WO2004015827A1 - Tunable ring laser with external grating operating in a single mode - Google Patents
Tunable ring laser with external grating operating in a single mode Download PDFInfo
- Publication number
- WO2004015827A1 WO2004015827A1 PCT/GB2003/003487 GB0303487W WO2004015827A1 WO 2004015827 A1 WO2004015827 A1 WO 2004015827A1 GB 0303487 W GB0303487 W GB 0303487W WO 2004015827 A1 WO2004015827 A1 WO 2004015827A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- frequency
- ring cavity
- lasing
- selection means
- laser
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Ceased
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B6/12004—Combinations of two or more optical elements
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
- H01S3/06—Construction or shape of active medium
- H01S3/063—Waveguide lasers, i.e. whereby the dimensions of the waveguide are of the order of the light wavelength
- H01S3/067—Fibre lasers
- H01S3/06791—Fibre ring lasers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
- H01S3/06—Construction or shape of active medium
- H01S3/063—Waveguide lasers, i.e. whereby the dimensions of the waveguide are of the order of the light wavelength
- H01S3/0632—Thin film lasers in which light propagates in the plane of the thin film
- H01S3/0635—Thin film lasers in which light propagates in the plane of the thin film provided with a periodic structure, e.g. using distributed feed-back, grating couplers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
- H01S3/08—Construction or shape of optical resonators or components thereof
- H01S3/08018—Mode suppression
- H01S3/08022—Longitudinal modes
- H01S3/08031—Single-mode emission
- H01S3/08036—Single-mode emission using intracavity dispersive, polarising or birefringent elements
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
- H01S3/08—Construction or shape of optical resonators or components thereof
- H01S3/081—Construction or shape of optical resonators or components thereof comprising three or more reflectors
- H01S3/083—Ring lasers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/02—Structural details or components not essential to laser action
- H01S5/026—Monolithically integrated components, e.g. waveguides, monitoring photo-detectors, drivers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/06—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium
- H01S5/065—Mode locking; Mode suppression; Mode selection ; Self pulsating
- H01S5/0656—Seeding, i.e. an additional light input is provided for controlling the laser modes, for example by back-reflecting light from an external optical component
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
- H01S5/1028—Coupling to elements in the cavity, e.g. coupling to waveguides adjacent the active region, e.g. forward coupled [DFC] structures
- H01S5/1032—Coupling to elements comprising an optical axis that is not aligned with the optical axis of the active region
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
- H01S5/1071—Ring-lasers
Definitions
- the present invention relates to an optoelectronic device, and in particular to a lasing device that can change an emitted wavelength at high speed.
- Tunable lasers are commonly used as sources in high capacity optical telecommunication systems, such as dense wavelength division multiplexing (DWDM) systems. This technique involves transmitting several optical signals via a single fibre with the optical signals having slightly differing respective wavelengths or frequency.
- Tunable lasers are' also used in photonic switching systems and also find application in other fields, such as spectroscopy and optical sensing.
- a first type is known as a " Y-cavity laser” (see M.J. Kuznetsov, J. of Lightwave Technology, Vol.12, Issue 12, Dec 1994), in which extended tuning (near 40 nm) is achieved by adopting an external interferometer.
- Y-cavity lasers suffer from a limited side mode suppression ratio (SMSR) of less than 25dB.
- GACC grating assisted co-directional coupler
- a third type of conventional tunable laser is the distributed Bragg reflector (DBR) laser family, particularly a device known as a "sampled grating distributed Bragg reflector (SGDBR) laser" which offers a wide tuning range (see L.A. Coldren, IEEE J. of Selected Topics in Quantum Electronics, Vol. 6, Issue 6, Nov-Dec. 2000 and references therein; F. Delorme, IEEE J. of Quantum Electronics, Vol.34 Issue 9, Sep. 1998).
- DBR distributed Bragg reflector
- SGDBR sampling distributed Bragg reflector
- the process of determining the control variables involves processing in several different zones in the multi-dimensional variable space.
- the slow speed of this processing leads to an inadequate tuning speed for efficient operation off, for example, optical packet transmission systems.
- This problem is further compounded by transient phenomena in the laser cavity which have relatively ipng decay times (such as thermal stabilizing time for the grating) .
- SGDBR lasers generally include phase matching components which add complexity and increase the dimensions of the device.
- a further type of tunable laser is a ring laser with intra-cavity tuning means such as a grating distributed reflector or tunable optical filter.
- This generally comprises a ring cavity laser with a grating or filter forming at least part of the ring cavity.
- Known devices generally use rare-earth doped optical fibre to form the ring cavity laser.
- a tuning mechanism is a part of the ring cavity and the laser cavity circumf rence is relatively short, then problems similar to those encountered in tunable SGDBR lasers arise.
- the circumference of the ring cavity determines the photon lifetime and thereby also affects the speed with which such known devices can be tuned. Thus, a greatex circumference is associated with a slower frequency tuning speed.
- a fibre ring cavity laser generally has a circumference of greater than lm and thus a photon round trip time of greater than 5 nanoseconds. Therefore, in such known devices, a tuning- speed on a nanosecond timescale is not possible.
- the present invention seeks to provide a tunable laser in which the problems of conventional tunable lasers are ⁇ at least alleviated.
- a lasing device comprising a ring cavity, a coupling means for extracting laser emission from the ring cavity, and a frequency selection means in connection with the coupling means, wherein the frequency selection means is operable to feed back part of the extracted laser emission into the ring cavity and to select the frequency of the feedback signal, and the frequency selection means is not part of the ring cavity.
- the tunable lasing device as described above can be utilised in an optical communication system.
- a method of changing a lasing frequency of a ring cavity laser comprising operating the ring cavity laser at a first ring cavity resonant frequency, wherein the first ring cavity resonant frequency substantially coincides with a first reflecting frequency of a frequency selection means, controlling the frequency selection means to change the first reflecting frequency to a second reflecting frequency, and operating the ring cavity laser at a second ring cavity resonant frequency, wherein the second ring cavity resonant frequency substantially coincides with the second reflecting frequency of the frequency selection means.
- the frequency selection means of the present invention is not part of the ring cavity, i.e., the ring cavity is close-looped and will work as a resonant cavity without the frequency selection means.
- the tunable laser of the present invention emits precise, discrete wavelengths as determined by the cavity modes of the ring laser cavity. These modes are determined during laser manufacture and can be precisely trimmed to the accurate values required.
- the lasing frequency tuning occurs at a high speed (potentially in the order of nanoseconds) .
- four factors contribute to achieving this high speed tuning.
- a frequency selection means which operates at a high speed is used.
- a lasing frequency lock-in time of the present invention is shorter than that of conventional tunable lasers. Lasing frequency lock-in time refers to the time for an output frequency to stabilize to a predetermined value.
- Lasing frequency lock-in time refers to the time for an output frequency to stabilize to a predetermined value.
- only a single control variable needs to be determined in order to set an operating frequency for the tunable laser.
- the emitted frequency is no longer affected by possible long-term transience (such as thermal drift of the frequency selection means) .
- the preferred embodiments of this invention have a ring cavity circumference of a few millimetres in length, which is considerably shorter than that of conventional tunable fibre ring devices. Laser devices of this short cavity length are capable of high speed tuning owing to the short photon lifetime in the ring cavity.
- Figure 1A is a schematic diagram of a tunable laser in accordance with an embodiment of the present invention
- Figure IB shows a graph illustrating single mode laser' operation of the tunable laser of Figure 1A
- Figure 2A illustrates an enlarged cross-section of an ' optical gain element of a first implementation of the present invention
- Figure 2B illustrates a plan view of a ring cavity laser of a first implementation of the present invention
- Figure 2C illustrates an enlarged cross-section of a grating element of a first implementation of the present invention
- Figure 3A illustrates an enlarged cross-section of an optical gain element of a second implementation of the present invention
- Figure 3B illustrates a plan view of a ring cavity laser of a second implementation of the present invention
- Figure 3C illustrates an enlarged cross-section of an optical coupler of a second implementation of the present invention
- Figure 3D illustrates an enlarged cross-section of a grating element of a second implementation of the present invention.
- Figure 4 illustrates a ring cavity laser of a ' third implementation of the present invention.
- a ring cavity 102 (comprised of a passive optical waveguide) and an optical gain element 104 are connected to a bi-directional optical output coupler 106.
- the optical output coupler 106 has a first port 108 and a second port 110.
- the first port 108 is coupled to an output optical fibre 112 and a second port, 1.10 is coupled-, to a frequency selection means 114 (such as a grating) .
- the optical gain element 104 provides optical gain within a predetermined spectral range and the ring cavity 102 provides a propagation route for circulating photons at one or more frequencies within the predetermined spectral range.
- a laser oscillation in the ring cavity 102 occurs at a laser frequency within the gain spectral range when two operating conditions are met.
- the total optical gain at that laser frequency f L exceeds the total optical loss in the ring cavity 102
- the optical phase delay - associated with a round trip of a photon within the ring cavity 102 is a multiple of 360 degrees.
- the graph of Figure IB illustrates single .mode operation of the ring cavity tunable laser 100.
- the upper section 118 plots the cavity mode frequencies 120 of the ring cavity 102 and shows the laser gain profile 122, and the lower section 124 plots the reflection frequencies 126 of the frequency selection means 114. Where one of the cavity mode frequencies 120 coincides with one of the grating reflection frequencies 126 single mode laser operation is achieved at frequency f L .
- the gain spectral range of the optical gain element 104 (for example, comprising a semiconductor gain medium) usually has a large bandwidth and therefore allows multiple optical frequencies to oscillate at the same time.
- the cavity mode frequencies 120, f m , of the ring cavity 102 are primarily determined by ⁇ the following relationship;
- n is the effective refractive index of the ring cavity 102
- L is the circumference of the ring cavity 102
- nL is the ring cavity optical path length
- m is an integer
- c is the speed of light in a vacuum.
- the ring cavity mode frequency interval ⁇ f is given by;
- varying the circumference of the ring cavity 102 results in altered ring cavity modes 120.
- a frequency selection means 114 has multiple reflecting frequencies 126 (as illustrated in the lower half of Fig. IB), rather than a single reflecting frequency, it is necessary that the reflection frequency intervals of the frequency selection means 114 differ from the ring cavity mode frequency intervals ⁇ f ⁇ .
- Laser emission is initiated by the injection of a pumping energy (e.g., an electric current) into the optical gain element 104.
- a pumping energy e.g., an electric current
- the photon population is increased as the photons pass through the optical gain element 104 until the population gain exceeds the population loss within the ring cavity.
- Laser output is obtained when the photons exit the ring cavity via the bi-directional output coupler 106.
- the frequency selection means 114 selects the lasing frequency of the ring cavity 102 from one of the many ring cavity resonant frequencies. Light output at the selected resonant frequency is reflected and fed back into the ring cavity, thereby enhancing the lasing at the selected ring cavity resonant frequency and suppressing lasing at other ring cavity resonant frequencies due to a mode competition process . This process allows the establishment of lasing at the selected frequency in a short time duration, usually a few nanoseconds. Further, because the selected lasing frequency is determined by the ring cavity according to above formulae, the reflecting frequency band,of the frequency selection means only needs to approximately align with the selected ring cavity resonant frequency to allow sufficient optical feedback. Furthermore, after the establishment of the lasing frequency, any small change in the frequency selection means 114 does not affect the lasing frequency.
- a first set of reflection frequencies of the frequency selection means 114 is determined by applying a first control signal (such as injecting a first current) into the frequency selection means 114 to set a first value to a physical property (such as refractive index) of the frequency selection means 114.
- a first control signal such as injecting a first current
- a physical property such as refractive index
- a second set of reflection frequencies of the frequency selection means 114 is determined by applying a second control signal (such as injecting a second current) into the frequency selection means 114 to set a second value to a physical property (such as refractive index) of the frequency selection means 114.
- a second control signal such as injecting a second current
- a physical property such as refractive index
- the pumping level of the optical gain element can be reduced to a level less than the 1 , ring cavity lasing threshold (which has the effect of switching off the ring cavity laser) .
- the pumping level of the optical gain element is increased to the original level. This has the effect of switching on the ring cavity laser, and so lasing can occur at the second cavity mode frequency.
- the alteration of the control signal such as injected current into the frequency selection means 114 can change the effective refractive index of the frequency selection means 114, and therefore the reflection frequencies of the frequency selection means 114 in approximately 1 nanosecond.
- the optical gain element 200 of a first implementation illustrated in Figure 2A is comprised of a substrate base 202 (such as an III-V semiconductor wafer) onto which an optically active layer 204 is deposited. Further, a semi-insulating semiconductor layer 206, an upper cladding layer 208, a contact layer 210 and finally, ohmic contacts 212 form the upper part of the optical gain element 200.
- a substrate base 202 such as an III-V semiconductor wafer
- an optically active layer 204 is deposited onto which an optically active layer 204 is deposited.
- a semi-insulating semiconductor layer 206, an upper cladding layer 208, a contact layer 210 and finally, ohmic contacts 212 form the upper part of the optical gain element 200.
- Figure 2B shows a complete ring cavity laser 214 including the optical gain element 200 of Figure 2A and a grating element 216 of Figure 2C, all of the first implementation.
- the fabrication process of the ring cavity laser 214 is now described..
- an optically active layer 204 that provides optical gain is deposited on the substrate 202.
- the substrate 202 consists of multiple layers of InGaAsP quaternary compound semiconductor deposited on an Indium Phosphide (InP) substrate.
- InP Indium Phosphide
- the surface is patterned by a photolithography or an electron beam lithography process, followed by an etching process, to form grating corrugations 218.
- the optically active layer 204 is then removed from the substrate 202 except for areas where the optical gain element 200 and the grating element 216 are to be fabricated.
- an optically passive or transparent layer 220 is deposited on the substrate 202 in areas where the optically active layer 204 has been removed.
- the position of this optically passive layer 220 . is vertically aligned to that of the optically active layer 204 (and the thickness of both layers are comparable) .
- the ring cavity laser 214 is then completed by a photolithography process that defines ridge waveguides which form the ring cavity 222, the output coupler 224 and the grating element 216.
- the entire structure is buried in the semi-insulating semiconductor layer 206 (except for the top of the waveguides) and the upper cladding layer 208 and the contact layer 210 are grown on top.
- the ohmic contacts 212 are then formed on the optical gain element 200 and the grating 216.
- the grating element 216 illustrated in Figure 2C is generally a sampled grating reflector formed in a similar way to the optical gain element 200 of Figure 2A.
- the optical gain element 300 of the second implementation illustrated in Figure 3A is comprised of a substrate base 302 onto which an optically passive layer 304 is deposited.
- a spacer layer 306 and an optically active layer 308 form the upper part of the optical gain element 300.
- the optically active layer 308 forms active vertical couplers with the optically passive layer 304 underneath (thereby creating a photonic integrated circuit (PIC) ) .
- Figure 3B shows a complete ring cavity laser 310 including the optical gain element 300 of Figure 3A, the output coupler 312 of Figure 3C and the grating element •3.14 of Figure 3D, all of a second implementation.
- Each feature is monolithically integrated onto the substrate 302.
- the fabrication process of the ring cavity laser 310 is mainly as described for the first implementation of the invention in Figures 2A to 2C, with the following exceptions.
- the passive ring cavity waveguide 316 and the output coupler 312 are formed in the optically passive layer 304. In order to achieve this, the optically active layer 308 is removed from the substrate 302 in these areas .
- the grating element 31 like the gain element 300, is formed in the optically active layer 308. In these areas the active layer is not removed. Light can therefore coupled from the passive layer into the active layer, either to experience optical amplification -.in the gain 'element or to interact with the grating element.
- the width of the waveguide, in the area designated for the grating element 314, is periodically varied to form the grating.
- the grating element 314 can be formed by the etching corrugations in th.e waveguide.
- Figure 4 shows a complete ring cavity laser 400 of a third implementation.
- a ring cavity waveguide 402, an optical gain element 404, a grating element 406 and an output coupler 408 are hybrid integrated onto a planar substrate 410.
- the fabrication process of the ring cavity laser 400 involves deposition of several optically passive layers (not specifically illustrated) onto the substrate 410 which are used to form the ring cavity waveguide 402 and the output coupler 408.
- the optical gain element 404 is a semiconductor optical amplifier which is positioned in a gap where the ring cavity waveguide 402 has been removed for that purpose.
- the length of the gap is suitable for efficient butt- coupling of light into and out of the semiconductor optical amplifier 404.
- the grating element 406 is separately fabricated in a semiconductor waveguide material and butt-coupled to one of the output waveguides 412 of the ring cavity laser 400.
- reflection at the butt-coupled joints is minimized.
- Other anti-reflection means, such as optical coatings can also be employed.
- non- waveguide forms of the invention in which one or more of the ring laser cavity, the output coupling mechanism, the optical gain element, or the frequency selection means are not formed in waveguides.
- the present invention provides a tunable lasing device which has significant advantages over conventional devices .
Landscapes
- Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Optics & Photonics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Plasma & Fusion (AREA)
- Semiconductor Lasers (AREA)
Abstract
Description
Claims
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| AU2003255778A AU2003255778A1 (en) | 2002-08-08 | 2003-08-08 | Tunable ring laser with external grating operating in a single mode |
| US10/524,049 US7376167B2 (en) | 2002-08-08 | 2003-08-08 | Tunable ring laser with external grating operation in a single mode |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| GB0218472A GB2391692A (en) | 2002-08-08 | 2002-08-08 | A lasing device with a ring cavity |
| GB0218472.9 | 2002-08-08 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| WO2004015827A1 true WO2004015827A1 (en) | 2004-02-19 |
Family
ID=9941974
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| PCT/GB2003/003487 Ceased WO2004015827A1 (en) | 2002-08-08 | 2003-08-08 | Tunable ring laser with external grating operating in a single mode |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US7376167B2 (en) |
| CN (1) | CN1675807A (en) |
| AU (1) | AU2003255778A1 (en) |
| GB (1) | GB2391692A (en) |
| WO (1) | WO2004015827A1 (en) |
Families Citing this family (25)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7406107B2 (en) * | 2004-09-29 | 2008-07-29 | Axsun Technologies, Inc. | Semiconductor spectroscopy system |
| KR100759820B1 (en) * | 2006-07-18 | 2007-09-18 | 한국전자통신연구원 | Long cavity single mode laser diode |
| CN101847830A (en) * | 2010-04-02 | 2010-09-29 | 中国科学院半导体研究所 | Multi-wavelength tunable ring laser array chip structure |
| CN101800397B (en) * | 2010-04-09 | 2011-05-18 | 浙江大学 | Semiconductor laser using semi-wave coupled ring resonator to achieve mode selection |
| FR2977987B1 (en) * | 2011-07-11 | 2014-02-14 | Commissariat Energie Atomique | LOOP-SHAPED CAVITY LASER DEVICE CAPABLE OF BEING FONCTINALIZED |
| JP5867509B2 (en) * | 2011-09-08 | 2016-02-24 | 富士通株式会社 | Optical semiconductor device |
| WO2013130065A1 (en) * | 2012-02-29 | 2013-09-06 | Hewlett-Packard Development Company, L.P. | Unidirectional ring lasers |
| US9030732B2 (en) * | 2013-03-12 | 2015-05-12 | Raytheon Company | Suppression of amplified spontaneous emission (ASE) within laser planar waveguide devices |
| CN104242052B (en) * | 2013-06-18 | 2018-01-19 | 中国科学院苏州纳米技术与纳米仿生研究所 | Ring cavity device and preparation method thereof |
| US20160142142A1 (en) * | 2014-03-10 | 2016-05-19 | Alcatel-Lucent Usa Inc. | Spatial-Mode Multiplexing Optical Signal Streams Onto A Multimode Optical Fiber |
| US9019998B1 (en) | 2014-04-02 | 2015-04-28 | King Fahd University Of Petroleum And Minerals | Tunable fiber ring laser with a gain clamped semiconductor optical amplifier |
| US9740080B2 (en) | 2015-10-30 | 2017-08-22 | International Business Machines Corporation | Waveguide switch with tuned photonic microring |
| CN105337149B (en) * | 2015-12-14 | 2018-04-06 | 电子科技大学 | A kind of impulse type narrow cable and wide optical fiber laser based on the modulation of graphene micro optical fiber ring |
| CN108075354A (en) | 2016-11-14 | 2018-05-25 | 中国科学院苏州纳米技术与纳米仿生研究所 | Narrow linewidth laser |
| US10680407B2 (en) * | 2017-04-10 | 2020-06-09 | Hewlett Packard Enterprise Development Lp | Multi-wavelength semiconductor comb lasers |
| US10511143B2 (en) * | 2017-08-31 | 2019-12-17 | Globalfoundries Inc. | III-V lasers with on-chip integration |
| FR3071676B1 (en) * | 2017-09-28 | 2019-10-04 | Commissariat A L'energie Atomique Et Aux Energies Alternatives | GERMANIUM SUSPENDED MEMBRANE LASER SOURCE AND INTEGRATED WAVEGUIDE PARTICIPATING IN FORMING THE OPTICAL CAVITY |
| CN107611774B (en) * | 2017-09-30 | 2019-05-31 | 武汉光迅科技股份有限公司 | A silicon-based integrated tunable laser structure and its control method |
| CN207426394U (en) * | 2017-10-27 | 2018-05-29 | 西安深瞳智控技术有限公司 | A kind of Dan Zong for improving wavelength delivery efficiency touches multi-wavelength tunable Optical Maser System |
| CN107887785B (en) * | 2017-12-04 | 2020-06-16 | 电子科技大学 | A Single-Frequency Fiber Laser Combining Fiber and Waveguide Resonator Ring |
| US10451806B1 (en) * | 2018-06-01 | 2019-10-22 | Honeywell International Inc. | RF frequency synthesis based on offset optical frequency combs in ring resonators |
| CN108845390B (en) * | 2018-07-02 | 2019-11-08 | 南京航空航天大学 | Reflective microring resonator, multi-wavelength optical delayer, photon beamforming chip |
| CN112366517B (en) * | 2020-11-10 | 2022-04-22 | 中国科学院半导体研究所 | Tuned Laser Chip |
| US20250392101A1 (en) * | 2021-09-01 | 2025-12-25 | Hewlett Packard Enterprise Development Lp | Bandwidth enhancement of quantum dot/well hybrid iii-v/silicon micro-ring lasers |
| CN119209181B (en) * | 2024-09-26 | 2026-04-21 | 陕西科技大学 | A semiconductor laser linewidth compression system based on hybrid optical feedback |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5231642A (en) * | 1992-05-08 | 1993-07-27 | Spectra Diode Laboratories, Inc. | Semiconductor ring and folded cavity lasers |
| US6324204B1 (en) * | 1999-10-19 | 2001-11-27 | Sparkolor Corporation | Channel-switched tunable laser for DWDM communications |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4314210A (en) * | 1979-11-23 | 1982-02-02 | Jersey Nuclear-Avco Isotopes, Inc. | Mode-locking and chirping system for lasers |
| US5416583A (en) * | 1993-07-30 | 1995-05-16 | Kearfott Guidance & Navigation Corporation | Quantum well bias mirror for phase modulation in a ring laser gyroscope |
| JPH0964440A (en) * | 1995-08-23 | 1997-03-07 | Furukawa Electric Co Ltd:The | Optical fiber laser |
| US6289032B1 (en) * | 1998-04-16 | 2001-09-11 | Governing Council Of The University Of Toronto | Self-collimating multiwavelength lasers |
| US6134250A (en) * | 1998-05-14 | 2000-10-17 | Lucent Technologies Inc. | Wavelength-selectable fiber ring laser |
| US6243517B1 (en) * | 1999-11-04 | 2001-06-05 | Sparkolor Corporation | Channel-switched cross-connect |
| US6856641B2 (en) * | 2001-01-26 | 2005-02-15 | California Institute Of Technology | Ring resonator based narrow-linewidth semiconductor lasers |
-
2002
- 2002-08-08 GB GB0218472A patent/GB2391692A/en not_active Withdrawn
-
2003
- 2003-08-08 US US10/524,049 patent/US7376167B2/en not_active Expired - Fee Related
- 2003-08-08 WO PCT/GB2003/003487 patent/WO2004015827A1/en not_active Ceased
- 2003-08-08 AU AU2003255778A patent/AU2003255778A1/en not_active Abandoned
- 2003-08-08 CN CN03819193.8A patent/CN1675807A/en active Pending
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5231642A (en) * | 1992-05-08 | 1993-07-27 | Spectra Diode Laboratories, Inc. | Semiconductor ring and folded cavity lasers |
| US6324204B1 (en) * | 1999-10-19 | 2001-11-27 | Sparkolor Corporation | Channel-switched tunable laser for DWDM communications |
Non-Patent Citations (3)
| Title |
|---|
| LI WEI ET AL: "Er-doped fiber ring laser with an external fiber Bragg grating", LASERS AND ELECTRO-OPTICS SOCIETY ANNUAL MEETING, 1997. LEOS '97 10TH ANNUAL MEETING. CONFERENCE PROCEEDINGS., IEEE SAN FRANCISCO, CA, USA 10-13 NOV. 1997, NEW YORK, NY, USA,IEEE, US, 10 November 1997 (1997-11-10), pages 382 - 383, XP010252795, ISBN: 0-7803-3895-2 * |
| LIAW S-K ET AL: "Power equalized wavelength-selective fiber lasers using fiber Bragg gratings", OPTICS COMMUNICATIONS, NORTH-HOLLAND PUBLISHING CO. AMSTERDAM, NL, vol. 155, no. 4-6, 15 October 1998 (1998-10-15), pages 255 - 259, XP004146448, ISSN: 0030-4018 * |
| YANG J ET AL: "Wideband wavelength tunable fiber ring laser with flattened output power spectrum", OPTICS COMMUNICATIONS, NORTH-HOLLAND PUBLISHING CO. AMSTERDAM, NL, vol. 210, no. 3-6, 15 September 2002 (2002-09-15), pages 313 - 318, XP004380469, ISSN: 0030-4018 * |
Also Published As
| Publication number | Publication date |
|---|---|
| US20060153268A1 (en) | 2006-07-13 |
| AU2003255778A1 (en) | 2004-02-25 |
| GB0218472D0 (en) | 2002-09-18 |
| GB2391692A (en) | 2004-02-11 |
| US7376167B2 (en) | 2008-05-20 |
| CN1675807A (en) | 2005-09-28 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US7376167B2 (en) | Tunable ring laser with external grating operation in a single mode | |
| Wesstrom et al. | State-of-the-art performance of widely tunable modulated grating Y-branch lasers | |
| US6940878B2 (en) | Tunable laser using microring resonator | |
| US6574398B2 (en) | Direct-coupled multimode WDM optical data links with monolithically-integrated multiple-channel VCSEL and photodetector arrays | |
| US6198863B1 (en) | Optical filters | |
| US20100142568A1 (en) | Wavelength tunable filter and wavelength tunable laser module | |
| US6687267B2 (en) | Widely tunable laser | |
| US6693937B2 (en) | Integrated tunable laser | |
| Segawa et al. | Semiconductor double-ring-resonator-coupled tunable laser for wavelength routing | |
| Segawa et al. | Full $ C $-Band Tuning Operation of Semiconductor Double-Ring Resonator-Coupled Laser With Low Tuning Current | |
| JP2002299755A (en) | Fast and broadband tunable laser | |
| US11152764B1 (en) | Gratings for high power single mode laser | |
| US20050249256A1 (en) | Wavelength switchable semiconductor laser | |
| JP5001239B2 (en) | Semiconductor tunable laser | |
| US7382817B2 (en) | V-coupled-cavity semiconductor laser | |
| JP3266497B2 (en) | Laser equipment | |
| JP2947142B2 (en) | Tunable semiconductor laser | |
| JP2012256667A (en) | Semiconductor laser light source | |
| EP0316194B1 (en) | A tunable wavelength filter | |
| US20050243882A1 (en) | Dual-wavelength semiconductor laser | |
| US6763165B1 (en) | Grating assisted coupler with controlled start | |
| JPH11103126A (en) | Semiconductor optical element and its manufacture | |
| JP6927153B2 (en) | Semiconductor laser | |
| WO2005060058A1 (en) | Semiconductor laser and its manufacturing method | |
| JP3311238B2 (en) | Optical semiconductor device and method of manufacturing the same |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| AK | Designated states |
Kind code of ref document: A1 Designated state(s): AE AG AL AM AT AU AZ BA BB BG BR BY BZ CA CH CN CO CR CU CZ DE DK DM DZ EC EE ES FI GB GD GE GH GM HR HU ID IL IN IS JP KE KG KP KR KZ LC LK LR LS LT LU LV MA MD MG MK MN MW MX MZ NI NO NZ OM PG PH PL PT RO RU SC SD SE SG SK SL SY TJ TM TN TR TT TZ UA UG US UZ VC VN YU ZA ZM ZW |
|
| AL | Designated countries for regional patents |
Kind code of ref document: A1 Designated state(s): GH GM KE LS MW MZ SD SL SZ TZ UG ZM ZW AM AZ BY KG KZ MD RU TJ TM AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IT LU MC NL PT RO SE SI SK TR BF BJ CF CG CI CM GA GN GQ GW ML MR NE SN TD TG |
|
| 121 | Ep: the epo has been informed by wipo that ep was designated in this application | ||
| WWE | Wipo information: entry into national phase |
Ref document number: 20038191938 Country of ref document: CN |
|
| 122 | Ep: pct application non-entry in european phase | ||
| ENP | Entry into the national phase |
Ref document number: 2006153268 Country of ref document: US Kind code of ref document: A1 |
|
| WWE | Wipo information: entry into national phase |
Ref document number: 10524049 Country of ref document: US |
|
| WWP | Wipo information: published in national office |
Ref document number: 10524049 Country of ref document: US |
|
| NENP | Non-entry into the national phase |
Ref country code: JP |
|
| WWW | Wipo information: withdrawn in national office |
Country of ref document: JP |