WO1997036317A3 - A method for producing a semiconductor device having semiconductor layers of sic by the use of an implanting step and a device produced thereby - Google Patents
A method for producing a semiconductor device having semiconductor layers of sic by the use of an implanting step and a device produced thereby Download PDFInfo
- Publication number
- WO1997036317A3 WO1997036317A3 PCT/SE1997/000532 SE9700532W WO9736317A3 WO 1997036317 A3 WO1997036317 A3 WO 1997036317A3 SE 9700532 W SE9700532 W SE 9700532W WO 9736317 A3 WO9736317 A3 WO 9736317A3
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- sic
- semiconductor
- producing
- layer
- implanting step
- Prior art date
Links
- 239000004065 semiconductor Substances 0.000 title abstract 6
- 238000004519 manufacturing process Methods 0.000 title abstract 2
- 239000010410 layer Substances 0.000 abstract 7
- 239000002019 doping agent Substances 0.000 abstract 1
- 239000012535 impurity Substances 0.000 abstract 1
- 239000002344 surface layer Substances 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
- H01L29/12—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by the materials of which they are formed
- H01L29/16—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by the materials of which they are formed including, apart from doping materials or other impurities, only elements of Group IV of the Periodic System
- H01L29/1608—Silicon carbide
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/0445—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising crystalline silicon carbide
- H01L21/0455—Making n or p doped regions or layers, e.g. using diffusion
- H01L21/046—Making n or p doped regions or layers, e.g. using diffusion using ion implantation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/74—Making of localized buried regions, e.g. buried collector layers, internal connections substrate contacts
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/66007—Multistep manufacturing processes
- H01L29/66053—Multistep manufacturing processes of devices having a semiconductor body comprising crystalline silicon carbide
- H01L29/66068—Multistep manufacturing processes of devices having a semiconductor body comprising crystalline silicon carbide the devices being controllable only by the electric current supplied or the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched, e.g. three-terminal devices
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/76—Unipolar devices, e.g. field effect transistors
- H01L29/772—Field effect transistors
- H01L29/80—Field effect transistors with field effect produced by a PN or other rectifying junction gate, i.e. potential-jump barrier
- H01L29/808—Field effect transistors with field effect produced by a PN or other rectifying junction gate, i.e. potential-jump barrier with a PN junction gate, e.g. PN homojunction gate
- H01L29/8083—Vertical transistors
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S438/00—Semiconductor device manufacturing: process
- Y10S438/931—Silicon carbide semiconductor
Abstract
A method for producing a semiconductor device having semiconductor layers of SiC with at least three doped layers on top of each other comprises: a step a) of growing a first semiconductor layer (1) of SiC; a step b) following on step a) of implanting an impurity dopant into said first layer for forming a second doped surface layer (3) as a sub-layer therein; and a step c) following upon step b) and in which a third semiconductor layer (4) of SiC is epitaxially grown on top of said second layer of SiC.
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP53433397A JP4530432B2 (en) | 1996-03-27 | 1997-03-26 | Method of manufacturing a semiconductor device having a SiC semiconductor layer using an implantation process |
EP97915822A EP0890186B1 (en) | 1996-03-27 | 1997-03-26 | A METHOD FOR PRODUCING A SEMICONDUCTOR DEVICE HAVING SEMICONDUCTOR LAYERS OF SiC BY THE USE OF AN IMPLANTING STEP |
DE69735056T DE69735056T2 (en) | 1996-03-27 | 1997-03-26 | METHOD FOR PRODUCING A SEMICONDUCTOR COMPONENT WITH SiC SEMICONDUCTOR LAYERS BY MEANS OF IMPLANTING STEP |
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
SE9601176-2 | 1996-03-27 | ||
SE9601176A SE9601176D0 (en) | 1996-03-27 | 1996-03-27 | A method of producing a semiconductor device having semiconductor layers of SiC using the implanting step and a device produced thereby |
US08/636,969 US5705406A (en) | 1996-03-27 | 1996-04-24 | Method for producing a semiconductor device having semiconductor layers of SiC by the use of an ion-implantation technique |
Publications (2)
Publication Number | Publication Date |
---|---|
WO1997036317A2 WO1997036317A2 (en) | 1997-10-02 |
WO1997036317A3 true WO1997036317A3 (en) | 1997-11-27 |
Family
ID=26662561
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/SE1997/000532 WO1997036317A2 (en) | 1996-03-27 | 1997-03-26 | A METHOD FOR PRODUCING A SEMICONDUCTOR DEVICE HAVING SEMICONDUCTOR LAYERS OF SiC BY THE USE OF AN IMPLANTING STEP AND A DEVICE PRODUCED THEREBY |
Country Status (3)
Country | Link |
---|---|
US (1) | US5705406A (en) |
SE (1) | SE9601176D0 (en) |
WO (1) | WO1997036317A2 (en) |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6011279A (en) * | 1997-04-30 | 2000-01-04 | Cree Research, Inc. | Silicon carbide field controlled bipolar switch |
SE9701724D0 (en) * | 1997-05-09 | 1997-05-09 | Abb Research Ltd | A pn diode of SiC and a method of production thereof |
US5932894A (en) * | 1997-06-26 | 1999-08-03 | Abb Research Ltd. | SiC semiconductor device comprising a pn junction |
SE9901410D0 (en) * | 1999-04-21 | 1999-04-21 | Abb Research Ltd | Abipolar transistor |
WO2004100225A2 (en) * | 2003-05-01 | 2004-11-18 | The University Of South Carolina | A system and method for fabricating diodes |
CN101258608B (en) * | 2005-09-08 | 2010-05-19 | 三菱电机株式会社 | Semiconductor device and method of fabricating semiconductor device |
US7595241B2 (en) * | 2006-08-23 | 2009-09-29 | General Electric Company | Method for fabricating silicon carbide vertical MOSFET devices |
US7691711B2 (en) * | 2008-01-31 | 2010-04-06 | General Electric Company | Method for fabricating silicon carbide vertical MOSFET devices |
US7906427B2 (en) * | 2008-10-14 | 2011-03-15 | General Electric Company | Dimension profiling of SiC devices |
SE541290C2 (en) | 2017-09-15 | 2019-06-11 | Ascatron Ab | A method for manufacturing a grid |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5318915A (en) * | 1993-01-25 | 1994-06-07 | North Carolina State University At Raleigh | Method for forming a p-n junction in silicon carbide |
US5322802A (en) * | 1993-01-25 | 1994-06-21 | North Carolina State University At Raleigh | Method of fabricating silicon carbide field effect transistor |
EP0627761A2 (en) * | 1993-04-30 | 1994-12-07 | Texas Instruments Incorporated | Epitaxial overgrowth method and devices |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4775882A (en) * | 1986-11-19 | 1988-10-04 | Rockwell International Corporation | Lateral bipolar transistor |
JPH01109738A (en) * | 1987-10-22 | 1989-04-26 | Nec Corp | Manufacture of semiconductor device |
US5135885A (en) * | 1989-03-27 | 1992-08-04 | Sharp Corporation | Method of manufacturing silicon carbide fets |
JPH0383332A (en) * | 1989-08-28 | 1991-04-09 | Sharp Corp | Manufacture of silicon carbide semiconductor device |
US5270554A (en) * | 1991-06-14 | 1993-12-14 | Cree Research, Inc. | High power high frequency metal-semiconductor field-effect transistor formed in silicon carbide |
US5378642A (en) * | 1993-04-19 | 1995-01-03 | General Electric Company | Method of making a silicon carbide junction field effect transistor device for high temperature applications |
US5510281A (en) * | 1995-03-20 | 1996-04-23 | General Electric Company | Method of fabricating a self-aligned DMOS transistor device using SiC and spacers |
-
1996
- 1996-03-27 SE SE9601176A patent/SE9601176D0/en unknown
- 1996-04-24 US US08/636,969 patent/US5705406A/en not_active Expired - Lifetime
-
1997
- 1997-03-26 WO PCT/SE1997/000532 patent/WO1997036317A2/en active IP Right Grant
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5318915A (en) * | 1993-01-25 | 1994-06-07 | North Carolina State University At Raleigh | Method for forming a p-n junction in silicon carbide |
US5322802A (en) * | 1993-01-25 | 1994-06-21 | North Carolina State University At Raleigh | Method of fabricating silicon carbide field effect transistor |
EP0627761A2 (en) * | 1993-04-30 | 1994-12-07 | Texas Instruments Incorporated | Epitaxial overgrowth method and devices |
Also Published As
Publication number | Publication date |
---|---|
WO1997036317A2 (en) | 1997-10-02 |
SE9601176D0 (en) | 1996-03-27 |
US5705406A (en) | 1998-01-06 |
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