WO2003092015A1 - Redundancy in chained memory architectures - Google Patents

Redundancy in chained memory architectures Download PDF

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Publication number
WO2003092015A1
WO2003092015A1 PCT/EP2003/004004 EP0304004W WO03092015A1 WO 2003092015 A1 WO2003092015 A1 WO 2003092015A1 EP 0304004 W EP0304004 W EP 0304004W WO 03092015 A1 WO03092015 A1 WO 03092015A1
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WO
WIPO (PCT)
Prior art keywords
memory
chain
bitline
integrated circuit
memory cells
Prior art date
Application number
PCT/EP2003/004004
Other languages
French (fr)
Inventor
Norbert Rehm
Hans-Oliver Joachim
Joerg Wohlfahrt
Thomas Roehr
Original Assignee
Infineon Technologies Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Infineon Technologies Ag filed Critical Infineon Technologies Ag
Priority to DE60314861T priority Critical patent/DE60314861T2/en
Priority to KR1020047017085A priority patent/KR100575289B1/en
Priority to EP03722498A priority patent/EP1500109B1/en
Priority to JP2004500300A priority patent/JP2005523557A/en
Publication of WO2003092015A1 publication Critical patent/WO2003092015A1/en

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Classifications

    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C7/00Arrangements for writing information into, or reading information out from, a digital store
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C29/00Checking stores for correct operation ; Subsequent repair; Testing stores during standby or offline operation
    • G11C29/70Masking faults in memories by using spares or by reconfiguring
    • G11C29/78Masking faults in memories by using spares or by reconfiguring using programmable devices
    • G11C29/80Masking faults in memories by using spares or by reconfiguring using programmable devices with improved layout
    • G11C29/816Masking faults in memories by using spares or by reconfiguring using programmable devices with improved layout for an application-specific layout
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C29/00Checking stores for correct operation ; Subsequent repair; Testing stores during standby or offline operation
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C11/00Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
    • G11C11/21Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements
    • G11C11/22Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using ferroelectric elements

Definitions

  • Ferroelectric metal oxide ceramic materials such as lead zirconate titanate (PZT) have been investigated for use in ferroelectric semiconductor memory devices.
  • Other ferroelectric materials for example, strontium bismuth tantalum (SBT) can also be used.
  • the ferroelectric material is located between two electrodes to form a ferroelectric capacitor for storage of information.
  • a ferroelectric capacitor uses the hysteresis polarization characteristic of the ferroelectric material for storing information.
  • the logic value stored in the memory cell depends on the polarization direction of the ⁇ ferroelectric capacitor.
  • a voltage which is greater than the switching voltage (coercive voltage) needs to be applied across its electrodes.
  • the polarization of the capacitor depends on the polarity of the voltage applied.
  • Fig. 1 shows a pair of bitlines (bitline BL and bitline complement /BL) .
  • Each of the bitlines includes a group of memory cells (110a or 110b) .
  • the memory cells 140 of a group each with a transistor 142 coupled to a capacitor 144 in parallel, are coupled in series to form a chain.
  • Such a memory architecture is described in, for example, Takashima et al . , "High Density Chain ferroelectric random access Memory (chain FRAM)", IEEE Jrnl. of Solid State Circuits, vol.33, pp.787-792, May 1998, which is herein incorporated by reference for all purposes.
  • a sense amplifier “not shown” is coupled to the bitlines to facilitate access to the memory cell.
  • the gates of the cell transistors can be gate conductors which are coupled to or serve as wordlines.
  • a selection transistor 130 is provided to selectively couple one end of the chain to its respective bitline (e.g., 130a couples chain 110a to BL and 130b couples chain 110b to /BL) .
  • a plateline is coupled to the other end of the chain (e.g., PL or /PL) .
  • Numerous bitline pairs or columns are interconnected via wordlines to form a memory block.
  • Redundant memory elements can be provided to repair defective cells.
  • One type of redundancy scheme is referred to as row or wordline redundancy. In row redundancy, the wordline corresponding to the defective cell is replaced with a redundant row of cells via redundancy circuitry. Redundancy schemes allow some defective ICs to be repaired, thus increasing yield which reduces manuf cturing costs .
  • a memory chain includes x number of first memory cells, where x is equal to or greater than 2 and m second memory cells, where m is equal to or greater than 1.
  • the first memory cells are used for storage of information and the second memory cells are used to repair defective first memory cells.
  • Fig. 1 shows the column of memory cells arranged in a conventional chained architecture
  • Fig. 2 shows a column of memory cells in accordance with one embodiment of the invention.
  • the gates of the cell transistors can be gate conductors which are coupled to or serve -as wordlines.
  • the memory cells are addressed by wordlines
  • a selection transistor 230 is provided to selectively couple one end of the chain to its respective bitline (e.g., 230a couples chain 210a to BL and 230b couples chain 210b to /BL) .
  • Selection transistor 230a is controlled by control signal BS 0 and selection transistor 230b is controlled by control signal BSi. If chain 210a is selected, control signal BS 0 is activated to couple it to the BL. On the other hand, control signal BSi is activated if chain 210b is selected.
  • a plateline is coupled to the other end of the chain (e.g., PL or /PL) .
  • the chain on BL is coupled to PL; the chain on /BL is coupled to /PL. Numerous bitline pairs are interconnected via wordlines to form a memory block.
  • a memory chain includes R number of redundant cells 222,
  • R 2 redundant cells
  • the number of cells within the chain is equal X + R.
  • the redundant cells are addressed via redundant wordlines RWL 0 -RWL R _ ⁇ .
  • the redundant memory cells are located at the first end of the chain, between the memory cells of the chain and selection transistor. Locating the redundant cells in other parts of the chain is also useful. It is further understood that the redundant cells need not necessarily be adjacent to each other (i.e., grouped together).
  • a redundant wordline can be used to replace the defective one. This also holds true for any number of defects in the block along the same wordline. If additional defects occur on other wordlines, other redundant wordlines can be used to replace those defective ones, so long as there are sufficient number of redundant wordlines available. For a memory chain with 8 cells, only four fuses are needed (3 bits for addressing and 1 bit to serve as a master fuse to indicate redundancy) to effect redundancy for each redundant wordline.
  • Memory chains 210c-d can also be provided on the bitline pairs on the other side of the platelines, forming left and right sections 276 and 278.
  • Selection transistors on the right section are controlled by separate control signals.
  • selection transistor 230c is controlled by BS 2 signal and selection transistor 230d is controlled by BS 3 .
  • the appropriate control signal is activated to connect the selected chain to the bitline.
  • the cells 227 on the right side of the block are addressed by different wordlines (e.g., WL a -WL ⁇ 5 ) .
  • redundant cells 223 are provided. As shown, the chains are provided with 2 redundant cells.
  • a defective wordline can be replaced with a redundant wordline instead of a whole block.
  • the redundancy element has a lower probability of failure.
  • chain size is also more flexible.

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  • Engineering & Computer Science (AREA)
  • Computer Hardware Design (AREA)
  • For Increasing The Reliability Of Semiconductor Memories (AREA)

Abstract

An improved redundancy scheme for chained memory architecture is disclosed. The redundany scheme comprises including redundant cells as part of the memory chain. As such, a redundant cell is used to repair a defective cell within the chain. This eliminates the need in conventional chained architecture to replace the whole memory block when there is a defective cell.

Description

REDUNDANCY IN CHAINED MEMORY ARCHITECTURES
FIELD OF THE INVENTION
The present invention relates to memory integrated circuits (ICs) . More particularly, the invention relates to implementation of redundancy in a chained memory architecture.
BACKGROUND OF THE INVENTION Ferroelectric metal oxide ceramic materials such as lead zirconate titanate (PZT) have been investigated for use in ferroelectric semiconductor memory devices. Other ferroelectric materials, for example, strontium bismuth tantalum (SBT) can also be used. The ferroelectric material is located between two electrodes to form a ferroelectric capacitor for storage of information. A ferroelectric capacitor uses the hysteresis polarization characteristic of the ferroelectric material for storing information. The logic value stored in the memory cell depends on the polarization direction of the ferroelectric capacitor. To change the polarization direction of the capacitor, a voltage which is greater than the switching voltage (coercive voltage) needs to be applied across its electrodes. The polarization of the capacitor depends on the polarity of the voltage applied. An advantage of the ferroelectric capacitor is that it retains its polarization state after power is removed, resulting in a non-volatile memory cell.
Fig. 1 shows a pair of bitlines (bitline BL and bitline complement /BL) . Each of the bitlines includes a group of memory cells (110a or 110b) . The memory cells 140 of a group, each with a transistor 142 coupled to a capacitor 144 in parallel, are coupled in series to form a chain. Such a memory architecture is described in, for example, Takashima et al . , "High Density Chain ferroelectric random access Memory (chain FRAM)", IEEE Jrnl. of Solid State Circuits, vol.33, pp.787-792, May 1998, which is herein incorporated by reference for all purposes. A sense amplifier "not shown" is coupled to the bitlines to facilitate access to the memory cell. The gates of the cell transistors can be gate conductors which are coupled to or serve as wordlines. A selection transistor 130 is provided to selectively couple one end of the chain to its respective bitline (e.g., 130a couples chain 110a to BL and 130b couples chain 110b to /BL) . A plateline is coupled to the other end of the chain (e.g., PL or /PL) . Numerous bitline pairs or columns are interconnected via wordlines to form a memory block. Redundant memory elements can be provided to repair defective cells. One type of redundancy scheme is referred to as row or wordline redundancy. In row redundancy, the wordline corresponding to the defective cell is replaced with a redundant row of cells via redundancy circuitry. Redundancy schemes allow some defective ICs to be repaired, thus increasing yield which reduces manuf cturing costs .
However, in a chained architecture, the wordlines of a block are interdependent. Due to this interdependence, a redundant element or unit has to be the same size as the block. This means that repairing a defective cell in a block requires replacement of the whole block. Since the redundant element is the same size as the block, it can repair any number of defects within the block. With respect to defects in other blocks, one additional redundant block needs to be provided for each block to be repaired. Thus, conventional redundancy schemes in chained architecture are very inefficient and utilize significant chip area. Additionally, the relatively large number of cells in a redundant element increases the probability of a failure in the redundant element itself . From the foregoing discussion, it is desirable to provide an improved redundancy in ICs with chained architecture.
SUMMARY OF THE INVENTION
The invention relates to improved redundancy schemes in chained memory architectures. In one embodiment, a memory chain includes x number of first memory cells, where x is equal to or greater than 2 and m second memory cells, where m is equal to or greater than 1. The first memory cells are used for storage of information and the second memory cells are used to repair defective first memory cells. By integrating redundant cells as part of the memory chain having normal storage cells, repairing a defective cell in a memory chain does not require replacement of the whole memory block in which the defective cell is located, as necessary in conventional memory chain architectures .
BRIEF DESCRIPTION OF DRAWINGS
Fig. 1 shows the column of memory cells arranged in a conventional chained architecture; and
Fig. 2 shows a column of memory cells in accordance with one embodiment of the invention. DETAILED DESCRIPTION OF THE INVENTION
Fig. 2 shows a portion 201 of an IC with redundancy in accordance with one embodiment of the invention. A pair of bitlines (BL and /BL) which represents a column is shown. A plurality of columns are interconnected by wordlines to form a memory block or array. A sense amplifier 295 is coupled to one end of the bitlines. The bitlines each includes a memory chain (210a or 210b) . The memory cells 240 of a chain, each with a transistor 242 coupled to a capacitor 244 in parallel, are coupled in series. The memory chain comprises X number of cells 226, where X is a whole number. For practical reasons, X is at least 2. Illustratively, a chain comprises 8 memory cells. Memory chains of other sizes are also useful. Preferably, the memory chain comprises 2Y memory
cells, where y is > 1. The gates of the cell transistors can be gate conductors which are coupled to or serve -as wordlines. The memory cells are addressed by wordlines
A selection transistor 230 is provided to selectively couple one end of the chain to its respective bitline (e.g., 230a couples chain 210a to BL and 230b couples chain 210b to /BL) . Selection transistor 230a is controlled by control signal BS0 and selection transistor 230b is controlled by control signal BSi. If chain 210a is selected, control signal BS0 is activated to couple it to the BL. On the other hand, control signal BSi is activated if chain 210b is selected. A plateline is coupled to the other end of the chain (e.g., PL or /PL) .
In one embodiment, the chain on BL is coupled to PL; the chain on /BL is coupled to /PL. Numerous bitline pairs are interconnected via wordlines to form a memory block.
In accordance with one embodiment of the invention, a memory chain includes R number of redundant cells 222,
where R is a whole number > 1. Repairability of the block is directly related to R (i.e., the higher R is,- the higher the repairability) . Illustratively, the chain includes 2 redundant cells (i.e., R = 2) . When providing redundant cells within the chain (i.e., intra-chain redundancy) , the number of cells within the chain is equal X + R. The redundant cells are addressed via redundant wordlines RWL0-RWLR_ι. In one embodiment, the redundant memory cells are located at the first end of the chain, between the memory cells of the chain and selection transistor. Locating the redundant cells in other parts of the chain is also useful. It is further understood that the redundant cells need not necessarily be adjacent to each other (i.e., grouped together). If a defective cell occurs on one of the wordlines of the chain, a redundant wordline can be used to replace the defective one. This also holds true for any number of defects in the block along the same wordline. If additional defects occur on other wordlines, other redundant wordlines can be used to replace those defective ones, so long as there are sufficient number of redundant wordlines available. For a memory chain with 8 cells, only four fuses are needed (3 bits for addressing and 1 bit to serve as a master fuse to indicate redundancy) to effect redundancy for each redundant wordline.
Memory chains 210c-d can also be provided on the bitline pairs on the other side of the platelines, forming left and right sections 276 and 278. Selection transistors on the right section, in one embodiment, are controlled by separate control signals. For example, selection transistor 230c is controlled by BS2 signal and selection transistor 230d is controlled by BS3. Depending on which section and which chain is selected, the appropriate control signal is activated to connect the selected chain to the bitline. In one embodiment, the cells 227 on the right side of the block are addressed by different wordlines (e.g., WLa-WLι5) . Like the chains on the left section, redundant cells 223 are provided. As shown, the chains are provided with 2 redundant cells.
However, it is not necessary that the chains on the right section have the same number of redundant and memory cells as the left section. As described, intra-chain redundancy in accordance with the invention enables more efficient use of redundant elements, compared to conventional approaches.
For example, a defective wordline can be replaced with a redundant wordline instead of a whole block. Furthermore, since fewer cells are used, the redundancy element has a lower probability of failure. Also, chain size is also more flexible.
While the invention has been particularly shown and described with reference to various embodiments, it will be recognized by those skilled in the art that modifications and changes may be made to the present invention without departing from the spirit and scope thereof. The scope of the' invention should therefore be determined not with reference to the above description but with reference to the appended claims- along with their full scope of equivalents .

Claims

What is claimed is:
1. An integrated circuit comprising: x first memory cells, where x is greater that or equal to 2, the first memory cells serve as storage memory cells;
m second memory cells, where m is equal to or greater than 1, the second memory cells serve as redundant memory cells, wherein a second memory cell is used to repair a defective first memory cell; and
the first and second memory cells are grouped in a chain.
2. The integrated circuit of claim 1 wherein the memory cells are ferroelectric memory cells.
3. The integrated circuit of claim 2 wherein x is equal 2^ and t is equal to or greater than 1.
4. The integrated circuit of claim 1 wherein x is equal 2^ and t is equal to or greater than 1.
5. The integrated circuit of claim 1 wherein a first end of the chain is coupled to a bitline and a second end is coupled to a plateline.
6. The integrated circuit of claim 5 wherein the first end of the chain is coupled to the bitline via a selection transistor.
7. The integrated circuit of claim 6 further comprising: a second memory chain having a first end coupled to a second bitline via a second selection transistor and a second end coupled to a second plateline, the second memory chain includes x first memory cells and m second memory cells, the bitline and second bitline forming a bitline pair; first and second control signal for controlling the first and second selection transistors.
8. The integrated circuit of claim 7 further comprising a plurality of the bitline pairs to form a memory block.
9. The integrated circuit of claim 7 further comprising a third memory chain having a first end coupled to the bitline via a third selection transistor and a second end coupled to the plateline;
a fourth memory chain having a first end coupled to the second bitline via a fourth selection transistor and a second end coupled to the second plateline, the third and fourth memory chains each comprises y first memory cells, where y is equal to or greater than 1, and n second memory cells, and n is equal to or greater than 1.
10. The integrated circuit of claim 9 further comprising a plurality of the bitline pairs to form a memory block.
11. The integrated circuit of claim 9 further comprising third and fourth control signals for controlling the third and fourth selection transistors.
12. The integrated circuit of claim 11 further comprising a plurality of the bitline pairs to form a memory block.
13. The integrated circuit of claim 9 wherein n = m and y = x.
14. The integrated circuit of clia 13 further comprising third and fourth control signals for controlling the third and fourth selection transistors.
15. The integrated circuit of claim 14 further comprising a plurality of the bitline pairs to form a memory block.
16. The integrated circuit of claim 5 further comprising a second memory chain having a first end coupled to a second bitline and a second end coupled to a second plateline, the second memory chain includes x first memory cells and m second memory cells, the bitline and second bitline forming a bitline pair.
17. The integrated circuit of claim 16 further comprising a plurality of the bitline pairs to form a memory block.
18. The integrated circuit of claim 16 further comprising: a third memory chain having a first end coupled to the bitline and a second end coupled to the plateline;
a fourth memory chain having a first end coupled to the second bitline and a second end coupled to the second plateline, teh third and fourth memory chains each comprises y first memory cells, where y is equal to or greater than 1, and n second memory cells, where n is equal to or greater than 1.
19. The integrated circuit of claim 18 wherein n = m and y = x.
20. The integrated circuit of claim 19 further comprising a plurality of the bitline pairs to form a memory block.
PCT/EP2003/004004 2002-04-26 2003-04-16 Redundancy in chained memory architectures WO2003092015A1 (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
DE60314861T DE60314861T2 (en) 2002-04-26 2003-04-16 REDUNDANCY FOR CHAIN STORAGE ARCHITECTURES
KR1020047017085A KR100575289B1 (en) 2002-04-26 2003-04-16 Redundancy in chained memory architectures
EP03722498A EP1500109B1 (en) 2002-04-26 2003-04-16 Redundancy in chained memory architectures
JP2004500300A JP2005523557A (en) 2002-04-26 2003-04-16 Redundancy in chained memory structures

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10/133,764 US6856560B2 (en) 2002-04-26 2002-04-26 Redundancy in series grouped memory architecture
US10/133,764 2002-04-26

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WO2003092015A1 true WO2003092015A1 (en) 2003-11-06

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US (1) US6856560B2 (en)
EP (1) EP1500109B1 (en)
JP (1) JP2005523557A (en)
KR (1) KR100575289B1 (en)
CN (1) CN1650370A (en)
DE (1) DE60314861T2 (en)
TW (1) TWI220991B (en)
WO (1) WO2003092015A1 (en)

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JP2007066448A (en) * 2005-08-31 2007-03-15 Toshiba Corp Ferroelectric semiconductor memory device
JP4996177B2 (en) * 2006-08-30 2012-08-08 富士通セミコンダクター株式会社 Semiconductor memory device and data reading method
JP5123140B2 (en) * 2008-11-12 2013-01-16 株式会社東芝 Ferroelectric memory
US20100145871A1 (en) * 2008-12-10 2010-06-10 Moshe Kesem Paperless system and method for delivering mail

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EP0537973A2 (en) * 1991-10-14 1993-04-21 Kabushiki Kaisha Toshiba Nand-cell type electrically erasable and programmable read- only memory with redundancy circuit
US5898615A (en) * 1997-03-19 1999-04-27 Fujitsu Limited Semiconductor memory device having non-volatile memory cells connected in series
US5903492A (en) * 1996-06-10 1999-05-11 Kabushiki Kaisha Toshiba Semiconductor memory device and various systems mounting them
US6317355B1 (en) * 1999-09-15 2001-11-13 Hyundai Electronics Industries Co., Ltd. Nonvolatile ferroelectric memory device with column redundancy circuit and method for relieving failed address thereof

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EP1141835B1 (en) * 1998-12-22 2002-07-31 Infineon Technologies AG Integrated memory with redundancy
JP4040243B2 (en) * 2000-09-08 2008-01-30 株式会社東芝 Ferroelectric memory
TW512520B (en) * 2001-01-19 2002-12-01 Fujitsu Ltd Semiconductor memory

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0537973A2 (en) * 1991-10-14 1993-04-21 Kabushiki Kaisha Toshiba Nand-cell type electrically erasable and programmable read- only memory with redundancy circuit
US5903492A (en) * 1996-06-10 1999-05-11 Kabushiki Kaisha Toshiba Semiconductor memory device and various systems mounting them
US5898615A (en) * 1997-03-19 1999-04-27 Fujitsu Limited Semiconductor memory device having non-volatile memory cells connected in series
US6317355B1 (en) * 1999-09-15 2001-11-13 Hyundai Electronics Industries Co., Ltd. Nonvolatile ferroelectric memory device with column redundancy circuit and method for relieving failed address thereof

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Publication number Publication date
TW200307943A (en) 2003-12-16
DE60314861T2 (en) 2008-03-20
JP2005523557A (en) 2005-08-04
EP1500109B1 (en) 2007-07-11
CN1650370A (en) 2005-08-03
US6856560B2 (en) 2005-02-15
DE60314861D1 (en) 2007-08-23
EP1500109A1 (en) 2005-01-26
KR100575289B1 (en) 2006-04-28
KR20050004149A (en) 2005-01-12
TWI220991B (en) 2004-09-11
US20030202386A1 (en) 2003-10-30

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