WO2000015869A1 - Part based on aluminium coated with amorphous hard carbon - Google Patents
Part based on aluminium coated with amorphous hard carbon Download PDFInfo
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- WO2000015869A1 WO2000015869A1 PCT/FR1999/002158 FR9902158W WO0015869A1 WO 2000015869 A1 WO2000015869 A1 WO 2000015869A1 FR 9902158 W FR9902158 W FR 9902158W WO 0015869 A1 WO0015869 A1 WO 0015869A1
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- layer
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- amorphous hard
- hard carbon
- aluminum
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/02—Pretreatment of the material to be coated
- C23C16/0272—Deposition of sub-layers, e.g. to promote the adhesion of the main coating
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/26—Deposition of carbon only
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/04—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material
Definitions
- the present invention relates to aluminum or aluminum alloy parts provided with an amorphous hard carbon coating.
- Such coatings make it possible to improve the mechanical and tribological properties of aluminum and its alloys, in particular their hardness.
- Parts provided with such coatings can be used in a wide variety of fields where the properties of lightness, malleability, power of heat dissipation, and recycling of aluminum are of great interest.
- parts of this type can be used in engine blocks and cylinder heads, synchronization parts, piston skirts, oil pump parts, plastic injection molds, suspension and cylinder housings.
- Aluminum and its alloys are materials used in a wide variety of fields due to the special properties of aluminum.
- these materials are corrodible and do not have good mechanical and tribological properties; in in particular, they have a low hardness, which makes it necessary to resort to a surface treatment of these parts.
- amorphous hard carbon (Diamond like Carbon) is of great interest because it has mechanical, electrical and thermal properties similar to that of diamond.
- This carbon exists only in the form of a thin layer because of high residual stresses in the film which limit its thickness. It has the advantageous properties of having a low coefficient of friction, low wear, great hardness and good abrasion resistance, and of being in the form of a relatively flexible layer.
- amorphous hard carbon coatings are very hard, they are difficult to deposit on soft substrates such as aluminum or aluminum alloy parts. It would therefore be of great interest to produce hardness gradient coatings on such substrates.
- the subject of the present invention is precisely parts made of aluminum or aluminum alloy, provided with such a coating, thanks to the presence of one or more intermediate layers between the base part and the coating of amorphous hard carbon, which ensure the adhesion of the amorphous hard carbon film.
- the part made of aluminum or aluminum alloy comprises a coating, the hardness increases from the surface of the part to the upper surface of the coating, said coating comprising an upper layer of amorphous hard carbon, two intermediate layers based on silicon including a layer of SiO x with x ranging from 1 to 2 and a layer of SiC, the layer of SiC being adjacent to the upper layer of the coating, and a lower layer of A1 2 0 3 between the surface of the part and the layer of SiO x .
- the intermediate layer or layers of the coating make it possible to form a hardness gradient which ensures the adhesion of the amorphous carbon film to the aluminum or aluminum alloy base.
- the part made of aluminum or aluminum alloy comprises a coating whose hardness increases from the surface of the part to the upper surface of the coating, said coating comprising an upper layer of carbon. hydrogenated and nitrogenous amorphous hard, two intermediate silicon-based layers including a layer of Si (0, N) and a layer of Si (C, N), the layer of Si (C, N) being adjacent to the upper layer of the coating, and a lower layer of A1 (0, N) between the surface of the part and the layer of Si (0, N).
- the formulas Si (0, N), Si (C, N) and A1 (0, N) relate respectively to the compounds SiO x , SiC and A1 2 0 3 , and mean that, in these compounds, 5 at 50% of the oxygen or carbon atoms can be replaced by nitrogen atoms.
- the total thickness of the coating is advantageously from 2 to 4 ⁇ m.
- Such hardness gradient coatings can be obtained by subjecting the aluminum or aluminum alloy substrate to a two-stage surface treatment. In a first step, a diffusion layer is produced by ionic oxynitriding or oxidation processes. Through this, diffusion layers of Al 2 0 3 and A1 (0, N) are obtained respectively. These layers have the particularity of already being harder than the substrate and allow a smooth transition in terms of hardness.
- a vapor deposition process assisted by cold plasma (PACVD or PVD) is carried out with a composition and hardness gradient coating.
- the coating is of SiO x type when the diffusion layer is Al 2 0 3 and Si (N, 0) when it is A1 (0, N).
- the intermediate layer is of SiC: H type.
- the latter promotes the attachment of the upper layer of DLC (hydrogenated amorphous carbon) or DLN (hydrogenated amorphous carbon doped with nitrogen).
- This last layer of DLC (or DLN) gives the assembly a high hardness as well as a very low coefficient of friction.
- the alumina diffusion layer can be formed on the substrate by ionic oxidation from an oxygen plasma.
- the diffusion layer in A1 (0, N) can be formed in the same way by oxynitriding by means of a plasma of oxygen and nitrogen.
- the intermediate layers are then produced by conventional PACVD techniques using from a gas mixture comprising an organic compound of silicon, oxygen and optionally nitrogen.
- the upper layers of amorphous hard carbon can be formed by the PECVD or PACVD technique described in Surface and Coatings Technology 98, 1998, pp. 976-984 [1].
- the advantage of the plasma-assisted vapor deposition technique has the advantage of allowing the deposition of an amorphous hard carbon layer on soft substrates by forming a hardness gradient coating, which improves the mechanical and tribological properties of aluminum or aluminum alloy parts.
- an amorphous hard carbon coating can be produced on aluminum or aluminum alloy parts, of various dimensions and geometry.
- the upper layer based on amorphous hard carbon can be deposited from a gas mixture comprising a hydrocarbon and hydrogen.
- the gas mixture used for this deposition further comprises nitrogen, and a layer of hard hydrogenated and nitrogenous amorphous carbon is thus obtained.
- the hydrocarbon used can be any hydrocarbon which can be used to form a carbon deposit.
- methane diluted with hydrogen, and optionally nitrogen, is used.
- the layers silicon-based intermediates can consist of a first layer of SiO x with x ranging from 1 to 2, which is deposited from a gaseous mixture comprising an organic compound of silicon and oxygen, and by a second layer of SiC which is deposited from a gas mixture comprising an organic compound of silicon, argon and hydrogen.
- the intermediate layers based on silicon are a first layer of Si (0, N) which is deposited from a gaseous mixture comprising a compound organic silicon, oxygen and nitrogen, and a second layer of Si (C, N) which is deposited from a gaseous mixture comprising an organic compound of silicon, nitrogen, argon and hydrogen.
- the organic silicon compound used for these deposits can be any organic compound capable of reacting in the plasma to form an oxide or a silicon carbide.
- TMS tetramethylsilane
- Figure 1 shows schematically in vertical section a reactor suitable for the production of a coating according to the invention on large parts.
- the deposition reactor comprises an earthed enclosure (1), inside which is a support (3) for the parts to be treated (5), this support being connected to a radio frequency generator (7).
- the support (3) can be a tray or a rod for hanging the parts to be treated.
- the generator (7) comprises a system for adjusting the power and the frequency as well as a device for displaying the self-biasing voltage.
- the gases necessary for deposits are introduced into the enclosure by a pipe (9) connected to a gas diffuser (11) located in the enclosure which may be cylindrical.
- the pipe (9) is connected to a gas supply system (13) which comprises at least 6 lines by which hydrogen, oxygen, nitrogen can be brought to the gas diffuser (11) , hydrogenated argon (volume ratio Ar: H 2 of 9: 1), the hydrocarbon C x H y and the organic silicon compound.
- the enclosure is also connected to a pumping unit (15) at its lower part to achieve and maintain the desired pressure in one enclosure.
- a control console not shown in the figure has pumping, gas flow and total pressure control devices, the pressure measurement being provided by a capacitive gauge.
- Each gas supply line is equipped an electronically regulated mass flow meter and a shut-off valve which are connected to the control cabinet fitted with a flow display and simultaneous adjustment device. All the steps of the process of the invention can be implemented in this reactor.
- a pickling treatment using a plasma of inert gas, for example argon or a mixture of argon and hydrogen in a volume proportion of 9: 1, using a pressure low enough to allow a powerful ion bombardment, for example a polarization of -700 V. It is then possible to carry out in this enclosure the formation of a first layer d alumina or A1 (0, N) by means of an oxygen or oxygen and nitrogen plasma. Next, the silicon-based layers are deposited, still in the same enclosure, by modifying the gases introduced and the gas flow rates.
- inert gas for example argon or a mixture of argon and hydrogen in a volume proportion of 9: 1
- the hard amorphous carbon film is formed, changing the gas source.
- methane is used for the deposition of the amorphous hard carbon layer and tetramethylsilane (TS) for the deposition of the intermediate layers based on Si.
- TS tetramethylsilane
- a layer of amorphous hard carbon (DLC) having very good mechanical properties is deposited on a piece of aluminum and silicon alloy.
- DLC amorphous hard carbon
- ion oxidation is carried out in radio frequency plasma at 13.56 MHz.
- the processing conditions are as follows:
- the hardness gradient layer is produced by PACVD RF (13.56 MHz).
- TMS tetramethyl silane + oxygen at a pressure of 0.01 mbar and a power density of 0.5 / cm.
- the total duration of this deposit phase is 3 hours.
- a coating of total thickness of between 2 and 4 ⁇ m is thus obtained with an average deposition rate of the order of 1 ⁇ m / h.
- the nature of the deposit is determined by infrared spectrometry.
- the thicknesses of the layers are determined by observation with a scanning electron microscope of metallographic section of the samples.
- a tribological characterization is carried out by a pawn / disc type test. A coefficient of friction of 0.05 and a nanosecurity of 20,000 MPa are recorded.
- the thicknesses of the layers are the following A1 2 0 3 0.2 to 0.5 ⁇ m SiO x 0.2 to 0.5 ⁇ m SiC 0.3 to 0.5 ⁇ m
- Amorphous hard carbon (DLC) 1 to 3 ⁇ m.
- the hardnesses obtained are as follows: Substrate in aluminum alloy: 2000 to 2500 MPa layer in A1 2 0 3 : 8000 MPa layer in SiO x : 8000 MPa layer of DLC: 18 000 to 20 000 MPa.
- a layer of hard hydrogenated and nitrogenous amorphous carbon DLN (Diamond Like Nanocomposite) is formed on an aluminum alloy part.
- the three intermediate layers providing a hardness gradient in the coating in this case contain nitrogen.
- ion oxynitriding is carried out in radio frequency plasma at 13.56 MHz.
- the processing conditions are as follows: Flow rate 0 2 : 50 cm / min. Flow N 2 : 50 cm / min. Duration: 60 min Temperature: 250 C
- the hardness gradient layer is produced by PACVD RF (13.56 MHz).
- PACVD RF 13.56 MHz.
- TMS tetramethyl silane + oxygen + nitrogen at a pressure of 0.01 mbar and a power density of 0.5 W / cra 2 .
- the total duration of this deposit phase is 3 hours.
Abstract
The invention concerns a part based on aluminium coated with amorphous hard carbon. Said part comprises a coating with a gradient of hardness containing a base layer in Al2O3 or Al (O, N), intermediate layers based on Si such as SiOx and SiC, or Si (O, N) and Si (C, N), and a top layer of hydrogenated and optionally nitrogenated amorphous hard carbon.
Description
PIECE A BASE D'ALUMINIUM REVETUE DE CARBONE DUR AMORPHEALUMINUM PART COATED WITH AMORPHOUS HARD CARBON
DESCRIPTIONDESCRIPTION
Domaine techniqueTechnical area
La présente invention a pour objet des pièces en aluminium ou en alliage d'aluminium munies d'un revêtement de carbone dur amorphe.The present invention relates to aluminum or aluminum alloy parts provided with an amorphous hard carbon coating.
De tels revêtements permettent d' améliorer les propriétés mécaniques et tribologiques de l'aluminium et de ses alliages, en particulier leur dureté.Such coatings make it possible to improve the mechanical and tribological properties of aluminum and its alloys, in particular their hardness.
Des pièces munies de tels revêtements peuvent être utilisées dans des domaines très variés où les propriétés de légèreté, malléabilité, pouvoir de dissipation thermique, et recyclage de l'aluminium sont d'un grand intérêt.Parts provided with such coatings can be used in a wide variety of fields where the properties of lightness, malleability, power of heat dissipation, and recycling of aluminum are of great interest.
A titre d'exemple, des pièces de ce type peuvent être utilisées dans des blocs moteurs et culasses, des pièces de synchronisation, des jupes de piston, des pièces de pompes à huile, des moules d'injection de matière plastique, des éléments de suspension et des carters de cylindres.For example, parts of this type can be used in engine blocks and cylinder heads, synchronization parts, piston skirts, oil pump parts, plastic injection molds, suspension and cylinder housings.
État de la technique antérieureState of the art
L'aluminium et ses alliages sont des matériaux utilisés dans des domaines très variés en raison des propriétés particulières de l'aluminium.Aluminum and its alloys are materials used in a wide variety of fields due to the special properties of aluminum.
Cependant, ces matériaux sont corrodables et n'ont pas de bonnes propriétés mécaniques et tribologiques ; en
particulier, ils ont une faible dureté, qui rend nécessaire d'avoir recours à un traitement de surface de ces pièces.However, these materials are corrodible and do not have good mechanical and tribological properties; in in particular, they have a low hardness, which makes it necessary to resort to a surface treatment of these parts.
Parmi les revêtements envisagés pour des pièces de ce type, le carbone dur amorphe (Diamond like Carbon) est d'un grand intérêt car il présente des propriétés mécaniques, électriques et thermiques semblables à celle du diamant. Ce carbone n'existe que sous forme de couche mince à cause de fortes contraintes résiduelles dans le film qui en limitent son épaisseur. Il présente les propriétés intéressantes d'avoir un faible coefficient de frottement, une faible usure, une grande dureté et une bonne résistance à l'abrasion, et de se présenter sous forme de couche relativement flexible.Among the coatings envisaged for parts of this type, amorphous hard carbon (Diamond like Carbon) is of great interest because it has mechanical, electrical and thermal properties similar to that of diamond. This carbon exists only in the form of a thin layer because of high residual stresses in the film which limit its thickness. It has the advantageous properties of having a low coefficient of friction, low wear, great hardness and good abrasion resistance, and of being in the form of a relatively flexible layer.
Les revêtements de carbone dur amorphe étant très durs, ils sont difficiles à déposer sur des substrats mous tels que des pièces en aluminium ou en alliage d'aluminium. Il serait donc d'un grand intérêt de réaliser sur de tels substrats des revêtements à gradient de dureté.As amorphous hard carbon coatings are very hard, they are difficult to deposit on soft substrates such as aluminum or aluminum alloy parts. It would therefore be of great interest to produce hardness gradient coatings on such substrates.
La présente invention a précisément pour objet des pièces en aluminium ou en alliage d'aluminium, munies d'un tel revêtement, grâce à la présence d'une ou plusieurs couches intermédiaires entre la pièce de base et le revêtement de carbone dur amorphe, qui permettent d'assurer l'adhérence du film de carbone dur amorphe.The subject of the present invention is precisely parts made of aluminum or aluminum alloy, provided with such a coating, thanks to the presence of one or more intermediate layers between the base part and the coating of amorphous hard carbon, which ensure the adhesion of the amorphous hard carbon film.
Exposé de l'inventionStatement of the invention
Selon l'invention, la pièce en aluminium ou en alliage d'aluminium comporte un revêtement dont la
dureté augmente depuis la surface de la pièce jusqu'à la surface supérieure du revêtement, ledit revêtement comportant une couche supérieure en carbone dur amorphe, deux couches intermédiaires à base de silicium dont une couche de SiOx avec x allant de 1 à 2 et une couche de SiC, la couche de SiC étant adjacente à la couche supérieure du revêtement, et une couche inférieure de A1203 entre la surface de la pièce et la couche de SiOx. Dans cette pièce, la ou les couches intermédiaires du revêtement permettent de former un gradient de dureté qui assure l'adhérence du film de carbone amorphe sur la base en aluminium ou en alliage d' aluminium. Selon une variante de réalisation de l'invention, la pièce en aluminium ou en alliage d' aluminium comporte un revêtement dont la dureté augmente depuis la surface de la pièce jusqu'à la surface supérieure du revêtement, ledit revêtement comportant une couche supérieure en carbone dur amorphe hydrogéné et azoté, deux couches intermédiaires à base de silicium dont une couche de Si(0,N) et une couche de Si(C,N), la couche de Si(C,N) étant adjacente à la couche supérieure du revêtement, et une couche inférieure de A1(0,N) entre la surface de la pièce et la couche de Si(0,N).According to the invention, the part made of aluminum or aluminum alloy comprises a coating, the hardness increases from the surface of the part to the upper surface of the coating, said coating comprising an upper layer of amorphous hard carbon, two intermediate layers based on silicon including a layer of SiO x with x ranging from 1 to 2 and a layer of SiC, the layer of SiC being adjacent to the upper layer of the coating, and a lower layer of A1 2 0 3 between the surface of the part and the layer of SiO x . In this part, the intermediate layer or layers of the coating make it possible to form a hardness gradient which ensures the adhesion of the amorphous carbon film to the aluminum or aluminum alloy base. According to an alternative embodiment of the invention, the part made of aluminum or aluminum alloy comprises a coating whose hardness increases from the surface of the part to the upper surface of the coating, said coating comprising an upper layer of carbon. hydrogenated and nitrogenous amorphous hard, two intermediate silicon-based layers including a layer of Si (0, N) and a layer of Si (C, N), the layer of Si (C, N) being adjacent to the upper layer of the coating, and a lower layer of A1 (0, N) between the surface of the part and the layer of Si (0, N).
Dans cette variante, les formules Si(0,N), Si(C,N) et A1(0,N) se rapportent respectivement aux composés SiOx, SiC et A1203, et signifient que, dans ces composés, 5 à 50 % des atomes d'oxygène ou de carbone peuvent être remplacés par des atomes d'azote.In this variant, the formulas Si (0, N), Si (C, N) and A1 (0, N) relate respectively to the compounds SiO x , SiC and A1 2 0 3 , and mean that, in these compounds, 5 at 50% of the oxygen or carbon atoms can be replaced by nitrogen atoms.
Selon l'invention, l'épaisseur totale du revêtement est avantageusement de 2 à 4 μm.
De tels revêtements à gradient de dureté peuvent être obtenus en soumettant le substrat en aluminium ou en alliage d'aluminium à un traitement de surface en deux étapes. Dans une première étape, on réalise une couche de diffusion par des procédés d'oxydation ou d' oxynitruration ioniques. Par ce biais, on obtient respectivement des couches de diffusion de Al203 et A1(0,N). Ces couches présentent la particularité d'être déjà plus dures que le substrat et permettent une transition douce au niveau de la dureté.According to the invention, the total thickness of the coating is advantageously from 2 to 4 μm. Such hardness gradient coatings can be obtained by subjecting the aluminum or aluminum alloy substrate to a two-stage surface treatment. In a first step, a diffusion layer is produced by ionic oxynitriding or oxidation processes. Through this, diffusion layers of Al 2 0 3 and A1 (0, N) are obtained respectively. These layers have the particularity of already being harder than the substrate and allow a smooth transition in terms of hardness.
A la suite de ce traitement de diffusion ionique, on réalise par un procédé de dépôt en phase vapeur assisté par plasma froid (PACVD ou PVD) un revêtement à gradient de composition et de dureté.Following this ion diffusion treatment, a vapor deposition process assisted by cold plasma (PACVD or PVD) is carried out with a composition and hardness gradient coating.
Côté substrat, le revêtement est de type SiOx lorsque la couche de diffusion est Al203 et Si(N,0) lorsqu'il s'agit de A1(0,N).On the substrate side, the coating is of SiO x type when the diffusion layer is Al 2 0 3 and Si (N, 0) when it is A1 (0, N).
La couche intermédiaire est de type SiC : H. Cette dernière favorise l'accrochage de la couche supérieure de DLC (Carbone amorphe hydrogéné) ou de DLN (Carbone amorphe hydrogéné dopé à l'azote).The intermediate layer is of SiC: H type. The latter promotes the attachment of the upper layer of DLC (hydrogenated amorphous carbon) or DLN (hydrogenated amorphous carbon doped with nitrogen).
Cette dernière couche de DLC (ou DLN) confère à l'ensemble une dureté élevée ainsi qu'un très bas coefficient de frottement.This last layer of DLC (or DLN) gives the assembly a high hardness as well as a very low coefficient of friction.
La couche de diffusion en alumine peut être formée sur le substrat par oxydation ionique à partir d'un plasma d'oxygène. La couche de diffusion en A1(0,N) peut être formée de la même façon par oxynitruration au moyen d'un plasma d'oxygène et d' azote .The alumina diffusion layer can be formed on the substrate by ionic oxidation from an oxygen plasma. The diffusion layer in A1 (0, N) can be formed in the same way by oxynitriding by means of a plasma of oxygen and nitrogen.
Les couches intermédiaires sont ensuite réalisées par les techniques classiques de PACVD à
partir d'un mélange gazeux comprenant un composé organique du silicium, de l'oxygène et éventuellement de l'azote.The intermediate layers are then produced by conventional PACVD techniques using from a gas mixture comprising an organic compound of silicon, oxygen and optionally nitrogen.
Les couches supérieures de carbone dur amorphe peuvent être formées par la technique de PECVD ou PACVD décrite dans Surface and Coatings Technology 98, 1998, pp. 976-984 [1] .The upper layers of amorphous hard carbon can be formed by the PECVD or PACVD technique described in Surface and Coatings Technology 98, 1998, pp. 976-984 [1].
L' emploi de la technique de dépôt en phase vapeur assistée par plasma a pour avantage de permettre le dépôt d'une couche de carbone dur amorphe sur des substrats mous par formation d'un revêtement à gradient de dureté, ce qui permet d'améliorer les propriétés mécaniques et tribologiques des pièces en aluminium ou en alliage d'aluminium. Ainsi, selon l'invention, on peut réaliser un revêtement de carbone dur amorphe sur des pièces en aluminium ou en alliage d'aluminium, de dimensions et géométrie diverses.The advantage of the plasma-assisted vapor deposition technique has the advantage of allowing the deposition of an amorphous hard carbon layer on soft substrates by forming a hardness gradient coating, which improves the mechanical and tribological properties of aluminum or aluminum alloy parts. Thus, according to the invention, an amorphous hard carbon coating can be produced on aluminum or aluminum alloy parts, of various dimensions and geometry.
Avec cette technique de dépôt, on peut déposer la couche supérieure à base de carbone dur amorphe à partir d'un mélange gazeux comprenant un hydrocarbure et de l'hydrogène.With this deposition technique, the upper layer based on amorphous hard carbon can be deposited from a gas mixture comprising a hydrocarbon and hydrogen.
Selon une variante de réalisation, le mélange gazeux utilisé pour ce dépôt comprend de plus de l'azote, et on obtient ainsi une couche de carbone dur amorphe hydrogéné et azoté.According to an alternative embodiment, the gas mixture used for this deposition further comprises nitrogen, and a layer of hard hydrogenated and nitrogenous amorphous carbon is thus obtained.
L'hydrocarbure utilisé peut être n'importe quel hydrocarbure utilisable pour former un dépôt de carbone. De préférence, on utilise le méthane dilué avec de l'hydrogène, et éventuellement de l'azote.The hydrocarbon used can be any hydrocarbon which can be used to form a carbon deposit. Preferably, methane diluted with hydrogen, and optionally nitrogen, is used.
Lorsque la couche supérieure est une couche de carbone dur hydrogéné obtenu à partir d'un mélange d'hydrocarbure et d'hydrogène, les couches
intermédiaires à base de silicium, peuvent être constituées par une première couche de SiOx avec x allant de 1 à 2 , que l'on dépose à partir d'un mélange gazeux comprenant un composé organique du silicium et de l'oxygène, et par une seconde couche de SiC que l'on dépose à partir d'un mélange gazeux comprenant un composé organique du silicium, de l'argon et de 1' hydrogène .When the upper layer is a layer of hard hydrogenated carbon obtained from a mixture of hydrocarbon and hydrogen, the layers silicon-based intermediates, can consist of a first layer of SiO x with x ranging from 1 to 2, which is deposited from a gaseous mixture comprising an organic compound of silicon and oxygen, and by a second layer of SiC which is deposited from a gas mixture comprising an organic compound of silicon, argon and hydrogen.
Dans le cas où la couche supérieure est une couche de carbone dur hydrogéné et azoté, les couches intermédiaires à base de silicium sont une première couche de Si(0,N) que l'on dépose à partir d'un mélange gazeux comprenant un composé organique du silicium, de l'oxygène et de l'azote, et une seconde couche de Si(C,N) que l'on dépose à partir d'un mélange gazeux comprenant un composé organique du silicium, de l'azote, de l'argon et de l'hydrogène.In the case where the upper layer is a layer of hard hydrogenated and nitrogenous carbon, the intermediate layers based on silicon are a first layer of Si (0, N) which is deposited from a gaseous mixture comprising a compound organic silicon, oxygen and nitrogen, and a second layer of Si (C, N) which is deposited from a gaseous mixture comprising an organic compound of silicon, nitrogen, argon and hydrogen.
Le composé organique du silicium utilisé pour ces dépôts, peut être n'importe quel composé organique capable de réagir dans le plasma pour former un oxyde ou un carbure de silicium. De préférence, on utilise le tétraméthylsilane (TMS) .The organic silicon compound used for these deposits can be any organic compound capable of reacting in the plasma to form an oxide or a silicon carbide. Preferably, tetramethylsilane (TMS) is used.
D' autres caractéristiques et avantages de l'invention apparaîtront mieux à la lecture de la description qui suit, donnée bien entendu à titre illustratif et non limitatif, en référence au dessin annexé .Other characteristics and advantages of the invention will appear better on reading the description which follows, given of course by way of illustration and not limitation, with reference to the appended drawing.
Brève description du dessinBrief description of the drawing
La figure 1 représente schématiquement en coupe verticale un réacteur convenant pour la
réalisation d'un revêtement conforme à l'invention sur des pièces de grandes dimensions.Figure 1 shows schematically in vertical section a reactor suitable for the production of a coating according to the invention on large parts.
Exposé détaillé des modes de réalisationDetailed description of the embodiments
Sur la figure 1, on voit que le réacteur de dépôt comprend une enceinte (1) mise à la terre, à l'intérieur de laquelle est disposé un support (3) pour les pièces à traiter (5), ce support étant relié à un générateur de radiofréquence (7). Le support (3) peut être un plateau ou une tige permettant de suspendre les pièces à traiter.In FIG. 1, it can be seen that the deposition reactor comprises an earthed enclosure (1), inside which is a support (3) for the parts to be treated (5), this support being connected to a radio frequency generator (7). The support (3) can be a tray or a rod for hanging the parts to be treated.
Le générateur (7) comprend un système de réglage de la puissance et de la fréquence ainsi qu'un dispositif d' affichage de la tension d' autopolarisation.The generator (7) comprises a system for adjusting the power and the frequency as well as a device for displaying the self-biasing voltage.
Les gaz nécessaires aux dépôts sont introduits dans l'enceinte par une conduite (9) reliée à un diffuseur de gaz (11) situé dans l'enceinte qui peut être cylindrique. La conduite (9) est reliée à un système d'alimentation en gaz (13) qui comprend au moins 6 lignes par lesquelles on peut amener au diffuseur de gaz (11) de l'hydrogène, de l'oxygène, de l'azote, de l'argon hydrogéné (rapport en volume Ar : H2 de 9 : 1), l'hydrocarbure CxHy et le composé organique du silicium. L'enceinte est également reliée à une unité de pompage (15) à sa partie inférieure pour réaliser et maintenir la pression désirée dans 1' enceinte .The gases necessary for deposits are introduced into the enclosure by a pipe (9) connected to a gas diffuser (11) located in the enclosure which may be cylindrical. The pipe (9) is connected to a gas supply system (13) which comprises at least 6 lines by which hydrogen, oxygen, nitrogen can be brought to the gas diffuser (11) , hydrogenated argon (volume ratio Ar: H 2 of 9: 1), the hydrocarbon C x H y and the organic silicon compound. The enclosure is also connected to a pumping unit (15) at its lower part to achieve and maintain the desired pressure in one enclosure.
Une console de contrôle non représentée sur la figure présente des dispositifs de commande de pompage, de débit de gaz, et de pression totale, la mesure de pression étant assurée par une jauge capacitive. Chaque ligne d'amenée de gaz est équipée
d'un débitmètre massique à régulation électronique et d'une vanne d'arrêt qui sont reliés à l'armoire de commande munie de dispositif d' affichage du débit et de réglage simultané. Toutes les étapes du procédé de l'invention peuvent être mises en oeuvre dans ce réacteur.A control console not shown in the figure has pumping, gas flow and total pressure control devices, the pressure measurement being provided by a capacitive gauge. Each gas supply line is equipped an electronically regulated mass flow meter and a shut-off valve which are connected to the control cabinet fitted with a flow display and simultaneous adjustment device. All the steps of the process of the invention can be implemented in this reactor.
Ainsi, après avoir introduit les pièces à traiter dans l'enceinte, on peut réaliser tout d'abord un traitement de décapage à l'aide d'un plasma de gaz inerte, par exemple d'argon ou d'un mélange d'argon et d'hydrogène dans une proportion volumique de 9 : 1, en utilisant une pression suffisamment basse pour permettre un bombardement ionique puissant, par exemple une polarisation de -700 V. On peut réaliser ensuite dans cette enceinte la formation d'une première couche d'alumine ou de A1(0,N) au moyen d'un plasma d'oxygène ou d'oxygène et d'azote. On procède ensuite au dépôt des couches à base de silicium, toujours dans la même enceinte, en modifiant les gaz introduits et les débits gazeux.Thus, after having introduced the parts to be treated into the enclosure, it is possible first of all to carry out a pickling treatment using a plasma of inert gas, for example argon or a mixture of argon and hydrogen in a volume proportion of 9: 1, using a pressure low enough to allow a powerful ion bombardment, for example a polarization of -700 V. It is then possible to carry out in this enclosure the formation of a first layer d alumina or A1 (0, N) by means of an oxygen or oxygen and nitrogen plasma. Next, the silicon-based layers are deposited, still in the same enclosure, by modifying the gases introduced and the gas flow rates.
Dans la dernière étape, on forme le film de carbone amorphe dur, en changeant la source gazeuse.In the last step, the hard amorphous carbon film is formed, changing the gas source.
Les exemples suivants donnés à titre indicatif et non limitatif, illustrent le procédé de 1' invention.The following examples, given by way of non-limiting illustration, illustrate the process of the invention.
Dans ces exemples, on utilise le méthane pour le dépôt de la couche de carbone dur amorphe et le tétraméthylsilane (T S) pour le dépôt des couches intermédiaires à base de Si.
Exemple 1In these examples, methane is used for the deposition of the amorphous hard carbon layer and tetramethylsilane (TS) for the deposition of the intermediate layers based on Si. Example 1
Dans cet exemple, on réalise le dépôt d'une couche de carbone dur amorphe (DLC) présentant de très bonnes propriétés mécaniques, (frottement, usure, dureté et élasticité) , sur une pièce en alliage d'aluminium et de silicium.In this example, a layer of amorphous hard carbon (DLC) having very good mechanical properties (friction, wear, hardness and elasticity) is deposited on a piece of aluminum and silicon alloy.
Sur ce substrat en alliage d'aluminium, on réalise une oxydation ionique en plasma radiofrequence à 13,56 MHz. Les conditions de traitement sont les suivantes :On this aluminum alloy substrate, ion oxidation is carried out in radio frequency plasma at 13.56 MHz. The processing conditions are as follows:
3 Débit 02 :50 cm /min. 3 Flow 0 2 : 50 cm / min.
Durée : 60 min Température : 250°CDuration: 60 min Temperature: 250 ° C
2 Densité de puissance : lW/cm Pression : 0,01 mbar2 Power density: lW / cm Pressure: 0.01 mbar
Puis on réalise par PACVD RF (13,56 MHz) la couche à gradient de dureté.Next, the hardness gradient layer is produced by PACVD RF (13.56 MHz).
Pour SiOx/SiC/DLC. On utilise un mélange gazeuxFor SiOx / SiC / DLC. We use a gas mixture
TMS (tétraméthyl silane) + oxygène à une pression de 0,01 mbar et une densité de puissance de 0,5 /cm .TMS (tetramethyl silane) + oxygen at a pressure of 0.01 mbar and a power density of 0.5 / cm.
On coupe progressivement l'incorporation d'oxygène afin d'arriver à la composition SiC : H puis, dans les mêmes conditions électriques et de pression, on envoie un mélange gazeux H2 + CH4 pour réaliser la couche finale de DLC.The incorporation of oxygen is gradually cut in order to arrive at the SiC: H composition, then, under the same electrical and pressure conditions, a gas mixture H 2 + CH 4 is sent to produce the final layer of DLC.
La durée totale de cette phase de dépôt est de 3 heures. On obtient ainsi un revêtement d'épaisseur totale comprise entre 2 et 4 μm avec une vitesse moyenne de dépôt de l'ordre de 1 μm/h.
On détermine la nature du dépôt par spectrométrie infrarouge. Les épaisseurs des couches sont déterminées par observation au microscope électronique à balayage de coupe métallographique des échantillons .The total duration of this deposit phase is 3 hours. A coating of total thickness of between 2 and 4 μm is thus obtained with an average deposition rate of the order of 1 μm / h. The nature of the deposit is determined by infrared spectrometry. The thicknesses of the layers are determined by observation with a scanning electron microscope of metallographic section of the samples.
Une caractérisation tribologique est effectuée par un essai de type pion/disque. On enregistre un coefficient de frottement de 0,05 et une nanodureté de 20 000 MPa .A tribological characterization is carried out by a pawn / disc type test. A coefficient of friction of 0.05 and a nanosecurity of 20,000 MPa are recorded.
Les épaisseurs des couches sont les suivantes A1203 0,2 à 0,5 μm SiOx 0,2 à 0,5 μm SiC 0,3 à 0,5 μm Carbone dur amorphe (DLC) : 1 à 3 μm. Les duretés obtenues sont les suivantes : Substrat en alliage d'aluminium : 2000 à 2500 MPa couche en A1203 : 8000 MPa couche en SiOx : 8000 MPa couche de DLC : 18 000 à 20 000 MPa.The thicknesses of the layers are the following A1 2 0 3 0.2 to 0.5 μm SiO x 0.2 to 0.5 μm SiC 0.3 to 0.5 μm Amorphous hard carbon (DLC): 1 to 3 μm. The hardnesses obtained are as follows: Substrate in aluminum alloy: 2000 to 2500 MPa layer in A1 2 0 3 : 8000 MPa layer in SiO x : 8000 MPa layer of DLC: 18 000 to 20 000 MPa.
Exemple 2Example 2
Dans cet exemple, on forme sur une pièce en alliage d' aluminium une couche de carbone amorphe dur hydrogéné et azoté DLN (Diamond Like Nanocomposite) . Les trois couches intermédiaires assurant un gradient de dureté dans le revêtement contiennent dans ce cas de 1' azote .In this example, a layer of hard hydrogenated and nitrogenous amorphous carbon DLN (Diamond Like Nanocomposite) is formed on an aluminum alloy part. The three intermediate layers providing a hardness gradient in the coating in this case contain nitrogen.
Sur un substrat en alliage d'aluminium, on réalise une oxynitruration ionique en plasma radiofrequence à 13,56 MHz.On an aluminum alloy substrate, ion oxynitriding is carried out in radio frequency plasma at 13.56 MHz.
Les conditions de traitement sont les suivantes :
Débit 02 :50 cm /min. Débit N2 :50 cm /min. Durée : 60 min Température : 250 CThe processing conditions are as follows: Flow rate 0 2 : 50 cm / min. Flow N 2 : 50 cm / min. Duration: 60 min Temperature: 250 C
2 Densité de puissance: lW/cm Pression : 0,01 mbar2 Power density: lW / cm Pressure: 0.01 mbar
Puis on réalise par PACVD RF (13,56 MHz) la couche à gradient de dureté. Pour Si (0,N) /Si(C,N) DLN On utilise un mélange gazeuxNext, the hardness gradient layer is produced by PACVD RF (13.56 MHz). For Si (0, N) / Si (C, N) DLN A gas mixture is used
TMS (tétraméthyl silane) + oxygène + azote à une pression de 0,01 mbar et une densité de puissance de 0, 5 W/cra2.TMS (tetramethyl silane) + oxygen + nitrogen at a pressure of 0.01 mbar and a power density of 0.5 W / cra 2 .
On coupe progressivement l'incorporation d'oxygène afin d'arriver à la composition Si(C,N), puis dans les mêmes conditions électriques et de pression on envoie un mélange gazeux H2+CH4 pour réaliser la couche finale de DLN.The incorporation of oxygen is gradually cut in order to arrive at the Si (C, N) composition, then, under the same electrical and pressure conditions, a gas mixture H 2 + CH 4 is sent to make the final layer of DLN.
La durée totale de cette phase de dépôt est de 3 heures.The total duration of this deposit phase is 3 hours.
Référence citéeCitation cited
[1] : Surface and Coatings Technology 98, 1998, pp. 976-984.
[1]: Surface and Coatings Technology 98, 1998, pp. 976-984.
Claims
1. Pièce en aluminium ou en alliage d'aluminium comportant un revêtement dont la dureté augmente depuis la surface de la pièce jusqu'à la surface supérieure du revêtement, ledit revêtement comportant une couche supérieure en carbone dur amorphe, deux couches intermédiaires à base de silicium dont une couche de SiOx avec x allant de 1 à 2 et une couche de SiC, la couche de SiC étant adjacente à la couche supérieure du revêtement, et une couche inférieure de A1203 entre la surface de la pièce et la couche de SiOx.1. An aluminum or aluminum alloy part comprising a coating whose hardness increases from the surface of the part to the upper surface of the coating, said coating comprising an upper layer of amorphous hard carbon, two intermediate layers based on silicon including a layer of SiO x with x ranging from 1 to 2 and a layer of SiC, the layer of SiC being adjacent to the upper layer of the coating, and a lower layer of A1 2 0 3 between the surface of the part and the layer of SiO x .
2. Pièce en aluminium ou en alliage d' aluminium comportant un revêtement dont la dureté augmente depuis la surface de la pièce jusqu'à la surface supérieure du revêtement, ledit revêtement comportant une couche supérieure en carbone dur amorphe hydrogéné et azoté, deux couches intermédiaires à base de silicium dont une couche de Si(0,N) et une couche de Si(C,N), la couche de Si(C,N) étant adjacente à la couche supérieure du revêtement, et une couche inférieure de A1(0,N) entre la surface de la pièce et la couche de Si(0,N). 2. Part made of aluminum or aluminum alloy comprising a coating whose hardness increases from the surface of the part to the upper surface of the coating, said coating comprising an upper layer of amorphous hard hydrogenated and nitrogenous carbon, two intermediate layers based on silicon, including a layer of Si (0, N) and a layer of Si (C, N), the layer of Si (C, N) being adjacent to the upper layer of the coating, and a lower layer of A1 ( 0, N) between the surface of the part and the layer of Si (0, N).
3. Pièce selon l'une quelconque des revendications 1 et 2, dans laquelle l'épaisseur totale du revêtement est de 2 à 4 μm.
3. Part according to any one of claims 1 and 2, wherein the total thickness of the coating is 2 to 4 microns.
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FR9811340 | 1998-09-11 | ||
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PCT/FR1999/002158 WO2000015869A1 (en) | 1998-09-11 | 1999-09-10 | Part based on aluminium coated with amorphous hard carbon |
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