.5 weight % to 2-fluorophenylhydrazine HCl, 473.5 mg) was added to the resulting solution at ambient temperature and stirred for about 15 to 20 hours. The cake (activated carbon) was washed with toluene (4 volumes to assay grams of pyrazole, 40.9 mL) . The washings were combined with the filtrate to give l-(2-fluorophenyl)-lH-pyrazole-3-amine 1-3.
Selected Signals: iH NMR (300 MHz, DMSO-dδ): δ 7.84 (d, J=2.6 Hz, IH), 7.72 (dd, J=8.2, 1.8 Hz, IH) , 7.34 (ddd, J=ll.l, 7.9, 1.7Hz, IH), 7.28-7.14 (m, 2H) , 5.77 (d, J=2.6Hz, IH) , 5.10 (brs, 2H) .
Step B: Preparation of the Hydrochloride Salt 2-1
Figure imgf000059_0001
1-3 2-1
A portion of the above organic layer containing 1- (2-fluorophenyl) -lH-pyrazole-3-amine 1-3 (115 mL, 51.0mg/mL, 5.87 assay g (33.13 mmol)) was solvent-switched from toluene to EtOH (29.4 mL, 5 volumes to pyrazole assay) . To the solution was added EtOAc ( 5.9 mL, 1 volume to assay grams of pyrazole) , followed by 4N HCl in EtOAc (9.11 mL, 36.4 mmol, 1.1 equivalents) at room temperature. Then the 1- (2-fluorophenyl) -lH-pyrazole-3-amine HCl salt (0.5 weight % to assay grams of pyrazole, 29.4mg) was aaaea as seea.
The resulting slurry was agea at room temperature for 1 hour, ana then EtOAc (88 mL, 15 volumes to pyrazole assay) was added dropwise at ambient temperature over more than 2 hours. The resulting suspension was aged at ambient temperature for 15 to 20 hours. The batch was filtered, washed with EtOH-AcOEt (1:10; 23.5 mL), EtOAc (11.7 mL) , and dried at room temperature under vacuum for 15 hours to give the l-( 2-fluorophenyl) -lH-pyrazole-3-amine hydrochloride salt 2-1.
Selected Signals iH NMR (500 MHz, DMSO-dβ): δ 9.18. (brs, 3H) , 8.20. (dd, J=2.4, 2.4. Hz, IH) , 7.73. (ddd, J=8.0, 8.0, 1.6. Hz, IH) , 7.50-7.42. (m, 2H) , 7.36. (ddd, J=8.0, 8.0, 1.5Hz , IH) , 6.40. (d, J=2.5Hz, 1H)~
Powder X-ray diffraction:!-( 2-Fluorophenyl) -lH-Pyrazole-3-Amine HCl Salt 2-1
2θ(2 theta) (degrees) Intensity(cps)
10.580 242
10.920 1187
11.740 489
14.880 377
17.660 874
19.020 192
19.400 1254
19.940 2149
22.080 1911
22.560 390 22.820 705
23.140 640
23.680 1771
24.160 405 24.680 2102
26.500 134
27.060 518
27.600 1539
28.260 286 29.140 844
29.860 476
31.340 534
32.360 588
32.900 169 33.320 204
33.700 400
34.860 795
35.460 136
35.820 225 36.760 150
37.400 357
37.740 177
38.340 150
39.380 379 Above powder X-ray aiffraction analysis data were measured by the same conditions as Example 1 (Step B) .
Although 1- ( 2-fluorophenyl) -lH-pyrazole-3-amine hydrochloride salt 2-1 is characterized by the complete group of angle 2 theta values listed in Table 3, all the values are not required for such indentification. The 1- (2-fluorophenyl) -1H- pyrazole-3-amine hydrochloride salt 2-1 can be identified by the angle theta value in the range of 19.9 - 20.0°. The l-(2- fluorophenyl)-lH-pyrazole-3-amine hydrochloride salt 2-1 can be identified by any one of the following angle theta values , or any one of the following groups of angle theta values : a) 19.94°; b) 10.9 - 11.0°, 19.9 - 20.0°, and 24.6 - 24.7°; and c) 10.9 - 11.0°, 19.4°, 19.9 - 20.0°, 22.0 - 22.1°, 23.6 - 23.7°, 24.6 - 24.7° and 27.6°. Additionally, each of the angle 2 theta values from Table 1 can be expressed to two decimal places as follows: 10.92°, 19.40°, 19.94°, 22.08°, 23.68°, 24.68° and 27.60°.
Compound 2-1 is also characterized by differential scanning calorimetry (DSC). The DSC curve for compound 1-3 is characterized by an endotherm with a peak temperature of 145.65°C + 2°C, when obtained under the same measurement conditions as for compound 1-3, Example 1, Step A.
EXAMPLE 3
Preparation of 1- ( 2-Phenyl) - lH-Pyrazole-3-Amine 3- 2
Figure imgf000062_0001
3-2 To a suspension of the phenylhydrazine hydrochloride 3-1 (1.0 g, TCI) in EtOH (5 mL) was added 21 weight % NaOEt in EtOH (7.23 mL) while keeping the temperature less than 30°C. The ethoxyacrylonitrile 1-2 (1.33mL, Acros) was then addea at 25°C. The reaction mixture was warmea to about 82°C over 30 minutes ana then agea for 20 hours . The reaction mixture was cooled to ambient temperature. Water (10 mL) was slowly added to the reaction mixture while keeping the temperature below 30°C. The resulting aqueous ethanol solution was extraced with MTBE (20 mL) then the organic layer was washed with 10% NaCl aqueous solution (5 mL) . Activated carbon (Shirasagi P, 5 mg) was added to the resulting solution at ambient temperature and stirred for about 1 hour. Concentration of the filtrate and purification of the resulting residue with flash chromatography (heptane/EtOAc = 2:1) gave l-(2-Phenyl)-lH-Pyrazole-3-Amine 3-2.
1HNMR (500 MHz, DMSO-dβ) : δ 8.12 (d, J=2.5 Hz, IH) , 7.63 (d, J=8.3 Hz, 2H), 7.38 (dd, J=7.9, 7.9 Hz, 2H) , 7.11 (dd, J=7.3, 7.3 Hz, IH), 5.73 (d, J=2.5 Hz, IH) , 5.06 (brs, 2H)
Alternatively, l-phenyl-lH-pyrazole-3-amine 3-2 may also be prepared according to the synthethic procedure shown in Example 4.
EXAMPLE 4
Preparation of 1-Phenyl-lH-Pyrazole-3-Amine 3-2
Figure imgf000064_0001
3-2
To a hot solution of tert-B QK (100 g, Tokyo Kasei) in te-rt-BuOH (650 mL) was added phenylhydrazine 3-3 (39.36 mL, Tokyo Kasei). After cooling to ambient temperature, methoxyacrylonitrile 3-4 (33.57 mL, Tokyo Kasei) was added dropwise and the mixture was refluxed for 15 hours. The reaction mixture was cooled to ambient temperature and the solvent was removed by evaporation. To the residue was added water (200 mL) and EtOAc (500 mL) . The layers were separated and the organic layer was washea with brine (200 mL), ariea over MgSθ4 ana concentratea. To the resiaue was aaded 5N HCl (200 mL) and EtOAc (500 mL) and the precipitated solias were removed by filtration. The filtered layers were separated, and the organic layer was extracted with 5N HCl ( 100 mL) . The aqueous layers were combined and treated with 5N NaOH to adjust the solution to a pH of about 9, then the aqueous solution was extracted with EtOAc (400 mL + 200 mL) . The organic layers were combined and washed with brine (100 mL), dried over MgSθ4 and concentrated. The resulting residue was purified by flash chromatography on silica gel (Wako gel C-300, Wako, EtOAc/hexane 1:9 to 1:1) to give compound 3-2.
iH NMR (300 MHz, DMSO-dβ): δ 8.11 (d, J=2.6 Hz , IH) , 7.62 (dd, J=8.7, 1.1Hz, 2H), 7.37 (dd, J=8.7, 7.4 Hz , 2H) , 7.10 (dt, J=7.4, 1 . 1 Hz , IH ) , 5 . 72 ( d , J=2 . 6 Hz , IH ) , 5 . 01 ( brs , 2H ) .
EXAMPLE 5 Preparation of 1- (2-Pyridyl) -lH-Pyrazole-3-Amine 5-3
Figure imgf000065_0001
5-3
To a hot solution of tert-BuOK (2.7 g, Tokyo Kasei) in te-rt-BuOH (60 mL) was added 2-hydrazinopyridine 5-1 (2.18 g, Aldrich) . After cooling to ambient temperature, a solution of methoxyacrylonitrile 3-4 (1.68 mL, Tokyo Kasei) in tex-t-BuOH (10 mL) was added and the reaction mixture was refluxed for 3 hours . The reaction mixture was cooled to ambient temperature and the solvent was removed by evaporation. To the residue was added water and EtOAc. The layers were separated and the organic layer was washed with brine, dried over Na2S04 and concentrated. The residue was purified by flash chromatography on silica gel (Wako gel C-300, Wako, EtOAσ/hexane 1:2 to 1:1) to give compound 5-3.
iH NMR (300 MHz, CDCI3): δ 8.35-8.29 (m, 2H) , 7.75-7.68 (m, 2H) , 7.09-7.01 (m, IH) , 5.88-5.83 (m, IH) , 3.89 (brs, 2H) .
The following lH-pyrazole-3-amines were prepared by the same procedure using corresponding hydrazine or its hydrochloride (supplied by Tokyo Kasei Kogyo, Wako Pure Chemicals, Kanto Chemicals, Aldrich Chemical Company or Lancaster Synthesis).
1- ( 3 , 4-Dichlorophenyl) -lH-Pyrazole-3-Amine iH NMR (300 MHz, DMSO-d6): δ 8.22 (s , IH) , 7.90 (s , IH) , 7.70-7.55 (m, 2H), 5.80 (s, IH) , 5.22 (brs, 2H)
l-(2-Methoxyphenyl)-lH-Pyrazole-3-Amine iH NMR (300 MHz, DMSO-dβ): δ 7.90-7.80 (m, IH) , 7.70-7.60 (m, IH), 7.50-6.80 (m, 3H) , 5.85-5.70(m, IH) , 3.98 (s, 3H)
l-(2-Methylphenyl)-lH-Pyrazole-3-Amine iH NMR (200 MHz, CDCI3) : δ 7.35 (d, J=2.4 Hz, IH) , 7.22-7.19 (m, 4H), 5.81 (d, J=2.4 Hz, IH) , 3.9 (brs, 2H) , 2.29 (s, 3H)
1- (3-Fluorophenyl) -lH-Pyrazole-3-Amine H NMR (200 MHz, CDCI3) : δ 7.68 (d, J=2.6 Hz, IH) , 7.39-7.28 (m,
3H), 6.91-6.79 (m, IH) , 5.86 (d, J=2.6 Hz, IH) , 3.82 (brs, 2H)
l-(4-Cyanophenyl)-lH-Pyrazole-3-Amine iH NMR (300 MHz, DMSO-dβ): δ 8.28 (d, J=2.7 Hz, IH) , 7.85-7.75 (m, 4H), 5.84 (d, J=2.7 Hz, IH) , 5.31 (brs, 2H)
1- (4-Chlorophenyl) -lH-Pyrazole-3-Amine iH NMR (300 MHz, CDCI3): δ7.64 (d, J=2.7 Hz, IH) , 7.55-7.42 (m, 2H), 7.40-7.29 (m, 2H) , 5.85 (d, J=2.7 Hz, IH) , 3.82 (brs, 2H)
l-(3-Chlorophenyl)-lH-Pyrazole-3-Amine lH NMR (300 MHz, CDCI3) : δ 7.67 (a, J=2.6 Hz, IH) , 7.65-7.50 (m, IH), 7.46-7.39 (m, IH) , 7.33-7.24 (m, IH) , 7.17-7.11 (m, IH) , 5.84 (d, J=2.6 Hz, IH), 3.82 (brs, 2H)
1- (2 ,4-Difluorophenyl) -lH-Pyrazole-3-Amine lH NMR (200 MHz, CDCI3): δ 7.84-7.69 (m, 2H) , 7.00-6.87 (m, 2H) , 5.87 (d, J=2.6 Hz, IH) , 3.85 (brs, 2H)
l-(3, 5-Difluorophenyl) -lH-Pyrazole-3-Amine lH NMR (300MHz, CDCI3): δ7.64 (d, J=2.6Hz, IH) , 7.17-7.06 (m, 2H), 6.63-6.55 (m, IH) , 5.88 (d, J=2.6 Hz, IH) , 3.86 (brs, 2H)
1- ( 4-Fluorophenyl) -lH-Pyrazole-3-Amine lH NMR (200 MHz, CDCI3): δ 7.64-7.43 (m, 3H) , 7.16-7.00 (m, 2H) , 5.83 (d, J=2.5 Hz, IH) , 3.84 (brs, 2H) .
Employing the procedure substantially as described in
Examples 1, 2, 3, 4 or 5 , but substituting the appropriate amines for the 2-fluorophenylhydrazine and phenyl hydrazine starting materials used in these Examples, other substituted pyrazole compounds of formula I may be prepared.
While the invention has been described and illustrated with reference to certain particular embodiments thereof, those skilled in the art will appreciate that various changes, modifications and substitutions can be made therein without departing from the spirit and scope of the invention. It is intended, therefore, that the invention be defined by the scope of the Claims which follow and that such Claims be interpreted as broadly as is reasonable.
Industrial Applicability The present invention relates to a process for the preparation of the pyrazole of formula I .
Figure imgf000068_0001
I The compounds of formula I are intermediates useful for the preparation of the spirolactone compounds of formula II.
Figure imgf000068_0002
II
The compounds of formula II are also useful as agents for the treatment of various diseases related to NPY, including, but not limited to, cardiovascular disorders, such as hypertension, nephropathy, heart disease, vasospasm, arteriosclerosis and the like, central nervous system disorders, such as bulimia. depression, anxiety, seizure, epilepsy, dementia, pain, alcoholism, drug withdrawal and the like, metabolic diseases such as obesity, diabetes, hormone abnormality, hypercholesterolemia, hyperlipidemia and the like, sexual and reproductive dysfunction, gastrointestinal disorder, respiratory disorder, inflammation or glaucoma, and the like.

Claims

1. A process for preparing a compound of the formula I', or a salt, hydrate or polymorph thereof.
Figure imgf000070_0001
wherein
R1 and R2 are both independently selected from the group consisting of
(I) hydrogen, (2) halogen,
(3) nitro,
(4) lower alkyl,
( 5 ) halo(lower)alkyl,
(6) hydroxy(lower)alkyl, (7) cyclo(lower)alkyl,
(8) lower alkenyl,
( 9 ) lower alkoxy,
(10) halo(lower)alkoxy,
(II) lower alkylthio, (12) carboxyl,
(13) lower alkanoyl,
(14) lower alkoxycarbonyl. (15) lower alkylene optionally substituted with oxo, and
(16) -Q-Ar2, wherein Q is selected from the group consisting of a single bond and a carbonyl, and
wherein Ar2 is selected from the group consisting of
(1) aryl, ana
(2) heteroaryl, wherein Ar2 is unsubstituted or substituted with a substituent selected from the group consisting of
(a] halogen.
(b] cyano,
(o] lower alkyl.
(a; halo(lower)alkyl,
(β] hyaroxy(lower)alkyl,
(f] hydroxy,
(gl lower alkoxy.
(h, halo(lower)alkoxy,
(i lower alkylamino.
(j i di-lower alkylamino.
(k lower alkanoyl, and
(1 i aryl ;
comprising the steps of:
(a) forming a hyarazine solution;
(b) aaaing a compouna of formula V
.CN
R30' , wherein
V
R3 is selected from the group consisting of
(1) lower alkyl,
(2 ) aryl, ana
(3) -CH2aryl, to the hyarazine solution of step (a) to form a mixture; ana (c) heating the mixture of step (b) to a temperature between about 50°C to about 100°C; to affora the compound I ' , or a salt , hyarate or polymorph thereof .
2. The process of Claim 1 wherein the hydrazine solution of step (a) is formed by dissolving a compound of formula III'
Figure imgf000072_0001
in a solvent .
3. The process of Claim 2, wherein the solvent is selected from the group consisting of (a) Ci- alcohol;
(b) toluene;
(c) tetrahydrofuran; and (d) dimethylformamide; or a mixture thereof.
4. The process of Claim 3 wherein the solvent is ethanol.
5. The process of Claim 1 wherein the hyarazine solution of step (a) is formea by treating a salt of a compouna of formula III'
Figure imgf000073_0001
salt of III'
with a base in a solvent ,
6. The process of Claim 5 wherein the solvent is selectea from the group consisting of
(a) Cι_4 alcohol;
(b) toluene; (c) tetrahydrofuran; and
( ) dimethyIformamide; or a mixture thereof.
The process of Claim 6 wherein the solvent is ethanol,
8. The process of Claim 5 wherein the salt of the compound of formula III' is selected from the group consisting of acetic acid salt, oxalic acid salt, hydrochloride salt, hydrobromide salt, dihydrobromide salt, mesylate salt, tosylate salt, besylate salt and sulfate salt.
9. The process of Claim 8 wherein the salt of the compouna of formula III' is a hyarochloriae salt.
10. The process of Claim 5 wherein the base is selectea from the group consisting of
(a) soaium ethoxiae;
(b) soaium methoxide; (σ) lower alkylamine; (d) l,8-diazabicyclo[5.4.0]undec-7-ene;
(e) potassium t-butoxide; and
(f) sodium hydroxiae.
11. The process of Claim 10 wherein the base is soaium ethoxiae,
12. The process of Claim 1 wherein R1 ana R2 are both inaependently selected from the group consisting of
( 1 ) hydrogen,
(2) halogen, (3) lower alkyl,
( 4) halo(lower)alkyl,
( 5) lower alkenyl,
(6) lower alkanoyl,
(7) lower alkylene, optionally substituted with oxo, and
(8) -Q-Ar2, wherein Q is selected from the group consisting of a single bond and a carbonyl, and wherein Ar2 is selected from the group consisting of ( i ) aryl, and (2) heteroaryl, wherein Ar2 is unsubstituted or substituted with a substituent selected from the group consisting of
(a] halogen.
(b] cyano ,
(σ] lower alkyl.
(a halo( lower) alkyl,
(e hydroxy( lower) alkyl ,
(f hydrox ,
(g i lower alkoxy.
(h i halo( lower) alkoxy,
(i i lower alkylamino.
(j i di-lower alkylamino.
(k I lower alkanoyl, and
(1 I aryl .
13. The process of Claim 12 wherein Rl is hydrogen and R2 is selected from the group consisting of (1) hydrogen.
( 2 ) 2-fluoro,
(3) 3-fluoro,
(4) 4-fluoro,
(5) 5-fluoro,
(6) 2-chloro,
(7) 3-chloro,
(8) 4-chloro,
(9) 2-difluoromethoxy,
(10) 3-difluoromethoxy,
(11) 2-methyl. ( 12 ) 2-pyridyl ,
(13) 2-quinolyl, and
(14) 3-quinolyl.
14. The process of Claim 13 wherein Rl is hydrogen and R2 is selected from the group consisting of
(1) hydrogen,
(2) 2-fluoro,
(3) 3-fluoro, and (4) 4-fluoro.
15. The process of Claim 14 wherein both Rl and R2 are hydrogen.
16. The process of Claim 14 wherein Rl is hydrogen and R2 is 2-fluoro.
17. The process of Claim 14 wherein Rl is hydrogen and R2 is 4-fluoro.
18. The process of Claim 1 wherein R3 is selected from the group consisting of lower alkyl.
19. The process of Claim 18 wherein R3 is selected from the group consisting of : -CH3, -CH2CH3, ~(CH2)2CH3, -CH(CH3)2, -(CH2)3CH3, and -C(CH3)3.
20. The process of Claim 19 wherein R3 is -CH2CH3.
21. The process of Claim 1 further comprising the step (d) of isolating the compound I ' .
22. The process of Claim 1 further comprising the step (e) of treating compound I ' with an acid to form a salt .
23. The process of Claim 22 wherein the acid of step (e) is selected from the group consisting of acetic acid, oxalic acid, hydrobromic acid, hydrochloric acid, anhydrous p-toluene- sulfonic acid, p-toluenesulfonic acid hydrate, p-toluenesulfonic acid monohydrate, benzenesulfonic acid, and methanesulfonic acid, or a mixture thereof.
24. The process of Claim 23 wherein the acid of step (e) is selected from the group consisting of acetic acid, oxalic acid, hydrochloric acid, anhydrous p-toluenesulfonic acid, p-toluenesulfonic acid hydrate, benzenesulfonic acid, and p-toluenesulfonic acid monohydrate, or a mixture thereof.
25. The process of Claim 24 wherein the acid of step (e) is p-toluenesulfonic acid monohydrate.
26. The process of Claim 24 wherein the acid of step (e) is hydrochloric acid.
27. A compound of formula 1-4
Figure imgf000078_0001
1-4 or a hydrate or polymorph thereof.
28. A compound which is a crystalline form of the tosylate salt of compound 1-4
Figure imgf000078_0002
1-4 29. The compound of Claim 28 having an x-ray powder diffraction pattern obtained using Cu radiation containing an angle 2 theta value of 14.2 - 14.3°.
30. The compound of Claim 28 having an x-ray powder diffraction pattern obtained using Cu radiation containing an angle 2 theta value of 14.24°.
31. The compound of Claim 28 having an x-ray powder diffraction pattern obtained using Cu radiation containing the following angle 2 theta values: 14.2 - 14.3° and 21.6 - 21.7°.
32. The compound of Claim 28 having an x-ray powder diffraction pattern obtained using Cu radiation containing the following angle 2 theta values: 14.2 - 14.3°, 20.0 - 20.1°, and 21.6 - 21.7°.
33. The compound of Claim 28 having an x-ray powder diffraction pattern obtained using Cu radiation containing an angle 2 theta value of 8.6 - 8.7°.
34. The compound of Claim 28 having an x-ray powder diffraction pattern obtained using Cu radiation containing an angle 2 theta value of 8.68°.
35. The compound of Claim 28 having an x-ray powder diffraction pattern obtained using Cu radiation containing the following angle 2 theta values :
8.6 - 8.7° and 11.9 - 12.0°.
36. The compound of Claim 28 having an x-ray powder diffraction pattern obtained using Cu radiation containing the following angle 2 theta values :
8.6 - 8.7°, 11.9 - 12.0°, and 20.5 - 20.6 °.
37. A compound of formula 2-1
Figure imgf000080_0001
or a hydrate or polymorph thereof,
38. A compound which is a crystalline form of the hydrochloride salt of compound 2-1
Figure imgf000080_0002
39. The compound of Claim 38 having an x-ray powder diffraction pattern obtained using Cu radiation containing the following angle 2 theta value: 19.9 - 20.0°.
40. The compound of Claim 38 having an x-ray powder diffraction pattern obtained using Cu radiation containing the following angle 2 theta value: 19.94°.
41 The compound of Claim 38 having an x-ray powder diffraction pattern obtained using Cu radiation containing the following angle 2 theta values :
10.9 - 11.0°, 19.9 - 20.0°, and 24.6 - 24.7°.
42. A process for preparing a compound of the formula I , or a salt, hydrate or polymorph thereof,
Figure imgf000081_0001
I; wherein
X is CH, CR1, CR2 or nitrogen;
R-*- and R2 are both independently selected from the group consisting of
( 1 ) hydrogen,
(2) halogen,
(3) nitro,
(4 ) lower alkyl, (5) halo(lower)alkyl,
( 6 ) hydroxy(lower)alkyl,
( 7) cyclo(lower)alkyl,
(8) lower alkenyl,
(9) lower alkoxy, (10) halo(lower) lkoxy,
(11) lower alkylthio,
(12) carboxyl,
(13) lower alkanoyl. (14) lower alkoxycarbonyl,
(15) lower alkylene optionally substituted with oxo, and
(16) -Q-Ar2, wherein Q is selected from the group consisting of a single bond and a carbonyl, and wherein Ar2 is selected from the group consisting of
( 1) aryl, and
(2) heteroaryl, wherein Ar2 is unsubstituted or substituted with a substituent selected from the group consisting of
(a) halogen,
(b) cyano,
(c) lower alkyl,
(d.) halo(lower) alkyl, (e) hydroxy(lower) alkyl,
(f) hydroxy,
(g) lower alkoxy,
(h) halo(lower)alkoxy, (i) lower alkylamino, (j) di-lower alkylamino,
(k) lower alkanoyl, and (1) aryl;
comprising the steps of: (a) forming a hydrazine solution; (b) adding a compound of formula V ^CN
R O V , wherein R3 is selected from the group consisting of
(1) lower alkyl,
( 2 ) aryl, and
(3) -CH2aryl, to the hydrazine solution of step (a) to form a mixture; and (c) heating the mixture of step (b) to a temperature between about 50°C to about 100°C; to afford the compound I, or a salt, hydrate or polymorph thereof .
43. The process of Claim 42 wherein the hydrazine solution of step (a) is formed by treating a compound of salt of formula III
Figure imgf000083_0001
salt of III
with a base in a solvent .
44. The process of Claim 43 wherein the base is potassium tert-butoxide, and the solvent is tejrt-butanol.
45. The process of Claim 42 further comprising the step (e) of treating the compound of formula I
Figure imgf000084_0001
with an acid to form a salt,
PCT/JP2003/013507 2002-10-23 2003-10-22 Process for making pyrazole compounds WO2004037794A1 (en)

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7700611B2 (en) 2005-07-28 2010-04-20 Merck Sharp & Dohme Corp. Synthesis and crystalline forms of NPY5 antagonist
EP2308852A1 (en) 2005-08-21 2011-04-13 Abbott GmbH & Co. KG 5-ring heteroaromatic compounds and their use as binding partners for 5-HT5 receptors
WO2014053450A1 (en) 2012-10-02 2014-04-10 Bayer Cropscience Ag Heterocyclic compounds as pesticides

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