WO2003056066A3 - Apparatus for the generation and supply of fluorine gas - Google Patents
Apparatus for the generation and supply of fluorine gas Download PDFInfo
- Publication number
- WO2003056066A3 WO2003056066A3 PCT/EP2002/014909 EP0214909W WO03056066A3 WO 2003056066 A3 WO2003056066 A3 WO 2003056066A3 EP 0214909 W EP0214909 W EP 0214909W WO 03056066 A3 WO03056066 A3 WO 03056066A3
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- gas
- supply
- cylinder
- electrolytic cell
- generation
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
- C25B15/00—Operating or servicing cells
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
- C25B1/00—Electrolytic production of inorganic compounds or non-metals
- C25B1/01—Products
- C25B1/24—Halogens or compounds thereof
- C25B1/245—Fluorine; Compounds thereof
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/4401—Means for minimising impurities, e.g. dust, moisture or residual gas, in the reaction chamber
- C23C16/4405—Cleaning of reactor or parts inside the reactor by using reactive gases
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
- C25B15/00—Operating or servicing cells
- C25B15/02—Process control or regulation
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Metallurgy (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Electrochemistry (AREA)
- Inorganic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Mechanical Engineering (AREA)
- Automation & Control Theory (AREA)
- Electrolytic Production Of Non-Metals, Compounds, Apparatuses Therefor (AREA)
- Feeding, Discharge, Calcimining, Fusing, And Gas-Generation Devices (AREA)
- Drying Of Semiconductors (AREA)
Abstract
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US10/500,406 US20050161321A1 (en) | 2001-12-27 | 2002-12-20 | Apparatus for the generation and supply of fluorine gas |
AU2002367093A AU2002367093A1 (en) | 2001-12-27 | 2002-12-20 | Apparatus for the generation and supply of fluorine gas |
KR10-2004-7010078A KR20040075034A (en) | 2001-12-27 | 2002-12-20 | Apparatus for the Generation and Supply of Fluorine Gas |
EP02805785A EP1461475A2 (en) | 2001-12-27 | 2002-12-20 | Apparatus for the generation and supply of fluorine gas |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2001/397278 | 2001-12-27 | ||
JP2001397278A JP3725822B2 (en) | 2001-12-27 | 2001-12-27 | Fluorine gas generation and supply equipment |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2003056066A2 WO2003056066A2 (en) | 2003-07-10 |
WO2003056066A3 true WO2003056066A3 (en) | 2004-03-25 |
Family
ID=19189170
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/EP2002/014909 WO2003056066A2 (en) | 2001-12-27 | 2002-12-20 | Apparatus for the generation and supply of fluorine gas |
Country Status (8)
Country | Link |
---|---|
US (1) | US20050161321A1 (en) |
EP (1) | EP1461475A2 (en) |
JP (1) | JP3725822B2 (en) |
KR (1) | KR20040075034A (en) |
CN (1) | CN1608146A (en) |
AU (1) | AU2002367093A1 (en) |
TW (1) | TWI252214B (en) |
WO (1) | WO2003056066A2 (en) |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3569277B1 (en) * | 2003-05-28 | 2004-09-22 | 東洋炭素株式会社 | Current control method and current control device for gas generator |
JP3725145B2 (en) * | 2003-07-14 | 2005-12-07 | 東洋炭素株式会社 | Molten salt electrolytic bath control device and control method thereof |
JP4018726B2 (en) | 2006-02-07 | 2007-12-05 | 東洋炭素株式会社 | Semiconductor manufacturing plant |
JP5659491B2 (en) * | 2009-01-30 | 2015-01-28 | セントラル硝子株式会社 | Semiconductor manufacturing equipment including fluorine gas generator |
JP2013507629A (en) * | 2009-10-16 | 2013-03-04 | ゾルファイ フルーオル ゲゼルシャフト ミット ベシュレンクテル ハフツング | High purity fluorine gas, its generation and use, and method for monitoring impurities in fluorine gas |
US20130017644A1 (en) * | 2011-02-18 | 2013-01-17 | Air Products And Chemicals, Inc. | Fluorine Based Chamber Clean With Nitrogen Trifluoride Backup |
TWI458843B (en) * | 2011-10-06 | 2014-11-01 | Ind Tech Res Inst | Evaporation apparatus and method of forminf organic film |
CN104651873A (en) * | 2014-12-22 | 2015-05-27 | 四川聚核科技有限公司 | Intelligentized container modularized middle-temperature electrolytic fluorine-preparing device |
JP2016134569A (en) * | 2015-01-21 | 2016-07-25 | 株式会社東芝 | Semiconductor manufacturing equipment |
FR3111133A1 (en) * | 2020-06-04 | 2021-12-10 | Université du Mans | AUTOMATED CHEMICAL TREATMENT PROCESS OF A SOLID SUBSTRATE BY A FLUORATION LINE |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0857796A2 (en) * | 1993-07-30 | 1998-08-12 | Applied Materials, Inc. | Apparatus for the low temperature etching of cold-wall CVD reactors |
JP2001267241A (en) * | 2000-03-10 | 2001-09-28 | L'air Liquide | Method and apparatus for cleaning, and method and apparatus for etching |
WO2001077412A1 (en) * | 2000-04-07 | 2001-10-18 | Toyo Tanso Co., Ltd. | Apparatus for generating fluorine gas |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
AU543291B2 (en) * | 1981-01-06 | 1985-04-18 | Medishield Corp. Ltd. | Gas switching device |
GB9418598D0 (en) * | 1994-09-14 | 1994-11-02 | British Nuclear Fuels Plc | Fluorine cell |
US6343627B1 (en) * | 1998-09-03 | 2002-02-05 | Nippon Sanso Corporation | Feed device for large amount of semiconductor process gas |
-
2001
- 2001-12-27 JP JP2001397278A patent/JP3725822B2/en not_active Expired - Fee Related
-
2002
- 2002-12-20 CN CNA028261534A patent/CN1608146A/en active Pending
- 2002-12-20 KR KR10-2004-7010078A patent/KR20040075034A/en not_active Application Discontinuation
- 2002-12-20 AU AU2002367093A patent/AU2002367093A1/en not_active Abandoned
- 2002-12-20 EP EP02805785A patent/EP1461475A2/en not_active Withdrawn
- 2002-12-20 WO PCT/EP2002/014909 patent/WO2003056066A2/en not_active Application Discontinuation
- 2002-12-20 US US10/500,406 patent/US20050161321A1/en not_active Abandoned
- 2002-12-23 TW TW091136993A patent/TWI252214B/en not_active IP Right Cessation
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0857796A2 (en) * | 1993-07-30 | 1998-08-12 | Applied Materials, Inc. | Apparatus for the low temperature etching of cold-wall CVD reactors |
JP2001267241A (en) * | 2000-03-10 | 2001-09-28 | L'air Liquide | Method and apparatus for cleaning, and method and apparatus for etching |
WO2001077412A1 (en) * | 2000-04-07 | 2001-10-18 | Toyo Tanso Co., Ltd. | Apparatus for generating fluorine gas |
EP1283280A1 (en) * | 2000-04-07 | 2003-02-12 | Toyo Tanso Co., Ltd. | Apparatus for generating fluorine gas |
Non-Patent Citations (1)
Title |
---|
PATENT ABSTRACTS OF JAPAN vol. 2000, no. 26 1 July 2002 (2002-07-01) * |
Also Published As
Publication number | Publication date |
---|---|
US20050161321A1 (en) | 2005-07-28 |
AU2002367093A8 (en) | 2003-07-15 |
WO2003056066A2 (en) | 2003-07-10 |
KR20040075034A (en) | 2004-08-26 |
CN1608146A (en) | 2005-04-20 |
JP3725822B2 (en) | 2005-12-14 |
EP1461475A2 (en) | 2004-09-29 |
AU2002367093A1 (en) | 2003-07-15 |
TW200306950A (en) | 2003-12-01 |
JP2003193278A (en) | 2003-07-09 |
TWI252214B (en) | 2006-04-01 |
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