WO2002088647A2 - Millimeter-wave terrestrial imager - Google Patents
Millimeter-wave terrestrial imager Download PDFInfo
- Publication number
- WO2002088647A2 WO2002088647A2 PCT/GB2002/001896 GB0201896W WO02088647A2 WO 2002088647 A2 WO2002088647 A2 WO 2002088647A2 GB 0201896 W GB0201896 W GB 0201896W WO 02088647 A2 WO02088647 A2 WO 02088647A2
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- array
- lens
- microbridges
- array according
- immersion
- Prior art date
Links
- 238000007654 immersion Methods 0.000 claims abstract description 35
- 239000002887 superconductor Substances 0.000 claims abstract description 21
- 230000003287 optical effect Effects 0.000 claims abstract description 10
- 238000003384 imaging method Methods 0.000 claims description 22
- 230000005855 radiation Effects 0.000 claims description 17
- 239000000463 material Substances 0.000 claims description 10
- 238000000034 method Methods 0.000 claims description 10
- 230000004888 barrier function Effects 0.000 claims description 6
- 230000008569 process Effects 0.000 claims description 6
- 238000000059 patterning Methods 0.000 claims description 2
- 229910052761 rare earth metal Inorganic materials 0.000 claims description 2
- 239000010949 copper Substances 0.000 description 12
- 238000001514 detection method Methods 0.000 description 12
- 239000000758 substrate Substances 0.000 description 11
- 238000001816 cooling Methods 0.000 description 10
- 229910021521 yttrium barium copper oxide Inorganic materials 0.000 description 10
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 7
- 239000000395 magnesium oxide Substances 0.000 description 7
- 238000005516 engineering process Methods 0.000 description 6
- 238000004519 manufacturing process Methods 0.000 description 6
- 239000010408 film Substances 0.000 description 5
- 239000003990 capacitor Substances 0.000 description 4
- 230000004044 response Effects 0.000 description 4
- 238000003491 array Methods 0.000 description 3
- 230000005540 biological transmission Effects 0.000 description 3
- 230000004907 flux Effects 0.000 description 3
- 239000010931 gold Substances 0.000 description 3
- 239000010409 thin film Substances 0.000 description 3
- PNEYBMLMFCGWSK-UHFFFAOYSA-N Alumina Chemical compound [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000000609 electron-beam lithography Methods 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 2
- 229910052737 gold Inorganic materials 0.000 description 2
- 239000012212 insulator Substances 0.000 description 2
- 230000007246 mechanism Effects 0.000 description 2
- 238000003801 milling Methods 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 230000035945 sensitivity Effects 0.000 description 2
- 238000004088 simulation Methods 0.000 description 2
- 230000003595 spectral effect Effects 0.000 description 2
- 229910020073 MgB2 Inorganic materials 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- 239000011358 absorbing material Substances 0.000 description 1
- 230000003321 amplification Effects 0.000 description 1
- 238000000137 annealing Methods 0.000 description 1
- 238000000429 assembly Methods 0.000 description 1
- 230000000712 assembly Effects 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 239000006260 foam Substances 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 238000010884 ion-beam technique Methods 0.000 description 1
- 238000005304 joining Methods 0.000 description 1
- 238000001459 lithography Methods 0.000 description 1
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 238000003199 nucleic acid amplification method Methods 0.000 description 1
- 238000006213 oxygenation reaction Methods 0.000 description 1
- 230000003071 parasitic effect Effects 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 229920000307 polymer substrate Polymers 0.000 description 1
- 230000001902 propagating effect Effects 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 125000006850 spacer group Chemical group 0.000 description 1
- 238000000992 sputter etching Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N69/00—Integrated devices, or assemblies of multiple devices, comprising at least one superconducting element covered by group H10N60/00
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
- G01J5/02—Constructional details
- G01J5/06—Arrangements for eliminating effects of disturbing radiation; Arrangements for compensating changes in sensitivity
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
- G01J5/10—Radiation pyrometry, e.g. infrared or optical thermometry using electric radiation detectors
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
- G01J5/02—Constructional details
- G01J5/06—Arrangements for eliminating effects of disturbing radiation; Arrangements for compensating changes in sensitivity
- G01J5/061—Arrangements for eliminating effects of disturbing radiation; Arrangements for compensating changes in sensitivity by controlling the temperature of the apparatus or parts thereof, e.g. using cooling means or thermostats
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
- G01J5/02—Constructional details
- G01J5/08—Optical arrangements
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
- G01J5/02—Constructional details
- G01J5/08—Optical arrangements
- G01J5/0837—Microantennas, e.g. bow-tie
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
- G01J5/10—Radiation pyrometry, e.g. infrared or optical thermometry using electric radiation detectors
- G01J5/20—Radiation pyrometry, e.g. infrared or optical thermometry using electric radiation detectors using resistors, thermistors or semiconductors sensitive to radiation, e.g. photoconductive devices
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01V—GEOPHYSICS; GRAVITATIONAL MEASUREMENTS; DETECTING MASSES OR OBJECTS; TAGS
- G01V8/00—Prospecting or detecting by optical means
- G01V8/005—Prospecting or detecting by optical means operating with millimetre waves, e.g. measuring the black losey radiation
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
- G01J2005/0077—Imaging
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
- G01J5/02—Constructional details
- G01J5/04—Casings
- G01J5/046—Materials; Selection of thermal materials
Definitions
- the present invention relates to a mm-wave imager suitable for imaging terrestrial scenes, and particularly but not exclusively to a passive mm-wave imager.
- Passive is meant that it is not necessary to illuminate the scene with mm radiation.
- Passive mm-wave imaging is a potentially important technology for security applications, such as for detecting concealed weapons in airports and border crossings. Passive mm-wave imaging of terrestrial scenes is also of use in aircraft and helicopters as flying or landing aids.
- passive mm-wave imagers must be able to generate real time images with a temperature resolution of less than 0.5K at acceptable cost and without overly clumsy equipment. Because of noise considerations it is necessary to integrate the signal at each pixel for a significant time, so that to achieve an acceptable performance (for example frames of at least 10 4 pixels at a 20 Hz frame rate) requires the use of a large number of independent detector channels, and a typical state of the art mm-wave imager will require more than 100 detectors.
- Detection schemes for astronomical passive mm-wave imaging employ heterodyne detection by low temperature superconductor tunnel junction quasiparticle mixers. This means that each detector is supplied with a local oscillator signal which is mixed with the noise signal from the astronomical scene being observed to produce a noise output at a relatively low intermediate frequency (IF).
- IF intermediate frequency
- An example of a superconducting receiver array suitable for spectral radio astronomy and aeronomy applications is described by V P Koshelets et al in "Integrated Superconducting Receivers", Supercond. Sci. Technol. 13 (2000) R532-R69.
- a terrestrial scene contains no narrow band spectral information of interest, and a detector channel simply needs to integrate the signal over a relatively large bandwidth with low noise.
- Existing technology for terrestrial passive mm-wave imaging employ a chain of fast amplifiers in state of the art semiconductor technology to amplify the noise signal from the scene. The signal is then directly detected using a semiconductor rectifier.
- the amplifier gains required are typically of the order of 60dB. Achieving this at frequencies of 90GHz and more requires many stages of gain leading to high cost, power dissipation and complexity.
- the size, cost and complexity of the real time scanners used in relation to current mm-wave imagers is a major disadvantage.
- phased array antenna concepts are known in which the beam from the antenna is steered by tuneable elements.
- An example of such a concept is given by Koepf (US patent 5105200).
- Such arrays typically have a single output and limited instantaneous bandwidth, and cannot readily provide the large number of detection channels and wide bandwidth desired for terrestrial imaging.
- the present invention provides an array of sensors for receiving a focussed terrestrial mm-wave image and providing a corresponding pixel-wise set of image representative signals therefrom, said sensors being antenna coupled high temperature superconductor weak links for directly detecting incident mm-wave radiation.
- each sensor of the array is capable of responding to a single pixel of the focussed image to provide a corresponding output signal.
- the signals tend to be processed initially in parallel channels, e.g. for integration, amplification and other requirements, but eventually it is common that the parallel channel signals are converted to a serial signal in known fashion.
- microbolometers do not operate as antenna coupled high temperature superconductor weak links for directly detecting incident mm-wave radiation, but rely on temperature changes induced by the radiation to alter the impedance, in particular the resistance, of the superconducting material, and the latter is necessarily held close to the superconducting critical temperature Tc for any significant impedance change to be manifested.
- the antenna coupled high temperature superconductor weak links are desirably maintained at a temperature significantly below (for example at least 5 Celsius degrees, and even more preferably at least 10 Celsius degrees) below TQ.
- Embodiments of the present invention use c-axis microbridge (CAM) junctions as sensors, and these are commonly made as step CAM junctions or cross-over CAM junctions.
- CAM c-axis microbridge
- the response of a step CAM junction to 100 GHz radiation is shown in Figure 10 as a function of bias, compared to the first and second derivatives of the current voltage characteristic, with magnitudes scaled to correspond approximately to the measured data.
- the resemblance to the second derivative curve is clear. Exact agreement between curves is not expected as the match to the antenna impedance is expected to vary with the bias conditions.
- the step CAM junction operates as a direct detector.
- phase locking can be used advantageously in an making an emitter of mm- wave radiation, or in a heterodyne detection scheme, but not in direct detection, which is the only approach that is well suited to terrestrial mm-wave imaging with high sensitivity.
- terrestrial is used here to indicate that the imager is designed for viewing terrestrial scenes as opposed to viewing the heavens.
- Such an imager may for example be used as a landing aid on planes and helicopters for imaging a potential landing site.
- the weak links may comprise Josephson junctions, in particular HTS Josephson tunnel junctions.
- the weak links may comprise mibrobridges, in particular C-axis microbridges.
- the microbridges may be cross-over microbridges or step microbridges. It should be noted that some of the technologies referred to herein for making microbridge junctions, including Josephson junctions, can produce barriers whose nature and mechanism is still controversial. For simplicity, they are all referred to herein as microbridges.
- the weak links are made from a high temperature superconductor material, for example RBa Cu 3 O x material, where R is Y or a rare earth element.
- the array is intended to receive a focussed image from imaging optics, e.g. for imaging a terrestrial scene.
- the imaging optics may comprise an optical immersion lens arrangement between the sensor array and front end optics.
- the optical immersion lens arrangement may comprise a single immersion lens (or immersion lens array - for example one lens per sensor).
- the sensor array should be arranged or secured in close proximity to or in contact with the adjacent immersion lens of the imaging optics; any gap between the two is preferably less than 0.01 wavelengths.
- the optical immersion lens may comprise a doublet having a first warm high optical power lens element and a second cooled lens element for providing the immersion function. In this case only the lens providing the immersion function needs to be cooled.
- Another way of reducing cooling requirements for the immersion lens arrangement is by thermally decoupling the optical immersion lens arrangement from the detector array.
- a narrow gap between the lens and the array can be engineered to greatly reduce thermal contact between the lens and detector array, while still allowing mm-wave radiation to tunnel through the gap. There can then be a temperature differential between the immersion lens arrangement and the detector array so that the lens arrangement does not have to be cooled to the low temperatures to which the detectors have to be cooled. More than one such thermal break could be used to enhance the thermal decoupling.
- the imager according to the present invention may comprise more than one immersion lens/detector array assembly, for example, different assemblies may operate at different frequencies or polarisations. Alternatively, more than one such assembly may be used to widen the field of view of the imager.
- a ground plane may be located at the side of the integrated array remote from the immersion lens in order to improve the power of the main forward lobe of the antennae.
- the integrated array of antennae and associated antennae coupled high temperature superconductor weak links are cost effectively formed monolithically by a process of epitaxial growth and patterning.
- Figure 1 schematically shows a mm-wave imager according to the present invention
- Figure 2 schematically shows a first embodiment of an integrated circuit layout of an array of four HTS cross-over c-axis microbridge (CAM)
- FIG. 1 schematically shows the structure of a cross-over CAM suitable for use in the circuit layout of Figure 2;
- Figures 4a to 4f schematically represent the fabrication process for the CAM of Figure 3;
- Figure 5 shows a second embodiment of an integrated circuit layout of an array of eight HTS step C AMs coupled to antennas suitable for use as direct detectors in the mm-wave imager of Figure 1;
- Figure 6 schematically shows the structure of a CAM suitable for use in the circuit layout of Figure 5;
- Figure 7 schematically shows a thermal break of the type suitable for use in the imager shown in Figure 1 ;
- Figure 8 schematically shows the mounting of the lens and detector arrangement in the imager of Figure 1;
- Figures 9a and 9b show the electrical connection of the detectors in the array to the current supply and low noise amplifier used in the imager of Figure 1 ;
- Figure 10 shows the response of a step CAM junction to 100 GHz radiation.
- the mm-wave imager shown in Figure 1 includes front end optics (not shown) for illuminating the front of a single immersion lens (2), for example made of magnesium oxide ceramic (MgO) or alumina ceramic.
- the immersion lens has an anti-reflection coating (6) on its surface which is illuminated by the front end optics.
- Absorbing material (7) such as conducting foam, is located on the sides of the lens (2) to absorb much of the radiation which is reflected or scattered within the lens (2) in order to minimise the amount of radiation that is propagating repeatedly inside the lens (2).
- the reduction of wavelength inside the immersion medium means that more detectors can be packed onto a given area of substrate.
- the drawback to using a single immersion lens (2) is that the whole lens must be cooled and this leads to relatively long cool down times of the order of several hours before the imager can be used.
- an immersion lens doublet could be used to reduce the cool down time.
- the lens and detector arrangement are housed in _a two stage Gifford-McMahon (GM) cooler in a vacuum jacket (5).
- the immersion lens (2) is illuminated by the front end optics through a window (9) in the vacuum jacket.
- the window may advantageously be patterned with elements that allow the desired radiation to be transmitted while reflecting out of band radiation.
- the GM cooler has a first cold stage (1) for cooling the lens (2) and a second cold stage (3) for cooling the detector array (4).
- the lens (2) is supported by a lens support (11) which also forms part of the lens cooling first cold stage and is formed as a radiation shield.
- a thermal break (13), for example of the type shown in Figure 7 can be provided between the lens (2) and the detector array (4).
- the thermal break (13) comprises a plate of glass transparent at mm wavelengths (although it could also comprise a plurality of plates of glass) having a dielectric constant similar to that of the lens (2) and the detector substrate (4), with occasional spacers (15) patterned on it.
- the combination of the front end optics and the immersion lens (2) produce an image of a terrestrial scene at the detector array (4).
- the detector array (4) is formed on a substrate of MgO, although higher refractive index materials could be used to further reduce the antenna impedance and increase the density of detectors.
- a ground plane (8) may be located behind the array of detectors (4).
- the ground plane (8) may be a plate of MgO or alumina which has a thickness approximately equal to a quarter of the operating wavelength of the imager and is coated on its surface remote from the detectors with gold (Au).
- Au gold
- the plane (8) would have a thickness of for example 250 ⁇ m or in the region thereof.
- the use of a ground plane (8) has the effect of reducing the antennae impedance and reducing the width of the main forward lobe of the antennae.
- the mounting of the lens and detector arrangement is shown in more detail in Figure 8.
- the lens is cooled directly by the same cold stage as cools the detector.
- the immersion lens (2) is supported by a cylindrical cooling sleeve (17) and is clamped in place by lens clamps (19).
- the array of detectors is formed on the face of the substrate (4) facing the lens (2) and the lens (2) and detector array are separated by a thermal break (13).
- a ground plane (8) is located behind the detector array.
- the lens assembly is supported on a copper cooling plate (23) which is the cooling head of the second stage of the GM cooler.
- Flexible copper braid (25) is used to cool the detector array and to bias the detector arrangement upwardly into contact with the lens (2).
- FIG. 2 A circuit layout of an array of four detector elements suitable for use in the detector array (4) is shown in Figure 2.
- Each detector element in the array comprises an antenna (lOa-d) and an antenna coupled HTS cross-over CAM Josephson junction (12a-d).
- the antennas (lOa-d) are H-antennae, each comprising two dipole antennae (14a, 14b) up to about half an operating wavelength apart and coupled by a line of the appropriate impedance and length.
- the CAM junctions (12a-d) are cross-connected across this line at its centre.
- the superconducting bias and read-out leads (16a-h) to the detector elements are connected to the antenna (lOa-d) at a relatively low impedance point.
- the leads (16a-h) comprise a low pass filter made up of alternate high and low impedance sections at half operating wavelength intervals in order to present a high impedance at the antennae (lOa-d).
- the bias leads (16a- h) are aligned perpendicular to the antennae (lOa-d) so as to minimise perturbation of the radiation patterns of the antennas (lOa-d).
- the HTS cross-over CAM Josephson junctions (12) used in the detector elements are shown in more detail in Figure 3.
- the junction (12) must have a high normal state resistance (RN), a high enough critical current (so that at its operating temperature T the critical current I c » kT/ ⁇ 0 , where k is the Boltzmanns constant and ⁇ o is the flux quantum, approximately equal to 2.10 "15 Wb).
- the characteristic frequency of the junction Fc I C N ⁇ O must be significantly greater than the frequency being detected, preferably at least three times the frequency being detected.
- Low capacitance is required for a tunnel junctions so that the McCumber parameter ⁇ c is very much less than 1.
- the McCumber parameter is given by:
- ⁇ c 2 ⁇ I c RN 2 C/ ⁇ 0
- RN Junction Normal Resistance
- C Capacitance
- ⁇ o flux quantum
- the superconductor element YBCO has a composition of YBa 2 Cu 3 O 7 (parts 18, 20, 22) and the relatively high resistance material PBCO has a composition of PrBa 2 Cu 3 O 7 (part 26).
- Other superconductors and insulators could alternatively be used, in particular the newly discovered MgB 2 superconductor could be used.
- the Figure 3 arrangement is improved over the Figure 5 arrangement of UK Patent Application serial number GB 2,288,094 in that the geometry of the junction (12) has changed so that there is no continuous a-b plane
- an epitaxial layer of PrBa 2 Cu 3 O 7 (24) is deposited on an MgO substrate (28) followed by an epitaxial layer of YBa 2 Cu 3 O 7 (20).
- the layers (20) and (24) are then patterned as shown in Figure 4a (cross- section) and Figure 4b (plan view) into a track.
- a layer of epitaxial PrBa 2 Cu 3 ⁇ 7 (26) is deposited over the track (20) as shown in Figure 4c and is then planarised to expose the track (20) as shown in Figure 4d.
- the treatment of this surface prior to growth of the next layer is a key step in forming the engineered junction.
- a second layer of epitaxial YBa 2 Cu 3 O 7 (18) is deposited over the layer (26) and is then patterned as shown in Figure 4e to form a second track (18) which crosses the track (20) as shown in the plan view of Figure 4f.
- the top layer (18) is patterned using photolithography and ion beam milling. Over-milling below the YBa 2 Cu 3 O 7 layer (18) ensures that the connection between the layers is such that the currents through the engineered interface are predominantly in the c-direction.
- the base electrode (20) and the top electrode (18) need to be small, with dimensions 0.1-0.2 ⁇ m. These dimensions can be achieved conveniently using hard mask material (eg. carbon) and electron beam lithography. The layer thicknesses required are probably only about 0.1 ⁇ m, perhaps 0.2 ⁇ m for the initial base layer (24). Less than full oxygenation at the end of processing (which can be achieved by annealing) will help to increase normal resistance RN at the cost of reducing the critical current Ic.
- the base layer (24) of PBCO suppresses the formation of a grain boundary that could propagate into the YBCO. It is necessary when the substrate is MgO, but might not be needed with other substrates.
- the junction should have a high normal resistance (RN) which roughly speaking reflects the need to match the antenna impedance (typically some tens of ohms).
- the second requirement is for a large critical current (Ic) - normal resistance (R N ) product ICRN so that the characteristic frequency (fc) of the junction is very much higher than the desired operating frequency of the imager. Where the operating frequency is much lower than the characteristic frequency (fc) the Josephson junction can be regarded as a non- linear resistor.
- the incident signal is then rectified by the Josephson junction to generate an output signal that is proportional to the curvature of the IN characteristic of the junction, d 2 N/dI 2 and to the square of the signal amplitude.
- the critical current Ic and thus the critical frequency f c increases.
- square law detection is the dominant effect in the junction.
- Each junction is biased by a constant current supply, and the voltage read out by a low noise amplifier. It is advantageous to use a low speed feedback circuit to adjust the bias current set point so that the voltage, averaged over many frames, is set to its optimum value. This will compensate t ⁇ a large extent for variations in the properties of individual detectors. In some applications, the array will be periodically calibrated, and the operating point could be set as part of the calibration cycle.
- the detector array is electrically connected to the current supply and low noise amplifier via an arrangement of bond wires (30) and thin film metal tracks (27) formed on a polymer substrate (29), as shown in Figures 9a and 9b.
- the mm-wave imager can be configured as a staring array, the use of a compact dither scanner could provide improved spatial resolution and optionally polarisation or frequency diversity.
- the mm-wave imager arrangement described above in relation to Figure 8 will take several hours to cool down to its operating temperature. This problem is minimised in the arrangement shown in Figures 1 and 7 in which the immersion lens (2) is thermally de-coupled from the detector array (4) so that the detectors can be cooled to their operating temperature while the immersion lens (2) is still cooling.
- the lens (2) may be mounted in the first stage of a GM cooler which has a relatively large cooling capacity with the detector mounted in the second stage of the GM cooler.
- a narrow gap of the order of microns between the detector array (4) and the lens (2) would be sufficient for thermal de-coupling without leading to observable optical losses.
- the antennae (10) located at the edges of the detector array (4) can be configured so that their main beam is directed at a slightly tilted angle outward with respect to the normal of the plane of the array. For an H-antenna, this can be achieved in the H-plane by offsetting the position of the junction (12) away from the midpoint of the H.
- FIG. 5 An alternative integrated circuit layout of an array of eight HTS step CAMs (42a- h) coupled to antennae (44a-h) and suitable for use as direct detector elements in the mm-wave imager of Figure 1 are shown in Figure 5.
- Each detector element in the array comprises an antenna (44a-h) and an antenna coupled HTS step CAM (42a-h).
- the antennas (44a-d) are H-antennae, each comprising two dipole antennae up to about half an operating wavelength apart and coupled by a line of the appropriate impedance.
- the step junctions (42a-d) are formed across this line at its centre.
- the superconducting bias and read-out leads (46a-j) to the detector elements are connected to the antennae (44a-d) at a relatively low impedance point.
- An overlap capacitor (eg. 48a) is provided in the circuit about a half of the operating wavelength away from the antennae in order to isolate the antennae and present a high impedance at the antennae (44a-d).
- the layout of the bias leads (46a-i) economises on space with half of the array led out to one side of the detector array (4) and the other half led out to the other side of the detector array.
- a single relatively high value overlap capacitor (eg. 48a), about half of the immersion operating wavelength away from the antenna is used to isolate the detector elements from each other and from their surroundings, allowing a common electrode to be used and thus saving space.
- overlap capacitors can be made using, for example, a thin film of gold as the top electrode, separated from the bias leads by a thin layer of spun-on polyimide insulator.
- step CAM The structure of the step CAM is shown in more detail in Figure 6. This type of
- an epitaxial layer of PrBa 2 Cu 3 O (34) is deposited on an MgO substrate (38).
- a step in the direction of the c-axis (See c-axis direction in Figure 6) having a height of less than 300nm is patterned in this buffer layer (34) using a Carbon tri-layer mask process and ion milling.
- a further layer of epitaxial PrBa 2 Cu 3 O 7 (36) is deposited over the buffer layer (34) followed by a layer of epitaxial YBa 2 Cu 3 O 7 (32) superconductor and a second layer of epitaxial PrBa 2 Cu 3 O (40).
- the three layers (36, 32, 40) are grown one after the other, preferably without exposing the wafer to atmosphere.
- the resistive PrBa 2 Cu 3 O 7 layers (34, 36) below the superconductor layer (32) act as isostructural buffer layers and the resistive PrBa 2 Cu 3 O 7 layer (40) above the superconductor (32) acts as a capping layer.
- the superconductor layer (32) currently used is 60nm thick, but this may not be the optimum and a range of different thicknesses, at least as low as 20nm are possible.
- the effective step height is the difference between the patterned step height and the superconducting film thickness. For example, a lOOnm patterned step height and a 60nm superconducting film thickness leaves an effective step height of 40nm.
- the methodology described here, in relation to Figure 6 is a simple way of making a c-axis microbridge.
- a thin film (preferably between 0.005 and 0.3 ⁇ m thick) of superconductor is grown over a step having a height comparable to or greater than the film thickness.
- the film has the same crystallographic orientation everywhere, including the step.
- the formation of grain boundaries at the step is suppressed by forming the step in the isostructural material PrBa 2 Cu 3 O .
- the superconductor is a three- dimensional but anisotropic superconductor, with its weakest superconducting direction normal to the substrate.
- a narrow track is patterned across the step and a c-axis microbridge is formed where the track crosses the step.
- Such a microbridge operates by the motion of vortices across the bridge, a mechanism that differs from the way a tunnel junction works.
- tracks (less than 2 ⁇ m wide) are patterned in the superconducting layer (32) so that the tracks cross the step and the c-axis microbridges are formed at the steps.
- the tracks are arranged to connect together the two conductors of the transmission line.
- the transmission line in turn is connected to the arms of the H antenna. If the junction width is not too demanding for the lithography technology being used, all these structures (track, transmission lines, antenna) can be patterned in a single process. Narrow step CAMs will produce better performance than wide ones, and it may be advantageous to pattern the narrow tracks in a separate lithographic step, eg. using electron beam lithography.
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Life Sciences & Earth Sciences (AREA)
- General Life Sciences & Earth Sciences (AREA)
- Geophysics (AREA)
- Superconductor Devices And Manufacturing Methods Thereof (AREA)
- Radiation Pyrometers (AREA)
- Photometry And Measurement Of Optical Pulse Characteristics (AREA)
- Transforming Light Signals Into Electric Signals (AREA)
- Variable-Direction Aerials And Aerial Arrays (AREA)
- Solid State Image Pick-Up Elements (AREA)
Abstract
Description
Claims
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP02718388A EP1384052A2 (en) | 2001-04-28 | 2002-04-22 | Millimeter-wave terrestrial imager |
US10/475,743 US7532917B2 (en) | 2001-04-28 | 2002-04-22 | Mm-wave terrestrial imager |
JP2002585902A JP2004534216A (en) | 2001-04-28 | 2002-04-22 | Millimeter wave surface imaging device |
KR10-2003-7013727A KR20040015109A (en) | 2001-04-28 | 2002-04-22 | MM-wave terrestrial imager |
AU2002249458A AU2002249458A1 (en) | 2001-04-28 | 2002-04-22 | Millimeter-wave terrestrial imager |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB0110468.6 | 2001-04-28 | ||
GBGB0110468.6A GB0110468D0 (en) | 2001-04-28 | 2001-04-28 | MM-Wave Terrestrial Imager |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2002088647A2 true WO2002088647A2 (en) | 2002-11-07 |
WO2002088647A3 WO2002088647A3 (en) | 2003-05-22 |
Family
ID=9913675
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/GB2002/001896 WO2002088647A2 (en) | 2001-04-28 | 2002-04-22 | Millimeter-wave terrestrial imager |
Country Status (8)
Country | Link |
---|---|
US (1) | US7532917B2 (en) |
EP (1) | EP1384052A2 (en) |
JP (1) | JP2004534216A (en) |
KR (1) | KR20040015109A (en) |
AU (1) | AU2002249458A1 (en) |
GB (1) | GB0110468D0 (en) |
TW (1) | TWI237418B (en) |
WO (1) | WO2002088647A2 (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2005286245A (en) * | 2004-03-30 | 2005-10-13 | Japan Science & Technology Agency | Superconducting element, neutron detecting apparatus using it, and manufacturing method of the superconducting element |
Families Citing this family (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2945119B1 (en) * | 2009-04-30 | 2011-04-08 | Commissariat Energie Atomique | BOLOMETRIC DETECTOR OF ELECTROMAGNETIC RADIATION IN THE DOMAIN OF TERAHERTZ AND MATRIX DETECTION DEVICE COMPRISING SUCH DETECTORS |
JP5363201B2 (en) * | 2009-06-05 | 2013-12-11 | 日本電信電話株式会社 | Fabrication method of superconductor fine pattern |
US8571614B1 (en) | 2009-10-12 | 2013-10-29 | Hypres, Inc. | Low-power biasing networks for superconducting integrated circuits |
EP3052911A1 (en) * | 2013-10-04 | 2016-08-10 | Battelle Memorial Institute | Contrast phantom for passive millimeter wave imaging systems |
US10222416B1 (en) | 2015-04-14 | 2019-03-05 | Hypres, Inc. | System and method for array diagnostics in superconducting integrated circuit |
US20200073023A1 (en) * | 2018-08-28 | 2020-03-05 | Raytheon Company | Solid-immersion lens focal plane array |
CN113074819B (en) * | 2021-04-02 | 2022-03-29 | 北京理工大学 | High-precision infrared temperature measurement system and method |
US20240188452A1 (en) * | 2021-04-13 | 2024-06-06 | Sumitomo Electric Industries, Ltd. | Joined body and method for producing joined body |
EP4352664A1 (en) | 2021-06-11 | 2024-04-17 | Seeqc Inc. | System and method of flux bias for superconducting quantum circuits |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5438336A (en) * | 1993-11-12 | 1995-08-01 | Trw Inc. | Focal plane imaging array with internal calibration source |
DE19629583A1 (en) * | 1996-07-23 | 1998-01-29 | Dornier Gmbh | Emitter and / or detector component for submillimeter-wave radiation and method for its production |
EP0823734A1 (en) * | 1996-07-23 | 1998-02-11 | DORNIER GmbH | Josephson junction array device, and manufacture thereof |
US5999122A (en) * | 1998-06-23 | 1999-12-07 | Trw Inc. | Millimeter wave instant photographic camera |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5105200A (en) | 1990-06-18 | 1992-04-14 | Ball Corporation | Superconducting antenna system |
GB2288094A (en) * | 1994-03-25 | 1995-10-04 | Secr Defence | Superconductive junction |
US6576904B1 (en) * | 1999-11-10 | 2003-06-10 | Itt Manufacturing Enterprises, Inc. | Transition edge detector technology for high performance IR focal plane arrays |
-
2001
- 2001-04-28 GB GBGB0110468.6A patent/GB0110468D0/en not_active Ceased
-
2002
- 2002-04-22 WO PCT/GB2002/001896 patent/WO2002088647A2/en not_active Application Discontinuation
- 2002-04-22 AU AU2002249458A patent/AU2002249458A1/en not_active Abandoned
- 2002-04-22 JP JP2002585902A patent/JP2004534216A/en active Pending
- 2002-04-22 US US10/475,743 patent/US7532917B2/en not_active Expired - Fee Related
- 2002-04-22 EP EP02718388A patent/EP1384052A2/en not_active Withdrawn
- 2002-04-22 KR KR10-2003-7013727A patent/KR20040015109A/en not_active Application Discontinuation
- 2002-04-23 TW TW091108383A patent/TWI237418B/en not_active IP Right Cessation
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5438336A (en) * | 1993-11-12 | 1995-08-01 | Trw Inc. | Focal plane imaging array with internal calibration source |
DE19629583A1 (en) * | 1996-07-23 | 1998-01-29 | Dornier Gmbh | Emitter and / or detector component for submillimeter-wave radiation and method for its production |
EP0823734A1 (en) * | 1996-07-23 | 1998-02-11 | DORNIER GmbH | Josephson junction array device, and manufacture thereof |
US5999122A (en) * | 1998-06-23 | 1999-12-07 | Trw Inc. | Millimeter wave instant photographic camera |
Non-Patent Citations (1)
Title |
---|
C.D. REINTSEMA: "A novel method of realizing two-dimensional array systems of high-Tc step-edge Josephson junctions" IEEE TRANSACTIONS ON APPLIED SUPERCONDUCTIVITY, vol. 5, no. 2, 1 June 1995 (1995-06-01), pages 3259-3262, XP002220044 NEW YORK * |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2005286245A (en) * | 2004-03-30 | 2005-10-13 | Japan Science & Technology Agency | Superconducting element, neutron detecting apparatus using it, and manufacturing method of the superconducting element |
Also Published As
Publication number | Publication date |
---|---|
JP2004534216A (en) | 2004-11-11 |
WO2002088647A3 (en) | 2003-05-22 |
US20040130311A1 (en) | 2004-07-08 |
TWI237418B (en) | 2005-08-01 |
AU2002249458A1 (en) | 2002-11-11 |
KR20040015109A (en) | 2004-02-18 |
US7532917B2 (en) | 2009-05-12 |
EP1384052A2 (en) | 2004-01-28 |
GB0110468D0 (en) | 2001-06-20 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US5450053A (en) | Use of vanadium oxide in microbolometer sensors | |
US6329655B1 (en) | Architecture and method of coupling electromagnetic energy to thermal detectors | |
US6114696A (en) | Uncooled infrared detector | |
US4922116A (en) | Flicker free infrared simulator with resistor bridges | |
US4654622A (en) | Monolithic integrated dual mode IR/mm-wave focal plane sensor | |
US7755048B2 (en) | Large format thermoelectric infrared detector and method of fabrication | |
US20110062330A1 (en) | Electromagnetic based thermal sensing and imaging incorporating differential pixel topology | |
US7132655B2 (en) | Passive millimeter wave sensor using high temperature superconducting leads | |
Kraus | Superconductive bolometers and calorimeters | |
US20090108202A1 (en) | Antenna-coupled-into-rectifier infrared sensor elements and infrared sensors | |
Mazin | Microwave kinetic inductance detectors: The first decade | |
US7501636B1 (en) | Nanotunneling junction-based hyperspectal polarimetric photodetector and detection method | |
Verghese et al. | Feasibility of infrared imaging arrays using high‐T c superconducting bolometers | |
US7532917B2 (en) | Mm-wave terrestrial imager | |
EP0645001B1 (en) | Use of vanadium oxide in microbolometer sensors | |
US20150211936A1 (en) | Photon radiation detector comprising an array of antennas and a spiral resistive support | |
US6404397B1 (en) | Compact all-weather electromagnetic imaging system | |
Humphreys et al. | Passive mm-wave imager using HTS Josephson junction detectors | |
Zerov et al. | Antenna-coupled microbolometers | |
Stickley et al. | MIcroantenna Arrays: Technology and Applications (MIATA)--an overview | |
Dietlein et al. | Performance comparison of Nb and NbN antenna-coupled microbolometers | |
Day et al. | Far-infrared/submillimeter imager-polarimeter using distributed antenna-coupled transition edge sensors | |
Ali et al. | Planar antenna-coupled transition-edge hot electron microbolometer | |
JP2001320629A (en) | Non-cooling infrared ray detector | |
EP1023579B1 (en) | Compact all-weather electromagnetic imaging system |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
AK | Designated states |
Kind code of ref document: A2 Designated state(s): AE AG AL AM AT AU AZ BA BB BG BR BY BZ CA CH CN CO CR CU CZ DE DK DM DZ EC EE ES FI GB GD GE GH GM HR HU ID IL IN IS JP KE KG KP KR KZ LC LK LR LS LT LU LV MA MD MG MK MN MW MX MZ NO NZ OM PH PL PT RO RU SD SE SG SI SK SL TJ TM TN TR TT TZ UA UG US UZ VN YU ZA ZM ZW |
|
AL | Designated countries for regional patents |
Kind code of ref document: A2 Designated state(s): GH GM KE LS MW MZ SD SL SZ TZ UG ZM ZW AM AZ BY KG KZ MD RU TJ TM AT BE CH CY DE DK ES FI FR GB GR IE IT LU MC NL PT SE TR BF BJ CF CG CI CM GA GN GQ GW ML MR NE SN TD TG |
|
121 | Ep: the epo has been informed by wipo that ep was designated in this application | ||
DFPE | Request for preliminary examination filed prior to expiration of 19th month from priority date (pct application filed before 20040101) | ||
WWE | Wipo information: entry into national phase |
Ref document number: 1020037013727 Country of ref document: KR |
|
WWE | Wipo information: entry into national phase |
Ref document number: 10475743 Country of ref document: US |
|
WWE | Wipo information: entry into national phase |
Ref document number: 2002585902 Country of ref document: JP |
|
DFPE | Request for preliminary examination filed prior to expiration of 19th month from priority date (pct application filed before 20040101) | ||
WWE | Wipo information: entry into national phase |
Ref document number: 2002718388 Country of ref document: EP |
|
WWP | Wipo information: published in national office |
Ref document number: 2002718388 Country of ref document: EP |
|
REG | Reference to national code |
Ref country code: DE Ref legal event code: 8642 |
|
WWW | Wipo information: withdrawn in national office |
Ref document number: 2002718388 Country of ref document: EP |