WO1999015468A1 - FUSED SiO2-TiO2 GLASS METHOD - Google Patents

FUSED SiO2-TiO2 GLASS METHOD Download PDF

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Publication number
WO1999015468A1
WO1999015468A1 PCT/US1998/018067 US9818067W WO9915468A1 WO 1999015468 A1 WO1999015468 A1 WO 1999015468A1 US 9818067 W US9818067 W US 9818067W WO 9915468 A1 WO9915468 A1 WO 9915468A1
Authority
WO
WIPO (PCT)
Prior art keywords
accordance
flame
precursor
vapor
particles
Prior art date
Application number
PCT/US1998/018067
Other languages
French (fr)
Inventor
James E. Maxon
Robert S. Pavlik, Jr.
Daniel R. Sempolinski
Michael H. Wasilewski
Original Assignee
Corning Incorporated
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Corning Incorporated filed Critical Corning Incorporated
Priority to DE69841741T priority Critical patent/DE69841741D1/en
Priority to JP2000512783A priority patent/JP4108926B2/en
Priority to EP98945813A priority patent/EP1030822B1/en
Priority to KR1020007003139A priority patent/KR100574123B1/en
Publication of WO1999015468A1 publication Critical patent/WO1999015468A1/en

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/09—Other methods of shaping glass by fusing powdered glass in a shaping mould
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
    • C03B19/1415—Reactant delivery systems
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
    • C03B19/1453—Thermal after-treatment of the shaped article, e.g. dehydrating, consolidating, sintering
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
    • C03B19/1476—Means for heating during or immediately prior to deposition
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/06—Glass compositions containing silica with more than 90% silica by weight, e.g. quartz
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/06—Doped silica-based glasses
    • C03B2201/30—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi
    • C03B2201/40—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi doped with transition metals other than rare earth metals, e.g. Zr, Nb, Ta or Zn
    • C03B2201/42—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi doped with transition metals other than rare earth metals, e.g. Zr, Nb, Ta or Zn doped with titanium
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2207/00—Glass deposition burners
    • C03B2207/30—For glass precursor of non-standard type, e.g. solid SiH3F
    • C03B2207/32—Non-halide
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2207/00—Glass deposition burners
    • C03B2207/50—Multiple burner arrangements
    • C03B2207/52—Linear array of like burners

Definitions

  • Relatively pure metal oxides are produced by thermal decomposition of precursors and deposition of the resulting oxides
  • the precursor may take the form of a vapor, or may be carried by a vapor It may be decomposed by either flame hydrolysis or pyrolysis
  • chlo ⁇ de-free precursors Specifically, a siloxane, octamethylcyclotetrasiloxane (OMCTS), and a titanium alkoxide, titanium isopropoxide, T ⁇ (OPr ⁇ ) 4 , are commercially employed
  • the precursors are separately converted to vapor form and carried to a mixing manifold by a carrier gas such as nitrogen
  • a carrier gas such as nitrogen
  • the mixture passes, via fume lines, into a flame where the precursors are converted into S ⁇ O 2 -T ⁇ O 2 particles These particles are collected in a refractory furnace where they melt to form a solid boule
  • Another purpose is to minimize material build-ups that occur in the vapor delivery system during operation
  • a further purpose is to improve the quality of the T ⁇ O 2 -doped fused silica produced
  • a still further purpose is to lengthen the time of a production run before it is necessary to shut the operation down for cleaning purposes SUMMARY OF THE INVENTION
  • the invention resides in a method of producing, by flame hydrolysis, a fused silica glass containing titania which comprises delivering a mixture of a silica precursor and a titania precursor in vapor form to a flame, passing the mixture through the flame to form SiO 2 -TiO 2 particles, and delivering an essentially pure, titanium precursor to the flame.
  • FIGURE in the accompanying drawing is a schematic representation of a system for practice of the invention.
  • the conventional, boule process used in making fused silica products is a continuous process.
  • a carrier gas such as nitrogen
  • a silica precursor such as SiCI 4 , or OMCTS.
  • the carrier gas entrains the precursor in vapor form and transports it to the site of the flame hydrolysis.
  • a titania precursor is introduced. Essentially, this involves duplicating the delivery system for the silica precursor to provide entrained vapors of the titania precursor. The two separate vapor trains feed into a manifold where they are mixed. The mixture is then carried through fume lines to burners where the flame hydrolysis takes place.
  • the flame converts the mixture of precursors into particles of TiO 2 - doped silica, commonly referred to as "soot "
  • the particles form within a refractory furnace having a member in its base known as a cup
  • the particles are deposited in the cup, and melt to form a solid body referred to as a boule
  • the single FIGURE in the accompanying drawing is a schematic representation of a system for use in practicing the present invention
  • the system is generally designated by the numeral 10
  • System 10 includes a source 12 of the silica precursor 14
  • a carrier gas 16, such as nitrogen, is introduced at or near the base of source 12 A by- pass stream of carrier gas is introduced at 18 to prevent saturation of the vaporous stream
  • the vaporous stream passes through a distribution system 20 to a manifold 22
  • System 10 further includes a source 24 of the titania precursor 26
  • Source 24 like source 12, has an inlet 28 for a carrier gas that passes through precursor material 26 and entrains vapors thereof Again, a bypass stream is introduced at 30, and the vaporous stream passes through a distribution system 32 to manifold 22
  • the two vapor streams mix in manifold 22
  • the mixture passes through fume lines 34 to burners 36 mounted in the upper portion 38 of furnace 40
  • the mixed vapor stream is further joined with a fuel/oxygen mixture at burners
  • the silica precursor, OMCTS was found to be the source of moisture Accordingly, it has been found necessary to employ "dry" OMCTS in the present process In particular, it has been necessary to maintain the water content in the OMCTS at less than 2 ppm to inhibit the white, titania build-up in the system
  • fume lines 34 are preferably insulated
  • the lines may be clad with a highly conductive and reflective material such as aluminum foil
  • crown 46 of furnace 40 runs hottest in its central area
  • a glassy condensate tends to develop in this area
  • this condensate can build-up and form a stalactite-like shape
  • d ⁇ ppage onto the fused silica boule from this glassy stalactite can occur This creates effects in the boule that must be removed by grinding
  • the boule lay-down cycle is shortened, thus adding to the cost of the operation At least two conditions have been found to aggravate development of the glassy condensate in the center of the crown.
  • impurities in the refractory brick especially alkali and alkaline earth metal impurities.
  • impurities migrate from the brick, or the silica penetrates the brick a less viscous, more fluid glass develops. This in turn more readily flows and drips onto the boule.
  • This contributing factor can be minimized by employing pure materials in brick preparation; also by treatment of the furnace bricks to extract impurities prior to use of the furnace.
  • the other condition manifests itself within the furnace, but it is caused by conditions in the vapor delivery system.
  • the condition is turbulence in the furnace due to eddy currents developed in the flame.
  • a key to controlling turbulence has been found to be maintenance of smooth, vapor flow rates. This requires more than mere inlet valve regulation and temperature control of the precursor materials. It has previously been explained that moisture must be essentially excluded to avoid dissociation of titanium alkoxide, and consequent buildup on the distribution system walls. It has been found that such buildup also creates erratic flow rates. These, in turn, cause turbulence in the furnace atmosphere.
  • Titanium alkoxides are water white in a pure state, but degrade readily. This condition is exhibited by a discoloration in the material that proceeds from a pale yellow through amber to dark brown. The discoloration is due to such contaminates as higher order polymers, oxidation products, and trace elements.
  • the alkoxide degrades, its properties change. In particular, its vapor pressure changes. This alters the flow-rate and thereby causes turbulence as well as composition variation. The turbulence, as noted, aggravates the buildup of glass condensate in the center of the furnace crown.
  • An added benefit of using a pure titanium alkoxide is that it permits using higher temperatures in the precursor materials.
  • the vapor pressure of the alkoxide increases with temperature, thus requiring a lower, carrier vapor flow rate. This lower flow rate contributes to a smoother operation and less turbulence.

Abstract

A method of producing, by flame hydrolysis, a fused silica glass containing titania which comprises delivering a mixture of a silica precursor and a titania precursor in vapor form to a flame, passing the vapor mixture through the flame to form SiO2-TiO2 particles, and depositing the particles within a furnace (40) where they melt to form a solid glass body (44).

Description

FUSED SiO2-TiO2 GLASS METHOD
FIELD OF THE INVENTION
Method of producing fused silica glasses containing titania
BACKGROUND OF THE INVENTION
Relatively pure metal oxides are produced by thermal decomposition of precursors and deposition of the resulting oxides The precursor may take the form of a vapor, or may be carried by a vapor It may be decomposed by either flame hydrolysis or pyrolysis
One such process is production of fused silica by hydrolysis or pyrolysis of a silica precursor Commercially, this is an application of flame hydrolysis involving forming and depositing particles of fused silica which melt to form large bodies (boules) Such boules may be used individually, may be finished and integrated together into large optical bodies, or may be cut into small pieces for finishing as lenses and the like In this procedure, the precursor is hydrolyzed and the hydrolyzed vapor is passed into a flame to form particles of a fused silica The particles are continuously deposited, for example, in the cup of a refractory furnace where they melt to form a solid boule Essentially pure fused silica finds many diverse applications However, it does have a small positive coefficient of thermal expansion (CTE) that can make it undesirable in some instances United States Patent No 2,326,059 (Nordberg) describes a fused silica doped with 5-11 % by weight titania (TιO2) These TιO2-doped glasses have CTEs lower than pure fused silica with the potential for a CTE that approximates 0
Originally, chlorides of silicon and titanium were employed as precursors Recently, primarily for environmental reasons, chloπde-free precursors have been proposed Specifically, a siloxane, octamethylcyclotetrasiloxane (OMCTS), and a titanium alkoxide, titanium isopropoxide, Tι(OPrι)4, are commercially employed
The precursors are separately converted to vapor form and carried to a mixing manifold by a carrier gas such as nitrogen The mixture passes, via fume lines, into a flame where the precursors are converted into SιO2-TιO2 particles These particles are collected in a refractory furnace where they melt to form a solid boule
With the changeover to the new precursor materials, problems have been encountered These problems are manifested largely by material buildups in the vapor delivery system The build-ups cause erratic operation, and consequent furnace upsets Ultimately, they require shut down of the vapor delivery system for cleaning
It is a basic purpose of this invention to provide an improved method of producing a TιO2-doped fused silica
Another purpose is to minimize material build-ups that occur in the vapor delivery system during operation
A further purpose is to improve the quality of the TιO2-doped fused silica produced
A still further purpose is to lengthen the time of a production run before it is necessary to shut the operation down for cleaning purposes SUMMARY OF THE INVENTION
Broadly, the invention resides in a method of producing, by flame hydrolysis, a fused silica glass containing titania which comprises delivering a mixture of a silica precursor and a titania precursor in vapor form to a flame, passing the mixture through the flame to form SiO2-TiO2 particles, and delivering an essentially pure, titanium precursor to the flame.
BRIEF DESCRIPTION OF THE DRAWINGS
The single FIGURE in the accompanying drawing is a schematic representation of a system for practice of the invention.
PRIOR ART
Literature deemed of possible relevance is listed in an accompanying document.
DESCRIPTION OF THE INVENTION
The conventional, boule process used in making fused silica products is a continuous process. In this process, a carrier gas, such as nitrogen, is bubbled through a silica precursor, such as SiCI4, or OMCTS. The carrier gas entrains the precursor in vapor form and transports it to the site of the flame hydrolysis.
Production of a SiO2-TiO2 glass follows the same basic procedure, but a titania precursor is introduced. Essentially, this involves duplicating the delivery system for the silica precursor to provide entrained vapors of the titania precursor. The two separate vapor trains feed into a manifold where they are mixed. The mixture is then carried through fume lines to burners where the flame hydrolysis takes place. The flame converts the mixture of precursors into particles of TiO2- doped silica, commonly referred to as "soot " The particles form within a refractory furnace having a member in its base known as a cup The particles are deposited in the cup, and melt to form a solid body referred to as a boule The single FIGURE in the accompanying drawing is a schematic representation of a system for use in practicing the present invention The system is generally designated by the numeral 10
System 10 includes a source 12 of the silica precursor 14 A carrier gas 16, such as nitrogen, is introduced at or near the base of source 12 A by- pass stream of carrier gas is introduced at 18 to prevent saturation of the vaporous stream The vaporous stream passes through a distribution system 20 to a manifold 22
System 10 further includes a source 24 of the titania precursor 26 Source 24, like source 12, has an inlet 28 for a carrier gas that passes through precursor material 26 and entrains vapors thereof Again, a bypass stream is introduced at 30, and the vaporous stream passes through a distribution system 32 to manifold 22
The two vapor streams mix in manifold 22 The mixture passes through fume lines 34 to burners 36 mounted in the upper portion 38 of furnace 40 The mixed vapor stream is further joined with a fuel/oxygen mixture at burners
36 There it combusts and is oxidized to form silica-titania particles at a temperature in excess of 1600° C The particles thus formed are directed at, and collect in, cup 42 of refractory furnace 40 There, they melt to form a solid boule shown as 44 The present invention arose when efforts were made to convert the system and process from chloride precursors to the more environmentally friendly, metallo-organic precursor materials (OMCTS and titanium isopropoxide) The alkoxides of the transition metals were known to be sensitive to light, heat and moisture It was also known that the metal alkoxides readily hydrolyze with moisture to form the hydroxide and oxide of the metal Accordingly, when white deposits built up in the vapor delivery system, it was suspected that moisture was the culprit Thus, it was postulated that these reactions were occurring
Tι(OPrι)4 + 4HOH - Tι(OH)4 + 4PrιOH Tι(OH)4 - TιO2 + 2HOH
This led to a search for a source of moisture
Surprisingly, the silica precursor, OMCTS, was found to be the source of moisture Accordingly, it has been found necessary to employ "dry" OMCTS in the present process In particular, it has been necessary to maintain the water content in the OMCTS at less than 2 ppm to inhibit the white, titania build-up in the system
It has also been found necessary to carefully control temperature in the vapor distribution system This is particularly true in the fume lines 34 between manifold 22 and burners 36 If these lines are too cold, vapors can condense in the line and disrupt flow This situation is averted by exposing the fume lines to heat from the burners and the furnace crown
If the temperature in the fume lines becomes too high, titanium isopropoxide tends to thermally decompose, thus forming oxide deposits in the line The oxide deposits disrupt vapor flow and cause turbulence in the furnace atmosphere As shown later, this contributes to other problems in the furnace
To avoid this overheating problem, fume lines 34 are preferably insulated For example, the lines may be clad with a highly conductive and reflective material such as aluminum foil It has been observed that crown 46 of furnace 40 runs hottest in its central area As a result, a glassy condensate tends to develop in this area In time, this condensate can build-up and form a stalactite-like shape Ultimately, dπppage onto the fused silica boule from this glassy stalactite can occur This creates effects in the boule that must be removed by grinding To avoid this expensive process, the boule lay-down cycle is shortened, thus adding to the cost of the operation At least two conditions have been found to aggravate development of the glassy condensate in the center of the crown. One condition is impurities in the refractory brick, especially alkali and alkaline earth metal impurities. As such impurities migrate from the brick, or the silica penetrates the brick, a less viscous, more fluid glass develops. This in turn more readily flows and drips onto the boule. This contributing factor can be minimized by employing pure materials in brick preparation; also by treatment of the furnace bricks to extract impurities prior to use of the furnace.
The other condition manifests itself within the furnace, but it is caused by conditions in the vapor delivery system. The condition is turbulence in the furnace due to eddy currents developed in the flame. A key to controlling turbulence has been found to be maintenance of smooth, vapor flow rates. This requires more than mere inlet valve regulation and temperature control of the precursor materials. It has previously been explained that moisture must be essentially excluded to avoid dissociation of titanium alkoxide, and consequent buildup on the distribution system walls. It has been found that such buildup also creates erratic flow rates. These, in turn, cause turbulence in the furnace atmosphere.
Titanium alkoxides, particularly Ti(OPri) , are water white in a pure state, but degrade readily. This condition is exhibited by a discoloration in the material that proceeds from a pale yellow through amber to dark brown. The discoloration is due to such contaminates as higher order polymers, oxidation products, and trace elements. As the alkoxide degrades, its properties change. In particular, its vapor pressure changes. This alters the flow-rate and thereby causes turbulence as well as composition variation. The turbulence, as noted, aggravates the buildup of glass condensate in the center of the furnace crown.
An added benefit of using a pure titanium alkoxide is that it permits using higher temperatures in the precursor materials. The vapor pressure of the alkoxide increases with temperature, thus requiring a lower, carrier vapor flow rate. This lower flow rate contributes to a smoother operation and less turbulence.
In summary then, optimum production of a fused, SiO2-TiO2 glass product by.flame hydrolysis is obtained by using a relatively pure, titania precursor and a relatively dry, silica precursor. Also, decomposition of the titania precursor should be avoided by controlling the temperature in the fume lines. Finally, the brick in the furnace, particularly in the crown portion, should be purified to minimize the occurrence of glass condensate at the crown hot spot.

Claims

WE CLAIM
1 In a method of producing, by flame hydrolysis, a fused silica glass containing titania which comprises delivering a mixture of a silica precursor and a titania precursor in vapor form to a flame and, passing the mixture through the flame to form SιO2-TιO2 particles, the improvement which comprises delivering an essentially pure, titanium precursor to the flame
2 A method in accordance with claim 1 which comprises delivering precursors composed essentially of a siloxane and a titanium alkoxide
3, A method in accordance with claim 2 which comprises delivering octametylcyclotetrasiloxane and titanium isopropoxide to the flame
4 A method in accordance with claim 2 which comprises delivering a siloxane that contains less than 2 ppm water
5 A method in accordance with claim 2 which comprises delivering a titanium alkoxide that is essentially colorless
6 A method in accordance with claim 1 which comprises depositing the SιO2-TιO2 particles in a refractory brick furnace while minimizing turbulence in the furnace atmosphere during deposition
7 A method in accordance with claim 6 which comprises maintaining steady, vapor flow rates during delivery of the precursors to the flame for hydrolysis
8 A method in accordance with claim 7 which comprises avoiding decomposition or condensation of the titania precursor to form deposits in the vapor delivery lines 9 A method in accordance with claim 8 which comprises maintaining the titanium precursor vapor at a temperature above its condensation point, but below its decomposition temperature during its delivery to the flame for hydrolysis
10 A method in accordance with claim 9 which comprises delivering the mixture of precursors through insulated fume lines to avoid overheating and decomposition of the titanium precursor
11 A method in accordance with claim 10 which comprises delivering the precursors through fume lines insulated with a heat conducting and reflecting cladding
12 A method in accordance with claim 11 which comprises delivering the precursors through fume lines clad with aluminum foil
13 A method in accordance with claim 1 which comprises depositing the SιO2-TιO2 particles in a refractory brick furnace in which at least the furnace crown is composed of purified brick to minimize the effect of silica condensate forming on the crown
14 A method of producing, by flame hydrolysis, a fused silica glass containing titania which comprises separately delivering vapor streams from sources of a silica precursor that contains less than 2 ppm water, and a titania precursor that is essentially colorless, mixing the vapor streams, delivering the mixture to burners through fume lines while maintaining steady, vapor flow rate by controlling temperature of the fume lines, passing the mixture through the flame to produce SιO2-TιO2 particles, depositing the particles in a refractory furnace having at least its crown portion composed of purified brick, and melting the particles as they are collected to form a solid body of fused silica
PCT/US1998/018067 1997-09-24 1998-08-31 FUSED SiO2-TiO2 GLASS METHOD WO1999015468A1 (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
DE69841741T DE69841741D1 (en) 1997-09-24 1998-08-31 PROCESS FOR PREPARING MELTED SiO2-TiO2 GLASS
JP2000512783A JP4108926B2 (en) 1997-09-24 1998-08-31 Method for producing molten SiO2-TiO2 glass
EP98945813A EP1030822B1 (en) 1997-09-24 1998-08-31 FUSED SiO2-TiO2 GLASS METHOD
KR1020007003139A KR100574123B1 (en) 1997-09-24 1998-08-31 Fused Silica-Titania glass method

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US5985997P 1997-09-24 1997-09-24
US60/059,859 1997-09-24

Publications (1)

Publication Number Publication Date
WO1999015468A1 true WO1999015468A1 (en) 1999-04-01

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PCT/US1998/018067 WO1999015468A1 (en) 1997-09-24 1998-08-31 FUSED SiO2-TiO2 GLASS METHOD

Country Status (5)

Country Link
EP (1) EP1030822B1 (en)
JP (1) JP4108926B2 (en)
KR (1) KR100574123B1 (en)
DE (1) DE69841741D1 (en)
WO (1) WO1999015468A1 (en)

Cited By (15)

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WO2001028941A1 (en) * 1999-10-19 2001-04-26 Liekki Oy Method and apparatus for dyeing a material
WO2001092172A1 (en) * 2000-05-25 2001-12-06 Corning Incorporated Method of making a titania-doped fused silica preform
US6387511B1 (en) 2000-07-27 2002-05-14 Corning Incorporated Light weight porous structure
EP1358132A1 (en) * 2000-12-21 2003-11-05 Corning Incorporated Refractories for fused silica production furnaces
JP2004511414A (en) * 2000-10-13 2004-04-15 コーニング　インコーポレイテッド Method for avoiding striae in EUV lithography mirrors
US6988378B1 (en) 2000-07-27 2006-01-24 Corning Incorporated Light weight porous structure
US7410922B2 (en) * 2003-04-03 2008-08-12 Asahi Glass Company, Limited Silica glass containing TiO2 and process for its production
US7429546B2 (en) * 2003-04-03 2008-09-30 Asahi Glass Company, Limited Silica glass containing TiO2 and process for its production
US7989378B2 (en) 2007-12-27 2011-08-02 Asahi Glass Company, Limited TiO2-containing silica glass
US8047023B2 (en) 2001-04-27 2011-11-01 Corning Incorporated Method for producing titania-doped fused silica glass
WO2012105513A1 (en) 2011-01-31 2012-08-09 旭硝子株式会社 Method for producing silica glass body containing titania, and silica glass body containing titania
EP3002262A1 (en) 2014-10-01 2016-04-06 Heraeus Quarzglas GmbH & Co. KG Method for the manufacture of synthetic quartz glass with polymerizable polyalkylsiloxane
EP3034476A1 (en) 2014-12-16 2016-06-22 Heraeus Quarzglas GmbH & Co. KG Method for the preparation of synthetic quartz glass with the use of a cleaning device
EP3059212A1 (en) 2015-02-18 2016-08-24 Heraeus Quarzglas GmbH & Co. KG Method and apparatus for making silica glass from polymerisable polyalkylsiloxane with membrane filter as cleaning device
US10604437B2 (en) 2014-10-20 2020-03-31 Navus Automation, Inc. Fused silica furnace system and method for continuous production of fused silica

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WO2004092082A1 (en) * 2003-04-11 2004-10-28 Nikon Corporation METHOD FOR PRODUCING SiO2-TiO2 BASED GLASS, SiO2-TiO2 BASED GLASS AND EXPOSURE SYSTEM
JP5992842B2 (en) * 2013-01-24 2016-09-14 信越石英株式会社 Method for producing silica titania glass and method for selecting silica titania glass

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US5152819A (en) * 1990-08-16 1992-10-06 Corning Incorporated Method of making fused silica
US5154744A (en) * 1991-08-26 1992-10-13 Corning Incorporated Method of making titania-doped fused silica
US5395413A (en) * 1993-04-16 1995-03-07 Corning Incorporated Method for producing fused silica with low sodium ion contamination level

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US5558687A (en) * 1994-12-30 1996-09-24 Corning Incorporated Vertical, packed-bed, film evaporator for halide-free, silicon-containing compounds
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US5043002A (en) * 1990-08-16 1991-08-27 Corning Incorporated Method of making fused silica by decomposing siloxanes
US5152819A (en) * 1990-08-16 1992-10-06 Corning Incorporated Method of making fused silica
US5154744A (en) * 1991-08-26 1992-10-13 Corning Incorporated Method of making titania-doped fused silica
US5395413A (en) * 1993-04-16 1995-03-07 Corning Incorporated Method for producing fused silica with low sodium ion contamination level

Cited By (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2001028941A1 (en) * 1999-10-19 2001-04-26 Liekki Oy Method and apparatus for dyeing a material
WO2001092172A1 (en) * 2000-05-25 2001-12-06 Corning Incorporated Method of making a titania-doped fused silica preform
US6387511B1 (en) 2000-07-27 2002-05-14 Corning Incorporated Light weight porous structure
US6988378B1 (en) 2000-07-27 2006-01-24 Corning Incorporated Light weight porous structure
JP2004511414A (en) * 2000-10-13 2004-04-15 コーニング　インコーポレイテッド Method for avoiding striae in EUV lithography mirrors
EP1358132A1 (en) * 2000-12-21 2003-11-05 Corning Incorporated Refractories for fused silica production furnaces
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JP4108926B2 (en) 2008-06-25
DE69841741D1 (en) 2010-08-05
KR20010024261A (en) 2001-03-26
EP1030822A1 (en) 2000-08-30
KR100574123B1 (en) 2006-04-25
JP2001517597A (en) 2001-10-09
EP1030822A4 (en) 2004-12-15
EP1030822B1 (en) 2010-06-23

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