WO2002007154A2 - Process and apparatus for finishing a magnetic slider - Google Patents
Process and apparatus for finishing a magnetic slider Download PDFInfo
- Publication number
- WO2002007154A2 WO2002007154A2 PCT/US2001/021561 US0121561W WO0207154A2 WO 2002007154 A2 WO2002007154 A2 WO 2002007154A2 US 0121561 W US0121561 W US 0121561W WO 0207154 A2 WO0207154 A2 WO 0207154A2
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- slider
- sliders
- disc drive
- lapping
- substrate
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/48—Disposition or mounting of heads or head supports relative to record carriers ; arrangements of heads, e.g. for scanning the record carrier to increase the relative speed
- G11B5/58—Disposition or mounting of heads or head supports relative to record carriers ; arrangements of heads, e.g. for scanning the record carrier to increase the relative speed with provision for moving the head for the purpose of maintaining alignment of the head relative to the record carrier during transducing operation, e.g. to compensate for surface irregularities of the latter or for track following
- G11B5/60—Fluid-dynamic spacing of heads from record-carriers
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/127—Structure or manufacture of heads, e.g. inductive
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/04—Lapping machines or devices; Accessories designed for working plane surfaces
- B24B37/048—Lapping machines or devices; Accessories designed for working plane surfaces of sliders and magnetic heads of hard disc drives or the like
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B49/00—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation
- B24B49/02—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation according to the instantaneous size and required size of the workpiece acted upon, the measuring or gauging being continuous or intermittent
- B24B49/04—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation according to the instantaneous size and required size of the workpiece acted upon, the measuring or gauging being continuous or intermittent involving measurement of the workpiece at the place of grinding during grinding operation
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B49/00—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation
- B24B49/10—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation involving electrical means
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B49/00—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation
- B24B49/16—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation taking regard of the load
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/10—Structure or manufacture of housings or shields for heads
- G11B5/102—Manufacture of housing
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/127—Structure or manufacture of heads, e.g. inductive
- G11B5/187—Structure or manufacture of the surface of the head in physical contact with, or immediately adjacent to the recording medium; Pole pieces; Gap features
- G11B5/1871—Shaping or contouring of the transducing or guiding surface
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/127—Structure or manufacture of heads, e.g. inductive
- G11B5/31—Structure or manufacture of heads, e.g. inductive using thin films
- G11B5/3103—Structure or manufacture of integrated heads or heads mechanically assembled and electrically connected to a support or housing
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/127—Structure or manufacture of heads, e.g. inductive
- G11B5/31—Structure or manufacture of heads, e.g. inductive using thin films
- G11B5/3163—Fabrication methods or processes specially adapted for a particular head structure, e.g. using base layers for electroplating, using functional layers for masking, using energy or particle beams for shaping the structure or modifying the properties of the basic layers
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/127—Structure or manufacture of heads, e.g. inductive
- G11B5/31—Structure or manufacture of heads, e.g. inductive using thin films
- G11B5/3163—Fabrication methods or processes specially adapted for a particular head structure, e.g. using base layers for electroplating, using functional layers for masking, using energy or particle beams for shaping the structure or modifying the properties of the basic layers
- G11B5/3173—Batch fabrication, i.e. producing a plurality of head structures in one batch
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/127—Structure or manufacture of heads, e.g. inductive
- G11B5/31—Structure or manufacture of heads, e.g. inductive using thin films
- G11B5/3109—Details
- G11B5/3116—Shaping of layers, poles or gaps for improving the form of the electrical signal transduced, e.g. for shielding, contour effect, equalizing, side flux fringing, cross talk reduction between heads or between heads and information tracks
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/127—Structure or manufacture of heads, e.g. inductive
- G11B5/31—Structure or manufacture of heads, e.g. inductive using thin films
- G11B5/3163—Fabrication methods or processes specially adapted for a particular head structure, e.g. using base layers for electroplating, using functional layers for masking, using energy or particle beams for shaping the structure or modifying the properties of the basic layers
- G11B5/3166—Testing or indicating in relation thereto, e.g. before the fabrication is completed
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/127—Structure or manufacture of heads, e.g. inductive
- G11B5/33—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only
- G11B5/39—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only using magneto-resistive devices or effects
- G11B5/3903—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only using magneto-resistive devices or effects using magnetic thin film layers or their effects, the films being part of integrated structures
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49002—Electrical device making
- Y10T29/4902—Electromagnet, transformer or inductor
- Y10T29/49021—Magnetic recording reproducing transducer [e.g., tape head, core, etc.]
- Y10T29/49032—Fabricating head structure or component thereof
- Y10T29/49048—Machining magnetic material [e.g., grinding, etching, polishing]
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49002—Electrical device making
- Y10T29/4902—Electromagnet, transformer or inductor
- Y10T29/49021—Magnetic recording reproducing transducer [e.g., tape head, core, etc.]
- Y10T29/49032—Fabricating head structure or component thereof
- Y10T29/49048—Machining magnetic material [e.g., grinding, etching, polishing]
- Y10T29/49052—Machining magnetic material [e.g., grinding, etching, polishing] by etching
Definitions
- the present invention relates generally to sliders for use in magnetic storage drives.
- this invention relates to methods and apparatus for finishing a disc drive slider that include lapping a surface of a disc drive slider.
- BACKGROUND OF THE INVENTION During the fabrication of magnetic heads for use in magnetic data storage applications, an array of transducers and auxiliary circuits are fabricated on a common substrate in a deposition of metallic and non-metallic layers. The array is then cut up into smaller bars, with each bar including a row of multiple read/write heads. The bars are then lapped to adjust an average stripe height (SH) of magnetoresistive (MR) transducers in the bar, the average throat height (TH) of inductive transducer in the bar, or both.
- SH average stripe height
- MR magnetoresistive
- TH average throat height
- the auxiliary circuits in the bars are electrical lap guides (ELGs) that sense the progress of the lapping process.
- ESGs electrical lap guides
- Each electrical lap guide has an electrical resistance that increases as material is removed by lapping. Lapping is stopped automatically when the average stripe height and/or average throat height are within acceptable limits. After the lapping process is complete, the bars are cut up into individual readwrite heads or sliders using diamond saws.
- the process of lapping a solid bar has a limited ability to adjust only the average stripe height or average throat height for all the sliders formed in the bar. There are remaining undesired variations in individual stripe height or throat height among the sliders in a bar. As higher recording densities are being introduced, there is a need for better control than this average control, particularly in the case of stripe height. It is, however, inconvenient and expensive to handle individual sliders in a lapping operation because of their small size. A process and apparatus are needed that can handle bars of substrate with multiple sliders in each bar, while controlling lapping to individually or independently control stripe height for each slider.
- the slider is part of a substrate bar having multiple unfinished sliders formed in it.
- An etch process is used to etch stress-isolating trenches in the substrate aligned between the sliders and to form webs joining the sliders together.
- the apparatus includes a pressure generator that applies multiple pressures to the back surface of one individual slider while the front surface of the one individual slider contacts a lapping surface to form a finished front surface of the slider.
- the webs are removed to separate the sliders.
- the webs flexibly hold the multiple sliders together in a fixture during the lapping process while allowing the individual sliders to move independently.
- the pressures applied to each individual slider can be independently controlled, allowing for improved control of the stripe height (SH), the throat height (TH) or both of each sldier.
- the etching process avoids damage from the use of diamond saws.
- FIG. 1 illustrates an embodiment of a disc drive.
- FIG. 2 illustrates an unfinished substrate including multiple unfinished disc drive sliders.
- FIG. 3 illustrates an unfinished substrate with a selective masking layer.
- FIG. 4 illustrates an unfinished substrate with etched trenches.
- FIG. 5 illustrates an unfinished shder with the selective masking layer removed.
- FIG. 6 schematically illustrates an apparatus applying multiple pressures to an unfinished slider during a lapping process.
- FIG. 7 illustrates a finished substrate including finished sliders.
- FIG. 8 illustrates a cross sectional view of a shder with an inductive transducer and a layer including a magnetoresistive (MR) transducer.
- MR magnetoresistive
- FIG. 9 illustrates a cross sectional view that is transverse to the view shown in FIG. 8 of the layer including a magnetoresistive transducer (MR).
- MR magnetoresistive transducer
- a pressure generator applies multiple pressures to the back surface of one individual slider while the front surface of the one individual slider contacts a lapping surface to form a finished front surface of the slider.
- the lapping can be automatically controlled by feedback from electric lap guides in the one slider being lapped.
- the slider being lapped is able to respond independently to the pressures applied to it because the trenches provide stress isolation between the individual sliders.
- the webs flex to allow the slider being lapped to move independently of adjacent sliders.
- the webs are removed to separate the sliders, preferably using masking and etching.
- Disc drive 100 includes a disc pack 126 having storage surfaces 106 that are typically layers of magnetic material.
- the disc pack 126 includes a stack of multiple discs and the read/write head assembly includes a read/write transducer or slider 110 for each stacked disc.
- Disc pack 126 is spun or rotated as shown by arrow 107 to allow read/write head assembly 112 to access different rotational locations for data on the storage surfaces 106 on the disc pack 126.
- Read/write head assembly 112 is actuated to move radially, relative to the disc pack 126, as shown by arrow 122 to access different radial locations for data on the storage surfaces 106 of disc pack 126.
- the actuation of read/write head assembly 112 is provided by a voice coil motor 118.
- Voice coil motor 118 includes a rotor 116 that pivots on axle 120 and an arm 114 that actuates the read/write head assembly 112.
- Disc drive 100 includes electronic circuitry 130 for controlling the operation of the disc drive and transferring data in and out of the disc drive.
- FIG. 2 illustrates a substrate 20 in an unfinished condition including multiple unfinished disc drive sliders 22 arranged in a bar shape.
- Each disc drive slider 22 includes a front surface 24 which is lapped in a subsequent finishing process while pressure or force is applied to a back surface 26 (not visible in FIG. 2) of each slider 22.
- Each disc drive slider 22 is formed from a slider substrate and various selectively deposited layers of materials that form a read/write head and electrical lap guides(s) in the deposited layers.
- FIG. 3 illustrates the substrate 20 with a selective masking layer 26 applied to the front surfaces 24 of the sliders 22.
- the masking layer 26 is lithographically patterned to define masking grooves 28 which are not covered by the masking layer 26.
- the masking layer 26 is formed of a material that is resistant to erosion by etching.
- FIG. 4 illustrates the substrate 20 after deep trenches 32 have been etched in substrate 20 using a microstructure etching process.
- Reactive ion etching (RIE), ion beam chemical dry etch, ion milling or other known microstructure etching (n icromacliining) techniques can be used. Etching processes are known, for example, from Handbook of Thin Film Technology, IOP Publishing Company
- trenches 32 are defined by the masking grooves 28 and aligned between the individual sliders 22.
- a directional etching process is preferred in etching trenches 32 in order to accurately reproduce the masking grooves and etch deep trenches 32.
- the substrate 20 can be formed of a single crystal material such as doped silicon. The etching process is stopped or controlled to etch trenches 32 only partially through the substrate 20, forming webs 34 that join the sliders 22 together. Webs 34 are thick enough to hold the sliders 22 together during a subsequent lapping operation, and thin and flexible enough to allow each slider 22 to mover responsive to pressure somewhat independently of the adjacent sliders 22.
- FIG. 5 illustrates the unfinished slider 20 with the selective masking layer 26 removed after the etching process is complete.
- FIG. 6 schematically illustrates a process of applying multiple pressures 36 to an unfinished slider 22 during a lapping process.
- a portion of the substrate 20 of FIG. 5 is illustrated with the same reference numerals being used in FIG. 6 that are used in FIG. 5.
- the bar-shaped substrate 20 made up of multiple unfinished sliders 22 joined together by webs 34 is placed between a lapping surface 42 and a multiple pressure generator 38.
- Multiple pressure generator 38 generates multiple pressures 36 that are applied to the back side 26 of one of the sliders 22 as illustrated.
- Multiple pressures 36 can be each individually controlled based on electrical feedback 46 from an electrical lap guide controller or circuit 44.
- Electrical lap guide controller 44 is connected to electrical lap guides (ELGs) 40 that are disposed in the unfinished slider 22 that is being lapped.
- ESGs electrical lap guides
- the front surface 24 of the slider 22 is in contact with lapping surface 42 while controlled pressure is applied to back surface 26.
- a finished front surface is formed by lapping at front surface 24 based on feedback from the electrical lap guides (ELGs) 40. Feedback from the ELGs 40 controls the approach of the front surface 24 to the lapping surface 42.
- the individual pressures 36 can be adjusted in real time to change the profile of pressure applied from front-to-back and left-to-right to vary the lapping rate in different regions of the front surface 24.
- the stripe height (SH), the throat height (TH) or both of each individual slider 22 are precisely controlled using feedback from the electrical lap guides 40.
- the electrical lap guides 40 are explained in more detail below in connection with FIG. 9.
- the multiple sliders 22 can be lapped independently of one another.
- the multiple sliders 22 can be lapped simultaneously using multiple pressure generators 38 and multiple ELG controllers 44.
- simultaneous lapping is done, the substrate 20 is held in place by mechanically engaging the webs 34 on an alternate mounting fixture with arms 12 inserted under the webs 34 as illustrated.
- the webs 34 hold the sliders 22 together and each trench 32 stress- isolates each slider 22 from an adjacent slider 22 during the lapping.
- the webs 34 hold the sliders 22 together while the trenches 32 reduce transverse mechanical support of each slider 22 during the lapping.
- FIG. 7 illustrates a finished substrate 20 including finished shders 23 that include a finished (lapped) front surface 25.
- FIG. 8 illustrates a partial cross sectional view of a slider 58 with an inductive write transducer 50 and a layer 66 including a magnetoresistive (MR) transducer and electrical lap guides (ELGs).
- the cross sectional view in FIG. 8 is perpendicular to a bottom surface 60 that is part of the lapped surface.
- the portion of the shder 58 that is illustrated is a portion near the trailing edge of the slider 58.
- Shder 58 is formed on a substrate 52 in a conventional manner using thin film processing techniques.
- the inductive transducer 50 includes an inductive transducer throat 62 with a throat height 64. Lapping of surface 60 (as described above in connection with FIG. 6) adjusts the height of the inductive throat 62 and also the height of a magnetoresistor and electrical lap guides in layer 66.
- the arrangement of the magnetoresistor and electrical lap guides in layer 66 is explained in more detail below in connection with FIG. 9.
- FIG. 9 illustrates a cross sectional view that is transverse to the view shown in FIG. 8 of the layer 66.
- Layer 66 includes a magnetoresistive transducer (MR) 72 and electrical lap guides 70.
- MR magnetoresistive transducer
- the stripe height 74 of the magnetoresistive transducer 72 changes, and also the electrical resistance of the electrical lap guides 70 changes as they are eroded away by the lapping process.
- the lapping process is stopped.
- the stripe height 74 is controlled by the applied pressures during lapping as explained above in connection with FIG. 6.
- the throat height (TH) 64 is also controlled or adjusted by the applied pressures during lapping.
- a substrate (20) has multiple unfinished sliders (22) formed in it, each slider (22) has a front surface (25) and a back surfaces (26).
- An etch process is used to etch trenches (32) in the substrate (20), aligned between the sliders (22) and to form webs (34) joining the sliders (22) together.
- a multiple pressure generator (38) applies pressures (36) to the back surface (26) of one slider (22) while the front surface (24) of the one slider (22) contacts a lapping surface (42) to form a finished front surface (25).
- the webs (34) are removed to separate the finished disc drive sliders (26).
Abstract
Description
Claims
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
AU2001273273A AU2001273273A1 (en) | 2000-07-13 | 2001-07-09 | Process and apparatus for finishing a magnetic slider |
KR10-2003-7000501A KR100525568B1 (en) | 2000-07-13 | 2001-07-09 | Process and apparatus for finishing a magnetic slider |
JP2002512974A JP4091419B2 (en) | 2000-07-13 | 2001-07-09 | Process and apparatus for finishing a magnetic slider |
GB0301026A GB2380049B (en) | 2000-07-13 | 2001-07-09 | Process and apparatus for finishing a magnetic slider |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US21826200P | 2000-07-13 | 2000-07-13 | |
US60/218,262 | 2000-07-13 |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2002007154A2 true WO2002007154A2 (en) | 2002-01-24 |
WO2002007154A3 WO2002007154A3 (en) | 2002-08-29 |
Family
ID=22814407
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/US2001/021561 WO2002007154A2 (en) | 2000-07-13 | 2001-07-09 | Process and apparatus for finishing a magnetic slider |
Country Status (6)
Country | Link |
---|---|
US (2) | US6551173B2 (en) |
JP (1) | JP4091419B2 (en) |
KR (1) | KR100525568B1 (en) |
AU (1) | AU2001273273A1 (en) |
GB (1) | GB2380049B (en) |
WO (1) | WO2002007154A2 (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
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US6551173B2 (en) * | 2000-07-13 | 2003-04-22 | Seagate Technology Llc | Process and apparatus for finishing a magnetic slider |
CN101183551B (en) * | 2006-11-16 | 2010-06-09 | 日立环球储存科技荷兰有限公司 | Reducing the probability of a slider contacting a surface of a disk |
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US6994608B1 (en) | 2004-11-12 | 2006-02-07 | Hitachi Global Storage Technologies Netherlands, B.V. | Methods of manufacturing sliders |
US8077632B2 (en) * | 2005-01-20 | 2011-12-13 | Citrix Systems, Inc. | Automatic LAN/WAN port detection |
US7450342B2 (en) * | 2005-03-14 | 2008-11-11 | Seagate Technology Llc | Composite head-electrical conditioner assembly |
US7643250B2 (en) | 2006-01-27 | 2010-01-05 | Hitachi Global Storage Technologies Netherlands B.V. | Pad slider design for on-slider ELGs |
US8087973B1 (en) | 2008-08-19 | 2012-01-03 | Western Digital (Fremont), Llc | Slider with leading edge blend and conformal step features |
US8254057B1 (en) | 2012-02-08 | 2012-08-28 | Hitachi Global Storage Technologies Netherlands B.V. | Detecting wedge angle with a third electric lapping guide (ELG) during manufacture of a magnetic head |
US9387568B1 (en) * | 2013-02-27 | 2016-07-12 | Western Digital Technologies, Inc. | Systems and methods for correcting fabrication error in magnetic recording heads using magnetic write width measurements |
US9242340B1 (en) | 2013-03-12 | 2016-01-26 | Western Digital Technologies, Inc. | Method to stress relieve a magnetic recording head transducer utilizing ultrasonic cavitation |
US11389924B2 (en) * | 2018-06-18 | 2022-07-19 | Seagate Technology Llc | Methods of lapping while heating one or more features, and related sliders, row bars, and systems |
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US6093083A (en) * | 1998-05-06 | 2000-07-25 | Advanced Imaging, Inc. | Row carrier for precision lapping of disk drive heads and for handling of heads during the slider fab operation |
JP2000311876A (en) * | 1999-04-27 | 2000-11-07 | Hitachi Ltd | Method and device for manufacturing wiring board |
US6551173B2 (en) * | 2000-07-13 | 2003-04-22 | Seagate Technology Llc | Process and apparatus for finishing a magnetic slider |
-
2001
- 2001-07-09 US US09/901,321 patent/US6551173B2/en not_active Expired - Lifetime
- 2001-07-09 WO PCT/US2001/021561 patent/WO2002007154A2/en active IP Right Grant
- 2001-07-09 AU AU2001273273A patent/AU2001273273A1/en not_active Abandoned
- 2001-07-09 GB GB0301026A patent/GB2380049B/en not_active Expired - Fee Related
- 2001-07-09 KR KR10-2003-7000501A patent/KR100525568B1/en not_active IP Right Cessation
- 2001-07-09 JP JP2002512974A patent/JP4091419B2/en not_active Expired - Fee Related
-
2003
- 2003-03-05 US US10/382,300 patent/US6843705B2/en not_active Expired - Fee Related
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JPS55135322A (en) * | 1979-04-11 | 1980-10-22 | Fujitsu Ltd | Manufacture of thin-film magnetic head |
US4418472A (en) * | 1981-11-23 | 1983-12-06 | Xerox Corporation | Method of delineating thin film magnetic head arrays |
JPS58194164A (en) * | 1982-05-04 | 1983-11-12 | Hitachi Ltd | Manufacture of magnetic head |
JPS644906A (en) * | 1987-06-26 | 1989-01-10 | Hitachi Ltd | Production of magnetic head |
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PATENT ABSTRACTS OF JAPAN vol. 005, no. 005 (P-044), 14 January 1981 (1981-01-14) & JP 55 135322 A (FUJITSU LTD), 22 October 1980 (1980-10-22) * |
PATENT ABSTRACTS OF JAPAN vol. 008, no. 042 (P-256), 23 February 1984 (1984-02-23) & JP 58 194164 A (HITACHI SEISAKUSHO KK), 12 November 1983 (1983-11-12) * |
PATENT ABSTRACTS OF JAPAN vol. 013, no. 167 (P-861), 20 April 1989 (1989-04-20) & JP 01 004906 A (HITACHI LTD), 10 January 1989 (1989-01-10) * |
PATENT ABSTRACTS OF JAPAN vol. 016, no. 070 (P-1315), 20 February 1992 (1992-02-20) & JP 03 263604 A (FUJITSU LTD), 25 November 1991 (1991-11-25) * |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6551173B2 (en) * | 2000-07-13 | 2003-04-22 | Seagate Technology Llc | Process and apparatus for finishing a magnetic slider |
CN101183551B (en) * | 2006-11-16 | 2010-06-09 | 日立环球储存科技荷兰有限公司 | Reducing the probability of a slider contacting a surface of a disk |
Also Published As
Publication number | Publication date |
---|---|
JP4091419B2 (en) | 2008-05-28 |
WO2002007154A3 (en) | 2002-08-29 |
US20020009949A1 (en) | 2002-01-24 |
GB2380049A (en) | 2003-03-26 |
KR100525568B1 (en) | 2005-11-03 |
GB2380049B (en) | 2004-01-07 |
AU2001273273A1 (en) | 2002-01-30 |
US6843705B2 (en) | 2005-01-18 |
US6551173B2 (en) | 2003-04-22 |
JP2004504685A (en) | 2004-02-12 |
US20030148715A1 (en) | 2003-08-07 |
GB0301026D0 (en) | 2003-02-19 |
KR20030078057A (en) | 2003-10-04 |
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