WO2001004621A1 - Frequency warping for improving resonator signal-to-noise ratio - Google Patents
Frequency warping for improving resonator signal-to-noise ratio Download PDFInfo
- Publication number
- WO2001004621A1 WO2001004621A1 PCT/US2000/018793 US0018793W WO0104621A1 WO 2001004621 A1 WO2001004621 A1 WO 2001004621A1 US 0018793 W US0018793 W US 0018793W WO 0104621 A1 WO0104621 A1 WO 0104621A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- voltage
- circuit
- sensor
- variable capacitor
- resonant
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N29/00—Investigating or analysing materials by the use of ultrasonic, sonic or infrasonic waves; Visualisation of the interior of objects by transmitting ultrasonic or sonic waves through the object
- G01N29/36—Detecting the response signal, e.g. electronic circuits specially adapted therefor
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N29/00—Investigating or analysing materials by the use of ultrasonic, sonic or infrasonic waves; Visualisation of the interior of objects by transmitting ultrasonic or sonic waves through the object
- G01N29/02—Analysing fluids
- G01N29/022—Fluid sensors based on microsensors, e.g. quartz crystal-microbalance [QCM], surface acoustic wave [SAW] devices, tuning forks, cantilevers, flexural plate wave [FPW] devices
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N29/00—Investigating or analysing materials by the use of ultrasonic, sonic or infrasonic waves; Visualisation of the interior of objects by transmitting ultrasonic or sonic waves through the object
- G01N29/34—Generating the ultrasonic, sonic or infrasonic waves, e.g. electronic circuits specially adapted therefor
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N29/00—Investigating or analysing materials by the use of ultrasonic, sonic or infrasonic waves; Visualisation of the interior of objects by transmitting ultrasonic or sonic waves through the object
- G01N29/36—Detecting the response signal, e.g. electronic circuits specially adapted therefor
- G01N29/42—Detecting the response signal, e.g. electronic circuits specially adapted therefor by frequency filtering or by tuning to resonant frequency
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2291/00—Indexing codes associated with group G01N29/00
- G01N2291/01—Indexing codes associated with the measuring variable
- G01N2291/014—Resonance or resonant frequency
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2291/00—Indexing codes associated with group G01N29/00
- G01N2291/02—Indexing codes associated with the analysed material
- G01N2291/025—Change of phase or condition
- G01N2291/0256—Adsorption, desorption, surface mass change, e.g. on biosensors
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2291/00—Indexing codes associated with group G01N29/00
- G01N2291/04—Wave modes and trajectories
- G01N2291/042—Wave modes
- G01N2291/0422—Shear waves, transverse waves, horizontally polarised waves
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2291/00—Indexing codes associated with group G01N29/00
- G01N2291/04—Wave modes and trajectories
- G01N2291/042—Wave modes
- G01N2291/0426—Bulk waves, e.g. quartz crystal microbalance, torsional waves
Definitions
- Bulk acoustic wave (BAW) chemical sensors are used to measure the concentration of constituents or analyte in fluids (gases and liquids).
- These acoustic wave devices are typically constructed of piezoelectric crystals coated on at least one side with a material that has an affinity for the analyte whose concentration is to be measured. The device is placed in the fluid stream containing the analyte to be measured, and the analyte is adsorbed or absorbed onto the coated surface.
- the amount of analyte adsorbed or absorbed by the acoustic wave device increases the mass of the device and alters the viscoelastic properties at the surface of the device, thereby damping the acoustic wave properties of the device. As a result, the frequency at which the acoustic wave device will resonant is altered.
- the change in resonant frequency of the device changes the operating frequency of the oscillator.
- the concentration of the analyte can be determined by measuring the change in operating frequency of the oscillator circuit over time.
- These chemical sensors are designed to operate in specific ranges of environmental conditions, such as temperature (e.g., -10°C to 50°C) and humidity (e.g., 0% to 90% relative humidity) and are capable of detecting small concentrations, and small changes of concentrations, of the targeted analyte.
- temperature e.g., -10°C to 50°C
- humidity e.g., 0% to 90% relative humidity
- small changes in analyte concentrations can produce small changes in the resonant frequency of the crystal.
- a small concentration of analyte being measured might alter the nominal resonant frequency of a 10 MHz crystal by about 200 Hz. Therefore, the detection circuit must be capable of detecting the resonant frequency of the crystal with high accuracy.
- the viscoelastic properties of the device can be affected by thermal dynamic conditions to which the device is subjected. More particularly, temperature and humidity can "age" the characteristics of the crystal, causing permanent alteration of the viscoelastic properties of the crystal. This alteration of viscoelastic properties affects the dynamic characteristics of the device, and hence the velocity of resonance in the crystal forming the device. Alteration of the resonant properties of the crystal often creates inharmonic mode responses, which generate noise in the operating frequency of the oscillator circuit. Therefore, it is important to eliminate the effects of noise in the detection circuit.
- This invention utilizes time domain signal processing to reduce the inharmonic noise which distorts the fundamental frequency of a bulk acoustic wave sensor.
- One form of the invention is a process for reducing the inharmonic noise which distorts the fundamental frequency of the sensor.
- a voltage variable capacitor is placed in series with the sensor to create a voltage-controlled oscillator.
- the voltage-controlled oscillator is placed in parallel with a resonant oscillator to form a circuit having a resonant frequency.
- a reverse bias direct current (dc) voltage is applied across the voltage variable capacitor to alter its capacitance thereby warping the resonant frequency away from inharmonic noise frequencies.
- Another form of the invention is a sensor circuit for use in measuring the concentration of analytes in a fluid.
- the circuit includes a bulk acoustic wave sensor.
- a voltage variable capacitor is connected to the sensor.
- An input supplies a bias warping dc voltage to the capacitor.
- a resonant oscillator circuit detects the fundamental frequency of the sensor, and produces a resonant signal frequency.
- the bias dc voltage applied to the voltage variable capacitor warps the resonant frequency of the circuit away from the inharmonic noise frequencies.
- the senor and capacitor are connected in series to form a voltage-controlled oscillator which, in turn, is connected in parallel to the resonant oscillator.
- FIG. 1 is a top view of a bulk acoustic wave chemical sensor employed in the preferred embodiment of the present invention.
- FIG. 2 is a section view of the sensor shown in FIG. 1 taken at line 2—2.
- FIG. 3 is a frequency diagram showing the inharmonic modes which can distort the fundamental frequency of the sensor shown in FIGS. 1 and
- FIG. 4 is a circuit illustrating the implementation of the preferred embodiment of the present invention.
- FIG. 1 is a top view, and FIG. 2 is a section view, of a bulk acoustic wave (BAW) sensor 18 employed in the presently preferred embodiment.
- Gold electrodes 10 and 24 are deposited to a thickness of about 300 Angstroms (A) onto a 50A chromium seedlayer on opposite surfaces 20 and 22 of substrate 12.
- a 0.1 to 8 micron polymer film 14 is deposited onto electrode 10 and exposed portions of surface 20.
- a second layer 26 of the same polymer material is deposited onto the bottom electrode 24 and exposed portion of surface 22. In either case, the polymer material has an affinity for the analyte to be measured.
- Sensor 18 is placed in a stream containing the analyte to be measured and the analyte is absorbed or adsorbed onto the coated surface.
- the thickness of substrate 12 together with electrodes 10 and 24 and films 14 and 26 define the resonant frequency of the device. As one or both polymer films absorb or adsorb analyte, the resonant frequency of the device changes.
- Electrodes 10 and 24 include terminals for connection of sensor 18 to respective circuit elements in FIG. 4.
- FIG. 3 is a frequency diagram showing potential effects of inharmonic distortion of the fundamental frequency of sensor 18.
- Signal amplitude is plotted on axis 30, and time is plotted on axis 32.
- T indicates the period of oscillation; the fundamental frequency is therefore 1/T.
- FIG. 3 shows signal distortion caused by inharmonic modes that pull away from the fundamental frequency of sensor 18. These inharmonic modes shift the fundamental frequency of the sensor by as much as 1 kilohertz (KHz) to 10 KHz, depending on various factors.
- KHz kilohertz
- artifacts in sensor 18 can produce thickness shear modes. Stress and damping characteristics also change with time and become more noticeable, causing the distortion shown in FIG. 3.
- the viscoelastic properties and dynamic loss characteristics (i.e. the motional parameters) of sensor 18 can intensify the inharmonic mode distortion over varying thermodynamic conditions. Temperature and humidity "age" the crystal of sensor 18, causing permanent alteration of its viscoelastic properties.
- Waveform 34 shows the undistorted fundamental frequency generated by sensor 18.
- Waveform 36 shows a distorted fundamental caused by an inharmonic mode that pulls down, or reduces, the fundamental frequency.
- Waveform 38 shows a distorted fundamental caused by an inharmonic mode that pulls up, or increases, the fundamental frequency.
- FIG. 4 is a circuit diagram of the preferred embodiment of the invention that warps a resonant frequency of the detection oscillator associated with the sensor.
- the circuit utilizes time domain signal processing, and is comprised of a voltage-controlled oscillator circuit in parallel with a resonant oscillator circuit.
- the voltage-controlled oscillator circuit includes sensor 18, varactor 40, reference bias capacitor C2, summing resistors Rl and R2, phase shifting capacitors Cl and C3, and input 44.
- Sensor 18 has one of its terminals connected to phase shifting capacitor C3, which in turn is connected to ground.
- the second terminal of sensor 18 is connected through summing resistor R2 to input 44, and to the cathode of varactor 40.
- Varactor 40 is preferably a Zetex Hyper-Hyperabrupt variable capacitance diode, type ZC932. Varactor 40 functions as a voltage variable capacitor. Increasing the reverse bias voltage across varactor 40 reduces its capacitance.
- the anode of varactor 40 is connected through second summing resistor Rl to ground, and to reference bias capacitor C2.
- Reference bias capacitor C2 is also connected through second phase shifting capacitor Cl to ground.
- the resonant oscillator circuit is connected in parallel with the voltage controlled oscillator circuit.
- the resonant oscillator circuit includes inverter 42 which is also connected to supply +V, resistors R3 and R4, and tuning capacitor C4.
- Resistor R3 is connected to the input of inverter 42, and also through capacitor C4 to ground.
- Resistor R4 is also connected through capacitor C4 to ground, and also in the output of inverter 42.
- the input of inverter 42 is connected to the junction of capacitors Cl and C2, and the output of inverter 42 is inverted to the junction of sensor 18 and capacitor C3, and to output 46.
- Inverter 42 is a high gain linear amplifier. Voltage +V supplies the power to the resonant oscillator circuit.
- Input voltage 44 provides a reverse bias dc voltage to the cathode of varactor 40.
- the value of the bias voltage is established by the summing resistors Rl and R2, as well as by capacitor C2.
- Capacitors Cl and C3 are phase shifting capacitors which enable startup of the circuit.
- the variable reactive load of varactor 40, in series with sensor 18, forces a change in the resonant frequency of sensor 18. The amount of the change is based on the values of resistors Rl and R2 and the bias dc voltage input at 44.
- Output 46 provides a signal with an adjusted resonant frequency, minus the inharmonic tones. Output 46 is connected to a high resolution counter, such as the one described in Application No.
- the senor 18 Under normal conditions, the sensor 18, with a nominal frequency of 10 MHz, typically oscillates with a maximum error of approximately 10 Hertz (Hz). However, as noted previously, the inharmonic mode oscillations can cause frequency skipping, thereby pulling the fundamental frequency away from its 10 megahertz (MHz) value by as much as 1 to 10 KHz (representing a distortion of .01% to .1%). Sensor 18, however, must have a high resolution to measure small changes in analyte concentrations. For example, concentrations of analyte being measured may alter the initial 10 MHz frequency of sensor 18 by about 200 Hz (representing a change of .002%).
- the frequency warping mechanism will pull the resonant frequency of the circuit back towards the 10 MHz fundamental value of the sensor.
- the warping circuit will pull the initial resonant frequency of the circuit back to 10.0 MHz through proper selection of resistors Rl and R2 and bias dc voltage value.
- the reverse bias dc voltage supplied by 44 is applied with voltage levels of 1, 2.5 and 4 volts.
- the amount of voltage applied by 44 is determined by the observed amount of noise distortion generated by sensor 18, and therefore by the amount of frequency warping needed.
- the selected reverse bias voltage is applied across 40 to provide a selected capacitance to varactor 40.
- bias dc voltage levels of 1, 2.5 and 4 volts affects varactor 40 to provide capacitance of 17, 9 and 5 picofarad (pF), respectively, in a Zetex ZC932 diode.
- Rl and R2 have values of about 100 K ohms.
Abstract
Description
Claims
Priority Applications (7)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CA002378759A CA2378759C (en) | 1999-07-13 | 2000-07-10 | Frequency warping for improving resonator signal-to-noise ratio |
JP2001509981A JP4773656B2 (en) | 1999-07-13 | 2000-07-10 | Frequency warping to improve the S / N ratio of the resonator |
DE60014090T DE60014090T2 (en) | 1999-07-13 | 2000-07-10 | FREQUENCY VARIATION FOR IMPROVING THE SIGNAL NOISE DISTANCE OF A SENSOR |
BRPI0012394-3A BR0012394B1 (en) | 1999-07-13 | 2000-07-10 | A process for reducing inharmonic noise effects that distorts a volume acoustic wave sensor signal, and a sensor circuit for use in measuring concentrations of an analyte in a fluid. |
EP00947178A EP1194771B1 (en) | 1999-07-13 | 2000-07-10 | Frequency warping for improving resonator signal-to-noise ratio |
AU60833/00A AU6083300A (en) | 1999-07-13 | 2000-07-10 | Frequency warping for improving resonator signal-to-noise ratio |
MXPA01013214A MXPA01013214A (en) | 1999-07-13 | 2000-07-10 | Frequency warping for improving resonator signal-to-noise ratio. |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US09/352,730 US6654470B1 (en) | 1999-07-13 | 1999-07-13 | Frequency warping for improving resonator signal-to-noise ratio |
US09/352,730 | 1999-07-13 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2001004621A1 true WO2001004621A1 (en) | 2001-01-18 |
Family
ID=23386243
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/US2000/018793 WO2001004621A1 (en) | 1999-07-13 | 2000-07-10 | Frequency warping for improving resonator signal-to-noise ratio |
Country Status (10)
Country | Link |
---|---|
US (1) | US6654470B1 (en) |
EP (1) | EP1194771B1 (en) |
JP (1) | JP4773656B2 (en) |
CN (1) | CN1172185C (en) |
AU (1) | AU6083300A (en) |
BR (1) | BR0012394B1 (en) |
CA (1) | CA2378759C (en) |
DE (1) | DE60014090T2 (en) |
MX (1) | MXPA01013214A (en) |
WO (1) | WO2001004621A1 (en) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2003168926A (en) * | 2001-11-29 | 2003-06-13 | Nippon Dempa Kogyo Co Ltd | Voltage-controlled piezoelectric oscillator |
CN100495008C (en) * | 2003-06-18 | 2009-06-03 | 中山市泰威技术开发有限公司 | Piezo-electric acoustic wave sensor passive array and its biological chip |
KR100828128B1 (en) * | 2006-07-20 | 2008-05-09 | 에이디반도체(주) | Method and apparatus for detecting capacitance using time division multi-frequency |
JP5505596B2 (en) * | 2008-06-18 | 2014-05-28 | セイコーエプソン株式会社 | Resonant circuit, oscillation circuit, filter circuit, and electronic device |
US9746442B2 (en) | 2014-03-30 | 2017-08-29 | International Business Machines Corporation | Switched-capacitor biosensor device |
WO2020131406A1 (en) * | 2018-12-19 | 2020-06-25 | Abbott Diabetes Care Inc. | Systems, devices, and methods for rf detection of analyte sensor measurements |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4361026A (en) * | 1980-06-24 | 1982-11-30 | Muller Richard S | Method and apparatus for sensing fluids using surface acoustic waves |
US4905701A (en) * | 1988-06-15 | 1990-03-06 | National Research Development Corporation | Apparatus and method for detecting small changes in attached mass of piezoelectric devices used as sensors |
US5212988A (en) * | 1988-02-29 | 1993-05-25 | The Reagents Of The University Of California | Plate-mode ultrasonic structure including a gel |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3260104A (en) * | 1962-10-22 | 1966-07-12 | Exxon Research Engineering Co | Apparatus for fluid analysis |
GB1483735A (en) * | 1973-11-09 | 1977-08-24 | Secr Defence | Acoustic wave oscillator |
US5229735A (en) * | 1992-03-30 | 1993-07-20 | Macrovision Corporation | Wide frequency deviation voltage controlled crystal oscillator having plural parallel crystals |
JPH06265459A (en) * | 1993-03-15 | 1994-09-22 | Toshiba Corp | Cracked gas detector |
JP3354217B2 (en) | 1993-07-30 | 2002-12-09 | 柴田科学株式会社 | How to measure the mass concentration of dust particles in a gas |
US5705399A (en) | 1994-05-20 | 1998-01-06 | The Cooper Union For Advancement Of Science And Art | Sensor and method for detecting predetermined chemical species in solution |
JPH09191216A (en) * | 1996-01-09 | 1997-07-22 | Sony Corp | Pll circuit using ceramic oscillator, ceramic fm modulator, ceramic reference oscillator, and pll type fm modulator using ceramic reference oscillator |
JPH1028016A (en) * | 1996-07-09 | 1998-01-27 | Murata Mfg Co Ltd | Piezoelectric reference oscillator |
US6222366B1 (en) * | 1999-05-10 | 2001-04-24 | Fisher Controls International, Inc. | High frequency measuring circuit with inherent noise reduction for resonating chemical sensors |
US6237397B1 (en) * | 1999-10-06 | 2001-05-29 | Iowa State University Research Foundation, Inc. | Chemical sensor and coating for same |
-
1999
- 1999-07-13 US US09/352,730 patent/US6654470B1/en not_active Expired - Lifetime
-
2000
- 2000-07-10 CN CNB008103615A patent/CN1172185C/en not_active Expired - Lifetime
- 2000-07-10 MX MXPA01013214A patent/MXPA01013214A/en active IP Right Grant
- 2000-07-10 CA CA002378759A patent/CA2378759C/en not_active Expired - Lifetime
- 2000-07-10 BR BRPI0012394-3A patent/BR0012394B1/en not_active IP Right Cessation
- 2000-07-10 AU AU60833/00A patent/AU6083300A/en not_active Abandoned
- 2000-07-10 WO PCT/US2000/018793 patent/WO2001004621A1/en active IP Right Grant
- 2000-07-10 DE DE60014090T patent/DE60014090T2/en not_active Expired - Lifetime
- 2000-07-10 EP EP00947178A patent/EP1194771B1/en not_active Expired - Lifetime
- 2000-07-10 JP JP2001509981A patent/JP4773656B2/en not_active Expired - Lifetime
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4361026A (en) * | 1980-06-24 | 1982-11-30 | Muller Richard S | Method and apparatus for sensing fluids using surface acoustic waves |
US5212988A (en) * | 1988-02-29 | 1993-05-25 | The Reagents Of The University Of California | Plate-mode ultrasonic structure including a gel |
US4905701A (en) * | 1988-06-15 | 1990-03-06 | National Research Development Corporation | Apparatus and method for detecting small changes in attached mass of piezoelectric devices used as sensors |
Also Published As
Publication number | Publication date |
---|---|
EP1194771A1 (en) | 2002-04-10 |
DE60014090D1 (en) | 2004-10-28 |
JP4773656B2 (en) | 2011-09-14 |
BR0012394A (en) | 2002-03-12 |
DE60014090T2 (en) | 2005-02-03 |
CA2378759A1 (en) | 2001-01-18 |
CN1361864A (en) | 2002-07-31 |
US6654470B1 (en) | 2003-11-25 |
JP2003504620A (en) | 2003-02-04 |
CN1172185C (en) | 2004-10-20 |
EP1194771B1 (en) | 2004-09-22 |
BR0012394B1 (en) | 2012-11-27 |
MXPA01013214A (en) | 2002-06-21 |
CA2378759C (en) | 2007-04-17 |
AU6083300A (en) | 2001-01-30 |
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