WO2002082872A1 - Verfahren und vorrichtung zum erzeugen von extrem ultravioletter strahlung und weicher röntgenstrahlung - Google Patents
Verfahren und vorrichtung zum erzeugen von extrem ultravioletter strahlung und weicher röntgenstrahlung Download PDFInfo
- Publication number
- WO2002082872A1 WO2002082872A1 PCT/DE2002/001085 DE0201085W WO02082872A1 WO 2002082872 A1 WO2002082872 A1 WO 2002082872A1 DE 0201085 W DE0201085 W DE 0201085W WO 02082872 A1 WO02082872 A1 WO 02082872A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- electrode
- plasma
- voltage
- trigger
- electrodes
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Ceased
Links
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05G—X-RAY TECHNIQUE
- H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
- H05G2/001—Production of X-ray radiation generated from plasma
- H05G2/003—Production of X-ray radiation generated from plasma the plasma being generated from a material in a liquid or gas state
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70008—Production of exposure light, i.e. light sources
- G03F7/70033—Production of exposure light, i.e. light sources by plasma extreme ultraviolet [EUV] sources
Definitions
- the procedure is such that the ignition delay is reduced by increasing the gas pressure or increased by reducing the gas pressure.
- Such changes in the gas pressure are particularly easy to achieve if the gas flows through the area of the electrode system, for example in order to influence the repetition frequency, that is to say to be able to carry out the method with higher pulse frequencies.
- the ignition delay can be regulated in that the time between reaching the predetermined ignition voltage and the ignition point is measured and in that the gas pressure is adjusted according to the predetermined ignition delay by means of the measurement result.
- the time between reaching the predetermined ignition voltage and the ignition point is measured, for example, in an analog manner using an integrator or digitally using a counter.
- the time is fed to a controller as a measured variable, which accordingly adjusts the gas pressure to stabilize the ignition delay. It can be averaged over a series of discharge processes, that is over a predetermined number of pulses.
- the invention also relates to a device with the features of the preamble of claim 29.
- ionization can occur in the discharge space.
- the mobile ions in the electric field hit the trigger electrode and usually have sufficient energy to knock secondary electrons out of the metallic surface of the electrode. Because of the potential difference, these electrons reach the anode.
- a conductive channel can be formed between the anode and the trigger electrode without the desired breakdown having already occurred in the area of the openings of the electrodes. there a noticeable part of the energy storage can be discharged via the trigger circuit, which entails the risk of this circuit being destroyed.
- the above object is achieved by the features of the characterizing part of claim 29. If the carrier electrode is arranged outside a particle beam which is formed in the axis of symmetry, the particles or ions accelerated in this axis no longer strike the carrier electrode. The malfunctions described above are therefore at least considerably reduced. The same applies if the trigger electrode has a shield that prevents the formation of a conductive channel between the trigger electrode and the anode.
- the device in such a way that the trigger electrode is completely insulated at least from the space adjacent to the first electrode is.
- the production of the trigger electrode for such a device can be advantageously influenced by complete insulation or coating. Inhomogeneities in the field or discharge formation on the metal surfaces of the trigger electrode in the transition region between insulated and non-insulated metal surfaces are also eliminated.
- the trigger electrode is not to be located in the axis of symmetry, it is preferable to design the device in such a way that the trigger electrode is designed as a hollow cylinder surrounding the axis of symmetry.
- the device is exposed to considerable heat during its operation. It is therefore advisable to design them so that the shielding is made of temperature-resistant insulation material.
- the electrode 12 is designed as an anode with a central opening 15 which widens conically starting from an electrode gap 22.
- ignition of the plasma 17 is only possible when an ignition voltage U z has been reached.
- an ignition delay 18 occurs.
- the size of the ignition delay 18 is regulated by controlling the gas pressure. With typical durations, the size of the ignition delay ranges from a few microseconds to a few milliseconds. The ignition delay leads to an extension of the build-up of the conductive plasma. This improves the cylinder symmetry of the plasma 17.
- the electrode system shown in FIG. 6 is provided with a trigger device in the area of the electrode 11.
- the electrode 11 points in the axis of symmetry 13 a trigger electrode 19, which is held by an insulator 26 in the bottom 30 of the electrode 11.
- the insulator 26 serves to enable the trigger electrode 19 to be given a potential which is different from that of the electrode 11.
- the trigger electrode 19 has a parasitic capacitance 31 with respect to the electrode 11, measured in parallel with a switch 32, with which both electrodes 19, 11 can be brought to the same potential.
- the electrode 12 is usually designed as an anode and is grounded as shown. In contrast, the cathode is at a negative potential -V while the trigger electrode 19 is at a potential -V + Vt.
- the potential of the trigger electrode before the start of the triggering process is therefore somewhat higher than that of the electrode 11.
- a trigger pulse is triggered by closing the switch 32, the potential of the trigger electrode 19 being pulled down to that of the electrode 11.
- Typical time constants for a change in the potential of the trigger electrode 19 are advantageously in the range from a few nanoseconds to a few hundred nanoseconds.
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- X-Ray Techniques (AREA)
- Plasma Technology (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
Priority Applications (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE10291549T DE10291549D2 (de) | 2001-04-06 | 2002-03-23 | Verfahren und Vorrichtung zum Erzeugen von extrem ultravioletter Strahlung und weicher Röntgenstrahlung |
| US10/474,121 US7126143B2 (en) | 2001-04-06 | 2002-03-23 | Method and device for producing extreme ultraviolet radiation and soft x-ray radiation |
| CNB02807825XA CN1311716C (zh) | 2001-04-06 | 2002-03-23 | 产生远紫外辐照和软x射线辐照的方法和装置 |
| EP02729817A EP1374650A1 (de) | 2001-04-06 | 2002-03-23 | Verfahren und vorrichtung zum erzeugen von extrem ultravioletter strahlung und weicher röntgenstrahlung |
| JP2002580685A JP4330344B2 (ja) | 2001-04-06 | 2002-03-23 | 超紫外線及び軟x線の発生方法及び装置 |
Applications Claiming Priority (6)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE10117377 | 2001-04-06 | ||
| DE10117377.6 | 2001-04-06 | ||
| DE10139677A DE10139677A1 (de) | 2001-04-06 | 2001-08-11 | Verfahren und Vorrichtung zum Erzeugen von extrem ultravioletter Strahlung und weicher Röntgenstrahlung |
| DE10139677.5 | 2001-08-11 | ||
| EP01125762A EP1248499B1 (de) | 2001-04-06 | 2001-10-29 | Verfahren und Vorrichtung zum Erzeugen von extrem ultravioletter Strahlung |
| EP01125762.3 | 2001-10-29 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| WO2002082872A1 true WO2002082872A1 (de) | 2002-10-17 |
Family
ID=26009027
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| PCT/DE2002/001085 Ceased WO2002082872A1 (de) | 2001-04-06 | 2002-03-23 | Verfahren und vorrichtung zum erzeugen von extrem ultravioletter strahlung und weicher röntgenstrahlung |
Country Status (8)
| Country | Link |
|---|---|
| US (1) | US7126143B2 (https=) |
| EP (2) | EP1248499B1 (https=) |
| JP (1) | JP4330344B2 (https=) |
| CN (1) | CN1311716C (https=) |
| AT (1) | ATE469533T1 (https=) |
| DE (3) | DE10139677A1 (https=) |
| TW (1) | TWI284916B (https=) |
| WO (1) | WO2002082872A1 (https=) |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE10260458B3 (de) * | 2002-12-19 | 2004-07-22 | Xtreme Technologies Gmbh | Strahlungsquelle mit hoher durchschnittlicher EUV-Strahlungsleistung |
| JP2006509330A (ja) * | 2002-12-04 | 2006-03-16 | コーニンクレッカ フィリップス エレクトロニクス エヌ ヴィ | Euv放射用放電灯 |
| JP2006521670A (ja) * | 2003-03-10 | 2006-09-21 | コーニンクレッカ フィリップス エレクトロニクス エヌ ヴィ | 放電空間内の電気放電を介するプラズマの発生のための方法及び装置 |
| JP2007501997A (ja) * | 2003-08-07 | 2007-02-01 | コーニンクレッカ フィリップス エレクトロニクス エヌ ヴィ | 極紫外線及び軟x線発生器 |
| DE102006022823A1 (de) * | 2006-05-12 | 2007-11-22 | Xtreme Technologies Gmbh | Anordnung zur Erzeugung von EUV-Strahlung auf Basis eines Gasentladungsplasmas |
| US7488962B2 (en) | 2005-06-01 | 2009-02-10 | Xtreme Technologies Gmbh | Arrangement for the generation of intensive short-wavelength radiation based on a gas discharge plasma |
Families Citing this family (20)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE10238096B3 (de) * | 2002-08-21 | 2004-02-19 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Gasentladungslampe |
| US6770895B2 (en) | 2002-11-21 | 2004-08-03 | Asml Holding N.V. | Method and apparatus for isolating light source gas from main chamber gas in a lithography tool |
| JP2004226244A (ja) * | 2003-01-23 | 2004-08-12 | Ushio Inc | 極端紫外光源および半導体露光装置 |
| US6919573B2 (en) | 2003-03-20 | 2005-07-19 | Asml Holding N.V | Method and apparatus for recycling gases used in a lithography tool |
| DE10359464A1 (de) | 2003-12-17 | 2005-07-28 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Verfahren und Vorrichtung zum Erzeugen von insbesondere EUV-Strahlung und/oder weicher Röntgenstrahlung |
| WO2006056917A1 (en) | 2004-11-29 | 2006-06-01 | Philips Intellectual Property & Standards Gmbh | Method and apparatus for generating radiation in the wavelength range from about 1 nm to about 30 nm, and use in a lithography device or in metrology |
| DE102004058500A1 (de) | 2004-12-04 | 2006-06-08 | Philips Intellectual Property & Standards Gmbh | Verfahren und Vorrichtung zum Betreiben einer elektrischen Entladevorrichtung |
| JP2008544448A (ja) * | 2005-06-14 | 2008-12-04 | コーニンクレッカ フィリップス エレクトロニクス エヌ ヴィ | Euv放射線及び/又は軟x線を発生させる放射線源を短絡から保護する方法 |
| US7687788B2 (en) * | 2007-07-16 | 2010-03-30 | Asml Netherlands B.V. | Debris prevention system, radiation system, and lithographic apparatus |
| US8493548B2 (en) * | 2007-08-06 | 2013-07-23 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| US7655925B2 (en) | 2007-08-31 | 2010-02-02 | Cymer, Inc. | Gas management system for a laser-produced-plasma EUV light source |
| US20090134129A1 (en) * | 2007-11-27 | 2009-05-28 | General Electric Company | Ablative plasma gun apparatus and system |
| DE102007060807B4 (de) * | 2007-12-18 | 2009-11-26 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Gasentladungsquelle, insbesondere für EUV-Strahlung |
| NL1036595A1 (nl) * | 2008-02-28 | 2009-08-31 | Asml Netherlands Bv | Device constructed and arranged to generate radiation, lithographic apparatus, and device manufacturing method. |
| EP2308272B1 (en) * | 2008-07-28 | 2012-09-19 | Philips Intellectual Property & Standards GmbH | Method and device for generating euv radiation or soft x-rays |
| US20110109226A1 (en) * | 2009-11-06 | 2011-05-12 | Agilent Technologies, Inc. | Microplasma device with cavity for vacuum ultraviolet irradiation of gases and methods of making and using the same |
| CN102625557A (zh) * | 2012-03-30 | 2012-08-01 | 大连理工大学 | 大气压裸电极冷等离子体射流发生装置 |
| KR101542333B1 (ko) * | 2014-12-26 | 2015-08-05 | 한국과학기술연구원 | 다중 가스셀 모듈을 이용한 극자외선 빔 생성장치 |
| US11373845B2 (en) * | 2020-06-05 | 2022-06-28 | Applied Materials, Inc. | Methods and apparatus for symmetrical hollow cathode electrode and discharge mode for remote plasma processes |
| CN114442437B (zh) * | 2020-10-30 | 2024-05-17 | 上海宏澎能源科技有限公司 | 光源装置 |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4201921A (en) * | 1978-07-24 | 1980-05-06 | International Business Machines Corporation | Electron beam-capillary plasma flash x-ray device |
| US4596030A (en) * | 1983-09-10 | 1986-06-17 | Carl Zeiss Stiftung | Apparatus for generating a source of plasma with high radiation intensity in the X-ray region |
| US4602376A (en) * | 1983-09-02 | 1986-07-22 | Centre National De La Recherche Scientifique | Soft X-ray source with cylindrical plasma compression |
| DE19753696A1 (de) * | 1997-12-03 | 1999-06-17 | Fraunhofer Ges Forschung | Vorrichtung und Verfahren zur Erzeugung von Extrem-Ultraviolettstrahlung und weicher Röntgenstrahlung aus einer Gasentladung |
| WO2002007484A2 (en) * | 2000-07-04 | 2002-01-24 | Lambda Physik Ag | Method of producing short-wave radiation from a gas-discharge plasma and device for implementing it |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO1989010646A1 (fr) * | 1988-04-26 | 1989-11-02 | Siemens Aktiengesellschaft | Circuit d'excitation pour lasers a gaz avec un commutateur a pseudo-etincelle a canaux multiples et procede d'utilisation dudit circuit |
| DE19962160C2 (de) * | 1999-06-29 | 2003-11-13 | Fraunhofer Ges Forschung | Vorrichtungen zur Erzeugung von Extrem-Ultraviolett- und weicher Röntgenstrahlung aus einer Gasentladung |
| TWI246872B (en) * | 1999-12-17 | 2006-01-01 | Asml Netherlands Bv | Radiation source for use in lithographic projection apparatus |
| US6667484B2 (en) * | 2000-07-03 | 2003-12-23 | Asml Netherlands B.V. | Radiation source, lithographic apparatus, device manufacturing method, and device manufactured thereby |
| RU2206186C2 (ru) * | 2000-07-04 | 2003-06-10 | Государственный научный центр Российской Федерации Троицкий институт инновационных и термоядерных исследований | Способ получения коротковолнового излучения из газоразрядной плазмы и устройство для его реализации |
-
2001
- 2001-08-11 DE DE10139677A patent/DE10139677A1/de not_active Withdrawn
- 2001-10-29 DE DE50115489T patent/DE50115489D1/de not_active Expired - Lifetime
- 2001-10-29 EP EP01125762A patent/EP1248499B1/de not_active Expired - Lifetime
- 2001-10-29 AT AT01125762T patent/ATE469533T1/de not_active IP Right Cessation
-
2002
- 2002-03-12 TW TW091104540A patent/TWI284916B/zh active
- 2002-03-23 WO PCT/DE2002/001085 patent/WO2002082872A1/de not_active Ceased
- 2002-03-23 JP JP2002580685A patent/JP4330344B2/ja not_active Expired - Fee Related
- 2002-03-23 US US10/474,121 patent/US7126143B2/en not_active Expired - Fee Related
- 2002-03-23 EP EP02729817A patent/EP1374650A1/de not_active Withdrawn
- 2002-03-23 CN CNB02807825XA patent/CN1311716C/zh not_active Expired - Fee Related
- 2002-03-23 DE DE10291549T patent/DE10291549D2/de not_active Expired - Fee Related
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4201921A (en) * | 1978-07-24 | 1980-05-06 | International Business Machines Corporation | Electron beam-capillary plasma flash x-ray device |
| US4602376A (en) * | 1983-09-02 | 1986-07-22 | Centre National De La Recherche Scientifique | Soft X-ray source with cylindrical plasma compression |
| US4596030A (en) * | 1983-09-10 | 1986-06-17 | Carl Zeiss Stiftung | Apparatus for generating a source of plasma with high radiation intensity in the X-ray region |
| DE19753696A1 (de) * | 1997-12-03 | 1999-06-17 | Fraunhofer Ges Forschung | Vorrichtung und Verfahren zur Erzeugung von Extrem-Ultraviolettstrahlung und weicher Röntgenstrahlung aus einer Gasentladung |
| WO2002007484A2 (en) * | 2000-07-04 | 2002-01-24 | Lambda Physik Ag | Method of producing short-wave radiation from a gas-discharge plasma and device for implementing it |
Cited By (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006509330A (ja) * | 2002-12-04 | 2006-03-16 | コーニンクレッカ フィリップス エレクトロニクス エヌ ヴィ | Euv放射用放電灯 |
| CN100375219C (zh) * | 2002-12-04 | 2008-03-12 | 皇家飞利浦电子股份有限公司 | 用于超紫外辐射的气体放电灯 |
| DE10260458B3 (de) * | 2002-12-19 | 2004-07-22 | Xtreme Technologies Gmbh | Strahlungsquelle mit hoher durchschnittlicher EUV-Strahlungsleistung |
| US6815900B2 (en) | 2002-12-19 | 2004-11-09 | Xtreme Technologies Gbmh | Radiation source with high average EUV radiation output |
| JP2006521670A (ja) * | 2003-03-10 | 2006-09-21 | コーニンクレッカ フィリップス エレクトロニクス エヌ ヴィ | 放電空間内の電気放電を介するプラズマの発生のための方法及び装置 |
| JP2011100741A (ja) * | 2003-03-10 | 2011-05-19 | Koninkl Philips Electronics Nv | 放電空間内の電気放電を介するプラズマの発生のための方法及び装置 |
| JP2007501997A (ja) * | 2003-08-07 | 2007-02-01 | コーニンクレッカ フィリップス エレクトロニクス エヌ ヴィ | 極紫外線及び軟x線発生器 |
| JP4814093B2 (ja) * | 2003-08-07 | 2011-11-09 | コーニンクレッカ フィリップス エレクトロニクス エヌ ヴィ | 極紫外線及び軟x線発生器 |
| US7488962B2 (en) | 2005-06-01 | 2009-02-10 | Xtreme Technologies Gmbh | Arrangement for the generation of intensive short-wavelength radiation based on a gas discharge plasma |
| DE102006022823A1 (de) * | 2006-05-12 | 2007-11-22 | Xtreme Technologies Gmbh | Anordnung zur Erzeugung von EUV-Strahlung auf Basis eines Gasentladungsplasmas |
| DE102006022823B4 (de) * | 2006-05-12 | 2010-03-25 | Xtreme Technologies Gmbh | Anordnung zur Erzeugung von EUV-Strahlung auf Basis eines Gasentladungsplasmas |
Also Published As
| Publication number | Publication date |
|---|---|
| EP1248499B1 (de) | 2010-05-26 |
| CN1311716C (zh) | 2007-04-18 |
| DE50115489D1 (de) | 2010-07-08 |
| DE10139677A1 (de) | 2002-10-17 |
| EP1374650A1 (de) | 2004-01-02 |
| EP1248499A1 (de) | 2002-10-09 |
| US20040183037A1 (en) | 2004-09-23 |
| ATE469533T1 (de) | 2010-06-15 |
| US7126143B2 (en) | 2006-10-24 |
| DE10291549D2 (de) | 2004-04-15 |
| TWI284916B (en) | 2007-08-01 |
| CN1531840A (zh) | 2004-09-22 |
| JP2004530269A (ja) | 2004-09-30 |
| JP4330344B2 (ja) | 2009-09-16 |
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