WO2002082872A1 - Verfahren und vorrichtung zum erzeugen von extrem ultravioletter strahlung und weicher röntgenstrahlung - Google Patents

Verfahren und vorrichtung zum erzeugen von extrem ultravioletter strahlung und weicher röntgenstrahlung Download PDF

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Publication number
WO2002082872A1
WO2002082872A1 PCT/DE2002/001085 DE0201085W WO02082872A1 WO 2002082872 A1 WO2002082872 A1 WO 2002082872A1 DE 0201085 W DE0201085 W DE 0201085W WO 02082872 A1 WO02082872 A1 WO 02082872A1
Authority
WO
WIPO (PCT)
Prior art keywords
electrode
plasma
voltage
trigger
electrodes
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/DE2002/001085
Other languages
German (de)
English (en)
French (fr)
Inventor
Jürgen Klein
Willi Neff
Stefan Seiwert
Klaus Bergmann
Joseph Pankert
Michael Löken
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Philips Intellectual Property and Standards GmbH
Fraunhofer Gesellschaft zur Foerderung der Angewandten Forschung eV
Koninklijke Philips NV
Original Assignee
Philips Corporate Intellectual Property GmbH
Fraunhofer Gesellschaft zur Foerderung der Angewandten Forschung eV
Koninklijke Philips Electronics NV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Philips Corporate Intellectual Property GmbH, Fraunhofer Gesellschaft zur Foerderung der Angewandten Forschung eV, Koninklijke Philips Electronics NV filed Critical Philips Corporate Intellectual Property GmbH
Priority to DE10291549T priority Critical patent/DE10291549D2/de
Priority to US10/474,121 priority patent/US7126143B2/en
Priority to CNB02807825XA priority patent/CN1311716C/zh
Priority to EP02729817A priority patent/EP1374650A1/de
Priority to JP2002580685A priority patent/JP4330344B2/ja
Publication of WO2002082872A1 publication Critical patent/WO2002082872A1/de
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05GX-RAY TECHNIQUE
    • H05G2/00Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001Production of X-ray radiation generated from plasma
    • H05G2/003Production of X-ray radiation generated from plasma the plasma being generated from a material in a liquid or gas state
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008Production of exposure light, i.e. light sources
    • G03F7/70033Production of exposure light, i.e. light sources by plasma extreme ultraviolet [EUV] sources

Definitions

  • the procedure is such that the ignition delay is reduced by increasing the gas pressure or increased by reducing the gas pressure.
  • Such changes in the gas pressure are particularly easy to achieve if the gas flows through the area of the electrode system, for example in order to influence the repetition frequency, that is to say to be able to carry out the method with higher pulse frequencies.
  • the ignition delay can be regulated in that the time between reaching the predetermined ignition voltage and the ignition point is measured and in that the gas pressure is adjusted according to the predetermined ignition delay by means of the measurement result.
  • the time between reaching the predetermined ignition voltage and the ignition point is measured, for example, in an analog manner using an integrator or digitally using a counter.
  • the time is fed to a controller as a measured variable, which accordingly adjusts the gas pressure to stabilize the ignition delay. It can be averaged over a series of discharge processes, that is over a predetermined number of pulses.
  • the invention also relates to a device with the features of the preamble of claim 29.
  • ionization can occur in the discharge space.
  • the mobile ions in the electric field hit the trigger electrode and usually have sufficient energy to knock secondary electrons out of the metallic surface of the electrode. Because of the potential difference, these electrons reach the anode.
  • a conductive channel can be formed between the anode and the trigger electrode without the desired breakdown having already occurred in the area of the openings of the electrodes. there a noticeable part of the energy storage can be discharged via the trigger circuit, which entails the risk of this circuit being destroyed.
  • the above object is achieved by the features of the characterizing part of claim 29. If the carrier electrode is arranged outside a particle beam which is formed in the axis of symmetry, the particles or ions accelerated in this axis no longer strike the carrier electrode. The malfunctions described above are therefore at least considerably reduced. The same applies if the trigger electrode has a shield that prevents the formation of a conductive channel between the trigger electrode and the anode.
  • the device in such a way that the trigger electrode is completely insulated at least from the space adjacent to the first electrode is.
  • the production of the trigger electrode for such a device can be advantageously influenced by complete insulation or coating. Inhomogeneities in the field or discharge formation on the metal surfaces of the trigger electrode in the transition region between insulated and non-insulated metal surfaces are also eliminated.
  • the trigger electrode is not to be located in the axis of symmetry, it is preferable to design the device in such a way that the trigger electrode is designed as a hollow cylinder surrounding the axis of symmetry.
  • the device is exposed to considerable heat during its operation. It is therefore advisable to design them so that the shielding is made of temperature-resistant insulation material.
  • the electrode 12 is designed as an anode with a central opening 15 which widens conically starting from an electrode gap 22.
  • ignition of the plasma 17 is only possible when an ignition voltage U z has been reached.
  • an ignition delay 18 occurs.
  • the size of the ignition delay 18 is regulated by controlling the gas pressure. With typical durations, the size of the ignition delay ranges from a few microseconds to a few milliseconds. The ignition delay leads to an extension of the build-up of the conductive plasma. This improves the cylinder symmetry of the plasma 17.
  • the electrode system shown in FIG. 6 is provided with a trigger device in the area of the electrode 11.
  • the electrode 11 points in the axis of symmetry 13 a trigger electrode 19, which is held by an insulator 26 in the bottom 30 of the electrode 11.
  • the insulator 26 serves to enable the trigger electrode 19 to be given a potential which is different from that of the electrode 11.
  • the trigger electrode 19 has a parasitic capacitance 31 with respect to the electrode 11, measured in parallel with a switch 32, with which both electrodes 19, 11 can be brought to the same potential.
  • the electrode 12 is usually designed as an anode and is grounded as shown. In contrast, the cathode is at a negative potential -V while the trigger electrode 19 is at a potential -V + Vt.
  • the potential of the trigger electrode before the start of the triggering process is therefore somewhat higher than that of the electrode 11.
  • a trigger pulse is triggered by closing the switch 32, the potential of the trigger electrode 19 being pulled down to that of the electrode 11.
  • Typical time constants for a change in the potential of the trigger electrode 19 are advantageously in the range from a few nanoseconds to a few hundred nanoseconds.

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • X-Ray Techniques (AREA)
  • Plasma Technology (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
PCT/DE2002/001085 2001-04-06 2002-03-23 Verfahren und vorrichtung zum erzeugen von extrem ultravioletter strahlung und weicher röntgenstrahlung Ceased WO2002082872A1 (de)

Priority Applications (5)

Application Number Priority Date Filing Date Title
DE10291549T DE10291549D2 (de) 2001-04-06 2002-03-23 Verfahren und Vorrichtung zum Erzeugen von extrem ultravioletter Strahlung und weicher Röntgenstrahlung
US10/474,121 US7126143B2 (en) 2001-04-06 2002-03-23 Method and device for producing extreme ultraviolet radiation and soft x-ray radiation
CNB02807825XA CN1311716C (zh) 2001-04-06 2002-03-23 产生远紫外辐照和软x射线辐照的方法和装置
EP02729817A EP1374650A1 (de) 2001-04-06 2002-03-23 Verfahren und vorrichtung zum erzeugen von extrem ultravioletter strahlung und weicher röntgenstrahlung
JP2002580685A JP4330344B2 (ja) 2001-04-06 2002-03-23 超紫外線及び軟x線の発生方法及び装置

Applications Claiming Priority (6)

Application Number Priority Date Filing Date Title
DE10117377 2001-04-06
DE10117377.6 2001-04-06
DE10139677A DE10139677A1 (de) 2001-04-06 2001-08-11 Verfahren und Vorrichtung zum Erzeugen von extrem ultravioletter Strahlung und weicher Röntgenstrahlung
DE10139677.5 2001-08-11
EP01125762A EP1248499B1 (de) 2001-04-06 2001-10-29 Verfahren und Vorrichtung zum Erzeugen von extrem ultravioletter Strahlung
EP01125762.3 2001-10-29

Publications (1)

Publication Number Publication Date
WO2002082872A1 true WO2002082872A1 (de) 2002-10-17

Family

ID=26009027

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/DE2002/001085 Ceased WO2002082872A1 (de) 2001-04-06 2002-03-23 Verfahren und vorrichtung zum erzeugen von extrem ultravioletter strahlung und weicher röntgenstrahlung

Country Status (8)

Country Link
US (1) US7126143B2 (https=)
EP (2) EP1248499B1 (https=)
JP (1) JP4330344B2 (https=)
CN (1) CN1311716C (https=)
AT (1) ATE469533T1 (https=)
DE (3) DE10139677A1 (https=)
TW (1) TWI284916B (https=)
WO (1) WO2002082872A1 (https=)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10260458B3 (de) * 2002-12-19 2004-07-22 Xtreme Technologies Gmbh Strahlungsquelle mit hoher durchschnittlicher EUV-Strahlungsleistung
JP2006509330A (ja) * 2002-12-04 2006-03-16 コーニンクレッカ フィリップス エレクトロニクス エヌ ヴィ Euv放射用放電灯
JP2006521670A (ja) * 2003-03-10 2006-09-21 コーニンクレッカ フィリップス エレクトロニクス エヌ ヴィ 放電空間内の電気放電を介するプラズマの発生のための方法及び装置
JP2007501997A (ja) * 2003-08-07 2007-02-01 コーニンクレッカ フィリップス エレクトロニクス エヌ ヴィ 極紫外線及び軟x線発生器
DE102006022823A1 (de) * 2006-05-12 2007-11-22 Xtreme Technologies Gmbh Anordnung zur Erzeugung von EUV-Strahlung auf Basis eines Gasentladungsplasmas
US7488962B2 (en) 2005-06-01 2009-02-10 Xtreme Technologies Gmbh Arrangement for the generation of intensive short-wavelength radiation based on a gas discharge plasma

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DE10238096B3 (de) * 2002-08-21 2004-02-19 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Gasentladungslampe
US6770895B2 (en) 2002-11-21 2004-08-03 Asml Holding N.V. Method and apparatus for isolating light source gas from main chamber gas in a lithography tool
JP2004226244A (ja) * 2003-01-23 2004-08-12 Ushio Inc 極端紫外光源および半導体露光装置
US6919573B2 (en) 2003-03-20 2005-07-19 Asml Holding N.V Method and apparatus for recycling gases used in a lithography tool
DE10359464A1 (de) 2003-12-17 2005-07-28 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Verfahren und Vorrichtung zum Erzeugen von insbesondere EUV-Strahlung und/oder weicher Röntgenstrahlung
WO2006056917A1 (en) 2004-11-29 2006-06-01 Philips Intellectual Property & Standards Gmbh Method and apparatus for generating radiation in the wavelength range from about 1 nm to about 30 nm, and use in a lithography device or in metrology
DE102004058500A1 (de) 2004-12-04 2006-06-08 Philips Intellectual Property & Standards Gmbh Verfahren und Vorrichtung zum Betreiben einer elektrischen Entladevorrichtung
JP2008544448A (ja) * 2005-06-14 2008-12-04 コーニンクレッカ フィリップス エレクトロニクス エヌ ヴィ Euv放射線及び/又は軟x線を発生させる放射線源を短絡から保護する方法
US7687788B2 (en) * 2007-07-16 2010-03-30 Asml Netherlands B.V. Debris prevention system, radiation system, and lithographic apparatus
US8493548B2 (en) * 2007-08-06 2013-07-23 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7655925B2 (en) 2007-08-31 2010-02-02 Cymer, Inc. Gas management system for a laser-produced-plasma EUV light source
US20090134129A1 (en) * 2007-11-27 2009-05-28 General Electric Company Ablative plasma gun apparatus and system
DE102007060807B4 (de) * 2007-12-18 2009-11-26 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Gasentladungsquelle, insbesondere für EUV-Strahlung
NL1036595A1 (nl) * 2008-02-28 2009-08-31 Asml Netherlands Bv Device constructed and arranged to generate radiation, lithographic apparatus, and device manufacturing method.
EP2308272B1 (en) * 2008-07-28 2012-09-19 Philips Intellectual Property & Standards GmbH Method and device for generating euv radiation or soft x-rays
US20110109226A1 (en) * 2009-11-06 2011-05-12 Agilent Technologies, Inc. Microplasma device with cavity for vacuum ultraviolet irradiation of gases and methods of making and using the same
CN102625557A (zh) * 2012-03-30 2012-08-01 大连理工大学 大气压裸电极冷等离子体射流发生装置
KR101542333B1 (ko) * 2014-12-26 2015-08-05 한국과학기술연구원 다중 가스셀 모듈을 이용한 극자외선 빔 생성장치
US11373845B2 (en) * 2020-06-05 2022-06-28 Applied Materials, Inc. Methods and apparatus for symmetrical hollow cathode electrode and discharge mode for remote plasma processes
CN114442437B (zh) * 2020-10-30 2024-05-17 上海宏澎能源科技有限公司 光源装置

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US4201921A (en) * 1978-07-24 1980-05-06 International Business Machines Corporation Electron beam-capillary plasma flash x-ray device
US4596030A (en) * 1983-09-10 1986-06-17 Carl Zeiss Stiftung Apparatus for generating a source of plasma with high radiation intensity in the X-ray region
US4602376A (en) * 1983-09-02 1986-07-22 Centre National De La Recherche Scientifique Soft X-ray source with cylindrical plasma compression
DE19753696A1 (de) * 1997-12-03 1999-06-17 Fraunhofer Ges Forschung Vorrichtung und Verfahren zur Erzeugung von Extrem-Ultraviolettstrahlung und weicher Röntgenstrahlung aus einer Gasentladung
WO2002007484A2 (en) * 2000-07-04 2002-01-24 Lambda Physik Ag Method of producing short-wave radiation from a gas-discharge plasma and device for implementing it

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WO1989010646A1 (fr) * 1988-04-26 1989-11-02 Siemens Aktiengesellschaft Circuit d'excitation pour lasers a gaz avec un commutateur a pseudo-etincelle a canaux multiples et procede d'utilisation dudit circuit
DE19962160C2 (de) * 1999-06-29 2003-11-13 Fraunhofer Ges Forschung Vorrichtungen zur Erzeugung von Extrem-Ultraviolett- und weicher Röntgenstrahlung aus einer Gasentladung
TWI246872B (en) * 1999-12-17 2006-01-01 Asml Netherlands Bv Radiation source for use in lithographic projection apparatus
US6667484B2 (en) * 2000-07-03 2003-12-23 Asml Netherlands B.V. Radiation source, lithographic apparatus, device manufacturing method, and device manufactured thereby
RU2206186C2 (ru) * 2000-07-04 2003-06-10 Государственный научный центр Российской Федерации Троицкий институт инновационных и термоядерных исследований Способ получения коротковолнового излучения из газоразрядной плазмы и устройство для его реализации

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4201921A (en) * 1978-07-24 1980-05-06 International Business Machines Corporation Electron beam-capillary plasma flash x-ray device
US4602376A (en) * 1983-09-02 1986-07-22 Centre National De La Recherche Scientifique Soft X-ray source with cylindrical plasma compression
US4596030A (en) * 1983-09-10 1986-06-17 Carl Zeiss Stiftung Apparatus for generating a source of plasma with high radiation intensity in the X-ray region
DE19753696A1 (de) * 1997-12-03 1999-06-17 Fraunhofer Ges Forschung Vorrichtung und Verfahren zur Erzeugung von Extrem-Ultraviolettstrahlung und weicher Röntgenstrahlung aus einer Gasentladung
WO2002007484A2 (en) * 2000-07-04 2002-01-24 Lambda Physik Ag Method of producing short-wave radiation from a gas-discharge plasma and device for implementing it

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006509330A (ja) * 2002-12-04 2006-03-16 コーニンクレッカ フィリップス エレクトロニクス エヌ ヴィ Euv放射用放電灯
CN100375219C (zh) * 2002-12-04 2008-03-12 皇家飞利浦电子股份有限公司 用于超紫外辐射的气体放电灯
DE10260458B3 (de) * 2002-12-19 2004-07-22 Xtreme Technologies Gmbh Strahlungsquelle mit hoher durchschnittlicher EUV-Strahlungsleistung
US6815900B2 (en) 2002-12-19 2004-11-09 Xtreme Technologies Gbmh Radiation source with high average EUV radiation output
JP2006521670A (ja) * 2003-03-10 2006-09-21 コーニンクレッカ フィリップス エレクトロニクス エヌ ヴィ 放電空間内の電気放電を介するプラズマの発生のための方法及び装置
JP2011100741A (ja) * 2003-03-10 2011-05-19 Koninkl Philips Electronics Nv 放電空間内の電気放電を介するプラズマの発生のための方法及び装置
JP2007501997A (ja) * 2003-08-07 2007-02-01 コーニンクレッカ フィリップス エレクトロニクス エヌ ヴィ 極紫外線及び軟x線発生器
JP4814093B2 (ja) * 2003-08-07 2011-11-09 コーニンクレッカ フィリップス エレクトロニクス エヌ ヴィ 極紫外線及び軟x線発生器
US7488962B2 (en) 2005-06-01 2009-02-10 Xtreme Technologies Gmbh Arrangement for the generation of intensive short-wavelength radiation based on a gas discharge plasma
DE102006022823A1 (de) * 2006-05-12 2007-11-22 Xtreme Technologies Gmbh Anordnung zur Erzeugung von EUV-Strahlung auf Basis eines Gasentladungsplasmas
DE102006022823B4 (de) * 2006-05-12 2010-03-25 Xtreme Technologies Gmbh Anordnung zur Erzeugung von EUV-Strahlung auf Basis eines Gasentladungsplasmas

Also Published As

Publication number Publication date
EP1248499B1 (de) 2010-05-26
CN1311716C (zh) 2007-04-18
DE50115489D1 (de) 2010-07-08
DE10139677A1 (de) 2002-10-17
EP1374650A1 (de) 2004-01-02
EP1248499A1 (de) 2002-10-09
US20040183037A1 (en) 2004-09-23
ATE469533T1 (de) 2010-06-15
US7126143B2 (en) 2006-10-24
DE10291549D2 (de) 2004-04-15
TWI284916B (en) 2007-08-01
CN1531840A (zh) 2004-09-22
JP2004530269A (ja) 2004-09-30
JP4330344B2 (ja) 2009-09-16

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