WO1982002235A1 - Planar vacuum seal for isolating an air bearing - Google Patents

Planar vacuum seal for isolating an air bearing Download PDF

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Publication number
WO1982002235A1
WO1982002235A1 PCT/US1980/001718 US8001718W WO8202235A1 WO 1982002235 A1 WO1982002235 A1 WO 1982002235A1 US 8001718 W US8001718 W US 8001718W WO 8202235 A1 WO8202235 A1 WO 8202235A1
Authority
WO
WIPO (PCT)
Prior art keywords
planar
portions
seal
vacuum chamber
plane
Prior art date
Application number
PCT/US1980/001718
Other languages
French (fr)
Inventor
Associates Varian
Wayne L Fox
Original Assignee
Associates Varian
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Associates Varian filed Critical Associates Varian
Priority to DE1981900255 priority Critical patent/DE67987T1/en
Publication of WO1982002235A1 publication Critical patent/WO1982002235A1/en

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/18—Vacuum locks ; Means for obtaining or maintaining the desired pressure within the vessel
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16C—SHAFTS; FLEXIBLE SHAFTS; ELEMENTS OR CRANKSHAFT MECHANISMS; ROTARY BODIES OTHER THAN GEARING ELEMENTS; BEARINGS
    • F16C29/00—Bearings for parts moving only linearly
    • F16C29/02—Sliding-contact bearings
    • F16C29/025—Hydrostatic or aerostatic
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16C—SHAFTS; FLEXIBLE SHAFTS; ELEMENTS OR CRANKSHAFT MECHANISMS; ROTARY BODIES OTHER THAN GEARING ELEMENTS; BEARINGS
    • F16C32/00—Bearings not otherwise provided for
    • F16C32/06—Bearings not otherwise provided for with moving member supported by a fluid cushion formed, at least to a large extent, otherwise than by movement of the shaft, e.g. hydrostatic air-cushion bearings
    • F16C32/0603—Bearings not otherwise provided for with moving member supported by a fluid cushion formed, at least to a large extent, otherwise than by movement of the shaft, e.g. hydrostatic air-cushion bearings supported by a gas cushion, e.g. an air cushion
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16C—SHAFTS; FLEXIBLE SHAFTS; ELEMENTS OR CRANKSHAFT MECHANISMS; ROTARY BODIES OTHER THAN GEARING ELEMENTS; BEARINGS
    • F16C33/00—Parts of bearings; Special methods for making bearings or parts thereof
    • F16C33/72—Sealings
    • F16C33/74—Sealings of sliding-contact bearings
    • F16C33/741—Sealings of sliding-contact bearings by means of a fluid
    • F16C33/748—Sealings of sliding-contact bearings by means of a fluid flowing to or from the sealing gap, e.g. vacuum seals with differential exhaust
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16J—PISTONS; CYLINDERS; SEALINGS
    • F16J15/00—Sealings
    • F16J15/002—Sealings comprising at least two sealings in succession
    • F16J15/006—Sealings comprising at least two sealings in succession with division of the pressure
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16J—PISTONS; CYLINDERS; SEALINGS
    • F16J15/00—Sealings
    • F16J15/16—Sealings between relatively-moving surfaces
    • F16J15/40—Sealings between relatively-moving surfaces by means of fluid
    • F16J15/406—Sealings between relatively-moving surfaces by means of fluid by at least one pump
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16C—SHAFTS; FLEXIBLE SHAFTS; ELEMENTS OR CRANKSHAFT MECHANISMS; ROTARY BODIES OTHER THAN GEARING ELEMENTS; BEARINGS
    • F16C2300/00—Application independent of particular apparatuses
    • F16C2300/40—Application independent of particular apparatuses related to environment, i.e. operating conditions
    • F16C2300/62—Application independent of particular apparatuses related to environment, i.e. operating conditions low pressure, e.g. elements operating under vacuum conditions

Definitions

  • This invention relates to treating materials under high vacuum conditions, e.g., in electron beam lithography.
  • electron beam lithography a substrate to be written on is supported in high vacuum on an x/y table. As the writing proceeds, the vacuum must be maintained while the motion of the table is accurately controlled in the x/y plane.
  • My invention features a vacuum chamber defined by means including two closely spaced planar portions which in turn define a planar seal for the chamber.
  • One of the planar portions at least partially encloses an interior volume of the chamber. Further, one of the planar portions, and with it the work element, is movable along the plane of the seal toward and away from that interior volume.
  • Means are provided for evacuating gas from between the planar portions along a direction transverse to the plane to provide the seal.
  • the seal is a graded seal between lapped surfaces of said planar portions, and a gas bearing is provided between said surfaces outwardly of said seal.
  • Fig. 1 is a diagrammatic elevation, partly in section of electron beam lithography apparatus embodying the invention.
  • Fig. 2 is a fragmentary plan view taken along 2-2 of Fig. 1.
  • Fig. 3 is a sectional view through 3-3 of
  • Fig. 4 is a sectional view through 4-4 of Fig. 2.
  • Fig. 5 is an enlarged view taken along 5-5 of Fig. 4.
  • Fig. 6 is a view similar to Fig. 1, of another embodiment.
  • Fig. 7 is a view similar to Fig. 1, of another embodiment. Structure
  • electron beam column assembly 10 including rectangular plate 12, is mounted for planar movement along x and y axes above rectangular plate 14. Recess 16 in plate 14 is evacuated through channel 18, to provide (with plate 12) a vacuum chamber. Workpiece 20 is supported in chamber 16.
  • Figs. 2-5 show an air bearing and seal between plates 12 and 14.
  • Each hole 22 and 24 communicates with a shallow air distribution groove 26 extending parallel to an edge of plate 14.
  • Bent metering rods 28 fit in holes 22 and 24, which are .005 inch in diameter larger than the rods.
  • Each rod has a groove 30 at its top.
  • Air pumps 32 and 34 supply pressurized air through manifolding 36 and 38 to holes 22 and 24.
  • Air filters 40 are located between pumps 32 and 34 and holes 22 and 24.
  • Three spaced air evacuation channels 42, 44, and 46 surround the perimeter of chamber 16 inwardly of air supply holes 24.
  • Channel 42 (1/2 inch deep and 1/8 inch wide) is connected directly by manifolding 48 to vacuum pump 50.
  • Channels 44 and 46 are connected by spaced holes 52 (5/16 inch diameter, spaced on 7/16 and 1/2 inch centers, respectively) through the channel floors, and manifolds 54 and 56 to vacuum pumps 58 and 60.
  • the facing surfaces 62 and 64 of plates 12 and 14 are lapped to a surface finish variation of no more than 4 micro-inches and to a flatness tolerance variation of no more than .0002 inch.
  • electron beam column assembly 100 including plate 112, is stationary. Vacuum chamber and recess 114 is in the upper plate 116, which is movable along x and y axes.
  • Plate 112 has two spaced rows of air delivery holes and three spaced air evacuation channels, respectively manifolded to air supply and vacuum pumps, all generally as in plate 14 of Figs. 1-5.
  • Plate surfaces 118 and 120 are lapped and correspond to surfaces 62 and 64 of plates 12 and 14.
  • electron beam column assembly 130 including plate 132, is stationary and supported by means not shown.
  • Plate 132 has an opening 133 into vacuum chamber 134, which is evacuated through channel 136.
  • Workpiece holder 138 in chamber 134 is connected by column 140 to plate 142, in turn supported from below for movement along x and y axes.
  • a light pressure, sliding mechanical seal 144 is preferably provided between workpiece holder 138 and the upper surface 146 of plate 132 overhangs and is lapped with the upper surface 150 of plate 142. These surfaces correspond to surfaces 62 and 64 of plates 12 and 14.
  • Plate 132 has the spaced rows of air delivery holes and air evacuation channels, respectively manifolded to air supply and vacuum pumps, all generally as in plate 14 of Figs. 1-5. Operation
  • pressurized air flows through holes 22 and 24 and around the outside of rods 28 to form an air cushion (pressurized at about 3 atm. or 2280 torr in the embodiment disclosed, and preferably from 1 to 10 micrometers thick) which acts as an air bearing between plates 12 and 14.
  • Air filters 40 remove dust from the pressurized air to protect the mating plate surfaces. Grooves 26 and 30 help distribute the air. The overall air supply arrangement promotes highly stable operation.
  • Channels 42, 44, and 46 provide an effective graded seal between the vacuum chamber and the air bearing, even though there is relative movement of the sealed plates across the vacuum chamber boundary with the air bearing.
  • the outermost air evacuation channel 42 reduces the air pressure to about 46.6 torr
  • the middle channel 44 further reduces pressure to about .180 torr
  • the innermost channel 46 reduces the pressure to about 3.2 x 10 -3 torr.
  • the pressure in the vacuum chamber 16 is typically about 5 x 10 -6 torr.
  • the air bearing pressure must be enough to at least counteract the tendency of plates 12 and 14 to approach each other because of the vacuum in chamber.
  • the electron beam assembly 10 is moved along the x and y axes to write on workpiece 20 as desired. In the embodiment of Fig. 6 movement of the electron beam assembly 100 is avoided. In the embodiment of Fig. 7, the overhang of downardly facing surface 148 protects the graded seal from dust accumulation. Sliding seal 144 acts to seal the vacuum chamber when the graded seal is shut down for repair or maintenance.

Abstract

A graded planar seal is provided between opposing planar surfaces (62, 64) for isolating an air bearing in a vacuum environment (16). The air bearing (22, 24, 26, 62, 64) supports a structure (20) such as a semiconductor mask or wafer and functions in a vacuum environment without severely degrading the quality of the vacuum. The air bearing is isolated from the vacuum by the use of the graded planar seal which establishes a pressure gradient from the level of the air which supports the air bearing (22, 24, 26, 62, 64) to the level of the vacuum environment (16). The gradient is established across the seal by evacuating gas through successive orifices (42, 44. 46, 52) in opposing planar members (12, 14).

Description

PLANAR VACUUM SEAL FOR ISOLATING AN AIR BEARING
Background of the Invention This invention relates to treating materials under high vacuum conditions, e.g., in electron beam lithography. In electron beam lithography, a substrate to be written on is supported in high vacuum on an x/y table. As the writing proceeds, the vacuum must be maintained while the motion of the table is accurately controlled in the x/y plane. Summary of the Invention
My invention features a vacuum chamber defined by means including two closely spaced planar portions which in turn define a planar seal for the chamber. One of the planar portions at least partially encloses an interior volume of the chamber. Further, one of the planar portions, and with it the work element, is movable along the plane of the seal toward and away from that interior volume. Means are provided for evacuating gas from between the planar portions along a direction transverse to the plane to provide the seal.
In preferred embodiments the seal is a graded seal between lapped surfaces of said planar portions, and a gas bearing is provided between said surfaces outwardly of said seal.
Both seal and bearing are highly effective, despite the pressure differential and despite the relative movement of the planar portions across the boundary of the vacuum chamber. Description of the Preferred Embodiment
I turn now to the structure and operation of preferred embodiments of the invention, after first briefly describing the drawings. Drawings
Fig. 1 is a diagrammatic elevation, partly in section of electron beam lithography apparatus embodying the invention. Fig. 2 is a fragmentary plan view taken along 2-2 of Fig. 1. Fig. 3 is a sectional view through 3-3 of
Fig. 2.
Fig. 4 is a sectional view through 4-4 of Fig. 2.
Fig. 5 is an enlarged view taken along 5-5 of Fig. 4.
Fig. 6 is a view similar to Fig. 1, of another embodiment. Fig. 7 is a view similar to Fig. 1, of another embodiment. Structure
Referring to Figs. 1-5, electron beam column assembly 10, including rectangular plate 12, is mounted for planar movement along x and y axes above rectangular plate 14. Recess 16 in plate 14 is evacuated through channel 18, to provide (with plate 12) a vacuum chamber. Workpiece 20 is supported in chamber 16.
Figs. 2-5 show an air bearing and seal between plates 12 and 14.
Around the perimeter of the plate 14 are two spaced rows of air delivery holes 22 and 24. Each hole 22 and 24 communicates with a shallow air distribution groove 26 extending parallel to an edge of plate 14. Bent metering rods 28 fit in holes 22 and 24, which are .005 inch in diameter larger than the rods. Each rod has a groove 30 at its top. Air pumps 32 and 34 supply pressurized air through manifolding 36 and 38 to holes 22 and 24. Air filters 40 are located between pumps 32 and 34 and holes 22 and 24. Three spaced air evacuation channels 42, 44, and 46 surround the perimeter of chamber 16 inwardly of air supply holes 24. Channel 42 (1/2 inch deep and 1/8 inch wide) is connected directly by manifolding 48 to vacuum pump 50. Channels 44 and 46 (each 3/8 inch wide, and 3/8 inch deep) are connected by spaced holes 52 (5/16 inch diameter, spaced on 7/16 and 1/2 inch centers, respectively) through the channel floors, and manifolds 54 and 56 to vacuum pumps 58 and 60. The facing surfaces 62 and 64 of plates 12 and 14 are lapped to a surface finish variation of no more than 4 micro-inches and to a flatness tolerance variation of no more than .0002 inch.
In the embodiment of Fig. 6, electron beam column assembly 100, including plate 112, is stationary. Vacuum chamber and recess 114 is in the upper plate 116, which is movable along x and y axes. Plate 112 has two spaced rows of air delivery holes and three spaced air evacuation channels, respectively manifolded to air supply and vacuum pumps, all generally as in plate 14 of Figs. 1-5. Plate surfaces 118 and 120 are lapped and correspond to surfaces 62 and 64 of plates 12 and 14.
In the embodiment of Fig. 7, electron beam column assembly 130, including plate 132, is stationary and supported by means not shown. Plate 132 has an opening 133 into vacuum chamber 134, which is evacuated through channel 136. Workpiece holder 138 in chamber 134 is connected by column 140 to plate 142, in turn supported from below for movement along x and y axes. A light pressure, sliding mechanical seal 144 is preferably provided between workpiece holder 138 and the upper surface 146 of plate 132 overhangs and is lapped with the upper surface 150 of plate 142. These surfaces correspond to surfaces 62 and 64 of plates 12 and 14. Plate 132 has the spaced rows of air delivery holes and air evacuation channels, respectively manifolded to air supply and vacuum pumps, all generally as in plate 14 of Figs. 1-5. Operation
Referring now to Figs. 1-5, pressurized air flows through holes 22 and 24 and around the outside of rods 28 to form an air cushion (pressurized at about 3 atm. or 2280 torr in the embodiment disclosed, and preferably from 1 to 10 micrometers thick) which acts as an air bearing between plates 12 and 14. Air filters 40 remove dust from the pressurized air to protect the mating plate surfaces. Grooves 26 and 30 help distribute the air. The overall air supply arrangement promotes highly stable operation.
Channels 42, 44, and 46 provide an effective graded seal between the vacuum chamber and the air bearing, even though there is relative movement of the sealed plates across the vacuum chamber boundary with the air bearing. In the embodiment disclosed, the outermost air evacuation channel 42 reduces the air pressure to about 46.6 torr, the middle channel 44 further reduces pressure to about .180 torr, and the innermost channel 46 reduces the pressure to about 3.2 x 10-3 torr. The pressure in the vacuum chamber 16 is typically about 5 x 10-6 torr.
In general, the air bearing pressure must be enough to at least counteract the tendency of plates 12 and 14 to approach each other because of the vacuum in chamber.
The electron beam assembly 10 is moved along the x and y axes to write on workpiece 20 as desired. In the embodiment of Fig. 6 movement of the electron beam assembly 100 is avoided. In the embodiment of Fig. 7, the overhang of downardly facing surface 148 protects the graded seal from dust accumulation. Sliding seal 144 acts to seal the vacuum chamber when the graded seal is shut down for repair or maintenance.
Other embodiments are in the following claims. Claims What is claimed is :

Claims

What is claimed is:
1. Apparatus for treating a work element in high vacuum, comprising means defining a vacuum chamber, said means having first and second closely spaced planar portions defining a planar seal for said chamber, one of said portions at least partially enclosing an interior volume of said chamber, one of said portions being movable relative to the other said portion parallel to the plane of said seal toward and away from said volume, means for supporting said work element in said chamber for movement parallel to said plane with said movable portion, means for treating said work element upon said movement, and means for evacuating gas from between said planar portions along a direction transverse to said plane to provide said seal.
2. The apparatus of claim 1 wherein said means for evacuating comprises first and second portions spaced apart in a direction parallel to said plane, to provide a graded seal.
3. The apparatus of claim 1 wherein said means for evacuating comprises three portions spaced apart in a direction parallel to said plane to provide a graded seal.
4. The apparatus of claim 2 or 3 wherein said evacuation portion closest to said vacuum chamber has the largest capacity.
5. The apparatus of claim 2 or 3 wherein said air evacuation portions comprise channels in one of said planar portions, said channels extending around the perimeter of said vacuum chamber and being adapted for connection to a vacuum pump.
6. The apparatus of claim 5 wherein one of said channels is adapted for connection to said pump through spaced, manifolded bores through the channel floor.
7. The apparatus of claim 1 further comprising means for providing a gas bearing between said planar portions, said means for evacuating being between said vacuum chamber and said means for providing a gas bearing.
8. The apparatus of claim 7 wherein said means for providing a gas bearing comprises gas supply openings in one of said planar portions, spaced around said vacuum chamber outwardly of said means for evacuating.
9. The apparatus of claim 8 wherein said gas supply openings are arranged in a plurality of rows spaced along a direction parallel to said plane.
10. The apparatus of claim 8 wherein each said gas supply opening communicates with a groove in said one planar portion, said grooves forming a border around said vacuum chamber.
11. The apparatus of claim 10 wherein said grooves are spaced from one another so that said border is discontinuous.
12. The apparatus of claim 8 wherein each said gas supply opening has a bent metering rod therein.
13. The apparatus of claim 12 wherein said rods are grooved at the surface of said one planar portion.
14. The apparatus of claim 1 wherein the opposing surfaces of said planar portions are lapped.
15. The apparatus of claim 14 wherein said surfaces are lapped to a surface finish variation of no more than 4 micro inches.
16. The apparatus of claim 14 wherein said surfaces are lapped to a flatness tolerance variation of no more than .0002 inch.
17. The apparatus of claim 1 wherein said means for treating comprises an electron beam column in communication with said vacuum chamber.
18. The apparatus of claim 1 wherein said planar portion facing said movable portion is recessed to provide said volume.
PCT/US1980/001718 1979-12-26 1980-12-23 Planar vacuum seal for isolating an air bearing WO1982002235A1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
DE1981900255 DE67987T1 (en) 1979-12-26 1980-12-23 FLAT AIRLESS SEAL FOR INSULATING A AIR CUSHION.

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10720779A 1979-12-26 1979-12-26
US107206791226 1979-12-26

Publications (1)

Publication Number Publication Date
WO1982002235A1 true WO1982002235A1 (en) 1982-07-08

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ID=22315423

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US1980/001718 WO1982002235A1 (en) 1979-12-26 1980-12-23 Planar vacuum seal for isolating an air bearing

Country Status (3)

Country Link
EP (1) EP0067987A4 (en)
JP (1) JPS58500134A (en)
WO (1) WO1982002235A1 (en)

Cited By (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2120009A (en) * 1982-05-07 1983-11-23 Gca Corp Lithographic apparatus
EP0106510A2 (en) * 1982-10-19 1984-04-25 Varian Associates, Inc. Envelope apparatus for localized vacuum processing
EP0109147A2 (en) * 1982-10-19 1984-05-23 Varian Associates, Inc. Charged particle beam lithography machine incorporating localized vacuum envelope
US4524261A (en) * 1983-09-19 1985-06-18 Varian Associates, Inc. Localized vacuum processing apparatus
US4528451A (en) * 1982-10-19 1985-07-09 Varian Associates, Inc. Gap control system for localized vacuum processing
US4634043A (en) * 1984-09-20 1987-01-06 At&T Technologies, Inc. Engaging second articles to engaged first articles
WO1988005211A1 (en) * 1986-12-30 1988-07-14 Image Micro Systems, Inc. Flowing gas seal enclosure for processing workpiece surface with controlled gas environment and intense laser irradiation
EP0384754A2 (en) * 1989-02-24 1990-08-29 Micrion Corporation Localized vacuum apparatus and method
EP0936368A3 (en) * 1998-01-23 2000-08-23 Nikon Corporation Air bearing operable in a vacuum region
US6163033A (en) * 1997-09-10 2000-12-19 Applied Materials, Inc. Method and apparatus for controlling a workpiece in a vacuum chamber
US6515288B1 (en) 2000-03-16 2003-02-04 Applied Materials, Inc. Vacuum bearing structure and a method of supporting a movable member
EP1367629A2 (en) * 2002-05-31 2003-12-03 Fei Company Apparatus for tilting a beam system
EP1052419A3 (en) * 1999-04-19 2004-01-07 Applied Materials, Inc. Apparatus for reducing distortion in fluidbearing surfaces
WO2006023595A2 (en) * 2004-08-18 2006-03-02 New Way Machine Components, Inc. Moving vacuum chamber stage with air bearing and differentially pumped grooves

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2859323B1 (en) * 2003-08-29 2006-05-19 Sonceboz Sa UNIVERSAL ACTUATOR, IN PARTICULAR FOR APPLICATION TO DASHBOARDS

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US3201188A (en) * 1961-03-29 1965-08-17 Varian Associates Rotary exhaust apparatus
US3520055A (en) * 1967-04-26 1970-07-14 Western Electric Co Method for holding workpieces for radiant energy bonding
US3691720A (en) * 1970-10-12 1972-09-19 Western Electric Co Apparatus for frequency adjusting and assembling monolithic crystal filters
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GB1325548A (en) * 1969-12-01 1973-08-01 Kodak Ltd Seal
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US4142004A (en) * 1976-01-22 1979-02-27 Bell Telephone Laboratories, Incorporated Method of coating semiconductor substrates
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GB1325548A (en) * 1969-12-01 1973-08-01 Kodak Ltd Seal
US3691720A (en) * 1970-10-12 1972-09-19 Western Electric Co Apparatus for frequency adjusting and assembling monolithic crystal filters
US3704504A (en) * 1971-08-06 1972-12-05 Stromberg Carlson Corp Apparatus for inserting small articles in a matrix plate
US4142004A (en) * 1976-01-22 1979-02-27 Bell Telephone Laboratories, Incorporated Method of coating semiconductor substrates
US4141456A (en) * 1976-08-30 1979-02-27 Rca Corp. Apparatus and method for aligning wafers
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Cited By (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2120009A (en) * 1982-05-07 1983-11-23 Gca Corp Lithographic apparatus
EP0106510A2 (en) * 1982-10-19 1984-04-25 Varian Associates, Inc. Envelope apparatus for localized vacuum processing
EP0109147A2 (en) * 1982-10-19 1984-05-23 Varian Associates, Inc. Charged particle beam lithography machine incorporating localized vacuum envelope
US4528451A (en) * 1982-10-19 1985-07-09 Varian Associates, Inc. Gap control system for localized vacuum processing
EP0109147A3 (en) * 1982-10-19 1986-04-16 Varian Associates, Inc. Charged particle beam lithography machine incorporating localized vacuum envelope
EP0106510A3 (en) * 1982-10-19 1986-04-16 Varian Associates, Inc. Envelope apparatus for localized vacuum processing
US4524261A (en) * 1983-09-19 1985-06-18 Varian Associates, Inc. Localized vacuum processing apparatus
US4634043A (en) * 1984-09-20 1987-01-06 At&T Technologies, Inc. Engaging second articles to engaged first articles
WO1988005211A1 (en) * 1986-12-30 1988-07-14 Image Micro Systems, Inc. Flowing gas seal enclosure for processing workpiece surface with controlled gas environment and intense laser irradiation
EP0384754A3 (en) * 1989-02-24 1991-05-02 Micrion Corporation Localized vacuum apparatus and method
EP0384754A2 (en) * 1989-02-24 1990-08-29 Micrion Corporation Localized vacuum apparatus and method
US5103102A (en) * 1989-02-24 1992-04-07 Micrion Corporation Localized vacuum apparatus and method
US6163033A (en) * 1997-09-10 2000-12-19 Applied Materials, Inc. Method and apparatus for controlling a workpiece in a vacuum chamber
EP0936368A3 (en) * 1998-01-23 2000-08-23 Nikon Corporation Air bearing operable in a vacuum region
EP1052419A3 (en) * 1999-04-19 2004-01-07 Applied Materials, Inc. Apparatus for reducing distortion in fluidbearing surfaces
US6515288B1 (en) 2000-03-16 2003-02-04 Applied Materials, Inc. Vacuum bearing structure and a method of supporting a movable member
EP1367629A2 (en) * 2002-05-31 2003-12-03 Fei Company Apparatus for tilting a beam system
EP1367629A3 (en) * 2002-05-31 2009-01-07 Fei Company Apparatus for tilting a beam system
WO2006023595A2 (en) * 2004-08-18 2006-03-02 New Way Machine Components, Inc. Moving vacuum chamber stage with air bearing and differentially pumped grooves
WO2006023595A3 (en) * 2004-08-18 2007-12-21 New Way Machine Components Inc Moving vacuum chamber stage with air bearing and differentially pumped grooves
US7394076B2 (en) 2004-08-18 2008-07-01 New Way Machine Components, Inc. Moving vacuum chamber stage with air bearing and differentially pumped grooves

Also Published As

Publication number Publication date
EP0067987A4 (en) 1983-04-06
JPS58500134A (en) 1983-01-20
EP0067987A1 (en) 1983-01-05

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