WO2003023481A1 - Optical system, projection optical system, exposure device having the projection optical system, and method for manufacturing micro device using the exposure device - Google Patents

Optical system, projection optical system, exposure device having the projection optical system, and method for manufacturing micro device using the exposure device

Info

Publication number
WO2003023481A1
WO2003023481A1 PCT/JP2002/008726 JP0208726W WO2003023481A1 WO 2003023481 A1 WO2003023481 A1 WO 2003023481A1 JP 0208726 W JP0208726 W JP 0208726W WO 2003023481 A1 WO2003023481 A1 WO 2003023481A1
Authority
WO
Grant status
Application
Patent type
Prior art keywords
optical system
projection optical
exposure device
device
lens
Prior art date
Application number
PCT/JP2002/008726
Other languages
French (fr)
Inventor
Yasuhiro Omura
Original Assignee
Nikon Corporation
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date

Links

Classifications

    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
    • G02B17/00Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08Catadioptric systems
    • G02B17/0892Catadioptric systems specially adapted for the UV
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
    • G02B1/00Optical elements characterised by the material of which they are made
    • G02B1/02Optical elements characterised by the material of which they are made made of crystals, e.g. rock-salt, semi-conductors
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
    • G02B13/00Optical objectives specially designed for the purposes specified below
    • G02B13/14Optical objectives specially designed for the purposes specified below for use with infra-red or ultra-violet radiation
    • G02B13/143Optical objectives specially designed for the purposes specified below for use with infra-red or ultra-violet radiation for use with ultra-violet radiation
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
    • G02B17/00Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08Catadioptric systems
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
    • G02B3/00Simple or compound lenses
    • G02B3/02Simple or compound lenses with non-spherical faces
    • G02B3/06Simple or compound lenses with non-spherical faces with cylindrical or toric faces
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Exposure apparatus for microlithography
    • G03F7/70216Systems for imaging mask onto workpiece
    • G03F7/70258Projection system adjustment, alignment during assembly of projection system

Abstract

An optical system capable of adjusting the rotation-asymmetric optical characteristics (for example, rotation-asymmetric astigmatism and magnification error component) with respect to the optical axis of the optical system without degrading the focusing performance by the effect of double refraction. In this optical system, a toric lens formed of fluorite and having rotation-asymmetric power and a corrected lens formed of fluorite form a pair, and the corrected lens is disposed so that the crystal axis thereof is in a predetermined positional relationship with respect to the crystal axis of the toric lens. The toric lens and the corrected lens are rotatable around the optical axis, and movable across the optical axis, and the predetermined positional relationship can be maintained even when the toric lens is rotated and moved.
PCT/JP2002/008726 2001-09-07 2002-08-29 Optical system, projection optical system, exposure device having the projection optical system, and method for manufacturing micro device using the exposure device WO2003023481A1 (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2001-272648 2001-09-07
JP2001272648 2001-09-07

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2003527483A JPWO2003023481A1 (en) 2001-09-07 2002-08-29 Optical system, the projection optical system, the projection optical system exposure apparatus equipped with, and a manufacturing method of a micro device using the exposure apparatus

Publications (1)

Publication Number Publication Date
WO2003023481A1 true true WO2003023481A1 (en) 2003-03-20

Family

ID=19097988

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2002/008726 WO2003023481A1 (en) 2001-09-07 2002-08-29 Optical system, projection optical system, exposure device having the projection optical system, and method for manufacturing micro device using the exposure device

Country Status (2)

Country Link
JP (1) JPWO2003023481A1 (en)
WO (1) WO2003023481A1 (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005331694A (en) * 2004-05-19 2005-12-02 Nikon Corp Projection optical system, exposure apparatus and exposure method
US7126765B2 (en) 2001-05-15 2006-10-24 Carl Zeiss Smt Ag Objective with fluoride crystal lenses
US7292388B2 (en) 2002-05-08 2007-11-06 Carl Zeiss Smt Ag Lens made of a crystalline material
WO2009065819A3 (en) * 2007-11-20 2009-07-09 Toralf Gruner Polariser
WO2017141852A1 (en) * 2016-02-15 2017-08-24 三菱重工業株式会社 Laser processing machine

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4643534A (en) * 1984-08-20 1987-02-17 General Electric Company Optical transmission filter for far field beam correction
JP2000331927A (en) * 1999-03-12 2000-11-30 Canon Inc Projection optical system and projection aligner using the same
EP1063684A1 (en) * 1999-01-06 2000-12-27 Nikon Corporation Projection optical system, method for producing the same, and projection exposure apparatus using the same

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4643534A (en) * 1984-08-20 1987-02-17 General Electric Company Optical transmission filter for far field beam correction
EP1063684A1 (en) * 1999-01-06 2000-12-27 Nikon Corporation Projection optical system, method for producing the same, and projection exposure apparatus using the same
JP2000331927A (en) * 1999-03-12 2000-11-30 Canon Inc Projection optical system and projection aligner using the same

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7126765B2 (en) 2001-05-15 2006-10-24 Carl Zeiss Smt Ag Objective with fluoride crystal lenses
US7180667B2 (en) 2001-05-15 2007-02-20 Carl Zeiss Smt Ag Objective with fluoride crystal lenses
US7292388B2 (en) 2002-05-08 2007-11-06 Carl Zeiss Smt Ag Lens made of a crystalline material
US7672044B2 (en) 2002-05-08 2010-03-02 Carl Zeiss Smt Ag Lens made of a crystalline material
JP2005331694A (en) * 2004-05-19 2005-12-02 Nikon Corp Projection optical system, exposure apparatus and exposure method
JP4547714B2 (en) * 2004-05-19 2010-09-22 株式会社ニコン A projection optical system, exposure apparatus, and exposure method
WO2009065819A3 (en) * 2007-11-20 2009-07-09 Toralf Gruner Polariser
US8379188B2 (en) 2007-11-20 2013-02-19 Carl Zeiss Smt Gmbh Optical system
WO2017141852A1 (en) * 2016-02-15 2017-08-24 三菱重工業株式会社 Laser processing machine

Also Published As

Publication number Publication date Type
JPWO2003023481A1 (en) 2004-12-24 application

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