WO2000024550A1 - Belt for polishing semiconductors - Google Patents

Belt for polishing semiconductors Download PDF

Info

Publication number
WO2000024550A1
WO2000024550A1 PCT/GB1999/003507 GB9903507W WO0024550A1 WO 2000024550 A1 WO2000024550 A1 WO 2000024550A1 GB 9903507 W GB9903507 W GB 9903507W WO 0024550 A1 WO0024550 A1 WO 0024550A1
Authority
WO
WIPO (PCT)
Prior art keywords
belt
layer
cupping
supporting
polymer
Prior art date
Application number
PCT/GB1999/003507
Other languages
French (fr)
Inventor
Brian Lombardo
Original Assignee
Scapa Group Plc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Scapa Group Plc filed Critical Scapa Group Plc
Priority to JP2000578140A priority Critical patent/JP2002528277A/en
Priority to DE69914215T priority patent/DE69914215T2/en
Priority to KR1020017005027A priority patent/KR20020018642A/en
Priority to AU63548/99A priority patent/AU6354899A/en
Priority to EP99950961A priority patent/EP1126952B1/en
Publication of WO2000024550A1 publication Critical patent/WO2000024550A1/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/11—Lapping tools
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B21/00—Machines or devices using grinding or polishing belts; Accessories therefor
    • B24B21/04—Machines or devices using grinding or polishing belts; Accessories therefor for grinding plane surfaces
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24D—TOOLS FOR GRINDING, BUFFING OR SHARPENING
    • B24D11/00—Constructional features of flexible abrasive materials; Special features in the manufacture of such materials
    • B24D11/001—Manufacture of flexible abrasive materials
    • B24D11/005—Making abrasive webs
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24D—TOOLS FOR GRINDING, BUFFING OR SHARPENING
    • B24D11/00—Constructional features of flexible abrasive materials; Special features in the manufacture of such materials
    • B24D11/06—Connecting the ends of materials, e.g. for making abrasive belts

Definitions

  • the purpose of this invention is to produce seamless, composite belts
  • CMP Chemical mechanical polishing
  • the present invention overcomes this critical problem.
  • the present invention comprises a seamless, composite belt that is
  • polishing layer typically have one or more polymer layers, including the polishing layer, and
  • the seamless, composite belts of the present invention are typically
  • the manufacturing process typically involves
  • thermoset materials to combine and cure thermoset materials.
  • polymeric materials to combine and cure thermoset materials.
  • the polymeric layer can be any suitable polymeric layer
  • material or combination of materials can be solid or porous, and it may
  • fillers contain any types or combinations of fillers and active or inert ingredients.
  • a substantially cylindrical mold is used to produce belts with
  • the mold can be
  • forming belts with symmetrical properties would include forming the belts
  • a composite belt of at least two different layers typically is needed
  • the polishing layer can be smooth or
  • the supporting layers may be any type of woven or
  • non-woven fabric made of natural or synthetic, organic or inorganic
  • the composite structure can lead to uneven internal
  • this invention is that the belts must have a composite structure in order for the seamless polishing belts to provide the flat surface in the span where
  • the wafers are contacted.
  • the composite structure is necessary in order to provide the right
  • the belt to lie substantially flat throughout the span between the mounting
  • a two-layer belt where a loosely woven, mesh fabric is coated on the outside or top by hot cast polyurethane.
  • polyurethane layer that is allowed to solidify at room temperature before
  • the top layer is made of a more rigid material than the

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Laminated Bodies (AREA)
  • Polishing Bodies And Polishing Tools (AREA)

Abstract

An improved belt for mechanical polishing of semiconductor wafers, which belt maintains a substantially flat surface in the span between its mounting surfaces. The belt has at least one polymer layer including a polishing layer, and at least one woven or non-woven supporting layer. The symmetrical properties of the belt are arranged to achieve a balance between down-cupping and up-cupping forces exerted on the belt in the span between its mounting in order to prevent the edges of the belt cupping up or down.

Description

BELT FOR POLISHING SEMICONDUCTORS
Background of the Invention
The purpose of this invention is to produce seamless, composite belts
for improved polishing of semiconductor wafers as a result of the belts lying
flat, without cupping up or down, while in contact with a semiconductor
wafer.
Chemical mechanical polishing (CMP) or semiconductor wafers is a
relatively new technology used in the manufacture of integrated circuits.
Conventional CMP technology involves holding a wafer face down in
contact with a flat polishing pad mounted on a rotating turntable. This
arrangement derived from traditional glass polishing technology. More
recently a new type of CMP polishing tool has been invented by Ontrak
Systems , later acquired by Lam Research. The new tool, as described in
U.S. Patent 5, 692,947, uses a linear polishing member comprising a
conventional, flat polishing pad adhered to a supporting endless metal belt.
Currently there are no one-piece belts available either for use in polishing
semiconductor wafers or for use on Lam's tool.
A division of Scapa Group has been developing a seamless,
composite belt for use on Lam's proprietary polishing tool. There are many
difficulties and constraints involved with developing such a belt that integrally combines sufficient strength and a precision polishing surface and
that can be manufactured efficiently and consistently. One unexpected
problem in particular was that the prototype belts would not maintain a flat
surface, i.e., the edges of the belt would curl up or down in the span
between the mounting rollers, which resulted in poor polishing performance
because of uneven contact with the surface of the semiconductor wafer.
The present invention overcomes this critical problem.
Summary of the Invention
The present invention comprises a seamless, composite belt that is
designed, constructed, or manufactured to maintain a substantially flat
surface in the span between two rollers. The belts of the present invention
typically have one or more polymer layers, including the polishing layer, and
one or more supporting woven or non-woven layers. The present invention
is accomplished by achieving the necessary balance between down-cupping
and up-cupping forces using one or more of the following approaches: 1 )
varying the relative thickness of the different polymer and supporting layers
in the belt, 2) varying the relative hardness or rigidity of the different layers
in the belt, 3) varying the temperatures at which the different layers are
formed, 4) varying the compositions of supporting layers, and 5)
prestressing one or more of the composite layers.
Belts of the present invention are particularly useful in chemical
mechanical polishing of semiconductor wafers, where it is critical to maintain even contact with the entire surface of the flat wafer. In addition,
belts of the present invention would be useful in other applications,
including other polishing applications, printing applications, and material
handling applications, for example, where uniform contact between the belt
and the workpiece is necessary.
Brief Description of the Invention
The seamless, composite belts of the present invention are typically
produced by casting, compression molding, or injection molding a polymer
layer onto a supporting layer. The manufacturing process typically involves
elevated temperatures in order to melt and flow thermoplastic materials or
to combine and cure thermoset materials. However the polymeric materials
may be cured at any suitable temperature or sequence of different
temperatures and times as desired. The polymeric layer can be any suitable
material or combination of materials. It can be solid or porous, and it may
contain any types or combinations of fillers and active or inert ingredients.
Typically a substantially cylindrical mold is used to produce belts with
symmetrical properties and without splices or seams. The mold can be
static, or it can be spinning, as in centrifugal casting. Another option for
forming belts with symmetrical properties would include forming the belts
on a rotating cylindrical core or roller. It is possible that the belts could be
manufactured by a continuous extrusion of a polymer layer onto a tubular
support material that is then sliced into belts of a desired width. A composite belt of at least two different layers typically is needed
to provide both the precision polishing surface and the necessary
mechanical strength of the belt. The polishing layer can be smooth or
textured and can have any suitable pattern of grooves, depressions, or
raised features, that have been molded in or achieved by machining or other
secondary operations. The supporting layers may be any type of woven or
non-woven fabric, made of natural or synthetic, organic or inorganic
materials.
However, the composite structure can lead to uneven internal
stresses when the belt is at rest and when it is mounted on rollers under
tension, which often result in the edges of the belt cupping up or down in
the span between the mounting rollers. Often the uneven internal stresses
are caused by the use of materials with different thermal or molecular
shrinkage rates or different tensile, shear, and compressive properties.
Given this understanding of the potential causes of belt cupping, it would
seem logical to look for a way to totally eliminate the uneven internal
stresses either by matching properties of different materials or by finding a
single material that both polishes and provides mechanical strength.
However, a single component belt that is seamless and that has been
formed in a substantially cylindrical shape, for example a solid rubber or
urethane belt, will not lie perfectly flat in the span between the mounting
rollers, and in fact the edges will cup downward. A surprising feature of
this invention is that the belts must have a composite structure in order for the seamless polishing belts to provide the flat surface in the span where
the wafers are contacted.
The composite structure is necessary in order to provide the right
balance of up-cutting and down-cupping forces in the belt when spanned
between mounting rollers. Balancing the up-cupping and the down-cupping
forces can be achieved by using one or a combination of the following
approaches: 1 ) varying the relative thickness of the different polymer and
supporting layers in the belt, 2) varying the relative hardness or rigidity of
the different layers in the belt, 3) varying the temperatures at which the
different layers are formed, 4) varying the compositions of supporting
layers, and 5) prestressing one or more of the composite layers. In
addition it is possible to create a suitable balance between up-cupping and
down-cupping by forming a belt with alternating sections around the length
of the belt that have opposite tendencies to cup. The alternating up-
cupping and down-cupping sections tend to cancel each other out to force
the belt to lie substantially flat throughout the span between the mounting
rollers.
Examples of belt structures that have the desired balance of up-
cupping and down-cupping in order to lie flat include
1 ) A three-layer belt where a woven fabric is coated on both sides
by hot cast polyurethane and where the top layer of urethane is thicker than
the bottom layer.
2) A two-layer belt where a loosely woven, mesh fabric is coated on the outside or top by hot cast polyurethane.
3) A two-layer belt where a hot cast polyurethane layer is formed
with wound reinforcing cord.
4) A two-layer belt where the hot cast polyurethane layer is
formed over a prestressed fabric being held under tension during the
molding process.
5) A two-layer belt where a fabric layer is coated with a
polyurethane layer that is allowed to solidify at room temperature before
completing the cure cycle at a higher temperature.
6) A three-layer belt where the top and bottom layers are the
same thickness but the top layer is made of a more rigid material than the
bottom layer.
7) A three-layer belt where the top layer is a uniform thickness
but the bottom layer varies in the thickness sinusoidally so as to create
alternating sections with slight up-cutting and slight down-cupping
tendencies.
8) A three-layer belt where the top layer is a foam and the bottom
layer is a solid material.

Claims

1 . A seamless, composite belt which will maintain a substantially
flat surface in a span between two spaced apart mounting surfaces, the belt
comprising one or more polymer layers including a polishing layer, and one
or more supporting woven or non-woven layers, the belt having symmetrical
properties to achieve a balance between down-cupping and up-cupping
forces exerted on the belt in the span between the mounting surfaces to
prevent edges of the belt cupping up or down.
2. The belt of claim 1 wherein the polymer layers have different
thickness.
3. The belt of claim 1 wherein the polymer layers have different
hardness or rigidity.
4. The belt of claim 1 wherein the polymer layers are formed at
different temperatures.
5. The belt of claim 1 wherein the polymer layers have different
compositions.
6. The belt of claim 1 wherein one or more of the polymer and
supporting layers are prestressed.
7. The belt of claim 1 wherein the belt has alternating sections
with opposite tendencies to cup.
8. The belt of claim 1 wherein the belt is in substantially
cylindrical shape.
9. The belt of claim 1 wherein the belt is a three-layer belt having a woven fabric coated on both sides by hot cast polyurethane and wherein
the top layer of urethane is thicker than the bottom layer.
10. The belt of claim 1 wherein the belt is a two-layer belt having
a loosely woven, mesh fabric coated on the outside or top by hot cast
polyurethane.
1 1 . The belt of claim 1 wherein the belt is a two-layer belt having
a hot cast polyurethane layer formed with wound reinforcing cord.
1 2. The belt of claim 1 wherein the belt is a two-layer belt having
a hot cast polyurethane layer formed over a prestressed fabric held under
tension during a molding process.
1 3. The belt of claim 1 wherein the belt is a two-layer belt having
a fabric layer coated with a polyurethane layer that is allowed to solidify at
room temperature before completing a cure cycle at a higher temperature.
14. The belt of claim 1 wherein the belt is a three-layer belt having
top and bottom polymer layers of the same thickness on either side of the
supporting layer and having the top layer made of a more rigid material than
the bottom layer.
1 5. The belt of claim 1 wherein the belt is a three-layer belt having
a top polymer layer of a uniform thickness above the supporting layer and
a bottom polymer layer below the supporting layer which varies in thickness
sinusoidally so as to create alternating sections with slight up-cupping and
slight down-cupping tendencies.
1 6. The belt of claim 1 wherein the belt is a three-layer belt having a top layer of a foam above the supporting layer and a bottom layer of a
solid material below the supporting layer.
PCT/GB1999/003507 1998-10-26 1999-10-22 Belt for polishing semiconductors WO2000024550A1 (en)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP2000578140A JP2002528277A (en) 1998-10-26 1999-10-22 Semiconductor polishing belt
DE69914215T DE69914215T2 (en) 1998-10-26 1999-10-22 SEMICONDUCTOR POLISHING TAPE
KR1020017005027A KR20020018642A (en) 1998-10-26 1999-10-22 Belt for Polishing Semiconductors
AU63548/99A AU6354899A (en) 1998-10-26 1999-10-22 Belt for polishing semiconductors
EP99950961A EP1126952B1 (en) 1998-10-26 1999-10-22 Belt for polishing semiconductors

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10560698P 1998-10-26 1998-10-26
US60/105,606 1998-10-26

Publications (1)

Publication Number Publication Date
WO2000024550A1 true WO2000024550A1 (en) 2000-05-04

Family

ID=22306791

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/GB1999/003507 WO2000024550A1 (en) 1998-10-26 1999-10-22 Belt for polishing semiconductors

Country Status (8)

Country Link
US (1) US6213858B1 (en)
EP (1) EP1126952B1 (en)
JP (1) JP2002528277A (en)
KR (1) KR20020018642A (en)
AU (1) AU6354899A (en)
DE (1) DE69914215T2 (en)
TW (1) TWI235115B (en)
WO (1) WO2000024550A1 (en)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6464566B1 (en) * 2000-06-29 2002-10-15 Lsi Logic Corporation Apparatus and method for linearly planarizing a surface of a semiconductor wafer
US6572463B1 (en) * 2000-12-27 2003-06-03 Lam Research Corp. Methods for making reinforced wafer polishing pads utilizing direct casting and apparatuses implementing the same
US6561889B1 (en) * 2000-12-27 2003-05-13 Lam Research Corporation Methods for making reinforced wafer polishing pads and apparatuses implementing the same
US20030224678A1 (en) * 2002-05-31 2003-12-04 Applied Materials, Inc. Web pad design for chemical mechanical polishing
US8602851B2 (en) * 2003-06-09 2013-12-10 Rohm And Haas Electronic Materials Cmp Holdings, Inc. Controlled penetration subpad

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US1994283A (en) * 1929-06-13 1935-03-12 Carborundum Co Manufacture of abrasive paper
WO1993012911A1 (en) * 1991-12-20 1993-07-08 Minnesota Mining And Manufacturing Company A coated abrasive belt with an endless, seamless backing and method of preparation
WO1998035785A1 (en) * 1997-02-14 1998-08-20 Lam Research Corporation Integrated pad and belt for chemical mechanical polishing

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4337598A (en) * 1979-12-21 1982-07-06 Minnesota Mining And Manufacturing Company Endless belt with automatic steering control
US4715150A (en) * 1986-04-29 1987-12-29 Seiken Co., Ltd. Nonwoven fiber abrasive disk
US5486133A (en) * 1994-05-31 1996-01-23 Russell; Jerry Timing belt grinding apparatus and method
ATE186001T1 (en) 1994-08-09 1999-11-15 Ontrak Systems Inc LINEAR POLISHER AND WAFER PLANARISATION PROCESS
EP0812456B1 (en) * 1995-03-02 2000-01-12 Minnesota Mining And Manufacturing Company Method of texturing a substrate using a structured abrasive article
US5769691A (en) * 1996-06-14 1998-06-23 Speedfam Corp Methods and apparatus for the chemical mechanical planarization of electronic devices
JP2738392B1 (en) * 1996-11-05 1998-04-08 日本電気株式会社 Polishing apparatus and polishing method for semiconductor device
IT243153Y1 (en) * 1997-04-30 2002-02-28 Paolo Baratti FLEXIBLE SUPPORT FOR ABRASIVE MATERIAL IN SHEETS.

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US1994283A (en) * 1929-06-13 1935-03-12 Carborundum Co Manufacture of abrasive paper
WO1993012911A1 (en) * 1991-12-20 1993-07-08 Minnesota Mining And Manufacturing Company A coated abrasive belt with an endless, seamless backing and method of preparation
WO1998035785A1 (en) * 1997-02-14 1998-08-20 Lam Research Corporation Integrated pad and belt for chemical mechanical polishing

Also Published As

Publication number Publication date
EP1126952A1 (en) 2001-08-29
DE69914215T2 (en) 2004-12-02
AU6354899A (en) 2000-05-15
KR20020018642A (en) 2002-03-08
EP1126952B1 (en) 2004-01-14
TWI235115B (en) 2005-07-01
JP2002528277A (en) 2002-09-03
DE69914215D1 (en) 2004-02-19
US6213858B1 (en) 2001-04-10

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