USRE35544E - Apparatus for monitoring moisture in a gas stream - Google Patents
Apparatus for monitoring moisture in a gas stream Download PDFInfo
- Publication number
- USRE35544E USRE35544E US08/671,231 US67123196A USRE35544E US RE35544 E USRE35544 E US RE35544E US 67123196 A US67123196 A US 67123196A US RE35544 E USRE35544 E US RE35544E
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- United States
- Prior art keywords
- coating
- piezoelectric material
- metal oxide
- crystal
- piezoelectric
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- 238000012544 monitoring process Methods 0.000 title description 5
- 238000000576 coating method Methods 0.000 claims abstract description 54
- 239000011248 coating agent Substances 0.000 claims abstract description 41
- 229910044991 metal oxide Inorganic materials 0.000 claims abstract description 38
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 36
- 150000004706 metal oxides Chemical class 0.000 claims abstract description 33
- 239000000463 material Substances 0.000 claims abstract description 28
- -1 zeolite metal oxide Chemical class 0.000 claims abstract description 18
- 239000000203 mixture Substances 0.000 claims abstract description 7
- 229910021536 Zeolite Inorganic materials 0.000 claims abstract description 4
- 239000010457 zeolite Substances 0.000 claims abstract description 4
- 239000007789 gas Substances 0.000 claims description 37
- QVQLCTNNEUAWMS-UHFFFAOYSA-N barium oxide Chemical compound [Ba]=O QVQLCTNNEUAWMS-UHFFFAOYSA-N 0.000 claims description 19
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 11
- 229920002981 polyvinylidene fluoride Polymers 0.000 claims description 8
- 230000001681 protective effect Effects 0.000 claims description 6
- 239000010453 quartz Substances 0.000 claims description 6
- 229910000000 metal hydroxide Inorganic materials 0.000 claims description 5
- 150000004692 metal hydroxides Chemical class 0.000 claims description 5
- 229920001343 polytetrafluoroethylene Polymers 0.000 claims description 3
- 239000004810 polytetrafluoroethylene Substances 0.000 claims description 3
- 230000004044 response Effects 0.000 claims description 2
- 239000013078 crystal Substances 0.000 abstract description 46
- 239000004020 conductor Substances 0.000 abstract description 3
- 239000011261 inert gas Substances 0.000 abstract description 2
- 238000006243 chemical reaction Methods 0.000 description 17
- 239000012535 impurity Substances 0.000 description 16
- 230000008859 change Effects 0.000 description 14
- 229910052751 metal Inorganic materials 0.000 description 14
- 239000002184 metal Substances 0.000 description 14
- 238000004544 sputter deposition Methods 0.000 description 11
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 10
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 10
- DSAJWYNOEDNPEQ-UHFFFAOYSA-N barium atom Chemical compound [Ba] DSAJWYNOEDNPEQ-UHFFFAOYSA-N 0.000 description 10
- 239000001301 oxygen Substances 0.000 description 10
- 229910052760 oxygen Inorganic materials 0.000 description 10
- 239000011347 resin Substances 0.000 description 9
- 229920005989 resin Polymers 0.000 description 9
- 229910052788 barium Inorganic materials 0.000 description 8
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 7
- 238000000034 method Methods 0.000 description 6
- 229910052786 argon Inorganic materials 0.000 description 5
- 239000000741 silica gel Substances 0.000 description 5
- 229910002027 silica gel Inorganic materials 0.000 description 5
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- 230000007423 decrease Effects 0.000 description 4
- 238000001514 detection method Methods 0.000 description 4
- 239000000758 substrate Substances 0.000 description 4
- BQCIDUSAKPWEOX-UHFFFAOYSA-N 1,1-Difluoroethene Chemical compound FC(F)=C BQCIDUSAKPWEOX-UHFFFAOYSA-N 0.000 description 3
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 3
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 3
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 3
- 230000000875 corresponding effect Effects 0.000 description 3
- 238000000151 deposition Methods 0.000 description 3
- 230000008021 deposition Effects 0.000 description 3
- 229910001882 dioxygen Inorganic materials 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 229910000040 hydrogen fluoride Inorganic materials 0.000 description 3
- WABPQHHGFIMREM-UHFFFAOYSA-N lead(0) Chemical compound [Pb] WABPQHHGFIMREM-UHFFFAOYSA-N 0.000 description 3
- 239000011777 magnesium Substances 0.000 description 3
- 229910052749 magnesium Inorganic materials 0.000 description 3
- 239000002808 molecular sieve Substances 0.000 description 3
- 230000008569 process Effects 0.000 description 3
- URGAHOPLAPQHLN-UHFFFAOYSA-N sodium aluminosilicate Chemical compound [Na+].[Al+3].[O-][Si]([O-])=O.[O-][Si]([O-])=O URGAHOPLAPQHLN-UHFFFAOYSA-N 0.000 description 3
- 229910001220 stainless steel Inorganic materials 0.000 description 3
- 239000010935 stainless steel Substances 0.000 description 3
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- CPELXLSAUQHCOX-UHFFFAOYSA-N Hydrogen bromide Chemical compound Br CPELXLSAUQHCOX-UHFFFAOYSA-N 0.000 description 2
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 2
- GQPLMRYTRLFLPF-UHFFFAOYSA-N Nitrous Oxide Chemical compound [O-][N+]#N GQPLMRYTRLFLPF-UHFFFAOYSA-N 0.000 description 2
- XYFCBTPGUUZFHI-UHFFFAOYSA-N Phosphine Chemical compound P XYFCBTPGUUZFHI-UHFFFAOYSA-N 0.000 description 2
- 239000007795 chemical reaction product Substances 0.000 description 2
- 230000005684 electric field Effects 0.000 description 2
- 150000008282 halocarbons Chemical class 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- 229910052744 lithium Inorganic materials 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 238000004375 physisorption Methods 0.000 description 2
- 229920000642 polymer Polymers 0.000 description 2
- 230000002028 premature Effects 0.000 description 2
- 230000035945 sensitivity Effects 0.000 description 2
- 238000002336 sorption--desorption measurement Methods 0.000 description 2
- 230000002277 temperature effect Effects 0.000 description 2
- 238000012360 testing method Methods 0.000 description 2
- 238000007736 thin film deposition technique Methods 0.000 description 2
- QFJAZXGJBIMYLJ-UHFFFAOYSA-N 2,3-dihydroxybutanedioic acid;ethane-1,2-diamine Chemical compound NCCN.OC(=O)C(O)C(O)C(O)=O QFJAZXGJBIMYLJ-UHFFFAOYSA-N 0.000 description 1
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical group [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 1
- 229910018503 SF6 Inorganic materials 0.000 description 1
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- LFVGISIMTYGQHF-UHFFFAOYSA-N ammonium dihydrogen phosphate Chemical compound [NH4+].OP(O)([O-])=O LFVGISIMTYGQHF-UHFFFAOYSA-N 0.000 description 1
- 229910000387 ammonium dihydrogen phosphate Inorganic materials 0.000 description 1
- RBFQJDQYXXHULB-UHFFFAOYSA-N arsane Chemical compound [AsH3] RBFQJDQYXXHULB-UHFFFAOYSA-N 0.000 description 1
- RQPZNWPYLFFXCP-UHFFFAOYSA-L barium dihydroxide Chemical compound [OH-].[OH-].[Ba+2] RQPZNWPYLFFXCP-UHFFFAOYSA-L 0.000 description 1
- 229910001863 barium hydroxide Inorganic materials 0.000 description 1
- 239000011575 calcium Substances 0.000 description 1
- 229910052791 calcium Inorganic materials 0.000 description 1
- 238000011088 calibration curve Methods 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 239000000356 contaminant Substances 0.000 description 1
- 230000002596 correlated effect Effects 0.000 description 1
- 238000013016 damping Methods 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- MROCJMGDEKINLD-UHFFFAOYSA-N dichlorosilane Chemical compound Cl[SiH2]Cl MROCJMGDEKINLD-UHFFFAOYSA-N 0.000 description 1
- 235000016693 dipotassium tartrate Nutrition 0.000 description 1
- 239000002019 doping agent Substances 0.000 description 1
- 239000010408 film Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 239000001307 helium Substances 0.000 description 1
- 229910052734 helium Inorganic materials 0.000 description 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
- 150000004677 hydrates Chemical class 0.000 description 1
- 229910000042 hydrogen bromide Inorganic materials 0.000 description 1
- IXCSERBJSXMMFS-UHFFFAOYSA-N hydrogen chloride Substances Cl.Cl IXCSERBJSXMMFS-UHFFFAOYSA-N 0.000 description 1
- 229910000041 hydrogen chloride Inorganic materials 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxide Chemical compound [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 238000011065 in-situ storage Methods 0.000 description 1
- 230000002452 interceptive effect Effects 0.000 description 1
- HFGPZNIAWCZYJU-UHFFFAOYSA-N lead zirconate titanate Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Ti+4].[Zr+4].[Pb+2] HFGPZNIAWCZYJU-UHFFFAOYSA-N 0.000 description 1
- 229910052451 lead zirconate titanate Inorganic materials 0.000 description 1
- GQYHUHYESMUTHG-UHFFFAOYSA-N lithium niobate Chemical compound [Li+].[O-][Nb](=O)=O GQYHUHYESMUTHG-UHFFFAOYSA-N 0.000 description 1
- 238000001755 magnetron sputter deposition Methods 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 229910052987 metal hydride Inorganic materials 0.000 description 1
- 150000004681 metal hydrides Chemical class 0.000 description 1
- 235000019837 monoammonium phosphate Nutrition 0.000 description 1
- 239000001272 nitrous oxide Substances 0.000 description 1
- NJPPVKZQTLUDBO-UHFFFAOYSA-N novaluron Chemical compound C1=C(Cl)C(OC(F)(F)C(OC(F)(F)F)F)=CC=C1NC(=O)NC(=O)C1=C(F)C=CC=C1F NJPPVKZQTLUDBO-UHFFFAOYSA-N 0.000 description 1
- 230000010355 oscillation Effects 0.000 description 1
- 229910000073 phosphorus hydride Inorganic materials 0.000 description 1
- 230000010399 physical interaction Effects 0.000 description 1
- 239000011591 potassium Substances 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- AVTYONGGKAJVTE-OLXYHTOASA-L potassium L-tartrate Chemical compound [K+].[K+].[O-]C(=O)[C@H](O)[C@@H](O)C([O-])=O AVTYONGGKAJVTE-OLXYHTOASA-L 0.000 description 1
- LJCNRYVRMXRIQR-OLXYHTOASA-L potassium sodium L-tartrate Chemical class [Na+].[K+].[O-]C(=O)[C@H](O)[C@@H](O)C([O-])=O LJCNRYVRMXRIQR-OLXYHTOASA-L 0.000 description 1
- 239000001472 potassium tartrate Substances 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 230000001902 propagating effect Effects 0.000 description 1
- 238000013094 purity test Methods 0.000 description 1
- 239000002516 radical scavenger Substances 0.000 description 1
- 238000001552 radio frequency sputter deposition Methods 0.000 description 1
- 239000000376 reactant Substances 0.000 description 1
- 229920013730 reactive polymer Polymers 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 230000002441 reversible effect Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000007086 side reaction Methods 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 235000011006 sodium potassium tartrate Nutrition 0.000 description 1
- 229910000679 solder Inorganic materials 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
- 229910052712 strontium Inorganic materials 0.000 description 1
- CIOAGBVUUVVLOB-UHFFFAOYSA-N strontium atom Chemical compound [Sr] CIOAGBVUUVVLOB-UHFFFAOYSA-N 0.000 description 1
- SFZCNBIFKDRMGX-UHFFFAOYSA-N sulfur hexafluoride Chemical compound FS(F)(F)(F)(F)F SFZCNBIFKDRMGX-UHFFFAOYSA-N 0.000 description 1
- 229960000909 sulfur hexafluoride Drugs 0.000 description 1
- TXEYQDLBPFQVAA-UHFFFAOYSA-N tetrafluoromethane Chemical compound FC(F)(F)F TXEYQDLBPFQVAA-UHFFFAOYSA-N 0.000 description 1
- 238000000427 thin-film deposition Methods 0.000 description 1
- 239000011032 tourmaline Substances 0.000 description 1
- 229940070527 tourmaline Drugs 0.000 description 1
- 229910052613 tourmaline Inorganic materials 0.000 description 1
- 231100000331 toxic Toxicity 0.000 description 1
- 230000002588 toxic effect Effects 0.000 description 1
- ZDHXKXAHOVTTAH-UHFFFAOYSA-N trichlorosilane Chemical compound Cl[SiH](Cl)Cl ZDHXKXAHOVTTAH-UHFFFAOYSA-N 0.000 description 1
- 239000005052 trichlorosilane Substances 0.000 description 1
- 238000011144 upstream manufacturing Methods 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N29/00—Investigating or analysing materials by the use of ultrasonic, sonic or infrasonic waves; Visualisation of the interior of objects by transmitting ultrasonic or sonic waves through the object
- G01N29/02—Analysing fluids
- G01N29/036—Analysing fluids by measuring frequency or resonance of acoustic waves
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2291/00—Indexing codes associated with group G01N29/00
- G01N2291/01—Indexing codes associated with the measuring variable
- G01N2291/014—Resonance or resonant frequency
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2291/00—Indexing codes associated with group G01N29/00
- G01N2291/02—Indexing codes associated with the analysed material
- G01N2291/028—Material parameters
- G01N2291/02845—Humidity, wetness
Definitions
- This invention relates to a method and apparatus for detecting water impurity in a gas stream. More particularly, this invention relates to a method and apparatus for detecting water impurity utilizing a piezoelectric crystal coated with a metal oxide reactive with water.
- ultrapure gas streams are utilized in chemical reactions such as in the semiconductor industry. These chemical reactions usually are conducted in sealed containers to maintain purity since the gases often times are toxic and are conducted under low pressure in order to decrease the probability of unwanted side reactions.
- the gas is treated, prior to entering the reaction chamber, in order to remove impurities therefrom. It is general practice to pass the gas through a bed of resin particles which are interactive with impurities such as water in the gas.
- the coating In the SAW device, the coating must be thin; on the order of a wavelength of the acoustic wave or thinner in order to permit accurate measurement of impurity concentration. While this device is extremely sensitive to impurity concentration change, i.e. in the picogram level, it is too sensitive for use in a device requiring an extended service, i.e., about one year or more, since the thickness of the coating necessary to have the capacity for extended lifetimes quickly exceeds that which permits accurate measurements.
- Absorbants such as alumina, silica gel and molecular sieves exhibit a steady increase in the water vapor pressure as more moisture is absorbed. This continual increase is undesirable, since the sensitivity for moisture steadily decreases as more moisture is absorbed.
- the coated crystal would need to be located within a carefully temperature controlled environment to eliminate any temperature effects on the physisorption.
- a scavenger for oxygen and water vapor impurities comprising metal hydrides are disclosed in U.S. Pat. Nos. 4,950,419 and 4,716,181.
- these devices are not useful for selective reaction with water in an oxygen gas containing stream since coatings of the device are reactive with both oxygen and water.
- the present invention provides a coated piezoelectric apparatus for detecting the presence of water impurity in a wide variety of gases.
- a piezoelectric crystal is coated on one or more opposing surfaces with .[.a.]. .Iadd.at least one .Iaddend.non-crystalline metal oxide.Iadd.; crystal1iline non-zeolite metal oxide and mixtures thereof coating .Iaddend.which reacts with water to form a metal hydroxide.
- the metal oxide can be deposited on the piezoelectric crystal by a suitable thin film deposition process. Alternatively the metal oxide coating can be formed in situ by first coating the crystal with a metal which is reactive with oxygen followed by exposure to an oxygen-containing gas to convert the metal coating to the desired metal oxide.
- the mass of reactive metal oxide coating applied is large enough so that there is enough material to continue to react with water for the service lifetime that is desired, while not being so heavy as to prevent or substantially reduce vibration of the piezoelectric crystal due to its mass or the mass of the reaction product.
- the crystal is subjected to an alternating electric field and the resonant vibration caused by the electric field is detected.
- the reaction of water with the reactive metal oxide coating will form a metal hydroxide with an accompanying change of mass.
- the mass change will cause a change in reasonant frequency, i.e., a mass increase causes a resonant frequency decrease due to a damping effect which is measured.
- the resonant frequency measured can be correlated to water impurity concentration in the incoming gas by means of a standard curve.
- the piezoelectric crystal can be coated with a protective polymer such as poly(vinylidene fluoride) (PVDF) or polytetrafluoroethylene to protect the piezoelectric from corrosive gases such as hydrogen fluoride.
- PVDF poly(vinylidene fluoride)
- polytetrafluoroethylene to protect the piezoelectric from corrosive gases such as hydrogen fluoride.
- the reactive coating is coated on the protective polymer.
- the combined mass of the two coatings must meet the mass criteria set forth above.
- FIG. 1 is a side view of a coated piezoelectric crystal device of this invention.
- FIG. 2 is a top view of an apparatus of this invention.
- FIG. 3 is a schematic view illustrating the use of the apparatus of this invention.
- FIG. 4 is a graph showing the maximum weight of material that can be deposited on a crystal and remain within the crystal linear range.
- FIG. 5 shows the effect of pressurized air contact with the coated piezoelectric crystal device of this invention.
- the coated piezoelectric crystals of this invention comprise a piezoelectric substrate such as natural quartz, lithium niobate, lead metaniobate, lead zirconate titanate, poly(vinylidene difluoride) (PVDF), Rochelle salts, tourmaline, ethylenediamine tartrate, dipotassium tartrate, ammonium dihydrogen phosphate or the like, preferably quartz (and PVDF in hydrogen fluoride gas streams).
- PVDF poly(vinylidene difluoride)
- the coating is applied to oneor both of the largest surfaces of the substrate.
- ⁇ f is the observed frequency change
- f o is the fundamental frequency of the crystal
- m is the mass change at the electrode surface
- N is the frequency constant for the crystal
- A is the surface area of the deposit
- ⁇ is the density of the piezoelectriccrystal.
- the observed frequency change is linearly dependent on the mass change but varies to the square of the fundamental frequency.
- a 2.0-MHz crystal will be four times more sensitive than a 1.0 MHz crystal.
- Good correlation has been found between the observed and calculated frequency change when the crystal linear rangeis assumed to be 1% of f o as shown in FIG. 4. Outside this range, thislinear relationship between frequency and mass change will deteriorate and above a critical mass, the crystal will cease to oscillate.
- the maximum amount of material that the crystal can accommodate and still vibrate within the linear response range will vary according to the frequency of the piezoelectric crystals utilized and is generally between about 0.1 and 3.5 milligrams.
- Suitable metal oxide coatings are those which react with water, permit detection of water at concentrations of 1 part per billion (ppb) and do not add contaminant to purified gas.
- the non-crystalline metal oxide.Iadd.; crystalline, non-zeolite metal oxide; and mixtures thereof .Iaddend.coatings most useful in the present invention are those which react with water to form the metal hydroxide which then reacts further with water to form hydrates of the hydroxide.
- Metal oxides which merely adsorb or absorb water are not useful in the present invention.
- the metal .Iadd.oxide .Iaddend. should be reactive with water at a temperature between about 10° and 60° C., preferably between about 20° and 35° C.
- metal oxides include the oxides of Groups IA and IIA elements, i.e. lithium, magnesium, potassium, strontium, barium, sodium, calcium or the like. It is preferred to utilize the metal oxides formed of a metal havinga low molecular weight such as lithium or magnesium since the mass change as a result of reaction with water is larger and more easily detectable ascompared to coatings containing higher molecular weight metals.
- the chemical reaction of the desired metal oxides of this invention differs significantly from the physical interaction of the metal oxides e.g. alumina, silica gel and molecular sieves with moisture.
- the water vapor absorption isotherms for the desired metal oxides have plateau regions corresponding to the different phases and do not continuously increase as observed with silica gel and alumina. Therefore, the reactivity and sensitivity toward moisture is constant in these regions. This extends thecapability of these coatings for accurate low-level moisture detection and simplifies the interpretation of moisture calibration curves.
- the chemical reaction of moisture with the desired metal oxides eliminates the need for careful temperature control that is required with the other metal oxide coatings that have adsorption-desorption equilibria.
- One of the desired coatings, barium oxide additionally has a lower water vapor pressure of 7 ⁇ 10 -4 torr compared to alumina and related metal oxides.
- analysis of reaction kinetic data showed similar reaction probabilities for the reactions of water with BaO and Ba metal, aknown getter for moisture (Verhoeven, J.; Van Doveren, H. Applications of Surface Science 1980, 6, 225)
- the detector of this invention is useful in monitoring water vapor impurityconcentration in oxygen containing gases such as oxygen or nitrous oxide; inert gases, such as helium, argon, nitrogen; silicon containing gases such as silane, dichlorosilane, trichlorosilane; dopants such as arsine, phosphine, diborane; etchants such as halocarbon 14, halocarbon 16, halocarbon 218, sulfur hexafluoride, chlorine, hydrogen bromide or reactants such as hydrogen chloride, hydrogen fluoride or ammonia.
- oxygen containing gases such as oxygen or nitrous oxide
- inert gases such as helium, argon, nitrogen
- silicon containing gases such as silane, dichlorosilane, trichlorosilane
- dopants such as arsine, phosphine, diborane
- etchants such as halocarbon 14, halocarbon 16, halocarbon 218, sulfur hexaflu
- the composite structure of this invention includes a piezoelectric crystal which is coated with the metal oxide coating materials of this invention set forth above to form coatings 12 and 14.
- a conductive lead wire 16 such as a copper wire is bonded to crystal 10 suchas with solder 18 in order to input alternating electrical energy into crystal 10.
- an apparatus of this invention including the piezoelectric crystal coating 12 and connected to lead wire 16.
- a second lead wire 22 is bonded to piezoelectric crystal 10 which transmits vibration of the coated crystal to an electronic circuit such as describedbelow.
- the electronic circuit monitors the frequency of vibration of the energized crystal.
- the coatings 12 and 14 are applied by an acceptable thin film deposition technique, e.g., sputtering.
- the film can be applied as the metal oxide directly or as the metal which then can be converted tothe metal oxide by reaction with oxygen.
- a metal conductor e.g. magnesium
- DC sputtering is a possible mode.
- other metals or metal oxides e.g.
- barium, barium oxide, RF is the recommended sputtering technique.
- a potential is applied to a barium target.
- the barium target will become negatively sell-biased creating an enrichment of ions in front of the target.
- the ions strike the target and sputtering is obtained.
- the crystal is positioned on a pedestal located at a distance of one to three inches from the bottom of the sputtering head.
- the crystal is masked so deposition occurs only on the desired areas of the piezoelectric electrodes.
- Typical sputtering operations with this piece of equipment areperformed at a pressure range of 2 to 10 mtorr and RF power of 50 to 150 W with argon as the sputtering gas.
- reactive RF sputtering may be employed with 1-5% oxygen in argon as the sputtering gas.
- the oscillator design is based on a CMOS Pierce Oscillator.
- the basic physics internal to the crystal is that of a sound wave propagating through the crystal.
- the initial electrical input at one voltage difference causes an expansion of the crystal.
- the initial voltage is produced by one end of the inverter gate due to its 180° phase difference from the other end of the inverter.
- the piezoelectric crystal behaves electrically like a high Q(quality) LC network, or physically likea mass spring. As the mass per unit length of the spring changes, so will the frequency of the springs oscillations. By changing the mass on the surface of the crystal frequency changes of the crystal oscillator can be detected.
- Two CMOS Pierce Oscillators are used in the electronics circuit.
- One oscillator is used as a reference, the other as a mass sensor.
- the two signals are fed into a flip-flop that gives the difference frequency of the two crystals. This serves two purposes; one to null Out any temperature effects, the other to give a smaller frequency value, e.g., 1,000,000 Hz reference signal, and 999,000 Hz sensor signal, will produce a 1,000 Hz difference frequency.
- the difference frequency is applied to a microcontroller counter input and frequency cycles summed for a given timeperiod. Knowing the number of total cycles and the time period, frequency in Hz can be calculated. A ten second sample time gives 1/10 Hz resolutionof the difference frequency.
- the sensor apparatus 8 of this invention is positionedon housing 30 and includes a gas inlet 32 and a gas outlet 34.
- Gas to be purified is introduced through inlet 36, through screen 38 and into resin bed 40.
- Optional resin bed 40 functions to scavenge water vapor from the incoming gas.
- Purified gas is passed out screen 42, through final filter 44 and through outlet 46 to a zone for chemical reaction (not shown).
- Alternate device configurations are possible, including a device in which the coated crystal is mounted directly within the flowing gas stream.
- a stainless steel housing consisting of all stainless steel components, metal-to-metal face seal and metal gasket seal connections and inlet and outlet diaphragm valves to seal the housing from outside atmosphere when required was constructed to permit testing of coated piezoelectric quartz crystals.
- a quartz crystal with fundamental frequency of 5.050 MHz was RF sputter coated in an argon glove box with barium metal at 55 W, 5 mTorr pressure for 7 minutes each side to deposit a total of 166 ⁇ g of bariummetal and decreased the frequency of the crystal to 5.014 MHz.
- the crystal previously mounted on a HC-51/U type holder with glass feedthroughs and holder welded onto metal header, was inserted into the stainless steel housing and sealed with metal gasket seal.
- the housing was removed from the glove box and connected to a high purity test stand. Connected to the upstream diaphragm valve of the housing was a Waferpure® Mini XL gas purifier (Model No. WPMV200SC) to remove water vapor from the test gas.
- a flow of purified nitrogen from a cryogenic source at 1.0 slpm was started through the housing containing the barium-coated crystal. After ca. 20 hours, the gas was switched to a 2% oxygen in argon mixture to accelerate the conversion of the barium coating to barium oxide. The gas flow was periodically stopped to pressurize the housing with the oxygen gas mixture, especially during overnight periods. After ca.
- the gas was switched to air (Grade 0.1,[H 2 O] ⁇ 3 ppm) to convert any remaining accessible barium to barium oxide.
- the purifier was removed after 162 hours to challenge the formed barium oxide coated sensor to the unpurifiedair. As shown in FIG. 5, exposure of the sensor to moisture resulted in a large and immediate frequency decrease corresponding to conversion of the sensor coating to barium hydroxide.
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Abstract
A device is provided comprising a piezoelectric material and at least one non-crystalline .[.non-crystalline.]. metal oxide.[.,.]..Iadd.; .Iaddend.crystalline.[.-.]..Iadd.,.Iaddend.non-zeolite metal oxide and mixtures thereof coating chemically reactive with trace quantities of water in chemically reactive and inert gases. The piezoelectric material is bonded to a conductor for delivering an alternating electric current and to a conductor for transmitting resonant vibration frequency of the crystal. The reactive metal oxide coating has an effective thickness which provides a serviceable life for the coating while not being so thick as to prevent vibration of the piezoelectric material.
Description
This application is a continuation-in-part of U.S. application Ser. No. 07/958,384, filed Oct. 8, 1992, which has become U.S. Pat. No. 5,339,675 as of Aug. 23, 1994.
This invention relates to a method and apparatus for detecting water impurity in a gas stream. More particularly, this invention relates to a method and apparatus for detecting water impurity utilizing a piezoelectric crystal coated with a metal oxide reactive with water.
At the present time ultrapure gas streams are utilized in chemical reactions such as in the semiconductor industry. These chemical reactions usually are conducted in sealed containers to maintain purity since the gases often times are toxic and are conducted under low pressure in order to decrease the probability of unwanted side reactions. In order to maintain the requisite gas purity, the gas is treated, prior to entering the reaction chamber, in order to remove impurities therefrom. It is general practice to pass the gas through a bed of resin particles which are interactive with impurities such as water in the gas. Over time, the capacity of the bed of resin particles for interacting with the impurities is depleted to a point where breakthrough of impurities from the resin bed occurs and the impurities enter the reaction zone it is difficult to predict when undesirable depletion of resin capacity occurs so that in the absence of independent monitoring means, premature or late removal of the resin is likely. Premature resin removal results in increased resin cost while late removal results in expensive damage to reaction product. It is additionally desirable to have a means for continuously monitoring the gas purity level and providing a measure of gas impurity concentration.
It has been proposed in U.S. Pat No. 5,138,867 to provide a detection system for sensing concentration of impurities in a gas stream which includes a sensing device which can be hygrometric, spectrophotometric, piezoelectric or colorimetric. The specific piezoelectric device disclosed is a surface acoustical wave (SAW) device. In a SAW device, an acoustical wave is passed along a surface coating on a substrate to measure the change in mass at the interface between the coating and the substrate. Mass change in the coating is caused by reaction of the coating with impurities in a gas which contacts the coating. Accordingly, a reactive polymer coating material is described that is consumed over time and regenerable. In the SAW device, the coating must be thin; on the order of a wavelength of the acoustic wave or thinner in order to permit accurate measurement of impurity concentration. While this device is extremely sensitive to impurity concentration change, i.e. in the picogram level, it is too sensitive for use in a device requiring an extended service, i.e., about one year or more, since the thickness of the coating necessary to have the capacity for extended lifetimes quickly exceeds that which permits accurate measurements.
The detection of water vapor using materials like silica gel and alumina on piezoelectric materials was proposed in U.S. Pat. No. 3,385,100. These types of metal oxide coatings absorb moisture through a physisorption, rather than chemisorption, mechanism. Water adsorption on these types of coatings occur principally through dipole bonds (H-bonding) with surface hydroxyls. The approximate water vapor pressure at 25° C. for absorbants like alumina are shown in the table below (Shriver, D. F.; Drezdzon, M. A. "The Manipulation of Air-Sensitive Compounds", 2nd.ed.; John Wiley & Sons, Inc.: New York. 1986; p 72):
______________________________________ Material Water Vapor Pressure (torr) ______________________________________Molecular Sieves 1 × 10.sup.-3 Alumina (active) 1 × 10.sup.-3 Silicagel 2 × 10.sup.-3 ______________________________________
Absorbants such as alumina, silica gel and molecular sieves exhibit a steady increase in the water vapor pressure as more moisture is absorbed. This continual increase is undesirable, since the sensitivity for moisture steadily decreases as more moisture is absorbed. In addition, due to the reversible adsorption-desorption of moisture from these type of coatings, the coated crystal would need to be located within a carefully temperature controlled environment to eliminate any temperature effects on the physisorption.
A scavenger for oxygen and water vapor impurities comprising metal hydrides are disclosed in U.S. Pat. Nos. 4,950,419 and 4,716,181. However, these devices are not useful for selective reaction with water in an oxygen gas containing stream since coatings of the device are reactive with both oxygen and water.
It would be desirable to provide a means for detecting water vapor in a gas stream which is useful and accurate for extended times. In addition it would be desirable to provide such a means for detecting water vapor capable of quantifying impurity concentration in a gas, particularly a gas stream consisting of or containing oxygen gas.
The present invention provides a coated piezoelectric apparatus for detecting the presence of water impurity in a wide variety of gases. A piezoelectric crystal is coated on one or more opposing surfaces with .[.a.]. .Iadd.at least one .Iaddend.non-crystalline metal oxide.Iadd.; crystal1iline non-zeolite metal oxide and mixtures thereof coating .Iaddend.which reacts with water to form a metal hydroxide. The metal oxide can be deposited on the piezoelectric crystal by a suitable thin film deposition process. Alternatively the metal oxide coating can be formed in situ by first coating the crystal with a metal which is reactive with oxygen followed by exposure to an oxygen-containing gas to convert the metal coating to the desired metal oxide. The mass of reactive metal oxide coating applied is large enough so that there is enough material to continue to react with water for the service lifetime that is desired, while not being so heavy as to prevent or substantially reduce vibration of the piezoelectric crystal due to its mass or the mass of the reaction product. The crystal is subjected to an alternating electric field and the resonant vibration caused by the electric field is detected. The reaction of water with the reactive metal oxide coating will form a metal hydroxide with an accompanying change of mass. The mass change will cause a change in reasonant frequency, i.e., a mass increase causes a resonant frequency decrease due to a damping effect which is measured. The resonant frequency measured can be correlated to water impurity concentration in the incoming gas by means of a standard curve. The piezoelectric crystal can be coated with a protective polymer such as poly(vinylidene fluoride) (PVDF) or polytetrafluoroethylene to protect the piezoelectric from corrosive gases such as hydrogen fluoride. The reactive coating is coated on the protective polymer. The combined mass of the two coatings must meet the mass criteria set forth above.
FIG. 1 is a side view of a coated piezoelectric crystal device of this invention.
FIG. 2 is a top view of an apparatus of this invention.
FIG. 3 is a schematic view illustrating the use of the apparatus of this invention.
FIG. 4 is a graph showing the maximum weight of material that can be deposited on a crystal and remain within the crystal linear range.
FIG. 5 shows the effect of pressurized air contact with the coated piezoelectric crystal device of this invention.
The coated piezoelectric crystals of this invention comprise a piezoelectric substrate such as natural quartz, lithium niobate, lead metaniobate, lead zirconate titanate, poly(vinylidene difluoride) (PVDF), Rochelle salts, tourmaline, ethylenediamine tartrate, dipotassium tartrate, ammonium dihydrogen phosphate or the like, preferably quartz (and PVDF in hydrogen fluoride gas streams). The coating is applied to oneor both of the largest surfaces of the substrate.
The behavior of the piezoelectric crystals can be explained using the Sauerbrey equation:
Δf=-f.sub.o.sup.2 m/NAρ
wherein Δ f is the observed frequency change, fo is the fundamental frequency of the crystal, m is the mass change at the electrode surface, N is the frequency constant for the crystal, A is the surface area of the deposit, and ρ is the density of the piezoelectriccrystal. As evidenced by the equation, the observed frequency change is linearly dependent on the mass change but varies to the square of the fundamental frequency. Thus, a 2.0-MHz crystal will be four times more sensitive than a 1.0 MHz crystal. Good correlation has been found between the observed and calculated frequency change when the crystal linear rangeis assumed to be 1% of fo as shown in FIG. 4. Outside this range, thislinear relationship between frequency and mass change will deteriorate and above a critical mass, the crystal will cease to oscillate. Thus, as shownin FIG. 4, the maximum amount of material that the crystal can accommodate and still vibrate within the linear response range will vary according to the frequency of the piezoelectric crystals utilized and is generally between about 0.1 and 3.5 milligrams.
Suitable metal oxide coatings are those which react with water, permit detection of water at concentrations of 1 part per billion (ppb) and do not add contaminant to purified gas. The non-crystalline metal oxide.Iadd.; crystalline, non-zeolite metal oxide; and mixtures thereof .Iaddend.coatings most useful in the present invention are those which react with water to form the metal hydroxide which then reacts further with water to form hydrates of the hydroxide. Metal oxides which merely adsorb or absorb water are not useful in the present invention. The metal .Iadd.oxide .Iaddend.should be reactive with water at a temperature between about 10° and 60° C., preferably between about 20° and 35° C. to form a metal hydroxide product having a melting point of at least about 60° C. Representative suitable metal oxides include the oxides of Groups IA and IIA elements, i.e. lithium, magnesium, potassium, strontium, barium, sodium, calcium or the like. It is preferred to utilize the metal oxides formed of a metal havinga low molecular weight such as lithium or magnesium since the mass change as a result of reaction with water is larger and more easily detectable ascompared to coatings containing higher molecular weight metals. The chemical reaction of the desired metal oxides of this invention differs significantly from the physical interaction of the metal oxides e.g. alumina, silica gel and molecular sieves with moisture. The water vapor absorption isotherms for the desired metal oxides have plateau regions corresponding to the different phases and do not continuously increase as observed with silica gel and alumina. Therefore, the reactivity and sensitivity toward moisture is constant in these regions. This extends thecapability of these coatings for accurate low-level moisture detection and simplifies the interpretation of moisture calibration curves. In addition,the chemical reaction of moisture with the desired metal oxides eliminates the need for careful temperature control that is required with the other metal oxide coatings that have adsorption-desorption equilibria. One of the desired coatings, barium oxide, additionally has a lower water vapor pressure of 7×10-4 torr compared to alumina and related metal oxides. In addition, analysis of reaction kinetic data showed similar reaction probabilities for the reactions of water with BaO and Ba metal, aknown getter for moisture (Verhoeven, J.; Van Doveren, H. Applications of Surface Science 1980, 6, 225)
The detector of this invention is useful in monitoring water vapor impurityconcentration in oxygen containing gases such as oxygen or nitrous oxide; inert gases, such as helium, argon, nitrogen; silicon containing gases such as silane, dichlorosilane, trichlorosilane; dopants such as arsine, phosphine, diborane; etchants such as halocarbon 14, halocarbon 16, halocarbon 218, sulfur hexafluoride, chlorine, hydrogen bromide or reactants such as hydrogen chloride, hydrogen fluoride or ammonia. When monitoring an oxygen-containing gas, a metal coating is first converted toa metal oxide by the gas stream which then is reactive with water vapor to produce the effects discussed above. The mass change corresponding to thisconversion must not exceed the maximum mass specified for the crystal discussed above. Alternatively, the metal oxide may be deposited on the piezoelectric crystal by a suitable thin film deposition technique.
Referring to FIG. 1, the composite structure of this invention includes a piezoelectric crystal which is coated with the metal oxide coating materials of this invention set forth above to form coatings 12 and 14. A conductive lead wire 16 such as a copper wire is bonded to crystal 10 suchas with solder 18 in order to input alternating electrical energy into crystal 10.
Referring to FIG. 2, an apparatus of this invention is shown including the piezoelectric crystal coating 12 and connected to lead wire 16. A second lead wire 22 is bonded to piezoelectric crystal 10 which transmits vibration of the coated crystal to an electronic circuit such as describedbelow. The electronic circuit monitors the frequency of vibration of the energized crystal. The coatings 12 and 14 are applied by an acceptable thin film deposition technique, e.g., sputtering. The film can be applied as the metal oxide directly or as the metal which then can be converted tothe metal oxide by reaction with oxygen. For the deposition of a metal conductor e.g. magnesium, DC sputtering is a possible mode. For other metals or metal oxides, e.g. barium, barium oxide, RF is the recommended sputtering technique. In a process of utilizing an RF planar magnetron sputtering system for the deposition of barium, e.g., Model CrC-100 PlanarMagnetron Sputtering System with optional 200 watt RF power supply manufactured by Plasma Sciences, Inc., a potential is applied to a barium target. In the sputtering process, the barium target will become negatively sell-biased creating an enrichment of ions in front of the target. The ions strike the target and sputtering is obtained. The crystalis positioned on a pedestal located at a distance of one to three inches from the bottom of the sputtering head. The crystal is masked so deposition occurs only on the desired areas of the piezoelectric electrodes. Typical sputtering operations with this piece of equipment areperformed at a pressure range of 2 to 10 mtorr and RF power of 50 to 150 W with argon as the sputtering gas. For the sputter deposition of metal oxides, reactive RF sputtering may be employed with 1-5% oxygen in argon as the sputtering gas.
The oscillator design is based on a CMOS Pierce Oscillator. The basic physics internal to the crystal is that of a sound wave propagating through the crystal. The initial electrical input at one voltage difference causes an expansion of the crystal. The initial voltage is produced by one end of the inverter gate due to its 180° phase difference from the other end of the inverter. The piezoelectric crystal behaves electrically like a high Q(quality) LC network, or physically likea mass spring. As the mass per unit length of the spring changes, so will the frequency of the springs oscillations. By changing the mass on the surface of the crystal frequency changes of the crystal oscillator can be detected.
Two CMOS Pierce Oscillators are used in the electronics circuit. One oscillator is used as a reference, the other as a mass sensor. The two signals are fed into a flip-flop that gives the difference frequency of the two crystals. This serves two purposes; one to null Out any temperature effects, the other to give a smaller frequency value, e.g., 1,000,000 Hz reference signal, and 999,000 Hz sensor signal, will produce a 1,000 Hz difference frequency. The difference frequency is applied to a microcontroller counter input and frequency cycles summed for a given timeperiod. Knowing the number of total cycles and the time period, frequency in Hz can be calculated. A ten second sample time gives 1/10 Hz resolutionof the difference frequency.
Referring to FIG. 3, the sensor apparatus 8 of this invention is positionedon housing 30 and includes a gas inlet 32 and a gas outlet 34. Gas to be purified is introduced through inlet 36, through screen 38 and into resin bed 40. Optional resin bed 40 functions to scavenge water vapor from the incoming gas. Purified gas is passed out screen 42, through final filter 44 and through outlet 46 to a zone for chemical reaction (not shown). Alternate device configurations are possible, including a device in which the coated crystal is mounted directly within the flowing gas stream.
The following example illustrates the present invention and is not intendedto limit the same.
A stainless steel housing consisting of all stainless steel components, metal-to-metal face seal and metal gasket seal connections and inlet and outlet diaphragm valves to seal the housing from outside atmosphere when required was constructed to permit testing of coated piezoelectric quartz crystals. A quartz crystal with fundamental frequency of 5.050 MHz was RF sputter coated in an argon glove box with barium metal at 55 W, 5 mTorr pressure for 7 minutes each side to deposit a total of 166 μg of bariummetal and decreased the frequency of the crystal to 5.014 MHz. The crystal,previously mounted on a HC-51/U type holder with glass feedthroughs and holder welded onto metal header, was inserted into the stainless steel housing and sealed with metal gasket seal. The housing was removed from the glove box and connected to a high purity test stand. Connected to the upstream diaphragm valve of the housing was a Waferpure® Mini XL gas purifier (Model No. WPMV200SC) to remove water vapor from the test gas. A flow of purified nitrogen from a cryogenic source at 1.0 slpm was started through the housing containing the barium-coated crystal. After ca. 20 hours, the gas was switched to a 2% oxygen in argon mixture to accelerate the conversion of the barium coating to barium oxide. The gas flow was periodically stopped to pressurize the housing with the oxygen gas mixture, especially during overnight periods. After ca. 143 hours, the gaswas switched to air (Grade 0.1,[H2 O]<3 ppm) to convert any remaining accessible barium to barium oxide. The purifier was removed after 162 hours to challenge the formed barium oxide coated sensor to the unpurifiedair. As shown in FIG. 5, exposure of the sensor to moisture resulted in a large and immediate frequency decrease corresponding to conversion of the sensor coating to barium hydroxide.
Claims (14)
1. A sensing device for measuring water content in a stream of purified gases which comprises:
a piezoelectric material having an effective mass of a coating .[.non-crystalline metal oxide.]. on at least one surface of said sensing device, with said coating formed of a composition .Iadd.selected from the group consisting of a non-crystalline metal oxide, a crystalline, non-zeolite metal oxide and mixtures thereof, said coating being .Iaddend.chemically reactive with water to form a metal hydroxide product, said coating having a mass which permits said material to vibrate in response to applied alternating electrical current,
means for applying an alternating electrical current to said piezoelectric material and means for measuring frequency of vibration of said piezoelectric material.
2. The device of claim 1 wherein said material has said coating on two opposing surfaces.
3. The device of claim 1 wherein said piezoelectric material is quartz.
4. The device of claim 2 wherein said piezoelectric material is quartz.
5. The device of claim 1 wherein said coating is barium oxide.
6. The device of claim 2 wherein said coating is barium oxide.
7. The device of claim 3 wherein said coating is barium oxide.
8. The device of claim 4 wherein said coating is barium oxide.
9. The device of claim 1 wherein said piezoelectric material is poly(vinylidene fluoride).
10. The device of claim 2 wherein said piezoelectric material is poly (vinylidene fluoride).
11. The device of claim 1 wherein said coating includes a layer of protective material between said metal oxide coating and said piezoelectric material comprising poly(vinylidene fluoride).
12. The device of claim .[.I.]. .Iadd.1 .Iaddend.wherein said coating includes a layer of protective material between said metal oxide coating and said piezoelectric material comprising polytetrafluoroethylene.
13. The device of claim 2 wherein said coating includes a layer of protective material between said metal oxide coating and said piezoelectric material comprising poly(vinylidene fluoride).
14. The device of claim 2 wherein said coating includes a layer of protective material between said-metal oxide coating and said piezoelectric material comprising polytetrafluoroethylene.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US08/671,231 USRE35544E (en) | 1992-10-08 | 1996-06-27 | Apparatus for monitoring moisture in a gas stream |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US07/958,384 US5339675A (en) | 1992-10-08 | 1992-10-08 | Apparatus for monitoring impurities in a gas stream |
| US08/281,286 US5477716A (en) | 1992-10-08 | 1994-07-27 | Apparatus for monitoring moisture in a gas stream |
| US08/671,231 USRE35544E (en) | 1992-10-08 | 1996-06-27 | Apparatus for monitoring moisture in a gas stream |
Related Parent Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| US07/958,384 Continuation-In-Part US5339675A (en) | 1992-10-08 | 1992-10-08 | Apparatus for monitoring impurities in a gas stream |
| US08/281,286 Reissue US5477716A (en) | 1992-10-08 | 1994-07-27 | Apparatus for monitoring moisture in a gas stream |
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| USRE35544E true USRE35544E (en) | 1997-07-01 |
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| US08/671,231 Expired - Fee Related USRE35544E (en) | 1992-10-08 | 1996-06-27 | Apparatus for monitoring moisture in a gas stream |
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| US6016686A (en) | 1998-03-16 | 2000-01-25 | Lockheed Martin Energy Research Corporation | Micromechanical potentiometric sensors |
| US6029500A (en) | 1998-05-19 | 2000-02-29 | Advanced Technology Materials, Inc. | Piezoelectric quartz crystal hydrogen sensor, and hydrogen sensing method utilizing same |
| US6079252A (en) | 1998-05-20 | 2000-06-27 | Advanced Technology Materials, Inc. | Leak detection device, and fluid vessel assembly comprising same |
| US6118124A (en) | 1996-01-18 | 2000-09-12 | Lockheed Martin Energy Research Corporation | Electromagnetic and nuclear radiation detector using micromechanical sensors |
| US6156578A (en) | 1998-06-01 | 2000-12-05 | Advanced Technology Materials, Inc. | Quartz crystal microbalance system for detecting concentration of a selected gas component in a multicomponent gas stream |
| US6167748B1 (en) | 1998-08-31 | 2001-01-02 | Lockheed Martin Energy Research Corporation | Capacitively readout multi-element sensor array with common-mode cancellation |
| US6289717B1 (en) | 1999-03-30 | 2001-09-18 | U. T. Battelle, Llc | Micromechanical antibody sensor |
| US6295861B1 (en) | 1999-01-28 | 2001-10-02 | Advanced Technology Materials, Inc. | Quartz crystal microbalance sensors and semiconductor manufacturing process systems comprising same |
| US20020102743A1 (en) * | 1999-08-19 | 2002-08-01 | The Regents Of The University Of California | Apparatus and method for visually identifying micro-forces with a palette of cantilever array blocks |
| US7059170B2 (en) | 2004-02-27 | 2006-06-13 | Nielsen-Kellerman, Inc. | Method and apparatus for measuring relative humidity of a mixture |
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